WO2021018693A3 - Gasverteiler für einen cvd-reaktor - Google Patents
Gasverteiler für einen cvd-reaktor Download PDFInfo
- Publication number
- WO2021018693A3 WO2021018693A3 PCT/EP2020/070694 EP2020070694W WO2021018693A3 WO 2021018693 A3 WO2021018693 A3 WO 2021018693A3 EP 2020070694 W EP2020070694 W EP 2020070694W WO 2021018693 A3 WO2021018693 A3 WO 2021018693A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- gas
- gas outlet
- cvd reactor
- outlet lines
- flow
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4408—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber by purging residual gases from the reaction chamber or gas lines
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45561—Gas plumbing upstream of the reaction chamber
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
- F15D—FLUID DYNAMICS, i.e. METHODS OR MEANS FOR INFLUENCING THE FLOW OF GASES OR LIQUIDS
- F15D1/00—Influencing flow of fluids
- F15D1/02—Influencing flow of fluids in pipes or conduits
- F15D1/025—Influencing flow of fluids in pipes or conduits by means of orifice or throttle elements
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
- F15D—FLUID DYNAMICS, i.e. METHODS OR MEANS FOR INFLUENCING THE FLOW OF GASES OR LIQUIDS
- F15D1/00—Influencing flow of fluids
- F15D1/14—Diverting flow into alternative channels
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- General Engineering & Computer Science (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Die Erfindung betrifft einen Gasverteiler mit einer Gaszuleitung (2), die mehreren Gasableitungen (3, 3', 3'') strömungsverbindet. Ein in die Gaszuleitung (2) eingespeister erster Massenfluss eines Gases wird derart auf die mehreren Gasableitungen (3, 3', 3'') aufgeteilt, dass durch zumindest zwei der Gasableitungen (3, 3', 3'') jeweils ein zweiter Massenfluss des Gases fließt. Um sicherzustellen, dass sich das Massenflussverhältnis bei einer Änderung eines Totaldrucks nicht ändert, besitzen die Gasableitungen (3, 3', 3'') Drosselelemente (4, 4', 4''), wobei die Drosselelemente (4, 4', 4'') ein oder mehrere untereinander gleichgestaltete Drosselkanäle (5) aufweisen, deren Durchflussfläche kleiner ist als die Durchflussfläche der zugeordneten Gasableitung (3, 3', 3''). Des Weiteren betrifft die Erfindung einen CVD-Reaktor (10) sowie ein Verfahren zum Einspeisen von Spülgasen in einen CVD-Reaktor (10).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102019120589.1A DE102019120589A1 (de) | 2019-07-30 | 2019-07-30 | Gasverteiler für einen CVD-Reaktor |
DE102019120589.1 | 2019-07-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2021018693A2 WO2021018693A2 (de) | 2021-02-04 |
WO2021018693A3 true WO2021018693A3 (de) | 2021-04-01 |
Family
ID=71784052
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2020/070694 WO2021018693A2 (de) | 2019-07-30 | 2020-07-22 | Gasverteiler für einen cvd-reaktor |
Country Status (3)
Country | Link |
---|---|
DE (1) | DE102019120589A1 (de) |
TW (1) | TW202118893A (de) |
WO (1) | WO2021018693A2 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102022002350A1 (de) * | 2022-06-29 | 2024-01-04 | Aixtron Se | Vorrichtung und Verfahren zum Behandeln eines Substrates |
CN115386859A (zh) * | 2022-08-16 | 2022-11-25 | 拓荆科技(上海)有限公司 | 限流组件和工艺腔体 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11230687A (ja) * | 1998-02-13 | 1999-08-27 | Toshiba Corp | 熱交換器 |
WO2009126155A1 (en) * | 2008-04-10 | 2009-10-15 | Utc Fire & Security Corporation | Fire suppression system with improved two-phase flow distribution |
EP3012229A1 (de) * | 2014-10-20 | 2016-04-27 | Auramarine Oy | Wasserzuführeinrichtung für uv-parallelreaktoren |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58142483U (ja) | 1982-03-20 | 1983-09-26 | 住友金属工業株式会社 | 分流器 |
US4800921A (en) | 1986-06-20 | 1989-01-31 | Exxon Production Research Company | Method and apparatus for dividing a single stream of liquid and vapor into multiple streams having similar vapor to liquid rations |
US5474102A (en) | 1991-07-15 | 1995-12-12 | Lopez; Robert | Fluid distribution manifold |
US5387477A (en) * | 1992-07-17 | 1995-02-07 | Dreisbach Electromotive Inc. | Air manager system for metal-air battery |
US6648019B2 (en) | 2000-12-15 | 2003-11-18 | Siemens Automotive Inc. | Air mass flow controller |
US6843882B2 (en) * | 2002-07-15 | 2005-01-18 | Applied Materials, Inc. | Gas flow control in a wafer processing system having multiple chambers for performing same process |
EP1748851B1 (de) | 2004-05-17 | 2009-07-29 | Rebs Zentralschmiertechnik GmbH | Vorrichtung und verfahren zum aufteilen einer mittels einer gasströmung transportierten viskosen flüssigkeit in mindestens zwei teilströmen |
DE102006013801A1 (de) * | 2006-03-24 | 2007-09-27 | Aixtron Ag | Gaseinlassorgan mit gelochter Isolationsplatte |
US20080122222A1 (en) * | 2006-11-29 | 2008-05-29 | H & H Tube & Manufacturing Co. | Crimp-on transition fitting |
US8291935B1 (en) * | 2009-04-07 | 2012-10-23 | Novellus Systems, Inc. | Flexible gas mixing manifold |
CN202962421U (zh) | 2012-12-21 | 2013-06-05 | 泸州市南方过滤设备有限公司 | 一种布流器 |
US9993387B2 (en) * | 2015-06-19 | 2018-06-12 | Lpi, Inc. | Multi-pump hot tub plumbing system |
-
2019
- 2019-07-30 DE DE102019120589.1A patent/DE102019120589A1/de active Pending
-
2020
- 2020-07-22 WO PCT/EP2020/070694 patent/WO2021018693A2/de active Application Filing
- 2020-07-27 TW TW109125218A patent/TW202118893A/zh unknown
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11230687A (ja) * | 1998-02-13 | 1999-08-27 | Toshiba Corp | 熱交換器 |
WO2009126155A1 (en) * | 2008-04-10 | 2009-10-15 | Utc Fire & Security Corporation | Fire suppression system with improved two-phase flow distribution |
EP3012229A1 (de) * | 2014-10-20 | 2016-04-27 | Auramarine Oy | Wasserzuführeinrichtung für uv-parallelreaktoren |
Also Published As
Publication number | Publication date |
---|---|
WO2021018693A2 (de) | 2021-02-04 |
TW202118893A (zh) | 2021-05-16 |
DE102019120589A1 (de) | 2021-02-04 |
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