DE102020103947A1 - CVD reactor and method of handling a process chamber ceiling plate - Google Patents

Abstract

The invention relates to a CVD reactor with a housing (1), with a susceptor (5) delimiting a process chamber (23) at the bottom and with a cover plate (6) delimiting the process chamber (23) at the top, the cover plate (6 ) can be raised by means of a lifting element (11) that can be raised from a lowered position into an assembly position into a contact position on a fastening section (21) of the housing (1), to which fastening section (21) the cover plate (6) can be fastened to the housing (1) is. In order to be able to attach the cover plate (6) to the housing (1) automatically or semi-automatically, a lifting element (11) is provided which either surrounds the susceptor (5) or supports it at its edge. The lifting element (11) can also be formed by a protective tube. With the lifting element (11), the cover plate (6) can be brought into a position in which it can be removed through a loading opening (18).

Description

Field of technology

The invention relates to a method for handling a cover plate that delimits a process chamber of a CVD reactor at the top, in particular for fully or semi-automatic replacement of the cover plate. The invention also relates to a further development of a CVD reactor in which the cover plate can be raised from a lowered position into an assembly position by means of a lifting element.

State of the art

From the DE 10 2012 110 125 A1 a CVD reactor is previously known. The ceiling plate there is a screen plate with gas passage openings arranged below a gas outlet plate of a showerhead, which is brought into the assembly position by a simultaneous vertical displacement of the susceptor and ceiling plate, the susceptor being displaced in the vertical direction by a lifting device and carrying the screen plate on its surface. Fastening means are provided which enable the ceiling panel to be fastened in an automated manner. A similar device is shown in US Pat DE 10 2019 117 479 A1 described. A ceiling plate fastened with holding elements below a gas outlet plate is also disclosed in the WO 2007/060143 A1 . The state of the art also includes JP 5721132 B2 .

Summary of the invention

The invention is based on the object of further developing the generic device and the generic method in an advantageous manner.

The object is achieved by the invention specified in the claims, the subclaims not only representing advantageous developments of the independent claims of the invention, but also independent solutions to the object.

First and foremost, it is proposed that a body surrounding the susceptor be used as the lifting element or that a body supporting the susceptor at its edge is used as the lifting element. The body can be in one piece or in several pieces. The body surrounding the susceptor can be a closed body or a body interrupted in the circumferential direction. The lifting element can be a pipe, for example. The body can be formed from a plurality of partial bodies lying next to one another in the circumferential direction, so the body can, for example, have a plan corresponding to a circular ring. For example, the body can have an annular outline. The body can, however, also be formed by a plurality of rods, columns or the like which extend in the vertical direction and which are arranged at different azimuthal positions around the susceptor or a heating device. In a preferred embodiment of the invention, the lifting element can be formed by a support element carrying the susceptor, as it is, for example, from the DE 10 2007 027 704 A1 is previously known. The support element can have an upper edge and the shape of a tube. A susceptor is supported on the upper edge in a process position. The edge of the susceptor rests on the upper edge. In order to use this support element to lift the cover plate, the susceptor is first brought out of the housing of the CVD reactor through a loading opening. For this purpose, a gate that closes the loading opening is opened. It can be provided that for this purpose an annular gas outlet member surrounding the susceptor must also be lowered so that it does not lie in the movement path of the susceptor which is moved in its plane of extension. The lifting element can be attached to a vertically displaceable support device. The carrier device can be displaceable in the vertical direction. The carrier device can also carry the heating device with which the susceptor is heated from below in the process position. In a variant of the invention, the gas outlet element can perform the function of the lifting element. In a preferred variant, the mounting of the ceiling plate takes place automatically and in particular fully automatically. In particular, provision is made for the ceiling panel to be exchanged semi-automatically or fully automatically. In a variant of the invention, the cover plate can be fastened to a cover of the housing which closes an upwardly facing housing opening. A gas inlet member in the form of a showerhead can be attached to this cover. The cover plate can be a protective plate which extends parallel to a gas outlet surface of the gas inlet element. The gas outlet surface can have a multiplicity of gas outlet openings opening in the direction of the cover plate. A gap can be located between the gas outlet surface and a top plate having the gas passage openings, in which the gas emerging from the gas outlet surface can be distributed. The edge of the cover plate can form a sealing bead which, in the installed position of the cover plate, rests in a sealing manner on the fastening section, for example on a fastening ring or the like. The ceiling plate can be fastened to the fastening section by means of fastening means, for example screws, bayonets or the like. The fastening means or several fastening means can also be arranged outside an outer ring zone of the ceiling plate. Fastening means can be provided on the entire surface of the cover plate in order to connect it to the cover or the gas inlet element. They can also be arranged near the center of the ceiling tile. These fastening means are preferably designed in such a way that they allow a slight lateral displacement of the plate relative to the gas inlet element without blocking. This way, different thermal expansions can be compensated. In a first variant of the invention, when the ceiling panel is replaced, a ceiling panel used in previous deposition processes on which deposits have formed is exchanged for a cleaned ceiling panel. For this purpose, the lifting element can be brought into a raised position in which it supports the ceiling plate fastened to the fastening section. Fastening means with which the ceiling plate is fastened to the fastening section are released in this position in which the lifting element rests against the ceiling plate. By lowering the lifting element, the cover plate is brought into a position in which it can be gripped by means of a gripper reaching through the loading opening into the interior of the housing in order to be able to be removed from the loading opening from the interior. The cleaned ceiling panel is attached to the fastening section in reverse order. In a second variant of the invention, a cover which closes an opening in a housing and carries the cover plate is raised. In the raised position, temporary fasteners are used to hold the ceiling panel to the fastening section. Screws or other fastening means with which the ceiling plate is fastened to the fastening section can be loosened manually or automatically. The cover is then lowered into a position in which the cover plate is supported by the lifting element. In this position, the temporary fasteners are released. By lowering the lifting element, the cover plate is released from the fastening section and brought into a position in which it can be gripped by the gripper. The cleaned ceiling plate is placed on the lifting element. The latter is brought into a raised position in which the ceiling panel rests against the fastening section, where it is fastened with the temporary fastening means. The cover can be raised further up to a position in which the screws or other fastening means can be mounted. The temporary fasteners are removed. The lid can be brought into its closed position. C-shaped brackets can be used as temporary fastening means, with which the cover plate is temporarily held on the fastening section, in particular on the cover. The transport of the ceiling plate from the interior or into the interior can be done with a robot arm that can reach through the loading opening. In the case of fully automatic assembly, the ceiling plate is connected to the fastening section with automatically actuatable fastening means. In the case of semi-automatic assembly, temporary fastening means, for example C-shaped brackets, are used with which the ceiling panel is temporarily fastened to the fastening section. This is preferably done with a cover brought into the first open position, the cover plate being brought by the lifting element over the upper edge of the housing opening so that the edge of the cover plate is accessible to which the temporary fastening means can be attached. Subsequently, during the semi-automatic assembly, the cover is raised further until the downward-facing broad side surface of the cover plate is accessible in order to attach the fastening means there, which can be threaded elements, for example. These intermediate steps are not required for fully automated assembly. The ceiling plate can be installed with the cover closed. After the fastening means have been fastened, the lifting element can be lowered. If a support element carrying the susceptor in the process position is used as the lifting element, the susceptor must be removed from the process chamber before the cover plate is replaced. This takes place after a lowering of the gas outlet element located in the process position in the movement path of the susceptor to be removed. After the cover plate has been replaced, a susceptor equipped with substrates to be coated can be brought into the process chamber through the loading opening via the lowered gas outlet element. This is done with a robot arm that places the susceptor on the support element. The gas outlet element is then raised until an upper edge of the gas outlet element abuts the edge of the cover plate or a section of the housing surrounding the cover plate. The cover plate, which can consist of quartz, steel, in particular stainless steel, or a ceramic material, has passage openings for a process gas to pass through, which is fed into the gap between the cover plate and the gas inlet element. The lifting element surrounding the susceptor can consist of steel, in particular stainless steel, quartz or a ceramic material. It can be formed by a tubular body, in the cavity of which a heating device for heating the susceptor is arranged. The heating device can be moved vertically together with the lifting element. In the process position, the lifting element can also perform the function of a liner, with which a space arranged below the susceptor is shielded from the process gases. The lifting element can thus perform the function of an umbrella tube.

The invention also relates to a further development of the ceiling plate. Near its edge, the cover plate has an annular bead directed towards the gas inlet element or the gas outlet plate. This annular bead defines a gap between the gas outlet plate and the ceiling plate. The annular bead is preferably in sealing contact with a flat underside of the gas inlet element or the gas outlet plate formed by the gas inlet element. The gas outlet plate can have a beveled edge surface in the area of the bead. The bead extends in the area of this beveled edge surface. The bead prevents the process gas fed into the gap from escaping to the side.

Another aspect of the invention relates to a further development of the cover of the housing. The gas inlet element is an integral part of the housing cover. For this purpose, the housing cover forms an annular web which is molded onto the cover plate of the cover using the same material. The ring web has a radially outwardly facing wall which, when the cover is installed, rests against an inner surface of a wall of the housing. The ring web also has a radially inwardly directed surface on which an outer edge section of the gas inlet element rests. The gas inlet element is preferably surrounded by the annular web and is enclosed by the annular web.

Figure list

• 1 in der Art eines Querschnitts einen CVD-Reaktor in einer Prozessstellung, in der eine Prozesskammer 23 nach untenhin durch einen Suszeptor 5 und nach oben hin durch eine Deckenplatte 6 begrenzt wird, wobei die Prozesskammer 23 von einem Gasauslassorgan 3 umgeben ist,
• 1a vergrößert den Ausschnitt Ia,
• 2 eine Darstellung gemäß 1, jedoch mit abgesenktem Gasauslassorgan 3,
• 3 eine Darstellung gemäß 2, bei der der Suszeptor 5 durch eine Beladeöffnung 18 entnommen wird,
• 4 eine Darstellung gemäß 3, bei der der Deckel 2 in eine erste Offenstellung gebracht ist, in der er sich etwa 20 bis 30 mm oberhalb eines Randes 24' der Öffnung 24 des Gehäuses 1 befindet, wobei temporäre Befestigungsmittel 19 angesetzt werden, zur temporären Fixierung der Deckenplatte 6 am Deckel 2,
• 5 eine Darstellung gemäß 4, wobei der Deckel 2 in eine zweite Offenstellung gebracht ist,
• 6 eine Darstellung gemäß 5, wobei Gewindeelemente 20, mit denen die Deckenplatte 6 am Deckel 2 befestigt sind, gelöst sind und die Deckenplatte 6 nur noch mittels der temporären Befestigungsmittel 19 am Deckel 2 gehalten wird,
• 7 eine Darstellung gemäß 6, wobei die Deckenplatte 6, die nur mittels der temporären Befestigungsmittel 19 am Deckel 2 gehalten ist, in die erste Offenstellung gebracht ist, wobei ein oberer Rand eines Hubelementes 11 die Deckenplatte 6 unterstützt,
• 8 eine Darstellung gemäß 7, wobei die temporären Befestigungsmittel 19 entfernt worden sind, sodass die Deckenplatte 6 nur noch vom Hubelement 11 getragen wird,
• 9 eine Darstellung gemäß 8, nachdem das Hubelement 11 in eine Position abgesenkt worden ist, in der sich die Deckenplatte 6 vom Deckel 2 gelöst hat und mittels eines Greifarms durch die Beladeöffnung 18 entnommen werden kann,
• 10 eine Darstellung gemäß 9, in der der Innenraum 22 weder einen Suszeptor noch eine Deckenplatte 6 enthält, bevor eine gereinigte Deckenplatte in den Innenraum 22 gebracht wird, die in im Wesentlichen umgekehrter Reihenfolge am Deckel 2 befestigt wird,
• 11 eine Darstellung gemäß 1a eines zweiten Ausführungsbeispiels, bei dem das Gasauslassorgan 3 die Funktion eines Hubelementes ausübt.

Embodiments of the invention are explained below with reference to the accompanying drawings. Show it:

• 1 in the manner of a cross section a CVD reactor in a process position in which a process chamber 23 down through a susceptor 5 and up through a ceiling tile 6th is limited, the process chamber 23 from a gas outlet member 3 is surrounded
• 1a enlarges the section Ia,
• 2 a representation according to 1 , but with lowered gas outlet 3 ,
• 3 a representation according to 2 where the susceptor 5 through a loading opening 18th is removed,
• 4th a representation according to 3 where the lid 2 is brought into a first open position, in which it is about 20 to 30 mm above an edge 24 ' the opening 24 of the housing 1 located, with temporary fasteners 19th for the temporary fixation of the ceiling panel 6th on the lid 2 ,
• 5 a representation according to 4th , with the lid 2 is brought into a second open position,
• 6th a representation according to 5 , where threaded elements 20th with which the ceiling tile 6th on the lid 2 are attached, are loosened and the ceiling plate 6th only by means of the temporary fastening means 19th on the lid 2 is held
• 7th a representation according to 6th , with the ceiling tile 6th that only by means of the temporary fasteners 19th on the lid 2 is held, is brought into the first open position, with an upper edge of a lifting element 11 the ceiling tile 6th supports,
• 8th a representation according to 7th , the temporary fasteners 19th have been removed so that the ceiling tile 6th only from the lifting element 11 will be carried,
• 9 a representation according to 8th after the lifting element 11 has been lowered to a position in which the ceiling panel 6th from the lid 2 has released and by means of a gripper arm through the loading opening 18th can be removed,
• 10 a representation according to 9 in which the interior 22nd neither a susceptor nor a ceiling tile 6th contains before a cleaned ceiling tile in the interior 22nd is brought in essentially the reverse order on the lid 2 is attached,
• 11 a representation according to 1a of a second embodiment, in which the gas outlet member 3 performs the function of a lifting element.

Description of the embodiments

the 1 shows schematically in the manner of a cross section through a CVD reactor its essential components. The CVD reactor has a gas-tight housing 1 , which has an upward-facing opening 24 having. In the in the 1 The process position shown is the opening 24 from a lid 2 locked. The lid 2 carries a gas inlet member 4th in the form of a showerhead. The gas inlet organ 4th has a gas distribution volume that goes down through a gas outlet plate 21 is limited, which forms a gas outlet surface with its underside. The gas outlet plate 21 has a large number of gas outlet openings 17th , with which gas from the gas distribution chamber 17th into a crack 15th can emerge. The gap 15th extends between the gas outlet plate 21 and a ceiling plate 6th that is below the gas inlet organ 4th is arranged. An edge of the essentially circular disk-shaped cover plate 6th owns a bead 14th , which is located on an edge section of the gas outlet plate 21 supported, the height of the bead 14th the height of the gap 15th Are defined. To define the gap, however, further spacer elements can also be provided, which are not shown in the drawings and are within the area of the bead 14th surrounding area are arranged. With such spacer elements, thermal deformations can be compensated. The height of the gap 15th can also be limited by other spacer elements. The ceiling tile 6th has a large number of gas passage openings 16 through which that in the gap 15th gas that has entered into one below the ceiling plate 6th arranged process chamber 23 one can stream. While the ceiling tile 6th the process chamber 23 Limited towards the top, delimited by a susceptor 5 the process chamber 23 downwards.

The edge of the ceiling tile 6th can in the area in which the circumferential bead 14th is arranged, have a smaller material thickness than in the central area, wherein the material thickness is preferably reduced on the upper side, so that an outwardly rising gap to the gas inlet member can result. The material thickness can also be reduced on the upper side, so that there is an outwardly rising gap to the gas inlet element.

The edge of the susceptor 5 rests on a support element which, in the exemplary embodiment, can have the shape of a tube. In particular, it can be from a protective tube 11 be trained. The protective tube 11 surrounds an arrangement with a heating device 7th that is below the susceptor 5 is located and the one carrier plate 12th has for supplying power to the heating device 7th . By means of a lifting device 10 can be the support element, in particular the protective tube 11 and the heater 7th be raised. The pipe 11 , on which the edge of the susceptor is supported, has the function of a support tube in a variant of the invention. The pipe 11 forms the carrier of the susceptor 5 .

The process chamber is formed by an annular gas outlet element 3 surround. The gas outlet element can be opened with a further lifting device 3 from one in the 1 process position shown in which it is in front of a loading opening 18th is arranged, lower, into a position in which the loading opening 18th free is. In this, in the 2 The position shown can be the susceptor 5 of one through the loading opening 18th in the interior 22nd of the housing engaging gripper to be gripped, as in the 3 shown, from the case 1 through the loading opening 18th to be able to be removed through to against another susceptor 5 to be exchanged. One with the reference number 9 designated element forms a gas outlet pipe with the gas which is in the gas outlet element 3 is collected, can be transported outside. That in the drawings with the reference number 9 The designated element can also illustrate the further lifting device with which the gas outlet element 3 can be lowered and raised.

With a fully automated replacement of the ceiling panel 6th moves in the edge area of the ceiling panel 6th under-reaching lifting element 11 , which is formed in the embodiment of the protective tube, up to the ceiling plate 6th in such a way that they are on the lid 2 or at the gas inlet element 4th holding fastening means can be released automatically, as is proposed, for example, in the prior art mentioned at the beginning. Then the ceiling tile 6th by lowering the lifting element 11 brought into a removal position in which they are by means of a through the loading opening 18th in the interior 22nd engaging gripper arm from the interior 22nd can be removed. The attachment of a replaced ceiling plate 6th on the lid 2 or gas inlet element 4th takes place in reverse order. The ceiling tile 6th is on the lifting element 11 filed. The lifting element 11 is raised to the ceiling plate 6th or the bead 14th at the gas inlet element 4th or on the lid 2 is present. The fastening means are then brought into a fastening position. Additional centering means can be provided with which the ceiling plate 6th can be brought into a centered position. The centering means can, however, also be formed by the fastening means.

To the ceiling tile 6th semi-automatically replacing the lid 2 in the in 4th shown first open position raised, in which the cover in particular with the lifting element 11 about 10 to 30 mm above an opening edge 24 ' is arranged. In this first open position, C-shaped brackets 19th at the one with screws 20th (please refer 6th ) on a fastening section 21 of the lid 2 attached ceiling plate 6th appropriate. Then the lid 2 in the in 5 Brought illustrated second open position. Alternatively, the lid 2 but also directly into the in the 5 Open position shown are brought to there by the C-shaped brackets 19th to attach formed temporary fasteners.

the 6th shows how the above screws 20th with which the ceiling tile 6th permanent on the lid 2 are attached, can be solved in the second open position. The lid 2 becomes with the only with the brackets 19th held ceiling plate 6th lowered to the first open position. Previously, the protective tube 11 , which in this embodiment has the function of a lifting element, brought into a raised assembly position, in which the upper edge of the lifting element 11 the ceiling tile 6th supports. The brackets 19th are removed so that those in the 8th operating position shown is reached in which the ceiling plate 6th only from the lifting element 11 will be carried. The lid 2 can be held in this position by further holding means, not shown.

By lowering the lifting element 11 will the in the 9 Reached operating position shown in which the ceiling plate 6th lies in a plane in which the loading opening 18th so that the ceiling tile 6th by a shift in its plane of extension by means of a gripper arm, not shown, through the loading opening 18th from the interior 22nd can be taken.

A cleaned ceiling tile is done in essentially the reverse order 6th on the lid 2 attached. A ceiling plate is required for this 6th in the interior 22nd of the housing 1 brought an operating position according to approximately 10 having. The ceiling tile 6th is according to 9 on the lifting element 11 hung up. The lifting element 11 will be in the 8th shown first open position raised in which the ceiling plate 6th at the gas inlet element 4th or on the lid 2 is present. There will be those in the 7th temporary fasteners shown 19th attached to the ceiling tile 6th on the lid 2 keep. Any necessary centering can be carried out. The lid 2 is in the in the 6th shown second open position raised in which the screws 20th or other fastening means are attached with which the ceiling plate 6th permanent on the lid 2 is attached. Alternatively, the centering of the ceiling plate 6th but also with the permanent fasteners 20th respectively.

The brackets 19th can be removed. But it is also possible to use the lid 2 previously in the in the 4th Lower the position shown to the clamps in this position 19th to remove. Then the lid 2 in the in the 3 shown closed position lowered. The lifting element 11 is placed in a lowered order. In this can a new susceptor 5 through the loading opening 18th in the interior 22nd be brought where it is on the lifting element 11 is put on.

the 11 shows in a representation according to 1a a variant of the invention in which the edge of the ceiling plate 6th from an upper portion of an annular gas outlet member 3 can be worn. The gas outlet organ 3 can not only depend on the one in the 2 shown lowered position are lowered. The gas outlet organ 3 can also be found in the 1 Process position shown are brought into a raised position, not shown, in which it is over the edge 24 ' protrudes so as to the ceiling tile 6th to bring in a raised position.

the 1 and 1a show an annular ridge formed from the underside of the lid 25th , which is integrally formed with the same material as the cover plate made of metal. This ring bridge 25th has a radially outwardly facing surface that abuts one surface of the wall of the housing 1 is present. When the lid is closed, the ring web protrudes 25th into the opening 24 into it.

The ring bridge 25th surrounds the gas inlet element 4th . The ring bridge 25th forms a circular receiving chamber in which the touching the underside of the lid 2 fixed gas inlet member 4th rests. An outer edge section 26th of the gas inlet organ 4th , which is preferably from the gas outlet plate 21 is made of the same material, has a radially outwardly facing wall on the radially inwardly facing wall of the annular web 25th is present. The height of the ring land 25th preferably corresponds to the height of the gas inlet element 4th so that the process chamber 23 facing surface of the gas inlet member 4th with the surface of the ring web pointing in the axial direction 25th runs flush.

the 1a shows that the gas inlet organ 4th facing surface of the ceiling panel 6th runs diagonally in the edge area, so that the material thickness of the ceiling panel 6th Reduced wedge-shaped at the edges. The bead already described above extends into this area 14th that is in contact with the gas inlet element 4th or the gas outlet plate 21 is present. In the exemplary embodiment, the circular bead is located 14th at the outer edge section 26th at. With the bead 14th this prevents process gas, which through the gas outlet openings 17th in the gap 15th enters, laterally out of the gap 15th steps out.

The above explanations serve to explain the inventions covered by the application as a whole, which also develop the state of the art independently at least through the following combinations of features, whereby two, more or all of these combinations of features can also be combined, namely:

A CVD reactor, which is characterized in that the lifting element 11 of one or more, the susceptor 5 surrounding or supporting bodies at its edge is formed.

A method, which is characterized in that the lifting element 11 of one or more of the susceptor 5 surrounding or at its edge supporting bodies is formed.

A CVD reactor or a process, which is characterized in that the lifting element 11 on the susceptor 5 carrying support element or the susceptor 5 surrounding gas outlet member 3 is.

A CVD reactor or a process, which is characterized in that the lifting element 11 has a circular plan and / or that the lifting element 11 has the shape of a tube.

A CVD reactor or a method, which is characterized in that the fastening section 21 from one an upper opening 24 of the housing 1 sealing lid 2 is formed and the lifting element 11 can be raised into a position in which at least an upper section of the lifting element 11 over the edge 24 ' the opening 24 protrudes outwards.

A CVD reactor or a process, which are characterized in that the ceiling plate 6th with temporary and / or permanent fasteners 19th , 20th on the fastening section 21 is or is fastened and / or that the ceiling plate 6th one to the gas inlet organ 4th or to the gas outlet plate 21 pointing circumferential annular bead 14th has, which is in sealing contact with the gas inlet member 4th or the gas outlet plate 21 and / or that the lid 2 one in the opening 24 protruding ring web 25th having the gas inlet member 4th surrounds.

A CVD reactor or a method, which is characterized in that the fastening section 21 a gas inlet member 4th is or a gas inlet element 4th surrounds, the gas inlet member 4th a multitude of gas outlet openings 17th having that in a gap 15th between the ceiling tile 6th and a gas outlet surface of the gas inlet element 4th open out, with the ceiling tile 6th Gas passage openings 16 having.

A CVD reactor or a process, characterized in that the gas outlet element 3 from one in the path of movement of the susceptor 5 or the ceiling plate 6th lying process position can be moved into a lowered position.

A CVD reactor or a method, which is characterized in that the fastening section 21 one an opening 24 of the housing 1 sealing lid 2 is assigned, and for mounting the ceiling plate 6th the lid 2 before or when lifting the ceiling panel 6th is brought into a first open position, and after lifting that of the lifting element 11 worn ceiling panel 6th with first fasteners 19th on the lid 2 is attached, and then after lifting the lid 2 into a second open position, during which the ceiling plate is 6th from the lifting element 11 separates, with second fastening means 20th on the lid 2 is attached and / or that for removing the ceiling plate 6th first the lid 2 is brought into a first open position, in the first fastening means 19th on the lid 2 be attached, and after lifting the lid 2 in a second open position, second fastening means 20th and then the lid 2 is brought back into the first open position in which the ceiling panel 6th on the lifting element 11 rests, in this position the first fastening means 19th removed.

All the features disclosed are essential to the invention (individually, but also in combination with one another). The disclosure of the application hereby also includes the full content of the disclosure content of the associated / attached priority documents (copy of the previous application), also for the purpose of including features of these documents in the claims of the present application. The subclaims characterize, even without the features of a referenced claim, with their features independent inventive developments of the prior art, in particular in order to make divisional applications on the basis of these claims. The invention specified in each claim can additionally have one or more of the features provided in the above description, in particular provided with reference numbers and / or specified in the list of reference numbers. The invention also relates to design forms in which some of the features mentioned in the above description are not implemented, in particular insofar as they are recognizable for the respective purpose or can be replaced by other technically equivalent means.

List of reference symbols

1

casing

2

lid

3

Gas outlet member

4th

Gas inlet element

5

Susceptor

6th

Ceiling plate

7th

Heating device

8th

shaft

9

Lifting device, outlet pipe

10

Lifting device

11

Lifting element, protective tube

12th

Carrier plate

13th

carrier

14th

bead

15th

gap

16

Gas passage opening

17th

Gas outlet opening, gas distribution chamber

18th

Loading opening

19th

Retaining clip, fastening means

20th

Screw, fasteners, threaded element

21

Gas outlet plate, fastening section

22nd

inner space

23

Process chamber

24

opening

24 '

Edge of the opening

25th

Ring bridge

26th

Outer edge section

QUOTES INCLUDED IN THE DESCRIPTION

This list of the documents listed by the applicant was generated automatically and is included solely for the better information of the reader. The list is not part of the German patent or utility model application. The DPMA assumes no liability for any errors or omissions.

Patent literature cited

• DE 102012110125 A1 [0002]
• DE 102019117479 A1 [0002]
• WO 2007/060143 A1 [0002]
• JP 5721132 B2 [0002]
• DE 102007027704 A1 [0005]

Claims (10)

CVD reactor with a housing (1), with a susceptor (5) delimiting a process chamber (23) at the bottom, and with a cover plate (6) delimiting the process chamber (23) at the top, the cover plate (6) by means of one of a lowered position can be lifted into a mounting position lifting element (11) up to a contact position on a fastening section (21), to which fastening section (21) the cover plate (6) can be fastened to the housing (1), characterized in that the lifting element ( 11) is formed by one or more bodies surrounding the susceptor (5) or supporting it at its edge. Method for handling a cover plate (6) delimiting a process chamber (23) of a CVD reactor and arranged above a susceptor (5), comprising the following steps: 1. Placing the cover plate (6) on a lifting element (11) arranged in the housing (1) ); 2. Lifting the lifting element (11) carrying the ceiling plate (6) into an assembly position; 3. Attaching the ceiling plate (6) to a fastening section (21) of the housing (1); 4. Lowering the lifting element (11) into a lowered position; and / or 5. lifting the lifting element (11) from a lowered position into an assembly position; 6. Detaching the cover plate (6) from a fastening section (21) of the housing (1); 7. Lowering of the lifting element (11) carrying the ceiling plate (6) into the lowered position; 8. Removing the cover plate (6) from the lifting element (11), characterized in that the lifting element (11) is formed by one or more bodies surrounding the susceptor (5) or supporting them at its edge. CVD reactor or method according to one of the preceding claims, characterized in that the lifting element (11) is a support element carrying the susceptor (5) or a gas outlet element (3) surrounding the susceptor (5). CVD reactor or method according to one of the preceding claims, characterized in that the lifting element (11) has an annular outline and / or that the lifting element (11) has the shape of a tube. CVD reactor or method according to one of the preceding claims, characterized in that the fastening section (21) is formed by a cover (2) closing an upper opening (24) of the housing (1) and the lifting element (11) is in one position can be raised, in which at least an upper section of the lifting element (11) protrudes outwards over the edge (24 ') of the opening (24). CVD reactor or method in particular according to one of the preceding claims, characterized in that the cover plate (6) can be or is fastened to the fastening section (21) with temporary and / or permanent fastening means (19, 20) and / or that the cover plate ( 6) has a circumferential annular bead (14) pointing towards the gas inlet element (4) or towards the gas outlet plate (21), which rests in sealing contact with the gas inlet element (4) or the gas outlet plate (21) and / or that the cover (2) has a Opening (24) has a protruding ring web (25) which surrounds the gas inlet element (4). CVD reactor or method according to one of the preceding claims, characterized in that the fastening section (21) is a gas inlet element (4) or surrounds a gas inlet element (4), the gas inlet element (4) having a plurality of gas outlet openings (17) which open into a gap (15) between the cover plate (6) and a gas outlet surface of the gas inlet element (4), the cover plate (6) having gas passage openings (16). CVD reactor with a housing (1), with a susceptor (5) delimiting a process chamber (23) at the bottom, with a cover plate (6) delimiting the process chamber (23) at the top, and with a gas outlet member surrounding the susceptor (5) (4), wherein the housing (1) has a loading opening (18) through which the susceptor (5) or the cover plate (6) with a movement that takes place in the direction of its surface extension into the interior (22) of the Housing (1) can be brought, characterized in that the gas outlet element (3) can be displaced from a process position lying in the movement path of the susceptor (5) or the cover plate (6) into a lowered position. Method according to one of the Claims 2 until 7th , characterized in that the fastening section (21) is assigned to a cover (2) which closes an opening (24) in the housing (1), and for mounting the cover plate (6) the cover (2) before or when the cover plate is lifted ( 6) is brought into a first open position, and after lifting the cover plate (6) carried by the lifting element (11) is fastened to the cover (2) with first fastening means (19), and then after lifting the cover (2) into a second open position, during which the cover plate (6) separates from the lifting element (11), with second fastening means (20) is fastened to the cover (2) and / or that, in order to remove the cover plate (6), the cover (2) is first brought into a first open position in which the first fastening means (19) are fastened to the cover (2) , and after lifting the cover (2) into a second open position, second fastening means (20) are released and then the cover (2) is brought back into the first open position in which the cover plate (6) rests on the lifting element (11) , in this position the first fastening means (19) are removed. CVD reactor or method, characterized by one or more of the characterizing features of one of the preceding claims.

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