WO2021160785A1 - Réacteur cvd et procédé pour manipuler une plaque de recouvrement de chambre de traitement - Google Patents

Réacteur cvd et procédé pour manipuler une plaque de recouvrement de chambre de traitement Download PDF

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Publication number
WO2021160785A1
WO2021160785A1 PCT/EP2021/053424 EP2021053424W WO2021160785A1 WO 2021160785 A1 WO2021160785 A1 WO 2021160785A1 EP 2021053424 W EP2021053424 W EP 2021053424W WO 2021160785 A1 WO2021160785 A1 WO 2021160785A1
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WO
WIPO (PCT)
Prior art keywords
cover
cover plate
susceptor
lifting element
plate
Prior art date
Application number
PCT/EP2021/053424
Other languages
German (de)
English (en)
Inventor
Olivier Feron
Original Assignee
AIXTRON Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AIXTRON Ltd. filed Critical AIXTRON Ltd.
Priority to KR1020227030765A priority Critical patent/KR20220141827A/ko
Priority to CN202180014575.7A priority patent/CN115190918A/zh
Publication of WO2021160785A1 publication Critical patent/WO2021160785A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45565—Shower nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4585—Devices at or outside the perimeter of the substrate support, e.g. clamping rings, shrouds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating

Definitions

  • the invention relates to a method for handling a process chamber of a CVD reactor upwardly limiting ceiling plate, in particular for fully or semi-automatic replacement of the ceiling plate.
  • the invention also relates to a further development of a CVD reactor in which the cover plate can be raised from a lowered position into an assembly position by means of a lifting element.
  • a CVD reactor is previously known from DE 102012110125 A1.
  • the ceiling plate there is a screen plate with gas passage openings arranged below a gas outlet plate of a showerhead, which is brought into the assembly position by a simultaneous vertical displacement of the susceptor and ceiling plate, the susceptor being displaced in the vertical direction by a lifting device and the screen plate on its surface wearing.
  • Fastening means are provided which enable the ceiling plate to be fastened automatically.
  • a similar device is described in DE 102019117479 A1.
  • WO 2007/060143 A1 also discloses a ceiling plate fastened with retaining elements below a gas outlet plate.
  • JP 5721132 B2 also belongs to the prior art.
  • a body surrounding the susceptor is used as the hub element or that a body supporting the susceptor at its edge is used as the hub element.
  • the body can be in one piece or in several pieces.
  • the body surrounding the susceptor can be a closed body or a body interrupted in the circumferential direction.
  • the lifting element can be a pipe, for example.
  • the body can be formed from a plurality of partial bodies lying next to one another in the circumferential direction, so the body can, for example, have a plan corresponding to a circular ring.
  • the body can have an annular outline.
  • the body can, however, also be formed by a plurality of rods, columns or the like which extend in the vertical direction and which are arranged at different azimuthal positions around the susceptor or a heating device.
  • the lifting element can be formed by a support element carrying the susceptor, as is previously known, for example, from DE 102007027704 A1.
  • the support element can have an upper edge and the shape of a tube.
  • a susceptor is supported on the upper edge in a process position. The edge of the susceptor rests on the upper edge.
  • the susceptor is first brought out of the housing of the CVD reactor through a loading opening. For this purpose, a gate that closes the loading opening is opened.
  • annular gas outlet member surrounding the susceptor must also be lowered so that it does not lie in the movement path of the susceptor which is moved in its plane of extension.
  • the lifting element can be on a vertical be attached displaceable carrier device.
  • the carrier device can be displaceable in the vertical direction.
  • the carrier device can also carry the heating device with which the susceptor is heated from below in the process position.
  • the gas outlet organ can perform the function of the lifting element.
  • the mounting of the ceiling plate takes place automatically and, in particular, fully automatically. In particular, provision is made for the ceiling panel to be exchanged semi-automatically or fully automatically.
  • the cover plate can be attached to a cover of the housing which closes an upwardly facing housing opening.
  • a gas inlet member in the form of a showerhead can be attached to this cover.
  • the cover plate can be a protective plate which extends parallel to a gas outlet surface of the gas inlet element.
  • the gas outlet surface can have a multiplicity of gas outlet openings opening in the direction of the cover plate.
  • a gap can be located between the gas outlet surface and an upper side of the cover plate having gas passage openings, in which the gas emerging from the gas outlet surface can be distributed.
  • the edge of the ceiling plate te can form a sealing bead that rests in the assembled position of the ceiling plate sealingly on the fastening portion, for example on a fastening ring or the like.
  • the ceiling plate can be fastened by means of fasteners, for example screws, bayonets or the like, on the section.
  • the fastening means or a plurality of fastening means can also be arranged outside an outer ring zone of the ceiling plate.
  • Fastening means can be seen on the entire surface of the cover plate in order to connect it to the cover or the gas inlet element. They can also be arranged near the center of the ceiling tile.
  • These fastening means are preferably designed in such a way that they allow a slight lateral displacement of the plate relative to the gas inlet element without blocking. This means that different thermal expansions can be compensated for.
  • the lifting element when exchanging the Ceiling plate a ceiling plate used in previous separation processes, on which deposits have formed, exchanged for a cleaned ceiling plate.
  • the lifting element can be brought into a raised position in which it supports the ceiling plate attached to the fastening section.
  • Fastening means, with which the ceiling plate is attached to the fastening section are solved in this position in which the lifting element rests against the ceiling plate.
  • the ceiling plate By lowering the lifting element, the ceiling plate is brought into a position in which it can be gripped by means of a gripper reaching through the loading opening into the interior of the housing in order to be able to be removed from the loading opening from the interior.
  • the cleaned ceiling panel is attached to the section in the reverse order.
  • a cover which closes an opening in a housing and carries the cover plate is raised.
  • the temporary fasteners are removed.
  • the lid can be brought into its closed position.
  • C-shaped brackets can be used as temporary fastening means, with which the ceiling panel is temporarily attached to the fastening section, in particular to the cover. will hold.
  • the transport of the ceiling plate from the interior or into the interior can be done with a robot arm that can reach through the loading opening.
  • the ceiling panel is connected to the fastening section with automatically actuated fasteners.
  • temporary fastening means for example C-shaped brackets, are used with which the ceiling panel is temporarily fastened to the fastening section.
  • the cover plate is brought by the lifting element over the upper edge of the housing opening so that the edge of the cover plate is accessible to which the temporary fastening means can be attached. Subsequently, during the semi-automatic assembly, the cover is raised further until the downward-facing broad side surface of the cover plate is accessible in order to attach the fastening means there, which can be threaded elements, for example. These intermediate steps are not required with fully automated assembly.
  • the ceiling plate can be installed with the cover closed. After the fastening means have been fastened, the lifting element can be lowered. If a support element carrying the susceptor in the process position is used as the lifting element, the susceptor must be removed from the process chamber before the cover plate is replaced.
  • a susceptor equipped with substrates to be coated can be brought into the process chamber through the loading opening via the lowered gas outlet element. This is done with a robot arm that places the susceptor on the support element. The gas outlet element is then raised until an upper edge of the gas outlet element abuts the edge of the cover plate or a section of the housing surrounding the cover plate.
  • the ceiling plate which can consist of quartz, steel, in particular stainless steel, or a ceramic material, has passage openings for a product to pass through. process gas that is fed into the gap between the ceiling plate and the gas inlet element.
  • the lifting element surrounding the susceptor can be made of steel, in particular special stainless steel, quartz or a ceramic material. It can be formed by a tubular body, in the cavity of which a heating device for heating the susceptor is arranged. The heating device can be moved vertically together with the lifting element. In the process position, the lifting element can also perform the function of a liner, with which a space arranged below the susceptor is shielded from the process gases. The lifting element can thus form the function of an umbrella tube.
  • the invention also relates to a further development of the ceiling plate.
  • the cover plate has near its edge an annular bead directed towards the gas inlet element or the gas outlet plate. This annular bead defines a gap between the gas outlet plate and the ceiling plate.
  • the annular bead is preferably in sealing contact with a flat underside of the gas inlet element or the gas outlet plate formed by the gas inlet element.
  • the gas outlet plate can have a beveled edge surface in the area of the bead. The bead extends in the area of this beveled edge surface. The bead prevents the process gas fed into the gap from escaping to the side.
  • the gas inlet element is an integral part of the housing cover.
  • the housing cover forms an annular web which is integrally molded onto the cover plate of the cover as a single material.
  • the ring web has a radially outwardly facing wall which, when the cover is installed, rests against an inner surface of a wall of the housing.
  • the ring web also has a radially inwardly directed surface on which an outer edge cut of the gas inlet element.
  • the gas inlet element is preferably surrounded by the annular web and is enclosed by the annular web.
  • Fig. 1 in the manner of a cross-section a CVD reactor in a process position in which a process chamber 23 is delimited at the bottom by a susceptor 5 and at the top by a cover plate 6, the process chamber 23 being surrounded by a gas outlet element 3 , Fig. La enlarges the section Ia,
  • FIG. 2 shows a representation according to Figure 1, but with lowered gas outlet member 3,
  • FIG. 3 shows an illustration according to FIG. 2, in which the susceptor 5 is removed through a loading opening 18,
  • FIG. 4 shows a representation according to FIG. 3, in which the cover 2 is brought into a first open position, in which it is located approximately 20 to 30 mm above an edge 24 'of the opening 24 of the housing 1, with temporary fastening means 19 being attached who, for the temporary fixation of the ceiling plate 6 on the cover 2,
  • FIG. 5 shows an illustration according to FIG. 4, the cover 2 being brought into a second open position
  • 6 shows an illustration according to FIG. 5, with threaded elements 20, with which the cover plate 6 are fastened to the cover 2, being loosened and the cover plate 6 is only held on the cover 2 by means of the temporary fastening means 19
  • FIG. 7 shows an illustration according to FIG 6, the top plate 6, which is only held on the cover 2 by means of the temporary fastening means 19, is brought into the first open position, with an upper edge of a lifting element 11 supporting the top plate 6,
  • FIG. 8 shows an illustration according to FIG. 7, the temporary fastening means 19 having been removed so that the ceiling plate 6 is only supported by the lifting element 11,
  • FIG. 9 shows an illustration according to FIG. 8 after the lifting element 11 has been lowered into a position in which the cover plate 6 has detached itself from the cover 2 and can be removed through the loading opening 18 by means of a gripping arm,
  • FIG. 10 shows a representation according to FIG. 9, in which the interior 22 contains neither a susceptor nor a cover plate 6 before a cleaned cover plate is brought into the interior 22, which is attached to the cover 2 in essentially the reverse order,
  • FIG. 11 shows a representation according to Figure la of a second embodiment, for example, in which the gas outlet member 3 performs the function of a lifting element. Description of the embodiments
  • FIG. 1 shows schematically in the form of a cross section through a CVD reactor its essential components.
  • the CVD reactor has a gas-tight housing 1 which has an opening 24 pointing upwards.
  • the opening 24 is closed by a cover 2.
  • the cover 2 carries a gas inlet element 4 in the form of a showerhead.
  • the gas inlet element 4 has a gas distribution volume which is delimited at the bottom by a gas outlet plate 21 which, with its underside, forms a gas outlet surface.
  • the gas outlet plate 21 has a multiplicity of gas outlet openings 17 with which gas can exit from the gas distribution chamber 17 into a gap 15.
  • the gap 15 extends between the gas outlet plate 21 and a cover plate 6 which is arranged below the gas inlet element 4.
  • One edge of the essentially circular disk-shaped cover plate 6 has a bead 14 which is supported on an edge section of the gas outlet plate 21, the height of the bead 14 defining the height of the gap 15.
  • the cover plate 6 has a plurality of gas passage openings 16 through which the gas that has entered the gap 15 can flow into a process chamber 23 arranged below the cover plate 6. While the cover plate 6 delimits the process chamber 23 towards the top, a susceptor 5 delimits the process chamber 23 towards the bottom.
  • the edge of the cover plate 6 can in the area in which the circumferential bead 14 is arranged, have a smaller material thickness than in the central area, the material thickness preferably being on the upper side. is reduced, so that an outwardly rising gap to the gas inlet member can result.
  • the material thickness can also be reduced on the upper side, so that there is an outwardly rising gap to the gas inlet element.
  • the edge of the susceptor 5 rests on a support element which, in the exemplary embodiment, can have the shape of a tube. It can in particular be formed by a protective tube 11.
  • the protective tube 11 surrounds an arrangement with a heating device 7, which is located below the susceptor 5 and which has a carrier plate 12 for supplying power to the Schuein direction 7 will.
  • the tube 11, on which the edge of the susceptor is supported, has the function of a support tube in a variant of the invention.
  • the tube 11 forms the carrier of the susceptor 5.
  • the process chamber is surrounded by an annular gas outlet element 3.
  • the gas outlet element 3 can be lowered from a process position shown in FIG. 1, in which it is arranged in front of a loading opening 18, into a position in which the loading opening 18 is free. In this position shown in FIG can be removed in order to be exchanged for another susceptor 5.
  • An element denoted by the reference number 9 forms a gas outlet pipe with which the gas which is collected in the gas outlet element 3 can be transported to the outside.
  • the egg designated in the drawings with the reference number 9 However, ment can also clarify the further lifting device with which the gas outlet element 3 can be lowered and raised.
  • the ceiling plate 6 moves a the edge region of the ceiling plate 6 reaching under lifting element 11, which is formed in the embodiment of the protective tube, up to support the ceiling plate 6 so that they on the cover 2 or the gas inlet organ 4 holding fasteners can be automatically released, as is proposed, for example, in the prior art mentioned at the beginning. Subsequently, the ceiling plate 6 is brought into a removal position by lowering the Hubelemen tes 11, in which it can be removed from the inner space 22 by means of a gripping arm engaging through the Bela deloch 18 in the interior 22. A replaced cover plate 6 is fastened to the cover 2 or to the gas inlet element 4 in the reverse order. The ceiling plate 6 is placed on the lifting element 11.
  • the lifting element 11 is raised until the cover plate 6 or the bead 14 rests on the gas inlet element 4 or on the cover 2. Then the fastening means are brought into a fastening position. Additional centering means can be provided with which the ceiling plate 6 can be brought into a centered position. The centering means can, however, also be formed by the fastening means.
  • the cover 2 is raised into the first open position shown in Figure 4, in which the cover is arranged in particular with the lifting element 11 about 10 to 30 mm above an opening edge 24 '.
  • C-shaped brackets 19 are attached to the cover plate 6 which is fastened to a fastening section 21 of the cover 2 with screws 20 (see FIG. 6).
  • the cover 2 is then inserted into the second opening shown in FIG. Position brought.
  • the cover 2 can also be brought directly into the open position shown in FIG. 5 in order to fasten the temporary fastening means formed by the C-shaped brackets 19 there.
  • Figure 6 shows how the above screws 20, with which the cover plate 6 are permanently attached to the cover 2, are solved in the second open position.
  • the cover 2 is lowered into the first open position with the cover plate 6, which is only held by the clamps 19.
  • the clamps 19 are removed so that the operating position shown in FIG. 8 is reached, in which the cover plate 6 is only supported by the lifting element 11.
  • the cover 2 can be held tesch in this position by not shown further Hal.
  • a cleaned ceiling panel 6 is attached to the cover 2 in essentially the reverse order.
  • a cover plate 6 is brought into the interior 22 of the housing 1, which has an operating position according to FIG.
  • the cover plate 6 is placed on the Hubele element 11 according to FIG.
  • the lifting element 11 is shown in FIG. raised fenposition, in which the cover plate 6 on the gas inlet element 4 or rather on the cover 2 rests.
  • the temporary fastening means 19 shown in FIG. 7 are attached, which hold the cover plate 6 on the cover 2. Any centering that may be required can be carried out.
  • the cover 2 is raised into the second position shown in FIG. 6, in which the screws 20 or other fastening means are attached with which the cover plate 6 is permanently fastened to the cover 2.
  • the centering of the ceiling plate 6 can also take place with the permanent fastening means 20.
  • the clips 19 can be removed. However, it is also possible to lower the cover 2 beforehand into the position shown in FIG. 4 in order to remove the clips 19 in this position. The cover 2 is then lowered into the closed position shown in FIG. The lifting element 11 is brought into a lowered order. In this a new susceptor 5 can be brought through the loading opening 18 into the interior 22, where it is placed on the lifting element 11.
  • FIG. 11 shows, in a representation according to FIG. La, a variant of the invention in which the edge of the cover plate 6 can be supported by an upper section of an annular gas outlet element 3.
  • the gas outlet element 3 can not only be lowered from the lowered position shown in FIG.
  • the gas outlet element 3 can also be brought from the process position shown in FIG. 1 into a raised position, not shown, in which it protrudes over the edge 24 'in order to bring the cover plate 6 into a raised position.
  • Figures 1 and la show an annular web 25 formed from the underside of the lid, which is integrally formed of the same material of the lid plate made of metal.
  • This annular web 25 has a radially outwardly white transmitting surface which rests against a surface of the wall of the housing 1. When the cover is closed, the annular web 25 protrudes into the opening 24.
  • the annular web 25 surrounds the gas inlet element 4.
  • the annular web 25 forms a circular receiving chamber in which the gas inlet element 4, which is attached to the underside of the cover 2, rests.
  • An outer edge section 26 of the gas inlet element 4, which is preferably formed as one material from the gas outlet plate 21, has a radially outwardly facing wall which rests against the radially inwardly facing wall of the annular web 25.
  • the height of the annular web 25 preferably corresponds to the height of the gas inlet element 4, so that the surface of the gas inlet element 4 facing the process chamber 23 runs flush with the surface of the annular web 25 pointing in the axial direction.
  • FIG. 1 a shows that the surface of the cover plate 6 facing the gas inlet element 4 runs obliquely in the edge region, so that the material thickness of the cover plate 6 is reduced in a wedge shape at the edge.
  • the circular bead 14 rests on the outer edge portion 26. The bead 14 prevents process gas which enters the gap 15 through the gas outlet openings 17 from exiting the gap 15 laterally.
  • a CVD reactor which is characterized in that the lifting element 11 is formed by one or more bodies surrounding the susceptor 5 or supporting it at its edge.
  • a CVD reactor or a method which is characterized in that the lifting element 11 is a support element carrying the susceptor 5 or a gas outlet element 3 surrounding the susceptor 5.
  • a CVD reactor or a method which is characterized in that the lifting element 11 has an annular plan and / or that the lifting element 11 has the shape of a tube.
  • a CVD reactor or a method which is characterized in that the fastening portion 21 is formed by a cover 2 closing an upper opening 24 of the housing 1 and the lifting element 11 can be raised into a position in which at least one upper portion of the Hubelemen tes 11 over the edge 24 'of the opening 24 protrudes to the outside.
  • a CVD reactor or a method which is characterized in that the cover plate 6 with temporary and / or permanent fastening means 19, 20 can be fastened to the fastening section 21 or is fastened and / or that the cover plate 6 is a gas inlet member 4th or has circumferential annular bead 14 facing the gas outlet plate 21, which rests in sealing contact with the gas inlet element 4 or the gas outlet plate 21 and / or that the cover 2 has an annular web 25 which protrudes into the opening 24 and surrounds the gas inlet element 4.
  • a CVD reactor or a method which is characterized in that the fastening section 21 is a gas inlet element 4 or surrounds a gas inlet element 4, the gas inlet element 4 having a plurality of gas outlet openings 17 which extend into a gap 15 between the Ceiling plate 6 and a gas outlet surface of the gas inlet element 4 open, with the ceiling plate 6 having gas passage openings 16.
  • a CVD reactor or a method which is characterized in that the gas outlet element 3 can be displaced from a process position lying in the movement path of the susceptor 5 or the cover plate 6 into a lowered position.
  • a CVD reactor or a method which is characterized in that the fastening portion 21 is assigned to an opening 24 of the housing 1 ver closing cover 2, and for mounting the cover plate 6 of the cover 2 before or when lifting the cover plate 6 is brought into a first open position, and after lifting the ceiling plate 6 supported by the lifting element 11 is fastened to the cover 2 with first fastening means 19, and then after lifting the cover 2 in a second position, during which the ceiling plate 6 separates from the lifting element 11, is attached to the cover 2 with second fastening means 20 and / or that, to remove the cover plate 6, the cover 2 is first brought into a first open position, in which the first fastening means 19 are attached to the cover 2, and after lifting of the cover 2 in a second open position second fastening means 20 are released and then the cover 2 is brought back to the first open position in which the cover plate 6 rests on the lifting element 11, in which position the first fastening means tel 19 are removed.

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

L'invention concerne un réacteur CVD comprenant un logement (1), comportant un suscepteur (5) délimitant une chambre de traitement (23) vers le bas et une plaque de recouvrement (6) délimitant cette chambre de traitement (23) vers le haut, ladite plaque de recouvrement (6) pouvant être levée au moyen d'un élément de levage (11) qui peut être levé d'une position abaissée vers une position de montage, jusqu'à une position d'appui au niveau d'une partie de fixation (21) du logement (1), la plaque de recouvrement (6) pouvant être fixée sur le logement (1) au niveau de cette partie de fixation (21). L'objectif de cette invention est de fixer la plaque de recouvrement (6) sur le logement (1) de manière automatique ou semi-automatique. À cet effet, un élément de levage (11) entoure le suscepteur (5) ou le soutient au niveau de son bord. Cet élément de levage (11) peut également être constitué par un tube protecteur. L'élément de levage (11) peut permettre de disposer la plaque de recouvrement (6) dans une position dans laquelle elle peut être retirée à travers une ouverture de chargement (18).
PCT/EP2021/053424 2020-02-14 2021-02-12 Réacteur cvd et procédé pour manipuler une plaque de recouvrement de chambre de traitement WO2021160785A1 (fr)

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KR1020227030765A KR20220141827A (ko) 2020-02-14 2021-02-12 Cvd-반응기 및 공정 챔버-커버 플레이트를 취급하기 위한 방법
CN202180014575.7A CN115190918A (zh) 2020-02-14 2021-02-12 Cvd反应器和用于处理过程室盖板的方法

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DE102020103947.6 2020-02-14
DE102020103947.6A DE102020103947A1 (de) 2020-02-14 2020-02-14 CVD-Reaktor und Verfahren zum Handhaben einer Prozesskammer-Deckenplatte

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DE102022129723A1 (de) 2022-11-10 2024-05-16 Aixtron Se CVD-Reaktor mit herausnehmbarem Prozesskammergehäuse
WO2024099936A1 (fr) 2022-11-10 2024-05-16 Aixtron Se Réacteur cvd avec boîtier de chambre de traitement amovible

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CN115190918A (zh) 2022-10-14
DE102020103947A1 (de) 2021-08-19
KR20220141827A (ko) 2022-10-20

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