WO2022227291A1 - 显示面板及其制作方法、显示装置 - Google Patents
显示面板及其制作方法、显示装置 Download PDFInfo
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- WO2022227291A1 WO2022227291A1 PCT/CN2021/106503 CN2021106503W WO2022227291A1 WO 2022227291 A1 WO2022227291 A1 WO 2022227291A1 CN 2021106503 W CN2021106503 W CN 2021106503W WO 2022227291 A1 WO2022227291 A1 WO 2022227291A1
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- layer
- segment
- conduction layer
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- signal line
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136259—Repairing; Defects
- G02F1/136263—Line defects
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136259—Repairing; Defects
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136222—Colour filters incorporated in the active matrix substrate
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
- G02F1/136295—Materials; Compositions; Manufacture processes
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/441—Interconnections, e.g. scanning lines
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1306—Details
- G02F1/1309—Repairing; Testing
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136259—Repairing; Defects
- G02F1/136272—Auxiliary lines
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
- G02F2201/50—Protective arrangements
- G02F2201/506—Repairing, e.g. with redundant arrangement against defective part
Definitions
- the present application relates to the field of display technology, and in particular, to a display panel, a method for manufacturing the same, and a display device having the display panel.
- Liquid Crystal Display is one of the most widely used flat panel displays at present, and the liquid crystal panel is the core component of the liquid crystal display.
- the traditional liquid crystal panel is usually composed of a color filter (Color Filter, CF) substrate, a thin film transistor array substrate (Thin Film Transistor Array Substrate, TFT Array Substrate) and a liquid crystal layer (Liquid Crystal Layer) disposed between two substrates, its working principle is to place liquid crystal molecules in two parallel glass substrates, and there are many vertical and horizontal thin wires between the two glass substrates.
- the liquid crystal molecules are controlled to change direction by whether the power is turned on or not, and the light from the backlight module is refracted to produce a picture.
- a thin film transistor (TFT) array is prepared on the thin film transistor array substrate, which is used to drive the rotation of the liquid crystal and control the display of each pixel, and the color filter substrate is provided with a color filter layer, which is used to form a color filter layer for each pixel. color.
- the color filter layer is composed of red color resists (Red), green color resists (Green), and blue color resists (Blue) arranged alternately.
- the disconnection of the thin film transistor array substrate means that the signal line in the liquid crystal display panel is broken due to a process defect of the thin film transistor array substrate, resulting in the phenomenon of poor display.
- the disconnection detection of the liquid crystal display is carried out after the thin film transistor array substrate manufacturing process, and the detected disconnection is repaired.
- a long metal film is used to connect the two sides of the breakpoint on the signal line to realize the signal in the signal line.
- the long metal film and the signal line are generally welded by laser melting.
- there is a step difference which will lead to uneven thickness of the long metal film, which is prone to breakage. Or the phenomenon of large impedance, which in turn affects the success rate of repair.
- Embodiments of the present application provide a display panel, a method for manufacturing the same, and a display device, which can solve the problems in the prior art, because the long metal film is prone to the phenomenon of uneven film thickness and fracture, which further affects the repair success rate of the first signal line. question.
- an embodiment of the present application provides a display panel, which includes:
- the first signal line includes a first segment, a second segment, and a transmission defect segment located between the first segment and the second segment;
- the repair part is continuously arranged on the spacer layer and is connected with the first segment and the second segment respectively, the repair part includes a first conduction layer arranged on the spacer layer and a a second conduction layer on the first conduction layer.
- a concave portion is formed on a side of the first conducting layer facing the second conducting layer, and the second conducting layer is at least filled in the concave portion.
- the second conduction layer is disposed on the spacer layer and the first conduction layer, and at least partially covers the first conduction layer.
- the fluidity of the material of the second conduction layer is greater than the fluidity of the material of the first conduction layer.
- the material of the first conduction layer includes tungsten, and the material of the second conduction layer includes silver.
- the display panel further includes a color resist layer disposed on the spacer layer, the color resist layer includes a hollow portion, the repair portion is disposed in the hollow portion, and the Two ends of the repaired portion are respectively connected with the first segment and the second segment through openings penetrating the spacer layer.
- the first conduction layer includes a first connection segment located in the opening
- the second conduction layer includes a second connection segment located in the opening
- the second connecting segment covers the first connecting segment snugly.
- the shape of the repair part includes a straight line, a broken line or a curved shape.
- a method for manufacturing a display panel which includes the following steps:
- a plurality of signal lines are formed, and the plurality of the signal lines include at least one first signal line, and the first signal line includes a first segment, a second segment, and a segment located between the first segment and the second segment.
- the repairing part is respectively connected with the first segment and the second segment, and the repairing part includes a first conducting layer formed on the spacer layer and a second conduction layer formed on the first conduction layer.
- a display device includes a display panel, and the display panel includes:
- the first signal line includes a first segment, a second segment, and a transmission defect segment located between the first segment and the second segment;
- the repair part is continuously arranged on the spacer layer and is connected with the first segment and the second segment respectively, the repair part includes a first conduction layer arranged on the spacer layer and a a second conduction layer on the first conduction layer.
- a concave portion is formed on a side of the first conducting layer facing the second conducting layer, and the second conducting layer is at least filled in the concave portion.
- the second conduction layer is disposed on the spacer layer and the first conduction layer, and at least partially covers the first conduction layer.
- the fluidity of the material of the second conduction layer is greater than the fluidity of the material of the first conduction layer.
- the material of the first conduction layer includes tungsten, and the material of the second conduction layer includes silver.
- the display panel further includes a color resist layer disposed on the spacer layer, the color resist layer includes a hollow portion, the repair portion is disposed in the hollow portion, and the Two ends of the repaired portion are respectively connected with the first segment and the second segment through openings penetrating the spacer layer.
- the first conduction layer includes a first connection segment located in the opening
- the second conduction layer includes a second connection segment located in the opening
- the second connecting segment covers the first connecting segment snugly.
- the shape of the repair part includes a straight line, a broken line or a curved shape.
- a repairing portion having a first conduction layer and a second conduction layer is arranged to be connected to the first signal line, and the second conduction layer is arranged on the first conduction layer, and is connected with the first conduction layer.
- a conductive layer is superimposed, thereby reducing the probability of breakage of the repaired portion, improving the thickness uniformity of the repairing portion, thereby effectively improving the repairing success rate of the repairing portion for the transmission defect of the first signal line, and improving the quality of the display panel. rate, improving the display effect.
- 1 is a schematic diagram of an existing long-film repair structure
- FIG. 2 is a schematic structural diagram of a display panel according to an embodiment of the present application.
- FIG. 3 is a schematic plan view of a display panel according to an embodiment of the present application.
- FIG. 4 is a schematic structural diagram of a repair part provided in an embodiment of the present application.
- FIG. 5 is a schematic structural diagram of another repair part provided in an embodiment of the present application.
- FIG. 6 is a schematic structural diagram of another display panel according to an embodiment of the present application.
- FIG. 7 is a schematic plan view of another display panel according to an embodiment of the present application.
- FIG. 8 is a schematic plan view of another display panel according to an embodiment of the present application.
- FIG. 9 is a schematic structural diagram of another display panel according to an embodiment of the present application.
- FIG. 10 is a schematic plan view of another display panel according to an embodiment of the present application.
- FIG. 11 is a flowchart of a method for fabricating a display panel according to an embodiment of the present application.
- the terms “installed”, “connected” and “connected” should be understood in a broad sense, for example, it may be a fixed connection or a detachable connection Connection, or integral connection; it can be mechanical connection, electrical connection or can communicate with each other; it can be directly connected or indirectly connected through an intermediate medium, it can be the internal communication of two elements or the interaction of two elements relation.
- installed should be understood in a broad sense, for example, it may be a fixed connection or a detachable connection Connection, or integral connection; it can be mechanical connection, electrical connection or can communicate with each other; it can be directly connected or indirectly connected through an intermediate medium, it can be the internal communication of two elements or the interaction of two elements relation.
- a first feature "on” or “under” a second feature may include direct contact between the first and second features, or may include the first and second features Not directly but through additional features between them.
- the first feature being “above”, “over” and “above” the second feature includes the first feature being directly above and obliquely above the second feature, or simply means that the first feature is level higher than the second feature.
- the first feature is “below”, “below” and “below” the second feature includes the first feature being directly below and diagonally below the second feature, or simply means that the first feature has a lower level than the second feature.
- the display panel includes a substrate 1, a passivation layer 2 disposed on the substrate 1, a signal line 3 disposed on the passivation layer 2, and an insulating layer 4 covering the signal line 3, and the signal line 3 is used for transmission and driving and the signal of the display function.
- the signal lines 3 are prone to breakage and other undesirable phenomena.
- the long-film repair technology is often used for repair, that is, a long metal film 5 is formed on the insulating layer 4, and the long metal film 5 and the signal line 3 have overlapping part.
- the overlapping parts are melted by laser and dotted to form openings through the insulating layer 4, so that the metal long film 5 is connected to the signal line 3, and needs to be connected to both sides of the break of the signal line 3, only shown in FIG. 1 . one place for illustration.
- the thickness distribution of the metal long film 5 is uneven, and the phenomenon of fracture or high impedance is prone to occur. , resulting in a low repair success rate and affecting the display effect of the display panel.
- an embodiment of the present application provides a display panel. Please refer to FIG. 2 and FIG. 3 .
- the display panel includes a plurality of signal lines, a spacer layer 20 and a repair portion 40 .
- the plurality of signal lines include at least one first signal line 30 , and the first signal line 30 includes a first segment 31 , a second segment 32 and a transmission defect segment located between the first segment 31 and the second segment 32 .
- the spacer layer 20 is disposed on the first signal line 30 , the repairing portion 40 is continuously disposed on the spacer layer 20 , and the repairing portion 40 is respectively connected with the first segment 31 and the second segment 32 .
- the repairing portion 40 includes a first conducting layer 41 disposed on the spacer layer 20 and a second conducting layer 42 disposed on the first conducting layer 41 .
- the embodiment of the present application provides the repair part 40 with the first conduction layer 41 and the second conduction layer 42, wherein the second conduction layer 42 is disposed on the first conduction layer 41.
- the display panel includes a substrate 10 , a gate insulating layer 21 disposed on the substrate 10 , and an interlayer insulating layer 22 disposed on the gate insulating layer 21 and disposed between the layers Color resist layer 60 on insulating layer 22 .
- the display panel further includes a plurality of signal lines, and the plurality of signal lines include at least one first signal line 30 and a plurality of second signal lines 50 .
- the plurality of signal lines include at least one first signal line 30 and a plurality of second signal lines 50 .
- signal line, and the second signal line 50 is other normal signal line for transmitting signals.
- the first signal line 30 includes a transmission defect segment 33 and a first segment 31 and a second segment 32 located on both sides of the transmission defect segment 33, wherein the transmission defect segment 33 has a signal transmission defect, which may specifically include a fracture or excessive impedance. big wait.
- the second signal line 50 may include a data line 51 and a scan line 52.
- the scan line 52 is disposed on the substrate 10 and covered by the gate insulating layer 21, and the data line 51 is disposed on the gate insulating layer 21 and is covered by the gate insulating layer 21.
- the interlayer insulating layer 22 covers.
- the second signal line 50 may further include other driving signal lines, such as power lines, etc., and the embodiments of the present application only take the data line 51 and the scan line 52 as examples for description.
- the display panel provided by the embodiment of the present application may be a COA type liquid crystal display panel, that is, in the manufacturing process of the display panel, the color resist layer is integrated and fabricated on one side of the array substrate.
- the array substrate includes a substrate 10 and a thin film transistor device and an electrode device disposed on the substrate 10
- the thin film transistor device includes a gate electrode and a data line disposed on the same layer as the scan line 52 and electrically connected to the data line.
- the source electrode and the drain electrode are arranged in the same layer and are electrically connected, and the active layer is respectively connected to the source electrode and the drain electrode on both sides.
- the color resist layer 60 is arranged on the interlayer insulating layer 22 .
- the display panel further includes an opposite substrate, a liquid crystal layer disposed between the array substrate and the opposite substrate, and pixel electrodes, common electrodes and the like disposed on the array substrate.
- the display panel also includes various other display components, such as an alignment film, a sealant, and the like between the array substrate and the opposite substrate. The setting can be performed with reference to the conventional process, and details are not repeated here.
- the data lines 51 and the scan lines 52 are intersected and distributed to define a plurality of pixel regions 61 distributed in an array, wherein the color resist layer 60 forms a color resist block corresponding to each pixel region 61, which may specifically include red color resist blocks, Green color block and blue color block.
- a thin film transistor device is disposed corresponding to each pixel region 61 , and the source electrode of the thin film transistor device is electrically connected to the data line 51 , and the gate electrode of the thin film transistor device is electrically connected to the scan line 52 to realize signal transmission.
- the first signal line 30 may be a data line 51 or a scan line 52.
- each first signal line 30 is independently selected from one of the data line 51 and the scan line 52 , which is determined according to actual production, and is not limited here.
- the display panel further includes a repairing portion 40, and the repairing portion 40 is disposed on the spacer layer 20 and connected to the first segment 31 and the second segment 32 of the first signal line 30 to realize parallel connection with the transmission defect segment 33 to realize Repair of a signal transmission defect in the first signal line 30 .
- the repair part 40 includes a first conduction layer 41 and a second conduction layer 42 arranged in layers.
- the second conduction layer 42 can further repair the repair defects of the first conductive layer 41 , thereby increasing the repair success rate of the repair portion 40 .
- a concave portion is formed on the side of the first conducting layer 41 facing the second conducting layer 42 , and the second conducting layer 42 is at least filled in the concave portion.
- the second conducting layer 42 has a flat surface. so that the repair part 40 also has a flat surface, so that the repair part 40 has a uniform film thickness and uniform impedance, so as to improve the repair effect.
- the fluidity of the material of the second conducting layer 42 is greater than that of the material of the first conducting layer 41 . It should be noted that the fluidity of the material here can be the same as that of the first conducting layer when preparing the repair part 40 .
- the fluidity of the film material coated on the through layer 41 and the second through layer 42 may specifically include liquid or solid forms. Since the fluidity of the material of the second conducting layer 42 is greater than that of the material of the first conducting layer 41 , the second conducting layer 42 can better cover the first conducting layer 41 to improve the first conducting layer 41 . Repair defects of the through layer 41 , such as uneven thickness or fracture, etc., to improve the repair success rate.
- the material of the first conduction layer 41 includes tungsten, and the material of the second conduction layer 42 includes silver. That is, in the embodiment of the present application, the surface of the first conduction layer 41 can be better covered by the fluidity of silver in the manufacturing process, so as to improve the thickness uniformity of the repair part 40 .
- the color resist layer 60 is formed with a continuous hollow portion, and the repair portion 40 is disposed in the hollow portion.
- the two ends of the repair portion 40 are respectively connected to the first section 31 and the second section 32 through the openings passing through the spacer layer 20 . connect.
- the hollow portion is formed by patterning the color resist layer 60 , that is, removing part of the color resist blocks in the color resist layer 60 , and the pattern of the hollow portion is the same as that of the repair portion 40 to accommodate the repair portion 40 .
- the thickness of the repairing portion 40 is equal to the thickness of the color resist layer 60, so as to reduce the generation of film layer step difference and improve the yield of the display panel.
- the first conductive layer 41 includes a first connecting section 411 located in the opening
- the second conducting layer 42 includes a second connecting section 421 located in the opening
- the second connecting section 421 closely covers the first connecting section 421.
- Connect segment 411 the side of the second connection segment 421 facing away from the first connection segment 411 has a flat surface, so as to improve the uniformity of the film layer of the repaired portion 40 in the opening, and to improve the connection between the repaired portion 40 and the first signal line 30 .
- the connection yield is improved, and the repair effect is improved.
- the second connecting section 421 is attached to the film topography in the opening and covers the first connecting section 411 .
- the second connection segment 421 can cover the first connection segment 411 by using the fluidity of the material of the second conduction layer 42 to conform to the film topography in the opening.
- the second connection segment 421 can also In the manufacturing process, the second connecting section 421 is covered on the first connecting section 411 by using the laser spotting technology, and the topography of the film layer in the opening is adhered.
- the second conductive layer 42 is disposed on the spacer layer 20 and the first conductive layer 41 and at least partially covers the first conductive layer 41 . Specifically, the following situations may be included.
- the second conductive layer 42 may cover the upper surface of the first conductive layer 41 , so that the repairing portion 40 has a flat upper surface, thereby improving the repairing effect.
- the second conductive layer 42 can cover the upper surface and the side surface of the first conductive layer 41 at the same time, so as to cover the first conductive layer 41 , so that the repair part 40 has a flat surface, which further improves the repair effect.
- the second conductive layer 42 may also be formed on a part of the upper surface of the first conductive layer 41 .
- the second conductive layer 42 may be located on the first conductive layer 41 where the repair defects are located and The position where the first conductive layer 41 and the first signal line 30 overlap, and the repair defect may be the position where the first conductive layer 41 is broken or the thickness is relatively uneven. Disposing the second conduction layer 42 at the position of the defect can improve the repairing defect of the first conduction layer 41 . Disposing the second conductive layer 42 at a position where the first conductive layer and the first signal line 30 have overlapping portions can ensure the contact yield between the repair part 40 and the first signal line 30 . Further, the thickness uniformity of the repair part 40 can be improved, and the repair success rate of the repair part 40 can be improved.
- the embodiments of the present application are not limited to the repair of the data lines 51 and the scan lines 52, but can also be repaired to any other signal lines in the display panel, such as power lines and other driving signal lines, which are not limited here.
- the first conductive layer 41 and the second conductive layer 42 are stacked to improve the success rate of repair.
- the first signal line 30 is a data line 51 .
- the display panel includes a substrate 10 , a gate insulating layer 21 disposed on the substrate 10 , a The interlayer insulating layer 22 on the gate insulating layer 21 and the color resist layer 60 disposed on the interlayer insulating layer 22 .
- the color resist layer 60 is formed with a hollow portion, and the display panel further includes a repair portion 40 disposed in the hollow portion.
- the repairing portion 40 is disposed on the interlayer insulating layer 22 .
- the spacer layer 20 is the interlayer insulating layer 22 .
- the repair part 40 is connected to the first signal line 30 through the opening through the interlayer insulating layer 22 .
- the first signal line 30 includes a first segment 31 , a second segment 32 and a transmission defect segment 33 located between the first segment 31 and the second segment 32 , and the repair portion 40 is connected to the first segment 31 and the first segment 31 and the second segment 32 respectively through the opening.
- the second segment 32 is connected in parallel with the transmission defect segment 33 to repair the signal transmission defect of the first signal line 30 .
- the repair part 40 includes a first conducting layer 41 disposed on the interlayer insulating layer 22 and a second conducting layer 42 disposed on the first conducting layer 41 , wherein the second conducting layer 42 may only cover the first conducting layer 42 .
- the upper surface of a conduction layer 41 either covers the upper surface and the side surface of the first conduction layer 41 , or is only disposed on a part of the first conduction layer 41 .
- the second conduction layer 42 can improve the repair defects, thereby improving the repair success rate of the repair part 40 .
- the shape of the repairing portion 40 includes a zigzag shape.
- the hollow portion formed in the color resist layer 60 is also a zigzag shape, and the hollow portion can be disposed in the pixel regions 61 on both sides of the first signal line 30 . Any of the above is not limited here.
- the repair portion 40 having the first conduction layer 41 and the second conduction layer 42 is arranged to be connected to the first signal line 30 , and the second conduction layer 42 is arranged on the first conduction layer 41 . It is superimposed with the first conductive layer 41, thereby reducing the probability of breakage of the repairing portion 40, improving the thickness uniformity of the repairing portion 40, and effectively improving the repairing success rate of the repairing portion 40 for the transmission defects of the first signal line 30. , improving the yield of the display panel and improving the display effect.
- the difference from the first embodiment lies in that the repair part 40 is set in a curved shape, and the repair part 40 can be disposed on the first signal line 30 Any one of the pixel regions 61 on both sides is not limited here.
- the difference from the first embodiment is that the repair part 40 is set to be straight, and the repair part 40 is parallel to the first signal line 30 , and correspondingly located above the first signal line 30 .
- Two ends of the repairing portion 40 are respectively connected to the first segment 31 and the second segment 32 through the opening, so as to improve the signal transmission defect of the first signal line 30 .
- the repairing portion 40 is disposed above the first signal line 30 , thereby reducing the area occupied by the repairing portion 40 in the pixel region 61 , increasing the pixel aperture ratio, and improving the display effect.
- the difference from the first embodiment is that the first signal line 30 is a scan line 52 .
- the repair portion 40 is located in the hollow portion and on the interlayer insulating layer 22 .
- the spacer layer 20 includes the interlayer insulating layer 22 and the gate insulating layer 21 , that is, the repair portion 40 penetrates through the interlayer insulating layer 22 and the gate insulating layer.
- the opening of the layer 21 is connected to the first signal line 30 .
- the repairing portion 40 is respectively connected to the first segment 31 and the second segment 32 of the first signal line 30 through the opening.
- the repair part 40 may also be set in a linear shape or a curved shape, which is not limited here.
- an embodiment of the present application further provides a method for fabricating a display panel according to the above-mentioned embodiment. Please refer to FIG. 2, FIG. 3 and FIG. 11, taking the structures shown in FIG. 2 and FIG. Production methods include:
- the plurality of signal lines include at least one first signal line 30, and the first signal line 30 includes a first segment 31, a second segment 32, and a first segment 31 and a second segment 32.
- the defective segment 33 is transmitted.
- the repairing part 40 continuously forming the repairing part 40 on the spacer layer 20, the repairing part 40 is respectively connected with the first segment 31 and the second segment 32, the repairing part 40 includes the first conducting layer 41 formed on the spacer layer 20 and the The second conductive layer 42 on the first conductive layer 41 .
- the manufacturing method of the display panel includes the following steps:
- a thin film transistor array layer and a color resist layer 60 are formed on the substrate 10 to form an array substrate.
- the array substrate includes a plurality of signal lines, and the plurality of signal lines includes at least one first signal line 30 and a plurality of second signal lines 50 .
- the first signal line 30 includes a first segment 31 , a second segment 32 and a transmission defect segment 33 located between the first segment 31 and the second segment 32 .
- the plurality of second signal lines 50 include data lines 51 and scan lines 52, and the first signal lines 30 can be data lines 51 or scan lines 52. When there are a plurality of first signal lines 30, each first signal line 30 Each is independently selected from the data line 51 and the scan line 52 .
- the array substrate further includes a substrate 10 , a gate insulating layer 21 disposed on the substrate 10 , an interlayer insulating layer 22 disposed on the gate insulating layer 21 , and a color resist layer 60 disposed on the interlayer insulating layer 22 .
- the data lines 51 are disposed on the gate insulating layer 21 and covered by the interlayer insulating layer 22
- the scanning lines 52 are disposed on the substrate 10 and covered by the gate insulating layer 21 .
- the thin film transistor array layer includes a thin film transistor device, and the thin film transistor device includes a gate electrode arranged in the same layer and electrically connected to the scan line 52, a source electrode and a drain electrode arranged in the same layer and electrically connected to the data line 51, The active layer to which the source and drain are connected, respectively.
- the spacer layer 20 is the interlayer insulating layer 22 .
- a hollow portion is formed on the color resist layer 60 corresponding to the first signal line 30 , and the hollow portion can be formed above the first signal line 30 or formed in the pixel regions 61 on both sides of the first signal line 30 .
- the color resist layer 60 is patterned to remove part of the color resist blocks in the color resist layer 60 to form the hollow portion.
- the hollow portion overlaps with the first segment 31 and the second segment 32 of the first signal line 30 .
- the repairing portion 40 is formed in the hollow portion, that is, the repairing portion 40 is formed on the interlayer insulating layer 22 .
- the first conductive layer 41 is formed in the hollow portion and on the interlayer insulating layer 22, and the first conductive layer 41 overlaps with the first segment 31 and the second segment 32.
- the overlapping portion of the through layer 41 with the first section 31 and the overlapping section with the second section 32 are both subjected to laser dot processing to form openings, and the first conduction layer 41 is formed with the first section 31 and the second section 32 respectively. connect.
- the material of the first conduction layer 41 includes tungsten.
- the second conduction layer 42 has overlapping parts with the first segment 31 and the second segment 32, that is, there is an overlapping part at the position of the opening, and then the first segment 31 and the second segment 32 have overlapping parts.
- the overlapping portion of a conducting layer 41 with the first segment 31 and the overlapping portion with the second segment 32 are both laser dotted twice, so that the second conducting layer 42 and the first conducting layer 41 are in phase with each other in the opening. Connected, that is, electrically connected to the first segment 31 and the second segment 32 respectively.
- the second conductive layer 42 can be evenly distributed in the opening, and can be connected with the first conductive layer 41 in the opening, which improves the repair effect and Repair success rate.
- the material of the second conduction layer 42 includes silver.
- the repairing portion 40 is formed by stacking the first conducting layer 41 and the second conducting layer 42, and the thickness of the repairing portion 40 is equal to the thickness of the color resist layer 60, thereby reducing the generation of film layer step difference and improving the product quality. Yield. Due to the better fluidity of silver, the repair defects of the first conduction layer 41 , such as uneven film thickness or fracture, can be further improved, which further improves the repair success rate of the repair portion 40 .
- An embodiment of the present application further provides a display device, the display device includes the display panel described in the foregoing embodiments, and the structures thereof are the same as those described in the foregoing embodiments, and are not repeated here.
- the repairing portion 40 having the first conduction layer 41 and the second conduction layer 42 is arranged to be connected to the first signal line 30 , and the second conduction layer 42 is arranged on the first conduction layer 41 . , and overlap with the first conduction layer 41 .
- the second conductive layer 42 can further improve the repair defects generated by the first conductive layer 41 , such as fracture or uneven thickness, thereby reducing the probability of fracture of the repair portion 40 , improving the thickness uniformity of the repair portion 40 , and further
- the repairing success rate of the repairing part 40 for the transmission defect of the first signal line 30 is effectively improved, the yield rate of the display panel is improved, and the display effect is improved.
- a display panel, a manufacturing method thereof, and a display device provided by the embodiments of the present application have been described in detail above.
- the principles and implementations of the present application are described with specific examples.
- the descriptions of the above embodiments are only for the purpose of Help to understand the technical solution of the present application and its core idea; those of ordinary skill in the art should understand: it can still make modifications to the technical solutions recorded in the foregoing embodiments, or perform equivalent replacements to some of the technical features; and these modifications Or alternatively, the essence of the corresponding technical solution does not deviate from the scope of the technical solutions of the embodiments of the present application.
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Abstract
一种显示面板及其制作方法、显示装置,其包括:第一信号线(30),第一信号线(30)包括第一段(31)、第二段(32)以及位于第一段(31)与第二段(32)之间的传输缺陷段;间隔层(20),设置于第一信号线(30)上;以及修复部(40),设置于间隔层(20)上,并分别与第一段(31)以及第二段(32)连接,修复部(40)包括设置于间隔层(20)上的第一导通层(41)以及设置于第一导通层(41)上的第二导通层(42),进而可以提高修复部(40)对第一信号线(30)的传输缺陷的修复成功率。
Description
本申请涉及显示技术领域,尤其涉及一种显示面板及其制作方法、及具有该显示面板的显示装置。
液晶显示器(Liquid Crystal Display,LCD)是目前使用最广泛的平板显示器之一,液晶面板是液晶显示器的核心组成部分。
传统的液晶面板通常是由一彩色滤光片(Color Filter,CF)基板、一薄膜晶体管阵列基板(Thin Film Transistor
Array Substrate,TFT Array
Substrate)以及一配置于两基板间的液晶层(Liquid Crystal Layer)所构成,其工作原理是在两片平行的玻璃基板当中放置液晶分子,两片玻璃基板中间有许多垂直和水平的细小电线,通过通电与否来控制液晶分子改变方向,将背光模组的光线折射出来产生画面。其中薄膜晶体管阵列基板上制备有薄膜晶体管(TFT)阵列,用于驱动液晶的旋转,控制每个像素的显示,而彩色滤光片基板上设有彩色滤光层,用于形成每个像素的色彩。彩色滤光层由红色色阻(Red)、绿色色阻(Green)、及蓝色色阻(Blue)交替排列组成。
薄膜晶体管阵列基板的断线是指由于薄膜晶体管阵列基板的制程缺陷导致液晶显示面板中的信号线发生断点,导致显示不良的现象发生。目前会在薄膜晶体管阵列基板制程后对液晶显示器进行断线检测,并对检查出的断线加以修复,通常采用金属长膜与信号线上断点的两侧连接,以实现信号线中信号的正常传输,金属长膜与信号线一般使用镭射熔融的方式进行焊接,但是,由于焊接空间较小,且信号线处起伏较大,存在段差,将导致金属长膜膜厚不均,容易出现断裂或阻抗较大的现象,进而影响修复的成功率。
本申请实施例提供一种显示面板及其制作方法、显示装置,能够解决现有技术,由于金属长膜容易出现膜厚不均、断裂的现象,进而影响第一信号线的修复成功率的技术问题。
为解决上述技术问题,本申请实施例提供一种显示面板,其包括:
多个信号线,包括至少一第一信号线,所述第一信号线包括第一段、第二段以及位于所述第一段与所述第二段之间的传输缺陷段;
间隔层,设置于所述第一信号线上;以及
修复部,连续地设置于所述间隔层上,并分别与所述第一段以及所述第二段相连接,所述修复部包括设置于所述间隔层上的第一导通层以及设置于所述第一导通层上的第二导通层。
在本申请的一种实施例中,所述第一导通层朝向所述第二导通层的一侧形成有凹部,所述第二导通层至少填充于所述凹部内。
在本申请的一种实施例中,所述第二导通层设置于所述间隔层与所述第一导通层上,并至少部分覆盖所述第一导通层。
在本申请的一种实施例中,所述第二导通层的材料的流动性大于所述第一导通层的材料的流动性。
在本申请的一种实施例中,所述第一导通层的材料包括钨,所述第二导通层的材料包括银。
在本申请的一种实施例中,所述显示面板还包括设置于所述间隔层上的色阻层,所述色阻层包括镂空部,所述修复部设置于所述镂空部内,所述修复部的两端通过贯穿所述间隔层的开孔分别与所述第一段以及所述第二段相连接。
在本申请的一种实施例中,所述第一导通层包括位于所述开孔内的第一连接段,所述第二导通层包括位于所述开孔内的第二连接段,所述第二连接段贴合地覆盖所述第一连接段。
在本申请的一种实施例中,所述修复部的形状包括直线形、折线形或曲线形。
根据本申请的上述目的,提供一种显示面板的制作方法,其包括以下步骤:
形成多个信号线,多个所述信号线包括至少一第一信号线,所述第一信号线包括第一段、第二段以及位于所述第一段与所述第二段之间的传输缺陷段;
形成间隔层于多个所述信号线上;以及
连续地形成修复部于所述间隔层上,所述修复部分别与所述第一段以及所述第二段相连接,所述修复部包括形成于所述间隔层上的第一导通层以及形成于所述第一导通层上的第二导通层。
根据本申请的上述目的,提供一种显示装置,所述显示装置包括显示面板,且所述显示面板包括:
多个信号线,包括至少一第一信号线,所述第一信号线包括第一段、第二段以及位于所述第一段与所述第二段之间的传输缺陷段;
间隔层,设置于所述第一信号线上;以及
修复部,连续地设置于所述间隔层上,并分别与所述第一段以及所述第二段相连接,所述修复部包括设置于所述间隔层上的第一导通层以及设置于所述第一导通层上的第二导通层。
在本申请的一种实施例中,所述第一导通层朝向所述第二导通层的一侧形成有凹部,所述第二导通层至少填充于所述凹部内。
在本申请的一种实施例中,所述第二导通层设置于所述间隔层与所述第一导通层上,并至少部分覆盖所述第一导通层。
在本申请的一种实施例中,所述第二导通层的材料的流动性大于所述第一导通层的材料的流动性。
在本申请的一种实施例中,所述第一导通层的材料包括钨,所述第二导通层的材料包括银。
在本申请的一种实施例中,所述显示面板还包括设置于所述间隔层上的色阻层,所述色阻层包括镂空部,所述修复部设置于所述镂空部内,所述修复部的两端通过贯穿所述间隔层的开孔分别与所述第一段以及所述第二段相连接。
在本申请的一种实施例中,所述第一导通层包括位于所述开孔内的第一连接段,所述第二导通层包括位于所述开孔内的第二连接段,所述第二连接段贴合地覆盖所述第一连接段。
在本申请的一种实施例中,所述修复部的形状包括直线形、折线形或曲线形。
相较于现有技术,本申请通过设置具有第一导通层以及第二导通层的修复部与第一信号线连接,且第二导通层设置于第一导通层上,与第一导通层叠加,进而可以减少修复部出现断裂的概率,提高了修复部的厚度均一性,进而有效地提高了修复部对于第一信号线传输缺陷的修复成功率,提高了显示面板的良品率,提高了显示效果。
下面结合附图,通过对本申请的具体实施方式详细描述,将使本申请的技术方案及其它有益效果显而易见。
图1为现有的长膜修复结构示意图;
图2为本申请实施例提供的一种显示面板的结构示意图;
图3为本申请实施例提供的一种显示面板的平面结构示意图;
图4为本申请实施例提供的一种修复部的结构示意图;
图5为本申请实施例提供的另一种修复部的结构示意图;
图6为本申请实施例提供的另一种显示面板的结构示意图;
图7为本申请实施例提供的另一种显示面板的平面结构示意图;
图8为本申请实施例提供的另一种显示面板的平面结构示意图;
图9为本申请实施例提供的另一种显示面板的结构示意图;
图10为本申请实施例提供的另一种显示面板的平面结构示意图;
图11为本申请实施例提供的显示面板的制作方法流程图。
下面将结合本申请实施例中的附图,对本申请实施例中的技术方案进行清楚、完整地描述。显然,所描述的实施例仅仅是本申请一部分实施例,而不是全部的实施例。基于本申请中的实施例,本领域技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本申请保护的范围。
在本申请的描述中,需要说明的是,除非另有明确的规定和限定,术语“安装”、“相连”、“连接”应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或一体地连接;可以是机械连接,也可以是电连接或可以相互通讯;可以是直接相连,也可以通过中间媒介间接相连,可以是两个元件内部的连通或两个元件的相互作用关系。对于本领域的普通技术人员而言,可以根据具体情况理解上述术语在本申请中的具体含义。
在本申请中,除非另有明确的规定和限定,第一特征在第二特征之“上”或之“下”可以包括第一和第二特征直接接触,也可以包括第一和第二特征不是直接接触而是通过它们之间的另外的特征接触。而且,第一特征在第二特征“之上”、“上方”和“上面”包括第一特征在第二特征正上方和斜上方,或仅仅表示第一特征水平高度高于第二特征。第一特征在第二特征“之下”、“下方”和“下面”包括第一特征在第二特征正下方和斜下方,或仅仅表示第一特征水平高度小于第二特征。
请参照图1,显示面板包括基板1、设置于基板1上的钝化层2、设置于钝化层2上的信号线3以及覆盖信号线3的绝缘层4,信号线3用于传输驱动以及显示功能的信号。在显示面板的制程中,信号线3容易发生断裂等不良现象,目前,常采用长膜修复技术进行修复,即在绝缘层4上形成金属长膜5,且金属长膜5与信号线3具有重叠部分。通过镭射熔融重叠部分进行打点,形成贯穿绝缘层4的开孔,使得金属长膜5与信号线3相连接,且需要与信号线3断裂处的两侧均连接,图1中仅示出其中一处,以作说明。但是,形成金属长膜5的过程中,由于信号线3处有起伏和段差,且镭射打点处空间较小,进而使得金属长膜5的厚度分布不均,容易出现断裂或阻抗较大的现象,导致修复成功率不高,影响显示面板的显示效果。
为解决上述技术问题,本申请实施例提供一种显示面板,请参照图2以及图3,显示面板包括多个信号线、间隔层20以及修复部40。
其中,多个信号线包括至少一第一信号线30,且第一信号线30包括第一段31、第二段32以及位于第一段31与第二段32之间的传输缺陷段。
间隔层20设置于第一信号线30上,修复部40连续地的设置于间隔层20上,且修复部40分别与第一段31以及第二段32相连接。
修复部40包括设置于间隔层20上第一导通层41以及设置于第一导通层41上的第二导通层42。
在实施应用过程中,本申请实施例通过设置具有第一导通层41以及第二导通层42的修复部40,其中,第二导通层42设置于第一导通层41上,当第一导通层41出现修复不完善的情况时,例如断裂或分布不均时,第二导通层42可以对第一导通层41上修复不完善的地方进行进一步的修复,进而可以提高修复部40对第一信号线30的传输缺陷的修复成功率。
请继续参照图2以及图3,在本申请实施例中,显示面板包括基板10、设置于基板10上的栅绝缘层21、设置于栅绝缘层21上的层间绝缘层22设置于层间绝缘层22上的色阻层60。
显示面板还包括多个信号线,多个信号线包括至少一第一信号线30以及多个第二信号线50。在显示面板的制程中,由于制程的波动,容易导致多个信号线中的部分出现缺陷,例如断裂或阻抗过大等,而第一信号线30即为显示面板制程中出现断裂等不良情况的信号线,而第二信号线50则为其他正常传输信号的信号线。
进一步地,第一信号线30包括传输缺陷段33以及位于传输缺陷段33两侧的第一段31以及第二段32,其中,传输缺陷段33具有信号传输缺陷,具体可包括断裂或阻抗过大等。
第二信号线50可包括数据线51以及扫描线52,在本申请实施例中,扫描线52设置于基板10上并由栅绝缘层21覆盖,数据线51设置于栅绝缘层21上并由层间绝缘层22覆盖。可选的,第二信号线50还可以包括其他驱动信号线,例如电源线等,而本申请实施例仅以数据线51以及扫描线52为例,进行说明。
需要说明的是,本申请实施例提供的显示面板可为COA型液晶显示面板,即在显示面板的制程中,将色阻层集成制作于阵列基板一侧。在本申请实施例中,阵列基板包括设置基板10以及设置于基板10上的薄膜晶体管器件以及电极器件,且薄膜晶体管器件包括与扫描线52同层且电性连接设置的栅极、与数据线51同层且电性连接设置的源极和漏极以及两侧与源极和漏极分别连接的有源层,色阻层60设置于层间绝缘层22上。此外,显示面板还包括对置基板以及设置于阵列基板与对置基板之间的液晶层,以及设置于阵列基板上的像素电极、公共电极等。显示面板还包含了各个其他显示部件,例如阵列基板和对置基板之间有配向膜、框胶等。可参照常规工艺进行设置,在此不再赘述。
承上,数据线51与扫描线52相交分布,以限定出阵列分布的多个像素区61,其中,色阻层60对应每个像素区61形成有色阻块,具体可包括红色色阻块、绿色色阻块以及蓝色色阻块。对应每个像素区61设置有薄膜晶体管器件,且薄膜晶体管器件的源极与数据线51电性连接,薄膜晶体管器件的栅极与扫描线52电性连接,以实现信号的传输。
可选的,第一信号线30可以为数据线51,也可以为扫描线52,当多个信号线在制程中出现传输缺陷时,即多个信号线包括有多个第一信号线30时,每个第一信号线30各自独立地选自数据线51以及扫描线52中的一种,根据实际生产决定,在此不作限定。
显示面板还包括修复部40,且修复部40设置于间隔层20上,并与第一信号线30的第一段31以及第二段32相连接,以实现与传输缺陷段33并联,以实现对第一信号线30中的信号传输缺陷的修复。
修复部40包括层叠设置的第一导通层41以及第二导通层42,通过在第一导通层41上再设置第二导通层42,且当第一导通层41出现修复缺陷时,例如断裂或厚度不均等,第二导通层42可对第一导通层41的修复缺陷进行进一步地修复,进而可以增加修复部40的修复成功率。
在本申请实施例中,第一导通层41朝向第二导通层42的一侧形成有凹部,且第二导通层42至少填充于凹部内,此外,第二导通层42具有平整的表面,进而使得修复部40也具有平整的表面,使得修复部40具有均匀的膜厚以及均匀的阻抗,以提高修复效果。
进一步地,第二导通层42的材料的流动性大于第一导通层41的材料的流动性,需要说明的是,此处材料的流动性可为在制备修复部40时,第一导通层41以及第二导通层42涂布的膜层材料的流动性,具体可包括液态或固态等形态。由于第二导通层42材料的流动性大于第一导通层41材料的流动性,进而使得第二导通层42可以更好的覆盖在第一导通层41上,以完善第一导通层41的修复缺陷,例如厚度不均或断裂等,以提高修复成功率。
可选的,第一导通层41的材料包括钨,第二导通层42的材料包括银。即本申请实施例通过银在制程中的流动性,可以更好地覆盖第一导通层41的表面,以提高修复部40的厚度均匀性。
需要说明的是,色阻层60形成有连续地镂空部,且修复部40设置于镂空部内,修复部40的两端通过贯穿间隔层20的开孔分别与第一段31以及第二段32连接。镂空部为对色阻层60进行图案化,即去除色阻层60中的部分色阻块形成,且镂空部的图案与修复部40相同,以容置修复部40。
可选的,修复部40的厚度等于色阻层60的厚度,以减少膜层段差的产生,提高了显示面板的良品率。
其中,第一导通层41包括位于开孔内的第一连接段411,第二导通层42包括位于开孔内的第二连接段421,且第二连接段421贴合地覆盖第一连接段411。进一步地,第二连接段421背向第一连接段411的一侧具有平整的表面,以提高修复部40位于开孔内的膜层均一性,提高了修复部40与第一信号线30的连接良品率,提高了修复效果。其中,第二连接段421贴合开孔内的膜层形貌覆盖于第一连接段411上。具体地,第二连接段421可利用第二导通层42材料的流动性,以贴合开孔内的膜层形貌覆盖于第一连接段411上,此外,第二连接段421还可通过制程中,采用镭射打点技术,将第二连接段421贴合地覆盖于第一连接段411上,并贴合开孔内的膜层形貌。
在本申请实施例中,第二导通层42设置于间隔层20与第一导通层41上,并至少部分覆盖第一导通层41。具体地,可包括如下几种情况。
请参照图4,第二导通层42可以覆盖第一导通层41的上表面,以使得修复部40具有平整的上表面,提高了修复效果。
请参照图5,第二导通层42可同时覆盖第一导通层41的上表面以及侧表面,以包覆第一导通层41,进而使得修复部40具有平整的表面,进一步地提高了修复效果。
请参照图6,第二导通层42也可形成于第一导通层41的部分上表面,具体地,第二导通层42可位于第一导通层41上具有修复缺陷的位置以及第一导通层41与第一信号线30具有重叠部分的位置,且修复缺陷可以是第一导通层41发生断裂或厚度较为不均的位置,通过在第一导通层41上具有修复缺陷的位置设置第二导通层42,可以改善第一导通层41的修复缺陷。在第一导通层与第一信号线30具有重叠部分的位置设置第二导通层42,可以保证修复部40与第一信号线30的接触良率。进而可以提高修复部40的厚度均一性,并提高了修复部40的修复成功率。
需要说明的是,本申请实施例并不限于对数据线51以及扫描线52的修复,还可以为显示面板中其他任何信号线的修复,例如电源线等驱动信号线,在此不作限定,通过层叠设置的第一导通层41与第二导通层42,以提高修复的成功率。
下面结合具体实施例,以对本申请实施例提供的显示面板的结构进行详述。
请参照图2以及图3,在本申请的一种实施例中,第一信号线30为数据线51,具体地,显示面板包括基板10、设置于基板10上的栅绝缘层21、设置于栅绝缘层21上的层间绝缘层22以及设置于层间绝缘层22上的色阻层60。色阻层60形成有镂空部,显示面板还包括设置于镂空部内的修复部40。
修复部40设置于层间绝缘层22上,在本实施例中,间隔层20即为层间绝缘层22。且修复部40通过贯穿层间绝缘层22的开孔与第一信号线30相连接。
进一步地,第一信号线30包括第一段31、第二段32以及位于第一段31与第二段32之间的传输缺陷段33,修复部40通过开孔分别与第一段31以及第二段32连接,以实现与传输缺陷段33并联,对第一信号线30的信号传输缺陷进行修复。
修复部40包括设置于层间绝缘层22上的第一导通层41以及设置于第一导通层41上的第二导通层42,其中,第二导通层42可仅覆盖于第一导通层41的上表面,或覆盖于第一导通层41的上表面以及侧表面,或仅设置于第一导通层41上的部分位置。当第一导通层41出现修复缺陷,例如厚度不均或断裂时,第二导通层42可对上述修复缺陷进行改善,进而可以提高修复部40的修复成功率。
在本实施例中,修复部40的形状包括折线形,对应的,色阻层60中形成的镂空部也为折线形,且镂空部可设置于第一信号线30两侧的像素区61中的任一者中,在此不作限定。
综上,本申请通过设置具有第一导通层41以及第二导通层42的修复部40与第一信号线30连接,且第二导通层42设置于第一导通层41上,与第一导通层41叠加,进而可以减少修复部40出现断裂的概率,提高了修复部40的厚度均一性,进而有效地提高了修复部40对于第一信号线30传输缺陷的修复成功率,提高了显示面板的良品率,提高了显示效果。
请参照图7,在本申请的另一种实施例中,其与第一个实施例的区别之处在于,将修复部40设置为曲线形,且修复部40可设置于第一信号线30两侧的像素区61中的任一者上,在此不作限定。
请参照图8,在本申请的另一种实施例中,其与第一个实施例的区别之处在于,将修复部40设置为直线形,且修复部40与第一信号线30平行,并对应位于第一信号线30的上方。修复部40的两端通过开孔分别与第一段31以及第二段32相连接,以改善第一信号线30的信号传输缺陷。
本实施例中将修复部40设置于第一信号线30上方,进而减少了修复部40占用像素区61的面积,提高了像素开口率,提高了显示效果。
请参照图9以及图10,在本申请的另一种实施例中,其与第一个实施例的区别之处在于,第一信号线30为扫描线52。修复部40位于镂空部内并位于层间绝缘层22上,在本实施例中,间隔层20包括层间绝缘层22以及栅绝缘层21,即修复部40通过贯穿层间绝缘层22以及栅绝缘层21的开孔与第一信号线30相连接。具体地,修复部40通过开孔分别与第一信号线30的第一段31以及第二段32相连接。
需要说明的是,在本申请的其他实施例中,针对第一信号线30为扫描线52的情况,修复部40也可设置为直线形或曲线形,在此不作限定。
另外,本申请实施例还提供一种上述实施例所述的显示面板的制作方法,请参照图2、图3以及图11,以图2以及图3中所示结构为例,进行说明,且制作方法包括:
S10、形成多个信号线,多个信号线包括至少一第一信号线30,第一信号线30包括第一段31、第二段32以及位于第一段31与第二段32之间的传输缺陷段33。
S20、形成间隔层20于多个信号线上。
S30、连续地形成修复部40于间隔层20上,修复部40分别与第一段31以及第二段32相连接,修复部40包括形成于间隔层20上的第一导通层41以及形成于第一导通层41上的第二导通层42。
具体地,本申请实施例提供的显示面板的制作方法包括以下步骤:
形成薄膜晶体管阵列层以及色阻层60于基板10上,以形成阵列基板。且阵列基板包括多个信号线,多个信号线包括至少一第一信号线30以及多个第二信号线50。其中,第一信号线30包括第一段31、第二段32以及位于第一段31以及第二段32之间的传输缺陷段33。多个第二信号线50包括数据线51以及扫描线52,且第一信号线30可为数据线51或扫描线52,当有多个第一信号线30时,每个第一信号线30各自独立地选自数据线51以及扫描线52。
进一步地,阵列基板还包括基板10、设置于基板10上的栅绝缘层21、设置于栅绝缘层21上的层间绝缘层22以及设置于层间绝缘层22上的色阻层60。其中,数据线51设置于栅绝缘层21上并被层间绝缘层22覆盖,扫描线52设置于基板10上并被栅绝缘层21覆盖。薄膜晶体管阵列层包括薄膜晶体管器件,且薄膜晶体管器件包括与扫描线52同层且电性连接设置的栅极、与数据线51同层且电性连接设置的源极和漏极以及两侧与源极和漏极分别连接的有源层。
需要说明的是,在图2所示结构的实施例中,间隔层20即为层间绝缘层22。
于色阻层60对应第一信号线30处形成镂空部,且镂空部可形成于第一信号线30上方,或形成于第一信号线30两侧的像素区61中。具体地,通过对色阻层60进行图案化处理,以去除色阻层60中的部分色阻块,以形成镂空部。其中,镂空部与第一信号线30的第一段31以及第二段32均有重叠部分。
形成修复部40于镂空部内,即形成修复部40于层间绝缘层22上。
具体地,形成第一导通层41于镂空部内,并位于层间绝缘层22上,且第一导通层41与第一段31以及第二段32均有重叠部分,然后对第一导通层41与第一段31的重叠部分以及与第二段32的重叠部分均进行镭射打点处理,以形成开孔,并使得第一导通层41分别与第一段31以及第二段32连接。
可选的,第一导通层41的材料包括钨。
形成第二导通层42与第一导通层41上,第二导通层42与第一段31以及第二段32均有重叠部分,即在开孔的位置具有重叠部分,然后对第一导通层41与第一段31的重叠部分以及与第二段32的重叠部分均进行两次镭射打点处理,并使得第二导通层42与第一导通层41在开孔内相连接,即分别与第一段31以及第二段32电性连接。
需要说明的是,由于在对第一导通层41进行镭射打点时,在第一信号线30上产生有开孔,且开孔空间较小,而第二导通层42不易进入开孔内,因此,本申请实施例通过至少两次镭射打点工艺,使得第二导通层42可以均匀分布于开孔内,并与第一导通层41在开孔内可以连接,提高了修复效果和修复成功率。
可选的,第二导通层42的材料包括银。
本申请实施例通过第一导通层41与第二导通层42层叠形成修复部40,且修复部40的厚度等于色阻层60的厚度,进而可以减少膜层段差的产生,提高了产品良率。由于银的流动性较好,进而可以进一步改善第一导通层41的修复缺陷,例如膜厚不均或断裂的,进一步地提高了修复部40的修复成功率。
本申请实施例还提供一种显示装置,显示装置包括上述实施例中所述的显示面板,其结构均与上述实施例中所述相同,在此不再赘述。
综上,本申请实施例通过设置具有第一导通层41以及第二导通层42的修复部40与第一信号线30连接,且第二导通层42设置于第一导通层41上,与第一导通层41叠加。第二导通层42可以进一步完善第一导通层41所产生的修复缺陷,例如断裂或厚度不均等,进而可以减少修复部40出现断裂的概率,提高了修复部40的厚度均一性,进而有效地提高了修复部40对于第一信号线30传输缺陷的修复成功率,提高了显示面板的良品率,提高了显示效果。
在上述实施例中,对各个实施例的描述都各有侧重,某个实施例中没有详述的部分,可以参见其他实施例的相关描述。
以上对本申请实施例所提供的一种显示面板及其制作方法、显示装置进行了详细介绍,本文中应用了具体个例对本申请的原理及实施方式进行了阐述,以上实施例的说明只是用于帮助理解本申请的技术方案及其核心思想;本领域的普通技术人员应当理解:其依然可以对前述各实施例所记载的技术方案进行修改,或者对其中部分技术特征进行等同替换;而这些修改或者替换,并不使相应技术方案的本质脱离本申请各实施例的技术方案的范围。
Claims (17)
- 一种显示面板,其包括:多个信号线,包括至少一第一信号线,所述第一信号线包括第一段、第二段以及位于所述第一段与所述第二段之间的传输缺陷段;间隔层,设置于所述第一信号线上;以及修复部,连续地设置于所述间隔层上,并分别与所述第一段以及所述第二段相连接,所述修复部包括设置于所述间隔层上的第一导通层以及设置于所述第一导通层上的第二导通层。
- 根据权利要求1所述的显示面板,其中,所述第一导通层朝向所述第二导通层的一侧形成有凹部,所述第二导通层至少填充于所述凹部内。
- 根据权利要求1所述的显示面板,其中,所述第二导通层设置于所述间隔层与所述第一导通层上,并至少部分覆盖所述第一导通层。
- 根据权利要求1所述的显示面板,其中,所述第二导通层的材料的流动性大于所述第一导通层的材料的流动性。
- 根据权利要求1所述的显示面板,其中,所述第一导通层的材料包括钨,所述第二导通层的材料包括银。
- 根据权利要求1所述的显示面板,其中,所述显示面板还包括设置于所述间隔层上的色阻层,所述色阻层包括镂空部,所述修复部设置于所述镂空部内,所述修复部的两端通过贯穿所述间隔层的开孔分别与所述第一段以及所述第二段相连接。
- 根据权利要求6所述的显示面板,其中,所述第一导通层包括位于所述开孔内的第一连接段,所述第二导通层包括位于所述开孔内的第二连接段,所述第二连接段贴合地覆盖所述第一连接段。
- 根据权利要求1所述的显示面板,其中,所述修复部的形状包括直线形、折线形或曲线形。
- 一种显示面板的制作方法,其包括以下步骤:形成多个信号线,多个所述信号线包括至少一第一信号线,所述第一信号线包括第一段、第二段以及位于所述第一段与所述第二段之间的传输缺陷段;形成间隔层于多个所述信号线上;以及连续地形成修复部于所述间隔层上,所述修复部分别与所述第一段以及所述第二段相连接,所述修复部包括形成于所述间隔层上的第一导通层以及形成于所述第一导通层上的第二导通层。
- 一种显示装置,所述显示装置包括显示面板,且所述显示面板包括:多个信号线,包括至少一第一信号线,所述第一信号线包括第一段、第二段以及位于所述第一段与所述第二段之间的传输缺陷段;间隔层,设置于所述第一信号线上;以及修复部,连续地设置于所述间隔层上,并分别与所述第一段以及所述第二段相连接,所述修复部包括设置于所述间隔层上的第一导通层以及设置于所述第一导通层上的第二导通层。
- 根据权利要求10所述的显示装置,其中,所述第一导通层朝向所述第二导通层的一侧形成有凹部,所述第二导通层至少填充于所述凹部内。
- 根据权利要求10所述的显示装置,其中,所述第二导通层设置于所述间隔层与所述第一导通层上,并至少部分覆盖所述第一导通层。
- 根据权利要求10所述的显示装置,其中,所述第二导通层的材料的流动性大于所述第一导通层的材料的流动性。
- 根据权利要求10所述的显示装置,其中,所述第一导通层的材料包括钨,所述第二导通层的材料包括银。
- 根据权利要求10所述的显示装置,其中,所述显示面板还包括设置于所述间隔层上的色阻层,所述色阻层包括镂空部,所述修复部设置于所述镂空部内,所述修复部的两端通过贯穿所述间隔层的开孔分别与所述第一段以及所述第二段相连接。
- 根据权利要求15所述的显示装置,其中,所述第一导通层包括位于所述开孔内的第一连接段,所述第二导通层包括位于所述开孔内的第二连接段,所述第二连接段贴合地覆盖所述第一连接段。
- 根据权利要求10所述的显示装置,其中,所述修复部的形状包括直线形、折线形或曲线形。
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- 2021-04-28 CN CN202110464609.4A patent/CN113176692B/zh active Active
- 2021-07-15 WO PCT/CN2021/106503 patent/WO2022227291A1/zh not_active Ceased
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| US20230168551A1 (en) | 2023-06-01 |
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