FI822257L - Ljuskaenslig blandning baserad pao, o-naftokinondiazid och daerav framstaellt ljuskaensligt kopieringsmaterial - Google Patents

Ljuskaenslig blandning baserad pao, o-naftokinondiazid och daerav framstaellt ljuskaensligt kopieringsmaterial

Info

Publication number
FI822257L
FI822257L FI822257A FI822257A FI822257L FI 822257 L FI822257 L FI 822257L FI 822257 A FI822257 A FI 822257A FI 822257 A FI822257 A FI 822257A FI 822257 L FI822257 L FI 822257L
Authority
FI
Finland
Prior art keywords
diazide
naphthoquinone
naftokinondiazid
ljuskaensligt
ljuskaenslig
Prior art date
Application number
FI822257A
Other languages
English (en)
Finnish (fi)
Other versions
FI822257A0 (fi
Inventor
Paul Stahlhofen
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of FI822257A0 publication Critical patent/FI822257A0/fi
Publication of FI822257L publication Critical patent/FI822257L/fi

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Measuring Or Testing Involving Enzymes Or Micro-Organisms (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Printing Plates And Materials Therefor (AREA)
FI822257A 1981-06-25 1982-06-23 Ljuskaenslig blandning baserad pao, o-naftokinondiazid och daerav framstaellt ljuskaensligt kopieringsmaterial FI822257L (fi)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19813124936 DE3124936A1 (de) 1981-06-25 1981-06-25 Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial

Publications (2)

Publication Number Publication Date
FI822257A0 FI822257A0 (fi) 1982-06-23
FI822257L true FI822257L (fi) 1982-12-26

Family

ID=6135331

Family Applications (1)

Application Number Title Priority Date Filing Date
FI822257A FI822257L (fi) 1981-06-25 1982-06-23 Ljuskaenslig blandning baserad pao, o-naftokinondiazid och daerav framstaellt ljuskaensligt kopieringsmaterial

Country Status (11)

Country Link
US (1) US4517275A (ja)
EP (1) EP0068346B1 (ja)
JP (1) JPS585737A (ja)
AT (1) ATE10141T1 (ja)
AU (1) AU8509082A (ja)
BR (1) BR8203685A (ja)
CA (1) CA1213600A (ja)
DE (2) DE3124936A1 (ja)
ES (1) ES513403A0 (ja)
FI (1) FI822257L (ja)
ZA (1) ZA824004B (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4735885A (en) * 1985-12-06 1988-04-05 Allied Corporation Deep UV photoresist composition with 1,3-disubstituted-5-diazobarbituric acids
JP2552891B2 (ja) * 1988-01-26 1996-11-13 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JP2700918B2 (ja) * 1989-04-26 1998-01-21 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
US5196517A (en) * 1989-10-30 1993-03-23 Ocg Microelectronic Materials, Inc. Selected trihydroxybenzophenone compounds and their use as photoactive compounds
US5019478A (en) * 1989-10-30 1991-05-28 Olin Hunt Specialty Products, Inc. Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures
US5219714A (en) * 1989-10-30 1993-06-15 Ocg Microelectronic Materials, Inc. Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures
US5618932A (en) * 1995-05-24 1997-04-08 Shipley Company, L.L.C. Photoactive compounds and compositions
US6461794B1 (en) * 1999-08-11 2002-10-08 Kodak Polychrome Graphics Llc Lithographic printing forms

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE510151A (ja) * 1949-07-23
BE508016A (ja) * 1950-12-23
BE586713A (ja) * 1959-01-21
US3647443A (en) * 1969-09-12 1972-03-07 Eastman Kodak Co Light-sensitive quinone diazide polymers and polymer compositions
JPS53494B2 (ja) * 1972-09-08 1978-01-09
DE2742631A1 (de) * 1977-09-22 1979-04-05 Hoechst Ag Lichtempfindliche kopiermasse
DE2828037A1 (de) * 1978-06-26 1980-01-10 Hoechst Ag Lichtempfindliches gemisch
DE3040157A1 (de) * 1980-10-24 1982-06-03 Hoechst Ag, 6000 Frankfurt Lichtemopfindliches gemisch und damit hergestelltes lichtempfindliches kopiermaterial
DE3043967A1 (de) * 1980-11-21 1982-06-24 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial

Also Published As

Publication number Publication date
JPS585737A (ja) 1983-01-13
ES8404065A1 (es) 1984-04-01
CA1213600A (en) 1986-11-04
DE3124936A1 (de) 1983-01-20
ATE10141T1 (de) 1984-11-15
ES513403A0 (es) 1984-04-01
US4517275A (en) 1985-05-14
AU8509082A (en) 1983-01-06
EP0068346B1 (de) 1984-10-31
FI822257A0 (fi) 1982-06-23
EP0068346A1 (de) 1983-01-05
JPH0339301B2 (ja) 1991-06-13
DE3261128D1 (en) 1984-12-06
ZA824004B (en) 1983-03-30
BR8203685A (pt) 1983-06-21

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Legal Events

Date Code Title Description
FD Application lapsed

Owner name: HOECHST AKTIENGESELLSCHAFT