ATE338034T1 - Verbesserung bei der haltbarkeit von photoinitiatoren - Google Patents

Verbesserung bei der haltbarkeit von photoinitiatoren

Info

Publication number
ATE338034T1
ATE338034T1 AT03775409T AT03775409T ATE338034T1 AT E338034 T1 ATE338034 T1 AT E338034T1 AT 03775409 T AT03775409 T AT 03775409T AT 03775409 T AT03775409 T AT 03775409T AT E338034 T1 ATE338034 T1 AT E338034T1
Authority
AT
Austria
Prior art keywords
sub
photoinitiators
improved
shelf life
formulations
Prior art date
Application number
AT03775409T
Other languages
English (en)
Inventor
Thomas Ulrich
Thomas Bolle
Kurt Dietliker
Jean-Pierre Wolf
Andre Fuchs
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Application granted granted Critical
Publication of ATE338034T1 publication Critical patent/ATE338034T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/12—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/08—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms
    • C07D295/096—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms with the ring nitrogen atoms and the oxygen or sulfur atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/10—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/10—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
    • C07D295/112—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Holo Graphy (AREA)
  • Measuring Pulse, Heart Rate, Blood Pressure Or Blood Flow (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
  • Paints Or Removers (AREA)
AT03775409T 2002-10-28 2003-10-17 Verbesserung bei der haltbarkeit von photoinitiatoren ATE338034T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH18002002 2002-10-28

Publications (1)

Publication Number Publication Date
ATE338034T1 true ATE338034T1 (de) 2006-09-15

Family

ID=32111465

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03775409T ATE338034T1 (de) 2002-10-28 2003-10-17 Verbesserung bei der haltbarkeit von photoinitiatoren

Country Status (16)

Country Link
US (1) US7291654B2 (de)
EP (1) EP1556365B1 (de)
JP (1) JP4575777B2 (de)
KR (1) KR101059703B1 (de)
CN (1) CN100430385C (de)
AT (1) ATE338034T1 (de)
AU (1) AU2003283441A1 (de)
BR (1) BR0315786A (de)
CA (1) CA2501438A1 (de)
DE (1) DE60308052T2 (de)
MX (1) MXPA05004015A (de)
NZ (1) NZ539621A (de)
RU (1) RU2005116302A (de)
TW (1) TWI320789B (de)
WO (1) WO2004037799A1 (de)
ZA (1) ZA200502642B (de)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050176841A1 (en) * 2003-12-30 2005-08-11 Krohn Roy C. UV curable ink compositions
JP4380359B2 (ja) * 2004-02-20 2009-12-09 Ｊｓｒ株式会社 スペーサー形成用感放射線性樹脂組成物、スペーサーとその形成方法および液晶表示素子
US20080160209A1 (en) * 2004-12-07 2008-07-03 Toshiyuki Takabayashi Actinic Radiation Curable Magenta Ink Composition, Actinic Radiation Curable Ink, Jet Recording Magenta Ink and Method for Image Formation and Ink Jet Recording Apparatus Using Said Ink, and Actinic Radiation Curable Printing Magenta Ink
US7459014B2 (en) 2005-01-14 2008-12-02 Xerox Corporation Radiation curable inks containing curable gelator additives
US20060199028A1 (en) * 2005-03-02 2006-09-07 Dimitry Chernyshov Process for coating
US7806050B2 (en) 2006-02-06 2010-10-05 Fujifilm Corporation Ink composition, inkjet recording method, method of producing planographic printing plate, and planographic printing plate
JP4952045B2 (ja) * 2006-04-28 2012-06-13 Ｊｓｒ株式会社 エネルギー線硬化型インクジェット印刷用インク
BRPI0714462A2 (pt) * 2006-07-17 2013-03-12 Ciba Holding Inc bases fotolatentes para adesivos
US20090298962A1 (en) * 2006-09-29 2009-12-03 Katia Studer Photolatent bases for systems based on blocked isocyanates
KR100920603B1 (ko) * 2006-12-28 2009-10-08 제일모직주식회사 감광성 수지 조성물 및 그로부터 제조되는 컬러필터
KR100881860B1 (ko) * 2007-01-17 2009-02-06 제일모직주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 이미지센서컬러필터
US8129447B2 (en) † 2007-09-28 2012-03-06 Fujifilm Corporation Ink composition and inkjet recording method using the same
US8486591B2 (en) * 2008-10-24 2013-07-16 Cheil Industries Inc. Photosensitive resin composition for color filter and color filter prepared using the same
IT1398626B1 (it) * 2009-03-30 2013-03-08 Carbontech S R L Materiale composito e/o multistrato con lettere, numeri, parole, immagini sulla superficie e relativo procedimento per la visualizzazione di esse.
CN102804061A (zh) * 2009-05-08 2012-11-28 惠普开发有限公司 作为疏水性涂层的功能化全氟聚醚材料
JP2010275392A (ja) * 2009-05-27 2010-12-09 Mitsubishi Rayon Co Ltd 重合性混合物、それから得られる樹脂成形体及びその製造方法
JP5812613B2 (ja) * 2010-03-09 2015-11-17 キヤノン株式会社 光音響整合材及び人体組織模擬材料
CN102206394B (zh) * 2010-03-31 2014-02-12 罗门哈斯公司 含水共聚物分散液和涂料组合物
JP5809780B2 (ja) * 2010-04-02 2015-11-11 Ｄｉｃグラフィックス株式会社 紫外線硬化性コーティングニス
EP2556124A1 (de) * 2010-04-09 2013-02-13 Basf Se Druckfarbe, enthaltend einen divinylester
US9373923B2 (en) 2011-11-22 2016-06-21 Savannah River Nuclear Solutions, Llc Rapid prototype extruded conductive pathways
KR20140083620A (ko) 2012-12-26 2014-07-04 제일모직주식회사 차광층용 감광성 수지 조성물 및 이를 이용한 차광층
CN103191739B (zh) * 2013-04-25 2015-07-29 上海师范大学 一种高产氢活性的金红石负载超长铜纳米线光催化剂及其制备方法和应用
JP2015002978A (ja) * 2013-05-23 2015-01-08 キヤノン株式会社 光音響用血液モデル
JP6388776B2 (ja) * 2014-03-12 2018-09-12 新日鉄住金化学株式会社 白色感光性樹脂組成物、それを用いた硬化物、及びその硬化物を構成成分として含むタッチパネル
US9482788B2 (en) 2014-12-05 2016-11-01 Pegavision Corporation UV-blocking silicone hydrogel composition and silicone hydrogel contact lens containing thereof
US10709530B2 (en) 2015-02-03 2020-07-14 Mitsui Chemicals, Inc. Photocurable composition, denture base, and plate denture
US9988539B2 (en) * 2015-11-12 2018-06-05 Ricoh Company, Ltd. Active-energy-ray-curable composition, active-energy-ray-curable ink, composition stored container, two-dimensional or three-dimensional image forming apparatus, two-dimensional or three-dimensional image forming method, cured material, and structure
EP3686252A1 (de) * 2019-01-24 2020-07-29 Agfa-Gevaert Nv Strahlungshärtbare tintenstrahltinte zur herstellung von leiterplatten
CN110698433A (zh) * 2019-11-25 2020-01-17 怀化市恒渝新材料有限公司 一种光引发剂的纯化方法和设备

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3738567A1 (de) * 1987-03-12 1988-09-22 Merck Patent Gmbh Coreaktive fotoinitiatoren
ATE89262T1 (de) 1987-03-26 1993-05-15 Ciba Geigy Ag Neue alpha-aminoacetophenone als photoinitiatoren.
US5795985A (en) 1996-03-05 1998-08-18 Ciba Specialty Chemicals Corporation Phenyl alkyl ketone substituted by cyclic amine and a process for the preparation thereof
US6620857B2 (en) * 1996-07-02 2003-09-16 Ciba Specialty Chemicals Corporation Process for curing a polymerizable composition
CA2297208A1 (en) * 1997-09-17 2000-03-25 Ciba Specialty Chemicals Holding Inc. Morpholinones as light stabilizers
US6478990B1 (en) * 1998-09-25 2002-11-12 Q2100, Inc. Plastic lens systems and methods
JP4164919B2 (ja) * 1998-11-30 2008-10-15 チッソ株式会社 光重合開始剤および光重合性開始剤組成物
KR100728462B1 (ko) * 2000-05-26 2007-06-13 아크조 노벨 엔.브이. 광활성가능한 코팅조성물
AU2002233644B2 (en) * 2001-02-19 2006-09-28 Jsr Corporation Radiation sensitive refractive index changing composition
CN100415812C (zh) * 2003-05-06 2008-09-03 西巴特殊化学品控股有限公司 一种形成保护性膜涂层的方法及所用的涂层组合物

Also Published As

Publication number Publication date
WO2004037799A1 (en) 2004-05-06
JP2006515833A (ja) 2006-06-08
US7291654B2 (en) 2007-11-06
AU2003283441A1 (en) 2004-05-13
BR0315786A (pt) 2005-09-13
EP1556365B1 (de) 2006-08-30
TWI320789B (en) 2010-02-21
TW200406425A (en) 2004-05-01
EP1556365A1 (de) 2005-07-27
CA2501438A1 (en) 2004-05-06
NZ539621A (en) 2006-03-31
US20060100298A1 (en) 2006-05-11
CN1708488A (zh) 2005-12-14
JP4575777B2 (ja) 2010-11-04
CN100430385C (zh) 2008-11-05
ZA200502642B (en) 2006-07-26
DE60308052T2 (de) 2007-04-05
RU2005116302A (ru) 2006-01-20
MXPA05004015A (es) 2005-06-08
KR20050065637A (ko) 2005-06-29
DE60308052D1 (de) 2006-10-12
KR101059703B1 (ko) 2011-08-29

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