WO2023188704A1 - Électrode d'électrolyse - Google Patents
Électrode d'électrolyse Download PDFInfo
- Publication number
- WO2023188704A1 WO2023188704A1 PCT/JP2023/001109 JP2023001109W WO2023188704A1 WO 2023188704 A1 WO2023188704 A1 WO 2023188704A1 JP 2023001109 W JP2023001109 W JP 2023001109W WO 2023188704 A1 WO2023188704 A1 WO 2023188704A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- intermediate layer
- layer
- conductive substrate
- electrode
- main surface
- Prior art date
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- 238000005868 electrolysis reaction Methods 0.000 title claims abstract description 92
- 239000000758 substrate Substances 0.000 claims abstract description 127
- 239000003054 catalyst Substances 0.000 claims abstract description 125
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 90
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 35
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 claims abstract description 23
- 229910000457 iridium oxide Inorganic materials 0.000 claims abstract description 23
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910003446 platinum oxide Inorganic materials 0.000 claims abstract description 10
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 10
- 239000010936 titanium Substances 0.000 claims abstract description 10
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 58
- 229910001936 tantalum oxide Inorganic materials 0.000 claims description 55
- 239000011148 porous material Substances 0.000 claims description 16
- 230000002093 peripheral effect Effects 0.000 claims description 13
- 239000011246 composite particle Substances 0.000 claims description 9
- 229910052801 chlorine Inorganic materials 0.000 abstract description 17
- 239000000460 chlorine Substances 0.000 abstract description 17
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract description 16
- 238000000034 method Methods 0.000 description 22
- 239000000463 material Substances 0.000 description 21
- 238000010438 heat treatment Methods 0.000 description 15
- 239000000243 solution Substances 0.000 description 15
- 238000001035 drying Methods 0.000 description 13
- 239000002245 particle Substances 0.000 description 13
- 238000010304 firing Methods 0.000 description 12
- 230000008569 process Effects 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 238000000576 coating method Methods 0.000 description 10
- 150000003839 salts Chemical class 0.000 description 9
- 229910052741 iridium Inorganic materials 0.000 description 8
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 239000000203 mixture Substances 0.000 description 5
- 150000003058 platinum compounds Chemical class 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 238000007788 roughening Methods 0.000 description 4
- 229910052715 tantalum Inorganic materials 0.000 description 4
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 4
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 238000004220 aggregation Methods 0.000 description 3
- 230000002776 aggregation Effects 0.000 description 3
- 150000002504 iridium compounds Chemical class 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000001878 scanning electron micrograph Methods 0.000 description 3
- 150000003482 tantalum compounds Chemical class 0.000 description 3
- 229910001069 Ti alloy Inorganic materials 0.000 description 2
- 238000010828 elution Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- -1 titanium-aluminum-vanadium Chemical compound 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- 150000003624 transition metals Chemical class 0.000 description 2
- NGCRLFIYVFOUMZ-UHFFFAOYSA-N 2,3-dichloroquinoxaline-6-carbonyl chloride Chemical compound N1=C(Cl)C(Cl)=NC2=CC(C(=O)Cl)=CC=C21 NGCRLFIYVFOUMZ-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910001252 Pd alloy Inorganic materials 0.000 description 1
- 229910000929 Ru alloy Inorganic materials 0.000 description 1
- 229910001362 Ta alloys Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 229910000756 V alloy Inorganic materials 0.000 description 1
- YJZATOSJMRIRIW-UHFFFAOYSA-N [Ir]=O Chemical group [Ir]=O YJZATOSJMRIRIW-UHFFFAOYSA-N 0.000 description 1
- ABAGVFOSGPMBFK-UHFFFAOYSA-N [Ti].[Ni].[Ru] Chemical compound [Ti].[Ni].[Ru] ABAGVFOSGPMBFK-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- UQZIWOQVLUASCR-UHFFFAOYSA-N alumane;titanium Chemical compound [AlH3].[Ti] UQZIWOQVLUASCR-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011093 chipboard Substances 0.000 description 1
- 150000001804 chlorine Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 1
- GSNZLGXNWYUHMI-UHFFFAOYSA-N iridium(3+);trinitrate Chemical compound [Ir+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O GSNZLGXNWYUHMI-UHFFFAOYSA-N 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- HWLDNSXPUQTBOD-UHFFFAOYSA-N platinum-iridium alloy Chemical compound [Ir].[Pt] HWLDNSXPUQTBOD-UHFFFAOYSA-N 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- VSSLEOGOUUKTNN-UHFFFAOYSA-N tantalum titanium Chemical compound [Ti].[Ta] VSSLEOGOUUKTNN-UHFFFAOYSA-N 0.000 description 1
- OEIMLTQPLAGXMX-UHFFFAOYSA-I tantalum(v) chloride Chemical compound Cl[Ta](Cl)(Cl)(Cl)Cl OEIMLTQPLAGXMX-UHFFFAOYSA-I 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- DANYXEHCMQHDNX-UHFFFAOYSA-K trichloroiridium Chemical compound Cl[Ir](Cl)Cl DANYXEHCMQHDNX-UHFFFAOYSA-K 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/02—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/02—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form
- C25B11/03—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form perforated or foraminous
- C25B11/031—Porous electrodes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/052—Electrodes comprising one or more electrocatalytic coatings on a substrate
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/055—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material
- C25B11/057—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material consisting of a single element or compound
- C25B11/061—Metal or alloy
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/055—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material
- C25B11/057—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material consisting of a single element or compound
- C25B11/061—Metal or alloy
- C25B11/063—Valve metal, e.g. titanium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
Abstract
La présente invention aborde le problème de la fourniture d'une électrode d'électrolyse avec laquelle plus de chlore peut être généré et une durabilité améliorée peut être obtenue. Une électrode d'électrolyse (1) comprend un substrat conducteur (2), une couche intermédiaire (3) et une couche de catalyseur (4). Le substrat conducteur (2) contient au moins du titane. La couche intermédiaire (3) est disposée sur une première surface principale (21) du substrat conducteur (2). La couche intermédiaire (3) contient du platine. La couche de catalyseur (4) est disposée sur la couche intermédiaire (3). La couche de catalyseur (4) contient du platine et de l'oxyde d'iridium. La couche intermédiaire (3) comprend : une première couche intermédiaire (31) disposée sur la première surface principale (21) du substrat conducteur (2) ; et une seconde couche intermédiaire (32) disposée sur la première couche intermédiaire (31). La première couche intermédiaire (31) contient du platine. La seconde couche intermédiaire (32) contient du platine. La seconde couche intermédiaire (32) est une couche poreuse. La première couche intermédiaire (31) est une couche plus dense que la seconde couche intermédiaire (32).
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022054527 | 2022-03-29 | ||
| JP2022-054527 | 2022-03-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2023188704A1 true WO2023188704A1 (fr) | 2023-10-05 |
Family
ID=88200219
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2023/001109 WO2023188704A1 (fr) | 2022-03-29 | 2023-01-17 | Électrode d'électrolyse |
Country Status (1)
| Country | Link |
|---|---|
| WO (1) | WO2023188704A1 (fr) |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56166384A (en) * | 1980-05-23 | 1981-12-21 | Japan Carlit Co Ltd:The | Anode coated with lead dioxide |
| JPS58171589A (ja) * | 1982-03-31 | 1983-10-08 | Ishifuku Kinzoku Kogyo Kk | 電解用電極及びその製造方法 |
| JPS62174394A (ja) * | 1986-10-31 | 1987-07-31 | Ishifuku Kinzoku Kogyo Kk | 電解用電極の製造方法 |
| JPH02200790A (ja) * | 1989-01-30 | 1990-08-09 | Ishifuku Kinzoku Kogyo Kk | 電解用電極 |
| JP2009142733A (ja) * | 2007-12-13 | 2009-07-02 | Ebara Corp | 不溶性電極及び電気化学的液体処理装置 |
| JP2020117780A (ja) * | 2019-01-24 | 2020-08-06 | パナソニックＩｐマネジメント株式会社 | 電解用電極及び電解用電極の製造方法 |
| WO2021117311A1 (fr) * | 2019-12-13 | 2021-06-17 | パナソニックＩｐマネジメント株式会社 | Électrode d'électrolyse |
-
2023
- 2023-01-17 WO PCT/JP2023/001109 patent/WO2023188704A1/fr unknown
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56166384A (en) * | 1980-05-23 | 1981-12-21 | Japan Carlit Co Ltd:The | Anode coated with lead dioxide |
| JPS58171589A (ja) * | 1982-03-31 | 1983-10-08 | Ishifuku Kinzoku Kogyo Kk | 電解用電極及びその製造方法 |
| JPS62174394A (ja) * | 1986-10-31 | 1987-07-31 | Ishifuku Kinzoku Kogyo Kk | 電解用電極の製造方法 |
| JPH02200790A (ja) * | 1989-01-30 | 1990-08-09 | Ishifuku Kinzoku Kogyo Kk | 電解用電極 |
| JP2009142733A (ja) * | 2007-12-13 | 2009-07-02 | Ebara Corp | 不溶性電極及び電気化学的液体処理装置 |
| JP2020117780A (ja) * | 2019-01-24 | 2020-08-06 | パナソニックＩｐマネジメント株式会社 | 電解用電極及び電解用電極の製造方法 |
| WO2021117311A1 (fr) * | 2019-12-13 | 2021-06-17 | パナソニックＩｐマネジメント株式会社 | Électrode d'électrolyse |
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