CN103631086A - Manufacturing method for micro-nano graphs used for integrated optoelectronic device - Google Patents
Manufacturing method for micro-nano graphs used for integrated optoelectronic device Download PDFInfo
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- CN103631086A CN103631086A CN201210297193.2A CN201210297193A CN103631086A CN 103631086 A CN103631086 A CN 103631086A CN 201210297193 A CN201210297193 A CN 201210297193A CN 103631086 A CN103631086 A CN 103631086A
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Abstract
The invention discloses a manufacturing method for micro-nano graphs used for an integrated optoelectronic device. The method comprises following steps: firstly, manufacturing an imprinting template and fixing the imprinting template and an imprinting substrate; secondly, aligning and attaching the imprinting template and the imprinting substrate, and imprinting the micro-nano graphs of the imprinting template on imprinting photoresist of the imprinting substrate; and finally, etching an integrated optoelectronic device micro-nano graph structure by taking the micro-nano graphs transferred to the imprinting photoresist as an etching mask. According to the invention, an aligning problem, during an integrated optoelectronic device manufacturing process, of a nano-imprinting method is solved, and the yield of nano-imprinted micro-nano graphs is greatly improved.
Description
Technical field
The method for making that the present invention relates to a kind of micro-nano graph for integrated opto-electronic device, belongs to photoelectron technology field.
Background technology
Along with the development of optical communication, especially optical communication system hypervelocity, jumbo requirement make Optoelectronic Integration become the hot fields of current scientific research.The integrated employing of photoelectron is similar to the method for making of SIC (semiconductor integrated circuit), and optical element is integrated on same substrate.The advantages such as this integrated device has that volume is little, the life-span is long, reliability is high, low in energy consumption, function admirable.
Along with the raising of integrated level, the functional diversities of device, the micro-nano graphic structure of integrated opto-electronic device the inside also becomes more complicated, and live width is less, therefore needs a kind of stable, reliable photoetching process to make integrated opto-electronic device micro-nano graph.More applicable photoetching method comprises at present: immersion lithography, extreme ultraviolet lithography, electron beam lithography, nanometer embossing.
Liquid immersion lithography is full of with a kind of liquid between the projection lens of litho machine and substrate, to increase the numerical aperture of projection lens, thereby obtains better resolution and depth of focus.But the existence of bubble in liquid can destroy the integrality of image or reduce contrast, makes edge fuzziness, thereby and liquid can exert an influence and affect the performance of liquid immersion lithography photoresist and camera lens.
Extreme ultraviolet photolithographic incides extreme extreme ultraviolet light (EUV) on reflecting mask, thereby obtains mask pattern on substrate.Its advantage is that photoetching resolution is high, more than at least can reaching 30nm.Extreme ultraviolet photolithographic technical matters is simple, easily industrialization.But extreme ultraviolet light source design difficulty is larger, extreme ultraviolet photolithographic Technology Need reflective projection system is absorbed by material to prevent extreme ultraviolet light simultaneously, makes difficulty.
Beamwriter lithography with magnetic field by Electron Beam Focusing on electronics etching agent, can make complicated micro-nano graph, and resolution 10nm.But beamwriter lithography film speed is slow, production efficiency is low, and be difficult to realize high-precision aligning and alignment.
Nano impression is to utilize mechanical pressure to be pressed in substrate surface on the impression glue of figure transfer layer the template that is manufactured with micro-nano graphic structure, make it to be full of figure space in template, afterwards that template same substrate is separated, on photoresist, leave relief pattern, by reactive ion beam etching (RIBE), remove impression glue remaining on transfer layer, then utilize dry method or wet etching, obtain the micro-nano graph needing.The resolution of nanometer embossing is high, can reach 10nm, and can prepare micro-nano graphic structure in enormous quantities, fast, is considered to the popular research field of Next Generation Lithography.
Even so, up to the present, utilize nano-imprinting method make optoelectronic device especially integrated opto-electronic device really seldom have report, its main difficulty is micro-nano graphic structure aligning aspect.
Patent " preparation method of a kind of two-dimensional photon crystal structure GaN base LED " (application number: proposed to utilize nanometer embossing to make the method for 2 D photon crystal 201110148202.7); The method of patent " method for making of low cost DFB laser " (application number: proposed 200610125535.7) to utilize nanometer embossing to make DFB(distributed Feedback Prague) laser instrument and dfb laser array.In these structures, micro-nano graphic structure is covered with whole substrate, does not need strict aligning.And for integrated opto-electronic device, especially micro-nano graph is distributed in the device of zones of different, just need accurate technique of alignment to guarantee the yield rate of nanometer embossing.Tang Yichao, Yu Yonglin, Zhao Jialin have proposed a kind of assembly that nano-imprint stamp is fixed and aimed at that can be used in patent " ultraviolet nanometer impression soft mode version is fixed and alignment components ", by this assembly, can realize aiming at of nano-imprint stamp figure and substrate figure in integrated opto-electronic device, for micro-nano imprint method provides a kind of important solution for the making of integrated opto-electronic device micro-nano graph.
Summary of the invention
The object of this invention is to provide a kind of method for making and application of the micro-nano graph for integrated opto-electronic device, it can solve the alignment issues that nano-imprinting method is made for integrated opto-electronic device, greatly improves the yield rate of nano impression micro-nano graph.
The technical solution adopted in the present invention is: a kind of method for making of the micro-nano graph for integrated opto-electronic device, comprising: first make impression formboard, and impression formboard and imprinted substrate are fixed; Then impression formboard aimed at imprinted substrate and fitted, the micro-nano graph of impression formboard being impressed on the imprint lithography glue of imprinted substrate; Finally will transfer to micro-nano graph on imprint lithography glue as etch mask, etching obtains required integrated opto-electronic device micro-nano graphic structure.
Described method, impression formboard and the fixing method of imprinted substrate are comprised: first with the masterplate stationary fixture of mask registration machine fixedly masterplate fix and alignment components, masterplate is fixed and the vacuum hole on alignment components top is arranged on the vacuum tank place of masterplate stationary fixture; Open after vacuum, pull of vacuum is through the vacuum tank of masterplate stationary fixture, by masterplate fix and alignment components in vacuum hole be passed to the vacuum hole place at this assembly lower surface center, impression formboard is adsorbed in this assembly lower surface by pull of vacuum, be about to that nano-imprint stamp is fixed on that masterplate is fixed and alignment components on; Last spin coating one deck imprint lithography glue in imprinted substrate, and imprinted substrate is placed and is fixed on worktable.
Described method, the method of impression formboard being aimed at imprinted substrate and fitting comprises: on imprinted substrate and impression formboard, be provided with alignment mark, adjust the height of worktable, imprinted substrate and nano-imprint stamp are moved closer to, by the alignment mark on observation by light microscope imprinted substrate and nano-imprint stamp, adjust worktable position and angle in the horizontal direction, until described alignment mark simultaneously; Finally continue to adjust the height of worktable, make imprinted substrate contact laminating with impression block.
Described method, the method for described micro-nano image impression comprises hot padding and ultraviolet stamping method.
Described method, the step of hot padding method comprises:
A) more than the imprinted substrate of laminating and impression block are heated to the glass temperature of imprint lithography glue, impression block is imposed to mechanical pressure, this template is pressed in softening imprint lithography glue, by alternating temperature, transformation process, imprint lithography glue is filled in the micro-nano graphic structure gap of impression block;
B) cancel pressure after being cooled to normal temperature, and imprinted substrate and impression block are departed from;
6. method according to claim 4, is characterized in that, ultraviolet stamping method comprises:
A) more than the imprinted substrate of laminating and impression block are heated to the glass temperature of imprint lithography glue, impression block is imposed to mechanical pressure, this template is pressed in softening imprint lithography glue, by alternating temperature, transformation process, imprint lithography glue is filled in the micro-nano graphic structure gap of impression block, then utilizes ultraviolet light to carry out exposure curing to imprint lithography glue;
B) cancel pressure after being cooled to normal temperature, and imprinted substrate and impression block are departed from;
Described method, while adopting ultraviolet stamping method, impression formboard adopts can see through ultraviolet material.
Described method, after the imprinted substrate that obtains comprising micro-nano graph, utilizes reactive ion beam etching (RIBE) method to go cull to process to imprinted substrate surface, and recycling dry method or wet etching method etch micro-nano graph.
The application that a kind of method for making of the micro-nano graph for integrated opto-electronic device is made at the integrated opto-electronic device that comprises grating, photonic crystal.
The invention has the advantages that: employing combining nano impression formboard is fixed and the nano-imprinting method of alignment components is made micro-nano graph, by nano impression formboard is fixed, and it is accurately aimed at imprinted substrate figure, solve the alignment issues that nano-imprinting method is made for integrated opto-electronic device, greatly improved the yield rate of nano impression micro-nano graph.Described aligning micro-nano graphic structure can be grating, photonic crystal and other micro-nano structure, and described micro-nano graphic structure can be distributed in zones of different on substrate, can carry out the aligning of zones of different figure by method for making of the present invention.This method has the advantages such as micro-nano graph resolution is high, yield rate is high, production efficiency is high, production cost is low.
Accompanying drawing explanation
Accompanying drawing 1 is that employing combining nano impression formboard of the present invention is fixed and the nano-imprinting method of alignment components is made the schematic diagram of micro-nano graph.
Four sections of broad tuning numeral cascaded fiber grating distributed Bragg reflection (DCG-DBR) laser structure schematic diagrams of accompanying drawing 2 embodiments.
Accompanying drawing 3 is structural representations of digital cascaded fiber grating in embodiment.
Accompanying drawing 4 is to utilize employing of the present invention to combine that nano impression formboard is fixed and the nano-imprinting method of alignment components is made the alignment procedures schematic diagram of DCG-DBR laser instrument grating structure.
After accompanying drawing 5 is nano impression, nano-imprint stamp optical grating construction figure is transferred to the schematic diagram on imprint lithography glue-line.
In figure, 1: masterplate is fixed and alignment components; 2: masterplate stationary fixture; 3: upper vacuum hole; 4: vacuum tank; 5: lower vacuum hole; 6: impression formboard; 7: imprinted substrate; 8: worktable; 9: impression with photoresist; 10:n-InP substrate; 11:InGaAsP lower waveguide layer; 12:InGaAsP/InP multiple quantum well layer; 13:InGaAsP/InP grating; The upper ducting layer of 14:InGaAsP; 15:P-InGaAs ohmic contact layer; 16:P face electrode; 17:N face electrode; 18: alignment mark; 19: template raster graphic; 20: raster graphic; A: front grating; B: active area; C: phase region; D: rear grating.
Embodiment
The present invention adopts and to combine that nano impression formboard is fixed and the nano-imprinting method of alignment components, nano impression formboard is fixed, and nano impression formboard can accurately be aimed at imprinted substrate graphics field.
The present invention includes following steps:
Step 1: with the masterplate stationary fixture 2 of mask registration machine fixedly masterplate fix and alignment components 1, the vacuum hole 3 on described assembly 1 top is positioned at vacuum tank 4 places of described masterplate stationary fixture 2.Open after vacuum, pull of vacuum is through the vacuum tank 4 of described masterplate stationary fixture 2, vacuum hole 3 in described assembly 1 is passed to vacuum hole 5 places at described assembly 1 lower surface center, masterplate 6 is adsorbed in this position by pull of vacuum, nano-imprint stamp 6 is fixed on to template is fixed and alignment components 1 on.
Step 2: 7 spin coating one decks impressions with photoresist 9 in imprinted substrate, and imprinted substrate 7 is placed and is fixed on worktable 8.
Step 3: the height of adjusting described worktable 8, described imprinted substrate 7 and described nano-imprint stamp 6 are moved closer to, two groups of alignment marks on imprinted substrate 7 by described in observation by light microscope and described nano-imprint stamp 6, adjust described worktable 8 position and angle in the horizontal direction, until two groups of described alignment mark simultaneously.Adjust the height of described worktable 8, make described nano impression substrate 7 contact laminating with described nano-imprint stamp 6, then close vacuum, and travelling table 8 makes worktable separated gradually with described template stationary fixture 2, the nano impression substrate 7 and the nano-imprint stamp 6 that take out laminating, complete alignment procedures.
Described nano-imprinting method comprises hot padding and ultraviolet stamping.
Described hot padding comprises the steps:
Step 1: more than the nano impression substrate 7 of described laminating and nano-imprint stamp 6 are heated to the glass temperature of imprint lithography glue 9, described nano-imprint stamp 6 is imposed to mechanical pressure, template is pressed in softening photoresist, by some alternating temperatures, transformation process, through after a while, imprint lithography glue 9 is filled in the micro-nano graphic structure gap of impression block 6.
Step 2: cancel pressure after being cooled to normal temperature, and described nano impression substrate 7 and described nano-imprint stamp 6 are departed from.
Step 3: utilize reactive ion beam etching (RIBE) (RIE) to go cull to process to nano impression substrate 7 surfaces, then utilize the imprint lithography glue pattern impressing out as etch mask, adopt dry method or wet etching, obtain required micro-nano graphic structure.
Described ultraviolet stamping comprises the steps:
Step 1: the nano impression substrate 7 of described laminating and nano-imprint stamp 6 are heated to uniform temperature, described nano-imprint stamp 6 is imposed to mechanical pressure, template is pressed in softening photoresist 9, by some alternating temperatures, transformation process, imprint lithography glue is filled in the micro-nano graphic structure gap of impression block 6, then utilizes ultraviolet light to carry out exposure curing to photoresist 9.
Step 2: cancel pressure and be cooled to after normal temperature, described nano impression substrate 7 and described nano-imprint stamp 6 are departed from.
Step 3: utilize reactive ion beam etching (RIBE) (RIE) to go cull to process to nano impression substrate 7 surfaces, then utilize the imprint lithography glue pattern impressing out as etch mask, adopt dry method or wet etching, obtain required micro-nano graphic structure.
Below in conjunction with accompanying drawing, be described in further detail the present invention.
As shown in Figure 1, nano impression soft mode version fix and alignment components in, masterplate is fixed and alignment components 1 clamps by masterplate stationary fixture 2.In masterplate stationary fixture 2, be provided with vacuum tank 4, vacuum tank 4 by masterplate, fix and alignment components 1 on upper vacuum hole 3 be connected.Masterplate is fixed and alignment components 1 lower surface is provided with lower vacuum hole 5, and communicates with upper vacuum hole 3.Open after vacuum, impression formboard 6 is adsorbed in lower vacuum hole 5 places by pull of vacuum.Imprinted substrate 7 is positioned on worktable 8, also scribbles one deck impression with photoresist 9 in imprinted substrate 7.
For a method for making for the micro-nano graph of integrated opto-electronic device, in described integrated opto-electronic device, micro-nano graph adopts and combines that nano impression formboard is fixed and the nano-imprinting method of alignment components 1 is made.Nano-imprinting method can be thermal marking method, can be also that ultraviolet stamping method is made.
Described combining nano impression formboard is fixed and the nano-imprinting method of alignment components, comprises the steps:
Step 1: the masterplate stationary fixture 2 of use mask registration machine is masterplate fixed alignment assembly 1 fixedly, and the vacuum hole 3 on described assembly 1 top is positioned at vacuum tank 4 places of described masterplate stationary fixture 2.Open after vacuum, pull of vacuum is through the vacuum tank 4 of described masterplate stationary fixture 2, vacuum hole 3 in described assembly 1 is passed to vacuum hole 5 places at described assembly 1 lower surface center, nano impression formboard 6 is adsorbed in this position by pull of vacuum, nano-imprint stamp 6 is fixed on to template is fixed and alignment components 1 on.
Step 2: 7 spin coating one decks impressions with photoresist 9 in imprinted substrate, and imprinted substrate 7 is placed and is fixed on worktable 8.
Step 3: the height of adjusting described worktable 8, described imprinted substrate 7 and described nano-imprint stamp 6 are moved closer to, two groups of alignment marks on imprinted substrate 7 by described in observation by light microscope and described nano-imprint stamp 6, adjust described worktable 8 position and angle in the horizontal direction, until two groups of described alignment mark simultaneously.Adjust the height of described worktable 8, make described nano impression substrate 7 contact laminating with described nano-imprint stamp 6, then close vacuum, and travelling table 8 makes worktable separated gradually with described template stationary fixture 2, the nano impression substrate 7 and the nano-imprint stamp 6 that take out laminating, complete alignment procedures.Nano impression formboard is fixed and alignment components 1 need to adopt transparent solid material, the alignment mark on the imprinted substrate 7 described in can seeing by optical microscope like this and described nano-imprint stamp 6.
Described thermal marking method comprises the steps:
Step 1: more than the nano impression substrate 7 of described laminating and nano-imprint stamp 6 are heated to the glass temperature of imprint lithography glue 9, described nano-imprint stamp 6 is imposed to mechanical pressure, template 6 is pressed in softening photoresist 9, by some alternating temperatures, transformation process, imprint lithography glue 9 is filled in the micro-nano graphic structure gap of impression block 6.
Step 2: cancel pressure after being cooled to normal temperature, and described nano impression substrate 7 and described nano-imprint stamp 6 are departed from.
Step 3: utilize reactive ion beam etching (RIBE) (RIE) to remove residual photoresist, then utilize the imprint lithography glue pattern impressing out as etch mask, adopt dry method or wet etching, obtain required micro-nano graphic structure.
Described ultraviolet stamping method comprises the steps:
Step 1: the nano impression substrate 7 of described laminating and nano-imprint stamp 6 are heated to uniform temperature (lower compared with hot padding method temperature), described nano-imprint stamp 6 is imposed to mechanical pressure, template 6 is pressed in softening photoresist 9, by some alternating temperatures, transformation process, imprint lithography glue 9 is filled in the micro-nano graphic structure gap of impression block 6, then utilizes ultraviolet light to carry out exposure curing to photoresist 9.Now, impression block 6 is to see through ultraviolet material.
Step 2: cancel pressure and be cooled to after normal temperature, described nano impression substrate 7 and described nano-imprint stamp 6 are departed from.
Step 3: utilize reactive ion beam etching (RIBE) (RIE) to remove residual photoresist, then utilize the imprint lithography glue pattern impressing out as etch mask, adopt dry method or wet etching, obtain required micro-nano graphic structure.
The micro-nano graph that the present invention makes can be grating, photonic crystal and other micro-nano graphic structures, and described micro-nano graphic structure can be distributed in zones of different on substrate, carries out the aligning of zones of different figure by the method for making of invention.
Provide below to utilize and combine that nano impression formboard is fixed and the nano-imprinting method of alignment components is made the embodiment of digital cascaded fiber grating (DCG) in digital cascaded fiber grating distributed Bragg reflection (DCG-DBR) laser instrument.
Contrast accompanying drawing below, embodiment is described.
In this embodiment, DCG-DBR laser structure figure as shown in Figure 2.
The basic structure of DCG-DBR laser instrument is the same with the structure of common sampled-grating distributed Bragg reflection laser, mainly comprise successively from top to bottom: N face electrode 17, n-InP substrate 10, InGaAsP lower waveguide layer 11, InGaAsP/InP multiple quantum well layer 12, InP/InGaAsP grating 13, the upper ducting layer 14 of InGaAsP, P-InGaAs ohmic contact layer 15, p side electrode 16.
DCG-DBR is longitudinally four regions, front grating A, active area B, phase region C and rear grating D.Front grating and rear grating provide the pectination reflectance spectrum at hyperchannel planar reflective peak, by vernier caliper principle, realize wavelength tuning.Gain region provides the gain of light, and phase region is used for finely tuning longitudinal mode position, adjusting wavelength.
Accompanying drawing 3 is structural representations of digital cascaded fiber grating (DCG).DCG was comprised of a plurality of sampling grating cycle, sampling period Z
0, a sampling period is by Z equal in length
gseveral grating subsegments form, these grating subsegments are different uniform grating of cycle, the grating cycle is respectively Λ
1, Λ
2Λ
n, the adjacent gratings cycle is spaced apart 2～5nm, is therefore difficult to make of common photoetching method.In the present invention, utilize the method for nano impression to make DCG.First by electronic beam photetching process, holographic exposure or other micro-nano graph method for makings, make DCG nano-imprint stamp, then remove to make DCG with the impression block of making, have very high precision.
Please refer to accompanying drawing 4, accompanying drawing 5 and accompanying drawing 6, set forth the implementation process that method of the present invention is made optical grating construction in DCG-DBR laser instrument below.
Please refer to accompanying drawing 4, elaboration below utilizes impression formboard to fix and alignment components realizes nano-imprint stamp and docks growing epitaxial sheet alignment procedures, comprises the steps:
Step 1: make the template 6 be ready for nano impression, and even spin coating one deck nano impression with photoresist 9 on the epitaxial wafer 7 of grow in docking.
Step 2: described soft mode version is fixed and alignment components 1 is fixed on the masterplate stationary fixture 2 of described mask registration machine, utilize pull of vacuum to be adsorbed in vacuum hole 5 places at described dull and stereotyped lower surface center nano-imprint stamp 6, described epitaxial wafer 7 is fixed on worktable 8.
Step 3: the height of adjusting operating platform 8, nano-imprint stamp 6 and epitaxial wafer 7 are moved closer to, by microscopic examination, adjust worktable 8 horizontal levels and angle, make the alignment mark 18 on nano-imprint stamp 6 and epitaxial wafer 7 overlap and aim at mutually, then adjusting operating platform, makes nano-imprint stamp 6 and epitaxial wafer 7 laminatings.Discharge pull of vacuum, take out the nano-imprint stamp 6 and epitaxial wafer 7 of laminating, complete alignment procedures.
Step 4: the template raster graphic 19 on nano-imprint stamp 6 is transferred on photoresist 9 by nano-imprinting method.Described nano-imprinting method can be thermal marking method, can be also ultraviolet stamping method.On nano-imprint lithography glue after figure shifts, 9 raster graphics 20 please refer to accompanying drawing 5.
Described thermal marking method, comprises the steps:
(1): more than the nano-imprint stamp of described laminating 6 and epitaxial wafer 7 are heated to the glass temperature of imprint lithography glue 9, described nano-imprint stamp 6 is imposed to mechanical pressure, nano-imprint stamp 6 is pressed in softening photoresist 9, by some alternating temperatures, transformation process, through after a while, imprint lithography glue 9 is filled in template raster graphic 19 structure intervals of nano-imprint stamp 6.
(2): after being cooled to normal temperature, cancel pressure, and described nano-imprint stamp 6 and described epitaxial wafer 7 are departed from.
Described ultraviolet stamping method, comprises the steps:
(1) nano-imprint stamp of described laminating 6 and epitaxial wafer 7 are heated to uniform temperature, described nano-imprint stamp 6 is imposed to mechanical pressure, template is pressed in softening photoresist 9, by some alternating temperatures, transformation process, imprint lithography glue 9 is filled in template raster graphic 19 structure intervals of nano-imprint stamp 6, then utilizes ultraviolet light to carry out exposure curing to imprint lithography glue 9.
(2): cancel pressure and be cooled to after normal temperature, described nano-imprint stamp 6 and described epitaxial wafer 7 are departed from.
Step 5: utilize reactive ion beam etching (RIBE) (RIE) to go cull to process to epitaxial wafer 7 surfaces, then utilize the figure impressing out as etch mask, adopt dry method or wet etching, obtain required grating 13 structures.
Above embodiment is only for illustrating method of the present invention; and the not restriction to the scope of application of the present invention; the those of ordinary skill in relevant technologies field; without departing from the spirit and scope of the present invention; can also make a variety of changes implementation content; thereby the technical scheme being equal to also belongs to category of the present invention, scope of patent protection of the present invention should be defined by the claims.
Claims (9)
1. for a method for making for the micro-nano graph of integrated opto-electronic device, it is characterized in that comprising: first make impression formboard, and impression formboard and imprinted substrate are fixed; Then impression formboard aimed at imprinted substrate and fitted, the micro-nano graph of impression formboard being impressed on the imprint lithography glue of imprinted substrate; Finally will transfer to micro-nano graph on imprint lithography glue as etch mask, etching obtains required integrated opto-electronic device micro-nano graphic structure.
2. method according to claim 1, it is characterized in that, impression formboard and the fixing method of imprinted substrate are comprised: first with the masterplate stationary fixture of mask registration machine fixedly masterplate fix and alignment components, masterplate is fixed and the vacuum hole on alignment components top is arranged on the vacuum tank place of masterplate stationary fixture; Open after vacuum, pull of vacuum is through the vacuum tank of masterplate stationary fixture, by masterplate fix and alignment components in vacuum hole be passed to the vacuum hole place at this assembly lower surface center, impression formboard is adsorbed in this assembly lower surface by pull of vacuum, be about to that nano-imprint stamp is fixed on that masterplate is fixed and alignment components on; Last spin coating one deck imprint lithography glue in imprinted substrate, and imprinted substrate is placed and is fixed on worktable.
3. method according to claim 1, it is characterized in that, the method of impression formboard being aimed at imprinted substrate and fitting comprises: on imprinted substrate and impression formboard, be provided with alignment mark, adjust the height of worktable, imprinted substrate and nano-imprint stamp are moved closer to, by the alignment mark on observation by light microscope imprinted substrate and nano-imprint stamp, adjust worktable position and angle in the horizontal direction, until described alignment mark simultaneously; Finally continue to adjust the height of worktable, make imprinted substrate contact laminating with impression block.
4. method according to claim 1, is characterized in that: the method for described micro-nano image impression comprises hot padding and ultraviolet stamping method.
5. method according to claim 4, is characterized in that, the step of hot padding method comprises:
A) more than the imprinted substrate of laminating and impression block are heated to the glass temperature of imprint lithography glue, impression block is imposed to mechanical pressure, this template is pressed in softening imprint lithography glue, by alternating temperature, transformation process, imprint lithography glue is filled in the micro-nano graphic structure gap of impression block;
B) cancel pressure after being cooled to normal temperature, and imprinted substrate and impression block are departed from.
6. method according to claim 4, is characterized in that, ultraviolet stamping method comprises:
A) more than the imprinted substrate of laminating and impression block are heated to the glass temperature of imprint lithography glue, impression block is imposed to mechanical pressure, this template is pressed in softening imprint lithography glue, by alternating temperature, transformation process, imprint lithography glue is filled in the micro-nano graphic structure gap of impression block, then utilizes ultraviolet light to carry out exposure curing to imprint lithography glue;
B) cancel pressure after being cooled to normal temperature, and imprinted substrate and impression block are departed from.
7. according to the method described in claim 4 or 6, it is characterized in that: while adopting ultraviolet stamping method, impression formboard adopts can see through ultraviolet material.
8. according to the method described in any one in claim 1～6, it is characterized in that: after the imprinted substrate that obtains comprising micro-nano graph, utilize reactive ion beam etching (RIBE) method to go cull to process to imprinted substrate surface, recycling dry method or wet etching method etch micro-nano graph.
9. for an application for the method for making of the micro-nano graph of integrated opto-electronic device, it is characterized in that: be applied in the integrated opto-electronic device that comprises grating, photonic crystal is made.
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| CN104635422A (en) * | 2014-09-10 | 2015-05-20 | 苏州大学 | Nanoimprinting method and device of array micro structure |
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| CN106647166A (en) * | 2016-11-25 | 2017-05-10 | 武汉红星杨科技有限公司 | Crystal direction alignment device and alignment method of nanometer impressing template |
| CN106980227A (en) * | 2016-04-01 | 2017-07-25 | 边捷 | A kind of method for preparing nanoparticle pattern for a variety of substrate surfaces |
| CN107179620A (en) * | 2017-06-07 | 2017-09-19 | 京东方科技集团股份有限公司 | The preparation method of ultra thin substrate bonding structure and preparation method thereof, display device |
| TWI694967B (en) * | 2014-04-22 | 2020-06-01 | 奧地利商Ev集團E塔那有限公司 | Method and device for embossing of a nanostructure |
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