WO2022107992A1 - 표면 개질 2차원 맥신 및 이의 제조방법 - Google Patents
표면 개질 2차원 맥신 및 이의 제조방법 Download PDFInfo
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 17
- 150000001875 compounds Chemical class 0.000 claims abstract description 66
- 150000008040 ionic compounds Chemical class 0.000 claims abstract description 26
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 23
- 125000004432 carbon atom Chemical group C* 0.000 claims description 46
- 239000000126 substance Substances 0.000 claims description 42
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 41
- 238000000034 method Methods 0.000 claims description 31
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims description 24
- 238000012986 modification Methods 0.000 claims description 24
- 230000004048 modification Effects 0.000 claims description 24
- 239000003960 organic solvent Substances 0.000 claims description 24
- 239000007864 aqueous solution Substances 0.000 claims description 23
- 229910052751 metal Inorganic materials 0.000 claims description 21
- 239000002184 metal Substances 0.000 claims description 21
- 238000003756 stirring Methods 0.000 claims description 19
- 125000000217 alkyl group Chemical group 0.000 claims description 16
- 125000003118 aryl group Chemical group 0.000 claims description 11
- 150000001768 cations Chemical class 0.000 claims description 9
- 229910052739 hydrogen Inorganic materials 0.000 claims description 9
- 239000001257 hydrogen Substances 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 9
- 125000003342 alkenyl group Chemical group 0.000 claims description 8
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 8
- 239000002253 acid Substances 0.000 claims description 7
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 claims description 6
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 6
- 125000002541 furyl group Chemical group 0.000 claims description 6
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- 125000003226 pyrazolyl group Chemical group 0.000 claims description 6
- 125000001725 pyrenyl group Chemical group 0.000 claims description 6
- 125000004076 pyridyl group Chemical group 0.000 claims description 6
- 125000000168 pyrrolyl group Chemical group 0.000 claims description 6
- 125000001544 thienyl group Chemical group 0.000 claims description 6
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims description 5
- ZADPBFCGQRWHPN-UHFFFAOYSA-N boronic acid Chemical compound OBO ZADPBFCGQRWHPN-UHFFFAOYSA-N 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 5
- 150000002009 diols Chemical class 0.000 claims description 5
- 238000005530 etching Methods 0.000 claims description 5
- 238000002156 mixing Methods 0.000 claims description 5
- BUUPQKDIAURBJP-UHFFFAOYSA-N sulfinic acid Chemical compound OS=O BUUPQKDIAURBJP-UHFFFAOYSA-N 0.000 claims description 5
- 210000002858 crystal cell Anatomy 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 229910052698 phosphorus Inorganic materials 0.000 claims description 3
- 229910052717 sulfur Inorganic materials 0.000 claims description 3
- HBEDSQVIWPRPAY-UHFFFAOYSA-N 2,3-dihydrobenzofuran Chemical group C1=CC=C2OCCC2=C1 HBEDSQVIWPRPAY-UHFFFAOYSA-N 0.000 claims description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- RAXXELZNTBOGNW-UHFFFAOYSA-O Imidazolium Chemical compound C1=C[NH+]=CN1 RAXXELZNTBOGNW-UHFFFAOYSA-O 0.000 claims description 2
- 125000003785 benzimidazolyl group Chemical group N1=C(NC2=C1C=CC=C2)* 0.000 claims description 2
- 125000004196 benzothienyl group Chemical group S1C(=CC2=C1C=CC=C2)* 0.000 claims description 2
- 150000002739 metals Chemical class 0.000 claims description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 claims description 2
- 125000001424 substituent group Chemical group 0.000 claims description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 3
- 230000003647 oxidation Effects 0.000 abstract description 29
- 238000007254 oxidation reaction Methods 0.000 abstract description 29
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 45
- 239000000976 ink Substances 0.000 description 43
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 36
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 36
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 36
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 30
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 28
- 230000000052 comparative effect Effects 0.000 description 21
- 239000000243 solution Substances 0.000 description 20
- 230000007774 longterm Effects 0.000 description 16
- 239000012153 distilled water Substances 0.000 description 14
- 238000002360 preparation method Methods 0.000 description 11
- 239000002904 solvent Substances 0.000 description 9
- 239000010409 thin film Substances 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- 238000002835 absorbance Methods 0.000 description 4
- 150000001450 anions Chemical class 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910052723 transition metal Inorganic materials 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical group N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- UQZIWOQVLUASCR-UHFFFAOYSA-N alumane;titanium Chemical compound [AlH3].[Ti] UQZIWOQVLUASCR-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- -1 transition metal carbides Chemical class 0.000 description 2
- 150000003624 transition metals Chemical class 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 125000001165 hydrophobic group Chemical group 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000011232 storage material Substances 0.000 description 1
- 238000002198 surface plasmon resonance spectroscopy Methods 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/90—Carbides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/90—Carbides
- C01B32/914—Carbides of single elements
- C01B32/921—Titanium carbide
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/20—Particle morphology extending in two dimensions, e.g. plate-like
Definitions
- the present invention was made with support from the Korean government in accordance with the "Photo-responsive Carbon Nanomaterial-based Transportation Convergence Material Development", a university-focused research institute support project in the science and engineering field with a unique project number 1345315501 and a project number 2018R1A6A1A03023788 of the National Research Foundation of Korea under the Ministry of Education.
- the present invention relates to a surface-modified two-dimensional maxine and a method for manufacturing the same, and specifically, a surface-modified two-dimensional maxine having improved dispersibility and preventing oxidation of maxin by modifying the surface with a compound or an ionic compound containing a hydroxyl group, and a method for manufacturing the same It relates to a manufacturing method.
- MAX phase (M is a transition metal including Sc, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, A is Al, Si , P, S, Ga, Ge, As, Cd, In, Sn, Tl, Group 13 or 14 elements including Pb, X is carbon and/or nitrogen) is a quasi-ceramic MX and a metal other than M As a crystalline substance in which element A is combined, it has excellent properties such as electrical conductivity, oxidation resistance, and machinability.
- Maxine has excellent electrical conductivity and strength due to its metal-like properties, and is recognized as a very useful material because it can be applied to various application technologies such as sensors, capacitors, storage materials, and electromagnetic shielding.
- Maxine (MXene) prepared by chemical etching process is easily dispersed in water due to the large amount of -OH functional groups present on the surface, but maxine (MXene) dispersed in aqueous solution is easily oxidized by water molecules and dissolved oxygen to metal oxide It is difficult to store for a long period of time, such as losing its original excellent properties.
- maxine (MXene) dispersed in aqueous solution is easily oxidized by water molecules and dissolved oxygen to metal oxide It is difficult to store for a long period of time, such as losing its original excellent properties.
- the bonding strength with other hydrophobic materials is low, so it is difficult to form a composite material in a uniform state with an organic single molecule or organic polymer.
- the technical problem to be achieved by the present invention is to prevent oxidation by dissolved oxygen present in water by physically modifying the surface of the two-dimensional maxine with a compound or ionic compound containing at least one hydroxyl group, and excellent in various organic solvents To provide a surface-modified two-dimensional maxine that exhibits dispersibility and has excellent electrical conductivity, solution processability and coating properties.
- One embodiment of the present invention provides a surface-modified two-dimensional maxin in which the outer surface of the two-dimensional maxin is modified with one selected from the group consisting of a compound containing at least one hydroxyl group, an ionic compound, and combinations thereof.
- the surface-modified two-dimensional maxine according to an exemplary embodiment of the present invention can be variously stably dispersed in water or an organic solvent depending on the compound or ionic compound containing at least one hydroxyl group used for surface modification, and oxidative stability and Long-term stability can be improved.
- the method for manufacturing a surface-modified two-dimensional maxine according to an exemplary embodiment of the present invention can easily surface-modify the two-dimensional maxine.
- FIG. 1 is a flowchart of a method for manufacturing a surface-modified two-dimensional maxine according to an embodiment of the present invention.
- Figure 2 is a schematic diagram showing a process for manufacturing a two-dimensional maxine.
- Figure 3 is a schematic diagram showing a state modified with a carboxylic acid-based compound in the surface-modified two-dimensional maxine according to an embodiment of the present invention.
- Example 4 is a photograph showing a state in which Example 1 and Comparative Example 1 were dispersed according to a solvent.
- Example 5 is a photograph taken of the results of the folding test in order to confirm the flexibility of the thin film prepared in Example 14.
- Example 6 is a photograph showing the contact angle of the thin film prepared according to Example 1 and Comparative Example 1 with respect to water.
- Example 7 is a photograph showing the oxidation rate results of Example 6 and Comparative Example 1.
- Example 8 is a graph showing the absorbance according to the wavelength of Example 5 and Comparative Example 1.
- Example 9 is a graph showing the XRD of Example 6 and Comparative Example 1.
- a and/or B means “A and B, or A or B.”
- One embodiment of the present invention provides a surface-modified two-dimensional maxin in which the outer surface of the two-dimensional maxin is modified with one selected from the group consisting of a compound containing at least one hydroxyl group, an ionic compound, and combinations thereof.
- the surface-modified two-dimensional maxine according to an exemplary embodiment of the present invention can be variously stably dispersed in water or an organic solvent depending on the compound or ionic compound containing at least one hydroxyl group used for surface modification, and oxidative stability and Long-term stability can be improved.
- the two-dimensional maxine includes at least one layer in which a plurality of crystal cells having an empirical formula of M n+1 X n form a two-dimensional array, each X is located in an octahedral array consisting of a plurality of M, wherein M is at least one metal selected from the group consisting of a group IIIB metal, a group IVB metal, a group VB metal, and a group VIB metal, wherein each X is C, It is one selected from N and combinations thereof, and n may be 1, 2, or 3.
- the two-dimensional maxine includes at least one layer in which a plurality of crystal cells having an empirical formula of M'2M"nXn+1 form a two-dimensional array, each X is located in an octahedral array of a plurality of M' and M", wherein M' and M" are different metals selected from the group consisting of a group IIIB metal, a group IVB metal, a group VB metal and a group VIB metal; , wherein each X is C, N, or a combination thereof, and n may be 1 or 2.
- the compound including a hydroxyl group is a diol-based compound, a boronic acid-based compound, a carboxylic acid-based compound, a sulfonic acid-based compound, a sulfinic acid-based compound, a compound represented by the following Chemical Formula 1, and combinations thereof. It may be one selected from
- the solubility according to the organic solvent according to the compound can be changed, and the binding force to the surface of the two-dimensional maxine can be improved.
- the diol-based compound may be of Formula 2 below.
- Each of R 1 , R 2 , R 3 and R 4 is hydrogen, a substituted or unsubstituted straight or branched chain alkyl group having 1 to 10 carbon atoms, a substituted or unsubstituted aryl group having 1 to 10 carbon atoms, and 3 to 7 carbon atoms. of a substituted or unsubstituted heterocycloalkene group, and a substituent represented by the following Chemical Formulas 2a and 2b.
- the “*” means a connection point, wherein Y 1 is O or S, and each of Y 2 and Y 3 is -F, -Cl, -Br, -I, -OH, -SH, -NR 6 R 7 R 8 , wherein each of R 6 , R 7 and R 8 is hydrogen, a substituted or unsubstituted straight or branched chain alkyl group having 1 to 10 carbon atoms, a substituted or unsubstituted aryl group having 1 to 10 carbon atoms, and 3 carbon atoms. to 7 is a substituted or unsubstituted heterocycloalkene group.
- Chemical Formula 2 may be any one of Chemical Formulas 2-1 to 2-5 below.
- Formula 2 By selecting Formula 2 from the above, it can be stably dispersed in various ways in water or an organic solvent, and oxidation stability and long-term stability can be improved.
- the boronic acid-based compound may be of Formula 3 below.
- R 9 is a hydroxyl group, a substituted or unsubstituted straight-chain or branched alkyl group having 1 to 10 carbon atoms, a substituted or unsubstituted straight-chain or branched alkenyl group having 2 to 10 carbon atoms, a substituted or unsubstituted A cycloalkyl group, a substituted or unsubstituted aryl group having 6 to 20 carbon atoms, a substituted or unsubstituted anthracenyl group, a substituted or unsubstituted pyrenyl group, a substituted or unsubstituted pyridinyl group, a substituted or unsubstituted thiophenyl group, a substituted or an unsubstituted furanyl group, a substituted or unsubstituted pyrazolyl group, and a substituted or unsubstituted pyrrolyl group.
- Chemical Formula 3 may be selected from the group consisting of the following compounds 3-1 to 3-42 and combinations thereof.
- Chemical Formula 3 By selecting Chemical Formula 3 from the above, it can be stably dispersed in various ways in water or an organic solvent, and oxidation stability and long-term stability can be improved.
- the carboxylic acid-based compound may be one selected from the group consisting of the following Chemical Formula 4, the following Chemical Formulas 4-1 to 4-3, and combinations thereof.
- R 10 is a substituted or unsubstituted linear or branched alkyl group having 1 to 10 carbon atoms, a substituted or unsubstituted straight or branched alkenyl group having 2 to 10 carbon atoms, a substituted or unsubstituted straight chain having 2 to 10 carbon atoms, or A branched dienyl group, a substituted or unsubstituted cycloalkyl group having 3 to 15 carbon atoms, a substituted or unsubstituted aryl group having 6 to 20 carbon atoms, a substituted or unsubstituted anthracenyl group, a substituted or unsubstituted pyrenyl group, a substituted or an unsubstituted pyridinyl group, a substituted or unsubstituted thiophenyl group, a substituted or unsubstituted furanyl group, a substituted or unsubstituted pyrazolyl
- Chemical Formula 4 may be selected from the group consisting of the following compounds 4-4 to 4-13 and combinations thereof.
- Chemical Formula 4 By selecting Chemical Formula 4 from the above, it can be stably dispersed in various ways in water or an organic solvent, and oxidation stability and long-term stability can be improved.
- the sulfonic acid-based compound may be of Formula 5 below.
- R 11 is a substituted or unsubstituted straight-chain or branched alkyl group having 1 to 10 carbon atoms, a substituted or unsubstituted straight-chain or branched alkenyl group having 2 to 10 carbon atoms, a substituted or unsubstituted straight chain having 2 to 10 carbon atoms Or a branched dienyl group, a substituted or unsubstituted cycloalkyl group having 3 to 15 carbon atoms, a substituted or unsubstituted aryl group having 6 to 20 carbon atoms, a substituted or unsubstituted anthracenyl group, a substituted or unsubstituted pyrenyl group, substituted Or an unsubstituted pyridinyl group, a substituted or unsubstituted thiophenyl group, a substituted or unsubstituted furanyl group, a substituted or unsubstituted pyr
- Chemical Formula 5 may be one selected from the group consisting of the following Chemical Formulas 5-1 to 5-13 and combinations thereof.
- Chemical Formula 5 By selecting Chemical Formula 5 from the above, it can be stably dispersed in various ways in water or an organic solvent, and oxidation stability and long-term stability can be improved.
- the sulfinic acid-based compound may be of Formula 6 below.
- the sulfinic acid-based compound as described above, it can be variously stably dispersed in water or an organic solvent, and oxidation stability and long-term stability can be improved.
- the ionic compound is a cation selected from the group consisting of imidazolium-based compounds, pyridinium-based compounds, ammonium-based compounds, phosphinium-based compounds, and combinations thereof; and F - , Cl - , Br - , I, BF 4 - , PF 6 - , (CF 3 SO 2 ) 2 N - , CF 3 SO 3 - , C 2 N 3 - , CH 3 SO 3 - , CF 3 BF 3 - , C 2 F 5 BF 3 - , NO 3 - , CF 3 CO 2 - , C 3 H 5 O 3 - , C 7 H 5 O 2 - , and combinations thereof it could be By selecting the ionic compound from the above, it can be variously stably dispersed in water or an organic solvent, and oxidation stability and long-term stability can be improved.
- the cation may be one selected from the group consisting of the following Chemical Formulas 7 to 9 and combinations thereof.
- Each of R 12 , R 13 and R 14 is hydrogen, a substituted or unsubstituted linear or branched alkyl group having 1 to 15 carbon atoms, and a substituted or unsubstituted linear or branched alkenyl group having 2 to 10 carbon atoms.
- Each of R 15 and R 16 is hydrogen and a substituted or unsubstituted straight-chain or branched alkyl group having 1 to 15 carbon atoms.
- Q is N or P, wherein R 17 , R 18 , R 19 and R 20 each is a substituted or unsubstituted straight-chain or branched alkyl group having 1 to 15 carbon atoms.
- Chemical Formula 7 is one selected from the group consisting of the following Chemical Formulas 7-1 to 7-13 and combinations thereof
- Chemical Formula 8 is the following Chemical Formulas 8-1 to 8-13 and these It may be one selected from the group consisting of a combination of
- Chemical Formula 9 may be one selected from the group consisting of the following Chemical Formulas 9-1 to 9-13 and combinations thereof.
- Chemical Formula 7 Chemical Formula 8 and Chemical Formula 9 from the above, it can be variously stably dispersed in water or an organic solvent, and oxidation stability and long-term stability can be improved.
- FIG. 1 is a flowchart of a method for manufacturing a surface-modified two-dimensional maxine according to an embodiment of the present invention.
- a first step (S10) of obtaining a maxine aqueous solution in which the two-dimensional maxine is dispersed by an acid etching process a second step (S30) of preparing a mixture in which one selected from the group consisting of a compound containing at least one hydroxyl group, an ionic compound, and a combination thereof is dispersed in water or an organic solvent
- the method for manufacturing a surface-modified two-dimensional maxine according to an exemplary embodiment of the present invention can easily surface-modify the two-dimensional maxine.
- an acid etching process includes a first step (S10) of obtaining an aqueous solution of maxine in which the two-dimensional maxine is dispersed.
- 2 is a schematic diagram showing a process for manufacturing a two-dimensional maxine. Referring to FIG. 2 , by selectively removing the aluminum layer using LiF-HCl in the three-dimensional titanium-aluminum carbide of the MAX phase, a two-dimensional crystalline transition metal carbide having the general formula M (n+1) X n T x Manufactures MXenes, which are crystalline transition metal carbides.
- the two-dimensional maxine manufactured by the above-described method includes a hydroxyl group, a fluorine group, a carbonyl group and/or an epoxy group on the surface.
- a hydroxyl group a fluorine group, a carbonyl group and/or an epoxy group on the surface.
- the second step (S30) of preparing a mixture in which one selected from the group consisting of a compound containing at least one hydroxyl group, an ionic compound, and a combination thereof is dispersed in water or an organic solvent include By dispersing one selected from the group consisting of a compound containing at least one hydroxyl group, an ionic compound, and a combination thereof in water or an organic solvent as described above, compatibility and workability with the Maxine aqueous solution can be improved.
- a third step (S50) of modifying the outer surface of the two-dimensional maxine by mixing and stirring the aqueous solution of maxin obtained in the first step and the mixture of the second step (S50); includes; .
- Figure 3 is a schematic diagram showing a state modified with a carboxylic acid-based compound in the surface-modified two-dimensional maxine according to an embodiment of the present invention. Referring to FIG. 3 , by mixing and stirring the maxine aqueous solution and the mixture, it can be confirmed that the carboxylic acid-based compound is physically bonded to the two-dimensional maxine surface by hydrogen bonding as shown in FIG. 3 .
- By modifying the outer surface of the two-dimensional maxine as described above it can be stably dispersed in various ways in water or an organic solvent, oxidation stability and long-term stability can be improved, and electrical conductivity can be improved.
- Maxine aqueous solution itself prepared in Preparation Example was used as Maxine ink.
- a maxine ink was prepared in the same manner as in Example 1, except that the maxine ink was prepared by using Formula 3-1 instead of Formula 2-1 in Example 1.
- a maxine ink was prepared in the same manner as in Example 1, except that in Example 1, a maxine ink was prepared by using Formula 4-3 instead of Formula 2-1.
- a maxine ink was prepared in the same manner as in Example 1, except that the maxine ink was prepared by using Formula 4-1 instead of Formula 2-1 in Example 1.
- a maxine ink was prepared in the same manner as in Example 1, except that in Example 1, a maxine ink was prepared by using Formula 3-6 instead of Formula 2-1.
- a maxine ink was prepared in the same manner as in Example 1, except that the maxine ink was prepared by using Formula 4-8 instead of Formula 2-1 in Example 1.
- a maxine ink was prepared in the same manner as in Example 1, except that in Example 1, a maxine ink was prepared by using Formula 5-5 instead of Formula 2-1.
- An organic solution was prepared by dissolving 35 mg of Formula 3-9 in 10 mL of ethanol.
- the aqueous maxine solution of Preparation Example and the organic solution in which Chemical Formula 3-9 was dissolved were mixed, and the reaction was performed by stirring at room temperature for 24 hours. After 24 hours, the stirring is stopped, and the maxine surface-modified by Chemical Formula 3-9 is separated through a centrifuge (1736R model, GYROZEN) and the solvent to be substituted (distilled water, ethanol, methanol, acetone, acetonitrile, chloroform, dichloro Methane, dimethylformamide) was washed 3 to 5 times to prepare maxine ink.
- An organic solution was prepared by dissolving 35 mg of Chemical Formula 3-10 in 10 mL of acetone.
- the aqueous maxine solution of Preparation Example and the organic solution in which Chemical Formula 3-10 was dissolved were mixed, and the reaction was performed by stirring at room temperature for 24 hours. After 24 hours, the stirring is stopped, and the maxine surface-modified by Chemical Formula 3-10 is separated through a centrifuge (1736R model, GYROZEN) and the solvent to be substituted (distilled water, ethanol, methanol, acetone, acetonitrile, chloroform, dichloro Methane, dimethylformamide) was washed 3 to 5 times to prepare maxine ink.
- a maxine ink was prepared in the same manner as in Example 9, except that the maxine ink was prepared by using Formula 3-22 instead of Formula 3-10 in Example 9.
- An organic solution was prepared by dissolving 35 mg of Formula 4-11 in 10 mL of chloroform.
- the Maxine aqueous solution of Preparation Example and the organic solution in which Chemical Formula 4-11 was dissolved were mixed, and the reaction was carried out by stirring at room temperature for 24 hours. After 24 hours, the stirring is stopped, and the maxine surface-modified by Chemical Formula 4-11 is separated through a centrifuge (1736R model, GYROZEN) and the solvent to be substituted (distilled water, ethanol, methanol, acetone, acetonitrile, chloroform, dichloro Methane, dimethylformamide) was washed 3 to 5 times to prepare maxine ink.
- An organic solution was prepared by dissolving 35 mg of Formula 3-24 in 10 mL of toluene.
- the aqueous maxine solution of Preparation Example and an organic solution in which Chemical Formula 3-24 was dissolved were mixed, and the reaction was performed by stirring at room temperature for 24 hours. After 24 hours, the stirring is stopped, and the maxine surface-modified by Chemical Formula 3-24 is separated through a centrifuge (1736R model, GYROZEN) and the solvent to be substituted (distilled water, ethanol, methanol, acetone, acetonitrile, chloroform, dichloro Methane, dimethylformamide) was washed 3 to 5 times to prepare maxine ink.
- An organic solution was prepared by dissolving 35 mg of Formula 3-25 in 10 mL of ethanol.
- the Maxine aqueous solution of Preparation Example and the organic solution in which Chemical Formula 3-25 was dissolved were mixed, and the reaction was performed by stirring at room temperature for 24 hours. After 24 hours, the stirring is stopped, and the maxine surface-modified by Chemical Formula 3-25 is separated through a centrifuge (1736R model, GYROZEN) and the solvent to be substituted (distilled water, ethanol, methanol, acetone, acetonitrile, chloroform, dichloro Methane, dimethylformamide) was washed 3 to 5 times to prepare maxine ink.
- a maxine ink was prepared in the same manner as in Example 9, except that the maxine ink was prepared by using Chemical Formula 4-3 instead of Chemical Formula 3-10 in Example 9.
- a maxine ink was prepared in the same manner as in Example 9, except that the maxine ink was prepared by using Formula 2-5 instead of Formula 3-25 in Example 13.
- Example 9 in the same manner as in Example 9, maxine ink was prepared using [(CF 3 SO 2 ) 2 N ⁇ ] as a cation and anion of Formula 7-9 instead of Formula 3-10. Ink was prepared.
- An organic solution was prepared by dissolving 35 mg of an ionic compound containing a cation of Formula 7-6 and an anion of [(CF 3 SO 2 ) 2 N - ] in 10 mL of acetonitrile.
- the maxin aqueous solution of Preparation Example and the organic solution in which the ionic compound was dissolved were mixed, and the reaction was performed by stirring at room temperature for 24 hours.
- Maxine ink was prepared by using an ionic compound containing a cation of Formula 7-10 and an anion of [(CF 3 SO 2 ) 2 N - ] instead of the ionic compound used in Example 17
- a maxine ink was prepared in the same manner as in step 17.
- Maxine ink was prepared by using an ionic compound containing a cation of Formula 9-2 and an anion of [(CF 3 SO 2 ) 2 N - ] instead of the ionic compound used in Example 17
- a maxine ink was prepared in the same manner as in step 17.
- FIG. 4 is a photograph showing a state in which Example 1 and Comparative Example 1 were dispersed according to a solvent. 4, the Maxine ink of Example 1 and the Maxine aqueous solution of Comparative Example 1 were dispersed in distilled water, ethanol, methanol, acetone, acetonitrile, chloroform, dichloromethane and DMF (dimethylformamide).
- Comparative Example 1 has excellent dispersibility only in distilled water, ethanol, methanol, and DMF (dimethylformamide), but Example 1 is for distilled water, ethanol, methanol, acetone, acetonitrile and DMF (dimethylformamide) It can be confirmed that it is stably and uniformly dispersed in more various organic solvents due to excellent compatibility.
- a thin film was prepared by filtration using an anodic aluminum oxide film (pore size: 200 ⁇ m) for the maxine ink surface-modified according to Examples 1 to 19.
- Example 5 is a photograph taken of the results of the folding test in order to confirm the flexibility of the thin film prepared in Example 14. As shown in FIG. 5 , it was confirmed that the thin films prepared with the Maxine inks of Examples 1 to 19 had a thickness of 7 ⁇ m and had excellent flexibility.
- Example 6 is a photograph showing the contact angle of the thin film prepared according to Example 1 and Comparative Example 1 with respect to water. As shown in FIG. 6 , it can be confirmed that the maxine of Example 1 exhibits more hydrophobicity than the maxine of Comparative Example 1 that is hydrophilic. That is, it can be seen that Maxine surface-modified with a compound having a hydrophobic group as in Formula 2-1 exhibits slightly more hydrophobicity. As a result, it was confirmed that the surface modification of the maxine surface was successfully performed.
- Example 7 is a photograph showing the oxidation rate results of Example 6 and Comparative Example 1. Referring to FIG. 7, in the case of Comparative Example 1, the oxidation rate rapidly increased after two months, and it was confirmed that most of them were oxidized and changed to a transparent solution state, whereas in the case of the Maxine ink of Example 6, oxidation was well performed even with the passage of time. I was able to confirm that it didn't happen.
- the surface-modified two-dimensional maxine ink according to an exemplary embodiment of the present invention has excellent oxidation stability and improved long-term storage stability compared to maxine that is not surface-modified.
- Example 8 is a graph showing the absorbance according to the wavelength of Example 5 and Comparative Example 1. Referring to FIG. 8, in Example 5, compared to Comparative Example 1, the absorption peak of 300 nm or less (the absorption peak of TiO 2 ) did not increase, and the Maxine surface plasmon resonance peak near 760 nm was maintained. The two-dimensional maxine confirmed that oxidation did not occur well additionally.
- Example 9 is a graph showing the XRD of Example 6 and Comparative Example 1. Referring to FIG. 9, it can be seen that the 2D stacking structure of Maxine is well maintained even after surface modification, and d-spacing is slightly increased from the (002) peak shifted to the left due to the compound bound to the surface after surface modification. can
- the surface-modified two-dimensional maxine and its manufacturing method, the two-dimensional maxine surface is modified with a compound containing a hydroxyl group to prevent oxidation and improve dispersibility in various organic solvents while maintaining electrical conductivity can
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Abstract
Description
구분 | 구분 | 전기 전도도
(S/cm) |
분산도 (상, 중, 하) | |||||||
① | ② | ③ | ④ | ⑤ | ⑥ | ⑦ | ⑧ | |||
비교예 | 맥신 수용액 | Avg. 3,010 | 상 | 하 | 중 | 하 | 하 | 하 | 하 | 중 |
실시예 1 | 화학식 2-1 | 5,369 | 상 | 상 | 상 | 상 | 상 | 하 | 하 | 상 |
실시예 2 | 화학식 3-1 | 5,213 | 상 | 상 | 상 | 상 | 상 | 하 | 하 | 상 |
실시예 3 | 화학식 4-3 | 5,266 | 상 | 상 | 상 | 상 | 상 | 하 | 하 | 상 |
실시예 4 | 화학식 4-1 | 4,849 | 상 | 중 | 중 | 중 | 중 | 하 | 하 | 상 |
실시예 5 | 화학식 3-6 | 5,981 | 상 | 중 | 중 | 하 | 하 | 하 | 하 | 중 |
실시예 6 | 화학식 4-8 | 9,558 | 상 | 상 | 상 | 중 | 상 | 하 | 하 | 상 |
실시예 7 | 화학식 5-5 | 6,579 | 상 | 상 | 상 | 상 | 상 | 하 | 하 | 상 |
실시예 8 | 화학식 3-9 | 3,571 | 상 | 하 | 하 | 중 | 중 | 하 | 하 | 중 |
실시예 9 | 화학식 3-10 | 3,093 | 상 | 하 | 하 | 중 | 중 | 하 | 하 | 중 |
실시예 10 | 화학식 3-22 | 3,817 | 중 | 하 | 하 | 중 | 중 | 중 | 중 | 중 |
실시예 11 | 화학식 4-11 | 3,726 | 하 | 하 | 하 | 중 | 중 | 중 | 중 | 중 |
실시예 12 | 화학식 3-24 | 3,108 | 하 | 하 | 하 | 중 | 중 | 중 | 중 | 하 |
실시예 13 | 화학식 3-25 | 3,053 | 하 | 하 | 하 | 중 | 중 | 중 | 중 | 하 |
실시예 14 | 화학식 4-3 | 3,047 | 하 | 중 | 중 | 중 | 상 | 중 | 중 | 중 |
실시예 15 | 화학식 2-5 | 3,135 | 중 | 중 | 중 | 중 | 상 | 하 | 하 | 중 |
실시예 16 | 화학식 7-9 및 [(CF 3SO 2) 2N -] | 3,823 | 중 | 상 | 중 | 중 | 상 | 상 | 중 | 중 |
실시예 17 | 화학식 7-6 및 [(CF 3SO 2) 2N -] | 4,563 | 하 | 하 | 하 | 중 | 상 | 상 | 상 | 중 |
실시예 18 | 화학식 7-10 및 [(CF 3SO 2) 2N -] | 4,333 | 하 | 하 | 하 | 중 | 상 | 상 | 상 | 중 |
실시예 19 | 화학식 9-2 및 [(CF 3SO 2) 2N -] | 3,371 | 중 | 중 | 중 | 상 | 중 | 중 | 중 | 중 |
Claims (17)
- 적어도 하나의 히드록시기를 포함하는 화합물, 이온성화합물 및 이들의 조합으로 이루어진 군으로부터 선택된 하나로 2차원 맥신의 외부 표면이 개질된 것인,표면 개질 2차원 맥신.
- 청구항 1에 있어서,상기 2차원 맥신은 M n+1X n의 실험식을 갖는 복수의 결정 셀(crystal cells)이 2차원 어레이를 이룬 층(layer)을 적어도 하나 이상 포함하며,각각의 X는 복수 개의 M으로 이루어지는 8면체 어레이 내에 위치하고,상기 M은 IIIB족 금속, IVB족 금속, VB족 금속 및 VIB 족 금속으로 이루어진 군으로부터 선택된 적어도 하나의 금속이며,상기 각각의 X는 C, N 및 이들의 조합으로부터 선택된 하나이고,상기 n은 1, 2 또는 3인 것인,표면 개질된 2차원 맥신.
- 청구항 1에 있어서,상기 2차원 맥신은 M' 2M" nX n+1의 실험식을 갖는 복수의 결정 셀(crystal cells)이 2차원 어레이를 이룬 층(layer)을 적어도 하나 이상 포함하며,각각의 X는 복수 개의 M' 및 M"로 이루어지는 8면체 어레이 내에 위치하고,상기 M' 및 M"은 IIIB족 금속, IVB족 금속, VB족 금속 및 VIB 족 금속으로 이루어진 군으로부터 선택된 서로 상이한 금속이며,상기 각각의 X는 C, N 또는 이들의 조합이고,상기 n은 1 또는 2인,표면 개질된 2차원 맥신.
- 청구항 4에 있어서,상기 디올계 화합물은 하기의 화학식 2인 것인,표면 개질 2차원 맥신:[화학식 2]상기 R 1, R 2, R 3 및 R 4 각각은 수소, 탄소수 1 내지 10의 치환 또는 비치환된 직쇄 또는 분지쇄인 알킬기, 탄소수 1 내지 10의 치환 또는 비치환된 아릴기, 탄소수 3 내지 7의 치환 또는 비치환된 헤테로시클로알켄기, 및 하기의 화학식 2a 및 화학식 2b로 표시되는 치환기이고,[화학식 2a][화학식 2b]상기 “*”은 연결지점을 의미하고,상기 Y 1는 O 또는 S이며,상기 Y 2 및 Y 3 각각은 -F, -Cl, -Br, -I, -OH, -SH, -NR 6R 7R 8이며,상기 R 6, R 7 및 R 8 각각은 수소, 탄소수 1 내지 10의 치환 또는 비치환된 직쇄 또는 분지쇄인 알킬기, 탄소수 1 내지 10의 치환 또는 비치환된 아릴기, 탄소수 3 내지 7의 치환 또는 비치환된 헤테로시클로알켄기이다.
- 청구항 4에 있어서,상기 보론산계 화합물은 하기의 화학식 3인 것인표면 개질 2차원 맥신:[화학식 3]R 9는 히드록시기, 탄소수 1 내지 10의 치환 또는 비치환된 직쇄 또는 분지쇄인 알킬기, 탄소수 2 내지 10의 치환 또는 비치환된 직쇄 또는 분지쇄인 알케닐기, 탄소수 3 내지 15의 치환 또는 비치환된 시클로알킬기, 치환 또는 비치환된 탄소수 6 내지 20의 아릴기, 치환 또는 비치환된 안트라센닐기, 치환 또는 비치환된 피렌닐기, 치환 또는 비치환된 피리디닐기, 치환 또는 비치환된 티오페닐기, 치환 또는 비치환된 퓨란닐기, 치환 또는 비치환된 피라조릴기 및 치환 또는 비치환된 피롤릴기이다.
- 청구항 7에 있어서,상기 화학식 3은 하기의 화합물 3-1 내지 3-42 및 이들의 조합으로 이루어진 군으로부터 선택된 것인,표면 개질 2차원 맥신;[화학식 3-1][화학식 3-2][화학식 3-3][화학식 3-4][화학식 3-5][화학식 3-6][화학식 3-7][화학식 3-8][화학식 3-9][화학식 3-10][화학식 3-11][화학식 3-12][화학식 3-13][화학식 3-14][화학식 3-15][화학식 3-16][화학식 3-17][화학식 3-18][화학식 3-19][화학식 3-20][화학식 3-21][화학식 3-22][화학식 3-23][화학식 3-24][화학식 3-25][화학식 3-26][화학식 3-27][화학식 3-28][화학식 3-29][화학식 3-30][화학식 3-31][화학식 3-32][화학식 3-33][화학식 3-34][화학식 3-35][화학식 3-36][화학식 3-37][화학식 3-38][화학식 3-39][화학식 3-40][화학식 3-41][화학식 3-42]
- 청구항 4에 있어서,상기 카르복실산계 화합물은 하기의 화학식 4, 하기 화학식 4-1 내지 4-3 및 이들의 조합으로 이루어진 군으로부터 선택된 하나인 것인,표면 개질 2차원 맥신;[화학식 4][화학식 4-1][화학식 4-2][화학식 4-3]R 10은 탄소수 1 내지 10의 치환 또는 비치환된 직쇄 또는 분지쇄인 알킬기, 탄소수 2 내지 10의 치환 또는 비치환된 직쇄 또는 분지쇄인 알케닐기, 탄소수 2 내지 10의 치환 또는 비치환된 직쇄 또는 분지쇄인 디엔닐기, 탄소수 3 내지 15의 치환 또는 비치환된 시클로알킬기, 치환 또는 비치환된 탄소수 6 내지 20의 아릴기, 치환 또는 비치환된 안트라센닐기, 치환 또는 비치환된 피렌닐기, 치환 또는 비치환된 피리디닐기, 치환 또는 비치환된 티오페닐기, 치환 또는 비치환된 퓨란닐기, 치환 또는 비치환된 피라조릴기 및 치환 또는 비치환된 피롤릴기이다.
- 청구항 4에 있어서,상기 설폰산계 화합물은 하기의 화학식 5인 것인 표면 개질 2차원 맥신;[화학식 5]상기 R 11은 탄소수 1 내지 10의 치환 또는 비치환된 직쇄 또는 분지쇄인 알킬기, 탄소수 2 내지 10의 치환 또는 비치환된 직쇄 또는 분지쇄인 알케닐기, 탄소수 2 내지 10의 치환 또는 비치환된 직쇄 또는 분지쇄인 디엔닐기, 탄소수 3 내지 15의 치환 또는 비치환된 시클로알킬기, 치환 또는 비치환된 탄소수 6 내지 20의 아릴기, 치환 또는 비치환된 안트라센닐기, 치환 또는 비치환된 피렌닐기, 치환 또는 비치환된 피리디닐기, 치환 또는 비치환된 티오페닐기, 치환 또는 비치환된 퓨란닐기, 치환 또는 비치환된 피라조릴기, 치환 또는 비치환된 피롤릴기, 치환 또는 비치환된 벤조티오펜닐기, 치환 또는 비치환된 벤조이미다졸기 및 치환 또는 비치환된 디히드로벤조퓨란기이다.
- 청구항 1에 있어서,상기 이온성화합물은 이미다졸리움계 화합물, 피리디늄계 화합물, 암모늄계 화합물, 포스피늄계 화합물 및 이들의 조합으로 이루어진 군으로부터 선택된 하나인 양이온; 및F -, Cl -, Br -, I -, BF 4 -, PF 6 -, (CF 3SO 2) 2N -, CF 3SO 3 -, C 2N 3 -, CH 3SO 3 -, CF 3BF 3 -, C 2F 5BF 3 -, NO 3 -, CF 3CO 2 -, C 3H 5O 3 -, C 7H 5O 2 -, 및 이들의 조합으로 선택된 하나인 음이온을 포함하는 것인,표면 개질 2차원 맥신:
- 청구항 14에 있어서,상기 양이온은 하기의 화학식 7 내지 9 및 이들의 조합으로 이루어진 군으로부터 선택된 하나인 것인,표면 개질 2차원 맥신;[화학식 7]상기 R 12, R 13 및 R 14 각각은 수소, 치환 또는 비치환된 탄소수 1 내지 15인 직쇄 또는 분지쇄의 알킬기, 및 치환 또는 비치환된 탄소수 2 내지 10인 직쇄 또는 분지쇄의 알케닐기이며,[화학식 8]상기 R 15 및 R 16 각각은 수소 및 치환 또는 비치환된 탄소수 1 내지 15인 직쇄 또는 분지쇄의 알킬기이고,[화학식 9]상기 Q는 N 또는 P이며,상기 R 17, R 18, R 19 및 R 20 각각은 치환 또는 비치환된 탄소수 1 내지 15인 직쇄 또는 분지쇄의 알킬기이다.
- 청구항 15에 있어서,상기 화학식 7은 하기 화학식 7-1 내지 7-10 및 이들의 조합으로 이루어진 군으로부터 선택된 하나인 것이며,상기 화학식 8은 하기 화학식 8-1 내지 8-2 및 이들의 조합으로 이루어진 군으로부터 선택된 하나인 것이고,상기 화학식 9는 하기 화학식 9-1 내지 9-6 및 이들의 조합으로 이루어진 군으로부터 선택된 하나인 것인,표면 개질 2차원 맥신:[화학식 7-1][화학식 7-2][화학식 7-3][화학식 7-4][화학식 7-5][화학식 7-6][화학식 7-7][화학식 7-8][화학식 7-9][화학식 7-10][화학식 8-1][화학식 8-2][화학식 9-1][화학식 9-2][화학식 9-3][화학식 9-4][화학식 9-5][화학식 9-6]
- 청구항 1의 표면 개질 2차원 맥신 제조방법에 있어서,산 에칭 공정으로 상기 2차원 맥신이 분산된 맥신 수용액을 수득하는 제1 단계;적어도 하나의 히드록시기를 포함하는 화합물, 이온성화합물 및 이들의 조합으로 이루어진 군으로부터 선택된 하나를 물 또는 유기용매에 분산시킨 혼합물을 준비하는 제2 단계; 및상기 제1 단계로 수득된 맥신 수용액과 상기 제2 단계의 혼합물을 혼합 및 교반하여 상기 2차원 맥신의 외부 표면을 개질시키는 제3 단계;를 포함하는,표면 개질 2차원 맥신 제조방법.
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US20190166733A1 (en) * | 2016-04-22 | 2019-05-30 | Drexel University | Two-dimensional metal carbide, nitride, and carbonitride films and composites for emi shielding |
KR20200071928A (ko) * | 2018-12-11 | 2020-06-22 | 한국과학기술원 | 수소 플라즈마를 활용한 이차원 물질의 전기적 특성 회복 방법 및 이의 장치 |
KR20200118650A (ko) * | 2019-04-08 | 2020-10-16 | 한국과학기술연구원 | 포화 또는 불포화 탄화수소를 포함하는 아민으로 표면개질 된 2차원 맥신 입자 및 이의 제조 방법 및 용도 |
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KR20200118650A (ko) * | 2019-04-08 | 2020-10-16 | 한국과학기술연구원 | 포화 또는 불포화 탄화수소를 포함하는 아민으로 표면개질 된 2차원 맥신 입자 및 이의 제조 방법 및 용도 |
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