WO2022152023A1 - 一种等离子体增强化学气相沉积设备及其使用方法 - Google Patents

一种等离子体增强化学气相沉积设备及其使用方法 Download PDF

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Publication number
WO2022152023A1
WO2022152023A1 PCT/CN2022/070334 CN2022070334W WO2022152023A1 WO 2022152023 A1 WO2022152023 A1 WO 2022152023A1 CN 2022070334 W CN2022070334 W CN 2022070334W WO 2022152023 A1 WO2022152023 A1 WO 2022152023A1
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WIPO (PCT)
Prior art keywords
tray
trays
support
electrode plates
vapor deposition
Prior art date
Application number
PCT/CN2022/070334
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English (en)
French (fr)
Inventor
杨宝海
杨娜
潘家永
许伟伟
宋玉超
李轶军
李翔
李敦信
李义升
Original Assignee
营口金辰机械股份有限公司
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Publication of WO2022152023A1 publication Critical patent/WO2022152023A1/zh

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4586—Elements in the interior of the support, e.g. electrodes, heating or cooling devices
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Definitions

  • the present application relates to the technical field of solar cells, and in particular, to a plasma-enhanced chemical vapor deposition apparatus and a method for using the same.
  • PECVD Plasma Enhanced Chemical Vapor Deposition, plasma enhanced chemical vapor deposition
  • tubular PECVD the shape of the electrodes is flat, the tray supports the battery, the battery is placed with the tray between the two flat electrodes to form a discharge circuit, the gas forms plasma under the action of the electric field, and finally completes the coating of the battery.
  • the tray supporting the battery slices may be greatly deformed, resulting in the tray's geometric tolerance and control accuracy exceeding the allowable range.
  • the embodiments of the present application are expected to provide a plasma enhanced chemical vapor deposition apparatus and a method for using the same, so as to alleviate the deformation of the tray.
  • an embodiment of the present application provides a plasma-enhanced chemical vapor deposition equipment, comprising:
  • a tray group the tray group is configured to be able to move in or out between two adjacent electrode plates, the tray group includes a plurality of trays for supporting battery slices, the battery slices and the trays are along the thickness direction of the tray Stacking; when the tray group is located between two adjacent electrode plates, any two trays are staggered from each other along the thickness direction of the tray, and the two adjacent electrode plates are respectively located on the tray along the tray. both sides in the thickness direction.
  • the plasma-enhanced chemical vapor deposition apparatus further includes a fixture and a plurality of process chambers, at least one of the process chambers is provided with the electrode plate, and the fixture is configured to attach the electrode plate in one of the process chambers.
  • the tray is transferred to another process chamber.
  • the fixture includes:
  • a first transfer drive device in driving connection with the main body support, the first transfer drive device configured to drive the main body support to move between the process chambers;
  • a gripper is connected to the side of the main body bracket away from the first conveying driving device, and the gripper is configured to pick up and place the tray.
  • each of the trays is correspondingly provided with one of the grippers.
  • the fixture includes:
  • a second transfer drive connected to the support, the second transfer drive configured to drive the support to move between the process chambers;
  • a support arm is connected with the support member, and the support arm is configured to pick up and place the tray.
  • the number of the support arms is multiple, and the multiple support arms are arranged in parallel.
  • Each of the supporting arms supports a plurality of the trays arranged along the length direction of the supporting arms.
  • the tray is formed with a support groove, the support groove is configured to support the battery sheet, the support groove is located on one side of the tray along the thickness direction of the tray, and the tray The side away from the support groove is isolated from the support groove; when the tray group is located between two adjacent electrode plates, the two adjacent electrode plates are located at the place away from the tray. The electrode plate on one side of the bracket is in contact with the tray.
  • the tray is formed with a support groove, the support groove is configured to support the battery sheet, and the depth of the support groove is 0.1 mm ⁇ 2 mm.
  • the shape of the tray is rectangular, a plurality of the trays are distributed in a matrix, and each tray is formed with a plurality of supporting grooves, the supporting grooves are configured to support the battery slices, so
  • the shape of the support groove is a rectangle, and a plurality of the support grooves are distributed in a matrix.
  • each of the trays is formed with a positioning hole, and the positioning hole is configured to determine the position of the tray between two adjacent electrode plates.
  • a second aspect of the embodiments of the present application provides a method for using a plasma-enhanced chemical vapor deposition apparatus, where the plasma-enhanced chemical vapor deposition apparatus is any of the above-mentioned plasma-enhanced chemical vapor deposition apparatuses; the using method includes the following: step:
  • Plasma-enhanced chemical vapor deposition coating is performed on the battery sheet between two adjacent electrode plates.
  • any two trays are staggered from each other along the thickness direction of the tray, so that the plurality of trays are roughly distributed along the plane, and two adjacent trays are
  • the electrode plates are located on both sides of the tray along the thickness direction of the tray, and between two adjacent electrode plates are a plurality of trays roughly distributed along the plane, which is equivalent to dividing the entire tray between the two adjacent electrode plates into two parts.
  • Multiple pallets are used to reduce the area of a single pallet.
  • the area of a single tray is reduced, and the total area of multiple trays is still large enough to place a sufficient number of cells, so that a sufficient number of cells can be coated for each PECVD coating on two adjacent electrode plates. It can ensure the production capacity of a single equipment, and the area of a single pallet is relatively small, which can improve the anti-deformation ability of the pallet to a certain extent, alleviate or even eliminate the deformation of the pallet during the handling process, so that the shape and position tolerance and control accuracy of the pallet can be improved. Basically within the allowable range.
  • FIG. 1 is a schematic structural diagram of an electrode plate and a tray group of a plasma-enhanced chemical vapor deposition apparatus according to an embodiment of the application;
  • FIG. 2 is a schematic structural diagram of a tray group according to an embodiment of the application.
  • FIG. 3 is a schematic structural diagram of a tray according to an embodiment of the application.
  • Fig. 4 is the sectional view at position A-A in Fig. 3;
  • FIG. 5 is a schematic diagram of a clamp picking up an entire pallet group at one time according to an embodiment of the application, in which the pallets in the pallet group are picked up by a gripper;
  • FIG. 6 is a schematic diagram of a clamp picking up an entire tray group at one time according to an embodiment of the application, in which the trays in the tray group are picked up by a support arm;
  • FIG. 7 is a schematic diagram of the assembly of a tray group and a frame according to an embodiment of the application.
  • FIG. 8 is a schematic structural diagram of a skeleton according to an embodiment of the present application.
  • orientation or positional relationship are based on the orientation or positional relationship shown in FIG. 1 .
  • the direction indicated by arrow B in the figure is the thickness direction of the tray.
  • the direction indicated by arrow C in the figure is the length direction of the support arm.
  • PECVD For plate type PECVD, in the prior art, a whole tray is usually moved between two electrode plates, and PECVD coating is performed on all the cells on the whole tray together, each time PECVD coating is performed, two electrode plates are There is only one tray in between. After the coating is completed, the cells need to be removed from between the electrode plates together with the whole tray. With the development of technology, the area of the electrode plate is getting larger and larger.
  • the area of the entire tray placed between the two electrode plates is also Correspondingly, it becomes larger and larger, and the area of the whole pallet is so large that the pallet will be deformed greatly during the handling process, resulting in the shape and position tolerance and control accuracy of the pallet exceeding the allowable range.
  • FIG. 1 which includes a tray group 2 and a plurality of electrode plates 1 .
  • the tray group 2 is configured to be able to move in or out between two adjacent electrode plates 1 .
  • the tray group 2 includes a plurality of trays 21 for supporting battery sheets. The battery sheets and the trays 21 are stacked along the thickness direction of the trays. When the tray group 2 is located between two adjacent electrode plates 1, any two trays 21 are staggered from each other along the thickness direction of the tray, and the two adjacent electrode plates 1 are located on both sides of the tray 21 along the thickness direction of the tray respectively.
  • any two trays 21 are staggered from each other along the thickness direction of the tray, so that the plurality of trays 21 are roughly distributed along the plane, and the two adjacent electrode plates 1 are respectively located at On both sides of the tray 21 along the thickness direction of the tray, between two adjacent electrode plates 1 are a plurality of trays 21 that are roughly distributed along the plane, which is equivalent to dividing the entire tray 21 originally between the two adjacent electrode plates 1 .
  • the multi-piece tray 21 is formed, and the area of the single-piece tray 21 is reduced.
  • the area of the single tray 21 is reduced, and the total area of the multiple trays 21 is still large enough to accommodate a sufficient number of cells, so that each PECVD coating of the adjacent two electrode plates 1 can complete a sufficient number of cells. Coating treatment can ensure the production capacity of a single device.
  • the area of a single tray 21 is relatively small, which can improve the deformation resistance of the tray 21 to a certain extent, alleviate or even eliminate the deformation of the tray 21 during the transportation process, so that the tray 21 has a relatively small area. Geometric tolerances and control accuracy can be substantially within the allowable range.
  • the single tray 21 by reducing the area of the single tray 21 to improve the deformation resistance of the tray 21, it is not necessary to increase the thickness of the tray 21 in order to improve the deformation resistance of the tray 21, and even the thickness of the tray 21 can be reduced to a certain extent. , which reduces the consumption of heat on the tray 21 , which is beneficial for the electrode plate 1 to transfer heat to the battery slices relatively quickly through the tray 21 , so that the battery slices are heated quickly and the production efficiency is improved.
  • the single tray 21 has a small area and does not need to increase the thickness of the tray 21 , which makes the tray 21 more convenient to manufacture and can reduce the process cost of the tray 21 , and the thinner tray 21 can reduce the material cost of the tray 21 .
  • the tray group 2 is moved in or out between two adjacent electrode plates 1, that is, all the trays 21 of the tray group 2 are moved in or out between the two adjacent electrode plates 1, and the handling process of the tray 21 includes the tray 21 The process of moving in or out of two adjacent electrode plates 1.
  • any two trays 21 are staggered along the tray thickness direction, that is, any two trays 21 do not overlap in the tray thickness direction.
  • the battery slices are placed on the tray 21, and the purpose of transporting the battery slices is achieved by the transportation of the tray 21.
  • the tray 21 can play a role in protecting the battery slices, avoiding damage to the battery slices caused by direct handling of the battery slices, and improving the performance of the battery slices. equipment yield.
  • two adjacent electrode plates 1 are usually arranged in the up-down direction.
  • two adjacent electrode plates 1 may be arranged in other directions than the up-down direction.
  • the material of the tray 21 may be aluminum alloy, carbon-carbon composite material, graphite, titanium alloy, carbon fiber, stainless steel, glass, or the like.
  • the deformation resistance of the tray 21 is improved, and the tray 21 does not necessarily need to be made of a material with a higher deformation resistance.
  • the material of the tray 21 may be aluminum alloy, which is relatively cheap, which is beneficial to reduce costs.
  • the cells are generally silicon wafers.
  • the size of the battery sheet is about 125mm-300mm.
  • each tray 21 is formed with a positioning hole 211 , and the positioning hole 211 is configured to determine the position of the tray 21 between two adjacent electrode plates 1 .
  • each tray 21 is positioned through the positioning holes 211, so that multiple trays 21 can be arranged in an orderly manner between two adjacent electrode plates 1, which is conducive to placing more trays 21 and corresponding batteries. It can better ensure the productivity of a single device, and avoid the waste of space between two adjacent electrode plates 1 caused by disorderly arrangement of the multiple trays 21 of the tray group 2 .
  • each tray 21 is provided with positioning holes 211 at diagonal positions.
  • each tray 21 is formed with a plurality of support grooves 212 , and the support grooves 212 are configured to support battery slices. In this way, the battery pieces are placed in the support groove 212 , so that the battery pieces are arranged in an orderly manner on the tray 21 .
  • the support groove 212 is located on one side of the tray 21 along the thickness direction of the tray, and the side of the tray 21 away from the support groove 212 is isolated from the support groove 212 .
  • the depth H of the support grooves 212 should not be too deep or too shallow. If too shallow, it is unfavorable for the support grooves 212 to limit the battery slices, and the battery slices may slide out of the support grooves 212. A plasma film is deposited on the cell surface. In one embodiment, the depth H of the support groove 212 is 0.1 ⁇ 2 mm. In this way, the depth H of the support groove 212 is suitable, which can not only achieve the purpose of limiting the position of the cell, but also better perform PECVD coating on the cell.
  • the shape of the cells of the solar photovoltaic cell is generally rectangular.
  • the shape of the support groove 212 is a rectangle.
  • the shape of the support grooves 212 is rectangular, the plurality of support grooves 212 are distributed in a matrix, the shape of the tray 21 is rectangular, and the plurality of trays 21 are distributed in a matrix .
  • Such a structure makes the distribution of the support grooves 212 and the distribution of the trays 21 relatively compact, the edges of the adjacent support grooves 212 can be well matched, and the edges of the adjacent trays 21 can be well matched, which is conducive to making full use of In the space between two adjacent electrode plates 1, more battery sheets are laid, so as to avoid waste of space between two adjacent electrode plates 1.
  • the shape of the tray 21 is rectangular, and the nine trays 21 are distributed in a matrix of 3 rows and 3 columns.
  • the shape of the support grooves 212 is rectangular, and each tray 21 has four support grooves 212 , and the four support grooves 212 are distributed in a matrix of 2 rows and 2 columns.
  • the plurality of trays 21 of the tray group 2 may be in a matrix distribution of 1 row and 2 columns, a matrix distribution of 1 row and 3 columns, a matrix distribution of 2 rows and 2 columns, a matrix distribution of 2 rows and 3 columns, and a matrix distribution of 2 rows and 4 columns.
  • the plurality of supporting grooves 212 of each tray 21 may be in a matrix distribution of 1 row and 1 column, a matrix distribution of 1 row and 2 columns, a matrix distribution of 1 row and 3 columns, a matrix distribution of 2 rows and 2 columns, Matrix distribution with 2 rows and 3 columns, matrix distribution with 2 rows and 4 columns, matrix distribution with 3 rows and 3 columns, matrix distribution with 3 rows and 4 columns, matrix distribution with 3 rows and 5 columns, or matrix distribution with 10 rows and 10 columns, etc.
  • all the supporting grooves 212 between two adjacent electrode plates 1 may be distributed in a matrix of 8 rows and 8 columns, a matrix distribution of 9 rows and 9 columns, or a matrix distribution of 10 rows and 10 columns.
  • the shape of the trays 21 is rectangular, and the ten trays 21 are distributed in a matrix of 2 rows and 5 columns.
  • the shape of the supporting grooves 212 is rectangular, and each tray 21 has 10 supporting grooves 212 , and the 10 supporting grooves 212 are arranged in a matrix of 5 rows and 2 columns.
  • the electrode plates 1, the tray 21 and the battery sheets on the tray 21 are usually in a vacuum state. .
  • the vacuum state is also the negative pressure state.
  • the negative pressure is relatively large and the air is relatively thin.
  • the plasma enhanced chemical vapor deposition apparatus further includes a fixture 3 and a plurality of process chambers, at least one process chamber is provided with an electrode plate 1, and the fixture 3 is configured to transfer the tray 21 in one of the process chambers to another. inside a process chamber.
  • at least one process chamber is provided with an electrode plate 1
  • the PECVD coating treatment of the battery sheets on the tray 21 is usually carried out in the corresponding process chamber, and the tray 21 of the tray group 2 can pass through the fixture 3 from one of the process chambers. Transfer to another process chamber with electrode plate 1, and move tray group 2 between two adjacent electrode plates 1.
  • electrode plate 1 is placed on tray 21. After the coating is completed, the tray group 2 is taken out from between the two adjacent electrode plates 1, and the battery is transferred from the process chamber with the electrode plate 1 to other processes through the fixture 3.
  • the transfer of the tray 21 between different process chambers is realized through the fixture 3 .
  • the trays 21 of the tray group 2 can be transferred from one of the process chambers to another process chamber with the electrode plate 1 through the jig 3, and one of the process chambers here can be a process chamber with the electrode plate 1
  • the process chamber can also be a chamber without the electrode plate 1 for conveying the tray 21 .
  • the cell sheet is transferred from the process chamber with the electrode plate 1 to other process chambers through the fixture 3, and the other process chambers here can be the process chamber with the electrode plate 1 or the process chamber with the electrode plate 1. is the chamber for the transfer tray 21 without the electrode plate 1
  • the transport process of the tray 21 also includes the process of transporting the tray 21 between different process chambers.
  • the tray group 2 can be moved into or out of two adjacent electrode plates 1 through the clamp 3 .
  • all the trays 21 in the tray group 2 can be moved into or out of two adjacent electrode plates 1 together through the clamp 3 .
  • all the trays 21 in the tray group 2 can be moved into or out of two adjacent electrode plates 1 in sequence through the clamp 3 .
  • the process chamber is usually in a vacuum state.
  • the clamp 3 includes a main body bracket 31 , a first transmission driving device 32 and a gripper 33 .
  • the first conveying driving device 32 is drivingly connected with the main body support 31, and the first conveying driving device 32 is configured to drive the main body support 31 to move between the respective process chambers.
  • the gripper 33 is connected to the side of the main body bracket 31 away from the first conveying driving device 32 , and the gripper 33 is configured to pick up and place the tray 21 .
  • the pallet 21 is picked and placed by the gripper 33
  • the main body bracket 31 is driven to move by the first transmission driving device 32
  • the main body bracket 31 drives the gripper 33 carrying the pallet 21 to move, so that the pallet 21 is moved between different chambers send.
  • the first transmission driving device 32 may be driven by a roller, and the power source drives the roller to roll on a corresponding track to drive the main body bracket 31 to move.
  • the first transmission driving device 32 may be driven by a link.
  • the power source drives the link mechanism to drive the main body bracket 31 to move.
  • each tray 21 is correspondingly provided with a gripper 33 .
  • all the trays 21 in the tray group 2 can be grabbed at one time and transferred to the corresponding positions.
  • all the trays 21 of the tray group 2 are grasped by the gripper 33 and moved into or out of two adjacent electrode plates 1 together.
  • the plurality of grippers 33 are distributed in a matrix.
  • the nine grippers 33 are arranged in a matrix of 3 rows and 3 columns, and the grippers 33 correspond to the trays 21 one-to-one.
  • all the trays 21 in the tray group 2 can also be moved into or out of two adjacent electrode plates 1 in sequence through the gripper 33 .
  • the gripper 33 may be an active gripper, and the active gripper can actively release or grasp the tray 21.
  • the gripper 33 may be a passive gripper, and the passive gripper will not actively release or grasp the tray 21 .
  • a hook portion 331 is formed on the bottom of the passive gripper, and the hook portion 331 abuts under the tray 21 to hold the tray 21 to grasp the tray 21 .
  • the gripper 33 may be a vacuum manipulator, and the tray 21 is adsorbed by the vacuum manipulator.
  • all trays 21 of the tray group 2 may be sucked together by a vacuum manipulator, so as to grasp all the trays 21 of the tray group 2 .
  • all the trays 21 of the tray group 2 adsorbed by the vacuum manipulator can be released together, so as to place all the trays 21 of the tray group 2 to corresponding positions.
  • the gripper 33 may be replaced with a suction cup.
  • the clamp 3 includes a support member 34 , a second transmission driving device 35 and a support arm 36 .
  • the second conveyor is connected to the support 34, and the second conveyor drive 35 is configured to drive the support 34 to move between the process chambers.
  • the support arm 36 is connected to the support 34 , and the support arm 36 is configured to pick up and place the tray 21 .
  • the second conveying driving device 35 drives the supporting member 34 to move, and the supporting member 34 drives the supporting arm 36 supporting the tray 21 to move, thereby completing the transmission of the tray 21 between different process chambers through the supporting arm 36 .
  • the tray group 2 can be moved into or out of two adjacent electrode plates 1 through the support arm 36 .
  • each support arm 36 supports a plurality of trays 21 arranged along the length direction of the support arm 36 .
  • the supporting arm 36 can support a row of trays 21 or a row of trays 21 of the tray group 2, and can easily pick and place the trays 21.
  • the support arm 36 can grab all the trays 21 of the tray group 2 together, and thus can move all the trays 21 of the tray group 2 into or out of the space between two adjacent electrode plates 1 together.
  • the electrode plate 1, the tray 21 and the battery are usually in a vacuum state.
  • the electrode plate 1 is usually a flat plate, and it is difficult to contact the battery on the tray 21 to heat the battery.
  • a vacuum state it is difficult for the heat of the electrode plate 1 to be quickly transferred to the battery sheet in a state of being isolated, which affects the production efficiency.
  • the support groove 212 is located on one side of the tray 21 along the thickness direction of the tray, and the side of the tray 21 away from the support groove 212 is isolated from the support groove 212 .
  • the electrode plate 1 located on the side of the tray 21 away from the supporting groove 212 abuts against the tray 21 .
  • the electrode plate 1 located in the bracket slot 212 is in contact with the tray 21.
  • the battery sheet can be in contact with the tray 21 on its entire surface, and the contact area between the tray 21 and the electrode plate 1 is increased, which is beneficial to the relatively rapid heat transfer from the electrode plate 1 to the battery sheet.
  • the thickness of the single tray 21 is relatively thin, which is conducive to the relatively rapid transfer of the heat of the electrode plate 1 to the battery sheet.
  • the electrode plate 1 facing the supporting groove 212 usually forms a gap with the battery sheet, so that the process gas enters the gap to form plasma.
  • two adjacent electrode plates 1 are arranged in the up-down direction, the support groove 212 is facing upward, and the bottom of the tray 21 is in contact with the electrode plate 1 below.
  • the number of cells coated in a single process chamber can reach about 100-400 cells.
  • the plasma enhanced chemical vapor deposition apparatus further includes a frame 4 , and all trays of the tray group are placed on the frame 4 .
  • the frame 4 is formed with an accommodating cavity 43 , and one accommodating cavity 43 is correspondingly provided for each tray.
  • all the pallets of the pallet group are placed on an integral skeleton 4, and all pallets of the pallet group can be transported together through the transportation of the skeleton 4, and all the pallets of the pallet group can be moved relatively quickly together with the skeleton. Move out between two adjacent electrode plates to improve production efficiency.
  • the deformation resistance of a single tray is improved. Even if the deformation resistance of the skeleton 4 is poor, it will not have much influence on the battery slices on the tray. The choice of materials is relatively free.
  • the accommodating cavity 43 is a through hole.
  • the solid material part of the frame 4 is basically arranged around each tray, and the frame 4 uses relatively less material, which can save costs to a certain extent.
  • the accommodating cavity 43 may also be formed on one side of the frame 4 , and the side of the frame 4 facing away from the accommodating cavity 43 is isolated from the accommodating cavity 43 .
  • the tray 21 when the accommodating cavity 43 is a through hole, the tray 21 can be exposed to the electrode plate 1 through the through hole, the electrode plate 1 can be in direct contact with the tray 21, and the electrode plate 1 can transfer heat through the tray 21 to the electrode plate 1 placed on the tray.
  • the cells on 21 are beneficial to improve heat transfer efficiency. It is avoided that the heat of the electrode plate is first transferred to the frame 4, then transferred to the tray through the frame 4, and then transferred to the battery slices on the tray.
  • the material of the skeleton 4 may be aluminum alloy, carbon-carbon composite material, graphite, titanium alloy, carbon fiber, stainless steel, glass, or the like.
  • the elastic modulus of the material of the frame 4 is greater than the elastic modulus of the material of the tray.
  • the deformation resistance of the skeleton 4 can be improved to a certain extent, thereby reducing the load imposed on the pallet due to the deformation of the skeleton 4.
  • the elastic modulus is small, the pallet will not deform greatly or even not deform.
  • the material with larger elastic modulus is more expensive.
  • the frame 4 and the tray use two different elastic modulus materials according to the actual situation. On the one hand, the deformation of the tray can be alleviated to a certain extent. Indiscriminate use of materials with higher elastic modulus can reduce production costs.
  • the frame 4 includes a frame 42 and a dividing net 41 , and the dividing net 41 is located in the area enclosed by the frame 42 to divide the area enclosed by the frame 42 into a plurality of accommodating cavities 43 , and the separation The net 41 is connected to the frame 42 .
  • the partition net 41 by disposing the partition net 41 in the frame 42, the area enclosed by the frame 42 is divided into a plurality of accommodating cavities 43 for accommodating the trays.
  • the dividing net 41 includes a first dividing bar 411 and a second dividing bar 412 which are connected to each other, and the first dividing bar 411 and the second dividing bar 412 form a predetermined angle.
  • the first dividing bar 411 and the second dividing bar 412 form a criss-cross net shape, so that the area surrounded by the frame 42 is divided into a plurality of accommodating cavities 43 .
  • the shape of the battery sheet is generally rectangular, correspondingly, the shape of the supporting groove on the tray and the tray are both rectangular.
  • the predetermined included angle is 90 degrees. In this way, the shape of the accommodating cavity 43 can be adapted to the shape of the tray as much as possible, and the tray can be accommodated in the smallest space possible, so that the space can be fully utilized and space waste is avoided.
  • the accommodating groove is a through hole
  • the frame 4 is formed with a supporting hook 44
  • each accommodating groove is provided with a supporting hook 44
  • the tray is provided on the supporting hook 44 .
  • both the first separating bar 411 and the frame 42 are formed with hooks 44 .
  • one of the electrode plates 1 of the two adjacent electrode plates 1 is a contact electrode plate.
  • the hook 44 is located on the side of the frame 4 facing the contact electrode plate.
  • two adjacent electrode plates 1 are arranged in an up-down direction, and the electrode plate 1 located below is a contact electrode plate.
  • the brackets 44 are located on the underside of the frame 4 .
  • the clamp 3 can move the frame 4 and the tray group 2 located on the frame 4 into or out of the space between two adjacent electrode plates 1 by grasping the frame 4 .
  • a second aspect of the embodiments of the present application provides a method for using a plasma-enhanced chemical vapor deposition apparatus, where the plasma-enhanced chemical vapor deposition apparatus is any of the above-mentioned plasma-enhanced chemical vapor deposition apparatuses.
  • the method of use includes the following steps:
  • Plasma-enhanced chemical vapor deposition coating is performed on the cells between two adjacent electrode plates 1 .

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Abstract

本申请实施例提供一种等离子体增强化学气相沉积设备及其使用方法，当托盘组位于相邻两块电极板之间，任意两块托盘沿托盘厚度方向相互错开，使得多块托盘大致沿平面分布，相邻两块电极板分别位于托盘沿托盘厚度方向的两侧，相邻两块电极板之间是大致沿平面分布的多块托盘，相当于将原来处于相邻两块电极板之间的整块托盘分割成了多块托盘，减小了单块托盘的面积。单块托盘的面积减小，多块托盘的总面积仍然足够大，能够放置足够数量的电池片，能够确保单台设备的产能，单块托盘的面积相对较小，在一定程度上能够提高托盘的抗变形能力，缓解甚至消除托盘在搬运过程中的变形，使得托盘的形位公差和控制精度能够基本上处于允许的范围内。

Description

一种等离子体增强化学气相沉积设备及其使用方法
相关申请的交叉引用
本申请基于申请号为202110047995.7、申请日为2021年01月14日的中国专利申请提出，并要求该中国专利申请的优先权，该中国专利申请的全部内容在此引入本申请作为参考。
技术领域
本申请涉及太阳能电池技术领域，尤其涉及一种等离子体增强化学气相沉积设备及其使用方法。
背景技术
在太阳能电池制作过程中，需要对电池片镀膜，常用的镀膜方式为PECVD(Plasma Enhanced Chemical Vapor Deposition，等离子体增强化学气相沉积)镀膜，PECVD分为管式PECVD和板式PECVD，对于板式PECVD而言，其电极的形状呈平板状，托盘承托电池片，电池片随托盘一起放置到两个平板状的电极之间形成放电回路，气体在电场作用下形成等离子体，最终完成电池片的镀膜。在使用过程中，承托电池片的托盘可能发生较大的变形导致托盘的形位公差和控制精度超出了允许的范围。
发明内容
有鉴于此，本申请实施例期望提供一种等离子体增强化学气相沉积设备及其使用方法，以缓解托盘的变形。
为达到上述目的，本申请实施例提供一种等离子体增强化学气相沉积设备，包括：
多块电极板；以及
托盘组，所述托盘组配置为能够移入或移出相邻两块所述电极板之间，所述托盘组包括多块承托电池片的托盘，所述电池片与所述托盘沿托盘厚度方向叠置；当所述托盘组位于相邻两块所述电极板之间，任意两块托盘沿所述托盘厚度方向相互错开，相邻两块所述电极板分别位于所述托盘沿所述托盘厚度方向的两侧。
一实施例中，所述等离子体增强化学气相沉积设备还包括夹具和多个工艺腔室，至少一个所述工艺腔室内设置有所述电极板，所述夹具配置为将其中一个工艺腔室内的托盘传送至另一个工艺腔室内。
一实施例中，所述夹具包括：
主体支架；
第一传送驱动装置，与所述主体支架驱动连接，所述第一传送驱动装置配置为驱动所述主体支架在各工艺腔室之间移动；以及
抓手，连接在所述主体支架背离所述第一传送驱动装置的一侧，所述抓手配置为取放所述托盘。
一实施例中，每块所述托盘对应设置有一个所述抓手。
一实施例中，所述夹具包括：
支撑件；
第二传送驱动装置，与所述支撑件连接，所述第二传送驱动装置配置为驱动所述支撑件在各工艺腔室之间移动；以及
承托臂，与所述支撑件连接，所述承托臂配置为取放所述托盘。
一实施例中，所述承托臂的数量为多个，多个所述承托臂平行设置，在承托臂将其中一个工艺腔室内的托盘传送至另一个工艺腔室内的过程中，每个所述承托臂承托有沿所述承托臂的长度方向排列的多块所述托盘。
一实施例中，所述托盘形成有承托槽，所述承托槽配置为承托所述电 池片，所述承托槽位于所述托盘沿所述托盘厚度方向的一侧，所述托盘背离所述承托槽的一侧与所述承托槽隔离；当所述托盘组位于相邻两块所述电极板之间，相邻两块所述电极板中，位于所述托盘背离所述承托槽一侧的电极板与所述托盘抵接。
一实施例中，所述托盘形成有承托槽，所述承托槽配置为承托所述电池片，所述承托槽的深度为0.1mm～2mm。
一实施例中，所述托盘的形状呈矩形，多块所述托盘呈矩阵分布，每块所述托盘形成有多个承托槽，所述承托槽配置为承托所述电池片，所述承托槽的形状为矩形，多个所述承托槽呈矩阵分布。
一实施例中，每块所述托盘均形成有定位孔，所述定位孔配置为确定所述托盘在相邻两块所述电极板之间的位置。
本申请实施例第二方面提供一种等离子体增强化学气相沉积设备的使用方法，所述等离子体增强化学气相沉积设备为上述任一种的等离子体增强化学气相沉积设备；所述使用方法包括以下步骤：
将电池片放置在所述托盘上；
将所述托盘组的所有托盘一起移入相邻两块所述电极板之间；
对相邻两块所述电极板之间的电池片进行等离子体增强化学气相沉积镀膜。
本申请实施例的等离子体增强化学气相沉积设备，当托盘组位于相邻两块电极板之间，任意两块托盘沿托盘厚度方向相互错开，使得多块托盘大致沿平面分布，相邻两块电极板分别位于托盘沿托盘厚度方向的两侧，相邻两块电极板之间是大致沿平面分布的多块托盘，相当于将原来处于相邻两块电极板之间的整块托盘分割成了多块托盘，减小了单块托盘的面积。单块托盘的面积减小，多块托盘的总面积仍然足够大，能够放置足够数量的电池片，使得相邻两块电极板每进行一次PECVD镀膜能够完成对足够数 量的电池片的镀膜处理，能够确保单台设备的产能，单块托盘的面积相对较小，在一定程度上能够提高托盘的抗变形能力，缓解甚至消除托盘在搬运过程中的变形，使得托盘的形位公差和控制精度能够基本上处于允许的范围内。
附图说明
图1为本申请一实施例的等离子体增强化学气相沉积设备的电极板和托盘组的结构示意图；
图2为本申请一实施例的托盘组的结构示意图；
图3为本申请一实施例的托盘的结构示意图；
图4为图3中位置A-A处的剖视图；
图5为本申请一实施例的夹具一次拾取整个托盘组的示意图，图中通过抓手拾取托盘组中的托盘；
图6为本申请一实施例的夹具一次拾取整个托盘组的示意图，图中通过承托臂拾取托盘组中的托盘；
图7为本申请一实施例的托盘组与骨架的装配示意图；
图8为本申请一实施例的骨架的结构示意图。
附图标记说明：电极板1；托盘组2；托盘21；定位孔211；承托槽212；夹具3；主体支架31；第一传送驱动装置32；抓手33；钩状部331；支撑件34；第二传送驱动装置35；承托臂36；骨架4；分隔网41；第一分隔条411；第二分隔条412；边框42；容纳腔43；托钩44。
具体实施方式
需要说明的是，在不冲突的情况下，本申请中的实施例及实施例中的技术特征可以相互组合，具体实施方式中的详细描述应理解为本申请宗旨的解释说明，不应视为对本申请的不当限制。
在本申请实施例的描述中，“上”、“下”、“顶”、“底”、方位或位置关系为基于附图1所示的方位或位置关系。在本申请实施例的描述中，请参阅图4，图中箭头B所示方向为托盘厚度方向。在本申请实施例的描述中，请参阅图6，图中箭头C所示方向为承托臂的长度方向。需要理解的是，这些方位术语仅是为了便于描述本申请和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请的限制。
作为本申请创造性构思的一部分，在描述本申请的实施例之前，需对现有技术中，托盘发生变形的原因进行分析，通过合理分析得到本申请实施例的技术方案。
对于板式PECVD而言，现有技术中，通常将一整块托盘移入两块电极板之间，并对整块托盘上的所有电池片一起进行PECVD镀膜，每次进行PECVD镀膜，两块电极板之间仅有一块托盘，镀膜完成后，需要将电池片随整块托盘一起从电极板之间移出。随着技术的发展，电极板的面积越来越大，为了充分利用面积增大的电极板对更多数量的电池片进行PECVD镀膜，放入两块电极板之间的整块托盘的面积也相应地越来越大，整块托盘的面积大到一定程度使得托盘在搬运过程中会发生较大的变形导致托盘的形位公差和控制精度超出了允许的范围。
鉴于此，本申请实施例提供一种等离子体增强化学气相沉积设备，请参阅图1，包括托盘组2和多块电极板1。托盘组2配置为能够移入或移出相邻两块电极板1之间，托盘组2包括多块承托电池片的托盘21，电池片与托盘21沿托盘厚度方向叠置。当托盘组2位于相邻两块电极板1之间，任意两块托盘21沿托盘厚度方向相互错开，相邻两块电极板1分别位于托盘21沿托盘厚度方向的两侧。如此结构形式，当托盘组2位于相邻两块电极板1之间，任意两块托盘21沿托盘厚度方向相互错开，使得多块托盘21 大致沿平面分布，相邻两块电极板1分别位于托盘21沿托盘厚度方向的两侧，相邻两块电极板1之间是大致沿平面分布的多块托盘21，相当于将原来处于相邻两块电极板1之间的整块托盘21分割成了多块托盘21，减小了单块托盘21的面积。单块托盘21的面积减小，多块托盘21的总面积仍然足够大，能够放置足够数量的电池片，使得相邻两块电极板1每进行一次PECVD镀膜能够完成对足够数量的电池片的镀膜处理，能够确保单台设备的产能，单块托盘21的面积相对较小，在一定程度上能够提高托盘21的抗变形能力，缓解甚至消除托盘21在搬运过程中的变形，使得托盘21的形位公差和控制精度能够基本上处于允许的范围内。另外，通过减小单块托盘21的面积以提高托盘21的抗变形能力，不需要为了提高托盘21的抗变形能力而增加托盘21的厚度，甚至还可以在一定程度上减小托盘21的厚度，减小了热量在托盘21上的消耗，有利于电极板1通过托盘21较为快速地向电池片传递热量，使电池片快速加热，提高生产效率。单块托盘21面积较小且不需要增加托盘21的厚度使得托盘21的制作较为方便，能够降低托盘21的工艺成本，托盘21较薄能够减小托盘21的材料成本。
需要解释的是，托盘组2移入或移出相邻两块电极板1之间，也就是托盘组2的所有托盘21移入或移出相邻两块电极板1之间，托盘21的搬运过程包括托盘21移入或移出相邻两块电极板1的过程。
需要解释的是，任意两块托盘21沿托盘厚度方向相互错开，也就是任意两块托盘21沿托盘厚度方向不重叠。
可以理解的是，电池片放置在托盘21上，通过托盘21的搬运达到搬运电池片的目的，托盘21能够起到保护电池片的作用，避免直接对电池片进行搬运造成电池片的损伤，提高设备的良率。
一实施例中，请参阅图1，相邻两块电极板1通常沿上下方向排列。
一实施例中，相邻两块电极板1可以沿上下方向以外的其它方向排列。
一实施例中，托盘21的材质可以为铝合金、碳-碳复合材料、石墨、钛合金、碳纤维、不锈钢或玻璃等。
可以理解的是，由于单块托盘21的面积减小提高了托盘21的抗变形能力，托盘21并不一定需要采用抗变形能力较大的材料制作。一实施例中，托盘21的材质可以为铝合金，铝合金价格相对较便宜，有利于降低成本。
一实施例中，电池片通常是硅片。
一实施例中，电池片的尺寸大约为125mm-300mm。
一实施例中，请参阅图2和图3，每块托盘21形成有定位孔211，定位孔211配置为确定托盘21在相邻两块电极板1之间的位置。如此结构形式，通过定位孔211对每块托盘21分别进行定位，使多块托盘21在相邻两块电极板1之间能够有序排列，有利于摆放较多的托盘21及相应的电池片，较好地确保单台设备的产能，避免托盘组2的多块托盘21无序排列造成相邻两块电极板1之间的空间浪费。
一实施例中，每块托盘21的对角位置设置有定位孔211。
一实施例中，请参阅图2～图4，每块托盘21形成有多个承托槽212，承托槽212配置为承托电池片。如此，将电池片放置在承托槽212内，使电池片在托盘21上有序排列摆放。
一实施例中，承托槽212位于托盘21沿托盘厚度方向的一侧，托盘21背离承托槽212的一侧与承托槽212隔离。
可以理解的是，承托槽212的深度H不宜过深或过浅，过浅则不利于承托槽212对电池片限位，电池片可以会滑出承托槽212，过深则不利于等离子体薄膜沉积到电池片表面。一实施例中，承托槽212的深度H为0.1～2mm。如此，承托槽212的深度H较为合适，即能够达到对电池片限位的目的，又能够对电池片较好地进行PECVD镀膜。
可以理解的是，太阳能光伏电池的电池片的形状通常呈矩形。一实施 例中，承托槽212的形状为矩形。
一实施例中，请参阅图2～图4，以及图6，承托槽212的形状为矩形，多个承托槽212呈矩阵分布，托盘21的形状呈矩形，多块托盘21呈矩阵分布。如此结构形式，使得承托槽212的分布和托盘21的分布均较为紧凑，相邻承托槽212的边缘能够较好地吻合，相邻托盘21的边缘能够较好地吻合，有利于充分利用相邻两块电极板1之间的空间铺设较多的电池片，避免相邻两电极板1之间的空间浪费。
一实施例中，请参阅图2和图3，托盘21的形状呈矩形，9块托盘21呈3行3列的矩阵分布。承托槽212的形状呈矩形，每块托盘21具有4个承托槽212，4个承托槽212呈2行2列的矩阵分布。
一实施例中，托盘组2的多块托盘21可以呈1行2列的矩阵分布、1行3列的矩阵分布、2行2列的矩阵分布、2行3列的矩阵分布、2行4列的矩阵分布、3行3列的矩阵分布、3行4列的矩阵分布、3行5列的矩阵分布、或10行10列的矩阵分布等。
一实施例中，每块托盘21的多个承托槽212可以呈1行1列的矩阵分布、1行2列的矩阵分布、1行3列的矩阵分布、2行2列的矩阵分布、2行3列的矩阵分布、2行4列的矩阵分布、3行3列的矩阵分布、3行4列的矩阵分布、3行5列的矩阵分布、或10行10列的矩阵分布等。
一实施例中，相邻两块电极板1之间的所有承托槽212可以呈8行8列的矩阵分布、9行9列的矩阵分布、或10行10列的矩阵分布等。
一实施例中，请参阅图6，托盘21的形状呈矩形，10个托盘21呈2行5列的矩阵分布。承托槽212的形状呈矩形，每个托盘21具有10个承托槽212，10个承托槽212排列成5行2列的矩阵分布。
一实施例中，当相邻两电极板1对相邻两电极板1之间的托盘21上的电池片进行镀膜处理，电极板1、托盘21以及托盘21上的电池片通常是处 于真空状态。
需要解释的是，真空状态也即为负压状态，在对电池片镀膜过程中，负压程度较大，空气较为稀薄。
一实施例中，等离子体增强化学气相沉积设备还包括夹具3和多个工艺腔室，至少一个工艺腔室内设置有电极板1，夹具3配置为将其中一个工艺腔室内的托盘21传送至另一个工艺腔室内。如此结构形式，至少一个工艺腔室内设置有电极板1，托盘21上的电池片的PECVD镀膜处理通常在相应的工艺腔室内进行，托盘组2的托盘21可以通过夹具3从其中一个工艺腔室传送到另一个带有电极板1的工艺腔室，并将托盘组2移入相邻两电极板1之间，当托盘组2位于相邻两电极板1之间，电极板1对托盘21上的电池片进行PECVD镀膜处理，镀膜完成后，将托盘组2从相邻两电极板1之间取出，并通过夹具3将电池片从这个带有电极板1的工艺腔室传送到其它的工艺腔室，通过夹具3实现托盘21在不同工艺腔室间的传送。
需要解释的是，托盘组2的托盘21可以通过夹具3从其中一个工艺腔室传送到另一个带有电极板1的工艺腔室，此处的其中一个工艺腔室可以是带有电极板1的工艺腔室也可以是不带电极板1的用于传送托盘21的腔室。
需要解释的是，通过夹具3将电池片从这个带有电极板1的工艺腔室传送到其它的工艺腔室，此处的其它工艺腔室可以是带有电极板1的工艺腔室也可以是不带电极板1的用于传送托盘21的腔室
可以理解的是，托盘21的搬运过程除了托盘21移入或移出相邻两块电极板1外，还包括托盘21在不同的工艺腔室之间传送的过程。
一实施例中，可以通过夹具3将托盘组2移入或移出相邻两块电极板1。
一实施例中，可以通过夹具3将托盘组2中的所有托盘21一起移入或移出相邻两块电极板1。
一实施例中，可以通过夹具3将托盘组2中的所有托盘21依次移入或移出相邻两块电极板1。
一实施例中，在工艺腔室内的电极板1对托盘21上的电池片进行镀膜的过程中，工艺腔室通常处于真空状态。
一实施例中，请参阅图5，夹具3包括主体支架31、第一传送驱动装置32以及抓手33。第一传送驱动装置32与主体支架31驱动连接，第一传送驱动装置32配置为驱动主体支架31在各工艺腔室之间移动。抓手33连接在主体支架31背离第一传送驱动装置32的一侧，抓手33配置为取放托盘21。如此结构形式，通过抓手33取放托盘21，通过第一传送驱动装置32驱动主体支架31移动，主体支架31带动携带有托盘21的抓手33移动，从而使得托盘21在不同的腔室间传送。
一实施例中，第一传送驱动装置32可以为滚轮驱动，动力源驱动滚轮在相应的轨道上滚动以带动主体支架31移动。
一实施例中，第一传送驱动装置32可以为连杆驱动。动力源驱动连杆机构带动主体支架31移动。
一实施例中，请参阅图5，每块托盘21对应设置有一个抓手33。如此，可以将托盘组2中的所有托盘21一次性全部抓取，并传送到相应的位置。例如通过抓手33抓取托盘组2的所有托盘21一起移入或移出相邻两块电极板1。
一实施例中，多个抓手33呈矩阵分布。
一实施例中，当9个托盘21排列成3行3列的矩阵分布，9个抓手33排列成3行3列的矩阵分布，抓手33与托盘21一一对应。
一实施例中，也可以通过抓手33将托盘组2内的所有托盘21依次移入或移出相邻两块电极板1。
一实施例中，抓手33可以为主动抓手，主动抓手能够主动松开或抓取 托盘21。
一实施例中，请参阅图5，抓手33可以为被动抓手，被动抓手不会主动松开或抓取托盘21。示例性地，被动抓手的底部形成有钩状部331，通过钩状部331抵接在托盘21的下方将托盘21托住以实现对托盘21的抓取。
一实施例中，抓手33可以为真空机械手，通过真空机械手吸附托盘21。
一实施例中，可以通过真空机械手将托盘组2的所有托盘21一起吸附，以实现对托盘组2的所有托盘21的抓取。
一实施例中，可以将真空机械手吸附的托盘组2的所有托盘21一起释放，以实现对托盘组2的所有托盘21放置到相应的位置。
一实施例中，可以用吸盘替换抓手33。
一实施例中，请参阅图6，夹具3包括支撑件34、第二传送驱动装置35以及承托臂36。第二传送装置与支撑件34连接，第二传送驱动装置35配置为驱动支撑件34在各工艺腔室之间移动。承托臂36与支撑件34连接，承托臂36配置为取放托盘21。如此结构形式，第二传送驱动装置35驱动支撑件34移动，支撑件34带动承托有托盘21的承托臂36移动，从而通过承托臂36完成托盘21在不同工艺腔室间的传送。
一实施例中，可以通过承托臂36将托盘组2移入或移出相邻两块电极板1。
一实施例中，请参阅图6，承托臂36的数量为多个，多个承托臂36平行设置，在承托臂36将其中一个工艺腔室内的托盘21传送至另一个工艺腔室内的过程中，每个承托臂36承托有沿承托臂36的长度方向排列的多块托盘21。如此结构形式，对于呈矩阵分布的多块托盘21，承托臂36可以承托托盘组2的一行托盘21或一列托盘21，能够较为方便地对托盘21进行取放，通过平行设置的多个承托臂36可以将托盘组2的所有托盘21一起抓取，因而能够将托盘组2的所有托盘21一起移入或移出相邻两块电 极板1之间。
可以理解的是，在电池片进行镀膜工艺过程中，电极板1、托盘21和电池片通常处于真空状态，电极板1通常为平板，难以接触到托盘21上的电池片以对电池片加热，而真空状态下，电极板1的热量难以在隔空的状态下快速地传递到电池片，影响生产效率。一实施例中，请参阅图1和图4，承托槽212位于托盘21沿托盘厚度方向的一侧，托盘21背离承托槽212的一侧与承托槽212隔离。当托盘组2位于相邻两块电极板1之间，相邻两块电极板1中，位于托盘21背离承托槽212一侧的电极板1与托盘21抵接。如此结构形式，由于托盘21背离承托槽212的一侧与承托槽212隔离，且位于托盘21背离承托槽212一侧的电极板1与托盘21抵接，位于承托槽212内的电池片能够整面与托盘21接触，且增大了托盘21与电极板1的接触面积，有利于电极板1向电池片较为快速地传热。再者，单块托盘21的厚度较薄，有利于电极板1的热量较为快速地向电池片传递。
可以理解的是，通常情况下，朝向承托槽212的电极板1通常与电池片形成间隙，以使工艺气体进入间隙形成等离子体。
一实施例中，请参阅图1和图4，相邻两块电极板1沿上下方向排列，承托槽212朝上，托盘21的底部与下方的电极板1抵接。
一实施例中，单工艺腔室单次镀膜的电池片的数量能够达到大约100～400片。
一实施例中，请参阅图7和图8，等离子体增强化学气相沉积设备还包括骨架4，托盘组的所有托盘放置在骨架4上。骨架4形成有容纳腔43，每个托盘对应设置一个容纳腔43。如此结构形式，托盘组的所有托盘放置在一个整体的骨架4上，通过对骨架4的搬运即可实现对托盘组的所有托盘一起搬运，托盘组的所有托盘随骨架一起能够较为快速地移入或移出相邻两块电极板之间，提高生产效率。再者，由于单个托盘的面积较小提高 了单个托盘的抗变形能力，即使骨架4的抗变形能力较差，对托盘上的电池片也不会有太大的影响，骨架4在形状设置以及材料选择上相对较为自由。
一实施例中，请参阅图8，容纳腔43为通孔。如此结构形式，骨架4的实体材料部分基本上围设在各个托盘的周围，骨架4的用材相对较少，能够在一定程度上节省成本。
一实施例中，容纳腔43也可以形成在骨架4的一侧，骨架4背离容纳腔43的一侧与容纳腔43隔离。
一实施例中，当容纳腔43为通孔，托盘21能够通过通孔向电极板1露出，电极板1能够与托盘21直接抵接，电极板1可通过托盘21将热量传递至放置在托盘21上的电池片，有利于提高传热效率。避免电极板的热量先传递到骨架4，再通过骨架4传递到托盘，然后再传递到托盘上的电池片。
一实施例中，骨架4的材质可以为铝合金、碳-碳复合材料、石墨、钛合金、碳纤维、不锈钢或玻璃等。
一实施例中，当容纳腔43为通孔，骨架4的材质的弹性模量大于托盘的材质的弹性模量。如此结构形式，由于骨架4的材质的弹性模量较大，能够在一定程度上提高骨架4的抗变形能力，从而减小由于骨架4变形而施加在托盘上的载荷，这样，托盘的材质的弹性模量即使较小，托盘也不会发生较大的变形甚至不变形。通常弹性模量较大的材质较为昂贵，骨架4和托盘根据实际情况采用两种不同弹性模量的材质，一方面能够在一定程度上缓解托盘的变形，另一方面相对于骨架4和托盘均无差别地采用较高弹性模量的材质，能够降低生产成本。
一实施例中，请参阅图8，骨架4包括边框42和分隔网41，分隔网41位于边框42围设成的区域内以将边框42围设成的区域分隔成多个容纳腔 43，分隔网41与边框42连接。如此结构形式，通过在边框42内设置分隔网41，将边框42围设成的区域分隔成多个容纳腔43，以用于容纳托盘。
一实施例中，请参阅图8，分隔网41包括相互连接的第一分隔条411和第二分隔条412，第一分隔条411和第二分隔条412呈预设夹角。如此结构形式，通过第一分隔条411和第二分隔条412形成纵横交错的网状，从而将边框42围设成的区域分隔成多个容纳腔43。
可以理解的是，由于电池片的形状通常为矩形，相应地，托盘上的承托槽及托盘的形状均为矩形。一实施例中，预设夹角为90度。如此使得容纳腔43的形状能够尽可能地与托盘的形状相适应，以尽可能小的空间容纳承托盘，使空间得以充分利用，避免空间浪费。
一实施例中，请参阅图8，当容纳槽为通孔，骨架4形成有托钩44，每个容纳槽设置有托钩44，托盘设置在托钩44上。如此结构形式，位于容纳槽内的托盘被托钩44托住，使托盘能够承托在骨架4上，避免托盘从通孔穿过。
一实施例中，第一分隔条411和边框42均形成有托钩44。
一实施例中，相邻两块电极板1的其中一块电极板1为接触电极板，当接触电极板与托盘抵接，托钩44位于骨架4朝向接触电极板的一侧。如此结构形式，使得托盘在骨架4上的位置较为靠近骨架4朝向接触电极板的一侧，有利于托盘与接触电极板接触。
一实施例中，请参阅图1，相邻两块电极板1沿上下方向布置，位于下方的电极板1为接触电极板。托钩44位于骨架4的下侧。
一实施例中，夹具3可以通过对骨架4的抓取，以将骨架4以及位于骨架4上的托盘组2一起移入或移出相邻两块电极板1之间。
本申请实施例第二方面提供一种等离子体增强化学气相沉积设备的使用方法，等离子体增强化学气相沉积设备为上述任一种的等离子体增强化 学气相沉积设备。使用方法包括以下步骤：
将电池片放置在托盘21上；
将托盘组2的所有托盘21一起移入相邻两块电极板1之间；
对相邻两块电极板1之间的电池片进行等离子体增强化学气相沉积镀膜。
如此，将托盘组2中的所有托盘21一起移入相邻两块电极板1之间，能够将托盘组2快速地移入或移出相邻两电极板1，节省时间，提高生产效率。
本申请提供的各个实施例/实施方式在不产生矛盾的情况下可以相互组合。
以上仅为本申请的较佳实施例而已，并不用于限制本申请，对于本领域的技术人员来说，本申请可以有各种更改和变化。凡在本申请的精神和原则之内，所作的任何修改、等同替换、改进等，均应包含在本申请的保护范围之内。

Claims (11)

  1. 一种等离子体增强化学气相沉积设备，包括：
    多块电极板；以及
    托盘组，所述托盘组配置为能够移入或移出相邻两块所述电极板之间，所述托盘组包括多块承托电池片的托盘，所述电池片与所述托盘沿托盘厚度方向叠置；当所述托盘组位于相邻两块所述电极板之间，任意两块托盘沿所述托盘厚度方向相互错开，相邻两块所述电极板分别位于所述托盘沿所述托盘厚度方向的两侧。
  2. 根据权利要求1所述的等离子体增强化学气相沉积设备，所述等离子体增强化学气相沉积设备还包括夹具和多个工艺腔室，至少一个所述工艺腔室内设置有所述电极板，所述夹具配置为将其中一个工艺腔室内的托盘传送至另一个工艺腔室内。
  3. 根据权利要求2所述的等离子体增强化学气相沉积设备，所述夹具包括：
    主体支架；
    第一传送驱动装置，与所述主体支架驱动连接，所述第一传送驱动装置配置为驱动所述主体支架在各工艺腔室之间移动；以及
    抓手，连接在所述主体支架背离所述第一传送驱动装置的一侧，所述抓手配置为取放所述托盘。
  4. 根据权利要求3所述的等离子体增强化学气相沉积设备，每块所述托盘对应设置有一个所述抓手。
  5. 根据权利要求2所述的等离子体增强化学气相沉积设备，所述夹具包括：
    支撑件；
    第二传送驱动装置，与所述支撑件连接，所述第二传送驱动装置配 置为驱动所述支撑件在各工艺腔室之间移动；以及
    承托臂，与所述支撑件连接，所述承托臂配置为取放所述托盘。
  6. 根据权利要求5所述的等离子体增强化学气相沉积设备，所述承托臂的数量为多个，多个所述承托臂平行设置，在承托臂将其中一个工艺腔室内的托盘传送至另一个工艺腔室内的过程中，每个所述承托臂承托有沿所述承托臂的长度方向排列的多块所述托盘。
  7. 根据权利要求1～6任一项所述的等离子体增强化学气相沉积设备，所述托盘形成有承托槽，所述承托槽配置为承托所述电池片，所述承托槽位于所述托盘沿所述托盘厚度方向的一侧，所述托盘背离所述承托槽的一侧与所述承托槽隔离；当所述托盘组位于相邻两块所述电极板之间，相邻两块所述电极板中，位于所述托盘背离所述承托槽一侧的电极板与所述托盘抵接。
  8. 根据权利要求1～6任一项所述的等离子体增强化学气相沉积设备，所述托盘形成有承托槽，所述承托槽配置为承托所述电池片，所述承托槽的深度为0.1mm～2mm。
  9. 根据权利要求1～6任一项所述的等离子体增强化学气相沉积设备，所述托盘的形状呈矩形，多块所述托盘呈矩阵分布，每块所述托盘形成有多个承托槽，所述承托槽配置为承托所述电池片，所述承托槽的形状为矩形，多个所述承托槽呈矩阵分布。
  10. 根据权利要求1～6任一项所述的等离子体增强化学气相沉积设备，每块所述托盘均形成有定位孔，所述定位孔配置为确定所述托盘在相邻两块所述电极板之间的位置。
  11. 一种等离子体增强化学气相沉积设备的使用方法，所述等离子体增强化学气相沉积设备为权利要求1～10任一项所述的等离子体增强化学气相沉积设备；所述使用方法包括以下步骤：
    将电池片放置在所述托盘上；
    将所述托盘组的所有托盘一起移入相邻两块所述电极板之间；
    对相邻两块所述电极板之间的电池片进行等离子体增强化学气相沉积镀膜。
PCT/CN2022/070334 2021-01-14 2022-01-05 一种等离子体增强化学气相沉积设备及其使用方法 WO2022152023A1 (zh)

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Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003234399A (ja) * 2003-02-10 2003-08-22 Seiko Epson Corp Ｌｃｄパネル搬送用トレー
JP2009040466A (ja) * 2007-08-09 2009-02-26 Panasonic Corp トレイ及び電子部品収納方法
CN102154630A (zh) * 2010-09-30 2011-08-17 北京北方微电子基地设备工艺研究中心有限责任公司 等离子体反应腔室及其设备、部件的制造方法和处理基片的方法
CN103155134A (zh) * 2011-07-15 2013-06-12 高美科株式会社 基板载置用托盘
CN104409405A (zh) * 2014-11-18 2015-03-11 中国电子科技集团公司第四十八研究所 用平板式pecvd制备hit太阳电池的传片机构及方法
CN110952079A (zh) * 2018-09-26 2020-04-03 东泰高科装备科技有限公司 搁架、承载盘、托盘、缓冲腔、装载腔及基片传输系统
CN215103541U (zh) * 2021-01-14 2021-12-10 营口金辰机械股份有限公司 一种等离子体增强化学气相沉积设备
CN215163110U (zh) * 2021-01-14 2021-12-14 营口金辰机械股份有限公司 承托装置和等离子体增强化学气相沉积设备

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003234399A (ja) * 2003-02-10 2003-08-22 Seiko Epson Corp Ｌｃｄパネル搬送用トレー
JP2009040466A (ja) * 2007-08-09 2009-02-26 Panasonic Corp トレイ及び電子部品収納方法
CN102154630A (zh) * 2010-09-30 2011-08-17 北京北方微电子基地设备工艺研究中心有限责任公司 等离子体反应腔室及其设备、部件的制造方法和处理基片的方法
CN103155134A (zh) * 2011-07-15 2013-06-12 高美科株式会社 基板载置用托盘
CN104409405A (zh) * 2014-11-18 2015-03-11 中国电子科技集团公司第四十八研究所 用平板式pecvd制备hit太阳电池的传片机构及方法
CN110952079A (zh) * 2018-09-26 2020-04-03 东泰高科装备科技有限公司 搁架、承载盘、托盘、缓冲腔、装载腔及基片传输系统
CN215103541U (zh) * 2021-01-14 2021-12-10 营口金辰机械股份有限公司 一种等离子体增强化学气相沉积设备
CN215163110U (zh) * 2021-01-14 2021-12-14 营口金辰机械股份有限公司 承托装置和等离子体增强化学气相沉积设备

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