KR101733343B1 - Variable Color Filter Film And Strain Measuring Apparatus - Google Patents

Variable Color Filter Film And Strain Measuring Apparatus Download PDF

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Publication number
KR101733343B1
KR101733343B1 KR1020160012177A KR20160012177A KR101733343B1 KR 101733343 B1 KR101733343 B1 KR 101733343B1 KR 1020160012177 A KR1020160012177 A KR 1020160012177A KR 20160012177 A KR20160012177 A KR 20160012177A KR 101733343 B1 KR101733343 B1 KR 101733343B1
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South Korea
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dielectric layer
periodic pattern
color filter
layer
variable color
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KR1020160012177A
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Korean (ko)
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이헌
최학종
허주혁
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고려대학교 산학협력단
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands

Abstract

The present invention provides a variable color filter and a strain measuring apparatus. The variable color filter comprises: a transparent flexible film having transmittance on light, first refractivity, and flexibility; and a periodic pattern completely embedded inside the transparent flexible film not to be protruded to the outside, having second refractivity higher than the first refractivity, and having non-flexibility.

Description

TECHNICAL FIELD [0001] The present invention relates to a variable color filter film,

The present invention relates to a color filter film using guided-mode resonance, and more specifically, to a variable color filter using a stretchable material.

In general, color filters used in industry use chemical pigments or dyeing reagents. However, as the display industry has developed, optical elements have become increasingly integrated, and process simplification has been required, new alternative technologies have been developed.

The colorful colors of peacock feathers found in nature and the lingering colors of butterfly wings are not the colors caused by chemical factors such as dye or dyeing but the color expressed by scattering light because the surface structure is nano-sized. This is called "structural color" and many studies have been conducted on it.

Nano-sized gratings vary in their optical characteristics depending on the structural size, such as the distance between the gratings, the diameter and the height or depth of one grating. There are also studies to improve the efficiency by generating plasmonic phenomenon through a complex structure of metal and dielectric materials used for patterning in nano-size.

Strain sensors are generally developed using optical fibers. A Bragg diffraction grating is formed inside the optical fiber, and then the light is irradiated to one end of the optical fiber to analyze the spectrum of the light that is deformed at the opposite side. The fiber strain sensor calculates the strain on the optical fiber.

SUMMARY OF THE INVENTION The present invention is directed to a color filter concept in which a nano-scale grating structure of a high-index material selectively reflects or transmits light to incident light. There is provided a strain sensor using an optical signal by utilizing the fact that the wavelength of light to be filtered is changed according to the strain applied to the stretchable film after the non-stretchable nano grid structure buried in the stretch film is formed. In addition, a variable color filter is provided that can control the wavelength of light to be filtered according to the degree of strain applied inversely.

A variable color filter according to an embodiment of the present invention includes a transparent stretchable film having transparency to light and having a first refractive index and elasticity; And a periodic pattern that is completely buried in the transparent stretchable film so as not to protrude outward and has a non-stretchable property and a second refractive index higher than the first refractive index.

In one embodiment of the present invention, the transparent stretchable film may include at least one of polydimethylsiloxane (PDMS), perfluoropolyether (PFPE), epoxy resin, and latex rubber.

In one embodiment of the present invention, the periodic pattern may include one of TiO 2 , ZrO 2 , ZnO, Si, and Ge. .

In one embodiment of the present invention, the periodic pattern is a straight line extending in parallel, the period of the periodic pattern is smaller than an incident wavelength, and the thickness of the periodic pattern may be an integer multiple of a half wavelength or a wavelength.

In one embodiment of the present invention, the periodic pattern is arranged with a first period in a first direction and a second period different from the first period in a second direction perpendicular to the first direction, And the second period may be smaller than an incident wavelength, and the thickness of the periodic pattern may be an integer multiple of a half wavelength or a wavelength.

A strain measuring apparatus according to an embodiment of the present invention includes a variable color filter deformed by a temperature or an external force and attached to an object to be measured; A broadband light source for emitting a broadband incident light to the variable color filter; A spectroscope that receives the reflected light reflected from the variable color filter or the light transmitted through the variable color filter and measures a spectrum according to the wavelength; And a processing unit for calculating a strain of the variable color filter from the wavelength of the maximum intensity of the reflection spectrum or the wavelength of the minimum intensity of the transmission spectrum measured in the spectroscope. Wherein the variable color filter is a transparent stretchable film having transparency to light and having a first refractive index and stretchability; And a periodic pattern completely buried in the transparent stretchable film so as not to protrude outward and having a second refractive index higher than the first refractive index.

In one embodiment of the present invention, the variable color filter may further include an adhesive layer disposed on one surface of the transparent stretchable film.

In one embodiment of the present invention, the transparent stretchable film may include at least one of polydimethylsiloxane (PDMS), perfluoropolyether (PFPE), epoxy resin, and latex rubber.

In one embodiment of the present invention, the periodic pattern may include one of TiO 2 , ZrO 2 , ZnO, Si, and Ge. .

According to an aspect of the present invention, there is provided a method of fabricating a variable color filter, including: depositing a first dielectric layer having a non-elasticity and a high refractive index on a sacrificial substrate; Forming a periodic pattern on the sacrificial substrate by patterning the first dielectric layer; Forming a second dielectric layer having a stretchability and a low refractive index on the periodic pattern; Removing the sacrificial substrate to expose the periodic pattern; And forming a third dielectric layer having a stretchability and a low refractive index on the exposed periodic pattern.

In one embodiment of the present invention, the sacrificial substrate may include a silicon substrate, a silicon oxide layer stacked on the silicon substrate, and a nickel layer stacked on the silicon oxide layer.

In one embodiment of the present invention, patterning the first dielectric layer to form a periodic pattern on the sacrificial substrate may include sequentially coating a sacrificial polymer mask layer and a silicon-containing resist layer on the first dielectric layer, Forming a line inverse pattern on the silicon-containing resist layer; Etching the sacrificial polymer mask layer with the silicon-containing resist having the reverse pattern formed thereon as a mask to expose an upper surface of the first dielectric layer; Depositing a metal mask layer on the exposed first dielectric layer; Removing the sacrificial polymer mask layer using a lift-off technique and forming a metal mask pattern; Etching the first dielectric layer using the metal mask pattern as a mask to form a periodic pattern; And removing the metal mask pattern to expose the periodic pattern.

In one embodiment of the present invention, the second dielectric layer and the third dielectric layer may include at least one of polydimethylsiloxane (PDMS), perfluoropolyether (PFPE), epoxy resin, and latex rubber. have.

In one embodiment of the present invention, the first dielectric layer may include one of titanium oxide (TiO 2 ), zirconium oxide (ZrO 2), zinc oxide (ZnO), silicon (Si) have.

According to one embodiment of the present invention, a nano-grid color filter can be implemented in a flexible / stretch film. The color filter changes the band to be filtered according to the strain, and operates as a variable color pillar and a strain sensor. Accordingly, the variable color filler can be utilized as a simple device that replaces the existing complex strain sensor and its system.

1 is a conceptual diagram illustrating a reflection type strain measuring apparatus according to an embodiment of the present invention.
Fig. 2 is a perspective view illustrating the variable color filter of Fig. 1. Fig.
3 is a cross-sectional view illustrating the variable color filter 2;
4A is a view showing a strain of a variable color filter according to an embodiment of the present invention.
FIG. 4B is a diagram showing a simulation result showing a reflection spectrum according to strain in FIG. 4A. FIG.
5 is an experimental result showing a reflection spectrum according to a strain of a variable color filter according to an embodiment of the present invention.
6A is a perspective view illustrating a variable color filter according to another embodiment of the present invention.
FIG. 6B is a plan view showing the variable color filter of FIG. 6A. FIG.
FIGS. 7 and 8 are cross-sectional views illustrating a method of fabricating a variable color filter according to an embodiment of the present invention.
9 is a conceptual diagram for explaining an apparatus for measuring a transmission strain according to another embodiment of the present invention.

Guided-mode resonance is a phenomenon that the guiding mode of an optical waveguide can be excited by a phase-matching device. A linear grating pattern of silicon material formed on the surface of the glass substrate can operate as a color filter. A color filter can be realized by using only a dielectric material having a high refractive index to make a nano grating structure.

According to an embodiment of the present invention, a linear grating pattern having a high refractive index is buried in a stretchable transparent material film having a low refractive index. The film of such a structure can be contracted / stretched by an external force. Such a stretchability can provide a variable color filter capable of varying the wavelength band to be reflected by changing the refractive index and the grating period of the grating pattern. In order to use the variable color filter, a tensile force may be applied to the variable color filter from the outside.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. The following examples and results are provided so that the disclosure of the present invention will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. Also, for convenience of explanation, the components may be exaggerated or reduced in size.

1 is a conceptual diagram illustrating a reflection type strain measuring apparatus according to an embodiment of the present invention.

Fig. 2 is a perspective view illustrating the variable color filter of Fig. 1. Fig.

3 is a cross-sectional view illustrating the variable color filter 2;

1 to 3, the strain measuring apparatus 100 includes a variable color filter 120, a broadband light source 110, a spectroscope 116, and a processing unit 118. The variable color filter 120 is deformed by temperature or external force and attached to the object 10 to be measured.

The broadband light source 110 irradiates the variable color filter 120 with a wideband incident light. The spectroscope 116 receives the reflected light reflected from the variable color filter 120 or the transmitted light transmitted through the variable color filter 120 and measures the spectrum according to the wavelength. The processing unit 118 calculates the strain of the variable color filter 120 from the wavelength of the maximum intensity of the reflection spectrum measured in the spectroscope 116 or the wavelength of the minimum intensity of the transmission spectrum. The variable color filter (120) includes a transparent stretchable film (124) having transparency to light and having a first refractive index and elasticity; And a periodic pattern 122 completely buried in the transparent stretchable film so as not to protrude outward and having a second refractive index higher than the first refractive index.

The strain measuring apparatus 100 is a sensor whose reflection spectrum changes according to applied force. The strain measuring apparatus 100 does not use the electric characteristics and is not disturbed by the external electromagnetic wave. When there is no external light source, the strain measuring apparatus 100 can use solar light as an external light source.

The measurement target 10 may be a device that is deformed by temperature or external force. The measurement object 110 is an object to measure the strain rate by the variable color filter 120. As the object to be measured is deformed, the variable color filters 120 are deformed at the same time.

The wideband light source 110 is selected according to the reflection characteristic of the variable color filter, and the bandwidth of the wideband light source may be 100 nm or more. The broadband light source 110 may use a plurality of light sources in combination to provide a continuous spectrum of a constant intensity. The broadband light source may be a tungsten lamp. The broadband light source 110 may be an infrared region or a visible light region. The period of the periodic pattern may be selected according to the wavelength band of the wideband light source.

The output light of the broadband light source may be selectively transmitted to the beam splitter 114 through the polarizer 112. Since the variable color filter 120 can function as a polarizing plate, it is possible to provide a uniform polarized light to the incident light. When the polarizer is disposed, the stability of the reflected light can be improved.

The beam splitter 114 may provide the output light of the wideband light source to the variable color filter 120 and reflect the reflected light to change the beam path.

The spectroscope 116 can analyze the spectrum by receiving the reflected light provided through the beam splitter 114. The spectroscope 116 may include a prism or a diffraction grating and may measure the spatially separated spectrum and change it to an electrical signal. The spectroscope 116 may include a one-dimensional optical sensor array, a two-dimensional optical sensor array, or a position sensitive detector for measuring a position of a maximum / minimum light intensity.

The processing unit 118 can calculate the strain of the measurement object from the position (wavelength) of the maximum intensity of the reflection spectrum of the spectroscope. The processing unit 118 is a wavelength difference between the maximum position of the reflection spectrum and the maximum position in the case where there is no deformation and deformation. The wavelength difference is linearly proportional to the strain when the strain is less than 20 percent and may not be linearly proportional to the strain when the strain is greater than 20 percent. The relationship between the wavelength difference and the strain can be tabulated and used.

The variable color filter (120) comprises a transparent stretchable film (124) having transparency to light and having a first refractive index and stretchability, a second transparent film (124) completely buried in the transparent stretchable film And a periodic pattern 122 having a refractive index. The incident light can be incident on the variable color filter vertically. The variable color filter 120 can change the maximum position (wavelength) of the reflection spectrum according to the strain. In addition, the variable color filter 120 may also function as a polarizing plate. The stretching direction of the variable color film 120 may be a direction perpendicular to the extending direction of the linear periodic pattern 122.

The transparent stretchable film 124 may include at least one of polydimethylsiloxane (PDMS), perfluoropolyether (PFPE), epoxy resin, and latex rubber. The transparent stretchable film 124 may be a transparent, nonconductive, stretchable or elastic polymer with respect to incident light.

The periodic pattern 122 may include one of titanium oxide (TiO 2 ), zirconium oxide (ZrO 2), zinc oxide (ZnO), silicon (Si), and yemalum (Ge). The periodic pattern may be a metal oxide that is nonconductive, transparent to incident light, and unstretchable.

The periodic pattern 122 may be a straight line extending in parallel, and the repetition period of the periodic pattern may be smaller than an incident wavelength.

The transparent stretchable film 124 may be made of a deformable flexible material, may have a low refractive index, and may have a refractive index of 2 or less. The transparent stretchable film 124 may be made of an organic or inorganic polymer having excellent stretchability such as PDMS, epoxy, and latex. The transparent stretchable film is disposed so as to completely surround the periodic pattern, and may not be broken even for a plurality of tension cycles. The thickness of the transparent stretchable film may be several micro-bits to several hundreds of micrometers.

The periodic pattern 122 is a nano-lattice structure of a high refractive index material. The refractive index of the periodic pattern 122 may be two or more. The material of the periodic pattern may be a transparent flexible material, a material having a high refractive index and being deformable to an external tensile force. The refractive index difference between the periodic pattern and the transparent stretchable film 124 may be 0.5 or more.

The period of the periodic pattern 122 may be 300 nm to 600 nm when the periodic pattern 122 has a wavelength smaller than the incident wavelength and having a maximum intensity in the reflection spectrum of the visible light region. The thickness of the periodic pattern 122 may be an integer multiple of a half wavelength of the incident light or a wavelength. The width of the periodic pattern 122 may be 1/2 to 1/3 of the period of the periodic pattern. When deformed by an external force, the thickness and height of the periodic pattern do not change, and the period of the periodic pattern 122 varies with the tensile force.

The variable color filter 122 may include an adhesive layer 126 disposed on one side of the transparent stretchable film. The adhesive layer 126 prevents the measurement object and the variable color filter from falling off. The adhesive layer 122 may be a thermosetting resin or an ultraviolet ray-curing resin including an epoxy resin or a material that is coextensive with the transparent stretchable film.

According to a modified embodiment of the present invention, the variable color filter is not limited to the above-mentioned materials but includes a high-refractive-index material and a low-refractive-index material in a cross-nano-sized lattice structure.

According to a modified embodiment of the present invention, the operating wavelength of the stretchable nano grating structure can be applied at various wavelengths, such as a visible ray region and an infrared ray region. The stretchable nano-grid structure can be variously modified into a linear, disc-shaped disc-like shape.

4A is a view showing a strain of a variable color filter according to an embodiment of the present invention.

FIG. 4B is a diagram showing a simulation result showing a reflection spectrum according to strain in FIG. 4A. FIG.

Referring to FIGS. 4A and 4B, simulation results are shown using FDTD simulation (Lumerical TM ). The filtered optical characteristics of the variable color filter can be modified according to the degree of expansion and contraction. Wherein the variable color filter comprises a transparent stretchable film having transparency to light and having a first refractive index and having elasticity and a linear periodic pattern completely buried in the transparent stretchable film and having a second refractive index higher than the first refractive index, .

The material of the linear periodic pattern 122 is titanium oxide, the refractive index is 2.4 level in the blue region, the line width is 400 nm, the period is 800 nm, and the thickness is 350 nm. The material of the transparent stretchable film 124 is PDMS, and the refractive index is 1.4.

As the strain increases, the wavelength of the maximum intensity of the reflection spectrum shifts in the direction of the long wavelength. Measurements of strain may preferably be used at less than 30 percent.

5 is an experimental result showing a reflection spectrum according to a strain of a variable color filter according to an embodiment of the present invention.

Referring to FIG. 5, the experimental result shows an effect similar to the simulation result. However, the experimental results and the simulation results showed a difference in the linewidths of the central wavelength and the reflection spectrum. The material of the linear periodic pattern 122 is titanium oxide, the refractive index is 2.4 level in the blue region, the line width is 400 nm, the period is 800 nm, and the thickness is 350 nm. The material of the transparent stretchable film 124 is PDMS, and the refractive index is 1.4.

If the strain is zero percent, the center wavelength is 1324 nm. If the strain is 10 percent, the center wavelength is 1355 nm. If the strain is 20 percent, the center wavelength is 1385 nm. If the strain is 30 percent, the center wavelength is 1445 nm. The center wavelengths according to strain can be tabulated or fitted with curves.

6A is a perspective view illustrating a variable color filter according to another embodiment of the present invention.

FIG. 6B is a plan view showing the variable color filter of FIG. 6A. FIG.

6A and 6B, the variable color filter 320 includes a transparent stretchable film 324 having transparency to light and having a first refractive index and stretchability; And a periodic pattern 322 completely buried in the transparent stretchable film so as not to protrude outward and having a non-stretchable and second refractive index higher than the first refractive index.

The periodic pattern 322 is disposed with a second period P2 different from the first period in a second direction perpendicular to the first direction with a first period P1 in a first direction. The first period and the second period may be smaller than an incident wavelength, and the thickness of the periodic pattern may be a half wavelength or an integral multiple of a wavelength. The first period P1 and the second period P2 may be different from each other such that the central wavelength based on the strain in the first direction and the center wavelength based on the strain in the second direction do not overlap each other.

FIGS. 7 and 8 are cross-sectional views illustrating a method of fabricating a variable color filter according to an embodiment of the present invention.

Referring to FIGS. 7 and 8, a method of manufacturing a variable color filter includes depositing a first dielectric layer 222 having a non-elasticity and a high refractive index on a sacrificial substrate 210 (S10); Forming a periodic pattern 222a on the sacrificial substrate by patterning the first dielectric layer 222 (S20); A step (S30) of forming a second dielectric layer 230 having a stretchability and a low refractive index on the periodic pattern 222a; Removing the sacrificial substrate 210 to expose the periodic pattern 222a (S40); And forming a third dielectric layer 240 having a stretchability and a low refractive index on the exposed periodic pattern (S50).

In the step S10 of depositing the first dielectric layer 222, a silicon oxide film and a nickel film are sequentially deposited on the silicon substrate 211 (S11). The first dielectric layer 222 is deposited on the nickel layer. The first dielectric layer 222 may include one of titanium oxide (TiO 2 ), zirconium oxide (ZrO 2), zinc oxide (ZnO), silicon (Si), and yemalum (Ge). Preferably, the first dielectric layer 222 may be titanium oxide (TiO 2 ). The sacrificial substrate may be transformed into a glass substrate (or quartz substrate) and a nickel layer laminated on the glass substrate.

Then, the first dielectric layer 222 is patterned to form a periodic pattern on the sacrificial substrate 210. The case where a nanoimprint lithography technique is used is described. (S20) of patterning the first dielectric layer 222 and forming a periodic pattern on the sacrificial substrate may be performed as follows. A sacrificial polymer mask layer 224 and a silicon containing resist layer are sequentially coated on the first dielectric layer 222 and a line inverse pattern 225 is formed on the silicon containing resist layer using a nanoimprinting technique S21). Then, the sacrificial polymer mask layer 224 is etched using the silicon-containing resist having the reverse pattern 225 formed thereon as a mask to expose the upper surface of the first dielectric layer 222 (S22). Next, a metal mask layer 226 is deposited on the exposed first dielectric layer 222 (S23). The sacrificial polymer mask layer 224 is then removed using a lift-off technique to form a metal mask pattern 226a (S24). Subsequently, the first dielectric layer 222 is etched using the metal mask pattern 226a as a mask to form a periodic pattern 222a (S25). Then, the metal mask pattern 226a is removed to expose the periodic pattern 222a (S26). The sacrificial polymer mask layer may be polymethyl methacrylate (PMMA). The metal mask layer may be chromium (Cr).

 Next, a second dielectric layer 230 having a stretchability and a low refractive index is formed on the periodic pattern 222a (S30). The second dielectric layer 230 may include at least one of polydimethylsiloxane (PDMS), perfluoropolyether (PFPE), epoxy resin, and latex rubber. Preferably, the second dielectric layer may be polydimethylsiloxane (PDMS). The polydimethylsiloxane may be coated and then thermally cured.

Then, the sacrificial substrate 210 is removed and the periodic pattern 222a may be exposed (S40). In the sacrificial substrate, the silicon substrate 211 and the silicon oxide film 212 may be separated by an external force (S41). The exposed nickel layer may be removed by etching and the periodic pattern may be exposed (S42).

Next, a third dielectric layer 240 having stretchability and low refractive index may be formed on the exposed periodic pattern (S50). The third dielectric layer 240 may include at least one of polydimethylsiloxane (PDMS), perfluoropolyether (PFPE), epoxy resin, and latex rubber. Preferably, the second dielectric layer may be polydimethylsiloxane (PDMS). The polydimethylsiloxane can be thermally cured after coating (S51) (S52). Accordingly, the second dielectric layer 230 and the third dielectric layer 240 can be integrated.

According to a modified embodiment of the present invention, the nano-periodic pattern formation process may be performed using optically-based lithography such as photolithography, laser interference lithography, or e-beam lithography, Non-optically based lithography such as Nanoimprint lithography, Nanotransfer printing, Roll imprint lithography, Direct patterning, or BCP-DSA. It is possible to make using the process.

9 is a conceptual diagram for explaining an apparatus for measuring a transmission strain according to another embodiment of the present invention. A description overlapping with that described in Fig. 1 will be omitted.

9, the strain measuring apparatus 100a includes a variable color filter 120, a broadband light source 110, a spectroscope 116, and a processing unit 118. [ The variable color filter is deformed by temperature or external force and attached to the object to be measured.

The variable color filter 120 is deformed by a broadband light source temperature or an external force and attached to an object to be measured. The wideband light source 110 irradiates the variable color filter with a wideband incident light. The spectroscope 116 receives the light transmitted through the variable color filter 120 and measures the spectrum according to the wavelength. The processing unit 118 calculates the strain of the variable color filter from the wavelength of the minimum intensity of the transmission spectrum measured in the spectroscope. The variable color filter (120) comprises: a transparent stretchable film (124) having transparency to light and having a first refractive index and elasticity; And a periodic pattern 122 completely buried in the transparent stretchable film so as not to protrude outward and having a second refractive index higher than the first refractive index. The adhesive layer 126 attaches the variable color filter 120 and the measurement target 10 to each other.

The strain measuring apparatus is a sensor whose transmission spectrum changes according to applied force. The strain measuring device does not use the electric characteristics and is not disturbed by the external electromagnetic wave. When there is no external light source, the strain measuring device can use the solar light as an external light source.

The transmission spectrum is given as the opposite of the reflection spectrum. The measurement target 10 may be a transparent material with respect to incident light.

While the invention has been shown and described with reference to certain preferred embodiments thereof, it will be understood by those skilled in the art that various changes and modifications may be made therein without departing from the spirit and scope of the invention as defined by the appended claims. And all of the various forms of embodiments that can be practiced without departing from the spirit of the invention.

120: Variable color filter
122: Transparent stretching film
124: cycle pattern

Claims (14)

delete delete delete delete delete delete delete delete delete Depositing a first dielectric layer having a non-stretchable and a high refractive index on the sacrificial substrate;
Forming a periodic pattern on the sacrificial substrate by patterning the first dielectric layer;
Forming a second dielectric layer having a stretchability and a low refractive index on the periodic pattern;
Removing the sacrificial substrate to expose the periodic pattern; And
And forming a third dielectric layer having a stretchability and a low refractive index on the exposed periodic pattern,
Wherein patterning the first dielectric layer to form a periodic pattern on the sacrificial substrate comprises:
Sequentially coating a sacrificial polymeric mask layer and a silicon-containing resist layer on the first dielectric layer and forming a line inverse pattern on the silicon-containing resist layer using an imprinting technique;
Etching the sacrificial polymer mask layer with the silicon-containing resist having the reverse pattern formed thereon as a mask to expose an upper surface of the first dielectric layer;
Depositing a metal mask layer on the exposed first dielectric layer;
Removing the sacrificial polymer mask layer using a lift-off technique and forming a metal mask pattern;
Etching the first dielectric layer using the metal mask pattern as a mask to form a periodic pattern; And
And removing the metal mask pattern to expose the periodic pattern. ≪ Desc / Clms Page number 19 > 11. The method of claim 10,
Wherein the sacrificial substrate comprises a silicon substrate, a silicon oxide layer stacked on the silicon substrate, and a nickel layer stacked on the silicon oxide layer. delete 11. The method of claim 10,
Wherein the second dielectric layer and the third dielectric layer comprise at least one of polydimethylsiloxane (PDMS), perfluoropolyether (PFPE), epoxy resin, and latex rubber. . 11. The method of claim 10,
Wherein the first dielectric layer includes one of titanium oxide (TiO 2 ), zirconium oxide (ZrO 2), zinc oxide (ZnO), silicon (Si), and yttrium (Ge) .
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11592344B2 (en) 2020-04-24 2023-02-28 Samsung Electronics Co., Ltd. Stretchable strain sensors and devices

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011089961A (en) * 2009-10-26 2011-05-06 Olympus Corp Spectroscope and photometric equipment provided with the same

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011089961A (en) * 2009-10-26 2011-05-06 Olympus Corp Spectroscope and photometric equipment provided with the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11592344B2 (en) 2020-04-24 2023-02-28 Samsung Electronics Co., Ltd. Stretchable strain sensors and devices
US11828664B2 (en) 2020-04-24 2023-11-28 Samsung Electronics Co., Ltd. Stretchable strain sensors and devices

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