WO2023202725A1 - 一体化加工设备 - Google Patents

一体化加工设备 Download PDF

Info

Publication number
WO2023202725A1
WO2023202725A1 PCT/CN2023/099782 CN2023099782W WO2023202725A1 WO 2023202725 A1 WO2023202725 A1 WO 2023202725A1 CN 2023099782 W CN2023099782 W CN 2023099782W WO 2023202725 A1 WO2023202725 A1 WO 2023202725A1
Authority
WO
WIPO (PCT)
Prior art keywords
flow guide
liquid
workpiece
axis
unit
Prior art date
Application number
PCT/CN2023/099782
Other languages
English (en)
French (fr)
Inventor
史继英
刘博瑞
管文萌
Original Assignee
成都博腾实达智能科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 成都博腾实达智能科技有限公司 filed Critical 成都博腾实达智能科技有限公司
Publication of WO2023202725A1 publication Critical patent/WO2023202725A1/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Definitions

  • the present application relates to the field of processing technology, specifically, to an integrated processing equipment.
  • the development process is an intermediate process in the photolithography process. Its purpose is to remove part of the photoresist on the wafer to form a three-dimensional physical pattern, thereby accurately copying the circuit structure on the mask to the photoresist layer of the silicon wafer. .
  • an acid-base neutralization reaction will occur between the fluid and the photoresist in the exposed area. After development, the residues in the reaction must be removed with deionized water.
  • the focus of development is to ensure that the feature size (minimum line width of semiconductor devices in integrated circuit manufacturing) meets the requirements. If the feature size meets the requirements, it is considered that all geometric features produced during processing meet the requirements.
  • immersion development immersion development
  • continuous spray development rotating immersion development. Existing continuous spray development sprays fluid onto the wafer in the form of mist while the wafer rotates at a speed of 100r/min to 500r/min.
  • the purpose of this application is to provide an integrated processing equipment that can process workpieces of different sizes, has strong adaptability, wide application range, and low cost.
  • This application provides an integrated processing equipment, including:
  • the rotation device includes an inclination angle adjustment unit and a rotation unit, the inclination angle adjustment unit is provided on the base, the rotation unit is connected to the inclination angle adjustment unit, the rotation unit is used to carry the workpiece and can Drive the workpiece to rotate around the first axis; the inclination angle adjustment unit is used to drive the rotation unit to rotate around the second axis that is at an angle with the first axis;
  • the flow guide device includes a frame body, a liquid storage piece and a flow guide piece, the frame body is connected to the inclination angle adjustment unit, the liquid storage piece and the flow guide piece are both connected to the frame
  • the liquid storage member is used to transport liquid to the flow guide member, and the liquid can flow through the flow guide member to the workpiece positioned on the rotation unit.
  • the inclination adjustment unit includes a first driver and a mounting platform, the first driver is connected to the base, the mounting platform is connected to the first driver, and the first driver used to drive the installation The stage rotates around the first axis;
  • the rotating unit and the frame are both connected to the mounting platform.
  • the installation platform is provided with a liquid collection tank and a liquid drainage port connected to the liquid collection tank; the base is provided with a liquid collection chamber, and the liquid drainage port is connected to the liquid collection cavity.
  • the cavities are connected; the rotating unit is located in the liquid collection tank; the liquid collection tank is used to collect liquid falling from the workpiece, and can enter the liquid collection cavity from the liquid discharge port.
  • the rotating unit includes a second driver, a rotating disk and a positioning assembly
  • the second driver is connected to the installation platform
  • the rotating disk is connected to the second driver
  • the second driver is connected to the installation platform.
  • Two drivers are used to drive the rotating disk to rotate around the second axis;
  • the positioning component is connected to the rotating disk, and the positioning component is used to position the workpiece located on the rotating disk.
  • the positioning assembly includes a plurality of clamping blocks, the plurality of clamping blocks are connected to the rotating disk, and the plurality of clamping blocks jointly define a space for clamping the workpiece. Clamping area, at least one of the plurality of clamping blocks can move relative to the rotating disk to adjust the size of the clamping area.
  • the flow guide is provided with a liquid outlet side, and the flow guide is movably connected to the frame body for adjusting the distance between the liquid outlet side and the frame body, thereby adjusting the distance between the liquid outlet side and the frame body. The distance between the liquid outlet side and the workpiece positioned on the rotating unit.
  • the flow guide is slidably connected to the frame body in the extension direction of the second axis to adjust the distance between the liquid outlet side and the frame body.
  • the flow guide device further includes a locking unit, the locking unit is connected to the flow guide and the frame body at the same time, and the locking unit has mutually switched locking states and In the unlocked state, when in the locked state, the flow guide and the frame are relatively fixed in the extension direction of the second axis; when in the unlocked state, the flow guide can be relative to the The frame body slides in the extension direction of the second axis.
  • the liquid storage member is slidably connected to the frame body in the extension direction of the second axis to adjust the distance of the liquid storage member relative to the flow guide member.
  • the liquid storage member is provided with a first chamber and a second chamber that are independent of each other, the first chamber has a first outlet, and the first chamber is used to store fluid; The second chamber has a second outlet, and the second chamber is used to store cleaning fluid.
  • the integrated processing equipment provided by this embodiment can be applied to development scenarios. Specifically, when developing a workpiece, the workpiece is positioned on the rotating unit, and then the inclination angle is adjusted according to the thickness and size of the workpiece.
  • the unit correspondingly adjusts the inclination angle of the workpiece relative to the horizontal plane, that is, the inclination angle of the workpiece relative to the flow guide is adjusted.
  • the fluid flowing from the flow guide to the surface of the workpiece has a small impact on the surface of the workpiece, is not easy to damage the surface of the workpiece, and has high development quality. .
  • the angle between the workpiece and the flow guide can be adjusted as needed. In this way, it can adapt to the development operation of workpieces of different sizes, and can ensure the development quality. It has a wide range of applications and does not need to be designed for workpieces of different sizes. Specialized developing equipment to reduce costs.
  • Figure 1 is a perspective structural schematic diagram of the integrated processing equipment according to the embodiment of the present application.
  • Figure 2 is a schematic structural diagram of the integrated processing equipment from another perspective according to the embodiment of the present application.
  • FIG. 3 is a partial structural schematic diagram of the integrated processing equipment according to the embodiment of the present application.
  • Figure 4 is a schematic structural diagram of the rotating disk and positioning assembly according to the embodiment of the present application.
  • Figure 5 is a schematic structural diagram of the frame body and locking unit according to the embodiment of the present application.
  • Figure 6 is a schematic structural diagram of the locking unit according to the embodiment of the present application.
  • Figure 7 is a schematic structural diagram of the flow guide according to the embodiment of the present application.
  • Figure 8 is a schematic structural diagram of a liquid storage component according to an embodiment of the present application.
  • horizontal does not mean that the component is required to be absolutely horizontal or suspended, but may be slightly tilted.
  • horizontal only means that its direction is more horizontal than “vertical”. It does not mean that the structure must be completely horizontal, but can be slightly tilted.
  • the terms "setting”, “installation”, “connecting” and “connecting” should be understood in a broad sense.
  • it can be a fixed connection, It can also be a detachable connection or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium; it can be an internal connection between two components.
  • the specific meanings of the above terms in this application can be understood on a case-by-case basis.
  • the workpiece when developing a workpiece, the workpiece is generally positioned on a turntable, and then the fluid is guided to the surface of the workpiece, and the workpiece continues to rotate to achieve development in the entire circumferential direction.
  • the angle of the turntable is fixed, the angle of the workpiece relative to the horizontal plane is fixed and cannot be adjusted.
  • the size of the workpiece is different, the height of the workpiece and the outflow side of the fluid will change.
  • the impact force When the fluid reaches the surface of the workpiece, the impact force will Changes occur, and the impact force can easily damage the workpiece and reduce the yield of finished products.
  • the designer has designed an integrated processing equipment that can be used in the field of development. It can adjust the inclination angle of the workpiece relative to the horizontal plane as needed, thereby adjusting the distance from the fluid to the workpiece surface and reducing the Impact force; it can also adjust the flow rate of the developer on the surface of the workpiece, thereby facilitating control of the development quality and improving the yield of finished products.
  • the integrated processing equipment includes a base 100, a rotating device 200 and a flow guide device 300.
  • the base 100 is used to be fixed on a support surface, which may be a workbench or the ground.
  • the rotation device 200 includes an inclination adjustment unit 210 and a rotation unit 220.
  • the inclination adjustment unit 210 is provided on the base 100.
  • the rotation unit 220 is connected to the inclination adjustment unit 210.
  • the rotation unit 220 is used to carry the workpiece and can drive the workpiece around the first axis 001 Rotation; the inclination angle adjustment unit 210 is used to drive the rotation unit 220 to rotate around the second axis 002 having an included angle with the first axis 001.
  • the flow guide device 300 includes a frame body 310, a liquid storage part 320 and a flow guide part 330.
  • the frame body 310 is connected to the inclination angle adjustment unit 210.
  • the liquid storage part 320 and the flow guide part 330 are both connected to the frame body 310.
  • the liquid storage part 320 is In delivering the liquid to the guide member 330 , the liquid can flow through the guide member 330 to the workpiece positioned on the rotating unit 220 .
  • first axis 001 is perpendicular to the second axis 002, and the second axis 002 Basically coincident with the horizontal plane, obviously, in other embodiments, the first axis 001 and the second axis 002 can also be other angles other than 0° and 90°. At the same time, the second axis 002 may have a non-zero angle with the horizontal plane.
  • the base 100 is configured as a square base.
  • the base 100 has a first plate surface and a second plate surface opposite each other.
  • the first plate surface is used to be fixed on the support surface, and the second plate surface faces
  • two mounting blocks 130 are provided on the second board. Both of the two mounting blocks 130 are square blocks and the two mounting blocks 130 are arranged at intervals.
  • Each mounting block 130 is provided with a bearing hole, and the two bearing holes on the two mounting blocks 130 are coaxially arranged.
  • the base 100 is provided with a liquid collection chamber 110 , the liquid collection chamber 110 has an opening located on the second plate, and a water pump 120 is provided in the liquid collection chamber 110 .
  • the tilt angle adjustment unit 210 includes a first driver 211, a mounting platform 212 and a bearing (not shown).
  • the first driver 211 is configured as a motor, and the first driver 211 is fixed on the first On the two plates, the number of bearings is two, and the two bearings are respectively embedded in the bearing holes on the two mounting blocks 130.
  • the output shaft of the first driver 211 is simultaneously inserted into the inner rings of the two bearings, so , the output shaft of the first driver 211 is rotatably connected to the two mounting blocks 130 around the second axis 002 through two bearings.
  • the mounting platform 212 is fixed on the output shaft of the first driver 211 and can rotate together with the output shaft.
  • the mounting platform 212 and the output shaft are relatively fixed in the circumferential direction of the output shaft.
  • the mounting platform 212 may be fixedly connected to the output shaft through splines or pins.
  • the mounting platform 212 includes a connected base body 2121 and a plate body 2122.
  • the base body 2121 is sleeved outside the output shaft and is fixedly connected to the output shaft.
  • the plate body 2122 is provided with a liquid collection tank 2123 and a liquid discharge port 2124 connected with the liquid collection tank 2123.
  • a through hole is provided in the middle of the liquid collection tank 2123.
  • the through hole is a cylindrical hole, and a sealed bearing is provided in the through hole.
  • the liquid in the liquid collection tank 2123 can be discharged into the liquid collection chamber 110 through the liquid discharge port 2124.
  • the tilt angle adjustment unit 210 also includes an angle measurer, which is connected to the first driver 211 and used to detect the rotation angle of the output shaft of the first driver 211 so as to obtain the installation platform 212 The angle of rotation can then be used to obtain the angle of the mounting platform 212 relative to the horizontal plane, and finally the angle of the workpiece relative to the horizontal plane can be obtained.
  • an angle measurer which is connected to the first driver 211 and used to detect the rotation angle of the output shaft of the first driver 211 so as to obtain the installation platform 212 The angle of rotation can then be used to obtain the angle of the mounting platform 212 relative to the horizontal plane, and finally the angle of the workpiece relative to the horizontal plane can be obtained.
  • the rotating unit 220 includes a second driver 221, a rotating disk 222 and a positioning assembly 223.
  • the second driver 221 is configured as a motor.
  • the second driver 221 is fixed on the base 2121 , and the output shaft of the second driver 221 passes through the sealed bearing, and the output shaft of the second driver 221 extends into the liquid collection tank 2123 .
  • the rotating disk 222 may be a circular disk.
  • the rotating disk 222 is located in the liquid collecting tank 2123 and is fixedly connected to the output shaft.
  • the axis of the rotating disk 222 is collinear with the axis of the output shaft.
  • the positioning component 223 is provided on the rotating disc 222.
  • the positioning component 223 is used to position the workpiece on the rotating disc 222 so that the workpiece will not move relative to the rotating disc 222 during the development process.
  • the positioning assembly 223 includes a plurality of positioning blocks, the plurality of positioning blocks are connected to the rotating disk 222, and at least one of the plurality of positioning blocks can slide relative to the rotating disk 222 along the radial direction of the rotating disk 222. , thereby adjusting the position of the positioning block relative to the rotating disk 222.
  • multiple positioning blocks are used to jointly clamp the workpiece, and multiple positioning blocks The blocks together form a clamping area. When the positioning block moves relative to the rotating disk 222, the size of the clamping area changes, thereby being able to adapt to the clamping of different workpieces, with a wide range of use and low cost.
  • each positioning block among the plurality of positioning blocks can be configured to slide relative to the rotating plate 222, with a wide adjustment range and flexible adjustment, and can clamp more types of workpieces.
  • only one positioning block among the plurality of positioning blocks can be configured to be movable relative to the rotating disk 222, and the function of adjusting the size of the clamping area can also be achieved.
  • the positioning block can be fixed on the rotating disk 222 through screws. Multiple threaded holes can be provided on the rotating disk. When the screws are screwed into different threaded holes, the positioning block relative to the rotating disk 222 in the radial direction of the rotating disk 222 can change. Change, so that the size of the clamping area can be kept unchanged after adjusting the size of the clamping area to stably clamp the workpiece.
  • the frame 310 includes a fixed plate 311 , a fixed rod 312 and an adjusting rod 313 .
  • the fixing plate 311 is configured as a rectangular plate, and the fixing plate 311 is fixed on the base 2121 through screws.
  • One end of the fixed rod 312 is connected to the fixed plate 311, and the other end is connected to the adjusting rod 313.
  • the number of the fixed rod 312 and the adjusting rod 313 is two.
  • the first ends of the two fixed rods 312 are connected to the base body 2121.
  • Two fixed rods 312 are connected to the base body 2121.
  • the other end of the fixed rod 312 is fixedly connected to the two adjusting rods 313 respectively.
  • the two adjustment rods 313 are both perpendicular to the second axis 002 and arranged at intervals in the extension direction of the second axis 002 .
  • each adjusting rod 313 is slidably connected to the corresponding fixed rod 312.
  • the sliding direction of the adjusting rod 313 and the fixed rod 312 is parallel to the guiding direction of the flow guide 330 to guide the liquid to flow to the workpiece.
  • the position of the adjustment rod 313 relative to the fixed rod 312 can be adjusted to move the flow guide 330 closer or farther away from the workpiece, so that the liquid flowing out from the flow guide 330 can smoothly fall on the workpiece. superior.
  • the flow guide 330 is slidably matched with the frame 310 through the locking unit 340.
  • the locking unit 340 has a locked state and an unlocked state that are switched between each other.
  • the flow guide 330 It is relatively fixed with the frame 310 in the extension direction of the second axis 002; when in the unlocked state, the flow guide 330 can slide relative to the frame 310 in the extension direction of the second axis 002, so that the flow guide 330 can move relative to
  • the frame 310 moves relative to the rotating plate 222 to adjust the distance between the guide 330 and the rotating plate 222, and finally the distance between the guide 330 and the workpiece surface located on the rotating plate 222 is adjusted. Adjustment.
  • the position of the flow guide 330 can be adjusted according to workpieces of different thicknesses, so that the distance between the flow guide 330 and the workpiece is always maintained within a reasonable distance range.
  • the liquid flowing from the liquid outlet side 331 to the surface of the workpiece can evenly cover the surface of the workpiece, thereby improving the work quality.
  • the flow guide 330 is configured as a square plate, and one side of the flow guide 330 is configured as the liquid outlet side 331 .
  • the flow guide 330 is provided with a clamping hole 332 that penetrates the flow guide 330 in the thickness direction.
  • the clamping hole 332 includes a first hole section 3321 and a second hole section 3322 that are connected.
  • the first hole section 3321 and the second hole section 3322 are all arc hole segments, and the hole diameter of the first hole segment 3321 is larger than the space of the second hole segment 3322.
  • the number of clamping holes 332 on the flow guide 330 is designed according to the number of clamping rods 341.
  • the number of clamping holes 332 is equal to the number of clamping rods 341 and corresponds one to one.
  • Each clamping rod 341 can be plugged into the corresponding clamping rod 341.
  • the clamping rod 341 can move between the first hole section 3321 and the second hole section 3322.
  • the locking unit 340 is in an unlocked state and the clamping The rod 341 can move relative to the flow guide 330 in the axis extension direction of the first hole section 3321 to adjust the position of the flow guide 330, and after moving to the set position, slide the clamping rod 341 to the second position.
  • the annular protrusion 342 is used to engage with the flow guide 330.
  • the locking unit 340 is in a locked state, so that the flow guide 330 and the clamping rod 341 are aligned in the axis extension direction of the clamping rod 341. Stay fixed.
  • the adjustment operation of the position of the flow guide 330 relative to the frame 310 is convenient and flexible.
  • the flow guide 330 can also be configured to rotate with the frame 310, and the distance between the liquid outlet side 331 and the workpiece can also be adjusted.
  • the liquid storage member 320 is provided with a first chamber and a second chamber that are independent of each other.
  • the first chamber has a first outlet 321 and a first inlet.
  • the chamber is used to store fluid, which may be developer fluid, etc.;
  • the second chamber has a second outlet 322 and a second inlet, and the second chamber is used to store cleaning fluid.
  • fluid is replenished in the first chamber through the first inlet.
  • the fluid is discharged from the first outlet 321 and falls on the guide member 330, and flows from the liquid outlet side 331 of the guide member 330 to workpiece surface.
  • the cleaning liquid in the second chamber is discharged from the second outlet 322 to flow to the surface of the workpiece through the flow guide 330 .
  • both the first outlet 321 and the second outlet 322 are strip-shaped openings, and both the first outlet 321 and the second outlet 322 extend along the extension direction of the second axis 002. In this way, the liquid flowing out of the first outlet 321 and the second outlet 322 can be in the shape of a water curtain, and can flow to the guide 330 more evenly.
  • the working mode of the integrated processing equipment includes, for example:
  • the workpiece is placed on the rotating disk 222, and the workpiece is clamped on the rotating disk 222 by moving the positioning block. Then, the inclination angle adjustment unit 210 is used to drive the installation platform 212 to rotate, thereby driving the rotating plate 222, the workpiece, the rotating unit 220 and the flow guide device 300 to simultaneously change the inclination angle with the horizontal plane. After the tilt angle adjustment is completed, adjust the height of the deflector relative to the workpiece, and then perform development and cleaning operations. Obviously, in other steps, it is feasible to adjust the distance between the deflector and the workpiece first, and then adjust the inclination angle of the workpiece.
  • the integrated processing equipment provided in this embodiment can process workpieces of different shapes and sizes.
  • the size of the workpiece includes the outer contour size and thickness of the workpiece.
  • the shape of the workpiece can be round, square, etc., and has a wide processing range and wide range of use. ,low cost.
  • the inclination angle and distance of the workpiece relative to the deflector can be adjusted according to the workpiece requirements to meet multiple needs. processing, and the processing quality is high.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

一种一体化加工设备，包括基台（100）、旋转装置（200）和导流装置（300）。旋转装置（200）包括倾角调节单元（210）和转动单元（220）,倾角调节单元（210）设于基台（100）上，转动单元（220）与倾角调节单元（210）连接，转动单元（220）用于承载工件并能带动工件绕第一轴线（001）转动；倾角调节单元（210）用于驱动转动单元（220）绕与第一轴线（001）具有夹角的第二轴线（002）转动。导流装置（300）包括架体（310）、储液件（320）和导流件（330）,架体（310）与倾角调节单元（210）连接，储液件（320）以及导流件（330）均与架体（310）连接，储液件（320）用于输送液体至导流件（330）,液体能通过导流件（330）流动至定位于转动单元（220）上的工件上。该一体化加工设备能够按需调整工件相对于水平面的倾角，从而调整流体到达工件表面的距离，减小冲击力；也能够调整流体在工件表面流动的速率，从而便于控制加工质量，提高成品良率。

Description

一体化加工设备
相关申请的交叉引用
本申请要求于2022年04月18日提交中国专利局的申请号为202210406069.9、名称为“一种一体化加工设备”的中国专利申请的优先权，其全部内容通过引用结合在本申请中。
技术领域
本申请涉及加工技术领域，具体而言，涉及一种一体化加工设备。
背景技术
显影工艺是光刻工艺中的中间工序，其目的是去除晶圆上部分光刻胶，形成三维的物理图形，从而将掩膜版上的电路结构准确地复制到硅片的光刻胶层上。显影过程中，流体与曝光区域的光刻胶会发生酸碱中和反应，显影后要通过去离子水清除反应中的残留物。显影的重点是保证特征尺寸(集成电路制造中半导体器件的最小线条宽度)达到要求，特征尺寸达到了要求，则认为加工中产生的所有几何特征都是符合要求的。传统的显影工艺有三种：浸没式显影、连续喷雾显影和旋转浸没式显影。现有的连续喷雾显影是将流体以雾状形式喷洒到晶圆上，同时晶圆以100r/min～500r/min的速度旋转。
经发明人研究发现，现有的显影设备存在如下缺点：
适用范围窄，成本高。
发明内容
本申请的目的在于提供一种一体化加工设备，其能够满足不同尺寸的工件的加工，适应能力强，适用范围广，成本低。
本申请的实施例是这样实现的：
本申请提供一种一体化加工设备，包括：
基台；
旋转装置，所述旋转装置包括倾角调节单元和转动单元，所述倾角调节单元设于所述基台上，所述转动单元与所述倾角调节单元连接，所述转动单元用于承载工件并能带动所述工件绕第一轴线转动；所述倾角调节单元用于驱动所述转动单元绕与所述第一轴线具有夹角的第二轴线转动；
以及导流装置，所述导流装置包括架体、储液件和导流件，所述架体与所述倾角调节单元连接，所述储液件以及所述导流件均与所述架体连接，所述储液件用于输送液体至所述导流件，所述液体能通过所述导流件流动至定位于所述转动单元上的工件上。
在可选的实施方式中，所述倾角调节单元包括第一驱动器和安装台，所述第一驱动器与所述基台连接，所述安装台与所述第一驱动器连接，所述第一驱动器用于驱动所述安装 台绕所述第一轴线转动；
所述转动单元以及所述架体均与所述安装台连接。
在可选的实施方式中，所述安装台设有集液槽以及与所述集液槽连通的排液口；所述基台设置有集液腔，所述排液口与所述集液腔连通；所述转动单元设于所述集液槽中；所述集液槽用于收集从所述工件上落下的液体，并能从所述排液口进入所述集液腔内。
在可选的实施方式中，所述转动单元包括第二驱动器、转动盘和定位组件，所述第二驱动器与所述安装台连接，所述转动盘与所述第二驱动器连接，所述第二驱动器用于驱动所述转动盘绕所述第二轴线转动；所述定位组件与所述转动盘连接，所述定位组件用于定位于位于所述转动盘上的工件。
在可选的实施方式中，所述定位组件包括多个夹持块，所述多个夹持块均与所述转动盘连接，所述多个夹持块共同限定出用于夹持工件的夹持区域，所述多个夹持块中的至少一个能相对于所述转动盘移动，以调节所述夹持区域的大小。
在可选的实施方式中，所述导流件设置有出液侧，所述导流件与所述架体活动连接，用于调节所述出液侧与所述架体的距离，从而调节所述出液侧与定位于所述转动单元上的工件的距离。
在可选的实施方式中，所述导流件与所述架体在所述第二轴线的延伸方向上可滑动地连接，以调节所述出液侧与所述架体的距离。
在可选的实施方式中，所述导流装置还包括锁紧单元，所述锁紧单元同时连接于所述导流件和所述架体，所述锁紧单元具有相互切换的锁定状态和解锁状态，处于所述锁定状态时，所述导流件与所述架体在所述第二轴线的延伸方向上相对固定；处于所述解锁状态时，所述导流件能相对于所述架体在所述第二轴线的延伸方向上滑动。
在可选的实施方式中，所述储液件与所述架体在所述第二轴线的延伸方向上可滑动地连接，以调节所述储液件相对于所述导流件的距离。
在可选的实施方式中，所述储液件设置有相互独立的第一腔室和第二腔室，所述第一腔室具有第一出口，所述第一腔室用于储存流体；所述第二腔室具有第二出口，所述第二腔室用于储存清洗液。
本申请实施例的有益效果是：
综上所述，本实施例提供的一体化加工设备，能够应用于显影场景，具体的，在对工件进行显影作业时，将工件定位于转动单元上，然后，根据工件的厚度尺寸通过倾角调节单元相应调节工件相对于水平面的倾角，也即，调整了工件相对于导流件的倾角，从导流件上流向工件表面的流体对于工件表面的冲击力小，不易损伤工件表面，显影质量高。由 于根据工件厚度尺寸的不同，能够按需调整工件与导流件之间的角度，如此，能够适应不同尺寸工件的显影作业，且能保证显影质量，适用范围广，不需要针对不同尺寸工件设计专门的显影设备，降低成本。
附图说明
为了更清楚地说明本申请实施例的技术方案，下面将对实施例中所需要使用的附图作简单地介绍，应当理解，以下附图仅示出了本申请的某些实施例，因此不应被看作是对范围的限定，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他相关的附图。
图1为本申请实施例的一体化加工设备的一视角结构示意图；
图2为本申请实施例的一体化加工设备的另一视角的结构示意图；
图3为本申请实施例的一体化加工设备的部分结构示意图；
图4为本申请实施例的转动盘和定位组件的结构示意图；
图5为本申请实施例的架体和锁紧单元的结构示意图；
图6为本申请实施例的锁紧单元的结构示意图；
图7为本申请实施例的导流件的结构示意图；
图8为本申请实施例的储液件的结构示意图。
图标:
001-第一轴线；002-第二轴线；100-基台；110-集液腔；120-水泵；130-安装块；200-
旋转装置；210-倾角调节单元；211-第一驱动器；212-安装台；2121-基体；2122-板体；2123-集液槽；2124-排液口；220-转动单元；221-第二驱动器；222-转动盘；223-定位组件；300-导流装置；310-架体；311-固定板；312-固定杆；313-调节杆；320-储液件；321-第一出口；322-第二出口；330-导流件；331-出液侧；332-卡孔；3321-第一孔段；3322-第二孔段；340-锁紧单元；341-卡接杆；342-环形凸起。
具体实施方式
为使本申请实施例的目的、技术方案和优点更加清楚，下面将结合本申请实施例中的附图，对本申请实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例是本申请一部分实施例，而不是全部的实施例。通常在此处附图中描述和示出的本申请实施例的组件可以以各种不同的配置来布置和设计。
因此，以下对在附图中提供的本申请的实施例的详细描述并非旨在限制要求保护的本申请的范围，而是仅仅表示本申请的选定实施例。基于本申请中的实施例，本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例，都属于本申请保护的范围。
应注意到：相似的标号和字母在下面的附图中表示类似项，因此，一旦某一项在一个 附图中被定义，则在随后的附图中不需要对其进行进一步定义和解释。
在本申请的描述中，需要说明的是，术语“中心”、“上”、“下”、“左”、“右”、“竖直”、“水平”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系，或者是该申请产品使用时惯常摆放的方位或位置关系，仅是为了便于描述本申请和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请的限制。此外，术语“第一”、“第二”、“第三”等仅用于区分描述，而不能理解为指示或暗示相对重要性。
此外，术语“水平”、“竖直”等术语并不表示要求部件绝对水平或悬垂，而是可以稍微倾斜。如“水平”仅仅是指其方向相对“竖直”而言更加水平，并不是表示该结构一定要完全水平，而是可以稍微倾斜。
在本申请的描述中，还需要说明的是，除非另有明确的规定和限定，术语“设置”、“安装”、“相连”、“连接”应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通。对于本领域的普通技术人员而言，可以具体情况理解上述术语在本申请中的具体含义。
目前，半导体加工领域中，对于工件进行显影时，一般将工件定位在转盘上，然后，将流体引导至工件的表面，工件持续转动从而实现整个圆周方向上的显影。工件与转盘定位后，由于转盘的角度固定，工件相对于水平面的角度固定，不能调整，当工件尺寸不同时，工件与流体的流出侧的高度会发生改变，流体到达工件表面时，冲击力会发生改变，且该冲击力容易损伤工件，降低成品良率。
请结合图1-图8，鉴于此，设计者设计了一种一体化加工设备，可以应用于显影领域，能够按需调整工件相对于水平面的倾角，从而调整流体到达工件表面的距离，减小冲击力；也能够调整显影液在工件表面流动的速率，从而便于控制显影质量，提高成品良率。
请参阅图1-图3，本实施例中，一体化加工设备包括基台100、旋转装置200和导流装置300。基台100用于固定于支撑面上，支撑面可以是工作台或地面。旋转装置200包括倾角调节单元210和转动单元220，倾角调节单元210设于基台100上，转动单元220与倾角调节单元210连接，转动单元220用于承载工件并能带动工件绕第一轴线001转动；倾角调节单元210用于驱动转动单元220绕与第一轴线001具有夹角的第二轴线002转动。导流装置300包括架体310、储液件320和导流件330，架体310与倾角调节单元210连接，储液件320以及导流件330均与架体310连接，储液件320用于输送液体至导流件330，液体能通过导流件330流动至定位于转动单元220上的工件上。
需要说明的是，本实施例中，第一轴线001与第二轴线002垂直，并且第二轴线002 基本与水平面重合，显然，在其他实施例中，第一轴线001和第二轴线002还可以是不为0°和90°的其他夹角。同时，第二轴线002可以与水平面具有不为零的夹角。
本实施例中，可选的，基台100设置为方形台，基台100具有相对的第一板面和第二板面，第一板面用于固定在支撑面上，第二板面朝上，第二板面上设置有两个安装块130，两个安装块130均为方形块，两个安装块130间隔排布。每个安装块130上设置有轴承孔，两个安装块130上的两个轴承孔同轴设置。进一步的，基台100上设置有集液腔110，集液腔110具有位于第二板面上的敞口，集液腔110中设置有水泵120。
请参阅图2，本实施例中，可选的，倾角调节单元210包括第一驱动器211、安装台212和轴承(图未示)，第一驱动器211设置为电机，第一驱动器211固定在第二板面上，轴承的数量为两个，两个轴承分别嵌设在两个安装块130上的轴承孔内，第一驱动器211的输出轴同时穿设于两个轴承的内圈中，如此，第一驱动器211的输出轴通过两个轴承与两个安装块130绕第二轴线002可转动地连接。安装台212固定在第一驱动器211的输出轴上，并能随输出轴一起转动，也就是说，安装台212安装在输出轴上后，安装台212与输出轴在输出轴的周向上相对固定。例如，安装台212可以通过花键或销轴与输出轴固定连接。进一步的，安装台212包括相连的基体2121和板体2122，基体2121套接在输出轴外且与输出轴固定连接。板体2122上设置有集液槽2123以及与集液槽2123连通的排液口2124，集液槽2123的中部设置有通孔，通孔为圆柱形孔，通孔内设置有密封轴承。集液槽2123中的液体能通过排液口2124排入集液腔110中。
在其他实施例中，可选的，倾角调节单元210还包括角度测量器，角度测量器与第一驱动器211连接，用于检测第一驱动器211的输出轴的转动角度，从而能获取安装台212转动的角度，进而获取安装台212相对于水平面的角度，最终能得到工件相对于水平面的夹角。
请参阅图1和图4，本实施例中，可选的，转动单元220包括第二驱动器221、转动盘222和定位组件223，第二驱动器221设置为电机。第二驱动器221固定在基体2121上，并且第二驱动器221的输出轴穿设于密封轴承中，并且第二驱动器221的输出轴伸入集液槽2123中。转动盘222可以为圆盘，转动盘222位于集液槽2123中转动盘222与输出轴固定连接，转动盘222的轴线与输出轴的轴线共线。定位组件223设于转动盘222上，定位组件223用于定位位于转动盘222上的工件，使工件在显影过程中不会相对于转动盘222移动。
可选的，定位组件223包括多个定位块，多个定位块均与转动盘222连接，并且，多个定位块中的至少一个定位块能沿转动盘222的径向相对于转动盘222滑动，从而调节定位块相对于转动盘222的位置。应当理解，多个定位块用于共同配合夹持工件，多个定位 块共同围成了夹持区域，当定位块相对于转动盘222移动时，夹持区域的大小改变，从而能够适应不同工件的夹持，使用范围广，成本低。
需要说明的是，多个定位块中的每一个定位块都可以设置为能相对于转动盘222滑动，调节范围广，调节灵活，能够夹持的工件的类型更多。显然，在其他实施例中，可以仅将多个定位块中的一个定位块设置为可相对于转动盘222移动，同样能实现调节夹持区域大小的功能。
此外，定位块可以通过螺钉固定于转动盘222上，转盘上可以设置多个螺纹孔，螺钉旋入不同的螺纹孔时，定位块相对于转动盘222在转动盘222的径向上的位置能发生改变，从而在调节夹持区域大小后能够保持夹持区域的大小不变，以稳定地夹持工件。
请参阅图5，本实施例中，可选的，架体310包括固定板311、固定杆312和调节杆313。固定板311设置为矩形板，固定板311通过螺钉固定在基体2121上。固定杆312的一端与固定板311连接，另一端与调节杆313连接，固定杆312和调节杆313的数量均为两根，两根固定杆312的第一端均与基体2121连接，两根固定杆312的另一端分别与两根调节杆313固定连接。两根调节杆313均与第二轴线002垂直，且在第二轴线002的延伸方向上间隔排布。
进一步的，每根调节杆313均与对应的固定杆312可滑动地连接，调节杆313与固定杆312的滑动方向平行于导流件330引导液体流向工件的引导方向，如此，当转动盘222上定位的工件尺寸较小时，可以通过调整调节杆313相对于固定杆312的位置，进而使导流件330相对于工件靠近或远离，使得从导流件330上流出的液体能够顺利落在工件上。
本实施例中，可选的，导流件330通过锁紧单元340与架体310可滑动地配合，锁紧单元340具有相互切换的锁定状态和解锁状态，处于锁定状态时，导流件330与架体310在第二轴线002的延伸方向上相对固定；处于解锁状态时，导流件330能相对于架体310在第二轴线002的延伸方向上滑动，如此，导流件330能相对于架体310移动，从而相对于转动盘222运动，实现导流件330与转动盘222之间的距离的调整，最终实现导流件330与位于转动盘222上的工件表面之间的距离的调整。这样设计，使得导流件330能够根据不同厚度的工件进行位置调整，使导流件330与工件之间的距离始终保持在合理距离范围中，经导流件330的引导并从导流件330的出液侧331流向工件表面的液体能够均匀地覆盖工件表面，提高作业质量。
请参阅图6，可选的，锁紧单元340包括多根卡接杆341，每根调节杆313上均设置有至少一根卡接杆341，每根卡接杆341上设置有在卡接杆341的轴线延伸方向上均匀间隔排布的环形凸起342。卡接杆341与调节杆313垂直设置。每根调节杆313上的卡接杆341的数量可以是一个、两个或三个等。
请参阅图7，可选的，导流件330设置为方形板，导流件330的一侧设置为出液侧331。导流件330上设置有在其厚度方向上贯穿导流件330的卡孔332，卡孔332包括连通的第一孔段3321和第二孔段3322，第一孔段3321和第二孔段3322均为圆弧孔段，第一孔段3321的孔径大于第二孔段3322的空间。导流件330上的卡孔332的数量根据卡接杆341的数量设计，卡孔332的数量与卡接杆341的数量相等且一一对应，每根卡接杆341能插接在对应的一个卡孔332中。并且，卡接杆341能够在第一孔段3321和第二孔段3322之间移动，当卡接杆341位于第一孔段3321中时，此时，锁紧单元340处于解锁状态，卡接杆341能够在第一孔段3321的轴线延伸方向上相对于导流件330运动，从而调整导流件330的位置，并且，在移动至设定位置后，将卡接杆341滑动至第二孔段3322中，利用环形凸起342与导流件330卡接，此时，锁紧单元340处于锁定状态，从而使导流件330与卡接杆341在卡接杆341的轴线延伸方向上保持固定。导流件330相对于架体310的位置的调节操作方便灵活。
显然，在其他实施例中，导流件330还可以设置为与架体310转动，同样可以实现出液侧331与工件之间的距离的调整。
请参阅图8，本实施例中，可选的，储液件320设有相互独立的第一腔室和第二腔室，第一腔室具有第一出口321和第一进口，第一腔室用于储存流体，流体可以是显影液等；第二腔室具有第二出口322和第二进口，第二腔室用于储存清洗液。实际作业时，需要进行显影时，第一腔室中通过第一进口补充流体，流体从第一出口321排出并落在导流件330上，并且从导流件330的出液侧331流动至工件表面。当显影完成后，需要对工件进行清洗时，将第二腔室中的清洗液从第二出口322排出，从而经由导流件330流向工件表面。
进一步的，第一出口321和第二出口322均为条形口，并且第一出口321和第二出口322均沿第二轴线002的延伸方向延伸。如此，第一出口321和第二出口322流出的液体能呈水幕状，进而能更加均匀地流向导流件330。
本实施例中，一体化加工设备的工作方式包括，例如：
将工件放置于转动盘222上，并且通过移动定位块将工件夹持于转动盘222上。然后，调整利用倾角调节单元210带动安装台212转动，进而带动转动盘222、工件、转动单元220和导流装置300同时改变与水平面的倾角。当倾角调节完成后，再调整导流板相对于工件的高度，而后，进行显影、清洗作业。显然，在其他步骤中，可以先调整导流板与工件的距离，再调整工件的倾角，都是可行的。
本实施例提供的一体化加工设备，能够加工不同形状大小的工件，其中，工件大小包括工件的外轮廓尺寸和厚度等，工件的形状可以是圆形、方形等，加工范围广，使用范围广，成本低。同时，能够根据工件要求调整工件相对于导流板的倾角和距离，满足多需求 的加工，且加工质量高。
需要说明的是，该一体化加工设备还可以应用于其他作业场景下，例如，应用于涂酸或镀膜等作业场景。
以上所述仅为本申请的优选实施例而已，并不用于限制本申请，对于本领域的技术人员来说，本申请可以有各种更改和变化。凡在本申请的精神和原则之内，所作的任何修改、等同替换、改进等，均应包含在本申请的保护范围之内。

Claims (10)

  1. 一种一体化加工设备，其特征在于，包括：
    基台；
    旋转装置，所述旋转装置包括倾角调节单元和转动单元，所述倾角调节单元设于所述基台上，所述转动单元与所述倾角调节单元连接，所述转动单元用于承载工件并能带动所述工件绕第一轴线转动；所述倾角调节单元用于驱动所述转动单元绕与所述第一轴线具有夹角的第二轴线转动；
    以及导流装置，所述导流装置包括架体、储液件和导流件，所述架体与所述倾角调节单元连接，所述储液件以及所述导流件均与所述架体连接，所述储液件用于输送液体至所述导流件，所述液体能通过所述导流件流动至定位于所述转动单元上的工件上。
  2. 根据权利要求1所述的一体化加工设备，其特征在于：
    所述倾角调节单元包括第一驱动器和安装台，所述第一驱动器与所述基台连接，所述安装台与所述第一驱动器连接，所述第一驱动器用于驱动所述安装台绕所述第一轴线转动；
    所述转动单元以及所述架体均与所述安装台连接。
  3. 根据权利要求2所述的一体化加工设备，其特征在于：
    所述安装台设有集液槽以及与所述集液槽连通的排液口；所述基台设置有集液腔，所述排液口与所述集液腔连通；所述转动单元设于所述集液槽中；所述集液槽用于收集从所述工件上落下的液体，并能从所述排液口进入所述集液腔内。
  4. 根据权利要求2所述的一体化加工设备，其特征在于：
    所述转动单元包括第二驱动器、转动盘和定位组件，所述第二驱动器与所述安装台连接，所述转动盘与所述第二驱动器连接，所述第二驱动器用于驱动所述转动盘绕所述第二轴线转动；所述定位组件与所述转动盘连接，所述定位组件用于定位于位于所述转动盘上的工件。
  5. 根据权利要求4所述的一体化加工设备，其特征在于：
    所述定位组件包括多个夹持块，所述多个夹持块均与所述转动盘连接，所述多个夹持块共同限定出用于夹持工件的夹持区域，所述多个夹持块中的至少一个能相对于所述转动盘移动，以调节所述夹持区域的大小。
  6. 根据权利要求1-5中任一项所述的一体化加工设备，其特征在于：
    所述导流件设置有出液侧，所述导流件与所述架体活动连接，用于调节所述出液 侧与所述架体的距离，从而调节所述出液侧与定位于所述转动单元上的工件的距离。
  7. 根据权利要求6所述的一体化加工设备，其特征在于：
    所述导流件与所述架体在所述第二轴线的延伸方向上可滑动地连接，以调节所述出液侧与所述架体的距离。
  8. 根据权利要求7所述的一体化加工设备，其特征在于：
    所述导流装置还包括锁紧单元，所述锁紧单元同时连接于所述导流件和所述架体，所述锁紧单元具有相互切换的锁定状态和解锁状态，处于所述锁定状态时，所述导流件与所述架体在所述第二轴线的延伸方向上相对固定；处于所述解锁状态时，所述导流件能相对于所述架体在所述第二轴线的延伸方向上滑动。
  9. 根据权利要求6所述的一体化加工设备，其特征在于：
    所述储液件与所述架体在所述第二轴线的延伸方向上可滑动地连接，以调节所述储液件相对于所述导流件的距离。
  10. 根据权利要求9所述的一体化加工设备，其特征在于：
    所述储液件设置有相互独立的第一腔室和第二腔室，所述第一腔室具有第一出口，所述第一腔室用于储存流体；所述第二腔室具有第二出口，所述第二腔室用于储存清洗液。
PCT/CN2023/099782 2022-04-18 2023-06-13 一体化加工设备 WO2023202725A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN202210406069.9 2022-04-18
CN202210406069.9A CN114815528A (zh) 2022-04-18 2022-04-18 一种一体化加工设备

Publications (1)

Publication Number Publication Date
WO2023202725A1 true WO2023202725A1 (zh) 2023-10-26

Family

ID=82535903

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2023/099782 WO2023202725A1 (zh) 2022-04-18 2023-06-13 一体化加工设备

Country Status (2)

Country Link
CN (1) CN114815528A (zh)
WO (1) WO2023202725A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114815528A (zh) * 2022-04-18 2022-07-29 成都博腾实达智能科技有限公司 一种一体化加工设备

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004095707A (ja) * 2002-08-30 2004-03-25 Tokyo Electron Ltd 液処理装置
JP2006229029A (ja) * 2005-02-18 2006-08-31 Nikon Corp ステージ装置、露光装置及びデバイスの製造方法
KR20090092412A (ko) * 2008-02-27 2009-09-01 한국과학기술원 노광 장치, 노광 방법 및 그에 따른 패턴 형성방법
CN104076622A (zh) * 2014-06-16 2014-10-01 京东方科技集团股份有限公司 一种显影装置
CN110308623A (zh) * 2018-03-20 2019-10-08 长鑫存储技术有限公司 图形显影装置及显影方法
CN111781210A (zh) * 2020-06-30 2020-10-16 苏州精濑光电有限公司 一种调节机构及检测设备
CN213001464U (zh) * 2020-08-03 2021-04-20 上海森帝润滑技术有限公司 一种被清洗物角度可调的清洗装置
CN215371962U (zh) * 2021-07-16 2021-12-31 上海市计量测试技术研究院 一种角度调节支架
CN114815528A (zh) * 2022-04-18 2022-07-29 成都博腾实达智能科技有限公司 一种一体化加工设备

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004095707A (ja) * 2002-08-30 2004-03-25 Tokyo Electron Ltd 液処理装置
JP2006229029A (ja) * 2005-02-18 2006-08-31 Nikon Corp ステージ装置、露光装置及びデバイスの製造方法
KR20090092412A (ko) * 2008-02-27 2009-09-01 한국과학기술원 노광 장치, 노광 방법 및 그에 따른 패턴 형성방법
CN104076622A (zh) * 2014-06-16 2014-10-01 京东方科技集团股份有限公司 一种显影装置
CN110308623A (zh) * 2018-03-20 2019-10-08 长鑫存储技术有限公司 图形显影装置及显影方法
CN111781210A (zh) * 2020-06-30 2020-10-16 苏州精濑光电有限公司 一种调节机构及检测设备
CN213001464U (zh) * 2020-08-03 2021-04-20 上海森帝润滑技术有限公司 一种被清洗物角度可调的清洗装置
CN215371962U (zh) * 2021-07-16 2021-12-31 上海市计量测试技术研究院 一种角度调节支架
CN114815528A (zh) * 2022-04-18 2022-07-29 成都博腾实达智能科技有限公司 一种一体化加工设备

Also Published As

Publication number Publication date
CN114815528A (zh) 2022-07-29

Similar Documents

Publication Publication Date Title
WO2023202725A1 (zh) 一体化加工设备
US11148150B2 (en) Liquid dispensing nozzle and substrate treating apparatus
CN1722373B (zh) 衬底弯月面界面及用于操作的方法
US9587322B2 (en) Wetting wave front control for reduced air entrapment during wafer entry into electroplating bath
US20090151753A1 (en) Methods for transitioning a fluid meniscus to and from surfaces of a substrate
US4753004A (en) Chip mounter
EP2067571A2 (en) Polishing apparatus and polishing method
US20180071883A1 (en) Substrate cleaning device, substrate processing apparatus, substrate cleaning method and substrate processing method
US10668591B2 (en) Substrate cleaning device, substrate processing apparatus and substrate cleaning method
JP2008093778A (ja) 板材の側辺加工装置
JP2007210043A (ja) ワークの側辺加工装置
US20220165576A1 (en) Vacuum pumping valve for semiconductor equipment and vacuum control system thereof
CN106132564B (zh) 用于旋转涂布中的缺陷控制的盖板
TWI685048B (zh) 一種低接觸晶圓翻轉系統
US7849865B2 (en) System for processing a workpiece
JP2020092252A (ja) エッジビード除去システム及び基板処理方法
JP2000015570A (ja) 研削装置
JP2018181931A (ja) 切削装置
CN107262437A (zh) 一种清洗装置
KR101036603B1 (ko) 노즐 및 이를 갖는 기판 처리 장치
US9146090B2 (en) Nozzle alignment tool for a fluid dispensing apparatus
US7040017B2 (en) Methods for making and implementing fluid delivery ring
JP6203667B2 (ja) 基板液処理装置及び基板液処理方法
WO2018091604A1 (en) Apparatus and method for cleaning a partial area of a substrate
JPH10216606A (ja) 回転式基板処理装置および基板回転保持装置ならびにその設計方法

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 23791377

Country of ref document: EP

Kind code of ref document: A1