WO2022037315A1 - 一种膛线式空心旋转电极的激光电化学复合沉积的方法及装置 - Google Patents

一种膛线式空心旋转电极的激光电化学复合沉积的方法及装置 Download PDF

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WO2022037315A1
WO2022037315A1 PCT/CN2021/105776 CN2021105776W WO2022037315A1 WO 2022037315 A1 WO2022037315 A1 WO 2022037315A1 CN 2021105776 W CN2021105776 W CN 2021105776W WO 2022037315 A1 WO2022037315 A1 WO 2022037315A1
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rifling
hollow rotating
rotating electrode
laser
deposition
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PCT/CN2021/105776
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English (en)
French (fr)
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张朝阳
吴予澄
徐坤
戴学仁
杨帅
郭盛
赵斗艳
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江苏大学
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Priority to GB2214784.7A priority Critical patent/GB2616490A/en
Priority to US17/617,005 priority patent/US11512407B2/en
Publication of WO2022037315A1 publication Critical patent/WO2022037315A1/zh

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/12—Shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D13/00—Electrophoretic coating characterised by the process
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C25D5/024—Electroplating of selected surface areas using locally applied electromagnetic radiation, e.g. lasers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating

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  • the invention relates to the field of micro composite processing in special processing technology, in particular to a method and device for laser electrochemical composite deposition of a rifling hollow rotating electrode, which is suitable for localized electrodeposition and processing of high-performance composite coatings.
  • Localized electrodeposition technology is a technology that uses the strong electric field generated between the anode tip and the cathode substrate to generate electrochemical reactions. It can deposit various shapes of structures on any position of the cathode substrate of metals, semiconductors and other materials. It is used in automobile, aerospace, medical and other fields, but there are problems that the accuracy is not easy to control and there are defects such as pores and protrusions. Therefore, the introduction of a composite energy field in the electrodeposition system is an effective solution.
  • Laser processing is a non-contact processing method, which has the advantages of high energy density, high efficiency and good flexibility. The introduction of laser irradiation into the electrodeposition system can increase the cathode potential and improve the limiting current density by using laser heat. Localized deposition guided by laser irradiation.
  • the composite coating containing nanoparticles Compared with the single coating, the composite coating containing nanoparticles has better wear resistance, corrosion resistance and other properties, and has good development and application prospects, but in the early preparation of the composite deposition solution, the particles need to be uniformly dispersed in the deposition solution. , the liquid must be stirred to keep the particles in suspension during the deposition process. Particle agglomeration will reduce the coating performance. How to effectively avoid particle agglomeration during the deposition process is a key issue in composite deposition.
  • Chinese Patent Publication No. CN105568348A proposes: using the magnetic field-assisted composite electroplating method, the magnetic ferric oxide particles of the core-shell structure are ultrasonically dispersed in the electroplating solution; Under the action of the electroplating solution, the core-shell structure magnetic particles dispersed in the plating solution are adsorbed on the surface of the cathode; the current is passed through the electroplating system, and the core-shell structure magnetic particles adsorbed on the cathode increase with the thickness of the deposited metal layer and gradually recombine into the metal coating layer. A composite coating is formed. In this method, the magnetic particles of core-shell structure are very difficult to fabricate and have certain application limitations.
  • the present invention provides a method for laser electrochemical composite deposition of a rifling hollow rotating electrode.
  • the uniform rotation of the rifling hollow rotating electrode is used to generate centripetal force, which improves the local deposition accuracy, and at the same time, the nanoparticles can be kept in a suspended state, the dispersion uniformity is improved, and the "self-circulation" of the solution is formed to suppress the concentration extreme. to improve the quality of the deposited layer.
  • the present invention also provides a device for laser electrochemical deposition of a rifling hollow rotating electrode, by which the above method can be realized.
  • the present invention achieves the above technical purpose through the following technical means.
  • a method for laser electrochemical composite deposition of a rifling hollow rotating electrode comprising the following steps: the rifling hollow rotating electrode and a cathode substrate are placed in a working tank, and are respectively connected to the positive electrode and the negative electrode of an electrochemical power supply; The rifling hollow rotating electrode is focused on the cathode substrate; the rifling hollow rotating electrode rotates at a constant speed, and the electrodeposition solution rotates in the rifling hollow rotating electrode and generates a certain centripetal force, which improves the deposition accuracy and localization.
  • the electrodeposition solution contains nanoparticles.
  • the rifling hollow rotating electrode is an insoluble hollow anode tube, which is resistant to high temperature, acid and alkali, and has external insulation.
  • a device for laser electrochemical composite deposition of a rifling hollow rotating electrode comprising a laser processing system, an electrochemical processing system and a control system; wherein, the laser processing system comprises a pulse laser, a mirror and a focusing lens; the mirror is placed on the In the horizontal direction of the pulsed laser, the focusing lens is placed directly under the mirror; the laser is aligned with the center of the rifling hollow rotating electrode and focused on the upper surface of the workpiece; the electrochemical machining system includes an electrochemical power source, a rifling hollow rotating electrode and a cathode a substrate; the positive electrode of the electrochemical power supply is connected to the rifling hollow rotating electrode, and the negative electrode is connected to the cathode substrate; the rifling hollow rotating electrode is located directly above the cathode substrate and maintains a certain initial gap; the control system includes a computer, a The control cabinet, the XYZ workbench and the numerical control platform; the computer is connected with the control cabinet and the pulse laser through the
  • the rifling hollow rotating electrode has a rifling structure inside and a helical structure outside, and the helical direction of the rifling structure is opposite to that of the helical structure.
  • the initial gap between the rifling hollow rotating electrode and the cathode substrate is 20 ⁇ m ⁇ 30 ⁇ m.
  • the rifling hollow rotating electrode is provided with a square hole, and the electrodeposition liquid can enter the inside of the rifling hollow rotating electrode through the square hole.
  • the rotation speed of the rifling hollow rotating electrode is 500r/min ⁇ 1000r/min.
  • the diameter of the laser formed by the pulsed laser is smaller than the inner diameter of the rifling hollow rotating electrode; the wavelength of the pulsed laser is 1064 nm, the frequency is 1 Hz to 100 Hz, and the single pulse energy is 100 mJ to 200 mJ.
  • the electrochemical power source is a pulse power source, the voltage is 0-20V, the frequency is 1kHz-2MHz, and the duty ratio is 0-100%.
  • the rifling hollow rotating electrode rotates at a constant speed during the machining process to generate centripetal force in the deposition liquid to improve the localization accuracy.
  • the rifling structure inside the rifling hollow rotating electrode can keep the particles in a suspended state during the deposition process, greatly improve the dispersion uniformity, save the preparation time of the composite deposition solution, and greatly improve the deposition efficiency.
  • the internal rifling structure of the rifling hollow rotating electrode is opposite to the external helical junction structure, which can make the deposition liquid form a "self-circulation" system, take away the bubbles in time, suppress the concentration polarization, and improve the quality of the deposition layer.
  • Laser irradiation can improve the reaction rate of the processing area, and the formed micro-region stirring can also suppress the concentration polarization, remove air bubbles and improve the uniformity of deposition, thereby improving the quality of the deposited layer.
  • FIG. 1 is a schematic structural diagram of a device for laser electrochemical composite deposition of a rifled hollow rotating electrode according to an embodiment of the present invention
  • Fig. 2a is a structural side view of a rifling hollow rotating electrode
  • Figure 2b is a structural cross-sectional view of a rifling hollow rotating electrode
  • Figure 2c is a top view of the structure of the rifling hollow rotating electrode.
  • a device for laser electrochemical composite deposition of a rifling hollow rotating electrode includes a laser modulation system, an electrochemical machining system and a control system; the laser machining system includes a pulsed laser 11, a mirror 10, and a control system. Focus lens 9.
  • the reflecting mirror 10 is placed in the horizontal direction of the pulsed laser 11, and the focusing lens 9 is placed directly under the reflecting mirror 10; the laser center is aligned with the center of the rifling hollow rotating electrode 7, and is focused on the upper surface of the workpiece after passing through the interior;
  • the electrochemical machining system includes an electrochemical power source 3, a rifling hollow rotating electrode 7 and a cathode substrate 6; the positive electrode of the electrochemical power source 3 is connected to the rifling hollow rotating electrode 7, and the negative electrode is connected to the cathode substrate 6; the rifling The hollow rotating electrode 7 is located directly above the cathode substrate 6 and maintains a certain initial gap; the initial gap between the rifling hollow rotating electrode 7 and the cathode substrate 6 is 20 ⁇ m to 30 ⁇ m.
  • the initial gap is the initial gap between the cathode substrates 6 where the rifled hollow rotating electrode 7 is located.
  • the rifled hollow rotating electrode 7 is located in the gap between the deposition heights on the cathode substrate 6 during the deposition process. It will become smaller, therefore, according to the thickness of the processed deposition layer, the gap size between the rifling hollow rotating electrode 7 and the cathode substrate 6 needs to be maintained by the numerical control platform 12, that is, there is a gap between the rifling hollow rotating electrode 7 and the cathode substrate 6, thereby Make sure that the deposited layer after processing is not in contact with the rifling hollow rotating electrode 7 .
  • the control system includes a computer 1, a control cabinet 2, an XYZ workbench 4 and a numerical control platform 12; the computer 1 is connected with the control cabinet 2 and the pulse laser 11 through a connection port; the control cabinet 2 is connected with the numerical control platform 12 and the XYZ Workbench 4 is connected.
  • the rifling hollow rotating electrode 7 is an insoluble anode tube, which is resistant to high temperature, acid and alkali, and has external insulation.
  • the inner diameter is 2mm to 5mm, and the outside is provided with a square hole that allows the deposition liquid to enter the inside of the electrode.
  • the rotation speed is 500r/min to 1000r/min, and the speed is stable;
  • the wavelength of the pulse laser 11 is 1064nm, the frequency is 1Hz to 100Hz, and the single The pulse energy is 100mJ ⁇ 200mJ, and the laser diameter is smaller than the inner diameter of the rifling hollow rotating electrode 7;
  • the electrochemical power supply 3 is a pulse power supply, the voltage is 0 ⁇ 20V, the frequency is 1kHz ⁇ 2MHz, and the duty ratio is 0 ⁇ 100%.
  • the high-speed rotation of the rifling structure inside the electrode makes the deposition liquid generate centripetal force, thereby improving the localization accuracy, and at the same time, the particles can be kept in a suspended state during the deposition process, and the dispersion uniformity is greatly improved.
  • the internal rifling structure and the external spiral structure of the rifling hollow rotating electrode can make the deposition liquid move upward, forming a "self-circulation" system of the deposition liquid, taking away the bubbles in time, suppressing the concentration polarization, and improving the quality of the deposition layer.
  • Laser irradiation can improve the reaction rate of the processing area, and the formed micro-region stirring can also suppress concentration polarization, remove air bubbles and improve the uniformity of deposition, thereby improving the quality of the deposited layer.
  • the invention is suitable for localized electrodeposition and processing of high-performance composite coating, and can be applied to the fields of micro-manufacturing and processing such as medical treatment, electronics and aerospace.
  • FIG. 7 Schematic diagram of the structure of the rifling hollow rotating electrode 7 .
  • the outside of the rifling hollow rotating electrode 7 is a helical structure with square holes, as shown in Figure 2a.
  • the inside is a rifling structure with the opposite helical direction to the outside, as shown in Figure 2b.
  • the deposition liquid will move in the opposite direction inside the electrode and around the outside of the electrode.
  • a method for laser electrochemical composite deposition of a rifling hollow rotating electrode comprising the following steps: base material pretreatment: cathode substrate 6 is put into working tank 5 after pretreatment such as grinding, polishing, ultrasonic cleaning, etc.; determining processing position .
  • Stirring can also suppress concentration polarization, remove air bubbles and improve the uniformity of deposition, thereby improving the quality of the deposited layer; when the deposition solution contains substances such as nanoparticles, the deposition solution will rotate at a uniform speed in the rifling hollow rotating electrode 7, It can reduce the phenomenon of agglomeration, so that the dispersion uniformity of nanoparticles is greatly improved; when the rifling hollow rotating electrode 7 rotates at a constant speed, the deposition liquid around the electrode will be lifted upward, thus forming a "self-circulation" system of the deposition liquid, which can suppress the concentration Differential polarization to improve the quality of the deposited layer.

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Abstract

本发明公开了一种膛线式空心旋转电极的激光电化学复合沉积的方法及装置，涉及特种加工技术中的微细复合加工领域。激光中心穿过膛线式空心旋转电极并聚焦到阴极基板上；膛线式空心旋转电极匀速旋转，电沉积液在膛线式空心旋转电极内旋转并产生一定的向心力，使得沉积精度提高、定域性加强。本发明在加工过程中，电极内部的膛线结构高速旋转使得沉积液产生向心力从而提高定域精度，同时能够使得颗粒在沉积过程中保持悬浮状态，分散均匀性大大提高。膛线式空心旋转电极内部的膛线结构和外部的螺旋结构可以使得沉积液向上运动，形成沉积液的"自循环"系统，及时带走气泡，抑制浓差极化，提高沉积层的质量。

Description

一种膛线式空心旋转电极的激光电化学复合沉积的方法及装置 技术领域
本发明涉及特种加工技术中的微细复合加工领域，尤其涉及到一种膛线式空心旋转电极的激光电化学复合沉积的方法及装置，适用于定域电沉积以及高性能复合镀层的加工。
背景技术
定域电沉积技术是一种利用阳极尖端与阴极基板之间产生的强电场来发生电化学反应的技术，可以在金属、半导体等材料的阴极基板任意位置上沉积出各种形状的结构，适用于汽车、航天、医疗等领域，但是存在精度不易控制以及有气孔、凸起等缺陷的问题。因此，在电沉积系统中引入复合能场是一种有效的解决办法。激光加工是一种非接触式的加工方法，具有能量密度高、效率高、柔性好等优点，在电沉积系统中引入激光辐照，利用激光热作用能够增加阴极电位，提高极限电流密度，从而实现激光辐照引导的定域沉积。
含有纳米颗粒的复合镀层相比于单一镀层具有更好的耐磨性、耐蚀性等性能，具有良好的发展应用前景，但是在复合沉积液的前期准备中需要将颗粒在沉积液中均匀分散，在沉积过程中液必须搅拌才能保持颗粒的悬浮状态。粒子团聚会降低镀层性能，如何有效避免沉积过程中颗粒团聚是复合沉积的关键问题。
关于定域电沉积技术国内外学者已经进行了一定的研究。中国专利“一种金属三维增材制造装置与方法”，中国专利公开号CN108103541A提出：利用成膜喷头在阴极基底上堆积出两列膜层，射流喷头将电解液喷射至阴极基底表面的两列膜层中间区域，定域电沉积出金属层，通过提升喷头的高度，不断叠加堆积膜层和金属层，实现三维金属构件的增材制造。该发明操作较为繁琐，且膜层去除时影响材料表面质量，沉积复杂形状表面成型精度低。
关于复合沉积过程中颗粒易团聚的问题，国内外学者已经进行了初步的研究。中国专利“一种采用磁场辅助复合电镀的方法”，中国专利公开号CN105568348A提出：采用磁场辅 助复合电镀的方法，将核壳结构的磁性三氧化二铁微粒超声分散在电镀液中；在外加磁场的作用下，将分散在镀液中的核壳结构磁性微粒吸附在阴极表面；将电流通过电镀体系，吸附在阴极的核壳结构磁性微粒随沉积金属层厚度增加，逐步复合到金属镀层中，形成复合镀层。该方法中核壳结构的磁性微粒制作难度很大，并且有一定的应用局限性。
发明内容
针对现有技术中存在的不足，本发明提供了一种膛线式空心旋转电极的激光电化学复合沉积的方法。在加工过程中，利用匀速旋转的膛线式空心旋转电极产生向心力，提高定域沉积精度，同时能够使得纳米颗粒保持悬浮状态，分散均匀性提高，并形成溶液的“自循环”，抑制浓差极化，提高沉积层的质量。
本发明还提供了一种膛线式空心旋转电极的激光电化学沉积的装置，利用该装置可以实现上述方法。
本发明是通过以下技术手段实现上述技术目的的。
一种膛线式空心旋转电极的激光电化学复合沉积的方法，包括以下步骤：膛线式空心旋转电极、阴极基板置于工作槽中，且分别与电化学电源的正极与负极相连；激光中心穿过膛线式空心旋转电极并聚焦到阴极基板上；膛线式空心旋转电极匀速旋转，电沉积液在膛线式空心旋转电极内旋转并产生一定的向心力，使得沉积精度提高、定域性加强。
进一步的，电沉积液内含有纳米颗粒。
进一步的，所述膛线式空心旋转电极为不溶性空心阳极管，耐高温、抗酸碱且外部绝缘。
一种膛线式空心旋转电极的激光电化学复合沉积的装置，包括激光加工系统、电化学加工系统和控制系统；其中，激光加工系统包括脉冲激光器、反射镜和聚焦透镜；所述反射镜置于脉冲激光器水平方向，所述聚焦透镜置于反射镜正下方；激光与膛线式空心旋转电极圆心对齐并聚焦到工件上表面；所述电化学加工系统包括电化学电源、膛线式空心旋转电极 和阴极基板；所述电化学电源的正极与膛线式空心旋转电极相连，负极与阴极基板相连；所述膛线式空心旋转电极位于阴极基板正上方且保持一定的起始间隙；所述控制系统包括计算机、控制柜、X-Y-Z工作台和数控平台；所述计算机通过连接端口与控制柜和脉冲激光器相连接；所述控制柜与数控平台以及X-Y-Z工作台相连接。
进一步的，所述膛线式空心旋转电极内部为膛线式结构，外部为螺旋式结构，且膛线式结构与螺旋式结构的螺旋方向相反。
进一步的，所述膛线式空心旋转电极与阴极基板之间的起始间隙为20μm～30μm。
进一步的，所述膛线式空心旋转电极上开设有方孔，电沉积液可通过方孔进入膛线式空心旋转电极内部。
进一步的，膛线式空心旋转电极旋转速度500r/min～1000r/min。
进一步的，所述脉冲激光器形成的激光直径小于膛线式空心旋转电极内径；脉冲激光器波长为1064nm，频率为1Hz～100Hz，单脉冲能量为100mJ～200mJ。
进一步的，所述电化学电源为脉冲电源，电压0～20V，频率1kHz～2MHz，占空比0～100％。
本发明的技术优势和有益效果：
1.膛线式空心旋转电极在加工过程中匀速旋转使得沉积液产生向心力从而提高定域精度。
2.膛线式空心旋转电极内部的膛线结构能够使得颗粒在沉积过程中保持悬浮状态，分散均匀性大大提高，省去复合沉积液的制备时间，并大大提高沉积效率。
3.膛线式空心旋转电极内部的膛线结构和外部的螺旋结结构相反可以使得沉积液形成“自循环”系统，及时带走气泡，抑制浓差极化，提高沉积层的质量。
4.激光照射可以提高加工区域反应速率，形成的微区搅拌也可以抑制浓差极化，排除气泡并提高沉积的均匀性，从而提高沉积层质量。
附图说明
图1为根据本发明实施例的一种膛线式空心旋转电极的激光电化学复合沉积的装置结构示意图；
图2a为膛线式空心旋转电极的结构侧视图；
图2b为膛线式空心旋转电极的结构剖视图；
图2c为膛线式空心旋转电极的结构俯视图。
附图标记：1-计算机；2-控制柜；3-电化学电源；4-X-Y-Z工作台；5-工作槽；6-阴极基板；7-膛线式空心旋转电极；8-专用夹头；9-聚焦透镜；10-反射镜；11-脉冲激光器；12-数控平台。
具体实施方式
下面详细描述本发明的实施例，所述实施例的示例在附图中示出，其中自始至终相同或类似的标号表示相同或类似的元件或具有相同或类似功能的元件。下面通过参考附图描述的实施例是示例性的，旨在用于解释本发明，而不能理解为对本发明的限制。
在本发明的描述中，需要理解的是，术语“中心”、“纵向”、“横向”、“长度”、“宽度”、“厚度”、“上”、“下”、“轴向”、“径向”、“竖直”、“水平”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本发明和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本发明的限制。
在本发明中，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”、“固定”等术语应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通。对于本领域的普通技术人员而言，可以根据具体情况理解上述术语在本发明中的具体含义。
结合附图1所示，一种膛线式空心旋转电极的激光电化学复合沉积的装置，包括激光 调制系统、电化学加工系统和控制系统；所述激光加工系统包括脉冲激光器11、反射镜10和聚焦透镜9。所述反射镜10置于脉冲激光器11水平方向，所述聚焦透镜9置于反射镜10正下方；激光中心与膛线式空心旋转电极7圆心对齐，通过内部后聚焦到工件上表面；
所述电化学加工系统包括电化学电源3、膛线式空心旋转电极7和阴极基板6；所述电化学电源3的正极与膛线式空心旋转电极7相连，负极与阴极基板6相连；所述膛线式空心旋转电极7位于阴极基板6正上方且保持一定的起始间隙；膛线式空心旋转电极7与阴极基板6之间的起始间隙为20μm～30μm。
其中，起始间隙为膛线式空心旋转电极7位于阴极基板6之间最初的间隙，随着沉积高度的增加，沉积过程中的膛线式空心旋转电极7位于阴极基板6上沉积高度之间的间隙会变小，因此，根据加工沉积层的厚度需要通过数控平台12来保持膛线式空心旋转电极7与阴极基板6的间隙大小，即膛线式空心旋转电极7与阴极基板6之间存在间隙，从而确保加工后的沉积层与膛线式空心旋转电极7不接触。
所述控制系统包括计算机1、控制柜2、X-Y-Z工作台4和数控平台12；所述计算机1通过连接端口与控制柜2和脉冲激光器11相连接；所述控制柜2与数控平台12以及X-Y-Z工作台4相连接。
其中所述膛线式空心旋转电极7为不溶性阳极管，耐高温、抗酸碱且外部绝缘，与阴极基板6的加工起始间隙为20μm～30μm，内部为膛线式结构，外部为螺旋式结构，内径2mm～5mm，外部开有能够使得沉积液进入电极内部的方孔，加工时旋转速度500r/min～1000r/min，速度稳定；所述脉冲激光器11波长为1064nm，频率为1Hz～100Hz，单脉冲能量为100mJ～200mJ，形成激光直径小于膛线式空心旋转电极7内径；所述电化学电源3为脉冲电源，电压0～20V，频率1kHz～2MHz，占空比0～100％。
本发明在加工过程中，电极内部的膛线结构高速旋转使得沉积液产生向心力从而提高定域精度，同时能够使得颗粒在沉积过程中保持悬浮状态，分散均匀性大大提高。膛线式空 心旋转电极内部的膛线结构和外部的螺旋结构可以使得沉积液向上运动，形成沉积液的“自循环”系统，及时带走气泡，抑制浓差极化，提高沉积层的质量。激光照射可以提高加工区域反应速率，形成的微区搅拌也可以抑制浓差极化，排除气泡并提高沉积的均匀性，从而提高沉积层质量。本发明适用于定域电沉积以及高性能复合镀层的加工，可以应用于医疗、电子、航天等微细制造加工领域。
膛线式空心旋转电极7的结构示意图。膛线式空心旋转电极7的外部为开有方孔的螺旋结构，如图2a所示。内部为与外部螺旋方向相反的膛线结构，如图2b所示。如图2c的膛线式空心旋转电极7俯视图所示，沉积液会在电极内部与电极外部周围的运动方向相反。
一种膛线式空心旋转电极的激光电化学复合沉积的方法，包括以下步骤：基材预处理：阴极基板6经过打磨、抛光、超声清洗等预处理后，放入工作槽5中；确定加工位置。利用专用夹头8夹住膛线式空心旋转电极7，调节数控平台12使其位于离阴极基板6一定起始间隙的加工位置；激光聚焦：调节激光加工系统使激光中心与膛线式空心旋转电极7圆心对齐并聚焦到阴极基板6表面；电极旋转：倒入沉积液后，使得沉积液浸没膛线式空心旋转电极7外部的方孔，并使电极保持稳定匀速旋转；开始加工：膛线式空心旋转电极7匀速旋转时，由于电极内部膛线结构的作用，沉积液向下挤压时会产生一定的向心力，使得沉积的精度提高、定域性加强，激光照射可以提高加工区域反应速率，形成的微区搅拌也可以抑制浓差极化，排除气泡并提高沉积的均匀性，从而提高沉积层质量；当沉积液中含有如纳米颗粒等物质时，沉积液在膛线式空心旋转电极7中会匀速旋转，能够减少团聚现象，使得纳米颗粒的分散均匀性大大提高；当膛线式空心旋转电极7匀速旋转时，电极外部周围的沉积液会向上提升，从而形成了沉积液“自循环”系统，能够抑制浓差极化，提高沉积层质量。
在本说明书的描述中，参考术语“一个实施例”、“一些实施例”、“示例”、“具体示例”、或“一些示例”等的描述意指结合该实施例或示例描述的具体特征、结构、材料或者特点包含于本发明的至少一个实施例或示例中。在本说明书中，对上述术语的示意性表述不一 定指的是相同的实施例或示例。而且，描述的具体特征、结构、材料或者特点可以在任何的一个或多个实施例或示例中以合适的方式结合。
尽管上面已经示出和描述了本发明的实施例，可以理解的是，上述实施例是示例性的，不能理解为对本发明的限制，本领域的普通技术人员在不脱离本发明的原理和宗旨的情况下在本发明的范围内可以对上述实施例进行变化、修改、替换和变型。

Claims (9)

  1. 一种膛线式空心旋转电极的激光电化学复合沉积的方法，其特征在于，包括以下步骤：膛线式空心旋转电极(7)、阴极基板(6)置于工作槽(5)中，且分别与电化学电源(3)的正极与负极相连；
    激光中心穿过膛线式空心旋转电极(7)并聚焦到阴极基板(6)上；
    膛线式空心旋转电极(7)匀速旋转，电沉积液在膛线式空心旋转电极(7)内旋转并产生一定的向心力，使得沉积精度提高、定域性加强；所述膛线式空心旋转电极(7)内部为膛线式结构，外部为螺旋式结构，且膛线式结构与螺旋式结构的螺旋方向相反。
  2. 根据权利要求1所述的膛线式空心旋转电极的激光电化学复合沉积的方法，其特征在于，电沉积液内含有纳米颗粒。
  3. 根据权利要求1所述的膛线式空心旋转电极的激光电化学复合沉积的方法，其特征在于，所述膛线式空心旋转电极(7)为不溶性空心阳极管，耐高温、抗酸碱且外部绝缘。
  4. 一种膛线式空心旋转电极的激光电化学复合沉积的装置，其特征在于，包括激光加工系统、电化学加工系统和控制系统；
    其中，激光加工系统包括脉冲激光器(11)、反射镜(10)和聚焦透镜(9)；所述反射镜(10)置于脉冲激光器(11)水平方向，所述聚焦透镜(9)置于反射镜(10)正下方；激光与膛线式空心旋转电极(7)圆心对齐并聚焦到工件上表面；
    所述电化学加工系统包括电化学电源(3)、膛线式空心旋转电极(7)和阴极基板(6)；所述电化学电源(3)的正极与膛线式空心旋转电极(7)相连，负极与阴极基板(6)相连；所述膛线式空心旋转电极(7)位于阴极基板(6)正上方且保持一定的起始间隙；
    所述控制系统包括计算机(1)、控制柜(2)、X-Y-Z工作台(4)和数控平台(12)；所述计算机(1)通过连接端口与控制柜(2)和脉冲激光器(11)相连接；所述控制柜(2)与数控平台(12)以及X-Y-Z工作台(4)相连接；所述膛线式空心旋转电极(7)内部为膛线式结构，外部为螺旋式结构，且膛线式结构与螺旋式结构的螺旋方向相反。
  5. 根据权利要求4所述的膛线式空心旋转电极的激光电化学复合沉积的装置，其特征在于，所述膛线式空心旋转电极(7)与阴极基板(6)之间的起始间隙为20μm～30μm。
  6. 根据权利要求4所述的膛线式空心旋转电极的激光电化学复合沉积的装置，其特征在于，所述膛线式空心旋转电极(7)上开设有方孔，电沉积液可通过方孔进入膛线式空心旋转电极(7)内部。
  7. 根据权利要求4所述的膛线式空心旋转电极的激光电化学复合沉积的装置，其特征在于，膛线式空心旋转电极(7)旋转速度500r/min～1000r/min。
  8. 根据权利要求4所述的膛线式空心旋转电极的激光电化学复合沉积的装置，其特征在于，所述脉冲激光器(11)形成的激光直径小于膛线式空心旋转电极(7)内径；脉冲激光器(11)波长为1064nm，频率为1Hz～100Hz，单脉冲能量为100mJ～200mJ。
  9. 根据权利要求4所述的膛线式空心旋转电极的激光电化学复合沉积的装置，其特征在于，所述电化学电源(3)为脉冲电源，电压0～20V，频率1kHz～2MHz，占空比0～100％。
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