CN102768381B - Micro-nano structured D-shaped optical fiber, method for producing same and application - Google Patents
Micro-nano structured D-shaped optical fiber, method for producing same and application Download PDFInfo
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- CN102768381B CN102768381B CN201210231125.6A CN201210231125A CN102768381B CN 102768381 B CN102768381 B CN 102768381B CN 201210231125 A CN201210231125 A CN 201210231125A CN 102768381 B CN102768381 B CN 102768381B
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Abstract
A micro-nano structured D-shaped optical fiber has a cross section which has a shape of a letter D, i.e. one side of the optical fiber is a round surface, the other side of the optical fiber is a plane or is similar to the plane, the distance (radius r) from a fiber core to the round side of the optical fiber is 50-200 micrometers, and the distance d from the plane to the fiber core is 5-15 micrometers; a concave-convex pattern structure is formed on the D plane, and is a one-dimensional array or a two-dimensional grid array which has a period of 0.2-15mu.m, the line width of 100-1000nm and the depth of 100-400nm; and the plane side of the optical fiber has a strong evanescent field, and is easily regulated by surface structure characteristics and material properties. A method for producing a micro-nano structure on the surface of the D-shaped optical fiber is specifically that a nanoimprint technology is utilized to transfer a template structure onto the plane of the D-shaped optical fiber, through the mutual action of the transferred micro-nano structure and the evanescent field of the D-shaped optical fiber plane, the light which is transmitted in the optical fiber can be regulated, and furthermore, the functions of light sensing, light regulating and the like are realized.
Description
Technical field
The present invention relates to photoelectron technology field, be specifically related to a kind of preparation technology and application of novel micro nanometer structure D shape optical fiber.This invention has proposed by nano impression, the micro-nano structure in template to be transferred to preparation technology's flow process and the parameter control of D shape optical fiber plane, and this D shape optical fiber is specifically applied to the fields such as sensing, communication, integrated optics.
Background technology
Refractive index cycle modulated structure is more and more subject to the attention of optical communication and sensory field in recent years.They can form Prague forbidden band relevant to period of change, in the transmitting procedure of light wave, play reflex.Before half a century, physicist just knows, electronics in crystal (as semiconductor) is owing to being subject to periodicity potential (periodic potential) scattering of lattice, part wave band can form energy gap (energy gap) because of destruction interference, cause the dispersion relation (dispersion relation) of electronics to be zonal arrangement, this is famous electronic band structure (electronic band structures).By 1987, E.Yablonovitch and S.John coincidentally point out, similarly phenomenon is also present in photonic system: be in the three-dimensional dielectric material of periodic arrangement at dielectric coefficient, electromagnetic wave is after dielectric function scattering, the electromagnetic intensity of some wave band can be exponential damping because of destruction interference, cannot in system, transmit, be equivalent to form energy gap on frequency spectrum, so dispersion relation also has banded structure, this is so-called photonic band structures (photonic band structures).There is the dielectric material of photonic band structures, be just called photonic band-gap system (photonic band-gap system is called for short PBG system), or be called for short photonic crystal (photonic crystals).The layered periodic structure just concept development based on photonic crystal gets up, and the application fast development based on Fiber Bragg Grating FBG (fiber Bragg gratings) in recent years proved the importance of layered periodic structure at optical communication and sensory field especially.
On optical fiber, making the micro-nano structures such as Bragg grating has multiple use, for example, utilize the variations in refractive index of evanescent field testing environment medium, thereby monitors the character such as its chemical concentrations and pH value.Compared with traditional sensors, this Fibre Optical Sensor with micro-nano structure has the features such as the little and cost of remote distributed sensor, on-line measurement, simplicity of design, volume is low.But ordinary optic fibre xsect is circular, make structure difficulty on its surface large, architecture quality is difficult to be guaranteed, and is produced on distance between structure and the sandwich layer on fibre cladding larger simultaneously, evanescent field insufficient strength, the sensitivity on sensing measurement and accuracy all can have impact.For evanescent field intensity is increased, need the covering of optical fiber to corrode, reduce the thickness of covering, or optical fiber is ground, the wherein one side of covering is polished and becomes D shape plane, optical fiber will have more energy leakage in external environment like this, occur stronger evanescent field, make the change of surrounding medium can directly have influence on the variation of the each parameter of light field.A kind of like this ordinary optic fibre is ground, be just called D shape optical fiber thereby change the special optical fiber that its shape of cross section and structure change basic mode transport property.
D shape optical fiber is a kind of by method change ordinary optic fibre (comprising single-mode fiber and multimode optical fiber) shape of cross section and the structure of grinding or corrode, thereby changes the special optical fiber of basic mode transport property.As shown in Figure 1a, the cladding diameter of former ordinary optic fibre is 2r, and its cladding diameter of single-mode fiber or multimode optical fiber is all 125 microns conventionally; After grinding, its section becomes the shape of letter " D ", and radius-of-curvature is that 3r is called D shape plane to the one side of ∞; Fiber core layer diameter is 2a, is generally 3 ~ 10 microns for single-mode fiber, and multimode optical fiber is 50 ~ 65 microns, and representative value is 50 microns and 62.5 microns; D is the distance from sandwich layer center to D shape plane, is generally 5 to 15 microns.There is stronger evanescent field at D shape plane place, and Fig. 1 b is shown in its distribution, and more common circular fiber significantly strengthens.
Compared with arcwall face, to make structure in the flat one side of D shape optical fiber and become easily, the quality of structure is also guaranteed.Therefore explore easy, efficiently on D shape optical fiber, make micro-nano structure and realize the method for the micro-nano structure of refractive index cycle modulation and there is real meaning and using value widely.
There is no at present and utilize stamping technique to realize any report prepared by micro-nano structure D shape optical fiber.Taking micro-nano structure grating as example: on ordinary optic fibre, people mainly make micro-nano structure grating by following two kinds of methods: phase masks and point-to-point writing method.1., phase masks is placed in the graphic mask of carving with electron beam exposure on optical fiber, utilize phase mask compacting Zero-order diffractive to strengthen the function of first-order diffraction, make ultraviolet light positive and negative first-order diffraction spectral line after mask phase-modulation on optical fiber, form interference fringe, be the Bragg grating of mask cycle half write cycle.The weak point of this method is to be only applicable to periodic structure, is difficult to realize the preparation of complex pattern, and mask fabrication complex process, cost are high.2., point-to-point writing method is to utilize precision mechanism control fiber optics displacement, successively exposure is inscribed.The method can realize the preparation of arbitrary graphic pattern, the accurate displacement device but the complicated focus optical of needs is unified, and cost is high, and efficiency is low.Therefore, invent a kind of low cost, the high efficiency method that can prepare grating micro-nano structure in D shape optical fiber plane has important value.
In the time of the more various technology of preparing micro-nano structure, some key indexs, such as resolution, pattern precision, production efficiency and preparation cost etc. are all important Scheme Choice standards.Be tending towards gradually resolution limit in traditional photoetching (photolithography) technology, in the process that various emerging technologies continue to bring out as optical interference and beam flying etc., nano impression (nanoimprint lithography) technology being proposed at first by the S.Chou of Princeton University etc. with its low cost, high resolving power, the inherent advantage such as be easy to realize prepared by large area structure and entered everybody sight line.And in nanometer embossing unique soft impression (soft lithography) technology at irregular contour surface micro-structure, the advantage aspect preparing is also very significant, therefore, prepare various artificial micro-nano structures with nanometer embossing, especially on the microsize irregular contour objects such as optical fiber, preparing the optical micro/nano structures such as grating has become the direction that academia and industrial community are extremely paid close attention to, and has good prospect of industrial development.We are incorporated into nanometer embossing in the middle of the making of micro-nano structure D shape optical fiber just, have started a kind of high precision, low cost, high efficiency technology of preparing.
This technology has application prospect very widely in fields such as optical communication, light sensing and integrated opticss.Such as for making dispersion compensation sheet, rejection filter, wavelength selector part, network monitoring, Erbium-Doped Fiber Amplifier (EDFA), non-linear raman amplifier, fiber laser, semiconductor laser; Polarization-modulating type sensor, phase modulation-type sensor, chemical sensor, temperature sensor, pressure transducer; Optical waveguide wavelength-selective switches and light-emitting component, light holographic memory, optical waveguide are directly write etc.These devices need quick, efficient, compact optics conventionally.In conventional device, these opticses are all body block parts, need to be by being optically coupled in these parts in optical fiber, playing after respective action coupling again gets back in optical fiber, can be directly and ordinary optic fibre welding with the D shape optical fiber of artificial micro-nano structure, realize full optical fibre device, and do not need corresponding body block part.
Summary of the invention
Object of the present invention: propose a kind of novel micro nanometer structure D shape optical fiber, preparation technology and related application.The technical characterictic of micro-nano structure D shape optical fiber has been listed in this invention, utilizes nano impression to prepare technological process and the parameter control of micro-nano structure D shape optical fiber, and has enumerated the concrete application in the fields such as this D shape Fibre Optical Sensor, communication, integrated optics.The present invention can be efficiently, stable, produce high-quality micro-nano structure D shape optical fiber in batches at an easy rate, realize the efficient modulation to light field in optical fiber.
The technical characterstic of micro-nano structure D shape optical fiber: as (Fig. 1 a) as shown in, for a kind of shape of cross section be letter " D " type optical fiber, optical fiber one side is circular face, it is D plane that optical fiber opposite side approaches plane.Fibre core is 50～200 microns to the distance (radius r) of circular face one side, and D plane is 5 ~ 15 microns to the distance d of fibre core, and there is very strong evanescent field at this type optical fiber D plane place, and Fig. 1 b is shown in its distribution, is vulnerable to the regulation and control of surface texture featur and material character.In D plane, periodic structure is set, making structure is one-dimensional grating array or the two-dimensional grid array of cycle 2 ~ 15um, live width 100 ~ 1000nm, the degree of depth 100 ~ 400nm.
Principle of the present invention: can form evanescent field on the interface of sandwich layer and covering when light is propagated in optical fiber.In optical fiber, because covering is non-absorbing medium, can not cause the minimizing of transmitting energy in optical fiber.The size of fiber evanescent field field intensity can be expressed as: E=E
0exp (z/dp).E in formula
0the energy intensity of evanescent field in interface; Z is the distance of field point apart from interface.Dp is the penetration depth of evanescent field, is defined as and drops to E when the intensity of energy field
0when/e, a point arrives the distance at interface.Equation expression is:
in formula: λ is the wavelength of light while propagating in a vacuum; n
1for the refractive index of fiber core; n
2for the refractive index of measured object solution; θ is the incident angle of light.The evanescent field that utilizes the special morphological feature of D shape optical fiber to produce at D plane place, make the generation effective interaction of the nanostructured of D shape face and the light of the interior transmission of fiber core layer, realize the modulation to characteristics such as light intensity, wavelength, phase place, polarizations, thereby in application performance important application such as optical communication, light sensing, integrated opticss.
Technical solution of the present invention: we are by stamping technique and equipment improvement and be transplanted to D shape fiber body and fasten, has realized the making of micro-nano structure D shape optical fiber.In the situation that D shape planar smoothness is good, can realize the making of high-resolution, high-quality micro-nano structure D shape optical fiber with hard template impression; In the time that the flatness of D shape optical fiber is good not, select the technology of soft template impression to be prepared, to ensure the resolution of figure and to shift precision.For the making of micro-nano structure in D type optical fiber plane provides a kind of simple preparation scheme efficiently.
Processing step prepared by micro-nano structure D shape optical fiber:
1. prepare D shape optical fiber by two kinds of different approaches: the one, be directly 2r=125 micron by grinding cladding diameter, the general single mode fiber of sandwich layer diameter 2a=10 micron (also can be multimode optical fiber 2r=125 micron, 2a=50 ~ 65 micron), make the shape of its section one-tenth " D " shape plane or almost plane, d=5-15 micron (to multimode optical fiber d=a～a+10 micron); The 2nd, a columniform preform side is vertically ground, according to the fiber size of design, grind off in proportion a part of covering, until approaching the shape of cross section that fiber cores makes prefabricated rods, polished plane is D shape.The D shape prefabricated rods of milled is placed on wire drawing machine and carries out melt drawing, control temperature unsuitable too high, make optical fiber cross section still keep D shape.Wire drawing in thermal-flame simultaneously, to the further flame polish effect of D shape plane, makes D plane become extremely smooth low scattering surface.
2. in the D plane of D shape optical fiber, applied impression glue is set by solution, annealing in process is removed solvent and is discharged internal stress;
3. the template with micro/nano-scale relief pattern structure is pressed in optical fiber plane in the impression glue in liquid state or viscoelastic state, then solidified imprinting glue, lift-off stencil, is transferred to micro-nano structure on impression glue; In moulding process, keep system pressure in 0 ~ 150bar scope, temperature, at 10 ~ 300 DEG C, makes to impress glue and in moulding process, keeps liquid state or viscoelastic state, keeps this pressure and temp condition 1 second ~ 200 minutes, realizes the abundant transfer of figure; Solidification process can adopt cooling to solidify and ultraviolet (visible) illumination curing according to impression glue type used, the curing pressure condition that maintains of cooling, control system temperature is down to following 1 ~ 100 DEG C of impression glue glass transition temperature, waits for 0 ~ 100 minute, and the system that realizes is solidified; Ultraviolet (visible) illumination curing maintains pressure condition, taking a luminous power as 0.01 ~ 1000mW/cm
2ultraviolet or visible light source irradiate impression glue 1 second ~ 200 minutes, the system that realizes is solidified; Moving back mold process is the process of utilizing external force that template is separated with impression glue machinery.Template comprises hard template and soft template, and hard template material characteristics is that mould material quality is hard, and in impression pressure process, template can keep its shape invariance.Soft template is quality softness, and polymkeric substance or the elastomeric material of more obvious deformation occurs in pressure process.
4. etching: be printed on the impression glue of micro-nano relief pattern structure by reactive ion beam etching (RIBE), remove the impression glue of groove; And further structure is transferred to optical fiber by etching or wet etching; Obtain having in D shape optical fiber D plane the micro-nano structure with formwork structure complementation;
5. wash-out: solvent elution is removed residual impression glue in optical fiber planar projections structure.
The concrete application of micro-nano structure D shape optical fiber: detailed preparation process and the performance parameter of the concrete device taking miniature full-optical fiber optical path sensor, full optical fiber optical optical switch, fiber-grating laser, complete optical fiber polarization device etc. as representative describe in detail in embodiment part.
Beneficial effect of the present invention:
1. because D plane is only 5 to 15 microns from the distance at sandwich layer center, 1/8th to 1/25th (standard single-mode fiber cladding diameter representative value is 125um) of standard single-mode fiber cladding diameter, the micro-nano structure of D shape face from sandwich layer very close to, structure is strengthened optical modulation effect in sandwich layer.
2. nano impression is a kind of low cost, high-level efficiency, high-resolution figure transfer techniques.Only need a template just can repeat to impress several thousand times, realize the fast transfer of large area, high-resolution micro-nano graph.
3. all very simple and repeated good regardless of the preparation or the operation of nanometer embossing that are D shape optical fiber, by changing template or utilizing the multi-impression of template at the same area, can obtain different micro-nano structures.Therefore the method that applying nano stamping technique is prepared micro-nano structure in D shape optical fiber plane has simple and convenient, flexible and changeable feature.
Brief description of the drawings
Fig. 1 a is D shape optical fiber sectional view.
Fig. 1 b is the distribution plan of disappearance wave field along section radius direction.
Fig. 2 is nano impression schematic diagram, and wherein scheming a is hot padding schematic diagram, and figure b is ultraviolet stamping schematic diagram.
Fig. 3 is the specific implementation method figure that carries out nano impression in D shape optical fiber plane, and wherein scheming a is that common hard impression is implemented schematic diagram, and figure b is that soft impression is implemented schematic diagram
Fig. 4 a, Fig. 4 b, Fig. 4 c and Fig. 4 d are the scanning electron microscope diagram of sample in the specific embodiment of the invention.
Fig. 5 a, Fig. 5 b are respectively the transmission spectrums of traditional Bragg grating and two-dimensional photonic crystal microcavity.
Fig. 6 a, Fig. 6 b are respectively the polarization contrast of sub-wavelength metal wiregrating D shape optical fiber and the data plot that corresponding different wave length selectivity of different wiregrating cycle sees through.
Embodiment:
Below in conjunction with the drawings and specific embodiments, the present invention is done further and illustrated, represented so that advantage of the present invention knows.Further illustrate the inventive method and application by embodiment, instead of limit the present invention with these embodiment.
The technological process of preparation as shown in Figure 3, impression block 1, impression glue 2, D shape optical fiber 3.
In embodiment, D shape optical fiber is 125 microns by direct grinding cladding diameter, and the general single mode fiber that sandwich layer diameter is 10 microns makes, and D plane is to distance of shaft centers from d=8 micron.
Embodiment 1:
In quartz substrate, construct out regular relief pattern (cycle 2.5um with the method for photoetching, the little ball array of two dimension of diameter 1um, degree of depth 300nm), structure is transferred to substrate by reactive ion etching, oxygen plasma treatment (etching 5s) is carried out in quartz construction surface, carry out again afterwards release treatment.Add support fixture in D shape optical fiber both sides, with D shape optical fiber plane maintain an equal level, then in D shape optical fiber plane spin coating one deck ultraviolet cured adhesive (mr-NIL6000 of Micro resist company, rotating speed 3000r/min, time 1min, the about 500nm of thickness).Quartz template is had to facing down of structure, be pressed onto in D shape optical fiber plane, under nitrogen protection condition, apply 15bar pressure, keep opening uviol lamp after 60s, with 50mW/cm
2power irradiate 5min, make ultraviolet glue completely curing.Take off after template, the pattern obtaining in optical fiber plane is as shown in Fig. 4 a.
We further introduce point defect in the two-dimensional photon crystal structure on D shape face, optimize refractive index and structural parameters, have realized a high efficiency optical resonator.Utilize the evanescent field of this D shape optical fiber in optical resonator, to excite the light of AD HOC, solved a difficult problem for photonic crystal coupling light.Utilize the high-quality-factor characteristic of this optical resonator, greatly improve the sensitivity of such device to environment refractive index, the miniature full-optical fiber optical path sensor of preparing with it, as shown in Fig. 5 (b), the peak width of transmitted spectrum is approximately 1/20 of common Bragg grating optical fiber (as Fig. 5 (a)), and therefore the common Bragg grating optical fiber of its remolding sensitivity to environment variations in refractive index is high 20 times.
Embodiment 2:
On nitride silicon based end template, construct out regular relief pattern (cycle 7um with the method for photoetching, the two-dimensional grid array of live width 500nm, degree of depth 200nm), structure is transferred to substrate by reactive ion etching, substrate is carried out to (oxygen plasma etch 5s) after surface treatment, then carry out release treatment.Then by PDMS(Silicone elastomer KIT 184, Daw corning, KIT 184 type silicon rubber, Dow Corning Corporation) be spin-coated on (spin coating rotating speed 600r/min in the substrate of being carved with structure, time 12s, the about 300nm of thickness), after vacuum defoamation 30min, at 60 DEG C, solidify 5h.In D shape optical fiber plane, gently brush one deck ultraviolet cured adhesive (the OG154 type ultraviolet glue of EPO-TEK company, the about 400nm of thickness), the PDMS being cured was taken off from the nitride silicon based end, there is structural plane down, be attached in D shape optical fiber plane, both contacted docile, at N
2under atmosphere, open uviol lamp, with 100mW/cm
2power solidify 2min.Take off after PDMS, the pattern obtaining in optical fiber plane as shown in Figure 4 b.
Carry out hydrofluorite wet etching using above-mentioned figure as blocking, structure is transferred on the sandwich layer of the former D shape of D shape optical fiber plane, form 2 D photon crystal D shape optical fiber.In this 2 D photon crystal, after inlead defect, the light in photonic crystal band just can be propagated along this line defect.Further filling liquid crystal in this 2 D photon crystal, extra electric field is realized system index modulation, thus modulation photon band gap just can be realized the controlled 2 D photon crystal photoswitch of liquid crystal.When input light arrives behind structure region along anterior fibre core, pass through by regulating the refractive index of gap liquid crystal just can realize the selectivity of light in linear defect wave-guide, so just can be used as fiber-optical switch.It is one of primary element of optical communication and integrated optics that light opens the light, we utilize micro-nano structure D shape optical fiber to realize full optical fiber optical optical switching device in conjunction with the adjustable character in refractive index outfield of liquid crystal material in the situation that not increasing any body block part, have great importance.
Embodiment 3:
Spin coating one deck polymetylmethacrylate in monocrystalline substrate template (the about 500nm of thickness), method with electron-beam direct writing (E-beam lithography) is constructed out regular relief pattern (cycle 700nm, the one-dimensional grating array of live width 350nm, degree of depth 300nm), structure is transferred to substrate by reactive ion etching, substrate is carried out to (oxygen plasma etch 5s) after surface treatment, then carry out release treatment.Then PDMS is spin-coated on (spin coating rotating speed 600r/min, the about 300nm of thickness) in the substrate of being carved with structure, after vacuum defoamation 30min, at 60 DEG C, solidifies 5h.In D shape optical fiber plane, gently brush one deck PMMA, the PDMS being cured is taken off from monocrystal silicon substrate, there is structural plane down, be attached in D shape optical fiber plane, under vacuum condition, (the about 10Pa of vacuum tightness) contacts both completely, is warming up to 160 DEG C and keeps 6min, then start to be cooled to 80 DEG C, take PDMS off, reactive ion etching is removed impression glue remnant layer completely, and the pattern obtaining in optical fiber plane is as shown in Fig. 4 c.
We have prepared fiber-grating laser to utilize this structure.Common fiber-grating laser need to be write the raster pattern on mask plate on optical fiber with ultraviolet wrting method, and because the susceptibility to ultraviolet light of ordinary optic fibre is poor, need to process optical fiber to increase its photosensitivity by special enhanced sensitivity technology, as high ballast hydrogen (H
2loading) technology, height are mixed germanium technologies, are mixed tin technology etc. altogether.The fiber-grating laser that we utilize nanometer embossing to prepare is low than classic method cost, efficiency is high, be more suitable for batch production, the most important thing is that such fiber-grating laser is than the above-mentioned optical fiber through enhanced sensitivity technical finesse, there will not be strength decreased, optical fiber own loss to increase, adulterate the inhomogeneous fiber axis that causes to problems such as photosensitivity are inhomogeneous.
Embodiment 4:
The about 400nm of spin coating one deck PMMA(thickness in silicon carbide substrates template), method with electron-beam direct writing (E-beam lithography) is constructed out regular pattern (cycle 400nm, the one-dimensional grating array of live width 160nm, degree of depth 250nm), and carry out reactive ion etching (RIE, reacting gas CHCl
3/ O
2, etching time 1min20s), pattern, by being carved on silicon substrate on PMMA, and is washed away remaining PMMA.Carry out release treatment to carving figuratum silicon substrate again.Add support fixture in D shape optical fiber both sides, maintain an equal level with D shape optical fiber plane, spin coating one deck heat-curable glue in D shape optical fiber plane (Beijing AMONIL of Hui Dexin company type glue, rotating speed 3000r/min, time 1min, the about 200nm of thickness).Have structural plane down silicon carbide substrate, be pressed onto in D shape optical fiber plane, under vacuum condition (vacuum tightness is about 1Pa) apply 30bar pressure, be warming up to 110 DEG C and keep after 60s, be warming up to 200 DEG C and pressure is enlarged to 40bar, solidify 500s.Take off after silicon template, the pattern obtaining in optical fiber plane is as shown in Fig. 4 d.
Carry out metal evaporation using above-mentioned figure as blocking, by residue glue-line and deposit metal level one on it and reinstate acetone and wash away, the D shape fibre optic polarizer of the wire grating structure obtaining.Utilize the polarization selection effect of sub-wave length metal grating, can realize the transmitance control to different polarization states light.Fig. 6 a is our sub-wavelength Au grating of preparing difference in the lower transmitance of two different polarization states (TM and TE), can find out that sub-wave length metal grating transmitance under TM incident light is higher, under TE incident light, transmitance is very low on the contrary, the polarization contrast ratio of TE transmitance (the TM transmitance with) has on average reached 240 at service band, has extraordinary polarization selectivity.Common polarizer is body piece device, cannot realize full optical fiber optical optical road.We utilize wire grating structure D shape optical fiber to realize the preparation of complete optical fiber polarization device, integrated significant for device miniaturization.By the cycle of regulation and control wire grating, also can realize the selectivity Polarization Control to different-waveband light, applicable to the service band of different wave length.Fig. 6 b a change wiregrating cycle realizes different-waveband to select the schematic diagram seeing through, the wire grating cycle shown in figure is for being operated in visible light wave range, by the difference (from 260nm to 400nm) in regulation and control wiregrating cycle, just can realize the selectivity of specific wavelength (red, green, blue three look ripples) is seen through.
Claims (1)
1. micro-nano structure D shape optical fiber, it is characterized in that described D shape optical fiber is that a kind of shape of cross section is alphabetical D type, optical fiber one side is circular face, and optical fiber opposite side is plane, fibre core is that radius r is 50～200 microns to the distance of optical fiber circular face one side, and plane is 5～15 microns to the distance d of fibre core; Plane is provided with the wire grating structure of relief pattern, and relief pattern wire grating structure is one-dimensional array or the two-dimensional grid array of cycle 0.2～15um, live width 100～1000nm, the degree of depth 100～400nm; This optical fiber plane one side has strong evanescent field, is vulnerable to the regulation and control of surface texture featur and material character; Micro-nano structure D shape optical fiber is the D shape optical fiber of wire grating structure.
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| CN115615937B (en) * | 2022-12-05 | 2023-03-07 | 南京邮电大学 | High-quality-factor photonic crystal sensor, preparation method thereof and sensing detection method |
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