WO2023189595A1 - 表面被覆切削工具 - Google Patents

表面被覆切削工具 Download PDF

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Publication number
WO2023189595A1
WO2023189595A1 PCT/JP2023/010052 JP2023010052W WO2023189595A1 WO 2023189595 A1 WO2023189595 A1 WO 2023189595A1 JP 2023010052 W JP2023010052 W JP 2023010052W WO 2023189595 A1 WO2023189595 A1 WO 2023189595A1
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Prior art keywords
layer
cutting tool
coated cutting
composite carbonitride
tivzrnb
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PCT/JP2023/010052
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English (en)
French (fr)
Japanese (ja)
Inventor
翔 龍岡
俊介 東城
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Mitsubishi Materials Corp
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Mitsubishi Materials Corp
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Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Priority to EP23779613.1A priority Critical patent/EP4501500A4/en
Priority to CN202380029558.XA priority patent/CN119053397A/zh
Priority to JP2024511750A priority patent/JP7822549B2/ja
Priority to US18/852,365 priority patent/US20250205789A1/en
Publication of WO2023189595A1 publication Critical patent/WO2023189595A1/ja
Anticipated expiration legal-status Critical
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/36—Carbonitrides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
    • B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
    • B23B27/148—Composition of the cutting inserts
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B2224/00—Materials of tools or workpieces composed of a compound including a metal
    • B23B2224/32—Titanium carbide nitride (TiCN)
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
    • B23B2228/10—Coatings
    • B23B2228/105—Coatings with specified thickness

Definitions

  • the present invention relates to a surface-coated cutting tool (hereinafter sometimes referred to as a coated tool).
  • a coated tool This application claims priority based on Japanese Patent Application No. 2022-55518, which is a Japanese patent application filed on March 30, 2022. All contents described in the Japanese patent application are incorporated herein by reference.
  • a coated tool in which a coating layer is formed on the surface of a substrate such as a tungsten carbide (hereinafter referred to as WC)-based cemented carbide, and is known to exhibit excellent wear resistance.
  • WC tungsten carbide
  • various proposals have been made for improving the coating layer.
  • Patent Document 1 has a base and a covering layer on the base, and the covering layer has a face-centered cubic structure with a lattice constant of 0.403 to 0.455 nm (Ti x Zr 1-x ).
  • (C y N 1-y ) (0.4 ⁇ x ⁇ 0.95, 0.2 ⁇ y ⁇ 0.9) or has a face-centered cubic structure with a lattice constant of 0.430 to 0.450 nm (Ti x
  • the coating layer is hard and wear-resistant. It is said to have a sexual nature.
  • Patent Document 2 a Ti 1-x Me x nitride (0.1 ⁇ x ⁇ 0.9, Me is A coated tool (insert) coated with one or more of Zr and Hf is described, and the coating layer of the coated tool is said to be hard and suitable for dry cutting of stainless steel.
  • Patent No. 4028891 US Patent Application Publication No. 2016/0298233
  • the present invention has been made in view of the above circumstances and the above proposals, and an object of the present invention is to provide a coated tool having a coating layer with high hardness and improved toughness.
  • the surface-coated cutting tool includes: having a base and a coating layer on the surface of the base,
  • the coating layer has a composite carbonitride layer,
  • the composite carbonitride layer has an average thickness of 1.0 ⁇ m or more and 20.0 ⁇ m or less,
  • the metal components Ti, V, Zr, and Nb are respectively a 1 , a 2 , a 3 , and the atomic ratio of the metal components a 1 , a 2 , a 3 , Contains in a 4
  • the nonmetallic components C and N are contained at b 1 and b 2 , respectively, which are the atomic ratios of the nonmetallic components, Furthermore, it contains unavoidable impurities,
  • the a 1 , a 2 , a 3 , a 4 , b 1 , b 2 are, 0.01 ⁇ a1 ⁇ 0.60 0.01 ⁇
  • the surface-coated cutting tool according to the embodiment may satisfy at least one of the following items (1) and (2).
  • the composite carbonitride layer further contains at least one of Hf and Ta as the metal component in an atomic ratio of a 5 and a 6 ,
  • the composite carbonitride layer contains 0.50 atomic % or less of Cl.
  • the coating layer has high hardness and high toughness.
  • a schematic diagram of the crystal structure of TiN is shown.
  • a schematic diagram of the crystal structure of (TiVZrNb) (CN) or (TiVZrNbHfTa) (CN) is shown.
  • the present inventor has achieved both high hardness and high toughness, which are in a trade-off relationship that could not be achieved with conventional coating layers, by increasing the mixing entropy of the solid solution (alloy) that constitutes the coating layer of coated tools.
  • a composite carbonitride layer with a specific composition is composed of multiple types of atoms with different atomic radii, which causes strain within the crystal grains and improves hardness and toughness;
  • the thermal stability and oxidation resistance of the composite carbonitride layer at high temperatures are improved; We obtained the following knowledge.
  • TiVZrNb (CN) Layer (1) Crystal Structure (TiVZrNb) (CN) has an arrangement of atoms as shown in FIG. That is, Ti, V, Zr, and Nb atoms, each having a different atomic radius, are present at the cation site (4), and C and N atoms are randomly mixed with each other at the anion site (2, 3) without regularity. Together, they form a crystal lattice. In this crystal lattice, each atom is displaced from its ideal lattice point position compared to the TiN crystal structure (Ti atom (1), N atom (2)) schematically shown in Figure 1. . This creates strain in the crystal lattice (indicated by the deviation from the dotted line in FIG. 2), which improves hardness and toughness. In addition, in FIG. 2, the amount of displacement of each atom is also schematically shown.
  • the average thickness of the (TiVZrNb) (CN) layer which is a composite carbonitride layer, is preferably 1.0 ⁇ m or more and 20.0 ⁇ m or less. The reason for this is that if the average thickness is less than 1.0 ⁇ m, the average thickness of the (TiVZrNb)(CN) layer is too small to ensure sufficient durability, whereas if the average thickness exceeds 20.0 ⁇ m, This is because the crystal grains of the (TiVZrNb)(CN) layer tend to become coarser and chipping tends to occur.
  • the average thickness of the (TiVZrNb)(CN) layer is more preferably 3.0 ⁇ m or more and 16.0 ⁇ m or less.
  • the entropy of mixing the (TiVZrNb)(CN) layer is increased, and this (TiVZrNb)(CN)
  • the layer has the physical properties (i) to (ii) obtained from the above findings.
  • a 1 , a 2 , a 3 , a 4 , b 1 , and b 2 are determined so that S config becomes larger.
  • the calculated upper limit of S config is 1.04R.
  • Cl Containing Cl If a film is formed by a CVD method using chloride as a raw material gas, Cl will inevitably be contained in a very small amount (an amount whose presence can be confirmed by analysis by detecting a single element of chlorine only). If the Cl content is 0.50 atomic % or less, the (TiVZrNb)(CN) layer has lubricity due to Cl.
  • the content of Cl (atomic %) is the proportion of all atoms of Ti, V, Zr, Nb, C, N, and Cl.
  • the (TiVZrNb) (CN) layer preferably has crystal grains with a NaCl-type face-centered cubic structure.
  • crystal grains other than the NaCl type face-centered cubic structure may be contained, the presence of crystal grains other than the NaCl type face-centered cubic structure is not intended.
  • having crystal grains with a NaCl-type face-centered cubic structure refers to crystal grains with a NaCl-type face-centered cubic structure, as well as crystal grains with an unintended NaCl-type face-centered cubic structure. This means that crystal grains may be present.
  • TiVZrNb On the top of the (CN) layer, one or more Ti compounds (with a stoichiometric composition) selected from a Ti nitride layer, a carbide layer, a carbonitride layer, and an oxide layer are added.
  • a top layer may be provided consisting of a layer (without limitation) and/or a layer of aluminum oxide (of non-limiting stoichiometric composition), the total average thickness of which is between 0.1 and 25.0 ⁇ m. Providing the upper layer improves chipping resistance and wear resistance.
  • Substrate Material Any conventionally known substrate material can be used as long as it does not impede achieving the object of the present invention.
  • WC-based cemented carbide (contains Co in addition to WC, and also includes carbides or nitrides such as Ti, Zr, Ta, Nb, and Cr), cermets (TiC, (TiN, TiCN, etc. as the main component), ceramics (titanium carbide, silicon carbide, silicon nitride, aluminum nitride, aluminum oxide), or cBN sintered body.
  • WC-based cemented carbide contains Co in addition to WC, and also includes carbides or nitrides such as Ti, Zr, Ta, Nb, and Cr), cermets (TiC, (TiN, TiCN, etc. as the main component), ceramics (titanium carbide, silicon carbide, silicon nitride, aluminum nitride, aluminum oxide), or cBN sintered body.
  • Shape There are no particular restrictions on the shape of the base as long as it can be used as a cutting tool, and examples include the shape of an insert and the shape of a solid tool.
  • the average thickness of the (TiVZrNb) (CN) layer, etc. can be determined as follows. Using a cross section polisher (CP) or the like, a sample for observing a longitudinal section of the coating layer was prepared, and the longitudinal section was observed using a scanning electron microscope (SEM). The thickness of the layer at locations (for example, 5 locations) is measured and averaged to determine the average thickness of the (TiVZrNb) (CN) layer, etc. Note that the definition of the surface of the base will be described later.
  • the vertical cross section refers to a cross section perpendicular to the surface of the base when the insert is treated as a flat surface, with minute irregularities on the surface of the base as absent.
  • the surface of the substrate is defined as the average line (straight line) of the interface roughness between the substrate and the coating layer in the observed longitudinal cross-sectional image.
  • the interface between the coating layer (if a lower layer exists, use the lower layer instead of the (TiVZrNb)(CN) layer) and the substrate is determined from the observation image of the longitudinal section, and the interface between the obtained coating layer and the substrate is determined.
  • An average line is drawn for the interface roughness curve, and this is taken as the surface of the substrate.
  • a direction perpendicular to this average line is defined as a direction perpendicular to the substrate (layer thickness direction).
  • the surface of the substrate can be determined using a similar method.
  • each element and the chlorine content of the coating layer are determined as follows. Ti, V, Zr, Nb contents a 1 , a 2 , a 3 , a 4 , C, N contents b 1 , b 2 , and chlorine content were measured using an electron probe microanalyzer (EPMA). Using a Micro Analyzer, a sample whose surface has been polished is irradiated with an electron beam from the surface side of the sample, and the average value of the 10 analysis results of the obtained characteristic X-rays is taken as the average value.
  • EPMA electron probe microanalyzer
  • the method for manufacturing the (TiVZrNb) (CN) layer of this embodiment includes, for example, TiCl 4 , ZrCl 4 , VCl 4 , NbCl 5 , H 2 , HCl, N 2 , CH 3 CN, Ar, H 2 . This can be performed by a CVD method using a gas.
  • Second Embodiment A composite carbonitride of (TiVZrNbHfTa) (sometimes expressed as (TiVZrNbHfTa) (CN)) constituting the coating layer according to the second embodiment will be described.
  • (TiVZrNbHfTa) (CN) layer (1) Crystal structure The crystal structure is defined as "(TiVZrNb) (CN)” and “Ti, V, Zr, Nb atoms” in the description of the first embodiment regarding the crystal structure. , respectively, are replaced with "(TiVZrNbHfTa)(CN)” and "Ti, V, Zr, Nb, Hf, Ta atoms (Hf and Ta are selected depending on the composition)".
  • composition of the (TiVZrNbHfTa) (CN) layer which is a composite carbonitride layer, is expressed by the formula: (Ti a1 V a2 Zr a3 Nb a4 Hf a5 Ta a6 ) (C b1 N b2 ),
  • a 1 , a 2 , a 3 , a 4 , a 5 , a 6 , b 1 and b 2 satisfy the above relationship, the entropy of mixing the (TiVZrNbHfTa)(CN) layer is increased and this
  • the (TiVZrNbHfTa) (CN) layer has the physical properties (i) to (ii) obtained from the above findings.
  • a 1 , a 2 , a 3 , a 4 , a 5 , a 6 , b 1 , and b 2 are determined so that S config becomes larger. Since the upper limits of a 5 and a 6 are both less than 0.01, the calculated upper limit of S config is 1.08R.
  • Containing Cl Containing Cl is the same as replacing “(TiVZrNb)(CN)” with “(TiVZrNbHfTa)(CN)” in the description of the first embodiment regarding the above-mentioned Cl content. That is, the content (atomic %) of Cl is the proportion of all atoms of Ti, V, Zr, Nb, Hf, Ta, C, N, and Cl.
  • Base Material The base material is the same as described in the first embodiment.
  • the method for manufacturing the (TiVZrNbHfTa) (CN) layer of this embodiment is, for example, using a gas obtained by adding HfCl 4 and TaCl 5 to the film forming gas of the first embodiment, that is, TiCl 4 , ZrCl 4 , VCl 4 . , NbCl 5 , HfCl 4 , TaCl 5 , H 2 , HCl, N 2 , CH 3 CN, Ar, and H 2 by the CVD method.
  • a surface-coated cutting tool having a base and a coating layer on the surface of the base,
  • the coating layer has a composite carbonitride layer
  • the composite carbonitride layer has an average thickness of 1.0 ⁇ m or more and 20.0 ⁇ m or less
  • the metal components Ti, V, Zr, and Nb are respectively a 1 , a 2 , a 3
  • the atomic ratio of the metal components a 1 , a 2 , a 3 Contains in a 4
  • the total atomic ratio of the nonmetallic components is 1, it contains C and N, which are nonmetallic components, at b 1 and b 2 , respectively, which are the atomic ratios of the nonmetallic components, and further contains unavoidable impurities.
  • the composite carbonitride layer further contains at least one of Hf and Ta as the metal component in an atomic ratio of a 5 and a 6 ,
  • a Ti compound layer of one or more of a Ti nitride layer, a carbide layer, a carbonitride layer, and an oxide layer is formed on the composite carbonitride layer, and the total average thickness thereof is 0.1 to 0.1.
  • Manufacture of Substrate WC powder, TiC powder, ZrC powder, TaC powder, NbC powder, Cr3C2 powder, TiN powder, and Co powder were prepared as raw material powders, and these raw material powders were mixed into the composition shown in Table 1. The mixture was blended, further wax was added, and the mixture was mixed in a ball mill for 24 hours in acetone, dried under reduced pressure, and then press-molded into a powder compact of a predetermined shape at a pressure of 98 MPa.
  • this green compact is vacuum sintered, and after sintering, the cutting edge is honed to R: 0.05 mm, and is made of WC-based cemented carbide with the insert shape of CNMG120408-MA manufactured by Mitsubishi Materials. Substrates A to C were each produced.
  • Film Formation A (TiVZrNb) (CN) layer was formed on the surfaces of the substrates A to C using a CVD apparatus to obtain Examples 1 to 10 shown in Table 5.
  • the film forming conditions were as shown in Table 2, and were generally as follows.
  • Reaction gas composition (the content of gas components is in % by volume): TiCl4 : 0.02-0.10% ZrCl4 : 0.10-0.50% VCl4 : 0.02-0.10% NbCl5 : 0.02-0.10% CH 3 CN: 0.10 to 0.50%, HCl: 0.10-0.50% N2 : 0.0-12.0% Ar: 10.0-50.0% H 2 : Residual reaction atmosphere pressure: 4.5 to 12.0 kPa Reaction atmosphere temperature: 800-950°C
  • (TiVZrNb)(CN) layers were formed on the surfaces of substrates A to C under the film forming conditions shown in Table 2 to obtain Comparative Examples 1 to 10 shown in Table 5.
  • the composition of the raw material gas was changed from that of the example.
  • the lower layer and/or upper layer shown in Table 4 were formed under the conditions shown in Table 3.
  • a TiCN layer and a lower layer, a lower layer and an upper layer as shown in Table 4 were formed on the surfaces of substrates A and C under the conditions shown in Table 3, and the conventional example shown in Table 5 1 and 2 were made.
  • Cutting test work material JIS/SCM440 Hollow round bar with two equally spaced grooves (width 20mm) (outer diameter ⁇ 180, inner diameter ⁇ 50) Cutting speed: 250m/min. Cut: 1.5mm Feed amount: 0.4mm/rev. Number of cuts: 20 passes
  • Table 6 shows the results of the cutting test.
  • the life was reached before the number of cutting passes reached 20 due to chipping or flank wear (life judgment criterion: flank wear width 0.4 mm). , indicates the number of cutting passes until the end of its life.
  • Examples 1 to 10 all had a small amount of wear, no chipping, improved hardness and toughness, and exhibited excellent cutting performance over a long period of time.
  • Comparative Examples 1 to 10 and Conventional Examples 1 to 2 all had a large amount of wear or chipping, and reached the end of their service life in a short period of time.
  • Example of second embodiment 1. Manufacturing of Substrates Substrates A to C made of WC-based cemented carbide and having the same insert shape of CNMG120408-MA manufactured by Mitsubishi Materials Corporation as in the first embodiment were manufactured.
  • Film Formation A (TiVZrNbHfTa)(CN) layer was formed on the surfaces of the substrates A to C using a CVD apparatus to obtain Examples 11 to 15 shown in Table 9.
  • the film forming conditions were as shown in Table 7, and were generally as follows.
  • Reaction gas composition (the content of gas components is in % by volume): TiCl4 : 0.02-0.10% VCl4 : 0.02-0.10% ZrCl4 : 0.10-0.50% NbCl5 : 0.02-0.10% * HfCl4 : 0.00-0.02% *TaCl 5 : 0.00-0.01% CH 3 CN: 0.10 to 0.50%, HCl: 0.10-0.50% N2 : 0.0-12.0% Ar: 10.0-50.0% H 2 :Remaining *HfCl 4 and TaCl 5 are selected depending on the composition of the (TiVZrNbHfTa)(CN) layer.
  • Reaction atmosphere pressure 4.5-12.0kPa
  • Reaction atmosphere temperature 800-950°C
  • (TiVZrNbHfTa)(CN) layers were formed on the surfaces of substrates A to C under the film forming conditions shown in Table 7 to obtain Comparative Examples 11 to 15 shown in Table 9.
  • the composition of the raw material gas was changed from that of the example.
  • the lower layer and/or upper layer shown in Table 8 were formed under the conditions shown in Table 3.
  • Cutting test work material JIS/SCM440 Hollow round bar with two equally spaced grooves (width 20mm) (outer diameter ⁇ 180, inner diameter ⁇ 50) Cutting speed: 250m/min. Cut: 1.5mm Feed amount: 0.4mm/rev. Number of cuts: 20 passes
  • Table 10 shows the results of the cutting test.
  • the life was reached before the number of cutting passes reached 20 due to chipping or flank wear (life judgment criterion: flank wear width 0.4 mm), so the Indicates the number of cutting passes.
  • Examples 11 to 15 all had a small amount of wear, no chipping, improved hardness and toughness, and exhibited excellent cutting performance over a long period of time.
  • Comparative Examples 11 to 15 all had a large amount of wear or chipping, and reached the end of their service life in a short period of time.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Vapour Deposition (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
PCT/JP2023/010052 2022-03-30 2023-03-15 表面被覆切削工具 Ceased WO2023189595A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP23779613.1A EP4501500A4 (en) 2022-03-30 2023-03-15 SURFACE COATING CUTTING TOOL
CN202380029558.XA CN119053397A (zh) 2022-03-30 2023-03-15 表面包覆切削工具
JP2024511750A JP7822549B2 (ja) 2022-03-30 2023-03-15 表面被覆切削工具
US18/852,365 US20250205789A1 (en) 2022-03-30 2023-03-15 Surface-coated cutting tool

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JP2022055518 2022-03-30

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US20160298233A1 (en) 2015-04-13 2016-10-13 Kennametal Inc. Cvd-coated article and cvd process of making the same
US20180223417A1 (en) * 2017-02-07 2018-08-09 City University Of Hong Kong High entropy alloy thin film coating and method for preparing the same
JP2019516007A (ja) * 2016-02-29 2019-06-13 サンドビック インテレクチュアル プロパティー アクティエボラーグ 代替バインダーを含む超硬合金
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