WO2023171509A1 - Composition pour la réflexion des ultraviolets et son procédé de production - Google Patents

Composition pour la réflexion des ultraviolets et son procédé de production Download PDF

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Publication number
WO2023171509A1
WO2023171509A1 PCT/JP2023/007668 JP2023007668W WO2023171509A1 WO 2023171509 A1 WO2023171509 A1 WO 2023171509A1 JP 2023007668 W JP2023007668 W JP 2023007668W WO 2023171509 A1 WO2023171509 A1 WO 2023171509A1
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WO
WIPO (PCT)
Prior art keywords
mass
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volume
barium sulfate
composition
Prior art date
Application number
PCT/JP2023/007668
Other languages
English (en)
Japanese (ja)
Inventor
碧美 佐藤
仁 金子
健志 浅見
翔太 外川
Original Assignee
デンカ株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
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Application filed by デンカ株式会社 filed Critical デンカ株式会社
Publication of WO2023171509A1 publication Critical patent/WO2023171509A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/30—Sulfur-, selenium- or tellurium-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
    • C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D127/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers
    • C09D127/02—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment
    • C09D127/12—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C09D127/16—Homopolymers or copolymers of vinylidene fluoride
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D127/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers
    • C09D127/02—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment
    • C09D127/12—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C09D127/20—Homopolymers or copolymers of hexafluoropropene
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/004—Reflecting paints; Signal paints
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/61—Additives non-macromolecular inorganic

Definitions

  • the numerical range "A or more” means A and a range exceeding A.
  • the numerical range “A or less” means a range of A and less than A.
  • the upper limit or lower limit of the numerical range of one step can be arbitrarily combined with the upper limit or lower limit of the numerical range of another step.
  • the upper limit or lower limit of the numerical range may be replaced with the values shown in the experimental examples.
  • “A or B” may include either A or B, or may include both. The materials exemplified herein can be used alone or in combination of two or more, unless otherwise specified.
  • the ultraviolet reflection composition according to the present embodiment (including the ultraviolet reflection compositions according to the first embodiment and second embodiment described below; the same applies hereinafter) comprises a base material and a composition dispersed in the base material. barium sulfate particles, and the base material contains a fluororesin.
  • a high reflectance for light with a wavelength of 270 to 280 nm can be obtained as a reflectance for deep ultraviolet rays.
  • the ultraviolet reflection composition according to the present embodiment it is possible to obtain a high reflectance in a film-like ultraviolet reflection composition with an average thickness of 100 ⁇ m, and for example, it is possible to obtain a high reflectance by the evaluation method described in the Examples below.
  • a reflectance of 80% or more (preferably 85% or more, 90% or more, 95% or more, 97% or more, etc.) can be obtained.
  • the present inventors speculate as follows about the reason why high reflectance is obtained.
  • the reason is not limited to the following. That is, materials such as titanium oxide have semiconductor properties and tend to absorb light of a wavelength having energy greater than the band gap. Materials with relatively small band gaps (e.g., about 3 eV ⁇ about 400 nm), such as titanium oxide, can absorb light at wavelengths of 270-280 nm, whereas materials with relatively large band gaps (e.g., about 5 eV Barium sulfate, which has a wavelength of about 250 nm), is difficult to absorb light with a wavelength of 270 to 280 nm, so its reflectance tends to increase.
  • materials with relatively small band gaps e.g., about 3 eV ⁇ about 400 nm
  • materials with relatively large band gaps e.g., about 5 eV Barium sulfate, which has a wavelength of about 250 nm
  • the particle size D50 of barium sulfate particles is 0.4 ⁇ m or more, 0.5 ⁇ m or more, 0.6 ⁇ m or more, 0.7 ⁇ m or more, 0.8 ⁇ m or more, 0.9 ⁇ m or more, 1.0 ⁇ m or more, more than 1.0 ⁇ m, 1 .5 ⁇ m or more, 2.0 ⁇ m or more, 2.5 ⁇ m or more, 3.0 ⁇ m or more, 3.5 ⁇ m or more, 4.0 ⁇ m or more, 4.5 ⁇ m or more, or 5.0 ⁇ m or more.
  • the content of the monomer units of vinylidene fluoride may be in the following range based on the total mass of the monomer units of the fluororesin (monomer units that constitute the fluororesin; the same shall apply hereinafter).
  • the content of monomer units of vinylidene fluoride is 50% by mass or more, 60% by mass or more, 65% by mass or more, 70% by mass or more, 75% by mass or more, 80% by mass from the viewpoint of easily obtaining high reflectance.
  • the content may be 85% by mass or more, or 90% by mass or more.
  • the content of monomer units of vinylidene fluoride may be 100% by mass or less, less than 100% by mass, 95% by mass or less, or 90% by mass or less, from the viewpoint of easily obtaining a high reflectance.
  • the content of vinylidene fluoride monomer units may be 85% by mass or less, or 80% by mass or less. From these viewpoints, the content of monomer units of vinylidene fluoride is 50 to 100% by mass, 50 to 100% by mass, 60 to 95% by mass, 70 to 95% by mass, 75 to 85% by mass. , 85-95% by weight, or 80-90% by weight.
  • the base material may not contain a compound having a siloxane bond, and may not contain at least one selected from the group consisting of polysiloxane and polysiloxane derivatives.
  • the content of the compound having a siloxane bond is 100 parts by mass or less, less than 100 parts by mass, 10 parts by mass or less, 10 parts by mass with respect to 100 parts by mass of the fluororesin.
  • the amount may be less than 1 part by weight, less than 1 part by weight, less than 0.1 part by weight, less than 0.1 part by weight, less than 0.01 part by weight, or less than 0.01 part by weight.
  • the ultraviolet reflecting composition according to this embodiment may contain inorganic particles other than barium sulfate particles.
  • the base material may contain one type of organic solvent or two or more types of organic solvents.
  • the organic solvent may contain at least one selected from the group consisting of methyl ethyl ketone and N,N-dimethylformamide from the viewpoint of excellent solubility of the fluororesin.
  • the average film thickness of the ultraviolet reflection composition according to the second embodiment may be in the following range.
  • the average film thickness is 10 ⁇ m or more, 30 ⁇ m or more, 40 ⁇ m or more, 50 ⁇ m or more, 60 ⁇ m or more, 60 ⁇ m or more, 80 ⁇ m or more, 100 ⁇ m or more, 120 ⁇ m or more, 150 ⁇ m or more, 160 ⁇ m or more, 180 ⁇ m or more, 190 ⁇ m or more, or 200 ⁇ m or more. It's fine.

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

L'invention concerne une composition pour la réflexion des ultraviolets, qui comprend un matériau de base et des particules de sulfate de baryum dispersées dans le matériau de base, le matériau de base comprenant une fluororésine ; et un procédé de production de la composition pour la réflexion des ultraviolets, le procédé consistant à mélanger des particules de sulfate de baryum à un matériau de base comprenant une fluororésine.
PCT/JP2023/007668 2022-03-08 2023-03-01 Composition pour la réflexion des ultraviolets et son procédé de production WO2023171509A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022-035121 2022-03-08
JP2022035121 2022-03-08

Publications (1)

Publication Number Publication Date
WO2023171509A1 true WO2023171509A1 (fr) 2023-09-14

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PCT/JP2023/007668 WO2023171509A1 (fr) 2022-03-08 2023-03-01 Composition pour la réflexion des ultraviolets et son procédé de production

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Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04248877A (ja) * 1991-01-25 1992-09-04 Matsushita Electric Works Ltd 紫外線反射用塗料
JP2009173723A (ja) * 2008-01-23 2009-08-06 Seiki Uchiyama 紫外線反射塗料
JP2012004553A (ja) * 2010-05-17 2012-01-05 Showa Denko Kk 発光素子用実装基板、発光素子用実装基板の製造方法、発光装置及び発光装置の製造方法並びに白色樹脂組成物
WO2013115117A1 (fr) * 2012-02-03 2013-08-08 富士フイルム株式会社 Film de protection de l'arrière pour des modules de cellule solaire et module de cellule solaire
WO2014007325A1 (fr) * 2012-07-06 2014-01-09 堺化学工業株式会社 Particules composites de sulfate de baryum, composition de résine les comprenant, et leur procédé de production
CN111574732A (zh) * 2020-04-29 2020-08-25 诸暨瑞讯新材料有限公司 一种低成本辐射降温膜的制备方法
CN111808312A (zh) * 2020-09-11 2020-10-23 宁波瑞凌新能源科技有限公司 制冷薄膜
JP2021518447A (ja) * 2018-03-15 2021-08-02 ソルベイ スペシャルティ ポリマーズ イタリー エス．ピー．エー． 発光装置の構成部品のためのフルオロポリマー組成物

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04248877A (ja) * 1991-01-25 1992-09-04 Matsushita Electric Works Ltd 紫外線反射用塗料
JP2009173723A (ja) * 2008-01-23 2009-08-06 Seiki Uchiyama 紫外線反射塗料
JP2012004553A (ja) * 2010-05-17 2012-01-05 Showa Denko Kk 発光素子用実装基板、発光素子用実装基板の製造方法、発光装置及び発光装置の製造方法並びに白色樹脂組成物
WO2013115117A1 (fr) * 2012-02-03 2013-08-08 富士フイルム株式会社 Film de protection de l'arrière pour des modules de cellule solaire et module de cellule solaire
WO2014007325A1 (fr) * 2012-07-06 2014-01-09 堺化学工業株式会社 Particules composites de sulfate de baryum, composition de résine les comprenant, et leur procédé de production
JP2021518447A (ja) * 2018-03-15 2021-08-02 ソルベイ スペシャルティ ポリマーズ イタリー エス．ピー．エー． 発光装置の構成部品のためのフルオロポリマー組成物
CN111574732A (zh) * 2020-04-29 2020-08-25 诸暨瑞讯新材料有限公司 一种低成本辐射降温膜的制备方法
CN111808312A (zh) * 2020-09-11 2020-10-23 宁波瑞凌新能源科技有限公司 制冷薄膜

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