WO2021179372A1 - 有机发光二极体显示面板、彩膜基板及其制作方法 - Google Patents

有机发光二极体显示面板、彩膜基板及其制作方法 Download PDF

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Publication number
WO2021179372A1
WO2021179372A1 PCT/CN2020/083078 CN2020083078W WO2021179372A1 WO 2021179372 A1 WO2021179372 A1 WO 2021179372A1 CN 2020083078 W CN2020083078 W CN 2020083078W WO 2021179372 A1 WO2021179372 A1 WO 2021179372A1
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Prior art keywords
color
black matrix
organic light
light emitting
display panel
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PCT/CN2020/083078
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English (en)
French (fr)
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徐鸣
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深圳市华星光电半导体显示技术有限公司
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Priority to US16/766,688 priority Critical patent/US20210288116A1/en
Publication of WO2021179372A1 publication Critical patent/WO2021179372A1/zh

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/50—OLEDs integrated with light modulating elements, e.g. with electrochromic elements, photochromic elements or liquid crystal elements
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/85—Arrangements for extracting light from the devices
    • H10K50/852—Arrangements for extracting light from the devices comprising a resonant cavity structure, e.g. Bragg reflector pair
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/85—Arrangements for extracting light from the devices
    • H10K50/854—Arrangements for extracting light from the devices comprising scattering means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/1201—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass

Definitions

  • the present invention relates to the field of display technology, and in particular to an organic light emitting diode display panel, a color film substrate and a manufacturing method thereof that improve the viewing angle of the display panel.
  • organic light-emitting diode display panels usually adopt a microcavity structure, which enables redistribution of the light field, changes in quantum efficiency, and narrowing of the spectrum, so that the emitted light has a stronger forward light. And higher color purity.
  • the viewing angle of the display panel becomes worse as the intensity of the microcavity effect increases. Therefore, it is necessary to provide an organic light-emitting diode display panel, a color filter substrate and a manufacturing method thereof to solve the problem of the prior art that the viewing angle of the display panel cannot be effectively improved while maintaining a high color gamut.
  • the purpose of the present invention is to provide an organic light emitting diode (OLED) display panel, a color film substrate and a manufacturing method thereof, so as to improve the viewing angle of the display panel and solve the problems existing in the prior art.
  • OLED organic light emitting diode
  • a color filter substrate which includes:
  • a color film substrate on which a black matrix is arranged A color film substrate on which a black matrix is arranged.
  • a plurality of color resists which are arranged on the color film substrate at intervals from the black matrix
  • each color resist has a wrinkled surface to increase the scattering angle of light.
  • the height of the black matrix is higher than the height of the plurality of color resists.
  • the black matrix has a bottom surface and a top surface, the bottom surface of the black matrix is in contact with the surface of the color filter substrate, and the width of the bottom surface of the black matrix is greater than the width of the top surface.
  • the black matrix has a bottom surface and a top surface, the bottom surface of the black matrix is in contact with the surface of the color filter substrate, and the width of the bottom surface of the black matrix is smaller than the width of the top surface.
  • the second aspect of the present invention provides a method for manufacturing a color filter substrate, the method including the following steps:
  • the step of forming a plurality of color resists with wrinkled surfaces includes:
  • Yellow light and etching processes are performed on the color resist material to obtain the plurality of color resists with wrinkled surfaces.
  • the height of the black matrix is higher than the height of the plurality of color resists.
  • the black matrix has a bottom surface and a top surface, the bottom surface of the black matrix is in contact with the surface of the color filter substrate, and the width of the bottom surface of the black matrix is greater than the width of the top surface.
  • the black matrix has a bottom surface and a top surface, the bottom surface of the black matrix is in contact with the surface of the color filter substrate, and the width of the bottom surface of the black matrix is smaller than the width of the top surface.
  • the heating temperature of the color film substrate and the color resist material is 200 to 300 degrees Celsius, and the heating time is 5 to 30 minutes.
  • the color film substrate and the color resist material are cooled down to 10 to 20 degrees Celsius or cooled down at room temperature.
  • a third aspect of the present invention provides an organic light emitting diode display panel, including:
  • An organic light emitting diode device includes a thin film transistor device and an organic light emitting layer, the organic light emitting layer is used to emit light;
  • the color filter substrate is arranged opposite to the thin film transistor element, and includes a plurality of color resists and a black matrix.
  • the plurality of color resists and the black matrix are spaced apart on the color filter substrate.
  • Each color resistor has a wrinkled surface in the direction facing the thin film transistor element, so that the light emitted by the organic light-emitting layer can increase its scattering angle.
  • the height of the black matrix is higher than the height of the plurality of color resists.
  • the black matrix has a bottom surface and a top surface, the bottom surface of the black matrix is in contact with the surface of the color filter substrate, and the width of the bottom surface of the black matrix is greater than the width of the top surface.
  • the black matrix has a bottom surface and a top surface, the bottom surface of the black matrix is in contact with the surface of the color filter substrate, and the width of the bottom surface of the black matrix is smaller than the width of the top surface.
  • the plurality of color resists include red color resists, green color resists, and blue color resists, and they are respectively arranged corresponding to different colors of light emitted by the organic light-emitting layer.
  • the organic light emitting diode display panel further includes an anode electrode and a cathode electrode, the organic light emitting layer is connected to the drain electrode in the thin film transistor layer through the anode electrode, and the cathode electrode is disposed at The other end of the organic light-emitting layer, the anode electrode and the cathode electrode are used for applying a bias voltage to the organic light-emitting layer.
  • the anode electrode is a metal material with high reflectivity
  • the cathode electrode is a transparent conductive film with light transmittance.
  • a Bragg reflector is provided in the organic light-emitting layer to enhance the microcavity effect.
  • the organic light-emitting diode display panel further includes an encapsulation layer disposed between the organic light-emitting layer and the color filter substrate to prevent water and oxygen from invading the organic light-emitting layer.
  • the OLED display panel with a microcavity structure can not only have high color gamut and high brightness, but also solve the problem of degradation caused by the microcavity effect.
  • the viewing angle problem thereby improving the viewing angle of the display panel.
  • the color filter substrate is located outside the organic light-emitting diode element, and will not affect its own electrical properties. It can be seen that the present invention has significant progress.
  • FIG. 1 is a schematic diagram of an organic light emitting diode display panel provided by an embodiment of the present invention.
  • FIG. 2 is a schematic diagram of a color filter substrate with a higher black matrix provided by an embodiment of the present invention.
  • FIG. 3 is a step diagram of the manufacturing method of the color filter substrate provided by an embodiment of the present invention.
  • FIG. 4 is a step diagram of a method for manufacturing multiple color resists with a wrinkled surface provided by an embodiment of the present invention.
  • 5A-5C are flowcharts of a method for manufacturing multiple color resists with wrinkled surfaces according to an embodiment of the present invention.
  • FIG. 1 is a schematic diagram of an organic light emitting diode (OLED) display panel provided by an embodiment of the present invention.
  • the organic light emitting diode display panel includes an organic light emitting diode element and a color filter substrate 14, wherein the organic light emitting diode element is a light emitting element, and it includes a thin film transistor element 11, an organic light emitting layer 12, and a package Layer 13, the thin film transistor element 11 is used to control the light emitting display of the OLED display panel, which includes a thin film transistor (TFT) layer 112 and an anode electrode 114, wherein the thin film transistor layer 112 may be a top-gate Structure, bottom-gate structure (bottom-gate), or dual-gate structure (dual-gate), etc.
  • TFT thin film transistor
  • the present invention does not further limit the type of the thin film transistor layer 112, and one end of the anode electrode 114 and The drain electrode (not labeled) in the thin film transistor layer 112 is electrically connected, and the other end is electrically connected to the organic light-emitting layer 12.
  • the organic light-emitting layer 12 is further formed with a hole injection layer (not shown), a hole transport layer (not shown), and a photoluminescent layer in sequence on the anode electrode 114.
  • an electron transport layer (not shown), an electron injection layer (not shown), an electron injection layer (not shown), and a cathode electrode (not shown), by applying a bias voltage to the anode electrode 114 and the cathode electrode,
  • the electrons in the electron injection layer and the holes in the hole injection layer respectively pass through the electron transport layer and the hole transport layer to recombine in the photoluminescent layer to generate excitons and emit light.
  • the color of the light emitted by the photoluminescent layer depends on its material. For example, when the material of the photoluminescent layer is PTPP or DCJTB, it emits red light. When the material is Alaq3 or If it is TDETE, etc., green light is emitted. When the material is TMTPEPA or BDPAS, etc., it emits blue light.
  • the present invention does not further limit the material of the photoluminescent layer.
  • the present invention takes a top-emission OLED display panel as an example. Therefore, the anode electrode 114 is a metal material with high reflectivity (for example, metallic copper), and the cathode electrode is transparent. Optical transparent conductive film (such as indium tin oxide).
  • a top-emitting or bottom-emitting OLED display panel since it is a structure formed by two parallel surfaces, a total reflection surface (ie, a metal material) and a half reflection surface (ie, a transparent conductive film), they all have A considerable degree of microcavity effect, that is, a micro-resonant cavity is formed between the total reflection surface and the semi-reflection surface, so that the light emitted by the photoluminescent layer will be reflected back and forth between the micro-cavity multiple times to gain gain gain.
  • a Bragg reflector may be provided in the organic light-emitting layer 12 to enhance the microcavity effect.
  • DBR Bragg reflector
  • a color film substrate 14 is formed on the opposite side of the thin film transistor element 11 and on the encapsulation layer 13, and the color film substrate 14 includes a color filter substrate 141, and a plurality of color resists 142 and a black matrix 143 formed on the color filter substrate 141 facing the direction of the thin film transistor element 11, wherein the plurality of color resists 142 and the The black matrix 143 is arranged at intervals.
  • the plurality of color resistors 142 includes a red color resistor, a green color resistor, and a blue color resistor, and they are respectively set corresponding to the color of the light emitted by the organic light-emitting layer 12, that is, the red color resistor corresponds to the organic light-emitting layer. 12
  • the emitted red light setting, the green color resistance correspond to the emitted green light setting, and the blue color resistance corresponds to the emitted blue light setting.
  • the purpose of forming a corrugated surface on each of the plurality of color resists 142 is to improve the scattering angle of light when passing through these corrugated surfaces, that is to say, the light will be scattered due to the irregularly shaped corrugated surface.
  • the height of the black matrix 143 can be set to be higher than the height of the plurality of color resistors 142, as shown in FIG. 2.
  • FIG. 3 is a step diagram of a manufacturing method of the color filter substrate 14 provided by an embodiment of the present invention. The method includes the following steps:
  • Step S1 forming a black matrix 143 on the color filter substrate 141.
  • the black matrix 143 can be formed to have a relatively high height to avoid interference between adjacent scattered light, a tapered surface (taper) is generated during the development and etching process, so that the black matrix 143
  • the width of the bottom surface is greater than the width of the top surface, wherein the bottom surface of the black matrix 143 is in contact with the surface of the color filter substrate 141. It is understandable that the black matrix 143 may be formed into different shapes due to different manufacturing methods, so in another embodiment, the width of the bottom surface may be smaller than the width of the top surface.
  • Step S2 forming a plurality of color resists with wrinkled surfaces on the color filter substrate 141 and arranged between adjacent black matrices 143.
  • FIG. 4 is a step diagram of a method for manufacturing a plurality of color resists 142 with a wrinkled surface provided by an embodiment of the present invention
  • FIGS. 5A-5C are a wrinkle provided by an embodiment of the present invention.
  • first coat color resist material on the color filter substrate 141 (as shown in FIG. 5A), and heat the color filter substrate 141 and the color resist material.
  • the heating temperature and time need to be controlled. Within the range where the color resist material does not undergo qualitative change, for example, the heating temperature can be controlled to 200 to 300 degrees Celsius, and the heating time is 5 to 30 minutes.
  • the color film substrate 141 and the color resist material are cooled down to 10 to 20 degrees Celsius or cooled down at room temperature.
  • the surface of the color resist material will form wrinkles (as shown in FIG. 5B).
  • yellow light and etching processes are performed on the color resist material (as shown in FIG. 5C), and a plurality of color resists 142 with wrinkled surfaces can be obtained.
  • the reason for the formation of the wrinkled surface is that the color resist material and the color filter substrate 141 have different thermal expansion coefficients, so the color resist material will deform after being heated and cooled, resulting in an irregular wrinkle shape.
  • Step S3 Repeat the above steps to form color resists 142 of different colors between adjacent black matrices 143.
  • the color filter substrate 14 of the present invention can also be applied to other types of display panels, such as liquid crystal display panels (LCD) or quantum dot display panels (QLED).
  • LCD liquid crystal display panels
  • QLED quantum dot display panels
  • the present invention forms multiple color resists with wrinkled surfaces on the color filter substrate, so that the OLED display panel with a microcavity structure can not only have high color gamut and high brightness, but also solve the problem of microcavity.
  • the viewing angle is reduced by the effect, and the viewing angle of the display panel is improved.
  • the color filter substrate is located outside the organic light-emitting diode element, and will not affect its own electrical properties.

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

一种彩膜基板（14），包括彩膜衬底（141）以及形成于彩膜衬底（141）上的多个色阻（142）和黑矩阵（143），其中多个色阻（142）与黑矩阵（143）间隔设置，并且每个色阻（142）具有褶皱表面，用以增加光线的散射角度。通过在彩膜基板（14）上形成具有褶皱表面的多个色阻（142），使得具有微腔结构的有机发光二极体显示面板除了具有高色域和高亮度的表现外，更提高了显示面板的视角。

Description

有机发光二极体显示面板、彩膜基板及其制作方法 技术领域
本发明涉及显示技术领域，尤其涉及一种提高显示面板视角的有机发光二极体显示面板、彩膜基板及其制作方法。
 背景技术
随着显示面板的发展，为了达到更冲击的视觉震撼，高色域以及广视角已成为面板的必要配备。为了达到高色域的需求，有机发光二极体显示面板通常会采用微腔结构，使得得以重新分布光场、改变量子效率以及窄化光谱，进而使发射出来的光线具有更强的正向光以及更高的色纯度。
然而，显示面板的视角会随着微腔效应强度增强而变差。因此，有必要提供一种机发光二极体显示面板、彩膜基板及其制作方法，以解决现有技术存在的在维持高色域的情况下无法有效提高显示面板视角的问题。
 技术问题
本发明的目的在于提供一种有机发光二极体（OLED）显示面板、彩膜基板及其制作方法，以提高显示面板视角，解决现有技术存在的问题。
 技术解决方案
为实现上述目的，本发明第一方面提供一种彩膜基板，包括：
彩膜衬底，其上设置有黑矩阵；以及
多个色阻，其与所述黑矩阵间隔设置于所述彩膜衬底上，
其中，每个色阻具有摺皱表面，用以增加光线的散射角度。
进一步地，所述黑矩阵的高度高于所述多个色阻的高度。
进一步地，所述黑矩阵具有底面和顶面，所述黑矩阵的底面与所述彩膜衬底的表面接触，所述黑矩阵的底面宽度大于其顶面宽度。
进一步地，所述黑矩阵具有底面和顶面，所述黑矩阵的底面与所述彩膜衬底的表面接触，所述黑矩阵的底面宽度小于其顶面宽度。
本发明第二方面提供一种彩膜基板的制作方法，所述方法包括以下步骤：
在彩膜衬底上形成黑矩阵；
形成具有褶皱表面的多个色阻于所述彩膜衬底上，并且设置于相邻黑矩阵之间；以及
重复上述步骤以形成不同颜色的色阻于相邻黑矩阵之间。
进一步地，所述形成具有褶皱表面的多个色阻的步骤包括：
涂布色阻材料于所述彩膜衬底上，并对所述彩膜衬底和所述色阻材料加热；
使所述彩膜衬底与所述色阻材料冷却降温；以及
对所述彩色阻材料进行黄光与蚀刻制程，得到具有摺皱表面的所述多个色阻。
进一步地，所述黑矩阵的高度高于所述多个色阻的高度。
进一步地，所述黑矩阵具有底面和顶面，所述黑矩阵的底面与所述彩膜衬底的表面接触，所述黑矩阵的底面宽度大于其顶面宽度。
进一步地，所述黑矩阵具有底面和顶面，所述黑矩阵的底面与所述彩膜衬底的表面接触，所述黑矩阵的底面宽度小于其顶面宽度。
进一步地，所述彩膜衬底和所述色阻材料的加热的温度为摄氏200至300度，加热时间为5至30分钟。
进一步地，所述彩膜衬底和所述色阻材料冷却降温至摄氏10度至20度或在室温下冷却降温。
本发明第三方面提供一种有机发光二极体显示面板，包括：
有机发光二极体元件，其包括有薄膜晶体管元件与有机发光层，所述有机发光层用以发射光线；以及
彩膜基板，与所述薄膜晶体管元件相对设置，其包括有多个色阻及黑矩阵，所述多个色阻与黑矩阵于彩膜衬底面上间隔设置，所述多个色阻中每个色阻面向所述薄膜晶体管元件的方向上具有摺皱表面，使得所述有机发光层发射的光线得以增加其散射角度。
进一步地，所述黑矩阵的高度高于所述多个色阻的高度。
进一步地，所述黑矩阵具有底面和顶面，所述黑矩阵的底面与所述彩膜衬底的表面接触，所述黑矩阵的底面宽度大于其顶面宽度。
进一步地，所述黑矩阵具有底面和顶面，所述黑矩阵的底面与所述彩膜衬底的表面接触，所述黑矩阵的底面宽度小于其顶面宽度。
进一步地，所述多个色阻包括红色色阻、绿色色阻、以及蓝色色阻，并且其分别与所述有机发光层所发出不同颜色的光线对应设置。
进一步地，所述有机发光二极体显示面板还包括有阳极电极以及阴极电极，所述有机发光层通过所述阳极电极与所述薄膜晶体管层中的漏极电极连接，所述阴极电极设置于所述有机发光层的另一端，所述阳极电极以及所述阴极电极用以对所述有机发光层施加偏压。
进一步地，所述阳极电极为具有高反射性的金属材料，并且所述阴极电极的为具有透光性的透明导电薄膜。
进一步地，所述有机发光层中设置有布拉格反射镜，用以增强微腔效应。
进一步地，所述有机发光二极体显示面板还包括有封装层，其设置于所述有机发光层以及所述彩膜基板之间，用以避免水氧侵入所述有机发光层。
 有益效果
本发明通过在彩膜基板上形成具有摺皱表面的多个色阻，使得具有微腔结构的OLED显示面板除了可以有高色域和高亮度的表现外，更可以解决因微腔效应而降低的视角问题，进而提高显示面板的视角。并且，所述彩膜基板位于有机发光二极体元件外部，不会影响到其自身的电性。可见，本发明具有显著的进步性。
 附图说明
图1为本发明实施例提供的有机发光二极体显示面板的示意图。
图2为本发明实施例提供的具较高的黑矩阵的彩膜基板的示意图。
图3为本发明实施例提供的所述彩膜基板的制作方法步骤图。
图4为本发明实施例提供的具摺皱表面的多个色阻的制作方法步骤图。
图5A-5C为本发明实施例提供的具摺皱表面的多个色阻的制作方法流程图。
 本发明的最佳实施方式
为使本发明的目的、技术方案及效果更加清楚、明确，以下参照附图并对本发明作进一步地详细说明。应当理解，此处所描述的具体实施例仅用以解释本发明，并不用于限定本发明。
以下各实施例的说明是参考附加的图示，用以例示本发明可用以实施的实施例。本发明所提到的方向用语仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本发明，而非用以限制本发明。
请参照图1，图1为本发明实施例提供的有机发光二极体（organic light emitting diode, OLED）显示面板的示意图。所述有机发光二极体显示面板包括有机发光二极体元件以及彩膜基板14，其中所述有机发光二极体元件为发光元件，并且其包括薄膜晶体管元件11、有机发光层12、以及封装层13，所述薄膜晶体管元件11用以控制OLED显示面板的发光显示，其包括有薄膜晶体管（TFT）层112与阳极电极114，其中所述薄膜晶体管层112可以为顶栅（top-gate）结构、底栅结构（bottom-gate）、或是双栅结构（dual-gate）等，本发明并未对所述薄膜晶体管层112的类型作进一步地限制，而所述阳极电极114的一端与所述薄膜晶体管层112中的漏极电极（未标示）电连接，另一端与所述有机发光层12电连接。在本发明的实施例中，所述有机发光层12在所述阳极电极114上还依序形成有电洞注入层（未图示）、电洞传输层（未图示）、光致发光层（未图示）、电子传输层（未图示）、电子注入层（未图示）、以及阴极电极（未图示），通过在所述阳极电极114以及所述阴极电极上施加偏压，使得所述电子注入层中的电子与所述电洞注入层中的电洞分别经过电子传输层与电洞传输层在所述光致发光层复合产生激子（excitation）而发射光线。可以理解的是，所述光致发光层所发射的光线颜色会根据其材料而定，例如当所述光致发光层的材料为PTPP或是DCJTB等，则发出红色光线，当材料为Alaq3或是TDETE等，则发出绿色光线，当材料为TMTPEPA或是BDPAS等，则发出蓝色光线，本发明并未对所述光致发光层的材料作进一步地限定。
在本发明的实施例中，本发明以顶发射的OLED显示面板作为实施例说明，因此所述阳极电极114为具有高反射性的金属材料（例如金属铜），而所述阴极电极为具有透光性的透明导电薄膜（例如铟锡氧化物）。无論是顶发射或底发射的OLED显示面板，由于其都是由两个相互平行的一全反射面（即金属材料）和一半反射面（即透明导电薄膜）所形成的结构，因此都具有相当程度的微腔效应（microcavity effect），即全反射面与半反射面之间形成微共振腔，使得光致发光层所发射的光线会在微共振腔之间来回多次反射而得到增益，并且只有与微共振腔共振的特定波长的光线才能以特定的角度射出，因此射出光线的半高宽（FWHM）会变窄，能量会变强，从而提高显示面板对色域以及亮度的表现。于一实施例中，可以在有机发光层12中设置布拉格反射镜（DBR）来增强微腔效应。然而，微腔效应虽然可以提高显示的表现，但同时也造成了显示面板视角变差的现象，因此本发明通过在彩膜基板14上形成具有摺皱表面的多个色阻来提高显示面板的视角。
具体地，在有机发光层12上形成封装层13避免水氧侵入所述有机发光层12后，在薄膜晶体管元件11对面以及所述封装层13上形成彩膜基板14，并且所述彩膜基板14包括彩膜衬底141，以及形成于所述彩膜衬底141上面向所述薄膜晶体管元件11的方向的多个色阻142以及黑矩阵143，其中所述多个色阻142与所述黑矩阵143间隔设置。所述多个色阻142包括有红色色阻、绿色色阻、以及蓝色色阻，并且其分别与有机发光层12所发射出的光线的颜色对应设置，即红色色阻对应所述有机发光层12所发射出的红色光线设置、绿色色阻对应所发射出的绿色光线设置、以及蓝色色阻对应所发射出的蓝色光线设置。在所述多个色阻142中的每个色阻142上形成褶皱表面的目的为改善当光线经过这些褶皱表面时的散射角度，也就是说光线会由于不规则形状的褶皱表面而使得散射出去的角度变得更宽广，从而提高OLED显示面板的视角。并且，为了避免相邻散射后的光线相互干扰，所述黑矩阵143的高度可以设定为高于所述多个色阻142的高度，如图2所示。
结合图3所示，图3为本发明实施例提供的所述彩膜基板14的制作方法步骤图。所述方法包括以下步骤：
步骤S1：在彩膜衬底141上形成黑矩阵143。
在该步骤中，由于所述黑矩阵143可以形成具有较高的高度以避免相邻散射后的光线相互干扰，因此其在进行显影蚀刻制程中会产生斜面（taper），使得所述黑矩阵143的底面宽度大于其顶面宽度，其中所述黑矩阵143的底面与彩膜衬底141的表面接触。可以理解的是，所述黑矩阵143会由于不同制程方式而形成不同形状，因此于另一实施例中其底面宽度也可以小于顶面宽度。
步骤S2：形成具有褶皱表面的多个色阻于所述彩膜衬底141上，并且设置于相邻黑矩阵143之间。
结合图4与图5A-5C所示，图4为本发明实施例提供的具摺皱表面的多个色阻142的制作方法步骤图，图5A-5C为本发明实施例提供的具摺皱表面的多个色阻142的制作方法流程图。在该步骤中，首先涂布色阻材料于所述彩膜衬底141上（如图5A），并对所述彩膜衬底141和所述色阻材料加热，加热的温度与时间需要控制在所述色阻材料不会发生质变的范围内，例如加热温度可以控制为摄氏200至300度，加热时间为5至30分钟。接着使所述彩膜衬底141与所述色阻材料冷却降温至摄氏10至20度或是在室温下冷却降温，此时所述色阻材料的表面会形成摺皱（如图5B），再对所述彩色阻材料进行黄光与蚀刻制程（如图5C），即可得到具有摺皱表面的多个色阻142。褶皱表面形成的原因是由于所述色阻材料与所述彩膜衬底141的热膨胀系数不同，因此所述色阻材料在加热冷却后会发生变形而出现不规则的褶皱形状。
步骤S3：重复上述步骤以形成不同颜色的色阻142于相邻黑矩阵143之间。
本发明所述的彩膜基板14还可以应用于其他类型的显示面板上，例如液晶显示面板（LCD）或量子点显示面板（QLED）等。
综合上述，本发明通过在彩膜基板上形成具有摺皱表面的多个色阻，使得具有微腔结构的OLED显示面板除了可以有高色域和高亮度的表现外，更可以解决因微腔效应而降低的视角问题，进而提高显示面板的视角。并且，所述彩膜基板位于有机发光二极体元件外部，不会影响到其自身的电性。
虽然本发明已以优选实施例揭露如上，但上述优选实施例并非用以限制本发明，本领域的普通技术人员，在不脱离本申请的范围内，均可作各种更动与润饰，因此本申请的保护范围以权利要求界定的范围为准。

Claims (20)

  1. 一种彩膜基板，其特征在于，包括：
    彩膜衬底，其上设置有黑矩阵；以及
    多个色阻，其与所述黑矩阵间隔设置于所述彩膜衬底上，
    其中，每个色阻具有摺皱表面，用以增加光线的散射角度。
  2. 根据权利要求1所述的彩膜基板，其特征在于：所述黑矩阵的高度高于所述多个色阻的高度。
  3. 根据权利要求1所述的彩膜基板，其特征在于：所述黑矩阵具有底面和顶面，所述黑矩阵的底面与所述彩膜衬底的表面接触，所述黑矩阵的底面宽度大于其顶面宽度。
  4. 根据权利要求1所述的彩膜基板，其特征在于：所述黑矩阵具有底面和顶面，所述黑矩阵的底面与所述彩膜衬底的表面接触，所述黑矩阵的底面宽度小于其顶面宽度。
  5. 一种彩膜基板的制作方法，其特征在于，所述方法包括以下步骤：
    在彩膜衬底上形成黑矩阵；
    形成具有褶皱表面的多个色阻于所述彩膜衬底上，并且设置于相邻黑矩阵之间；以及
    重复上述步骤以形成不同颜色的色阻于相邻黑矩阵之间。
  6. 根据权利要求5所述的制作方法，其特征在于，所述形成具有褶皱表面的多个色阻的步骤包括：
    涂布色阻材料于所述彩膜衬底上，并对所述彩膜衬底和所述色阻材料加热；
    使所述彩膜衬底与所述色阻材料冷却降温；以及
    对所述彩色阻材料进行黄光与蚀刻制程，得到具有摺皱表面的所述多个色阻。
  7. 根据权利要求5所述的制作方法，其特征在于：所述黑矩阵的高度高于所述多个色阻的高度。
  8. 根据权利要求5所述的制作方法，其特征在于：所述黑矩阵具有底面和顶面，所述黑矩阵的底面与所述彩膜衬底的表面接触，所述黑矩阵的底面宽度大于其顶面宽度。
  9. 根据权利要求5所述的制作方法，其特征在于：所述黑矩阵具有底面和顶面，所述黑矩阵的底面与所述彩膜衬底的表面接触，所述黑矩阵的底面宽度小于其顶面宽度。
  10. 根据权利要求6所述的制作方法，其特征在于：所述彩膜衬底和所述色阻材料的加热温度为摄氏200至300度，加热时间为5至30分钟。
  11. 根据权利要求6所述的制作方法，其特征在于：所述彩膜衬底和所述色阻材料冷却降温至摄氏10度至20度或在室温下冷却降温。
  12. 一种有机发光二极体显示面板，其特征在于，包括：
    有机发光二极体元件，其包括有薄膜晶体管元件与有机发光层，所述有机发光层用以发射光线；以及
    彩膜基板，与所述薄膜晶体管元件相对设置，其包括有多个色阻及黑矩阵，所述多个色阻与黑矩阵于彩膜衬底上间隔设置，所述多个色阻中每个色阻面向所述薄膜晶体管元件的方向上具有摺皱表面，使得所述有机发光层发射的光线得以增加其散射角度。
  13. 根据权利要求12所述的有机发光二极体显示面板，其特征在于：所述黑矩阵的高度高于所述多个色阻的高度。
  14. 根据权利要求12所述的有机发光二极体显示面板，其特征在于：所述黑矩阵具有底面和顶面，所述黑矩阵的底面与所述彩膜衬底的表面接触，所述黑矩阵的底面宽度大于其顶面宽度。
  15. 根据权利要求12所述的有机发光二极体显示面板，其特征在于：所述黑矩阵具有底面和顶面，所述黑矩阵的底面与所述彩膜衬底的表面接触，所述黑矩阵的底面宽度小于其顶面宽度。
  16. 根据权利要求12所述的有机发光二极体显示面板，其特征在于：所述多个色阻包括红色色阻、绿色色阻、以及蓝色色阻，并且其分别与所述有机发光层所发出不同颜色的光线对应设置。
  17. 根据权利要求12所述的有机发光二极体显示面板，其特征在于：所述有机发光二极体显示面板还包括有阳极电极以及阴极电极，所述有机发光层通过所述阳极电极与所述薄膜晶体管层中的漏极电极连接，所述阴极电极设置于所述有机发光层的另一端，所述阳极电极以及所述阴极电极用以对所述有机发光层施加偏压。
  18. 根据权利要求17所述的有机发光二极体显示面板，其特征在于：所述阳极电极为具有高反射性的金属材料，并且所述阴极电极的为具有透光性的透明导电薄膜。
  19. 根据权利要求12所述的有机发光二极体显示面板，其特征在于：所述有机发光层中设置有布拉格反射镜，用以增强微腔效应。
  20. 根据权利要求12所述的有机发光二极体显示面板，其特征在于：所述有机发光二极体显示面板还包括有封装层，其设置于所述有机发光层以及所述彩膜基板之间，用以避免水氧侵入所述有机发光层。
PCT/CN2020/083078 2020-03-11 2020-04-02 有机发光二极体显示面板、彩膜基板及其制作方法 WO2021179372A1 (zh)

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040253413A1 (en) * 2003-02-28 2004-12-16 Yasuko Baba Optical filter and organic EL display using the same
US20140361264A1 (en) * 2013-06-10 2014-12-11 Samsung Display Co., Ltd. Organic light emitting display device and method of manufacturing the same
CN105467660A (zh) * 2016-01-05 2016-04-06 武汉华星光电技术有限公司 彩膜基板的制作方法
CN107102470A (zh) * 2017-06-12 2017-08-29 京东方科技集团股份有限公司 反射式液晶显示器及其制造方法
CN108122949A (zh) * 2016-11-30 2018-06-05 乐金显示有限公司 具有发光结构的显示设备
CN110120466A (zh) * 2019-05-30 2019-08-13 京东方科技集团股份有限公司 显示基板及其制造方法、显示面板

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102631461B1 (ko) * 2016-10-26 2024-01-30 엘지디스플레이 주식회사 발광 영역 및 반사 영역을 포함하는 디스플레이 장치
CN109686869B (zh) * 2019-02-28 2020-04-28 武汉华星光电半导体显示技术有限公司 一种oled显示面板及其制备方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040253413A1 (en) * 2003-02-28 2004-12-16 Yasuko Baba Optical filter and organic EL display using the same
US20140361264A1 (en) * 2013-06-10 2014-12-11 Samsung Display Co., Ltd. Organic light emitting display device and method of manufacturing the same
CN105467660A (zh) * 2016-01-05 2016-04-06 武汉华星光电技术有限公司 彩膜基板的制作方法
CN108122949A (zh) * 2016-11-30 2018-06-05 乐金显示有限公司 具有发光结构的显示设备
CN107102470A (zh) * 2017-06-12 2017-08-29 京东方科技集团股份有限公司 反射式液晶显示器及其制造方法
CN110120466A (zh) * 2019-05-30 2019-08-13 京东方科技集团股份有限公司 显示基板及其制造方法、显示面板

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