ZA200302928B - Diamondoid-containing materials in microelectronics. - Google Patents
Diamondoid-containing materials in microelectronics. Download PDFInfo
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- ZA200302928B ZA200302928B ZA200302928A ZA200302928A ZA200302928B ZA 200302928 B ZA200302928 B ZA 200302928B ZA 200302928 A ZA200302928 A ZA 200302928A ZA 200302928 A ZA200302928 A ZA 200302928A ZA 200302928 B ZA200302928 B ZA 200302928B
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- ZA
- South Africa
- Prior art keywords
- diamondoid
- film
- diamondoids
- field emission
- diamond
- Prior art date
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Classifications
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- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C4/00—Preparation of hydrocarbons from hydrocarbons containing a larger number of carbon atoms
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- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C7/00—Purification; Separation; Use of additives
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C13/00—Cyclic hydrocarbons containing rings other than, or in addition to, six-membered aromatic rings
- C07C13/28—Polycyclic hydrocarbons or acyclic hydrocarbon derivatives thereof
- C07C13/32—Polycyclic hydrocarbons or acyclic hydrocarbon derivatives thereof with condensed rings
- C07C13/62—Polycyclic hydrocarbons or acyclic hydrocarbon derivatives thereof with condensed rings with more than three condensed rings
- C07C13/64—Polycyclic hydrocarbons or acyclic hydrocarbon derivatives thereof with condensed rings with more than three condensed rings with a bridged ring system
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- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C17/00—Preparation of halogenated hydrocarbons
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- C07C17/10—Preparation of halogenated hydrocarbons by replacement by halogens of hydrogen atoms
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- C07C17/16—Preparation of halogenated hydrocarbons by replacement by halogens of hydroxyl groups
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- C07C17/00—Preparation of halogenated hydrocarbons
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- C07C17/383—Separation; Purification; Stabilisation; Use of additives by distillation
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- C07C17/00—Preparation of halogenated hydrocarbons
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- C07C17/395—Separation; Purification; Stabilisation; Use of additives by treatment giving rise to a chemical modification of at least one compound
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- C07C205/00—Compounds containing nitro groups bound to a carbon skeleton
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- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C211/00—Compounds containing amino groups bound to a carbon skeleton
- C07C211/43—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
- C07C211/44—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton having amino groups bound to only one six-membered aromatic ring
- C07C211/49—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton having amino groups bound to only one six-membered aromatic ring having at least two amino groups bound to the carbon skeleton
- C07C211/50—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton having amino groups bound to only one six-membered aromatic ring having at least two amino groups bound to the carbon skeleton with at least two amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
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- C07C23/18—Polycyclic halogenated hydrocarbons
- C07C23/20—Polycyclic halogenated hydrocarbons with condensed rings none of which is aromatic
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- C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
- C07C39/12—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings
- C07C39/17—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings containing other rings in addition to the six-membered aromatic rings, e.g. cyclohexylphenol
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- C07C47/00—Compounds having —CHO groups
- C07C47/28—Saturated compounds having —CHO groups bound to carbon atoms of rings other than six—membered aromatic rings
- C07C47/34—Saturated compounds having —CHO groups bound to carbon atoms of rings other than six—membered aromatic rings polycyclic
- C07C47/347—Saturated compounds having —CHO groups bound to carbon atoms of rings other than six—membered aromatic rings polycyclic having a —CHO group on a condensed ring system
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- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/385—Saturated compounds containing a keto group being part of a ring
- C07C49/417—Saturated compounds containing a keto group being part of a ring polycyclic
- C07C49/423—Saturated compounds containing a keto group being part of a ring polycyclic a keto group being part of a condensed ring system
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
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- C08G83/00—Macromolecular compounds not provided for in groups C08G2/00 - C08G81/00
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- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L65/00—Compositions of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Compositions of derivatives of such polymers
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- C07C2603/02—Ortho- or ortho- and peri-condensed systems
- C07C2603/54—Ortho- or ortho- and peri-condensed systems containing more than five condensed rings
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- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2603/00—Systems containing at least three condensed rings
- C07C2603/56—Ring systems containing bridged rings
- C07C2603/90—Ring systems containing bridged rings containing more than four rings
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Nanotechnology (AREA)
- Water Supply & Treatment (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Composite Materials (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Production Of Liquid Hydrocarbon Mixture For Refining Petroleum (AREA)
- Carbon And Carbon Compounds (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Chemical Vapour Deposition (AREA)
- Processing Of Solid Wastes (AREA)
Applications Claiming Priority (1)
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US26284201P | 2001-01-19 | 2001-01-19 |
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Application Number | Title | Priority Date | Filing Date |
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ZA200302926A ZA200302926B (en) | 2001-01-19 | 2003-04-14 | Compositions comprising higher diamondoids and processes for their separation. |
ZA200302925A ZA200302925B (en) | 2001-01-19 | 2003-04-14 | Processes for the purification of higher diamondoids and compositions comprising such diamondoids. |
ZA200302928A ZA200302928B (en) | 2001-01-19 | 2003-04-14 | Diamondoid-containing materials in microelectronics. |
ZA200302929A ZA200302929B (en) | 2001-01-19 | 2003-04-14 | Compositions comprising cyclohexamantane. |
ZA200302927A ZA200302927B (en) | 2001-01-19 | 2003-04-14 | Polymerizable higher diamondiod derivatives. |
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ZA200302926A ZA200302926B (en) | 2001-01-19 | 2003-04-14 | Compositions comprising higher diamondoids and processes for their separation. |
ZA200302925A ZA200302925B (en) | 2001-01-19 | 2003-04-14 | Processes for the purification of higher diamondoids and compositions comprising such diamondoids. |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
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ZA200302929A ZA200302929B (en) | 2001-01-19 | 2003-04-14 | Compositions comprising cyclohexamantane. |
ZA200302927A ZA200302927B (en) | 2001-01-19 | 2003-04-14 | Polymerizable higher diamondiod derivatives. |
Country Status (24)
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US (2) | US6844477B2 (es) |
EP (1) | EP1392603B1 (es) |
JP (1) | JP2005503352A (es) |
KR (1) | KR20040004490A (es) |
CN (1) | CN1286784C (es) |
AR (2) | AR035529A1 (es) |
AT (1) | ATE438590T1 (es) |
AU (1) | AU2002321993B2 (es) |
BR (1) | BR0206531A (es) |
CA (1) | CA2435407A1 (es) |
CZ (1) | CZ20031977A3 (es) |
DE (1) | DE60233221D1 (es) |
HK (1) | HK1066527A1 (es) |
HU (1) | HUP0302721A3 (es) |
IL (2) | IL156963A0 (es) |
MX (1) | MXPA03006377A (es) |
MY (1) | MY143730A (es) |
NO (1) | NO20033259L (es) |
NZ (1) | NZ525260A (es) |
PL (1) | PL369175A1 (es) |
RU (1) | RU2307822C2 (es) |
TW (2) | TWI235743B (es) |
WO (3) | WO2002057203A1 (es) |
ZA (5) | ZA200302926B (es) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6843851B2 (en) * | 2001-01-19 | 2005-01-18 | Chevron U.S.A., Inc. | Compositions comprising pentamantanes and processes for their separation |
EP1351905A2 (en) * | 2001-01-19 | 2003-10-15 | Chevron USA, Inc. | Polymerizable higher diamondoid derivatives |
US7795468B2 (en) * | 2001-01-19 | 2010-09-14 | Chevron U.S.A. Inc. | Functionalized higher diamondoids |
US7309476B2 (en) * | 2002-07-18 | 2007-12-18 | Chevron U.S.A. Inc. | Diamondoid-based components in nanoscale construction |
US7049374B2 (en) | 2002-07-18 | 2006-05-23 | Chevron U.S.A. Inc. | Heterodiamondoids |
US7173160B2 (en) * | 2002-07-18 | 2007-02-06 | Chevron U.S.A. Inc. | Processes for concentrating higher diamondoids |
US7488565B2 (en) * | 2003-10-01 | 2009-02-10 | Chevron U.S.A. Inc. | Photoresist compositions comprising diamondoid derivatives |
US7402716B2 (en) * | 2003-12-31 | 2008-07-22 | Chevron U.S.A. Inc. | Hybrid cubic/hexagonal diamondoids |
US20070037909A1 (en) * | 2005-08-10 | 2007-02-15 | Chevron U.S.A. Inc. | Diamondoid-based nucleating agents for thermoplastics |
US20070251446A1 (en) * | 2006-03-24 | 2007-11-01 | Chevron U.S.A. Inc. | Chemically attached diamondoids for CVD diamond film nucleation |
US8062512B2 (en) * | 2006-10-06 | 2011-11-22 | Vary Petrochem, Llc | Processes for bitumen separation |
US7758746B2 (en) | 2006-10-06 | 2010-07-20 | Vary Petrochem, Llc | Separating compositions and methods of use |
EA015626B1 (ru) * | 2006-10-06 | 2011-10-31 | ВЭЙРИ ПЕТРОКЕМ, ЭлЭлСи | Разделяющие композиции и способы их применения |
US8367166B2 (en) * | 2008-10-31 | 2013-02-05 | Chevron U.S.A. Inc. | Synthesis of higher diamondoids |
CN102101817B (zh) * | 2009-12-18 | 2013-04-24 | 中国石油天然气股份有限公司 | 石油和烃源岩中低级金刚烷类化合物的分离和富集方法 |
JPWO2011099351A1 (ja) * | 2010-02-12 | 2013-06-13 | 国立大学法人 東京大学 | ダイヤモンドイドの合成方法及びダイヤモンドイド |
WO2012096710A2 (en) * | 2011-01-14 | 2012-07-19 | Exxonmobil Upstream Research Company | System and method for performing geochronology |
CN102768256B (zh) * | 2012-07-23 | 2014-06-04 | 中国石油天然气股份有限公司 | 用全二维气相色谱定量石油样品中金刚烷类化合物的方法 |
CN111107782B (zh) | 2017-09-21 | 2023-12-12 | 威里利生命科学有限责任公司 | 具有可移动的光阑的视网膜相机 |
CN111635289B (zh) * | 2020-04-29 | 2022-07-05 | 中国石油天然气股份有限公司 | 一种分离原油中乙基降金刚烷类化合物的方法和系统 |
Family Cites Families (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3457318A (en) | 1967-11-30 | 1969-07-22 | Atlantic Richfield Co | Alkenyl adamantanes |
US3832332A (en) | 1971-10-22 | 1974-08-27 | Sun Research Development | Polyamide polymer of diamino methyl adamantane and dicarboxylic acid |
EP0399851B1 (en) | 1989-05-26 | 1996-11-20 | Mobil Oil Corporation | Purification of hydrocarbonaceous fractions |
US4982049A (en) | 1989-05-26 | 1991-01-01 | Mobil Oil Corp. | Purification of hydrocarbonaceous fractions |
US4952749A (en) | 1989-05-26 | 1990-08-28 | Mobil Oil Corp. | Removal of diamondoid compounds from hydrocarbonaceous fractions |
US4952748A (en) | 1989-05-26 | 1990-08-28 | Mobil Oil Corp. | Purification of hydrocarbonaceous fractions |
US4952757A (en) | 1989-11-15 | 1990-08-28 | Summagraphics Corporation | Low-power electromagnetic digitizer tablet |
US5017734A (en) | 1989-12-11 | 1991-05-21 | Kurt Baum | Ethynyl adamantane derivatives and methods of polymerization thereof |
US5019665A (en) | 1990-04-18 | 1991-05-28 | Mobil Oil Corp. | Shape-selective process for concentrating diamondoid-containing hydrocarbon solvents |
US5245104A (en) | 1990-12-17 | 1993-09-14 | Mobil Oil Corporation | Method and apparatus for producing and separating diamondoid compounds from natural gas streams |
US5461184A (en) | 1991-09-25 | 1995-10-24 | Chevron U.S.A. Inc. | Method for diamondoid extraction using a solvent system |
US5414189A (en) | 1992-08-24 | 1995-05-09 | Mobil Oil Corporation | Isolation of high purity diamondoid fractions and components |
US5268513A (en) | 1992-09-10 | 1993-12-07 | Mobil Oil Corporation | Air hydroxylation of diamondoids |
US5256391A (en) | 1992-09-11 | 1993-10-26 | Mobil Oil Corporation | Method for synthesizing microporous crystalline material |
US5298666A (en) | 1992-09-18 | 1994-03-29 | Mobil Oil Corporation | Synthesis of adamantane-2,4-dione |
US5306851A (en) | 1992-11-23 | 1994-04-26 | Mobil Oil Corporation | High viscosity index lubricant fluid |
US5347063A (en) | 1993-03-09 | 1994-09-13 | Mobil Oil Corporation | Method for direct arylation of diamondoids |
US5576355A (en) | 1993-06-04 | 1996-11-19 | Mobil Oil Corp. | Diamondoid derivatives for pharmaceutical use |
US5369213A (en) | 1993-06-30 | 1994-11-29 | Mobil Oil Corporation | Oxidative coupling of diamondoids and aromatics |
US5382684A (en) | 1993-07-06 | 1995-01-17 | Mobil Oil Corporation | Nitrogenous 1,3-substituted adamantanes |
US5334228A (en) * | 1993-10-18 | 1994-08-02 | Mobil Oil Corporation | Deposit control additives and fuel compositions containing the same |
US5400427A (en) | 1993-10-18 | 1995-03-21 | Mobil Oil Corporation | Fiber optic cable and viscous filler material |
US5397488A (en) | 1993-12-09 | 1995-03-14 | Mobil Oil Corporation | Oxidatively stable esters derived from diamondoids totally hydroxylated at the bridgeheads |
US5430193A (en) | 1994-04-22 | 1995-07-04 | Mobil Oil Corporation | Synthesis of 4-hydroxy-2-adamantanes and related compounds |
US5394733A (en) | 1994-06-24 | 1995-03-07 | Mobil Oil Corporation | Quantitative pyrolysis-gas chromatography using diamondoid compounds |
US5498812A (en) | 1994-08-04 | 1996-03-12 | Mobil Oil Corporation | Two-stage process for producing diamondoid hydrocarbons |
WO1998052902A1 (fr) | 1997-05-23 | 1998-11-26 | Daicel Chemical Industries, Ltd. | Derives polymerisables de l'adamantane et leur procede de production |
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2001
- 2001-12-12 US US10/017,821 patent/US6844477B2/en not_active Expired - Fee Related
- 2001-12-12 US US10/012,336 patent/US6743290B2/en not_active Expired - Fee Related
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2002
- 2002-01-09 MY MYPI20020072A patent/MY143730A/en unknown
- 2002-01-15 AR ARP020100119A patent/AR035529A1/es not_active Application Discontinuation
- 2002-01-15 AR ARP020100120A patent/AR032499A1/es not_active Application Discontinuation
- 2002-01-17 JP JP2002593285A patent/JP2005503352A/ja active Pending
- 2002-01-17 AT AT02756078T patent/ATE438590T1/de not_active IP Right Cessation
- 2002-01-17 NZ NZ525260A patent/NZ525260A/en unknown
- 2002-01-17 WO PCT/US2002/000508 patent/WO2002057203A1/en active IP Right Grant
- 2002-01-17 PL PL02369175A patent/PL369175A1/xx not_active Application Discontinuation
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- 2002-01-17 MX MXPA03006377A patent/MXPA03006377A/es active IP Right Grant
- 2002-01-17 DE DE60233221T patent/DE60233221D1/de not_active Expired - Lifetime
- 2002-01-17 AU AU2002321993A patent/AU2002321993B2/en not_active Ceased
- 2002-01-17 WO PCT/US2002/004549 patent/WO2002096804A2/en active IP Right Grant
- 2002-01-17 CZ CZ20031977A patent/CZ20031977A3/cs unknown
- 2002-01-17 RU RU2003125362/15A patent/RU2307822C2/ru not_active IP Right Cessation
- 2002-01-17 CA CA002435407A patent/CA2435407A1/en not_active Abandoned
- 2002-01-17 WO PCT/US2002/000505 patent/WO2002057202A1/en active Application Filing
- 2002-01-17 BR BR0206531-2A patent/BR0206531A/pt not_active IP Right Cessation
- 2002-01-17 CN CNB02803774XA patent/CN1286784C/zh not_active Expired - Fee Related
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- 2002-01-17 KR KR10-2003-7009162A patent/KR20040004490A/ko active IP Right Grant
- 2002-01-18 TW TW091100766A patent/TWI235743B/zh not_active IP Right Cessation
- 2002-01-18 TW TW091100765A patent/TWI302527B/zh active
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2003
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2004
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