Classifications

• • C—CHEMISTRY; METALLURGY
  • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
  • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
  • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
  • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
  • C04B35/48—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates
  • C04B35/486—Fine ceramics
  • C04B35/488—Composites
• • C—CHEMISTRY; METALLURGY
  • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
  • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
  • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
  • C04B35/50—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on rare-earth compounds
• • C—CHEMISTRY; METALLURGY
  • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
  • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
  • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
  • C04B35/50—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on rare-earth compounds
  • C04B35/505—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on rare-earth compounds based on yttrium oxide
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
  • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
  • H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
  • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
  • H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
  • H01B1/08—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances oxides
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
  • H01M10/00—Secondary cells; Manufacture thereof
  • H01M10/05—Accumulators with non-aqueous electrolyte
  • H01M10/052—Li-accumulators
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
  • H01M10/00—Secondary cells; Manufacture thereof
  • H01M10/05—Accumulators with non-aqueous electrolyte
  • H01M10/056—Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes
  • H01M10/0561—Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes the electrolyte being constituted of inorganic materials only
  • H01M10/0562—Solid materials
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
  • H01M4/00—Electrodes
  • H01M4/02—Electrodes composed of, or comprising, active material
  • H01M4/13—Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulators; Processes of manufacture thereof
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
  • H01M4/00—Electrodes
  • H01M4/02—Electrodes composed of, or comprising, active material
  • H01M4/62—Selection of inactive substances as ingredients for active masses, e.g. binders, fillers
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
  • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
  • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
  • Y02E60/10—Energy storage using batteries

Definitions

• the present disclosure relates to ion-conducting solid-state and all-solid-state batteries.
• lithium-ion secondary batteries Conventionally, lightweight and high-capacity lithium-ion secondary batteries have been mounted in mobile devices such as smartphones and notebook computers, and in transportation devices such as electric vehicles and hybrid electric vehicles.
• a liquid containing a flammable solvent is used as an electrolyte in a conventional lithium ion secondary battery, there is a fear of leakage of the flammable solvent and ignition when the battery is short-circuited. Therefore, in recent years, in order to ensure safety, a secondary battery using an ion-conductive solid as an electrolyte, which is different from a liquid electrolyte, has attracted attention, and such a secondary battery is called an all-solid battery.
• Solid electrolytes such as oxide-based solid electrolytes and sulfide-based solid electrolytes are widely known as electrolytes used in all-solid-state batteries. Among them, oxide-based solid electrolytes do not react with moisture in the air to generate hydrogen sulfide, and are more safe than sulfide-based solid electrolytes.
• an all-solid-state battery includes a positive electrode containing a positive electrode active material, a negative electrode containing a negative electrode active material, an electrolyte containing an ion-conductive solid disposed between the positive electrode and the negative electrode, and optionally a current collector. and (the positive electrode active material and the negative electrode active material are also collectively referred to as “electrode active material”).
• electrode active material When producing an all-solid-state battery using an oxide-based solid electrolyte, heat treatment is performed to reduce the contact resistance between particles of the oxide-based material contained in the solid electrolyte.
• the conventional oxide-based solid electrolyte requires a high temperature of 900° C.
• Li 2+x C 1-x B x O 3 is an example of an oxide-based solid electrolyte that can be produced by heat treatment at a temperature lower than 900° C. (Non-Patent Document 1).
• the present disclosure provides an ion-conductive solid that can be produced by heat treatment at a low temperature and has high ion conductivity, and an all-solid-state battery having the same.
• the ion - conducting solid of the present disclosure is an ion- conducting solid characterized by containing an oxide represented by the general formula LiaYbMcBdO9 .
• M is at least one element selected from the group consisting of Mg, Al, Zr, Ce, Sn, Hf, C and Nb, and a, b, c, and d are 5.100 ⁇ a ⁇ 5 .990, 0.100 ⁇ b ⁇ 1.000, 0.010 ⁇ c ⁇ 0.900, and 2.400 ⁇ d ⁇ 3.100.
• the all-solid-state battery of the present disclosure is a positive electrode; a negative electrode; an electrolyte; An all-solid-state battery having at least An all-solid battery characterized in that at least one selected from the group consisting of the positive electrode, the negative electrode and the electrolyte contains the ion-conductive solid of the present disclosure.
• an ion-conductive solid that can be produced by heat treatment at a low temperature and has high ion conductivity, and an all-solid-state battery having the same.
• the ion-conducting solid of the present disclosure is an ion-conducting solid comprising an oxide represented by the general formula LiaYbMcBdO9 .
• M is at least one element selected from the group consisting of Mg, Al, Zr, Ce, Sn, Hf, C and Nb.
• a, b, c, and d are 5.100 ⁇ a ⁇ 5.990, 0.100 ⁇ b ⁇ 1.000, 0.010 ⁇ c ⁇ 0.900, 2.400 ⁇ d ⁇ 3. Meet 100.
• the charge will be reduced by the element replacement with different valences. Since the balance is adjusted, the Li + in the crystal lattice becomes deficient (5.100 ⁇ a ⁇ 5.990 in the present disclosure).
• the ionic conductivity is improved because surrounding Li + moves to fill the Li + deficiency.
• the ion-conducting solids of the present disclosure preferably have a monoclinic crystal structure.
• the ion -conducting solid has a monoclinic crystal structure
• 2 ⁇ 27.915 ° or more and 28.100 ° or less, 27.920 ° or more and 28.100 ° or less, or 27.930 ° or more and 28 It is preferable to have a diffraction peak in the range of 0.100° or less.
• the lattice volume of the ionically conductive solid of the present disclosure is preferably 752.00 ⁇ 3 or greater, more preferably 752.55 ⁇ 3 or greater, even more preferably 753.00 ⁇ 3 or greater, and particularly preferably 753.40 ⁇ 3 or greater. be.
• the lattice volume is preferably 756.00 ⁇ 3 or less, more preferably 754.50 ⁇ 3 or less, even more preferably 754.00 ⁇ 3 or less, and particularly preferably 753.50 ⁇ 3 or less.
• the numerical ranges can be combined arbitrarily.
• the lattice volume can be, for example, 752.00 ⁇ 3 or more and 756.00 ⁇ 3 or less.
• the lattice volume of the ion-conducting solid can be controlled by changing the element represented by M in the above general formula and by adjusting the values of a, b, c, and d in the formula.
• M in the above general formula is at least one element selected from the group consisting of Mg, Al, Zr, Ce, Sn, Hf, C and Nb.
• M is preferably at least one element selected from the group consisting of Zr, Ce, Sn and Nb.
• M more preferably contains at least Zr, Ce, and Sn.
• M contains at least Zr.
• M is preferably at least one element selected from the group consisting of Mg, Al, Zr, Ce, Hf and C, and at least one element selected from the group consisting of Mg, Al, Hf and C. It is also more preferable to have
• a in the general formula satisfies 5.100 ⁇ a ⁇ 5.990.
• a is a real number.
• the lower limit of a is preferably 5.110 or more, 5.120 or more, 5.130 or more, 5.140 or more, 5.150 or more, 5.160 or more, 5.170 or more, 5.180 or more. 5.240 or more, 5.250 or more, 5.300 or more, 5.350 or more, 5.400 or more; 450 or more or 5.500 or more.
• the upper limit of a is preferably 5.980 or less, 5.970 or less, 5.960 or less, 5.950 or less, 5.940 or less, 5.930 or less, 5.920 or less, 5.910 or less.
• b in the general formula satisfies 0.100 ⁇ b ⁇ 1.000.
• b is a real number.
• the lower limit of b is preferably 0.110 or more, 0.120 or more, 0.130 or more, 0.140 or more, 0.150 or more, 0.160 or more, 0.170 or more, 0.180 or more, 0.180 or more.
• the upper limit of b is preferably 0.990 or less, 0.980 or less, 0.970 or less, 0.960 or less, 0.950 or less, 0.940 or less, 0.930 or less, 0.920 or less, 0.920 or less. 910 or less, 0.900 or less, 0.890 or less, 0.880 or less, 0.870 or less, 0.860 or less, 0.850 or less, 0.800 or less, 0.750 or less, 0.700 or less, 0. 650 or less or 0.600 or less.
• the numerical ranges can be combined arbitrarily.
• b can be, for example, 0.100 ⁇ b ⁇ 0.990.
• c in the above general formula satisfies 0.010 ⁇ c ⁇ 0.900.
• c is a real number.
• the lower limit of c is preferably 0.020 or more, 0.030 or more, 0.040 or more, 0.050 or more, 0.060 or more, 0.070 or more, 0.080 or more, 0.090 or more, 0.090 or more. 100 or more, 0.110 or more, 0.120 or more, 0.130 or more, 0.140 or more, 0.150 or more, 0.160 or more, 0.170 or more, 0.180 or more, 0.190 or more, 0. 200 or more, 0.250 or more, 0.300 or more, 0.350 or more, 0.400 or more, 0.450 or more, or 0.500 or more.
• the upper limit of c is preferably 0.890 or less, 0.870 or less, 0.860 or less, 0.850 or less, 0.840 or less, 0.830 or less, 0.820 or less, 0.810 or less, and 0.810 or less. 800 or less, 0.790 or less, 0.780 or less, 0.770 or less, 0.760 or less, 0.750 or less, 0.700 or less, 0.650 or less, 0.600 or less, or 0.550 or less.
• the numerical ranges can be combined arbitrarily.
• c can be, for example, 0.100 ⁇ c ⁇ 0.200.
• c is the total number of atoms of each element.
• M represents two elements M1 and M2
• the value of c is the sum of the atomic number c1 of M1 and the atomic number c2 of M2.
• M represents three or more elements selected from the above group.
• d in the above general formula satisfies 2.400 ⁇ d ⁇ 3.100.
• d is a real number.
• the lower limit of d is preferably 2.410 or more, 2.420 or more, 2.430 or more, 2.440 or more, 2.450 or more, 2.460 or more, 2.470 or more, 2.480 or more. 490 or more, 2.500 or more, 2.510 or more, 2.520 or more, 2.530 or more, 2.540 or more, 2.550 or more, 2.600 or more, 2.650 or more, 2.700 or more; 800 or more or 2.900 or more.
• the upper limit of d is preferably 3.090 or less, 3.080 or less, 3.070 or less, 3.060 or less, 3.050 or less, 3.040 or less, 3.030 or less, 3.020 or less. 010 or less, 3.000 or less, 2.990 or less, 2.980 or less, 2.970 or less, 2.960 or less, 2.950 or less, 2.940 or less, 2.930 or less, 2.920 or less, 2. 910 or less, 2.900 or less, 2.890 or less, 2.880 or less, 2.870 or less, 2.860 or less, 2.850 or less, 2.800 or less, 2.750 or less, or 2.700 or less.
• the numerical ranges can be combined arbitrarily.
• c can be, for example, 2.900 ⁇ d ⁇ 3.100.
• the number of atoms of Mg is preferably 0.010 to 0.150, more preferably 0.025 to 0.100.
• the number of Al atoms (value of c) is preferably 0.005 to 0.300, more preferably 0.010 to 0.200.
• the number of Zr atoms (value of c) is preferably 0.005 to 0.800, more preferably 0.010 to 0.595.
• the number of Ce atoms (value of c) is preferably 0.005 to 0.900, more preferably 0.010 to 0.805.
• the number of atoms of Sn is preferably 0.010 to 0.300, more preferably 0.020 to 0.205.
• the number of atoms of Hf (the value of c) is preferably 0.005 to 0.200, more preferably 0.010 to 0.100.
• the number of atoms of C (value of c) is preferably 0.015 to 0.800, more preferably 0.025 to 0.600.
• the number of atoms of Nb (the value of c) is preferably 0.010 to 0.200, more preferably 0.020 to 0.105.
• the ion-conducting solid of the present disclosure can be, for example, the following embodiments, but is not limited to these embodiments.
• M represents Zr and Ce, the number of Zr atoms is 0.090 to 0.180 (eg, 0.105 or 0.155), the number of Ce atoms is 0.010 to 0.030, and c is 0.100 ⁇ It is preferable to satisfy c ⁇ 0.200.
• M represents Zr, Ce and Hf
• the number of Zr atoms is 0.050 to 0.100 (eg 0.075)
• the number of Ce atoms is 0.010 to 0.030 (eg 0.025)
• the number of Hf The number of atoms should be 0.010 to 0.030 (eg, 0.025)
• c should satisfy 0.100 ⁇ c ⁇ 0.150 (eg, 0.125).
• M represents Zr, Ce and C
• the number of Zr atoms is 0.090 to 0.120 (eg 0.100)
• the number of Ce atoms is 0.010 to 0.030 (eg 0.025)
• the number of atoms should be 0.040 to 0.060 (for example, 0.050)
• c should satisfy 0.150 ⁇ c ⁇ 0.200.
• M represents Mg, Zr and Ce
• the number of Mg atoms is 0.010 to 0.35 (eg 0.025)
• the number of Zr atoms is 0.050 to 0.150 (eg 0.100)
• the number of Ce should be 0.015 to 0.040 (eg, 0.025)
• c should satisfy 0.050 ⁇ c ⁇ 0.250 (eg, 0.150).
• M represents Al, Zr and Ce
• the number of Al atoms is 0.010 to 0.35 (eg 0.025)
• the number of Zr atoms is 0.050 to 0.150 (eg 0.100)
• the number of Ce should be 0.015 to 0.040 (eg, 0.025)
• c should satisfy 0.050 ⁇ c ⁇ 0.250 (eg, 0.150).
• a method for producing an ion-conductive solid containing an oxide represented by the general formula LiaYbMcBdO9 comprising: It can have a primary firing step of heat-treating the raw materials mixed so as to obtain the oxide represented by the general formula at a temperature below the melting point of the oxide.
• M is at least one element selected from the group consisting of Mg, Al, Zr, Ce, Sn, Hf, C and Nb, and a, b, c, and d are 5.100 ⁇ a ⁇ 5 .990, 0.100 ⁇ b ⁇ 1.000, 0.010 ⁇ c ⁇ 0.900, and 2.400 ⁇ d ⁇ 3.100.
• the method for producing an ion-conductive solid according to the present disclosure includes weighing and mixing raw materials so as to obtain the oxide represented by the above general formula, and heat-treating the raw material at a temperature below the melting point of the oxide. , a primary calcination step to produce an ionically conductive solid comprising said oxide.
• the production method includes heat-treating the obtained ion-conductive solid containing the oxide at a temperature below the melting point of the oxide to produce a sintered body of the ion-conductive solid containing the oxide.
• a subsequent firing step may be included.
• the method for producing an ion-conductive solid according to the present disclosure which includes the primary firing step and the secondary firing step, will be described in detail below, but the present disclosure is not limited to the manufacturing method described below.
• the general formula LiaYbMcBdO9 (where a , b , c, and d are 5.100 ⁇ a ⁇ 5.990 , 0.100 ⁇ b ⁇ 1. 000, 0.010 ⁇ c ⁇ 0.900, 2.400 ⁇ d ⁇ 3.100), chemical reagent grade Li 3 BO 3 , H 3 BO 3 , Y 2 O 3 , MgO, Raw materials such as Al 2 O 3 , ZrO 2 , CeO 2 , SnO 2 , HfO 2 , Li 2 CO 3 , Nb 2 O 5 are weighed in stoichiometric amounts and mixed.
• the device used for mixing is not particularly limited, for example, a pulverizing mixer such as a planetary ball mill can be used.
• the material and capacity of the container used for mixing and the material and diameter of the ball are not particularly limited, and can be appropriately selected according to the type and amount of raw materials used.
• a zirconia 45 mL container and a zirconia 5 mm diameter ball can be used.
• the conditions for the mixing treatment are not particularly limited, but can be, for example, a rotation speed of 50 rpm or more and 2000 rpm or less and a time of 10 minutes or more and 60 minutes or less. After obtaining a mixed powder of the above raw materials by the mixing treatment, the obtained mixed powder is press-molded into pellets.
• the pressure molding method a known pressure molding method such as a cold uniaxial molding method and a cold isostatic pressure molding method can be used.
• Conditions for pressure molding in the primary firing step are not particularly limited, but for example, the pressure can be set to 100 MPa or more and 200 MPa or less.
• the obtained pellets are calcined using a calcining device such as an atmospheric calcining device.
• the temperature for performing solid - phase synthesis by primary firing is not particularly limited as long as it is lower than the melting point of the ion conductive solid represented by the general formula LiaYbMcBdO9 .
• the temperature for the primary firing can be, for example, less than 700° C., 680° C. or less, 670° C. or less, 660° C.
• the time for the primary firing step is not particularly limited, but can be, for example, 700 minutes or more and 750 minutes or less.
• the ion conductive solid containing the oxide can also be pulverized using a mortar/pestle or a planetary mill to obtain a powder of the ion conductive solid containing the oxide.
• Secondary firing step In the secondary firing step, at least one selected from the group consisting of the ion-conductive solid containing the oxide obtained in the primary firing step and the powder of the ion-conductive solid containing the oxide is pressure-molded. and sintering to obtain an ion conductive solid sintered body containing the oxide of the present disclosure.
• Pressure molding and secondary firing may be performed simultaneously using spark plasma sintering (hereinafter also simply referred to as "SPS") or hot pressing, and pellets are produced by cold uniaxial molding and then in an atmosphere.
• the secondary firing may be performed in an oxidizing atmosphere or a reducing atmosphere. Under the above conditions, an ion-conductive solid with high ion conductivity can be obtained without melting due to heat treatment.
• the conditions for pressure molding in the secondary firing step are not particularly limited, but the pressure can be, for example, 10 MPa or more and 100 MPa or less.
• the secondary firing temperature is lower than the melting point of the ion conductive solid containing the oxide represented by the general formula LiaYbMcBdO9 .
• the temperature for secondary firing is preferably less than 700°C, more preferably 680°C or less, still more preferably 670°C or less, and particularly preferably 660°C or less.
• the lower limit of the temperature is not particularly limited, and is preferably 500° C. or higher, although the lower the better.
• the numerical ranges can be combined arbitrarily, they can be, for example, a range of 500°C or higher and lower than 700°C.
• the time for the secondary firing step can be appropriately changed according to the temperature of the secondary firing and the like, but is preferably 24 hours or less, and may be 1 hour or less.
• the duration of the secondary baking process may be, for example, 5 minutes or longer.
• the method for cooling the sintered body of the ion-conductive solid containing the oxide of the present disclosure obtained by the secondary firing step is not particularly limited, and may be naturally cooled (cooled in a furnace) or rapidly. It may be cooled, it may be cooled more gradually than natural cooling, or it may be maintained at a certain temperature during cooling.
• All-solid-state batteries generally have a positive electrode, a negative electrode, an electrolyte comprising an ionically conductive solid disposed between the positive and negative electrodes, and optionally a current collector.
• the all-solid-state battery of the present disclosure is a positive electrode; a negative electrode; an electrolyte; An all-solid-state battery having at least At least one selected from the group consisting of the positive electrode, the negative electrode and the electrolyte comprises the ionically conductive solid of the present disclosure.
• the all-solid-state battery of the present disclosure may be a bulk-type battery or a thin-film battery.
• a specific shape of the all-solid-state battery of the present disclosure is not particularly limited, and examples thereof include a coin type, a button type, a sheet type, a laminated type, and the like.
• the all-solid-state battery of the present disclosure has an electrolyte. Moreover, in the all-solid-state battery of the present disclosure, at least the electrolyte preferably contains the ion-conductive solid of the present disclosure.
• the solid electrolyte in the all-solid-state battery of the present disclosure may consist of the ion-conductive solid of the present disclosure, may contain other ion-conductive solids, and may contain ionic liquids and gel polymers. Other ion-conductive solids are not particularly limited , and may include ion-conductive solids commonly used in all-solid-state batteries, such as LiI, Li3PO4 , Li7La3Zr2O12 , and the like . good.
• the content of the ion-conductive solid of the present disclosure in the electrolyte in the all-solid-state battery of the present disclosure is not particularly limited, and is preferably 25% by mass or more, more preferably 50% by mass or more, and still more preferably It is 75% by mass or more, and particularly preferably 100% by mass.
• An all-solid-state battery of the present disclosure has a positive electrode.
• the positive electrode may include a positive electrode active material and may include the positive electrode active material and the ionically conductive solid of the present disclosure.
• As the positive electrode active material a known positive electrode active material such as a sulfide containing a transition metal element or an oxide containing lithium and a transition metal element can be used without particular limitation.
• the positive electrode may contain a binder, a conductive agent, and the like.
• binders include polyvinylidene fluoride, polytetrafluoroethylene, and polyvinyl alcohol.
• Examples of conductive agents include natural graphite, artificial graphite, acetylene black, and ethylene black.
• the all-solid-state battery of the present disclosure has a negative electrode.
• the negative electrode may include a negative electrode active material and may include the negative electrode active material and the ionically conductive solid of the present disclosure.
• the negative electrode active material known negative electrode active materials such as lithium, lithium alloys, inorganic compounds such as tin compounds, carbonaceous materials capable of absorbing and releasing lithium ions, and conductive polymers can be used without particular limitation.
• the negative electrode may contain a binder, a conductive agent, and the like. As the binder and the conductive agent, the same ones as those mentioned for the positive electrode can be used.
• the electrode "contains" the electrode active material means that the electrode has the electrode active material as a component/element/property.
• both the case of containing the electrode active material in the electrode and the case of the electrode surface being coated with the electrode active material correspond to the above "include”.
• the positive electrode and the negative electrode can be obtained by known methods such as mixing raw materials, molding, and heat treatment.
• the ion-conducting solid enters the gaps between the electrode active materials, making it easier to secure the conduction path of lithium ions. Since the ion conductive solid of the present disclosure can be produced by heat treatment at a lower temperature than the conventional technology, it is thought that the formation of a high resistance phase caused by the reaction between the ion conductive solid and the electrode active material can be suppressed.
• the positive electrode and the negative electrode may have current collectors.
• the current collector known current collectors such as aluminum, titanium, stainless steel, nickel, iron, calcined carbon, conductive polymer, and conductive glass can be used.
• the surface of aluminum, copper or the like treated with carbon, nickel, titanium, silver or the like can be used as the current collector.
• the all-solid-state battery of the present disclosure can be obtained by a known method such as laminating a positive electrode, a solid electrolyte, and a negative electrode, molding, and heat-treating, for example. Since the ion-conductive solid of the present disclosure can be produced by heat treatment at a lower temperature than the conventional technology, it is thought that the formation of a high-resistance phase caused by the reaction between the ion-conductive solid and the electrode active material can be suppressed. It is believed that an all-solid-state battery with excellent characteristics can be obtained.
• composition analysis of the ion-conductive solid is a sample solidified by the pressure molding method using wavelength dispersive X-ray fluorescence spectroscopy (hereinafter also referred to as XRF).
• XRF wavelength dispersive X-ray fluorescence spectroscopy
• composition analysis may be performed by inductively coupled plasma atomic emission spectrometry (ICP-AES).
• ICP-AES inductively coupled plasma atomic emission spectrometry
• the analyzer used is ZSX Primus II manufactured by Rigaku Corporation.
• the analysis conditions are as follows: Rh is used for the anode of the X-ray tube, vacuum atmosphere, analysis diameter is 10 mm, analysis range is from 17 deg to 81 deg, step is 0.01 deg, and scan speed is 5 sec/step.
• a proportional counter is used to measure light elements, and a scintillation counter is used to measure heavy elements.
• x 18.000 - 3b - xc - 3d
• x 18.000 - 3b - xc - 3d
• x is +2 when M is Mg, +3 when M is Al, +4 when M is Zr, Ce, Sn, Hf or C, and +5 when M is Nb.
• M represents two or more elements selected from the above group
• the value of xc is the sum of the products of x and the number of atoms c of each element.
• M2 Zr
• M represents three or more elements selected from the above group.
• Example 1 - Primary firing process Li3BO3 (manufactured by Toshima Seisakusho, purity 99.9% by mass), H3BO3 (manufactured by Kanto Chemical, purity 99.5%), Y2O3 (manufactured by Shin - Etsu Chemical, purity 99.9%). 9% by mass) and ZrO 2 (manufactured by Shin Nippon Denko, purity 99.9%) as raw materials, and each raw material is mixed so that Li 5.990 Y 0.990 Zr 0.010 B 3.000 O 9 Stoichiometric amounts were weighed and mixed in a Fritsch planetary mill P-7 at 300 rpm disk speed for 30 minutes.
• a zirconia ⁇ 5 mm ball and a 45 mL container were used for the planetary mill.
• the mixed powder was cold uniaxially molded at 147 MPa using a 100 kN electric press P3052-10 manufactured by NPA Systems, and fired in an air atmosphere.
• the heating temperature was 650° C. and the holding time was 720 minutes.
• the resulting ion-conductive solid containing oxide was pulverized with a planetary mill P-7 manufactured by Fritsch at a disk rotation speed of 230 rpm for 180 minutes to prepare a powder of ion-conductive solid containing oxide.
• the powder of the ion-conductive solid containing the oxide obtained above is molded using a discharge plasma sintering machine SPS-625 manufactured by Fuji Dempa Kogyo Co., Ltd. (hereinafter also simply referred to as “SPS”). , to prepare a sintered body of the ion-conductive solid containing the oxide of Example 1 by secondary firing.
• the heating temperature was 630° C.
• the pressure was 30 MPa
• the holding time was 10 minutes.
• Examples 2 to 5 Primary firing process Examples 2 to 5 were performed in the same process as in Example 1, except that the above raw materials were weighed in stoichiometric amounts so that a, b, c, and d were the values shown in Table 1.
• An ion-conducting solid containing an oxide and a powder of an ion-conducting solid containing an oxide were prepared.
• SPS spark plasma sintering
• Example 6 - Primary firing process Li3BO3 (manufactured by Toshima Seisakusho, purity 99.9% by mass), H3BO3 (manufactured by Kanto Chemical, purity 99.5%), Y2O3 (manufactured by Shin - Etsu Chemical, purity 99.9%). 9% by mass) and CeO 2 (manufactured by Shin - Etsu Chemical Co. , Ltd., purity 99.9 %) as raw materials, and The ion-conducting solid containing oxide and the powder of the ion-conducting solid containing oxide of Example 6 were prepared in the same process as in Example 1, except that the stoichiometric amount was weighed.
• the powder of the ion-conductive solid containing the oxide obtained above was molded in an air atmosphere and secondary-fired to prepare a sintered body of the ion-conductive solid containing the oxide of Example 6. .
• the heating conditions were 650° C. and the holding time was 720 minutes.
• Examples 7-9 Primary firing process Examples 7 to 9 were performed in the same process as in Example 6, except that the above raw materials were weighed in stoichiometric amounts so that a, b, c, and d were the values shown in Table 1.
• An ion-conducting solid containing an oxide and a powder of an ion-conducting solid containing an oxide were prepared.
• ⁇ Secondary firing step The powder of the ion-conductive solid containing the oxide obtained above is molded in an air atmosphere in the same process as in Example 6, and the oxides of Examples 7 to 9 are included by secondary firing. A sintered body of an ion-conducting solid was produced.
• Example 10 Primary firing process Li3BO3 (manufactured by Toshima Seisakusho, purity 99.9% by mass), H3BO3 (manufactured by Kanto Chemical, purity 99.5%), Y2O3 (manufactured by Shin - Etsu Chemical, purity 99.9%).
• Examples 11-12 - Calcination process
• the oxidation of Examples 11 and 12 was performed in the same process as in Example 10, except that the above raw materials were weighed in stoichiometric amounts so that a, b, c, and d were the values shown in Table 1.
• Powders of ion-conducting solids containing substances and ion-conducting solids containing oxides were prepared.
• ⁇ Secondary firing step The powder of the ion conductive solid containing the oxide obtained above is molded in an air atmosphere and secondary fired in the same process as in Example 6 to include the oxides of Examples 11 and 12. A sintered body of an ion-conducting solid was produced.
• Example 13 Primary firing process Li3BO3 (manufactured by Toshima Seisakusho, purity 99.9% by mass), H3BO3 (manufactured by Kanto Chemical, purity 99.5%), Y2O3 (manufactured by Shin - Etsu Chemical, purity 99.9%).
• Example 13 Li 5.930 Y 0.930 Zr 0
• the oxide-containing ion-conducting solid and oxide-containing solid of Example 13 were prepared in the same manner as in Example 1, except that each raw material was weighed in stoichiometric amounts to give 9.045 Ce 0.025 B 3.000 O 9 .
• a powder of an ion-conducting solid containing a substance was prepared.
• ⁇ Secondary firing step The powder of the ion-conductive solid containing the oxide obtained above is molded in an air atmosphere in the same steps as in Example 6, and secondary firing is performed to form the ion-conductive powder containing the oxide of Example 13. A sintered body of a flexible solid was produced.
• Example 14 to 16 Primary firing process Examples 14 to 16 were obtained in the same process as in Example 13, except that the above raw materials were weighed in stoichiometric amounts so that a, b, c, and d were the values shown in Table 1.
• An ion-conducting solid containing an oxide and a powder of an ion-conducting solid containing an oxide were prepared.
• ⁇ Secondary firing step The ion-conductive solid powder containing the oxide obtained above is molded in an air atmosphere and secondary fired in the same process as in Example 6 to include the oxides of Examples 14 to 16. A sintered body of an ion-conducting solid was produced.
• Example 17 Primary firing process Li3BO3 (manufactured by Toshima Seisakusho, purity 99.9% by mass), H3BO3 (manufactured by Kanto Chemical, purity 99.5%), Y2O3 (manufactured by Shin - Etsu Chemical, purity 99.9%).
• Example 17 9% by mass
• ZrO 2 manufactured by Shin Nippon Denko, purity 99.9%
• CeO 2 manufactured by Shin-Etsu Chemical, purity 99.9%
• SnO 2 manufactured by Mitsuwa Chemicals, purity 99.7%
• ⁇ Secondary firing step The powder of the ion-conductive solid containing the oxide obtained above is molded in an air atmosphere in the same steps as in Example 6, and secondary firing is performed to form the ion-conductive powder containing the oxide of Example 17. A sintered body of a flexible solid was produced.
• Example 18 - Primary firing process Li3BO3 (manufactured by Toshima Seisakusho, purity 99.9% by mass), H3BO3 (manufactured by Kanto Chemical, purity 99.5%), Y2O3 (manufactured by Shin - Etsu Chemical, purity 99.9%). 9% by mass) and Nb 2 O 5 (manufactured by Mitsui Kinzoku Mining, purity 99.9%) as raw materials, Li 5.790 Y 0.895 Nb 0.105 B 3.000 O 9 An oxide-containing ion-conductive solid and an oxide-containing ion-conductive solid powder of Example 18 were prepared in the same steps as in Example 1, except that the raw materials were weighed in stoichiometric amounts.
• Example 19 - Primary firing process Li3BO3 (manufactured by Toshima Seisakusho, purity 99.9% by mass), H3BO3 (manufactured by Kanto Chemical, purity 99.5%), Y2O3 (manufactured by Shin - Etsu Chemical, purity 99.9%).
• Example 20 - Primary firing process Li3BO3 (manufactured by Toshima Seisakusho, purity 99.9% by mass), H3BO3 (manufactured by Kanto Chemical, purity 99.5%), Y2O3 (manufactured by Shin - Etsu Chemical, purity 99.9%). 9% by mass), ZrO 2 (manufactured by Shin Nippon Denko, purity 99.9%), CeO 2 (manufactured by Shin-Etsu Chemical, purity 99.9%), SnO 2 (manufactured by Mitsuwa Chemicals, purity 99.7%) Li 5.795 Y 0.820 Zr 0.105 Ce 0.025 Sn 0.025 Nb 0.025 B3 .
• the ion-conductive solid containing oxide of Example 20 and the powder of the ion-conductive solid containing oxide of Example 20 were prepared in the same process as in Example 1, except that each raw material was weighed in a stoichiometric amount so as to give 9 000 O 2 . was made.
• ⁇ Secondary firing step The powder of the ion-conductive solid containing the oxide obtained above is molded in an air atmosphere in the same steps as in Example 6, and secondary firing is performed to form the ion-conductive powder containing the oxide of Example 20. A sintered body of a flexible solid was produced.
• Example 21 - Primary firing process Li3BO3 ( manufactured by Toshima Seisakusho, purity 99.9% by mass), H3BO3 (manufactured by Kanto Chemical, purity 99.5%), Y2O3 ( manufactured by Shin - Etsu Chemical, purity 99.9%). 9% by mass) and Li 2 CO 3 (manufactured by Nacalai Tesque, purity 99.0%) as raw materials, and each raw material so as to be Li 5.950 Y 1.000 C 0.050 B 2.950 O 9
• An ion-conductive solid containing an oxide of Example 21 and a powder of an ion-conductive solid containing an oxide of Example 21 were prepared in the same steps as in Example 1, except that a stoichiometric amount of was weighed.
• Example 22 Primary firing step
• the oxide of Example 22 was prepared in the same step as in Example 21, except that the above raw materials were weighed in stoichiometric amounts so that a, b, c, and d were the values shown in Table 1.
• Powders of ion-conducting solids containing and oxides were prepared.
• ⁇ Secondary firing step The powder of the ion-conductive solid containing the oxide obtained above is molded in an air atmosphere in the same steps as in Example 6, and secondary firing is performed to form the ion-conductive powder containing the oxide of Example 22. A sintered body of a flexible solid was produced.
• Example 23 Primary firing process Li3BO3 (manufactured by Toshima Seisakusho, purity 99.9% by mass), H3BO3 (manufactured by Kanto Chemical, purity 99.5%), Y2O3 (manufactured by Shin - Etsu Chemical, purity 99.9%).
• Example 23 The ion conductive solid containing oxide of Example 23 and the powder of the ion conductive solid containing oxide of Example 23 were prepared in the same process as in Example 1.
• Examples 24 to 27 - Calcination process
• the oxidation of Examples 24 to 27 was performed in the same process as in Example 23, except that the above raw materials were weighed in stoichiometric amounts so that a, b, c, and d were the values shown in Table 1.
• Powders of ion-conducting solids containing substances and ion-conducting solids containing oxides were prepared.
• ⁇ Secondary firing step The ion-conductive solid powder containing the oxide obtained above is molded in an air atmosphere and secondary fired in the same process as in Example 6 to include the oxides of Examples 24 to 27. A sintered body of an ion-conducting solid was produced.
• Example 28 - Primary firing process Li3BO3 (manufactured by Toshima Seisakusho, purity 99.9% by mass), H3BO3 (manufactured by Kanto Chemical, purity 99.5%), Y2O3 (manufactured by Shin - Etsu Chemical, purity 99.9%). 9% by mass), HfO 2 (manufactured by Numetals, purity 99.9%) and CeO 2 (manufactured by Shin-Etsu Chemical Co., Ltd., purity 99.9%) as raw materials to prepare Li 5.875 Y 0.875 Hf 0.9 mass %.
• Example 29 Primary firing process Li3BO3 ( manufactured by Toshima Seisakusho, purity 99.9% by mass), H3BO3 (manufactured by Kanto Chemical, purity 99.5%), Y2O3 ( manufactured by Shin - Etsu Chemical, purity 99.9%).
• ⁇ Secondary firing step The powder of the ion-conductive solid containing the oxide obtained above is molded in an air atmosphere in the same process as in Example 6, and secondary firing is performed to form the ion-conductive powder containing the oxide of Example 29. A sintered body of a flexible solid was produced.
• Example 30 - Primary firing process Li3BO3 ( manufactured by Toshima Seisakusho, purity 99.9% by mass), H3BO3 (manufactured by Kanto Chemical, purity 99.5%), Y2O3 ( manufactured by Shin - Etsu Chemical, purity 99.9%). 9% by mass) and HfO 2 (manufactured by New Metals, purity 99.9%) as raw materials, and chemically reacting each raw material so as to become Li 5.990 Y 0.990 Hf 0.010 B 3.000 O
• a sintered body of an ion conductive solid containing an oxide of Example 30 was produced in the same process as in Example 1, except that the stoichiometric amount was weighed.
• Example 31 Primary firing process Li3BO3 ( manufactured by Toshima Seisakusho, purity 99.9% by mass), H3BO3 (manufactured by Kanto Chemical, purity 99.5%), Y2O3 ( manufactured by Shin - Etsu Chemical, purity 99.9%). 9 mass %) and MgO (manufactured by Ube Materials , purity 99.0%) as raw materials , and chemically chemically A sintered compact of an ion-conductive solid containing the oxide of Example 31 was produced in the same process as in Example 1, except that the stoichiometric amount was weighed.
• ⁇ Secondary firing step The powder of the ion-conductive solid containing the oxide obtained above is molded in an air atmosphere in the same steps as in Example 6, and secondary firing is performed to form the ion-conductive powder containing the oxide of Example 31. A sintered body of a flexible solid was produced.
• Example 32 - Primary firing process Li3BO3 ( manufactured by Toshima Seisakusho, purity 99.9% by mass), H3BO3 (manufactured by Kanto Chemical, purity 99.5%), Y2O3 ( manufactured by Shin - Etsu Chemical, purity 99.9%).
• ⁇ Secondary calcination step The ion conductive solid powder containing the oxide obtained above is molded in an air atmosphere and secondary calcined in the same steps as in Example 6 to form the ion conductive powder containing the oxide of Example 32. A sintered body of a flexible solid was produced.
• Examples 33-34 Primary firing process Examples 33 to 34 were obtained in the same process as in Example 32, except that the above raw materials were weighed in stoichiometric amounts so that a, b, c, and d were the values shown in Table 1.
• An ion-conducting solid containing an oxide and a powder of an ion-conducting solid containing an oxide were prepared.
• ⁇ Secondary firing step The powder of the ion-conductive solid containing the oxide obtained above is molded in an air atmosphere in the same process as in Example 6, and is subjected to secondary firing to include the oxides of Examples 33-34. A sintered body of an ion-conducting solid was produced.
• Example 35 Primary firing process Li3BO3 ( manufactured by Toshima Seisakusho, purity 99.9% by mass), H3BO3 (manufactured by Kanto Chemical, purity 99.5%), Y2O3 ( manufactured by Shin - Etsu Chemical, purity 99.9%).
• MgO manufactured by Ube Materials, purity 99.0%
• ZrO 2 manufactured by Shin-Nippon Denko, purity 99.9%
• CeO 2 manufactured by Shin-Etsu Chemical, purity 99.9%
• HfO Li 5.745 Y 0.820 Mg 0.025 Zr 0.2 manufactured by Nu Metals, purity 99.9%
• Nb 2 O 5 manufactured by Mitsui Kinzoku Mining, purity 99.9 % were used as raw materials .
• Example 35 was prepared in the same process as in Example 1, except that each raw material was weighed in a stoichiometric amount to give 9 A sintered body of an ion-conducting solid containing ⁇ Secondary firing step The powder of the ion conductive solid containing the oxide obtained above is molded in an air atmosphere in the same steps as in Example 6, and secondary firing is performed to form the ion conductive powder containing the oxide of Example 35. A sintered body of a flexible solid was produced.
• Example 36 Primary firing process Li3BO3 (manufactured by Toshima Seisakusho, purity 99.9% by mass), H3BO3 (manufactured by Kanto Chemical, purity 99.5%), Y2O3 (manufactured by Shin - Etsu Chemical, purity 99.9%).
• Example 36 9% by mass
• MgO manufactured by Ube Materials, purity 99.0%
• ZrO 2 manufactured by Shin-Nippon Denko, purity 99.9%
• CeO 2 manufactured by Shin-Etsu Chemical, purity 99.9%
• Li Li 5.745 Y 0.845 Mg 0.025 Zr using 2 CO 3 manufactured by Nacalai Tesque, purity 99.0%
• Nb 2 O 5 manufactured by Mitsui Mining & Smelting, purity 99.9%
• a sintered body of an ion-conducting solid containing ⁇ Secondary firing step The powder of the ion-conductive solid containing the oxide obtained above is molded in an air atmosphere in the same steps as in Example 6, and secondary firing is performed to form the ion-conductive powder containing the oxide of Example 36.
• a sintered body of a flexible solid was produced.
• Example 37 Primary firing process Li3BO3 (manufactured by Toshima Seisakusho, purity 99.9% by mass), H3BO3 (manufactured by Kanto Chemical, purity 99.5%), Y2O3 (manufactured by Shin - Etsu Chemical, purity 99.9%).
• MgO manufactured by Ube Materials, purity 99.0%
• ZrO 2 manufactured by Shin-Nippon Denko, purity 99.9%
• CeO 2 manufactured by Shin-Etsu Chemical, purity 99.9%
• HfO 2 manufactured by Numetals, purity 99.9%
• Li 2 CO 3 manufactured by Nacalai Tesque, purity 99.0%
• Nb 2 O 5 manufactured by Mitsui Mining & Smelting, purity 99.9%
• a sintered body of an ion-conductive solid containing an oxide of Example 37 was produced in the same steps as in Example 1, except that the weight was weighed in .
• ⁇ Secondary firing step The powder of the ion-conductive solid containing the oxide obtained above is molded in an air atmosphere in the same steps as in Example 6, and secondary firing is performed to form the ion conductive powder containing the oxide of Example 37.
• a sintered body of a flexible solid was produced.
• Example 38 - Primary firing process Li3BO3 (manufactured by Toshima Seisakusho, purity 99.9% by mass), H3BO3 (manufactured by Kanto Chemical, purity 99.5%), Y2O3 (manufactured by Shin - Etsu Chemical, purity 99.9%).
• ⁇ Secondary firing step The powder of the ion-conductive solid containing the oxide obtained above is molded in an air atmosphere in the same steps as in Example 6, and secondary firing is performed to form the ion-conductive powder containing the oxide of Example 38. A sintered body of a flexible solid was produced.
• Example 39 - Primary firing process Li3BO3 ( manufactured by Toshima Seisakusho, purity 99.9% by mass), H3BO3 (manufactured by Kanto Chemical, purity 99.5%), Y2O3 ( manufactured by Shin - Etsu Chemical, purity 99.9%). 9% by mass) and Al 2 O 3 (manufactured by Baikowski Japan, purity 99.99%) as raw materials so that Li 5.970 Y 1.000 Al 0.010 B 3.000 O 9 A sintered body of an ion-conductive solid containing an oxide of Example 39 was produced in the same process as in Example 1, except that each raw material was weighed in a stoichiometric amount.
• ⁇ Secondary firing step The ion conductive solid powder containing the oxide obtained above is molded in an air atmosphere and secondary fired in the same process as in Example 6 to form the ion conductive powder containing the oxide of Example 39. A sintered body of a flexible solid was produced.
• Example 40 Primary firing process Li3BO3 (manufactured by Toshima Seisakusho, purity 99.9% by mass), H3BO3 (manufactured by Kanto Chemical, purity 99.5%), Y2O3 (manufactured by Shin - Etsu Chemical, purity 99.9%).
• Example 40 A sintered compact of an ion-conductive solid containing the oxide of Example 40 was produced in the same process as in Example 1.
• ⁇ Secondary firing step The powder of the ion-conductive solid containing the oxide obtained above is molded in an air atmosphere in the same steps as in Example 6, and secondary firing is performed to form the ion-conductive powder containing the oxide of Example 40. A sintered body of a flexible solid was produced.
• Examples 41-43 Firing step The oxidation of Examples 41 to 43 in the same steps as in Example 40, except that the above raw materials were weighed in stoichiometric amounts so that a, b, c, and d have the values shown in Table 1. Powders of ion-conducting solids containing substances and ion-conducting solids containing oxides were prepared. ⁇ Secondary calcination step The powder of the ion-conductive solid containing the oxide obtained above is molded in an air atmosphere in the same process as in Example 6, and is secondarily calcined to include the oxides of Examples 41 to 43. A sintered body of an ion-conducting solid was produced.
• the powder of the ion-conductive solid obtained above was shaped by spark plasma sintering (SPS) and secondary-fired to prepare a sintered body of the ion-conductive solid of Comparative Example 1.
• the heating temperature was 700° C.
• the pressure was 30 MPa
• the holding time was 10 minutes.
• the sintered bodies of ion conductive solids containing oxides of Examples 1 to 44 were subjected to composition analysis by the above method. Also, the sintered bodies of Examples 1 to 44 and Comparative Examples 1 and 2 were measured for ion conductivity by the following method. A method for measuring ionic conductivity is described below. Table 1 shows the obtained evaluation results.
• the sintered body of the ion-conductive solid containing a flat plate-shaped oxide obtained by the secondary firing two surfaces facing each other in parallel and having a large area were polished with sandpaper.
• the dimensions of the sintered body of the ion-conductive solid containing the plate-shaped oxide can be, for example, 0.9 cm ⁇ 0.9 cm ⁇ 0.05 cm, but are not limited thereto. Polish first with #500 for 15 to 30 minutes, then with #1000 for 10 to 20 minutes, and finally with #2000 for 5 to 10 minutes. Completed. After polishing, a gold film was formed on the polished surface of the sintered body of the ion conductive solid containing oxide using a Sanyu Denshi SC-701MkII ADVANCE sputtering apparatus.
• the film formation conditions were as follows: process gas: Ar, degree of vacuum: 2 Pa to 5 Pa, film formation time: 5 minutes. After the film formation, AC impedance measurement of the measurement sample was performed.
• An impedance/gain phase analyzer SI1260 and a dielectric interface system 1296 (both manufactured by Solartron) were used for impedance measurement, and the measurement conditions were a temperature of 27° C., an amplitude of 20 mV, and a frequency of 0.1 Hz to 1 MHz.
• the resistance of the sintered body of the ion conductive solid containing oxide was calculated using the Nyquist plot obtained by the impedance measurement and AC analysis software ZVIEW manufactured by Scribner.
• Ionic conductivity (S/cm) Thickness of sintered body of ion-conductive solid containing oxide (cm)/(Resistance of sintered body of ion-conductive solid containing oxide ( ⁇ ) ⁇ Electrode area (cm) 2 ))
• Table 1 shows the stoichiometric amounts of raw materials (general formula Li a Y b M The elements represented by M in cBdO 9 and the values of a, b, c and d) and ionic conductivity were summarized.
• all of the sintered bodies of ion-conductive solids containing oxides of Examples 1 to 44 and Comparative Example 1 have the composition as the stoichiometric amounts of the raw materials listed in Table 1. was confirmed.
• the sintered bodies of the ion-conductive solids containing oxides of Examples 1 to 44 were ion-conductive solids exhibiting high ion conductivity even when fired at a temperature of less than 700°C.
• the main crystal structure of the sintered body of the ion conductive solid containing the oxide of Comparative Example 2 was a mixture of ZrO 2 and CeO 2 used as raw materials.

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