WO2021099405A1 - Soupape d'admission de gaz pour chambres de traitement sous vide - Google Patents

Soupape d'admission de gaz pour chambres de traitement sous vide Download PDF

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Publication number
WO2021099405A1
WO2021099405A1 PCT/EP2020/082566 EP2020082566W WO2021099405A1 WO 2021099405 A1 WO2021099405 A1 WO 2021099405A1 EP 2020082566 W EP2020082566 W EP 2020082566W WO 2021099405 A1 WO2021099405 A1 WO 2021099405A1
Authority
WO
WIPO (PCT)
Prior art keywords
gas
plate
gas inlet
unit
inlet valve
Prior art date
Application number
PCT/EP2020/082566
Other languages
German (de)
English (en)
Inventor
Florian Ehrne
Martin NETZER
Hanspeter Frehner
Original Assignee
Vat Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vat Holding Ag filed Critical Vat Holding Ag
Priority to US17/776,437 priority Critical patent/US20220403953A1/en
Priority to KR1020227015503A priority patent/KR20220100588A/ko
Priority to JP2022529050A priority patent/JP2023502660A/ja
Priority to CN202080079818.0A priority patent/CN114729713A/zh
Publication of WO2021099405A1 publication Critical patent/WO2021099405A1/fr

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K41/00—Spindle sealings
    • F16K41/10—Spindle sealings with diaphragm, e.g. shaped as bellows or tube
    • F16K41/12—Spindle sealings with diaphragm, e.g. shaped as bellows or tube with approximately flat diaphragm
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/02—Actuating devices; Operating means; Releasing devices electric; magnetic
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/12—Actuating devices; Operating means; Releasing devices actuated by fluid
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/12—Actuating devices; Operating means; Releasing devices actuated by fluid
    • F16K31/122—Actuating devices; Operating means; Releasing devices actuated by fluid the fluid acting on a piston
    • F16K31/1225—Actuating devices; Operating means; Releasing devices actuated by fluid the fluid acting on a piston with a plurality of pistons
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K51/00—Other details not peculiar to particular types of valves or cut-off apparatus
    • F16K51/02—Other details not peculiar to particular types of valves or cut-off apparatus specially adapted for high-vacuum installations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K37/00—Special means in or on valves or other cut-off apparatus for indicating or recording operation thereof, or for enabling an alarm to be given
    • F16K37/0025—Electrical or magnetic means
    • F16K37/0041—Electrical or magnetic means for measuring valve parameters

Definitions

  • the present invention relates to a gas inlet valve for the inlet of a process gas into a vacuum process chamber.
  • Such vacuum process chambers are used for integrated circuit (IC), semiconductor, flat panel or substrate production, the vacuum chambers being flooded with a process gas for at least some of the process steps after evacuation. Production must take place in a protected atmosphere and, if possible, without the presence of contaminating particles.
  • the evacuation takes place with a vacuum valve, which connects the vacuum process chamber with a vacuum pump and differs in its design and its technical requirements from a gas inlet valve.
  • vacuum chambers have at least one or two vacuum chamber openings through which the elements to be processed can be guided into and / or out of the vacuum chamber.
  • the highly sensitive semiconductor or liquid crystal elements sequentially run through several vacuum process chambers in which the elements are processed by means of a processing device.
  • the element can be placed on extended support pins of a lifting system, for example by means of a robot, and placed on a carrier, for example a potential plate (chuck), by lowering the support pins.
  • a lifting system for example by means of a robot
  • a carrier for example a potential plate (chuck)
  • the robot arm which typically carries the element, is then moved out of the chamber.
  • the pins can be lowered and are then separated from it, ie there is no contact between the pins and the element.
  • the chamber is usually evacuated and then filled with a process gas, whereupon the processing of the element can start.
  • Gas inlet valves are designed in particular for the defined control or regulation of the gas flow and are located, for example, within a pipe system between a vacuum process chamber (or a transfer chamber) and a gas source, the atmosphere or another vacuum process chamber.
  • the opening cross-section of such gas inlet valves is generally smaller than that of a vacuum valve.
  • gas inlet valves are used depending on the application not only to completely open and close an opening, but also to control or regulate a flow by continuously adjusting the opening cross-section between an open position and a gas-tight closed position, they are also referred to as control valves.
  • gas inlet valve for a vacuum process chamber.
  • the gas inlet valve according to the invention enables faster and more precisely controllable flooding of an evacuated vacuum process chamber with a process gas.
  • the present invention relates to a gas inlet valve for the controlled inlet of a process gas into a vacuum process chamber, wherein the gas inlet valve has: a gas flow unit with a gas inlet, a gas outlet and an internal volume that has free access to Has the gas inlet and the gas outlet, the gas flow unit having a sealing surface in the inner volume, an adjusting device with an adjusting unit, the adjusting unit protruding into the inner volume and being adjustably mounted outside the gas flow unit in the adjusting device, the adjusting unit having a plate which is inside the inner volume is arranged, wherein the plate can be brought into a closed position by means of the adjusting device, in which the plate rests on the sealing surface and thus prevents gas flow, and wherein the plate can be brought into an open position by means of the adjusting device, in which the plate is spaced from the sealing surface is and thus enables a gas passage, a first flexible sealing element which is attached to the gas passage unit and to the adjustment unit and seals the adjustment device with respect to the internal volume, and
  • the gas inlet valve can have a second flexible sealing element, wherein the first and the second flexible sealing element embody two flexible sealing elements which are each attached to the gas flow unit and to the adjustment unit and thus seal the internal volume.
  • the present invention also relates to a gas inlet valve for the controlled inlet of a process gas into a vacuum process chamber, the gas inlet valve having: a gas flow unit with a gas inlet, a gas outlet and an internal volume that has free access to the gas inlet and the gas outlet, the gas flow unit has a sealing surface in the inner volume, an adjusting device with an adjusting unit, the adjusting unit protruding into the inner volume and being adjustably mounted outside the gas flow unit in the adjusting device, the adjusting unit having a plate which is arranged inside the inner volume, the plate being arranged by means of the adjusting device can be brought into a closed position in which the plate rests on the sealing surface and thus prevents gas flow, and the plate by means of the Adjusting device can be brought into an open position in which the plate is spaced from the sealing surface and thus enables gas to flow through, two flexible sealing elements which are each attached to the gas flow unit and to the adjusting unit and thus seal the internal volume, and a position determining unit that is attached to or is
  • the first and / or the second flexible sealing element can be attached to the plate and the gas passage unit.
  • One of the sealing elements or both sealing elements are designed in one embodiment as a membrane, in particular as a metal membrane.
  • at least one of the sealing elements as well as the side of the plate opposite the respective sealing element have a similarly large, in particular exactly the same pressure application area, whereby at least essentially a pressure force cancellation is achieved that makes a movement of the plate independent of the prevailing pressure. This allows the valve to be adjusted more quickly.
  • the plate In the closed position, the plate is pressed against the sealing surface in particular by a bias, the bias at least partially emanating from at least one of the sealing elements and / or at least partially from a biasing device which is arranged outside the inner volume.
  • at least one of the sealing elements has a spring stiffness and can counteract the force of the prevailing pressure by preloading.
  • the pretensioning device is comprised by the adjusting device.
  • the abovementioned contact surfaces and / or the spring stiffness (s) of the spring element (s) can also be adapted to one another in such a way that a preload bias arises, which has an advantageous effect on the response time of the valve (e.g.
  • the plate and / or the sealing surface can have a sealing ring which is compressed in the closed position. The compression is due to the pre-tension and ensures that the gas inlet is separated from the gas outlet in a gas-tight manner.
  • the two sealing elements can be biased against one another, so that when the adjustment unit is adjusted, no or only a comparatively low resistance force arises from the sealing elements.
  • the sealing surface, the plate and the sealing elements have in particular a circular cross section, the inner volume being at least partially cylindrical, and the sealing surface being formed by a shoulder in the inner volume.
  • the cylindrical shape of the inner volume is formed in particular by the gas flow unit as the jacket surface and the sealing elements as the base surfaces, with the gas inlet and gas outlet gaining free access to the inner volume via the jacket surface. This means that the gas inlet and gas outlet each penetrate the outer surface.
  • the adjusting device can be operated electrically or pneumatically.
  • the plate divides the internal volume in the closed position into a first and a second partial internal volume, the gas inlet having free access to the first partial volume and the gas outlet having free access to the second partial volume.
  • the gas outlet in particular has free access to a vacuum process chamber and the gas inlet in particular has free access to a gas source.
  • FIG. 1 is a perspective view of an embodiment of a gas inlet valve
  • FIGS 2 and 3 show the gas inlet valve from Figure 1 in two different sectional views
  • FIG. 4 shows in detail the internal volume of the gas inlet valve
  • FIGS. 5a and 5b show a further embodiment of the invention.
  • Figures 1 to 3 show an embodiment of a gas inlet valve 1 with a gas flow unit 2, which has a gas inlet 21, a gas outlet 22 and an inner volume 23, the inner volume 23 has free access to the gas inlet 21 and to the gas outlet 22, and wherein the gas passage unit has a sealing surface 24 in the interior volume.
  • the adjusting device 3 has an adjusting unit 31 and a plate 32, the adjusting unit 31 protruding into the inner volume 23 and is adjustably mounted outside the gas flow unit 2 in the adjusting device 3, the plate being arranged inside the inner volume 23 and by means of the Adjusting device 3 can be brought into a closed position, in which the plate 32 rests on the sealing surface 24 and thus prevents the passage of gas.
  • the plate can also be brought into an open position in which the plate 32 is spaced from the sealing surface 24 and thus enables gas to flow through.
  • the gas inlet valve 1 also has two flexible sealing elements 41 and 42, which are designed as membranes in the example shown.
  • the sealing elements are each fastened to the gas flow unit 2 and to the adjustment unit 31 and thus seal the inner volume 23.
  • a position determination unit 5 is arranged on the adjustment device 3 and is set up to determine a position of the upper end of the adjustment unit 31.
  • the adjustment unit 31 has in the shown Example on several fixed interconnected elements, so that the location of the measurement (upper end of the adjustment unit 31) has a fixed local relation to the plate. This means that the position of the plate can be determined at any time and without interruption.
  • the plate 32 is firmly connected to the adjustment unit 31, as a result of which the determination of a position of the adjustment unit 31 at the same time corresponds to a position determination for the plate 32.
  • the particularly continuous or continuous determination of a plate position enables active control (and / or regulation) of the valve and thus of the gas flow to be carried out.
  • the subsequent (after the gas outlet) determination of an actual gas flow (as a controlled variable) as a function of a current valve control can be dispensed with.
  • FIG. 1 shows the gas inlet valve 1 in perspective from the outside, with a pneumatic device 6 and a control unit 7 also being provided in the example shown, by means of which the adjusting device 3 can be controlled.
  • the adjustment device 3 can be operated, for example, by means of electric motors.
  • the sealing ring can (as shown here) be embedded in the plate 32 or (in other embodiments) in the sealing surface 24. Furthermore, the sealing elements 41 and 42 can be braced against one another, so that no force acting on the adjustment unit 31 results. However, this minimizes a force counteracting the adjustment direction during the process of spacing the plate 32 away from the sealing surface 24, ie when opening the valve. This is due to the fact that one of the sealing elements approaches its basic position when the valve is opened and the other (still) stretches due to the adjustment path. This reduction on the one hand and increase on the other ideally cancel each other out, but at least minimize the resulting resistance when adjusting. Consequently, (essentially) only the prestress caused by the prestressing device (springs 91 and 92) has to be overcome when the valve is opened or closed.
  • the sealing elements are metal membranes.
  • the seats of the flexible sealing elements 41 and 42 on the adjustment unit 31 can also be made by jamming, as FIG. 4 shows.
  • the adjustment unit 31 comprises the rod 311, but also the screw 312, as well as the sleeve 313 and the plate 32.
  • the screw 312 is screwed into the rod 311, whereby on the one hand the sealing element 41 is clamped between the rod 311 and the plate 32, and on the other hand, the sealing element 42 between the plate 32 and the sleeve 313.
  • a number of other design options are known to those skilled in the art for connecting the sealing elements to the adjustment unit so that the plate in the inner volume 23 can be adjusted.
  • the first partial volume 231 is formed annularly between the lateral surface of the inner volume 23 and a lateral surface of the upper axial part of the plate 32, and is limited in the axial direction by the sealing element 41 and the front plate surface.
  • the second partial volume 232 is formed annularly between the jacket surface of the inner volume 23 and a jacket surface of the lower axial part of the plate 32, and is delimited in the axial direction by the sealing element 42 and the rear plate surface.
  • the control unit 7 is designed in particular to adjust the plate 32 in a defined manner.
  • the closed position (plate 32 is pressed against sealing surface 24) can be achieved either purely passively, ie by any pre-tensioning (pre-tensioning device and / or sealing elements), or by corresponding active adjustment of the adjustment device 3, controlled by the control unit 7.
  • An open position of the plate 32 means that the plate 32 is raised from the sealing surface 24. How far the plate 32 is raised can be defined by the adjusting device 3, which is controlled accordingly by the control unit 7.
  • the control unit 7 can also be set up to travel along defined travel paths of the plate 32.
  • the plate 32 could be lifted from the sealing surface 24 at a very low starting speed in order to then achieve a faster lifting speed from a certain distance.
  • the valve can be opened in a defined “pulsed” manner, so that the process gas can be introduced into the process chamber in pieces.
  • the position determination unit 5 is in particular continuously read out and used as feedback.
  • FIG. 5a shows a gas inlet valve 100 with an adjusting device 103, a gas flow unit 102 and a position determination unit 105.
  • This embodiment differs from the embodiments according to the preceding figures in particular in the design of the gas flow unit 102 and the sealing by means of (only) one membrane 141.
  • FIG. 5b shows a section through the gas flow unit 102.
  • a valve closure or valve disk 132 is located in the inner volume of the valve 100 arranged and linearly movable by means of the rod 131 of the adjusting device 103.
  • the valve disk 132 is fixedly connected to the rod 131.
  • the valve 100 is shown here in an open state, ie a gas or a fluid can flow through the gas inlet 121 via the internal volume to and through the gas outlet 122. In this state, the valve disk 132 is at a distance from a sealing surface 124 provided in the interior of the gas passage unit 102.
  • the valve disk 132 has a sealing element 133. It goes without saying, however, that, according to alternative embodiments, the sealing element 133 can be arranged on the sealing surface 124.
  • the position of the plate 132 can be determined directly by means of the position determination unit 105, which can determine a linear position of the rod 131 (as part of the adjustment unit).
  • the position determination unit 105 thus enables a determination of whether the valve is closed or open and a determination of how large a possible distance between sealing surface 124 and valve disk 132 or sealing element 133 is, ie how large an existing opening cross section is and thus how large a possible volume flow is current through valve 100.
  • the membrane 141 designed as a flexible sealing element, provides a flexible seal between the inner volume and the adjustment device 103.
  • the membrane 141 is connected on the one hand to the gas flow unit 102 and on the other hand to the adjustment unit, here with the plate 132 or with the rod 131.

Abstract

L'invention concerne une soupape d'admission de gaz (1) pour l'entrée contrôlée d'un gaz de traitement dans une chambre de traitement sous vide, la soupape d'admission de gaz comprenant : une unité de passage de gaz (2) ayant une entrée de gaz (21), une sortie de gaz (22) et un volume interne (23) qui a un accès libre à l'entrée de gaz et à la sortie de gaz, l'unité de passage de gaz ayant une surface d'étanchéité (24) dans le volume interne, un dispositif de réglage (3) ayant une unité de réglage (31), l'unité de réglage faisant saillie dans le volume interne et étant montée de manière à pouvoir être réglée à l'extérieur de l'unité de passage de gaz dans le dispositif de réglage, l'unité de réglage comportant une plaque (32) qui est disposée à l'intérieur du volume interne, la plaque pouvant être déplacée au moyen du dispositif de réglage dans une position fermée, dans laquelle la plaque repose sur la surface d'étanchéité et empêche donc un passage du gaz, et la plaque pouvant être déplacée au moyen du dispositif de réglage dans une position ouverte, dans laquelle la plaque est espacée de la surface d'étanchéité et par conséquent rend possible le passage du gaz, deux éléments d'étanchéité flexibles (41, 42) qui sont fixés respectivement à l'unité de passage de gaz et à l'unité de réglage et qui, par conséquent, scellent le volume interne, et une unité de détermination de position qui est disposée sur ou dans le dispositif de réglage et qui est conçue pour déterminer une position d'une partie de l'unité de réglage, ladite partie présentant une relation spatiale fixe par rapport à la plaque.
PCT/EP2020/082566 2019-11-19 2020-11-18 Soupape d'admission de gaz pour chambres de traitement sous vide WO2021099405A1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US17/776,437 US20220403953A1 (en) 2019-11-19 2020-11-18 Gas inlet valve for vacuum process chambers
KR1020227015503A KR20220100588A (ko) 2019-11-19 2020-11-18 진공 프로세스 챔버들을 위한 가스 유입구 밸브
JP2022529050A JP2023502660A (ja) 2019-11-19 2020-11-18 真空プロセスチャンバのための気体流入弁
CN202080079818.0A CN114729713A (zh) 2019-11-19 2020-11-18 真空工艺室的进气阀

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102019008017.3A DE102019008017A1 (de) 2019-11-19 2019-11-19 Gaseinlassventil für Vakuumprozesskammern
DE102019008017.3 2019-11-19

Publications (1)

Publication Number Publication Date
WO2021099405A1 true WO2021099405A1 (fr) 2021-05-27

Family

ID=73544140

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2020/082566 WO2021099405A1 (fr) 2019-11-19 2020-11-18 Soupape d'admission de gaz pour chambres de traitement sous vide

Country Status (7)

Country Link
US (1) US20220403953A1 (fr)
JP (1) JP2023502660A (fr)
KR (1) KR20220100588A (fr)
CN (1) CN114729713A (fr)
DE (1) DE102019008017A1 (fr)
TW (1) TW202142798A (fr)
WO (1) WO2021099405A1 (fr)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6041814A (en) * 1995-09-01 2000-03-28 Ckd Corporation Vacuum pressure control system
US20050285064A1 (en) * 2002-07-03 2005-12-29 Asahi Organic Chemicals Industry Co., Ltd. Flow control valve
EP3290761A1 (fr) * 2016-08-31 2018-03-07 Armaturen-Wolff Soupape d'arrêt

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Publication number Priority date Publication date Assignee Title
US2646077A (en) * 1950-02-15 1953-07-21 Stator Company Multilayer diaphragm
US3770195A (en) * 1972-03-24 1973-11-06 Eaton Corp Temperature control system and vacuum modulator valve therefor
DE3731444A1 (de) * 1987-09-18 1989-03-30 Leybold Ag Vorrichtung zum beschichten von substraten
US5186209A (en) * 1990-12-04 1993-02-16 Mcmanigal Paul G Accurate high-flow clean regulator with input-pressure balancing
JP4142883B2 (ja) * 2002-03-20 2008-09-03 シーケーディ株式会社 薬液弁
US7337805B2 (en) * 2003-03-07 2008-03-04 Swagelok Company Valve with adjustable stop
CN1865741A (zh) * 2005-05-22 2006-11-22 陈国平 多功能阀
JP2007058337A (ja) * 2005-08-22 2007-03-08 Asahi Organic Chem Ind Co Ltd 流体制御装置
US8794588B1 (en) * 2011-08-04 2014-08-05 Metrex Valve Corp. High pressure actuator regulating valve
US8978839B2 (en) * 2012-05-07 2015-03-17 Haldex Brake Products Corporation Pneumatic brake actuator with flow insensitive two way control valve

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6041814A (en) * 1995-09-01 2000-03-28 Ckd Corporation Vacuum pressure control system
US20050285064A1 (en) * 2002-07-03 2005-12-29 Asahi Organic Chemicals Industry Co., Ltd. Flow control valve
EP3290761A1 (fr) * 2016-08-31 2018-03-07 Armaturen-Wolff Soupape d'arrêt

Also Published As

Publication number Publication date
JP2023502660A (ja) 2023-01-25
KR20220100588A (ko) 2022-07-15
CN114729713A (zh) 2022-07-08
DE102019008017A1 (de) 2021-05-20
TW202142798A (zh) 2021-11-16
US20220403953A1 (en) 2022-12-22

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