WO2021027090A1 - 掩膜版和像素结构 - Google Patents

掩膜版和像素结构 Download PDF

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Publication number
WO2021027090A1
WO2021027090A1 PCT/CN2019/115300 CN2019115300W WO2021027090A1 WO 2021027090 A1 WO2021027090 A1 WO 2021027090A1 CN 2019115300 W CN2019115300 W CN 2019115300W WO 2021027090 A1 WO2021027090 A1 WO 2021027090A1
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WO
WIPO (PCT)
Prior art keywords
mask
opening
pixel
curved
sides
Prior art date
Application number
PCT/CN2019/115300
Other languages
English (en)
French (fr)
Inventor
刘志乔
Original Assignee
武汉华星光电半导体显示技术有限公司
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Filing date
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Application filed by 武汉华星光电半导体显示技术有限公司 filed Critical 武汉华星光电半导体显示技术有限公司
Priority to US16/640,762 priority Critical patent/US11313025B2/en
Publication of WO2021027090A1 publication Critical patent/WO2021027090A1/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C17/00—Hand tools or apparatus using hand held tools, for applying liquids or other fluent materials to, for spreading applied liquids or other fluent materials on, or for partially removing applied liquids or other fluent materials from, surfaces
    • B05C17/06—Stencils
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C21/00—Accessories or implements for use in connection with applying liquids or other fluent materials to surfaces, not provided for in groups B05C1/00 - B05C19/00
    • B05C21/005—Masking devices
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Definitions

  • This application relates to the technical field of display panels, and in particular to a mask and pixel structure.
  • OLED Organic Light-Emitting Diode (Organic Light-Emitting Diode) display screen adopts vacuum evaporation technology to prepare organic light-emitting layer.
  • organic materials are deposited on the substrate above the evaporation source by high-temperature evaporation.
  • a high-precision metal mask Fine Metal Mask, FMM
  • FMM Fe Metal Mask
  • the pixel structure design of high aperture ratio and high pixel density is becoming more and more complex, and the shape of the pixel is various.
  • the corresponding The production of FMM is becoming more and more difficult, and the prepared FMM is prone to wrinkles during the drawing process, which makes the vapor-deposited organic material and the pixel position designed on the backboard easily deviate, and the formed pixels are easy to mix colors, which affects the performance of the product . Therefore, the design of the pixel structure limits the opening design of the FMM and also affects the mass production of the FMM.
  • the present application provides a mask and a pixel structure.
  • the mask edge corresponding to the concave curve edge of the pixel opening in the mask opening to have a curvature smaller than the curvature of the corresponding curve edge, the mask opening of the mask is relative to The corresponding pixel openings are enlarged in non-equal proportions, which solves the technical problems of difficult mask production and easy wrinkles.
  • the present application provides a mask including a mask opening for making sub-pixels in a pixel opening of a display panel; the area of the mask opening is larger than the area of the corresponding pixel opening; the pixel opening includes at least one Concave curved sides; the mask opening includes at least one mask side, and the at least one mask side corresponds to at least one curved side, and the curvature of each mask side is smaller than the curvature of its corresponding curved side.
  • the edges of the mask are linear.
  • the edges of the mask are curved.
  • the edges of the mask are in the shape of an arc, and the central angle of the arc is greater than 0° and less than or equal to 30°.
  • the shape of the mask opening is an axisymmetric pattern.
  • the shape of the mask opening includes a regular polygon or a regular polygon with chamfered corners.
  • the shape of the pixel opening is an axisymmetric octagon
  • the pixel opening includes four curved sides, and any two adjacent curved sides pass through the first straight line.
  • the line edges are connected, and any two adjacent curved edges are arranged opposite to two other adjacent curved edges;
  • the shape of the mask opening is an axisymmetric octagon, the mask opening includes four mask sides, the four mask sides correspond to the four curved sides one by one, and two adjacent sides are arbitrarily The mask edges are connected by a second straight edge.
  • the length and curvature of the four curved sides are the same; the length and curvature of the four mask sides are the same.
  • the first straight side is parallel to the second straight side, and the length of the first straight side is smaller than the length of the second straight side.
  • the distance between the second straight edge and the corresponding first straight edge is greater than the distance between the mask edge and the corresponding curved edge.
  • the mask includes a high-precision metal mask.
  • the embodiment of the present application also provides a mask, including a mask opening for making sub-pixels in a pixel opening of a display panel; the area of the mask opening is larger than the area of the corresponding pixel opening;
  • the shape is an axisymmetric octagon, the pixel opening includes four concave curved sides, any two adjacent curved sides are connected by a first straight edge, and the any two adjacent curved sides are connected to another The two adjacent curved edges are set relative to each other;
  • the shape of the mask opening is an axisymmetric octagon, the mask opening includes four straight mask edges, and the four straight mask edges correspond to the four concave curved edges in a one-to-one manner. Two adjacent mask edges are connected by a second straight edge; the first straight edge is parallel to the second straight edge, and the length of the first straight edge is less than the length of the second straight edge .
  • An embodiment of the present application further provides a pixel structure, the pixel structure includes sub-pixels formed in a pixel opening of a display panel, and the sub-pixels are produced by using a mask;
  • the mask includes a mask opening for making the sub-pixels in the pixel opening; the area of the mask opening is larger than the area of the corresponding pixel opening; the pixel opening includes at least one concave curve Side; the mask opening includes at least one mask side, and the at least one mask side corresponds to at least one curved side one-to-one, and the curvature of each mask side is less than the curvature of its corresponding curved side.
  • the edges of the mask are linear.
  • the edge of the mask is curved.
  • the mask side is in the shape of an arc, and the central angle of the arc is greater than 0° and less than or equal to 30°.
  • the shape of the mask opening is an axisymmetric pattern.
  • the shape of the mask opening includes a regular polygon or a regular polygon with chamfered corners.
  • the shape of the pixel opening is an axisymmetric octagon, the pixel opening includes four curved sides, and any two adjacent curved sides pass through a first straight line. The edges are connected, and the two adjacent curved edges are arranged opposite to the other two adjacent curved edges;
  • the shape of the mask opening is an axisymmetric octagon, the mask opening includes four mask sides, the four mask sides correspond to the four curved sides one by one, and two adjacent sides are arbitrarily The mask edges are connected by a second straight edge.
  • the length and curvature of the four curved sides are the same; and the length and curvature of the four mask sides are the same.
  • the beneficial effect of the present application is that for the pixel opening design including at least one concave curved side, compared with the technical solution of designing and manufacturing the mask opening of the mask plate according to the corresponding pixel opening, the mask in this application
  • the area of the film opening is larger than the area of the pixel opening, and the curvature of the mask edge corresponding to the mask opening and the curve edge is smaller than the curvature of the curve edge, so that the mask opening of the mask is expanded non-equally with respect to the corresponding pixel opening, so that The size of the different positions of the mask opening of the mask can be adjusted within the process margin, and the mask edge of the mask opening is avoided to be made into a concave curved edge, and the mask opening of the mask is reduced
  • the difficulty of the preparation process makes it possible to prepare the mask with the above-mentioned curved edge pixel structure to achieve mass production; making the mask edge corresponding to the curved edge of the pixel opening into a linear shape can further reduce the mask of the mask.
  • FIG. 1 is a schematic structural diagram of a mask provided by an embodiment of the application.
  • FIG. 2 is a schematic structural diagram of a mask and pixel openings provided by an embodiment of the application
  • FIG. 3 is an enlarged schematic view of the mask opening and the pixel opening in the area A in FIG. 2;
  • FIG. 4 is an enlarged schematic diagram of another mask opening and pixel opening in area A in FIG. 2;
  • FIG. 5 is a schematic structural diagram of a pixel structure provided by an embodiment of the application.
  • FIG. 6 is a schematic diagram of another mask and pixel opening structure provided by an embodiment of the application.
  • FIG. 7 is an enlarged schematic diagram of the mask opening and the pixel opening in the area B in FIG. 6;
  • FIG. 8 is an enlarged schematic diagram of another mask opening and pixel opening in area B in FIG. 6;
  • FIG. 9 is a schematic structural diagram of another pixel structure provided by an embodiment of the application.
  • FIG. 10 is a schematic structural diagram of another mask provided by an embodiment of the application.
  • FIG. 11 is a schematic structural diagram of another mask provided by an embodiment of the application.
  • FIG. 12 is a schematic diagram of the structure of an exemplary mask.
  • an embodiment of the present application provides a mask 1 including a mask opening 5 for making sub-pixels 3 in a pixel opening 2 of a display panel; the area of the mask opening 5 is larger than The area of the corresponding pixel opening 2; the pixel opening 2 includes at least one concave curved side 6; the mask opening 5 includes at least one mask side 7, and at least one mask side 7 corresponds to at least one curved side 6, one to one, The curvature of each mask edge 7 is smaller than the curvature of its corresponding curved edge 6.
  • the mask 1 in this embodiment includes a high-precision metal mask (FMM), the display panel includes an Organic Light Emitting Diode (OLED) display panel, and the sub-pixels 3 on the display panel are generally
  • the organic material is allowed to pass through the mask opening 5 of the FMM to form an organic electroluminescence structure in the corresponding pixel opening 2 by using the evaporation film forming technology.
  • the mask opening 5 of FMM is generally made by an etching process and is isotropic etching. The characteristic of isotropic etching is that the vertical direction and the horizontal direction are etched in equal proportions to form a basin-shaped pattern, so the edge of the mask opening 5 The presence of a slope will affect the evaporation effect.
  • the area of the mask opening 5 corresponding to the pixel opening 2 is larger than that of the pixel
  • the area of the opening 2 and the size of the mask opening 5 need to meet the process margin.
  • the mask 1 when the mask 1 is used to make the sub-pixels 3, it is necessary to align and align the mask with the display panel, so that the orthographic projection of the mask opening 5 on the mask 1 completely covers the pixel openings 2 Orthographic projection on the mask 1.
  • the multiple sides of the mask opening 5 correspond to the multiple sides of the corresponding pixel opening 2
  • each side of the mask opening 5 corresponds to the corresponding pixel opening.
  • the minimum distance between the sides of 2 should be greater than or equal to the process allowance, and the maximum distance should be less than the minimum distance between two adjacent pixel openings 2.
  • the organic material in the non-aperture position does not belong to the sub-pixel 3, that is, the shape of the sub-pixel 3 and the shape of the pixel opening 2 are the same (the shape of the pixel opening 2 determines the shape of the sub-pixel 3).
  • the mask opening 5 of the FMM is prepared by etching technology, and the mask opening 5 containing the concave curved side 6 needs to be prepared by a double-sided etching process.
  • the preparation process is difficult and it is not easy to achieve mass production, while the straight side may approach a straight line.
  • the side mask opening 5 has less manufacturing process difficulty, so that the size of each side produced can be controlled, and the quality of the mask 1 produced is guaranteed.
  • the design of the pixel opening 2 including at least one concave curved side 6 is compared with the technical solution designed and manufactured by enlarging the mask opening 5 of the mask 1 in proportion to the corresponding pixel opening 2.
  • the area of the mask opening 5 in the application is larger than the area of the pixel opening 2, and the curvature of the mask side 7 corresponding to the mask opening 5 and the curved side 6 is smaller than the curvature of the curved side 6, so that the mask opening 5 of the mask 1 is opposite
  • the corresponding pixel opening 2 is enlarged non-equally, so that the size of the mask opening 5 of the mask 1 can be adjusted within the process margin, and it is avoided that the mask edge 7 of the mask opening 5 is made to be the same as the pixel opening.
  • the curve side 6 of 2 has exactly the same concave curve side 6, which reduces the difficulty of the preparation process of the mask opening 5 of the mask 1, so that the mask 1 of the sub-pixel 3 with the curve side 6 can be prepared.
  • the mask edge 7 is linear.
  • the mask side 7 corresponding to the curved side 6 of the pixel opening 2 is made into a linear shape.
  • it can reduce the manufacturing process difficulty of the mask opening 5 of the mask 1 and on the other hand can greatly reduce the mask The probability of wrinkles appearing when the film plate is 1 screen, thereby reducing the probability of color mixing of adjacent sub-pixels 3 of the display panel, and ensuring the display effect of the manufactured display panel.
  • the shape of the mask opening 5 is an axisymmetric figure.
  • the mask opening 5 may include one axis of symmetry, or may include multiple axes of symmetry.
  • the mask opening 5 is symmetrical in both the horizontal and vertical directions of the mask 1.
  • the stress distribution of the mask opening 5 in the horizontal direction and the vertical direction is uniform, which prevents the mask 1 from wrinkling under the pulling force, thereby avoiding the shift of the position of the sub-pixel 3 formed by evaporation to cause color mixing.
  • the shape of the mask opening 5 includes a regular polygon or a regular polygon with chamfers (not shown in the figure).
  • the sides of the regular polygon are straight or approaching straight sides, and the sub-pixel 3 produced may be a regular polygon or an irregular polygon.
  • the mask 1 in this embodiment can be used to make regular polygonal sub-pixels 3 with concave curved sides 6 and can also make polygonal sub-pixels 3 with straight sides, which has a wide range of applications.
  • the number of mask openings 5 on the mask 1 is multiple, the number of pixel openings 2 on the display panel is multiple, and the mask 1
  • the number of mask openings 5 on the upper surface can be equal to the number of pixel openings 2 on the display panel, and one-to-one correspondence.
  • only one mask plate 1 is required to correspond to multiple pixels of the display panel to prepare multiple sub- Pixel 3;
  • the size and shape of the multiple pixel openings 2 are the same, and the multiple pixel openings 2 are arranged in an array, and the size and shape of the multiple mask openings 5 on the corresponding mask 1 are all the same, and
  • the multiple mask openings 5 are distributed in an array.
  • the number of mask openings 5 on the mask 1 can also be smaller than the number of pixel openings 2 on the display panel, and the multiple mask openings 5 on the mask 1 correspond to some of the pixel openings 2 one-to-one.
  • the shape or size of the pixel openings 2 on the display panel are not exactly the same, the pixel openings 2 of the same shape and size are evenly distributed on the display panel, and the pixel openings 2 of the same shape and size correspond to the same mask. Therefore, The production of multiple sub-pixels of this type of display panel requires multiple masks to complete, and the shape, size, and position distribution of the mask openings on different masks are different.
  • the mask 1 in this embodiment can be used alone to make all the sub-pixels 3 on the display panel, or it can be used in conjunction with other masks to form sub-pixels with different shapes and sizes on the display panel.
  • the arrangement of the mask openings on a mask is determined by the arrangement of the corresponding pixel openings.
  • the embodiment of the present application also provides a mask 1.
  • the mask edge 7 corresponding to the curved edge 6 of the pixel opening 2 is curved.
  • the mask edge 7 of the mask 1 includes a concave curve shape or a convex curve shape.
  • the mask edge 7 has a circular arc shape, and the central angle ⁇ of the circular arc is greater than 0° and less than or equal to 30°. In this embodiment, the arc with the central angle ⁇ between 0° and 30° is close to a straight line. This arc-shaped mask edge 7 is less difficult to manufacture, which is beneficial to realize the production of the sub-pixel 3 with the aforementioned curved edge 6 Mass production of mask 1.
  • the embodiment of the present application also provides a mask 1.
  • the shape of the pixel opening 2 is an axisymmetric octagon, and the pixel opening 2 includes four curves.
  • Side 6, any two adjacent curved sides 6 are connected by a first straight side 8, and any two adjacent curved sides 6 are arranged opposite to the other two adjacent curved sides 6;
  • the shape of the mask opening 5 It is an axisymmetric octagon, the mask opening 5 includes four mask sides 7, four mask sides 7 correspond to four curved sides 6 one by one, and any two adjacent mask sides 7 are connected by a second straight line 9 .
  • the axis of symmetry of the octagonal mask opening 5 is located in the horizontal direction, or in the vertical direction, or both in the horizontal direction and in the vertical direction. Of course, it can also be located in other directions.
  • the embodiment does not limit the specific position of the symmetry axis.
  • the length and curvature of the four curved sides 6 are the same; the length and curvature of the four mask sides 7 are the same.
  • the length and curvature of the four curved sides 6 can also be the same two by one (the length and curvature of the two adjacent curved sides 6 are the same or the length and curvature of the two opposite curved sides 6 are the same); the four mask sides 7
  • the length and curvature can also be the same in pairs (the length and curvature of the two adjacent mask sides 7 are the same or the length and curvature of the two opposite mask sides 7 are the same), and there is no limitation here.
  • the first linear side 8 is parallel to the corresponding second linear side 9, and the length of the first linear side 8 is smaller than the length of the corresponding second linear side 9.
  • the length of the first straight side 8 connecting different curved sides 6 may be different, and the length of the second straight side 9 connecting different mask sides 7 may also be different, which is not limited here.
  • the first straight side 8 of the pixel opening 2 is a short side, that is, the length of the first straight side 8 is smaller than the curved side 6 connected to it, and the first straight side 8 is connected to it.
  • the second straight side 9 of the mask opening 5 is also a short side, that is, the length of the second straight side 8 is smaller than the two mask sides 7 connected to it.
  • the two straight edges 8 and the two mask edges 7 connected to them form sharp corners; when the mask 5 is used to prepare the sub-pixels 3, since the opening area of the sharp corner is small, the evaporation effect at this position is not ideal. It is easy to cause the lack of sharp corners of the sub-pixels and affect the performance of the lighting screen.
  • the distance between the second straight side 9 and the first straight side 8 may be greater than the distance between the mask side 7 and the curved side 6.
  • the mask 1 can prepare the sub-pixels 3 with four concave curved sides 6, of course, the number of concave curved sides 6 can also be one, two or three, etc., which is not limited here;
  • the above-mentioned mask 1 may be suitable for the preparation of irregularly shaped sub-pixels and realize the mass production of the above-mentioned sub-pixels.
  • an embodiment of the present application further provides a pixel structure 10.
  • the pixel structure 10 includes sub-pixels 3 formed in the pixel opening 2, and the sub-pixels 3 are produced by using the above-mentioned mask 1.
  • the number of sub-pixels 3 is multiple and distributed in an array, and the shape and size of the multiple sub-pixels 3 are the same.
  • the above-mentioned mask 1 can be used to prepare sub-pixels 3 with concave curved edges 6, so that the shapes of the sub-pixels 3 can be diversified, and the pixel structure can be more diversified.
  • the spacing between the multiple sub-pixels and the arrangement of the sub-pixels shown in FIG. 5 are specifically determined by the corresponding pixel openings, and other forms of arrangement also fall within the protection scope of the embodiments of the present application.
  • an embodiment of the present application also provides a pixel structure 10.
  • the sub-pixel 3 includes a first sub-pixel 11, a second sub-pixel 12, and a third sub-pixel 13;
  • the sub-pixel 11 and the third sub-pixel 13 constitute a first repeating unit 14, the second sub-pixel 12 and the third sub-pixel 13 constitute a second repeating unit 15;
  • the first repeating unit 14 includes multiple, and the second repeating unit 15 includes multiple
  • the multiple first repeating units 14 and the multiple second repeating units 15 are alternately arranged in the row direction (horizontal direction) and column direction (vertical direction);
  • the third sub-pixels 13 are uniformly distributed in a matrix, and every four A third sub-pixel 13 surrounds a first sub-pixel 11 or a second sub-pixel 12;
  • the shape of the first sub-pixel 11 is an axisymmetric octagon, and the first sub-pixel 11 includes four concave curved sides , The curved side is set close to the third sub-pixel 13;
  • the first sub-pixel 11 is prepared by using a first mask 16, and the first mask 16 includes a first mask opening 19 for making the first sub-pixel 11;
  • the second sub-pixel 12 is prepared by using a second mask 17, and the second mask 17 includes a second mask opening 20 for making the second sub-pixel 12;
  • the third sub-pixel 13 is prepared by using a third mask 18.
  • the third mask 18 includes a third mask opening 21 for making the third sub-pixel 13; wherein, the first mask
  • the plate 16 and the second mask plate 17 are the mask plates described in the above embodiment, and the third mask plate 18 is other exemplary mask plates.
  • each mask is combined with a cover mask (Cover Mask), a support mask (Howling Mask), and an alignment mask (Align Mask). It becomes MFA, and then puts the combined MFA into the corresponding vapor deposition chamber to vaporize the organic light-emitting material corresponding to the corresponding sub-pixel 3.
  • cover mask Cover Mask
  • Support Mask Support Mask
  • Align Mask alignment mask
  • MFA cover mask
  • Align Mask alignment mask
  • only one type of sub-pixel 3 can be formed at a time, and another sub-pixel 3 is formed after one type of sub-pixel 3 is formed, and the above-mentioned pixel structure 10 is obtained after the three sub-pixels 3 are sequentially formed.
  • the third sub-pixel 13 is surrounded by the concave curved side 6 of the first sub-pixel 11 and the second sub-pixel 12.
  • the three sub-pixels 3 are arranged closely, which increases the aperture ratio of the display panel and is arbitrarily adjacent.
  • the first sub-pixel 11 and the second sub-pixel 12 can form a light-emitting pixel point with the adjacent third sub-pixel 13, and the low-resolution physical resolution between the pixels achieves a high-resolution display effect through the principle of color borrowing
  • the above-mentioned pixel structure 10 is produced by the mask 1 in the above-mentioned embodiment and other masks, so that the display panel with the pixel structure 10 with high aperture ratio, high resolution and irregular shape can be mass-produced.
  • the first sub-pixel 11, the second sub-pixel 12, and the third sub-pixel 13 include any one of a red sub-pixel, a green sub-pixel, and a blue sub-pixel, and the first sub-pixel 11, the second sub-pixel
  • the colors of the second sub-pixel 12 and the third sub-pixel 13 are different from each other.
  • the green sub-pixel and the adjacent red sub-pixel and blue sub-pixel can form a light-emitting pixel point, and the low-resolution physical resolution between the pixels achieves a high-resolution display effect through the principle of color borrowing.

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  • Mechanical Engineering (AREA)
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  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

本申请提供了一种掩膜版和像素结构，掩膜版包括用于在显示面板的像素开口中制作子像素的掩膜开口；掩膜开口的面积大于对应的像素开口的面积；像素开口包括至少一条内凹的曲线边；掩膜开口包括至少一条掩膜边，且至少一条掩膜边与至少一条曲线边一一对应，每一条掩膜边的曲率小于其对应的曲线边的曲率。

Description

掩膜版和像素结构 技术领域
本申请涉及显示面板技术领域，尤其涉及一种掩膜版和像素结构。
 背景技术
这里的陈述仅提供与本申请有关的背景信息，而不必然地构成现有技术。
目前OLED(Organic Light-Emitting Diode，有机发光二极管)显示屏采用真空蒸镀技术制备有机发光层。在器件制备过程中，有机材料通过高温蒸镀淀积在位于蒸发源上方的基板上，为使有机材料按照设计蒸镀到特定的位置上，需要使用高精度金属掩膜版（Fine Metal Mask，FMM），FMM上留有预先设计好的开口，有机材料通过该开口沉积到背板上面，形成预设图形的像素。
随着OLED显示屏的分辨率和亮度要求越来越高，高开口率和高像素密度的像素结构设计越来越复杂，像素的形状多种多样，对于不规则的像素形状设计，使得对应的FMM的制作越来越困难，且制备得到的FMM在拉网过程中易出现褶皱，使得蒸镀的有机材料与背板上设计的像素位置容易出现偏差，形成的像素容易混色，影响产品的性能。因此，像素结构的设计限制了FMM 的开口设计，也影响了FMM的量产化。
 技术问题
本申请提供掩膜版和像素结构，通过将掩膜开口中与像素开口的内凹型曲线边对应的掩膜边设计为曲率小于对应的曲线边的曲率，使得掩膜版的掩膜开口相对于对应的像素开口非等比例扩大，解决了掩膜版制作难度大及易褶皱的技术问题。
 技术解决方案
为解决上述问题，本申请提供的技术方案如下：
本申请提供一种掩膜版，包括用于在显示面板的像素开口中制作子像素的掩膜开口；所述掩膜开口的面积大于对应的像素开口的面积；所述像素开口包括至少一条内凹的曲线边；所述掩膜开口包括至少一条掩膜边，且所述至少一条掩膜边与至少一条曲线边一一对应，每一条掩膜边的曲率小于其对应的曲线边的曲率。
在本申请实施例所提供的掩膜版中，所述掩膜边呈直线形。
在本申请实施例所提供的掩膜版中，所述掩膜边呈曲线形。
在本申请实施例所提供的掩膜版中，所述掩膜边呈圆弧形，所述圆弧的圆心角大于0°，且小于或等于30°。
在本申请实施例所提供的掩膜版中，所述掩膜开口的形状为轴对称图形。
在本申请实施例所提供的掩膜版中，所述掩膜开口的形状包括正多边形或具有倒角的正多边形。
在本申请实施例所提供的掩膜版中，所述像素开口的形状为轴对称的八边形，所述像素开口包括四条所述曲线边，任意相邻的两条曲线边通过第一直线边连接，且所述任意相邻的两条曲线边与另外相邻的两条曲线边相对设置；
所述掩膜开口的形状为轴对称的八边形，所述掩膜开口包括四条所述掩膜边，四条所述掩膜边与四条所述曲线边一一对应，任意相邻的两条掩膜边通过第二直线边连接。
在本申请实施例所提供的掩膜版中，四条所述曲线边的长度和曲率相同；四条所述掩膜边的长度和曲率相同。
在本申请实施例所提供的掩膜版中，所述第一直线边与所述第二直线边平行，且所述第一直线边的长度小于所述第二直线边的长度。
在本申请实施例所提供的掩膜版中，所述第二直线边与对应的第一直线边之间的间距大于所述掩膜边与对应的曲线边之间的间距。
在本申请实施例所提供的掩膜版中，所述掩膜版包括高精度金属掩膜版。
本申请实施例还提供一种掩膜版，包括用于在显示面板的像素开口中制作子像素的掩膜开口；所述掩膜开口的面积大于对应的像素开口的面积；所述像素开口的形状为轴对称的八边形，所述像素开口包括四条内凹的曲线边，任意相邻的两条曲线边通过第一直线边连接，且所述任意相邻的两条曲线边与另外相邻的两条曲线边相对设置；
所述掩膜开口的形状为轴对称的八边形，所述掩膜开口包括四条直线形掩膜边，所述四条直线形掩膜边与所述四条内凹的曲线边一一对应，任意相邻的两条掩膜边通过第二直线边连接；所述第一直线边与所述第二直线边平行，且所述第一直线边的长度小于所述第二直线边的长度。
本申请实施例还提供一种像素结构，所述像素结构包括形成在显示面板的像素开口中的子像素，且所述子像素采用掩膜版制作获得；
所述掩膜版包括用于在所述像素开口中制作所述子像素的掩膜开口；所述掩膜开口的面积大于对应的像素开口的面积；所述像素开口包括至少一条内凹的曲线边；所述掩膜开口包括至少一条掩膜边，且所述至少一条掩膜边与至少一条曲线边一一对应，每一条掩膜边的曲率小于其对应的曲线边的曲率。
在本申请实施例所提供的像素结构中，所述掩膜边呈直线形。
在本申请实施例所提供的像素结构中，所述掩膜边呈曲线形。
在本申请实施例所提供的像素结构中，所述掩膜边呈圆弧形，所述圆弧的圆心角大于0°，且小于或等于30°。
在本申请实施例所提供的像素结构中，所述掩膜开口的形状为轴对称图形。
在本申请实施例所提供的像素结构中，所述掩膜开口的形状包括正多边形或具有倒角的正多边形。
在本申请实施例所提供的像素结构中，所述像素开口的形状为轴对称的八边形，所述像素开口包括四条所述曲线边，任意相邻的两条曲线边通过第一直线边连接，且所述任意相邻的两条曲线边与另外相邻的两条曲线边相对设置；
所述掩膜开口的形状为轴对称的八边形，所述掩膜开口包括四条所述掩膜边，四条所述掩膜边与四条所述曲线边一一对应，任意相邻的两条掩膜边通过第二直线边连接。
在本申请实施例所提供的像素结构中，四条所述曲线边的长度和曲率相同；四条所述掩膜边的长度和曲率相同。
 有益效果
本申请的有益效果为：对于包括至少一条内凹的曲线边的像素开口设计，与将掩膜版的掩膜开口按照对应的像素开口等比例扩大设计制作的技术方案相比，本申请中掩膜开口的面积大于像素开口的面积，且掩膜开口与曲线边对应的掩膜边的曲率小于曲线边的曲率，使得掩膜版的掩膜开口相对于对应的像素开口非等比例扩大，使得掩膜版的掩膜开口的不同位置的尺寸可在工艺余量内做调整，且避免了将掩膜开口的掩膜边做成内凹的曲线边，减小了掩膜版的掩膜开口的制备工艺难度，使得制备具有上述曲线边的像素结构的掩膜版可以实现量产；将与像素开口的曲线边对应的掩膜边做成直线形，一方面可以进一步降低掩膜版的掩膜开口的制备工艺难度，另一方面可以大幅降低掩膜版张网时出现褶皱的概率，从而降低了显示面板的相邻子像素混色的概率。
 附图说明
为了更清楚地说明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单介绍，显而易见地，下面描述中的附图仅仅是申请的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本申请实施例提供的一种掩膜版的结构示意图；
图2为本申请实施例提供的一种掩膜版和像素开口的结构示意图；
图3为图2中A区域的掩膜开口和像素开口的放大示意图；
图4为图2中A区域的另一种掩膜开口和像素开口的放大示意图；
图5为本申请实施例提供的一种像素结构的结构示意图；
图6为本申请实施例提供的另一种掩膜版和像素开口的结构示意图；
图7为图6中B区域的掩膜开口和像素开口的放大示意图；
图8为图6中B区域的另一种掩膜开口和像素开口的放大示意图；
图9为本申请实施例提供的另一种像素结构的结构示意图；
图10为本申请实施例提供的另一种掩膜版的结构示意图；
图11为本申请实施例提供的另一种掩膜版的结构示意图；
图12为示例性的一种掩膜版的结构示意图。
 本发明的实施方式
这里所公开的具体结构和功能细节仅仅是代表性的，并且是用来描述本申请的示例性实施例的目的。但是本申请可以通过许多替换形式来具体实现，并且不应当被解释成仅仅受限于这里所阐述的实施例。
在本申请的描述中，需要理解的是，术语“中心”、“横向”、“上”、“下”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本申请和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请的限制。此外，术语“第一”、“第二”仅用来描述目的，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个该特征。在本申请的描述中，除非另有说明，“多个”的含义是两个或两个以上。另外，术语“包括”及其任何变形，意图在于覆盖不排他的包含。
这里所使用的术语仅仅是为了描述具体实施例而不意图限制示例性实施例。除非上下文明确地另有所指，否则这里所使用的单数形式“一个”、“一项”还意图包括复数。还应当理解的是，这里所使用的术语“包括”和/或“包含”规定所陈述的特征、整数、步骤、操作、单元和/或组件的存在，而不排除存在或添加一个或更多其他特征、整数、步骤、操作、单元、组件和/或其组合。
下面结合附图和实施例对本申请作进一步说明。
如图1至图8所示，本申请实施例提供了一种掩膜版1，包括用于在显示面板的像素开口2中制作子像素3的掩膜开口5；掩膜开口5的面积大于对应的像素开口2的面积；像素开口2包括至少一条内凹的曲线边6；掩膜开口5包括至少一条掩膜边7，且至少一条掩膜边7与至少一条曲线边6一一对应，每一条掩膜边7的曲率小于其对应的曲线边6的曲率。
具体的，本实施例中的掩膜版1包括高精度金属掩膜版（FMM），显示面板包括有机电致发光（Organic Light Emitting Diode，OLED）显示面板，显示面板上的子像素3一般是利用蒸镀成膜技术使有机材料透过FMM的掩膜开口5在对应的像素开口2中形成有机电致发光结构。FMM的掩膜开口5一般通过蚀刻工艺制作，且为等向性蚀刻，等向性蚀刻的特点是垂直方向和水平方向以等比例进行蚀刻，而形成盆状图案，因此掩膜开口5的边缘存在斜面，会影响蒸镀效果，为了保证像素开口2内形成的子像素3的完整性（即保证有机电致发光结构的发光性能），与像素开口2对应的掩膜开口5的面积大于像素开口2的面积，且掩膜开口5的尺寸大小需要满足工艺余量。
具体的，当采用掩膜版1制作子像素3时，需要将掩膜版1张网并与显示面板对位贴合，使得掩膜开口5在掩膜版1上的正投影完全覆盖像素开口2在掩膜版1上的正投影，此时，掩膜开口5的多条边与对应的像素开口2的多条边一一对应，且每一条掩膜开口5的边到对应的像素开口2的边之间的最小距离要大于或等于工艺余量，其最大距离要小于相邻的两个像素开口2之间的最小间距；掩膜版1与显示面板对位贴合后，有机材料透过掩膜开口5蒸镀到像素开口2中，形成子像素3，需要说明的是，由于掩膜开口5的面积大于对应的像素开口2的面积，部分有机材料可能会蒸镀到像素开口2与对应的掩膜开口5之间的非开口位置（像素界定层），由于显示面板接通电源后只有像素开口2中的有机材料会被点亮，非开口位置的有机材料不会被点亮，因此非开口位置的有机材料不属于子像素3，即子像素3的形状和像素开口2的形状相同（像素开口2的形状决定了子像素3的形状）。
具体的，采用蚀刻技术制备FMM的掩膜开口5，含内凹型曲线边6的掩膜开口5需要采用双面蚀刻工艺制备，制备工艺难度大，不易实现量产，而直线边或趋近直线边的掩膜开口5与内凹曲线边6的掩膜开口5相比，制作工艺难度小，使得制作的每条边的尺寸可控，且制得的掩膜版1的质量有保证。
本实施例中，对于包括至少一条内凹的曲线边6的像素开口2设计，与将掩膜版1的掩膜开口5按照对应的像素开口2等比例扩大设计制作的技术方案相比，本申请中掩膜开口5的面积大于像素开口2的面积，且掩膜开口5与曲线边6对应的掩膜边7的曲率小于曲线边6的曲率，使得掩膜版1的掩膜开口5相对于对应的像素开口2非等比例扩大，使得掩膜版1的掩膜开口5的尺寸可在工艺余量内做调整，且避免了将掩膜开口5的掩膜边7做成与像素开口2的曲线边6完全相同的内凹曲线边6，减小了掩膜版1的掩膜开口5的制备工艺难度，使得制备具有上述曲线边6的子像素3的掩膜版1可以实现量产。
在一实施例中，如图3和图8所示，掩膜边7呈直线形。本实施例中，将与像素开口2的曲线边6对应的掩膜边7做成直线形，一方面可以降低掩膜版1的掩膜开口5的制备工艺难度，另一方面可以大幅降低掩膜版1张网时出现褶皱的概率，从而降低了显示面板的相邻子像素3混色的概率，保证了制得的显示面板的显示效果。
在一实施例中，掩膜开口5的形状为轴对称图形。具体的，掩膜开口5可以包括一个对称轴，也可以包括多个对称轴，例如掩膜开口5在掩膜版1的水平方向和竖直方向上都对称，当掩膜版1张网时，掩膜开口5在水平方向上和竖直方向上的应力分布均匀，避免了掩膜版1在拉力作用下出现褶皱，从而避免了蒸镀形成的子像素3位置发生偏移导致混色。
在一实施例中，掩膜开口5的形状包括正多边形或具有倒角的正多边形（图中未示出）。具体的，正多边形的边为直线边或趋近直线边，制作得到的子像素3可以是正多边形也可以是不规则的多边形。本实施例中的掩膜版1既可以用来制作具有内凹的曲线边6的正多边形子像素3，也可以制作直线边的多边形子像素3，应用范围广。
在一实施例中，如图1、图2和图6所示，掩膜版1上的掩膜开口5数量为多个，显示面板上的像素开口2的数量为多个，掩膜版1上的掩膜开口5的数量可以与显示面板上的像素开口2的数量相等，且一一对应，此时只需要一张上述掩膜版1与该显示面板的多个像素对应来制备多个子像素3；具体的，多个像素开口2的大小和形状都相同，且多个像素开口2呈阵列分布，对应的掩膜版1上的多个掩膜开口5的大小和形状都相等，且多个掩膜开口5呈阵列分布。当然，掩膜版1上的掩膜开口5的数量还可以小于显示面板上的像素开口2的数量，且掩膜版1上的多个掩膜开口5与部分像素开口2一一对应，此时，显示面板上的像素开口2的形状或大小不完全相同，相同形状和大小的像素开口2在显示面板上均匀分布，且相同形状和大小的像素开口2对应同一张掩膜版，因此，制作此类显示面板的多个子像素需要多张掩膜版配合完成，且不同掩膜版上的掩膜开口的形状、大小和位置分布不同。因此，本实施例中的掩膜版1既可以单独用来制作显示面板上的所有子像素3，也可以和其他掩膜版配合使用，在显示面板上形成形状和大小不同的子像素，每一个掩膜版上的掩膜开口的排布由对应的像素开口的排布决定。
如图4和图7所示，本申请实施例还提供了一种掩膜版1，与上述实施例不同的在于，与像素开口2的曲线边6对应的掩膜边7呈曲线形。本实施例中，掩膜版1的掩膜边7包括内凹曲线形或外凸曲线形，由于掩膜边7的曲率越大，制作难度越大，不利于掩膜版1的量产，因此，曲线形的掩膜边7的曲率小于对应的曲线边6的曲率，可以减小制作具有上述曲线边6的子像素3的掩膜版1的制作工艺难度。
在一实施例中，如图7所示，掩膜边7呈圆弧形，圆弧的圆心角θ大于0°，且小于或等于30°。本实施例中，圆心角θ在0°和30°之间的圆弧接近直线，这种圆弧形的掩膜边7制作难度较小，有利于实现制作具有上述曲线边6的子像素3的掩膜版1的量产。
如图1至图8所示，本申请实施例还提供了一种掩膜版1，与上述实施例不同的在于，像素开口2的形状为轴对称的八边形，像素开口2包括四条曲线边6，任意相邻的两条曲线边6通过第一直线边8连接，且任意相邻的两条曲线边6与另外相邻的两条曲线边6相对设置；掩膜开口5的形状为轴对称的八边形，掩膜开口5包括四条掩膜边7，四条掩膜边7与四条曲线边6一一对应，任意相邻的两条掩膜边7通过第二直线边9连接。
具体的，八边形的掩膜开口5的对称轴位于水平方向上，或者位于竖直方向上，或者既位于水平方向上也位于竖直方向上，当然，还可以位于其他方向上，本申请实施例对该对称轴的具体位置不做限制。
具体的，如图6至图8所示，四条曲线边6的长度和曲率相同；四条掩膜边7的长度和曲率相同。当然，四条曲线边6的长度和曲率也可以两两相同（相邻的两条曲线边6的长度和曲率相同或者相对的两条曲线边6的长度和曲率相同）；四条掩膜边7的长度和曲率也可以两两相同（相邻的两条掩膜边7的长度和曲率相同或者相对的两条掩膜边7的长度和曲率相同），此处不做限制。
具体的，第一直线边8与对应的第二直线边9平行，且第一直线边8的长度小于对应的第二直线边9的长度。另外，连接不同曲线边6的第一直线边8的长度可以不相同，连接不同掩膜边7的第二直线边9的长度也可以不相同，此处不做限制。如图4所示，当像素开口2的第一直线边8为短边，即第一直线边8的长度小于与之相连的曲线边6，且第一直线边8与与之相连的两条曲线边6形成尖角时，对应的，掩膜开口5的第二直线边9也为短边，即第二直线边8的长度小于与之相连的两条掩膜边7，第二直线边8与与之相连的两条掩膜边7形成尖角；采用掩膜版5制备子像素3时，由于尖角位置的开口面积较小，该位置的蒸镀效果不太理想，容易造成子像素的尖角缺失而影响点亮画面性能，为了避免上述问题，第二直线边9到第一直线边8的间距可以大于掩膜边7到曲线边6的间距。
本实施例中，掩膜版1可以制备具有四条内凹的曲线边6的子像素3，当然内凹的曲线边6的数量还可以是一条、两条或三条等，此处不做限制；上述掩膜版1可以适用于不规则形状的子像素制备，并实现上述子像素的量产。
如图1和图5所示，本申请实施例还提供一种像素结构10，像素结构10包括形成在像素开口2中的子像素3，且子像素3采用上述的掩膜版1制作获得。具体的，子像素3的数量为多个，且呈阵列分布，多个子像素3的形状和大小相同。本实施例中，采用上述的掩膜版1可以制备具有内凹的曲线边6的子像素3，使得子像素3的形状可以实现多样化，从而使得像素结构更多样化。需要说明的是，图5中所示的多个子像素之间的间距以及子像素的排布具体由对应的像素开口决定，其他形式的排布也属于本申请实施例的保护范围。
如图9所示，本申请实施例还提供一种像素结构10，与上述实施例不同的在于，子像素3包括第一子像素11、第二子像素12和第三子像素13；第一子像素11和第三子像素13构成第一重复单元14，第二子像素12和第三子像素13构成第二重复单元15；第一重复单元14包括多个，第二重复单元15包括多个，多个第一重复单元14和多个第二重复单元15在行方向（水平方向）和列方向（竖直方向）均交替排列；第三子像素13呈矩阵式均匀分布，且每四个第三子像素13环绕一个第一子像素11或环绕一个第二子像素12；第一子像素11的形状为轴对称的八边形，且第一子像素11包括四条内凹的曲线边，曲线边靠近第三子像素13设置；第二子像素12的形状也为轴对称的八边形，且第二子像素12也包括四条内凹的曲线边，且曲线边靠近第三子像素13设置；第一子像素11靠近第二子像素12的边为直线边，第二子像素12靠近第一子像素11的边也为直线边，且两条相邻的直线边相互平行；第三子像素13的形状包括圆形、椭圆形、正多边形或具有倒圆角的正多边形（图中仅示出椭圆形作为示例）；第一子像素11和第二子像素12采用上述掩膜版制备得到，第三子像素13采用其他具有与第三子像素13的形状对应的掩膜开口的掩膜版制备得到。
具体的，如图9和图10所示，第一子像素11采用第一掩膜版16制备得到，第一掩膜版16包括用于制作第一子像素11的第一掩膜开口19；如图9和图11所示，第二子像素12采用第二掩膜版17制备得到，第二掩膜版17包括用于制作第二子像素12的第二掩膜开口20；如图9和图12所示，第三子像素13采用第三掩膜版18制备得到，第三掩膜版18包括用于制作第三子像素13的第三掩膜开口21；其中，第一掩膜版16和第二掩膜版17为上述实施例所述的掩膜版，第三掩膜版18为其他示例性的掩膜版。
具体的，在采用上述三个掩膜版形成上述像素结构10时，每一个掩模板均与覆盖掩模板(Cover Mask)、支撑掩模板(Howling Mask)和对位掩模板(Align Mask)进行组合成为MFA，然后将组合后的MFA放入相应的蒸镀腔室中蒸镀与对应的子像素3对应的有机发光材料。在具体实施时，一次只能形成一种子像素3，形成完一种子像素3后再形成另一种子像素3，三种子像素3依次形成后得到上述像素结构10。
本实施例中，第三子像素13被第一子像素11和第二子像素12的内凹曲线边6包围，三个子像素3排列紧密，增大了显示面板的开口率，且任意相邻的第一子像素11和第二子像素12可以与相邻的第三子像素13构成一个发光像素点，像素之间通过借色原理由低分辨率的物理分辨率实现高分辨率的显示效果；上述像素结构10通过上述实施例中的掩膜版1与其他掩膜版配合制作得到，使具有高开口率、高分辨率且形状不规则的像素结构10的显示面板实现量产。
在一实施例中，第一子像素11、第二子像素12和第三子像素13包括红色子像素、绿色子像素和蓝色子像素中的任意一种，且第一子像素11、第二子像素12和第三子像素13的颜色各不相同。本实施例中，绿色子像素可以与相邻的红色子像素和蓝色子像素构成一个发光像素点，像素之间通过借色原理由低分辨率的物理分辨率实现高分辨率的显示效果。
综上所述，虽然本申请已以优选实施例揭露如上，但上述优选实施例并非用以限制本申请，本领域的普通技术人员，在不脱离本申请的精神和范围内，均可作各种更动与润饰，因此本申请的保护范围以权利要求界定的范围为准。

Claims (20)

  1. 一种掩膜版，包括用于在显示面板的像素开口中制作子像素的掩膜开口；所述掩膜开口的面积大于对应的像素开口的面积；所述像素开口包括至少一条内凹的曲线边；所述掩膜开口包括至少一条掩膜边，且所述至少一条掩膜边与至少一条曲线边一一对应，每一条掩膜边的曲率小于其对应的曲线边的曲率。
  2. 如权利要求1所述的掩膜版，其中，所述掩膜边呈直线形。
  3. 如权利要求1所述的掩膜版，其中，所述掩膜边呈曲线形。
  4. 如权利要求3所述的掩膜版，其中，所述掩膜边呈圆弧形，所述圆弧的圆心角大于0 ，且小于或等于30 。
  5. 如权利要求1所述的掩膜版，其中，所述掩膜开口的形状为轴对称图形。
  6. 如权利要求1所述的掩膜版，其中，所述掩膜开口的形状包括正多边形或具有倒角的正多边形。
  7. 如权利要求1所述的掩膜版，其中，所述像素开口的形状为轴对称的八边形，所述像素开口包括四条所述曲线边，任意相邻的两条曲线边通过第一直线边连接，且所述任意相邻的两条曲线边与另外相邻的两条曲线边相对设置；
    所述掩膜开口的形状为轴对称的八边形，所述掩膜开口包括四条所述掩膜边，四条所述掩膜边与四条所述曲线边一一对应，任意相邻的两条掩膜边通过第二直线边连接。
  8. 如权利要求7所述的掩膜版，其中，四条所述曲线边的长度和曲率相同；四条所述掩膜边的长度和曲率相同。
  9. 如权利要求7所述的掩膜版，其中，所述第一直线边与所述第二直线边平行，且所述第一直线边的长度小于所述第二直线边的长度。
  10. 如权利要求7所述的掩膜版，其中，所述第二直线边与对应的第一直线边之间的间距大于所述掩膜边与对应的曲线边之间的间距。
  11. 如权利要求1所述的掩膜版，其中，所述掩膜版包括高精度金属掩膜版。
  12. 一种掩膜版，包括用于在显示面板的像素开口中制作子像素的掩膜开口；所述掩膜开口的面积大于对应的像素开口的面积；
    所述像素开口的形状为轴对称的八边形，所述像素开口包括四条内凹的曲线边，任意相邻的两条曲线边通过第一直线边连接，且所述任意相邻的两条曲线边与另外相邻的两条曲线边相对设置；
    所述掩膜开口的形状为轴对称的八边形，所述掩膜开口包括四条直线形掩膜边，所述四条直线形掩膜边与所述四条内凹的曲线边一一对应，任意相邻的两条掩膜边通过第二直线边连接；所述第一直线边与所述第二直线边平行，且所述第一直线边的长度小于所述第二直线边的长度。
  13. 一种像素结构，所述像素结构包括形成在显示面板的像素开口中的子像素，且所述子像素采用掩膜版制作获得；
    所述掩膜版包括用于在所述像素开口中制作所述子像素的掩膜开口；所述掩膜开口的面积大于对应的像素开口的面积；所述像素开口包括至少一条内凹的曲线边；所述掩膜开口包括至少一条掩膜边，且所述至少一条掩膜边与至少一条曲线边一一对应，每一条掩膜边的曲率小于其对应的曲线边的曲率。
  14. 如权利要求13所述的像素结构，其中，所述掩膜边呈直线形。
  15. 如权利要求13所述的像素结构，其中，所述掩膜边呈曲线形。
  16. 如权利要求15所述的像素结构，其中，所述掩膜边呈圆弧形，所述圆弧的圆心角大于0 ，且小于或等于30 。
  17. 如权利要求13所述的像素结构，其中，所述掩膜开口的形状为轴对称图形。
  18. 如权利要求13所述的像素结构，其中，所述掩膜开口的形状包括正多边形或具有倒角的正多边形。
  19. 如权利要求13所述的像素结构，其中，所述像素开口的形状为轴对称的八边形，所述像素开口包括四条所述曲线边，任意相邻的两条曲线边通过第一直线边连接，且所述任意相邻的两条曲线边与另外相邻的两条曲线边相对设置；
    所述掩膜开口的形状为轴对称的八边形，所述掩膜开口包括四条所述掩膜边，四条所述掩膜边与四条所述曲线边一一对应，任意相邻的两条掩膜边通过第二直线边连接。
  20. 如权利要求19所述的像素结构，其中，四条所述曲线边的长度和曲率相同；四条所述掩膜边的长度和曲率相同。
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CN108594544A (zh) * 2017-10-24 2018-09-28 友达光电股份有限公司 像素结构与显示面板
CN208722880U (zh) * 2018-02-09 2019-04-09 京东方科技集团股份有限公司 一种像素排布结构、高精度金属掩模板及显示装置
CN208970513U (zh) * 2018-11-30 2019-06-11 京东方科技集团股份有限公司 像素结构和精细金属掩模板组
CN109935617A (zh) * 2018-11-30 2019-06-25 京东方科技集团股份有限公司 像素排列结构、显示基板以及掩模板组
CN109768073A (zh) * 2019-02-26 2019-05-17 武汉华星光电半导体显示技术有限公司 有机发光二极管显示器像素排列结构及显示面板

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