CN102768381A - Micro-nano structured D-shaped optical fiber, method for producing same and application - Google Patents
Micro-nano structured D-shaped optical fiber, method for producing same and application Download PDFInfo
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Abstract
A micro-nano structured D-shaped optical fiber has a cross section which has a shape of a letter D, i.e. one side of the optical fiber is a round surface, the other side of the optical fiber is a plane or is similar to the plane, the distance (radius r) from a fiber core to the round side of the optical fiber is 50-200 micrometers, and the distance d from the plane to the fiber core is 5-15 micrometers; a concave-convex pattern structure is formed on the D plane, and is a one-dimensional array or a two-dimensional grid array which has a period of 0.2-15mu.m, the line width of 100-1000nm and the depth of 100-400nm; and the plane side of the optical fiber has a strong evanescent field, and is easily regulated by surface structure characteristics and material properties. A method for producing a micro-nano structure on the surface of the D-shaped optical fiber is specifically that a nanoimprint technology is utilized to transfer a template structure onto the plane of the D-shaped optical fiber, through the mutual action of the transferred micro-nano structure and the evanescent field of the D-shaped optical fiber plane, the light which is transmitted in the optical fiber can be regulated, and furthermore, the functions of light sensing, light regulating and the like are realized.
Description
Technical field
The present invention relates to the photoelectron technology field, be specifically related to a kind of preparation technology and application of novel micro nanometer structure D shape optical fiber.This invention has proposed to control through preparation technology's flow process and parameter that nano impression is transferred to D shape optical fiber plane with the micro-nano structure on the template, and this D shape optical fiber specifically is applied to fields such as sensing, communication, integrated optics.
Background technology
Refractive index cycle property modulated structure more and more receives the attention of optical communication and sensory field in recent years.They can form Prague forbidden band relevant with period of change, in the transmission course of light wave, play reflex.Before half a century; The physicist just knows; Electronics in the crystal (like semiconductor) is owing to receive periodicity potential (periodic potential) scattering of lattice; Partly wave band can form energy gap (energy gap) because of destruction interference, causes the dispersion relation (dispersion relation) of electronics to be zonal arrangement, and this is famous electronic band structure (electronic band structures).By 1987; E.Yablonovitch and S.John coincidentally point out; Similar phenomenon also is present in the photonic system: be in the three-dimensional dielectric material of periodic arrangement at dielectric coefficient, electromagnetic wave is after the dielectric function scattering, and the electromagnetic intensity of some wave band can be exponential damping because of destruction interference; Can't in system, transmit; Be equivalent on frequency spectrum, form energy gap, so dispersion relation also has banded structure, this is so-called photonic band structures (photonic band structures).Dielectric material with photonic band structures just is called photonic band-gap system (photonic band-gap system is called for short the PBG system), or is called for short photonic crystal (photonic crystals).Layered periodic structure just is being based on that the concept development of photonic crystal gets up, and the application fast development based on Fiber Bragg Grating FBG (fiber Bragg gratings) has in recent years proved the importance of layered periodic structure at optical communication and sensory field especially.
On optical fiber, making micro-nano structure such as Bragg grating has multiple use, for example utilizes the variations in refractive index of evanescent field testing environment medium, thereby monitors character such as its chemical concentrations and pH value.Compare characteristics such as this Fibre Optical Sensor with micro-nano structure has remote distributed sensor, on-line measurement, simplicity of design, volume is little and cost is low with traditional sensors.But the ordinary optic fibre xsect is circular; Make the structure difficulty on its surface big, and architecture quality is difficult to be guaranteed, and the structure and the distance between the sandwich layer that are produced on simultaneously on the fibre cladding are bigger; The evanescent field insufficient strength all can be influential to the sensitivity and the accuracy of sensing measurement.For evanescent field intensity is increased; Then need the covering of optical fiber be corroded, reduce the thickness of covering, perhaps optical fiber is ground; Wherein simultaneously polishing of covering become D shape plane; Optical fiber will have more energy to leak in the external environment like this, stronger evanescent field occur, make the change of surrounding medium can directly have influence on the variation of each parameter of light field.A kind of like this ordinary optic fibre is ground, just be called D shape optical fiber thereby change the special optical fiber that its shape of cross section and structure change the basic mode transport property.
D shape optical fiber is a kind of through grinding or corroding method change ordinary optic fibre (comprising single-mode fiber and multimode optical fiber) shape of cross section and structure, thereby changes the special optical fiber of basic mode transport property.Shown in Fig. 1 a, the cladding diameter of former ordinary optic fibre is 2r, and single-mode fiber still is that its cladding diameter of multimode optical fiber all is 125 microns usually; Be called D shape plane through grinding its section of back to become the shape of alphabetical " D ", radius-of-curvature be 3r to the one side of ∞; The fiber core layer diameter is 2a, is generally 3 ~ 10 microns for single-mode fiber, and multimode optical fiber is 50 ~ 65 microns, and representative value is 50 microns and 62.5 microns; D is the distance from the sandwich layer center to D shape plane, is generally 5 to 15 microns.There is stronger evanescent field at place, D shape plane, and Fig. 1 b is seen in its distribution, and more common circular fiber significantly strengthens.
Than arcwall face, to make structure in the flat one side of D shape optical fiber and become easily, the quality of structure also is guaranteed.Therefore explore easy, on D shape optical fiber, make micro-nano structure efficiently and realize that the method for the micro-nano structure of refractive index cycle property modulation has realistic meanings and using value widely.
Still there is not at present any report that utilizes stamping technique to realize micro-nano structure D shape optical fiber preparation.With the micro-nano structure grating is example: on ordinary optic fibre, people mainly make the micro-nano structure grating through following two kinds of methods: phase mask method and point-to-point writing method.1., the phase mask method will be carved good figure mask with electron beam exposure and placed on the optical fiber; Utilize phase mask compacting Zero-order diffractive to strengthen the function of first-order diffraction; Positive and negative first-order diffraction spectral line forms interference fringe after making ultraviolet light through the mask phase modulation (PM) on optical fiber, and be the half the Bragg grating of mask cycle write cycle.The weak point of this method is only to be applicable to periodic structure, is difficult to realize the preparation of complex pattern, and mask fabrication complex process, cost are high.2., point-to-point writing method is to utilize precision mechanism control fiber optics displacement, exposure inscription one by one.This method can realize the preparation of arbitrary graphic pattern, the accurate displacement device but the complicated focus optical of needs is unified, and cost is high, and efficient is low.Therefore, invent a kind of low cost, the high efficiency method that can on D shape optical fiber plane, prepare the grating micro-nano structure has significant values.
When more various preparation micro-nano structures technological, some key indexs, for example resolution, pattern precision, production efficiency and preparation cost etc. all are important Scheme Choice standards.Be tending towards resolution limit gradually in traditional photoetching (photolithography) technology; In the process that various emerging technologies such as optical interference and beam flying etc. continue to bring out, nano impression (nanoimprint lithography) technology that proposes at first by the S.Chou of Princeton University etc. with its low cost, high resolving power, be easy to realize that inherent advantage such as large tracts of land structure preparation has got into everybody sight line.And unique soft impression (soft lithography) technology also is very significant in the advantage of irregular contour surface micro-structure aspect preparing in the nanometer embossing; Therefore; Prepare various artificial micro-nano structures with nanometer embossing; Especially optical micro/nano structure such as preparation grating etc. has become the direction that academia and industrial community are extremely paid close attention on microsize irregular contour objects such as optical fiber, has good industry development prospect.We are incorporated into nanometer embossing in the middle of the making of micro-nano structure D shape optical fiber just, have started a kind of high precision, low cost, high efficiency technology of preparing.
This technology all has very application prospects in fields such as optical communication, light sensing and integrated opticss.Such as being used to make dispersion compensation sheet, rejection filter, wavelength selector spare, network monitoring, Erbium-Doped Fiber Amplifier (EDFA), non-linear raman amplifier, fiber laser, semiconductor laser; Polarization-modulating type sensor, phase modulation-type sensor, chemical sensor, temperature sensor, pressure transducer; Optical waveguide wavelength-selective switches and light-emitting component, light holographic memory, optical waveguide are directly write or the like.These devices need quick, efficient, compact optics usually.In conventional device; These opticses all are the body block parts; Need be with being optically coupled in these parts in the optical fiber, play after the respective action again coupling and get back in the optical fiber, the D shape optical fiber that has an artificial micro-nano structure then can be directly and the ordinary optic fibre welding; Realize full optical fibre device, and do not need corresponding body block part.
Summary of the invention
The object of the invention: propose a kind of novel micro nanometer structure D shape optical fiber, preparation technology and related application.The technical characterictic of micro-nano structure D shape optical fiber has been listed in this invention, utilizes nano impression to prepare the technological process and the parameter control of micro-nano structure D shape optical fiber, and has enumerated the concrete application in fields such as this D shape Fibre Optical Sensor, communication, integrated optics.The present invention can be efficiently, stable, produce high-quality micro-nano structure D shape optical fiber in batches at an easy rate, realize efficient modulation to light field in the optical fiber.
The technical characterstic of micro-nano structure D shape optical fiber: as (Fig. 1 a) shown in, for a kind of shape of cross section be the letter " D " type optical fiber, promptly optical fiber one side is a rounded face, the optical fiber opposite side is the D plane near the plane.Fibre core is 50～200 microns to the distance (radius r) of rounded face one side, and the D plane is 5 ~ 15 microns to fibre core apart from d, and there is very strong evanescent field at place, this type optical fiber D plane, and Fig. 1 b is seen in its distribution, is vulnerable to the regulation and control of surface texture featur and material character.On the D plane, periodic structure is set, making structure is one-dimensional grating array or the two-dimensional grid array of cycle 2 ~ 15um, live width 100 ~ 1000nm, the degree of depth 100 ~ 400nm.
Principle of the present invention: can on the interface of sandwich layer and covering form evanescent field when light is propagated in optical fiber.Because covering is non-absorbing medium, can not cause the minimizing of transmission of power in the optical fiber in the optical fiber.The size of fiber evanescent field field intensity can be expressed as: E=E
0Exp (z/dp).E in the formula
0Be evanescent field at the interface energy intensity; Z is the distance of field point apart from the interface.Dp is the penetration depth of evanescent field, and the strength degradation that is defined as when energy field arrives E
0During/e, the distance at interface is put in the field.Equation expression is:
In the formula: λ is the wavelength of light when propagating in a vacuum; n
1Refractive index for fiber core; n
2Refractive index for measured object solution; θ is the incident angle of light.The evanescent field that utilizes the special morphological feature of D shape optical fiber to produce at place, D plane; Make the nanostructured of D shape face and the generation effective interaction of the interior light that transmits of fiber core layer; Realization is to the modulation of characteristics such as light intensity, wavelength, phase place, polarization, thereby in applications such as optical communication, light sensing, integrated optics performance important application.
Technical scheme of the present invention: we are with stamping technique and equipment improvement and be transplanted to D shape fiber body and fasten, and have realized the making of micro-nano structure D shape optical fiber.Under the good situation of D shape planar smoothness, can realize the making of high-resolution, high-quality micro-nano structure D shape optical fiber with the hard template impression; When the flatness of D shape optical fiber is good inadequately, then select for use the technology of soft template impression to prepare, with the resolution that ensures figure with shift precision.For the making of micro-nano structure on the D type optical fiber plane provides a kind of advantages of simplicity and high efficiency to prepare scheme.
The processing step of micro-nano structure D shape optical fiber preparation:
1. prepare D shape optical fiber through two kinds of different approaches: the one, be the 2r=125 micron directly through grinding cladding diameter; The general single mode fiber of sandwich layer diameter 2a=10 micron (also can be multimode optical fiber 2r=125 micron; 2a=50 ~ 65 micron); Make the shape of its section one-tenth " D " shape plane or almost plane, d=5-15 micron (to multimode optical fiber d=a～a+10 micron); The 2nd, a columniform preform side is vertically ground, the fiber size according to design grinds off a part of covering in proportion, makes the shape of cross section of prefabricated rods be D shape until polished plane near fiber cores.The D shape prefabricated rods that mill is good is placed on carries out melt drawing on the wire drawing machine, the control temperature is unsuitable too high, makes the optical fiber cross section still keep D shape.Wire drawing in the thermal-flame simultaneously makes the D plane become extremely smooth low scattering surface to the further flame polish effect in D shape plane.
2. on the D plane of D shape optical fiber, through the solution coating impression glue is set, annealing in process is removed solvent and is also discharged internal stress;
The template that 3. will have micro/nano-scale relief pattern structure is pressed in the impression glue that is in liquid state or viscoelastic attitude on the optical fiber plane, solidified imprinting glue then, and lift-off stencil is transferred to micro-nano structure on the impression glue; Keep system pressure in 0 ~ 150bar scope in the moulding process, temperature makes impression glue in moulding process, keep liquid state or viscoelastic attitude at 10 ~ 300 ℃, keeps this pressure and temp condition 1 second ~ 200 minutes, realizes the abundant transfer of figure; Solidification process can adopt cooling to solidify and ultraviolet (visible) illumination curing according to used impression glue type; Pressure condition is kept in cooling curing; The control system temperature is reduced to following 1 ~ 100 ℃ of impression glue glass transition temperature, waits for 0 ~ 100 minute, and the realization system is solidified; Ultraviolet (visible) illumination curing is kept pressure condition, is 0.01 ~ 1000mW/cm with a luminous power
2Ultraviolet or visible light source irradiation impression glue 1 second ~ 200 minutes, the realization system is solidified; Moving back mold process is to utilize external force to make template and the process that impresses the glue mechanical separation.Template comprises hard template and soft template, and the hard template material characteristics is that the mould material quality is hard, and in impression pressure process, template can keep its shape invariance.Soft template is that quality is soft, and the polymkeric substance or the elastomeric material of obviously deformation takes place in pressure process.
4. etching: be printed on the impression glue of micro-nano relief pattern structure with reactive ion beam etching (RIBE), remove the impression glue of groove; And further etching or wet etching are transferred to optical fiber with structure; Obtain having the micro-nano structure complementary on the D shape optical fiber D plane with formwork structure;
5. wash-out: solvent elution is removed residual impression glue on the optical fiber planar projections structure.
The concrete application of micro-nano structure D shape optical fiber: with miniature full-optical fiber optical path sensor, full optical fiber optical optical switch, fiber-grating laser, complete optical fiber polarization device etc. is that the detailed preparation process and the performance parameter of the concrete device of representative partly details at embodiment.
Beneficial effect of the present invention:
1. because the distance of D plane from the sandwich layer center is merely 5 to 15 microns; Be 1/8th to 1/25th (standard single-mode fiber cladding diameter representative value is 125um) of standard single-mode fiber cladding diameter; The micro-nano structure of D shape face is very near from sandwich layer, and structure is strengthened the optical modulation effect in the sandwich layer.
2. nano impression is a kind of low cost, high-level efficiency, high-resolution figure transfer technology.Only need a template just can repeat to impress several thousand times, realize the quick transfer of large tracts of land, high-resolution micro-nano graph.
3. all very simple and repeated good regardless of the preparation or the operation of nanometer embossing that are D shape optical fiber, perhaps utilize the multi-impression of template through changing template at the same area, can obtain different micro-nano structures.Therefore the method that the applying nano stamping technique prepares micro-nano structure on D shape optical fiber plane has simple and convenient, flexible and changeable characteristics.
Description of drawings
Fig. 1 a is a D shape optical fiber sectional view.
Fig. 1 b is the distribution plan of disappearance wave field along the section radius direction.
Fig. 2 is the nano impression schematic diagram, and wherein scheming a is the hot padding synoptic diagram, and figure b is the ultraviolet stamping synoptic diagram.
Fig. 3 is that common hard impression is implemented synoptic diagram on D shape optical fiber plane, carrying out the practical implementation method figure of nano impression, wherein scheming a, and figure b is that soft impression is implemented synoptic diagram
Fig. 4 a, Fig. 4 b, Fig. 4 c and Fig. 4 d are the scanning electron microscope diagram of sample in the specific embodiment of the invention.
Fig. 5 a, Fig. 5 b are respectively the transmission spectrums of traditional Bragg grating and 2 D photon crystal microcavity.
Fig. 6 a, Fig. 6 b are respectively the polarization contrast of sub-wavelength metal wiregrating D shape optical fiber and the data plot of corresponding different wave length selective permeation of different wiregrating cycle.
Embodiment:
Below in conjunction with accompanying drawing and embodiment the present invention is done specifying further, so that advantage of the present invention is able to clear representing.Come further to illustrate the inventive method and application through embodiment, rather than will limit the present invention with these embodiment.
The technological process of preparation as shown in Figure 3, impression block 1, impression glue 2, D shape optical fiber 3.
D shape optical fiber is 125 microns through direct grinding cladding diameter among the embodiment, and the general single mode fiber that the sandwich layer diameter is 10 microns makes, and the d=8 micron is left to distance of shaft centers in the D plane.
Embodiment 1:
On quartz substrate; Construct out regular relief pattern (cycle 2.5um with the method for photoetching; The two-dimentional little ball array of diameter 1um, degree of depth 300nm), reactive ion etching is transferred to substrate with structure; Oxygen plasma treatment (etching 5s) is carried out on the quartz construction surface, carry out release treatment afterwards again.Add support fixture in D shape optical fiber both sides, maintain an equal level with D shape optical fiber plane, again spin coating one deck ultraviolet cured adhesive (mr-NIL6000 of Micro resist company, rotating speed 3000r/min, time 1min, the about 500nm of thickness) on D shape optical fiber plane.Quartz template there be facing down of structure, be pressed onto on the D shape optical fiber plane, under the nitrogen protection condition, apply 15bar pressure, keep opening uviol lamp behind the 60s, with 50mW/cm
2Power irradiation 5min, make the ultraviolet glue full solidification.After taking template off, the pattern that obtains on the optical fiber plane is promptly shown in Fig. 4 a.
We further introduce point defect in the two-dimensional photon crystal structure on D shape face, optimize refractive index and structural parameters, have realized a high efficiency optical resonator.Utilize the evanescent field of this D shape optical fiber in optical resonator, to excite the light of AD HOC, solved the difficult problem of photonic crystal coupling light.Utilize the high-quality-factor characteristic of this optical resonator; Improved of the sensitivity of such device greatly to the environment refractive index; Miniature full-optical fiber optical path sensor with its preparation; The peak width of transmitted spectrum is 1/20 of common Bragg grating optical fiber (like Fig. 5 (a)) approximately shown in Fig. 5 (b), so the common Bragg grating optical fiber of its remolding sensitivity to the environment variations in refractive index is high 20 times.
Embodiment 2:
On nitride silicon based end template; Construct out regular relief pattern (cycle 7um with the method for photoetching; The two-dimensional grid array of live width 500nm, degree of depth 200nm), reactive ion etching is transferred to substrate with structure; (oxygen plasma etch 5s) after the surface treatment carried out in substrate, carry out release treatment again.Then with PDMS (Silicone elastomer KIT 184, Daw corning, KIT 184 type silicon rubber; Dow Corning Corporation) is spin-coated on (spin coating rotating speed 600r/min in the substrate of being carved with structure; Time 12s, the about 300nm of thickness), solidify 5h down at 60 ℃ behind the vacuum defoamation 30min.On D shape optical fiber plane, gently brush one deck ultraviolet cured adhesive (the OG154 type ultraviolet glue of EPO-TEK company, the about 400nm of thickness), the PDMS that is cured was taken off from the nitride silicon based end; There is structural plane down; Be attached on the D shape optical fiber plane, it is docile that both are contacted, at N
2Open uviol lamp under the atmosphere, with 100mW/cm
2Power solidify 2min.After taking PDMS off, the pattern that obtains on the optical fiber plane is promptly shown in Fig. 4 b.
Carry out the hydrofluorite wet etching with above-mentioned figure as blocking, structure is transferred on the sandwich layer on the former D shape of D shape optical fiber plane, form 2 D photon crystal D shape optical fiber.After the inlead defective, the light in the photonic crystal band just can be propagated along this line defect in this 2 D photon crystal.Further filling liquid crystal in this 2 D photon crystal, extra electric field is realized the system index modulation, thus the modulation photon band gap just can be realized the 2 D photon crystal photoswitch that liquid crystal is controlled.After input light arrives the structure region along anterior fibre core, can realize just that through the refractive index of regulating the gap liquid crystal selectivity of light is passed through in the linear defect wave-guide, so just can be used as fiber-optical switch.It is one of primary element of optical communication and integrated optics that light opens the light; We utilize micro-nano structure D shape optical fiber to combine the adjustable character in refractive index outfield of liquid crystal material to realize the full optical fiber optical optical switching device under the situation that does not increase any body block part, have great importance.
Embodiment 3:
Spin coating one deck polymetylmethacrylate on the monocrystalline substrate template (the about 500nm of thickness); Method with electron-beam direct writing (E-beam lithography) is constructed out regular relief pattern (cycle 700nm; The one-dimensional grating array of live width 350nm, degree of depth 300nm), reactive ion etching is transferred to substrate with structure; (oxygen plasma etch 5s) after the surface treatment carried out in substrate, carry out release treatment again.Then PDMS is spin-coated on (spin coating rotating speed 600r/min, the about 300nm of thickness) in the substrate of being carved with structure, solidifies 5h down at 60 ℃ behind the vacuum defoamation 30min.On D shape optical fiber plane, gently brush one deck PMMA, the PDMS that is cured is taken off from monocrystal silicon substrate, have structural plane down; Be attached on the D shape optical fiber plane, (the about 10Pa of vacuum tightness) contacts both fully under vacuum condition, is warming up to 160 ℃ and keeps 6min; Begin to be cooled to 80 ℃ then; Take PDMS off, reactive ion etching will impress the glue remnant layer and remove fully, and the pattern that obtains on the optical fiber plane is promptly shown in Fig. 4 c.
We have prepared fiber-grating laser to utilize this structure.Common fiber-grating laser need be write the raster pattern on the mask plate on the optical fiber with the ultraviolet wrting method; And because the susceptibility to ultraviolet light of ordinary optic fibre is poor; Need handle optical fiber to increase its photosensitivity, like high ballast hydrogen (H with special enhanced sensitivity technology
2Loading) technology, height are mixed germanium technologies, are mixed tin technology or the like altogether.We utilize the fiber-grating laser of nanometer embossing preparation low than the classic method cost; Efficient is high; Be more suitable for producing in batches; The most important thing is such fiber-grating laser than above-mentioned optical fiber, can not occur that intensity reduces, the optical fiber own loss increases, the inhomogeneous fiber axis that causes that mixes is to problems such as photosensitivity are inhomogeneous through the enhanced sensitivity technical finesse.
Embodiment 4:
Spin coating one deck PMMA on the silicon carbide substrates template (the about 400nm of thickness); Method with electron-beam direct writing (E-beam lithography) is constructed out regular pattern (cycle 400nm; The one-dimensional grating array of live width 160nm; And carry out reactive ion etching (RIE, reacting gas CHCl degree of depth 250nm),
3/ O
2, etching time 1min20s), with pattern by being carved on the silicon substrate on the PMMA, and with remaining PMMA flush away.Again the silicon substrate that is carved with pattern is carried out release treatment.Add support fixture in D shape optical fiber both sides, maintain an equal level, spin coating one deck heat-curable glue on D shape optical fiber plane (Beijing remittance moral letter AMONIL of company type glue, rotating speed 3000r/min, time 1min, the about 200nm of thickness) with D shape optical fiber plane.Have structural plane down silicon carbide substrate, be pressed onto on the D shape optical fiber plane, under vacuum condition (vacuum tightness is about 1Pa) apply 30bar pressure, be warming up to 110 ℃ keep 60s after, be warming up to 200 ℃ and pressure is enlarged to 40bar, solidify 500s.After taking the silicon template off, the pattern that obtains on the optical fiber plane is promptly shown in Fig. 4 d.
Carry out metal evaporation with above-mentioned figure as blocking, the metal level one that remains glue-line and deposit on it is reinstated the acetone flush away, the D shape fibre optic polarizer of the wire grating structure that then obtains.Utilize the polarization selection effect of sub-wave length metal grating, can realize transmitance control different polarization states light.Fig. 6 a is our sub-wavelength Au grating of preparing in two different polarization states (TM and TE) difference of transmitance down; Can find out that sub-wave length metal grating transmitance under the TM incident light is higher; Transmitance is very low under the TE incident light on the contrary; The polarization contrast ratio of TE transmitance (the TM transmitance with) has on average reached 240 at service band, we can say to have extraordinary polarization selectivity.Common polarizer is a body piece device, can't realize the full optical fiber optical optical road.We utilize wire grating structure D shape optical fiber then to realize the preparation of complete optical fiber polarization device, and are integrated significant for device miniaturization.Through the cycle of regulation and control wire grating, also can realize selectivity Polarization Control, applicable to the service band of different wave length to different-waveband light.Fig. 6 b is exactly one and changes the synoptic diagram that the selection of wiregrating cycle realization different-waveband sees through; The wire grating cycle shown in the figure is for being operated in visible light wave range; Difference (from 260nm to 400nm) through the regulation and control wiregrating cycle just can realize the selective permeation to specific wavelength (red, green, blue three look ripples).
Claims (7)
1. micro-nano structure D shape optical fiber; It is characterized in that said D shape optical fiber is that a kind of shape of cross section is alphabetical D type; Be that optical fiber one side is a rounded face; The optical fiber opposite side is plane or near the plane, fibre core is 50 ~ 200 microns to the distance (radius r) of optical fiber rounded face one side, and the plane is 5 ~ 15 microns to fibre core apart from d; The D plane is provided with the relief pattern structure, and the relief pattern structure is one-dimensional array or the two-dimensional grid array of cycle 0.2 ~ 15um, live width 100 ~ 1000nm, the degree of depth 100 ~ 400nm; This optical fiber plane one side has strong evanescent field, is vulnerable to the regulation and control of surface texture featur and material character.
2. micro-nano structure D shape optical fiber according to claim 1 is characterized in that micro-nano structure D shape optical fiber is the D shape fibre optic polarizer of wire grating structure.
3. realize micro-nano structure D shape method of optical fiber preparation for one kind, it is characterized in that, comprise the steps:
1. on the D plane of D shape optical fiber, impression glue is set;
The concaveconvex structure that 2. will have the template of micron/nano size relief pattern structure evenly is pressed in the impression glue that is in liquid state or viscoelastic attitude on the optical fiber plane, solidified imprinting glue then, and lift-off stencil is transferred to micro-nano structure on the impression glue;
3. etching: have the impression glue of micro-nano relief pattern structure with reactive ion beam etching (RIBE), remove the impression glue of groove; And further etching or wet etching are transferred to optical fiber with structure; Obtain having the micro-nano structure complementary on the D shape optical fiber D plane with formwork structure;
4. wash-out: solvent elution is removed residual impression glue on the optical fiber planar projections structure.
4. a kind of realization micro-nano structure D shape method of optical fiber preparation as claimed in claim 3 is characterized in that, said impression glue selects for use the thermoplastics type to impress glue and uv-curing type impression glue according to curing mode; Heat curing impression glue is the intensification fusion or becomes viscoelasticity, can solidify any one or several kinds potpourri and the potpourri of forming with other additive material in the thermoplastic, polymeric materials that keeps shape after the cooling; Ultra-violet curing impression glue precursor is liquid state or viscoelastic attitude, and ultraviolet or visible light can cause crosslinking curing, and then keeps any one or several kinds potpourri and the potpourri of forming with other additive material blend thereof in the polymkeric substance of specific morphology.
5. a kind of realization micro-nano structure D shape method of optical fiber preparation as claimed in claim 3 is characterized in that said template comprises hard template and soft template, and template is carved with the relief pattern of nanometer or micron order size.The hard template material characteristics is that the mould material quality is hard, and in impression pressure process, template can keep its shape invariance.Soft template quality softness has elasticity, the whole better applying that takes place deformation with acquisition and D shape optical fiber plane in pressure process, but microstructure does not receive obviously to influence in transfer process.
6. a kind of realization micro-nano structure D shape method of optical fiber preparation as claimed in claim 3 is characterized in that, graph copying comprises impression, solidifies, moves back processes such as mould; Keep system pressure in 0 ~ 150bar scope in the moulding process, temperature makes impression glue in moulding process, keep liquid state or viscoelastic attitude at 10 ~ 300 ℃, keeps this pressure and temp condition 1 second ~ 200 minutes, realizes the abundant transfer of figure; Solidification process can adopt cooling curing and ultraviolet or visible illumination curing according to used impression glue type; Pressure condition is kept in cooling curing, and the control system temperature is reduced to following 1 ~ 100 ℃ of impression glue glass transition temperature, waits for 0 ~ 100 minute; The realization system is solidified; Ultraviolet or visible illumination curing are kept pressure condition, are ultraviolet or the visible light source irradiation impression glue 1 second ~ 200 minutes of 0.01 ~ 1000mW/cm2 with a luminous power, and the realization system is solidified; Move back mold process and make template and impression glue separating process for utilizing external force.
7. micro-nano structure D shape optical fiber is in the application in fields such as optical communication, Fibre Optical Sensor, integrated optics.
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