WO2021184498A1 - 显示面板及其制作方法 - Google Patents

显示面板及其制作方法 Download PDF

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Publication number
WO2021184498A1
WO2021184498A1 PCT/CN2020/087617 CN2020087617W WO2021184498A1 WO 2021184498 A1 WO2021184498 A1 WO 2021184498A1 CN 2020087617 W CN2020087617 W CN 2020087617W WO 2021184498 A1 WO2021184498 A1 WO 2021184498A1
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WO
WIPO (PCT)
Prior art keywords
substrate
sub
display panel
carrier
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2020/087617
Other languages
English (en)
French (fr)
Inventor
熊鹏鹏
王添鸿
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TCL China Star Optoelectronics Technology Co Ltd
Original Assignee
TCL China Star Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TCL China Star Optoelectronics Technology Co Ltd filed Critical TCL China Star Optoelectronics Technology Co Ltd
Priority to US16/960,742 priority Critical patent/US11609456B2/en
Publication of WO2021184498A1 publication Critical patent/WO2021184498A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13396—Spacers having different sizes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13398—Spacer materials; Spacer properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices

Definitions

  • the application relates to the field, and in particular to a display panel and a manufacturing method thereof.
  • gap control materials are required to support the display panel so as to avoid damage to the display panel when the display panel is subjected to external pressure.
  • the present application provides a display panel and a manufacturing method thereof to solve the technical problems in the prior art that in the manufacturing process of spacers of different heights, the photomask is expensive, the manufacturing process is complicated, and the cost remains high.
  • a display panel comprising a first substrate, a second substrate disposed opposite to the first substrate, and a liquid crystal layer located between the first substrate and the second substrate;
  • the first substrate includes a first substrate and a stage layer on the first substrate, and the stage layer includes a plurality of stages;
  • the second substrate includes a second substrate and a spacer layer on the second substrate, the spacer layer includes a plurality of spacers, and one of the stages corresponds to one of the spacers;
  • the carrier includes a base and at least one sub-carrier located on the base, and the orthographic projection of the sub-carrier on the base is located in the base.
  • the orthographic projection area of the sub-carrier on the base gradually decreases.
  • the carrier includes at least a first sub carrier on the base and a second sub carrier on the first sub carrier;
  • the orthographic projection area of the second sub-carrier on the base is smaller than the orthographic projection area of the first sub-carrier on the base.
  • the thickness of the sub-stage far away from the first substrate is smaller than the thickness of the sub-stage near the first substrate.
  • the first substrate further includes a color filter layer located between the first substrate and the stage layer;
  • any one of the stages is composed of at least one of a red color resist, a green color resist, or a blue color resist in the color film layer.
  • the thickness of the carrier is 1 ⁇ m-2 ⁇ m.
  • the distance between the carrier and the corresponding spacer is less than 1 ⁇ m.
  • the cross-sectional area of the sub-carrier in the first cross section is not less than 144 ⁇ m 2 , and the first cross section is parallel to the display panel.
  • the cross-sectional area of the base on the first cross-section is not greater than 500 ⁇ m 2 , and the first cross-section is parallel to the display panel.
  • the material of the carrier includes color resist or photoresist.
  • a manufacturing method of a display panel includes:
  • one of the bases corresponds to one of the spacers
  • the orthographic projection of the sub-carrier on the base is located in the base, the base and the sub-carrier constitute a carrier, and the spacers constitute a spacer layer.
  • the step of sequentially forming a plurality of pedestals and at least one sub-carrier on the pedestal on the first substrate includes:
  • the orthographic projection area of the sub-carrier on the base gradually decreases.
  • the pattern of the first mask corresponding to any one of the stages includes a central light-shielding area and at least one ring-shaped light-shielding area surrounding the central light-shielding area, so as to form a light-shielding area including a plurality of A plurality of said carriers of a base and a plurality of sub-carriers.
  • the step of forming the base and the sub-carrier includes:
  • the orthographic projection area of the second sub-carrier on the base is smaller than the orthographic projection area of the first sub-carrier on the base.
  • the step of forming the sub-carrier includes:
  • the thickness of the sub-stage far away from the first substrate is smaller than the thickness of the sub-stage close to the first substrate.
  • any one of the stages is composed of at least one of a red color resist, a green color resist, or a blue color resist in the color resist layer.
  • the thickness of the carrier is 1 ⁇ m-2 ⁇ m.
  • the distance between the carrier and the corresponding spacer is less than 1 ⁇ m.
  • the cross-sectional area of the sub-carrier in the first cross-section is not less than 144 ⁇ m 2 , and the first cross-section is parallel to the display panel.
  • the cross-sectional area of the base on the first cross section is not greater than 500 ⁇ m 2 , and the first cross section is parallel to the display panel.
  • stages with different thicknesses are formed to form a step difference between the spacer and the corresponding stage, which improves the surface pressure of the display panel, saves manufacturing process costs, and improves productivity efficiency.
  • FIG. 1 is a schematic diagram of the structure of the display panel of this application.
  • FIG. 2 is a schematic diagram of a partial structure of the display panel of the application
  • FIG. 3 is a schematic top view of the comparison between the structure of the display panel of this application and the structure of the prior art
  • FIG. 4 is a flow chart of the steps of the manufacturing method of the display panel of this application.
  • FIG. 5 is a schematic diagram of the mask pattern in the manufacturing method of the display panel of the present application.
  • the present application provides a display panel and a manufacturing method thereof.
  • the present application will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the application, and are not used to limit the application.
  • This application proposes a display panel 10, which includes a first substrate 100, a second substrate 200 disposed opposite to the first substrate 100, and a display panel located between the first substrate 100 and the The liquid crystal layer between the second substrate 200.
  • the first substrate 100 includes a first substrate 110 and a stage layer 120 on the first substrate 110, and the stage layer 120 includes a plurality of stages 130.
  • the second substrate 200 includes a second substrate 210 and a spacer layer on the second substrate 210.
  • the spacer layer includes a plurality of spacers 230 with the same thickness. One of the spacers 230 corresponds to.
  • the carrier 130 includes a base 131 and at least one sub-carrier 132 located on the base 131, and the orthographic projection of the sub-carrier 132 on the base 131 is located in the base 131 .
  • stages with different thicknesses are formed to form a step difference between the spacer and the corresponding stage, which improves the surface pressure of the display panel, saves manufacturing process costs, and improves productivity efficiency.
  • the display panel 10 includes a first substrate 100, a second substrate 200 disposed opposite to the first substrate 100, and located between the first substrate 100 and the second substrate 200 Between the liquid crystal layer.
  • the first substrate 100 includes a first substrate 110 and a stage layer 120 on the first substrate 110, and the stage layer 120 includes a plurality of stages 130.
  • the second substrate 200 includes a second substrate 210 and a spacer layer on the second substrate 210.
  • the spacer layer includes a plurality of spacers 230, a carrier 130 and a spacer layer.
  • the mat 230 corresponds.
  • the carrier 130 includes a base 131 and at least one sub-carrier 132 located on the base 131, and the orthographic projection of the sub-carrier 132 on the base 131 is located in the base 131 .
  • any two spacers 230 is the same.
  • the second substrate further includes a color filter layer 220 located between the second substrate 210 and the spacer layer. Please refer to FIG. 1 for details.
  • the second substrate 200 further includes a black matrix layer located between the color filter layer 220 and the spacer layer.
  • the black matrix layer includes a plurality of black matrices 240. 240 corresponds to the spacer 230, and the orthographic projection of the spacer 230 on the second substrate 200 is within the orthographic projection corresponding to the black matrix 240 on the second substrate 200.
  • a black matrix layer located between the color filter layer 220 and the spacer layer.
  • the black matrix layer includes a plurality of black matrices 240.
  • 240 corresponds to the spacer 230
  • the orthographic projection of the spacer 230 on the second substrate 200 is within the orthographic projection corresponding to the black matrix 240 on the second substrate 200.
  • the stage layer 120, the black matrix layer, and the spacer layer are located in the non-display area of the display panel 10.
  • the contact area is larger, and the main spacer in the prior art is eliminated.
  • the area of the non-display area is reduced, and the pixel aperture ratio of the display panel is increased.
  • a is the prior art, and a plurality of main spacers 22 and auxiliary spacers 23 are arranged between two adjacent sub-pixel regions 21 of the existing display panel 20, b
  • a plurality of spacers 130 are arranged between two adjacent sub-pixel regions 11 of the display panel 10.
  • FIG. 1 A, B, and C are schematic structural examples of the three carrier platforms 130.
  • the carrier 130 at least includes a first sub-carrier 1321 on the base 131 and a second sub-carrier 1322 on the first sub-carrier 1321.
  • the orthographic projected area of the second sub-carrier 1322 on the base 131 is smaller than the orthographic projected area of the first sub-carrier 1321 on the base 131. Please refer to FIGS. 1 and 2 for details.
  • the thickness of the sub-stage 132 far away from the first substrate 110 is smaller than the thickness of the sub-stage 132 close to the first substrate 110.
  • FIGS. 1 and 2 for details.
  • the material of the stage 130 includes color resist or photoresist.
  • the first substrate 100 further includes a color filter layer 220 located between the first substrate 110 and the stage layer.
  • any one of the stages 130 is composed of at least one of the red color resist, the green color resist, or the blue color resist in the color film layer 220, and the color and composition of the color resist are not limited here.
  • any one of the bases 131 is composed of at least one of the red color resist, the green color resist, or the blue color resist in the color film layer 220, and the color and composition of the color resist are not limited here. .
  • any one of the sub-carriers 132 is composed of at least one of the red color resist, the green color resist, or the blue color resist in the color film layer 220.
  • the color and composition of the color resist are not performed here. limit.
  • the thickness E of the carrier 130 is 1 ⁇ m to 2 ⁇ m. Please refer to FIGS. 1 and 2 for details. While the carrier 130 and the corresponding spacer 230 form a step difference, the formation of The space of the step difference ensures the stability of the carrier 130 and prevents the panel 10 from being squeezed and the carrier 130 may be broken or overturned when the carrier 130 is compressed.
  • the distance D between the carrier 130 and the corresponding spacer 230 is less than 1 ⁇ m.
  • the carrier 130 with different heights forms a step with the corresponding spacer 230 When the display panel is squeezed, the carrier 130 can be compressed, and the compressed space with a step gap protects the display panel.
  • the cross-sectional area of the sub-carrier 132 in the first cross-section is not less than 144 ⁇ m 2 , the first cross-section is parallel to the display surface of the display panel 10, and the sub-carrier 132 is in the first cross-section. If the cross-sectional area of the upper part is too small, when the display panel is squeezed, when the spacer 230 is in contact with the sub-carrier 132, the pressure on the display panel is too large, resulting in poor display.
  • the cross-sectional area of the base 131 on the first cross section is not greater than 500 ⁇ m 2 , the first cross section is parallel to the display surface of the display panel 10, and the base 131 is on the first cross section. If the cross-sectional area is too large, the aperture ratio of the display area will be occupied, resulting in a decrease in the aperture ratio and a waste of effective display area.
  • carriers with different thicknesses are used to form a step difference between the spacer and the corresponding carrier, thereby improving the surface pressure of the display panel, saving process costs, and improving productivity.
  • the present application also provides a manufacturing method of a display panel, and the manufacturing method of the display panel 10 includes:
  • the orthographic projection of the sub-carrier 132 on the base 131 is located in the base 131, the base 131 and the sub-carrier 132 constitute the carrier 130, and the spacer 230 constitutes a spacer layer.
  • carriers with different thicknesses and spacers with the same thickness are used to form a gap between the spacer and the corresponding carrier, so as to improve the surface pressure of the display panel, save process costs, and improve productivity.
  • the manufacturing method of the display panel 10 includes:
  • a plurality of pedestals 131 and at least one sub-carrier 132 on the pedestal 131 are sequentially formed on the first substrate 110.
  • step S10 includes:
  • the color resist layer may be formed to include a transparent area and a non-transparent area.
  • the transparent area is a pixel defining area
  • the non-transparent area is a non-luminous area between the pixel defining areas.
  • the mesa 120, the black matrix layer, and the spacer layer are located in the non-luminous region between the non-transparent regions being the pixel defining regions.
  • the patterning process includes using a first photomask to expose and develop the color resist layer.
  • the S10 further includes:
  • a multilayer color resist layer is formed on the first substrate 110, the color resist layer includes any combination of two or three of red color resist, blue color resist, or green color resist.
  • the patterning process includes using a first photomask to expose and develop the color resist layer.
  • step S12 further includes:
  • the thickness of the sub-carrier 132 far away from the first substrate 100 is smaller than the thickness of the sub-carrier 132 correspondingly close to the first substrate 100. Please refer to FIGS. 1 and 2 for details.
  • step S12 is to use the first photomask to perform the exposure and development process to form a plurality of pedestals 131 and first sub-carriers 1321 on the pedestals 131 and on the first sub-carriers.
  • the second sub-carrier 1322 on the 1321 please refer to FIG. 1 and FIG. 2 for details.
  • the orthographic projection area of the second sub-carrier 1322 on the base 131 is smaller than the orthographic projection area of the first sub-carrier 1321 on the base 131.
  • the pattern of the first mask 300 corresponding to any one of the stages 130 includes a central light-shielding area 310 and at least one annular light-shielding area 320 surrounding the central light-shielding area.
  • the light transmittance of the annular light-shielding area 320 is the same, so the price of the first photomask 300 is cheap, and the diffraction of light is used, and the height and light intensity of the exposure machine are controlled to form a structure including multiple bases 131 and multiple sub-carriers 132
  • a plurality of the stages 130, for example, using the mask pattern of FIG. 5, can form the stage 130 as shown in C in FIG. 2.
  • the thickness E of the carrier 130 is 1 ⁇ m to 2 ⁇ m. Please refer to FIGS. 1 and 2 for details. While the carrier 130 and the corresponding spacer 230 form a step difference, the formation of The space of the step difference ensures the stability of the carrier 130 and prevents the panel 10 from being squeezed and the carrier 130 may be broken or overturned when the carrier 130 is compressed.
  • step S10 includes:
  • the color resist layer may be the color filter layer 220.
  • step S21 may be omitted, and subsequent steps may be adjusted accordingly.
  • the first photomask may be a partial pattern of the photomask of the patterned color filter layer 220.
  • the color resist layer may be formed to include a transparent area and a non-transparent area.
  • the transparent area is a pixel defining area
  • the non-transparent area is a non-luminous area between the pixel defining areas.
  • the mesa 120, the black matrix layer, and the spacer layer are located in the non-luminous region between the non-transparent regions being the pixel defining regions.
  • the patterning process includes using a first photomask to expose and develop the color resist layer.
  • any one of the stages 130 is composed of at least one of the red color resist, the green color resist, or the blue color resist in the color film layer 220, and the color and composition of the color resist are not limited here. .
  • any one of the bases 131 is composed of at least one of the red color resist, the green color resist, or the blue color resist in the color film layer 220, and the color and composition of the color resist are not limited here. .
  • any one of the sub-carriers 132 is composed of at least one of the red color resist, the green color resist, or the blue color resist in the color film layer 220.
  • the color and composition of the color resist are not performed here. limit.
  • the cross-sectional area of the sub-carrier 132 in the first cross-section is not less than 144 ⁇ m 2 , the first cross-section is parallel to the display surface of the display panel 10, and the sub-carrier 132 is in the first cross-section. If the cross-sectional area is too small, when the display panel is squeezed, when the spacer 230 is in contact with the sub-carrier 132, the pressure on the display panel is too large, resulting in poor display.
  • the cross-sectional area of the base 131 on the first cross section is not greater than 500 ⁇ m 2 , the first cross section is parallel to the display surface of the display panel 10, and the base 131 is on the first cross section. If the cross-sectional area is too large, the aperture ratio of the display area will be occupied, resulting in a decrease in the aperture ratio and a waste of effective display area.
  • a plurality of spacers 230 are formed on the second substrate 210, and one of the bases 131 corresponds to one of the spacers 230. Please refer to FIGS. 1 and 2 for details.
  • step S20 includes:
  • the material of the spacer layer is composed of photoresist.
  • step S22 includes:
  • S222 Pass the black matrix layer through exposure and development processes to form a plurality of black matrices 240.
  • the spacer layer is exposed and developed to form a plurality of spacers 230, one of the base 131 corresponds to one of the spacers 230, please refer to FIG. 1 and FIG. 2 for details.
  • a plurality of spacers 230 with the same thickness are formed on a plurality of the black matrices 240, one of the black matrix 240 corresponds to the one of the spacers 230, and one of the bases 131 and one of the spacers 230.
  • the spacer 230 corresponds, please refer to FIG. 1 and FIG. 2 for details.
  • the stage layer 120, the black matrix layer, and the spacer layer are located in the non-display area of the display panel 10. Because the main spacer and the display panel in the prior art The contact area is larger, and the main spacer in the prior art is eliminated. By reducing the contact area between the spacer and the non-display area, the area of the non-display area is reduced, and the pixel aperture ratio of the display panel is increased. To improve the display effect, please refer to FIG.
  • a is the prior art, and a plurality of main spacers 22 and auxiliary spacers 23 are arranged between two adjacent sub-pixel regions 21 of the existing display panel 20, b
  • a plurality of spacers 130 are arranged between two adjacent sub-pixel regions 11 of the display panel 10.
  • the carrier 130 when the first substrate 110 and the second substrate 210 are aligned and attached, at least one of the spacers 230 is in contact with the corresponding carrier 130, and the carrier 130 is in contact with The distance D corresponding to the spacer 230 is less than 1 ⁇ m. Please refer to FIGS. 1 and 2 for details.
  • the stage 130 of different heights forms a step with the spacer 230.
  • the display panel is squeezed, the The carrier 130 can be compressed, and there is a compressed space with a step gap, which protects the display panel.
  • the orthographic projection of the sub-carrier 132 on the base 131 is located in the base 131, the base 131 and the sub-carrier 132 constitute the carrier 130, and the spacer 230 constitutes a spacer layer, please refer to Figure 1 and Figure 2 for details.
  • step S30 and step S40 further include:
  • This implementation utilizes ordinary masks to form stages of different thicknesses to form a gap between the spacer and the corresponding stage, improve the surface pressure of the display panel, increase the rebound of the display panel, save process costs, and increase productivity. .
  • this application discloses a display panel and a manufacturing method thereof.
  • the display panel includes a first substrate, a second substrate disposed opposite to the first substrate, and a liquid crystal layer located between the first substrate and the second substrate; the first substrate includes a first substrate and a second substrate located on the first substrate.
  • stages with different thicknesses are formed to form a step difference between the spacer and the corresponding stage, which improves the surface pressure of the display panel, saves manufacturing process costs, and improves productivity efficiency.

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Abstract

一种显示面板（10）及其制作方法。显示面板(10)包括第一基板（100）、第二基板（200）、及液晶层；第一基板（100）的载台层（120）包括多个载台（130）；第二基板（200）的隔垫层包括多个隔垫物（230），一该载台（130）与一该隔垫物（230）对应；其中，载台（130）包括基座（131）及位于基座（131）上的至少一子载台（132）。通过不同厚度的载台(130)，以形成段差，改善显示面板（10）的面压，节省制程成本。

Description

显示面板及其制作方法 技术领域
本申请涉及领域，尤其涉及一种显示面板及其制作方法。
 背景技术
LCD显示器（Liquid Crystal Display，液晶显示器）领域中，需要间隙控制材料以使显示面板有支撑，在显示面板受到外界压力时，避免对显示面板的破坏。
现有技术中，通过改变间隙控制材料中隔垫物的高度，利用不同高度的隔垫物以形成段差，保护显示面板，但制作隔垫物的光罩价格昂贵，制程复杂，成本居高不下。
因此，亟需一种显示面板及其制作方法以解决上述技术问题。
 技术问题
本申请提供了一种显示面板及其制作方法，以解决现有技术中，不同高度的隔垫物的制作过程中，其光罩价格昂贵，制程复杂，成本居高不下的技术问题。
 技术解决方案
为解决上述问题，本申请提供的技术方案如下：
一种显示面板，所述显示面板包括第一基板、与所述第一基板相对设置的第二基板、及位于所述第一基板与所述第二基板之间的液晶层；
所述第一基板包括第一衬底及位于所述第一衬底上的载台层，所述载台层包括多个载台；
所述第二基板包括第二衬底及位于所述第二衬底上的隔垫层，所述隔垫层包括多个隔垫物，一所述载台与一所述隔垫物对应；
其中，所述载台包括基座及位于所述基座上的至少一子载台，所述子载台在所述基座上的正投影位于所述基座内。
在本申请的显示面板中，在所述第一基板至所述第二基板的方向上，所述子载台在所述基座上的正投影面积逐渐减小。
在本申请的显示面板中，所述载台至少包括位于所述基座上的第一子载台及位于所述第一子载台上的第二子载台；
所述第二子载台在所述基座上的正投影面积小于所述第一子载台在所述基座上的正投影面积。
在本申请的显示面板中，远离所述第一衬底的所述子载台的厚度小于靠近所述第一衬底的所述子载台的厚度。
在本申请的显示面板中，所述第一基板还包括位于所述第一衬底与所述载台层之间的彩膜层；
其中，任一所述载台由所述彩膜层中的红色色阻、绿色色阻或蓝色色阻中的至少一种构成。
在本申请的显示面板中，所述载台的厚度为1μm~2μm。
在本申请的显示面板中，所述载台与对应所述隔垫物的距离小于1μm。
在本申请的显示面板中，所述子载台在第一截面上的截面积不小于144μm 2，所述第一截面与所述显示面板平行。
在本申请的显示面板中，所述基座在第一截面上的截面积不大于500μm 2，所述第一截面与所述显示面板平行。
在本申请的显示面板中，所述载台的材料包括色阻或光阻。
一种显示面板的制作方法，包括：
在第一衬底上依次形成多个基座及位于所述基座上的至少一子载台；
在第二衬底上形成多个隔垫物，一所述基座与一所述隔垫物对应；
将所述第一衬底形成有所述子载台的一侧与所述第二衬底中形成有所述隔垫物的一侧对位贴合；
其中，所述子载台在所述基座上的正投影位于所述基座内，所述基座与所述子载台构成载台，所述隔垫物构成隔垫层。
在本申请的显示面板的制作方法中，在第一衬底上依次形成多个基座及位于所述基座上的至少一子载台的步骤包括：
在第一衬底上形成一色阻层；
利用第一光罩对所述色阻层图案化处理，以形成多个基座及位于所述基座上的至少一子载台；
其中，在所述第一基板至所述第二基板的方向上，所述子载台在所述基座上的正投影面积逐渐减小。
在本申请的显示面板的制作方法中，所述第一光罩对应任一所述载台的图案包括中心遮光区、以及包围所述中心遮光区的至少一个环形遮光区，以形成包括多个基座及多个子载台的多个所述载台。
在本申请的显示面板的制作方法中，形成所述基座及所述子载台的步骤包括：
利用第一光罩进行曝光及显影制程，以形成多个基座及位于所述基座上的第一子载台及位于所述第一子载台上的第二子载台；
所述第二子载台在所述基座上的正投影面积小于所述第一子载台在所述基座上的正投影面积。
在本申请的显示面板的制作方法中，形成所述子载台的步骤包括：
利用第一光罩进行曝光及显影制程，以形成多个子载台；
远离所述第一衬底的所述子载台的厚度小于靠近所述第一衬底的所述子载台的厚度。
在本申请的显示面板的制作方法中，任一所述载台由所述色阻层中的红色色阻、绿色色阻或蓝色色阻中的至少一种构成。
在本申请的显示面板的制作方法中，所述载台的厚度为1μm~2μm。
在本申请的显示面板的制作方法中，所述载台与对应所述隔垫物的距离小于1μm。
在本申请的显示面板的制作方法中，所述子载台在第一截面上的截面积不小于144μm 2，所述第一截面与所述显示面板平行。
在本申请的显示面板的制作方法中，所述基座在第一截面上的截面积不大于500μm 2，所述第一截面与所述显示面板平行。
有益效果
本申请通过不同厚度的载台，以形成隔垫物与对应载台之间的段差，改善显示面板的面压，节省制程成本，提高产能效益。
 附图说明
图1为本申请的显示面板结构示意图；
图2为本申请的显示面板局部结构示意图；
图3为本申请的显示面板结构与现有技术结构对比的俯视示意图；
图4为本申请的显示面板的制作方法的步骤流程图；
图5为本申请的显示面板的制作方法中的光罩图案示意图。
 本发明的实施方式
本申请提供一种显示面板及其制作方法，为使本申请的目的、技术方案及效果更加清楚、明确，以下参照附图并举实施例对本申请进一步详细说明。应当理解，此处所描述的具体实施例仅用以解释本申请，并不用于限定本申请。
请参阅图1、图2，本申请提出了一种显示面板10，包括第一基板100、与所述第一基板100相对设置的第二基板200、及位于所述第一基板100与所述第二基板200之间的液晶层。
所述第一基板100包括第一衬底110及位于所述第一衬底110上的载台层120，所述载台层120包括多个载台130。
所述第二基板200包括第二衬底210及位于所述第二衬底210上的隔垫层，所述隔垫层包括多个厚度相同的隔垫物230，一所述载台130与一所述隔垫物230对应。
其中，所述载台130包括基座131及位于所述基座131上的至少一子载台132，所述子载台132在所述基座131上的正投影位于所述基座131内。
本申请通过不同厚度的载台，以形成隔垫物与对应载台之间的段差，改善显示面板的面压，节省制程成本，提高产能效益。
现结合具体实施例对本申请的技术方案进行描述。
请参阅图1、图2，所述显示面板10包括第一基板100、与所述第一基板100相对设置的第二基板200、及位于所述第一基板100与所述第二基板200之间的液晶层。
所述第一基板100包括第一衬底110及位于所述第一衬底110上的载台层120，所述载台层120包括多个载台130。
所述第二基板200包括第二衬底210及位于所述第二衬底210的隔垫层，所述隔垫层包括多个隔垫物230，一所述载台130与一所述隔垫物230对应。
其中，所述载台130包括基座131及位于所述基座131上的至少一子载台132，所述子载台132在所述基座131上的正投影位于所述基座131内。
本实施例中，任意两个所述隔垫物230的厚度相同。
本实施例中，所述第二基板还包括位于所述第二衬底210与所述隔垫层之间的彩膜层220，具体请参阅图1。
本实施例中，所述第二基板200还包括位于所述彩膜层220与所述隔垫层之间的黑色矩阵层，所述黑色矩阵层包括多个黑色矩阵240，一所述黑色矩阵240对应一所述隔垫物230，所述隔垫物230在所述第二基板200上的正投影位于对应所述黑色矩阵240在所述第二基板200上的正投影之内，具体请参阅图1。
本实施例中，所述载台层120、所述黑色矩阵层、及所述隔垫层位于所述显示面板10的非显示区内，由于现有技术中主隔垫物与所述显示面板的接触面积较大，取消了现有技术中的主隔垫物，通过减小隔垫物与非显示区的接触面积，从而减小非显示区的面积，增大显示面板的像素开口率，提高显示效果，具体请参阅图3，其中，a为现有技术，现有显示面板20的相邻两个子像素区21之间设置有多个主隔垫物22、辅隔垫物23，b为本申请技术方案，所述显示面板10的相邻两个子像素区11之间设置有多个隔垫物130。
本实施例中，所述第一基板100至所述第二基板200的方向上，所述子载台132在所述基座131上的正投影面积逐渐减小，具体请参阅图1、图2，图2中A、B、C为三个所述载台130的结构示意图例。
本实施例中，所述载台130至少包括位于所述基座131上的第一子载台1321及位于所述第一子载台1321上的第二子载台1322。所述第二子载台1322在所述基座131上的正投影面积小于所述第一子载台1321在所述基座131上的正投影面积，具体请参阅图1、图2。
本实施例中，远离所述第一衬底110的所述子载台132的厚度小于靠近所述第一衬底110的所述子载台132的厚度，具体请参阅图1、图2，在所述显示面板10受到挤压时，远离所述第一衬底110的所述子载台132最先受到挤压，向靠近所述第一衬底110的所述子载台132压缩，受力面积增大，载台受到的压强减小，面板受到的压强也减小，同时，载台的回弹力、支撑力增大，有利于回弹，保护显示面板的同时，加强了显示面板的整体恢复力。
本实施例中，所述载台130的材料包括色阻或光阻。
本实施例中，所述第一基板100还包括位于所述第一衬底110与所述载台层之间的彩膜层220。其中，任一所述载台130由所述彩膜层220中的红色色阻、绿色色阻或蓝色色阻中的至少一种构成，在此不对色阻的颜色及组成进行限制。
本实施例中，任一所述基座131由所述彩膜层220中的红色色阻、绿色色阻或蓝色色阻中的至少一种构成，在此不对色阻的颜色及组成进行限制。
本实施例中，任一所述子载台132由所述彩膜层220中的红色色阻、绿色色阻或蓝色色阻中的至少一种构成，在此不对色阻的颜色及组成进行限制。
本实施例中，所述载台130的厚度E为1μm~2μm，具体请参阅图1、图2，在所述载台130与对应所述隔垫物230形成段差的同时，即保证了形成段差的空间，又保证了所述载台130的稳定性，避免了所述面板10受到挤压，所述载台130被压缩时可能出现的断裂、倾覆现象。
本实施例中，所述载台130与对应所述隔垫物230的距离D小于1μm，具体请参阅图1、图2，通过不同高度的载台130与对应所述隔垫物230形成段差，在显示面板受到挤压时，所述载台130可以被压缩，有段差间隙的压缩空间，保护了显示面板。
本实施例中，所述子载台132在第一截面上的截面积不小于144μm 2，所述第一截面与所述显示面板10的显示面平行，所述子载台132在第一截面上的截面积过小，会导致显示面板受到挤压时，所述隔垫物230与所述子载台132接触时，显示面板受到的压强过大，导致显示不良。
本实施例中，所述基座131在第一截面上的截面积不大于500μm 2，所述第一截面与所述显示面板10的显示面平行，所述基座131在第一截面上的截面积过大，会造成占用显示区的开口率，导致开口率下降，浪费有效显示面积。
本实施例通过不同厚度的载台，以形成隔垫物与对应载台之间的段差，改善显示面板的面压，节省制程成本，提高产能效益。
本申请还提供一种显示面板的制作方法，所述显示面板10的制作方法包括：
S10、在第一衬底110上依次形成多个基座131及位于所述基座131上的至少一子载台132；
S20、在第二衬底210上形成多个隔垫物230，一所述基座131与一所述隔垫物230对应；
S30、将所述第一衬底110形成有所述子载台132的一侧与所述第二衬底210中形成有所述隔垫物230的一侧对位贴合；
S40、其中，所述子载台132在所述基座131上的正投影位于所述基座131内，所述基座131与所述子载台132构成载台130，所述隔垫物230构成隔垫层。
本申请通过不同厚度的载台，相同厚度的隔垫物，以形成隔垫物与对应载台之间的段差，改善显示面板的面压，节省制程成本，提高产能效益。
现结合具体实施例对本申请的技术方案进行描述。
请参阅图4，所述显示面板10的制作方法包括：
S10、在第一衬底110上依次形成多个基座131及位于所述基座131上的至少一子载台132。
本实施例中，步骤S10包括：
S11、在第一衬底110上形成一色阻层。
本实施例中，所述色阻层可以形成包括透明区和非透明区，所述透明区为像素定义区，所述非透明区为所述像素定义区之间的非发光区域，所述载台层120、所述黑色矩阵层、及所述隔垫层位于所述非透明区为所述像素定义区之间的非发光区域内。
S12、利用第一光罩对所述色阻层图案化处理，以形成多个基座131及位于所述基座131上的至少一子载台132。
本实施例中，所述图案化处理包括利用第一光罩对所述色阻层进行曝光、显影制程。
S13、所述第一基板110至所述第二基板210的方向上，所述子载台132在所述基座131上的正投影面积逐渐减小。
本实施例中，所述S10还包括：
S11、在第一衬底110上形成多层色阻层，所述色阻层包括红色色阻、蓝色色阻或绿色色阻中两种或三种的任意组合。
S12、利用第一光罩对所述色阻层图案化处理，以形成多个基座131及位于所述基座131上的至少一子载台132。
本实施例中，所述图案化处理包括利用第一光罩对所述色阻层进行曝光、显影制程。
S13、所述第一基板110至所述第二基板210的方向上，所述子载台132在所述基座131上的正投影面积逐渐减小。
本实施例中，步骤S12还包括：
远离所述第一基板100的所述子载台132的厚度小于相应靠近所述第一基板100的所述子载台132的厚度，具体请参阅图1、图2。
本实施例中，步骤S12为利用第一光罩进行曝光及显影制程，以形成多个基座131及位于所述基座131上的第一子载台1321及位于所述第一子载台1321上的第二子载台1322，具体请参阅图1、图2。所述第二子载台1322在所述基座131上的正投影面积小于所述第一子载台1321在所述基座131上的正投影面积。
本实施例中，所述第一光罩300对应任一所述载台130的图案包括中心遮光区310、以及包围所述中心遮光区的至少一个环形遮光区320，具体请参阅图5，该环形遮光区320的透光率相同，所以第一光罩300的价格便宜，利用光的衍射，以及控制曝光机的高度及光强，以形成包括多个基座131及多个子载台132的多个所述载台130，例如利用图5的光罩图案，可形成如图2中C所示的所述载台130。
本实施例中，所述载台130的厚度E为1μm~2μm，具体请参阅图1、图2，在所述载台130与对应所述隔垫物230形成段差的同时，即保证了形成段差的空间，又保证了所述载台130的稳定性，避免了所述面板10受到挤压，所述载台130被压缩时可能出现的断裂、倾覆现象。
本实施例中，步骤S10包括：
S11、在第一衬底110上形成一色阻层。
本实施例中，所述色阻层可以为彩膜层220，当所述色阻层可以为彩膜层220时，步骤S21可以省略，后续步骤相应调整。
本实施例中，当所述色阻层可以为彩膜层220时，所述第一光罩可以为图案化彩膜层220的光罩的部分图案。
本实施例中，所述色阻层可以形成包括透明区和非透明区，所述透明区为像素定义区，所述非透明区为所述像素定义区之间的非发光区域，所述载台层120、所述黑色矩阵层、及所述隔垫层位于所述非透明区为所述像素定义区之间的非发光区域内。
S12、利用第一光罩对所述色阻层图案化处理，以形成多个基座131及位于所述基座131上的至少一子载台132。
本实施例中，所述图案化处理包括利用第一光罩对所述色阻层进行曝光、显影制程。
本实施例中，任一所述载台130由所述彩膜层220中的红色色阻、绿色色阻或蓝色色阻中的至少一种构成，在此不对色阻的颜色及组成进行限制。
本实施例中，任一所述基座131由所述彩膜层220中的红色色阻、绿色色阻或蓝色色阻中的至少一种构成，在此不对色阻的颜色及组成进行限制。
本实施例中，任一所述子载台132由所述彩膜层220中的红色色阻、绿色色阻或蓝色色阻中的至少一种构成，在此不对色阻的颜色及组成进行限制。
本实施例中，所述子载台132在第一截面上的截面积不小于144μm 2，所述第一截面与所述显示面板10的显示面平行，所述子载台132在第一截面上的截面积过小，会导致显示面板受到挤压时，所述隔垫物230与所述子载台132接触时，显示面板受到的压强过大，导致显示不良。
本实施例中，所述基座131在第一截面上的截面积不大于500μm 2，所述第一截面与所述显示面板10的显示面平行，所述基座131在第一截面上的截面积过大，会造成占用显示区的开口率，导致开口率下降，浪费有效显示面积。
S20、在第二衬底210上形成多个隔垫物230，一所述基座131与一所述隔垫物230对应，具体请参阅图1、图2。
本实施例中，S20步骤包括：
S21、在第二衬底210上形成一彩膜层220。
S22、在所述彩膜层220上形成一隔垫层。
本实施例中，所述隔垫层的材料由光阻组成。
本实施例中，步骤S22包括：
S221、在所述彩膜层220上形成一黑色矩阵层。
S222、将所述黑色矩阵层通过曝光、显影工艺，形成多个黑色矩阵240。
S23、将所述隔垫层通过曝光、显影工艺，形成多个隔垫物230，一所述基座131与一所述隔垫物230对应，具体请参阅图1、图2。
本实施例中，在多个所述黑色矩阵240上形成多个厚度相同的隔垫物230，一所述黑色矩阵240与一所述隔垫物230对应，一所述基座131与一所述隔垫物230对应，具体请参阅图1、图2。
S30、将所述第一衬底110形成有所述子载台132的一侧与所述第二衬底210中形成有所述隔垫物230的一侧对位贴合。
本实施例中，所述载台层120、所述黑色矩阵层、及所述隔垫层位于所述显示面板10的非显示区内，由于现有技术中主隔垫物与所述显示面板的接触面积较大，取消了现有技术中的主隔垫物，通过减小隔垫物与非显示区的接触面积，从而减小非显示区的面积，增大显示面板的像素开口率，提高显示效果，具体请参阅图3，其中，a为现有技术，现有显示面板20的相邻两个子像素区21之间设置有多个主隔垫物22、辅隔垫物23，b为本申请技术方案，所述显示面板10的相邻两个子像素区11之间设置有多个隔垫物130。
本实施例中，在所述第一衬底110与所述第二衬底210对位贴合时，至少一所述隔垫物230与对应所述载台130接触，所述载台130与对应所述隔垫物230的距离D小于1μm，具体请参阅图1、图2，通过不同高度的载台130与对应所述隔垫物230形成段差，在显示面板受到挤压时，所述载台130可以被压缩，有段差间隙的压缩空间，保护了显示面板。
S40、其中，所述子载台132在所述基座131上的正投影位于所述基座131内，所述基座131与所述子载台132构成载台130，所述隔垫物230构成隔垫层，具体请参阅图1、图2。
本实施例中，步骤S30与步骤S40之间还包括：
S400、在所述第一衬底110与所述第二衬底210之间形成液晶层。
本实施利通过普通光罩形成不同厚度的载台，以使隔垫物与对应载台之间形成段差，改善显示面板的面压，增大显示面板的回弹，节省制程成本，提高产能效益。
综上所述，本申请公开了一种显示面板及其制作方法。该显示面板包括第一基板、与该第一基板相对设置的第二基板、及位于该第一基板与该第二基板之间的液晶层；该第一基板包括第一衬底及位于该第一衬底上的载台层，该载台层包括多个载台；该第二基板包括第二衬底及位于该第二衬底上的隔垫层，该隔垫层包括多个隔垫物，一该载台与一该隔垫物对应；其中，该载台包括基座及位于该基座上的至少一子载台，该子载台在该基座上的正投影位于该基座内。本申请通过不同厚度的载台，以形成隔垫物与对应载台之间的段差，改善显示面板的面压，节省制程成本，提高产能效益。
可以理解的是，对本领域普通技术人员来说，可以根据本申请的技术方案及其发明构思加以等同替换或改变，而所有这些改变或替换都应属于本申请所附的权利要求的保护范围。

Claims (20)

  1. 一种显示面板，其中，所述显示面板包括第一基板、与所述第一基板相对设置的第二基板、及位于所述第一基板与所述第二基板之间的液晶层；
    所述第一基板包括第一衬底及位于所述第一衬底上的载台层，所述载台层包括多个载台；
    所述第二基板包括第二衬底及位于所述第二衬底上的隔垫层，所述隔垫层包括多个隔垫物，一所述载台与一所述隔垫物对应；
    其中，所述载台包括基座及位于所述基座上的至少一子载台，所述子载台在所述基座上的正投影位于所述基座内。
  2. 根据权利要求1所述的显示面板，其中，在所述第一基板至所述第二基板的方向上，所述子载台在所述基座上的正投影面积逐渐减小。
  3. 根据权利要求2所述的显示面板，其中，所述载台至少包括位于所述基座上的第一子载台及位于所述第一子载台上的第二子载台；
    所述第二子载台在所述基座上的正投影面积小于所述第一子载台在所述基座上的正投影面积。
  4. 根据权利要求1所述的显示面板，其中，远离所述第一衬底的所述子载台的厚度小于靠近所述第一衬底的所述子载台的厚度。
  5. 根据权利要求1所述的显示面板，其中，所述第一基板还包括位于所述第一衬底与所述载台层之间的彩膜层；
    其中，任一所述载台由所述彩膜层中的红色色阻、绿色色阻或蓝色色阻中的至少一种构成。
  6. 根据权利要求1所述的显示面板，其中，所述载台的厚度为1μm~2μm。
  7. 根据权利要求1所述的显示面板，其中，所述载台与对应所述隔垫物的距离小于1μm。
  8. 根据权利要求1所述的显示面板，其中，所述子载台在第一截面上的截面积不小于144μm 2，所述第一截面与所述显示面板平行。
  9. 根据权利要求1所述的显示面板，其中，所述基座在第一截面上的截面积不大于500μm 2，所述第一截面与所述显示面板平行。
  10. 根据权利要求1所述的显示面板，其中，所述载台的材料包括色阻或光阻。
  11. 一种显示面板的制作方法，其中，包括：
    在第一衬底上依次形成多个基座及位于所述基座上的至少一子载台；
    在第二衬底上形成多个隔垫物，一所述基座与一所述隔垫物对应；
    将所述第一衬底形成有所述子载台的一侧与所述第二衬底中形成有所述隔垫物的一侧对位贴合；
    其中，所述子载台在所述基座上的正投影位于所述基座内，所述基座与所述子载台构成载台，所述隔垫物构成隔垫层。
  12. 根据权利要求11所述的显示面板的制作方法，其中，在第一衬底上依次形成多个基座及位于所述基座上的至少一子载台的步骤包括：
    在第一衬底上形成一色阻层；
    利用第一光罩对所述色阻层图案化处理，以形成多个基座及位于所述基座上的至少一子载台；
    其中，在所述第一基板至所述第二基板的方向上，所述子载台在所述基座上的正投影面积逐渐减小。
  13. 根据权利要求12所述的显示面板的制作方法，其中，所述第一光罩对应任一所述载台的图案包括中心遮光区、以及包围所述中心遮光区的至少一个环形遮光区，以形成包括多个基座及多个子载台的多个所述载台。
  14. 根据权利要求12所述的显示面板的制作方法，其中，形成所述基座及所述子载台的步骤包括：
    利用第一光罩进行曝光及显影制程，以形成多个基座及位于所述基座上的第一子载台及位于所述第一子载台上的第二子载台；
    所述第二子载台在所述基座上的正投影面积小于所述第一子载台在所述基座上的正投影面积。
  15. 根据权利要求12所述的显示面板的制作方法，其中，形成所述子载台的步骤包括：
    利用第一光罩进行曝光及显影制程，以形成多个子载台；
    远离所述第一衬底的所述子载台的厚度小于靠近所述第一衬底的所述子载台的厚度。
  16. 根据权利要求12所述的显示面板的制作方法，其中，任一所述载台由所述色阻层中的红色色阻、绿色色阻或蓝色色阻中的至少一种构成。
  17. 根据权利要求11所述的显示面板的制作方法，其中，所述载台的厚度为1μm~2μm。
  18. 根据权利要求11所述的显示面板的制作方法，其中，所述载台与对应所述隔垫物的距离小于1μm。
  19. 根据权利要求11所述的显示面板的制作方法，其中，所述子载台在第一截面上的截面积不小于144μm 2，所述第一截面与所述显示面板平行。
  20. 根据权利要求11所述的显示面板的制作方法，其中，所述基座在第一截面上的截面积不大于500μm 2，所述第一截面与所述显示面板平行。
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