WO2022213449A1 - 一种二维片层材料垂直取向组装体的制备方法 - Google Patents

一种二维片层材料垂直取向组装体的制备方法 Download PDF

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WO2022213449A1
WO2022213449A1 PCT/CN2021/094036 CN2021094036W WO2022213449A1 WO 2022213449 A1 WO2022213449 A1 WO 2022213449A1 CN 2021094036 W CN2021094036 W CN 2021094036W WO 2022213449 A1 WO2022213449 A1 WO 2022213449A1
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preparation
colloidal dispersion
dimensional sheet
scratches
assembly
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高超
曹敏
许震
刘英军
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浙江大学
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    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00Carbon; Compounds thereof
    • C01B32/15Nano-sized carbon materials
    • C01B32/182Graphene
    • C01B32/198Graphene oxide
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00Nitrogen; Compounds thereof
    • C01B21/06Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • C01B21/072Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with aluminium
    • C01B21/0728After-treatment, e.g. grinding, purification
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00Carbon; Compounds thereof
    • C01B32/20Graphite
    • C01B32/21After-treatment
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00Carbon; Compounds thereof
    • C01B32/20Graphite
    • C01B32/21After-treatment
    • C01B32/22Intercalation
    • C01B32/225Expansion; Exfoliation
    • CCHEMISTRY; METALLURGY
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    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00Carbon; Compounds thereof
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    • C01B32/21After-treatment
    • C01B32/23Oxidation
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01FCOMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F5/00Compounds of magnesium
    • C01F5/02Magnesia
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    • C01FCOMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F7/00Compounds of aluminium
    • C01F7/02Aluminium oxide; Aluminium hydroxide; Aluminates
    • C01F7/021After-treatment of oxides or hydroxides
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/515Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
    • C04B35/58Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
    • C04B35/583Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on boron nitride

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  • the invention belongs to the field of materials, and in particular relates to a control method and preparation of a large-area vertically arranged assembly of two-dimensional sheet materials.
  • Two-dimensional sheet materials have excellent anisotropic mechanical, electrical, optical, thermal and other physical and chemical properties, these characteristics make two-dimensional sheet materials in many fields such as displays, sensors, high-performance fibers, proton transport membranes, and thermal management. Research hotspots and frontiers.
  • the mechanical and thermal properties of macroscopic two-dimensional assemblies are mainly affected by the orientation structure of the two-dimensional sheet material elements. Therefore, how to precisely control and design the orientation of two-dimensional sheet materials to prepare high-performance two-dimensional sheet material assemblies is an urgent problem to be solved.
  • the existing two-dimensional sheet material orientation control methods include ice template method, electric field orientation, magnetic field orientation, chemical vapor deposition, etc., which are often complicated in process, huge energy consumption, difficult to large-area continuous preparation, and difficult to meet the requirements of high precision and high efficiency. application requirements.
  • the specific disadvantages are as follows:
  • the ice template method is to orient the two-dimensional sheet material along the direction of ice crystal growth through the directional growth of ice crystals, but this method is only suitable for low-concentration two-dimensional colloids, and high-concentration two-dimensional colloids are much larger than ice crystal growth due to the internal viscous resistance. orientation force and cannot be oriented.
  • High-frequency electric field orientation and high-frequency magnetic field orientation require enormous energy consumption, expensive equipment, and complicated processes.
  • Chemical vapor deposition can grow two-dimensional lamellar walls in situ, but this method relies heavily on the substrate, and the grown highly vertical nanowalls are difficult to peel from the substrate, which limits its further application.
  • the purpose of the present invention is to provide a high-precision/low-cost, high-efficiency preparation of a large-area and highly vertically oriented two-dimensional assembly and a preparation method for the deficiencies of the existing technology.
  • the information disclosed in this Background section is only for enhancement of understanding of the general background of the invention and should not be taken as an acknowledgement or any form of suggestion that this information forms the prior art already known to a person of ordinary skill in the art.
  • the purpose of the present invention is to provide a preparation method of a two-dimensional sheet material vertical orientation assembly, mainly by adjusting the spacing of adjacent scratches to prepare a large-area and highly vertical orientation structure, and at the same time, a two-dimensional assembly with a controllable degree of orientation can be obtained. body.
  • the orientation structure of the two-dimensional sheet material can be precisely designed and regulated, the electrolyte transmission performance in capacitors and batteries can be accelerated, and high-efficiency vertical heat conduction can also be performed, and energy such as solar water evaporation can be recovered. It has extremely high value in the fields of and utilization.
  • control method described in the present invention is as follows: configure the two-dimensional sheet material into a colloidal dispersion of 0.5mg/g-400mg/g, and use microneedles with a diameter of 10-1000um at 0.001-2000mm/sec.
  • colloidal dispersion several scratches with the same sliding direction are constructed at a distance x, and after drying, a highly vertically oriented two-dimensional sheet assembly is obtained; the x ⁇ L, L is the sliding of a single microneedle in the colloidal dispersion. The width of the scratch.
  • the several scratches may be a single needle sliding multiple times, or a needle row multiple scratches or a single needle row scratch.
  • x ⁇ 0.5L more preferably: x ⁇ 0.1L.
  • the two-dimensional sheet materials at least include: carbon materials (graphene oxide, graphite oxide, expanded graphite, expandable graphite, flake graphite, etc.); ceramic materials (boron nitride, etc.); metal oxides Species materials (alumina, magnesium oxide), metal nitride-based materials (aluminum nitride, etc.).
  • the colloidal dispersion of the two-dimensional sheet material is not limited to one or any of the above mixed colloidal dispersions.
  • the movement track of the needle includes vertical movement up and down and horizontal sliding arbitrarily, and may also be circumferential sliding and so on.
  • the degree of orientation of the two-dimensional sheet vertical assembly can range from no vertical orientation to large-area continuous vertical orientation.
  • Using the shear field generated by needle sliding to prepare a single highly vertically oriented structure is based on the anisotropic response of two-dimensional sheet materials to shear force, without the need for high energy consumption equipment such as electric and magnetic fields, simple operation, low energy consumption, and production efficiency High, large area, continuous processing.
  • the vertical alignment structure can be controlled with high precision and wide range, and a series of two-dimensional sheet material assemblies with different degrees of orientation can be prepared, as well as highly vertically oriented two-dimensional sheet assemblies.
  • this method has significant advantages over traditional methods such as directional freezing and controlling the orientation, and is one of the important methods for controlling the vertical orientation structure of two-dimensional sheet materials in the future.
  • Thermal interface materials with specific properties can be obtained based on the present invention.
  • Fig. 1a is a schematic diagram of microneedle sliding in Comparative Example 1
  • Fig. 1b is a scanning electron microscope image of the obtained graphene material.
  • Fig. 2a is a schematic view of the microneedle sliding in Example 2
  • Fig. 2b is a scanning electron microscope image of the obtained graphene material.
  • Fig. 3a is a schematic diagram of probe sliding in implementation 2
  • Fig. 3b is a scanning electron microscope image of the obtained graphene material.
  • FIG. 4a is a schematic diagram of probe sliding in Example 3, and FIG. 4b is a scanning electron microscope image of the obtained graphene material.
  • Figures 5a-d are graphs of changes in the orientation degree of the materials obtained in Comparative Example 1 and Examples 1-3.
  • Fig. 6 is a schematic diagram of probe sliding in Example 4-5;
  • FIG. 7 is a scanning electron microscope image of the boron nitride material obtained in Example 4.
  • FIG. 7 is a scanning electron microscope image of the boron nitride material obtained in Example 4.
  • Example 8 is a scanning electron microscope image of the graphene material obtained in Example 5.
  • the graphene oxide assembly was obtained after freeze-drying, as shown in Figure 1b.
  • the degree of orientation was measured by small-angle X-ray diffraction, and the degree of orientation was 0.62, as shown in Figure 5b.
  • the graphene oxide assembly was obtained after freeze-drying, and its cross-sectional morphology was shown in Figure 2b.
  • the degree of orientation was measured by small-angle X-ray diffraction, and the degree of orientation was 0.80, as shown in Figure 5c. After freeze-drying, a graphene oxide assembly is obtained, as shown in Figure 3b. It can be seen from the figure that the degree of vertical orientation of the material gradually increases.
  • the degree of orientation was measured by small-angle X-ray diffraction, and the degree of orientation was 0.816, as shown in Figure 5d.
  • the graphene oxide assembly was obtained after freeze-drying, as shown in Figure 4b. It can be seen from the figure that the material has a better vertical orientation structure.
  • boron nitride colloid nanosheet dispersion size 50-300um
  • boron nitride colloid nanosheet dispersion size 50-300um
  • the two-dimensional assembly is highly vertically oriented in the longitudinal direction and distributed concentrically in the horizontal direction, which has great advantages in the field of anisotropic thermal management materials.
  • the longitudinal thermal conductivity was 27W/mK
  • the lateral thermal conductivity was 2.1W/mK
  • the thermal conductivity anisotropy ratio was about 13 by LFA476 laser flasher.
  • graphite oxide nanosheets sheet diameter 50-100um, thickness 0.5um
  • graphene oxide sheet diameter 10-50um, thickness 0.9nm
  • spread the colloidal dispersion on the PET substrate use the microneedle to slide in a concentric circle trajectory (as shown in Figure 6), set the maximum sliding radius R to 1cm, and the distance between adjacent scratches to be 10um. until the scratches cover the entire circular area.
  • the sample was quickly frozen and dried to obtain a concentric graphene oxide nanosheet assembly, as shown in Figure 8 below. It can be seen from the figure that there is a vertical vertical orientation structure with a concentric distribution.
  • the graphite oxide three-dimensional assembly was immersed in a polyimide acid solution (12 wt %) for 2 hours, taken out, and dried to obtain a graphite oxide/polyimide composite three-dimensional assembly.
  • the prepared graphite oxide/polyimide composite three-dimensional assembly was placed in a tube furnace, heated under the protection of high-purity argon (99.999%), and firstly heated from room temperature to 300°C at a heating rate of 5°C/min, The temperature was kept for 1 h, and then heated to 1200° C. at a heating rate of 2° C./min, and kept for 1 h to obtain a preliminarily carbonized assembly.
  • the carbonized assembly was placed in a high-temperature furnace, heated from room temperature to 1500 °C at a heating rate of 10 °C/min, and then graphitized at a heating rate of 2 °C/min to 3000 °C. Finally, the graphitized three-dimensional cross-linking was performed.
  • the pure carbon material samples have anisotropic thermal conductivity.
  • the longitudinal thermal conductivity was 87W/mK
  • the lateral thermal conductivity was 5.1W/mK
  • the thermal conductivity anisotropy ratio was about 17 by LFA476 laser flasher.

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Abstract

提供一种二维片层材料垂直取向组装体的制备方法,包括:将二维片层材料配置成0.5 mg/g-400 mg/g的胶体分散液,利用直径在10-1000μm的微针以0.001-2000毫米/秒的速度在胶体分散液中以间距x构建相同滑动方向的若干划痕,干燥后得到高度垂直取向的二维片层组装体;其中,x≤L,L为单一微针滑动在胶体分散液中产生划痕的宽度。该方法可以对二维片层材料的取向结构进行精确设计和调控,加快电容器、电池中的电解液传输性能,也可进行高效垂直导热,在太阳能水蒸发等能源的回收与利用等领域具有极高的价值。

Description

一种二维片层材料垂直取向组装体的制备方法 技术领域
本发明属于材料领域,具体涉及一种二维片层材料大面积垂直排列组装体的调控方法及制备。
背景技术
二维片层材料具有优异的各向异性力学、电学、光学、热学等理化性能,这些特性使二维片层材料在显示屏、传感器、高性能纤维、质子传输膜、热管理等众多领域成为研究的热点和前沿。对于二维片层材料,除了其组成的化学元素差异外,其宏观二维组装体的力学、热学等性能都主要受二维片层材料基元的取向结构影响。因此,如何精确调控和设计二维片层材料的取向制备高性能二维片层材料组装体是亟待解决的问题。
目前,现有的二维片层材料取向调控方法有冰模板法、电场取向、磁场取向、化学气象沉积等,往往工艺复杂、能耗巨大难于大面积连续化制备,难以满足高精度、高效率的应用需求。具体缺点如下:
1.冰模板法是通过冰晶定向生长使二维片层材料沿着冰晶生长的方向取向,但是此方法仅适用低浓度的二维胶体,高浓度二维胶体由于内部粘滞阻力远大于冰晶生长的取向力而无法取向。
2.高频电场取向和高频磁场取向需要极大的能耗,设备昂贵,工艺复杂。
3.化学气象沉积可以原位生长二维片层墙,但是此方法严重依赖基底,生长的高度垂直的纳米墙很难从基底剥离,限制了其进一步应用。
本发明的目的是针对现有的技术不足,提供一种高精度/低成本、高效率的制备大面积高度垂直取向的二维组装体及其制备方法。公开于该背景技术部分的信息仅仅旨在增加对本发明的总体背景的理解,而不应当被视为承认或以任何形式暗示该信息构成已为本领域一般技术人员所公知的现有技术。
发明内容
本发明的目的在于提供一种二维片层材料垂直取向组装体的制备方法,主要是通过调控相邻划痕的间距制备大面积高度垂直取向结构,同时可以获得可控取向度的二维组装体。通过本发明所述方法,可以对二维片层材料的取向结构进行 精确设计和调控,可加快电容器、电池中的电解液传输性能,也可以进行高效垂直导热,在太阳能水蒸发等能源的回收与利用等领域具有极高的价值。
具体的,本发明所述的调控方法为:将二维片层材料配置成0.5mg/g-400mg/g的胶体分散液,利用直径在10-1000um的微针以0.001-2000毫米/秒的速度在胶体分散液中以间距x构建相同滑动方向的若干划痕,干燥后得到高度垂直取向的二维片层组装体;所述x≤L,L为单一微针滑动在胶体分散液中产生划痕的宽度。
当微针在二维胶体分散液中运动时,剪切力会诱导片层垂直排列,产生一定宽度的划痕(L)。当相邻划痕的距离x远大于L时(比如x≥10L),胶体分散液内部存在大量无取向区域,制备的二维片层组装体取向度很低。随着x逐渐减小,二维组装体取向度逐渐提高。当相邻划痕的距离x远小于时(x≤L),可以得到大面积、可连续化制备的高垂直取向二维片层材料组装体。
在某些实施例中,所述的若干划痕可以为单针多次滑动,也可以为排针多次划取或者排针单次划取。
为了达到更好的垂直取向度,x≤0.5L,更优选为:x≤0.1L。
本申请中,所述的二维片层材料至少包括:碳材料(氧化石墨烯、氧化石墨、膨胀石墨、可膨胀石墨、鳞片石墨等等);陶瓷类材料(氮化硼等);金属氧化物类材料(氧化铝、氧化镁)、金属氮化物类材料(氮化铝等等)。所述的二维片层材料的胶体分散液不限于一种或者以上任意几种的混合胶体分散液。
所述的针的移动轨迹包括垂直方向的上下运动和水平方向任意的滑动,也可以为圆周方向滑动等等。
所述的二维片层垂直组装体的取向度可以从无垂直取向到大面积连续垂直取向。
本发明的有益效果在于:
1.利用针滑动产生的剪切场制备单一高度垂直取向结构,是基于二维片层材料对剪切力的各向异性响应,无需电场磁场等高能耗设备,操作简单,低能耗,生产效率高,可以大面积、连续化加工。
2.对垂直取向结构的调控精度高、范围大,可以制备一系列不同取向度的二维片层材料组装体制备,也可以制备高度垂直取向的二维片层组装体。
3.团案化定制。不同的运动轨迹制备不同形状。
综上,本方法相比传统的定向冷冻调控取向等方法具有显著优势,是未来调控二维片层材料垂直取向结构的重要方法之一。基于本发明可以得到特定性能的热界面材料。
附图说明
图1a为对比例1微针滑动示意图,图1b为所得到的石墨烯材料的扫描电镜图。
图2a为实施例2微针滑动示意图,图2b为所得到的石墨烯材料的扫描电镜图。
图3a为实施2探针滑动示意图,图3b为所得到的石墨烯材料的扫描电镜图。
图4a为实施例3探针滑动示意图,图4b为所得到的石墨烯材料的扫描电镜图。
图5a~d为对比例1及实施例1-3所得材料的取向度变化图。
图6为实施例4-5探针滑动示意图;
图7为实施例4所得到的氮化硼材料的扫描电镜图。
图8为实施例5所得到的石墨烯材料的扫描电镜图。
具体实施方式
下面结合实施例对本发明进一步描述。但本发明的保护范围不仅限于此。
在本发明的描述中,需要理解的是,术语“中心”、“纵向”、“横向”、“长度”、“宽度”、“厚度”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”“内”、“顺时针”、“逆时针”等指示的方位或位置关系为方位或位置关系,仅是为了便于描述本发明和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本发明的限制。
对比例1
将10mg/ml的氧化石墨烯悬浮液(GO-1,杭州高烯科技有限公司,尺寸20~30um)刮涂在PET基底上,得到厚度为0.5mm的氧化石墨烯胶体;利用微机械臂固定一根直径100um的针,浸没并插入至胶体底部,然后在侧边位置以1000毫米/秒的速度水平移动(在偏光显微镜下测量划痕宽度为L=200um),利用机械臂控制相邻划痕间距x=1000um(x>L),多次划取使划痕布满整个胶体,如图1a,利用小角X射线衍射测试取向度,由于划痕间距过大,存在大量无序区域,取向度为0,如图5a。将其冷冻干燥后得到氧化石墨烯组装体,如图1b。
实施例1
将10mg/ml的氧化石墨烯悬浮液(GO-1,杭州高烯科技有限公司,尺寸20~30um)刮涂在PET基底上,得到厚度为0.5mm的氧化石墨烯胶体;利用微机械臂固定一根直径100um的针,浸没并插入至胶体底部,然后在侧边位置以1000毫米/秒的速度水平移动(在偏光显微镜下测量划痕宽度为L=200um),利用机械臂控制相邻划痕间距x=200um(x=L),多次划取使划痕布满整个胶体,如图2a。利用小角X射线衍射测试取向度,取向度为0.62,如图5b。将其冷冻干燥后得到氧化石墨烯组装体,其断面形貌如图2b。
实施例2
将10mg/ml的氧化石墨烯悬浮液(GO-1,杭州高烯科技有限公司,尺寸20~30um)刮涂在PET基底上,得到厚度为0.5mm的氧化石墨烯胶体;利用微机械臂固定一排等间距分布的直径100um的针,浸没并插入至胶体底部,然后在侧边位置以1000毫米/秒的速度圆周移动(在偏光显微镜下测量划痕宽度为L=200um),利用机械臂控制相邻划痕间距x=50um(x=0.25*L),多次划取使划痕布满整个胶体,如图3a。利用小角X射线衍射测试取向度,取向度为0.80,如图5c。将其冷冻干燥后得到氧化石墨烯组装体,如图3b,从图中可以看出,材料的垂直取向度逐渐增大。
实施例3
将10mg/ml的氧化石墨烯悬浮液(GO-1,杭州高烯科技有限公司,尺寸20~30um)刮涂在PET基底上,得到厚度为0.5mm的氧化石墨烯胶体;利用微机械臂固定一排等间距分布的直径100um的针,浸没并插入至胶体底部,然后在侧边位置以1000毫米/秒的速度圆周移动(在偏光显微镜下测量划痕宽度为L=200um),利用机械臂控制相邻划痕间距x=10um(x=0.1*L),多次划取使划痕布满整个胶体,如图4a。利用小角X射线衍射测试取向度,取向度为0.816,如图5d。将其冷冻干燥后得到氧化石墨烯组装体,如图4b,从图中可以看出,材料具有较优的垂直取向结构。
实施例4
将250mg/g的氮化硼胶纳米片体分散液(尺寸50~300um)刮涂在PET基底上,得到厚度为3mm的氮化硼胶体;利用微机械臂固定直径为40um的微针,将微针浸没并插入至胶体底部,然后在侧边位置以300毫米/秒的速度以同心圆轨迹滑动(在偏光显微镜下测量划痕宽度为L=100um),利用机械臂控制相邻同心圆间距x=10um(x=0.1*L),多次划取使划痕布满整个胶体,如图6。将其干燥后得到具有高度垂直取向结构的氮化硼组装体,如图7,从图7上表面SEM图可以看出水平方向氮化硼纳米片具有圆弧状曲率, 具有同心圆结构特征。
该二维组装体纵向高度垂直取向,同时在水平方向呈同心圆状分布,在各向异性热管理材料领域具有极大优势。利用LFA476激光闪射仪测试其纵向导热率为27W/mK,横向导热率为2.1W/mK,导热率各向异性比约为13。
实施例5
将180mg/g氧化石墨纳米片胶体分散液(氧化石墨:氧化石墨烯=8:2,质量比),其中氧化石墨纳米片(片径50-100um,厚度0.5um)和氧化石墨烯(片径10-50um,厚度0.9nm),将胶体分散液平铺在PET基底上,利用微针以同心圆轨迹滑动(如图6),设置最大滑动半R径1cm,相邻划痕间距为10um,直至划痕布满整个圆形区域。将样品快速冷冻,干燥后得到同心圆状氧化石墨烯纳米片组装体,如下图8,从图中可以看出具有同心圆状分布的纵向垂直取向结构。
将氧化石墨三维组装体浸渍在聚酰亚胺酸溶液(12wt%)中,2h,取出,干燥后得到氧化石墨/聚酰亚胺复合三维组装体。
将制备好的氧化石墨/聚酰亚胺复合三维组装体放置于管式炉中,在高纯氩(99.999%)保护下升温,先以5℃/min的升温速率从室温升温至300℃,保温1h,再以2℃/min的升温速率升温到1200℃,保温1h,得到初步碳化的组装体。碳化的组装体置于高温炉内,以10℃/min的升温速率从室温升到1500℃,然后以2℃/min的升温速率升到3000℃进行石墨化,最后石墨化的三维交联的纯碳材料样品具有各异性的导热系数。利用LFA476激光闪射仪测试其纵向导热率为87W/mK,横向导热率为5.1W/mK,导热率各向异性比约为17。

Claims (6)

  1. 一种二维片层材料垂直取向组装体的制备方法,其特征在于,该方法为:将二维片层材料配置成0.5mg/g-400mg/g的胶体分散液,利用直径在10-1000um的微针以0.001-2000毫米/秒的速度在胶体分散液中以间距x构建相同滑动方向的若干划痕,干燥后得到高度垂直取向的二维片层组装体;所述x≤L,L为单一微针滑动在胶体分散液中产生划痕的宽度。
  2. 根据权利要求1所述的制备方法,其特征在于:所述的若干划痕可以为单针多次滑动,也可以为排针多次划取或者排针单次划取。
  3. 根据权利要1所述的制备方法,其特征在于,x≤0.5L。
  4. 根据权利要1所述的制备方法,其特征在于:x≤0.1L。
  5. 根据权利要求1所述的制备方法,其特征在于:所述的二维片层材料包括碳材料(氧化石墨烯、氧化石墨、膨胀石墨、可膨胀石墨、鳞片石墨等等);陶瓷类材料(氮化硼等);金属氧化物类材料(氧化铝、氧化镁)、金属氮化物类材料(氮化铝等等)。所述的二维片层材料的胶体分散液不限于一种或者任意几种的混合胶体分散液。
  6. 根据权利要求1所述的制备方法,其特征在于:所述的针的移动轨迹包括垂直方向的上下运动和水平方向任意的滑动。
PCT/CN2021/094036 2021-04-09 2021-05-17 一种二维片层材料垂直取向组装体的制备方法 WO2022213449A1 (zh)

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