WO2024062563A1 - Dispositif optique d'éclairage et dispositif d'inspection - Google Patents

Dispositif optique d'éclairage et dispositif d'inspection Download PDF

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Publication number
WO2024062563A1
WO2024062563A1 PCT/JP2022/035197 JP2022035197W WO2024062563A1 WO 2024062563 A1 WO2024062563 A1 WO 2024062563A1 JP 2022035197 W JP2022035197 W JP 2022035197W WO 2024062563 A1 WO2024062563 A1 WO 2024062563A1
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Prior art keywords
optical system
lens
condensing optical
lenses
light
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PCT/JP2022/035197
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English (en)
Japanese (ja)
Inventor
公則 田村
明宏 岩松
俊一 松本
Original Assignee
株式会社日立ハイテク
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Priority to PCT/JP2022/035197 priority Critical patent/WO2024062563A1/fr
Publication of WO2024062563A1 publication Critical patent/WO2024062563A1/fr

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for

Definitions

  • the present invention relates to an illumination optical device and an inspection device.
  • the illumination optical system and substrate inspection device are used to detect foreign objects on the object to be inspected by irradiating the surface of the object with light and detecting the reflected or scattered light from the object.
  • Inspection for defects can be performed using an inspection device.
  • Patent Document 1 addresses the problem of wanting to flexibly change the beam spot diameter in the longitudinal direction according to inspection conditions and stage operation while maintaining the focus of the beam spot. It is disclosed that the beam spot is controlled in the longitudinal direction using a condensing optical system including a cylindrical parabolic mirror and a condensing lens.
  • Patent Document 1 does not take into account beam spot position shift due to environmental temperature changes at all.
  • the present disclosure provides an illumination optical system and an illumination optical system that flexibly changes the beam spot diameter of illumination light according to inspection conditions and stage operation while maintaining highly accurate focusing performance in response to environmental temperature changes.
  • a board inspection device equipped with the same is provided.
  • the present disclosure provides an illumination optical device that expands a luminous flux and focuses it on an object, which includes a light source that emits a luminous flux, and a variable luminous flux diameter unit that enlarges the diameter of the luminous flux from the light source.
  • a condensing optical system that condenses a beam whose diameter has been expanded onto a target object, the variable beam diameter unit includes at least four lenses, and at least one lens of the variable beam diameter unit satisfies the conditions.
  • Formula (1) is satisfied, at least one lens in the variable beam diameter unit other than the lens that satisfies conditional formula (1) satisfies conditional formula (2), and the condensing optical system has at least two at least two lenses satisfy conditional expression (3), at least one lens of the condensing optical system satisfies conditional expression (1), and at least one lens of the condensing optical system satisfies conditional expression (3).
  • lenses other than the lenses satisfying conditional expression (1) satisfy conditional expression (2).
  • dn/dt is the temperature coefficient of refractive index
  • m is the number of lenses included in the condensing optical system
  • f i is the focal length of the i-th lens in the condensing optical system
  • dn i /dt is the condensing optical system.
  • the refractive index temperature coefficient of the i-th lens in the system is the focal length of the condensing optical system
  • MAX_dn i /dt is the maximum absolute value of the refractive index temperature coefficient of the lens included in the condensing optical system. .
  • the technology disclosed herein makes it possible to maintain high-precision focusing performance even when the temperature changes.
  • FIG. 2 is a diagram illustrating a configuration example of an illumination optical system OP1 according to a first embodiment of the present disclosure.
  • FIG. 2 is a diagram illustrating a schematic internal configuration example of a variable beam diameter unit 4 according to the present disclosure.
  • FIG. 3 is a diagram illustrating a schematic configuration example of a condensing optical system 5 according to the first embodiment. 3 is a diagram showing an example of the configuration of a support structure 6.
  • FIG. 1 is a diagram showing an example of a schematic configuration of a board inspection apparatus 100.
  • FIG. It is a figure showing an example of composition of illumination optical system OP1 concerning a 2nd embodiment.
  • 3 is a diagram showing an example of the arrangement of two spherical lenses 25c and 25d in the condensing optical system 25.
  • Increasing the output of the light source based on the increased sensitivity of defect detection, as well as the heat generated by the motors used to drive high-speed rotation stages and other motors used to adjust the amount of light and the optical axis, may cause damage to the vicinity of the illumination optical system (configuration shown in Figure 1). (near the element) changes frequently. However, it is necessary to maintain highly sensitive defect detection even when the temperature changes, and for this purpose, it is extremely important to maintain the focusing performance of the beam spot formed on the wafer.
  • Embodiments of the present disclosure propose a technique that makes it possible to maintain focus performance of a beam spot formed on a wafer. Embodiments of the present invention will be described below based on the accompanying drawings.
  • FIG. 1 is a diagram illustrating a configuration example of an illumination optical system OP1 according to a first embodiment of the present disclosure.
  • the illumination optical system OP1 includes a DUV light source (Deep Ultra Violet light source: wavelength range is 200 to 300 nm) 1, an attenuator 2, a mirror 3, a variable beam diameter unit (expander) 4, and a condensing optical system.
  • the illumination optical system OP1 includes a system 5, a support structure 6, and a control section 8 (the control section 8 may be provided outside the illumination optical system OP1).
  • the DUV light source 1 emits parallel light (which may be called linear light). Note that in FIG. 1, parallel light is schematically shown as a straight line. Further, in this embodiment, the DUV light source 1 is used as a light source, but the present invention is not limited to this, and a light source that emits light of any wavelength can be used.
  • the support structure 6 can fix a group of elements (the attenuator 2, the mirror 3, the variable beam diameter unit 4, the condensing optical system 5, etc.) for guiding the light from the DUV light source 1 to the inspection object 7. It has a structure.
  • the support structure 6 may be composed of a single fixed member or support member, or may be a mechanical structure made up of a plurality of members combined.
  • the control unit 8 changes the position on the optical axis of the cylindrical lenses 5a and 5b of the condensing optical system 5 supported by the support structure 6 (moves on the optical axis) in response to an instruction input by the user. can be done.
  • the light emitted from the DUV light source 1 undergoes light intensity adjustment by the attenuator 2.
  • the light whose quantity has been adjusted is reflected by the mirror 3, its course direction is changed, and it is guided to the beam diameter variable unit 4.
  • the variable beam diameter unit 4 enlarges the beam diameter of the light reflected by the mirror 3 and guides it to the condensing optical system 5 .
  • the condensing optical system 5 condenses the light whose beam diameter has been expanded, and irradiates the condensed light onto the inspection object 7 .
  • the internal configuration of the variable beam diameter unit 4 and the internal configuration of the condensing optical system 5 are devised to maintain focus performance even when the temperature changes.
  • FIG. 2 is a diagram showing a schematic internal configuration example of the variable beam diameter unit 4 according to this embodiment.
  • the variable beam diameter unit 4 includes a positive lens group (at least one positive lens) 4a, a negative lens group (at least one negative lens) 4b, and a positive lens group (consisting of two positive lenses) 4c group. (composed of at least four lenses).
  • a positive lens group 4a is arranged on the DUV light source 1 side, and a positive lens group 4c is arranged on the inspection object 7 side.
  • Parallel light enters the variable beam diameter unit 4, and light emitted therefrom is also parallel light. However, the light is emitted with a diameter of the luminous flux that is enlarged relative to the diameter of the incident luminous flux.
  • the variable beam diameter unit 4 is configured such that any or all of the groups constituting it can operate in the optical axis direction, thereby changing the diameter of the emitted beam.
  • the refractive index becomes higher (lower) due to temperature changes, and the light flux diameter variable unit 4
  • the emitted light beam converges (diverges).
  • the light beam emitted from the variable beam diameter unit 4 needs to be parallel light.
  • Synthetic quartz (dn/dt>0) and fluorite (dn/dt ⁇ 0) can be cited as an example of a combination of materials having refractive index temperature coefficients (dn/dt) of opposite signs. If synthetic quartz (dn/dt > 0) or fluorite (dn/dt ⁇ 0) is used as the material of the lens constituting the variable beam diameter unit 4, it is possible to suppress defocusing when the environmental temperature changes based on the above-mentioned theory. be.
  • the positive lens group 4a and the negative lens group 4b are made of synthetic quartz, and one of the two positive lenses included in the lens group 4c is made of synthetic quartz and the other is made of fluorite. , it becomes possible to suppress the focus fluctuation when the environmental temperature changes as described above. Note that similar effects can be expected when the positive lens group 4a and the negative lens group 4b are made of fluorite, and of the two positive lenses included in the lens group 4c, one is made of quartz and the other is made of fluorite.
  • FIG. 3 is a diagram showing a schematic configuration example of the condensing optical system 5.
  • the condensing optical system 5 includes, in order from the variable beam diameter unit 4 side (light incident side), at least two cylindrical lenses 5a and 5b, two folding mirrors 5c and 5d, and one cylindrical parabolic mirror 5e. Equipped with. Note that depending on the angle at which the light is irradiated onto the inspection object 7, the mirrors 5c and 5d may not be essential components.
  • the parallel light from the variable beam diameter unit 4 is focused onto the inspection object 7 by the cylindrical lenses 5a and 5b and the cylindrical parabolic mirror 5e.
  • What is condensed by the cylindrical lenses 5a and 5b is the light flux in the vertical direction of the paper in FIG.
  • the light beam in the depth direction of the paper is focused onto the inspection object 7 by the cylindrical parabolic mirror 5e.
  • each character or character expression is m: number of lenses included in the condensing optical system; f i : focal length of the i-th lens of the condensing optical system; dn i /dt: refractive index temperature coefficient of the i-th lens of the condensing optical system; f: focal length of condensing optical system; MAX_dn i /dt: maximum absolute value of refractive index temperature coefficient in the lens included in the condensing optical system; It shows.
  • the right side of equation (3) indicates the amount of focus variation if the condensing optical system 5 were composed of lenses made of a single material. If the left side of equation (3) is smaller than the right side of equation (3), it means that the optical system is capable of suppressing focus fluctuations due to temperature changes.
  • the two cylindrical lenses 5a and 5b are made of the same glass material (same optical glass) and have different signs of power (refractive power), then formula (3) can be satisfied. This makes it possible to realize an optical system with small focus fluctuations.
  • the power of the cylindrical lens 5a is positive (convex lens)
  • the power of the cylindrical lens 5b is negative (concave lens)
  • both glass materials are fluorite
  • the environmental temperature rises the refractive power of the cylindrical lens 5a weakens due to the temperature rise, but the refractive power of the cylindrical lens 5b strengthens, making it possible to cancel (at least partially offset) the overall refractive power fluctuations. As a result, it becomes possible to suppress focus fluctuations on the inspection object 7.
  • the focal length of each lens can be optimized by moving the cylindrical lenses 5a and/or 5b on the optical axis.
  • a camera (not shown) acquires an image of the beam spot size on the inspection object (for example, a wafer) 7, and the user confirms it.
  • the control unit 8 moves the cylindrical lenses 5a and/or 5b on the optical axis, so that the beam spot size can be adjusted as appropriate.
  • a low expansion metal such as Invar
  • focus performance during temperature changes is improved. can be further increased.
  • the focal lengths of the cylindrical lenses 5a and 5b and the cylindrical parabolic mirror 5e are each optimized so that the light is focused on the inspection object 7.
  • the cylindrical lenses 5a and 5b and the cylindrical parabolic mirror 5e have different focal lengths, so that the beam spot diameter on the inspection object 7 is linear (linear: the beam spot shape is such that the major axis is the minor axis). It is constructed so that it can be formed into a very large elliptical shape (compared to the elliptical shape).
  • the linear shape (elliptical shape) is used to increase the throughput by increasing the scanning width when performing beam scanning while rotating or moving the stage (not shown) on which the inspection object 7 (wafer) is placed. This is to do so.
  • the combined focal length of the cylindrical lenses 5a and 5b is fA
  • the focal length of the cylindrical parabolic mirror 5e is fB
  • the angle of elevation of light beam incidence on the inspection object 7 is ⁇
  • the wavelength of the DUV light source 1 is ⁇
  • the condensing optical system 5 is If the diameter of the incident beam (luminous flux) in the longitudinal direction is DA, and the diameter of the beam in the lateral direction is DB, then the beam diameter ⁇ A formed in the horizontal direction on the inspection object 7 in FIG. 3 and the beam diameter formed in the depth direction.
  • the relationship between the beam diameter ⁇ B and the beam diameter ⁇ B is expressed by the following equations (4) and (5).
  • ⁇ A 1.22*fA* ⁇ /(DA*sin ⁇ )... (4)
  • ⁇ B 1.22*fB* ⁇ /(DA*sin ⁇ )... (5)
  • the beam spot diameter and beam aspect ratio are adjusted by adjusting the beam diameter (DA and DB) incident on the condensing optical system 5, the combined focal length of the cylindrical lenses 5a and 5b, and the focal length of the cylindrical parabolic mirror 5e. It can be seen that control is possible by doing this. Note that in this embodiment, the combined focal length of the cylindrical lenses 5a and 5b is longer than the focal length of the cylindrical parabolic mirror 5e, so on the inspection object 7, the long axis is in the left-right direction in the plane of the paper, and the long axis is short in the depth direction in the plane of the paper. An axis is formed.
  • the control unit 8 controls the lens drive unit (the lens drive unit itself is not shown) that moves the cylindrical lenses 5a and 5b in response to instructions input by the user, thereby moving the cylindrical lenses.
  • the position of 5a and/or 5b on the optical axis can be moved.
  • the configuration shown in FIG. 3 makes it possible to realize an illumination optical system OP1 that controls the aspect ratio of the beam spot and suppresses focus deviations caused by changes in the environmental temperature.
  • FIG. 4 is a diagram showing a configuration example of the support structure 6.
  • the support structure 6 can be configured by, for example, a base 6a and element support members 6b_1 to 6b_4.
  • the support structure 6 may be configured by fixing a plurality of elements on the same base 6a, or may be configured by a plurality of bases.
  • the element supporting members 6b_1 to 6b_4 may be formed of a single member, or may be a mechanical structure formed by combining a plurality of members.
  • FIG. 5 is a diagram showing a schematic configuration example of the board inspection apparatus 100.
  • the substrate inspection apparatus 100 shown in FIG. 5 is equipped with the illumination optical system OP1 according to the first embodiment, it may be equipped with an illumination optical system OP2 according to the second embodiment described later.
  • the substrate inspection apparatus 100 includes an illumination optical system OP1, a stage 111 on which the inspection object 7 is placed, a light receiving lens 112, a light receiving element 113, and an analysis unit 114.
  • the inspection object 7 is fixed on a stage 111.
  • This stage 111 is rotatable around a rotation axis in the vertical direction in the plane of FIG. 5, and can also be translated in a direction perpendicular to the rotation axis (for example, in the horizontal direction in the plane of FIG. 5).
  • the longitudinal direction of the linear beam spot formed by the illumination optical system OP1 also coincides with this.
  • the inspection object 7 has a disk shape (for example, a wafer), and can be rotated and translated in parallel by the stage 111. This makes it possible to irradiate the entire surface of the disk (inspection object 7) with light.
  • the light-receiving lens 112 condenses a portion of the diffusely reflected light that is generated when a defect or foreign object on the inspection object 7 is hit by light.
  • the light receiving element 113 converts the light collected by the light receiving lens 112 into an electrical signal.
  • Analysis unit 114 receives the electrical signal from light receiving element 113 and analyzes it.
  • the analysis unit 114 also outputs the analysis result as a test result, for example, on a display screen of a display device (not shown).
  • the analysis unit 114 may include a computer.
  • the board inspection apparatus 100 inspects the inspection object 7 (foreign object inspection, defect inspection).
  • the beam outputted by the illumination optical system OP1 is highly accurately focused in a linear manner, so that inspection can be performed with higher accuracy.
  • the analysis unit 114 may also have a function of appropriately arranging optical elements (for example, a condensing optical system or a variable beam diameter unit) placed on the optical path (the control unit in FIG. (It may also have the functions of 8). This function may be performed in response to user input of the board inspection apparatus 100, or may be performed automatically by the analysis unit 114.
  • the analysis unit 114 automatically controls the arrangement of optical elements, the optical elements may be selected so that the electrical signal obtained by the light receiving element 113 is in the optimal state for the target inspection. good.
  • FIG. 5 shows one light receiving lens 112 and one light receiving element 113, a plurality of either or both of these may be provided.
  • FIG. 6 is a diagram showing a configuration example of the illumination optical system OP1 according to the second embodiment.
  • the condensing optical system 5 is composed of an axially symmetrical spherical lens instead of a cylindrical lens.
  • the light is focused to the left and right of the page by the cylindrical lenses 5a and 5b, and to the depth of the page by the cylindrical parabolic mirror 5e.
  • the aspect ratio of the beam spot is controlled by providing a difference in focal length between the cylindrical lenses 5a and 5b and the cylindrical parabolic mirror 5e.
  • the illumination optical system OP2 includes a DUV light source (Deep Ultra Violet light source) 21, an attenuator 22, a mirror 23, and an anamorphic prism 28. , a variable beam diameter unit (expander) 24, a condensing optical system 25, a support structure 26, and a control section 29 (the control section 29 may be provided outside the illumination optical system OP2). Be prepared.
  • the condensing optical system 25 instead of the cylindrical lenses 5a and 5b according to the first embodiment, axially symmetrical spherical lenses 25c and 25d are responsible for image formation in the left-right direction and the depth direction in the drawing. ing.
  • an anamorphic prism 28 is provided on the optical path to control the aspect ratio of the beam spot.
  • the condensing optical system 25 includes, in order when viewed from the DUV light source 21 side, two mirrors 25a and 25b and two spherical lenses 25c and 25d. Even when the condensing optical system 25 is configured with an axially symmetrical spherical lens, it is possible to suppress out of focus due to changes in environmental temperature by satisfying the condition shown in equation (3) above.
  • FIG. 7 is a diagram showing an example of the arrangement of the two spherical lenses 25c and 25d in the condensing optical system 25.
  • the condensing optical system 25 when one of the two spherical lenses 25c and 25d is made of synthetic quartz and the other is made of fluorite, the condition shown in equation (3) can be satisfied. Therefore, similarly to the first embodiment, it is possible to realize a condensing optical system 25 that suppresses focus fluctuations.
  • the spherical lens 25c is made of synthetic quartz and the spherical lens 25d is made of fluorite, and the environmental temperature rises, the refractive power of 5c will become stronger but the refractive power of 5d will weaken as the temperature rises, resulting in an overall change in refractive power. It becomes possible to cancel (or at least partially offset) As a result, it becomes possible to suppress focus fluctuations on the inspection object 7.
  • the circular light beam from the DUV light source 21 becomes elliptical after passing through the anamorphic prism 28.
  • the longitudinal direction of the elliptical beam emitted from the anamorphic prism 28 corresponds to the depth direction of the paper
  • the lateral direction corresponds to the left-right direction of the paper.
  • the pupil diameter D of the beam before entering the condensing optical system 25 is smaller in the horizontal direction (DB) of the drawing than in the depth direction (DA) of the drawing. Since the beam diameters ⁇ A and ⁇ B on the inspection object 27 are as shown in equations (4) and (5) above, a linear (elliptical) beam spot is formed on the inspection object 27.
  • the length of the beam spot corresponds to the horizontal direction of the paper
  • the short length of the beam spot corresponds to the depth direction of the paper.
  • variable beam diameter unit 24 disposed downstream of the anamorphic prism 28 an internal optical element moves in the optical axis direction under the control of the control unit 29 (a lens drive unit (not shown) is controlled by the control unit 29). (by moving an optical element in response to a signal), it is possible to change the size of the elliptical beam.
  • the focus can be varied by optimizing the focal length of each of the spherical lenses 25c and 25d so that the left side of equation (3) becomes extremely small (so as to cancel out the difference in the temperature coefficient of refraction between synthetic quartz and fluorite). It is possible to enhance the suppressive effect.
  • the condensing optical system 25 has two lenses, but the number of lenses is not limited as long as it satisfies equation (3).
  • the distance between two lenses is the distance between the optical elements that is the widest among the optical element intervals included in the condensing optical system 5 or 25 (in the condensing optical system 5, the distance between the cylindrical lens 5a and the cylindrical parabolic mirror 5e).
  • DR_max is set, focus fluctuation can be suppressed more efficiently by setting DR to less than 1/10 of DR_max (DR ⁇ DR_max/10).
  • f_max indicates the focal length of the lens with the longest focal length among the target lenses
  • f_min indicates the focal length of the lens with the shortest focal length among the target lenses.
  • the illumination optical device includes a variable beam diameter unit (expander) 4 or 24 and a condensing optical system 5 or 25.
  • the variable beam diameter unit at least one lens is configured to satisfy dn/dt ⁇ 0 (conditional expression (1)), and at least one other lens is configured to satisfy dn/dt>0 (conditional expression (2)). be done.
  • At least two lenses in the condensing optical system are configured to satisfy conditional expression (3).
  • at least one lens in the condensing optical system is configured to satisfy conditional expression (1), and at least one other lens is configured to satisfy conditional expression (2).
  • dn/dt is the temperature coefficient of refractive index
  • m is the number of lenses included in the condensing optical system
  • f i is the focal length of the i-th lens in the condensing optical system
  • dn i /dt is the condensing optical system.
  • the refractive index temperature coefficient of the i-th lens in the system is the focal length of the condensing optical system
  • MAX_dn i /dt is the maximum absolute value of the refractive index temperature coefficient of the lens included in the condensing optical system.
  • a DUV light source that emits linear light and has a wavelength range of 200 nm to 300 nm can be used.
  • Using linear light makes it easier to control the aspect ratio of the beam spot of the light irradiated onto the inspection target. Furthermore, by using beam spots with different aspect ratios, it is possible to increase the throughput when inspecting an object to be inspected.
  • DR is the interval between two lenses included in the condensing optical system
  • DR_max is the interval between the optical elements that is the widest among the optical element intervals included in the condensing optical system
  • the condensing optical system 5 or 25 is It is preferable to configure so that DR ⁇ DR_max/10 is satisfied. By doing so, it becomes possible to flexibly change the beam spot diameter on the object to be inspected according to the inspection conditions and stage operation.
  • the two lenses included in the condensing optical system 5 according to the first embodiment are cylindrical lenses arranged with their power directions facing each other.
  • the two lenses included in the condensing optical system 25 according to the second embodiment are spherical lenses arranged with their power directions facing each other.
  • ⁇ 50mm It can be configured as follows. By doing so, it becomes possible to flexibly change the beam spot diameter on the object to be inspected according to the inspection conditions and stage operation.
  • the illumination optical device includes a control section 29 that moves at least one lens included in the variable beam diameter unit 24 in the optical axis direction.
  • the control unit 29 controls the beam diameter by expanding or reducing the diameter of the beam by moving at least one lens of the variable beam diameter unit 24 in the optical axis direction. By doing so, it becomes possible to flexibly adjust the beam spot diameter.
  • the support structure 6 holds at least the variable beam diameter unit 4 or 24 and the condensing optical system 5 or 25.
  • the support structure can be constructed from a low expansion metal.
  • each optical element can be stably arranged in the illumination optical device, so that highly accurate focus control can be achieved without being affected by external factors other than environmental temperature changes. Can be done. Further, by configuring the support structure 6 using a low expansion metal, focusing performance during temperature changes can be further improved.
  • the illumination optical device variably controls the focal length of the condensing optical system 5 by moving the optical elements of the condensing optical system 5 on the optical axis, so that the object is irradiated.
  • the controller 8 includes a control unit 8 that adjusts the aspect ratio of the beam spot (provided that the configuration requirement (i) above is provided).
  • an optical element that changes the aspect ratio of the beam spot irradiated onto the inspection object. This makes it possible to easily generate a linear (elliptical) beam.
  • the illumination optical device according to this embodiment can be applied to a substrate inspection device.
  • focus control can be performed with high precision without being affected by environmental temperature changes, so that inspection of the substrate (object to be inspected) can be performed with high precision.

Abstract

Dans les dispositifs d'inspection des substrats, la taille des défauts et des corps étrangers à détecter diminue, et l'utilisation d'une source de lumière laser ultraviolette profonde à haute puissance pour former un point de faisceau avec une grande précision augmente la sensibilité de la détection. Il est donc nécessaire d'améliorer la stabilité de la taille et de la position d'un point de faisceau. En outre, il est important que les variations de la position de mise au point ne soient pas causées par un changement de la température ambiante pendant le fonctionnement de l'appareil. À cet effet, l'invention concerne un système optique d'éclairage qui modifie de manière flexible le diamètre du point de faisceau de la lumière d'éclairage en fonction des conditions d'inspection et des mouvements de la platine, tout en conservant une performance de mise au point de haute précision qui permet de gérer les changements de température ambiante. Plus précisément, la suppression des variations de la position du foyer est rendue possible par l'optimisation de la disposition et des matériaux d'un élément optique d'un système optique transparent constituant un dispositif (voir fig. 1).
PCT/JP2022/035197 2022-09-21 2022-09-21 Dispositif optique d'éclairage et dispositif d'inspection WO2024062563A1 (fr)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013011547A1 (fr) * 2011-07-15 2013-01-24 株式会社オーク製作所 Système optique de projection et dispositif d'exposition de projection
JP2019174848A (ja) * 2019-07-11 2019-10-10 株式会社タムロン 撮像レンズおよび撮像装置
JP2019199397A (ja) * 2018-05-10 2019-11-21 Hoya株式会社 光学ガラスおよび光学素子
JP2020122992A (ja) * 2017-04-26 2020-08-13 京セラ株式会社 撮像レンズ

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013011547A1 (fr) * 2011-07-15 2013-01-24 株式会社オーク製作所 Système optique de projection et dispositif d'exposition de projection
JP2020122992A (ja) * 2017-04-26 2020-08-13 京セラ株式会社 撮像レンズ
JP2019199397A (ja) * 2018-05-10 2019-11-21 Hoya株式会社 光学ガラスおよび光学素子
JP2019174848A (ja) * 2019-07-11 2019-10-10 株式会社タムロン 撮像レンズおよび撮像装置

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