WO2023153556A1 - Preload-type probe head - Google Patents

Preload-type probe head Download PDF

Info

Publication number
WO2023153556A1
WO2023153556A1 PCT/KR2022/004443 KR2022004443W WO2023153556A1 WO 2023153556 A1 WO2023153556 A1 WO 2023153556A1 KR 2022004443 W KR2022004443 W KR 2022004443W WO 2023153556 A1 WO2023153556 A1 WO 2023153556A1
Authority
WO
WIPO (PCT)
Prior art keywords
guide film
open area
block
probe head
probe
Prior art date
Application number
PCT/KR2022/004443
Other languages
French (fr)
Korean (ko)
Inventor
안승배
주영훈
Original Assignee
(주)티에스이
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by (주)티에스이 filed Critical (주)티에스이
Publication of WO2023153556A1 publication Critical patent/WO2023153556A1/en

Links

Images

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/06711Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
    • G01R1/06733Geometry aspects
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/06705Apparatus for holding or moving single probes
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/06711Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
    • G01R1/06716Elastic
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/06711Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
    • G01R1/06755Material aspects
    • G01R1/06761Material aspects related to layers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851Testing of integrated circuits [IC]
    • G01R31/2886Features relating to contacting the IC under test, e.g. probe heads; chucks
    • G01R31/2889Interfaces, e.g. between probe and tester

Definitions

  • the present invention relates to a probe head for testing a semiconductor device, and more particularly to a preloaded probe head that alleviates the shock received by a block by forming an elastic space by introducing a guide film having an open area formed on the upper part of the block.
  • a manufacturing process of a semiconductor device includes a patterning process for manufacturing semiconductor elements, an electrical die sorting (EDS) process for electrically testing them to determine whether or not they are defective, and an assembly process for integrating each semiconductor element on a wafer. there is.
  • EDS electrical die sorting
  • the EDS process is a process of supplying an inspection current to each semiconductor element and examining an electrical signal output therefrom to determine whether or not it is defective. A probe that electrically contacts each semiconductor element to test its performance. The device is widely used.
  • probe devices include a tester that supplies test current and tests and analyzes the resulting signal, a probe card that electrically connects the test object (semiconductor device) and the tester, and the test object and the probe card. It consists of a probe (probe) that is in direct contact with the printed circuit board of the.
  • the probe is provided in a probe head structure in which a plurality of probes are accommodated and assembled to ensure stable contact while maintaining appropriate contact resistance between an object to be inspected and a probe card, and to ensure durability even during multiple tests.
  • the probe head is composed of a probe and a block in which the probe is accommodated and assembled, and the first and second ends of the probe are accommodated so as to protrude outward from the first and second surfaces of the block to form the printed circuit board.
  • the substrate and the contact terminal of the semiconductor element are electrically contacted with appropriate pressure, respectively.
  • Coupling holes are formed in the block at pitch intervals corresponding to the contact terminals of the semiconductor device to be tested, the probe is accommodated and assembled in the coupling hole, and the probe slides inside the coupling hole by a predetermined pressure during the test. formed into a structure
  • the block includes an upper plate supporting the upper side of the probe and a lower plate supporting the lower side of the probe, and the upper plate and the lower plate are spaced apart from each other by a predetermined distance to stably support the probe.
  • the probe 10 is tested while repeatedly sliding up and down inside the coupling hole 21 formed in the block 20 of the probe head.
  • a stopper 11 is formed on the upper side of the probe 10 to prevent unauthorized departure from the lower side of the coupling hole 21 .
  • the flatness of a printed circuit board is 30 ⁇ m to 50 ⁇ m, and according to this flatness, the impact applied to the block or the upper plate by the plurality of stoppers in a specific area is further increased, and the test is There is a problem in that breakage of blocks or the like in the area occurs more easily during repeated execution.
  • An object of the present invention is to provide a preloaded probe head that alleviates the shock received by a block by forming an elastic space by introducing a guide film having an open area formed on the upper part of the block.
  • the present invention provides a probe head for testing a semiconductor device, which includes a probe having a stopper, and a block having a coupling hole to which the probe is coupled, and an open area on top of the block to expose the coupling hole.
  • a guide film is formed, and the lower part of the open area is formed relatively wider than the upper part to provide an elastic space between the probe stopper and the block by the guide film.
  • the guide film is preferably formed of a single layer or a plurality of layers.
  • guide films each having an open area are stacked to expose the coupling hole on the upper part of the block, and at least one of the guide films stacked on the upper part of the block is formed of the open area. It is preferable that the size is formed larger than the size of the coupling hole.
  • the guide film includes a first guide film having a first open area including an area where the coupling hole is formed and an area where the stopper is formed, and is formed on the first guide film and includes only the area where the coupling hole is formed. It is provided with a second guide film formed with a second open area, wherein the first open area and the second open area are overlapped around the coupling hole, and the area of the first guide film on which the stopper is formed. It is preferable to provide the elastic space by the first open area including a.
  • the open area of the guide film formed on the uppermost layer from the block has an open area most similar to the size of the coupling hole.
  • the guide film is preferably formed of a plurality of combinations of the first guide film and the second guide film.
  • the second guide film preferably has a buffer part formed in an area connected to or adjacent to the second open area and formed with the stopper, and the buffer part has the second open area as a center in a first direction or in a second direction. direction, or formed by cutting in the first and second directions.
  • the buffer part may be radially formed around the second open area.
  • the size of the elastic space is equal to or greater than that of the pressing portion of the stopper.
  • the guide film is preferably formed of a polymer substrate or a coating layer of a polymer material.
  • the polymer substrate is made of polyimide, polycarbonate (PC), polyethylenenaphthalate (PEN), polyacrylate, polyvinylalcohol, polyethylene terephthalate , PET), polyethersulfone (PES), or any one or a combination of two or more may be used.
  • the open area may be formed by laser processing, and the formation of the open area is performed by layering the guide film on top of the block and then laser processing to form the bonding hole. It may be performed at the same time as the forming process, or after forming the open area by laser processing, a guide film may be post-laminated on top of the block.
  • the polymer substrate is coupled to the upper portion of the block by a fixing member, or the polymer substrate has an adhesive layer on the bonding surface so that the upper portion of the block and the polymer substrate can be adhered to each other. may be formed.
  • photoresist may be used as the polymer material, and in this case, the open area may be formed by a photopatterning process after coating photoresist on top of the block.
  • the shape of the open area may be formed to correspond to the horizontal cross-sectional shape of the probe, and may be formed in any one of a circular shape, an elliptical shape, and a polygonal shape.
  • the block is formed of a structure including an upper plate having a first coupling hole and a lower plate spaced apart from the upper plate and having a second coupling hole formed thereon, or the upper plate and the lower plate are selectively provided in plurality. It can be formed into a structure formed of.
  • the guide film is formed on the upper plate to which the pressing force of the stopper is applied, and the open area is formed corresponding to the first coupling hole.
  • the present invention relates to a probe head for testing semiconductor devices, wherein a plurality of guide films are introduced on the top of a block to form an elastic space on the top of the block corresponding to the pressing part of the probe stopper so that the block is This is to mitigate the impact.
  • a guide film which is a flexible material, is introduced into the pressing part of the stopper to first absorb the impact force caused by the stopper, and secondly to stop by providing a preload space (buffer space) by the elastic space. It is possible to absorb the impact force caused by the fur, thereby minimizing the stress applied to the probe and the block, thereby improving the durability of the probe and block.
  • the present invention provides an elastic space in the pressing part of the probe to offset the flatness of the printed circuit board or the like in contact with the upper tip of the probe, thereby mitigating the probe card assembly tolerance, and It has the effect of further improving durability.
  • the height of the block is increased, and the length of the probe tip is increased, thereby extending the overall lifespan of the probe head.
  • the present invention has an effect of prolonging the life of a product and performing a more precise test by minimizing an impact force caused by a probe stopper that may occur during a semiconductor device test process.
  • FIG. 1 A schematic diagram of a conventional probe head.
  • FIG. 2 A schematic diagram of a probe head according to an embodiment of the present invention.
  • Figure 6 A schematic diagram showing a method of laminating a guide film according to the present invention on top of a block.
  • Figure 15 A schematic diagram showing the action state between the stopper and the guide film according to an embodiment of the present invention.
  • the present invention relates to a probe head for testing semiconductor devices, in which a guide film is introduced on top of a block to form an elastic space on the top of the block corresponding to a probe stopper to mitigate the shock received by the block during semiconductor device testing.
  • the impact force caused by the probe stopper that may occur during the semiconductor device test process is minimized to prolong the life of the product and perform more precise tests.
  • FIG. 2 is a schematic view of a probe head according to an embodiment of the present invention
  • FIGS. 3 to 5 are schematic views of a probe head according to another embodiment of the present invention
  • FIG. 6 is a block diagram of a guide film according to the present invention.
  • 7 to 14 are schematic diagrams showing various embodiments of the uppermost guide film according to the present invention
  • FIG. 15 shows the action state between the stopper and the guide film according to an embodiment of the present invention. It is also a model.
  • the probe head according to the present invention in the probe head for testing semiconductor devices, includes a probe 100 on which a stopper 110 is formed and a block on which a coupling hole 210 to which the probe 100 is coupled is formed. 200, and a guide film 300 having an open area 310 is formed on the top of the block 200 to expose the coupling hole 210, and the lower part of the open area 310 is formed on the upper part. It is formed relatively wide compared to , and provides an elastic space 400 by the guide film 300 between the probe stopper 110 and the block 200 .
  • the probe head according to the present invention is largely composed of the probe 100, the block 200, and the guide film 300, and the elastic space 400 created by them.
  • the probe 100 may be any probe 100 having any shape, function, and material for testing existing semiconductor devices, and the block 200 also stably fixes the probe 100 and the probe 100
  • the block 200 of any shape that can guarantee the flow space of is also free.
  • a coupling hole 210 for coupling the probe 100 is formed in the block 200, and thousands to tens of thousands of probes 100 can be coupled to one block 200, and the coupling hole ( 210) is also formed correspondingly.
  • the coupling hole ( 210) is also formed correspondingly.
  • description will be made in each figure, focusing on a state in which one probe 100 is coupled to the block 200.
  • a stopper is generally provided on one side of the probe 100 so that the probe 100 does not leave the lower side of the coupling hole 210 of the block 200 without permission.
  • the stopper 110 may be formed at any position of the probe 100, and is generally formed adjacent to the upper tip of the probe 100.
  • An embodiment of the present invention will also be described centering on the probe 100 having the stopper 110 formed adjacent to the upper tip, and in general, the probe 100 repeatedly slides up and down inside the coupling hole 210. while the test is performed.
  • the guide film 300 according to an embodiment of the present invention is formed as a single layer, and an open area 310 is formed on the top of the block 200 so that the coupling hole 210 is exposed, and the open area 310 is formed.
  • the lower portion of the region 310 is formed relatively wider than the upper portion to provide an elastic space 400 between the probe stopper 110 and the block 200 by the guide film 300 .
  • the open area 310 of the guide film 300 is formed in a step shape, and the lower portion of the open area 310 is formed between the area where the coupling hole 210 is formed and the area where the stopper 110 is formed. Including all of them, the upper part of the open area 310 includes only the area where the coupling hole 210 is formed, and the lower part of the open area 310 is formed relatively wider than the upper part, so that the probe stopper 110 ) And the elastic space 400 is provided between the block 200.
  • an open area ( 310) are stacked, and at least one of the guide films 300 stacked on top of the block 200 has the size of the open area 310 equal to the size of the coupling hole 210. It is characterized in that it is formed larger than.
  • a guide film 300 having an open area 310 formed thereon is stacked in multiple layers to expose the coupling hole 210 on the upper part of the block 200, Since the open areas 310 have different sizes, an elastic space 400 is provided between the block 200 and the guide film 300.
  • the size of the open area 310 is larger than the size of the coupling hole 210, so that the probe stopper 110 and the block It is to provide an elastic space (400) between (200).
  • an open area 310 is formed in the guide film 300 according to the present invention so that the coupling hole 210 can be exposed, and when stacked in two or more layers, at least one open area of the guide film 300 310 is formed larger than the size of the coupling hole 210, and the elastic space 400 is formed below the pressing part of the stopper 110 (the part where the stopper 110 presses the block) to stop the stop It is to provide a preload space (buffer space) capable of absorbing the impact force caused by the fur 110.
  • a preload space buffer space
  • the size of the coupling hole 210 may correspond to the width or diameter of the coupling hole 210.
  • the open area 310 formed larger than the size of the coupling hole 210 may be expanded in the direction in which the stopper 110 is formed to form a rectangular shape
  • the open area 310 formed larger than the size of the coupling hole 210 may be formed in an elliptical shape.
  • the open area 310 formed larger than the size of the coupling hole 210 is not limited to the shape as long as it can provide an elastic space 400 in a shape extending to the lower side of the stopper 110, and the probe 100 Corresponding to the shape of the horizontal cross section of the circular, elliptical, and polygonal shapes, or formed in various shapes such as stripe fine patterns, square fine patterns, and circular fine patterns according to the shape of the pressing part of the stopper 110 It can be.
  • the size of the elastic space 400 according to the present invention is at least equal to or larger than that of the pressing portion of the stopper 110, so that a sufficient preload space can be secured.
  • the first open area when the guide film 300 is formed in two layers (FIG. 3), the first open area includes an area where the coupling hole 210 is formed and an area where the stopper 110 is formed.
  • a first guide film 320 on which 321 is formed, and a second open area 331 formed on the first guide film 320 and including only the area where the coupling hole 210 is formed is formed. It is provided as a guide film 330, and the first open area 321 and the second open area 331 are overlappingly formed around the coupling hole 210, so that the first guide film 320
  • the elastic space 400 is provided by the first open area 321 including the area where the stopper 110 is formed.
  • the first open area 321 formed in the first guide film 320 includes the area where the coupling hole 210 and the stopper 110 are formed, it is formed larger than the size of the coupling hole 210, Since the second open area 331 formed in the second guide film 330 includes only the area where the coupling hole 210 is formed, the size is the same as or similar to the size of the coupling hole 210 .
  • the open area 310 of the guide film 300 formed on the uppermost layer from the block 200 is the first guide film 320 formed on the lower layer.
  • the open area 310 of the guide film 300 formed on the uppermost layer from the block 200 is the first guide film 320 formed on the lower layer.
  • it has an open area 310 most similar to the size of the coupling hole 210 .
  • the impact force caused by the uppermost guide film 300 can be absorbed first, and the impact force caused by the stopper 110 can be absorbed secondarily by the elastic space 400.
  • the guide film 300 may include a plurality of combinations of the first guide film 320 and the second guide film 330, but is not limited thereto, and the stop Guide films 300 having open areas 310 of various shapes and sizes may be stacked in multiple layers to provide an elastic space 400 capable of absorbing the impact force of the fur 110 .
  • FIGS. 2 to 4 shows a case where the block 200 is formed in a single shape
  • the embodiment of FIG. 5 shows a case where the block 200 is composed of an upper plate 220 and a lower plate 230. is shown.
  • the block 200 according to the present invention can be implemented in various ways.
  • the block 200 according to the embodiment of FIG. 5 is formed with an upper plate 220 having a first coupling hole 221, spaced apart from the upper plate 220, and a second coupling hole 231 formed thereon.
  • a lower plate 230 may be included, or a plurality of the upper plate 220 and the lower plate 230 may be selectively formed as needed.
  • one upper plate 220 and two lower plates 230 spaced apart from each other by the space necessary for the flow of the probe 100 are shown.
  • the stopper 110 contacts and presses the top of the top plate 220, so that an elastic space 400 is formed therebetween, and the first coupling hole is formed on the top of the top plate 220.
  • the guide film 300 having the open area 310 is provided.
  • the first guide film 320 formed with the first open area 321 including the area where the first coupling hole 221 is formed and the area where the stopper 110 is formed is placed on the top of the upper plate 220.
  • the first guide film 320 is laminated, and the second guide film 330 having the second open area 331 including only the area where the first coupling hole 221 is formed is laminated on the top of the first guide film 320 .
  • the present invention can be applied to blocks 200 of various shapes, and by forming an elastic space 400 in the pressing part with the probe stopper 110, the impact force by the stopper 110 can be absorbed. do.
  • FIG. 6 shows a method of stacking the guide film 300 according to the present invention on top of the block 200, and shows the guide film 300 made of two layers as an embodiment of the present invention.
  • the block (upper plate 220) 200 has a larger (first coupling hole 221) larger than the size of the coupling hole (first coupling hole 221) 210 formed and the stopper 110
  • An upper guide film (second guide film 330) formed with an open area (second open area 331) including only the formed area is stacked so as to overlap with the coupling hole (first coupling hole 221) as a center. .
  • FIG. 7 to 14 show various embodiments of the uppermost guide film according to the present invention.
  • the second open area 331 and the buffer part 332 formed on the second guide film 330 are shown.
  • the second open area 331 is formed in a quadrangular shape.
  • the size of the coupling hole is also quadrangular.
  • the buffer part 332 may be formed in various directions, such as a first direction, a second direction, a first direction and a second direction, with the second open area 331 as the center, and if necessary, a stripe pattern or a dot pattern. , can be formed in various ways such as circular or polygonal patterns.
  • the guide film 300 according to the present invention is made of a flexible material, and when the stopper 110 presses the upper part of the guide film 300 in the elastic space 400, the wave of the guide film 300 to the periphery. Varnish (waveness) is generated, and in this case, the durability of the product is hindered.
  • the buffer part 332 is to prevent such a problem, and prevents the guide film 300 from crying, deformation, or damage.
  • FIG. 8 to 11 show a case in which the buffer part 332 is formed in a cutout shape
  • FIG. 8 shows a line-shaped buffer part 332 connected to the second open area 331
  • FIG. 9 shows the second open area ( 331)
  • FIG. 10 shows a branch-shaped buffer unit 332 connected to the second open area 331.
  • the coupling hole may also be circular.
  • the buffer part 332 is formed by extending along the circumference of the probe, with the second open area 331 as the center.
  • the buffer portion 332 may be formed by radially cutting.
  • the 15 shows an action state between the stopper 110 and the guide film 300 when the buffer unit 332 is formed, and the second centering on the buffer unit 332 by the pressing force of the stopper 110.
  • the second guide film 330 does not cry or deform even when the stopper 110 presses it.
  • the user forms the buffer part 332 of various shapes in consideration of the shape of the probe, the shape of the coupling hole, the shape of the probe stopper or the shape of the pressing part, and the degree of pressing force to form the second guide film (top layer guide film). 330 is deformed or prevented from crying.
  • the guide film according to the present invention is formed of a flexible material that can absorb impact force to some extent without being damaged by elastically flowing in and out of the elastic space 400 by the pressing force of the stopper 110. It can be implemented as a polymer substrate or a coating layer of a polymer material.
  • the polymer substrate may be any material as long as it is electrically and chemically stable, flexible, and has excellent processability.
  • the open area 310 may be formed by laser processing.
  • the formation of the open area 310 may be performed simultaneously with the process of forming the coupling hole by laser processing after the guide film is stacked on top of the block 200 .
  • a guide film may be post-laminated on top of the block 200 .
  • the formation of the open area 310 of the guide film may be performed by laminating the guide film on the block 200, that is, the top of the upper plate 220, and then processing the bonding hole by using a laser.
  • the first guide film 320 is first laminated on the top of the block 200, and the first open area 321 is formed while processing the coupling hole using a laser, and then the second guide film 330 After stacking ), the second open area 331 may be formed using a laser. If necessary, the second open area 331 of the second guide film 330 may be separately formed and then laminated on the first guide film 320 .
  • first open area 321 of the first guide film 320 by laser processing and forming the second open area 331 of the second guide film 330, respectively, they are sequentially formed. After stacking on top of the block 200 or stacking the first guide film 320 and the second guide film 330, the first open area 321 and the second open area ( 331) may be formed and stacked on top of the block 200.
  • the open area 310 of the guide film may be formed by various well-known patterning processes (wet or dry), which may be opened after the stacking layer depending on the physical properties of the guide film or the shape of the open area 310. After the formation of the region 310 or the formation of the open region 310, post-lamination may be selected and performed.
  • the polymer substrate is coupled to the top of the block 200 by a fixing member, or the polymer substrate is attached to a bonding surface so that it can be adhered between the top of the block 200 and the polymer substrate.
  • An adhesive layer may be formed.
  • the fixing member may be variously employed, such as a screw, a jig, or a clutch.
  • the effect of increasing the height of the block 200 is manifested, thereby increasing the length of the probe tip to extend the overall lifespan of the probe head. do. That is, when the probe tip is worn, the effect of extending the probe tip may be expressed by removing the guide film.
  • the guide film may be formed in two or more layers as needed.
  • the guide film according to the present invention may be formed of a coating layer of a polymer material, which uses a photoresist (PR) to coat the photoresist on top of the block 200 and then perform a photopatterning process. By doing so, a predetermined open area 310 is formed.
  • PR photoresist
  • the first guide film 320 and the second guide film 330 have different hardnesses by using different photoresists or adjusting the degree of curing by adjusting the curing time or energy during heat or ultraviolet curing. It is also possible to form a guide film having.
  • the hardness of the second guide film 330 is lower than that of the first guide film 320 so that the impact force of the stopper 110 can be better absorbed by the second guide film 330
  • the first guide film 320 may support the elastic space 400 .
  • the open area 310 may be formed by a pre-lamination or post-lamination method of a guide film on the upper part of the block 200 in combination with the aforementioned laser processing process, wet or dry etching process, and the like.
  • the present invention relates to a probe head for testing a semiconductor device, wherein a plurality of guide films are introduced on an upper portion of a block to form an elastic space on the upper portion of the block corresponding to the pressing portion of the probe stopper, thereby performing the probe head in a semiconductor device test process. This is to mitigate the impact of the block.
  • a guide film which is a flexible material, is introduced into the pressing part of the stopper to first absorb the impact force caused by the stopper, and secondly to stop by providing a preload space (buffer space) by the elastic space. It is possible to absorb the impact force caused by the fur, thereby minimizing the stress applied to the probe and the block, thereby improving the durability of the probe and block.
  • the present invention provides an elastic space in the pressing part of the probe to offset the flatness of the printed circuit board that is in contact with the upper tip of the probe, thereby alleviating the probe card assembly tolerance and durability of the probe and block. can be further improved.
  • the length of the probe tip can be increased by increasing the height of the block, thereby extending the overall lifetime of the probe head.
  • the present invention minimizes the impact force caused by the probe stopper that may occur during a semiconductor device test process, thereby prolonging the life of the product and performing a more precise test.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Geometry (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Measuring Leads Or Probes (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

The present invention relates to a probe head for testing semiconductor elements, the central technical feature being a preload-type probe head comprising: a probe having a stopper; and a block having a coupling hole into which the probe is coupled, wherein a guide film having an open area to expose the coupling hole is provided on top of the block, and a lower part under the open area is formed to be wide relative to the upper part to thus provide a flexible area, due to the guide film, between the probe stopper and the block. Accordingly, multiple guide films on top of the block form thereon flexible spaces that correspond to the pressed part of the probe stopper, thereby providing the benefit of reducing the impact received by the block during semiconductor element testing.

Description

프리로드형 프로브 헤드Preloaded Probe Head
본 발명은 반도체 소자 테스트용 프로브 헤드에 관한 것으로서, 블럭 상부에 오픈영역이 형성된 가이드 필름을 도입하여 탄성공간을 형성함으로써 블럭이 받는 충격을 완화시키는 프리로드형 프로브 헤드에 관한 것이다.The present invention relates to a probe head for testing a semiconductor device, and more particularly to a preloaded probe head that alleviates the shock received by a block by forming an elastic space by introducing a guide film having an open area formed on the upper part of the block.
일반적으로 반도체 장치의 제조 공정은 반도체 소자를 제조하는 패터닝 공정과, 이들을 전기적으로 테스트하여 불량 여부를 판별하는 EDS(Electrical Die Sorting) 공정 그리고 웨이퍼 상에 각 반도체 소자를 집적하는 조립 공정 등을 포함하고 있다.In general, a manufacturing process of a semiconductor device includes a patterning process for manufacturing semiconductor elements, an electrical die sorting (EDS) process for electrically testing them to determine whether or not they are defective, and an assembly process for integrating each semiconductor element on a wafer. there is.
상기 EDS 공정은 각 반도체 소자들에 검사 전류를 공급하여 이로부터 출력되는 전기적 신호를 검사하여 불량 여부를 판별하는 공정으로, 각 반도체 소자에 프로브(probe)를 전기적으로 접촉시켜 그 성능을 검사하는 프로브 장치가 널리 사용되고 있다.The EDS process is a process of supplying an inspection current to each semiconductor element and examining an electrical signal output therefrom to determine whether or not it is defective. A probe that electrically contacts each semiconductor element to test its performance. The device is widely used.
이러한 프로브 장치는 검사 전류를 공급하고, 그에 따른 신호를 검사하고 분석하는 테스터(tester)와, 검사대상물(반도체 소자)과 테스터를 전기적으로 연결하는 프로브 카드(probe card) 그리고, 검사대상물과 프로브 카드의 인쇄회로기판과 직접적으로 접촉되는 프로브(probe)로 구성된다.These probe devices include a tester that supplies test current and tests and analyzes the resulting signal, a probe card that electrically connects the test object (semiconductor device) and the tester, and the test object and the probe card. It consists of a probe (probe) that is in direct contact with the printed circuit board of the.
상기 프로브는 일반적으로 검사대상물과 프로브 카드와의 적절한 접촉 저항을 유지하면서 안정적인 접촉을 도모하고, 복수 회 테스트에도 내구성이 보장되도록 복수개의 프로브가 수용 조립된 프로브 헤드 구조로 제공되고 있다.In general, the probe is provided in a probe head structure in which a plurality of probes are accommodated and assembled to ensure stable contact while maintaining appropriate contact resistance between an object to be inspected and a probe card, and to ensure durability even during multiple tests.
일반적으로 상기 프로브 헤드는 프로브와, 상기 프로브가 수용 조립된 블럭으로 구성되며, 상기 프로브의 제1단부와 제2단부는 상기 블럭의 제1면과 제2면 외측으로 돌출되도록 수용되어 상기 인쇄회로기판과 반도체 소자의 접촉단자와 적절한 압력으로 각각 전기적으로 접촉되게 된다.In general, the probe head is composed of a probe and a block in which the probe is accommodated and assembled, and the first and second ends of the probe are accommodated so as to protrude outward from the first and second surfaces of the block to form the printed circuit board. The substrate and the contact terminal of the semiconductor element are electrically contacted with appropriate pressure, respectively.
상기 블럭에는 테스트하고자 하는 반도체 소자의 접촉단자에 대응되는 피치 간격으로 결합공이 형성되어, 상기 프로브가 상기 결합공에 수용 조립되며, 테스트 시에는 소정의 압력에 의해 프로브가 상기 결합공 내부에서 슬라이딩하는 구조로 형성된다.Coupling holes are formed in the block at pitch intervals corresponding to the contact terminals of the semiconductor device to be tested, the probe is accommodated and assembled in the coupling hole, and the probe slides inside the coupling hole by a predetermined pressure during the test. formed into a structure
또한 이러한 블럭은 상기 프로브 상측을 지지하는 상부 플레이트와 상기 프로브 하측을 지지하는 하부 플레이트를 포함하면서, 상기 상부 플레이트와 하부 플레이트는 상기 프로브의 안정적인 지지를 위해 일정 거리 이격된 구조로 형성된다.In addition, the block includes an upper plate supporting the upper side of the probe and a lower plate supporting the lower side of the probe, and the upper plate and the lower plate are spaced apart from each other by a predetermined distance to stably support the probe.
일반적으로 이러한 프로브(10)는 도 1에 도시한 바와 같이, 프로브 헤드의 블럭(20)에 형성된 결합공(21) 내부에서 상하로 슬라이딩을 반복하면서 테스트가 수행되게 되는데, 상기 프로브(10)가 상기 결합공(21) 하측으로 무단이탈하지 않도록 상기 프로브(10)의 상측부에 스탑퍼(stopper)(11)가 형성되어 있다.In general, as shown in FIG. 1, the probe 10 is tested while repeatedly sliding up and down inside the coupling hole 21 formed in the block 20 of the probe head. A stopper 11 is formed on the upper side of the probe 10 to prevent unauthorized departure from the lower side of the coupling hole 21 .
이 경우 테스트가 수행되는 동안 스탑퍼에 의해 그 주변의 블럭 또는 그 주변의 상부 플레이트 구조물에 지속적인 충격이 가해지게 되는데 이로 인해 프로브의 변형이나 파손 또는 블럭 등의 변형이나 파손이 초래되고 있다. 일반적으로 상기 블럭 등은 세라믹 재질로 형성되므로 상기 스탑퍼에 의한 충격으로 파손되는 경우 먼지가 발생하게 되고, 정확한 테스트 수행에 방해가 되고 있다.In this case, while the test is being performed, a continuous impact is applied to the block around it or the upper plate structure around it by the stopper, which causes deformation or breakage of the probe or deformation or breakage of the block. In general, since the block or the like is formed of a ceramic material, when it is damaged by an impact by the stopper, dust is generated, which hinders accurate test performance.
또한, 일반적으로 인쇄회로기판의 평탄도가 30㎛ ~ 50㎛로 알려져 있으며, 이러한 평탄도에 따라 특정 영역에서 복수개의 스탑퍼에 의한 블럭 또는 상부 플레이트에 가해지는 충격이 더욱 증가하게 되며, 테스트가 반복 수행되는 동안 그 영역에서의 블럭 등의 파손이 더욱 쉽게 발생하는 문제점이 있다.In addition, it is generally known that the flatness of a printed circuit board is 30 μm to 50 μm, and according to this flatness, the impact applied to the block or the upper plate by the plurality of stoppers in a specific area is further increased, and the test is There is a problem in that breakage of blocks or the like in the area occurs more easily during repeated execution.
본 발명은 상기 문제점을 해결하기 위한 도출된 것으로서, 블럭 상부에 오픈영역이 형성된 가이드 필름을 도입하여 탄성공간을 형성함으로써 블럭이 받는 충격을 완화시키는 프리로드형 프로브 헤드의 제공을 그 목적으로 한다.An object of the present invention is to provide a preloaded probe head that alleviates the shock received by a block by forming an elastic space by introducing a guide film having an open area formed on the upper part of the block.
상기 목적을 달성하기 위해 본 발명은, 반도체 소자 테스트용 프로브 헤드에 있어서, 스탑퍼가 형성된 프로브와, 상기 프로브가 결합되는 결합공이 형성된 블럭을 포함하며, 상기 블럭 상부에 상기 결합공이 노출되도록 오픈영역이 형성된 가이드 필름이 형성되며, 상기 오픈영역의 하측부는 상측부에 비해 상대적으로 넓게 형성되어, 상기 프로브 스탑퍼와 상기 블럭 사이에 상기 가이드 필름에 의한 탄성공간을 제공하는 것을 특징으로 하는 프리로드형 프로브 헤드를 기술적 요지로 한다.In order to achieve the above object, the present invention provides a probe head for testing a semiconductor device, which includes a probe having a stopper, and a block having a coupling hole to which the probe is coupled, and an open area on top of the block to expose the coupling hole. A guide film is formed, and the lower part of the open area is formed relatively wider than the upper part to provide an elastic space between the probe stopper and the block by the guide film. as the technical point.
또한, 상기 가이드 필름은, 단일층 또는 복수층으로 형성된 것이 바람직하다.In addition, the guide film is preferably formed of a single layer or a plurality of layers.
여기에서, 상기 가이드 필름이 복수층으로 형성된 경우, 상기 블럭 상부에 상기 결합공이 노출되도록 오픈영역이 각각 형성된 가이드 필름이 적층되고, 상기 블럭 상부에 적층되는 상기 가이드 필름 중 적어도 하나는 상기 오픈영역의 크기가 상기 결합공의 크기보다는 크게 형성된 것이 바람직하다.Here, when the guide film is formed in a plurality of layers, guide films each having an open area are stacked to expose the coupling hole on the upper part of the block, and at least one of the guide films stacked on the upper part of the block is formed of the open area. It is preferable that the size is formed larger than the size of the coupling hole.
또한, 상기 가이드 필름은, 상기 결합공이 형성된 영역과 상기 스탑퍼가 형성된 영역을 포함하는 제1오픈영역이 형성된 제1가이드 필름과, 상기 제1가이드 필름 상부에 형성되며, 상기 결합공이 형성된 영역만을 포함하는 제2오픈영역이 형성된 제2가이드 필름으로 구비되어, 상기 제1오픈영역과 상기 제2오픈영역이 상기 결합공을 중심으로 중첩적으로 형성되어, 상기 제1가이드 필름의 상기 스탑퍼가 형성된 영역을 포함하는 상기 제1오픈영역에 의해 상기 탄성공간을 제공하는 것이 바람직하다.In addition, the guide film includes a first guide film having a first open area including an area where the coupling hole is formed and an area where the stopper is formed, and is formed on the first guide film and includes only the area where the coupling hole is formed. It is provided with a second guide film formed with a second open area, wherein the first open area and the second open area are overlapped around the coupling hole, and the area of the first guide film on which the stopper is formed. It is preferable to provide the elastic space by the first open area including a.
또한, 상기 블럭으로부터 최상층에 형성된 상기 가이드 필름의 오픈영역은, 상기 결합공의 크기와 가장 유사한 오픈영역을 갖는 것이 바람직하다.In addition, it is preferable that the open area of the guide film formed on the uppermost layer from the block has an open area most similar to the size of the coupling hole.
또한, 상기 가이드 필름은, 상기 제1가이드 필름과, 상기 제2가이드 필름의 조합이 복수개로 형성된 것이 바람직하다.In addition, the guide film is preferably formed of a plurality of combinations of the first guide film and the second guide film.
또한, 상기 제2가이드 필름은, 상기 제2오픈영역에 연결되거나 인접하여 상기 스탑퍼가 형성된 영역으로 버퍼부가 형성된 것이 바람직하며, 상기 버퍼부는, 상기 제2오픈영역을 중심으로 제1방향 또는 제2방향, 또는 제1방향 및 제2방향으로 절개되어 형성된 것이 바람직하다. 또한, 상기 버퍼부는, 상기 제2오픈영역을 중심으로 방사형으로 형성될 수도 있다.In addition, the second guide film preferably has a buffer part formed in an area connected to or adjacent to the second open area and formed with the stopper, and the buffer part has the second open area as a center in a first direction or in a second direction. direction, or formed by cutting in the first and second directions. In addition, the buffer part may be radially formed around the second open area.
또한, 상기 탄성공간의 크기는, 상기 스탑퍼의 가압부와 크기가 같거나 크게 형성된 것이 바람직하다.In addition, it is preferable that the size of the elastic space is equal to or greater than that of the pressing portion of the stopper.
또한, 상기 가이드 필름은, 고분자 기판 또는 고분자 물질의 코팅층으로 형성된 것이 바람직하다.In addition, the guide film is preferably formed of a polymer substrate or a coating layer of a polymer material.
또한, 상기 고분자 기판은, 폴리이미드(polyimide), 폴리카보네이트(polycarbonate, PC), 폴리에틸렌나프탈레이트(Polyethylenenaphthalate, PEN), 폴리아크릴레이트(polyacrylate), 폴리비닐알콜(Polyvinylalcohol), 폴리에틸렌 테레프탈레이트(polyethylene terephthalate, PET), 폴리에테르설폰(Polyethersulfone, PES) 중 어느 하나 또는 둘 이상을 조합하여 사용할 수 있다.In addition, the polymer substrate is made of polyimide, polycarbonate (PC), polyethylenenaphthalate (PEN), polyacrylate, polyvinylalcohol, polyethylene terephthalate , PET), polyethersulfone (PES), or any one or a combination of two or more may be used.
또한, 상기 가이드 필름으로 고분자 기판이 사용되는 경우에는 레이저 가공에 의해 상기 오픈영역을 형성할 수 있으며, 상기 오픈영역의 형성은 상기 가이드 필름을 블럭 상부에 선적층시킨 후 레이저 가공에 의해 상기 결합공의 형성 공정과 동시에 수행되거나, 레이저 가공에 의해 상기 오픈영역을 형성한 후, 상기 블럭 상부에 가이드 필름을 후적층할 수 있다.In addition, when a polymer substrate is used as the guide film, the open area may be formed by laser processing, and the formation of the open area is performed by layering the guide film on top of the block and then laser processing to form the bonding hole. It may be performed at the same time as the forming process, or after forming the open area by laser processing, a guide film may be post-laminated on top of the block.
또한, 상기 가이드 필름으로 고분자 기판이 사용되는 경우에는, 상기 고분자 기판은 고정부재에 의해 상기 블럭 상부에 결합되거나, 상기 고분자 기판은 상기 블럭 상부 및 고분자 기판 간에 점착될 수 있도록 결합면에 점착층이 형성될 수도 있다.In addition, when a polymer substrate is used as the guide film, the polymer substrate is coupled to the upper portion of the block by a fixing member, or the polymer substrate has an adhesive layer on the bonding surface so that the upper portion of the block and the polymer substrate can be adhered to each other. may be formed.
또한, 상기 고분자 물질은, 포토레지스트(photo resist, PR)을 사용할 수도 있으며, 이 경우 상기 오픈영역은, 상기 블럭 상부에 포토레지스트를 코팅한 후 광패터닝 공정에 의해 형성될 수 있다.In addition, photoresist (PR) may be used as the polymer material, and in this case, the open area may be formed by a photopatterning process after coating photoresist on top of the block.
또한, 상기 오픈영역의 형상은, 상기 프로브의 수평단면 형상에 대응되게 형성될 수 있으며, 원형, 타원형 및 다각형 형상 중 어느 하나의 형상으로 형성될 수도 있다.In addition, the shape of the open area may be formed to correspond to the horizontal cross-sectional shape of the probe, and may be formed in any one of a circular shape, an elliptical shape, and a polygonal shape.
한편, 상기 블럭은, 제1결합공이 형성된 상부 플레이트와, 상기 상부 플레이트와 이격되어 형성되고, 제2결합공이 형성된 하부 플레이트를 포함하는 구조체로 형성되거나, 상기 상부 플레이트 및 상기 하부 플레이트가 선택적으로 복수개로 형성된 구조체로 형성될 수 있다.On the other hand, the block is formed of a structure including an upper plate having a first coupling hole and a lower plate spaced apart from the upper plate and having a second coupling hole formed thereon, or the upper plate and the lower plate are selectively provided in plurality. It can be formed into a structure formed of.
여기에서, 상기 가이드 필름은, 상기 스탑퍼의 가압력이 인가되는 상부 플레이트 상부에 형성되며, 상기 제1결합공에 대응하여 상기 오픈영역이 형성되게 된다.Here, the guide film is formed on the upper plate to which the pressing force of the stopper is applied, and the open area is formed corresponding to the first coupling hole.
본 발명은 반도체 소자 테스트용 프로브 헤드에 관한 것으로서, 블럭 상부에 복수개의 가이드 필름을 도입하여 상기 프로브 스탑퍼의 가압부에 대응하여 상기 블럭 상부에 탄성공간을 형성하여 반도체 소자 테스트 과정에서 상기 블럭이 받는 충격을 완화시키고자 하는 것이다.The present invention relates to a probe head for testing semiconductor devices, wherein a plurality of guide films are introduced on the top of a block to form an elastic space on the top of the block corresponding to the pressing part of the probe stopper so that the block is This is to mitigate the impact.
즉, 상기 스탑퍼의 가압부에 유연 소재인 가이드 필름을 도입하여 1차로 스탑퍼에 의한 충격력을 흡수하게 하고, 상기 탄성공간에 의한 프리로드(preload) 공간(완충 공간)을 제공하여 2차로 스탑퍼에 의한 충격력을 흡수할 수 있어, 프로브 및 블럭에 인가되는 스트레스를 최소화함으로써 프로브 및 블럭의 내구성을 형상시키도록 하는 것이다.That is, a guide film, which is a flexible material, is introduced into the pressing part of the stopper to first absorb the impact force caused by the stopper, and secondly to stop by providing a preload space (buffer space) by the elastic space. It is possible to absorb the impact force caused by the fur, thereby minimizing the stress applied to the probe and the block, thereby improving the durability of the probe and block.
또한, 본 발명은 프로브의 가압부에 탄성공간을 제공하여, 상기 프로브의 상부팁과 접촉되는 인쇄회로기판 등의 평탄도를 상쇄시킬 수 있어, 프로브 카드 조립 공차를 완화시키면서, 상기 프로브 및 블럭의 내구성을 더욱 향상시키는 효과가 있다.In addition, the present invention provides an elastic space in the pressing part of the probe to offset the flatness of the printed circuit board or the like in contact with the upper tip of the probe, thereby mitigating the probe card assembly tolerance, and It has the effect of further improving durability.
또한, 본 발명은 가이드 필름을 도입함으로써, 상기 블럭의 높이를 높이는 효과를 발현시켜, 프로브 팁의 길이를 증가시켜 프로브 헤드의 전체적인 수명을 연장시키는 효과가 있다.In addition, by introducing a guide film, the height of the block is increased, and the length of the probe tip is increased, thereby extending the overall lifespan of the probe head.
따라서, 본 발명은 반도체 소자 테스트 과정 중에 발생할 수 있는 프로브 스탑퍼에 의한 충격력을 최소화하여 제품의 수명을 연장시키고, 보다 정밀한 테스트를 수행할 수 있는 효과가 있다.Accordingly, the present invention has an effect of prolonging the life of a product and performing a more precise test by minimizing an impact force caused by a probe stopper that may occur during a semiconductor device test process.
도 1 - 종래의 프로브 헤드에 대한 모식도.1 - A schematic diagram of a conventional probe head.
도 2 - 본 발명의 일실시예에 따른 프로브 헤드에 대한 모식도.Figure 2 - A schematic diagram of a probe head according to an embodiment of the present invention.
도 3 내지 도 5 - 본 발명의 다른 실시예에 따른 프로브 헤드에 대한 모식도.3 to 5 - schematic views of a probe head according to another embodiment of the present invention.
도 6 - 본 발명에 따른 가이드 필름을 블럭 상부에 적층하는 방법을 나타낸 모식도.Figure 6 - A schematic diagram showing a method of laminating a guide film according to the present invention on top of a block.
도 7 내지 도 14 - 본 발명에 따른 최상층 가이드 필름의 다양한 실시예를 나타낸 모식도.7 to 14 - schematic diagrams showing various embodiments of the uppermost guide film according to the present invention.
도 15 - 본 발명의 실시예에 따른 스탑퍼와 가이드 필름 간의 작용 상태를 나타낸 모식도.Figure 15 - A schematic diagram showing the action state between the stopper and the guide film according to an embodiment of the present invention.
본 발명은 반도체 소자 테스트용 프로브 헤드에 관한 것으로서, 블럭 상부에 가이드 필름을 도입하여 프로브 스탑퍼에 대응하여 상기 블럭 상부에 탄성공간을 형성하여 반도체 소자 테스트 과정에서 블럭이 받는 충격을 완화시키고자 하는 것이다.The present invention relates to a probe head for testing semiconductor devices, in which a guide film is introduced on top of a block to form an elastic space on the top of the block corresponding to a probe stopper to mitigate the shock received by the block during semiconductor device testing. will be.
이에 의해 반도체 소자 테스트 과정 중에 발생할 수 있는 프로브 스탑퍼에 의한 충격력을 최소화하여 제품의 수명을 연장시키고, 보다 정밀한 테스트를 수행하도록 하는 것이다.Accordingly, the impact force caused by the probe stopper that may occur during the semiconductor device test process is minimized to prolong the life of the product and perform more precise tests.
이하에서는 첨부된 도면을 참조하여 본 발명의 실시예에 대해 상세히 설명하고자 한다. 도 2는 본 발명의 일실시예에 따른 프로브 헤드에 대한 모식도이고, 도 3 내지 도 5는 본 발명의 다른 실시예에 따른 프로브 헤드에 대한 모식도이고, 도 6은 본 발명에 따른 가이드 필름을 블럭 상부에 적층하는 방법을 나타낸 모식도이고, 도 7 내지 도 14는 본 발명에 따른 최상층 가이드 필름의 다양한 실시예를 나타낸 모식도이며, 도 15 본 발명의 실시예에 따른 스탑퍼와 가이드 필름 간의 작용 상태를 나타낸 모식도이다.Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. 2 is a schematic view of a probe head according to an embodiment of the present invention, FIGS. 3 to 5 are schematic views of a probe head according to another embodiment of the present invention, and FIG. 6 is a block diagram of a guide film according to the present invention. 7 to 14 are schematic diagrams showing various embodiments of the uppermost guide film according to the present invention, and FIG. 15 shows the action state between the stopper and the guide film according to an embodiment of the present invention. It is also a model.
도시된 바와 같이 본 발명에 따른 프로브 헤드는, 반도체 소자 테스트용 프로브 헤드에 있어서, 스탑퍼(110)가 형성된 프로브(100)와, 상기 프로브(100)가 결합되는 결합공(210)이 형성된 블럭(200)을 포함하며, 상기 블럭(200) 상부에 상기 결합공(210)이 노출되도록 오픈영역(310)이 형성된 가이드 필름(300)이 형성되며, 상기 오픈영역(310)의 하측부는 상측부에 비해 상대적으로 넓게 형성되어, 상기 프로브 스탑퍼(110)와 상기 블럭(200) 사이에 상기 가이드 필름(300)에 의한 탄성공간(400)을 제공한다.As shown, the probe head according to the present invention, in the probe head for testing semiconductor devices, includes a probe 100 on which a stopper 110 is formed and a block on which a coupling hole 210 to which the probe 100 is coupled is formed. 200, and a guide film 300 having an open area 310 is formed on the top of the block 200 to expose the coupling hole 210, and the lower part of the open area 310 is formed on the upper part. It is formed relatively wide compared to , and provides an elastic space 400 by the guide film 300 between the probe stopper 110 and the block 200 .
본 발명에 따른 프로브 헤드는 프로브(100)와 블럭(200), 그리고 가이드 필름(300) 이에 의해 생성되는 탄성공간(400)으로 크게 구성된다.The probe head according to the present invention is largely composed of the probe 100, the block 200, and the guide film 300, and the elastic space 400 created by them.
상기 프로브(100)는 기존의 반도체 소자의 테스트를 위한 어떠한 형태, 기능 및 소재를 갖는 프로브(100)도 무방하며, 상기 블럭(200) 또한 상기 프로브(100)를 안정적으로 고정시키고 프로브(100)의 유동공간을 보장할 수 있는 어떠한 형상의 블럭(200) 또한 무방하다.The probe 100 may be any probe 100 having any shape, function, and material for testing existing semiconductor devices, and the block 200 also stably fixes the probe 100 and the probe 100 The block 200 of any shape that can guarantee the flow space of is also free.
일반적으로 블럭(200)에는 프로브(100)의 결합을 위한 결합공(210)이 형성되어 있고, 프로브(100)는 수천~수만개가 하나의 블럭(200)에 결합될 수 있으며, 상기 결합공(210) 또한 이에 대응되어 형성된다. 본 발명에서는 편의상 하나의 프로브(100)가 블럭(200)에 결합된 상태를 중심으로 각 도면에서 설명하고자 한다.In general, a coupling hole 210 for coupling the probe 100 is formed in the block 200, and thousands to tens of thousands of probes 100 can be coupled to one block 200, and the coupling hole ( 210) is also formed correspondingly. In the present invention, for convenience, description will be made in each figure, focusing on a state in which one probe 100 is coupled to the block 200.
이러한 프로브(100)가 블럭(200)에 결합될 때 상기 블럭(200)의 결합공(210) 하측으로 프로브(100)가 무단이탈되지 않도록 상기 프로브(100)의 일측에는 일반적으로 스탑퍼(stopper)(110)가 형성되어 있다. 상기 스탑퍼(110)는 프로브(100)의 어느 위치에 형성되어도 무방하며, 일반적으로 프로브(100)의 상부팁 인접부에 형성된다.When the probe 100 is coupled to the block 200, a stopper is generally provided on one side of the probe 100 so that the probe 100 does not leave the lower side of the coupling hole 210 of the block 200 without permission. ) 110 is formed. The stopper 110 may be formed at any position of the probe 100, and is generally formed adjacent to the upper tip of the probe 100.
본 발명의 일실시예도 상부팁 인접부에 스탑퍼(110)가 형성된 프로브(100)를 중심으로 설명하고자 하며, 일반적으로 이러한 프로브(100)는 상기 결합공(210) 내부에서 상하로 슬라이딩을 반복하면서 테스트가 수행되게 된다.An embodiment of the present invention will also be described centering on the probe 100 having the stopper 110 formed adjacent to the upper tip, and in general, the probe 100 repeatedly slides up and down inside the coupling hole 210. while the test is performed.
도 2는 본 발명의 일실시예에 따른 가이드 필름(300)은 단일층으로 형성되고, 상기 블럭(200) 상부에 상기 결합공(210)이 노출되도록 오픈영역(310)이 형성되며, 상기 오픈영역(310)의 하측부는 상측부에 비해 상대적으로 넓게 형성되어, 상기 프로브 스탑퍼(110)와 상기 블럭(200) 사이에 상기 가이드 필름(300)에 의한 탄성공간(400)을 제공하는 것이다.2 shows that the guide film 300 according to an embodiment of the present invention is formed as a single layer, and an open area 310 is formed on the top of the block 200 so that the coupling hole 210 is exposed, and the open area 310 is formed. The lower portion of the region 310 is formed relatively wider than the upper portion to provide an elastic space 400 between the probe stopper 110 and the block 200 by the guide film 300 .
즉, 가이드 필름(300)의 오픈영역(310)이 스텝(step)형상으로 형성되며, 상기 오픈영역(310)의 하측부는 결합공(210)이 형성된 영역과 스탑퍼(110)가 형성된 영역을 모두 포함하고, 상기 오픈영역(310)의 상측부는 결합공(210)이 형성된 영역만을 포함하여, 상기 오픈영역(310)의 하측부는 상측부에 비해 상대적으로 넓게 형성되어, 상기 프로브 스탑퍼(110)와 상기 블럭(200) 사이에 탄성공간(400)을 제공하게 되는 것이다.That is, the open area 310 of the guide film 300 is formed in a step shape, and the lower portion of the open area 310 is formed between the area where the coupling hole 210 is formed and the area where the stopper 110 is formed. Including all of them, the upper part of the open area 310 includes only the area where the coupling hole 210 is formed, and the lower part of the open area 310 is formed relatively wider than the upper part, so that the probe stopper 110 ) And the elastic space 400 is provided between the block 200.
이는 오픈영역(310)의 상측부에서는 스탑퍼(110)의 가압부와 가이드 필름(300) 간의 접촉 면적을 높여 1차로 스탑퍼(110)에 의한 충격력을 가이드 필름(300)에서 먼저 흡수할 수 있도록 하고, 탄성공간(400)에 의해 2차로 스탑퍼(110)에 의한 충격력을 흡수할 수 있도록 하는 것이다.This increases the contact area between the pressing part of the stopper 110 and the guide film 300 at the upper part of the open area 310 so that the guide film 300 can first absorb the impact force caused by the stopper 110 first. And to be able to absorb the impact force by the second stopper 110 by the elastic space (400).
본 발명의 다른 실시예로 도 3 및 도 4에 도시한 바와 같이, 상기 가이드 필름(300)이 복수층으로 형성된 경우, 상기 블럭(200) 상부에 상기 결합공(210)이 노출되도록 오픈영역(310)이 각각 형성된 가이드 필름(300)이 적층되고, 상기 블럭(200) 상부에 적층되는 상기 가이드 필름(300) 중 적어도 하나는 상기 오픈영역(310)의 크기가 상기 결합공(210)의 크기보다는 크게 형성된 것을 특징으로 한다.As another embodiment of the present invention, as shown in FIGS. 3 and 4, when the guide film 300 is formed in multiple layers, an open area ( 310) are stacked, and at least one of the guide films 300 stacked on top of the block 200 has the size of the open area 310 equal to the size of the coupling hole 210. It is characterized in that it is formed larger than.
도시된 바와 같이 본 발명의 일실시예에 따른 프로브 헤드는 상기 블럭(200) 상부에 상기 결합공(210)이 노출되도록 오픈영역(310)이 형성된 가이드 필름(300)이 복수층으로 적층되고, 상기 오픈영역(310)이 서로 크기가 달라서 상기 블럭(200)과 가이드 필름(300) 사이에 탄성공간(400)이 제공되는 것을 특징으로 한다.As shown, in the probe head according to an embodiment of the present invention, a guide film 300 having an open area 310 formed thereon is stacked in multiple layers to expose the coupling hole 210 on the upper part of the block 200, Since the open areas 310 have different sizes, an elastic space 400 is provided between the block 200 and the guide film 300.
구체적으로는, 상기 복수층으로 적층되는 가이드 필름(300) 중 적어도 하나는 상기 오픈영역(310)의 크기가 상기 결합공(210)의 크기보다는 크게 형성되어 상기 프로브 스탑퍼(110)와 상기 블럭(200) 사이에 탄성공간(400)을 제공하게 되는 것이다.Specifically, in at least one of the guide films 300 stacked in multiple layers, the size of the open area 310 is larger than the size of the coupling hole 210, so that the probe stopper 110 and the block It is to provide an elastic space (400) between (200).
즉, 본 발명에 따른 가이드 필름(300)에는 상기 결합공(210)이 노출될 수 있도록 오픈영역(310)이 형성되되, 2층 이상으로 적층될 때 적어도 하나의 가이드 필름(300)의 오픈영역(310)은 상기 결합공(210)의 크기보다는 크게 형성되며, 상기 탄성공간(400)은 스탑퍼(110)의 가압부(스탑퍼(110)가 블록을 가압하는 부분) 하측으로 형성되어 스탑퍼(110)에 의한 충격력을 흡수할 수 있는 프리로드(preload) 공간(완충 공간)을 제공하는 것이다.That is, an open area 310 is formed in the guide film 300 according to the present invention so that the coupling hole 210 can be exposed, and when stacked in two or more layers, at least one open area of the guide film 300 310 is formed larger than the size of the coupling hole 210, and the elastic space 400 is formed below the pressing part of the stopper 110 (the part where the stopper 110 presses the block) to stop the stop It is to provide a preload space (buffer space) capable of absorbing the impact force caused by the fur 110.
여기에서 상기 결합공(210)은 일반적으로 프로브(100)의 수평 단면 형상에 대응되어 형성되므로, 상기 결합공(210)의 크기는 결합공(210)의 폭 또는 지름 등에 해당될 수 있다. 예컨대, 상기 결합공(210)이 정사각 형상이라고 하면 상기 결합공(210)의 크기보다 크게 형성된 상기 오픈영역(310)은 스탑퍼(110)가 형성된 방향으로 확장되어 직사각형 형상으로 형성될 수 있으며, 상기 결합공(210)이 원형이라고 하면 상기 결합공(210)의 크기보다 크게 형성된 상기 오픈영역(310)은 타원형으로 형성될 수 있다.Here, since the coupling hole 210 is generally formed to correspond to the horizontal cross-sectional shape of the probe 100, the size of the coupling hole 210 may correspond to the width or diameter of the coupling hole 210. For example, if the coupling hole 210 has a square shape, the open area 310 formed larger than the size of the coupling hole 210 may be expanded in the direction in which the stopper 110 is formed to form a rectangular shape, If the coupling hole 210 is circular, the open area 310 formed larger than the size of the coupling hole 210 may be formed in an elliptical shape.
상기 결합공(210)의 크기보다 크게 형성된 오픈영역(310)은 스탑퍼(110)의 하측으로 연장된 형상으로 탄성공간(400)을 제공할 수 있다면 그 형상에 한정되지 않고, 프로브(100)의 수평 단면의 형상에 대응되어 원형, 타원형 및 다각형 형상 중 어느 하나의 형상으로 형성되거나, 스탑퍼(110)의 가압부의 형상에 따라 스트라이프 미세 패턴, 사각 미세 패턴, 원형 미세 패턴 등 다양한 형상으로 형성될 수 있다.The open area 310 formed larger than the size of the coupling hole 210 is not limited to the shape as long as it can provide an elastic space 400 in a shape extending to the lower side of the stopper 110, and the probe 100 Corresponding to the shape of the horizontal cross section of the circular, elliptical, and polygonal shapes, or formed in various shapes such as stripe fine patterns, square fine patterns, and circular fine patterns according to the shape of the pressing part of the stopper 110 It can be.
이와 같이 본 발명에 따른 탄성공간(400)의 크기는 적어도 상기 스탑퍼(110)의 가압부와 크기가 같거나 크게 형성되어 충분한 프리로드 공간을 확보할 수 있도록 한다. In this way, the size of the elastic space 400 according to the present invention is at least equal to or larger than that of the pressing portion of the stopper 110, so that a sufficient preload space can be secured.
본 발명의 일실시예로 상기 가이드 필름(300)이 2층으로 형성된 경우(도 3), 상기 결합공(210)이 형성된 영역과 상기 스탑퍼(110)가 형성된 영역을 포함하는 제1오픈영역(321)이 형성된 제1가이드 필름(320)과, 상기 제1가이드 필름(320) 상부에 형성되며, 상기 결합공(210)이 형성된 영역만을 포함하는 제2오픈영역(331)이 형성된 제2가이드 필름(330)으로 구비되어, 상기 제1오픈영역(321)과 상기 제2오픈영역(331)이 상기 결합공(210)을 중심으로 중첩적으로 형성되어, 상기 제1가이드 필름(320)의 상기 스탑퍼(110)가 형성된 영역을 포함하는 상기 제1오픈영역(321)에 의해 상기 탄성공간(400)을 제공하게 된다.In one embodiment of the present invention, when the guide film 300 is formed in two layers (FIG. 3), the first open area includes an area where the coupling hole 210 is formed and an area where the stopper 110 is formed. A first guide film 320 on which 321 is formed, and a second open area 331 formed on the first guide film 320 and including only the area where the coupling hole 210 is formed is formed. It is provided as a guide film 330, and the first open area 321 and the second open area 331 are overlappingly formed around the coupling hole 210, so that the first guide film 320 The elastic space 400 is provided by the first open area 321 including the area where the stopper 110 is formed.
즉, 상기 제1가이드 필름(320)에 형성된 제1오픈영역(321)은 결합공(210)과 스탑퍼(110)가 형성된 영역을 포함하므로 상기 결합공(210)의 크기보다는 크게 형성되고, 상기 제2가이드 필름(330)에 형성된 제2오픈영역(331)은 결합공(210)이 형성된 영역만을 포함하므로 상기 결합공(210)의 크기와 같거나 이와 유사하게 형성된다.That is, since the first open area 321 formed in the first guide film 320 includes the area where the coupling hole 210 and the stopper 110 are formed, it is formed larger than the size of the coupling hole 210, Since the second open area 331 formed in the second guide film 330 includes only the area where the coupling hole 210 is formed, the size is the same as or similar to the size of the coupling hole 210 .
특히, 상기 블럭(200)으로부터 최상층에 형성된 상기 가이드 필름(300)의 오픈영역(310)은, 즉, 상기 제2가이드 필름(330)의 오픈영역은 아래층에 형성된 상기 제1가이드 필름(320)의 오픈영역(310)에 비해 상기 결합공(210)의 크기와 가장 유사한 오픈영역(310)을 갖게 된다.In particular, the open area 310 of the guide film 300 formed on the uppermost layer from the block 200, that is, the open area of the second guide film 330 formed on the lower layer, is the first guide film 320 formed on the lower layer. Compared to the open area 310 of , it has an open area 310 most similar to the size of the coupling hole 210 .
이는 최상층에 형성된 가이드 필름(300)에 의해 충분한 탄성공간(400)을 확보할 수 있도록 하면서, 스탑퍼(110)의 가압부와 가이드 필름(300) 간의 접촉 면적을 높여 1차로 스탑퍼(110)에 의한 충격력을 최상층의 가이드 필름(300)에서 먼저 흡수할 수 있도록 하고, 탄성공간(400)에 의해 2차로 스탑퍼(110)에 의한 충격력을 흡수할 수 있도록 하는 것이다.This allows a sufficient elastic space 400 to be secured by the guide film 300 formed on the uppermost layer, while increasing the contact area between the pressurized part of the stopper 110 and the guide film 300 to first stop the stopper 110. The impact force caused by the uppermost guide film 300 can be absorbed first, and the impact force caused by the stopper 110 can be absorbed secondarily by the elastic space 400.
이러한 가이드 필름(300)은 도 4에 도시한 바와 같이, 상기 제1가이드 필름(320)과, 상기 제2가이드 필름(330)의 조합이 복수개로 형성될 수 있으며, 이에 한정되지 않고, 상기 스탑퍼(110)의 충격력을 흡수할 수 있는 탄성공간(400)을 제공할 수 있도록 다양한 형상 및 크기의 오픈영역(310)을 갖는 가이드 필름(300)을 복수층으로 적층할 수 있다.As shown in FIG. 4, the guide film 300 may include a plurality of combinations of the first guide film 320 and the second guide film 330, but is not limited thereto, and the stop Guide films 300 having open areas 310 of various shapes and sizes may be stacked in multiple layers to provide an elastic space 400 capable of absorbing the impact force of the fur 110 .
도 2 내지 도 4에 따른 실시예는 블럭(200)이 단일 형상으로 형성된 경우를 도시한 것이고, 도 5의 실시예는 블럭(200)이 상부 플레이트(220)와 하부 플레이트(230)로 구성된 경우를 도시한 것이다. 상술한 바와 같이, 본 발명에 따른 블럭(200)은 다양하게 실시할 수 있다.The embodiment according to FIGS. 2 to 4 shows a case where the block 200 is formed in a single shape, and the embodiment of FIG. 5 shows a case where the block 200 is composed of an upper plate 220 and a lower plate 230. is shown. As described above, the block 200 according to the present invention can be implemented in various ways.
도 5의 실시예에 따른 블럭(200)은, 제1결합공(221)이 형성된 상부 플레이트(220)와, 상기 상부 플레이트(220)와 이격되어 형성되고, 제2결합공(231)이 형성된 하부 플레이트(230)를 포함하거나, 필요에 따라 상기 상부 플레이트(220) 및 상기 하부 플레이트(230)가 선택적으로 복수개 형성될 수 있다. 도면에 나타낸 본 발명의 실시예로는 상부 플레이트(220) 한개, 프로브(100)의 유동에 필요한 공간만큼 이격되게 형성된 하부 플레이트(230) 두개로 형성된 것을 나타낸 것이다.The block 200 according to the embodiment of FIG. 5 is formed with an upper plate 220 having a first coupling hole 221, spaced apart from the upper plate 220, and a second coupling hole 231 formed thereon. A lower plate 230 may be included, or a plurality of the upper plate 220 and the lower plate 230 may be selectively formed as needed. In the embodiment of the present invention shown in the drawings, one upper plate 220 and two lower plates 230 spaced apart from each other by the space necessary for the flow of the probe 100 are shown.
이 경우 상술한 바와 같이 상기 스탑퍼(110)는 상부 플레이트(220) 상부와 접촉하여 가압하게 되므로, 그 사이에 탄성공간(400)이 형성되며, 상기 상부 플레이트(220) 상부에 제1결합공(221)에 대응하여 상기 오픈영역(310)이 형성된 가이드 필름(300)을 구비한다.In this case, as described above, the stopper 110 contacts and presses the top of the top plate 220, so that an elastic space 400 is formed therebetween, and the first coupling hole is formed on the top of the top plate 220. Corresponding to (221), the guide film 300 having the open area 310 is provided.
즉, 상기 제1결합공(221)이 형성된 영역과 스탑퍼(110)가 형성된 영역을 포함하는 제1오픈영역(321)이 형성된 제1가이드 필름(320)을 상기 상부 플레이트(220) 상부에 적층하고, 상기 제1가이드 필름(320) 상부에 상기 제1결합공(221)이 형성된 영역만을 포함하는 제2오픈영역(331)이 형성된 제2가이드 필름(330)을 적층하는 것이다.That is, the first guide film 320 formed with the first open area 321 including the area where the first coupling hole 221 is formed and the area where the stopper 110 is formed is placed on the top of the upper plate 220. The first guide film 320 is laminated, and the second guide film 330 having the second open area 331 including only the area where the first coupling hole 221 is formed is laminated on the top of the first guide film 320 .
이와 같이 본 발명은 다양한 형상의 블럭(200)에 적용할 수 있으며, 프로브 스탑퍼(110)와의 가압부에 탄성공간(400)을 형성함으로써, 스탑퍼(110)에 의한 충격력을 흡수할 수 있게 된다.As such, the present invention can be applied to blocks 200 of various shapes, and by forming an elastic space 400 in the pressing part with the probe stopper 110, the impact force by the stopper 110 can be absorbed. do.
도 6은 본 발명에 따른 가이드 필름(300)을 블럭(200) 상부에 적층하는 방법을 나타낸 것으로, 본 발명의 일실시예로 2개 층으로 이루어진 가이드 필름(300)을 도시한 것이다.6 shows a method of stacking the guide film 300 according to the present invention on top of the block 200, and shows the guide film 300 made of two layers as an embodiment of the present invention.
상기 블럭(상부 플레이트(220))(200) 상부에 결합공(제1결합공(221))(210)의 크기보다는 큰(제1결합공(221)이 형성된 영역과 스탑퍼(110)가 형성된 영역을 포함) 오픈영역(제1오픈영역(321))을 갖는 하측 가이드 필름(제1가이드 필름(320))을 형성하고, 그 상부에 상기 결합공(제1결합공(221))이 형성된 영역만을 포함하는 오픈영역(제2오픈영역(331))이 형성된 상측 가이드 필름(제2가이드 필름(330))을 상기 결합공(제1결합공(221))을 중심으로 중첩되게 적층시킨다.The block (upper plate 220) 200 has a larger (first coupling hole 221) larger than the size of the coupling hole (first coupling hole 221) 210 formed and the stopper 110 A lower guide film (first guide film 320) having an open area (including the formed area) (first open area 321) is formed, and the coupling hole (first coupling hole 221) is formed on the top thereof. An upper guide film (second guide film 330) formed with an open area (second open area 331) including only the formed area is stacked so as to overlap with the coupling hole (first coupling hole 221) as a center. .
이에 의해 상기 블럭(200)의 상부면(상부 플레이트(220)의 상부면)과 상측 가이드 필름(제2가이드 필름(330))의 하측면 그리고 상기 하측 가이드 필름(제1가이드 필름(320))의 측면으로 둘러싸인 탄성공간(400)이 형성되게 된다.Accordingly, the upper surface of the block 200 (the upper surface of the upper plate 220) and the lower surface of the upper guide film (the second guide film 330) and the lower guide film (the first guide film 320) An elastic space 400 surrounded by the side of the is formed.
도 7 내지 도 14는 본 발명에 따른 최상층 가이드 필름의 다양한 실시예를 나타낸 것이다. 본 발명의 일실시예로 2개층의 가이드 필름으로 형성된 경우, 제2가이드 필름(330)에 형성된 제2오픈영역(331) 및 버퍼부(332)를 도시한 것이다.7 to 14 show various embodiments of the uppermost guide film according to the present invention. In the case of forming a two-layer guide film according to an embodiment of the present invention, the second open area 331 and the buffer part 332 formed on the second guide film 330 are shown.
도 7은 상기 제2오픈영역(331)이 사각형으로 형성된 것으로서, 일반적으로 프로브의 수평 단면의 형상이 사각형인 경우, 결합공의 크기도 사각형인 경우이다.7 shows that the second open area 331 is formed in a quadrangular shape. In general, when the shape of the horizontal section of the probe is quadrangular, the size of the coupling hole is also quadrangular.
도 8 내지 도 10은 상기 제2오픈영역(331)이 사각형으로 형성되고, 상기 제2오픈영역(331)에 연결되거나 인접하여 상기 스탑퍼가 형성된 영역으로 버퍼부(332)가 형성된 것을 도시한 것이다. 상기 버퍼부(332)는 상기 제2오픈영역(331)을 중심으로 제1방향 또는 제2방향, 제1방향 및 제2방향 등 다양한 방향으로 형성될 수 있으며, 필요에 따라 스트라이프 패턴, 점 패턴, 원형 또는 다각 패턴 등 다양하게 형성될 수 있다.8 to 10 show that the second open area 331 is formed in a rectangular shape, and the buffer part 332 is formed as an area connected to or adjacent to the second open area 331 and where the stopper is formed. . The buffer part 332 may be formed in various directions, such as a first direction, a second direction, a first direction and a second direction, with the second open area 331 as the center, and if necessary, a stripe pattern or a dot pattern. , can be formed in various ways such as circular or polygonal patterns.
본 발명에 따른 가이드 필름(300)은 유연한 소재로 형성된 것으로, 상기 스탑퍼(110)가 탄성공간(400) 상측의 가이드 필름(300) 부분을 가압하는 경우 그 주변부로 가이드 필름(300)의 웨이브니스(waveness)가 발생하게 되는데, 이 경우 제품의 내구성의 지장을 초래하게 된다. 상기 버퍼부(332)는 이러한 문제점을 방지하기 위한 것으로서, 상기 가이드 필름(300)이 울거나 변형, 파손되는 것을 방지하게 된다.The guide film 300 according to the present invention is made of a flexible material, and when the stopper 110 presses the upper part of the guide film 300 in the elastic space 400, the wave of the guide film 300 to the periphery. Varnish (waveness) is generated, and in this case, the durability of the product is hindered. The buffer part 332 is to prevent such a problem, and prevents the guide film 300 from crying, deformation, or damage.
도 8 내지 도 11은 버퍼부(332)가 절개된 형태로 형성된 경우로서, 도 8은 상기 제2오픈영역(331)에 연결되는 일자형 버퍼부(332), 도 9는 상기 제2오픈영역(331)에 연결되는 T자형 버퍼부(332), 도 10은 상기 제2오픈영역(331)에 연결되는 브랜치형(branch) 버퍼부(332)를 나타낸 것이다.8 to 11 show a case in which the buffer part 332 is formed in a cutout shape, FIG. 8 shows a line-shaped buffer part 332 connected to the second open area 331, and FIG. 9 shows the second open area ( 331), and FIG. 10 shows a branch-shaped buffer unit 332 connected to the second open area 331.
도 11은 일반적으로 프로브가 원형인 경우, 결합공 또한 원형이 될 수 있으며, 이 경우 버퍼부(332)가 상기 프로브의 둘레를 따라 확장되어 형성되는 것으로, 상기 제2오픈영역(331)을 중심으로 상기 버퍼부(332)가 방사형으로 절개되어 형성될 수 있다.11 shows that when the probe is generally circular, the coupling hole may also be circular. In this case, the buffer part 332 is formed by extending along the circumference of the probe, with the second open area 331 as the center. Thus, the buffer portion 332 may be formed by radially cutting.
도 12 내지 도 14는 프로브가 사각형인 경우, 상기 버퍼부(332)가 외팔보 형태로 구현된 것으로서, 스탑퍼의 가압력을 보다 효율적으로 분산시켜, 가이드 필름(300)이 울거나 변형, 파손되는 것을 방지하게 된다.12 to 14 show that the buffer unit 332 is implemented in a cantilever shape when the probe is rectangular, and the pressing force of the stopper is more efficiently distributed to prevent the guide film 300 from crying, deforming or breaking. will prevent
도 15는 버퍼부(332)가 형성된 경우, 스탑퍼(110)와 가이드 필름(300) 간의 작용 상태를 나타낸 것으로서, 스탑퍼(110)의 가압력에 의해 상기 버퍼부(332)를 중심으로 제2가이드 필름(330)이 벌어지면서 굽혀지게 되어, 스탑퍼(110)의 가압력에도 상기 제2가이드 필름(330)은 울거나 변형되지 않게 된다.15 shows an action state between the stopper 110 and the guide film 300 when the buffer unit 332 is formed, and the second centering on the buffer unit 332 by the pressing force of the stopper 110. As the guide film 330 opens and bends, the second guide film 330 does not cry or deform even when the stopper 110 presses it.
이와 같이 사용자는 프로브의 형상, 결합공의 형상, 프로브 스탑퍼의 형상이나 가압부의 형상, 가압력 정도를 고려하여 다양한 형상의 버퍼부(332)를 형성하여 상기 제2가이드 필름(최상층의 가이드 필름)(330)이 변형되거나 우는 것을 방지하게 된다.In this way, the user forms the buffer part 332 of various shapes in consideration of the shape of the probe, the shape of the coupling hole, the shape of the probe stopper or the shape of the pressing part, and the degree of pressing force to form the second guide film (top layer guide film). 330 is deformed or prevented from crying.
한편, 본 발명에 따른 가이드 필름은 스탑퍼(110)의 가압력에 의해서 탄성공간(400) 내외부로 탄성적으로 유동되어 파손되지 않으면서, 충격력을 어느 정도 흡수할 수 있는 유연소재로 형성되며, 구체적으로는 고분자 기판이나 고분자 물질의 코팅층으로 구현될 수 있다.On the other hand, the guide film according to the present invention is formed of a flexible material that can absorb impact force to some extent without being damaged by elastically flowing in and out of the elastic space 400 by the pressing force of the stopper 110. It can be implemented as a polymer substrate or a coating layer of a polymer material.
상기 고분자 기판은, 전기, 화학적으로 안정적이고 유연하면서, 가공성이 우수한 소재이면 어떠한 것을 사용하여도 무방하며, 본 발명의 일실시예로 폴리이미드(polyimide), 폴리카보네이트(polycarbonate, PC), 폴리에틸렌나프탈레이트(Polyethylenenaphthalate, PEN), 폴리아크릴레이트(polyacrylate), 폴리비닐알콜(Polyvinylalcohol), 폴리에틸렌 테레프탈레이트(polyethylene terephthalate, PET), 폴리에테르설폰(Polyethersulfone, PES) 중 어느 하나 또는 둘 이상을 조합하여 사용하는 것이 바람직하다.The polymer substrate may be any material as long as it is electrically and chemically stable, flexible, and has excellent processability. In one embodiment of the present invention, polyimide, polycarbonate (PC), polyethylene or Polyethylenenaphthalate (PEN), polyacrylate, polyvinylalcohol, polyethylene terephthalate (PET), polyethersulfone (PES), or a combination of two or more it is desirable
상기 가이드 필름으로 고분자 기판이 사용되는 경우에는 레이저 가공에 의해 상기 오픈영역(310)을 형성할 수 있다.When a polymer substrate is used as the guide film, the open area 310 may be formed by laser processing.
상기 오픈영역(310)의 형성은 상기 가이드 필름을 블럭(200) 상부에 선적층시킨 후 레이저 가공에 의해 상기 결합공의 형성 공정과 동시에 수행될 수 있다. 또한, 레이저 가공에 의해 상기 오픈영역(310)을 형성한 후, 상기 블럭(200) 상부에 가이드 필름을 후적층할 수도 있다.The formation of the open area 310 may be performed simultaneously with the process of forming the coupling hole by laser processing after the guide film is stacked on top of the block 200 . In addition, after forming the open area 310 by laser processing, a guide film may be post-laminated on top of the block 200 .
상기 가이드 필름의 오픈영역(310)의 형성은 블럭(200) 즉, 상기 상부 플레이트(220) 상부에 가이드 필름을 적층시킨 후 레이저를 이용하여 상기 결합공 가공과 동시에 수행할 수 있다. 이 경우, 제1가이드 필름(320)을 먼저 블럭(200) 상부에 적층하고, 레이저를 이용하여 결합공의 가공을 하면서 제1오픈영역(321)을 형성하고, 그 후 제2가이드 필름(330)을 적층한 후 레이저를 이용하여 제2오픈영역(331)을 형성할 수 있다. 필요에 따라 제2가이드 필름(330)의 제2오픈영역(331)의 형성은 별개로 진행한 후 상기 제1가이드 필름(320) 상에 적층할 수도 있다. The formation of the open area 310 of the guide film may be performed by laminating the guide film on the block 200, that is, the top of the upper plate 220, and then processing the bonding hole by using a laser. In this case, the first guide film 320 is first laminated on the top of the block 200, and the first open area 321 is formed while processing the coupling hole using a laser, and then the second guide film 330 After stacking ), the second open area 331 may be formed using a laser. If necessary, the second open area 331 of the second guide film 330 may be separately formed and then laminated on the first guide film 320 .
또한, 레이저 가공에 의해 상기 제1가이드 필름(320)의 제1오픈영역(321)을 형성하고, 상기 제2가이드 필름(330)의 제2오픈영역(331)을 각각 형성한 후, 이를 순차적으로 상기 블럭(200) 상부에 적층하거나, 또는 제1가이드 필름(320)과 제2가이드 필름(330)을 적층한 후, 동시에 패터닝 공정과 함께 제1오픈영역(321)과 제2오픈영역(331)을 형성한 후 이를 상기 블럭(200) 상부에 적층할 수도 있다.In addition, after forming the first open area 321 of the first guide film 320 by laser processing and forming the second open area 331 of the second guide film 330, respectively, they are sequentially formed. After stacking on top of the block 200 or stacking the first guide film 320 and the second guide film 330, the first open area 321 and the second open area ( 331) may be formed and stacked on top of the block 200.
또한, 상기 가이드 필름의 오픈영역(310)의 형성은 공지된 다양한 패터닝 공정(습식 또는 건식)에 의해 형성될 수 있으며, 이는 가이드 필름의 물성이나 오픈영역(310)의 형상 등에 따라 선적층 후 오픈영역(310)의 형성 또는 오픈영역(310)의 형성 후 후적층 등의 방법을 선택하여 수행할 수 있다.In addition, the open area 310 of the guide film may be formed by various well-known patterning processes (wet or dry), which may be opened after the stacking layer depending on the physical properties of the guide film or the shape of the open area 310. After the formation of the region 310 or the formation of the open region 310, post-lamination may be selected and performed.
이러한 가이드 필름으로 고분자 기판이 사용되는 경우에는 상기 고분자 기판은 고정부재에 의해 상기 블럭(200) 상부에 결합되거나, 상기 고분자 기판은 상기 블럭(200) 상부 및 고분자 기판 간에 점착될 수 있도록 결합면에 점착층이 형성될 수도 있다.When a polymer substrate is used as such a guide film, the polymer substrate is coupled to the top of the block 200 by a fixing member, or the polymer substrate is attached to a bonding surface so that it can be adhered between the top of the block 200 and the polymer substrate. An adhesive layer may be formed.
즉, 필요에 따라 가이드 필름의 적층, 결합, 제거 및 교체가 용이하도록 고정부재에 의해 상기 블럭(200)과 결합되거나, 점착층을 이용하여 점착 고정되도록 한다. 상기 고정부재는 나사(screw), 지그(zig), 클러치(clutch) 등 다양하게 채용될 수 있다.That is, it is combined with the block 200 by a fixing member or adhesively fixed by using an adhesive layer so that the guide film can be easily laminated, combined, removed, and replaced as needed. The fixing member may be variously employed, such as a screw, a jig, or a clutch.
반도체 소자 테스트용 프로브 헤드에 본 발명에 따른 가이드 필름을 도입함으로써, 상기 블럭(200)의 높이를 높이는 효과가 발현되고, 이에 의해 프로브 팁의 길이를 증가시켜 프로브 헤드의 전체적인 수명을 연장시킬 수 있게 된다. 즉, 프로브 팁이 마모되는 경우, 상기 가이드 필름을 제거하여 프로브 팁이 연장되는 효과를 발현시킬 수 있다. 이 경우 필요에 따라 가이드 필름을 2층 이상으로 형성할 수 있다.By introducing the guide film according to the present invention to the probe head for testing semiconductor devices, the effect of increasing the height of the block 200 is manifested, thereby increasing the length of the probe tip to extend the overall lifespan of the probe head. do. That is, when the probe tip is worn, the effect of extending the probe tip may be expressed by removing the guide film. In this case, the guide film may be formed in two or more layers as needed.
또한, 본 발명에 따른 가이드 필름은 고분자 물질의 코팅층으로 형성될 수 있으며, 이는 포토레지스트(photo resist, PR)을 사용하여, 상기 블럭(200) 상부에 포토레지스트를 코팅한 후 광패터닝 공정을 수행함으로써, 소정의 오픈영역(310)을 형성하는 것이다.In addition, the guide film according to the present invention may be formed of a coating layer of a polymer material, which uses a photoresist (PR) to coat the photoresist on top of the block 200 and then perform a photopatterning process. By doing so, a predetermined open area 310 is formed.
이 경우, 상기 제1가이드 필름(320)과 제2가이드 필름(330)은 서로 다른 포토레지스트를 사용하거나, 열 또는 자외선 경화시 경화 시간 또는 에너지 등을 조절하여 경화정도를 조절함으로써, 서로 다른 경도를 갖는 가이드 필름을 형성할 수도 있다.In this case, the first guide film 320 and the second guide film 330 have different hardnesses by using different photoresists or adjusting the degree of curing by adjusting the curing time or energy during heat or ultraviolet curing. It is also possible to form a guide film having.
예컨대, 제1가이드 필름(320)보다 제2가이드 필름(330)의 경도가 더 낮도록 하여, 상기 제2가이드 필름(330)에 의해서는 스탑퍼(110)의 충격력을 보다 잘 흡수할 수 있도록 하고, 상기 제1가이드 필름(320)은 탄성공간(400)을 지지할 수 있도록 할 수도 있다.For example, the hardness of the second guide film 330 is lower than that of the first guide film 320 so that the impact force of the stopper 110 can be better absorbed by the second guide film 330 And, the first guide film 320 may support the elastic space 400 .
필요에 따라 상술한 레이저 가공 공정, 습식 또는 건식 식각 공정 등과 조합하여 상기 블럭(200) 상부에 가이드 필름의 선적층, 또는 후적층의 방법으로 오픈영역(310)을 형성할 수 있다.If necessary, the open area 310 may be formed by a pre-lamination or post-lamination method of a guide film on the upper part of the block 200 in combination with the aforementioned laser processing process, wet or dry etching process, and the like.
이와 같이 본 발명은 반도체 소자 테스트용 프로브 헤드에 관한 것으로서, 블럭 상부에 복수개의 가이드 필름을 도입하여 상기 프로브 스탑퍼의 가압부에 대응하여 상기 블럭 상부에 탄성공간을 형성하여 반도체 소자 테스트 과정에서 상기 블럭이 받는 충격을 완화시키고자 하는 것이다.As described above, the present invention relates to a probe head for testing a semiconductor device, wherein a plurality of guide films are introduced on an upper portion of a block to form an elastic space on the upper portion of the block corresponding to the pressing portion of the probe stopper, thereby performing the probe head in a semiconductor device test process. This is to mitigate the impact of the block.
즉, 상기 스탑퍼의 가압부에 유연 소재인 가이드 필름을 도입하여 1차로 스탑퍼에 의한 충격력을 흡수하게 하고, 상기 탄성공간에 의한 프리로드(preload) 공간(완충 공간)을 제공하여 2차로 스탑퍼에 의한 충격력을 흡수할 수 있어, 프로브 및 블럭에 인가되는 스트레스를 최소화함으로써 프로브 및 블럭의 내구성을 형상시키도록 하는 것이다.That is, a guide film, which is a flexible material, is introduced into the pressing part of the stopper to first absorb the impact force caused by the stopper, and secondly to stop by providing a preload space (buffer space) by the elastic space. It is possible to absorb the impact force caused by the fur, thereby minimizing the stress applied to the probe and the block, thereby improving the durability of the probe and block.
또한 본 발명은 프로브의 가압부에 탄성공간을 제공하여, 상기 프로브의 상부팁과 접촉되는 인쇄회로기판 등의 평탄도를 상쇄시킬 수 있어, 프로브 카드 조립 공차를 완화시키면서, 상기 프로브 및 블럭의 내구성을 더욱 향상시킬 수 있게 된다.In addition, the present invention provides an elastic space in the pressing part of the probe to offset the flatness of the printed circuit board that is in contact with the upper tip of the probe, thereby alleviating the probe card assembly tolerance and durability of the probe and block. can be further improved.
또한, 본 발명은 가이드 필름을 도입함으로써, 상기 블럭의 높이를 높이는 효과를 발현시켜, 프로브 팁의 길이를 증가시켜 프로브 헤드의 전체적인 수명을 연장시킬 수 있게 된다.In addition, by introducing a guide film, the length of the probe tip can be increased by increasing the height of the block, thereby extending the overall lifetime of the probe head.
따라서, 본 발명은 반도체 소자 테스트 과정 중에 발생할 수 있는 프로브 스탑퍼에 의한 충격력을 최소화하여 제품의 수명을 연장시키고, 보다 정밀한 테스트를 수행할 수 있게 된다.Accordingly, the present invention minimizes the impact force caused by the probe stopper that may occur during a semiconductor device test process, thereby prolonging the life of the product and performing a more precise test.

Claims (21)

  1. 반도체 소자 테스트용 프로브 헤드에 있어서,In the probe head for testing semiconductor devices,
    스탑퍼가 형성된 프로브;a probe with a stopper;
    상기 프로브가 결합되는 결합공이 형성된 블럭;을 포함하며,Including; a block formed with a coupling hole to which the probe is coupled,
    상기 블럭 상부에 상기 결합공이 노출되도록 오픈영역이 형성된 가이드 필름이 형성되며,A guide film having an open area is formed on the top of the block to expose the coupling hole,
    상기 오픈영역의 하측부는 상측부에 비해 상대적으로 넓게 형성되어, 상기 프로브 스탑퍼와 상기 블럭 사이에 상기 가이드 필름에 의한 탄성공간을 제공하는 것을 특징으로 하는 프리로드형 프로브 헤드.The preloaded probe head of claim 1, wherein the lower portion of the open area is formed relatively wider than the upper portion to provide an elastic space between the probe stopper and the block by the guide film.
  2. 제1항에 있어서, 상기 가이드 필름은,The method of claim 1, wherein the guide film,
    단일층 또는 복수층으로 형성된 것을 특징으로 하는 프리로드형 프로브 헤드.A preloaded probe head characterized in that it is formed of a single layer or multiple layers.
  3. 제2항에 있어서, 상기 가이드 필름이 복수층으로 형성된 경우,The method of claim 2, when the guide film is formed of a plurality of layers,
    상기 블럭 상부에 상기 결합공이 노출되도록 오픈영역이 각각 형성된 가이드 필름이 적층되고,Guide films each formed with an open area are laminated on the top of the block to expose the coupling hole,
    상기 블럭 상부에 적층되는 상기 가이드 필름 중 적어도 하나는 상기 오픈영역의 크기가 상기 결합공의 크기보다는 크게 형성된 것을 특징으로 하는 프리로드형 프로브 헤드.The preloaded probe head of claim 1, wherein the size of the open area of at least one of the guide films stacked on the upper part of the block is larger than the size of the coupling hole.
  4. 제3항에 있어서, 상기 가이드 필름은,The method of claim 3, wherein the guide film,
    상기 결합공이 형성된 영역과 상기 스탑퍼가 형성된 영역을 포함하는 제1오픈영역이 형성된 제1가이드 필름과,A first guide film having a first open area including an area where the coupling hole is formed and an area where the stopper is formed;
    상기 제1가이드 필름 상부에 형성되며, 상기 결합공이 형성된 영역만을 포함하는 제2오픈영역이 형성된 제2가이드 필름으로 구비되어,It is formed on the first guide film and is provided with a second guide film having a second open area including only the area where the coupling hole is formed,
    상기 제1오픈영역과 상기 제2오픈영역이 상기 결합공을 중심으로 중첩적으로 형성되어, 상기 제1가이드 필름의 상기 스탑퍼가 형성된 영역을 포함하는 상기 제1오픈영역에 의해 상기 탄성공간을 제공하는 것을 특징으로 하는 프리로드형 프로브 헤드.The first open area and the second open area are overlapped around the coupling hole, and the elastic space is provided by the first open area including the area where the stopper of the first guide film is formed. A preloaded probe head, characterized in that.
  5. 제3항에 있어서, 상기 블럭으로부터 최상층에 형성된 상기 가이드 필름의 오픈영역은,The method of claim 3, wherein the open area of the guide film formed on the uppermost layer from the block,
    상기 결합공의 크기와 가장 유사한 오픈영역을 갖는 것을 특징으로 하는 프리로드형 프로브 헤드.A preloaded probe head, characterized in that it has an open area most similar to the size of the coupling hole.
  6. 제5항에 있어서, 상기 가이드 필름은,The method of claim 5, wherein the guide film,
    상기 제1가이드 필름과, 상기 제2가이드 필름의 조합이 복수개로 형성된 것을 특징으로 하는 프리로드형 프로브 헤드.A preloaded probe head, characterized in that a plurality of combinations of the first guide film and the second guide film are formed.
  7. 제5항에 있어서, 상기 제2가이드 필름은,The method of claim 5, wherein the second guide film,
    상기 제2오픈영역에 연결되거나 인접하여 상기 스탑퍼가 형성된 영역으로 버퍼부가 형성된 것을 특징으로 하는 프리로드형 프로브 헤드.A preloaded probe head, characterized in that a buffer part is formed in an area connected to or adjacent to the second open area where the stopper is formed.
  8. 제7항에 있어서, 상기 버퍼부는,The method of claim 7, wherein the buffer unit,
    상기 제2오픈영역을 중심으로 제1방향 또는 제2방향, 또는 제1방향 및 제2방향으로 형성된 것을 특징으로 하는 프리로드형 프로브 헤드.A preloaded probe head characterized in that it is formed in the first direction or the second direction, or in the first and second directions around the second open area.
  9. 제7항에 있어서, 상기 버퍼부는,The method of claim 7, wherein the buffer unit,
    상기 제2오픈영역을 중심으로 방사형으로 형성된 것을 특징으로 하는 프리로드형 프로브 헤드.A preloaded probe head, characterized in that formed radially around the second open area.
  10. 제1항에 있어서, 상기 탄성공간의 크기는,The method of claim 1, wherein the size of the elastic space,
    상기 스탑퍼의 가압부와 크기가 같거나 크게 형성된 것을 특징으로 하는 프리로드형 프로브 헤드.A preloaded probe head, characterized in that the size is equal to or larger than the pressing portion of the stopper.
  11. 제1항에 있어서, 상기 가이드 필름은,The method of claim 1, wherein the guide film,
    고분자 기판 또는 고분자 물질의 코팅층으로 형성된 것을 특징으로 하는 프리로드형 프로브 헤드. A preloaded probe head formed of a polymer substrate or a coating layer of a polymer material.
  12. 제11항에 있어서, 상기 고분자 기판은,The method of claim 11, wherein the polymer substrate,
    폴리이미드(polyimide), 폴리카보네이트(polycarbonate, PC), 폴리에틸렌나프탈레이트(Polyethylenenaphthalate, PEN), 폴리아크릴레이트(polyacrylate), 폴리비닐알콜(Polyvinylalcohol), 폴리에틸렌 테레프탈레이트(polyethylene terephthalate, PET), 폴리에테르설폰(Polyethersulfone, PES) 중 어느 하나 또는 둘 이상을 조합하여 사용하는 것을 특징으로 하는 프리로드형 프로브 헤드.Polyimide, polycarbonate (PC), polyethylenenaphthalate (PEN), polyacrylate, polyvinylalcohol, polyethylene terephthalate (PET), polyethersulfone (Polyethersulfone, PES) A preloaded probe head characterized in that any one or a combination of two or more is used.
  13. 제11항에 있어서, 상기 가이드 필름으로 고분자 기판이 사용되는 경우에는 레이저 가공에 의해 상기 오픈영역을 형성하는 것을 특징으로 하는 프리로드형 프로브 헤드.The preloaded probe head of claim 11, wherein the open area is formed by laser processing when a polymer substrate is used as the guide film.
  14. 제13항에 있어서, 상기 오픈영역의 형성은 상기 가이드 필름을 블럭 상부에 선적층시킨 후 레이저 가공에 의해 상기 결합공의 형성 공정과 동시에 수행되거나,14. The method of claim 13, wherein the formation of the open area is performed simultaneously with the formation of the coupling hole by laser processing after the guide film is stacked on top of the block, or
    레이저 가공에 의해 상기 오픈영역을 형성한 후, 상기 블럭 상부에 가이드 필름을 후적층하는 것을 특징으로 하는 프리로드형 프로브 헤드.A preloaded probe head characterized in that after forming the open area by laser processing, a guide film is later laminated on the upper part of the block.
  15. 제11항에 있어서, 상기 가이드 필름으로 고분자 기판이 사용되는 경우에는,The method of claim 11, when a polymer substrate is used as the guide film,
    상기 고분자 기판은 고정부재에 의해 상기 블럭 상부에 결합되거나,The polymer substrate is coupled to the top of the block by a fixing member,
    상기 고분자 기판은 상기 블럭 상부 및 고분자 기판 간에 점착될 수 있도록 결합면에 점착층이 형성된 것을 특징으로 하는 프리로드형 프로브 헤드.The preloaded probe head, characterized in that the polymer substrate has an adhesive layer formed on a bonding surface so that the upper portion of the block and the polymer substrate can be adhered to each other.
  16. 제11항에 있어서, 상기 고분자 물질은,The method of claim 11, wherein the polymer material,
    포토레지스트(photo resist, PR)인 것을 특징으로 하는 프리로드형 프로브 헤드.A preloaded probe head, characterized in that it is a photo resist (PR).
  17. 제16항에 있어서, 상기 오픈영역은,The method of claim 16, wherein the open area,
    상기 블럭 상부에 포토레지스트를 코팅한 후 광패터닝 공정에 의해 형성되는 것을 특징으로 하는 프리로드형 프로브 헤드.A preloaded probe head, characterized in that formed by an optical patterning process after coating a photoresist on the top of the block.
  18. 제1항에 있어서, 상기 오픈영역의 형상은,The method of claim 1, wherein the shape of the open area is,
    상기 프로브의 수평단면 형상에 대응되게 형성되는 것을 특징으로 하는 프리로드형 프로브 헤드.A preloaded probe head, characterized in that formed to correspond to the horizontal cross-sectional shape of the probe.
  19. 제18항에 있어서, 상기 오픈영역의 형상은,The method of claim 18, wherein the shape of the open area,
    원형, 타원형 및 다각형 형상 중 어느 하나의 형상으로 형성된 것을 특징으로 하는 프리로드형 프로브 헤드.A preloaded probe head characterized in that it is formed in any one of a circular shape, an elliptical shape and a polygonal shape.
  20. 제1항에 있어서, 상기 블럭은,The method of claim 1, wherein the block,
    제1결합공이 형성된 상부 플레이트;an upper plate in which a first coupling hole is formed;
    상기 상부 플레이트와 이격되어 형성되고, 제2결합공이 형성된 하부 플레이트;를 포함하는 구조체로 형성되거나,It is formed as a structure including a lower plate formed to be spaced apart from the upper plate and formed with a second coupling hole,
    상기 상부 플레이트 및 상기 하부 플레이트가 선택적으로 복수개로 형성된 구조체인 것을 특징으로 하는 프리로드형 프로브 헤드.The preloaded probe head according to claim 1 , wherein the upper plate and the lower plate are selectively formed in plurality.
  21. 제20항에 있어서, 상기 가이드 필름은,The method of claim 20, wherein the guide film,
    상기 스탑퍼의 가압력이 인가되는 상부 플레이트 상부에 형성되며, 상기 제1결합공에 대응하여 상기 오픈영역이 형성되는 것을 특징으로 하는 프리로드형 프로브 헤드.The preloaded probe head is formed on an upper part of the upper plate to which the pressing force of the stopper is applied, and the open area is formed corresponding to the first coupling hole.
PCT/KR2022/004443 2022-02-11 2022-03-29 Preload-type probe head WO2023153556A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020220018138A KR20230121371A (en) 2022-02-11 2022-02-11 Preload type probe head
KR10-2022-0018138 2022-02-11

Publications (1)

Publication Number Publication Date
WO2023153556A1 true WO2023153556A1 (en) 2023-08-17

Family

ID=87564475

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2022/004443 WO2023153556A1 (en) 2022-02-11 2022-03-29 Preload-type probe head

Country Status (2)

Country Link
KR (1) KR20230121371A (en)
WO (1) WO2023153556A1 (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013148500A (en) * 2012-01-20 2013-08-01 Murata Mfg Co Ltd Electronic component characteristic measuring jig
KR20150031371A (en) * 2013-09-13 2015-03-24 한국기계연구원 Probe module and manufacturing method of probe module
KR20170092523A (en) * 2014-12-04 2017-08-11 테크노프로브 에스.피.에이. Testing head comprising vertical probes
WO2021023739A1 (en) * 2019-08-07 2021-02-11 Technoprobe S.P.A. Probe head for electronic devices and corresponding probe card
KR20210119814A (en) * 2020-03-25 2021-10-06 (주)포인트엔지니어링 Probe head and probe card having the same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013148500A (en) * 2012-01-20 2013-08-01 Murata Mfg Co Ltd Electronic component characteristic measuring jig
KR20150031371A (en) * 2013-09-13 2015-03-24 한국기계연구원 Probe module and manufacturing method of probe module
KR20170092523A (en) * 2014-12-04 2017-08-11 테크노프로브 에스.피.에이. Testing head comprising vertical probes
WO2021023739A1 (en) * 2019-08-07 2021-02-11 Technoprobe S.P.A. Probe head for electronic devices and corresponding probe card
KR20210119814A (en) * 2020-03-25 2021-10-06 (주)포인트엔지니어링 Probe head and probe card having the same

Also Published As

Publication number Publication date
KR20230121371A (en) 2023-08-18
TW202332914A (en) 2023-08-16

Similar Documents

Publication Publication Date Title
WO2013151316A1 (en) Test socket having high-density conductive unit, and method for manufacturing same
WO2012033338A2 (en) Probe card and method for manufacturing same
WO2022010246A1 (en) Vertical probe pin and probe card having same
WO2019216503A1 (en) Semiconductor device test socket
WO2015012498A1 (en) Conductive connector and manufacturing method therefor
WO2014129784A1 (en) Test socket with high density conduction section
WO2016108520A1 (en) Contact inspection device
WO2021194213A1 (en) Probe head and probe card comprising same
WO2012121449A1 (en) Probe card and manufacturing method
WO2010098558A2 (en) Probe block
WO2011087215A2 (en) Probe card
WO2018135674A1 (en) Bidirectional conductive pattern module
WO2015102304A1 (en) Sheet-type connector and electrical connector device
WO2023128428A1 (en) Test socket for signal loss protection
WO2021045502A1 (en) Test probe, method of manufacturing the same, and test socket supporting the same
WO2012169831A2 (en) Probe apparatus for testing chips
WO2015156653A1 (en) Method for manufacturing test sheet, and test sheet
WO2023153556A1 (en) Preload-type probe head
WO2020050645A1 (en) Probe card for electrical inspection, and probe head of probe card
WO2021215786A1 (en) Probe card
WO2021045286A1 (en) Test socket having empty space
WO2016167412A1 (en) Bidirectional conductive socket for testing high-frequency device, bidirectional conductive module for testing high-frequency device, and manufacturing method thereof
WO2023163271A1 (en) Low-friction probe head
WO2022181951A1 (en) Alignment module and alignment transfer method for electrically conductive contact pins
WO2019245153A1 (en) Plate spring-type connecting pin

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 22926154

Country of ref document: EP

Kind code of ref document: A1