ZA200502642B - Improvement in the storage stability of photoinitiators - Google Patents
Improvement in the storage stability of photoinitiatorsInfo
- Publication number
- ZA200502642B ZA200502642B ZA200502642A ZA200502642A ZA200502642B ZA 200502642 B ZA200502642 B ZA 200502642B ZA 200502642 A ZA200502642 A ZA 200502642A ZA 200502642 A ZA200502642 A ZA 200502642A ZA 200502642 B ZA200502642 B ZA 200502642B
- Authority
- ZA
- South Africa
- Prior art keywords
- sub
- storage stability
- photoinitiators
- improvement
- formulations
- Prior art date
Links
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 2
- 125000003545 alkoxy group Chemical group 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- 238000009472 formulation Methods 0.000 abstract 2
- 229910052739 hydrogen Inorganic materials 0.000 abstract 2
- 239000001257 hydrogen Substances 0.000 abstract 2
- 239000000203 mixture Substances 0.000 abstract 2
- CPEONABTMRSIKA-UHFFFAOYSA-N 1,4$l^{2}-oxazinane Chemical compound C1COCC[N]1 CPEONABTMRSIKA-UHFFFAOYSA-N 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/12—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/08—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms
- C07D295/096—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms with the ring nitrogen atoms and the oxygen or sulfur atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/10—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/10—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
- C07D295/112—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/10—Printing inks based on artificial resins
- C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Holo Graphy (AREA)
- Paints Or Removers (AREA)
- Ink Jet Recording Methods And Recording Media Thereof (AREA)
- Measuring Pulse, Heart Rate, Blood Pressure Or Blood Flow (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH18002002 | 2002-10-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ZA200502642B true ZA200502642B (en) | 2006-07-26 |
Family
ID=32111465
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ZA200502642A ZA200502642B (en) | 2002-10-28 | 2005-04-01 | Improvement in the storage stability of photoinitiators |
Country Status (16)
| Country | Link |
|---|---|
| US (1) | US7291654B2 (nl) |
| EP (1) | EP1556365B1 (nl) |
| JP (1) | JP4575777B2 (nl) |
| KR (1) | KR101059703B1 (nl) |
| CN (1) | CN100430385C (nl) |
| AT (1) | ATE338034T1 (nl) |
| AU (1) | AU2003283441A1 (nl) |
| BR (1) | BR0315786A (nl) |
| CA (1) | CA2501438A1 (nl) |
| DE (1) | DE60308052T2 (nl) |
| MX (1) | MXPA05004015A (nl) |
| NZ (1) | NZ539621A (nl) |
| RU (1) | RU2005116302A (nl) |
| TW (1) | TWI320789B (nl) |
| WO (1) | WO2004037799A1 (nl) |
| ZA (1) | ZA200502642B (nl) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050176841A1 (en) * | 2003-12-30 | 2005-08-11 | Krohn Roy C. | UV curable ink compositions |
| JP4380359B2 (ja) * | 2004-02-20 | 2009-12-09 | Ｊｓｒ株式会社 | スペーサー形成用感放射線性樹脂組成物、スペーサーとその形成方法および液晶表示素子 |
| CN101068892A (zh) * | 2004-12-07 | 2007-11-07 | 柯尼卡美能达医疗印刷器材株式会社 | 活性光线固化型品红油墨组合物、活性光线固化型喷墨记录用品红油墨和使用该油墨的图像形成方法及喷墨记录装置、活性光线固化型印刷用品红油墨 |
| US7459014B2 (en) | 2005-01-14 | 2008-12-02 | Xerox Corporation | Radiation curable inks containing curable gelator additives |
| US20060199028A1 (en) * | 2005-03-02 | 2006-09-07 | Dimitry Chernyshov | Process for coating |
| EP1815978B1 (en) * | 2006-02-06 | 2012-01-18 | FUJIFILM Corporation | Ink composition, inkjet recording method, method of producing planographic printing plate, and planographic printing plate |
| JP4952045B2 (ja) * | 2006-04-28 | 2012-06-13 | Ｊｓｒ株式会社 | エネルギー線硬化型インクジェット印刷用インク |
| EP2041217A2 (en) * | 2006-07-17 | 2009-04-01 | Ciba Holding Inc. | Method of bonding |
| BRPI0717655B1 (pt) * | 2006-09-29 | 2018-12-18 | Basf Se | bases fotolatentes para sistema à base de isocianatos bloqueados |
| KR100920603B1 (ko) * | 2006-12-28 | 2009-10-08 | 제일모직주식회사 | 감광성 수지 조성물 및 그로부터 제조되는 컬러필터 |
| KR100881860B1 (ko) * | 2007-01-17 | 2009-02-06 | 제일모직주식회사 | 컬러필터용 감광성 수지 조성물 및 이를 이용한 이미지센서컬러필터 |
| US8129447B2 (en) † | 2007-09-28 | 2012-03-06 | Fujifilm Corporation | Ink composition and inkjet recording method using the same |
| CN101727003B (zh) * | 2008-10-24 | 2012-07-18 | 第一毛织株式会社 | 用于彩色滤光片的光敏树脂组合物以及使用其制备的彩色滤光片 |
| IT1398626B1 (it) * | 2009-03-30 | 2013-03-08 | Carbontech S R L | Materiale composito e/o multistrato con lettere, numeri, parole, immagini sulla superficie e relativo procedimento per la visualizzazione di esse. |
| WO2010128969A1 (en) * | 2009-05-08 | 2010-11-11 | Hewlett-Packard Development Company, L.P. | Functionalized perfluoropolyether material as a hydrophobic coating |
| JP2010275392A (ja) * | 2009-05-27 | 2010-12-09 | Mitsubishi Rayon Co Ltd | 重合性混合物、それから得られる樹脂成形体及びその製造方法 |
| JP5812613B2 (ja) * | 2010-03-09 | 2015-11-17 | キヤノン株式会社 | 光音響整合材及び人体組織模擬材料 |
| CN102206394B (zh) * | 2010-03-31 | 2014-02-12 | 罗门哈斯公司 | 含水共聚物分散液和涂料组合物 |
| JP5809780B2 (ja) * | 2010-04-02 | 2015-11-11 | Ｄｉｃグラフィックス株式会社 | 紫外線硬化性コーティングニス |
| US20130029046A1 (en) * | 2010-04-09 | 2013-01-31 | Basf Se | Printing ink containing a divinyl ester |
| US9373923B2 (en) * | 2011-11-22 | 2016-06-21 | Savannah River Nuclear Solutions, Llc | Rapid prototype extruded conductive pathways |
| KR20140083620A (ko) | 2012-12-26 | 2014-07-04 | 제일모직주식회사 | 차광층용 감광성 수지 조성물 및 이를 이용한 차광층 |
| CN103191739B (zh) * | 2013-04-25 | 2015-07-29 | 上海师范大学 | 一种高产氢活性的金红石负载超长铜纳米线光催化剂及其制备方法和应用 |
| JP2015002978A (ja) * | 2013-05-23 | 2015-01-08 | キヤノン株式会社 | 光音響用血液モデル |
| JP6388776B2 (ja) * | 2014-03-12 | 2018-09-12 | 新日鉄住金化学株式会社 | 白色感光性樹脂組成物、それを用いた硬化物、及びその硬化物を構成成分として含むタッチパネル |
| US9482788B2 (en) | 2014-12-05 | 2016-11-01 | Pegavision Corporation | UV-blocking silicone hydrogel composition and silicone hydrogel contact lens containing thereof |
| WO2016125758A1 (ja) * | 2015-02-03 | 2016-08-11 | 三井化学株式会社 | 光硬化性組成物、義歯床及び有床義歯 |
| US9988539B2 (en) * | 2015-11-12 | 2018-06-05 | Ricoh Company, Ltd. | Active-energy-ray-curable composition, active-energy-ray-curable ink, composition stored container, two-dimensional or three-dimensional image forming apparatus, two-dimensional or three-dimensional image forming method, cured material, and structure |
| EP3686252A1 (en) * | 2019-01-24 | 2020-07-29 | Agfa-Gevaert Nv | Radiation curable inkjet ink for manufacturing printed circuit boards |
| CN110698433A (zh) * | 2019-11-25 | 2020-01-17 | 怀化市恒渝新材料有限公司 | 一种光引发剂的纯化方法和设备 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3738567A1 (de) * | 1987-03-12 | 1988-09-22 | Merck Patent Gmbh | Coreaktive fotoinitiatoren |
| DE3880868D1 (en) * | 1987-03-26 | 1993-06-17 | Ciba Geigy Ag | Neue alpha-aminoacetophenone als photoinitiatoren. |
| US5795985A (en) * | 1996-03-05 | 1998-08-18 | Ciba Specialty Chemicals Corporation | Phenyl alkyl ketone substituted by cyclic amine and a process for the preparation thereof |
| US6620857B2 (en) * | 1996-07-02 | 2003-09-16 | Ciba Specialty Chemicals Corporation | Process for curing a polymerizable composition |
| CN1214018C (zh) * | 1997-09-17 | 2005-08-10 | 西巴特殊化学品控股有限公司 | 作为光稳定剂的吗啉酮化合物 |
| US6228289B1 (en) * | 1998-09-25 | 2001-05-08 | Q2100, Inc. | Plastic lens systems and methods |
| JP4164919B2 (ja) * | 1998-11-30 | 2008-10-15 | チッソ株式会社 | 光重合開始剤および光重合性開始剤組成物 |
| EP1285012B1 (en) * | 2000-05-26 | 2007-01-10 | Akzo Nobel Coatings International B.V. | Photoactivatable coating composition |
| RU2281310C2 (ru) * | 2001-02-19 | 2006-08-10 | Джей Эс Эр КОРПОРЕЙШН | Чувствительная к облучению композиция, изменяющая показатель преломления |
| MXPA05011847A (es) * | 2003-05-06 | 2006-01-26 | Ciba Sc Holding Ag | Revestimientos fotocurados y estabilizados. |
-
2003
- 2003-10-17 US US10/531,482 patent/US7291654B2/en active Active
- 2003-10-17 CA CA002501438A patent/CA2501438A1/en not_active Abandoned
- 2003-10-17 MX MXPA05004015A patent/MXPA05004015A/es unknown
- 2003-10-17 WO PCT/EP2003/050729 patent/WO2004037799A1/en active IP Right Grant
- 2003-10-17 BR BR0315786-5A patent/BR0315786A/pt not_active Application Discontinuation
- 2003-10-17 JP JP2004546040A patent/JP4575777B2/ja not_active Expired - Lifetime
- 2003-10-17 KR KR1020057007427A patent/KR101059703B1/ko not_active IP Right Cessation
- 2003-10-17 EP EP03775409A patent/EP1556365B1/en not_active Expired - Lifetime
- 2003-10-17 DE DE60308052T patent/DE60308052T2/de not_active Expired - Lifetime
- 2003-10-17 CN CNB2003801021819A patent/CN100430385C/zh not_active Expired - Lifetime
- 2003-10-17 AU AU2003283441A patent/AU2003283441A1/en not_active Abandoned
- 2003-10-17 RU RU2005116302/04A patent/RU2005116302A/ru not_active Application Discontinuation
- 2003-10-17 NZ NZ539621A patent/NZ539621A/xx unknown
- 2003-10-17 AT AT03775409T patent/ATE338034T1/de not_active IP Right Cessation
- 2003-10-27 TW TW092129799A patent/TWI320789B/zh not_active IP Right Cessation
-
2005
- 2005-04-01 ZA ZA200502642A patent/ZA200502642B/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| DE60308052T2 (de) | 2007-04-05 |
| MXPA05004015A (es) | 2005-06-08 |
| TW200406425A (en) | 2004-05-01 |
| TWI320789B (en) | 2010-02-21 |
| KR101059703B1 (ko) | 2011-08-29 |
| JP2006515833A (ja) | 2006-06-08 |
| KR20050065637A (ko) | 2005-06-29 |
| RU2005116302A (ru) | 2006-01-20 |
| AU2003283441A1 (en) | 2004-05-13 |
| CN1708488A (zh) | 2005-12-14 |
| JP4575777B2 (ja) | 2010-11-04 |
| WO2004037799A1 (en) | 2004-05-06 |
| EP1556365B1 (en) | 2006-08-30 |
| ATE338034T1 (de) | 2006-09-15 |
| CN100430385C (zh) | 2008-11-05 |
| DE60308052D1 (de) | 2006-10-12 |
| CA2501438A1 (en) | 2004-05-06 |
| NZ539621A (en) | 2006-03-31 |
| US20060100298A1 (en) | 2006-05-11 |
| EP1556365A1 (en) | 2005-07-27 |
| BR0315786A (pt) | 2005-09-13 |
| US7291654B2 (en) | 2007-11-06 |
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| EP1203763A3 (de) | Beta-Hydroxyalkylamide, Verfahren zu ihrer Herstellung und deren Verwendung | |
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