WO2022088730A1 - 机台清洁装置 - Google Patents

机台清洁装置 Download PDF

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Publication number
WO2022088730A1
WO2022088730A1 PCT/CN2021/103379 CN2021103379W WO2022088730A1 WO 2022088730 A1 WO2022088730 A1 WO 2022088730A1 CN 2021103379 W CN2021103379 W CN 2021103379W WO 2022088730 A1 WO2022088730 A1 WO 2022088730A1
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WO
WIPO (PCT)
Prior art keywords
cleaning
machine
top surface
main body
bracket
Prior art date
Application number
PCT/CN2021/103379
Other languages
English (en)
French (fr)
Inventor
梁学玉
Original Assignee
长鑫存储技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 长鑫存储技术有限公司 filed Critical 长鑫存储技术有限公司
Priority to US17/442,326 priority Critical patent/US20230056022A1/en
Publication of WO2022088730A1 publication Critical patent/WO2022088730A1/zh

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
    • B08B1/12—Brushes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
    • B08B1/14—Wipes; Absorbent members, e.g. swabs or sponges
    • B08B1/143—Wipes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B08B3/024—Cleaning by means of spray elements moving over the surface to be cleaned
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00—Cleaning by methods involving the use of air flow or gas flow
    • B08B5/04—Cleaning by suction, with or without auxiliary action
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F7/00—Magnets
    • H01F7/06—Electromagnets; Actuators including electromagnets
    • H01F7/20—Electromagnets; Actuators including electromagnets without armatures
    • H01F7/206—Electromagnets for lifting, handling or transporting of magnetic pieces or material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
    • B08B2203/02—Details of machines or methods for cleaning by the force of jets or sprays
    • B08B2203/0217—Use of a detergent in high pressure cleaners; arrangements for supplying the same
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
    • B08B2203/02—Details of machines or methods for cleaning by the force of jets or sprays
    • B08B2203/027—Pump details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F7/00—Magnets
    • H01F7/06—Electromagnets; Actuators including electromagnets
    • H01F7/08—Electromagnets; Actuators including electromagnets with armatures
    • H01F7/16—Rectilinearly-movable armatures
    • H01F7/1638—Armatures not entering the winding

Definitions

  • the present application relates to the field of semiconductor equipment, and in particular, to a machine cleaning device.
  • various processes are usually required. Different semiconductor processes can be performed on different equipment, for example, deposition equipment is used to form thin films, grinding equipment is used for planarization, lithography equipment is used for patterning, and implantation equipment is used for ion implantation.
  • the clean room usually maintains a certain pressure, and makes the gas flow from the top to the bottom of the clean room, so as to prevent dust in the clean room and reduce the adverse effects of dust or other foreign particles on semiconductor products.
  • the clean room usually maintains a certain pressure, and makes the gas flow from the top to the bottom of the clean room, so as to prevent dust in the clean room and reduce the adverse effects of dust or other foreign particles on semiconductor products.
  • the stage on which the workpiece to be processed is placed is exposed to the main body of the machine, under the disturbance of the airflow, the dust or foreign particles accumulated on the top surface of the main body of the machine are likely to fall on the stage, contaminating the stage and affecting the waiting time.
  • the quality of the processed parts leads to a low yield of the parts to be processed.
  • the present application provides a machine table cleaning device for cleaning the top surface of a machine table main body
  • the machine table cleaning device includes: a guide rail arranged beside a carrier of the machine table main body, slidably installed on the guide rail a bracket on the bracket, a cleaning part installed on the bracket, a driving device connected to the bracket, and a controller connected with the driving device; when the cleaning part cleans the top surface of the machine main body At this time, the controller controls the driving device to drive the bracket to move along the guide rail, so as to drive the cleaning member to clean the top surface of the machine main body in a direction away from the carrier.
  • the main body of the machine is provided with a carrier, and the machine cleaning device cleans the top surface of the main body of the machine;
  • the cleaning device of the machine includes a guide rail, a bracket, a cleaning part, a driving device and a controller, and the guide rail is arranged beside the carrying table.
  • a bracket that can slide along the guide rail is installed on the guide rail, the bracket is connected with the driving device, the driving device is connected with the controller signal, and the controller controls the driving device to drive the bracket to move along the guide rail, and the cleaning part is installed on the bracket;
  • the controller controls the driving device to drive the cleaning component to clean the top surface of the machine main body away from the carrier, so as to prevent foreign particles from falling and contaminating the carrier during the cleaning process.
  • the foreign particles accumulated on the top surface of the main body of the machine can be reduced or avoided to fall on the carrier, thereby reducing the contamination of the carrier by foreign particles and improving the The cleanliness of the stage, thereby improving the yield of the workpiece to be processed.
  • FIG. 1 is a schematic structural diagram of a machine main body in an embodiment of the application.
  • FIG. 2 is a schematic structural diagram of a machine cleaning device in an embodiment of the application.
  • FIG. 3 is a schematic structural diagram of a guide rail and a roller in an embodiment of the application.
  • FIG. 4 is a working state diagram of the cylinder in the embodiment of the application.
  • Fig. 5 is another working state diagram of the cylinder in the embodiment of the application.
  • FIG. 7 is the second state of the solenoid valve and the cylinder in the embodiment of the application.
  • FIG. 9 is a schematic diagram of the connection between the bracket and the cleaning head in the embodiment of the application.
  • FIG. 10 is a side view of the connection between the bracket and the cleaning head in the embodiment of the application.
  • FIG. 11 is a schematic structural diagram of a cleaning block in an embodiment of the application.
  • FIG. 12 is a schematic structural diagram of a limiting device in an embodiment of the application.
  • FIG. 13 is a schematic diagram of a grating ruler in an embodiment of the application.
  • FIG. 14 is a circuit diagram of a signal processing circuit in an embodiment of the application.
  • 15 is a schematic structural diagram of an atomizing device in an embodiment of the application.
  • FIG. 16 is a schematic diagram of a keyboard circuit in an embodiment of the present application.
  • the machine cleaning device cleans the top surface of the machine main body with the carrier
  • the machine cleaning device includes a guide rail, a bracket, a driving device, a cleaning component and a controller.
  • the guide rail is arranged beside the carrier, and a bracket is slidably installed on the guide rail.
  • the bracket is driven and connected to a driving device, and the driving device is controlled by a controller.
  • a cleaning component is also installed on the bracket.
  • the controller controls the drive bracket to move along the guide rail, and drives the cleaning component to clean the top surface of the machine main body away from the carrier, reducing the possibility of foreign particles falling during cleaning. and by cleaning the foreign particles on the top surface of the main body of the machine close to the carrier, reducing or avoiding the foreign particles falling on the carrier and contaminating the carrier, thereby improving the yield of the workpiece to be processed.
  • the machine body 10 includes a machine body 11 , and the stage 12 is generally disposed on the working side of the machine body 11 and exposed to the machine body 11 .
  • the carrier 12 is disposed on the front side of the machine main body 11 , and the carrier 12 is located outside the machine main body 11 to facilitate picking and placing the workpiece to be processed.
  • the top surface of the stage 12 is generally lower than the top surface 13 of the main body of the machine, so that the stage 12 has a suitable height and is convenient to operate on the stage 12 .
  • two sides of the carrier 12 may also be provided with a vertical cabinet, and the top surface of the vertical cabinet is flush with the top surface 13 of the machine main body.
  • a machine table main body 11 is provided on the right side of the carrier 12
  • a vertical cabinet is provided on each of the upper and lower sides of the carrier table 12, and the top surface 13 of the machine table main body and the top surface of the vertical cabinet are on the same plane.
  • the top surface 13 of the machine body is cleaned by a machine cleaning device.
  • the machine cleaning device includes a guide rail 20 , a bracket 30 , a driving device 40 , a cleaning component and a controller.
  • the guide rails 20 are arranged beside the carrier 12 of the machine main body 11 to provide a track for the machine cleaning device to move.
  • the guide rail 20 may be disposed on the side surface of the machine main body 11 , or may be disposed on the top surface 13 of the machine main body.
  • the embodiment of the present application does not limit the installation position of the guide rail 20 .
  • the guide rail 20 is fixedly connected to the top surface 13 of the machine table main body, and the guide rail 20 extends along the front side of the machine table main body 11 to the rear side of the machine table main body 11 . As shown in FIG. 2 , one end of the guide rail 20 corresponds to the end of the carrier 12 .
  • Two guide rails 20 may be provided to improve the moving stability of the bracket 30 , and the two guide rails 20 are respectively arranged on two sides of the carrier 12 , that is, the carrier 12 is located between the two guide rails 20 .
  • the two guide rails 20 can be arranged in parallel and opposite to each other, so that the bracket 30 can move on the two guide rails 20 .
  • a bracket 30 is usually slidably mounted on the guide rail 20 .
  • there are two guide rails 20 wheels are respectively provided on both sides of the bracket 30 , and guide grooves are arranged on the surface of the wheels along the circumferential direction, and the guide grooves are engaged with the guide rails 20 , so that the bracket 30 can travel on the guide rails 20 .
  • each guide rail 20 is provided with a track groove 21
  • two sides of the bracket 30 are respectively provided with rollers 31 adapted to the track groove 21 , located in the bracket 30 .
  • the rollers 31 on the same side are arranged in the corresponding track grooves 21 .
  • the roller 31 moves relative to the track groove 21 so that the bracket 30 can move along the guide rail 20 .
  • the cross-sectional shape of the track groove 21 may be a trapezoid, a rectangle or other polygons.
  • the opening on the track groove 21 for the connection between the roller 20 and the bracket 30 may be directed upward as shown in FIG. 3 , or may be directed to the left or right as shown in FIG. 3 .
  • rollers 31 are arranged in parallel in one track groove 21 , the two rollers 31 are a group of rollers, and the groups of rollers are a roller module.
  • three sets of rollers are one roller module, that is, one roller module includes six rollers 31 , and the six rollers 31 are divided into three rows along the extending direction of the guide rail 20 .
  • each side of the bracket 30 may be provided with a plurality of the above-mentioned roller modules.
  • each side of the bracket 30 is provided with two above-mentioned roller modules, that is, each side of the bracket 30 is provided with twelve rollers 31, and the two roller modules located on the same side of the bracket 30 are installed in the same track groove 21. middle.
  • the stand 30 may be a plate, a block or a frame.
  • the orthographic projection of the bracket 30 to the top surface 13 of the machine table body is a square, and the side length of the square is 20 cm.
  • the frame can be a field-shaped frame or a mouth-shaped frame to reduce the weight of the bracket 30 .
  • the cleaning member is attached to the top surface 13 of the machine main body.
  • the cleaning member is in contact with the top surface 13 of the machine main body or has a first preset distance, so as to keep the cleaning member in contact with the top surface 13 of the machine main body.
  • the cleaning member is driven to clean the top surface 13 of the machine body in a direction away from the carrier 12 .
  • the bracket 30 is connected with a driving device 40 , and the driving device 40 provides power to drive the bracket 30 to move.
  • the driving device 40 is signal-connected to the controller, and the controller controls the driving device 40 to operate or stop.
  • the driving device 40 may be a servo motor, an air cylinder or a hydraulic cylinder.
  • the driving device 40 is a cylinder.
  • the cylinder includes a piston 41 and a push rod 42 arranged inside the cylinder.
  • the piston 41 divides the cylinder into two parts, the two parts are a rod cavity 43 and a rodless cavity 44 respectively.
  • One end of the push rod 42 is connected to the piston 41 , and the other end of the push rod 42 is connected to the end of the bracket 30 away from the carrier 12 .
  • the driving device 40 can be signal-connected to the controller through a solenoid valve, and the controller controls the movement of the driving device 40 by controlling the solenoid valve.
  • the controller is electrically connected with the coil of the solenoid valve, and controls the on and off of the coil, thereby controlling the position of the valve core of the solenoid valve.
  • the solenoid valve adopts a 5/2-way valve
  • the 5/2-way valve includes an intake port, a vent port and an exhaust port.
  • Gas such as compressed air (CDA for short)
  • CDA compressed air
  • Solenoid valve can adopt single coil, spring return single electric control mode, or double coil double electric control mode. Taking the solenoid valve as an example of a two-position five-way valve with a single electronic control, the process of the controller controlling the cylinder is described in detail with reference to FIGS. 6 to 8 .
  • the spool When there is a first current in the coil, the spool is in the first position. Referring to Figure 6, the air inlet at P and the air outlet at A are for air intake, the air outlet at B and the exhaust port at O are exhausted, The gas flows in the direction of the arrow as shown in FIG. 6 , the push rod 42 of the cylinder extends, and the support 30 moves toward the direction close to the carrier 12 .
  • the spring pushes the spool to reset, and the spool is in the second position.
  • the intake port at P and the vent port at B are for intake, the vent port at A and the exhaust port at O Exhaust, the gas flows in the direction of the arrow as shown in FIG. 7 , the push rod 42 of the cylinder is retracted, and the bracket 30 moves in a direction away from the carrier 12 .
  • the spool When there is a second current in the coil, the spool is in the initial position. Referring to Figure 8, the spool blocks the air inlet at P, the vent at A, the vent at B and the exhaust at O, The cylinder does not work and the bracket 30 does not move.
  • the cleaning component includes a lifting device and a cleaning head 50
  • the cleaning head 50 is installed on the bracket 30 through the lifting device
  • the lifting device controls the distance between the cleaning head 50 and the top surface 13 of the main body of the machine, that is, the lifting device can
  • the cleaning head 50 is controlled to be close to or away from the top surface 13 of the machine body.
  • the cleaning head 50 is in contact with the top surface 13 of the machine main body or has a first preset distance; when the cleaning head 50 is away from the top surface 13 of the machine main body, the cleaning The head 50 has a second preset distance from the top surface 13 of the machine main body, and the second preset distance is greater than the first preset distance.
  • the lifting device includes an electromagnet and a connecting plate, the electromagnet and the connecting plate are both fixedly connected to the bracket 30, and the electromagnet is signal-connected to the controller.
  • a cleaning head 50 is installed between the connecting plates, and the cleaning head 50 can slide relative to the connecting plates.
  • the top surface 13 is in contact with the top surface 13 of the machine main body or has a first preset distance.
  • the cleaning head 50 When the cleaning component cleans the top surface 13 of the machine main body, the cleaning head 50 is put down, the controller controls the electromagnet to lose power, the cleaning head 50 slides down relative to the bracket 30 along the connecting plate under the action of gravity, and the cleaning head 50 slides down close to the bottom of the machine main body. Top surface 13.
  • the lifting device includes an electromagnet 92 and a connecting rod 91 , one end of the connecting rod 91 is rotatably connected to the bracket 30 , and the other end of the connecting rod 91 is fixedly connected to the cleaning head 50 , and the cleaning head 50
  • the connecting rod 91 can rotate around the bracket 30 .
  • the electromagnet 92 is fixedly connected to the bracket 30
  • the electromagnet 92 is signal-connected to the controller
  • the cleaning head 50 is provided with a suction plate 51 correspondingly.
  • the electromagnet 92 can be horizontally fixed on the bracket 30 and protrude relative to the bracket 30 , and one end of the electromagnet 92 away from the bracket 30 is matched with the suction plate 51 .
  • the electromagnet 92 When the electromagnet 92 is energized, the electromagnet 92 attracts the suction plate 51, and the cleaning head 50 is lifted.
  • the cleaning head 50 is in a horizontal position, and the cleaning head 50 has a large distance from the top of the machine main body 11 .
  • the electromagnet 92 loses power, the electromagnet 92 does not attract the suction plate 51, the cleaning head 50 is put down, and the cleaning head 50 approaches the top surface 13 of the machine main body under the action of gravity.
  • the controller controls the electromagnet 92 to lose power, the cleaning head 50 drives the connecting rod 91 to rotate around the bracket 30 under the action of gravity, and the cleaning head 50 rotates close to the top surface 13 of the machine main body.
  • the cleaning head 50 can be lowered directly below the electromagnet 92 , that is, the cleaning head 50 is not positioned directly below the bracket 30 . As shown in FIG. 10 , there is a first distance H between the cleaning head 50 and the bracket 30 , and the first distance H may be 5 cm.
  • the controller controls the electromagnet 92 to be energized, so that the cleaning head 50 is lifted and cleaned.
  • the head 50 has a second predetermined distance from the top surface 13 of the machine main body.
  • the cleaning head 50 is moved toward the direction close to the stage 12 while maintaining the state that the cleaning head 50 has a second predetermined distance from the top surface 13 of the machine main body.
  • the electromagnet 92 may be disposed in the middle of the two connecting rods 91 , or may be disposed on the same side of the two connecting rods 91 .
  • a plurality of electromagnets 92 may be provided.
  • there are two electromagnets 92 and corresponding areas of the cleaning head 50 are respectively provided with matching suction plates 51 .
  • the electromagnet 92 and the controller can be connected by a relay signal.
  • the controller is electrically connected to the windings of the relay, and the contacts of the relay are electrically connected to the electromagnet 92 .
  • the electromagnet 92 is energized to attract the suction plate 51; when the contacts of the relay are opened, the electromagnet 92 is de-energized.
  • the contacts of the relay are normally open contacts.
  • the contact of the relay is closed, and the electromagnet 92 is energized; when the controller controls the winding of the relay to be de-energized, the contact of the relay is turned off. When the point is turned on, the electromagnet 92 is de-energized.
  • the contact of the relay can also be a normally closed contact.
  • the controller controls the winding of the relay to be de-energized the contact of the relay is closed, and the electromagnet 92 is energized; when the controller controls the winding of the relay to be energized, the contact of the relay is opened. , the electromagnet 92 loses power.
  • a first spring 93 is further provided between the cleaning head 50 and the bracket 30.
  • One end of the first spring 93 is fixedly connected to the cleaning head 50, and the other end of the first spring 93 is connected to the cleaning head 50.
  • the bracket 30 is fixedly connected.
  • the cleaning head 50 may have a concave-shaped structure, and the direction of the opening of the concave-shaped structure is opposite to the moving direction of the cleaning member when the cleaning member cleans the top surface 13 of the machine main body. As shown in FIG. 2 , when the cleaning member cleans the top surface 13 of the machine main body, the moving direction of the cleaning member is from left to right, and the opening of the concave structure faces left.
  • the opening of the concave-shaped structure penetrates two opposite sides of the cleaning head 50 . As shown in FIG. 2 , the opening of the concave-shaped structure penetrates two opposite sides of the cleaning head 50 .
  • the lifting device lowers the cleaning head 50 toward the carrier 12 , the carrier 12 is exposed in the opening of the concave structure, and the top surfaces of the two vertical cabinets on both sides of the carrier 12 Covered by a concave structure. That is, when the cleaning head 50 is close to the top surface 13 of the machine main body and maintained, the concave structure of the cleaning head 50 is adapted to the carrier 12 and the vertical cabinet, so that the cleaning head 50 can clean the top surface of the vertical cabinet.
  • the carrier 12 is completely exposed in the opening of the concave structure, and coincides with the orthographic projection of the carrier 12 and the opening of the concave structure on the top surface 13 of the machine main body, and the top surfaces of the two vertical cabinets are concave.
  • the glyph structure is completely covered, so that when cleaning the top surface of the vertical cabinet, the cleaning head 50 is prevented from being located directly above the carrier 12, thereby preventing foreign particles on the cleaning head 50 from falling onto the carrier 12, reducing the number of carrier 12 possibility of contamination.
  • the concave structure may include two L-shaped cleaning blocks 52 .
  • two L-shaped cleaning blocks 52 are assembled to form a concave-shaped structure.
  • the long side D1 of the L-shaped cleaning block 52 is 30 cm, and the short side D2 is 5 cm.
  • the two L-shaped cleaning blocks 52 may be respectively connected with lifting devices, that is, each L-shaped cleaning block 52 is driven by a lifting device respectively, and the two L-shaped cleaning blocks 52 may also be connected as a whole and then connected with a lifting device.
  • the cleaning head 50 is used for cleaning the top surface 13 of the machine main body, and the cleaning head 50 may or may not be in contact with the top surface 13 of the machine main body.
  • the cleaning head 50 When the cleaning head 50 is a cleaning brush or a cleaning cloth, and cleans the top surface 13 of the machine body, the cleaning head 50 is close to the top surface 13 of the machine body and contacts with the top surface 13 of the machine body, and the cleaning head 50 keeps the top surface 13 of the machine body.
  • the state moves away from the stage 12 under the driving of the bracket 30 . That is, the cleaning head 50 moves in the direction from the front side of the machine main body 11 to the rear side of the machine table main body 11 for cleaning, cleaning the foreign particles to the side away from the stage 12 , and cleaning the top of the machine main body close to the stage 12 . face 13.
  • the cleaning head 50 When the cleaning head 50 is a dust suction cup and cleans the top surface 13 of the machine main body, the cleaning head 50 is close to the top surface 13 of the machine main body and has a first preset distance from the top surface 13 of the machine main body, that is, the cleaning head 50 Not in contact with the top surface 13 of the machine main body, the cleaning head 50 maintains the first preset distance and moves away from the carrier 12 under the drive of the bracket 30, so that foreign particles can be sucked from the top surface 13 of the machine main body. From then on, clean the top surface 13 of the machine body near the stage 12 .
  • the dust suction cup can be a vacuum suction cup.
  • the machine cleaning device is further provided with a limiting device 60 to prevent the bracket 30 from moving out of range.
  • the limiting device 60 is disposed beside one end of the guide rail 20 away from the carrier 12 and is opposite to the guide rail 20 . That is, the limiting device 60 is provided on the rear side of the machine table main body 11 . When the bracket 30 moves to the end of the guide rail 20 away from the carrier 12 , the limiting device 60 abuts against the bracket 30 .
  • the limiting device 60 includes two limiting blocks 61 .
  • the two limiting blocks 61 are in one-to-one correspondence with the two guide rails 20 , and each limiting block 61 is provided with two second springs on the side facing the bracket 30 . 62.
  • the expansion and contraction direction of the second spring 62 is the same as the moving direction of the bracket 30 , and is used for shock absorption and buffering of the bracket 30 .
  • the limit block 61 can be a limit iron block
  • the second spring 62 can be a rubber air spring.
  • the machine cleaning device is further provided with a positioning device 70, the positioning device 70 is connected to the controller information, and outputs the position information of the bracket 30 relative to the front side of the machine main body 11 to the controller, which is used to determine the relative load of the bracket 30.
  • the controller controls the driving device 40 and the lifting device according to the received position information, so as to control the cleaning process of the machine table cleaning device.
  • the positioning device 70 may be a grating scale, including a scale grating 71 and a grating reading head.
  • the scale grating 71 is parallel to the guide rail 20, the scale grating 71 can be arranged on the top surface 13 of the machine main body, and the grating reading head is arranged on the bracket 30, and the scale grating 71 and the grating reading head are not in direct contact during operation.
  • the grating reading head includes a light source 72 , a lens 73 , an indicating grating 74 and an optoelectronic element 75 .
  • the light source 72 can be an LED light source 72
  • the indicating grating 74 and the scale grating 71 have the same grating pitch
  • the photoelectric element 75 can be a photosensitive element, such as a photodiode or a phototransistor
  • the photoelectric element 75 is connected to the controller through a signal processing circuit Connected so that the grating readhead can detect and transmit the position information of the carriage 30 .
  • the signal processing circuit can be an A/D conversion circuit (analog/digital converter), including resistors, capacitors, diodes, etc. These components are connected in the manner shown in FIG. 14 to form a signal processing circuit.
  • the indicator grating 74 moves relative to the scale grating 71, the light condensed by the lens 73 passes through the scale grating 71 and the grating slits of the indicator grating 74 to form moire fringes alternately bright and dark. Converted into electrical signals, after being filtered by the signal processing circuit, the output signal is close to a sine wave, and the controller subdivides and counts the sine wave to obtain the displacement of the indicating grating 74 .
  • the displacement detected by the grating scale is 190 cm, and the closer to the stage 12, the smaller the displacement detected by the grating scale.
  • the cleaning head 50 is in contact with the top surface 13 of the machine main body or has a first preset distance, and moves away from the carrier 12; when the displacement is 190 cm, the cleaning head 50 stops moving , the limiting device 60 buffers and limits the bracket 30 to prevent the cleaning component from moving beyond the cleaning range.
  • the machine cleaning device further includes an atomizing device 80, and the atomizing device 80 sprays the atomized cleaning agent in the cleaning area on the top surface 13 of the machine main body, as shown in the dotted line area in FIG. 2 . , so as to wet the top surface 13 of the machine main body in the cleaning area, so as to facilitate the cleaning of foreign particles.
  • the atomizing device 80 includes a cleaning agent storage device 81 , a pumping device 82 , a pipe 83 , and a spray head 84 disposed in the pipe 83 and communicating with the pipe 83 .
  • the detergent storage device 81 may be a storage tank for storing the detergent.
  • the cleaning agent wets the top surface 13 of the machine main body, and can adsorb foreign particles floating on the top surface 13 of the machine main body and make them fall on the top surface 13 of the machine main body.
  • the top surface 13 of the machine body is cleaned.
  • the cleaning head is a cleaning cloth
  • the top surface 13 of the machine body can also be cleaned when the top surface 13 of the machine body is wetted, so as to easily clean foreign particles from the top surface 13 of the machine body.
  • the cleaning agent can be water or alcohol.
  • the cleaning agent is alcohol.
  • alcohol has a good effect of cleaning foreign particles.
  • alcohol is highly volatile, and is not easy to corrode the machine main body 11 and the stage 12, and is not easy to remain.
  • the detergent storage device 81 is an alcohol storage tank with a capacity of 2L. The remaining amount of the cleaning agent in the cleaning agent storage device 81 is checked regularly, for example, every two months, and the cleaning agent is replaced in time when the cleaning agent is insufficient.
  • the pumping device 82 communicates with the cleaning agent storage device 81 and the pipeline 83, and is used for pumping the cleaning agent in the cleaning agent storage device 81 into the pipeline 83, and the pumping device 82 can be a flow pump.
  • the pumping device 82 is signally connected to the controller, and the controller controls the working state of the pumping device 82.
  • the pumping device 82 When the pumping device 82 receives the atomization signal from the controller, the pumping device 82 pumps the cleaning agent in the cleaning agent storage device 81 into the pipeline 83 , and the spray head 84 sprays the atomized cleaning agent to the surface of the machine main body 11 .
  • the working time of the pumping device 82 can be 10s, and the spraying dose of the cleaning agent is greater than or equal to 20ml.
  • the spray head 84 is disposed opposite to the top surface 13 of the machine body, that is, the spray head 84 faces the top surface 13 of the machine body.
  • a plurality of spray heads 84 may be provided, so that the part of the top surface 13 of the machine main body located in the cleaning area can be completely atomized and wetted.
  • the spray head 84 is an ultrasonic atomizing spray head.
  • the controller in the embodiment of the present application may be a central processing unit (Central Processing Unit, CPU for short), and the controller is signally connected to the driving device 40, the lifting device, the positioning device 70 and the pumping device 82, respectively, to control the machine cleaning device cleaning process.
  • CPU Central Processing Unit
  • the cleaning part When the machine cleaning device is not working, the cleaning part is in the initial state, the cleaning part is located on the back side of the machine main body 11, as shown in Figure 2, the cleaning part is on the right side, the displacement measured by the grating ruler is the largest, for example, the displacement is 190cm.
  • the cleaning process of the machine cleaning device specifically includes: wetting the top surface 13 of the machine body by the atomizing device 80 , moving the cleaning component from the initial position to the cleaning initial position, and cleaning the top surface 13 of the machine body by the cleaning component.
  • the top surface 13 of the machine main body is first wetted by the atomizing device 80, and the controller controls the atomizing device 80 to work to wet the clean area on the top surface 13 of the machine main body.
  • the atomizing device 80 Work for 10s.
  • the controller controls the lifting device to lift the cleaning head 50, and the cleaning head 50 has a second preset distance from the top surface 13 of the machine main body and maintains it.
  • the controller controls the driving device 40 to drive the bracket 30 to move toward the direction close to the carrier 12 . It can be understood that when the displacement measured by the grating scale is at the maximum value, the cleaning member is at the initial position, and when the displacement measured by the grating scale is zero, the cleaning member is at the initial cleaning position.
  • the process of cleaning the top surface 13 of the machine main body by the cleaning component includes: the cleaning head 50 approaches and maintains the top surface 13 of the machine main body, and the cleaning head 50 moves to the initial position along the guide rail 20 .
  • the controller controls the lifting device to lower the cleaning head 50 toward the top surface 13 of the machine body, the cleaning head 50 is close to the top surface 13 of the machine body, and the cleaning head 50 is connected to the top surface of the machine body.
  • 13 contacts or has a first preset distance, and maintains the height state of the cleaning head 50 .
  • the controller controls the driving device 40, and the driving device 40 drives the bracket 30 to move along the guide rail 20, so as to drive the cleaning head 50 to move away from the carrier 12, until the bracket 30 stops when it returns to the initial position,
  • the cleaning head 50 moves from the cleaning initial position to the initial position along the guide rail 20 .
  • the cleaning component moves back and forth from the initial position to the initial cleaning position once, and completes a cleaning process on the top surface 13 of the machine main body.
  • the cleaning of the top surface 13 of the machine main body by the machine cleaning device may be implemented in various ways.
  • a timing device such as a timer or a timer, is provided in the controller of the machine cleaning device.
  • the machine cleaning device cleans the top surface 13 of the machine body, for example, the machine cleaning device completes the cleaning process once a day.
  • Regular automatic cleaning of the top surface 13 of the main body of the machine can be realized through the timing device.
  • the frequency of manual cleaning can be reduced to ensure the safety of personnel operations.
  • the accumulation of foreign particles can be reduced, and the movement of foreign particles in the cleaning parts can be reduced. the possibility of falling when disturbed.
  • the controller of the machine cleaning device is connected to the automation system to clean the top surface 13 of the machine main body according to the quality of the workpiece to be processed. For example, when the automated system fails (reticle reject), the automated system issues a cleaning instruction to the machine cleaning device, and the machine cleaning device cleans the top surface 13 of the machine main body, for example, the machine cleaning device completes two cleaning process.
  • the controller of the machine cleaning device is connected to the keyboard circuit.
  • the keyboard circuit includes three branches, and each branch is connected with a button and a resistor in series.
  • S1, S2, and S3 shown in Figure 16 are all keys of the keyboard circuit.
  • R1, R2, and R3 shown in Figure 16 are all resistors.
  • the resistance of the resistors is 4.7 ⁇ 10 3 ohms.
  • One end of each branch is Ground, one end is connected to a positive voltage, for example, the voltage is 5V.
  • the three pins of the controller are connected between the button and the resistor in each shunt.
  • the voltage on the pin corresponding to the button of the controller is 5V.
  • the voltage on the controller pin corresponding to the button is zero.
  • the controller can determine whether a button is pressed according to the change of the voltage on the pin. When a button is pressed, the machine cleaning device completes a cleaning process.
  • the machine cleaning device in the embodiment of the present application cleans the top surface 13 of the machine main body with the carrier 12 .
  • the machine cleaning device includes a guide rail 20 , a bracket 30 , a driving device 40 , a cleaning component and a controller.
  • the guide rail 20 is provided with Next to the carrier 12, a bracket 30 that can slide along the guide rail 20 is installed on the guide rail 20.
  • the bracket 30 is connected to the driving device 40 in a transmission, and the driving device 40 is signally connected to the controller.
  • the driving device 40 drives the bracket 30 to move along the guide rail 20.
  • a cleaning component is installed on the bracket 30; when the cleaning component cleans the top surface 13 of the machine main body, the controller controls the driving device 40 to drive the cleaning component to clean the top surface 13 of the machine main body away from the carrier 12, reducing the number of cleaning components
  • the possibility of foreign particles falling when cleaning the top surface 13 of the machine main body prevents contamination of the stage 12 during the cleaning process.
  • the foreign particles accumulated on the top surface 13 of the machine main body are reduced or prevented from falling on the carrier 12, thereby reducing the contamination of the load by foreign particles.
  • stage 12 thereby improving the cleanliness of the stage 12, thereby improving the yield of the workpiece to be processed.
  • references to the terms “one embodiment,” “some embodiments,” “exemplary embodiments,” “examples,” “specific examples,” or “some examples” and the like are meant to incorporate embodiments
  • a particular feature, structure, material, or characteristic described or exemplified is included in at least one embodiment or example of the present application.
  • schematic representations of the above terms do not necessarily refer to the same embodiment or example.
  • the particular features, structures, materials or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.

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Abstract

一种机台清洁装置，用于对机台主体（11）的顶面进行清洁，包括：设置在机台主体（11）的载台（12）旁的导轨（20），滑动安装在导轨（20）上的支架（30），安装在机台清洁装置支架（30）上的清洁部件，与机台清洁装置支架（30）传动连接的驱动装置（40），以及与机台清洁装置驱动装置（40）连接的控制器；当清洁部件对机台主体的顶面清洁时，控制器控制驱动装置（40）驱动支架（30）沿导轨（20）移动，以带动清洁部件向远离载台（12）的方向清洁机台主体（11）的顶面，清洁时减少异物颗粒掉落污染载台，并通过将异物颗粒从机台主体的顶面清洁掉，从而减少堆积在机台主体的顶面的异物颗粒掉落污染载台，提高待加工件的良品率。

Description

机台清洁装置
本申请要求于2020年11月02日提交中国专利局、申请号为202011203503.0、申请名称为“机台清洁装置”的中国专利申请的优先权，其全部内容通过引用结合在本申请中。
技术领域
本申请涉及半导体设备领域，尤其涉及一种机台清洁装置。
背景技术
在半导体生产制造过程中，通常需要进行各种制程。半导体的不同制程可以在不同的设备上进行，例如，利用沉积设备形成薄膜，利用研磨设备进行平坦化处理，利用光刻设备进行图形化处理，利用注入设备进行离子注入。
为保证半导体产品的质量，各种设备可以放置在无尘室中。无尘室通常保持一定压力，并使气体由无尘室的上方向下方流动，从而防止无尘室内有扬尘，减少尘土或者其他异物颗粒对半导体产品的不良影响。然而，当放置待加工件的载台外露于机台主体时，气流扰动下，易使堆积在机台主体的顶面上的灰尘或者异物颗粒掉落到载台上，污染载台，影响待加工件的质量，导致待加工件的良品率低。
发明内容
本申请提供一种机台清洁装置，用于对机台主体的顶面进行清洁，所述机台清洁装置包括：设置在所述机台主体的载台旁的导轨，滑动安装在所述导轨上的支架，安装在所述支架上的清洁部件，与所述支架传动连接的驱动装置，以及与所述驱动装置连接的控制器；当所述清洁部件对所述机台主体的顶面清洁时，所述控制器控制所述驱动装置驱动所述支架沿所述导轨移动，以带动所述清洁部件向远离所述载台的方向清洁所述机台主体的顶面。
本申请提供的机台清洁装置具有如下优点：
本申请中，机台主体设置有载台，机台清洁装置对机台主体的顶面进行清洁；机台清洁装置包括导轨、支架、清洁部件、驱动装置和控制器，导轨设置在载台旁，导轨上安装有可以沿导轨滑动的支架，支架与驱动装置传动连接，驱动装置与控制器信号连接，由控制器控制驱动装置驱动支架沿导轨运动，支架上通过安装有清洁部件；当清洁部件对机台主体的顶面清洁时，控制器控制驱动装置驱动清洁部件向远离载台的方向清洁机台主体的顶面，避免清洁过程中异物颗粒掉落污染载台。此外，通过将机台主体的顶面靠近载台的异物颗粒清洁掉，减少或者避免堆积在机台主体的顶面上的异物颗粒掉落在载台上，从而减少异物颗粒污染载台，提高载台的洁净度，进而提高待加工件的良品率。
附图说明
图1为本申请实施例中的机台主体的结构示意图；
图2为本申请实施例中的机台清洁装置的结构示意图；
图3为本申请实施例中的导轨与滚轮的结构示意图；
图4为本申请实施例中的气缸的一种工作状态图；
图5为本申请实施例中的气缸的另一种工作状态图；
图6为本申请实施例中的电磁阀与气缸的第一种状态；
图7为本申请实施例中的电磁阀与气缸的第二种状态；
图8为本申请实施例中的电磁阀与气缸的第三种状态；
图9为本申请实施例中的支架与清洁头的连接示意图；
图10为本申请实施例中的支架与清洁头的连接侧视图；
图11为本申请实施例中的清洁块的结构示意图；
图12为本申请实施例中的限位装置的结构示意图；
图13为本申请实施例中的光栅尺的示意图；
图14为本申请实施例中的信号处理电路的电路图；
图15为本申请实施例中的雾化装置的结构示意图；
图16为本申请实施例中的键盘电路的示意图。
具体实施方式
本申请实施例提供的机台清洁装置对具有载台的机台主体的顶面进行清洁，机台清洁装置包括导轨、支架、驱动装置、清洁部件和控制器。导轨设置在载台旁，导轨上滑动安装有支架，支架传动连接驱动装置，驱动装置由控制器控制，支架上还安装有清洁部件。当清洁部件对机台主体的顶面清洁时，控制器控制驱动支架沿导轨移动，带动清洁部件向远离载台的方向对机台主体的顶面进行清洁，减少清洁时异物颗粒掉落的可能性，并通过将机台主体的顶面上靠近载台的异物颗粒清洁掉，减少或者避免异物颗粒掉落到载台上而污染载台，进而提高待加工件的良品率。
为了使本申请实施例的上述目的、特征和优点能够更加明显易懂，下面将结合本申请实施例中的附图，对本申请实施例中的技术方案进行清楚、完整地描述。显然，所描述的实施例仅仅是本申请的一部分实施例，而不是全部的实施例。基于本申请中的实施例，本领域普通技术人员在没有作出创造性劳动的前提下所获得的所有其它实施例，均属于本申请保护的范围。
参照图1，机体10中包括机台主体11，载台12通常设置在机台主体11的工作侧且外露于机台主体11。示例性的，载台12设置在机台主体11的前侧，且载台12位于机台主体11的外部，以便于取放待加工件。载台12的顶面通常低于机台主体的顶面13，使得载台12具有适宜高度，便于对载台12进行操作。
需要说明的是，载台12的两侧还可以各设有一个立柜，立柜的顶面与机台主体的顶面13齐平。以图2中所示方位为例，载台12的右侧设置有机台主体11，载台12的上下两侧各设置有一个立柜，机台主体的顶面13与立柜的顶面在一个平面内。
本申请实施例中，机台主体的顶面13通过的机台清洁装置进行清洁。参照图2，机台清洁装置包括导轨20、支架30、驱动装置40、清洁部件以及控制器。
导轨20设置在机台主体11的载台12旁，以提供机台清洁装置移动的轨道。导轨20可以设置在机台主体11的侧面上，也可以设置在机台主体的顶面13上，本申请实施例对导轨20的设置位置不做限定。
本申请实施例中，导轨20固定连接在机台主体的顶面13上，且导轨 20沿机台主体11的前侧向机台主体11的后侧延伸。如图2所示，导轨20的一端与载台12的端部相对应，例如，导轨20的左端与载台12的左端相齐平，导轨20的另一端向远离载台12的方向延伸。
导轨20可以设置有两条，以提高支架30移动的平稳性，这两条导轨20分别设置在载台12的两侧，即载台12位于两条导轨20之间。两条导轨20可以平行设置且相对设置，以便于支架30在两条导轨20上移动。
导轨20上通常滑动安装有支架30。在一些可能的示例中，导轨20设置有两条，支架30两侧分别设置有车轮，车轮表面沿周向设置有导槽，导槽与导轨20咬合，以使支架30可以在导轨20上行驶。
在另一些可能的示例中，导轨20设置有两条，参照图3，每条导轨20均设置有轨道槽21，支架30两侧分别设置有与轨道槽21适配的滚轮31，位于支架30同一侧的滚轮31设置在对应的轨道槽21中。滚轮31相对轨道槽21运动，以使支架30可以沿导轨20移动。采用滚轮31与轨道槽21，滚轮31与轨道槽21之间的摩擦力较小，可以减少支架30运动过程中带动的异物颗粒的数量。
示例性的，参照图3，以垂直于轨道槽21的延伸方向的平面为截面，轨道槽21的截面形状可以为梯形、矩形或者其他多边形。轨道槽21上供滚轮20与支架30连接的开口可以朝向图3中所示的上方，也可以朝向图3中所示的左方或者右方。
沿导轨20的延伸方向，一个轨道槽21中平行设置有两个滚轮31，这两个滚轮31为一组滚轮，多组滚轮为一个滚轮模组。例如，三组滚轮为一个滚轮模组，即一个滚轮模组中包括六个滚轮31，六个滚轮31沿导轨20的延伸方向分为三行。
为了提高支架30移动的稳定性，支架30的每侧均可以设置有多个上述滚轮模组。示例性的，支架30的每侧设置有两个上述滚轮模组，即支架30的每侧均设置有十二个滚轮31，位于支架30同一侧的两个滚轮模组安装在同一轨道槽21中。
继续参照图2，支架30可以为平板、方块或者框架。例如，支架30向机台主体的顶面13的正投影为正方形，正方形的边长为20cm。框架可以为田字形框架或者口字形框架，以减轻支架30的重量。
支架30与机台主体的顶面13之间可以具有间隔，以供清洁部件相对 机台主体的顶面13运动。当清洁部件接近机台主体11时，清洁部件贴向机台主体的顶面13，示例性的，清洁部件与机台主体的顶面13相接触或者具有第一预设距离，保持清洁部件与机台主体的顶面13相接触或者具有第一预设距离的状态，带动清洁部件沿远离载台12的方向清洁机台主体的顶面13。
继续参照图2，支架30连接有驱动装置40，驱动装置40提供动力，带动支架30运动。驱动装置40与控制器信号连接，由控制器控制驱动装置40工作或者停止。驱动装置40可以为伺服电机、气缸或者液压缸。
示例性的，驱动装置40为气缸，参照图4和图5，气缸包括设置在气缸内部的活塞41和推杆42。活塞41将气缸分为两个部分，这两个部分分别为有杆腔43和无杆腔44。推杆42的一端与活塞41连接，推杆42的另一端连接在支架30远离载台12的一端，例如，如图2所示，气缸设置在支架30的右侧。
当气缸的有杆腔43进气、无杆腔44排气时，参照图4，活塞41向无杆腔44方向运动，推杆42沿图4中A方向运动，即推杆42缩回，支架30向远离载台12的方向运动。当气缸的有杆腔43排气、无杆腔44进气时，参照图5，活塞41向有杆腔43方向运动，推杆42沿图5中B方向运动，即推杆42伸出，支架30向靠近载台12方向的运动。气缸的有杆腔43或无杆腔44进气和排气一次，活塞41往复运动一次，支架30沿导轨20往复运动一次，机台清洁装置对机台主体的顶面13完成一次清洁过程。
驱动装置40可以通过电磁阀与控制器信号连接，控制器通过控制电磁阀，从而控制驱动装置40的运动。控制器与电磁阀的线圈电连接，控制线圈的通、断电，从而控制电磁阀的阀芯位置。驱动装置40为气缸时，当阀芯处于初始位置，电磁阀与气缸之间的通路断开，气缸不工作；当阀芯处于第一位置，气缸的推杆42伸出；当阀芯处于第二位置，气缸的推杆42缩回。
示例性的，电磁阀采用二位五通阀，二位五通阀包括进气口、通气口和排气口。进气口中通入气体，例如压缩空气(Compressed air，简称CDA)，通气口设置有两个，两个通气口分别与气缸的有杆腔43和无杆腔44连通，排气口中排出气体。
电磁阀可以采用单线圈、弹簧复位的单电控方式，也可以采用双线圈 的双电控方式。以电磁阀为单电控的二位五通阀为例，结合图6至图8，详述控制器控制气缸的过程。
当线圈中有第一电流时，阀芯处于第一位置，参照图6，P处的进气口和A处的通气口进气，B处的通气口和O处的排气口排气，气体如图6中所示箭头方向流动，气缸的推杆42伸出，支架30向靠近载台12的方向运动。
当线圈断电时，弹簧推动阀芯复位，阀芯处于第二位置，参照图7，P处的进气口和B处的通气口进气，A处的通气口和O处的排气口排气，气体如图7中所示箭头方向流动，气缸的推杆42缩回，支架30向远离载台12的方向运动。
当线圈中有第二电流时，阀芯处于初始位置，参照图8，阀芯将P处的进气口、A处的通气口、B处的通气口和O处的排气口封堵，气缸不工作，支架30不运动。
继续参照图2，清洁部件包括升降装置和清洁头50，清洁头50通过升降装置安装在支架30上，升降装置控制清洁头50相对机台主体的顶面13之间的距离，即升降装置可以控制清洁头50接近或者远离机台主体的顶面13。当清洁头50接近机台主体的顶面13时，清洁头50与机台主体的顶面13相接触或具有第一预设距离；当清洁头50远离机台主体的顶面13时，清洁头50与机台主体的顶面13具有第二预设距离，第二预设距离大于第一预设距离。
在一些可能的示例中，升降装置包括电磁铁和连接板，电磁铁和连接板均固定连接在支架30上，电磁铁与控制器信号连接。连接板设置有两个，分别安装在电磁铁的两侧。连接板之间安装有清洁头50，清洁头50可以相对连接板滑动。
当电磁铁得电时，电磁铁吸附清洁头50，清洁头50提起；当电磁铁失电时，电磁铁不吸附清洁头50，清洁头50放下，清洁头50在重力作用接近机台主体的顶面13，与机台主体的顶面13相接触或具有第一预设距离。
当清洁部件对机台主体的顶面13清洁时，清洁头50放下，控制器控制电磁铁失电，清洁头50重力作用下沿连接板相对支架30下滑，清洁头50下滑接近机台主体的顶面13。
在另一些可能的示例中，参照图9，升降装置包括电磁铁92和连接杆91，连接杆91的一端转动连接在支架30上，连接杆91的另一端固定连接清洁头50，清洁头50与连接杆91可以绕支架30转动。电磁铁92固定连接在支架30上，电磁铁92与控制器信号连接，清洁头50对应设置有吸板51。
参照图9，电磁铁92可以水平固定在支架30上，且相对支架30外凸，电磁铁92远离支架30的一端与吸板51配合。当电磁铁92得电时，电磁铁92吸附吸板51，清洁头50提起。例如，清洁头50处于水平位置，清洁头50与机台主体11的顶部具有较大距离。当电磁铁92失电时，电磁铁92不吸附吸板51，清洁头50放下，清洁头50在重力作用下接近机台主体的顶面13。
当清洁部件对机台主体的顶面13清洁时，控制器控制电磁铁92失电，清洁头50重力作用下带动连接杆91绕支架30转动，清洁头50转动接近机台主体的顶面13。
需要说明的是，清洁头50可以降至电磁铁92的正下方，即清洁头50未位于支架30的正下方。如图10所示，清洁头50与支架30之间具有第一距离H，第一距离H可以为5cm。
需要说明的是，当清洁头50向靠近载台12的方向移动时，为防止清洁头50将异物颗粒带到载台12附近，控制器控制电磁铁92得电，使得清洁头50提起，清洁头50与机台主体的顶面13具有第二预设距离。保持清洁头50与机台主体的顶面13具有第二预设距离的状态，清洁头50向靠近载台12的方向移动。
如图9所示，连接杆91可以设置有两个，电磁铁92可以设置在两个连接杆91的中间，也可以设置在两个连接杆91的同一侧。为了提高清洁头50提升时的稳定性，电磁铁92可以设置有多个。例如，电磁铁92设置有两个，清洁头50的对应区域分别设置有相配合的吸板51。
电磁铁92与控制器之间可以通过继电器信号连接。控制器与继电器的绕组电连接，继电器的触点与电磁铁92电连接。当继电器的触点闭合时，电磁铁92得电吸附吸板51；当继电器的触点打开时，电磁铁92失电。
示例性的，继电器的触点为常开触点，当控制器控制继电器的绕组通电时，继电器的触点闭合，电磁铁92得电；当控制器控制继电器的绕组断 电时，继电器的触点打开，电磁铁92失电。继电器的触点也可以为常闭触点，当控制器控制继电器的绕组断电时，继电器的触点闭合，电磁铁92得电；当控制器控制继电器的绕组通电时，继电器的触点打开，电磁铁92失电。
为了缓冲清洁头50的下降速度，参照图9，清洁头50与支架30之间还设置有第一弹簧93，第一弹簧93的一端与清洁头50固定连接，第一弹簧93的另一端与支架30固定连接。当电磁铁92失电，清洁头50下降时，第一弹簧93拉伸，清洁头50在重力与第一弹簧93拉力作用下缓慢下降，使得机台清洁装置的运行更加平稳。
清洁头50可以为凹字形结构，凹字形结构的开口的朝向与清洁部件对机台主体的顶面13清洁时清洁部件的移动方向相反。如图2所示，清洁部件对机台主体的顶面13清洁时，清洁部件的移动方向由左至右，凹字形结构的开口朝左。
凹字形结构的开口贯通清洁头50的两个相对的侧面，如图2所示，凹字形结构的开口贯通清洁头50的上下两个相对侧面。当清洁部件对机台主体的顶面13清洁时，升降装置使清洁头50朝向载台12下降，载台12暴露在凹字形结构的开口内，载台12两侧的两个立柜的顶面被凹字形结构覆盖。即当清洁头50接近机台主体的顶面13并保持时，清洁头50的凹字形结构与载台12和立柜相适配，以使清洁头50可以清洁立柜的顶面。
示例性的，载台12完全暴露在凹字形结构的开口中，且与载台12与凹字形结构的开口在机台主体的顶面13上的正投影重合，两个立柜的顶面被凹字形结构完全覆盖，如此设置，在清洁立柜的顶面的同时，避免清洁头50位于载台12的正上方，从而避免清洁头50上的异物颗粒掉落到载台12上，减少载台12被污染的可能性。
凹字形结构可以包括两个L形清洁块52。参照图11，两个L形清洁块52拼合形成凹字形结构。L形清洁块52的长边D1为30cm，短边D2为5cm。两个L形清洁块52可以分别连接有升降装置，即每个L形清洁块52分别由一个升降装置驱动，两个L形清洁块52也可以连接成一个整体后连接有升降装置。
清洁头50用于机台主体的顶面13进行清洁，清洁头50可以与机台主体的顶面13相接触，也可以不接触。
当清洁头50为清洁刷或者清洁布，对机台主体的顶面13清洁时，清洁头50接近机台主体的顶面13且与机台主体的顶面13相接触，清洁头50保持该状态在支架30的带动下向远离载台12的方向移动。即清洁头50沿机台主体11的前侧至机台主体11的后侧的方向移动进行清洁，将异物颗粒清扫至远离载台12的一侧，清洁靠近载台12的机台主体的顶面13。
当清洁头50为除尘吸盘，对机台主体的顶面13清洁时，清洁头50接近机台主体的顶面13且与机台主体的顶面13具有第一预设距离，即清洁头50与机台主体的顶面13不接触，清洁头50保持第一预设距离并在支架30的带动下向远离载台12的方向移动，将异物颗粒可以从机台主体的顶面13上吸起，清洁靠近载台12的机台主体的顶面13。其中，除尘吸盘可以为真空吸盘。
继续参照图2，机台清洁装置还设置有限位装置60，以防止支架30移动超出范围。限位装置60设置导轨20远离载台12的一端旁，并与导轨20相对。即限位装置60设置有机台主体11的后侧。当支架30移动至导轨20远离载台12的一端时，限位装置60与支架30相抵。
限位装置60包括两个限位块61，参照图12，两个限位块61与两个导轨20一一对应，每个限位块61朝向支架30的一侧设置有两个第二弹簧62。第二弹簧62的伸缩方向与支架30的移动方向相同，用于对支架30减震和缓冲。限位块61可以为限位铁块，第二弹簧62可以为橡胶空气弹簧。
继续参照图2，机台清洁装置还设置有定位装置70，定位装置70与控制器信息连接，向控制器输出支架30相对机台主体11的前侧的位置信息，用于确定支架30相对载台12的位置，控制器根据接收的位置信息控制驱动装置40和升降装置，以控制机台清洁装置的清洁过程。
定位装置70可以为光栅尺，包括标尺光栅71和光栅读数头。标尺光栅71与导轨20相平行，标尺光栅71可以设置在机台主体的顶面13上，光栅读数头设置在支架30上，工作时标尺光栅71和光栅读数头无直接接触。
光栅读数头包括光源72、透镜73、指示光栅74以及光电元件75。参照图13，光源72可以为LED光源72，指示光栅74与标尺光栅71具有相同的栅距，光电元件75可以为光敏元件，例如光敏二极管或者光敏三极管， 光电元件75通过信号处理电路与控制器连接，以使光栅读数头可以检测和发送支架30的位置信息。信号处理电路可以为A/D转换电路(模拟/数字转换器)，包括电阻、电容、二极管等，这些元器件以如图14所示方式连接形成信号处理电路。
当指示光栅74相对标尺光栅71移动时，经透镜73会聚后的光通过标尺光栅71和指示光栅74的光栅狭缝形成明暗相间的莫尔条纹，光电元件75将莫尔条纹的光强变化信号转换为电信号，经信号处理电路滤波后，输出信号接近正弦波，控制器对正弦波细分和计数，得到指示光栅74的位移量。
示例性的，光栅尺检测的位移量为190cm，越靠近载台12，光栅尺检测到的位移量越小。当位移量为0cm时，清洁头50与机台主体的顶面13相接触或者具有第一预设距离，并向远离载台12的方向移动；当位移量为190cm时，清洁头50停止移动，限位装置60对支架30进行缓冲和限位，以防清洁部件移动超出清洁范围。
为了提高清洁效果，机台清洁装置还包括雾化装置80，雾化装置80将雾化的清洁剂喷洒在机台主体的顶面13上的清洁区域中，如图2中所示的虚线区域，以使位于清洁区域内的机台主体的顶面13润湿，便于将异物颗粒清洁掉。参照图15，雾化装置80包括清洁剂存储装置81、泵送装置82、管道83，以及设置在管道83且与管道83连通的喷头84。
清洁剂存储装置81可以为储存罐，用于存储清洁剂。清洁剂将机台主体的顶面13润湿，可以将漂浮在机台主体的顶面13的异物颗粒吸附使其落到机台主体的顶面13上，待清洁剂挥发后，清洁部件对机台主体的顶面13清洁。当清洁头为清洁布时，也可以在机台主体的顶面13润湿时，对机台主体的顶面13进行清洁，易将异物颗粒从机台主体的顶面13清洁掉。
清洁剂可以为水或者酒精。本申请实施例中清洁剂为酒精，一方面，酒精清洁异物颗粒的效果较好，另一方面，酒精挥发性强，不易腐蚀机台主体11和载台12，也不易残留。清洁剂存储装置81为容量为2L的酒精储存罐。清洁剂存储装置81内的清洁剂的剩余量定期检查，例如每两个月检查一次，当清洁剂不足时及时更换。
泵送装置82连通清洁剂存储装置81和管道83，用于将清洁剂存储装置81中的清洁剂泵入管道83中，泵送装置82可以为流量泵。泵送装置 82与控制器信号连接，控制器控制泵送装置82的工作状态。
当泵送装置82接收到控制器的雾化信号时，泵送装置82将清洁剂存储装置81内的清洁剂泵入管道83中，喷头84将雾化的清洁剂喷洒到机台主体11的清洁区域，泵送装置82的工作时间可以为10s，清洁剂的喷洒剂量大于或者等于20ml。
喷头84与机台主体的顶面13相对设置，即喷头84朝向机台主体的顶面13。喷头84可以设置有多个，以使得机台主体的顶面13位于清洁区域内的部分可以完全雾化润湿。示例性的，喷头84为超声波雾化喷头。
本申请实施例中的控制器可以为中央处理器(Central Processing Unit，简称CPU)，控制器分别与驱动装置40、升降装置、定位装置70和泵送装置82信号连接，以控制机台清洁装置的清洁过程。
机台清洁装置未工作时，清洁部件处于初始状态，清洁部件位于机台主体11的后侧，如图2所示，清洁部件位于右侧，光栅尺测得的位移量最大，例如，位移量为190cm。
机台清洁装置的清洁过程具体包括：雾化装置80对机台主体的顶面13润湿、清洁部件由初始位置移动至清洁初始位置，以及清洁部件对机台主体的顶面13清洁。
具体的，先通过雾化装置80对机台主体的顶面13润湿，控制器控制雾化装置80工作，对机台主体的顶面13上的清洁区域润湿，例如，雾化装置80工作10s。
润湿后，清洁部件由初始位置移动至清洁初始位置，控制器控制升降装置将清洁头50提升，清洁头50与机台主体的顶面13具有第二预设距离并保持。控制器控制驱动装置40带动支架30向靠近载台12的方向移动。可以理解的是，光栅尺测得的位移量为最大值时，清洁部件位于初始位置，光栅尺测得的位移量为零时，清洁部件位于清洁初始位置。
清洁部件对机台主体的顶面13清洁的过程包括：清洁头50接近机台主体的顶面13并保持，以及清洁头50沿导轨20移动到初始位置。
当清洁部件位于清洁初始位置后，控制器控制升降装置使清洁头50朝向机台主体的顶面13下降，清洁头50接近机台主体的顶面13，清洁头50与机台主体的顶面13接触或者具有第一预设距离，并保持清洁头50的高度状态。
保持清洁头50的高度状态，控制器控制驱动装置40，驱动装置40驱动支架30沿导轨20移动，以带动清洁头50向远离载台12的方向移动，直至支架30回到初始位置时停止，清洁头50沿导轨20由清洁初始位置移动到初始位置。清洁部件由初始位置至清洁初始位置往返运动一次，对机台主体的顶面13完成一次清洁过程。
本申请实施例中，机台清洁装置对机台主体的顶面13的清洁可以通过多种方式实现。
在一些可能的示例中，机台清洁装置的控制器内设置有定时装置，例如定时器或者计时器。当达到预定时间时，机台清洁装置对机台主体的顶面13进行清洁，例如，机台清洁装置每天完成一次清洁过程。通过定时装置可以实现对机台主体的顶面13进行定期自动清扫，一方面可以减少人工清扫次数，保证人员作业的安全性，另一方面，可以减少异物颗粒堆积，降低异物颗粒在清洁部件移动时受到扰动而掉落的可能性。
在另一些可能的示例中，机台清洁装置的控制器连接自动化系统，根据待加工件的质量等对机台主体的顶面13进行清洁。例如，当自动化系统出现不合格的情况时(reticle reject)，自动化系统对机台清洁装置发出清洁指令，机台清洁装置对机台主体的顶面13进行清洁，例如，机台清洁装置完成两次清洁过程。
在又一些可能的示例中，机台清洁装置的控制器连接键盘电路，如图16所示，键盘电路包括三个分路，每个分路上串联有按键和电阻。图16所示的S1、S2、S3均为键盘电路的按键，图16所示所示的R1、R2、R3均为电阻，电阻的阻值为4.7×10 3欧姆，每个分路的一端接地，一端接正电压，例如，电压为5V。控制器的三个引脚分别连接到每个分路中的按键和电阻之间。
当按键断开时，控制器与该按键对应的引脚上的电压为5V。当按键按下时，控制器与该按键对应的引脚上的电压为零。控制器根据引脚上的电压的变化可以判断是否有按键按下。当有按键按下时，机台清洁装置完成一次清洁过程。
本申请实施例中的机台清洁装置对具有载台12的机台主体的顶面13进行清洁，机台清洁装置包括导轨20、支架30、驱动装置40、清洁部件和控制器，导轨20设置在载台12旁，导轨20上安装有可以沿导轨20滑 动的支架30，支架30与驱动装置40传动连接，驱动装置40与控制器信号连接，由驱动装置40驱动支架30沿导轨20运动，支架30上安装有清洁部件；当清洁部件对机台主体的顶面13清洁时，控制器控制驱动装置40驱动清洁部件向远离载台12的方向清洁机台主体的顶面13，减少清洁部件对机台主体的顶面13清洁时异物颗粒掉落的可能性，避免清洁过程中污染载台12。此外，通过将机台主体的顶面13靠近载台12的异物颗粒清扫，减少或者避免堆积在机台主体的顶面13上的异物颗粒掉落在载台12上，从而减少异物颗粒污染载台12，从而提高载台12的洁净度，进而提高待加工件的良品率。
本说明书中各实施例或实施方式采用递进的方式描述，每个实施例重点说明的都是与其他实施例的不同之处，各个实施例之间相同相似部分相互参见即可。
本领域技术人员应理解的是，在本申请的揭露中，术语“纵向”、“横向”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”等指示的方位或位置关系是基于附图所示的方位或位置关系，其仅是为了便于描述本申请和简化描述，而不是指示或暗示所指的系统或元件必须具有特定的方位、以特定的方位构造和操作，因此上述术语不能理解为对本申请的限制。
在本说明书的描述中，参考术“一个实施方式”、“一些实施方式”、“示意性实施方式”、“示例”、“具体示例”、或“一些示例”等的描述意指结合实施方式或示例描述的具体特征、结构、材料或者特点包含于本申请的至少一个实施方式或示例中。在本说明书中，对上述术语的示意性表述不一定指的是相同的实施方式或示例。而且，描述的具体特征、结构、材料或者特点可以在任何的一个或多个实施方式或示例中以合适的方式结合。
最后应说明的是：以上各实施例仅用以说明本申请的技术方案，而非对其限制；尽管参照前述各实施例对本申请进行了详细的说明，本领域的普通技术人员应当理解：其依然可以对前述各实施例所记载的技术方案进行修改，或者对其中部分或者全部技术特征进行等同替换；而这些修改或者替换，并不使相应技术方案的本质脱离本申请各实施例技术方案的范围。

Claims (16)

  1. 一种机台清洁装置，用于对机台主体的顶面进行清洁，其中，所述机台清洁装置包括：
    设置在所述机台主体的载台旁的导轨，滑动安装在所述导轨上的支架，安装在所述支架上的清洁部件，与所述支架传动连接的驱动装置，以及与所述驱动装置连接的控制器；
    当所述清洁部件对所述机台主体的顶面清洁时，所述控制器控制所述驱动装置驱动所述支架沿所述导轨移动，以带动所述清洁部件向远离所述载台的方向清洁所述机台主体的顶面。
  2. 根据权利要求1所述的机台清洁装置，其中，所述清洁部件包括升降装置和清洁头，所述清洁头通过所述升降装置安装在所述支架上，所述升降装置与所述控制器信号连接；
    当所述清洁部件对所述机台主体的顶面清洁时，所述控制器控制所述升降装置使所述清洁头接近所述机台主体的顶面。
  3. 根据权利要求2所述的机台清洁装置，其中，所述升降装置包括：安装在所述支架上的电磁铁，以及安装在所述支架上的两个连接板，两个所述连接板分别位于所述电磁铁的两侧；
    所述清洁头滑动安装在两个所述连接板之间，所述电磁铁与所述控制器信号连接，当所述清洁部件对所述机台主体的顶面清洁时，所述控制器控制所述电磁铁失电，所述清洁头接近所述机台主体的顶面并保持。
  4. 根据权利要求2所述的机台清洁装置，其中，所述升降装置包括：安装在所述支架上的电磁铁，以及一端与所述支架转动连接的连接杆，所述连接杆的另一端与所述清洁头固定连接；
    所述电磁铁与所述控制器信号连接，当所述清洁部件对所述机台主体的顶面清洁时，所述控制器控制所述电磁铁失电，所述清洁头接近所述机台主体的顶面并保持。
  5. 根据权利要求3所述的机台清洁装置，其中，所述控制器与继电器的绕组电连接，所述继电器的触点与所述电磁铁电连接；
    当所述清洁部件对所述机台主体的顶面清洁时，所述继电器的触点断开，所述电磁铁失电。
  6. 根据权利要求3所述的机台清洁装置，其中，所述升降装置还包括第一弹簧，所述第一弹簧的一端与所述清洁头固定连接，所述第一弹簧的另一端与所述支架固定连接；
    所述控制器控制所述电磁铁失电时，所述第一弹簧缓冲所述清洁头的下降速度。
  7. 根据权利要求2所述的机台清洁装置，其中，所述载台的两侧各设置有一个立柜，所述立柜的顶面与所述机台主体的顶面平齐；
    所述清洁头为凹字形结构，所述凹字形结构的开口的朝向与所述清洁部件对所述机台主体的顶面清洁时所述清洁部件的移动方向相反；
    当所述升降装置使所述清洁头朝向所述载台下降时，所述载台暴露在所述凹字形结构的开口内，且两个所述立柜的顶面被所述凹字形结构覆盖。
  8. 根据权利要求7所述的机台清洁装置，其中，所述凹字形结构包括两个L形清洁块，两个所述L形清洁块拼合形成所述凹字形结构。
  9. 根据权利要求2所述的机台清洁装置，其中，所述清洁头包括清洁刷或者清洁布；
    当所述清洁部件对所述机台主体的顶面清洁时，所述清洁头与所述机台主体的顶面相接触并保持，且向远离所述载台的方向移动。
  10. 根据权利要求2所述的机台清洁装置，其中，所述清洁头包括除尘吸盘；
    当所述清洁部件对所述机台主体的顶面清洁时，所述清洁头与所述机台主体的顶面具有第一预设距离并保持，且向远离所述载台的方向移动。
  11. 根据权利要求1所述的机台清洁装置，其中，所述导轨设置有两条，两条所述导轨平行且相对设置在所述机台主体的顶面上，两条所述导轨位于所述载台的两侧，每个所述导轨设置有轨道槽；
    所述支架两侧设置有滚轮，位于所述支架一侧的所述滚轮设置在对应的所述轨道槽中。
  12. 根据权利要求1所述的机台清洁装置，其中，所述机台清洁装置还包括设置在所述导轨远离所述载台的一端旁的限位装置，所述限位装置被配置为当所述支架移动到所述导轨远离所述载台的一端时，与所述支架相抵。
  13. 根据权利要求12所述的机台清洁装置，其中，所述限位装置包括 两个限位块，两个所述限位块与两个导轨一一对应，每个限位块朝向所述支架的一侧设置有两个第二弹簧，每个所述第二弹簧的伸缩方向与所述支架的移动方向相同。
  14. 根据权利要求1所述的机台清洁装置，其中，所述机台清洁装置还包括定位装置，所述定位装置与所述控制器信号连接，所述定位装置输出所述支架的位置信息；所述控制器根据接收的所述位置信息控制所述驱动装置和所述清洁部件。
  15. 根据权利要求14所述的机台清洁装置，其中，所述定位装置包括设置在所述支架旁且与所述导轨平行的标尺光栅，以及设置在所述支架上的光栅读数头，所述光栅读数头与所述控制器连接，用于检测和发送所述支架的位置信息。
  16. 根据权利要求1所述的机台清洁装置，其中，所述机台清洁装置还包括对所述机台主体的顶面进行润湿的雾化装置；
    所述雾化装置包括清洁剂存储装置，与所述清洁剂存储装置连通的泵送装置，与所述泵送装置连通的管道，以及设置在所述管道上且与所述管道连通的喷头；
    所述泵送装置与所述控制器信号连接，当所述清洁部件对所述机台主体的顶面清洁时，所述控制器控制所述泵送装置将所述清洁剂存储装置中的清洁剂泵入所述管道中，并经所述喷头雾化后喷洒至所述机台主体的顶面。
PCT/CN2021/103379 2020-11-02 2021-06-30 机台清洁装置 WO2022088730A1 (zh)

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