WO2022186513A1 - Cosmetic composition for skin care through porphyrin production control and hyaluronidase control in skin microbiome - Google Patents
Cosmetic composition for skin care through porphyrin production control and hyaluronidase control in skin microbiome Download PDFInfo
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- WO2022186513A1 WO2022186513A1 PCT/KR2022/002286 KR2022002286W WO2022186513A1 WO 2022186513 A1 WO2022186513 A1 WO 2022186513A1 KR 2022002286 W KR2022002286 W KR 2022002286W WO 2022186513 A1 WO2022186513 A1 WO 2022186513A1
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- skin
- cosmetic composition
- acne
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- 230000028327 secretion Effects 0.000 description 1
- 239000008159 sesame oil Substances 0.000 description 1
- 235000011803 sesame oil Nutrition 0.000 description 1
- 230000008591 skin barrier function Effects 0.000 description 1
- 239000007974 sodium acetate buffer Substances 0.000 description 1
- 239000008234 soft water Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 235000000346 sugar Nutrition 0.000 description 1
- 150000008163 sugars Chemical class 0.000 description 1
- 230000000475 sunscreen effect Effects 0.000 description 1
- 239000000516 sunscreening agent Substances 0.000 description 1
- 239000000375 suspending agent Substances 0.000 description 1
- 230000009885 systemic effect Effects 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 210000001519 tissue Anatomy 0.000 description 1
- 229940088594 vitamin Drugs 0.000 description 1
- 229930003231 vitamin Natural products 0.000 description 1
- 235000013343 vitamin Nutrition 0.000 description 1
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- 239000011715 vitamin B12 Substances 0.000 description 1
- 235000019163 vitamin B12 Nutrition 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Images
Classifications
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
- A61K8/67—Vitamins
- A61K8/673—Vitamin B group
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
- A61K8/60—Sugars; Derivatives thereof
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
- A61K8/67—Vitamins
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
- A61Q19/00—Preparations for care of the skin
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
- A61Q19/00—Preparations for care of the skin
- A61Q19/08—Anti-ageing preparations
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K2800/00—Properties of cosmetic compositions or active ingredients thereof or formulation aids used therein and process related aspects
- A61K2800/74—Biological properties of particular ingredients
- A61K2800/78—Enzyme modulators, e.g. Enzyme agonists
- A61K2800/782—Enzyme inhibitors; Enzyme antagonists
Definitions
- the present invention relates to a cosmetic composition that can beneficially control (rebalance) the growth and metabolites of skin flora.
- the present invention also relates to a cosmetic composition capable of inhibiting the production of harmful substances on the skin, such as inhibiting the production of porphyrin in a porphyrin-producing strain, and inhibiting the hyaluronic acid degradation ability of a strain secreting a hyaluronic acid-degrading enzyme.
- the skin contains millions of bacteria, fungi and viruses that make up the skin microbiome.
- the microbiome refers to the total number of microorganisms present in a specific environment.
- the genes of microorganisms that exist in the human body exist hundreds of times more than human genes, and they affect various functions in the human body.
- microorganisms present in the skin also play an essential role in various metabolisms such as pathogen invasion, immune system regulation, and natural product decomposition, similar to the microorganisms in the intestine, and can affect human health.
- the skin the largest organ of the human body, is colonized by beneficial microorganisms and acts as a physical barrier to prevent the entry of pathogens. When the barrier is weakened or the balance between symbionts and pathogens is disrupted, skin diseases or systemic diseases can develop. Studying the composition of the human skin site microbiota is useful for elucidating the pathogenesis of common skin diseases or association with skin conditions.
- Cutibacterium acnes serves to inhibit the invasion or growth of pathogenic bacteria by decomposing sebum into glycerol and fatty acids to keep the skin slightly acidic. It is one of the major bacterial species that reside on the skin and plays an important role in maintaining the skin barrier. Therefore, it is undesirable to apply antibiotics with antibacterial or bactericidal action to the skin that can affect the entire C. acnes bacteria.
- C. acne Cutibacterium acne
- C. acne strain which is mainly possessed by healthy people rather than the acne patient group
- C. acne strain which is mainly present in acne patients without being present in healthy skin
- C. acne has different characteristics of secreting harmful molecules such as protease, lipase, hemolysin and porphyrin depending on the strain, and through these, harmful reactions of the skin such as decomposing host tissues or inducing inflammatory reactions can cause
- porphyrin levels are observed to be higher in acne skin compared to healthy skin, and higher in acne lesions compared to non-lesion areas of acne patients.
- the strain of C. acnes related to acne produces a higher concentration of porphyrin.
- porphyrin can be produced in the case of S. aureus, which is a problem in atopic dermatitis or wound infection.
- Porphyrin not only induces oxidative stress in the skin and promotes the expression of inflammatory cytokines in keratinocytes, but also induces a carbonylation reaction, a type of protein oxidation, which can darken the skin tone and make the skin look unhealthy. Therefore, it is used as a measurement index in various types of skin measuring devices and needs to be controlled as one of the major harmful factors of skin microorganisms.
- the problem to be solved by the present invention is to inhibit the skin flora (for example, a specific C. acne strain) that has a relatively bad effect on the skin, such as causing acne, and has no significant effect on the skin (
- it is to provide a cosmetic composition capable of rebalancing the skin flora by having relatively little influence on the growth of a specific C. acnes strain).
- Another object to be solved by the present invention is to provide a skin improvement composition that controls oxidative stress and inflammation of the skin by inhibiting the production of porphyrin secreted by microorganisms present in the skin.
- Another object of the present invention is to provide a skin improvement composition capable of preventing hyaluronic acid decomposition by inhibiting hyaluronic acid degrading enzyme secreted by microorganisms.
- the present disclosure provides a skin microbiome comprising at least one selected from the group consisting of thiamine or a cosmetically acceptable salt thereof and saccharide isomerate as an active ingredient.
- a cosmetic composition for conditioning is provided.
- Another aspect of the present disclosure includes thiamine or a cosmetically acceptable salt thereof and any one or more selected from the group consisting of saccharide isomerate as an active ingredient, for controlling Cutibacterium acne in the skin microbiome A cosmetic composition is provided.
- the cosmetic composition according to the present invention may be used for skin improvement through control of porphyrin production and/or control of hyaluronic acid degrading enzymes in skin flora.
- a skin improvement composition that controls oxidative stress and inflammation of the skin by inhibiting the production of porphyrin secreted by microorganisms present in the skin to control harmful skin factors.
- Another aspect of the present disclosure provides a skin improvement composition capable of preventing hyaluronic acid decomposition by inhibiting hyaluronic acid degrading enzyme secreted by microorganisms.
- the cosmetic composition(s) according to the present disclosure includes thiamine or a cosmetically acceptable salt thereof as an active ingredient.
- the present inventors tested various substances such as amino acids, amino acid derivatives, extracts, saccharides, vitamins, and fragrance ingredients, and completed the present invention by confirming that only the compounds of the present invention exhibit the desired effect in the present invention.
- RT4 and RT5 based on the ribotype are known as acne-inducing types
- RT6 is known to be abundant in healthy skin.
- Ribotype RT4 e.g., HL053PA1 strain
- RT6 e.g., HL110PA3 strain
- cause acne has exist doesn't exist incubation rate Slow (6 days) Medium (4 days) porphyrin production High (500nM) Low (about 30 nM) HA resolution lowness very high
- the HL053PA1 strain and the like produce excessive amounts of porphyrin, which can cause inflammation and oxidative stress, which can cause the secretion of inflammatory cytokines in the skin to cause inflammation such as acne. Inhibits the growth of the induced type (eg, RT4 or RT5, type IA based on recA type) and has relatively no effect on the growth of the acne-inducing type (eg, RT6), so the dominant species microbiome ecology can be maintained.
- the induced type eg, RT4 or RT5, type IA based on recA type
- the acne-inducing type eg, RT6
- the cosmetic composition of the present disclosure inhibits the porphyrin production of the skin flora, particularly the porphyrin production of the acne-causing type C. acnes strain or the porphyrin production of the strain such as S. aureus, thereby inhibiting the occurrence of acne, or the skin dermis is dense. It is very helpful in increasing the skin tone, improving the symptoms of dry skin, or improving skin tone.
- strains belonging to RT6 (or recA type standard type II) produce relatively few harmful factors such as porphyrin, but can produce an excess of hyaluronic acid degrading enzyme. It is also known that various bacteria such as S. aureus can produce hyaluronic acid degrading enzymes.
- the cosmetic composition of the present disclosure is a cosmetic composition for improving skin elasticity through inhibition of hyaluronic acid decomposition of skin flora, in particular, inhibition of hyaluronic acid decomposition by non-acne type C. acne strain or S. aureus. may have beneficial effects.
- This inhibition of hyaluronic acid decomposition also improves the density of the dermis, thereby showing good effects in moisturizing and preventing aging.
- Cosmetically acceptable salts in the present invention include salts of the active compounds prepared with relatively non-toxic acids. Acid addition salts may be obtained by contacting the neutral form of such compounds with a sufficient amount of the desired acid, neat or with a suitable inert solvent.
- cosmetically acceptable acid addition salts are acetic acid, propionic acid, isobutyric acid, oxalic acid, maleic, malonic, benzoic, succinic, suberic, fumaric ( fumaric), mandelic, phthalic, benzenesulfonic, p-tolylsulfonic, citric acid, tartaric acid, methanesulfonic, and the like.
- salts derived from non-toxic organic acids hydrogen chloride, hydrogen bromide, nitric acid, carbonic acid, monohydrogencarbonic, phosphoric, monohydrogenphosphate, dihydrogenphosphoric acid, sulfuric acid, monohydrogensulfuric acid, hydrogen iodide or phosphorous acid ( phosphorous acid) and its analogs.
- salts of amino acids such as arginate and analogues thereof and analogues of organic acids such as glucuronic or galactunoric acids and analogues thereof.
- Other examples of salts can be found in literature known in the art.
- the total content of the active ingredients is preferably 0.00001 to 10% by weight based on the total weight of the cosmetic composition.
- the active ingredient of the present invention may exist in unsolvated as well as solvated forms, including hydrates, ethanolates, and the like.
- the active ingredient of the present invention may exist in crystalline or amorphous form, and all such physical forms are included within the scope of the present invention.
- the cosmetic composition according to the present invention includes solutions, external ointments, creams, foams, nourishing lotions, softening lotions, packs, soft water, emulsions, makeup bases, essences, soaps, liquid detergents, bathing agents, sunscreen creams, sun oils, suspensions, Emulsions, pastes, gels, lotions, powders, soaps, surfactant-containing cleansing, oils, powder foundations, emulsion foundations, wax foundations, patches and sprays may be prepared in a formulation selected from the group consisting of, but not limited to it is not
- the cosmetic composition of the present invention may further include one or more cosmetically acceptable carriers to be formulated in general skin cosmetics, and conventional ingredients include, for example, oil, water, surfactant, humectant, lower alcohol, A thickener, a chelating agent, a colorant, a preservative, a fragrance, etc. may be appropriately mixed, but the present invention is not limited thereto.
- the cosmetically acceptable carrier included in the cosmetic composition of the present invention varies depending on the formulation.
- the formulation of the present invention is an ointment, paste, cream or gel, animal oil, vegetable oil, wax, paraffin, starch, tracanth, cellulose derivative, polyethylene glycol, silicone, bentonite, silica, talc, zinc oxide or Mixtures thereof may be used.
- lactose, talc, silica, aluminum hydroxide, calcium silicate, polyamide powder, or a mixture thereof may be used as a carrier component, and in particular, in the case of a spray, additional chloro propellants such as fluorohydrocarbons, propane/butane or dimethyl ether.
- a solvent, solubilizer, or emulsifier is used as a carrier component, such as water, ethanol, isopropanol, ethyl carbonate, ethyl acetate, benzyl benzoate, propylene glycol, 1,3 -Butylglycol oil, in particular cottonseed oil, peanut oil, corn germ oil, olive oil, castor oil and sesame oil, glycerol fatty esters, fatty acid esters of polyethylene glycol or sorbitan.
- the formulation of the present invention is a suspension
- a liquid diluent such as water, ethanol or propylene glycol
- a suspending agent such as ethoxylated isostearyl alcohol, polyoxyethylene sorbitol esters and polyoxyethylene sorbitan esters; Crystalline cellulose, aluminum metahydroxide, bentonite, agar, or tracanth may be used.
- the formulation of the present invention is a soap, alkali metal salts of fatty acids, fatty acid hemiester salts, fatty acid protein hydrolysates, isethionate, lanolin derivatives, aliphatic alcohols, vegetable oils, glycerol, sugars, etc. may be used as carrier components.
- alkali metal salts of fatty acids fatty acid hemiester salts, fatty acid protein hydrolysates, isethionate, lanolin derivatives, aliphatic alcohols, vegetable oils, glycerol, sugars, etc.
- composition for cosmetics, food, or personal care according to the present invention contains the ingredients according to the present invention within the content limit allowed by the relevant laws and regulations of each country.
- the composition provided in the present disclosure has an effect of inhibiting the growth of major flora of the skin, for example, the growth of C. acne type frequently present in acne patients among C. acnes and the production of harmful factors (porphyrin). indicates.
- it can exhibit the effect of inhibiting the activity of hyaluronidase produced by this strain without affecting the growth of C. acne type, which is mainly present in non-inflammatory skin.
- it may exhibit an effect of inhibiting porphyrin production and/or hyaluronidase activity generated by bacteria present in the skin, such as S. aureus, in addition to the C. ance strain.
- Figure 2 is a result of evaluating the effect of the thiamine salt on a non-pathogenic strain of Cutibacterium acnes.
- Figure 3 is a result of evaluating the effect of the thiamine salt on the production of porphyrin of the pathogenic and non-pathogenic strains of Cutibacterium acnes.
- a is a result of evaluating the effect on the strain growth of HL053PA1, a C. acnes strain associated with acne
- b is a result of evaluating the effect on the growth of a strain of HL110PA3, a healthy skin-related C. acnes strain
- c is the result of evaluating the effect on porphyrin production of HL053PA1, a C. acnes strain associated with acne skin
- d is the result of evaluating the effect on the degradation rate of hyaluronic acid of HL110PA3, a healthy skin-related C. acne strain.
- the HL053PA1 strain which is a Cutibacterium acne type, which is mainly present in acne patients, was cultured and activated in BHI broth, and then re-inoculated at the same turbidity. At this time, thiamine HCl was treated at a concentration of 1 w/v% and absorbance was measured at 595 nm after incubation for 7 days to confirm the effect on strain growth. The results are shown in FIG. 1 .
- the HL110PA3 strain which is a C. ance type mainly present only in normal skin, was cultured and activated in BHI liquid medium, and then re-inoculated at the same turbidity. At this time, thiamine HCl was treated at a concentration of 1%, and absorbance was measured at 595 nm after 7 days of incubation to confirm the effect on strain growth. The results are shown in FIG. 2 .
- C. acnes HL053PA1 and HL110PA3 strains were respectively cultured and activated in BHI broth, and then re-inoculated at the same turbidity.
- thiamine HCl was treated at a concentration of 1%, and the strain culture was recovered after 7 days of incubation.
- 400 ⁇ l of the bacterial culture was extracted by adding ethyl acetate and acetic acid (4: 1, vol/vol). The extract was centrifuged to recover the upper layer containing porphyrin through layer separation.
- the recovered supernatant was dissolved in 1.5 M HCl, and the layers were separated by centrifugation to recover the lower layer.
- the recovered soluble phase was measured for fluorescence at 405 nm/620 nm. The results are shown in FIG. 3 .
- the acne-associated C. acnes strain produced a greater amount of porphyrin than the C. acnes strain present in normal skin.
- Thiamine HCl treatment significantly reduced the amount of porphyrin present in the culture of acne-associated strain HL053PA1.
- S. aureus strains were re-inoculated at 1/100 concentration activated by culturing in BHI broth.
- the strain culture was recovered after treatment with thiamine HCl at a concentration of 1 w/v% and culturing for 24 hours.
- 400 ⁇ l of the bacterial culture was extracted by adding ethyl acetate and acetic acid (4: 1, vol/vol). The extract was centrifuged to recover the upper layer containing porphyrin through layer separation.
- the recovered supernatant was dissolved in 1.5 M HCl, and the layers were separated by centrifugation to recover the lower layer.
- the recovered soluble phase was measured for fluorescence at 405 nm/620 nm. The results are shown in FIG. 4 .
- the HL110PA3 strain was activated by culturing in BHI broth and then re-inoculated to the same turbidity. At this time, thiamine HCl was treated at a concentration of 1%, and the culture medium was recovered after 7 days of incubation.
- the hyaluronic acid and the culture medium were mixed and reacted at 37° C. for 20 minutes. After the reaction was completed, 1% BSA sodium acetate buffer was added to aggregate the remaining hyaluronic acid and BSA, and the degree of decomposition of hyaluronic acid was confirmed by taking absorbance at 540 nm. The results are shown in FIG. 5 .
- HL110PA3 a non-pathogenic strain of C. acnes, is generally classified as a healthy skin type C. acne because it is isolated from healthy skin without inflammatory lesions. can do. While about 85% of hyaluronic acid was decomposed for 20 minutes when treated with untreated culture medium, about 60% of hyaluronic acid was decomposed in the culture medium of the experimental group treated with Thiamine HCl, indicating that it can inhibit the degradation of hyaluronic acid by 30% compared to the control group. Confirmed.
- S. aureus strains were re-inoculated at 1/100 concentration activated by culturing in BHI broth. After treatment with thiamine HCl at a concentration of 1% and cultured for 24 hours, the culture medium was recovered. To measure the activity of the hyaluronic acid degrading enzyme secreted by S. aureus, the hyaluronic acid and the culture medium were mixed and reacted at 37° C. for 90 minutes. In order to measure the hyaluronic acid remaining without degradation, the remaining hyaluronic acid was quantified using a hyaluronan ELISA kit.
Abstract
The present disclosure provides a cosmetic composition which is configured to inhibit the growth of a skin microbiome harmful to skin health and to reduce the production of the detrimental factor porphyrin while having no influences on skin microbiomes not harmful to skin health, thus healthily rebalancing the skin microbiome. The present disclosure also provides a cosmetic composition capable of suppressing porphyrin production in strains that produce porphyrin. The present disclosure provides a skin care composition which is helpful for moisturizing the skin and for preventing skin aging by inhibiting the activity of hyaluronidase secreted from a skin microbiome to suppress the degradation of hyaluronic acid.
Description
본 출원은 2021년 3월 3일에 출원된 한국출원 제10-2021-0028329호에 기초한 우선권을 주장하며, 해당 출원의 명세서 및 도면에 개시된 모든 내용은 본 출원에 원용된다.This application claims priority based on Korean Application No. 10-2021-0028329 filed on March 3, 2021, and all contents disclosed in the specification and drawings of the application are incorporated herein by reference.
본 발명은 피부 상재균의 성장 및 대사체를 유익하게 조절(리밸런싱)할 수 있는 화장료 조성물에 관한 것이다. 본 발명은 또한, 포피린 생성 균주의 포피린 생성 억제 등 피부 유해물질의 생성을 억제하고, 히알루론산 분해 효소를 분비하는 균주의 히알루론산 분해능을 억제할 수 있는 화장료 조성물에 관한 것이다.The present invention relates to a cosmetic composition that can beneficially control (rebalance) the growth and metabolites of skin flora. The present invention also relates to a cosmetic composition capable of inhibiting the production of harmful substances on the skin, such as inhibiting the production of porphyrin in a porphyrin-producing strain, and inhibiting the hyaluronic acid degradation ability of a strain secreting a hyaluronic acid-degrading enzyme.
피부에는 skin microbiome을 구성하는 수백만 개의 박테리아, 곰팡이 및 바이러스가 있다. 마이크로바이옴(Microbiome)이란 특정 환경에 존재하는 미생물들의 총합을 말한다. 인체 내 존재하는 미생물의 유전자는 인간 유전자의 수백 배로 존재하며 인체 내 다양한 기능에 영향을 미치게 된다. The skin contains millions of bacteria, fungi and viruses that make up the skin microbiome. The microbiome refers to the total number of microorganisms present in a specific environment. The genes of microorganisms that exist in the human body exist hundreds of times more than human genes, and they affect various functions in the human body.
인간 미생물 총의 대부분은 장내에 존재한다고 알려져 있으나, 피부에도 다양한 미생물 들이 존재한다. 피부에 존재하는 미생물 또한 장내의 미생물과 유사하게 병원균 침입, 면역계 조절, 천연물 분해 등의 다양한 대사에 필수적인 역할을 하며 사람의 건강 상태에 영향을 미칠 수 있다고 알려져 있다. 인체의 가장 큰 기관인 피부는 유익한 미생물에 의해 식민지화되며 병원균의 침입을 막기 위한 물리적 장벽으로 작용한다. 장벽이 약화되거나 공생체와 병원체 사이의 균형이 깨지는 경우, 피부 질환 또는 전신 질환이 발생할 수 있다. 인간의 피부 부위 미생물 총의 조성을 연구하는 것은 일반적인 피부 질환의 병인 또는 피부 상태와의 연관성을 밝히는 데 유용하다. Most of the human microbiota is known to exist in the intestine, but various microorganisms are also present in the skin. It is known that microorganisms present in the skin also play an essential role in various metabolisms such as pathogen invasion, immune system regulation, and natural product decomposition, similar to the microorganisms in the intestine, and can affect human health. The skin, the largest organ of the human body, is colonized by beneficial microorganisms and acts as a physical barrier to prevent the entry of pathogens. When the barrier is weakened or the balance between symbionts and pathogens is disrupted, skin diseases or systemic diseases can develop. Studying the composition of the human skin site microbiota is useful for elucidating the pathogenesis of common skin diseases or association with skin conditions.
피부의 모든 고유 미생물 군집을 제거 할 수 있는 강력한 살균 작용을 갖는 살균제 또는 항생제를 사용하는 경우, 피부에 유익한 영향을 미치는 박테리아도 제거 될 위험이 있으며, 해당 성분에 대한 내성 박테리아의 출현 및 증식이 촉진 될 수 있다. 또한 살균제 또는 항생제의 사용이 중단 되었을 때, 기존의 피부 균총 균형이 깨졌기 때문에 피부에 바람직하지 않은 박테리아가 우선적으로 성장하여 기회 감염 등을 유발할 위험이 있다. 광범위 항생제 대신 선택적으로 균총을 조절할 수 있는 물질이 사용되는 경우, 피부 고유 미생물 군집에 대한 광범위한 부작용을 피하면서 피부에 유익한 효과를 갖는 박테리아의 비율이 향상 될 수 있다.If you use a fungicide or antibiotic with a strong bactericidal action that can eliminate all intrinsic microbial communities on the skin, you risk eliminating bacteria that have a beneficial effect on the skin as well, promoting the emergence and proliferation of bacteria resistant to that component. can be In addition, when the use of disinfectants or antibiotics is stopped, there is a risk of causing opportunistic infections and the like by preferentially growing undesirable bacteria on the skin because the existing skin flora balance is disrupted. If a substance that can selectively control the flora is used instead of broad-spectrum antibiotics, the proportion of bacteria having a beneficial effect on the skin can be improved while avoiding a wide range of side effects on the skin's intrinsic microbial community.
즉, 피부에 존재하는 유익균과 유해균 사이의 균형의 붕괴는 기회 감염을 유발할 수 있다. 따라서 미생물 간의 균형을 유지하는 것은 건강한 피부상태를 유지하기 위해 중요한 부분이다.In other words, disruption of the balance between beneficial and harmful bacteria present on the skin can cause opportunistic infections. Therefore, maintaining the balance between microorganisms is an important part to maintain a healthy skin condition.
큐티박테리움 아크네(Cutibacterium acne, C. acne)는 피부를 약산성으로 유지하기 위해 피지를 글리세롤과 지방산으로 분해하여 병원성 박테리아의 침입 또는 성장을 억제하는 역할을 한다. 피부에 상재하고 있는 주요 균종 중 하나이고 피부 장벽 유지를 위한 중요한 역할을 수행하고 있다. 따라서, 전체 C. acne 박테리아에 영향을 미칠 수 있는 항균 또는 살균 작용을 갖는 항생제를 피부에 적용하는 것은 바람직하지 않다.Cutibacterium acnes (C. acne) serves to inhibit the invasion or growth of pathogenic bacteria by decomposing sebum into glycerol and fatty acids to keep the skin slightly acidic. It is one of the major bacterial species that reside on the skin and plays an important role in maintaining the skin barrier. Therefore, it is undesirable to apply antibiotics with antibacterial or bactericidal action to the skin that can affect the entire C. acnes bacteria.
최근, 여드름 박테리아의 계통 발생학적 분석이 수행되어 왔으며, 여드름 환자군보다는 건강한 사람이 주로 갖고 있는 C. acne (Cutibacterium acne) 균주 및 건강한 피부에는 존재하지 않으면서 여드름 환자에서 주로 존재하는 C. acne 균주가 있음이 명백해졌다. 또한 C. acne는 계통에 따라 프로테아제, 리파제, 헤모리신 및 포피린(porphyrin)과 같은 유해 분자를 분비하는 특성이 각기 다르고 이러한 이를 통해 숙주 조직을 분해하거나 염증반응을 유발하는 등 피부의 유해 반응을 유발할 수 있다. Recently, a phylogenetic analysis of acne bacteria has been performed, and the C. acne (Cutibacterium acne) strain, which is mainly possessed by healthy people rather than the acne patient group, and the C. acne strain, which is mainly present in acne patients without being present in healthy skin, has been identified. it became clear that In addition, C. acne has different characteristics of secreting harmful molecules such as protease, lipase, hemolysin and porphyrin depending on the strain, and through these, harmful reactions of the skin such as decomposing host tissues or inducing inflammatory reactions can cause
일 예로 포피린 수치는 건강한 피부와 비교했을 때 여드름 피부에서 높게 관찰되며, 여드름 환자의 비병변 부위와 비교하여 여드름 병변에서 더 높게 관찰된다. 특히 여드름과 연관된 계통의 C. acne 균주가 더 높은 농도의 포피린을 생성한다고 알려져 있다. 또한 아토피 피부염이나 상처 감염 등에서 문제가 되는 S. aureus의 경우에도 포피린을 생성할 수 있다고 알려져 있다.For example, porphyrin levels are observed to be higher in acne skin compared to healthy skin, and higher in acne lesions compared to non-lesion areas of acne patients. In particular, it is known that the strain of C. acnes related to acne produces a higher concentration of porphyrin. It is also known that porphyrin can be produced in the case of S. aureus, which is a problem in atopic dermatitis or wound infection.
포피린은 피부에서 산화 스트레스를 유발하고 각질형성세포의 염증성 사이토카인의 발현을 촉진할 뿐만 아니라 단백질 산화의 일종인 카보닐레이션 반응을 유발하여 피부톤을 어둡게 만들어 건강하지 않은 피부로 보이게 할 수 있다. 따라서 다양한 종류의 피부 측정기기에서 하나의 측정 지표로서 사용되고 있으며 피부 미생물의 주요한 유해인자 중 하나로서 조절될 필요가 있다.Porphyrin not only induces oxidative stress in the skin and promotes the expression of inflammatory cytokines in keratinocytes, but also induces a carbonylation reaction, a type of protein oxidation, which can darken the skin tone and make the skin look unhealthy. Therefore, it is used as a measurement index in various types of skin measuring devices and needs to be controlled as one of the major harmful factors of skin microorganisms.
따라서 본 발명이 해결하고자 하는 과제는 여드름을 야기하는 등 피부에 상대적으로 나쁜 영향을 미치는 피부 상재균(예를 들어, 특정 C. acne 균주)는 억제하고, 피부에 큰 영향이 없는 피부 상재균(예를 들어, 특정 C. acne 균주)의 생장에는 상대적으로 영향을 덜 미쳐, 피부 상재균 균총을 리밸런싱하는 것이 가능한 화장료 조성물을 제공하는 것이다.Therefore, the problem to be solved by the present invention is to inhibit the skin flora (for example, a specific C. acne strain) that has a relatively bad effect on the skin, such as causing acne, and has no significant effect on the skin ( For example, it is to provide a cosmetic composition capable of rebalancing the skin flora by having relatively little influence on the growth of a specific C. acnes strain).
본 발명이 해결하고자 하는 다른 과제는 피부에 존재하는 미생물이 분비하는 포피린 생성을 억제하여 피부의 산화 스트레스 및 염증 등을 유발하는 피부 유해 인자를 조절하는 피부개선 조성물을 제공하는 것이다.Another object to be solved by the present invention is to provide a skin improvement composition that controls oxidative stress and inflammation of the skin by inhibiting the production of porphyrin secreted by microorganisms present in the skin.
또한 미생물에 의해 분비되는 히알루론산 분해 효소를 저해함으로써 히알루론산 분해를 막아줄 수 있는 피부개선 조성물을 제공하는 것이다.Another object of the present invention is to provide a skin improvement composition capable of preventing hyaluronic acid decomposition by inhibiting hyaluronic acid degrading enzyme secreted by microorganisms.
상기 과제를 해결하기 위하여, 본 개시는 티아민 또는 이의 화장학적으로 허용 가능한 염 및 사카라이드 아이소머레이트(saccharide isomerate)으로 이루어진 군으로부터 선택된 어느 하나 이상을 유효 성분으로 포함하는, 피부 미생물군집(microbiome) 조정용 화장료 조성물을 제공한다. In order to solve the above problems, the present disclosure provides a skin microbiome comprising at least one selected from the group consisting of thiamine or a cosmetically acceptable salt thereof and saccharide isomerate as an active ingredient. A cosmetic composition for conditioning is provided.
본 개시의 다른 양태는 티아민 또는 이의 화장학적으로 허용 가능한 염 및 사카라이드 아이소머레이트(saccharide isomerate)으로 이루어진 군으로부터 선택된 어느 하나 이상을 유효 성분으로 포함하는, 피부 미생물군집(microbiome) 내 Cutibacterium acne 조정용 화장료 조성물을 제공한다. Another aspect of the present disclosure includes thiamine or a cosmetically acceptable salt thereof and any one or more selected from the group consisting of saccharide isomerate as an active ingredient, for controlling Cutibacterium acne in the skin microbiome A cosmetic composition is provided.
본 개시의 일 양태에 따르면, 본 발명에 따른 화장료 조성물은 피부 상재균에서 포피린 생성 조절 및/또는 히알루론산 분해 효소 조절을 통한 피부 개선을 위한 용도로 사용될 수 있다. 따라서, 본 개시의 일 양태는 피부에 존재하는 미생물이 분비하는 포피린 생성을 억제하여 피부의 산화 스트레스 및 염증 등을 유발하는 피부 유해 인자를 조절하는 피부개선 조성물을 제공한다. 본 개시의 다른 양태는 미생물에 의해 분비되는 히알루론산 분해 효소를 저해함으로써 히알루론산 분해를 막아줄 수 있는 피부개선 조성물을 제공한다. According to one aspect of the present disclosure, the cosmetic composition according to the present invention may be used for skin improvement through control of porphyrin production and/or control of hyaluronic acid degrading enzymes in skin flora. Accordingly, one aspect of the present disclosure provides a skin improvement composition that controls oxidative stress and inflammation of the skin by inhibiting the production of porphyrin secreted by microorganisms present in the skin to control harmful skin factors. Another aspect of the present disclosure provides a skin improvement composition capable of preventing hyaluronic acid decomposition by inhibiting hyaluronic acid degrading enzyme secreted by microorganisms.
바람직하게, 본 개시에 따른 상기 화장료 조성물(들)은 유효 성분으로 티아민 또는 이의 화장학적으로 허용 가능한 염을 포함한다.Preferably, the cosmetic composition(s) according to the present disclosure includes thiamine or a cosmetically acceptable salt thereof as an active ingredient.
본 발명자들은 아미노산, 아미노산 유도체, 추출물, 당류, 비타민, 향료성분 등 다양한 물질들을 시험하였으며, 본 발명 화합물들만이 본 발명에서 목적하는 효과를 나타냄을 확인하여 본 발명을 완성하였다. The present inventors tested various substances such as amino acids, amino acid derivatives, extracts, saccharides, vitamins, and fragrance ingredients, and completed the present invention by confirming that only the compounds of the present invention exhibit the desired effect in the present invention.
Fitz-Gibbon, S. etc., (2013). Propionibacterium acnes Strain Populations in the Human Skin Microbiome Associated with Acne. Journal of Investigative Dermatology, 133(9), 2152-2160 등에 따를 때, 피부 상재균 중 하나인 C. acne는 다음과 같이 나눌 수 있으며, 이중 ribotype을 기준으로 RT4 및 RT5는 여드름 유발 타입으로 알려져 있고, RT6는 건강한 피부에 많이 상재하는 것으로 알려져 있다.Fitz-Gibbon, S. etc., (2013). Propionibacterium acnes Strain Populations in the Human Skin Microbiome Associated with Acne. According to Journal of Investigative Dermatology, 133(9), 2152-2160, one of the skin flora, C. acnes, can be divided as follows, and RT4 and RT5 based on the ribotype are known as acne-inducing types, RT6 is known to be abundant in healthy skin.
RibotypeRibotype |
RT4 (예를 들어, HL053PA1 균주)RT4 (e.g., HL053PA1 strain) |
RT6 (예를 들어, HL110PA3 균주)RT6 (e.g., HL110PA3 strain) |
여드름 유발cause acne | 있음has exist | 없음doesn't exist |
배양 속도incubation rate | 느림 (6일)Slow (6 days) | 중간 (4일)Medium (4 days) |
포피린 생성porphyrin production | High (500nM)High (500nM) | Low (약 30 nM)Low (about 30 nM) |
HA 분해능HA resolution | 낮음lowness | 매우 높음very high |
HL053PA1 균주 등은 염증 및 산화 스트레스를 유발할 수 있는 porphyrin을 과량 생산하며 이 때문에 피부에서 염증성 사이토카인의 분비를 유발하여 여드름 등 염증을 일으킬 수 있다.본 개시의 화장료 조성물은 C. acne 균주들 중 여드름 유발 타입 (예를 들어, RT4 또는 RT5, recA type 기준으로는 type IA)의 생장은 억제하고, 여드름 비유발 타입(예를 들어, RT6)의 생장에는 상대적으로 영향을 미치지 않아 우점종의 마이크로바이옴 생태를 유지할 수 있다. The HL053PA1 strain and the like produce excessive amounts of porphyrin, which can cause inflammation and oxidative stress, which can cause the secretion of inflammatory cytokines in the skin to cause inflammation such as acne. Inhibits the growth of the induced type (eg, RT4 or RT5, type IA based on recA type) and has relatively no effect on the growth of the acne-inducing type (eg, RT6), so the dominant species microbiome ecology can be maintained.
뿐만 아니라, 본 개시의 화장료 조성물은 피부 상재균의 포피린 생성, 특히 여드름 유발 타입 C. acne 균주의 포피린 생성 또는 S. aureus와 같은 균주의 포피린 생성을 억제함으로써, 여드름 유발은 억제하거나, 피부 진피치밀도를 높이거나, 피부 건조 증상을 개선하거나, 또는 피부톤을 개선하는데 큰 도움이 된다.In addition, the cosmetic composition of the present disclosure inhibits the porphyrin production of the skin flora, particularly the porphyrin production of the acne-causing type C. acnes strain or the porphyrin production of the strain such as S. aureus, thereby inhibiting the occurrence of acne, or the skin dermis is dense. It is very helpful in increasing the skin tone, improving the symptoms of dry skin, or improving skin tone.
최근 연구에 따르면 RT6 (또는 recA type 기준 type II)에 속하는 균주들은 포피린 등의 다양한 유해인자를 상대적으로 적게 생성하지만, 히알루론산 분해효소를 과량 생성할 수 있음이 알려졌다. 또한 S. aureus 등 다양한 박테리아가 히알루론산 분해 효소를 생성할 수 있음이 알려져 있다. According to a recent study, it was known that strains belonging to RT6 (or recA type standard type II) produce relatively few harmful factors such as porphyrin, but can produce an excess of hyaluronic acid degrading enzyme. It is also known that various bacteria such as S. aureus can produce hyaluronic acid degrading enzymes.
이러한 측면에서, 본 개시의 화장료 조성물은 피부상재균의 히알루론산 분해 억제, 특히 여드름 비유발 타입 C. acne 균주 또는 S. aureus에 의한 히알루론산 분해 억제를 통해 피부 탄력을 개선하는 등 화장료 조성물로 매우 유익한 효과를 나타낼 수 있다. 이러한 히알루론산 분해능 억제는 또한 진피치밀도를 개선하여 보습, 노화예방 등에도 좋은 효과를 나타낸다. In this aspect, the cosmetic composition of the present disclosure is a cosmetic composition for improving skin elasticity through inhibition of hyaluronic acid decomposition of skin flora, in particular, inhibition of hyaluronic acid decomposition by non-acne type C. acne strain or S. aureus. may have beneficial effects. This inhibition of hyaluronic acid decomposition also improves the density of the dermis, thereby showing good effects in moisturizing and preventing aging.
본 발명에 있어 "화장학적으로 허용 가능한 염"은 비교적 비독성 산으로 제조된 활성 화합물의 염들을 포함한다. 산성 부가 염들은 충분한 양의 원하는 산, 순수한 또는 적당한 비활성(inert) 용매로 그러한 화합물들의 중성 형태를 접촉하여 얻을 수 있다. 화장학적으로 허용 가능한 산성 부가 염의 예들은 초산, 프로피온산, 이소부틸산, 옥살릭산(oxalic), 마레익(maleic), 말로닉(malonic), 안식향성, 숙신산, 수버릭(suberic), 푸마릭(fumaric), 만데릭(mandelic), 프탈릭(phthalic), 벤젠설포닉(benzenesulfonic), p-토릴설포닉(tolylsulfonic), 구연산, 주석산, 메탄솔포닉(methanesulfonic), 및 그 유사체를 포함하는 상대적으로 비독성 유기산에서 유래한 염들 뿐만 아니라, 염화수소, 브롬화 수소, 질산, 탄산, 일수소탄산(monohydrogencarbonic), 인산(phosphoric), 일수소인산, 이수소인산, 황산, 일수소황산, 요오드화수소 또는 아인산(phosphorous acid) 및 그 유사체를 포함한다. 또한 알긴네이트(arginate)와 그 유사체와 같은 아미노산의 염 및 글루쿠로닉(glucuronic) 또는 갈락투노릭(galactunoric) 산들과 그 유사체와 같은 유기산의 유사체를 포함한다. 염들의 다른 예들은 본 발명이 속한 분야에서 공지된 문헌들로부터 파악할 수 있다. "Cosmetically acceptable salts" in the present invention include salts of the active compounds prepared with relatively non-toxic acids. Acid addition salts may be obtained by contacting the neutral form of such compounds with a sufficient amount of the desired acid, neat or with a suitable inert solvent. Examples of cosmetically acceptable acid addition salts are acetic acid, propionic acid, isobutyric acid, oxalic acid, maleic, malonic, benzoic, succinic, suberic, fumaric ( fumaric), mandelic, phthalic, benzenesulfonic, p-tolylsulfonic, citric acid, tartaric acid, methanesulfonic, and the like. As well as salts derived from non-toxic organic acids, hydrogen chloride, hydrogen bromide, nitric acid, carbonic acid, monohydrogencarbonic, phosphoric, monohydrogenphosphate, dihydrogenphosphoric acid, sulfuric acid, monohydrogensulfuric acid, hydrogen iodide or phosphorous acid ( phosphorous acid) and its analogs. Also included are salts of amino acids such as arginate and analogues thereof and analogues of organic acids such as glucuronic or galactunoric acids and analogues thereof. Other examples of salts can be found in literature known in the art.
본 발명에 따른 화장료 조성물에 있어, 상기 유효 성분들의 총 함량은 화장료 조성물 전체 중량 대비 0.00001 내지 10 중량%인 것이 바람직하다.In the cosmetic composition according to the present invention, the total content of the active ingredients is preferably 0.00001 to 10% by weight based on the total weight of the cosmetic composition.
본 발명의 유효 성분은 수화물, 에탄올화물 등의 형태를 포함하는 용매화된 형태뿐만 아니라 비-용매화된(unsolvated) 형태로 존재할 수도 있다. 본 발명의 유효 성분은 결정형 또는 무정형 형태로 존재할 수 있으며, 이러한 모든 물리적 형태는 본 발명의 범위에 포함된다.The active ingredient of the present invention may exist in unsolvated as well as solvated forms, including hydrates, ethanolates, and the like. The active ingredient of the present invention may exist in crystalline or amorphous form, and all such physical forms are included within the scope of the present invention.
본 발명에 따른 화장료 조성물은 용액, 외용연고, 크림, 폼, 영양화장수, 유연화장수, 팩, 유연수, 유액, 메이크업베이스, 에센스, 비누, 액체 세정료, 입욕제, 선 스크린크림, 선오일, 현탁액, 유탁액, 페이스트, 겔, 로션, 파우더, 비누, 계면활성제-함유 클린싱, 오일, 분말 파운데이션, 유탁액 파운데이션, 왁스 파운데이션, 패취 및 스프레이로 구성된 군으로부터 선택되는 제형으로 제조할 수 있으나, 이에 제한되는 것은 아니다.The cosmetic composition according to the present invention includes solutions, external ointments, creams, foams, nourishing lotions, softening lotions, packs, soft water, emulsions, makeup bases, essences, soaps, liquid detergents, bathing agents, sunscreen creams, sun oils, suspensions, Emulsions, pastes, gels, lotions, powders, soaps, surfactant-containing cleansing, oils, powder foundations, emulsion foundations, wax foundations, patches and sprays may be prepared in a formulation selected from the group consisting of, but not limited to it is not
또한, 본 발명의 화장료 조성물은 일반 피부 화장료에 배합되는 화장품학적으로 허용 가능한 담체를 1종 이상 추가로 포함할 수 있으며, 통상의 성분으로 예를 들면 유분, 물, 계면활성제, 보습제, 저급 알코올, 증점제, 킬레이트제, 색소, 방부제, 향료 등을 적절히 배합할 수 있으나, 이에 제한되는 것은 아니다.In addition, the cosmetic composition of the present invention may further include one or more cosmetically acceptable carriers to be formulated in general skin cosmetics, and conventional ingredients include, for example, oil, water, surfactant, humectant, lower alcohol, A thickener, a chelating agent, a colorant, a preservative, a fragrance, etc. may be appropriately mixed, but the present invention is not limited thereto.
본 발명의 화장료 조성물에 포함되는 화장품학적으로 허용 가능한 담체는 제형에 따라 다양하다. 본 발명의 제형이 연고, 페이스트, 크림 또는 젤인 경우에는, 담체성분으로서 동물성 유, 식물성 유, 왁스, 파라핀, 전분, 트라칸트, 셀룰로오스 유도체, 폴리에틸렌 글리콜, 실리콘, 벤토나이트, 실리카, 탈크, 산화아연 또는 이들의 혼합물이 이용될 수 있다.The cosmetically acceptable carrier included in the cosmetic composition of the present invention varies depending on the formulation. When the formulation of the present invention is an ointment, paste, cream or gel, animal oil, vegetable oil, wax, paraffin, starch, tracanth, cellulose derivative, polyethylene glycol, silicone, bentonite, silica, talc, zinc oxide or Mixtures thereof may be used.
본 발명의 제형이 파우더 또는 스프레이인 경우에는, 담체 성분으로서 락토스, 탈크, 실리카, 알루미늄 히드록사이드, 칼슘 실케이트, 폴리아미드 파우더 또는 이들의 혼합물이 이용될 수 있고, 특히 스프레이인 경우에는 추가적으로 클로로플루오로히드로카본, 프로판/부탄 또는 디메틸 에테르와 같은 추진제를 포함할 수 있다.When the formulation of the present invention is a powder or a spray, lactose, talc, silica, aluminum hydroxide, calcium silicate, polyamide powder, or a mixture thereof may be used as a carrier component, and in particular, in the case of a spray, additional chloro propellants such as fluorohydrocarbons, propane/butane or dimethyl ether.
본 발명의 제형이 용액 또는 유탁액인 경우에는, 담체 성분으로서 용매, 용해화제, 또는 유탁화제가 이용되고 예컨대 물, 에탄올, 이소프로판올, 에틸 카보네이트, 에틸 아세테이트, 벤질 벤조에이트, 프로필렌 글리콜, 1,3-브틸글리콜 오일이 있으며, 특히, 목화씨 오일, 땅콩 오일, 옥수수 배종 오일, 올리브 오일, 피마자 오일 및 참깨 오일, 글리세롤 지방족 에스테르, 폴리에틸렌 글리콜 또는 소르비탄의 지방산 에스테르가 있다.When the formulation of the present invention is a solution or emulsion, a solvent, solubilizer, or emulsifier is used as a carrier component, such as water, ethanol, isopropanol, ethyl carbonate, ethyl acetate, benzyl benzoate, propylene glycol, 1,3 -Butylglycol oil, in particular cottonseed oil, peanut oil, corn germ oil, olive oil, castor oil and sesame oil, glycerol fatty esters, fatty acid esters of polyethylene glycol or sorbitan.
본 발명의 제형이 현탁액인 경우에는, 담체 성분으로서 물, 에탄올 또는 프로필렌 글리콜과 같은 액상의 희석제, 에톡실화 이소스테아릴 알코올, 폴리옥시에틸렌 소르비톨 에스테르 및 폴리 옥시에틸렌 소르비탄 에스테르와 같은 현탁제, 미소결정성 셀룰로오스, 알루미늄 메타히드록시드, 벤토나이트, 아가 또는 트라칸트 등이 이용될 수 있다.When the formulation of the present invention is a suspension, as a carrier component a liquid diluent such as water, ethanol or propylene glycol, a suspending agent such as ethoxylated isostearyl alcohol, polyoxyethylene sorbitol esters and polyoxyethylene sorbitan esters; Crystalline cellulose, aluminum metahydroxide, bentonite, agar, or tracanth may be used.
본 발명의 제형이 비누인 경우에는 담체 성분으로서 지방산의 알칼리 금속 염, 지방산 헤미에스테르 염, 지방산 단백질 히드롤리제이트, 이세티오네이트, 라놀린 유도체, 지방족 알코올, 식물성 유, 글리세롤, 당 등이 이용될 수 있다.When the formulation of the present invention is a soap, alkali metal salts of fatty acids, fatty acid hemiester salts, fatty acid protein hydrolysates, isethionate, lanolin derivatives, aliphatic alcohols, vegetable oils, glycerol, sugars, etc. may be used as carrier components. can
본 발명에 기재된 모든 성분은, 바람직하게는, 한국, 중국, 미국, 유럽, 일본 등의 관련 법규, 규범 (예를 들어, 화장품 안전 기준 등에 관한 규정(한국), 화장품 안전 기술 규범(중국), 식품공전(한국), 식품첨가물공전(한국), 건강기능식품공전(한국), 위생 규범(중국)) 등에서 규정한 최대사용치를 초과하지 않는다. 즉, 바람직하게, 본 발명에 따른 화장료, 식품, 또는 퍼스널 케어용 조성물은 각국의 관련 법규, 규범에서 허용되는 함량 한도로 본 발명에 따른 성분들을 포함한다.All ingredients described in the present invention, preferably, relevant laws and regulations of Korea, China, the United States, Europe, Japan, etc. (eg, regulations on cosmetic safety standards (Korea), cosmetic safety technical standards (China), Do not exceed the maximum use values stipulated in the Food Standards Code (Korea), Food Additives Code (Korea), Health Functional Food Code (Korea), and hygiene standards (China)). That is, preferably, the composition for cosmetics, food, or personal care according to the present invention contains the ingredients according to the present invention within the content limit allowed by the relevant laws and regulations of each country.
본 개시에서 제공하는 조성물, 특히 화장료 조성물은 피부의 주요 상재균, 예를 들어 C. acne 중 여드름 환자에서 빈번하게 존재하는 C. acne type의 생장 및 유해인자(porphyrin)의 생성을 억제하는 효과를 나타낸다. 또한 염증이 없는 피부에 주로 존재하는 C. acne type의 생장에는 영향을 미치지 않으면서 이 균주가 생성하는 hyaluronidase의 활성을 저해하는 효과를 나타낼 수 있다. 또한 C. ance 균주 외에 S. aureus 등 피부에 존재하는 균에서 생성되는 포피린 생성 및/또는 hyaluronidase 활성을 억제하는 효과를 나타낼 수 있다.The composition provided in the present disclosure, particularly the cosmetic composition, has an effect of inhibiting the growth of major flora of the skin, for example, the growth of C. acne type frequently present in acne patients among C. acnes and the production of harmful factors (porphyrin). indicates. In addition, it can exhibit the effect of inhibiting the activity of hyaluronidase produced by this strain without affecting the growth of C. acne type, which is mainly present in non-inflammatory skin. In addition, it may exhibit an effect of inhibiting porphyrin production and/or hyaluronidase activity generated by bacteria present in the skin, such as S. aureus, in addition to the C. ance strain.
본 명세서에 첨부되는 다음의 도면들은 본 발명의 바람직한 실시예를 예시하는 것이며, 전술한 발명의 내용과 함께 본 발명의 기술사상을 더욱 이해시키는 역할을 하는 것이므로, 본 발명은 그러한 도면에 기재된 사항에만 한정되어 해석되어서는 아니 된다.The following drawings attached to the present specification illustrate preferred embodiments of the present invention, and serve to further understand the technical idea of the present invention together with the above-described contents of the present invention, so the present invention is limited to the matters described in such drawings It should not be construed as being limited.
도 1은 티아민 염이 Cutibacterium acne 병원성 균주에 미치는 영향을 평가한 결과이다.1 is a result of evaluating the effect of thiamine salt on the pathogenic strain Cutibacterium acnes.
도 2는 티아민 염이 Cutibacterium acne 비병원성 균주에 미치는 영향을 평가한 결과이다.Figure 2 is a result of evaluating the effect of the thiamine salt on a non-pathogenic strain of Cutibacterium acnes.
도 3은 티아민 염이 Cutibacterium acne 병원성 균주 및 비병원성 균주의 포피린 생성에 미치는 영향을 평가한 결과이다.Figure 3 is a result of evaluating the effect of the thiamine salt on the production of porphyrin of the pathogenic and non-pathogenic strains of Cutibacterium acnes.
도 4는 티아민 염이 Staphylococcus aureus 균주의 포피린 생성에 미치는 영향을 평가한 결과이다.4 is a result of evaluating the effect of thiamine salt on porphyrin production of Staphylococcus aureus strain.
도 5은 티아민 염이 Cutibacterium acne 비병원성 균주의 히알루론산 분해능에 미치는 영향을 평가한 결과이다.5 is a result of evaluating the effect of the thiamine salt on the hyaluronic acid decomposition ability of a non-pathogenic strain of Cutibacterium acnes.
도 6은 티아민 염이 Staphylococcus aureus 균주의 히알루론산 분해능에 미치는 영향을 평가한 결과이다.6 is a result of evaluating the effect of the thiamine salt on the hyaluronic acid degradation ability of Staphylococcus aureus strain.
도 7는 saccharide isomerate가 Cutibacterium acne 병원성 균주 및 비병원성 균주의 성장에 미치는 영향 및 Cutibacterium acne 병원성 균주의 포피린 생성에 미치는 영향을 평가한 결과이다. 도 7 중 a는 여드름 피부 연관형 C. acne 균주인 HL053PA1의 균주 생장에 미치는 영향을 평가한 결과이며, b는 건강 피부 연관형 C. acne 균주인 HL110PA3의 균주 생장에 미치는 영향을 평가한 결과이고, c는 여드름 피부 연관형 C. acne 균주인 HL053PA1의 포피린 생성에 미치는 영향을 평가한 결과이고, d는 건강 피부 연관형 C. acne 균주인 HL110PA3의 히알루론산 분해율에 미치는 영향을 평가한 결과이다.7 is a result of evaluating the effect of saccharide isomerate on the growth of pathogenic and non-pathogenic strains of Cutibacterium acnes and on the production of porphyrins of pathogenic strains of Cutibacterium acne. In FIG. 7, a is a result of evaluating the effect on the strain growth of HL053PA1, a C. acnes strain associated with acne, and b is a result of evaluating the effect on the growth of a strain of HL110PA3, a healthy skin-related C. acnes strain. , c is the result of evaluating the effect on porphyrin production of HL053PA1, a C. acnes strain associated with acne skin, and d is the result of evaluating the effect on the degradation rate of hyaluronic acid of HL110PA3, a healthy skin-related C. acne strain.
이하, 본 발명의 이해를 돕기 위하여 실시예 등을 들어 상세하게 설명하기로 한다. 그러나, 본 발명에 따른 실시예들은 여러 가지 다른 형태로 변형될 수 있으며, 본 발명의 범위가 하기 실시예들에 한정되는 것으로 해석되어서는 안 된다. 본 발명의 실시예들은 본 발명이 속한 분야에서 평균적인 지식을 가진 자에게 본 발명을 보다 완전하게 설명하기 위해 제공되는 것이다.Hereinafter, examples and the like will be described in detail to help the understanding of the present invention. However, the embodiments according to the present invention may be modified in various other forms, and the scope of the present invention should not be construed as being limited to the following examples. The embodiments of the present invention are provided to more completely explain the present invention to those of ordinary skill in the art to which the present invention pertains.
참고로 하기 실험방법들 중 구체적으로 언급된 이외의 재료 및 방법은 논문 "Vitamin B12 modulates the transcriptome of the skin microbiota in acne pathogenesis" (Sci Transl Med. 2015 Jun 24;7(293):293ra103. doi: 10.1126/scitranslmed.aab2009.) 또는 "The Skin Bacterium Propionibacterium acnes Employs Two Variants of Hyaluronate Lyase with Distinct Properties" (Microorganisms. 2017 Sep 12;5(3):57. doi: 10.3390/microorganisms5030057.)를 참고하여 진행하였다. For reference, materials and methods other than those specifically mentioned among the following experimental methods are described in the paper "Vitamin B12 modulates the transcriptome of the skin microbiota in acne pathogenesis" (Sci Transl Med. 2015 Jun 24;7(293):293ra103. doi: 10.1126/scitranslmed.aab2009.) or "The Skin Bacterium Propionibacterium acnes Employs Two Variants of Hyaluronate Lyase with Distinct Properties" (Microorganisms. 2017 Sep 12;5(3):57. doi: 10.3390/microorganisms5030057.) .
1. 여드름 연관 C. acne 균주 생장 억제 (도 1)1. Acne-associated C. acne strain growth inhibition (Fig. 1)
실험방법: Thiamine HCl이 여드름 연관 C. acne의 증식에 미치는 영향을 확인하기 위한 실험을 수행하였다. Experimental method : An experiment was performed to determine the effect of Thiamine HCl on the proliferation of acne-related C. acnes.
여드름 환자에 주로 존재하는 Cutibacterium acne type인 HL053PA1 균주를 BHI 액체배지에서 배양하여 활성화시킨 다음 동일 탁도로 맞춰 재접종하였다. 이때 thiamine HCl을 1 w/v% 농도로 처리하고 7일간 배양 후 595nm에서 흡광도를 측정하여 균주 증식에 미치는 영향을 확인하였다. 그 결과를 도 1에 나타내었다.The HL053PA1 strain, which is a Cutibacterium acne type, which is mainly present in acne patients, was cultured and activated in BHI broth, and then re-inoculated at the same turbidity. At this time, thiamine HCl was treated at a concentration of 1 w/v% and absorbance was measured at 595 nm after incubation for 7 days to confirm the effect on strain growth. The results are shown in FIG. 1 .
결과: Thiamine HCl 처리시 무처리군 대비 생장이 70%정도 감소하여 유해한 인자를 주로 방출하는 C. acne type의 생장을 억제함을 확인하였다. Result : Thiamine HCl treatment reduced the growth by about 70% compared to the untreated group, confirming that the growth of C. acne type, which mainly emits harmful factors, was inhibited.
2. 일반 피부 연관형 C. acne 균주 생장 (도 2)2. Normal skin-associated C. acne strain growth (Fig. 2)
실험방법: Thiamine HCl이 여드름 등 염증이 존재하지 않는 일반 피부에만 주로 존재하는 C. acne type의 증식에 미치는 영향을 확인하기 위한 실험을 수행하였다. Experimental method : An experiment was performed to confirm the effect of Thiamine HCl on the proliferation of C. acne type, which is mainly present only in normal skin without inflammation such as acne.
일반 피부에만 주로 존재하는 C. ance type인 HL110PA3 균주를 BHI 액체배지에서 배양하여 활성화시킨 다음 동일 탁도로 맞춰 재접종하였다. 이때 thiamine HCl을 1% 농도로 처리하고 7일간 배양 후 595nm에서 흡광도를 측정하여 균주 증식에 미치는 영향을 확인하였다. 그 결과를 도 2에 나타내었다. The HL110PA3 strain, which is a C. ance type mainly present only in normal skin, was cultured and activated in BHI liquid medium, and then re-inoculated at the same turbidity. At this time, thiamine HCl was treated at a concentration of 1%, and absorbance was measured at 595 nm after 7 days of incubation to confirm the effect on strain growth. The results are shown in FIG. 2 .
결과: Thiamine HCl 처리시 여드름 연관 C. acne type의 생장을 확연히 줄였던 것에 비해 일반 피부형 C. acne type의 생장에는 큰 영향을 미치지 못했다 Results : Thiamine HCl treatment significantly reduced the growth of acne-related C. acne type, but had no significant effect on the growth of C. acne type, a normal skin type.
3. porphyrin 생성 억제 효과 (도 3)3. Inhibitory effect of porphyrin production (Fig. 3)
실험방법: 산화 스트레스를 유발하며 피부에서 여드름 등의 염증에 관여한다고 알려져 있는 포피린(porphyrin) 생성에 미치는 영향을 알아보기 위한 실험을 진행하였다. Experimental method: An experiment was conducted to investigate the effect on the production of porphyrin, which is known to induce oxidative stress and is involved in inflammation such as acne in the skin.
C. acne HL053PA1 및 HL110PA3 균주를 각각 BHI 액체배지에서 배양하여 활성화 시킨 다음 동일 탁도로 맞춰 재접종하였다. 이때 thiamine HCl을 1% 농도로 처리하고 7일간 배양 후 균주 배양물을 회수하였다. 400 μl의 세균 배양물을 에틸 아세테이트와 아세트산 (4 : 1, vol / vol)을 넣어 추출하였다. 추출물을 원심분리하여 층분리를 통해 포피린을 포함하는 상층부를 회수하였다. 회수한 상층액에 1.5 M HCl 넣어 용해시키고 원심분리를 통해 층분리를 하여 하층부를 회수하였다. 회수된 가용상을 405nm/620nm에서 형광을 측정하였다. 그 결과를 도 3에 나타내었다.C. acnes HL053PA1 and HL110PA3 strains were respectively cultured and activated in BHI broth, and then re-inoculated at the same turbidity. At this time, thiamine HCl was treated at a concentration of 1%, and the strain culture was recovered after 7 days of incubation. 400 μl of the bacterial culture was extracted by adding ethyl acetate and acetic acid (4: 1, vol/vol). The extract was centrifuged to recover the upper layer containing porphyrin through layer separation. The recovered supernatant was dissolved in 1.5 M HCl, and the layers were separated by centrifugation to recover the lower layer. The recovered soluble phase was measured for fluorescence at 405 nm/620 nm. The results are shown in FIG. 3 .
결과: 여드름 연관 C. acne 균주는 일반 피부에 존재하는 C. acne 균주에 비해 많은 양의 포피린을 생산하였다. Thiamine HCl 처리시 여드름 연관 균주인 HL053PA1 배양물에 존재하는 포피린 양이 확연하게 줄어들었다. RESULTS: The acne-associated C. acnes strain produced a greater amount of porphyrin than the C. acnes strain present in normal skin. Thiamine HCl treatment significantly reduced the amount of porphyrin present in the culture of acne-associated strain HL053PA1.
4. porphyrin 생성하는 다른 균주에서 porphyrin 생성 억제 효과 (도 4)4. Inhibitory effect of porphyrin production in other porphyrin-producing strains (Fig. 4)
S. aureus 균주를 BHI 액체배지에서 배양하여 활성화 시킨 1/100 농도로 재접종 하였다. thiamine HCl을 1 w/v% 농도로 처리하고 24시간 배양 후 균주 배양물을 회수하였다. 400 μl의 세균 배양물을 에틸 아세테이트와 아세트산 (4 : 1, vol / vol)을 넣어 추출하였다. 추출물을 원심분리하여 층분리를 통해 포피린을 포함하는 상층부를 회수하였다. 회수한 상층액에 1.5 M HCl 넣어 용해시키고 원심분리를 통해 층분리를 하여 하층부를 회수하였다. 회수된 가용상을 405nm/620nm에서 형광을 측정하였다. 그 결과를 도 4에 나타내었다.S. aureus strains were re-inoculated at 1/100 concentration activated by culturing in BHI broth. The strain culture was recovered after treatment with thiamine HCl at a concentration of 1 w/v% and culturing for 24 hours. 400 μl of the bacterial culture was extracted by adding ethyl acetate and acetic acid (4: 1, vol/vol). The extract was centrifuged to recover the upper layer containing porphyrin through layer separation. The recovered supernatant was dissolved in 1.5 M HCl, and the layers were separated by centrifugation to recover the lower layer. The recovered soluble phase was measured for fluorescence at 405 nm/620 nm. The results are shown in FIG. 4 .
결과: Thiamine HCl 처리시 S.aureus가 분비하는 포피린 양이 확연하게 줄어들었다. Results: Thiamine HCl treatment significantly reduced the amount of porphyrin secreted by S. aureus.
5. 히알루론산 분해 억제 효능 (도 5)5. Hyaluronic acid degradation inhibitory effect (Fig. 5)
실험방법: 일반 피부 연관 C. acne 균주인 HL110PA3가 분비하는 히알루론산 분해 효소의 활성이 억제되는지 확인하기 위해 실험을 수행하였다. Experimental method: An experiment was performed to determine whether the activity of the hyaluronic acid degrading enzyme secreted by HL110PA3, a general skin-associated C. acnes strain, is inhibited.
HL110PA3 균주를 BHI 액체배지에서 배양하여 활성화시킨 다음 동일 탁도로 맞춰 재접종하였다. 이때 thiamine HCl을 1% 농도로 처리하고 7일간 배양 후 배양액을 회수하였다. C. acne가 분비한 히알루론산 분해 효소의 활성을 측정하기 위해 히알루론산과 배양액을 섞은 후 20분간 37℃에서 반응시켰다. 반응이 끝난 후 1% BSA sodium acetate buffer를 넣어 남아있는 히알루론산과 BSA를 응집시키고 540nm에서 흡광도를 찍어 히알루론산의 분해정도를 확인하였다. 그 결과를 도 5에 나타내었다. The HL110PA3 strain was activated by culturing in BHI broth and then re-inoculated to the same turbidity. At this time, thiamine HCl was treated at a concentration of 1%, and the culture medium was recovered after 7 days of incubation. In order to measure the activity of the hyaluronic acid degrading enzyme secreted by C. acne, the hyaluronic acid and the culture medium were mixed and reacted at 37° C. for 20 minutes. After the reaction was completed, 1% BSA sodium acetate buffer was added to aggregate the remaining hyaluronic acid and BSA, and the degree of decomposition of hyaluronic acid was confirmed by taking absorbance at 540 nm. The results are shown in FIG. 5 .
결과: C. acne 비병원성 균주인 HL110PA3은 염증 병변이 없는 건강한 피부에서 분리되었기 때문에 일반적으로 건강 피부형 C. acne로 분류되지만, 실험 결과와 같이 히알루론산 분해 효소를 분비하기 때문에 피부 내 히알루론산을 분해할 수 있다. 무처리 배양액 처리시 20분간 약 85%의 히알루론산이 분해된 반면, Thiamine HCl을 처리한 실험군의 배양액에서는 60%정도의 히알루론산이 분해되어 대조군 대비 30%정도 히알루론산 분해를 억제할 수 있음을 확인하였다. Result: HL110PA3, a non-pathogenic strain of C. acnes, is generally classified as a healthy skin type C. acne because it is isolated from healthy skin without inflammatory lesions. can do. While about 85% of hyaluronic acid was decomposed for 20 minutes when treated with untreated culture medium, about 60% of hyaluronic acid was decomposed in the culture medium of the experimental group treated with Thiamine HCl, indicating that it can inhibit the degradation of hyaluronic acid by 30% compared to the control group. Confirmed.
6. 히알루론산 분해효소를 분비하는 다른 균주에서 히알루론산 분해 억제 효능 (도 6)6. Efficacy of inhibiting hyaluronic acid degradation in other strains secreting hyaluronic acid degrading enzyme (Fig. 6)
실험방법: S. aureus 히알루론산 분해 효소의 활성이 억제되는지 확인하기 위해 실험을 수행하였다. Experimental method: An experiment was performed to determine whether the activity of S. aureus hyaluronic acid degrading enzyme was inhibited.
S.aureus 균주를 BHI 액체배지에서 배양하여 활성화 시킨 1/100 농도로 재접종 하였다. thiamine HCl을 1% 농도로 처리하고 24시간 배양 후 균주 배양액을 회수하였다. S.aureus가 분비한 히알루론산 분해 효소의 활성을 측정하기 위해 히알루론산과 배양액을 섞은 후 90분간 37℃에서 반응시켰다. 분해되지 않고 남아있는 히알루론산을 측정하기 위해 hyaluronan ELISA 키트를 이용하여 남아있는 히알루론산을 정량하였다.S. aureus strains were re-inoculated at 1/100 concentration activated by culturing in BHI broth. After treatment with thiamine HCl at a concentration of 1% and cultured for 24 hours, the culture medium was recovered. To measure the activity of the hyaluronic acid degrading enzyme secreted by S. aureus, the hyaluronic acid and the culture medium were mixed and reacted at 37° C. for 90 minutes. In order to measure the hyaluronic acid remaining without degradation, the remaining hyaluronic acid was quantified using a hyaluronan ELISA kit.
결과: 아토피 피부염 병변 등에서 높은 빈도로 발견되는 S.aureus는 히알루론산을 분해할 수 있다. 무처리 배양액 처리시 50% 이상의 히알루론산이 분해된 반면, Thiamine HCl을 처리한 실험군의 배양액에서는 10% 미만의 히알루론산이 분해되어 확연하게 히알루론산 분해를 억제할 수 있음을 확인하였다. Results: S. aureus, which is found frequently in atopic dermatitis lesions, etc., can degrade hyaluronic acid. It was confirmed that more than 50% of hyaluronic acid was decomposed when treated with untreated culture, whereas less than 10% of hyaluronic acid was decomposed in the culture of the experimental group treated with Thiamine HCl, thereby significantly inhibiting the decomposition of hyaluronic acid.
7. Saccharide isomerate의 평가 결과 (도 7)7. Evaluation result of saccharide isomerate (Fig. 7)
상기 티아민 염과 동일한 방법으로 C. acne 여드름 병원성 균주 및 비병원성 균주의 성장에 미치는, saccharide isomerate의 영향을 평가하였다. 그 결과를 도 7에 나타내었다. Saccharide isomerate로는 PENTAVIIN® 제품을 사용하였다.In the same manner as the thiamine salt, the effect of saccharide isomerate on the growth of pathogenic and non-pathogenic strains of C. acnes acne was evaluated. The results are shown in FIG. 7 . As saccharide isomerate, PENTAVIIN® product was used.
도 7에 나타나는 바와 같이, saccharide isomerate 또한 여드름 유발하는 유해 C. acne 균의 생장을 억제시키면서도, 유익 C. acne 균의 생장 억제는 상대적으로 적어 균주 리밸런싱 효과를 가짐을 확인할 수 있었다. 또한 포피린 생성 억제 및 히알루론산 분해 효소의 억제 효과를 나타냄을 확인하였다.As shown in FIG. 7 , while the saccharide isomerate also inhibited the growth of acne-causing harmful C. acnes bacteria, the growth inhibition of beneficial C. acnes bacteria was relatively small, confirming that it had a strain rebalancing effect. In addition, it was confirmed that the inhibitory effect of porphyrin production and hyaluronic acid degrading enzyme was exhibited.
Claims (7)
- 티아민 또는 이의 화장학적으로 허용 가능한 염 및 사카라이드 아이소머레이트(saccharide isomerate)으로 이루어진 군으로부터 선택된 어느 하나 이상을 유효 성분으로 포함하는, 피부 미생물군집(microbiome) 조정용 화장료 조성물. A cosmetic composition for adjusting skin microbiome, comprising as an active ingredient at least one selected from the group consisting of thiamine or a cosmetically acceptable salt thereof and saccharide isomerate.
- 제1항에 있어서, 상기 화장료 조성물은 피부 미생물군집(microbiome) 내 Cutibacterium acne 조정용인, 화장료 조성물.The cosmetic composition according to claim 1, wherein the cosmetic composition is for adjusting Cutibacterium acnes in the skin microbiome.
- 제2항에 있어서, 상기 조성물은 Cutibacterium acne HL110PA3 균주보다 Cutibacterium acne HL053PA1 균주의 성장을 더 많이 억제하는, 화장료 조성물.The cosmetic composition according to claim 2, wherein the composition inhibits the growth of the Cutibacterium acne HL053PA1 strain more than the Cutibacterium acne HL110PA3 strain.
- 티아민 또는 이의 화장학적으로 허용 가능한 염 및 사카라이드 아이소머레이트(saccharide isomerate)으로 이루어진 군으로부터 선택된 어느 하나 이상을 유효 성분으로 포함하는, 미생물이 분비하는 포피린의 생성 억제용 화장료 조성물. A cosmetic composition for inhibiting the production of porphyrin secreted by microorganisms, comprising as an active ingredient at least one selected from the group consisting of thiamine or a cosmetically acceptable salt thereof and saccharide isomerate.
- 제3항에 있어서, 상기 화장료 조성물은 피부 산화 스트레스를 억제하거나, 피부 염증을 개선하거나, 여드름 유발을 억제하거나, 진피치밀도를 높이거나, 피부 건조 증상을 개선하거나, 또는 피부톤을 개선하는 용도인, 화장료 조성물. The method according to claim 3, wherein the cosmetic composition is used for inhibiting skin oxidative stress, improving skin inflammation, inhibiting acne induction, increasing dermal density, improving skin dryness symptoms, or improving skin tone. , cosmetic composition.
- 티아민 또는 이의 화장학적으로 허용 가능한 염 및 사카라이드 아이소머레이트(saccharide isomerate)으로 이루어진 군으로부터 선택된 어느 하나 이상을 유효 성분으로 포함하는, 미생물에 의해 분비되는 히알루론산 분해 효소 저해용 화장료 조성물. A cosmetic composition for inhibiting hyaluronic acid degrading enzyme secreted by microorganisms, comprising as an active ingredient any one or more selected from the group consisting of thiamine or a cosmetically acceptable salt thereof and saccharide isomerate.
- 제6항에 있어서, 상기 조성물은 히알루론산 분해능을 억제하여 피부 탄력, 건조, 또는 노화 증상을 개선하는 용도인, 화장료 조성물.The cosmetic composition according to claim 6, wherein the composition is used to improve skin elasticity, dryness, or aging symptoms by inhibiting hyaluronic acid decomposition.
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JP2023553374A JP2024508524A (en) | 2021-03-03 | 2022-02-16 | Cosmetic composition for skin improvement through regulation of porphyrin production by skin resident bacteria and regulation of hyaluronic acid degrading enzyme |
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