WO2021114409A1 - 一种黑色光刻胶及其制备方法、显示面板 - Google Patents

一种黑色光刻胶及其制备方法、显示面板 Download PDF

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WO2021114409A1
WO2021114409A1 PCT/CN2019/128791 CN2019128791W WO2021114409A1 WO 2021114409 A1 WO2021114409 A1 WO 2021114409A1 CN 2019128791 W CN2019128791 W CN 2019128791W WO 2021114409 A1 WO2021114409 A1 WO 2021114409A1
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photoresist
dye
black
display panel
black photoresist
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English (en)
French (fr)
Inventor
于晓平
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TCL China Star Optoelectronics Technology Co Ltd
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TCL China Star Optoelectronics Technology Co Ltd
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Priority to US16/627,804 priority Critical patent/US20210333662A1/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136222—Colour filters incorporated in the active matrix substrate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
    • C09K2323/03—Viewing layer characterised by chemical composition
    • C09K2323/031—Polarizer or dye
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix

Definitions

  • the present invention relates to the field of display technology, in particular to a black photoresist, a preparation method thereof, and a display panel.
  • Contrast is one of the important indicators for evaluating the image quality performance of a liquid crystal display (LCD).
  • the reflectivity of the display panel will affect the contrast of the screen, as shown below, L on , L off and R amibent represent the bright state of the display panel and the dark state brightness of the display panel respectively
  • ambient brightness RL represents the reflectivity of the display panel.
  • L on , L off and R amibent represent the bright state of the display panel and the dark state brightness of the display panel respectively
  • ambient brightness RL represents the reflectivity of the display panel.
  • To increase the contrast of the display panel one can start from two aspects: 1) increase the brightness Lon of the display panel, and 2) reduce the reflectivity R L of the display panel.
  • Contrast (L on +L ambient* R L )/(L off +L ambient* R L )
  • the black matrix layer in the color filter substrate of the display panel has a strong light scattering property, which causes part of the light to be reflected and reduces the picture quality of the display panel.
  • the invention provides a black photoresist, a preparation method thereof, and a display panel, which can solve the problem of poor display contrast of the existing display panel due to the strong light scattering of the black matrix layer.
  • a technical solution adopted by the present invention is to provide a black photoresist.
  • the black photoresist includes:
  • the dyes include carbon black particles and organic dyes with a molecular weight of less than 1,000.
  • the organic dyes include perylene dimer dyes.
  • R includes at least one of the following structures
  • R includes at least one of a and d, a and e, b and d, c and d, and c and e.
  • the size of the carbon black particles is less than 1 micron.
  • the mass fraction of the dye in the black photoresist is greater than 20%.
  • a technical solution adopted by the present invention is to provide a display panel, the display panel including:
  • the color filter substrate is arranged corresponding to the array substrate;
  • the liquid crystal layer is sandwiched between the array substrate and the color filter substrate;
  • the light-shielding structure in the display panel is made of the black photoresist.
  • the light shielding structure includes a black matrix layer.
  • a technical solution adopted by the present invention is to provide a method for preparing a black photoresist, wherein the method includes:
  • the dye includes carbon black particles and organic dyes with a molecular weight of less than 1,000.
  • this application adds a small molecular weight organic dye to the black photoresist. Due to its small molecular weight, the light scattering ability is poor, the reflected light is reduced, and the display contrast of the display panel can be improved. , And provide a better viewing experience.
  • FIG. 1 is a schematic structural diagram of an embodiment of a black photoresist according to the present application
  • FIG. 2 is a schematic structural diagram of a first embodiment of a display panel of the present application
  • FIG. 3 is a schematic structural diagram of a second embodiment of a display panel according to the present application.
  • FIG. 4 is a schematic structural diagram of a third embodiment of a display panel according to the present application.
  • FIG. 5 is a schematic structural diagram of an embodiment of a display device according to the present application.
  • FIG. 6 is a schematic flowchart of an embodiment of a method for preparing a black photoresist according to the present application.
  • FIG. 1 is a schematic structural diagram of a first embodiment of a black photoresist of the present application.
  • the black photoresist includes: a photoresist reactive monomer; a dye, and the dye includes carbon black particles and a molecular weight. Organic dyes less than 1000.
  • an organic dye with a small molecular weight is added to the black photoresist. Due to its small molecular weight, its ability to scatter light is poor, and the reflected light is reduced, which can improve the display contrast of the display panel, thereby providing better The viewing experience.
  • the photoresist monomer is the main component of the black photoresist, and the photoresist is obtained through polymerization reaction.
  • the dye can make the photoresist have a corresponding color.
  • the dye is a black dye, which may specifically include carbon black particles and organic dyes with a molecular weight of less than 1,000.
  • the performance of the photoresist is closely related to the uniformity of its color. In order to make the photoresist reactive monomer and the dye be fully mixed, sufficient stirring can be performed during the preparation process or a dispersant can be added to improve the uniformity of the mixing. Further, a better mixing effect is not obtained, and the size of the carbon black particles needs to be uniform, that is, the particle size distribution of the carbon black particles is relatively concentrated.
  • the size of the carbon black particles has a certain influence on the preparation process and performance of the black photoresist.
  • the size of the carbon black particles is less than 1 micrometer, such as 0.1 micrometer, 0.3 micrometer, 0.5 micrometer, 0.7 micrometer or 0.9 micrometer.
  • the size of the carbon black particles is 0.3 ⁇ m-0.5 ⁇ m.
  • the mass fraction of the dye in the black photoresist is greater than 20%, such as 25%, 30%, 60%, 80%, or 90%.
  • the specific addition amount is related to the properties of the dye and the property requirements of the black photoresist, and is not specifically limited here. Further, under the premise of ensuring the new performance of the product, minimizing the amount of the dye, especially the organic dye, is not only beneficial to simplifying the preparation process of the photoresist, but also beneficial to reducing the production cost of the photoresist.
  • the reactive monomer must have heat resistance to avoid damage to its structure due to high-temperature baking during the process of preparing the light-shielding layer, thereby affecting the use effect.
  • the reactive monomer may be a polyimide reactive monomer.
  • the organic dyes need to have better solubility, heat resistance and absorbance properties in common solvents (eg, monomethyl ether propylene glycol acetate (PGMEA)).
  • the organic dye may be a perylene dimer dye or a mixture of the dye and carbon black, wherein the perylene dimer has excellent heat resistance, and its temperature resistance can reach 320 degrees Celsius.
  • the organic dyes include perylene dimer dyes; the structural formula of the perylene dimer is:
  • R includes at least one of the following structures
  • the two Rs in the structural formula of the perylene dimer may have the same structure or different structures.
  • the two structures include at least one of a and d, a and e, b and d, c and d, and c and e, and any combination of the above can further improve the shading of the black photoresist effect.
  • FIG. 2 is a schematic structural diagram of a first embodiment of a display panel of the present invention.
  • the display panel 1 includes:
  • the array substrate 10; the color filter substrate 20 is set corresponding to the array substrate 10; the liquid crystal layer 30 is sandwiched between the array substrate 10 and the color filter substrate 20; wherein, the light-shielding in the display panel 1
  • the structure 40 is made of the aforementioned black photoresist. Further, the light shielding structure 40 includes a black matrix layer. The black matrix is arranged between the color resist blocks of different colors to shield the mixed color light between the color resist blocks of different colors. Further, the light shielding structure 40 includes a black matrix layer.
  • FIG. 3 is a schematic structural diagram of a second embodiment of a display panel of the present invention.
  • the display panel 1 includes a first substrate 300 and a color resist layer 400 disposed on the first substrate 300.
  • the color resist layer 400 includes color resist blocks 41 of different colors and a black matrix 42 arranged between the color resist blocks 41 of different colors.
  • the black matrix 42 is used to block the color mixing between the color resist blocks 41 of different colors.
  • the first substrate 300 may be an array substrate or a color filter substrate.
  • the black matrix is arranged on the array substrate 10.
  • the color block 41 includes a red color block, a green color block and a blue color block.
  • a white color block can also be provided according to product requirements.
  • a first metal layer, a first insulating layer, a semiconductor layer, and a second metal layer are sequentially arranged between the color group layer 400 and the first substrate 300.
  • a reflective barrier layer is provided on the metal layer close to the viewer to reduce the reflectivity of the array substrate to ambient light.
  • the array substrate faces the viewer, and when the first substrate 400 is an array substrate, it is between the first metal layer and the base substrate, and/or between the second metal layer and the semiconductor layer
  • the reflection blocking layer is provided.
  • the color filter substrate faces the viewer, and when the first substrate 400 is an array substrate, it is between the first metal layer and the first insulating layer, and/or the second metal layer and the
  • the reflective barrier layer is arranged between the color resist layers.
  • FIG. 4 is a schematic structural diagram of a third embodiment of a display panel of the present invention.
  • the display panel 1 in this embodiment adopts a film-spraying permit method to travel, including a first substrate 500 and a first substrate
  • the color resist layer 600 on the first substrate 500 includes a non-blocking wall 62 for blocking the mixed color light between the color resist blocks 61 of different colors.
  • the wall material (bank material) of the inkjet printing is made of the black photoresist described in this application.
  • a specially designed gray-scale photomask is used to make the surface of the retaining wall material present a regular uneven microstructure, changing the hydrophilicity and hydrophobicity of the retaining wall material, As a result, the sides and surfaces of the retaining wall material exhibit different hydrophilic and hydrophobic properties, and it is ensured that the inkjet droplets will not overflow.
  • a technical solution adopted by the present invention is to provide a display device.
  • FIG. 5 is a schematic structural diagram of an embodiment of a display device according to the present application, in which the display device 1000 includes the display panel 1.
  • the display device 1000 includes a fixed display device and a mobile display device.
  • the fixed display device includes, but is not limited to, a TV, a desktop computer monitor, etc., especially a fixed display device with a narrow frame and no frame.
  • the mobile display device includes, but is not limited to, mobile phones, tablet computers, smart watches, VR glasses, etc.
  • a technical solution adopted by the present invention is to provide a method for preparing black photoresist.
  • FIG. 6 is a flowchart of an embodiment of a method for preparing a black photoresist according to the present application. The method includes the steps:
  • the dye for preparing the photoresist needs to be fully dissolved in order to avoid the poor light-shielding performance of the prepared photoresist due to uneven color.
  • the dye needs to be fully dispersed.
  • the dye may be mechanically stirred, or a dispersant may be added. Specifically, the stirring time and rotation speed can be set according to the amount and properties of the dye, so there is no specific limitation.
  • the dispersant may be a resin-based dispersant, and further, the dispersant is an alkali-soluble dispersant.
  • the photoresist reactive monomer and the dye solution are fully mixed.
  • the dye may be mechanically stirred or a dispersant may be added.
  • the stirring time and rotation speed can be set according to the amount and properties of the dye, so there is no specific limitation.
  • the dispersant may be a resin-based dispersant, and further, the dispersant is an alkali-soluble dispersant.
  • the size of the carbon black particles needs to be uniform, that is, the particle size distribution of the carbon black particles is relatively concentrated.
  • the display panel prepared using the photoresist reduces the light reflected by the black matrix and other light-shielding structures, which can improve The display contrast of the display panel to provide a better viewing experience
  • the black photoresist also includes photoinitiators, solvents, additives, etc., wherein the photoinitiators are used to initiate the polymerization of the photoresist monomers.
  • the type and amount of the photoinitiator are closely related to the type of the photoresist monomer, and there is no specific limitation here.
  • the black photoresist generally needs to go through the stages of coating, pre-baking, exposure, development, and post-baking. According to different product requirements, the above-mentioned preparation process and specific operating parameters are different, and there is no specific limitation here.
  • this application adds organic dyes with a small molecular weight to the black photoresist. Due to its small molecular weight, it has poor light scattering ability and reduced reflected light, which can improve the display contrast of the display panel, and thus Provide a better viewing experience.

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Abstract

一种黑色光刻胶及其制备方法、显示面板（1），其中黑色光刻胶包括：光刻胶反应单体和染料，染料包括炭黑颗粒和分子量小于1000的有机染料。黑色光刻胶减少对光的散射，进而提高显示对比度，有利于提高显示装置（1000）的显示效果。

Description

一种黑色光刻胶及其制备方法、显示面板 技术领域
本发明涉及显示技术领域，特别是涉及一种黑色光刻胶及其制备方法、显示面板。
背景技术
对比度是评估液晶显示屏(LCD)的画质表现的重要指标之一。在真实使用场景中，由于周围环境光的影响，显示面板的反射率会影响画面的对比度，如下所示，L on、L off和R amibent分别表示显示面板的亮态、显示面板的暗态亮度和环境亮度，R L表示显示面板的反射率。想要提高显示面板的对比度可以从两个方面入手：1)提高显示面板的亮态亮度Lon，2)降低显示面板的反射率R L。
对比度＝(L on+L ambient*R L)/(L off+L ambient*R L)
技术问题
而现有技术中，显示面板中彩膜基板中的黑矩阵层对光的散射性较强，导致部分光反射出来，降低显示面板的画面品质。
因此，现有技术有待进一步改进。
技术解决方案
本发明提供一种黑色光刻胶及其制备方法、显示面板，能够解决现有的显示面板因黑矩阵层对光的散射性较强导致的显示对比度差的问题。
为解决上述技术问题，本发明采用的一个技术方案是：提供一种黑色光刻胶。
所述黑色光刻胶包括：
光刻胶反应单体；
染料，所述染料包括炭黑颗粒和分子量小于1000的有机染料。
其中，所述有机染料包括苝二聚体染料。
其中，所述苝二聚体的结构式为：
Figure PCTCN2019128791-appb-000001
其中，R包括下述结构中的至少一种；
Figure PCTCN2019128791-appb-000002
其中，R至少包括a与d、a与e、b与d、c与d及c与e中的一组。
其中，所述炭黑颗粒的尺寸小于1微米。
其中，所述黑色光刻胶中所述染料的质量分数为大于20％。
为解决上述技术问题，本发明采用的一个技术方案是：提供一种显示面板，所述显示面板包括：
阵列基板；
彩膜基板，与所述阵列基板对应设置；
液晶层，夹设在所述阵列基板与所述彩膜基板之间；
其中，所述显示面板中的遮光结构由所述的黑色光刻胶制成。
其中，所述遮光结构包括黑矩阵层。
为解决上述技术问题，本发明采用的一个技术方案是：提供一种黑色光刻胶的制备方法，其中，所述方法包括：
将染料进行分散得到染料溶液；
将光刻胶反应单体与所述染料溶液混合，得到所述光刻胶；
其中，所述染料包括炭黑颗粒和分子量小于1000的有机染料。
有益效果
本申请的有益效果：
区别于现有技术的，本申请在黑色光刻胶中添加了分子量较小的有机染料，由于其分子量较小，对光的散射能力差，反射出来的光减少，能够提高显示面板的显示对比度，进而提供更好的观看体验。
附图说明
图1是本申请一种黑色光刻胶一实施方式的结构示意图；
图2是本申请一种显示面板第一实施方式的结构示意图
图3是本申请一种显示面板第二实施方式的结构示意图；
图4是本申请一种显示面板第三实施方式的结构示意图；
图5是本申请一种显示装置一实施方式的结构示意图；
图6是本申请一种黑色光刻胶的制备方法一实施方式的流程示意图。
本发明的实施方式
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例， 都属于本发明保护的范围。
需要说明，本发明实施例中所有方向性指示(诸如上、下、左、右、前、后......)仅用于解释在某一特定姿态(如附图所示)下各部件之间的相对位置关系、运动情况等，如果所述特定姿态发生改变时，则所述方向性指示也相应地随之改变。
另外，在本发明中涉及“第一”、“第二”等的描述仅用于描述目的，而不能理解为指示或暗示其相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”的特征可以明示或者隐含地包括至少一个所述特征。另外，各个实施例之间的技术方案可以相互结合，但是必须是以本领域普通技术人员能够实现为基础，当技术方案的结合出现相互矛盾或无法实现时应当认为这种技术方案的结合不存在，也不在本发明要求的保护范围之内。
请参考图1，图1是本申请一种黑色光刻胶第一实施方式的结构示意图，所述黑色光刻胶包括：光刻胶反应单体；染料，所述染料包括炭黑颗粒和分子量小于1000的有机染料。
本实施方式在黑色光刻胶中添加了分子量较小的有机染料，由于其分子量较小，对光的散射能力差，反射出来的光减少，能够提高显示面板的显示对比度，进而提供更好的观看体验。
具体的，所述光刻胶单体是所述黑色光刻胶中的主要成分，通过发生聚合反应得到光刻胶。所述染料能够使所述光刻胶具有对应的颜色。在本实施方式中，染料为黑色染料，具体可以包括炭黑颗粒和分子量小于1000的有机染料。而光刻胶的性能与其颜色的均匀性密切相光，为使得所述光刻胶反应单体和所述染料充分混合，可以在准备过程中进行充分搅拌或加入分散剂提高混合的均匀性。进一步，未获得更好的混匀效果，需要所述炭黑颗粒的尺寸均匀，也即所述炭黑颗粒的粒度分布较为集中。
具体的，所述炭黑颗粒的尺寸对所述黑色光刻胶的制备过程及性能有一定影响。采用颗粒较小，如，几纳米或者更早，不仅成本较高且在生产过程中会产生浮尘，危害操作者健康。但如果所述炭黑颗粒 尺寸过大则不利于其在所述黑色光刻胶体系中均匀分散。因此，所述炭黑颗粒的尺寸小于1微米，如，0.1微米、0.3微米、0.5微米、0.7微米或0.9微米等。在一个实施方式中，为避免所述炭黑颗粒的尺寸影响所述黑色光刻胶的混匀效果，所述炭黑颗粒的尺寸为0.3微米-0.5微米。
在本实施方式中，所述染料在所述黑色光刻胶中的质量分数为大于20％，如，25％、30％、60％、80％或90％等。其具体添加量与所述染料性质及对所述黑色光刻胶的性质要求有关，此处不做具体限定。进一步的，在保证产品新能的前提下，尽量减少所述染料用量，尤其是有机染料，不仅有利于简化所述光刻胶的制备过程，也有利于降低所述光刻胶的生产成本。
在本实施方式中，所述反应单体须具有耐热性，避免在制备遮光层的过程中因高温烘烤破坏其结构，进而影响使用效果。如，所述反应单体可以为聚酰亚胺反应单体。为简化工艺并获得较好的效果，所述有机染料需在常用的溶剂(如，单甲基醚丙二醇乙酸酯(PGMEA))中具有较好的溶解性、耐热性及吸光度性质。相应的，所述有机染料可以为苝二聚体染料或者该染料与炭黑的混合物，其中，所述苝二聚体的耐热性优异，其耐受温度可达到320摄氏度。
具体的，所述有机染料包括苝二聚体染料；所述苝二聚体的结构式为：
Figure PCTCN2019128791-appb-000003
其中，R包括下述结构中的至少一种；
Figure PCTCN2019128791-appb-000004
更进一步的，所述苝二聚体的结构式中的两个R可以是相同的结构或不同的结构。当二者结构不同时，其至少包括a与d、a与e、b与d、c与d及c与e中的一组，且采用上述任意组合能够进一步提高所述黑色光刻胶的遮光效果。
为解决上述技术问题，本发明采用的一个技术方案是：提供一种显示面板。请参考图2，图2是本发明一种显示面板第一实施方式的结构示意图，所述显示面板1包括：
阵列基板10；彩膜基板20，与所述阵列基板10对应设置；液晶层30，夹设在所述阵列基板10与所述彩膜基板20之间；其中，所述显示面板1中的遮光结构40由所述的黑色光刻胶制成。进一步的，所述遮光结构40包括黑矩阵层。所述黑矩阵设置在不同颜色的色阻块之间，以遮挡不同颜色的色阻块之间的混色光。进一步的，所述遮光结构40包括黑矩阵层。
进一步的，请参考图3，图3是本发明一种显示面板第二实施方式的结构示意图，所述显示面板1包括第一基板300和设置在所述第一基板300上的色阻层400，所述色阻层400包括不同颜色色阻块41及设置在不同颜色的色阻块41之间的黑矩阵42，所述黑矩阵42用以遮挡不同颜色的色阻块41之间的混色光。具体的，所述第一基板300可以为阵列基板，也可以为彩膜基板，对于COA型面板，所述黑矩阵设置在阵列基板10上。所述色阻块41包括红色色阻块、绿色色阻块和蓝色色阻块，当然也可以根据产品需要设置白色色阻块。
当让，所述色组层400与所述第一基板300之间还依次设有第一金属层、第一绝缘层、半导体层及第二金属层。靠近观看者的所述金 属层上设置反射阻挡层，以降低所述阵列基板对环境光的反射率。当阵列基板朝向光看者时，所述第一基板400为阵列基板时，在所述第一金属层与衬底基板之间，和/或所述第二金属层与所述半导体层之间设置所述反射阻挡层。当彩膜基板朝向光看者时，所述第一基板400为阵列基板时，在所述第一金属层与所述第一绝缘层之间，和/或所述第二金属层与所述色阻层之间设置所述反射阻挡层。
更进一步的，请参考图4，图4是本发明一种显示面板第三实施方式的结构示意图，本实施方式中的显示面板1采用喷膜答应方式行程，包括第一基板500和设置在所述第一基板500上的色阻层600，所述色阻层600包括不挡墙62用以遮挡不同颜色的色阻块61之间的混色光。
所述喷墨打印的所述挡墙材料(bank材料)采用本申请所述的黑色光刻胶制成。在使用黄光制程制作所述挡墙材料时，采用特殊设计的灰阶光罩，使得所述挡墙材料的表面呈现出有规律的凹凸不平的微结构改变所述挡墙材料的亲疏水性，从而使得所述挡墙材料的侧面和表面表现出不同的亲疏水特性，保证喷墨液滴不会溢出。
为解决上述技术问题，本发明采用的一个技术方案是：提供一种显示装置。
请参考图5，图5是本申请一种显示装置一实施方式的结构示意图，其中，所述显示装置1000包括所述显示面板1。所述显示装置1000包括固定显示装置和移动显示装置。所述固定显示装置包括但不限于电视，台式机显示器等，尤其是窄边框和无边框的固定显示装置。所述移动显示装置包括但不限于手机、平板电脑、智能手表及VR眼镜等。
为解决上述技术问题，本发明采用的一个技术方案是：提供一种黑色光刻胶的制备方法。
请参考图6，图6是本申请一种黑色光刻胶的制备方法一实施方式的流程图，所述方法包括步骤：
S100、将染料进行分散得到染料溶液。
在所述步骤S100中，制备光刻胶的染料需要充分溶解，才能避免制备的光刻胶因颜色不均匀导致遮光性能差。在本实施方式中，需要对所述染料进行充分分散，可以对所述染料进行机械搅拌，也可以加入分散剂。具体的，搅拌时间和转速可根据所述染料的用量和性质进行设定，故此不做具体限定。所述分散剂可以是树脂类分散剂，进一步，所述分散剂为碱可溶分散剂。
S200、将光刻胶反应单体与所述染料溶液混合，得到所述光刻胶；其中，所述染料包括炭黑颗粒和分子量小于1000的有机染料。
在所述步骤S200中，将所述光刻胶反应单体与所述染料溶液充分混合，为保证混合效果，可以对所述染料进行机械搅拌，也可以加入分散剂。具体的，搅拌时间和转速可根据所述染料的用量和性质进行设定，故此不做具体限定。所述分散剂可以是树脂类分散剂，进一步，所述分散剂为碱可溶分散剂。进一步的，为避免所述染料与所述光刻胶反应单体混合不充分，需要所述炭黑颗粒的尺寸均匀，也即所述炭黑颗粒的粒度分布较为集中。
在本实施方式中，由于所述染料中包括分子量较小的有机染料，对光的散射能力差，使用所述光刻胶制备的显示面板由黑矩阵等遮光结构反射出来的光减少，能够提高显示面板的显示对比度，进而提供更好的观看体验
当然，所述黑色光刻胶还包括光引发剂、溶剂及添加剂等，其中，所述光引发剂用于引发所述光刻胶单体的聚合。显然，所述光引发剂的种类和用量与所述光刻胶单体的种类密切相关，此处不做具体限定。此外，所述黑色光刻胶一般需要经过涂布、预烘烤、曝光、显影及后烘烤等阶段，根据产品的需求不同，上述制备过程及具体操作参数不同，此处不做具体限定。
本实施方式的技术好处和技术细节已经在前文进行了详细阐释，故此处不再赘述。
综上所述，本申请在黑色光刻胶中添加了分子量较小的有机染料，由于其分子量较小，对光的散射能力差，反射出来的光减少，能够提 高显示面板的显示对比度，进而提供更好的观看体验。
以上所述仅为本发明的实施方式，并非因此限制本发明的专利范围，凡是利用本发明说明书及附图内容所作的等效结构或等效流程变换，或直接或间接运用在其他相关的技术领域，均同理包括在本发明的专利保护范围内。

Claims (9)

  1. 一种黑色光刻胶，其中，所述黑色光刻胶包括：
    光刻胶反应单体；
    染料，所述染料包括炭黑颗粒和分子量小于1000的有机染料。
  2. 如权利要求1所述的黑色光刻胶，其中，所述有机染料包括苝二聚体染料。
  3. 如权利要求2所述的黑色光刻胶，其中，所述苝二聚体的结构式为：
    Figure PCTCN2019128791-appb-100001
    其中，R包括下述结构中的至少一种；
    Figure PCTCN2019128791-appb-100002
  4. 如权利要求3所述的黑色光刻胶，其中，R至少包括a与d、a与e、b与d、c与d及c与e中的一组。
  5. 如权利要求1所述的黑色光刻胶，其中，所述炭黑颗粒的尺寸小于1微米。
  6. 如权利要求1所述的黑色光刻胶，其中，所述黑色光刻胶中所述染料的质量分数为大于20％。
  7. 一种显示面板，其中，所述显示面板包括：
    阵列基板；
    彩膜基板，与所述阵列基板对应设置；
    液晶层，夹设在所述阵列基板与所述彩膜基板之间；
    其中，所述显示面板中的遮光结构由权利要求1-6任一项所述的黑色光刻胶制成。
  8. 如权利要求7所述的显示面板，其中，所述遮光结构包括黑矩阵层。
  9. 一种黑色光刻胶的制备方法，其中，所述方法包括：
    将染料进行分散得到染料溶液；
    将光刻胶反应单体与所述染料溶液混合，得到所述黑色光刻胶；
    其中，所述染料包括炭黑颗粒和分子量小于1000的有机染料。
PCT/CN2019/128791 2019-12-13 2019-12-26 一种黑色光刻胶及其制备方法、显示面板 Ceased WO2021114409A1 (zh)

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