WO2023036489A3 - Beschichtungsverfahren und vorrichtung zum ausbilden einer barriereschicht zur erhöhung der impermeabilität und korrosionsbeständigkeit, beschichtung und gebinde zur einbettung und versiegelung radioaktiver körper für die endlagerung, sowie verfahren zur herstellung des gebindes - Google Patents

Beschichtungsverfahren und vorrichtung zum ausbilden einer barriereschicht zur erhöhung der impermeabilität und korrosionsbeständigkeit, beschichtung und gebinde zur einbettung und versiegelung radioaktiver körper für die endlagerung, sowie verfahren zur herstellung des gebindes Download PDF

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Publication number
WO2023036489A3
WO2023036489A3 PCT/EP2022/068318 EP2022068318W WO2023036489A3 WO 2023036489 A3 WO2023036489 A3 WO 2023036489A3 EP 2022068318 W EP2022068318 W EP 2022068318W WO 2023036489 A3 WO2023036489 A3 WO 2023036489A3
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WO
WIPO (PCT)
Prior art keywords
packaging
coating
barrier layer
forming
embedding
Prior art date
Application number
PCT/EP2022/068318
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English (en)
French (fr)
Other versions
WO2023036489A2 (de
Inventor
Sahabi BEHZAD
Original Assignee
Behzad Sahabi
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Behzad Sahabi filed Critical Behzad Sahabi
Publication of WO2023036489A2 publication Critical patent/WO2023036489A2/de
Publication of WO2023036489A3 publication Critical patent/WO2023036489A3/de

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21C—NUCLEAR REACTORS
    • G21C3/00—Reactor fuel elements and their assemblies; Selection of substances for use as reactor fuel elements
    • G21C3/02—Fuel elements
    • G21C3/04—Constructional details
    • G21C3/16—Details of the construction within the casing
    • G21C3/20—Details of the construction within the casing with coating on fuel or on inside of casing; with non-active interlayer between casing and active material with multiple casings or multiple active layers
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
    • G21F5/00—Transportable or portable shielded containers
    • G21F5/005—Containers for solid radioactive wastes, e.g. for ultimate disposal
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
    • G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
    • G21F9/28—Treating solids
    • G21F9/30—Processing
    • G21F9/301—Processing by fixation in stable solid media
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
    • G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
    • G21F9/28—Treating solids
    • G21F9/34—Disposal of solid waste

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Thermal Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Details Of Rigid Or Semi-Rigid Containers (AREA)
  • Laminated Bodies (AREA)

Abstract

Im Rahmen der vorliegenden Erfindung wird ein Beschichtungsverfahren zum Ausbilden einer Barriereschicht (21) zur Verbesserung der Impermeabilität und Korrosionsbeständigkeit auf einer Oberfläche (11) eines Körpers, insbesondere eines radioaktiven Körpers wie einem Brennelement, angegeben, aufweisend die folgenden Schritte: Erhitzen der zu beschichtenden Oberfläche (11) auf eine Beschichtungstemperatur; Zuführen von Kohlenwasserstoff (69) an die zu beschichtende Oberfläche (11) bei gleichzeitigem Halten der zu beschichtenden Oberfläche (11) auf der Beschichtungstemperatur, bis an der Oberfläche (11) eine Barriereschicht (21) aus amorphem Kohlenstoff mit einer vorgegebenen Dicke ausgebildet ist. Ferner werden eine Vorrichtung zum Ausbilden der Barriereschicht, sowie eine Beschichtung und ein Gebinde zur Einbettung und Versiegelung radioaktiver Körper (1), insbesondere radioaktiver Reaktorbrennelemente, für die Endlagerung sowie ein Verfahren zur Herstellung des Gebindes angegeben.
PCT/EP2022/068318 2021-09-13 2022-07-01 Beschichtungsverfahren und vorrichtung zum ausbilden einer barriereschicht zur erhöhung der impermeabilität und korrosionsbeständigkeit, beschichtung und gebinde zur einbettung und versiegelung radioaktiver körper für die endlagerung, sowie verfahren zur herstellung des gebindes WO2023036489A2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP21196314.5A EP4148162A1 (de) 2021-09-13 2021-09-13 Beschichtungsverfahren und vorrichtung zum ausbilden einer barriereschicht zur erhöhung der impermeabilität und korrosionsbeständigkeit, beschichtung und gebinde zur einbettung und versiegelung radioaktiver körper für die endlagerung, sowie verfahren zur herstellung des gebindes
EP21196314.5 2021-09-13

Publications (2)

Publication Number Publication Date
WO2023036489A2 WO2023036489A2 (de) 2023-03-16
WO2023036489A3 true WO2023036489A3 (de) 2023-05-04

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2022/068318 WO2023036489A2 (de) 2021-09-13 2022-07-01 Beschichtungsverfahren und vorrichtung zum ausbilden einer barriereschicht zur erhöhung der impermeabilität und korrosionsbeständigkeit, beschichtung und gebinde zur einbettung und versiegelung radioaktiver körper für die endlagerung, sowie verfahren zur herstellung des gebindes

Country Status (2)

Country Link
EP (1) EP4148162A1 (de)
WO (1) WO2023036489A2 (de)

Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05120933A (ja) * 1991-10-30 1993-05-18 Matsushita Electric Ind Co Ltd 透明導電膜の形成方法
JP2939470B2 (ja) * 1997-12-02 1999-08-25 コリア アトミック エナジー リサーチ インスティテュート 核燃料の製造方法
US6054700A (en) * 1997-04-10 2000-04-25 Nucon Systems Process and apparatus for joining thick-walled ceramic parts
JP2002012972A (ja) * 2000-02-17 2002-01-15 Applied Materials Inc アモルファスカーボン層の堆積方法
US20030156675A1 (en) * 2000-02-24 2003-08-21 Francesco Venneri System and method for radioactive waste destruction
JP2005127916A (ja) * 2003-10-24 2005-05-19 Ishikawajima Harima Heavy Ind Co Ltd 放射性廃棄物の地層処分容器
US20060007983A1 (en) * 2003-10-27 2006-01-12 California Institute Of Technology Pyrolyzed thin film carbon
US20060039524A1 (en) * 2004-06-07 2006-02-23 Herbert Feinroth Multi-layered ceramic tube for fuel containment barrier and other applications in nuclear and fossil power plants
US20090020068A1 (en) * 2007-05-09 2009-01-22 Elpida Memory, Inc. Method of manufacturing of substrate
US20090093128A1 (en) * 2007-10-08 2009-04-09 Martin Jay Seamons Methods for high temperature deposition of an amorphous carbon layer
DE102010003289A1 (de) * 2010-03-25 2011-09-29 Ald Vacuum Technologies Gmbh Gebinde zur Lagerung von radioaktiven Abfällen und Verfahren zu seiner Herstellung
WO2012049922A1 (ja) * 2010-10-13 2012-04-19 シャープ株式会社 製膜装置及び製膜方法
US20120301816A1 (en) * 2011-05-27 2012-11-29 Postech Academy-Industry Foundation Method of preparing carbon thin film, and electronic device and electrochemical devices each including the carbon thin film
KR101839273B1 (ko) * 2017-10-30 2018-04-27 국방과학연구소 금속 분말을 포함하는 용액 전구체 증착 장치

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102018114463A1 (de) 2018-06-15 2019-12-19 Siceram Gmbh Verfahren zum Verbinden von Bauteilen aus SSiC

Patent Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05120933A (ja) * 1991-10-30 1993-05-18 Matsushita Electric Ind Co Ltd 透明導電膜の形成方法
US6054700A (en) * 1997-04-10 2000-04-25 Nucon Systems Process and apparatus for joining thick-walled ceramic parts
JP2939470B2 (ja) * 1997-12-02 1999-08-25 コリア アトミック エナジー リサーチ インスティテュート 核燃料の製造方法
JP2002012972A (ja) * 2000-02-17 2002-01-15 Applied Materials Inc アモルファスカーボン層の堆積方法
US20030156675A1 (en) * 2000-02-24 2003-08-21 Francesco Venneri System and method for radioactive waste destruction
JP2005127916A (ja) * 2003-10-24 2005-05-19 Ishikawajima Harima Heavy Ind Co Ltd 放射性廃棄物の地層処分容器
US20060007983A1 (en) * 2003-10-27 2006-01-12 California Institute Of Technology Pyrolyzed thin film carbon
US20060039524A1 (en) * 2004-06-07 2006-02-23 Herbert Feinroth Multi-layered ceramic tube for fuel containment barrier and other applications in nuclear and fossil power plants
US20090020068A1 (en) * 2007-05-09 2009-01-22 Elpida Memory, Inc. Method of manufacturing of substrate
US20090093128A1 (en) * 2007-10-08 2009-04-09 Martin Jay Seamons Methods for high temperature deposition of an amorphous carbon layer
DE102010003289A1 (de) * 2010-03-25 2011-09-29 Ald Vacuum Technologies Gmbh Gebinde zur Lagerung von radioaktiven Abfällen und Verfahren zu seiner Herstellung
WO2012049922A1 (ja) * 2010-10-13 2012-04-19 シャープ株式会社 製膜装置及び製膜方法
US20120301816A1 (en) * 2011-05-27 2012-11-29 Postech Academy-Industry Foundation Method of preparing carbon thin film, and electronic device and electrochemical devices each including the carbon thin film
KR101839273B1 (ko) * 2017-10-30 2018-04-27 국방과학연구소 금속 분말을 포함하는 용액 전구체 증착 장치

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
BÖCKLER F. ET AL: "Pyrokohlenstoff - RÖMPP, Thieme", RÖMPP, 1 January 2002 (2002-01-01), pages 1 - 1, XP055948903, Retrieved from the Internet <URL:https://roempp.thieme.de/lexicon/RD-16-05211> [retrieved on 20220804] *

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EP4148162A1 (de) 2023-03-15
WO2023036489A2 (de) 2023-03-16

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