WO2021184438A1 - 显示基板 - Google Patents

显示基板 Download PDF

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Publication number
WO2021184438A1
WO2021184438A1 PCT/CN2020/083252 CN2020083252W WO2021184438A1 WO 2021184438 A1 WO2021184438 A1 WO 2021184438A1 CN 2020083252 W CN2020083252 W CN 2020083252W WO 2021184438 A1 WO2021184438 A1 WO 2021184438A1
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WO
WIPO (PCT)
Prior art keywords
layer
fingerprint recognition
under
screen
oxide
Prior art date
Application number
PCT/CN2020/083252
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English (en)
French (fr)
Inventor
高洪
金武谦
Original Assignee
武汉华星光电半导体显示技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 武汉华星光电半导体显示技术有限公司 filed Critical 武汉华星光电半导体显示技术有限公司
Priority to EP20736234.4A priority Critical patent/EP4123710A4/en
Priority to US16/761,532 priority patent/US11271052B2/en
Publication of WO2021184438A1 publication Critical patent/WO2021184438A1/zh

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/60—OLEDs integrated with inorganic light-sensitive elements, e.g. with inorganic solar cells or inorganic photodiodes
    • H10K59/65—OLEDs integrated with inorganic image sensors
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V40/00—Recognition of biometric, human-related or animal-related patterns in image or video data
    • G06V40/10—Human or animal bodies, e.g. vehicle occupants or pedestrians; Body parts, e.g. hands
    • G06V40/12—Fingerprints or palmprints
    • G06V40/13—Sensors therefor
    • G06V40/1318—Sensors therefor using electro-optical elements or layers, e.g. electroluminescent sensing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/60—OLEDs integrated with inorganic light-sensitive elements, e.g. with inorganic solar cells or inorganic photodiodes

Definitions

  • This application relates to the technical field of display devices, and in particular to a display substrate with an under-screen fingerprint recognition function.
  • LTPO low temperature polycrystalline oxide
  • Existing low-temperature polycrystalline oxide display panels generally include low-temperature polysilicon thin film transistors and oxide thin film transistors. Among them, the low temperature polysilicon thin film transistor does not drift in threshold voltage and is used as a driving transistor; the oxide thin film transistor has good switching performance and is used as a switching transistor.
  • LTPO active-matrix organic light-emitting diode
  • FOD Fingerprint on display
  • the present invention provides a display substrate combining LTPO technology and under-screen fingerprint identification technology, which can realize the under-screen fingerprint identification function and the power-saving function of the screen.
  • An embodiment of the present invention provides a display substrate, including: a display area and a fingerprint recognition area;
  • the display area includes a laminated low-temperature polycrystalline oxide structure, an organic light-emitting layer, a cathode layer, and an anode layer
  • the fingerprint recognition area includes an under-screen fingerprint recognition structure, and the low-temperature polycrystalline oxide structure and the The fingerprint recognition structure under the screen is located on the same layer;
  • the under-screen fingerprint recognition structure does not have the cathode layer and the organic light-emitting layer
  • the light emitted from the display area is reflected through the fingerprint path to the under-screen fingerprint recognition structure in the fingerprint recognition area;
  • the under-screen fingerprint structure includes a grid and an oxide, the oxide is a photosensitive element, and the oxide is a sensor of the under-screen fingerprint identification structure; the sensor of the under-screen fingerprint identification structure The sensor is located in the gap of the pixel structure.
  • the light emitted by the organic light-emitting layer in the display area is reflected on the oxide of the fingerprint recognition structure under the screen.
  • the anode layer is totally reflective to light.
  • the cathode layer is semi-reflective to light.
  • the embodiment of the present invention also provides a display substrate, including: a display area and a fingerprint recognition area;
  • the display area includes a laminated low-temperature polycrystalline oxide structure, an organic light-emitting layer, a cathode layer, and an anode layer
  • the fingerprint recognition area includes an under-screen fingerprint recognition structure, and the low-temperature polycrystalline oxide structure and the The fingerprint recognition structure under the screen is located on the same layer;
  • the under-screen fingerprint recognition structure does not have the cathode layer and the organic light-emitting layer
  • the light emitted from the display area is reflected to the fingerprint recognition structure under the screen in the fingerprint recognition area through the fingerprint path.
  • the under-screen fingerprint structure includes a grid and an oxide, the oxide is a photosensitive element, and the oxide is an inductive sensor of the under-screen fingerprint recognition structure.
  • the light emitted by the organic light-emitting layer in the display area is reflected on the oxide of the fingerprint recognition structure under the screen.
  • the anode layer is totally reflective to light.
  • the cathode layer is semi-reflective to light.
  • the sensing sensor of the under-screen fingerprint recognition structure is located in the gap of the pixel structure.
  • the embodiment of the present invention also provides a display substrate, including: a display area and a fingerprint recognition area;
  • the display area includes a laminated low-temperature polycrystalline oxide structure, an organic light-emitting layer, a cathode layer, and an anode layer
  • the fingerprint recognition area includes an under-screen fingerprint recognition structure, and the low-temperature polycrystalline oxide structure and the The fingerprint recognition structure under the screen is located on the same layer;
  • the under-screen fingerprint recognition structure and the low-temperature polycrystalline oxide structure share the cathode layer and the organic light-emitting layer;
  • the light emitted from the display area is reflected to the fingerprint recognition structure under the screen in the fingerprint recognition area through the fingerprint path.
  • the under-screen fingerprint structure includes a grid and an oxide, the oxide is a photosensitive element, and the oxide is an inductive sensor of the under-screen fingerprint recognition structure.
  • the anode layer is totally reflective to light.
  • the cathode layer is semi-reflective to light.
  • the present invention provides a display substrate with LTPO technology and under-screen fingerprint recognition technology.
  • the light emitted from the light-emitting layer is sensed by the sensor in the under-screen fingerprint recognition structure after being reflected by the finger, and the screen is awakened to realize the built-in screen.
  • the function of fingerprint sensing; and the organic light-emitting layer is not a functional layer in the fingerprint recognition structure under the screen.
  • the organic light-emitting layer in the fingerprint recognition structure can be removed, so that more reflected light from the finger enters the sensor sensor, which is greatly enhanced Light sensing capability; display substrates manufactured using LTPO technology can also save screen power.
  • FIG. 1 is a schematic diagram of the structure of a display substrate provided by an embodiment of the present invention.
  • FIG. 2 is a schematic structural diagram of another display substrate provided by an embodiment of the present invention.
  • Fig. 3 is a schematic diagram of the relative position of the inductive sensor of the fingerprint recognition structure under the screen.
  • first and second are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Therefore, the features defined with “first” and “second” may explicitly or implicitly include one or more of the features. In the description of the present application, “multiple” means two or more than two, unless otherwise specifically defined.
  • connection should be understood in a broad sense, unless otherwise clearly specified and limited.
  • it can be a fixed connection or a detachable connection.
  • Connected or integrally connected it can be mechanically connected, or electrically connected or can communicate with each other; it can be directly connected or indirectly connected through an intermediate medium, it can be the internal communication of two components or the interaction of two components relation.
  • an intermediate medium it can be the internal communication of two components or the interaction of two components relation.
  • the "on" or “under” of the first feature of the second feature may include direct contact between the first and second features, or may include the first and second features Not in direct contact but through other features between them.
  • the "above”, “above” and “above” of the first feature on the second feature include the first feature directly above and obliquely above the second feature, or it simply means that the first feature is higher in level than the second feature.
  • the “below”, “below” and “below” of the second feature of the first feature include the first feature directly below and obliquely below the second feature, or it simply means that the level of the first feature is smaller than the second feature.
  • FIG. 1 it is a schematic structural diagram of a display substrate 1 provided by an embodiment of the present invention.
  • An embodiment of the present invention provides a display substrate 1.
  • the display substrate 1 includes a display area 10 and a fingerprint recognition area 20;
  • the display area 10 includes a laminated low-temperature polycrystalline oxide structure 101, an organic light-emitting layer 102, a cathode layer 103, and an anode layer 104
  • the fingerprint recognition area 20 includes an under-screen fingerprint recognition structure 210.
  • the crystalline oxide structure 101 and the under-screen fingerprint recognition structure 210 are located on the same layer;
  • the under-screen fingerprint recognition structure 210 does not have the cathode layer 103 and has the organic light-emitting layer 102;
  • the light emitted in the display area 10 is reflected to the under-screen fingerprint recognition structure 210 in the fingerprint recognition area 20 through the fingerprint path.
  • the bottom layer is a layer of flexible substrate 30, on one side of the flexible substrate 30 is an insulating layer 40, and a low temperature is provided on the side of the insulating layer 40 away from the flexible substrate 30.
  • the polycrystalline oxide structure 101 is composed of the low-temperature polycrystalline oxide structure 101 to form a TFT structure.
  • the TFT structure includes a P-si layer 1011, a first gate insulating layer 1012, a gate layer 1013, and a first interlayer dielectric Layer 1014, and the first source and drain layer 1015.
  • a second gate insulating layer 105 is provided above the low-temperature polycrystalline oxide structure 101, a first oxide layer 106 is provided on the second gate insulating layer 105, and a first oxide layer 106 is provided on the first oxide layer.
  • a second interlayer dielectric layer 107 is disposed on 106, and the second interlayer dielectric layer 107 covers the second gate insulating layer 105 and the first oxide layer 106.
  • a second source-drain layer 108 is provided on the first oxide layer 106 and the second interlayer dielectric layer 107, and a flat layer 109 is provided on the second source-drain layer 108.
  • the A flat layer 109 covers the second source and drain layer 108 and the second interlayer dielectric layer 107, an anode layer 104 is provided on the flat layer 109, and a pixel defining layer 110 is provided above the anode layer 104
  • An organic light-emitting layer 102 is provided on the pixel defining layer 110
  • a cathode layer 103 is provided above the organic light-emitting layer 102
  • a chemical vapor deposition method, an inkjet printing method, etc. is used on the cathode layer 103
  • Other layers such as an insulating layer 111 and a polarizer layer 112 are provided, and the glass cover plate 113 is attached by laminating glue to complete the packaging.
  • the flexible substrate 30, the insulating layer 40, the first gate insulating layer 1012, and the first interlayer dielectric layer 1014 are sequentially stacked and arranged in the first interlayer
  • a gate layer 1013 is provided on the dielectric layer 1014
  • the second gate insulating layer 105 is provided on the gate layer 1013
  • the second gate insulating layer 105 completely covers the gate layer 1013.
  • a second oxide layer 201 is provided on the second gate insulating layer 105
  • the second interlayer dielectric layer 107 is provided on the second oxide layer 201
  • the second interlayer dielectric layer 107 is provided on the second oxide layer 201.
  • the flat layer 109 is provided on the flat layer 109, and other layers such as an insulating layer 111 and a polarizer layer 112 are provided on the flat layer 109 by chemical vapor deposition, inkjet printing, etc., and the glass cover plate 113 is laminated with glue Laminate and complete the package.
  • the flat layer 109, the second interlayer dielectric layer 107, the second oxide layer 201, the second gate insulating layer 105, and the gate layer 1013 constitute an under-screen fingerprint recognition structure 210 .
  • the under-screen fingerprint recognition structure 210 does not have the cathode layer 103 and the organic light-emitting layer 102.
  • the second oxide layer 201 in the under-screen fingerprint identification structure 210 is a photosensitive element, and therefore, the second oxide layer 201 is an inductive sensor of the under-screen fingerprint identification structure 210.
  • the under-screen fingerprint recognition structure 210 does not have the cathode layer 103 and the organic light-emitting layer 102, more light reflected by the finger will enter the sensing area of the second oxide layer 201, thereby enhancing the light sensing ability. Makes the screen fingerprint more sensitive.
  • the low-temperature polycrystalline oxide structure 101 and the under-screen fingerprint recognition structure 201 are located on the same layer.
  • the anode layer 104 has the characteristic of totally reflecting light
  • the cathode layer 103 has the characteristic of semi-reflecting light.
  • the display substrate 1 has a low-temperature polycrystalline oxide structure 101 and an under-screen fingerprint identification structure 210, wherein the under-screen fingerprint identification structure 210 does not have the organic light-emitting layer 102 and the cathode layer 103, and the second oxide layer 201 in the sensing area of the under-screen fingerprint recognition structure 210 is a light sensing element.
  • the organic light-emitting layer 102 and the cathode layer 103 there are more fingers
  • the reflected light enters the light sensing area of the second oxide layer 201, which greatly enhances the light sensing capability of the fingerprint identification structure 210 under the screen.
  • FIG. 2 it is a schematic structural diagram of another display substrate 1 provided by an embodiment of the present invention.
  • An embodiment of the present invention provides a display substrate 1.
  • the display substrate 1 includes a display area 10 and a fingerprint recognition area 20;
  • the display area 10 includes a laminated low-temperature polycrystalline oxide structure 101, an organic light-emitting layer 102, a cathode layer 103, and an anode layer 104.
  • the fingerprint recognition area 20 includes an under-screen fingerprint recognition structure 210.
  • the crystalline oxide structure 101 and the under-screen fingerprint recognition structure 210 are located on the same layer;
  • the under-screen fingerprint recognition structure 210 and the low-temperature polycrystalline oxide structure 101 share the cathode layer 103 and the organic light-emitting layer 102;
  • the light emitted in the display area 10 is reflected to the under-screen fingerprint recognition structure 210 in the fingerprint recognition area 20 through the fingerprint path.
  • the bottom layer is a layer of flexible substrate 30, on one side of the flexible substrate 30 is an insulating layer 40, and a low temperature is provided on the side of the insulating layer 40 away from the flexible substrate 30.
  • the polycrystalline oxide structure 101 is composed of the low-temperature polycrystalline oxide structure 101 to form a TFT structure.
  • the TFT structure includes a P-si layer 1011, a first gate insulating layer 1012, a gate layer 1013, and a first interlayer dielectric Layer 1014, and the first source and drain layer 1015.
  • a second gate insulating layer 105 is provided above the low-temperature polycrystalline oxide structure 101, a first oxide layer 106 is provided on the second gate insulating layer 105, and a first oxide layer 106 is provided on the first oxide layer.
  • a second interlayer dielectric layer 107 is disposed on 106, and the second interlayer dielectric layer 107 covers the second gate insulating layer 105 and the first oxide layer 106.
  • a second source-drain layer 108 is provided on the first oxide layer 106 and the second interlayer dielectric layer 107, and a flat layer 109 is provided on the second source-drain layer 108.
  • the A flat layer 109 covers the second source and drain layer 108 and the second interlayer dielectric layer 107, an anode layer 104 is provided on the flat layer 109, and a pixel defining layer 110 is provided above the anode layer 104
  • An organic light-emitting layer 102 is provided on the pixel defining layer 110
  • a cathode layer 103 is provided above the organic light-emitting layer 102
  • a chemical vapor deposition method, an inkjet printing method, etc. is used on the cathode layer 103
  • Other layers such as an insulating layer 111 and a polarizer layer 112 are provided, and the glass cover plate 113 is attached by laminating glue to complete the packaging.
  • the flexible substrate 30, the insulating layer 40, the first gate insulating layer 1012, and the first interlayer dielectric layer 1014 are sequentially stacked and arranged in the first interlayer
  • a gate layer 1013 is provided on the dielectric layer 1014
  • the second gate insulating layer 105 is provided on the gate layer 1013
  • the second gate insulating layer 105 completely covers the gate layer 1013.
  • a second oxide layer 201 is provided on the second gate insulating layer 105
  • the second interlayer dielectric layer 107 is provided on the second oxide layer 201
  • the second interlayer dielectric layer 107 is provided on the second oxide layer 201.
  • the flat layer 109 is arranged thereon, the organic light-emitting layer 102 is arranged above the flat layer 109, and the cathode layer 103 is arranged above the organic light-emitting layer.
  • An insulating layer 111, a polarizer layer 112 and other layers are arranged above the cathode layer by chemical vapor deposition, inkjet printing, etc., and the glass cover plate 113 is bonded by laminating glue to complete the packaging.
  • the flat layer 109, the second interlayer dielectric layer 107, the second oxide layer 201, the second gate insulating layer 105, and the gate layer 1013 constitute an under-screen fingerprint recognition structure 210 .
  • the second oxide layer 201 in the under-screen fingerprint identification structure 210 is a photosensitive element, therefore, the second oxide layer 201 is the under-screen fingerprint identification structure 210 Inductive sensor.
  • the low-temperature polycrystalline oxide structure 101 and the under-screen fingerprint recognition structure 210 are located on the same layer.
  • the anode layer 104 has the characteristic of totally reflecting light
  • the cathode layer 103 has the characteristic of semi-reflecting light.
  • FIG. 3 it is a schematic diagram of the relative position of the inductive sensor of the fingerprint recognition structure under the screen. It can be seen from FIG. 3 that in the display substrate structure, the sensing sensor 002 of the under-screen fingerprint recognition structure is arranged in the gap of the RGB pixels 001, which saves space and improves the response speed of fingerprint recognition.
  • the present invention provides a display substrate with LTPO technology and under-screen fingerprint recognition technology.
  • the light emitted from the light-emitting layer is sensed by the sensor in the under-screen fingerprint recognition structure after being reflected by the finger, and the screen is awakened to realize the built-in screen.
  • the function of fingerprint sensing; and the organic light-emitting layer is not a functional layer in the fingerprint recognition structure under the screen.
  • the organic light-emitting layer in the fingerprint recognition structure can be removed, so that more reflected light from the finger enters the sensor sensor, which is greatly enhanced Light sensing capability; display panels manufactured using LTPO technology can also save screen power.

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Abstract

一种显示基板(1)，包括：显示区(10)和指纹识别区(20)；显示区(10)包括层叠设置的低温多晶氧化物结构(101)、有机发光层(102)、阴极层(103)和阳极层(104)，指纹识别区(20)包括屏下指纹识别结构(210)，低温多晶氧化物结构(101)与屏下指纹识别结构(210)位于同一层；屏下指纹识别结构(210)没有阴极层(103)以及有机发光层(102)。

Description

显示基板 技术领域
本申请涉及显示装置技术领域，尤其涉及一种具有屏下指纹识别功能的显示基板。
 背景技术
随着全面屏技术的发展，省电技术和屏下指纹技术越来越受到消费者的欢迎。随着显示设备领域的迅猛发展，已经出现了一种低温多晶氧化物(LTPO，lowtemperature polycrystalline oxide)显示面板。现有的低温多晶氧化物显示面板通常包括低温多晶硅薄膜晶体管和氧化物薄膜晶体管。其中，低温多晶硅薄膜晶体管阈值电压不漂移，用作驱动晶体管；氧化物薄膜晶体管开关性能好，用作开关晶体管。而且，LTPO技术作为兴起的有源矩阵有机发光二极管（AMOLED，active-matrix organic light-emitting diode）省电技术已经用在手表上面，而屏下指纹(FOD, fingerprint on display)技术也已更多的应用到终端手机上。
 技术问题
本发明提供一种结合LTPO技术以及屏下指纹识别技术的显示基板，既能实现屏下指纹识别功能，也可以实现屏幕的省电功能。
 技术解决方案
本发明提供的技术方案如下：
本发明实施例提供一种显示基板，包括：显示区和指纹识别区；
其中，所述显示区包括层叠设置的低温多晶氧化物结构、有机发光层、阴极层和阳极层，所述指纹识别区包括屏下指纹识别结构，所述低温多晶氧化物结构与所述屏下指纹识别结构位于同一层；
其中，所述屏下指纹识别结构没有所述阴极层以及所述有机发光层；
所述显示区内发出的光，经过手指纹路反射到所述指纹识别区内的屏下指纹识别结构；
其中，所述屏下指纹结构包括栅极和氧化物，所述氧化物为感光元件，所述氧化物为所述屏下指纹识别结构的感应传感器；所述屏下指纹识别结构的所述感应传感器位于像素结构的间隙之中。
根据本发明实施例所提供的显示基板，所述显示区内的所述有机发光层所发出的光，经过反射到所述屏下指纹识别结构的所述氧化物上。
根据本发明实施例所提供的显示基板，所述阳极层对光为全反射。
根据本发明实施例所提供的显示基板，所述阴极层对光为半反射。
本发明实施例还提供一种显示基板，包括：显示区和指纹识别区；
其中，所述显示区包括层叠设置的低温多晶氧化物结构、有机发光层、阴极层和阳极层，所述指纹识别区包括屏下指纹识别结构，所述低温多晶氧化物结构与所述屏下指纹识别结构位于同一层；
其中，所述屏下指纹识别结构没有所述阴极层以及所述有机发光层；
所述显示区内发出的光，经过手指纹路反射到所述指纹识别区内的屏下指纹识别结构。
根据本发明实施例所提供的显示基板，所述屏下指纹结构包括栅极和氧化物，所述氧化物为感光元件，所述氧化物为所述屏下指纹识别结构的感应传感器。
根据本发明实施例所提供的显示基板，所述显示区内的所述有机发光层所发出的光，经过反射到所述屏下指纹识别结构的所述氧化物上。
根据本发明实施例所提供的显示基板，所述阳极层对光为全反射。
根据本发明实施例所提供的显示基板，所述阴极层对光为半反射。
根据本发明实施例所提供的显示基板，所述屏下指纹识别结构的所述感应传感器位于像素结构的间隙之中。
本发明实施例还提供一种显示基板，包括：显示区和指纹识别区；
其中，所述显示区包括层叠设置的低温多晶氧化物结构、有机发光层、阴极层和阳极层，所述指纹识别区包括屏下指纹识别结构，所述低温多晶氧化物结构与所述屏下指纹识别结构位于同一层；
其中，所述屏下指纹识别结构与所述低温多晶氧化物结构共用所述阴极层以及所述有机发光层；
所述显示区内发出的光，经过手指纹路反射到所述指纹识别区内的屏下指纹识别结构。
根据本发明实施例所提供的显示基板，所述屏下指纹结构包括栅极和氧化物，所述氧化物为感光元件，所述氧化物为所述屏下指纹识别结构的感应传感器。
根据本发明实施例所提供的显示基板，所述阳极层对光为全反射。
根据本发明实施例所提供的显示基板，所述阴极层对光为半反射。
 有益效果
本发明提供的一种以LTPO技术以及屏下指纹识别技术的显示基板，通过在发光层发出的光，被手指反射后被屏下指纹识别结构中的感应传感器感应后，唤醒屏幕，实现内置屏下指纹感应的功能；且有机发光层在被屏下指纹识别结构中不是功能作用层，可以去掉指纹识别结构中的有机发光层，让更多的手指反射光进入到感应传感器中，大大增强了光的感应能力；使用LTPO技术制造的显示基板还可以节省屏幕用电。
 附图说明
为了更清楚地说明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单介绍，显而易见地，下面描述中的附图仅仅是发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本发明实施例所提供的显示基板的结构示意图。
图2为本发明实施例所提供的另一显示基板的结构示意图。
图3为屏下指纹识别结构的感应传感器的相对位置示意图。
 本发明的实施方式
下面将结合本申请实施例中的附图，对本申请实施例中的技术方案进行清楚、完整地描述。显然，所描述的实施例仅仅是本申请一部分实施例，而不是全部的实施例。基于本申请中的实施例，本领域技术人员在没有作出创造性劳动前提下所获得的所有其他实施例，都属于本申请保护的范围。
在本申请的描述中，需要理解的是，术语“中心”、“纵向”、“横向”、“长度”、“宽度”、“厚度”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”、“顺时针”、“逆时针”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本申请和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请的限制。此外，术语“第一”、“第二”仅用于描述目的，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个所述特征。在本申请的描述中，“多个”的含义是两个或两个以上，除非另有明确具体的限定。
在本申请的描述中，需要说明的是，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是机械连接，也可以是电连接或可以相互通讯；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通或两个元件的相互作用关系。对于本领域的普通技术人员而言，可以根据具体情况理解上述术语在本申请中的具体含义。
在本申请中，除非另有明确的规定和限定，第一特征在第二特征之“上”或之“下”可以包括第一和第二特征直接接触，也可以包括第一和第二特征不是直接接触而是通过它们之间的另外的特征接触。而且，第一特征在第二特征“之上”、“上方”和“上面”包括第一特征在第二特征正上方和斜上方，或仅仅表示第一特征水平高度高于第二特征。第一特征在第二特征“之下”、“下方”和“下面”包括第一特征在第二特征正下方和斜下方，或仅仅表示第一特征水平高度小于第二特征。
下文的公开提供了许多不同的实施方式或例子用来实现本申请的不同结构。为了简化本申请的公开，下文中对特定例子的部件和设置进行描述。当然，它们仅仅为示例，并且目的不在于限制本申请。此外，本申请可以在不同例子中重复参考数字和/或参考字母，这种重复是为了简化和清楚的目的，其本身不指示所讨论各种实施方式和/或设置之间的关系。此外，本申请提供了的各种特定的工艺和材料的例子，但是本领域普通技术人员可以意识到其他工艺的应用和/或其他材料的使用。
如图1所示，为本发明实施例所提供的显示基板1的结构示意图。本发明实施例提供一种显示基板1，所述显示基板1包括：显示区10和指纹识别区20；
其中，所述显示区10包括层叠设置的低温多晶氧化物结构101、有机发光层102、阴极层103和阳极层104，所述指纹识别区20包括屏下指纹识别结构210，所述低温多晶氧化物结构101与所述屏下指纹识别结构210位于同一层；
其中，所述屏下指纹识别结构210没有所述阴极层103以及有所述机发光层102；
所述显示区10内发出的光，经过手指纹路反射到所述指纹识别区20内的屏下指纹识别结构210。
在所述显示区10中，最底层为一层柔性基板30，在所述柔性基板30的一侧为隔绝层40，在所述隔绝层40远离所述柔性基板30的一侧上设置有低温多晶氧化物结构101，由所述低温多晶氧化物结构101组成TFT结构，所述TFT结构包括P-si层1011，第一栅极绝缘层1012，栅极层1013，第一层间介质层1014，以及第一源漏极层1015。在所述低温多晶氧化物结构101的上方设置有第二栅极绝缘层105，在所述第二栅极绝缘层105上设置有第一氧化物层106，在所述第一氧化物层106上设置有第二层间介质层107，所述第二层间介质层107覆盖所述第二栅极绝缘层105和所述第一氧化物层106。在所述第一氧化物层106以及所述第二层间介质层107上设置有第二源漏极层108，在所述第二源漏极层108上覆盖设置有平坦层109，所述平坦层109覆盖所述第二源漏极层108以及所述第二层间介质层107，在所述平坦层109上设置有阳极层104，在所述阳极层104上方设置有像素界定层110，在所述像素界定层110上设置有一层有机发光层102，在所述有机发光层102上方设置有阴极层103，在所述阴极层103上方通过化学气相沉积法、喷墨打印法等方法设置有绝缘层111、偏光片层112等其它层，玻璃盖板113通过贴合胶贴合，完成封装。
在所述指纹识别区20中，依次叠加设置有所述柔性基板30，所述隔绝层40，所述第一栅极绝缘层1012，第一层间介质层1014，在所述第一层间介质层1014上设置有栅极层1013，所述第二栅极绝缘层105设置在所述栅极层1013上，所述第二栅极绝缘层105完全覆盖所述栅极层1013，在所述第二栅极绝缘层105上设置有第二氧化物层201，在所述第二氧化物层201上设置有所述第二层间介质层107，在所述第二层间介质层107上设置有所述平坦层109，在所述平坦层109上方通过化学气相沉积法、喷墨打印法等方法设置有绝缘层111、偏光片层112等其它层，玻璃盖板113通过贴合胶贴合，完成封装。其中，所述平坦层109、所述第二层间介质层107、所述第二氧化物层201、所述第二栅极绝缘层105以及所述栅极层1013组成屏下指纹识别结构210。
在图1的实施例中，所述屏下指纹识别结构210没有阴极层103以及有机发光层102。在所述屏下指纹识别结构210中的所述第二氧化物层201为感光元件，因此，所述第二氧化物层201为所述屏下指纹识别结构210的感应传感器。当有机发光层102所发射出来的光经过手指指纹在屏幕上的反射，反射光反射到所述第二氧化物层201的感应区域，便可以唤醒屏幕。由于，所述屏下指纹识别结构210没有阴极层103以及有机发光层102，会有更多的手指反射光进入到所述第二氧化物层201的感应区域，以此增强光的感应能力，使得屏幕指纹更加灵敏。
如图1所示，所述低温多晶氧化物结构101与所述屏下指纹识别结构201位于同一层。其中，所述阳极层104具有对光全反射的特性，而所述阴极层103具有对光半反射的特性。
在图1的本实施例中，所述显示基板1具有低温多晶氧化物结构101以及屏下指纹识别结构210，其中，屏下指纹识别结构210没有所述有机发光层102和所述阴极层103，且所述屏下指纹识别结构210的感应区中的所述第二氧化物层201为光感应元件，去除掉所述有机发光层102和所述阴极层103后，有更多的手指反射光进入到所述第二氧化物层201的光感应区，大大增强了屏下指纹识别结构210光的感应能力。
如图2所示，为本发明实施例所提供的另一显示基板1的结构示意图。本发明实施例提供一种显示基板1，所述显示基板1包括：显示区10和指纹识别区20；
其中，所述显示区10包括层叠设置的低温多晶氧化物结构101、有机发光层102、阴极层103和阳极层104，所述指纹识别区20包括屏下指纹识别结构210，所述低温多晶氧化物结构101与所述屏下指纹识别结构210位于同一层；
其中，所述屏下指纹识别结构210与所述低温多晶氧化物结构101共用所述阴极层103以及所述有机发光层102；
所述显示区10内发出的光，经过手指纹路反射到所述指纹识别区20内的屏下指纹识别结构210。
在所述显示区10中，最底层为一层柔性基板30，在所述柔性基板30的一侧为隔绝层40，在所述隔绝层40远离所述柔性基板30的一侧上设置有低温多晶氧化物结构101，由所述低温多晶氧化物结构101组成TFT结构，所述TFT结构包括P-si层1011，第一栅极绝缘层1012，栅极层1013，第一层间介质层1014，以及第一源漏极层1015。在所述低温多晶氧化物结构101的上方设置有第二栅极绝缘层105，在所述第二栅极绝缘层105上设置有第一氧化物层106，在所述第一氧化物层106上设置有第二层间介质层107，所述第二层间介质层107覆盖所述第二栅极绝缘层105和所述第一氧化物层106。在所述第一氧化物层106以及所述第二层间介质层107上设置有第二源漏极层108，在所述第二源漏极层108上覆盖设置有平坦层109，所述平坦层109覆盖所述第二源漏极层108以及所述第二层间介质层107，在所述平坦层109上设置有阳极层104，在所述阳极层104上方设置有像素界定层110，在所述像素界定层110上设置有一层有机发光层102，在所述有机发光层102上方设置有阴极层103，在所述阴极层103上方通过化学气相沉积法、喷墨打印法等方法设置有绝缘层111、偏光片层112等其它层，玻璃盖板113通过贴合胶贴合，完成封装。
在所述指纹识别区20中，依次叠加设置有所述柔性基板30，所述隔绝层40，所述第一栅极绝缘层1012，第一层间介质层1014，在所述第一层间介质层1014上设置有栅极层1013，所述第二栅极绝缘层105设置在所述栅极层1013上，所述第二栅极绝缘层105完全覆盖所述栅极层1013，在所述第二栅极绝缘层105上设置有第二氧化物层201，在所述第二氧化物层201上设置有所述第二层间介质层107，在所述第二层间介质层107上设置有所述平坦层109，在所述平坦层109上方设置有所述有机发光层102，在所述有机发光层上方设置有所述阴极层103。在所述阴极层上方通过化学气相沉积法、喷墨打印法等方法设置有绝缘层111、偏光片层112等其它层，玻璃盖板113通过贴合胶贴合，完成封装。其中，所述平坦层109、所述第二层间介质层107、所述第二氧化物层201、所述第二栅极绝缘层105以及所述栅极层1013组成屏下指纹识别结构210。
在图2的实施例中，在所述屏下指纹识别结构210中的所述第二氧化物层201为感光元件，因此，所述第二氧化物层201为所述屏下指纹识别结构210的感应传感器。当有机发光层102所发射出来的光经过手指指纹在屏幕上的反射，反射光反射到所述第二氧化物层201的感应区域，便可以唤醒屏幕。如图2所示，所述低温多晶氧化物结构101与所述屏下指纹识别结构210位于同一层。其中，所述阳极层104具有对光全反射的特性，而所述阴极层103具有对光半反射的特性。
如图3所示，为所述屏下指纹识别结构的感应传感器的相对位置示意图。由图3可知，在所述显示基板结构中，所述屏下指纹识别结构的所述感应传感器002设置在RGB像素001的间隙之中，既能节省空间，有提升了指纹识别的响应速度。
本发明提供的一种以LTPO技术以及屏下指纹识别技术的显示基板，通过在发光层发出的光，被手指反射后被屏下指纹识别结构中的感应传感器感应后，唤醒屏幕，实现内置屏下指纹感应的功能；且有机发光层在被屏下指纹识别结构中不是功能作用层，可以去掉指纹识别结构中的有机发光层，让更多的手指反射光进入到感应传感器中，大大增强了光的感应能力；使用LTPO技术制造的显示面板还可以节省屏幕用电。
以上对本申请实施例所提供的一种显示基板进行了详细介绍，本文中应用了具体个例对本申请的原理及实施方式进行了阐述，以上实施例的说明只是用于帮助理解本申请的技术方案及其核心思想；本领域的普通技术人员应当理解：其依然可以对前述各实施例所记载的技术方案进行修改，或者对其中部分技术特征进行等同替换；而这些修改或者替换，并不使相应技术方案的本质脱离本申请各实施例的技术方案的范围。

Claims (14)

  1. 一种显示基板，包括：显示区和指纹识别区；
    其中，所述显示区包括层叠设置的低温多晶氧化物结构、有机发光层、阴极层和阳极层，所述指纹识别区包括屏下指纹识别结构，所述低温多晶氧化物结构与所述屏下指纹识别结构位于同一层；
    其中，所述屏下指纹识别结构没有所述阴极层以及所述有机发光层；
    所述显示区内发出的光，经过手指纹路反射到所述指纹识别区内的屏下指纹识别结构；
    其中，所述屏下指纹结构包括栅极和氧化物，所述氧化物为感光元件，所述氧化物为所述屏下指纹识别结构的感应传感器；所述屏下指纹识别结构的所述感应传感器位于像素结构的间隙之中。
  2. 根据权利要求1所述的显示基板，其中所述显示区内的所述有机发光层所发出的光，经过反射到所述屏下指纹识别结构的所述氧化物上。
  3. 根据权利要求2所述的显示基板，其中所述阳极层对光为全反射。
  4. 根据权利要求2所述的显示基板，其中所述阴极层对光为半反射。
  5. 一种显示基板，包括：显示区和指纹识别区；
    其中，所述显示区包括层叠设置的低温多晶氧化物结构、有机发光层、阴极层和阳极层，所述指纹识别区包括屏下指纹识别结构，所述低温多晶氧化物结构与所述屏下指纹识别结构位于同一层；
    其中，所述屏下指纹识别结构没有所述阴极层以及所述有机发光层；
    所述显示区内发出的光，经过手指纹路反射到所述指纹识别区内的屏下指纹识别结构。
  6. 根据权利要求5所述的显示基板，其中所述屏下指纹结构包括栅极和氧化物，所述氧化物为感光元件，所述氧化物为所述屏下指纹识别结构的感应传感器。
  7. 根据权利要求6所述的显示基板，其中所述显示区内的所述有机发光层所发出的光，经过反射到所述屏下指纹识别结构的所述氧化物上。
  8. 根据权利要求7所述的显示基板，其中所述阳极层对光为全反射。
  9. 根据权利要求7所述的显示基板，其中所述阴极层对光为半反射。
  10. 根据权利要求5所述的显示基板，其中所述屏下指纹识别结构的所述感应传感器位于像素结构的间隙之中。
  11. 一种显示基板，包括：显示区和指纹识别区；
    其中，所述显示区包括层叠设置的低温多晶氧化物结构、有机发光层、阴极层和阳极层，所述指纹识别区包括屏下指纹识别结构，所述低温多晶氧化物结构与所述屏下指纹识别结构位于同一层；
    其中，所述屏下指纹识别结构与所述低温多晶氧化物结构共用所述阴极层以及所述有机发光层；
    所述显示区内发出的光，经过手指纹路反射到所述指纹识别区内的屏下指纹识别结构。
  12. 根据权利要求11所述的显示基板，其中所述屏下指纹结构包括栅极和氧化物，所述氧化物为感光元件，所述氧化物为所述屏下指纹识别结构的感应传感器。
  13. 根据权利要求11所述的显示基板，其中所述阳极层对光为全反射。
  14. 根据权利要求11所述的显示基板，其中所述阴极层对光为半反射。
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