WO2021160785A1 - Cvd reactor and method for handling a process chamber cover plate - Google Patents

Cvd reactor and method for handling a process chamber cover plate Download PDF

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Publication number
WO2021160785A1
WO2021160785A1 PCT/EP2021/053424 EP2021053424W WO2021160785A1 WO 2021160785 A1 WO2021160785 A1 WO 2021160785A1 EP 2021053424 W EP2021053424 W EP 2021053424W WO 2021160785 A1 WO2021160785 A1 WO 2021160785A1
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WO
WIPO (PCT)
Prior art keywords
cover
cover plate
susceptor
lifting element
plate
Prior art date
Application number
PCT/EP2021/053424
Other languages
German (de)
French (fr)
Inventor
Olivier Feron
Original Assignee
AIXTRON Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AIXTRON Ltd. filed Critical AIXTRON Ltd.
Priority to CN202180014575.7A priority Critical patent/CN115190918A/en
Priority to KR1020227030765A priority patent/KR20220141827A/en
Publication of WO2021160785A1 publication Critical patent/WO2021160785A1/en

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563Gas nozzles
    • C23C16/45565Shower nozzles
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4585Devices at or outside the perimeter of the substrate support, e.g. clamping rings, shrouds
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54Apparatus specially adapted for continuous coating

Definitions

  • the invention relates to a method for handling a process chamber of a CVD reactor upwardly limiting ceiling plate, in particular for fully or semi-automatic replacement of the ceiling plate.
  • the invention also relates to a further development of a CVD reactor in which the cover plate can be raised from a lowered position into an assembly position by means of a lifting element.
  • a CVD reactor is previously known from DE 102012110125 A1.
  • the ceiling plate there is a screen plate with gas passage openings arranged below a gas outlet plate of a showerhead, which is brought into the assembly position by a simultaneous vertical displacement of the susceptor and ceiling plate, the susceptor being displaced in the vertical direction by a lifting device and the screen plate on its surface wearing.
  • Fastening means are provided which enable the ceiling plate to be fastened automatically.
  • a similar device is described in DE 102019117479 A1.
  • WO 2007/060143 A1 also discloses a ceiling plate fastened with retaining elements below a gas outlet plate.
  • JP 5721132 B2 also belongs to the prior art.
  • a body surrounding the susceptor is used as the hub element or that a body supporting the susceptor at its edge is used as the hub element.
  • the body can be in one piece or in several pieces.
  • the body surrounding the susceptor can be a closed body or a body interrupted in the circumferential direction.
  • the lifting element can be a pipe, for example.
  • the body can be formed from a plurality of partial bodies lying next to one another in the circumferential direction, so the body can, for example, have a plan corresponding to a circular ring.
  • the body can have an annular outline.
  • the body can, however, also be formed by a plurality of rods, columns or the like which extend in the vertical direction and which are arranged at different azimuthal positions around the susceptor or a heating device.
  • the lifting element can be formed by a support element carrying the susceptor, as is previously known, for example, from DE 102007027704 A1.
  • the support element can have an upper edge and the shape of a tube.
  • a susceptor is supported on the upper edge in a process position. The edge of the susceptor rests on the upper edge.
  • the susceptor is first brought out of the housing of the CVD reactor through a loading opening. For this purpose, a gate that closes the loading opening is opened.
  • annular gas outlet member surrounding the susceptor must also be lowered so that it does not lie in the movement path of the susceptor which is moved in its plane of extension.
  • the lifting element can be on a vertical be attached displaceable carrier device.
  • the carrier device can be displaceable in the vertical direction.
  • the carrier device can also carry the heating device with which the susceptor is heated from below in the process position.
  • the gas outlet organ can perform the function of the lifting element.
  • the mounting of the ceiling plate takes place automatically and, in particular, fully automatically. In particular, provision is made for the ceiling panel to be exchanged semi-automatically or fully automatically.
  • the cover plate can be attached to a cover of the housing which closes an upwardly facing housing opening.
  • a gas inlet member in the form of a showerhead can be attached to this cover.
  • the cover plate can be a protective plate which extends parallel to a gas outlet surface of the gas inlet element.
  • the gas outlet surface can have a multiplicity of gas outlet openings opening in the direction of the cover plate.
  • a gap can be located between the gas outlet surface and an upper side of the cover plate having gas passage openings, in which the gas emerging from the gas outlet surface can be distributed.
  • the edge of the ceiling plate te can form a sealing bead that rests in the assembled position of the ceiling plate sealingly on the fastening portion, for example on a fastening ring or the like.
  • the ceiling plate can be fastened by means of fasteners, for example screws, bayonets or the like, on the section.
  • the fastening means or a plurality of fastening means can also be arranged outside an outer ring zone of the ceiling plate.
  • Fastening means can be seen on the entire surface of the cover plate in order to connect it to the cover or the gas inlet element. They can also be arranged near the center of the ceiling tile.
  • These fastening means are preferably designed in such a way that they allow a slight lateral displacement of the plate relative to the gas inlet element without blocking. This means that different thermal expansions can be compensated for.
  • the lifting element when exchanging the Ceiling plate a ceiling plate used in previous separation processes, on which deposits have formed, exchanged for a cleaned ceiling plate.
  • the lifting element can be brought into a raised position in which it supports the ceiling plate attached to the fastening section.
  • Fastening means, with which the ceiling plate is attached to the fastening section are solved in this position in which the lifting element rests against the ceiling plate.
  • the ceiling plate By lowering the lifting element, the ceiling plate is brought into a position in which it can be gripped by means of a gripper reaching through the loading opening into the interior of the housing in order to be able to be removed from the loading opening from the interior.
  • the cleaned ceiling panel is attached to the section in the reverse order.
  • a cover which closes an opening in a housing and carries the cover plate is raised.
  • the temporary fasteners are removed.
  • the lid can be brought into its closed position.
  • C-shaped brackets can be used as temporary fastening means, with which the ceiling panel is temporarily attached to the fastening section, in particular to the cover. will hold.
  • the transport of the ceiling plate from the interior or into the interior can be done with a robot arm that can reach through the loading opening.
  • the ceiling panel is connected to the fastening section with automatically actuated fasteners.
  • temporary fastening means for example C-shaped brackets, are used with which the ceiling panel is temporarily fastened to the fastening section.
  • the cover plate is brought by the lifting element over the upper edge of the housing opening so that the edge of the cover plate is accessible to which the temporary fastening means can be attached. Subsequently, during the semi-automatic assembly, the cover is raised further until the downward-facing broad side surface of the cover plate is accessible in order to attach the fastening means there, which can be threaded elements, for example. These intermediate steps are not required with fully automated assembly.
  • the ceiling plate can be installed with the cover closed. After the fastening means have been fastened, the lifting element can be lowered. If a support element carrying the susceptor in the process position is used as the lifting element, the susceptor must be removed from the process chamber before the cover plate is replaced.
  • a susceptor equipped with substrates to be coated can be brought into the process chamber through the loading opening via the lowered gas outlet element. This is done with a robot arm that places the susceptor on the support element. The gas outlet element is then raised until an upper edge of the gas outlet element abuts the edge of the cover plate or a section of the housing surrounding the cover plate.
  • the ceiling plate which can consist of quartz, steel, in particular stainless steel, or a ceramic material, has passage openings for a product to pass through. process gas that is fed into the gap between the ceiling plate and the gas inlet element.
  • the lifting element surrounding the susceptor can be made of steel, in particular special stainless steel, quartz or a ceramic material. It can be formed by a tubular body, in the cavity of which a heating device for heating the susceptor is arranged. The heating device can be moved vertically together with the lifting element. In the process position, the lifting element can also perform the function of a liner, with which a space arranged below the susceptor is shielded from the process gases. The lifting element can thus form the function of an umbrella tube.
  • the invention also relates to a further development of the ceiling plate.
  • the cover plate has near its edge an annular bead directed towards the gas inlet element or the gas outlet plate. This annular bead defines a gap between the gas outlet plate and the ceiling plate.
  • the annular bead is preferably in sealing contact with a flat underside of the gas inlet element or the gas outlet plate formed by the gas inlet element.
  • the gas outlet plate can have a beveled edge surface in the area of the bead. The bead extends in the area of this beveled edge surface. The bead prevents the process gas fed into the gap from escaping to the side.
  • the gas inlet element is an integral part of the housing cover.
  • the housing cover forms an annular web which is integrally molded onto the cover plate of the cover as a single material.
  • the ring web has a radially outwardly facing wall which, when the cover is installed, rests against an inner surface of a wall of the housing.
  • the ring web also has a radially inwardly directed surface on which an outer edge cut of the gas inlet element.
  • the gas inlet element is preferably surrounded by the annular web and is enclosed by the annular web.
  • Fig. 1 in the manner of a cross-section a CVD reactor in a process position in which a process chamber 23 is delimited at the bottom by a susceptor 5 and at the top by a cover plate 6, the process chamber 23 being surrounded by a gas outlet element 3 , Fig. La enlarges the section Ia,
  • FIG. 2 shows a representation according to Figure 1, but with lowered gas outlet member 3,
  • FIG. 3 shows an illustration according to FIG. 2, in which the susceptor 5 is removed through a loading opening 18,
  • FIG. 4 shows a representation according to FIG. 3, in which the cover 2 is brought into a first open position, in which it is located approximately 20 to 30 mm above an edge 24 'of the opening 24 of the housing 1, with temporary fastening means 19 being attached who, for the temporary fixation of the ceiling plate 6 on the cover 2,
  • FIG. 5 shows an illustration according to FIG. 4, the cover 2 being brought into a second open position
  • 6 shows an illustration according to FIG. 5, with threaded elements 20, with which the cover plate 6 are fastened to the cover 2, being loosened and the cover plate 6 is only held on the cover 2 by means of the temporary fastening means 19
  • FIG. 7 shows an illustration according to FIG 6, the top plate 6, which is only held on the cover 2 by means of the temporary fastening means 19, is brought into the first open position, with an upper edge of a lifting element 11 supporting the top plate 6,
  • FIG. 8 shows an illustration according to FIG. 7, the temporary fastening means 19 having been removed so that the ceiling plate 6 is only supported by the lifting element 11,
  • FIG. 9 shows an illustration according to FIG. 8 after the lifting element 11 has been lowered into a position in which the cover plate 6 has detached itself from the cover 2 and can be removed through the loading opening 18 by means of a gripping arm,
  • FIG. 10 shows a representation according to FIG. 9, in which the interior 22 contains neither a susceptor nor a cover plate 6 before a cleaned cover plate is brought into the interior 22, which is attached to the cover 2 in essentially the reverse order,
  • FIG. 11 shows a representation according to Figure la of a second embodiment, for example, in which the gas outlet member 3 performs the function of a lifting element. Description of the embodiments
  • FIG. 1 shows schematically in the form of a cross section through a CVD reactor its essential components.
  • the CVD reactor has a gas-tight housing 1 which has an opening 24 pointing upwards.
  • the opening 24 is closed by a cover 2.
  • the cover 2 carries a gas inlet element 4 in the form of a showerhead.
  • the gas inlet element 4 has a gas distribution volume which is delimited at the bottom by a gas outlet plate 21 which, with its underside, forms a gas outlet surface.
  • the gas outlet plate 21 has a multiplicity of gas outlet openings 17 with which gas can exit from the gas distribution chamber 17 into a gap 15.
  • the gap 15 extends between the gas outlet plate 21 and a cover plate 6 which is arranged below the gas inlet element 4.
  • One edge of the essentially circular disk-shaped cover plate 6 has a bead 14 which is supported on an edge section of the gas outlet plate 21, the height of the bead 14 defining the height of the gap 15.
  • the cover plate 6 has a plurality of gas passage openings 16 through which the gas that has entered the gap 15 can flow into a process chamber 23 arranged below the cover plate 6. While the cover plate 6 delimits the process chamber 23 towards the top, a susceptor 5 delimits the process chamber 23 towards the bottom.
  • the edge of the cover plate 6 can in the area in which the circumferential bead 14 is arranged, have a smaller material thickness than in the central area, the material thickness preferably being on the upper side. is reduced, so that an outwardly rising gap to the gas inlet member can result.
  • the material thickness can also be reduced on the upper side, so that there is an outwardly rising gap to the gas inlet element.
  • the edge of the susceptor 5 rests on a support element which, in the exemplary embodiment, can have the shape of a tube. It can in particular be formed by a protective tube 11.
  • the protective tube 11 surrounds an arrangement with a heating device 7, which is located below the susceptor 5 and which has a carrier plate 12 for supplying power to the Schuein direction 7 will.
  • the tube 11, on which the edge of the susceptor is supported, has the function of a support tube in a variant of the invention.
  • the tube 11 forms the carrier of the susceptor 5.
  • the process chamber is surrounded by an annular gas outlet element 3.
  • the gas outlet element 3 can be lowered from a process position shown in FIG. 1, in which it is arranged in front of a loading opening 18, into a position in which the loading opening 18 is free. In this position shown in FIG can be removed in order to be exchanged for another susceptor 5.
  • An element denoted by the reference number 9 forms a gas outlet pipe with which the gas which is collected in the gas outlet element 3 can be transported to the outside.
  • the egg designated in the drawings with the reference number 9 However, ment can also clarify the further lifting device with which the gas outlet element 3 can be lowered and raised.
  • the ceiling plate 6 moves a the edge region of the ceiling plate 6 reaching under lifting element 11, which is formed in the embodiment of the protective tube, up to support the ceiling plate 6 so that they on the cover 2 or the gas inlet organ 4 holding fasteners can be automatically released, as is proposed, for example, in the prior art mentioned at the beginning. Subsequently, the ceiling plate 6 is brought into a removal position by lowering the Hubelemen tes 11, in which it can be removed from the inner space 22 by means of a gripping arm engaging through the Bela deloch 18 in the interior 22. A replaced cover plate 6 is fastened to the cover 2 or to the gas inlet element 4 in the reverse order. The ceiling plate 6 is placed on the lifting element 11.
  • the lifting element 11 is raised until the cover plate 6 or the bead 14 rests on the gas inlet element 4 or on the cover 2. Then the fastening means are brought into a fastening position. Additional centering means can be provided with which the ceiling plate 6 can be brought into a centered position. The centering means can, however, also be formed by the fastening means.
  • the cover 2 is raised into the first open position shown in Figure 4, in which the cover is arranged in particular with the lifting element 11 about 10 to 30 mm above an opening edge 24 '.
  • C-shaped brackets 19 are attached to the cover plate 6 which is fastened to a fastening section 21 of the cover 2 with screws 20 (see FIG. 6).
  • the cover 2 is then inserted into the second opening shown in FIG. Position brought.
  • the cover 2 can also be brought directly into the open position shown in FIG. 5 in order to fasten the temporary fastening means formed by the C-shaped brackets 19 there.
  • Figure 6 shows how the above screws 20, with which the cover plate 6 are permanently attached to the cover 2, are solved in the second open position.
  • the cover 2 is lowered into the first open position with the cover plate 6, which is only held by the clamps 19.
  • the clamps 19 are removed so that the operating position shown in FIG. 8 is reached, in which the cover plate 6 is only supported by the lifting element 11.
  • the cover 2 can be held tesch in this position by not shown further Hal.
  • a cleaned ceiling panel 6 is attached to the cover 2 in essentially the reverse order.
  • a cover plate 6 is brought into the interior 22 of the housing 1, which has an operating position according to FIG.
  • the cover plate 6 is placed on the Hubele element 11 according to FIG.
  • the lifting element 11 is shown in FIG. raised fenposition, in which the cover plate 6 on the gas inlet element 4 or rather on the cover 2 rests.
  • the temporary fastening means 19 shown in FIG. 7 are attached, which hold the cover plate 6 on the cover 2. Any centering that may be required can be carried out.
  • the cover 2 is raised into the second position shown in FIG. 6, in which the screws 20 or other fastening means are attached with which the cover plate 6 is permanently fastened to the cover 2.
  • the centering of the ceiling plate 6 can also take place with the permanent fastening means 20.
  • the clips 19 can be removed. However, it is also possible to lower the cover 2 beforehand into the position shown in FIG. 4 in order to remove the clips 19 in this position. The cover 2 is then lowered into the closed position shown in FIG. The lifting element 11 is brought into a lowered order. In this a new susceptor 5 can be brought through the loading opening 18 into the interior 22, where it is placed on the lifting element 11.
  • FIG. 11 shows, in a representation according to FIG. La, a variant of the invention in which the edge of the cover plate 6 can be supported by an upper section of an annular gas outlet element 3.
  • the gas outlet element 3 can not only be lowered from the lowered position shown in FIG.
  • the gas outlet element 3 can also be brought from the process position shown in FIG. 1 into a raised position, not shown, in which it protrudes over the edge 24 'in order to bring the cover plate 6 into a raised position.
  • Figures 1 and la show an annular web 25 formed from the underside of the lid, which is integrally formed of the same material of the lid plate made of metal.
  • This annular web 25 has a radially outwardly white transmitting surface which rests against a surface of the wall of the housing 1. When the cover is closed, the annular web 25 protrudes into the opening 24.
  • the annular web 25 surrounds the gas inlet element 4.
  • the annular web 25 forms a circular receiving chamber in which the gas inlet element 4, which is attached to the underside of the cover 2, rests.
  • An outer edge section 26 of the gas inlet element 4, which is preferably formed as one material from the gas outlet plate 21, has a radially outwardly facing wall which rests against the radially inwardly facing wall of the annular web 25.
  • the height of the annular web 25 preferably corresponds to the height of the gas inlet element 4, so that the surface of the gas inlet element 4 facing the process chamber 23 runs flush with the surface of the annular web 25 pointing in the axial direction.
  • FIG. 1 a shows that the surface of the cover plate 6 facing the gas inlet element 4 runs obliquely in the edge region, so that the material thickness of the cover plate 6 is reduced in a wedge shape at the edge.
  • the circular bead 14 rests on the outer edge portion 26. The bead 14 prevents process gas which enters the gap 15 through the gas outlet openings 17 from exiting the gap 15 laterally.
  • a CVD reactor which is characterized in that the lifting element 11 is formed by one or more bodies surrounding the susceptor 5 or supporting it at its edge.
  • a CVD reactor or a method which is characterized in that the lifting element 11 is a support element carrying the susceptor 5 or a gas outlet element 3 surrounding the susceptor 5.
  • a CVD reactor or a method which is characterized in that the lifting element 11 has an annular plan and / or that the lifting element 11 has the shape of a tube.
  • a CVD reactor or a method which is characterized in that the fastening portion 21 is formed by a cover 2 closing an upper opening 24 of the housing 1 and the lifting element 11 can be raised into a position in which at least one upper portion of the Hubelemen tes 11 over the edge 24 'of the opening 24 protrudes to the outside.
  • a CVD reactor or a method which is characterized in that the cover plate 6 with temporary and / or permanent fastening means 19, 20 can be fastened to the fastening section 21 or is fastened and / or that the cover plate 6 is a gas inlet member 4th or has circumferential annular bead 14 facing the gas outlet plate 21, which rests in sealing contact with the gas inlet element 4 or the gas outlet plate 21 and / or that the cover 2 has an annular web 25 which protrudes into the opening 24 and surrounds the gas inlet element 4.
  • a CVD reactor or a method which is characterized in that the fastening section 21 is a gas inlet element 4 or surrounds a gas inlet element 4, the gas inlet element 4 having a plurality of gas outlet openings 17 which extend into a gap 15 between the Ceiling plate 6 and a gas outlet surface of the gas inlet element 4 open, with the ceiling plate 6 having gas passage openings 16.
  • a CVD reactor or a method which is characterized in that the gas outlet element 3 can be displaced from a process position lying in the movement path of the susceptor 5 or the cover plate 6 into a lowered position.
  • a CVD reactor or a method which is characterized in that the fastening portion 21 is assigned to an opening 24 of the housing 1 ver closing cover 2, and for mounting the cover plate 6 of the cover 2 before or when lifting the cover plate 6 is brought into a first open position, and after lifting the ceiling plate 6 supported by the lifting element 11 is fastened to the cover 2 with first fastening means 19, and then after lifting the cover 2 in a second position, during which the ceiling plate 6 separates from the lifting element 11, is attached to the cover 2 with second fastening means 20 and / or that, to remove the cover plate 6, the cover 2 is first brought into a first open position, in which the first fastening means 19 are attached to the cover 2, and after lifting of the cover 2 in a second open position second fastening means 20 are released and then the cover 2 is brought back to the first open position in which the cover plate 6 rests on the lifting element 11, in which position the first fastening means tel 19 are removed.

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

The invention relates to a CVD reactor comprising a housing (1), comprising a susceptor (5) bordering a process chamber (23) from below, and comprising a cover plate (6) bordering the process chamber (23) from above, wherein the cover plate (6) can be raised into a contact position on a securing section (21) of the housing (1) by means of a lifting element (11) that can be raised from a lowered position into a mounting position, wherein the cover plate (6) can be secured to the housing (1) at said securing section (21). In order to be able to automatically or semi-automatically secure the cover plate (6) to the housing (1), a lifting element (11) is provided, which either surrounds the susceptor (5) or supports same on its edge. The lifting element (11) can also be formed by a protective tube. Using the lifting element (11), the cover plate (6) can be brought into a position in which it can be removed via a loading opening (18).

Description

Beschreibung description
CVD-Reaktor und Verfahren zum Handhaben einer Prozesskammer-Deckenplate CVD reactor and method for handling a process chamber ceiling plate
Gebiet der Technik Field of technology
[0001] Die Erfindung betrifft ein Verfahren zum Handhaben einer eine Pro zesskammer eines CVD-Reaktors nach obenhin begrenzenden Deckenplatte, insbesondere zum voll-oder halb-automatischen Austausch der Deckenplatte.The invention relates to a method for handling a process chamber of a CVD reactor upwardly limiting ceiling plate, in particular for fully or semi-automatic replacement of the ceiling plate.
Die Erfindung betrifft darüber hinaus eine Weiterbildung eines CVD-Reaktors, bei dem die Deckenplatte mittels eines Hubelementes von einer abgesenkten Stellung in eine Montageposition angehoben werden kann. The invention also relates to a further development of a CVD reactor in which the cover plate can be raised from a lowered position into an assembly position by means of a lifting element.
Stand der Technik State of the art
[0002] Aus der DE 102012110125 Al ist ein CVD-Reaktor vorbekannt. Die De- ckenplatte ist dort eine unterhalb einer Gasaustrittsplatte eines Showerheads an geordnete Schirmplatte mit Gasdurchtrittsöffnungen, die durch eine gleichzeitige Vertikalverlagerung von Suszeptor und Deckenplatte in die Montagestellung gebracht wird, wobei der Suszeptor von einer Hubeinrichtung in Vertikalrich tung verlagert wird und auf seiner Oberfläche die Schirmplatte trägt. Es sind Be- festigungsmittel vorgesehen, die eine automatisierte Befestigung der Deckenplat te ermöglichen. Eine ähnliche Vorrichtung wird in der DE 102019117479 Al beschrieben. Eine mit Halteelementen unterhalb einer Gasaustrittsplatte befestig te Deckenplatte offenbart auch die WO 2007/060143 Al. Zum Stand der Technik gehört ferner JP 5721132 B2. A CVD reactor is previously known from DE 102012110125 A1. The ceiling plate there is a screen plate with gas passage openings arranged below a gas outlet plate of a showerhead, which is brought into the assembly position by a simultaneous vertical displacement of the susceptor and ceiling plate, the susceptor being displaced in the vertical direction by a lifting device and the screen plate on its surface wearing. Fastening means are provided which enable the ceiling plate to be fastened automatically. A similar device is described in DE 102019117479 A1. WO 2007/060143 A1 also discloses a ceiling plate fastened with retaining elements below a gas outlet plate. JP 5721132 B2 also belongs to the prior art.
Zusammenfassung der Erfindung [0003] Der Erfindung liegt die Aufgabe zugrunde, die gattungsgemäße Vor richtung und das gattungsgemäße Verfahren gebrauchsvorteilhaft weiterzubil den. [0004] Gelöst wird die Aufgabe durch die in den Ansprüchen angegebene Er findung, wobei die Unteransprüche nicht nur vorteilhafte Weiterbildungen der in den nebengeordneten Ansprüchen der Erfindung, sondern auch eigenstän dige Lösungen der Aufgabe darstellen. SUMMARY OF THE INVENTION [0003] The invention is based on the object of further developing the generic device and the generic method in an advantageous manner. The object is achieved by the invention specified in the claims, the subclaims not only representing advantageous developments of the independent claims of the invention, but also independent solutions to the problem.
[0005] Zunächst und im Wesentlichen wird vorgeschlagen, dass als Hubele ment ein den Suszeptor umgebender Körper verwendet wird oder dass als Hub element ein den Suszeptor an seinem Rand stützender Körper verwendet wird. Der Körper kann einteilig oder mehrteilig sein. Bei dem den Suszeptor umge benden Körper kann es sich um einen geschlossenen oder um einen in Umfangs richtung unterbrochenen Körper handeln. Das Hubelement kann beispielsweise ein Rohr sein. Der Körper kann aus mehreren in Umfangsrichtung nebeneinan derliegenden Teilkörpern ausgebildet sein, so kann der Körper beispielsweise einen einem Kreisring entsprechenden Grundriss aufweisen. So kann der Körper beispielsweise einen kreisringförmigen Grundriss aufweisen. Der Körper kann aber auch von mehreren sich in vertikaler Richtung erstreckenden Stäben, Säulen oder dergleichen ausgebildet sein, die an verschiedenen azimutalen Positionen um den Suszeptor oder eine Heizeinrichtung herum angeordnet sind. In einer bevorzugten Ausgestaltung der Erfindung kann das Hubelement von einem den Suszeptor tragenden Tragelement ausgebildet sein, wie es beispielsweise aus der DE 102007027704 Al vorbekannt ist. Das Tragelement kann einen oberen Rand und die Form eines Rohres besitzen. Auf dem oberen Rand stützt sich in einer Prozessstellung ein Suszeptor ab. Der Rand des Suszeptors liegt dabei auf dem oberen Rand auf. Um dieses Tragelement zum Anheben der Deckenplatte zu verwenden, wird der Suszeptor zuvor durch eine Beladeöffnung aus dem Ge häuse des CVD-Reaktors herausgebracht. Hierzu wird ein die Beladeöffnung verschließendes Tor geöffnet. Es kann vorgesehen sein, dass hierzu auch ein den Suszeptor umgebendes, ringförmiges Gasauslassorgan abgesenkt werden muss, sodass es nicht in der Bewegungsbahn des Suszeptors liegt, der in seiner Flä chenerstreckungsebene bewegt wird. Das Hubelement kann an einer vertikal verlagerbaren Trägereinrichtung befestigt sein. Die Trägereinrichtung kann in Vertikalrichtung verlagerbar sein. Die Trägereinrichtung kann darüber hinaus auch die Heizeinrichtung tragen, mit der in der Prozessstellung der Suszeptor von unten beheizt wird. In einer Variante der Erfindung kann das Gasauslass organ die Funktion des Hubelementes ausüben. In einer bevorzugten Variante erfolgt die Montage der Deckenplatte automatisch und insbesondere vollautoma tisch. Es ist insbesondere vorgesehen, dass ein Austausch der Deckenplatte halb automatisch oder vollautomatisch erfolgt. Die Deckenplatte kann in einer Varian te der Erfindung an einem Deckel des Gehäuses befestigt sein, der eine nach oben weisende Gehäuseöffnung verschließt. An diesem Deckel kann ein die Form eines Showerheads aufweisendes Gaseinlassorgan befestigt sein. Die De ckenplatte kann eine Schutzplatte sein, die sich parallel zu einer Gasaustrittsflä che des Gaseinlassorgans erstreckt. Die Gasauslassfläche kann eine Vielzahl von in Richtung auf die Deckenplatte mündenden Gasaustrittsöffnungen aufweisen. Zwischen der Gasaustrittsfläche und einer Oberseite der Gasdurchtrittsöffnun gen aufweisenden Deckenplatte kann sich ein Spalt befinden, in dem sich das aus der Gasaustrittsfläche austretende Gas verteilen kann. Der Rand der Deckenplat te kann einen Dichtwulst ausbilden, der in der montierten Stellung der Decken platte dichtend am Befestigungsabschnitt, beispielsweise an einem Befestigungs ring oder dergleichen anliegt. Die Deckenplatte kann mittels Befestigungsmit teln, beispielsweise Schrauben, Bajonette oder dergleichen, am Befestigungsab schnitt befestigt sein. Das Befestigungsmittel oder mehrere Befestigungsmittel können auch außerhalb einer äußeren Ringzone der Deckenplatte angeordnet sein. Befestigungsmittel können auf der gesamten Fläche der Deckenplatte vor gesehen sein, um diese mit dem Deckel bzw. dem Gaseinlassorgan zu verbinden. Sie können auch in der Nähe der Mitte der Deckenplatte angeordnet sein. Diese Befestigungsmittel sind bevorzugt so ausgelegt, dass sie eine geringe laterale Verschiebung der Platte gegenüber dem Gaseinlassorgan erlauben, ohne zu blo ckieren. Dadurch können unterschiedliche thermische Ausdehnungen kompen siert werden. In einer ersten Variante der Erfindung wird beim Austausch der Deckenplatte eine bei vorangehenden Abscheideprozessen benutzte Deckenplat te, an der sich Belegungen gebildet haben, gegen eine gereinigte Deckenplatte ausgetauscht. Hierzu kann das Hubelement in eine angehobene Stellung ge bracht werden, in der es die am Befestigungsabschnitt befestigte Deckenplatte unterstützt. Befestigungsmittel, mit denen die Deckenplatte am Befestigungsab schnitt befestigt ist, werden in dieser Stellung, in der das Hubelement an der De ckenplatte anliegt, gelöst. Durch Absenken des Hubelementes wird die Decken platte in eine Position gebracht, in der sie mittels eines durch die Beladeöffnung in den Innenraum des Gehäuses greifenden Greifer gegriffen werden kann, um aus der Beladeöffnung aus dem Innenraum entfernt werden zu können. Die ge reinigte Deckenplatte wird in umgekehrter Reihenfolge am Befestigungsab schnitt befestigt. In einer zweiten Variante der Erfindung wird ein eine Öffnung eines Gehäuses verschließender Deckel, der die Deckenplatte trägt, angehoben.First and foremost, it is proposed that a body surrounding the susceptor is used as the hub element or that a body supporting the susceptor at its edge is used as the hub element. The body can be in one piece or in several pieces. The body surrounding the susceptor can be a closed body or a body interrupted in the circumferential direction. The lifting element can be a pipe, for example. The body can be formed from a plurality of partial bodies lying next to one another in the circumferential direction, so the body can, for example, have a plan corresponding to a circular ring. For example, the body can have an annular outline. The body can, however, also be formed by a plurality of rods, columns or the like which extend in the vertical direction and which are arranged at different azimuthal positions around the susceptor or a heating device. In a preferred embodiment of the invention, the lifting element can be formed by a support element carrying the susceptor, as is previously known, for example, from DE 102007027704 A1. The support element can have an upper edge and the shape of a tube. A susceptor is supported on the upper edge in a process position. The edge of the susceptor rests on the upper edge. In order to use this support element for lifting the ceiling plate, the susceptor is first brought out of the housing of the CVD reactor through a loading opening. For this purpose, a gate that closes the loading opening is opened. It can be provided that for this purpose an annular gas outlet member surrounding the susceptor must also be lowered so that it does not lie in the movement path of the susceptor which is moved in its plane of extension. The lifting element can be on a vertical be attached displaceable carrier device. The carrier device can be displaceable in the vertical direction. The carrier device can also carry the heating device with which the susceptor is heated from below in the process position. In a variant of the invention, the gas outlet organ can perform the function of the lifting element. In a preferred variant, the mounting of the ceiling plate takes place automatically and, in particular, fully automatically. In particular, provision is made for the ceiling panel to be exchanged semi-automatically or fully automatically. In a variant of the invention, the cover plate can be attached to a cover of the housing which closes an upwardly facing housing opening. A gas inlet member in the form of a showerhead can be attached to this cover. The cover plate can be a protective plate which extends parallel to a gas outlet surface of the gas inlet element. The gas outlet surface can have a multiplicity of gas outlet openings opening in the direction of the cover plate. A gap can be located between the gas outlet surface and an upper side of the cover plate having gas passage openings, in which the gas emerging from the gas outlet surface can be distributed. The edge of the ceiling plate te can form a sealing bead that rests in the assembled position of the ceiling plate sealingly on the fastening portion, for example on a fastening ring or the like. The ceiling plate can be fastened by means of fasteners, for example screws, bayonets or the like, on the section. The fastening means or a plurality of fastening means can also be arranged outside an outer ring zone of the ceiling plate. Fastening means can be seen on the entire surface of the cover plate in order to connect it to the cover or the gas inlet element. They can also be arranged near the center of the ceiling tile. These fastening means are preferably designed in such a way that they allow a slight lateral displacement of the plate relative to the gas inlet element without blocking. This means that different thermal expansions can be compensated for. In a first variant of the invention, when exchanging the Ceiling plate a ceiling plate used in previous separation processes, on which deposits have formed, exchanged for a cleaned ceiling plate. For this purpose, the lifting element can be brought into a raised position in which it supports the ceiling plate attached to the fastening section. Fastening means, with which the ceiling plate is attached to the fastening section, are solved in this position in which the lifting element rests against the ceiling plate. By lowering the lifting element, the ceiling plate is brought into a position in which it can be gripped by means of a gripper reaching through the loading opening into the interior of the housing in order to be able to be removed from the loading opening from the interior. The cleaned ceiling panel is attached to the section in the reverse order. In a second variant of the invention, a cover which closes an opening in a housing and carries the cover plate is raised.
In der angehobenen Stellung werden temporäre Befestigungsmittel verwendet, um die Deckenplatte am Befestigungsabschnitt zu halten. Schrauben oder an derweitige Befestigungsmittel, mit denen die Deckenplatte am Befestigungsab schnitt befestigt ist, können manuell oder automatisch gelöst werden. Anschlie ßend wird der Deckel abgesenkt bis in eine Stellung, in der die Deckenplatte vom Hubelement getragen wird. In dieser Stellung werden die temporären Befesti gungsmitteln gelöst. Durch Absenken des Hubelementes wird die Deckenplatte vom Befestigungsabschnitt gelöst und in eine Position gebracht, in der sie vom Greifer gegriffen werden kann. Die gereinigte Deckenplatte wird auf dem Hub element abgelegt. Letzteres wird in eine angehobene Stellung gebracht, in der die Deckenplatte am Befestigungsabschnitt anliegt, wo sie mit den temporären Befes tigungsmitteln befestigt wird. Der Deckel kann weiter angehoben werden bis in eine Stellung, in der die Schrauben oder anderweitige Befestigungsmittel mon tiert werden können. Die temporären Befestigungsmittel werden entfernt. Der Deckel kann in seine Geschlossen-Stellung gebracht werden. Als temporäre Be festigungsmittel können C-förmige Klammern verwendet werden, mit denen die Deckenplatte temporär am Befestigungsabschnitt, insbesondere am Deckel, ge- halten wird. Der Transport der Deckenplatte aus dem Innenraum oder in den Innenraum kann mit einem Roboterarm erfolgen, der durch die Beladeöffnung hindurchgreifen kann. Bei einer vollautomatischen Montage wird die Decken platte mit automatisch betätigbaren Befestigungsmitteln mit dem Befestigungs abschnitt verbunden. Bei einer halbautomatischen Montage werden temporäre Befestigungsmittel, beispielsweise C-förmige Klammern, verwendet, mit denen die Deckenplatte temporär am Befestigungsabschnitt befestigt wird. Dies erfolgt bevorzugt bei einem in die erste Öffnungsstellung gebrachten Deckel, wobei die Deckenplatte vom Hubelement über den oberen Rand der Gehäuseöffnung ge bracht wird, sodass der Rand der Deckenplatte zugänglich ist, an dem die tem porären Befestigungsmittel befestigt werden können. Im Anschluss daran wird bei der halbautomatischen Montage der Deckel weiter angehoben, bis die nach unten weisende Breitseitenfläche der Deckenplatte zugänglich ist, um dort die Befestigungsmittel anzubringen, die beispielsweise Gewindeelemente sein kön nen. Bei der vollautomatischen Montage sind diese Zwischenschritte nicht erfor derlich. Die Montage der Deckenplatte kann bei geschlossenem Deckel erfolgen. Nach Befestigen der Befestigungsmittel kann das Hubelement abgesenkt werden. Wird als Hubelement ein in der Prozessstellung den Suszeptor tragendes Trag element verwendet, so muss der Suszeptor vor dem Austausch der Deckenplatte aus der Prozesskammer entfernt werden. Dies erfolgt nach einem Absenken des in der Prozessstellung in der Bewegungsbahn des zu entnehmenden Suszeptors liegenden Gasauslassorgans. Nach dem Auswechseln der Deckenplatte kann ein mit zu beschichtenden Substraten bestückter Suszeptor durch die Beladeöffnung über das abgesenkte Gasauslassorgan in die Prozesskammer gebracht werden. Dies erfolgt mit einem Roboterarm, der den Suszeptor auf dem Tragelement ab setzt. Anschließend wird das Gasauslassorgan angehoben, bis ein oberer Rand des Gasauslassorgans an den Rand der Deckenplatte beziehungsweise an einen die Deckenplatte umgebenden Abschnitt des Gehäuses anstößt. Die Deckenplat te, die aus Quarz, Stahl, insbesondere Edelstahl, oder einem keramischen Werk stoff bestehen kann, besitzt Durchtrittsöffnungen zum Hindurchtreten eines Pro- zessgases, das in den Spalt zwischen Deckenplatte und Gaseinlassorgan einge speist wird. Das den Suszeptor umgebende Hubelement kann aus Stahl insbe sondere Edelstahl, Quarz oder einem keramischen Werkstoff bestehen. Es kann von einem rohrförmigen Körper ausgebildet sein, in dessen Höhlung eine Heiz einrichtung zum Beheizen des Suszeptors angeordnet ist. Die Heizeinrichtung kann zusammen mit dem Hubelement vertikal verlagert werden. Das Hubele ment kann in der Prozessstellung auch die Funktion eines Liners ausüben, mit dem ein unterhalb des Suszeptors angeordneter Raum gegenüber den Prozess gasen abgeschirmt wird. Das Hubelement kann somit die Funktion eines Schirm rohres ausbilden. In the raised position, temporary fasteners are used to hold the ceiling panel to the fastening section. Screws or other fasteners with which the ceiling plate is fastened to the section fixing, can be solved manually or automatically. The cover is then lowered to a position in which the cover plate is supported by the lifting element. In this position, the temporary fastening means are released. By lowering the lifting element, the cover plate is released from the fastening section and brought into a position in which it can be gripped by the gripper. The cleaned ceiling panel is placed on the lifting element. The latter is brought into a raised position in which the ceiling plate rests on the fastening section, where it is fastened with the temporary fasteners. The lid can be raised further to a position in which the screws or other fasteners can be installed on it. The temporary fasteners are removed. The lid can be brought into its closed position. C-shaped brackets can be used as temporary fastening means, with which the ceiling panel is temporarily attached to the fastening section, in particular to the cover. will hold. The transport of the ceiling plate from the interior or into the interior can be done with a robot arm that can reach through the loading opening. In the case of fully automatic assembly, the ceiling panel is connected to the fastening section with automatically actuated fasteners. In the case of semi-automatic assembly, temporary fastening means, for example C-shaped brackets, are used with which the ceiling panel is temporarily fastened to the fastening section. This is preferably done with a cover in the first open position, the cover plate being brought by the lifting element over the upper edge of the housing opening so that the edge of the cover plate is accessible to which the temporary fastening means can be attached. Subsequently, during the semi-automatic assembly, the cover is raised further until the downward-facing broad side surface of the cover plate is accessible in order to attach the fastening means there, which can be threaded elements, for example. These intermediate steps are not required with fully automated assembly. The ceiling plate can be installed with the cover closed. After the fastening means have been fastened, the lifting element can be lowered. If a support element carrying the susceptor in the process position is used as the lifting element, the susceptor must be removed from the process chamber before the cover plate is replaced. This takes place after a lowering of the gas outlet element located in the process position in the movement path of the susceptor to be removed. After the cover plate has been replaced, a susceptor equipped with substrates to be coated can be brought into the process chamber through the loading opening via the lowered gas outlet element. This is done with a robot arm that places the susceptor on the support element. The gas outlet element is then raised until an upper edge of the gas outlet element abuts the edge of the cover plate or a section of the housing surrounding the cover plate. The ceiling plate, which can consist of quartz, steel, in particular stainless steel, or a ceramic material, has passage openings for a product to pass through. process gas that is fed into the gap between the ceiling plate and the gas inlet element. The lifting element surrounding the susceptor can be made of steel, in particular special stainless steel, quartz or a ceramic material. It can be formed by a tubular body, in the cavity of which a heating device for heating the susceptor is arranged. The heating device can be moved vertically together with the lifting element. In the process position, the lifting element can also perform the function of a liner, with which a space arranged below the susceptor is shielded from the process gases. The lifting element can thus form the function of an umbrella tube.
[0006] Die Erfindung betrifft ferner eine Weiterbildung der Deckenplatte. Die Deckenplatte besitzt nahe ihres Randes einen auf das Gaseinlassorgan bezie hungsweise die Gasaustrittsplatte gerichteten Ringwulst. Dieser Ringwulst de finiert einen Spalt zwischen der Gasaustrittsplatte und der Deckenplatte. Der Ringwulst liegt bevorzugt in dichtender Anlage an einer ebenen Unterseite des Gaseinlassorganes oder der vom Gaseinlassorgan ausgebildeten Gasaustritts platte. Die Gasaustrittsplatte kann im Bereich des Wulstes eine abgeschrägte Randfläche besitzen. Im Bereich dieser abgeschrägten Randfläche erstreckt sich der Wulst. Der Wulst verhindert das seitliche Austreten des in den Spalt einge speisten Prozessgases. The invention also relates to a further development of the ceiling plate. The cover plate has near its edge an annular bead directed towards the gas inlet element or the gas outlet plate. This annular bead defines a gap between the gas outlet plate and the ceiling plate. The annular bead is preferably in sealing contact with a flat underside of the gas inlet element or the gas outlet plate formed by the gas inlet element. The gas outlet plate can have a beveled edge surface in the area of the bead. The bead extends in the area of this beveled edge surface. The bead prevents the process gas fed into the gap from escaping to the side.
[0007] Ein weiterer Aspekt der Erfindung betrifft eine Weiterbildung des De ckels des Gehäuses. Das Gaseinlassorgan ist integraler Bestandteil des Gehäu sedeckels. Hierzu bildet der Gehäusedeckel einen Ringsteg aus, der material einheitlich der Deckelplatte des Deckels angeformt ist. Der Ringsteg besitzt eine radial nach außen weisende Wandung, die im eingebauten Zustand des De ckels an einer Innenfläche einer Wand des Gehäuses anliegt. Der Ringsteg be sitzt ferner eine radial einwärts gerichtete Fläche, an der ein Außenrandab- schnitt des Gaseinlassorganes anliegt. Das Gaseinlassorgan wird bevorzugt von dem Ringsteg umgeben und ist vom Ringsteg eingefasst. Another aspect of the invention relates to a development of the cover of the housing. The gas inlet element is an integral part of the housing cover. For this purpose, the housing cover forms an annular web which is integrally molded onto the cover plate of the cover as a single material. The ring web has a radially outwardly facing wall which, when the cover is installed, rests against an inner surface of a wall of the housing. The ring web also has a radially inwardly directed surface on which an outer edge cut of the gas inlet element. The gas inlet element is preferably surrounded by the annular web and is enclosed by the annular web.
Kurze Beschreibung der Zeichnungen Brief description of the drawings
[0008] Ausführungsbeispiele der Erfindung werden nachfolgend anhand bei gefügter Zeichnungen erläutert. Es zeigen: Embodiments of the invention are explained below with reference to attached drawings. Show it:
Fig. 1 in der Art eines Querschnitts einen CVD-Reaktor in einer Pro zessstellung, in der eine Prozesskammer 23 nach untenhin durch einen Suszeptor 5 und nach oben hin durch eine Decken platte 6 begrenzt wird, wobei die Prozesskammer 23 von einem Gasauslassorgan 3 umgeben ist, Fig. la vergrößert den Ausschnitt Ia, Fig. 1 in the manner of a cross-section a CVD reactor in a process position in which a process chamber 23 is delimited at the bottom by a susceptor 5 and at the top by a cover plate 6, the process chamber 23 being surrounded by a gas outlet element 3 , Fig. La enlarges the section Ia,
Fig. 2 eine Darstellung gemäß Figur 1, jedoch mit abgesenktem Gas auslassorgan 3, Fig. 2 shows a representation according to Figure 1, but with lowered gas outlet member 3,
Fig. 3 eine Darstellung gemäß Figur 2, bei der der Suszeptor 5 durch eine Beladeöffnung 18 entnommen wird, 3 shows an illustration according to FIG. 2, in which the susceptor 5 is removed through a loading opening 18,
Fig. 4 eine Darstellung gemäß Figur 3, bei der der Deckel 2 in eine ers te Offenstellung gebracht ist, in der er sich etwa 20 bis 30 mm oberhalb eines Randes 24' der Öffnung 24 des Gehäuses 1 be findet, wobei temporäre Befestigungsmittel 19 angesetzt wer den, zur temporären Fixierung der Deckenplatte 6 am Deckel 2, 4 shows a representation according to FIG. 3, in which the cover 2 is brought into a first open position, in which it is located approximately 20 to 30 mm above an edge 24 'of the opening 24 of the housing 1, with temporary fastening means 19 being attached who, for the temporary fixation of the ceiling plate 6 on the cover 2,
Fig. 5 eine Darstellung gemäß Figur 4, wobei der Deckel 2 in eine zweite Offenstellung gebracht ist, Fig. 6 eine Darstellung gemäß Figur 5, wobei Gewindeelemente 20, mit denen die Deckenplatte 6 am Deckel 2 befestigt sind, gelöst sind und die Deckenplatte 6 nur noch mittels der temporären Befestigungsmittel 19 am Deckel 2 gehalten wird, Fig. 7 eine Darstellung gemäß Figur 6, wobei die Deckenplatte 6, die nur mittels der temporären Befestigungsmittel 19 am Deckel 2 gehalten ist, in die erste Offenstellung gebracht ist, wobei ein oberer Rand eines Hubelementes 11 die Deckenplatte 6 unter stützt, FIG. 5 shows an illustration according to FIG. 4, the cover 2 being brought into a second open position, 6 shows an illustration according to FIG. 5, with threaded elements 20, with which the cover plate 6 are fastened to the cover 2, being loosened and the cover plate 6 is only held on the cover 2 by means of the temporary fastening means 19, FIG. 7 shows an illustration according to FIG 6, the top plate 6, which is only held on the cover 2 by means of the temporary fastening means 19, is brought into the first open position, with an upper edge of a lifting element 11 supporting the top plate 6,
Fig. 8 eine Darstellung gemäß Figur 7, wobei die temporären Befesti gungsmittel 19 entfernt worden sind, sodass die Deckenplatte 6 nur noch vom Hubelement 11 getragen wird, 8 shows an illustration according to FIG. 7, the temporary fastening means 19 having been removed so that the ceiling plate 6 is only supported by the lifting element 11,
Fig. 9 eine Darstellung gemäß Figur 8, nachdem das Hubelement 11 in eine Position abgesenkt worden ist, in der sich die Decken- platte 6 vom Deckel 2 gelöst hat und mittels eines Greifarms durch die Beladeöffnung 18 entnommen werden kann, 9 shows an illustration according to FIG. 8 after the lifting element 11 has been lowered into a position in which the cover plate 6 has detached itself from the cover 2 and can be removed through the loading opening 18 by means of a gripping arm,
Fig. 10 eine Darstellung gemäß Figur 9, in der der Innenraum 22 weder einen Suszeptor noch eine Deckenplatte 6 enthält, bevor eine gereinigte Deckenplatte in den Innenraum 22 gebracht wird, die in im Wesentlichen umgekehrter Reihenfolge am Deckel 2 befestigt wird, 10 shows a representation according to FIG. 9, in which the interior 22 contains neither a susceptor nor a cover plate 6 before a cleaned cover plate is brought into the interior 22, which is attached to the cover 2 in essentially the reverse order,
Fig. 11 eine Darstellung gemäß Figur la eines zweiten Ausführungs beispiels, bei dem das Gasauslassorgan 3 die Funktion eines Hubelementes ausübt. Beschreibung der Ausführungsformen Fig. 11 shows a representation according to Figure la of a second embodiment, for example, in which the gas outlet member 3 performs the function of a lifting element. Description of the embodiments
[0009] Die Figur 1 zeigt schematisch in der Art eines Querschnittes durch ei nen CVD-Reaktor dessen wesentliche Bestandteile. Der CVD-Reaktor besitzt ein gasdichtes Gehäuse 1, welches eine nach oben weisende Öffnung 24 aufweist.FIG. 1 shows schematically in the form of a cross section through a CVD reactor its essential components. The CVD reactor has a gas-tight housing 1 which has an opening 24 pointing upwards.
In der in der Figur 1 dargestellten Prozessstellung ist die Öffnung 24 von einem Deckel 2 verschlossen. Der Deckel 2 trägt ein Gaseinlassorgan 4 in Form eines Showerheads. Das Gaseinlassorgan 4 besitzt ein Gasverteilvolumen, das nach untenhin durch eine Gasaustrittsplatte 21 begrenzt ist, die mit ihrer Unterseite eine Gasaustrittsfläche ausbildet. Die Gasaustrittsplatte 21 besitzt eine Vielzahl von Gasaustrittsöffnungen 17, mit denen Gas aus der Gasverteilkammer 17 in einen Spalt 15 austreten kann. Der Spalt 15 erstreckt sich zwischen der Gasaus trittsplatte 21 und einer Deckenplatte 6, die unterhalb des Gaseinlassorgans 4 angeordnet ist. Ein Rand der im Wesentlichen kreisscheibenförmigen Decken platte 6 besitzt einen Wulst 14, der sich an einem Randabschnitt der Gasaus trittsplatte 21 abstützt, wobei die Höhe des Wulstes 14 die Höhe des Spaltes 15 definiert. Zur DefiniÜon des Spaltes können aber auch weitere Distanzelemente vorgesehen sein, die in den Zeichnungen nicht dargestellt sind und innerhalb der vom Wulst 14 umgebenden Fläche angeordnet sind. Mit derartigen Distan zelementen können thermische Verformungen kompensiert werden. Die Höhe des Spaltes 15 kann auch durch andere Distanzelemente zusätzlich begrenzt werden. Die Deckenplatte 6 besitzt eine Vielzahl von Gasdurchtrittsöffnun gen 16, durch die das in den Spalt 15 eingetretene Gas in eine unterhalb der De ckenplatte 6 angeordnete Prozesskammer 23 ein strömen kann. Während die Deckenplatte 6 die Prozesskammer 23 nach oben hin begrenzt, begrenzt ein Suszeptor 5 die Prozesskammer 23 nach unten hin. In the process position shown in FIG. 1, the opening 24 is closed by a cover 2. The cover 2 carries a gas inlet element 4 in the form of a showerhead. The gas inlet element 4 has a gas distribution volume which is delimited at the bottom by a gas outlet plate 21 which, with its underside, forms a gas outlet surface. The gas outlet plate 21 has a multiplicity of gas outlet openings 17 with which gas can exit from the gas distribution chamber 17 into a gap 15. The gap 15 extends between the gas outlet plate 21 and a cover plate 6 which is arranged below the gas inlet element 4. One edge of the essentially circular disk-shaped cover plate 6 has a bead 14 which is supported on an edge section of the gas outlet plate 21, the height of the bead 14 defining the height of the gap 15. To define the gap, however, further spacer elements can also be provided, which are not shown in the drawings and are arranged within the area surrounding the bead 14. With such distance elements, thermal deformations can be compensated. The height of the gap 15 can also be limited by other spacer elements. The cover plate 6 has a plurality of gas passage openings 16 through which the gas that has entered the gap 15 can flow into a process chamber 23 arranged below the cover plate 6. While the cover plate 6 delimits the process chamber 23 towards the top, a susceptor 5 delimits the process chamber 23 towards the bottom.
[0010] Der Rand der Deckenplatte 6 kann in dem Bereich, in dem der umlau fende Wulst 14 angeordnet ist, eine geringere Materialstärke als im Zentralbe reich aufweisen, wobei die Materialstärke bevorzugt an der oberen Seite ver- ringert wird, so dass sich ein nach außen steigender Spalt zum Gaseinlassorgan ergeben kann. Die Materialstärke kann auch an der oberen Seite verringert werden, so dass sich ein nach außen steigender Spalt zum Gaseinlassorgan ergibt. The edge of the cover plate 6 can in the area in which the circumferential bead 14 is arranged, have a smaller material thickness than in the central area, the material thickness preferably being on the upper side. is reduced, so that an outwardly rising gap to the gas inlet member can result. The material thickness can also be reduced on the upper side, so that there is an outwardly rising gap to the gas inlet element.
[0011] Der Rand des Suszeptors 5 ruht auf einem Tragelement, welches im Ausführungsbeispiel die Form eines Rohres aufweisen kann. Es kann insbeson dere von einem Schutzrohr 11 ausgebildet sein. Das Schutzrohr 11 umgibt eine Anordnung mit einer Heizeinrichtung 7, die sich unterhalb des Suszeptors 5 befindet und die eine Trägerplatte 12 aufweist zur Stromzufuhr der Heizein richtung 7. Mittels einer Hubeinrichtung 10 kann das Tragelement, also insbe sondere das Schutzrohr 11 und die Heizeinrichtung 7 angehoben werden. Das Rohr 11, auf dem sich der Rand des Suszeptors abstützt, hat in einer Variante der Erfindung die Funktion eines Tragrohres. Das Rohr 11 bildet den Träger des Suszeptors 5. The edge of the susceptor 5 rests on a support element which, in the exemplary embodiment, can have the shape of a tube. It can in particular be formed by a protective tube 11. The protective tube 11 surrounds an arrangement with a heating device 7, which is located below the susceptor 5 and which has a carrier plate 12 for supplying power to the Heizein direction 7 will. The tube 11, on which the edge of the susceptor is supported, has the function of a support tube in a variant of the invention. The tube 11 forms the carrier of the susceptor 5.
[0012] Die Prozesskammer wird von einem ringförmigen Gasauslassorgan 3 umgeben. Mit einer weiteren Hubeinrichtung lässt sich das Gasauslassorgan 3 von einer in der Figur 1 dargestellten Prozessstellung, in der es vor einer Bela deöffnung 18 angeordnet ist, absenken, in eine Stellung, in der die Beladeöff nung 18 frei ist. In dieser, in der Figur 2 dargestellten Stellung kann der Suszep- tor 5 von einem durch die Beladeöffnung 18 in den Innenraum 22 des Gehäuses hineingreifenden Greifer gegriffen werden, um, wie in der Figur 3 dargestellt, aus dem Gehäuse 1 durch die Beladeöffnung 18 hindurch entnommen werden zu können, um gegen einen anderen Suszeptor 5 ausgetauscht zu werden. Ein mit der Bezugsziffer 9 bezeichnetes Element bildet ein Gasauslassrohr, mit dem Gas, welches im Gasauslassorgan 3 gesammelt wird, nach außen transportiert werden kann. Das in den Zeichnungen mit der Bezugsziffer 9 bezeichnete Eie- ment kann aber auch die weitere Hubeinrichtung verdeutlichen, mit der sich das Gasauslassorgan 3 absenken und anheben lässt. The process chamber is surrounded by an annular gas outlet element 3. With a further lifting device, the gas outlet element 3 can be lowered from a process position shown in FIG. 1, in which it is arranged in front of a loading opening 18, into a position in which the loading opening 18 is free. In this position shown in FIG can be removed in order to be exchanged for another susceptor 5. An element denoted by the reference number 9 forms a gas outlet pipe with which the gas which is collected in the gas outlet element 3 can be transported to the outside. The egg designated in the drawings with the reference number 9 However, ment can also clarify the further lifting device with which the gas outlet element 3 can be lowered and raised.
[0013] Bei einem vollautomatisierten Austausch der Deckenplatte 6 fährt ein den Randbereich der Deckenplatte 6 untergreifendes Hubelement 11, das beim Ausführungsbeispiel vom Schutzrohr gebildet wird, nach oben, um die Decken platte 6 derart abzustützen, dass die sie am Deckel 2 beziehungsweise am Gas einlassorgan 4 haltenden Befestigungsmittel automatisiert gelöst werden können, wie es beispielsweise im eingangs genannten Stand der Technik vorgeschlagen wird. Anschließend wird die Deckenplatte 6 durch Absenken des Hubelemen tes 11 in eine Entnahmestellung gebracht, in der sie mittels eines durch die Bela deöffnung 18 in den Innenraum 22 eingreifenden Greifarm aus dem Innen raum 22 herausgenommen werden kann. Die Befestigung einer ausgetauschten Deckenplatte 6 am Deckel 2 beziehungsweise Gaseinlassorgan 4 erfolgt in umge kehrter Reihenfolge. Die Deckenplatte 6 wird auf dem Hubelement 11 abgelegt. Das Hubelement 11 wird angehoben bis die Deckenplatte 6 beziehungsweise der Wulst 14 am Gaseinlassorgan 4 beziehungsweise am Deckel 2 anliegt. Daran an schließend werden die Befestigungsmittel in eine Befestigungsstellung gebracht. Es können zusätzliche Zentriermittel vorgesehen sein, mit denen die Deckenplat te 6 in eine zentrierte Position gebracht werden kann. Die Zentriermittel können aber auch von den Befestigungsmitteln ausgebildet sein. In a fully automated replacement of the ceiling plate 6 moves a the edge region of the ceiling plate 6 reaching under lifting element 11, which is formed in the embodiment of the protective tube, up to support the ceiling plate 6 so that they on the cover 2 or the gas inlet organ 4 holding fasteners can be automatically released, as is proposed, for example, in the prior art mentioned at the beginning. Subsequently, the ceiling plate 6 is brought into a removal position by lowering the Hubelemen tes 11, in which it can be removed from the inner space 22 by means of a gripping arm engaging through the Bela deloch 18 in the interior 22. A replaced cover plate 6 is fastened to the cover 2 or to the gas inlet element 4 in the reverse order. The ceiling plate 6 is placed on the lifting element 11. The lifting element 11 is raised until the cover plate 6 or the bead 14 rests on the gas inlet element 4 or on the cover 2. Then the fastening means are brought into a fastening position. Additional centering means can be provided with which the ceiling plate 6 can be brought into a centered position. The centering means can, however, also be formed by the fastening means.
[0014] Um die Deckenplatte 6 halbautomatisch auszutauschen, wird der De ckel 2 in die in Figur 4 dargestellte erste Offenstellung angehoben, in welcher der Deckel insbesondere mit dem Hubelement 11 etwa 10 bis 30 mm oberhalb eines Öffnungsrandes 24' angeordnet ist. In dieser ersten Offenstellung werden C-förmige Klammern 19 an der mit Schrauben 20 (siehe Figur 6) an einem Be festigungsabschnitt 21 des Deckels 2 befestigten Deckenplatte 6 angebracht. Anschließend wird der Deckel 2 in die in Figur 5 dargestellte zweite Öffnungs- Stellung gebracht. Alternativ dazu kann der Deckel 2 aber auch direkt in die in der Figur 5 dargestellte Offenstellung gebracht werden, um dort die von den C- förmigen Klammern 19 gebildeten temporären Befestigungsmittel zu befesti gen. In order to replace the ceiling plate 6 semi-automatically, the cover 2 is raised into the first open position shown in Figure 4, in which the cover is arranged in particular with the lifting element 11 about 10 to 30 mm above an opening edge 24 '. In this first open position, C-shaped brackets 19 are attached to the cover plate 6 which is fastened to a fastening section 21 of the cover 2 with screws 20 (see FIG. 6). The cover 2 is then inserted into the second opening shown in FIG. Position brought. Alternatively, the cover 2 can also be brought directly into the open position shown in FIG. 5 in order to fasten the temporary fastening means formed by the C-shaped brackets 19 there.
[0015] Die Figur 6 zeigt, wie die oben genannten Schrauben 20, mit denen die Deckenplatte 6 permanent am Deckel 2 befestigt sind, in der zweiten Offenstel lung gelöst werden. Der Deckel 2 wird mit der nur noch mit den Klammern 19 gehaltenen Deckenplatte 6 in die erste Offenstellung abgesenkt. Zuvor wurde das Schutzrohr 11, welches bei diesem Ausführungsbeispiel die Funktion eines Hubelementes aufweist, in eine angehobene Montagestellung gebracht, in der der obere Rand des Hubelementes 11 die Deckenplatte 6 unterstützt. Die Klammern 19 werden entfernt, sodass die in der Figur 8 dargestellte Betriebs stellung erreicht ist, in der die Deckenplatte 6 nur vom Hubelement 11 getragen wird. Der Deckel 2 kann in dieser Position durch nicht dargestellte weitere Hal temittel gehalten werden. Figure 6 shows how the above screws 20, with which the cover plate 6 are permanently attached to the cover 2, are solved in the second open position. The cover 2 is lowered into the first open position with the cover plate 6, which is only held by the clamps 19. The protective tube 11, which in this exemplary embodiment has the function of a lifting element, was brought into a raised assembly position in which the upper edge of the lifting element 11 supports the cover plate 6. The clamps 19 are removed so that the operating position shown in FIG. 8 is reached, in which the cover plate 6 is only supported by the lifting element 11. The cover 2 can be held temittel in this position by not shown further Hal.
[0016] Durch Absenken des Hubelementes 11 wird die in der Figur 9 darge stellte Betriebsstellung erreicht, in der die Deckenplatte 6 in einer Ebene liegt, in der sich die Beladeöffnung 18 befindet, sodass die Deckenplatte 6 durch eine Verlagerung in ihrer Erstreckungsebene mittels eines nicht darges teilten Greif arms durch die Beladeöffnung 18 aus dem Innenraum 22 entnommen werden kann. By lowering the lifting element 11, the operating position shown in Figure 9 is reached, in which the ceiling plate 6 lies in a plane in which the loading opening 18 is, so that the ceiling plate 6 by a shift in its plane of extension by means of a not Darges split gripping arms can be removed through the loading opening 18 from the interior 22.
[0017] In im Wesentlichen umgekehrter Reihenfolge wird eine gereinigte De ckenplatte 6 am Deckel 2 befestigt. Hierzu wird eine Deckenplatte 6 in den In nenraum 22 des Gehäuses 1 gebracht, das eine Betriebsstellung etwa gemäß Figur 10 aufweist. Die Deckenplatte 6 wird gemäß Figur 9 auf das Hubele ment 11 aufgelegt. Das Hubelement 11 wird in die Figur 8 dargestellte erste Of- fenstellung angehoben, in der die Deckenplatte 6 am Gaseinlassorgan 4 bezie hungsweise am Deckel 2 anliegt. Es werden die in der Figur 7 dargestellten temporären Befestigungsmittel 19 angebracht, die die Deckenplatte 6 am De ckel 2 halten. Dabei kann eine eventuell erforderliche Zentrierung vorgenom men werden. Der Deckel 2 wird in die in der Figur 6 dargestellten zweiten Of fenstellung angehoben, in der die Schrauben 20 oder anderweitige Befesti gungsmittel angebracht werden, mit denen die Deckenplatte 6 permanent am Deckel 2 befestigt ist. Alternativ dazu kann die Zentrierung der Deckenplatte 6 aber auch mit den permanenten Befestigungsmitteln 20 erfolgen. A cleaned ceiling panel 6 is attached to the cover 2 in essentially the reverse order. For this purpose, a cover plate 6 is brought into the interior 22 of the housing 1, which has an operating position according to FIG. The cover plate 6 is placed on the Hubele element 11 according to FIG. The lifting element 11 is shown in FIG. raised fenposition, in which the cover plate 6 on the gas inlet element 4 or rather on the cover 2 rests. The temporary fastening means 19 shown in FIG. 7 are attached, which hold the cover plate 6 on the cover 2. Any centering that may be required can be carried out. The cover 2 is raised into the second position shown in FIG. 6, in which the screws 20 or other fastening means are attached with which the cover plate 6 is permanently fastened to the cover 2. As an alternative to this, the centering of the ceiling plate 6 can also take place with the permanent fastening means 20.
[0018] Die Klammern 19 können entfernt werden. Es ist aber auch möglich, den Deckel 2 zuvor in die in der Figur 4 dargestellte Stellung abzusenken, um in dieser Position die Klammern 19 zu entfernen. Anschließend wird der De ckel 2 in die in der Figur 3 dargestellten Geschlossen-Stellung abgesenkt. Das Hubelement 11 wird in eine abgesenkte Bestellung gebracht. In dieser kann ein neuer Suszeptor 5 durch die Beladeöffnung 18 in den Innenraum 22 gebracht werden, wo er auf das Hubelement 11 aufgesetzt wird. The clips 19 can be removed. However, it is also possible to lower the cover 2 beforehand into the position shown in FIG. 4 in order to remove the clips 19 in this position. The cover 2 is then lowered into the closed position shown in FIG. The lifting element 11 is brought into a lowered order. In this a new susceptor 5 can be brought through the loading opening 18 into the interior 22, where it is placed on the lifting element 11.
[0019] Die Figur 11 zeigt in einer Darstellung gemäß Figur la eine Variante der Erfindung, bei der der Rand der Deckenplatte 6 von einem oberen Ab schnitt eines ringförmigen Gasauslassorganes 3 getragen werden kann. Das Gasauslassorgan 3 kann bei dieser Variante nicht nur von der in der Figur 2 dargestellten abgesenkten Stellung abgesenkt werden. Das Gasauslassorgan 3 kann darüber hinaus aus der in der Figur 1 dargestellten Prozessstellung in eine nicht dargestellte angehobene Stellung gebracht werden, in der es über den Rand 24' hinausragt, um so die Deckenplatte 6 in eine angehobene Stellung zu bringen. [0020] Die Figuren 1 und la zeigen einen von der Unterseite des Deckels aus gebildeten Ringsteg 25, der materialeinheitlich der aus Metall bestehenden De ckelplatte angeformt ist. Dieser Ringsteg 25 besitzt eine radial nach außen wei sende Oberfläche, die an einer Oberfläche der Wand des Gehäuses 1 anliegt. Bei geschlossenem Deckel ragt der Ringsteg 25 in die Öffnung 24 hinein. FIG. 11 shows, in a representation according to FIG. La, a variant of the invention in which the edge of the cover plate 6 can be supported by an upper section of an annular gas outlet element 3. In this variant, the gas outlet element 3 can not only be lowered from the lowered position shown in FIG. The gas outlet element 3 can also be brought from the process position shown in FIG. 1 into a raised position, not shown, in which it protrudes over the edge 24 'in order to bring the cover plate 6 into a raised position. Figures 1 and la show an annular web 25 formed from the underside of the lid, which is integrally formed of the same material of the lid plate made of metal. This annular web 25 has a radially outwardly white transmitting surface which rests against a surface of the wall of the housing 1. When the cover is closed, the annular web 25 protrudes into the opening 24.
[0021] Der Ringsteg 25 umgibt das Gaseinlassorgan 4. Der Ringsteg 25 bildet eine kreisförmige Aufnahmekammer, in der das berührend an der Unterseite des Deckels 2 befestigte Gaseinlassorgan 4 einliegt. Ein Außenrandabschnitt 26 des Gaseinlassorgans 4, welcher bevorzugt von der Gasaustrittsplatte 21 mate rialeinheitlich ausgebildet ist, besitzt eine radial nach außen weisende Wand, die an der radial nach innen weisenden Wand des Ringstegs 25 anliegt. Die Höhe des Ringstegs 25 entspricht bevorzugt der Höhe des Gaseinlassorgans 4, sodass die zur Prozesskammer 23 weisende Oberfläche des Gaseinlassorgans 4 mit der in Achsrichtung weisenden Fläche des Ringstegs 25 bündig verläuft. The annular web 25 surrounds the gas inlet element 4. The annular web 25 forms a circular receiving chamber in which the gas inlet element 4, which is attached to the underside of the cover 2, rests. An outer edge section 26 of the gas inlet element 4, which is preferably formed as one material from the gas outlet plate 21, has a radially outwardly facing wall which rests against the radially inwardly facing wall of the annular web 25. The height of the annular web 25 preferably corresponds to the height of the gas inlet element 4, so that the surface of the gas inlet element 4 facing the process chamber 23 runs flush with the surface of the annular web 25 pointing in the axial direction.
[0022] Die Figur la zeigt, dass die zum Gaseinlassorgan 4 weisende Fläche der Deckenplatte 6 im Randbereich schräg verläuft, sodass sich die Materialstärke der Deckenplatte 6 randseitig keilförmig vermindert. In diesen Bereich erstreckt sich der oben bereits beschriebene Wulst 14, der berührend an dem Gaseinlass organ 4 beziehungsweise der Gasaustrittsplatte 21 anliegt. Beim Ausführungs beispiel liegt der kreisförmig verlaufende Wulst 14 am Außenrandabschnitt 26 an. Mit dem Wulst 14 wird verhindert, dass Prozessgas, welches durch die Gasaustrittsöffnungen 17 in den Spalt 15 eintritt, seitlich aus dem Spalt 15 her austritt. FIG. 1 a shows that the surface of the cover plate 6 facing the gas inlet element 4 runs obliquely in the edge region, so that the material thickness of the cover plate 6 is reduced in a wedge shape at the edge. The above-described bead 14, which is in contact with the gas inlet organ 4 or the gas outlet plate 21, extends into this area. In the embodiment example, the circular bead 14 rests on the outer edge portion 26. The bead 14 prevents process gas which enters the gap 15 through the gas outlet openings 17 from exiting the gap 15 laterally.
[0023] Die vorstehenden Ausführungen dienen der Erläuterung der von der Anmeldung insgesamt erfassten Erfindungen, die den Stand der Technik zu mindest durch die folgenden Merkmalskombinationen jeweils auch eigenstän- dig weiterbilden, wobei zwei, mehrere oder alle dieser Merkmalskombinatio nen auch kombiniert sein können, nämlich: [0023] The above explanations serve to explain the inventions covered by the application as a whole which, at least by means of the following combinations of features, represent the state of the art in each case also independently. dig further, whereby two, more or all of these combinations of features can also be combined, namely:
[0024] Ein CVD-Reaktor, das dadurch gekennzeichnet ist, dass das Hubele ment 11 von ein oder mehreren, den Suszeptor 5 umgebenden oder an seinem Rand unterstützenden Körpern gebildet ist. A CVD reactor, which is characterized in that the lifting element 11 is formed by one or more bodies surrounding the susceptor 5 or supporting it at its edge.
[0025] Ein Verfahren, das dadurch gekennzeichnet ist, dass das Hubele ment 11 von ein oder mehreren den Suszeptor 5 umgebenden oder an seinem Rand abstützenden Körpern gebildet ist. A method which is characterized in that the lifting element 11 is formed by one or more bodies surrounding the susceptor 5 or supporting it at its edge.
[0026] Ein CVD-Reaktor oder ein Verfahren, die dadurch gekennzeichnet sind, dass das Hubelement 11 ein den Suszeptor 5 tragendes Tragelement oder ein den Suszeptor 5 umgebendes Gasauslassorgan 3 ist. A CVD reactor or a method, which is characterized in that the lifting element 11 is a support element carrying the susceptor 5 or a gas outlet element 3 surrounding the susceptor 5.
[0027] Ein CVD-Reaktor oder ein Verfahren, die dadurch gekennzeichnet sind, dass das Hubelement 11 einen kreisringförmigen Grundriss aufweist und/ oder dass das Hubelement 11 die Form eines Rohres aufweist. [0028] Ein CVD-Reaktor oder ein Verfahren, die dadurch gekennzeichnet sind, dass der Befestigungsabschnitt 21 von einem eine obere Öffnung 24 des Gehäu ses 1 verschließenden Deckel 2 gebildet ist und das Hubelement 11 bis in eine Position anhebbar ist, in der zumindest ein oberer Abschnitt des Hubelemen tes 11 über den Rand 24' der Öffnung 24 nach außen ragt. [0029] Ein CVD-Reaktor oder ein Verfahren, die dadurch gekennzeichnet sind, dass die Deckenplatte 6 mit temporären und/ oder permanenten Befestigungs mitteln 19, 20 am Befestigungsabschnitt 21 befestigbar ist beziehungsweise be festigt wird und/ oder dass die Deckenplatte 6 einen zum Gaseinlassorgan 4 oder zur Gasaustrittsplatte 21 weisenden umlaufenden Ringwulst 14 aufweist, der in dichtender Anlage am Gaseinlassorgan 4 oder der Gasaustrittsplatte 21 anliegt und/ oder dass der Deckel 2 einen in die Öffnung 24 hineinragenden Ringsteg 25 aufweist, der das Gaseinlassorgan 4 umgibt. A CVD reactor or a method, which is characterized in that the lifting element 11 has an annular plan and / or that the lifting element 11 has the shape of a tube. A CVD reactor or a method, which is characterized in that the fastening portion 21 is formed by a cover 2 closing an upper opening 24 of the housing 1 and the lifting element 11 can be raised into a position in which at least one upper portion of the Hubelemen tes 11 over the edge 24 'of the opening 24 protrudes to the outside. A CVD reactor or a method, which is characterized in that the cover plate 6 with temporary and / or permanent fastening means 19, 20 can be fastened to the fastening section 21 or is fastened and / or that the cover plate 6 is a gas inlet member 4th or has circumferential annular bead 14 facing the gas outlet plate 21, which rests in sealing contact with the gas inlet element 4 or the gas outlet plate 21 and / or that the cover 2 has an annular web 25 which protrudes into the opening 24 and surrounds the gas inlet element 4.
[0030] Ein CVD-Reaktor oder ein Verfahren, die dadurch gekennzeichnet sind, dass der Befestigungsabschnitt 21 ein Gaseinlassorgan 4 ist oder ein Gaseinlass organ 4 umgibt, wobei das Gaseinlassorgan 4 eine Vielzahl von Gasaustrittsöff nungen 17 aufweist, die in einen Spalt 15 zwischen der Deckenplatte 6 und ei ner Gasaustrittsfläche des Gaseinlassorgans 4 münden, wobei die Deckenplat te 6 Gasdurchtrittsöffnungen 16 aufweist. A CVD reactor or a method, which is characterized in that the fastening section 21 is a gas inlet element 4 or surrounds a gas inlet element 4, the gas inlet element 4 having a plurality of gas outlet openings 17 which extend into a gap 15 between the Ceiling plate 6 and a gas outlet surface of the gas inlet element 4 open, with the ceiling plate 6 having gas passage openings 16.
[0031] Ein CVD-Reaktor oder ein Verfahren, die dadurch gekennzeichnet sind, dass das Gasauslassorgan 3 aus einer in der Bewegungsbahn des Suszeptors 5 oder der Deckenplatte 6 liegenden Prozessstellung in eine abgesenkte Stellung verlagerbar ist. A CVD reactor or a method, which is characterized in that the gas outlet element 3 can be displaced from a process position lying in the movement path of the susceptor 5 or the cover plate 6 into a lowered position.
[0032] Ein CVD-Reaktor oder ein Verfahren, die dadurch gekennzeichnet sind, dass der Befestigungsabschnitt 21 einem eine Öffnung 24 des Gehäuses 1 ver schließenden Deckel 2 zugeordnet ist, und zur Montage der Deckenplatte 6 der Deckel 2 vor dem oder beim Anheben der Deckenplatte 6 in eine erste Offen stellung gebracht wird, und nach dem Anheben die vom Hubelement 11 getra gene Deckenplatte 6 mit ersten Befestigungsmitteln 19 am Deckel 2 befestigt wird, und anschließend nach einem Anheben des Deckels 2 in eine zweite Of fenstellung, währenddessen sich die Deckenplatte 6 vom Hubelement 11 trennt, mit zweiten Befestigungsmitteln 20 am Deckel 2 befestigt wird und/ oder dass zur Entnahme der Deckenplatte 6 zunächst der Deckel 2 in eine erste Offenstel lung gebracht wird, in der erste Befestigungsmittel 19 am Deckel 2 befestigt werden, und nach einem Anheben des Deckels 2 in eine zweite Offenstellung zweite Befestigungsmittel 20 gelöst werden und anschließend der Deckel 2 zu rück in die erste Offenstellung gebracht wird, in der die Deckenplatte 6 auf dem Hubelement 11 aufliegt, wobei in dieser Stellung die ersten Befestigungsmit tel 19 entfernt werden. A CVD reactor or a method, which is characterized in that the fastening portion 21 is assigned to an opening 24 of the housing 1 ver closing cover 2, and for mounting the cover plate 6 of the cover 2 before or when lifting the cover plate 6 is brought into a first open position, and after lifting the ceiling plate 6 supported by the lifting element 11 is fastened to the cover 2 with first fastening means 19, and then after lifting the cover 2 in a second position, during which the ceiling plate 6 separates from the lifting element 11, is attached to the cover 2 with second fastening means 20 and / or that, to remove the cover plate 6, the cover 2 is first brought into a first open position, in which the first fastening means 19 are attached to the cover 2, and after lifting of the cover 2 in a second open position second fastening means 20 are released and then the cover 2 is brought back to the first open position in which the cover plate 6 rests on the lifting element 11, in which position the first fastening means tel 19 are removed.
[0033] Alle offenbarten Merkmale sind (für sich, aber auch in Kombination untereinander) erfindungswesentlich. In die Offenbarung der Anmeldung wird hiermit auch der Offenbarungsinhalt der zugehörigen/ beigefügten Prioritäts unterlagen (Abschrift der Voranmeldung) vollinhaltlich mit einbezogen, auch zu dem Zweck, Merkmale dieser Unterlagen in Ansprüche vorliegender An meldung mit aufzunehmen. Die Unteransprüche charakterisieren, auch ohne die Merkmale eines in Bezug genommenen Anspruchs, mit ihren Merkmalen eigenständige erfinderische Weiterbildungen des Standes der Technik, insbe sondere um auf Basis dieser Ansprüche Teilanmeldungen vorzunehmen. Die in jedem Anspruch angegebene Erfindung kann zusätzlich ein oder mehrere der in der vorstehenden Beschreibung, insbesondere mit Bezugsziffern versehene und/ oder in der Bezugsziffernliste angegebene Merkmale aufweisen. Die Er findung betrifft auch Gestaltungsformen, bei denen einzelne der in der vorste henden Beschreibung genannten Merkmale nicht verwirklicht sind, insbeson dere soweit sie erkennbar für den jeweiligen Verwendungszweck entbehrlich sind oder durch andere technisch gleichwirkende Mittel ersetzt werden kön nen. All the features disclosed are essential to the invention (individually, but also in combination with one another). In the disclosure of the application, the disclosure content of the associated / attached priority documents (copy of the previous application) is hereby fully included, also for the purpose of including features of these documents in the claims of the present application. The subclaims characterize, even without the features of a referenced claim, with their features independent inventive developments of the prior art, in particular in order to make divisional applications on the basis of these claims. The invention specified in each claim can additionally have one or more of the features provided in the above description, in particular provided with reference numbers and / or specified in the list of reference numbers. The invention also relates to design forms in which some of the features mentioned in the preceding description are not implemented, in particular insofar as they are recognizable for the respective purpose or can be replaced by other technically equivalent means.
Liste der Bezugszeichen List of reference symbols
1 Gehäuse 21 Gasaustrittsplatte, Befesti1 housing 21 gas outlet plate, fastening
2 Deckel gungsabschnitt 2 cover section
3 Gasauslassorgan 22 Innenraum 3 gas outlet member 22 interior
4 Gaseinlassorgan 23 Prozesskammer 4 gas inlet element 23 process chamber
5 Suszeptor 24 Öffnung 5 susceptor 24 opening
6 Deckenplatte 24' Rand der Öffnung6 ceiling plate 24 'edge of the opening
7 Heizeinrichtung 25 Ringsteg 7 heating device 25 ring web
8 Schaft 26 Außenrandabschnitt8 shaft 26 outer edge section
9 Hubeinrichtung, Auslassrohr 9 Lifting device, outlet pipe
10 Hubeinrichtung 10 lifting device
11 Hubelement, Schutzrohr 11 Lifting element, protective tube
12 Trägerplatte 12 support plate
13 Träger 13 carriers
14 Wulst 14 bead
15 Spalt 15 gap
16 Gasdurchtrittsöffnung 16 gas passage opening
17 Gasaustrittsöffnung, Gasver teilkammer 17 Gas outlet opening, gas distribution chamber
18 Beladeöffnung 18 Loading opening
19 Halteklammer, Befestigungs mittel 19 Retaining clip, fastening means
20 Schraube, Befestigungsmittel, Gewindeelement 20 screw, fasteners, threaded element

Claims

Ansprüche Expectations
1. CVD-Reaktor mit einem Gehäuse (1), mit einem eine Prozesskammer (23) nach unten begrenzenden Suszeptor (5) und mit einer die Prozesskam mer (23) nach oben hin begrenzenden Deckenplatte (6), wobei die Decken platte (6) mittels eines von einer abgesenkten Stellung in eine Montagepo- sition anhebbaren Hubelementes (11) bis in eine Anlagestellung an einen1. CVD reactor with a housing (1), with a susceptor (5) delimiting a process chamber (23) at the bottom and with a cover plate (6) delimiting the process chamber (23) at the top, the cover plate (6 ) by means of a lifting element (11) that can be raised from a lowered position into an assembly position into a contact position on one
Befestigungsabschnitt (21) anhebbar ist, an welchem Befestigungsab schnitt (21) die Deckenplatte (6) am Gehäuse (1) befestigbar ist, dadurch gekennzeichnet, dass das Hubelement (11) von ein oder mehreren, den Suszeptor (5) umgebenden oder an seinem Rand unterstützenden Körpern gebildet ist. Fastening section (21) can be raised, on which fastening section (21) the cover plate (6) can be fastened to the housing (1), characterized in that the lifting element (11) of one or more surrounding the susceptor (5) or on its Edge supporting bodies is formed.
2. Verfahren zum Handhaben einer eine Prozesskammer (23) eines CVD-2. Method for handling a process chamber (23) of a CVD
Reaktors begrenzenden, oberhalb eines Suszeptors (5) angeordneten De ckenplatte (6) mit den folgenden Schritten: Reactor delimiting, above a susceptor (5) arranged ceiling plate (6) with the following steps:
1. Ablegen der Deckenplatte (6) auf einem im Gehäuse (1) angeordne ten Hubelement (11); 1. Depositing the cover plate (6) on one in the housing (1) angeordne th lifting element (11);
2. Anheben des die Deckenplatte (6) tragenden Hubelementes (11) bis in eine Montageposition; 2. Lifting the lifting element (11) carrying the ceiling plate (6) into an assembly position;
3. Befestigen der Deckenplatte (6) an einem Befestigungsabschnitt (21) des Gehäuses (1); 3. Attaching the ceiling plate (6) to a fastening section (21) of the housing (1);
4. Absenken des Hubelementes (11) in eine abgesenkte Stellung; und/ oder 4. Lowering the lifting element (11) into a lowered position; and or
5. Anheben des Hubelementes (11) von einer abgesenkten Stellung in eine Montagestellung; 5. Raising the lifting element (11) from a lowered position into an assembly position;
6. Lösen der Deckenplatte (6) von einem Befestigungsabschnitt (21) des Gehäuses (1); 6. Detaching the cover plate (6) from a fastening section (21) of the housing (1);
7. Absenken des die Deckenplatte (6) tragenden Hubelementes (11) bis in die abgesenkte Stellung; 7. Lowering of the lifting element (11) carrying the ceiling plate (6) into the lowered position;
8. Entnehmen der Deckenplatte (6) vom Hubelement (11), dadurch gekennzeichnet, dass das Hubelement (11) von ein oder mehre ren den Suszeptor (5) umgebenden oder an seinem Rand abstützenden Körpern gebildet ist. 8. Removing the cover plate (6) from the lifting element (11), characterized in that the lifting element (11) is formed by one or more Ren the susceptor (5) surrounding or supporting bodies at its edge.
CVD-Reaktor oder Verfahren nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass das Hubelement (11) ein den Suszeptor (5) tragendes Tragelement oder ein den Suszeptor (5) umgebendes Gasaus lassorgan (3) ist. CVD reactor or method according to one of the preceding claims, characterized in that the lifting element (11) is a support element carrying the susceptor (5) or a gas outlet element (3) surrounding the susceptor (5).
CVD-Reaktor oder Verfahren nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass das Hubelement (11) einen kreisringförmi gen Grundriss aufweist und/ oder dass das Hubelement (11) die Form ei nes Rohres aufweist. CVD reactor or method according to one of the preceding claims, characterized in that the lifting element (11) has a circular shape and / or that the lifting element (11) has the shape of a tube.
CVD-Reaktor oder Verfahren nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass der Befestigungsabschnitt (21) von einem eine obere Öffnung (24) des Gehäuses (1) verschließenden Deckel (2) ge bildet ist und das Hubelement (11) bis in eine Position anhebbar ist, in der zumindest ein oberer Abschnitt des Hubelementes (11) über den Rand (24') der Öffnung (24) nach außen ragt. CVD reactor or method according to one of the preceding claims, characterized in that the fastening section (21) is formed by a cover (2) closing an upper opening (24) of the housing (1) and the lifting element (11) extends into a Position can be raised in which at least an upper section of the lifting element (11) protrudes outward over the edge (24 ') of the opening (24).
CVD-Reaktor oder Verfahren insbesondere nach einem der vorhergehen den Ansprüche, dadurch gekennzeichnet, dass die Deckenplatte (6) mit temporären und/ oder permanenten Befestigungsmitteln (19, 20) am Befes tigungsabschnitt (21) befestigbar ist beziehungsweise befestigt wird und/ oder dass die Deckenplatte (6) einen zum Gaseinlassorgan (4) oder zur Gasaustrittsplatte (21) weisenden umlaufenden Ringwulst (14) auf weist, der in dichtender Anlage am Gaseinlassorgan (4) oder der Gasaus- trittsplatte (21) anliegt und/ oder dass der Deckel (2) einen in die Öff nung (24) hineinragenden Ringsteg (25) aufweist, der das Gaseinlassor gan (4) umgibt. CVD reactor or method in particular according to one of the preceding claims, characterized in that the cover plate (6) can be or will be fastened to the fastening section (21) with temporary and / or permanent fastening means (19, 20) and / or that the Cover plate (6) has a circumferential annular bead (14) pointing towards the gas inlet element (4) or towards the gas outlet plate (21), which is in sealing contact with the gas inlet element (4) or the gas outlet step plate (21) rests and / or that the cover (2) has an annular web (25) which protrudes into the opening (24) and surrounds the gas inlet device (4).
CVD-Reaktor oder Verfahren nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass der Befestigungsabschnitt (21) ein Gasein lassorgan (4) ist oder ein Gaseinlassorgan (4) umgibt, wobei das Gasein lassorgan (4) eine Vielzahl von Gasaustrittsöffnungen (17) aufweist, die in einen Spalt (15) zwischen der Deckenplatte (6) und einer Gasaustrittsflä che des Gaseinlassorgans (4) münden, wobei die Deckenplatte (6) Gas durchtrittsöffnungen (16) aufweist. CVD reactor or method according to one of the preceding claims, characterized in that the fastening section (21) is a gas inlet element (4) or surrounds a gas inlet element (4), the gas inlet element (4) having a plurality of gas outlet openings (17) which open into a gap (15) between the cover plate (6) and a gas outlet surface of the gas inlet element (4), the cover plate (6) having gas passage openings (16).
CVD-Reaktor mit einem Gehäuse (1), mit einem eine Prozesskammer (23) nach unten begrenzenden Suszeptor (5), mit einer die Prozesskammer (23) nach oben hin begrenzenden Deckenplatte (6) und mit einem den Suszep tor (5) umgebenden Gasauslassorgan (4), wobei das Gehäuse (1) eine Be ladeöffnung (18) aufweist, durch welche der Suszeptor (5) oder die De ckenplatte (6) mit einer Bewegung, die in Richtung seiner/ ihrer Flächen erstreckung erfolgt, in den Innenraum (22) des Gehäuses (1) bringbar ist, dadurch gekennzeichnet, dass das Gasauslassorgan (3) aus einer in der Bewegungsbahn des Suszeptors (5) oder der Deckenplatte (6) liegenden Prozessstellung in eine abgesenkte Stellung verlagerbar ist. CVD reactor with a housing (1), with a susceptor (5) delimiting a process chamber (23) at the bottom, with a cover plate (6) delimiting the process chamber (23) at the top and with a susceptor (5) surrounding the susceptor Gas outlet element (4), wherein the housing (1) has a loading opening (18) through which the susceptor (5) or the ceiling plate (6) with a movement that extends in the direction of its / their surfaces into the interior (22) of the housing (1) can be brought, characterized in that the gas outlet element (3) can be displaced from a process position lying in the movement path of the susceptor (5) or the cover plate (6) into a lowered position.
Verfahren nach einem der Ansprüche 2 bis 7, dadurch gekennzeichnet, dass der Befestigungsabschnitt (21) einem eine Öffnung (24) des Gehäu ses (1) verschließenden Deckel (2) zugeordnet ist, und zur Montage der Deckenplatte (6) der Deckel (2) vor dem oder beim Anheben der Decken platte (6) in eine erste Offenstellung gebracht wird, und nach dem Anhe ben die vom Hubelement (11) getragene Deckenplatte (6) mit ersten Befes- tigungsmitteln (19) am Deckel (2) befestigt wird, und anschließend nach einem Anheben des Deckels (2) in eine zweite Offenstellung, währenddes sen sich die Deckenplatte (6) vom Hubelement (11) trennt, mit zweiten Be festigungsmitteln (20) am Deckel (2) befestigt wird. 10. Verfahren nach einem der vorhergehenden Ansprüche, dadurch gekenn zeichnet, dass zur Entnahme der Deckenplatte (6) zunächst der Deckel (2) in eine erste Offenstellung gebracht wird, in der erste Befestigungsmit tel (19) am Deckel (2) befestigt werden, und nach einem Anheben des De ckels (2) in eine zweite Offenstellung zweite Befestigungsmittel (20) gelöst werden und anschließend der Deckel (2) zurück in die erste Offenstellung gebracht wird, in der die Deckenplatte (6) auf dem Hubelement (11) auf liegt, wobei in dieser Stellung die ersten Befestigungsmittel (19) entfernt werden. Method according to one of Claims 2 to 7, characterized in that the fastening section (21) is assigned to a cover (2) which closes an opening (24) in the housing (1), and the cover (2) for mounting the cover plate (6) ) is brought into a first open position before or when lifting the ceiling panel (6), and after lifting the ceiling panel (6) carried by the lifting element (11) with first fasteners fastening means (19) is fastened to the cover (2), and then after lifting the cover (2) into a second open position, during which the cover plate (6) separates from the lifting element (11), with second fastening means (20) on the Cover (2) is attached. 10. The method according to any one of the preceding claims, characterized in that in order to remove the cover plate (6) first the cover (2) is brought into a first open position in which the first fastening means (19) are attached to the cover (2), and after the cover (2) has been raised into a second open position, second fastening means (20) are released and then the cover (2) is brought back into the first open position in which the cover plate (6) rests on the lifting element (11) lies, in which position the first fastening means (19) are removed.
11. CVD-Reaktor oder Verfahren, gekennzeichnet durch eines oder mehrere der kennzeichnenden Merkmale eines der vorhergehenden Ansprüche. 11. CVD reactor or method, characterized by one or more of the characterizing features of one of the preceding claims.
PCT/EP2021/053424 2020-02-14 2021-02-12 Cvd reactor and method for handling a process chamber cover plate WO2021160785A1 (en)

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