WO2021031402A1 - 显示面板及其制造方法 - Google Patents
显示面板及其制造方法 Download PDFInfo
- Publication number
- WO2021031402A1 WO2021031402A1 PCT/CN2019/117780 CN2019117780W WO2021031402A1 WO 2021031402 A1 WO2021031402 A1 WO 2021031402A1 CN 2019117780 W CN2019117780 W CN 2019117780W WO 2021031402 A1 WO2021031402 A1 WO 2021031402A1
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- WO
- WIPO (PCT)
- Prior art keywords
- array substrate
- clock
- sealant
- display panel
- metallic glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/842—Containers
- H10K50/8426—Peripheral sealing arrangements, e.g. adhesives, sealants
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/131—Interconnections, e.g. wiring lines or terminals
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/38—Devices specially adapted for multicolour light emission comprising colour filters or colour changing media [CCM]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/87—Passivation; Containers; Encapsulations
- H10K59/871—Self-supporting sealing arrangements
- H10K59/8722—Peripheral sealing arrangements, e.g. adhesives, sealants
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/1201—Manufacture or treatment
Definitions
- the present disclosure relates to the field of display technology, in particular to a display panel and a manufacturing method thereof.
- the liquid crystal display is a widely used flat panel display, which mainly realizes the picture display by modulating the light field intensity of the backlight source through the liquid crystal switch.
- the array substrate and the color filter substrate often need to be bonded by sealant.
- the contact position of the sealant on the existing liquid crystal display has the risk of being easily corroded, which is likely to cause the problem of poor display.
- the contact position of the sealant on the existing liquid crystal display has the risk of being easily corroded, which is likely to cause the problem of poor display.
- the present disclosure proposes a display panel and a manufacturing method thereof, so as to reduce the interference of water vapor components in the sealant at the position of the via hole of the clock metal wire, and reduce the probability of the clock metal wire being corroded , To improve the display defects caused by the corrosion of the clock wire, and to facilitate the effect of more delicate and fine coating process.
- the present disclosure provides a display panel including an array substrate; a clock metal line for transmitting signals, the clock metal line is arranged above the array substrate, and the clock metal line is composed of It includes microcrystalline metallic glass; a sealant coated above the array substrate; and a color filter substrate disposed above the array substrate, wherein the color filter substrate and the array substrate pass through the sealant Bonding.
- the sealant is also coated on a part of the clock wire.
- the sealant is also coated on the clock metal wire.
- the array substrate includes a via structure, and the clock metal line passes through the via structure.
- the sealant is further coated on the clock metal line and the via structure.
- the coating range of the sealant is separated from the edge of the array substrate by an edge distance.
- the ratio of metallic glass to metal in the microcrystalline metallic glass is between 5% and 95%.
- the ratio of metallic glass to metal in the microcrystalline metallic glass is between 20% and 60%.
- the ratio of metallic glass to metal in the microcrystalline metallic glass is between 30% and 50%.
- the present disclosure also provides a display panel, the display panel including:
- the clock metal line is used to transmit signals.
- the clock metal line is arranged above the array substrate.
- the constituent material of the clock metal line includes microcrystalline metallic glass, wherein the microcrystalline metallic glass contains metal The ratio of glass to metal is between 5% and 95%;
- the color filter substrate is arranged above the array substrate, wherein the color filter substrate and the array substrate are bonded by the frame glue.
- the present disclosure further provides a method for manufacturing a display panel, including: forming an array substrate; forming a clock metal line on the array substrate, the clock metal line being made of microcrystalline metallic glass material; Coating a frame glue on the array substrate; and forming a color filter substrate on the array substrate, wherein the array substrate and the color filter substrate are bonded by the frame glue.
- the coating area of the sealant in the process of applying the sealant on the array substrate, further includes a part of the clock metal wire.
- the coating area of the sealant in the process of applying the sealant on the array substrate, further includes the clock metal wire.
- the array substrate is provided with a via structure, and a clock metal line is formed on the array substrate.
- the clock metal line is made of microcrystalline metallic glass material.
- the clock metal wire passes through the via structure.
- the coating area of the sealant in the process of applying the sealant on the array substrate, further includes the clock metal line and the via structure.
- the array substrate is provided with a via structure, and a clock metal line is formed on the array substrate.
- the clock metal line is made of microcrystalline metallic glass material.
- the clock metal line passes through the via structure and is connected to the corresponding gate line.
- the process of applying the sealant on the array substrate before the process of applying the sealant on the array substrate, it is also based on the size of the array substrate, the size and the constituent material of the clock wire, and the overpass.
- the size of the hole structure determines the coating range of the sealant and the edge distance between the sealant and the edge of the array substrate.
- the process of applying the sealant on the array substrate before the process of applying the sealant on the array substrate, it is also based on the size of the array substrate, the size and the constituent material of the clock wire, and the overpass.
- the size of the hole structure determines the coating range of the sealant and the edge distance between the sealant and the edge of the array substrate.
- the ratio of metallic glass to metal in the microcrystalline metallic glass is between 5% and 95%.
- the ratio of metallic glass to metal in the microcrystalline metallic glass is between 20% and 60%.
- the ratio of metallic glass to metal in the microcrystalline metallic glass is between 30% and 50%.
- the display panel and the manufacturing method thereof include an array substrate; a clock metal line for transmitting signals, the clock metal line is arranged above the array substrate, and
- the constituent materials of the clock metal wire include microcrystalline metallic glass; a sealant, which is coated on the array substrate; and a color filter substrate, which is arranged above the array substrate, wherein the color filter substrate and the The array substrate is bonded by the frame glue, so as to reduce the interference of water vapor components in the frame glue, reduce the probability of the clock metal line being corroded, improve the display failure caused by the clock metal line corrosion, and facilitate more refined The effect of subtle coating process.
- FIG. 1 shows a schematic diagram of the structure of a microcrystalline metallic glass material according to an embodiment of the present disclosure
- FIG. 2 shows a schematic diagram of the layout of the array substrate of the organic light emitting diode display device according to an embodiment of the present disclosure
- FIG. 3 shows a schematic flowchart of a manufacturing method of a display panel according to an embodiment of the present disclosure.
- the present disclosure provides a display panel including an array substrate; a clock metal line for transmitting signals, the clock metal line is arranged above the array substrate, and the clock metal line is composed of It includes microcrystalline metallic glass; a sealant coated above the array substrate; and a color filter substrate disposed above the array substrate, wherein the color filter substrate and the array substrate pass through the sealant Bonding.
- FIG. 1 shows a schematic diagram of the structure of the microcrystalline metallic glass material in a clock metal wire according to an embodiment of the present disclosure.
- FIG. 1 indicates the schematic diagrams of the structure of the metal 300, the microcrystalline metallic glass 400, and the metallic glass 500 respectively.
- the constituent materials of the microcrystalline metallic glass 400 include metal 300 and metallic glass 500.
- composition ratio of the metal 300 to the metallic glass 500 in the microcrystalline metallic glass 400 constituting the clock wire in the present disclosure can be adjusted according to the applicable field of the clock wire. For example, increasing the proportion of the metal 300 in the microcrystalline metallic glass 400 in the clock metal wire will increase the ductility and conductivity of the clock metal wire. Increasing the proportion of the microcrystalline metallic glass 400 in the metallic glass 500 in the clock metal wire increases the corrosion resistance of the clock metal wire.
- the ratio of the metallic glass 500 to the metal 300 is between 5% and 95%.
- the ratio of the metallic glass 500 to the metal 300 in the microcrystalline metallic glass 400 inside the clock wire is between 20% and 60%, so as to improve the durability of the clock wire
- the corrosiveness also has the effect of ductility of the clock wire.
- the ratio of the metallic glass 500 to the metal 300 in the microcrystalline metallic glass 400 inside the clock wire is between 30% and 50%, so as to further improve the durability of the clock wire Corrosive effect.
- microcrystalline metallic glass 400 in the constituent material of the clock metal wire, it is possible to increase the corrosion resistance of the clock metal wire while taking into account the low resistivity of the clock metal wire to provide the time The necessary conditions for good signal transmission of the pulse metal wire and the effect of taking into account the ductility of the clock metal wire for a more refined coating process.
- the array substrate includes a via structure, and the clock metal line passes through the via structure and is connected to other lines for signal transmission without affecting the overall thickness of the array substrate.
- the wiring arrangement of the clock metal line is further simplified.
- the array substrate includes a via structure, and the clock metal line passes through the via structure and is connected to the corresponding gate line for signal transmission. Without affecting the overall thickness of the array substrate, further The wiring arrangement of the clock metal line is simplified.
- the sealant is also coated on the clock metal line and the via structure.
- the sealant By directly coating the sealant on the clock metal line and the via structure, the array substrate and the color filter are increased. The contact area between the substrate and the sealant respectively strengthens the bonding effect between the array substrate and the color filter substrate.
- the sealant is also coated on part of the clock metal wire.
- the sealant is also coated on part of the clock metal wire.
- the sealant is also coated on the clock metal wire.
- the contact area between the array substrate and the color filter substrate and the sealant is increased. , To strengthen the bonding effect of the array substrate and the color filter substrate.
- the coating range of the sealant is separated from the edge of the array substrate of the organic light emitting diode display device by an edge distance.
- the array substrate and the color are increased.
- the bonding effect of the filter substrate reduces the probability that the sealant will overflow the bonding surface between the array substrate and the color filter substrate after the array substrate and the color filter substrate are bonded.
- FIG. 2 shows a schematic layout diagram of an array substrate of an organic light emitting diode display device according to an embodiment of the present disclosure.
- the array substrate A2 of the organic light emitting diode display device includes: a first clock bus CK1, a first clock metal wire 10 connected to the first clock bus CK1, and a first clock wire 10 arranged on the first clock bus The first via structure 11 on the row CK1 through which the first clock wire 10 passes.
- edge distance 210 between the coating range 100 of the sealant and the edge 200 of the array substrate of the organic light emitting diode display device.
- a sealant is coated on part of the clock metal wire. Taking the embodiment shown in FIG. 2 as an example, part of the first clock metal wire 10, part of the second clock metal wire 20, part of the third clock metal wire 30, and part of the fourth clock
- the vein metal wire 40 is arranged in the coating range 100 of the sealant.
- the present disclosure is not limited to this.
- the array substrate, the clock wire, and the via structure are all coated with sealant; in other words, the sealant is simultaneously coated On the clock metal line, via structure and array substrate, to strengthen the adhesion with other adhesion components.
- FIG. 3 shows a schematic flow chart of a manufacturing method of a display panel according to an embodiment of the present disclosure.
- the present disclosure also provides a manufacturing method of a display panel, including:
- Process S1 forming an array substrate
- Process S2 forming a clock metal wire on the array substrate, and the clock metal wire is made of a microcrystalline metallic glass material;
- Process S3 coating sealant on the array substrate.
- Process S4 forming a color filter substrate above the array substrate, wherein the array substrate and the color filter substrate are bonded by the frame glue.
- the coating area of the sealant in the process S3, in the process of coating the sealant on the array substrate, also includes part of the clock wire.
- the array substrate is provided with a via structure, the clock metal line passes through the via structure, and in process S2, a clock metal line is formed on the array substrate, In the process where the clock metal wire is made of microcrystalline metallic glass material, the clock metal wire passes through the via structure.
- the clock metal line passes through the via structure and is connected to the corresponding gate line for signal transmission, without affecting the overall thickness of the array substrate, and at the same time simplifies the clock metal line wiring arrangement.
- the coating area of the sealant further includes a clock metal line and a via structure.
- the process S3 before the process of applying the sealant on the array substrate, it is also based on the size of the array substrate, the size of the clock wire and the constituent materials and the The size of the via structure determines the coating range of the sealant and the edge distance between the sealant and the edge of the array substrate of the organic light emitting diode display device; by preserving the edge distance, in addition to reducing the adhesion between the array substrate and the color filter substrate In addition to the possibility that the rear sealant overflows the bonding surface of the array substrate and the color filter substrate, the position of the applied sealant is further optimized, and the production cost of the organic light emitting diode display device is reduced.
- the display panel and the manufacturing method thereof provided by the present disclosure include an array substrate; a clock metal line for transmitting signals, the clock metal line is arranged above the array substrate, and the constituent material of the clock metal line includes Microcrystalline metallic glass; frame glue, coated above the array substrate; and color filter substrate, arranged above the array substrate, wherein the color filter substrate and the array substrate are bonded by the frame glue , So as to reduce the interference of the water vapor component in the sealant at the via hole position, reduce the probability of the clock metal line being corroded, improve the display failure caused by the clock metal line corrosion, and facilitate more refined and fine coating process Effect.
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Abstract
一种显示面板及其制造方法,包括阵列基板(A2)、时脉金属线(10,20,30,40,50,60,70,80)、框胶(100)以及彩色滤光基板,时脉金属线(10,20,30,40,50,60,70,80)的构成材料包含微晶态金属玻璃(400),通过时脉金属线(10,20,30,40,50,60,70,80)降低框胶(100)中水汽成分的干扰,减少连接处被腐蚀的概率,改善由腐蚀引起的显示不良状况,以及达到利于进行更精致细微的镀膜工艺的效果。
Description
本揭示涉及显示技术领域,具体涉及显示面板及其制造方法。
液晶显示器是一种被广泛应用的平板显示器,主要是通过液晶开关调制背光源光场强度来实现画面显示。在实际生产过程中,阵列基板和彩色滤光基板常需要通过框胶进行粘合。
其中,由于框胶中含有一定的水汽成分,因此,在现有液晶显示器上的框胶接触位置,具有易于被腐蚀的风险,容易引起显示不良的问题。
故,有需要提供一种显示面板及其制造方法,以解决现有技术存在的问题。
由于框胶中含有一定的水汽成分,因此,在现有液晶显示器上的框胶接触位置,具有易于被腐蚀的风险,容易引起显示不良的问题。
为解决上述问题,本揭示提出一种显示面板及其制造方法,从而达到在所述时脉金属线的过孔位置降低框胶中水汽成分的干扰,减少所述时脉金属线被腐蚀的概率,改善由时脉金属线腐蚀引起的显示不良状况,以及便于进行更精致细微的镀膜工艺的效果。
为达成上述目的,本揭示提供一种显示面板,包括阵列基板;时脉金属线,用于传输信号,所述时脉金属线设置在所述阵列基板上方,所述时脉金属线的构成材料包含微晶态金属玻璃;框胶,涂布在所述阵列基板上方;以及彩色滤光基板,设置在所述阵列基板上方,其中所述彩色滤光基板与所述阵列基板通过所述框胶黏合。
于本揭示其中的一实施例中,所述框胶还涂布在部份的所述时脉金属线上方。
于本揭示其中的一实施例中,所述框胶还涂布在所述时脉金属线上方。
于本揭示其中的一实施例中,所述阵列基板包括过孔结构,所述时脉金属线穿过所述过孔结构。
于本揭示其中的一实施例中,所述框胶还涂布在所述时脉金属线以及所述过孔结构上方。
于本揭示其中的一实施例中,所述框胶的涂布范围与所述阵列基板的边缘间隔有边缘距离。
于本揭示其中的一实施例中,所述微晶态金属玻璃内金属玻璃与金属的比例介于5%至95%之间。
于本揭示其中的一实施例中,所述微晶态金属玻璃内金属玻璃与金属的比例介于20%至60%之间。
于本揭示其中的一实施例中,所述微晶态金属玻璃内金属玻璃与金属的比例介于30%至50%之间。
为达成上述目的,本揭示还提供一种显示面板,所述显示面板包括:
阵列基板;
时脉金属线,用于传输信号,所述时脉金属线设置在所述阵列基板上方,所述时脉金属线的构成材料包含微晶态金属玻璃,其中所述微晶态金属玻璃内金属玻璃与金属的比例介于5%至95%之间;
框胶,涂布在所述阵列基板及部份的所述时脉金属线上方;以及
彩色滤光基板,设置在所述阵列基板上方,其中所述彩色滤光基板与所述阵列基板通过所述框胶黏合。
为达成上述目的,本揭示再提供一种显示面板的制作方法,包括:形成阵列基板;在所述阵列基板上形成时脉金属线,所述时脉金属线由微晶态金属玻璃材料构成;涂布框胶在所述阵列基板上方;以及形成彩色滤光基板在所述阵列基板上方,其中所述阵列基板与所述彩色滤光基板通过所述框胶黏合。
于本揭示其中的一实施例中,在涂布框胶在所述阵列基板上方的流程中,所述框胶的涂布区域还包含部份的所述时脉金属线。
于本揭示其中的一实施例中,在涂布框胶在所述阵列基板上方的流程中,所述框胶的涂布区域还包含所述时脉金属线。
于本揭示其中的一实施例中,所述阵列基板设置有过孔结构,在所述阵列基板上形成时脉金属线,所述时脉金属线由微晶态金属玻璃材料构成的流程中,所述时脉金属线穿过所述过孔结构。
于本揭示其中的一实施例中,在涂布框胶在所述阵列基板上方的流程中,所述框胶的涂布区域还包含所述时脉金属线以及所述过孔结构。
于本揭示其中的一实施例中,所述阵列基板设置有过孔结构,在所述阵列基板上形成时脉金属线,所述时脉金属线由微晶态金属玻璃材料构成的流程中,所述时脉金属线穿过所述过孔结构与对应的闸极线连接。
于本揭示其中的一实施例中,在涂布框胶在所述阵列基板上方的流程之前,还根据所述阵列基板的大小、所述时脉金属线的大小及构成材料,以及所述过孔结构的大小决定所述框胶的涂布范围以及所述框胶与所述阵列基板的边缘间的边缘距离。
于本揭示其中的一实施例中,在涂布框胶在所述阵列基板上方的流程之前,还根据所述阵列基板的大小、所述时脉金属线的大小及构成材料,以及所述过孔结构的大小决定所述框胶的涂布范围以及所述框胶与所述阵列基板的边缘间的边缘距离。
于本揭示其中的一实施例中,所述微晶态金属玻璃内金属玻璃与金属的比例介于5%至95%之间。
于本揭示其中的一实施例中,所述微晶态金属玻璃内金属玻璃与金属的比例介于20%至60%之间。
于本揭示其中的一实施例中,所述微晶态金属玻璃内金属玻璃与金属的比例介于30%至50%之间。
为让本揭示的上述内容能更明显易懂,下文特举优选实施例,并配合所附图式,作详细说明如下:
相较于现有技术,由于本揭示所提供的显示面板及其制造方法,包括阵列基板;时脉金属线,用于传输信号,所述时脉金属线设置在所述阵列基板上方,所述时脉金属线的构成材料包含微晶态金属玻璃;框胶,涂布在所述阵列基板上方;以及彩色滤光基板,设置在所述阵列基板上方,其中所述彩色滤光基板与所述阵列基板通过所述框胶黏合,从而达到降低框胶中水汽成分的干扰,减少所述时脉金属线被腐蚀的概率,改善由时脉金属线腐蚀引起的显示不良状况,以及利于进行更精致细微的镀膜工艺的效果。
图1显示根据本揭示的一实施例的微晶态金属玻璃材料构成示意图;
图2显示根据本揭示的一实施例的有机发光二极管显示装置的阵列基板的布局示意图
图3显示根据本揭示的一实施例的显示面板的制作方法流程示意图。
以下实施例的说明是参考附加的图示,用以例示本揭示可用以实施的特定实施例。本揭示所提到的方向用语,例如[上]、[下]、[前]、[后]、[左]、[右]、[内]、[外]、[侧面]等,仅是参考附加图式的方向。因此,使用的方向用语是用以说明及理解本揭示,而非用以限制本揭示。
在图中,结构相似的单元是以相同标号表示。
为达成上述目的,本揭示提供一种显示面板,包括阵列基板;时脉金属线,用于传输信号,所述时脉金属线设置在所述阵列基板上方,所述时脉金属线的构成材料包含微晶态金属玻璃;框胶,涂布在所述阵列基板上方;以及彩色滤光基板,设置在所述阵列基板上方,其中所述彩色滤光基板与所述阵列基板通过所述框胶黏合。
请参照图1,图1显示根据本揭示的一实施例的时脉金属线中,所述微晶态金属玻璃材料构成示意图。其中,图1分别标示金属300、微晶态金属玻璃400及金属玻璃500的构成示意图。如图1所示,微晶态金属玻璃400的构成材料包含金属300与金属玻璃500。
进一步而言,在本揭示中构成所述时脉金属线的微晶态金属玻璃400中金属300与金属玻璃500的成分比例可根据所述时脉金属线的适用场域进行调整。举例而言,增加时脉金属线中微晶态金属玻璃400中金属300的比例,则时脉金属线的延展性及导电性增加。增加时脉金属线中微晶态金属玻璃400中金属玻璃500的比例,则所述时脉金属线的耐腐蚀性能增加。
于本揭示其中的一实施例中,时脉金属线内部的微晶态金属玻璃400中,金属玻璃500与金属300的比例介于5%至95%之间。
于本揭示其中的一实施例中,时脉金属线内部的微晶态金属玻璃400中金属玻璃500与金属300的比例介于20%至60%之间,从而达到提升时脉金属线的耐腐蚀性的同时兼具所述时脉金属线的延展性的效果。
于本揭示其中的一实施例中,时脉金属线内部的微晶态金属玻璃400中金属玻璃500与金属300的比例介于30%至50%之间,从而达到进一步提升时脉金属线耐腐蚀性的效果。
换言之,通过在所述时脉金属线的构成材料包含微晶态金属玻璃400,达到增加所述时脉金属线耐腐蚀性能的同时,兼顾所述时脉金属线的低电阻率提供所述时脉金属线良好的信号传输必备条件,以及兼顾所述时脉金属线延展性以进行更精致的镀膜制程的效果。
于本揭示其中的一实施例中,所述阵列基板包括有过孔结构,所述时脉金属线穿过所述过孔结构与其他线路连接进行信号传输,在不影响阵列基板的整体厚度的前提下,还进一步简化所述时脉金属线的布线安排。
于本揭示其中的一实施例中,阵列基板包括过孔结构,时脉金属线穿过过孔结构与对应的闸极线连接进行信号传输,在不影响阵列基板的整体厚度的前提下,进一步简化所述时脉金属线的布线安排。
于本揭示其中的一实施例中,框胶还涂布在时脉金属线与过孔结构上方,通过直接在时脉金属线与过孔结构上涂布框胶,增加阵列基板与彩色滤光基板分别和框胶的接触面积,加强阵列基板与彩色滤光基板的黏合效果。
于本揭示其中的一实施例中,框胶还涂布在部份的时脉金属线上方,通过在部份的时脉金属线上涂布框胶,增加阵列基板与彩色滤光基板分别和框胶的接触面积,加强阵列基板与彩色滤光基板的黏合效果。
于本揭示其中的一实施例中,框胶还涂布在时脉金属线上方,通过直接在时脉金属线上涂布框胶,增加阵列基板与彩色滤光基板分别和框胶的接触面积,加强阵列基板与彩色滤光基板的黏合效果。
于本揭示其中的一实施例中,框胶的涂布范围与有机发光二极管显示装置的阵列基板的边缘间隔有边缘距离,通过预先保留间隔的边缘距离,以增加所述阵列基板与所述彩色滤光基板的黏合效果,并减少所述阵列基板与所述彩色滤光基板黏合后,框胶溢出阵列基板与彩色滤光基板之间的接合面的几率。
请参照图2,图2显示根据本揭示的一实施例的有机发光二极管显示装置的阵列基板的布局示意图。如图所示,在有机发光二极管显示装置的阵列基板A2包括:第一时脉汇流排CK1,与第一时脉汇流排CK1连接的第一时脉金属线10以及设置在第一时脉汇流排CK1上被第一时脉金属线10穿过的第一过孔结构11。第二时脉汇流排CK2,与第二时脉汇流排CK2连接的第二时脉金属线20以及设置在第二时脉汇流排CK2上被第二时脉金属线20穿过的第二过孔结构21。第三时脉汇流排CK3,与第三时脉汇流排CK3连接的第三时脉金属线30以及设置在第三时脉汇流排CK3上被第三时脉金属线30穿过的第三过孔结构31。第四时脉汇流排CK4,与第四时脉汇流排CK4连接的第四时脉金属线40以及设置在第四时脉汇流排CK4上被第四时脉金属线40穿过的第四过孔结构41。第五时脉汇流排CK5,与第五时脉汇流排CK5连接的第五时脉金属线50以及设置在第五时脉汇流排CK5上被第五时脉金属线50穿过的第五过孔结构51。第六时脉汇流排CK6,与第六时脉汇流排CK6连接的第六时脉金属线60以及设置在第六时脉汇流排CK6上被第六时脉金属线60穿过的第六过孔结构61。第七时脉汇流排CK7,与第七时脉汇流排CK7连接的第七时脉金属线70以及设置在第七时脉汇流排CK7上被第七时脉金属线70穿过的第七过孔结构71。以及第八时脉汇流排CK8,与第八时脉汇流排CK8连接的第八时脉金属线80以及设置在第一时脉汇流排CK8上被第八时脉金属线80穿过的第八过孔结构81。
其中,框胶的涂布范围100与有机发光二极管显示装置的阵列基板的边缘200之间间隔有边缘距离210,通过预先保留边缘距离210,除了减少阵列基板A2与彩色滤光基板黏合后框胶溢出阵列基板A2与彩色滤光基板的接合面的几率,进一步优化涂布的框胶涂布位置,降低有机发光二极管显示装置的生产成本。
于本揭示其中的一实施例中,框胶涂布在部份的所述时脉金属线上。以图2所揭示的实施例为例,部份的第一时脉金属线10、部份的第二时脉金属线20、部份的第三时脉金属线30以及部份的第四时脉金属线40设置于框胶的涂布范围100内。
然而,本揭示不限于此,于本揭示其中的一实施例中,在所述阵列基板、所述时脉金属线以及所述过孔结构都涂布有框胶;换言之,框胶同时涂布在时脉金属线、过孔结构以及阵列基板上,以强化与其他黏附元件的黏附性。
请参阅图3,图3显示根据本揭示的一实施例的显示面板的制作方法流程示意图。为达成上述目的,本揭示还提供一种显示面板的制作方法,包括:
流程S1:形成阵列基板;
流程S2:在所述阵列基板上形成时脉金属线,所述时脉金属线由微晶态金属玻璃材料构成;
流程S3:涂布框胶在所述阵列基板上方;以及
流程S4:形成彩色滤光基板在所述阵列基板上方,其中所述阵列基板与所述彩色滤光基板通过所述框胶黏合。
于本揭示其中的一实施例中,在流程S3,涂布框胶在所述阵列基板上方的流程中,框胶的涂布区域还包含部份的时脉金属线。通过在部份的时脉金属线上涂布框胶,增加阵列基板与彩色滤光基板分别和框胶的接触面积,加强阵列基板与彩色滤光基板的黏合效果。
于本揭示其中的一实施例中,所述阵列基板设置有过孔结构,所述时脉金属线穿过所述过孔结构,在流程S2,在所述阵列基板上形成时脉金属线,所述时脉金属线由微晶态金属玻璃材料构成的流程中,时脉金属线穿过过孔结构。通过过孔结构的设置,时脉金属线穿过过孔结构与对应的闸极线连接进行信号传输,不影响阵列基板的整体厚度,同时简化时脉金属线布线安排。
于本揭示其中的一实施例中,在流程S3,涂布框胶在所述阵列基板上方的流程中,框胶的涂布区域还包含时脉金属线以及过孔结构。通过在时脉金属线以及过孔结构上涂布框胶,增加阵列基板与彩色滤光基板分别和框胶的接触面积,加强阵列基板与彩色滤光基板的黏合效果。
于本揭示其中的一实施例中,在流程S3,涂布框胶在所述阵列基板上方的流程之前,还根据所述阵列基板的大小、所述时脉金属线的大小及构成材料以及所述过孔结构的大小决定所述框胶的涂布范围以及框胶与有机发光二极管显示装置的阵列基板的边缘间的边缘距离;通过预先保留边缘距离,除了减少阵列基板与彩色滤光基板黏合后框胶溢出阵列基板与彩色滤光基板的接合面的几率之外,进一步优化涂布的框胶涂布位置,降低有机发光二极管显示装置的生产成本。
由于本揭示提供的显示面板及其制造方法,包括阵列基板;时脉金属线,用于传输信号,所述时脉金属线设置在所述阵列基板上方,所述时脉金属线的构成材料包含微晶态金属玻璃;框胶,涂布在所述阵列基板上方;以及彩色滤光基板,设置在所述阵列基板上方,其中所述彩色滤光基板与所述阵列基板通过所述框胶黏合,从而达到在过孔位置降低框胶中水汽成分的干扰,减少所述时脉金属线被腐蚀的概率,改善由时脉金属线腐蚀引起的显示不良状况,以及利于进行更精致细微的镀膜工艺的效果。
以上仅是本揭示的优选实施方式,应当指出,对于本领域普通技术人员,在不脱离本揭示原理的前提下,还可以做出若干改进和润饰,这些改进和润饰也应视为本揭示的保护范围。
Claims (20)
- 一种显示面板,其中,所述显示面板包括:阵列基板;时脉金属线,用于传输信号,所述时脉金属线设置在所述阵列基板上方,所述时脉金属线的构成材料包含微晶态金属玻璃;框胶,涂布在所述阵列基板上方;以及彩色滤光基板,设置在所述阵列基板上方,其中所述彩色滤光基板与所述阵列基板通过所述框胶黏合。
- 如权利要求1所述的显示面板,其中,所述框胶还涂布在部份的所述时脉金属线上方。
- 如权利要求1所述的显示面板,其中,所述框胶还涂布在所述时脉金属线上方。
- 如权利要求1所述的显示面板,其中,所述阵列基板包括过孔结构,所述时脉金属线穿过所述过孔结构。
- 如权利要求4所述的显示面板,其中,所述框胶还涂布在所述时脉金属线以及所述过孔结构上方。
- 如权利要求1所述的显示面板,其中,所述框胶的涂布范围与所述阵列基板的边缘间隔有边缘距离。
- 如权利要求1所述的显示面板,其中,所述微晶态金属玻璃内金属玻璃与金属的比例介于5%至95%之间。
- 如权利要求1所述的显示面板,其中,所述微晶态金属玻璃内金属玻璃与金属的比例介于20%至60%之间。
- 如权利要求1所述的显示面板,其中,所述微晶态金属玻璃内金属玻璃与金属的比例介于30%至50%之间。
- 一种显示面板,其中,所述显示面板包括:阵列基板;时脉金属线,用于传输信号,所述时脉金属线设置在所述阵列基板上方,所述时脉金属线的构成材料包含微晶态金属玻璃,其中所述微晶态金属玻璃内金属玻璃与金属的比例介于5%至95%之间;框胶,涂布在所述阵列基板及部份的所述时脉金属线上方;以及彩色滤光基板,设置在所述阵列基板上方,其中所述彩色滤光基板与所述阵列基板通过所述框胶黏合。
- 一种显示面板的制作方法,其中,包括:形成阵列基板;形成时脉金属线在所述阵列基板上,所述时脉金属线由微晶态金属玻璃材料构成;涂布框胶在所述阵列基板上方;以及形成彩色滤光基板在所述阵列基板上方,其中所述阵列基板与所述彩色滤光基板通过所述框胶黏合。
- 如权利要求11所述的显示面板的制作方法,其中,在涂布框胶在所述阵列基板上方的流程中,所述框胶的涂布区域还包含部份的所述时脉金属线。
- 如权利要求11所述的显示面板的制作方法,其中,在涂布框胶在所述阵列基板上方的流程中,所述框胶的涂布区域还包含所述时脉金属线。
- 如权利要求11所述的显示面板的制作方法,其中,所述阵列基板设置有过孔结构,在所述阵列基板上形成时脉金属线,所述时脉金属线由微晶态金属玻璃材料构成的流程中,所述时脉金属线穿过所述过孔结构。
- 如权利要求14所述的显示面板的制作方法,其中,在涂布框胶在所述阵列基板上方的流程中,所述框胶的涂布区域还包含所述时脉金属线以及所述过孔结构。
- 如权利要求11所述的显示面板,其中,所述阵列基板设置有过孔结构,在所述阵列基板上形成时脉金属线,所述时脉金属线由微晶态金属玻璃材料构成的流程中,所述时脉金属线穿过所述过孔结构与对应的闸极线连接。
- 如权利要求15所述的显示面板的制作方法,其中,在涂布框胶在所述阵列基板上方的流程之前,还根据所述阵列基板的大小、所述时脉金属线的大小及构成材料,以及所述过孔结构的大小决定所述框胶的涂布范围以及所述框胶与所述阵列基板的边缘间的边缘距离。
- 如权利要求11所述的显示面板的制作方法,其中,所述微晶态金属玻璃内金属玻璃与金属的比例介于5%至95%之间。
- 如权利要求11所述的显示面板,其中,所述微晶态金属玻璃内金属玻璃与金属的比例介于20%至60%之间。
- 如权利要求11所述的显示面板,其中,所述微晶态金属玻璃内金属玻璃与金属的比例介于30%至50%之间。
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| CN114335401A (zh) * | 2020-09-30 | 2022-04-12 | 咸阳虹微新型显示技术有限公司 | Oled显示面板制备方法、oled显示面板和oled显示器 |
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| US20210351374A1 (en) | 2021-11-11 |
| CN110488541A (zh) | 2019-11-22 |
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