WO2022168624A1 - 積層ガラスセラミック誘電体材料、焼結体、焼結体の製造方法及び高周波用回路部材 - Google Patents
積層ガラスセラミック誘電体材料、焼結体、焼結体の製造方法及び高周波用回路部材 Download PDFInfo
- Publication number
- WO2022168624A1 WO2022168624A1 PCT/JP2022/002048 JP2022002048W WO2022168624A1 WO 2022168624 A1 WO2022168624 A1 WO 2022168624A1 JP 2022002048 W JP2022002048 W JP 2022002048W WO 2022168624 A1 WO2022168624 A1 WO 2022168624A1
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- WO
- WIPO (PCT)
- Prior art keywords
- sintered body
- outer layer
- inner layer
- dielectric material
- layer
- Prior art date
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- 239000002241 glass-ceramic Substances 0.000 title claims abstract description 35
- 239000003989 dielectric material Substances 0.000 title claims abstract description 32
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 238000005245 sintering Methods 0.000 claims abstract description 19
- 239000000463 material Substances 0.000 claims abstract description 15
- 238000005259 measurement Methods 0.000 claims abstract description 12
- 239000000843 powder Substances 0.000 claims description 57
- 239000011521 glass Substances 0.000 claims description 44
- 239000000919 ceramic Substances 0.000 claims description 23
- 238000010304 firing Methods 0.000 claims description 21
- 239000013078 crystal Substances 0.000 claims description 8
- 229910052661 anorthite Inorganic materials 0.000 claims description 4
- NWXHSRDXUJENGJ-UHFFFAOYSA-N calcium;magnesium;dioxido(oxo)silane Chemical compound [Mg+2].[Ca+2].[O-][Si]([O-])=O.[O-][Si]([O-])=O NWXHSRDXUJENGJ-UHFFFAOYSA-N 0.000 claims description 4
- 229910001597 celsian Inorganic materials 0.000 claims description 4
- GWWPLLOVYSCJIO-UHFFFAOYSA-N dialuminum;calcium;disilicate Chemical group [Al+3].[Al+3].[Ca+2].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-] GWWPLLOVYSCJIO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052637 diopside Inorganic materials 0.000 claims description 4
- 239000010433 feldspar Substances 0.000 claims description 4
- 229910052844 willemite Inorganic materials 0.000 claims description 4
- 239000011159 matrix material Substances 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 109
- 239000004020 conductor Substances 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 6
- 238000002425 crystallisation Methods 0.000 description 6
- 230000008025 crystallization Effects 0.000 description 6
- 238000013001 point bending Methods 0.000 description 6
- 229910004298 SiO 2 Inorganic materials 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000002244 precipitate Substances 0.000 description 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 239000007769 metal material Substances 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000002002 slurry Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 239000004014 plasticizer Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- IRIAEXORFWYRCZ-UHFFFAOYSA-N Butylbenzyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCC1=CC=CC=C1 IRIAEXORFWYRCZ-UHFFFAOYSA-N 0.000 description 2
- 229910018068 Li 2 O Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- 238000007606 doctor blade method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- RSWGJHLUYNHPMX-UHFFFAOYSA-N 1,4a-dimethyl-7-propan-2-yl-2,3,4,4b,5,6,10,10a-octahydrophenanthrene-1-carboxylic acid Chemical compound C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000011812 mixed powder Substances 0.000 description 1
- 238000010295 mobile communication Methods 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000000634 powder X-ray diffraction Methods 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910021493 α-cristobalite Inorganic materials 0.000 description 1
- 229910021489 α-quartz Inorganic materials 0.000 description 1
- 229910021492 β-tridymite Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/16—Compositions for glass with special properties for dielectric glass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B18/00—Layered products essentially comprising ceramics, e.g. refractory products
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
- B32B7/025—Electric or magnetic properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
- B32B7/027—Thermal properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/10—Forming beads
- C03B19/108—Forming porous, sintered or foamed beads
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C12/00—Powdered glass; Bead compositions
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/14—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on silica
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/16—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on silicates other than clay
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/16—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on silicates other than clay
- C04B35/18—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on silicates other than clay rich in aluminium oxide
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/02—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/02—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
- H01B3/08—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances quartz; glass; glass wool; slag wool; vitreous enamels
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/02—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
- H01B3/12—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances ceramics
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
Definitions
- the present invention relates to a laminated glass-ceramic dielectric material, a sintered body, and a high-frequency circuit member having a low dielectric constant and high mechanical strength that are advantageous for signal processing in a high-frequency region of 20 GHz or higher.
- Alumina ceramics are widely used as wiring boards and circuit parts.
- Alumina ceramic has a high relative permittivity of 10, so it has the disadvantage of slow signal processing.
- tungsten with a high melting point must be used as the conductor material, there is also the drawback that the conductor loss increases.
- a glass-ceramic dielectric material consisting of glass powder and ceramic powder has been developed, and its sintered body is used as the dielectric layer.
- a sintered body of a glass-ceramic dielectric material using glass powder made of alkali borosilicate glass has a dielectric constant of 6 to 8, which is lower than that of an alumina ceramic material.
- it since it can be fired at a temperature of 1000° C. or less, it can be fired simultaneously with low melting point metal materials such as Ag and Cu, which have low conductor loss, and have the advantage that these can be used as inner layer conductors (Patent document 1 and 2).
- Japanese Patent Laid-Open No. 11-116272 Japanese Patent Laid-Open No. 9-241068 Japanese Patent Laid-Open No. 60-136294
- the transmission loss of electromagnetic waves in an electronic circuit is proportional to the product of the square root of the dielectric constant of the circuit board, the dielectric loss tangent, and the frequency of the electromagnetic wave.
- the glass-ceramic dielectric materials disclosed in Patent Documents 1 and 2 have a problem that the transmission loss increases because the dielectric constant of the sintered body is not sufficiently low for the required value of 6 to 8. rice field.
- a sintered body of a glass-ceramic dielectric material with a low dielectric constant has a low mechanical strength, and there has been a problem that cracks or the like occur during the process of mounting the element on the substrate.
- An object of the present invention is to provide a laminated glass-ceramic dielectric material, a sintered body, and a high-frequency circuit member that have low dielectric properties and high mechanical strength in a high-frequency region of 20 GHz or higher.
- the laminated glass-ceramic dielectric material of the present invention has a laminated structure in which at least an outer layer, an inner layer, and an outer layer are laminated in this order. 5 or less, and the inner layer is made of a material whose thermal expansion coefficient after sintering is higher than that of the outer layer after sintering.
- the "relative dielectric constant at a measurement temperature of 25°C and a frequency of 28 GHz” is measured by using a sintered body densely sintered at 900°C as a measurement sample.
- “Thermal expansion coefficient” is an average value measured in a temperature range of 30 to 380° C. using a sintered body densely sintered at 900° C. as a measurement sample.
- the “inner layer” and the “outer layer” are different materials. The “inner layer” and the “outer layer” are not limited to one layer, and may be a laminate of a plurality of layers made of substantially the same material. Note that materials of substantially the same kind refer to materials with a difference of 1 ppm/K or less in thermal expansion coefficient after firing.
- the laminate of substantially the same kind of material is integrated into a single layer after sintering.
- the "thermal expansion coefficient” refers to the thermal expansion coefficient of a sintered body obtained by densely sintering a laminate of approximately the same material at 900°C. From the viewpoint of accurately enjoying the effects of the present invention, it is preferable not to have different types of layers other than the "inner layer” and the "outer layer”. is not completely excluded.
- the dielectric constant of the outer layer after firing at a measurement temperature of 25°C and a frequency of 28 GHz is 5.5 or less. Therefore, low dielectric properties of the sintered body can be ensured.
- the inner layer is made of a material whose thermal expansion coefficient after sintering is higher than that of the outer layer after sintering.
- the amount of heat shrinkage of the inner layer during firing can be made larger than the amount of heat shrinkage of the outer layer.
- compressive stress is likely to occur in the vicinity of the front and back surfaces of the sintered body, and the mechanical strength of the sintered body can be increased.
- the compressive stress value is 50 to 100 MPa.
- the inner layer preferably has a thermal expansion coefficient after sintering higher than that of the outer layer after sintering by 1.5 ppm/K or more.
- the inner layer preferably contains at least crystallizable glass powder.
- the outer layer preferably contains at least amorphous glass powder.
- crystalline glass powder refers to glass powder that crystallizes when fired at 900°C
- amorphous glass powder refers to glass powder that does not crystallize when fired at 900°C. Point.
- the inner layer contains at least a crystalline glass powder and the outer layer contains at least an amorphous glass powder, thereby increasing the mechanical strength and firing at a temperature of 1000° C. or less.
- metal materials with low melting points, such as Ag and Cu, can be used as inner layer conductors.
- the laminated glass-ceramic dielectric material of the present invention is preferably used in the form of laminated green sheets.
- the sintered body of the present invention is a sintered body obtained by sintering the above laminated glass-ceramic dielectric material, wherein the glass matrix of the inner layer, anorthite, Sr feldspar, celsian, diopside and willemite It is preferable that one or more selected crystals are precipitated. As described above, the mechanical strength of the sintered body can be increased by regulating the crystal species precipitated in the crystallizable glass contained in the inner layer.
- the outer layer has a dielectric constant of 4 or less at a measurement temperature of 25°C and a frequency of 28 GHz.
- the outer layer preferably does not substantially contain ceramic powder (the content of ceramic powder in the outer layer is less than 0.5% by mass).
- the sintered body of the present invention is a sintered body in which at least an outer layer, an inner layer, and an outer layer are laminated and integrated in this order, and the relative dielectric constant of the outer layer at a measurement temperature of 25 ° C. and a frequency of 28 GHz is 5.5 or less, Moreover, it is preferable that the coefficient of thermal expansion of the inner layer is higher than that of the outer layer.
- the method for producing a sintered body of the present invention it is preferable to fire the laminated glass-ceramic dielectric material.
- the laminated glass-ceramic dielectric material it is preferable to fire the laminated glass-ceramic dielectric material at a temperature of 1000°C or less.
- the high-frequency circuit member of the present invention is a high-frequency circuit member having a dielectric layer, and the dielectric layer is preferably the sintered body described above.
- the sintered body has low dielectric properties in a high frequency range of 20 GHz or higher, and the sintered body has high mechanical strength. Therefore, the laminated glass-ceramic dielectric material of the present invention is suitable as a circuit member for high frequencies such as 5G communication.
- the laminated glass-ceramic dielectric material of the present invention is a laminate in which an outer layer, an inner layer, and an outer layer are laminated in this order, and particularly a laminate in which the inner layer contains crystalline glass powder and the outer layer contains amorphous glass powder.
- the inner layer contains crystalline glass powder and the outer layer contains amorphous glass powder.
- the glass powder that constitutes the inner layer preferably contains crystallizable glass powder that exhibits a higher coefficient of thermal expansion than the outer layer after firing.
- a crystallizable glass powder having a property of precipitating one or more kinds of crystals selected from anorthite, Sr feldspar, celsian, diopside and willemite when fired.
- the glass-ceramic in which the crystals are precipitated tends to have a high coefficient of thermal expansion and high mechanical strength, so that the mechanical strength of the sintered body can be easily increased.
- the thermal expansion coefficient of the inner layer glass-ceramic after sintering is, for example, about 6-11 ppm/K at 30-380.degree.
- the crystallizable glass powder preferably contains high-strength ceramic powder such as alumina or zirconia.
- the content of the crystallizable glass powder is preferably 50 to 80% by mass, and the content of the high-strength ceramic powder is preferably 20 to 50% by mass. is 60 to 75% by mass, and the content of the high-strength ceramic powder is more preferably 25 to 40% by mass. If the content of the high-strength ceramic powder is too large, it becomes difficult to densify the sintered body. On the other hand, if the amount of high-strength ceramic powder is too small, the mechanical strength of the sintered body tends to decrease.
- ceramic powders may be introduced as high-strength ceramic powders.
- other ceramic powders for example, one or more selected from silicon carbide, silicon nitride and aluminum nitride can be used.
- the crystallization temperature T1 of the inner layer is preferably 850-900°C, particularly 870-900°C. If T1 is too low, the substrate tends to warp. On the other hand, if T1 is too high, the firing temperature will be high.
- the composition of the crystallizable glass powder may be selected according to the crystal seed to be precipitated.
- the crystallizable glass powder from which anorthite precipitates has a glass composition of 40 to 60% SiO 2 , 1 to 20% Al 2 O 3 , 15 to 30% CaO, and 0 to 10% B 2 O 3 in terms of mass %. It is preferable to contain.
- the crystallizable glass powder in which Sr-based feldspar precipitates has a glass composition of 20 to 40% SiO 2 , 20 to 40% Al 2 O 3 , 10 to 30% SrO, 10 to 20% MgO, and B 2 in mass %. It preferably contains 0-10% O 3 .
- the crystalline glass powder from which celsian precipitates may contain 35 to 60% by mass of SiO 2 , 1 to 10% by mass of Al 2 O 3 , 20 to 40% by mass of BaO and 10 to 20% by mass of MgO. preferable.
- the crystallizable glass powder from which diopside precipitates contains 40 to 60% by mass of SiO 2 , 0 to 10% by mass of Al 2 O 3 , 10 to 25% by mass of MgO, and 15 to 35% by mass of CaO as a glass composition. is preferred.
- the crystalline glass powder from which willemite precipitates preferably contains 30 to 60% by mass of SiO 2 , 10 to 30% by mass of CaO, 10 to 20% by mass of MgO and 10 to 30% by mass of ZnO.
- the inner layer preferably has a dielectric constant of 10 or less, particularly 9.5 or less at 25°C and 28 GHz after firing. If the dielectric constant is too high, the speed of signal processing tends to slow down. Although the lower limit of the dielectric constant is not particularly limited, it is practically 5 or more.
- the inner layer after firing, preferably has a dielectric loss tangent at 25°C and 28 GHz of 0.0040 or less, particularly 0.0038 or less. If the dielectric loss tangent is too high, transmission signal loss tends to increase. Although the lower limit of the dielectric loss tangent is not particularly limited, it is practically 0.0005 or more.
- the amorphous glass powder contained in the outer layer preferably exhibits a thermal expansion coefficient lower than that of the inner layer after firing, and has a dielectric constant of 5.5 or less, particularly 4 or less at 25°C and 28 GHz. Also, the dielectric loss tangent is preferably 0.0020 or less.
- the coefficient of thermal expansion is, for example, about 5.5 to 6.5 ppm/K at 30 to 380°C. It is about 5 to 4.5 ppm/K.
- the amorphous glass powder is preferably borosilicate glass with low expansion and low dielectric constant.
- 2 O+Na 2 O+K 2 O total amount of Li 2 O, Na 2 O and K 2 O
- 0.1 to 5% is more preferably contained.
- the contents of Li 2 O, Na 2 O and K 2 O are preferably 0 to 3% each.
- the amorphous glass powder may contain a low dielectric constant ceramic powder having a dielectric constant of 5.5 or less, particularly 4 or less. If the dielectric constant is sufficiently low, the low dielectric constant ceramic powder may not be included.
- the content of the amorphous glass powder is preferably 60 to 80% by mass, and the content of the low dielectric constant ceramic powder is preferably 20 to 40% by mass. If the content of the low dielectric constant ceramic powder is too large, it becomes difficult to densify the sintered body. On the other hand, if the low dielectric constant ceramic powder is too small, the relative dielectric constant will be difficult to decrease.
- the low dielectric constant ceramic powder is preferably ⁇ -quartz, ⁇ -cristobalite or ⁇ -tridymite, which has a relative dielectric constant of 5 or less and a dielectric loss tangent of 0.0010 or less in a high frequency range of 20 GHz or higher.
- the softening point T2 of the outer layer is preferably 770-840 °C, especially 790-830°C. If T2 is too low, the heat resistance will decrease. On the other hand, if T2 is too high , the firing temperature will be high.
- the outer layer preferably has a dielectric constant of 5.5 or less, particularly 4 or less at 25°C and 28 GHz after firing. If the dielectric constant is too high, the speed of signal processing tends to slow down. Although the lower limit of the dielectric constant is not particularly limited, it is practically 2.5 or more.
- the outer layer preferably has a dielectric loss tangent of 0.0025 or less, particularly 0.0020 or less at 25°C and 28 GHz. If the dielectric loss tangent is too high, transmission signal loss tends to increase. Although the lower limit of the dielectric loss tangent is not particularly limited, it is practically 0.0005 or more.
- slurry is prepared by adding predetermined amounts of a binder, a plasticizer, and a solvent to the glass powder or the mixed powder of the glass powder and the ceramic powder.
- Suitable binders include, for example, polyvinyl butyral resin and methacrylic acid resin, suitable plasticizers include dibutyl phthalate, and suitable solvents include toluene and methyl ethyl ketone.
- the above slurry is formed into a green sheet by a doctor blade method, dried, cut to a predetermined size, and then mechanically processed to form via holes, for example, a low resistance green sheet that can be used as a silver conductor or electrode.
- a metal material is printed on the via hole and the surface of the green sheet.
- the sheet containing the crystalline glass powder is placed in the inner layer and the sheet containing the amorphous glass powder is placed in the outer layer, laminated, and integrated by thermocompression to obtain a laminated green sheet.
- the inner layer preferably occupies one-third or more, particularly half or more, of the total thickness.
- the thickness of the inner layer after lamination is preferably 0.2 to 3 mm, and the thickness of each of the outer layers is preferably 0.1 to 1.5 mm. If the inner layer is too thin, it is difficult to obtain the effect of improving the strength due to the difference in thermal expansion coefficient between the inner layer and the outer layer.
- the temperature difference T 1 -T 2 between the crystallization temperature T 1 of the inner layer and the softening point T 2 of the outer layer is preferably 50 to 120°C, more preferably 60 to 110°C. If T 1 -T 2 is too small, the substrate tends to warp. On the other hand, if T 1 -T 2 is too large, the diffusion of the conductor may increase.
- a sintered body can be obtained by firing the laminated green sheet.
- the sintered body thus produced has conductors and electrodes inside and on the surface.
- the firing temperature is desirably 1000.degree.
- the coefficient of thermal expansion of the inner layer is preferably higher than that of the outer layer.
- the difference between the thermal expansion coefficient of the inner layer and the thermal expansion coefficient of the outer layer is preferably 1.5 ppm/K or more, 1.6 ppm/K or more, particularly 1.7 ppm/K or more, and is 10 ppm. /K or less, 6 ppm/K or less, particularly preferably 5.3 ppm/K or less.
- the difference in coefficient of thermal expansion increases, compressive stress is likely to occur in the vicinity of the front and back surfaces of the sintered body, and the mechanical strength of the sintered body can be increased.
- the difference in coefficient of thermal expansion is too large, separation is likely to occur at the interface between the inner layer and the outer layer.
- the three-point bending strength of the produced sintered body is preferably 300 MPa or more, particularly 310 MPa or more. The higher the three-point bending strength, the less likely cracks or the like will occur in the sintered body.
- the high-frequency circuit member of the present invention is a high-frequency circuit member having a dielectric layer, and the dielectric layer is preferably the sintered body described above.
- the high-frequency circuit member of the present invention can be produced by forming a coil with wiring or by connecting a chip of a Si-based or GaAs-based semiconductor element on the surface of the sintered body produced as described above. can be done.
- Table 1 shows examples of the present invention (Sample Nos. 1 to 7) and a comparative example (Sample No. 8).
- R2O in Table 1 refers to Li2O + Na2O + K2O .
- CTE in Table 1 refers to the coefficient of thermal expansion.
- Each sample was prepared as follows. First, glass raw materials of various oxides were prepared so as to have the glass composition shown in Table 1, mixed uniformly, then placed in a platinum crucible and melted at 1400 to 1600 ° C. for 3 to 8 hours, followed by a water-cooled roller. The molten glass was formed into thin plates. Next, after crushing the resulting glass film, alcohol was added, wet pulverization was performed with a ball mill, and classification was performed so that the average particle size was 1.5 to 3 ⁇ m to obtain glass powder.
- the amount of ceramic powder (average particle size: 2 ⁇ m) shown in Table 1 was uniformly mixed with the above glass powder to obtain a glass-ceramic dielectric material.
- the crystal phase was identified by powder X-ray diffraction.
- the relative dielectric constant and dielectric loss tangent are measured by sintering the green sheet at 900° C., processing it into a size of 25 mm ⁇ 50 mm ⁇ 0.1 mm, and making it a measurement sample. It was measured at a measurement temperature of 25°C and a frequency of 28 GHz based on the microwave dielectric property measurement method (JIS R1641).
- the difference in thermal expansion coefficient between the inner layer and the outer layer was calculated by measuring the inner layer and the outer layer separately sintered at 900 ° C. in the temperature range of 30 to 380 ° C. with a thermomechanical analyzer. .
- the three-point bending strength was evaluated according to JIS R1601.
- the crystallization temperature T1 of the inner layer and the softening point T2 of the outer layer were measured using a macro - type differential thermal analyzer. Specifically, for the inner layer and outer layer before firing, the chart obtained by measuring up to 1050 ° C. at a temperature increase rate of 10 ° C./min using a macro-type differential thermal analyzer, the value of the fourth inflection point was taken as the softening point, and the strong exothermic peak was taken as the crystallization temperature. Also, the difference between the above crystallization temperature and softening point was calculated as T 1 -T 2 .
- sample No. 1 to 7 had a high three-point bending strength of 200 to 380 MPa because the difference in thermal expansion coefficient between the inner layer and the outer layer (inner layer CTE - outer layer CTE) was 1.8 to 5.3 ppm/K.
- the dielectric constant of the outer layer is as low as 3.8 to 4.0, attenuation of signals at frequencies above 20 GHz is reduced.
- sample No. In No. 8 the difference in thermal expansion coefficient between the inner layer and the outer layer (inner layer CTE-outer layer CTE) was -2.5 ppm/K, so the three-point bending strength was as low as 100 MPa.
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Abstract
Description
本発明の積層ガラスセラミック誘電体材料は、外層、内層、外層の順に積層された積層体であり、特に内層が結晶性ガラス粉末を含有し、外層が非晶質ガラス粉末を含有する積層体であることが好ましい。
本発明の高周波用回路部材は、配線でコイルを形成したり、上記のようにして作製した焼結体表面上にSi系やGaAs系の半導体素子のチップを接続したりすることで作製することができる。
Claims (12)
- 少なくとも外層、内層、外層の順に積層された積層構造を有し、前記外層は、焼結後の測定温度25℃、周波数28GHzにおける比誘電率が5.5以下となる材料からなり、且つ前記内層は、焼結後の熱膨張係数が、前記外層の焼結後の熱膨張係数より高くなる材料からなることを特徴とする積層ガラスセラミック誘電体材料。
- 前記内層は、焼結後の熱膨張係数が、前記外層の焼成後の熱膨張係数よりも1.5ppm/K以上高くなる材料からなることを特徴とする請求項1に記載の積層ガラスセラミック誘電体材料。
- 内層が、少なくとも結晶性ガラス粉末を含有することを特徴とする請求項1又は2に記載の積層ガラスセラミック誘電体材料。
- 外層が、少なくとも非晶質ガラス粉末を含有することを特徴とする請求項1~3の何れかに記載の積層ガラスセラミック誘電体材料。
- 積層グリーンシートの形態で使用に供されることを特徴とする請求項1~4の何れかに記載の積層ガラスセラミック誘電体材料。
- 請求項1~5の何れかに記載の積層ガラスセラミック誘電体材料を焼結させた焼結体であって、内層のガラスマトリクスから、アノーサイト、Sr長石、セルシアン、ディオプサイド及びウイレマイトから選ばれる一種類以上の結晶が析出することを特徴とする焼結体。
- 測定温度25℃、周波数28GHzにおける外層の比誘電率が4以下であることを特徴とする請求項6に記載の焼結体。
- 外層が実質的にセラミック粉末を含まないことを特徴とする請求項6又は7に記載の焼結体。
- 少なくとも外層、内層、外層の順に積層一体化された焼結体であって、測定温度25℃、周波数28GHzにおける外層の比誘電率が5.5以下であって、且つ内層の熱膨張係数が外層の熱膨張係数より高いことを特徴とする焼結体。
- 請求項1~5の何れかに記載の積層ガラスセラミック誘電体材料を焼成することを特徴とする焼結体の製造方法。
- 1000℃以下の温度で焼成することを特徴とする請求項10に記載の焼結体の製造方法。
- 誘電体層を有する高周波用回路部材であって、誘電体層が請求項6~9の何れかに記載の焼結体であることを特徴とする高周波用回路部材。
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KR1020237021780A KR20230142453A (ko) | 2021-02-05 | 2022-01-20 | 적층 유리 세라믹 유전체 재료, 소결체, 소결체의 제조방법 및 고주파용 회로 부재 |
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JP2003055034A (ja) * | 2001-08-21 | 2003-02-26 | Nippon Electric Glass Co Ltd | 積層ガラスセラミック材料及び積層ガラスセラミック焼結体 |
JP2003229675A (ja) * | 2001-11-29 | 2003-08-15 | Kyocera Corp | ガラスセラミック多層配線基板 |
JP2008053525A (ja) * | 2006-08-25 | 2008-03-06 | Murata Mfg Co Ltd | 多層セラミック基板およびその製造方法 |
JP2010206326A (ja) * | 2009-02-27 | 2010-09-16 | Kyocera Corp | 高周波基板、高周波基板を備える送信器、受信器、送受信器およびレーダ装置 |
JP2019161219A (ja) * | 2018-03-07 | 2019-09-19 | 日本電気硝子株式会社 | ガラスセラミック誘電体 |
JP2021011412A (ja) * | 2019-07-08 | 2021-02-04 | Tdk株式会社 | ガラスセラミックス焼結体および配線基板 |
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JPH09241068A (ja) | 1996-03-11 | 1997-09-16 | Sumitomo Metal Ind Ltd | 低温焼成セラミックス基板 |
KR101203892B1 (ko) | 2010-04-19 | 2012-11-23 | 주식회사 에스에프에이 | 레이저 용접장치 |
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Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2003055034A (ja) * | 2001-08-21 | 2003-02-26 | Nippon Electric Glass Co Ltd | 積層ガラスセラミック材料及び積層ガラスセラミック焼結体 |
JP2003229675A (ja) * | 2001-11-29 | 2003-08-15 | Kyocera Corp | ガラスセラミック多層配線基板 |
JP2008053525A (ja) * | 2006-08-25 | 2008-03-06 | Murata Mfg Co Ltd | 多層セラミック基板およびその製造方法 |
JP2010206326A (ja) * | 2009-02-27 | 2010-09-16 | Kyocera Corp | 高周波基板、高周波基板を備える送信器、受信器、送受信器およびレーダ装置 |
JP2019161219A (ja) * | 2018-03-07 | 2019-09-19 | 日本電気硝子株式会社 | ガラスセラミック誘電体 |
JP2021011412A (ja) * | 2019-07-08 | 2021-02-04 | Tdk株式会社 | ガラスセラミックス焼結体および配線基板 |
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