WO2023274596A1 - Substratträger - Google Patents
Substratträger Download PDFInfo
- Publication number
- WO2023274596A1 WO2023274596A1 PCT/EP2022/059201 EP2022059201W WO2023274596A1 WO 2023274596 A1 WO2023274596 A1 WO 2023274596A1 EP 2022059201 W EP2022059201 W EP 2022059201W WO 2023274596 A1 WO2023274596 A1 WO 2023274596A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- openings
- along
- receiving
- substrate carrier
- support plate
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 66
- 239000002184 metal Substances 0.000 claims description 2
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 238000005516 engineering process Methods 0.000 claims 1
- 239000000463 material Substances 0.000 description 11
- 238000000576 coating method Methods 0.000 description 10
- 239000000969 carrier Substances 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000109 continuous material Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68771—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by supporting more than one semiconductor substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67754—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a batch of workpieces
Definitions
- the present invention relates to a substrate carrier for receiving and transporting a plurality of substrates.
- substrate carriers are used to hold and transport a number of substrates, to bring the substrates into corresponding processing systems, to carry them during the substrate treatment and/or to transport them between different units of such processing systems.
- substrate carriers are used in the coating of substrates or wafers.
- the substrate carriers are used in double-sided coating processes. For example, in double-sided coating processes, it is important that the substrates are stored securely centered in their "nests" with regard to the respective coating openings, while at the same time the edge coverage resulting from storage should be minimized. Furthermore, the substrates should be able to be inserted and removed in a simple manner without the substrates being able to be damaged in the process. Furthermore, there can be strong temperature variations in different processes, since the substrates are subjected to different heating and cooling steps, for example, in the course of a coating process. The substrate carriers can become deformed, which can lead to an undefined support of the substrate in the nest and a resulting defective coating.
- the object of the present invention is to provide improved substrate carriers against the background of the requirements discussed above.
- the present invention relates to a substrate carrier for receiving and transporting a plurality of substrates, the substrate carrier having a frame with two each other opposite running rails and at least two further elongate frame members and one or more support plates which are fixed to the frame.
- the running rails of the substrate carrier frame are used to transport the substrate carrier in a corresponding transport device which can engage with the running rails.
- the two running rails of the substrate carrier frame extend along a first direction, which corresponds to the direction of movement during transport when the substrate carrier is used in a corresponding process.
- the at least two elongate frame members extend along a second direction perpendicular to the first direction.
- the support sheets are used to hold a plurality of substrates and define a first plane (the first and second directions are typically parallel to this first plane).
- Each of the one or more support sheets has a plurality of receiving openings (forming the "nests" discussed above) each for receiving a substrate.
- a supporting sheet metal web is formed in each case between adjacent receiving openings in the first direction, which web extends along the second direction.
- Each of the support plates also has at least two elongate openings, preferably slots, which each extend essentially perpendicular to the plane through the support plate and essentially along the first direction, so that between each two adjacent openings in the first direction of the at least two openings a connecting element is formed. In this case, there is an offset along the first direction between the supporting plate webs extending along the second direction and the connecting element.
- the invention is based, among other things, on the idea of using the at least two elongated openings, which extend along the first direction, to compensate for different thermal expansion of the support plate and frame element during process-related temperature fluctuations. Since, for example, during a coating process, the support plate usually heats up more than the frame elements, it will expand more in the second direction than the corresponding elongate frame elements. This expansion can then take place in the area of the elongated openings, which in this way compensate for the expansion without distortions occurring within the support plate.
- the specific shape of the elongated openings is not relevant if sufficient free space is provided for the expansion of the support plate material. It it is also not critical that the elongated openings extend exactly along the first direction. Rather, they can also assume an angle of, for example, 5° and up to 10° with the first direction.
- the elongate openings also do not have to extend through the support plate exactly perpendicular to the plane. It is only important that there are through openings so that the support plate can expand over the entire thickness. However, the elongated openings could also be inclined with respect to the perpendicular to the first plane and, for example, assume an angle with the perpendicular of up to 10°. However, the elongate openings should preferably be optically dense, so that no coating material can pass through these elongate openings, for example during a coating process.
- the elongated openings cannot extend over the entire length of the wing, since otherwise they would no longer be connected to the rails. It is therefore necessary between two adjacent openings of the at least two openings in the first direction, a connecting element that connects the support plate beyond the openings with the running rail. Since the possibility of expansion of the support plate material discussed above is not guaranteed in the area of this connecting element, it is provided according to the invention that there is an offset along the first direction between the support plate webs extending along the second direction and the connecting element. This ensures that the connecting element is located precisely where there is hardly any support plate material due to the receiving openings, whereas an elongated opening is provided where the support plate webs are located and therefore a lot of expanding material is present.
- the offset is preferably at least 20%, more preferably at least 30% and particularly preferably at least 40% of this width of the receiving openings.
- the connecting element should be arranged centrally with regard to the width of the receiving opening.
- the connecting elements should be dimensioned in such a way that on the one hand they ensure sufficient stability of the support plate and on the other hand the expansion of the support plate material not affect.
- the connecting element has a width along the first direction of at least 10 mm, preferably at least 12 mm and particularly preferably at least 14 mm.
- the connecting element has a width along the first direction of at most 20 mm, more preferably at most 18 mm and particularly preferably at most 16 mm.
- the elongate openings each have a width along the second direction of at least 0.5 mm, more preferably at least 0.7 mm and most preferably at least 0.9 mm. Furthermore, the elongated openings each have a width along the second direction of preferably at most 5 mm, more preferably at most 3 mm, and particularly preferably at most 1.5 mm.
- the distance along the second direction between each of the elongate openings and the receiving openings adjacent in the second direction is at least 10 mm, more preferably at least 12 mm and most preferably at least 14 mm.
- the tray webs have a width and the spacing along the second direction between each of the elongated openings and the second direction adjacent receiving openings is preferably at least 70%, more preferably at least 80%, and most preferably at least 90% of the width of the tray webs.
- the elongate openings form an angle with the vertical to the first plane which is between 0° and 10°, more preferably between 2° and 8°.
- the elongated openings each extend to the edge of the support plate on one side. If three or more openings are provided per support plate, this obviously only affects the edge openings.
- the support plates are connected to the running rails, preferably in a fixed manner, for example screwed to them. Furthermore, the support plates are preferably movably connected to the elongate frame elements.
- the elongate frame elements each have several Receiving openings for receiving corresponding fasteners of the support plates.
- the receiving openings preferably allow play in the connecting elements of the support plate along the second direction in order to tolerate the expansion of the support plates along the second direction.
- the receiving openings have a first extent along the second direction and the connecting elements of the support plate have a second extent along the second direction, with the ratio between the second and first extent preferably being less than 0.95, more preferably less than 0.9 and particularly is preferably less than 0.85.
- at least one of the elongate openings extends through one of the connecting elements.
- FIG. 1 a perspective view of a substrate carrier according to a preferred embodiment of the present invention
- Figure 2 a "nest" for a substrate in a substrate carrier according to Figure 1;
- Figure 3 a perspective detailed view of the substrate carrier according to Figure 1.
- FIG. 1 shows a perspective view of a substrate carrier 1 according to a preferred embodiment of the present invention.
- the substrate carrier 1 serves to receive and transport a plurality of substrates, which can be received in corresponding receiving openings 8 .
- receive openings 8 In the illustrated embodiment, 64 such receiving openings 8 are present.
- more or fewer receiving openings can also be provided in a square, rectangular or other arrangement.
- the substrate carrier 1 has a frame with two running rails 2 lying opposite one another and two further elongate frame elements 3 lying opposite one another.
- four support plates 4 are provided, which are attached to the frame.
- Further elongated frame elements 3a are provided between each two adjacent such support plates 4, so that in the preferred embodiment shown each support plate is framed and held by the two opposite running rails 2 on the one hand and two further elongated frame elements 3, 3a on the other.
- Support plates can be provided. If only a single support plate is present, the central frame elements 3a can be dispensed with.
- the two running rails 2 which can be seen particularly well in FIG. 3, are used to transport the substrate carrier 1 in a corresponding transport device and are constructed and designed in such a way that they can engage with corresponding elements of the transport device.
- the support plates 4 are each fixedly connected to the two running rails 2 . In the embodiment shown, it is fastened by means of screws 13 (cf. FIG. 3).
- the two running rails 2 extend along a first direction, which is indicated by the arrow 6 in FIG.
- the two or more further elongate frame elements 3 and 3a extend along a second direction perpendicular to the first direction 6, which is indicated by an arrow 7 in FIG.
- the support plates define a first plane, which can be characterized, for example, by the surface of the support plates or by the area in which the substrates are held.
- each of the four support plates 4 has 16 receiving openings 8 for receiving one substrate each (i.e. for receiving a total of 16 substrates), so that a support plate web 9 is formed between two receiving openings 8 that are adjacent in the first direction 6. which extends along the second direction 7. Due to the symmetrical arrangement of the receiving openings 8 , the individual support plate webs 9 form a continuous web that extends essentially over the entire width of the substrate carrier 1 , one such web per support plate 4 being present. Of course, with a different arrangement of the receiving openings 8 in the support plate 4 in three or more rows, two or more webs would be formed accordingly. Furthermore, corresponding support plate webs are also formed between two receiving openings 8 that are adjacent in the second direction 7, but these webs are not important for the following discussion.
- the elongate frame elements 3, 3a are more solid than the support plate webs 9.
- the elongate frame elements 3 and 3a can be tubular elements, as can be seen in FIG.
- the frame elements can also consist of one be made of a different material than the support plates. If the substrate carrier is now heated up together with the substrates located on it, for example during a coating process, the support plate webs 9 will heat up more quickly than the solid frame elements 3, 3a, so that the support plate webs 9 will expand more during this heating process than the corresponding frame elements 3 and 3a.
- each support plate 4 according to the invention, which in the case of the preferred embodiment shown here are realized in the form of two elongated slots 10a and 10b (cf. FIG. 3). In the illustrated embodiment, these two slots 10a and 10b extend through the support plate perpendicular to the first plane defined by the support plate 4 and along the first direction 6.
- the slots 10a and 10b also run obliquely through the material of the support plate 4 so that they assume an angle with the perpendicular to the first plane and/or run at an incline with respect to the first direction 6 .
- the connecting element 11 is preferably arranged centrally with regard to the width of the receiving opening 8, as illustrated in FIG. However, this is not necessary as long as the offset V is large enough so that the web material can deviate into the slot opening.
- the offset is defined as the distance between the respective centers of the support plate web 9 and the connecting element 11, the offset should correspond to at least half the sum of the support plate web width and the connecting element width. However, the offset is preferably at least 20% of the width of the receiving openings 8 along the first direction 6.
- two slots 10a and 10b are provided on both sides of each support plate 4 (see FIG. 1).
- the slits could be provided on only one side and/or there could be more than two slits per side.
- a connecting element 11 can be present between adjacent slots 10 for each row of receiving openings 8, so that three slots with two connecting elements could also be useful in the embodiment shown.
- the slots at the edges on one side each extend to the edge of the support plate 4, as can be seen in FIG.
- the elongate frame elements 3 and 3a can each have a plurality of receiving openings 12 for receiving corresponding connecting elements of the support plates 4.
- the tubes 3 each have a plurality of elongated slots 12 for receiving corresponding projections on the support plates 4, as can be seen in FIGS.
- the receiving openings 12 allow a play of the connecting elements of the support plate 4 along the second direction 7 in order to compensate for a different thermal expansion in this way.
- at least one of the elongate openings or slots 10a and 10b extends through one of the connecting elements, as illustrated in FIG.
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Packaging Frangible Articles (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP22721662.9A EP4292126A1 (de) | 2021-06-28 | 2022-04-07 | Substratträger |
CN202280044510.1A CN117561593A (zh) | 2021-06-28 | 2022-04-07 | 基板载体 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102021003330.2 | 2021-06-28 | ||
DE102021003330.2A DE102021003330B3 (de) | 2021-06-28 | 2021-06-28 | Substratträger |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2023274596A1 true WO2023274596A1 (de) | 2023-01-05 |
Family
ID=81585407
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2022/059201 WO2023274596A1 (de) | 2021-06-28 | 2022-04-07 | Substratträger |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP4292126A1 (de) |
CN (1) | CN117561593A (de) |
DE (1) | DE102021003330B3 (de) |
WO (1) | WO2023274596A1 (de) |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050214398A1 (en) | 2003-05-14 | 2005-09-29 | Molecular Imprints, Inc | Assembly and method for transferring imprint lithography templates |
US20070241454A1 (en) | 2006-04-13 | 2007-10-18 | Jun-Ming Chen | Capture ring |
DE202009001817U1 (de) * | 2009-01-31 | 2009-06-04 | Roth & Rau Ag | Substratträger zur Halterung einer Vielzahl von Solarzellenwafern |
US20110000882A1 (en) | 2009-07-01 | 2011-01-06 | Nordson Corporation | Apparatus and methods for supporting workpieces during plasma processing |
DE102011017566A1 (de) * | 2010-04-22 | 2011-12-01 | Von Ardenne Anlagentechnik Gmbh | Substratbehandlungsanlage und Substrathalter dafür |
US20120048186A1 (en) * | 2010-08-27 | 2012-03-01 | Applied Materials Gmbh & Co. Kg | Carrier for a substrate and a method for assembling the same |
US20150170947A1 (en) * | 2012-04-26 | 2015-06-18 | Intevac, Inc. | System and method for bi-facial processing of substrates |
US20160276142A1 (en) * | 2013-11-25 | 2016-09-22 | Applied Materials, Inc. | Substrate carrier for a reduced transmission of thermal energy |
CN206685356U (zh) | 2017-04-28 | 2017-11-28 | 苏州阿特斯阳光电力科技有限公司 | 一种用于板式pecvd设备的石墨框 |
CN207793422U (zh) * | 2017-12-26 | 2018-08-31 | 杭州大和热磁电子有限公司 | 一种可拆卸成膜框架装置 |
WO2021004518A1 (zh) * | 2019-07-11 | 2021-01-14 | 苏州迈正科技有限公司 | 一种复合托盘 |
-
2021
- 2021-06-28 DE DE102021003330.2A patent/DE102021003330B3/de active Active
-
2022
- 2022-04-07 CN CN202280044510.1A patent/CN117561593A/zh active Pending
- 2022-04-07 EP EP22721662.9A patent/EP4292126A1/de active Pending
- 2022-04-07 WO PCT/EP2022/059201 patent/WO2023274596A1/de active Application Filing
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050214398A1 (en) | 2003-05-14 | 2005-09-29 | Molecular Imprints, Inc | Assembly and method for transferring imprint lithography templates |
US20070241454A1 (en) | 2006-04-13 | 2007-10-18 | Jun-Ming Chen | Capture ring |
DE202009001817U1 (de) * | 2009-01-31 | 2009-06-04 | Roth & Rau Ag | Substratträger zur Halterung einer Vielzahl von Solarzellenwafern |
US20110000882A1 (en) | 2009-07-01 | 2011-01-06 | Nordson Corporation | Apparatus and methods for supporting workpieces during plasma processing |
DE102011017566A1 (de) * | 2010-04-22 | 2011-12-01 | Von Ardenne Anlagentechnik Gmbh | Substratbehandlungsanlage und Substrathalter dafür |
US20120048186A1 (en) * | 2010-08-27 | 2012-03-01 | Applied Materials Gmbh & Co. Kg | Carrier for a substrate and a method for assembling the same |
US20150170947A1 (en) * | 2012-04-26 | 2015-06-18 | Intevac, Inc. | System and method for bi-facial processing of substrates |
US20160276142A1 (en) * | 2013-11-25 | 2016-09-22 | Applied Materials, Inc. | Substrate carrier for a reduced transmission of thermal energy |
CN206685356U (zh) | 2017-04-28 | 2017-11-28 | 苏州阿特斯阳光电力科技有限公司 | 一种用于板式pecvd设备的石墨框 |
CN207793422U (zh) * | 2017-12-26 | 2018-08-31 | 杭州大和热磁电子有限公司 | 一种可拆卸成膜框架装置 |
WO2021004518A1 (zh) * | 2019-07-11 | 2021-01-14 | 苏州迈正科技有限公司 | 一种复合托盘 |
Also Published As
Publication number | Publication date |
---|---|
DE102021003330B3 (de) | 2022-09-01 |
EP4292126A1 (de) | 2023-12-20 |
CN117561593A (zh) | 2024-02-13 |
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