WO2022217954A1 - Method and device for manufacturing micro-nano structure - Google Patents
Method and device for manufacturing micro-nano structure Download PDFInfo
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- WO2022217954A1 WO2022217954A1 PCT/CN2021/138020 CN2021138020W WO2022217954A1 WO 2022217954 A1 WO2022217954 A1 WO 2022217954A1 CN 2021138020 W CN2021138020 W CN 2021138020W WO 2022217954 A1 WO2022217954 A1 WO 2022217954A1
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- Prior art keywords
- micro
- nano structure
- light
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- expansion material
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- 239000002086 nanomaterial Substances 0.000 title claims abstract description 73
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 28
- 238000000034 method Methods 0.000 title claims abstract description 16
- 239000000463 material Substances 0.000 claims abstract description 101
- 230000009471 action Effects 0.000 claims abstract description 8
- 230000005484 gravity Effects 0.000 claims abstract description 8
- 239000007788 liquid Substances 0.000 claims abstract description 7
- 238000001514 detection method Methods 0.000 claims description 8
- 239000004606 Fillers/Extenders Substances 0.000 claims description 3
- 239000011344 liquid material Substances 0.000 claims description 2
- 239000012780 transparent material Substances 0.000 claims description 2
- 230000009286 beneficial effect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- 238000009434 installation Methods 0.000 description 3
- 239000012071 phase Substances 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 238000007711 solidification Methods 0.000 description 3
- 230000008023 solidification Effects 0.000 description 3
- 238000000992 sputter etching Methods 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 230000003666 anti-fingerprint Effects 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000004049 embossing Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
Definitions
- the invention belongs to the technical field of micro-nano structure fabrication, and in particular relates to a micro-nano structure fabrication method and a micro-nano structure fabrication device.
- Micro-nano structures are fabricated on the surface of the light-transmitting member, which can often change, enhance or expand the functional properties of the light-transmitting member.
- the window member is used to isolate the external physical environment and only allow light to pass through.
- the sub-wavelength structure is made on the surface, which is beneficial to improve the anti-reflection property of the window.
- micro-nano structure due to the small size of the micro-nano structure, photolithography, electron beam direct writing or ion etching are often used to fabricate the micro-nano structure on the surface of the light-transmitting member, and the micro-nano structure is fabricated on the surface of the light-transmitting member.
- the structure process is relatively time-consuming, that is, there is a problem of low efficiency in fabricating the micro-nano structure on the surface of the light-transmitting member.
- the purpose of the present invention is to overcome the above-mentioned deficiencies of the prior art, and to provide a micro-nano structure fabrication device, which aims to solve the problem of low efficiency in fabricating the micro-nano structure on the surface of the light-transmitting member.
- the present invention is realized in this way:
- a method for fabricating a micro-nano structure comprising:
- a layer of liquid and transparent material is adhered on one side surface of the transparent blank and a functional extension material that does not flow out of the transparent blank under the action of gravity;
- the seal structure is separated from the functional expansion material.
- the functional extension material is an ultraviolet curing material
- the functional extender is cured by ultraviolet rays.
- the force with which the stamp structure imprints the functional expansion material is kept constant.
- the light-transmitting member is a window member
- the micro-nano structure is a sub-wavelength structure.
- the present invention also provides a micro-nano structure manufacturing device, including a stamp structure, which can make the material appear when it is imprinted in a liquid state and will not flow away from the material of the adhered object under the action of its own gravity.
- the resulting shape is a micro-nano structure.
- the seal structure is a seal structure made of light-transmitting material.
- the seal structure is made of flexible material and is in the shape of a film.
- the micro-nano structure fabrication device further includes:
- the stamping driving structure is used for driving the stamping structure to stamp on the functional expansion material.
- the micro-nano structure fabrication device further includes:
- a constant force control assembly including a pressure sensor and a detection force application member connected with the imprinting structure;
- the detection force-applying member presses the pressure sensor when the seal structure is imprinted on the functional expansion material
- the driving structure maintains the imprinting force on the functional expansion material when the pressure sensor detects that the pressure of the constant force detection force application member reaches a preset value.
- the light-transmitting member is a window member
- the micro-nano structure is a sub-wavelength structure.
- the micro-nano structure on the surface of the light-transmitting member can be formed at one time.
- the micro-nano structure can be gradually formed on the surface of the light-transmitting member.
- the fabrication time is shortened, and the fabrication efficiency of fabricating the micro-nano structure on the surface of the light-transmitting member is improved.
- FIG. 1 is a schematic diagram of the overall structure of a micro-nano structure fabrication device provided by an embodiment of the present invention
- FIG. 2 is a schematic diagram of a partial structure of a micro-nano structure fabrication device provided by an embodiment of the present invention
- FIG. 3 is a schematic diagram of another viewing angle of FIG. 2 .
- an embodiment of the present invention provides a method for fabricating a micro-nano structure, and the specific fabrication steps are as follows.
- a layer of functional expansion material that is liquid and is a light-transmitting material and will not flow out of the light-transmitting blank under the action of gravity is adhered to one side surface of the light-transmitting blank.
- the functional expansion material is a light-transmitting material, which can avoid affecting the realization of the basic functions of the light-transmitting member 800.
- the functional expansion material can be a thermosetting material, that is, when the temperature of the functional expansion material reaches a predetermined temperature, a solidification phase transition will occur, from a liquid phase. It can become a solid, or it can be a UV-curable material, that is, the functional extender will undergo a solidification phase change when it is irradiated by ultraviolet rays, from a liquid phase to a solid.
- the functional expansion material is an ultraviolet curing material. In this way, the functional expansion material will not undergo a solidification phase transition when it is not irradiated by ultraviolet rays, thereby avoiding the interference of the environmental temperature on the functional expansion material.
- the functional expansion material is in the form of a film as a whole, and although the functional expansion material is liquid, it will not flow out of the light-transmitting blank under the action of gravity, so the viscosity of the functional expansion material is relatively high. .
- the functional extension material can be coated on the transparent blank by a spin coater
- the stamp structure 100 is imprinted with a function extension material, and the shape of the function extension material is a micro-nano structure 810 .
- the side of the stamp structure 100 facing the functional expansion material has an embossing structure 110 that can be embedded with the micro-nano structure 810, so that when the stamp structure 100 imprints the functional expansion material, the shape of the functional expansion material is a micro-nano structure. 810.
- the functional expansion material is still in liquid state, and therefore, the functional expansion material will be deformed when being stamped by the stamp structure 100 .
- the functional expansion material is cured and attached to the light-transmitting blank, wherein the light-transmitting blank and the functional expansion material in the shape of the micro-nano structure 810 together constitute the light-transmitting member 800 .
- the functional expansion material becomes a part of the light-transmitting member 800
- the functional expansion material is in the shape of a micro-nano structure 810 .
- the functional expansion material is an ultraviolet curing material (eg, epoxy acrylate)
- the functional expansion material is cured by ultraviolet rays.
- the fourth step is to separate the seal structure 100 from the function expansion material.
- the functional extension material will not adhere to the stamp structure 100 to avoid damaging the micro-nano structure 810 presented by the functional extension material.
- the micro-nano structures 810 on the surface of the light-transmitting member 800 can be formed at one time.
- the surface is gradually formed, which significantly reduces the fabrication time and improves the fabrication efficiency of fabricating the micro-nano structure 810 on the surface of the light-transmitting member 800 .
- the force for imprinting the functional expansion material on the stamp structure 100 is kept constant, which is beneficial to ensure the imprinting effect of the stamp structure 100 .
- the stamp structure 100 is made of a flexible material and is in the shape of a film.
- the seal structure 100 is a hard material, the positions between the transparent blank and the seal structure 100 need to correspond completely. Between the seal structures 100, it is difficult to make the function expansion material present the preset micro-nano structure 810, and even the light-transmitting blank may be damaged. Based on this structural design, the position between the light-transmitting blank and the seal structure 100 is not complete.
- the stamp structure 100 when the stamp structure 100 is imprinted, the stamp structure 100 will be deformed, at least not damaging the light-transmitting blank.
- the stamp structure 100 will The deformation can still make the functional expansion material present the preset micro-nano structure 810 shape.
- the light-transmitting member 800 is a window member
- the micro-nano structure 810 is a sub-wavelength structure.
- the light-transmitting member 800 may be a screen panel, an anti-fingerprint film, an anti-peep film, or the like.
- the present invention further provides an apparatus for fabricating a micro-nano structure.
- the micro-nano structure manufacturing device includes a stamp structure 100 , and the stamp structure 100 can make the material present a shape of the micro-nano structure 810 when it is imprinted in a liquid state and will not flow away from the material of the adhered object under the action of its own gravity. .
- the method for fabricating the micro-nano structure 810 in the foregoing embodiment can be performed.
- the foregoing embodiment which will not be repeated here.
- the micro-nano structure 810 on the surface of the light-transmitting member 800 can be formed at one time, which is relatively
- the fabrication methods of photolithography, electron beam direct writing or ion etching are gradually formed on the surface of the transparent member 800 , which significantly reduces the fabrication time and improves the fabrication efficiency of fabricating the micro-nano structure 810 on the surface of the transparent member 800 .
- the stamp structure 100 is a stamp structure 100 made of a light-transmitting material. Based on this, first, when the stamp structure 100 imprints the function expansion material, the stamp structure 100 will cover the function expansion material, and based on this structure design, the staff can intuitively observe whether the imprinting position of the stamp structure 100 has obvious deviation. Next, when the functional expansion material is an ultraviolet curing material, it is convenient for the ultraviolet rays to pass through the stamp structure 100 to be irradiated to the functional expansion material.
- the seal structure 100 is made of a flexible material and is in the shape of a film.
- the side surface of the transparent blank adhering the function extension material is a curved surface
- the seal structure 100 is a hard material, the positions between the transparent blank and the seal structure 100 need to correspond completely. Between the seal structures 100, it is difficult to make the function expansion material present the preset micro-nano structure 810, and even the light-transmitting blank may be damaged. Based on this structural design, the position between the light-transmitting blank and the seal structure 100 is not complete.
- the stamp structure 100 when the stamp structure 100 is imprinted, the stamp structure 100 will be deformed, at least the light-transmitting blank will not be damaged. In addition, when the position between the light-transmitting blank and the stamp structure 100 is slightly misaligned, the stamp structure 100 will The deformation can still make the functional expansion material present the preset micro-nano structure 810 shape.
- a hard connecting ring is connected around the seal structure 100, and is connected with other structural components through the connecting ring.
- the micro-nano structure fabrication device further includes:
- the stamping driving structure 200 is used for driving the stamping structure 100 to stamp on the function expansion material.
- the use of machinery to drive the stamp structure 100 to emboss the functional expansion material is beneficial to ensure the consistency of stamping of the stamp structure 100 .
- the imprinting driving structure 200 can also be connected to a robotic arm 300 , and through the robotic arm 300 , the movable range of the imprinting driving structure 200 can be expanded, so that the imprinting driving structure 200 can finish imprinting a Before the light-transmitting member 800, the light-transmitting member 800 can be continuously imprinted at another location, thereby reducing the waiting time of the imprinting driving structure 200 and improving the imprinting efficiency.
- the micro-nano structure fabrication device further includes:
- the constant force control assembly 400 includes a pressure sensor 410 and a detection force application member 420 connected with the imprinting structure;
- the driving structure maintains the pressing force on the functional expansion material when the pressure sensor 410 detects that the pressure of the constant force detecting force applying member 420 reaches a preset value.
- the force of the stamp structure 100 to imprint the functional expansion material remains constant, which is beneficial to ensure the imprint effect of the stamp structure 100 .
- the micro-nano structure fabrication apparatus further includes a worktable 500 and a blank holder 600 .
- the blank holder 600 is placed on the worktable 500 and is provided with a transparent blank on the upper side. the placement slot 601.
- the pressure sensor 410 is installed on the workbench 500 .
- the apparatus for fabricating the micro-nano structure further includes an ultraviolet generator 700, and the ultraviolet generator 700 is used for generating ultraviolet rays.
- the detection force member 420 has an installation through hole 4201
- the seal structure 100 is installed at the opening of the installation through hole 4201
- the ultraviolet generator 700 is installed in the installation through hole 4201 .
- the light-transmitting member 800 is a window member
- the micro-nano structure 810 is a sub-wavelength structure.
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Abstract
A method and device for manufacturing a micro-nano structure (810). The method for manufacturing a micro-nano structure (810) comprises: adhering a layer of liquid functional extension material, which is a light-transmitting material and which does not flow away from a light-transmitting blank under the action of gravity, to a surface of one side of the light-transmitting blank; stamping the functional extension material with a stamp structure (100), such that the functional extension material assumes the shape of a micro-nano structure (810); curing the functional extension material and attaching the cured functional extension material to the light-transmitting blank, wherein the light-transmitting blank and the functional extension material jointly form a light-transmitting member (800); and separating the stamp structure (100) from the functional extension material. The manufacturing efficiency of manufacturing the micro-nano structure (810) on the surface of the light-transmitting member (800) is improved.
Description
本发明属于微纳结构制作技术领域,尤其涉及一种微纳结构制作方法及微纳结构制作装置。The invention belongs to the technical field of micro-nano structure fabrication, and in particular relates to a micro-nano structure fabrication method and a micro-nano structure fabrication device.
在透光件的表面制出微纳结构,常能改变、增强或扩展透光件的功能特性,如,窗口件用于隔绝外部的物理环境,仅容许光线通过,其中,在透光件的表面制出亚波长结构,有利于提高窗口件的增透性。Micro-nano structures are fabricated on the surface of the light-transmitting member, which can often change, enhance or expand the functional properties of the light-transmitting member. For example, the window member is used to isolate the external physical environment and only allow light to pass through. The sub-wavelength structure is made on the surface, which is beneficial to improve the anti-reflection property of the window.
现有技术中,由于微纳结构尺寸较小,常采用光刻、电子束直写或离子刻蚀的方式在透光件的表面制出微纳结构,在透光件的表面制出微纳结构的过程较为费时,也即是在透光件的表面制出微纳结构存在效率低的问题。In the prior art, due to the small size of the micro-nano structure, photolithography, electron beam direct writing or ion etching are often used to fabricate the micro-nano structure on the surface of the light-transmitting member, and the micro-nano structure is fabricated on the surface of the light-transmitting member. The structure process is relatively time-consuming, that is, there is a problem of low efficiency in fabricating the micro-nano structure on the surface of the light-transmitting member.
本发明的目的在于克服上述现有技术的不足,提供了一种微纳结构制作装置,其旨在解决在透光件的表面制出微纳结构存在效率低的问题。The purpose of the present invention is to overcome the above-mentioned deficiencies of the prior art, and to provide a micro-nano structure fabrication device, which aims to solve the problem of low efficiency in fabricating the micro-nano structure on the surface of the light-transmitting member.
本发明是这样实现的:The present invention is realized in this way:
一种微纳结构制作方法,包括:A method for fabricating a micro-nano structure, comprising:
在透光坯料的一侧表面粘附有一层液态并为透光材料且不会在重力作用下流离所述透光坯料的功能扩展料;A layer of liquid and transparent material is adhered on one side surface of the transparent blank and a functional extension material that does not flow out of the transparent blank under the action of gravity;
将印章结构压印所述功能扩展料,并使所述功能扩展料呈现出的形状为微纳结构;imprinting the functional expansion material on the seal structure, and making the functional expansion material present a micro-nano structure;
使所述功能扩展料固化,并附着于所述透光坯料,其中,所述透光坯料与呈微纳结构状的所述功能扩展料共同构成透光件;curing the functional expansion material and attaching it to the light-transmitting blank, wherein the light-transmitting blank and the functional expansion material in the form of a micro-nano structure together constitute a light-transmitting member;
使所述印章结构与所述功能扩展料分离。The seal structure is separated from the functional expansion material.
可选地,所述功能扩展料为紫外固化材料;Optionally, the functional extension material is an ultraviolet curing material;
通过紫外线使所述功能扩展料固化。The functional extender is cured by ultraviolet rays.
可选地,在所述功能扩展料固化之前,使所述印章结构压印所述功能扩展料的作用力维持恒定。Optionally, before the functional expansion material is cured, the force with which the stamp structure imprints the functional expansion material is kept constant.
可选地,所述透光件为窗口件;Optionally, the light-transmitting member is a window member;
所述微纳结构为亚波长结构。The micro-nano structure is a sub-wavelength structure.
本发明还提供一种微纳结构制作装置,包括印章结构,所述印章结构能够在压印于一液态且在自身重力作用下不会流离所粘附的物件的物料时,使所述物料呈现出的形状为微纳结构。The present invention also provides a micro-nano structure manufacturing device, including a stamp structure, which can make the material appear when it is imprinted in a liquid state and will not flow away from the material of the adhered object under the action of its own gravity. The resulting shape is a micro-nano structure.
可选地,所述印章结构为由透光材料制成的印章结构。Optionally, the seal structure is a seal structure made of light-transmitting material.
可选地,所述印章结构由柔性材料制成,且呈薄膜状。Optionally, the seal structure is made of flexible material and is in the shape of a film.
可选地,所述微纳结构制作装置还包括:Optionally, the micro-nano structure fabrication device further includes:
压印驱动结构,用于驱动所述印章结构压印至所述功能扩展料。The stamping driving structure is used for driving the stamping structure to stamp on the functional expansion material.
可选地,所述微纳结构制作装置还包括:Optionally, the micro-nano structure fabrication device further includes:
恒力控制组件,包括压力传感器以及与所述压印结构连接的检测施力件;a constant force control assembly, including a pressure sensor and a detection force application member connected with the imprinting structure;
所述检测施力件在所述印章结构压印至所述功能扩展料时抵压所述压力传感器;The detection force-applying member presses the pressure sensor when the seal structure is imprinted on the functional expansion material;
所述驱动结构在所述压力传感器检测到所述恒力检测施力件的压力达到预设值时维持对所述功能扩展料的压印力。The driving structure maintains the imprinting force on the functional expansion material when the pressure sensor detects that the pressure of the constant force detection force application member reaches a preset value.
可选地,所述透光件为窗口件;Optionally, the light-transmitting member is a window member;
所述微纳结构为亚波长结构。The micro-nano structure is a sub-wavelength structure.
基于本发明,透光件的表面的微纳结构可以一次成型,相对于现有,即相对于光刻、电子束直写或离子刻蚀的制作方法在透光件的表面逐步形成,明显减少了制作时间,提高了在透光件的表面制出微纳结构的制作效率。Based on the present invention, the micro-nano structure on the surface of the light-transmitting member can be formed at one time. Compared with the existing manufacturing methods, namely, photolithography, electron beam direct writing or ion etching, the micro-nano structure can be gradually formed on the surface of the light-transmitting member. The fabrication time is shortened, and the fabrication efficiency of fabricating the micro-nano structure on the surface of the light-transmitting member is improved.
为了更清楚地说明本发明实施例中的技术方案,下面将对实施例中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to illustrate the technical solutions in the embodiments of the present invention more clearly, the following briefly introduces the drawings required in the embodiments. Obviously, the drawings in the following description are only some embodiments of the present invention. For those of ordinary skill in the art, other drawings can also be obtained from these drawings without any creative effort.
图1是本发明实施例提供的微纳结构制作装置的整体结构示意图;1 is a schematic diagram of the overall structure of a micro-nano structure fabrication device provided by an embodiment of the present invention;
图2是本发明实施例提供的微纳结构制作装置的局部结构的示意图;2 is a schematic diagram of a partial structure of a micro-nano structure fabrication device provided by an embodiment of the present invention;
图3是图2的另一视角的示意图。FIG. 3 is a schematic diagram of another viewing angle of FIG. 2 .
附图标号说明:Description of reference numbers:
标号 label | 名称 name | 标号 label | 名称 name |
100 100 | 印章结构 seal structure | 110 110 | 压嵌结构 Compression structure |
200 200 | 压印驱动结构 Imprint drive structure | ||
300 300 | 机械臂 robotic arm | ||
400 400 | 恒力控制组件 Constant force control components | ||
410 410 | 压力传感器 Pressure Sensor | ||
420 420 | 检测施力件 Check the force | 4201 4201 | 安装通孔 Mounting through holes |
500 500 | 工作台 workbench | ||
600 600 | 坯料夹具 Blank fixture | 601 601 | 安置槽 placement slot |
700 700 | 紫外发生器 UV generator | ||
800 800 | 透光件 Translucent parts | 810 810 | 微纳结构 Micro-nano structure |
为了使本发明的目的、技术方案及优点更加清楚明白,以下结合附图及实施例,对本发明进行进一步详细说明。应当理解,此处所描述的具体实施例仅用以解释本发明,并不用于限定本发明。In order to make the objectives, technical solutions and advantages of the present invention clearer, the present invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention, but not to limit the present invention.
可参考图2和图3,本发明实施例提供一种微纳结构制作方法,其具体制作步骤如下。Referring to FIG. 2 and FIG. 3 , an embodiment of the present invention provides a method for fabricating a micro-nano structure, and the specific fabrication steps are as follows.
第一步,在透光坯料的一侧表面粘附有一层液态并为透光材料且不会在重力作用下流离透光坯料的功能扩展料。In the first step, a layer of functional expansion material that is liquid and is a light-transmitting material and will not flow out of the light-transmitting blank under the action of gravity is adhered to one side surface of the light-transmitting blank.
功能扩展料为透光材料,可避免影响透光件800的基础功能实现,功能扩展料可为热固材料,也即是功能扩展料的温度达到预定温度时会发生固化相变,从液态相变为固体,也可以是紫外固化材料,也即是功能扩展料受到紫外线照射时会发生固化相变,从液态相变为固体。在本发明实施例中,功能扩展料为紫外固化材料,如此,功能扩展料在没有受到紫外线照射时,不会发生固化相变,避免环境温度对功能扩展料的干扰。The functional expansion material is a light-transmitting material, which can avoid affecting the realization of the basic functions of the light-transmitting member 800. The functional expansion material can be a thermosetting material, that is, when the temperature of the functional expansion material reaches a predetermined temperature, a solidification phase transition will occur, from a liquid phase. It can become a solid, or it can be a UV-curable material, that is, the functional extender will undergo a solidification phase change when it is irradiated by ultraviolet rays, from a liquid phase to a solid. In the embodiment of the present invention, the functional expansion material is an ultraviolet curing material. In this way, the functional expansion material will not undergo a solidification phase transition when it is not irradiated by ultraviolet rays, thereby avoiding the interference of the environmental temperature on the functional expansion material.
在此需要说明的是,此步骤中,功能扩展料整体呈薄膜状,且虽然功能扩展料为液态,但不会在重力作用下流离透光坯料,因此,功能扩展料的粘稠度较高。It should be noted here that in this step, the functional expansion material is in the form of a film as a whole, and although the functional expansion material is liquid, it will not flow out of the light-transmitting blank under the action of gravity, so the viscosity of the functional expansion material is relatively high. .
在具体实施中,功能扩展料可通过旋涂机涂覆于透光坯料In a specific implementation, the functional extension material can be coated on the transparent blank by a spin coater
第二步,将印章结构100压印功能扩展料,并使功能扩展料呈现出的形状为微纳结构810。In the second step, the stamp structure 100 is imprinted with a function extension material, and the shape of the function extension material is a micro-nano structure 810 .
其中,印章结构100朝向功能扩展料的侧面具有能够与微纳结构810嵌合的压嵌结构110,以在印章结构100压印功能扩展料时,使功能扩展料呈现出的形状为微纳结构810。Wherein, the side of the stamp structure 100 facing the functional expansion material has an embossing structure 110 that can be embedded with the micro-nano structure 810, so that when the stamp structure 100 imprints the functional expansion material, the shape of the functional expansion material is a micro-nano structure. 810.
在此步骤中,功能扩展料依然是液态,因此,功能扩展料受到印章结构100压印时会发生形变。In this step, the functional expansion material is still in liquid state, and therefore, the functional expansion material will be deformed when being stamped by the stamp structure 100 .
第三步,使功能扩展料固化,并附着于透光坯料,其中,透光坯料与呈微纳结构810状的功能扩展料共同构成透光件800。In the third step, the functional expansion material is cured and attached to the light-transmitting blank, wherein the light-transmitting blank and the functional expansion material in the shape of the micro-nano structure 810 together constitute the light-transmitting member 800 .
在功能扩展料成为透光件800的一部分时,功能扩展料呈微纳结构810状。When the functional expansion material becomes a part of the light-transmitting member 800 , the functional expansion material is in the shape of a micro-nano structure 810 .
在此需要说明的是,如功能扩展料为紫外固化材料(如,环氧丙烯酸酯),则在此步骤中,是通过紫外线使功能扩展料固化的。It should be noted here that, if the functional expansion material is an ultraviolet curing material (eg, epoxy acrylate), in this step, the functional expansion material is cured by ultraviolet rays.
第四步,使印章结构100与功能扩展料分离。The fourth step is to separate the seal structure 100 from the function expansion material.
此步骤中,功能扩展料不会粘附于印章结构100,避免破坏功能扩展料呈现出的微纳结构810。In this step, the functional extension material will not adhere to the stamp structure 100 to avoid damaging the micro-nano structure 810 presented by the functional extension material.
基于本发明的方法,透光件800的表面的微纳结构810可以一次成型,相对于现有技术,即相对于光刻、电子束直写或离子刻蚀的制作方法在透光件800的表面逐步形成,明显减少了制作时间,提高了在透光件800的表面制出微纳结构810的制作效率。Based on the method of the present invention, the micro-nano structures 810 on the surface of the light-transmitting member 800 can be formed at one time. The surface is gradually formed, which significantly reduces the fabrication time and improves the fabrication efficiency of fabricating the micro-nano structure 810 on the surface of the light-transmitting member 800 .
在本发明实施例中,在功能扩展料固化之前,使印章结构100压印功能扩展料的作用力维持恒定,如此,有利于保证印章结构100的压印效果。In the embodiment of the present invention, before the functional expansion material is cured, the force for imprinting the functional expansion material on the stamp structure 100 is kept constant, which is beneficial to ensure the imprinting effect of the stamp structure 100 .
在本发明实施例中,使印章结构100由柔性材料制成,且呈薄膜状。在透光坯料粘附功能扩展料的侧面为曲面的情况下,如印章结构100为硬质材料,透光坯料与印章结构100之间的位置需要完全对应,如不完全对应,透光坯料与印章结构100之间难以使功能扩展料呈现出预设的微纳结构810状,甚至出现使透光坯料损坏的情况,而基于此结构设计,透光坯料与印章结构100之间的位置不完全对应,印章结构100压印时,印章结构100会发生形变,至少不会出现损坏透光坯料的情形,此外,透光坯料与印章结构100之间的位置略微错位时,通过印章结构100会发生形变,依然能够使功能扩展料呈现出预设的微纳结构810状。In the embodiment of the present invention, the stamp structure 100 is made of a flexible material and is in the shape of a film. In the case where the side surface of the transparent blank adhering the function extension material is a curved surface, if the seal structure 100 is a hard material, the positions between the transparent blank and the seal structure 100 need to correspond completely. Between the seal structures 100, it is difficult to make the function expansion material present the preset micro-nano structure 810, and even the light-transmitting blank may be damaged. Based on this structural design, the position between the light-transmitting blank and the seal structure 100 is not complete. Correspondingly, when the stamp structure 100 is imprinted, the stamp structure 100 will be deformed, at least not damaging the light-transmitting blank. In addition, when the position between the light-transmitting blank and the stamp structure 100 is slightly misaligned, the stamp structure 100 will The deformation can still make the functional expansion material present the preset micro-nano structure 810 shape.
在本发明实施例中,透光件800为窗口件,而微纳结构810为亚波长结构。In the embodiment of the present invention, the light-transmitting member 800 is a window member, and the micro-nano structure 810 is a sub-wavelength structure.
在此需要说明的是,透光件800可以是屏幕面板、抗指纹膜、防窥膜等。It should be noted here that the light-transmitting member 800 may be a screen panel, an anti-fingerprint film, an anti-peep film, or the like.
请参阅图1至图3,本发明还提供一种微纳结构制作装置。Please refer to FIG. 1 to FIG. 3 , the present invention further provides an apparatus for fabricating a micro-nano structure.
该微纳结构制作装置包括印章结构100,印章结构100能够在压印于一液态且在自身重力作用下不会流离所粘附的物件的物料时,使物料呈现出的形状为微纳结构810。The micro-nano structure manufacturing device includes a stamp structure 100 , and the stamp structure 100 can make the material present a shape of the micro-nano structure 810 when it is imprinted in a liquid state and will not flow away from the material of the adhered object under the action of its own gravity. .
基于此结构设计,可进行前述实施例的微纳结构810制作方法,具体可参见前述实施例,在此不再赘述。Based on this structural design, the method for fabricating the micro-nano structure 810 in the foregoing embodiment can be performed. For details, please refer to the foregoing embodiment, which will not be repeated here.
同样地,基于本此结构设计,在在透光件800的表面制出微纳结构810的过程中,透光件800的表面的微纳结构810可以一次成型,相对于现有,即相对于光刻、电子束直写或离子刻蚀的制作方法在透光件800的表面逐步形成,明显减少了制作时间,提高了在透光件800的表面制出微纳结构810的制作效率。Similarly, based on this structural design, in the process of fabricating the micro-nano structure 810 on the surface of the light-transmitting member 800, the micro-nano structure 810 on the surface of the light-transmitting member 800 can be formed at one time, which is relatively The fabrication methods of photolithography, electron beam direct writing or ion etching are gradually formed on the surface of the transparent member 800 , which significantly reduces the fabrication time and improves the fabrication efficiency of fabricating the micro-nano structure 810 on the surface of the transparent member 800 .
在本发明实施例中,印章结构100为由透光材料制成的印章结构100。基于此,首先,在印章结构100压印功能扩展料时,印章结构100会遮蔽功能扩展料,而基于此结构设计,工作人员能够直观地观察到印章结构100的压印位置是否有明显的偏移等,其次,在功能扩展料为紫外固化材料时,便于紫外线透过印章结构100照射到功能扩展料。In the embodiment of the present invention, the stamp structure 100 is a stamp structure 100 made of a light-transmitting material. Based on this, first, when the stamp structure 100 imprints the function expansion material, the stamp structure 100 will cover the function expansion material, and based on this structure design, the staff can intuitively observe whether the imprinting position of the stamp structure 100 has obvious deviation. Next, when the functional expansion material is an ultraviolet curing material, it is convenient for the ultraviolet rays to pass through the stamp structure 100 to be irradiated to the functional expansion material.
请参阅图1,在本发明实施例中,印章结构100由柔性材料制成,且呈薄膜状。在透光坯料粘附功能扩展料的侧面为曲面的情况下,如印章结构100为硬质材料,透光坯料与印章结构100之间的位置需要完全对应,如不完全对应,透光坯料与印章结构100之间难以使功能扩展料呈现出预设的微纳结构810状,甚至出现使透光坯料损坏的情况,而基于此结构设计,透光坯料与印章结构100之间的位置不完全对应,印章结构100压印时,印章结构100会发生形变,至少不会出现损坏透光坯料的情形,此外,透光坯料与印章结构100之间的位置略微错位时,通过印章结构100会发生形变,依然能够使功能扩展料呈现出预设的微纳结构810状。Referring to FIG. 1 , in the embodiment of the present invention, the seal structure 100 is made of a flexible material and is in the shape of a film. In the case where the side surface of the transparent blank adhering the function extension material is a curved surface, if the seal structure 100 is a hard material, the positions between the transparent blank and the seal structure 100 need to correspond completely. Between the seal structures 100, it is difficult to make the function expansion material present the preset micro-nano structure 810, and even the light-transmitting blank may be damaged. Based on this structural design, the position between the light-transmitting blank and the seal structure 100 is not complete. Correspondingly, when the stamp structure 100 is imprinted, the stamp structure 100 will be deformed, at least the light-transmitting blank will not be damaged. In addition, when the position between the light-transmitting blank and the stamp structure 100 is slightly misaligned, the stamp structure 100 will The deformation can still make the functional expansion material present the preset micro-nano structure 810 shape.
在此需要说明的是,为便于印章结构100的固定,印章结构100四周连接有一硬质的连接环,通过连接环来与其他结构件连接。It should be noted here that, in order to facilitate the fixing of the seal structure 100, a hard connecting ring is connected around the seal structure 100, and is connected with other structural components through the connecting ring.
请参阅图1,在本发明实施例中,微纳结构制作装置还包括:Referring to FIG. 1, in the embodiment of the present invention, the micro-nano structure fabrication device further includes:
压印驱动结构200,用于驱动印章结构100压印至功能扩展料。The stamping driving structure 200 is used for driving the stamping structure 100 to stamp on the function expansion material.
基于此,利用机械来驱动印章结构100压印至功能扩展料,有利于保证印章结构100压印的一致性。Based on this, the use of machinery to drive the stamp structure 100 to emboss the functional expansion material is beneficial to ensure the consistency of stamping of the stamp structure 100 .
在本发明实施例中,压印驱动结构200还可连接一机械臂300,通过机械臂300,可扩展压印驱动结构200的活动范围,使压印驱动结构200在一个位置压印完出一个透光件800之前,可以到另一个位置继续压印透光件800,减少压印驱动结构200的等待时间,提高压印效率。In the embodiment of the present invention, the imprinting driving structure 200 can also be connected to a robotic arm 300 , and through the robotic arm 300 , the movable range of the imprinting driving structure 200 can be expanded, so that the imprinting driving structure 200 can finish imprinting a Before the light-transmitting member 800, the light-transmitting member 800 can be continuously imprinted at another location, thereby reducing the waiting time of the imprinting driving structure 200 and improving the imprinting efficiency.
请参阅图1至图3,在本发明实施例中,微纳结构制作装置还包括:Please refer to FIG. 1 to FIG. 3 , in the embodiment of the present invention, the micro-nano structure fabrication device further includes:
恒力控制组件400,包括压力传感器410以及与压印结构连接的检测施力件420;The constant force control assembly 400 includes a pressure sensor 410 and a detection force application member 420 connected with the imprinting structure;
检测施力件420在印章结构100压印至功能扩展料时抵压压力传感器410;Detecting that the force-applying member 420 presses against the pressure sensor 410 when the seal structure 100 is imprinted on the functional expansion material;
驱动结构在压力传感器410检测到恒力检测施力件420的压力达到预设值时维持对功能扩展料的压印力。The driving structure maintains the pressing force on the functional expansion material when the pressure sensor 410 detects that the pressure of the constant force detecting force applying member 420 reaches a preset value.
基于此结构设计,在功能扩展料固化之前,印章结构100压印功能扩展料的作用力维持恒定,如此,有利于保证印章结构100的压印效果。Based on this structural design, before the functional expansion material is cured, the force of the stamp structure 100 to imprint the functional expansion material remains constant, which is beneficial to ensure the imprint effect of the stamp structure 100 .
请参阅图1至图3,在本发明实施例中,微纳结构制作装置还包括工作台500以及坯料夹具600,坯料夹具600放置于工作台500上,且于上侧开设有放置透光坯料的安置槽601。Referring to FIGS. 1 to 3 , in the embodiment of the present invention, the micro-nano structure fabrication apparatus further includes a worktable 500 and a blank holder 600 . The blank holder 600 is placed on the worktable 500 and is provided with a transparent blank on the upper side. the placement slot 601.
结合前述结构,压力传感器410安装于工作台500。Combined with the aforementioned structure, the pressure sensor 410 is installed on the workbench 500 .
进一步地,在本发明实施例中,微纳结构制作装置还包括紫外发生器700,紫外发生器700用以产生紫外线。Further, in the embodiment of the present invention, the apparatus for fabricating the micro-nano structure further includes an ultraviolet generator 700, and the ultraviolet generator 700 is used for generating ultraviolet rays.
结合前述结构,检测施力件420开设有安装通孔4201,印章结构100安装于安装通孔4201的孔口处,紫外发生器700安装于安装通孔4201。Combined with the aforementioned structures, the detection force member 420 has an installation through hole 4201 , the seal structure 100 is installed at the opening of the installation through hole 4201 , and the ultraviolet generator 700 is installed in the installation through hole 4201 .
在本发明实施例中,透光件800为窗口件,而微纳结构810为亚波长结构。In the embodiment of the present invention, the light-transmitting member 800 is a window member, and the micro-nano structure 810 is a sub-wavelength structure.
以上仅为本发明的较佳实施例而已,并不用以限制本发明,凡在本发明的精神和原则之内所作的任何修改、等同替换或改进等,均应包含在本发明的保护范围之内。The above are only preferred embodiments of the present invention and are not intended to limit the present invention. Any modification, equivalent replacement or improvement made within the spirit and principle of the present invention shall be included in the protection scope of the present invention. Inside.
Claims (10)
- 一种微纳结构制作方法,其特征在于,包括: A method for fabricating a micro-nano structure, comprising:在透光坯料的一侧表面粘附有一层液态并为透光材料且不会在重力作用下流离所述透光坯料的功能扩展料;A layer of liquid and transparent material is adhered on one side surface of the transparent blank and a functional extension material that does not flow out of the transparent blank under the action of gravity;将印章结构压印所述功能扩展料,并使所述功能扩展料呈现出的形状为微纳结构;imprinting the functional expansion material on the seal structure, and making the functional expansion material present a micro-nano structure;使所述功能扩展料固化,并附着于所述透光坯料,其中,所述透光坯料与呈微纳结构状的所述功能扩展料共同构成透光件;curing the functional expansion material and attaching it to the light-transmitting blank, wherein the light-transmitting blank and the functional expansion material in the form of a micro-nano structure together constitute a light-transmitting member;使所述印章结构与所述功能扩展料分离。The seal structure is separated from the functional expansion material.
- 如权利要求1所述的微纳结构制作方法,其特征在于,所述功能扩展料为紫外固化材料;The method for fabricating a micro-nano structure according to claim 1, wherein the functional extension material is an ultraviolet curing material;通过紫外线使所述功能扩展料固化。The functional extender is cured by ultraviolet rays.
- 如权利要求1所述的微纳结构制作方法,其特征在于,在所述功能扩展料固化之前,使所述印章结构压印所述功能扩展料的作用力维持恒定。The method for fabricating a micro-nano structure according to claim 1, characterized in that, before the functional expansion material is cured, the force with which the stamp structure imprints the functional expansion material is kept constant.
- 如权利要求1所述的微纳结构制作方法,其特征在于,所述透光件为窗口件;The method for fabricating a micro-nano structure according to claim 1, wherein the light-transmitting member is a window member;所述微纳结构为亚波长结构。The micro-nano structure is a sub-wavelength structure.
- 一种微纳结构制作装置,其特征在于,包括印章结构,所述印章结构能够在压印于一液态且在自身重力作用下不会流离所粘附的物件的物料时,使所述物料呈现出的形状为微纳结构。A micro-nano structure manufacturing device is characterized in that it includes a seal structure, which can make the material appear when it is imprinted in a liquid state and will not flow away from the material of the adhered object under the action of its own gravity. The resulting shape is a micro-nano structure.
- 如权利要求5所述的微纳结构制作装置,其特征在于,所述印章结构为由透光材料制成的印章结构。The device for fabricating a micro-nano structure according to claim 5, wherein the stamp structure is a stamp structure made of a light-transmitting material.
- 如权利要求6所述的微纳结构制作装置,其特征在于,所述印章结构由柔性材料制成,且呈薄膜状。6. The device for fabricating a micro-nano structure according to claim 6, wherein the stamp structure is made of a flexible material and is in the shape of a film.
- 如权利要求1所述的微纳结构制作装置,其特征在于,所述微纳结构制作装置还包括:The device for fabricating a micro-nano structure according to claim 1, wherein the device for fabricating a micro-nano structure further comprises:压印驱动结构,用于驱动所述印章结构压印至所述功能扩展料。The stamping driving structure is used for driving the stamping structure to stamp on the functional expansion material.
- 如权利要求8所述的微纳结构制作装置,其特征在于,所述微纳结构制作装置还包括:The device for fabricating a micro-nano structure according to claim 8, wherein the device for fabricating a micro-nano structure further comprises:恒力控制组件,包括压力传感器以及与所述压印结构连接的检测施力件;a constant force control assembly, including a pressure sensor and a detection force application member connected with the imprinting structure;所述检测施力件在所述印章结构压印至所述功能扩展料时抵压所述压力传感器;The detection force-applying member presses the pressure sensor when the seal structure is imprinted on the functional expansion material;所述驱动结构在所述压力传感器检测到所述恒力检测施力件的压力达到预设值时维持对所述功能扩展料的压印力。The driving structure maintains the imprinting force on the functional expansion material when the pressure sensor detects that the pressure of the constant force detection force application member reaches a preset value.
- 如权利要求5所述的微纳结构制作装置,其特征在于,所述透光件为窗口件;The device for fabricating a micro-nano structure according to claim 5, wherein the light-transmitting member is a window member;所述微纳结构为亚波长结构。The micro-nano structure is a sub-wavelength structure.
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