WO2021006284A1 - Polyimide resin, polyimide varnish, and polyimide film - Google Patents

Polyimide resin, polyimide varnish, and polyimide film Download PDF

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Publication number
WO2021006284A1
WO2021006284A1 PCT/JP2020/026619 JP2020026619W WO2021006284A1 WO 2021006284 A1 WO2021006284 A1 WO 2021006284A1 JP 2020026619 W JP2020026619 W JP 2020026619W WO 2021006284 A1 WO2021006284 A1 WO 2021006284A1
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structural unit
polyimide
mol
film
compound
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PCT/JP2020/026619
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French (fr)
Japanese (ja)
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舜 星野
三田寺 淳
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三菱瓦斯化学株式会社
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Priority to KR1020217043366A priority Critical patent/KR20220034059A/en
Priority to JP2021530710A priority patent/JP7484913B2/en
Priority to CN202080049420.2A priority patent/CN114096589B/en
Publication of WO2021006284A1 publication Critical patent/WO2021006284A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1075Partially aromatic polyimides
    • C08G73/1078Partially aromatic polyimides wholly aromatic in the diamino moiety
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1003Preparatory processes
    • C08G73/1007Preparatory processes from tetracarboxylic acids or derivatives and diamines
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1057Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
    • C08G73/1064Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing sulfur
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D179/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
    • C09D179/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C09D179/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2150/00Compositions for coatings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2379/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
    • C08J2379/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08J2379/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

Definitions

  • the present invention relates to a polyimide resin, a polyimide varnish and a polyimide film.
  • polyimide resins are being studied in fields such as electrical and electronic components. For example, it is desired to replace a glass substrate used in an image display device such as a liquid crystal display or an OLED display with a plastic substrate for the purpose of reducing the weight and flexibility of the device, and a polyimide film suitable as the plastic substrate. Research is underway. In an image display device, when light emitted from a display element is emitted through a plastic substrate, colorless transparency is required for the plastic substrate, and light passes through a retardation film or a polarizing plate ( For example, a liquid crystal display, a touch panel, etc.) are required to have high optical isotropic properties (that is, low Rth) in addition to colorless transparency.
  • a retardation film or a polarizing plate For example, a liquid crystal display, a touch panel, etc.
  • Patent Document 1 states that 3,3'-diaminodiphenylsulfone (first diamine), 4,4′-diaminodiphenylsulfone and the like are used as polyimide resins that provide a polyimide film that is colorless and transparent, has a low Rth, and has excellent toughness.
  • a polyimide resin produced by using a combination with a specific diamine (second diamine) as a diamine component is described.
  • Patent Document 2 the applicant states that as a polyimide resin having a high refractive index, 1,2,4,5-cyclohexanetetracarboxylic acid dianhydride and 3,3', 4,4'-biphenyl are used as dicarboxylic acid components.
  • a polyimide using a combination of tetracarboxylic acid dianhydride and a combination of 4,4'-diaminodiphenyl sulfone and bis [4- (4-aminophenoxy) phenyl] phenyl as a diamine is disclosed.
  • a polyimide film in order for a polyimide film to be suitable as a substrate, not only colorless transparency and optical isotropic properties, but also chemical resistance (for example, acid resistance and alkali resistance) are important physical properties.
  • chemical resistance for example, acid resistance and alkali resistance
  • the polyimide film is required to have resistance to the acid used for etching the ITO film. If the acid resistance of the polyimide film is insufficient, the film may turn yellow and the colorless transparency may be impaired.
  • an alkaline aqueous solution such as a sodium hydroxide aqueous solution or a potassium hydroxide aqueous solution is mainly used for cleaning a support (a support to which a polyimide varnish is applied) such as a glass plate used in manufacturing a polyimide film. .. Cleaning with an alkaline aqueous solution may be performed even when a polyimide film is formed on a support such as a glass plate. Therefore, the polyimide film is also required to have resistance to alkali. However, in Patent Document 1, the chemical resistance is not evaluated.
  • a target electronic circuit is formed on the polyimide film through various steps such as a sputtering step and an etching step for forming a metal film depending on the application. If the film is not in close contact with a support such as a glass plate, a problem will occur in the process. In addition, a step of peeling the polyimide film from the support is required after these processes. At that time, the polyimide film is required to have a certain toughness, that is, high strength and good elongation in order to facilitate the process and prevent breakage during peeling.
  • polyimide when producing polyimide, various monomers are combined, but depending on the type of monomer, the reactivity is poor, and if an attempt is made to increase the molecular weight of the polyimide, polymerization takes an excessive amount of time. Therefore, polymerization is performed from the viewpoint of production cost. There was a need to save time.
  • the present invention has been made in view of such a situation, and the subject of the present invention is a film having excellent colorless transparency, optical isotropic property, chemical resistance (for example, acid resistance and alkali resistance), and toughness. It is an object of the present invention to provide a polyimide resin which can be formed and has a short polymerization time, and a polyimide varnish and a polyimide film containing the polyimide resin.
  • the present inventors have found that a polyimide resin containing a combination of specific structural units can solve the above-mentioned problems, and have completed the invention.
  • the structural unit A includes a structural unit (A-1) derived from a compound represented by the following formula (a-1), and a structural unit (A) derived from a compound represented by the following formula (a-2). -2) is not included,
  • the present invention it is possible to form a film having excellent colorless transparency, optical isotropic property, chemical resistance (for example, acid resistance and alkali resistance), and toughness, and the polymerization time of the polyimide resin is short.
  • the polyimide resin of the present invention has a structural unit A derived from tetracarboxylic acid dianhydride and a structural unit B derived from diamine, and the structural unit A is derived from a compound represented by the following formula (a-1).
  • the structural unit (A-1) is included, and the structural unit (A-2) derived from the compound represented by the following formula (a-2) is not included, and the structural unit B is the following formula (b-1).
  • the ratio of the structural unit (B-1) in the structural unit B is 30 to 70 mol%, and the ratio of the structural unit (B-2) in the structural unit B is 70 to 30 mol%.
  • the structural unit A is a structural unit derived from the tetracarboxylic dianhydride occupying the polyimide resin, and includes the structural unit (A-1) derived from the compound represented by the following formula (a-1), and , Does not include the structural unit (A-2) derived from the compound represented by the following formula (a-2).
  • the compound represented by the formula (a-1) is 1,2,4,5-cyclohexanetetracarboxylic dianhydride.
  • the structural unit A includes the structural unit (A-1)
  • the colorless transparency, optical isotropic property, and chemical resistance of the film can be improved.
  • the compound represented by the formula (a-2) is a 4,4'-oxydiphthalic anhydride. Since the structural unit A does not include the structural unit (A-2), the polymerization time of the polyimide resin can be shortened.
  • the ratio of the constituent unit (A-1) in the constituent unit A is preferably 90 mol% or more, more preferably more than 95 mol%, still more preferably 97 mol% or more, and particularly preferably 100 mol%. That is, it is particularly preferable that the structural unit A is composed of only the structural unit (A-1).
  • the structural unit A may include a structural unit other than the structural unit (A-1).
  • the tetracarboxylic dianhydride giving such a constituent unit is not particularly limited, but is pyromellitic dianhydride, 3,3', 4,4'-biphenyltetracarboxylic dianhydride, 9,9'.
  • Arophilic tetracarboxylic dianhydrides such as -bis (3,4-dicarboxyphenyl) fluorene dianhydride and 4,4'-(hexafluoroisopropyridene) diphthalic acid dianhydride (provided that the formula (a-2) is used.
  • the aromatic tetracarboxylic dianhydride means a tetracarboxylic dianhydride containing one or more aromatic rings
  • the alicyclic tetracarboxylic dianhydride has one alicyclic ring. It means a tetracarboxylic dianhydride containing the above and does not contain an aromatic ring
  • the aliphatic tetracarboxylic dianhydride means a tetracarboxylic dianhydride containing neither an aromatic ring nor an alicyclic ring.
  • the structural unit arbitrarily included in the structural unit A may be one type or two or more types.
  • the structural unit B is a structural unit derived from diamine in the polyimide resin, and is a structural unit (B-1) derived from a compound represented by the following formula (b-1) and the following formula (b-2). Includes a structural unit (B-2) derived from the compound represented by.
  • the compound represented by the formula (b-1) is 3,3'-diaminodiphenyl sulfone.
  • the structural unit B includes the structural unit (B-1)
  • the optical isotropic property and chemical resistance of the film can be improved.
  • the compound represented by the formula (b-2) is a bis [4- (4-aminophenoxy) phenyl] sulfone.
  • the structural unit B includes the structural unit (B-2)
  • the toughness of the film is excellent, that is, the tensile elongation can be improved.
  • the ratio of the structural unit (B-1) in the structural unit B is 30 to 70 mol%, preferably 40 to 65 mol%, and more preferably 50 to 60 mol%.
  • the ratio of the structural unit (B-2) in the structural unit B is 70 to 30 mol%, preferably 60 to 35 mol%, and more preferably 50 to 40 mol%.
  • the polymerization time of the polyimide resin is relatively short, which is preferable.
  • the molar ratio [(B-1) / (B-2)] of the structural unit (B-1) and the structural unit (B-2) in the structural unit B is preferably 30/70 to 70/30. , More preferably 40/60 to 65/35, and even more preferably 50/50 to 60/40.
  • the ratio or molar ratio of the structural unit (B-1) and the structural unit (B-2) is within the above range, the polymerization time can be shortened, and the transparency and toughness (elastic modulus) of the obtained polyimide resin can be shortened. , Strength and elongation) can be improved.
  • the molar ratio [(B-1) / (B-2)] of the structural unit (B-1) and the structural unit (B-2) in the structural unit B is preferably 50. It is / 50 to 70/30, more preferably 55/45 to 70/30, and even more preferably 60/40 to 70/30. Further, especially from the viewpoint of toughness (strength and elongation) and transparency, the molar ratio of the structural unit (B-1) to the structural unit (B-2) in the structural unit B [(B-1) / ( B-2)] is preferably 30/70 to 60/40, more preferably 30/70 to 55/45, and even more preferably 30/70 to 50/50.
  • the total ratio of the structural units (B-1) and (B-2) in the structural unit B is preferably 50 mol% or more, more preferably 70 mol% or more, still more preferably 90 mol% or more. It is particularly preferably 99 mol% or more.
  • the upper limit of the total ratio of the structural units (B-1) and (B-2) is not particularly limited, that is, 100 mol%.
  • the structural unit B may consist only of the structural unit (B-1) and the structural unit (B-2).
  • the structural unit B may include a structural unit other than the structural units (B-1) and (B-2).
  • the diamine that provides such a constituent unit is not particularly limited, but is limited to 1,4-phenylenediamine, p-xylylene diamine, 3,5-diaminobenzoic acid, 1,5-diaminonaphthalene, and 2,2'-dimethyl.
  • Alicyclic diamines such as cyclohexane and 1,4-bis (aminomethyl) cyclohexane; and aliphatic diamines such as ethylenediamine and hexamethylenediamine.
  • the aromatic diamine means a diamine containing one or more aromatic rings
  • the alicyclic diamine means a diamine containing one or more alicyclic rings and not containing an aromatic ring, and is a fat.
  • the group diamine means a diamine that does not contain an aromatic ring or an alicyclic ring.
  • the structural unit arbitrarily included in the structural unit B may be one type or two or more types.
  • Examples of the diamine that gives the structural unit arbitrarily included in the structural unit B include a compound represented by the following formula (b-3-1), a compound represented by the following formula (b-3-2), and the following formula (b).
  • the compound represented by -3-3) and the compound represented by the following formula (b-3-4) are preferable. That is, in the polyimide resin of one aspect of the present invention, the structural unit B is a structural unit (B-3-1) derived from a compound represented by the following formula (b-3-1), and the following formula (b-3).
  • R is independently a hydrogen atom, a fluorine atom or a methyl group.
  • the compound represented by the formula (b-3-1) is 4,4'-diamino-2,2'-bistrifluoromethyldiphenyl ether.
  • the structural unit (B-3-1) By including the structural unit (B-3-1) in the structural unit B, the colorless transparency of the film can be improved.
  • R is independently a hydrogen atom, a fluorine atom, or a methyl group, and is preferably a hydrogen atom.
  • the compounds represented by the formula (b-3-2) include 9,9-bis (4-aminophenyl) fluorene, 9,9-bis (3-fluoro-4-aminophenyl) fluorene, and 9,9. Examples thereof include -bis (3-methyl-4-aminophenyl) fluorene, and 9,9-bis (4-aminophenyl) fluorene is preferable.
  • the structural unit B includes the structural unit (B-3-2)
  • the optical isotropic property and heat resistance of the film can be improved.
  • the compound represented by the formula (b-3-3) is 2,2-bis (4- (4-aminophenoxy) phenyl) hexafluoropropane.
  • the structural unit B includes the structural unit (B-3-3), the colorless transparency of the film can be improved.
  • the compound represented by the formula (b-3-4) is 2,2'-bis (trifluoromethyl) benzidine.
  • the structural unit B includes the structural unit (B-3-4), the colorless transparency, chemical resistance, and mechanical properties of the film can be improved.
  • the constituent unit B includes the constituent unit (B-1), the constituent unit (B-2), and the constituent unit (B-3), the constituent unit (B-1) and the constituent unit (B-) in the constituent unit B.
  • the total ratio of 2) is preferably 70 to 95 mol%, more preferably 75 to 95 mol%, still more preferably 75 to 90 mol%, and the constituent unit (B-3) in the constituent unit B.
  • the total ratio of the structural unit (B-1), the structural unit (B-2), and the structural unit (B-3) in the structural unit B is preferably 75 mol% or more, more preferably 80 mol%.
  • the above is more preferably 90 mol% or more, and particularly preferably 99 mol% or more.
  • the upper limit of the ratio of the total of the structural unit (B-1), the structural unit (B-2), and the structural unit (B-3) is not particularly limited, that is, 100 mol%.
  • the structural unit B may be composed of only the structural unit (B-1), the structural unit (B-2), and the structural unit (B-3).
  • the structural unit (B-3) may be only the structural unit (B-3-1), may be only the structural unit (B-3-2), or may be only the structural unit (B-3-3). It may be only, or it may be only a structural unit (B-3-4). Further, the structural unit (B-3) may be a combination of two or more structural units selected from the group consisting of the structural units (B-3-1) to (B-3-4).
  • the number average molecular weight of the polyimide resin of the present invention is preferably 5,000 to 200,000 from the viewpoint of the mechanical strength of the obtained polyimide film.
  • the number average molecular weight of the polyimide resin can be obtained from, for example, a standard polymethylmethacrylate (PMMA) conversion value measured by gel filtration chromatography.
  • PMMA polymethylmethacrylate
  • the polyimide resin of the present invention may contain a structure other than the polyimide chain (a structure in which the structural unit A and the structural unit B are imide-bonded).
  • Examples of the structure other than the polyimide chain that can be contained in the polyimide resin include a structure containing an amide bond.
  • the polyimide resin of the present invention preferably contains a polyimide chain (a structure in which a structural unit A and a structural unit B are imide-bonded) as a main structure. Therefore, the ratio of the polyimide chain to the polyimide resin of the present invention is preferably 50% by mass or more, more preferably 70% by mass or more, still more preferably 90% by mass or more, and particularly preferably 99% by mass. % Or more.
  • the polyimide resin of the present invention By using the polyimide resin of the present invention, it is possible to form a film having excellent colorless transparency, optical isotropic property, chemical resistance (for example, acid resistance and alkali resistance), and toughness, which is suitable for the film.
  • the physical property values are as follows.
  • the total light transmittance is preferably 88% or more, more preferably 88.5% or more, and further preferably 89% or more when the film has a thickness of 10 ⁇ m.
  • the yellow index (YI) is preferably 4.0 or less, more preferably 2.5 or less, and further preferably 2.0 or less when the film has a thickness of 10 ⁇ m.
  • b * is preferably 2.0 or less, more preferably 1.2 or less, and further preferably 1.0 or less when the film has a thickness of 10 ⁇ m.
  • the absolute value of the thickness retardation (Rth) is preferably 70 nm or less, more preferably 60 nm or less, and further preferably 35 nm or less when the film has a thickness of 10 ⁇ m. Within this range, the optical isotropic property is excellent.
  • the tensile strength is preferably 105 MPa or more, more preferably 110 MPa or more, and further preferably 115 MPa or more.
  • the tensile elongation is preferably 5 to 20%, more preferably 5 to 15%. When both the tensile strength and the tensile elongation are in this range, the toughness of the film is excellent, the polyimide film can be easily peeled off from the support, and breakage during peeling can be prevented.
  • the mixed acid ⁇ YI is preferably 1.5 or less, more preferably 1.3 or less, and further preferably 1.0 or less when the film has a thickness of 10 ⁇ m.
  • the mixed acid ⁇ b * is preferably 0.8 or less, more preferably 0.6 or less, and further preferably 0.5 or less when the film has a thickness of 10 ⁇ m.
  • the mixed acid ⁇ YI and the mixed acid ⁇ b * mean the difference in YI and the difference in b * before and after the immersion of the polyimide film in the mixture of phosphoric acid, nitric acid and acetic acid, respectively. It can be measured by the method described in the example. The smaller ⁇ YI and ⁇ b * , the better the acid resistance.
  • a film having excellent chemical resistance can be formed, and it also exhibits excellent resistance to acids. In particular, it exhibits excellent resistance to the above acid mixture.
  • the film that can be formed using the polyimide resin of the present invention has good mechanical properties and heat resistance, and has the following suitable physical property values.
  • the tensile elastic modulus is preferably 2.0 GPa or more, more preferably 2.5 GPa or more, and further preferably 3.0 GPa or more.
  • the glass transition temperature (Tg) is preferably 250 ° C. or higher, more preferably 270 ° C. or higher, and even more preferably 300 ° C. or higher. Within this range, the polyimide substrate has heat resistance suitable for manufacturing an image display device such as a liquid crystal display or an OLED display.
  • the above-mentioned physical property values in the present invention can be specifically measured by the method described in Examples.
  • the polyimide resin of the present invention contains a tetracarboxylic dian component containing a compound giving the above-mentioned structural unit (A-1) (however, does not contain the compound giving the above-mentioned structural unit (A-2)) and the above-mentioned structural unit. It can be produced by reacting a diamine component containing a compound giving (B-1) and a compound giving the above-mentioned structural unit (B-2).
  • Examples of the compound giving the structural unit (A-1) include the compound represented by the formula (a-1), but the compound is not limited to this, and may be a derivative thereof as long as the same structural unit is given.
  • Examples of the derivative include a tetracarboxylic acid (that is, 1,2,4,5-cyclohexanetetracarboxylic acid) corresponding to the tetracarboxylic dianhydride represented by the formula (a-1) and an alkyl of the tetracarboxylic acid. Esters can be mentioned.
  • the compound represented by the formula (a-1) that is, dianhydride
  • the compound represented by the formula (a-1) that is, dianhydride
  • the tetracarboxylic acid component contains the compound giving the structural unit (A-1) in an amount of preferably 90 mol% or more, more preferably more than 95 mol%, still more preferably 97 mol% or more, still more preferably 100. Contains mol%.
  • the tetracarboxylic acid component may contain a compound other than the compound giving the constituent unit (A-1), and examples of the compound include the above-mentioned aromatic tetracarboxylic dianhydride and alicyclic tetracarboxylic dianhydride. And aliphatic tetracarboxylic dianhydrides, and derivatives thereof (tetracarboxylic dians, alkyl esters of tetracarboxylic dians, etc.).
  • the compound arbitrarily contained in the tetracarboxylic acid component may be one kind or two or more kinds.
  • Examples of the compound giving the structural unit (B-1) include the compound represented by the formula (b-1), but the compound is not limited to this, and may be a derivative thereof as long as the same structural unit is given.
  • Examples of the derivative include diisocyanates corresponding to the diamine represented by the formula (b-1).
  • the compound represented by the formula (b-1) that is, diamine
  • the compound represented by the formula (B-2) include the compound represented by the formula (b-2), but the compound is not limited to this, and may be a derivative thereof as long as the same structural unit is given.
  • Examples of the derivative include diisocyanates corresponding to the diamine represented by the formula (b-2).
  • the compound represented by the formula (b-2) that is, diamine
  • the diamine component preferably contains a compound that gives the structural unit (B-1) in an amount of 30 to 70 mol%, more preferably 40 to 65 mol%, and even more preferably 50 to 60 mol%.
  • the ratio of the compound giving the structural unit (B-1) in the diamine component is within the above range, the polymerization time of the polyimide resin is relatively short, which is preferable.
  • the diamine component preferably contains a compound that gives the structural unit (B-2) in an amount of 70 to 30 mol%, more preferably 60 to 35 mol%, still more preferably 50 to 40 mol%.
  • the molar ratio [(B-1) / (B-2)] of the compound giving the structural unit (B-1) and the compound giving the structural unit (B-2) in the diamine component is preferably from 30/70 to. It is 70/30, more preferably 40/60 to 65/35, and even more preferably 50/50 to 60/40.
  • the molar ratio of the compound giving the structural unit (B-1) to the compound giving the structural unit (B-2) in the diamine component [(B-1) / (B-2)]. is preferably 50/50 to 70/30, more preferably 55/45 to 70/30, and even more preferably 60/40 to 70/30.
  • the molar ratio of the compound giving the structural unit (B-1) and the compound giving the structural unit (B-2) in the diamine component [(B). -1) / (B-2)] is preferably 30/70 to 60/40, more preferably 30/70 to 55/45, and even more preferably 30/70 to 50/50.
  • the diamine component contains, in total, a compound giving the structural unit (B-1) and a compound giving the structural unit (B-2) in an amount of 50 mol% or more, more preferably 70 mol% or more, still more preferably 90 mol. % Or more, particularly preferably 99 mol% or more.
  • the upper limit of the total content ratio of the compound giving the structural unit (B-1) and the compound giving the structural unit (B-2) is not particularly limited, that is, 100 mol%.
  • the diamine component may consist only of a compound giving a structural unit (B-1) and a compound giving a structural unit (B-2).
  • the diamine component may contain a compound other than the compound giving the structural unit (B-1) or (B-2), and the compound includes the above-mentioned aromatic diamine, alicyclic diamine, and aliphatic diamine, and them. Derivatives of (diamine, etc.) can be mentioned.
  • the compound arbitrarily contained in the diamine component (that is, a compound other than the compound giving the structural unit (B-1) or (B-2)) may be one kind or two or more kinds.
  • Examples of the compound arbitrarily contained in the diamine component include a compound that gives a structural unit (B-3) (that is, a compound that gives a structural unit (B-3-1), and a compound that gives a structural unit (B-3-2). At least one selected from the group consisting of a compound giving a structural unit (B-3-3) and a compound giving a structural unit (B-3-4)) is preferable.
  • Examples of the compound giving the structural unit (B-3) include a compound represented by the formula (b-3-1), a compound represented by the formula (b-3-2), and a compound represented by the formula (b-3-3).
  • Examples thereof include the compound represented by the compound and the compound represented by the formula (b-3-4), but the present invention is not limited to this, and a derivative thereof may be used as long as the same structural unit can be formed.
  • Examples of the derivative include diisocyanates corresponding to diamines represented by the formulas (b-3-1) to (b-3-4).
  • the compound that gives the structural unit (B-3) at least one (that is, diamine) selected from the group consisting of the compounds represented by the formulas (b-3-1) to (b-3-4) is used. preferable.
  • the diamine component contains a compound that gives a structural unit (B-1), a compound that gives a structural unit (B-2), and a compound that gives a structural unit (B-3), the diamine component is a structural unit (B-1).
  • the constituent unit (B-2) are preferably contained in an amount of 70 to 95 mol%, more preferably 75 to 95 mol%, still more preferably 75 to 90 mol%, and the constituent unit ( The compound giving B-3) is preferably contained in an amount of 5 to 30 mol%, more preferably 5 to 25 mol%, still more preferably 10 to 25 mol%.
  • the diamine component contains a compound that gives the structural unit (B-1), a compound that gives the structural unit (B-2), and a compound that gives the structural unit (B-3) in total, preferably 75 mol% or more, and more. It preferably contains 80 mol% or more, more preferably 90 mol% or more, and particularly preferably 99 mol% or more.
  • the upper limit of the total content ratio of the compound giving the structural unit (B-1), the compound giving the structural unit (B-2), and the compound giving the structural unit (B-3) is not particularly limited, that is, 100. Mol%.
  • the diamine component may consist only of a compound that gives a structural unit (B-1), a compound that gives a structural unit (B-2), and a compound that gives a structural unit (B-3).
  • the compound that gives the structural unit (B-3) may be only the compound that gives the structural unit (B-3-1), or may be only the compound that gives the structural unit (B-3-2). It may be only a compound giving a structural unit (B-3-3), or it may be only a compound giving a structural unit (B-3-4).
  • the compound that gives the structural unit (B-3) is a combination of two or more compounds selected from the group consisting of the compounds that give the structural unit (B-3-1) to (B-3-4). May be good.
  • the ratio of the amount of the tetracarboxylic acid component to the diamine component charged in the production of the polyimide resin is preferably 0.9 to 1.1 mol of the diamine component with respect to 1 mol of the tetracarboxylic acid component.
  • an end-capping agent may be used for producing the polyimide resin.
  • the terminal encapsulant monoamines or dicarboxylic acids are preferable.
  • the amount of the end-capping agent to be introduced is preferably 0.0001 to 0.1 mol, particularly preferably 0.001 to 0.06 mol, based on 1 mol of the tetracarboxylic acid component.
  • Examples of the monoamine terminal sealant include methylamine, ethylamine, propylamine, butylamine, benzylamine, 4-methylbenzylamine, 4-ethylbenzylamine, 4-dodecylbenzylamine, 3-methylbenzylamine, 3-. Ethylbenzylamine, aniline, 3-methylaniline, 4-methylaniline and the like are recommended. Of these, benzylamine and aniline can be preferably used.
  • dicarboxylic acid terminal encapsulant dicarboxylic acids are preferable, and a part thereof may be ring-closed.
  • phthalic acid, phthalic anhydride, 4-chlorophthalic acid, tetrafluorophthalic acid, 2,3-benzophenonedicarboxylic acid, 3,4-benzophenonedicarboxylic acid, cyclopentane-1,2-dicarboxylic acid, 4-cyclohexene-1. , 2-Dicarboxylic acid, etc. are recommended.
  • phthalic acid and phthalic anhydride can be preferably used.
  • the method for reacting the above-mentioned tetracarboxylic acid component with the diamine component is not particularly limited, and a known method can be used.
  • a specific reaction method (1) a tetracarboxylic acid component, a diamine component, and a reaction solvent are charged into a reactor, stirred at room temperature to 80 ° C. for 0.5 to 30 hours, and then heated to imidize. Method of carrying out the reaction, (2) After charging the diamine component and the reaction solvent into the reactor and dissolving them, the tetracarboxylic acid component is charged, and if necessary, the mixture is stirred at room temperature to 80 ° C.
  • Examples thereof include a method of carrying out an imidization reaction by raising the temperature to (3) a method of charging a tetracarboxylic acid component, a diamine component and a reaction solvent into a reactor and immediately raising the temperature to carry out the imidization reaction.
  • the reaction solvent used in the production of the polyimide resin may be one that does not inhibit the imidization reaction and can dissolve the produced polyimide resin.
  • an aprotic solvent, a phenol solvent, an ether solvent, a carbonate solvent and the like can be mentioned.
  • aprotonic solvent examples include N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidone, N-methylcaprolactam, 1,3-dimethylimidazolidinone, tetramethylurea and the like.
  • Amide-based solvents lactone-based solvents such as ⁇ -butyrolactone and ⁇ -valerolactone, phosphorus-containing amide-based solvents such as hexamethylphosphoric amide and hexamethylphosphintriamide, and sulfur-containing solvents such as dimethylsulfone, dimethylsulfoxide, and sulfolane.
  • Examples thereof include based solvents, ketone solvents such as acetone, cyclohexanone and methylcyclohexanone, amine solvents such as picolin and pyridine, and ester solvents such as acetic acid (2-methoxy-1-methylethyl).
  • phenolic solvent examples include phenol, o-cresol, m-cresol, p-cresol, 2,3-xylenol, 2,4-xylenol, 2,5-xylenol, 2,6-xylenol, 3,4. -Xylenol, 3,5-xylenol and the like can be mentioned.
  • ether solvent examples include 1,2-dimethoxyethane, bis (2-methoxyethyl) ether, 1,2-bis (2-methoxyethoxy) ethane, and bis [2- (2-methoxyethoxy) ethyl]. Examples include ether, tetrahydrofuran, 1,4-dioxane and the like.
  • the carbonate solvent examples include diethyl carbonate, methyl ethyl carbonate, ethylene carbonate, propylene carbonate and the like.
  • an amide solvent or a lactone solvent is preferable.
  • the above-mentioned reaction solvent may be used alone or in mixture of 2 or more types.
  • the imidization reaction it is preferable to carry out the reaction while removing water generated during production using a Dean-Stark apparatus or the like. By performing such an operation, the degree of polymerization and the imidization rate can be further increased.
  • a known imidization catalyst can be used.
  • the imidization catalyst include a base catalyst and an acid catalyst.
  • Base catalysts include pyridine, quinoline, isoquinoline, ⁇ -picoline, ⁇ -picoline, 2,4-lutidine, 2,6-lutidine, trimethylamine, triethylamine, tripropylamine, tributylamine, triethylenediamine, imidazole, N, N.
  • Examples thereof include organic base catalysts such as dimethylaniline and N, N-diethylaniline, and inorganic base catalysts such as potassium hydroxide, sodium hydroxide, potassium carbonate, sodium carbonate, potassium hydrogencarbonate and sodium hydrogencarbonate.
  • the acid catalyst examples include crotonic acid, acrylic acid, trans-3-hexenoic acid, cinnamic acid, benzoic acid, methylbenzoic acid, oxybenzoic acid, terephthalic acid, benzenesulfonic acid, paratoluenesulfonic acid, naphthalenesulfonic acid and the like. Can be mentioned.
  • the above-mentioned imidization catalyst may be used alone or in combination of two or more.
  • a base catalyst more preferably an organic base catalyst, further preferably triethylamine, and particularly preferably a combination of triethylamine and triethylenediamine.
  • the temperature of the imidization reaction is preferably 120 to 250 ° C., more preferably 160 to 200 ° C. from the viewpoint of suppressing the reaction rate and gelation.
  • the reaction time is preferably 0.5 to 6 hours, more preferably 0.5 to 5.5 hours after the start of distillation of the produced water.
  • the reaction time of the polyimide resin of the present invention is relatively short.
  • the solid content concentration during the imidization reaction is preferably 30 to 60% by mass, more preferably 35 to 58% by mass, and particularly preferably 40 to 56% by mass.
  • the solid content concentration at the time of the imidization reaction is within this range, the imidization reaction proceeds satisfactorily and the water generated during the reaction can be easily removed, so that the degree of polymerization and the imidization rate can be increased.
  • the solid content concentration at the time of the imidization reaction is a value calculated from the following formula based on the mass of the tetracarboxylic acid component added into the reaction system, the diamine component in the reaction system, and the reaction solvent.
  • Solid content concentration (mass%) at the time of imidization reaction (total mass of tetracarboxylic acid component and diamine component) / (total mass of tetracarboxylic acid component, diamine component, and reaction solvent) ⁇ 100
  • the polyimide varnish of the present invention is obtained by dissolving the polyimide resin of the present invention in an organic solvent. That is, the polyimide varnish of the present invention contains the polyimide resin of the present invention and an organic solvent, and the polyimide resin is dissolved in the organic solvent.
  • the organic solvent may be any one that dissolves the polyimide resin, and is not particularly limited, but it is preferable to use the above-mentioned compounds alone or in combination of two or more as the reaction solvent used for producing the polyimide resin.
  • the polyimide varnish of the present invention may be a polyimide solution itself in which a polyimide resin obtained by a polymerization method is dissolved in a reaction solvent, or a diluting solvent may be further added to the polyimide solution.
  • the polyimide resin of the present invention Since the polyimide resin of the present invention has solvent solubility, it can be a varnish having a high concentration stable at room temperature.
  • the polyimide varnish of the present invention preferably contains the polyimide resin of the present invention in an amount of 5 to 40% by mass, more preferably 10 to 30% by mass.
  • the viscosity of the polyimide varnish is preferably 1 to 200 Pa ⁇ s, more preferably 1.5 to 100 Pa ⁇ s.
  • the viscosity of the polyimide varnish is a value measured at 25 ° C. using an E-type viscometer.
  • the polyimide varnish of the present invention has an inorganic filler, an adhesion accelerator, a release agent, a flame retardant, an ultraviolet stabilizer, a surfactant, a leveling agent, a defoaming agent, and a fluorescence increase as long as the required properties of the polyimide film are not impaired.
  • Various additives such as a whitening agent, a cross-linking agent, a polymerization initiator, and a photosensitizer may be contained.
  • the method for producing the polyimide varnish of the present invention is not particularly limited, and a known method can be applied.
  • the polyimide film of the present invention contains the polyimide resin of the present invention. Therefore, the polyimide film of the present invention is excellent in colorless transparency, optical isotropic property, and chemical resistance (for example, acid resistance and alkali resistance). Suitable physical property values of the polyimide film of the present invention are as described above.
  • the method for producing the polyimide film of the present invention is not particularly limited, and a known method can be used.
  • the polyimide varnish of the present invention is applied onto a smooth support such as a glass plate, a metal plate, or plastic, or formed into a film, and then an organic solvent such as a reaction solvent or a dilution solvent contained in the varnish is applied. Examples thereof include a method of removing by heating.
  • the coating method examples include known coating methods such as spin coating, slit coating, and blade coating. Above all, the slit coat is preferable from the viewpoint of controlling the intermolecular orientation and improving the chemical resistance and workability.
  • the organic solvent is evaporated at a temperature of 150 ° C. or lower to make it tack-free, and then the temperature is equal to or higher than the boiling point of the organic solvent used (not particularly limited, but preferably). It is preferable to dry at 200 to 500 ° C.). Further, it is preferable to dry in an air atmosphere or a nitrogen atmosphere. The pressure in the dry atmosphere may be reduced pressure, normal pressure, or pressurized pressure.
  • the method of peeling the polyimide film formed on the support from the support is not particularly limited, but a laser lift-off method or a method of using a sacrificial layer for peeling (a mold release agent is applied to the surface of the support in advance). How to put) can be mentioned.
  • the polyimide film of the present invention can also be produced by using a polyamic acid varnish in which polyamic acid is dissolved in an organic solvent.
  • the polyamic acid contained in the polyamic acid varnish is a precursor of the polyimide resin of the present invention and includes a compound giving the above-mentioned structural unit (A-1) and a compound giving the above-mentioned structural unit (A-2). It is a product of a polyaddition reaction between a tetracarboxylic acid component and a diamine component containing the compound giving the above-mentioned structural unit (B-1) and the compound giving the above-mentioned structural unit (B-2).
  • the polyimide resin of the present invention By imidizing (dehydrating and ring-closing) this polyamic acid, the polyimide resin of the present invention, which is the final product, can be obtained.
  • the organic solvent contained in the polyamic acid varnish the organic solvent contained in the polyimide varnish of the present invention can be used.
  • the polyamic acid varnish may be the polyamic acid solution itself obtained by subjecting the tetracarboxylic acid component and the diamine component to a heavy addition reaction in a reaction solvent, or may be further diluted with respect to the polyamic acid solution. It may be the one to which a solvent is added.
  • the method for producing the polyimide film using the polyamic acid varnish is not particularly limited, and a known method can be used.
  • a polyamic acid varnish is applied onto a smooth support such as a glass plate, a metal plate, or plastic, or formed into a film, and organic solvents such as a reaction solvent and a diluting solvent contained in the varnish are removed by heating.
  • a polyamic acid film is obtained, and the polyamic acid in the polyamic acid film is imidized by heating to produce a polyimide film.
  • the heating temperature for drying the polyamic acid varnish to obtain a polyamic acid film is preferably 50 to 120 ° C.
  • the heating temperature for imidizing the polyamic acid by heating is preferably 200 to 400 ° C.
  • the imidization method is not limited to thermal imidization, and chemical imidization can also be applied.
  • the thickness of the polyimide film of the present invention can be appropriately selected depending on the intended use and the like, but is preferably in the range of 1 to 250 ⁇ m, more preferably 5 to 100 ⁇ m, and further preferably 10 to 80 ⁇ m. When the thickness is 1 to 250 ⁇ m, it can be practically used as a self-supporting film.
  • the thickness of the polyimide film can be easily controlled by adjusting the solid content concentration and viscosity of the polyimide varnish.
  • the polyimide film of the present invention is suitably used as a film for various members such as color filters, flexible displays, semiconductor parts, and optical members.
  • the polyimide film of the present invention is particularly preferably used as a substrate for an image display device such as a liquid crystal display or an OLED display.
  • each physical property was measured by the method shown below.
  • (1) Film thickness The film thickness was measured using a micrometer manufactured by Mitutoyo Co., Ltd.
  • Tensile strength (tensile strength), tensile elastic modulus and tensile elongation (tensile fracture strain) are based on JIS K7161: 2014 and JIS K7127: 1999, and the tensile tester "Strograph VG-1E" manufactured by Toyo Seiki Co., Ltd. Was measured using.
  • the distance between the chucks was 50 mm, the test piece size was 10 mm ⁇ 70 mm, and the test speed was 20 mm / min.
  • (3) Glass transition temperature (Tg) Using the thermomechanical analyzer "TMA / SS6100" manufactured by Hitachi High-Tech Science Co., Ltd., residual stress is removed under the conditions of sample size 2 mm x 20 mm, load 0.1 N, and heating rate 10 ° C / min in tensile mode. The temperature was raised to a sufficient temperature to remove residual stress, and then cooled to room temperature.
  • Rth is expressed by the following formula when the maximum in-plane refractive index of the polyimide film is nx, the minimum is ny, the refractive index in the thickness direction is nz, and the thickness of the film is d. It is a thing.
  • Rth [ ⁇ (nx + ny) / 2 ⁇ -nz] ⁇ d (6)
  • Polymerization time The polymerization time required for the viscosity to be 12 Pa ⁇ s or more when the solid content concentration was 20% by mass was defined as the polymerization time. However, the polymerization time means the time during which the temperature in the reaction system reaches 190 ° C. and is maintained at 190 ° C.
  • Acid resistance (mixed acid ⁇ YI and mixed acid ⁇ b * )
  • a mixed acid HNO 3 (10% by mass) + H 3 PO 4 (70% by mass) + CH 3 COOH (5% by mass) + H 2 O (15% by mass) obtained by warming a polyimide film formed on a glass plate to 40 ° C.
  • the mixture was immersed in a mixed solution for 4 minutes and then washed with water. After washing with water, the water was wiped off, and the mixture was heated on a hot plate at 240 ° C. for 50 minutes to dry.
  • YI and b * were measured before and after the test, and their changes ( ⁇ YI and ⁇ b * ) were determined.
  • the YI measurement and b * measurement here were performed in a state where a polyimide film was formed on a glass plate (a state of a glass plate + a polyimide film).
  • the polyimide film formed on the alkali-resistant glass plate was immersed in a potassium hydroxide aqueous solution having a concentration of 3% by mass at room temperature for 5 minutes, and then washed with water. After washing with water, it was confirmed that there was no change on the film surface.
  • the evaluation criteria for alkali resistance are as follows. A: There was no change on the film surface. B: The film surface was slightly cracked. C: The film surface was cracked or the film surface was dissolved.
  • tetracarboxylic acid component and diamine component used in Examples and Comparative Examples, other components, and their abbreviations are as follows.
  • BAPS Bis [4- (4-aminophenoxy) phenyl] sulfone (manufactured by Seika Co., Ltd .; compound represented by formula (b-2))
  • GBL ⁇ -Butyrolactone (manufactured by Mitsubishi Chemical Corporation)
  • TEA Triethylamine (manufactured by Kanto Chemical Co.,
  • Example 1 3,3'-DDS 14.135g (0) in a 300mL five-necked round-bottom flask with a stainless half-moon agitator, a nitrogen inlet tube, a Dean Stark with a cooling tube, a thermometer, and a glass end cap. .057 mol), BAPS 24.527 g (0.057 mol), and GBL 41.945 g were added and stirred at a system temperature of 70 ° C. and a nitrogen atmosphere at a rotation speed of 200 rpm to obtain a solution.
  • Example 2 3,3'-DDS 17.571g (0) in a 300mL five-necked round-bottom flask equipped with a stainless half-moon agitator, a nitrogen inlet tube, a Dean Stark with a cooling tube, a thermometer, and a glass end cap. .071 mol), BAPS 20.326 g (0.047 mol), and GBL 42.041 g were added and stirred at a system temperature of 70 ° C. and a nitrogen atmosphere at a rotation speed of 200 rpm to obtain a solution.
  • the obtained polyimide varnish was applied onto a glass plate by spin coating, held on a hot plate at 80 ° C. for 20 minutes, and then heated in a hot air dryer at 260 ° C. for 30 minutes in an air atmosphere to evaporate the solvent. And obtained a film.
  • Table 1 The results are shown in Table 1.
  • the polyimide films of Examples 1 and 2 used HPMDA as the tetracarboxylic acid component, and 50 to 60 mol% of 3,3'-DDS and 50 to 40 mol% of BAPS as the diamine component. Manufactured in combination. As a result, it exhibited colorless transparency, optical isotropic property, acid resistance, and alkali resistance, and was excellent in toughness. Furthermore, the polymerization time was shorter than that of the comparative example.
  • the polyimide film of Comparative Example 1 was produced by using HPMDA as a tetracarboxylic acid component and using 20 mol% of 3,3'-DDS and 80 mol% of BAPS in combination as a diamine component.
  • the polyimide film of Comparative Example 2 was produced by using HPMDA as a tetracarboxylic acid component and using 80 mol% of 3,3'-DDS and 20 mol% of BAPS in combination as a diamine component. As a result, although the thickness retardation (Rth) was low and the optical characteristics were excellent, the tensile elongation and tensile strength were low and inferior. In addition, the polymerization time was long.
  • a polyimide film produced by using HPMDA as a tetracarboxylic acid component and 3,3'-DDS and BAPS as a diamine component in a specific ratio has colorless transparency, optical isotropic property, and chemical resistance (for example, it can be suitably used as a plastic substrate for a liquid crystal display, a touch panel, etc. as a film having excellent acid resistance and alkali resistance) and toughness. Further, the polymerization time is short, the energy during production can be reduced, and the production cost is excellent.

Abstract

This polyimide resin has structural unit A derived from a tetracarboxylic acid di-anhydride and structural unit B derived from a diamine, wherein the structural unit A includes structural unit (A-1) derived from a compound represented by formula (a-1) but does not include structural unit (A-2) derived from a compound represented by formula (a-2), the structural unit B includes structural unit (B-1) derived from a compound represented by formula (b-1) and structural unit (B-2) derived from a compound represented by formula (b-2), the proportion of structural unit (B-1) in structural unit B is 30-70 mol%, and the proportion of structural unit (B-2) in structural unit B is 70-30 mol%.

Description

ポリイミド樹脂、ポリイミドワニス及びポリイミドフィルムPolyimide resin, polyimide varnish and polyimide film
 本発明はポリイミド樹脂、ポリイミドワニス及びポリイミドフィルムに関する。 The present invention relates to a polyimide resin, a polyimide varnish and a polyimide film.
 ポリイミド樹脂は、電気・電子部品等の分野において様々な利用が検討されている。例えば、液晶ディスプレイやOLEDディスプレイ等の画像表示装置に用いられるガラス基板を、デバイスの軽量化やフレキシブル化を目的として、プラスチック基板へ代替することが望まれており、当該プラスチック基板として適するポリイミドフィルムの研究が進められている。
 画像表示装置において、表示素子から発せられる光がプラスチック基板を通って出射されるような場合、プラスチック基板には無色透明性が要求され、さらに、位相差フィルムや偏光板を光が通過する場合(例えば、液晶ディスプレイ、タッチパネルなど)は、無色透明性に加えて、光学的等方性が高い(即ち、Rthが低い)ことも要求される。
Various uses of polyimide resins are being studied in fields such as electrical and electronic components. For example, it is desired to replace a glass substrate used in an image display device such as a liquid crystal display or an OLED display with a plastic substrate for the purpose of reducing the weight and flexibility of the device, and a polyimide film suitable as the plastic substrate. Research is underway.
In an image display device, when light emitted from a display element is emitted through a plastic substrate, colorless transparency is required for the plastic substrate, and light passes through a retardation film or a polarizing plate ( For example, a liquid crystal display, a touch panel, etc.) are required to have high optical isotropic properties (that is, low Rth) in addition to colorless transparency.
 上記のような要求性能を満たすために、様々なポリイミド樹脂の開発が進められている。例えば、特許文献1には、無色透明でRthが低く、靱性に優れるポリイミドフィルムを与えるポリイミド樹脂として、3,3’-ジアミノジフェニルスルホン(第一ジアミン)と4,4’-ジアミノジフェニルスルホン等の特定のジアミン(第二ジアミン)との組み合わせをジアミン成分に用いて製造されたポリイミド樹脂が記載されている。
 また、出願人は、特許文献2において、屈折率の高いポリイミド樹脂として、ジカルボン酸成分として1,2,4,5-シクロヘキサンテトラカルボン酸二無水物および3,3’,4,4’-ビフェニルテトラカルボン酸二無水物を組み合わせて用い、ジアミンとして4,4’-ジアミノジフェニルスルホン及びビス[4-(4-アミノフェノキシ)フェニル]スルホンを組み合わせて用いたポリイミドを開示している。
Various polyimide resins are being developed in order to satisfy the above-mentioned required performance. For example, Patent Document 1 states that 3,3'-diaminodiphenylsulfone (first diamine), 4,4′-diaminodiphenylsulfone and the like are used as polyimide resins that provide a polyimide film that is colorless and transparent, has a low Rth, and has excellent toughness. A polyimide resin produced by using a combination with a specific diamine (second diamine) as a diamine component is described.
Further, in Patent Document 2, the applicant states that as a polyimide resin having a high refractive index, 1,2,4,5-cyclohexanetetracarboxylic acid dianhydride and 3,3', 4,4'-biphenyl are used as dicarboxylic acid components. A polyimide using a combination of tetracarboxylic acid dianhydride and a combination of 4,4'-diaminodiphenyl sulfone and bis [4- (4-aminophenoxy) phenyl] phenyl as a diamine is disclosed.
国際公開第2016/158825号International Publication No. 2016/158825 国際公開第2017/195574号International Publication No. 2017/195574
 ところで、ポリイミドフィルムが基板として適するためには、無色透明性及び光学的等方性だけでなく、耐薬品性(例えば耐酸性及び耐アルカリ性)も重要な物性である。
 例えば、ポリイミドフィルムをITO(Indium Tin Oxide)膜形成用の基板として用いた場合、ポリイミドフィルムにはITO膜のエッチングに用いられる酸に対する耐性が求められる。ポリイミドフィルムの耐酸性が不十分であると、フィルムが黄変して無色透明性が損なわれるおそれがある。
 また、ポリイミドフィルムを製造する際に使用するガラス板等の支持体(ポリイミドワニスを塗布する支持体)の洗浄には、水酸化ナトリウム水溶液や水酸化カリウム水溶液等のアルカリ水溶液が主に使用される。アルカリ水溶液による洗浄は、ガラス板等の支持体上にポリイミドフィルムが製膜された状態でも行われる可能性がある。したがって、ポリイミドフィルムにはアルカリに対する耐性も求められる。
 しかし、特許文献1では、耐薬品性について評価されていない。
By the way, in order for a polyimide film to be suitable as a substrate, not only colorless transparency and optical isotropic properties, but also chemical resistance (for example, acid resistance and alkali resistance) are important physical properties.
For example, when a polyimide film is used as a substrate for forming an ITO (Indium Tin Oxide) film, the polyimide film is required to have resistance to the acid used for etching the ITO film. If the acid resistance of the polyimide film is insufficient, the film may turn yellow and the colorless transparency may be impaired.
Further, an alkaline aqueous solution such as a sodium hydroxide aqueous solution or a potassium hydroxide aqueous solution is mainly used for cleaning a support (a support to which a polyimide varnish is applied) such as a glass plate used in manufacturing a polyimide film. .. Cleaning with an alkaline aqueous solution may be performed even when a polyimide film is formed on a support such as a glass plate. Therefore, the polyimide film is also required to have resistance to alkali.
However, in Patent Document 1, the chemical resistance is not evaluated.
 そして、ポリイミドフィルムを基板として用いた場合には、用途に応じて金属膜作成のためのスパッタ工程やエッチング工程など各種工程をへてポリイミドフィルム上に目的とする電子回路が作られるが、この間ポリイミドフィルムはガラス板等の支持体上に密着していないとプロセスに不具合が生じる。また、それらのプロセス後にポリイミドフィルムを支持体から剥離する工程が必要となる。その際、ポリイミドフィルムにはプロセスを容易にして剥離中の破断を防ぐ意味で、一定の靱性、即ち高い強度を有するとともに良好な伸びを有することが求められる。
 さらに、ポリイミドを製造するに際しては、各種モノマーを組み合わせるが、モノマーの種類によっては反応性が悪く、ポリイミドの分子量を増加させようとすると重合に過剰な時間がかかることから、製造コストの観点から重合時間を短縮することが求められていた。
When the polyimide film is used as a substrate, a target electronic circuit is formed on the polyimide film through various steps such as a sputtering step and an etching step for forming a metal film depending on the application. If the film is not in close contact with a support such as a glass plate, a problem will occur in the process. In addition, a step of peeling the polyimide film from the support is required after these processes. At that time, the polyimide film is required to have a certain toughness, that is, high strength and good elongation in order to facilitate the process and prevent breakage during peeling.
Furthermore, when producing polyimide, various monomers are combined, but depending on the type of monomer, the reactivity is poor, and if an attempt is made to increase the molecular weight of the polyimide, polymerization takes an excessive amount of time. Therefore, polymerization is performed from the viewpoint of production cost. There was a need to save time.
 本発明はこのような状況に鑑みてなされたものであり、本発明の課題は、無色透明性、光学的等方性、耐薬品性(例えば耐酸性及び耐アルカリ性)、及び靱性に優れるフィルムの形成が可能であり、かつ重合時間の短いポリイミド樹脂、並びに該ポリイミド樹脂を含むポリイミドワニス及びポリイミドフィルムを提供することにある。 The present invention has been made in view of such a situation, and the subject of the present invention is a film having excellent colorless transparency, optical isotropic property, chemical resistance (for example, acid resistance and alkali resistance), and toughness. It is an object of the present invention to provide a polyimide resin which can be formed and has a short polymerization time, and a polyimide varnish and a polyimide film containing the polyimide resin.
 本発明者らは、特定の構成単位の組み合わせを含むポリイミド樹脂が上記課題を解決できることを見出し、発明を完成させるに至った。 The present inventors have found that a polyimide resin containing a combination of specific structural units can solve the above-mentioned problems, and have completed the invention.
 即ち、本発明は、下記の[1]~[3]に関する。
[1]テトラカルボン酸二無水物に由来する構成単位A及びジアミンに由来する構成単位Bを有するポリイミド樹脂であって、
 構成単位Aが下記式(a-1)で表される化合物に由来する構成単位(A-1)を含み、かつ、下記式(a-2)で表される化合物に由来する構成単位(A-2)を含まず、
 構成単位Bが下記式(b-1)で表される化合物に由来する構成単位(B-1)と、下記式(b-2)で表される化合物に由来する構成単位(B-2)とを含み、
 構成単位B中における構成単位(B-1)の比率が30~70モル%であり、構成単位B中における構成単位(B-2)の比率が70~30モル%である、ポリイミド樹脂。
Figure JPOXMLDOC01-appb-C000002

[2]上記[1]に記載のポリイミド樹脂が有機溶媒に溶解してなるポリイミドワニス。
[3]上記[1]に記載のポリイミド樹脂を含む、ポリイミドフィルム。
That is, the present invention relates to the following [1] to [3].
[1] A polyimide resin having a structural unit A derived from tetracarboxylic dianhydride and a structural unit B derived from diamine.
The structural unit A includes a structural unit (A-1) derived from a compound represented by the following formula (a-1), and a structural unit (A) derived from a compound represented by the following formula (a-2). -2) is not included,
A structural unit (B-1) in which the structural unit B is derived from a compound represented by the following formula (b-1) and a structural unit (B-2) derived from a compound represented by the following formula (b-2). Including and
A polyimide resin in which the ratio of the structural unit (B-1) in the structural unit B is 30 to 70 mol%, and the ratio of the structural unit (B-2) in the structural unit B is 70 to 30 mol%.
Figure JPOXMLDOC01-appb-C000002

[2] A polyimide varnish obtained by dissolving the polyimide resin according to the above [1] in an organic solvent.
[3] A polyimide film containing the polyimide resin according to the above [1].
 本発明によれば、無色透明性、光学的等方性、耐薬品性(例えば耐酸性及び耐アルカリ性)、及び靱性に優れるフィルムを形成することができ、かつ、ポリイミド樹脂の重合時間が短い。 According to the present invention, it is possible to form a film having excellent colorless transparency, optical isotropic property, chemical resistance (for example, acid resistance and alkali resistance), and toughness, and the polymerization time of the polyimide resin is short.
[ポリイミド樹脂]
 本発明のポリイミド樹脂は、テトラカルボン酸二無水物に由来する構成単位A及びジアミンに由来する構成単位Bを有し、構成単位Aが下記式(a-1)で表される化合物に由来する構成単位(A-1)を含み、かつ、下記式(a-2)で表される化合物に由来する構成単位(A-2)を含まず、構成単位Bが下記式(b-1)で表される化合物に由来する構成単位(B-1)と、下記式(b-2)で表される化合物に由来する構成単位(B-2)とを含む。そして、構成単位B中における構成単位(B-1)の比率が30~70モル%であり、構成単位B中における構成単位(B-2)の比率が70~30モル%である。
Figure JPOXMLDOC01-appb-C000003
[Polyimide resin]
The polyimide resin of the present invention has a structural unit A derived from tetracarboxylic acid dianhydride and a structural unit B derived from diamine, and the structural unit A is derived from a compound represented by the following formula (a-1). The structural unit (A-1) is included, and the structural unit (A-2) derived from the compound represented by the following formula (a-2) is not included, and the structural unit B is the following formula (b-1). It contains a structural unit (B-1) derived from the compound represented by the compound and a structural unit (B-2) derived from the compound represented by the following formula (b-2). The ratio of the structural unit (B-1) in the structural unit B is 30 to 70 mol%, and the ratio of the structural unit (B-2) in the structural unit B is 70 to 30 mol%.
Figure JPOXMLDOC01-appb-C000003
<構成単位A>
 構成単位Aは、ポリイミド樹脂に占めるテトラカルボン酸二無水物に由来する構成単位であって、下記式(a-1)で表される化合物に由来する構成単位(A-1)を含み、かつ、下記式(a-2)で表される化合物に由来する構成単位(A-2)を含まない。
Figure JPOXMLDOC01-appb-C000004
<Structural unit A>
The structural unit A is a structural unit derived from the tetracarboxylic dianhydride occupying the polyimide resin, and includes the structural unit (A-1) derived from the compound represented by the following formula (a-1), and , Does not include the structural unit (A-2) derived from the compound represented by the following formula (a-2).
Figure JPOXMLDOC01-appb-C000004
 式(a-1)で表される化合物は、1,2,4,5-シクロヘキサンテトラカルボン酸二無水物である。
 構成単位Aが構成単位(A-1)を含むことによって、フィルムの無色透明性、光学的等方性、及び耐薬品性を向上させることができる。
 式(a-2)で表される化合物は、4,4’-オキシジフタル酸無水物である。構成単位Aが構成単位(A-2)を含まないことによって、ポリイミド樹脂の重合時間を短くすることができる。
The compound represented by the formula (a-1) is 1,2,4,5-cyclohexanetetracarboxylic dianhydride.
When the structural unit A includes the structural unit (A-1), the colorless transparency, optical isotropic property, and chemical resistance of the film can be improved.
The compound represented by the formula (a-2) is a 4,4'-oxydiphthalic anhydride. Since the structural unit A does not include the structural unit (A-2), the polymerization time of the polyimide resin can be shortened.
 構成単位A中における構成単位(A-1)の比率は、好ましくは90モル%以上、より好ましくは95モル%を超え、更に好ましくは97モル%以上、特に好ましくは100モル%である。すなわち、構成単位Aは構成単位(A-1)のみからなることが特に好ましい。 The ratio of the constituent unit (A-1) in the constituent unit A is preferably 90 mol% or more, more preferably more than 95 mol%, still more preferably 97 mol% or more, and particularly preferably 100 mol%. That is, it is particularly preferable that the structural unit A is composed of only the structural unit (A-1).
 構成単位Aは、構成単位(A-1)以外の構成単位を含んでもよい。そのような構成単位を与えるテトラカルボン酸二無水物としては、特に限定されないが、ピロメリット酸二無水物、3,3’,4,4’-ビフェニルテトラカルボン酸二無水物、9,9’-ビス(3,4-ジカルボキシフェニル)フルオレン二無水物、及び4,4’-(ヘキサフルオロイソプロピリデン)ジフタル酸無水物等の芳香族テトラカルボン酸二無水物(ただし、式(a-2)で表される化合物を除く);1,2,3,4-シクロブタンテトラカルボン酸二無水物及びノルボルナン-2-スピロ-α-シクロペンタノン-α’-スピロ-2’’-ノルボルナン-5,5’’,6,6’’-テトラカルボン酸二無水物等の脂環式テトラカルボン酸二無水物(ただし、式(a-1)で表される化合物を除く);並びに1,2,3,4-ブタンテトラカルボン酸二無水物等の脂肪族テトラカルボン酸二無水物が挙げられる。
 なお、本明細書において、芳香族テトラカルボン酸二無水物とは芳香環を1つ以上含むテトラカルボン酸二無水物を意味し、脂環式テトラカルボン酸二無水物とは脂環を1つ以上含み、かつ芳香環を含まないテトラカルボン酸二無水物を意味し、脂肪族テトラカルボン酸二無水物とは芳香環も脂環も含まないテトラカルボン酸二無水物を意味する。
 構成単位Aに任意に含まれる構成単位は、1種でもよいし、2種以上であってもよい。
The structural unit A may include a structural unit other than the structural unit (A-1). The tetracarboxylic dianhydride giving such a constituent unit is not particularly limited, but is pyromellitic dianhydride, 3,3', 4,4'-biphenyltetracarboxylic dianhydride, 9,9'. Arophilic tetracarboxylic dianhydrides such as -bis (3,4-dicarboxyphenyl) fluorene dianhydride and 4,4'-(hexafluoroisopropyridene) diphthalic acid dianhydride (provided that the formula (a-2) is used. ); 1,2,3,4-cyclobutanetetracarboxylic dianhydride and norbornane-2-spirio-α-cyclopentanone-α'-spirio-2''-norbornan-5 , 5'', 6,6''-Alicyclic tetracarboxylic dianhydride such as tetracarboxylic dianhydride (excluding the compound represented by the formula (a-1)); and 1,2, , 3,4-Butanetetracarboxylic dianhydride and other aliphatic tetracarboxylic dianhydrides.
In the present specification, the aromatic tetracarboxylic dianhydride means a tetracarboxylic dianhydride containing one or more aromatic rings, and the alicyclic tetracarboxylic dianhydride has one alicyclic ring. It means a tetracarboxylic dianhydride containing the above and does not contain an aromatic ring, and the aliphatic tetracarboxylic dianhydride means a tetracarboxylic dianhydride containing neither an aromatic ring nor an alicyclic ring.
The structural unit arbitrarily included in the structural unit A may be one type or two or more types.
<構成単位B>
 構成単位Bは、ポリイミド樹脂に占めるジアミンに由来する構成単位であって、下記式(b-1)で表される化合物に由来する構成単位(B-1)と、下記式(b-2)で表される化合物に由来する構成単位(B-2)とを含む。
Figure JPOXMLDOC01-appb-C000005
<Structural unit B>
The structural unit B is a structural unit derived from diamine in the polyimide resin, and is a structural unit (B-1) derived from a compound represented by the following formula (b-1) and the following formula (b-2). Includes a structural unit (B-2) derived from the compound represented by.
Figure JPOXMLDOC01-appb-C000005
 式(b-1)で表される化合物は、3,3’-ジアミノジフェニルスルホンである。
 構成単位Bが構成単位(B-1)を含むことによって、フィルムの光学的等方性及び耐薬品性を向上させることができる。
 式(b-2)で表される化合物は、ビス[4-(4-アミノフェノキシ)フェニル]スルホンである。
 構成単位Bが構成単位(B-2)を含むことによって、フィルムの靱性に優れる、即ち引張伸び率を向上させることができる。
The compound represented by the formula (b-1) is 3,3'-diaminodiphenyl sulfone.
When the structural unit B includes the structural unit (B-1), the optical isotropic property and chemical resistance of the film can be improved.
The compound represented by the formula (b-2) is a bis [4- (4-aminophenoxy) phenyl] sulfone.
When the structural unit B includes the structural unit (B-2), the toughness of the film is excellent, that is, the tensile elongation can be improved.
 構成単位B中における構成単位(B-1)の比率は、30~70モル%であり、好ましくは40~65モル%であり、より好ましくは50~60モル%である。構成単位B中における構成単位(B-1)の比率が当該範囲内にあれば、ポリイミド樹脂の重合時間が比較的短く、好ましい。
 構成単位B中における構成単位(B-2)の比率は、70~30モル%であり、好ましくは60~35モル%であり、より好ましくは50~40モル%である。構成単位B中における構成単位(B-2)の比率が当該範囲内にあれば、ポリイミド樹脂の重合時間が比較的短く、好ましい。
 構成単位B中における構成単位(B-1)と構成単位(B-2)とのモル比率[(B-1)/(B-2)]は、好ましくは30/70~70/30であり、より好ましくは40/60~65/35であり、更に好ましくは50/50~60/40である。
 構成単位(B-1)及び構成単位(B-2)の比率あるいはモル比率が前記範囲であると、重合時間を短くすることができるうえに、得られるポリイミド樹脂の透明性及び靱性(弾性率、強度及び伸び率)を向上させることができる。
The ratio of the structural unit (B-1) in the structural unit B is 30 to 70 mol%, preferably 40 to 65 mol%, and more preferably 50 to 60 mol%. When the ratio of the structural unit (B-1) in the structural unit B is within the range, the polymerization time of the polyimide resin is relatively short, which is preferable.
The ratio of the structural unit (B-2) in the structural unit B is 70 to 30 mol%, preferably 60 to 35 mol%, and more preferably 50 to 40 mol%. When the ratio of the structural unit (B-2) in the structural unit B is within the range, the polymerization time of the polyimide resin is relatively short, which is preferable.
The molar ratio [(B-1) / (B-2)] of the structural unit (B-1) and the structural unit (B-2) in the structural unit B is preferably 30/70 to 70/30. , More preferably 40/60 to 65/35, and even more preferably 50/50 to 60/40.
When the ratio or molar ratio of the structural unit (B-1) and the structural unit (B-2) is within the above range, the polymerization time can be shortened, and the transparency and toughness (elastic modulus) of the obtained polyimide resin can be shortened. , Strength and elongation) can be improved.
 特に重合時間の観点からは、構成単位B中における構成単位(B-1)と構成単位(B-2)とのモル比率[(B-1)/(B-2)]は、好ましくは50/50~70/30であり、より好ましくは55/45~70/30であり、更に好ましくは60/40~70/30である。
 また、特に靱性(強度及び伸び率)や透明性の観点からは、構成単位B中における構成単位(B-1)と構成単位(B-2)とのモル比率[(B-1)/(B-2)]は、好ましくは30/70~60/40であり、より好ましくは30/70~55/45であり、更に好ましくは30/70~50/50である。
In particular, from the viewpoint of polymerization time, the molar ratio [(B-1) / (B-2)] of the structural unit (B-1) and the structural unit (B-2) in the structural unit B is preferably 50. It is / 50 to 70/30, more preferably 55/45 to 70/30, and even more preferably 60/40 to 70/30.
Further, especially from the viewpoint of toughness (strength and elongation) and transparency, the molar ratio of the structural unit (B-1) to the structural unit (B-2) in the structural unit B [(B-1) / ( B-2)] is preferably 30/70 to 60/40, more preferably 30/70 to 55/45, and even more preferably 30/70 to 50/50.
 構成単位B中における構成単位(B-1)及び(B-2)の合計の比率は、好ましくは50モル%以上であり、より好ましくは70モル%以上であり、更に好ましくは90モル%以上であり、特に好ましくは99モル%以上である。構成単位(B-1)及び(B-2)の合計の比率の上限値は特に限定されず、即ち、100モル%である。構成単位Bは構成単位(B-1)と構成単位(B-2)とのみからなっていてもよい。 The total ratio of the structural units (B-1) and (B-2) in the structural unit B is preferably 50 mol% or more, more preferably 70 mol% or more, still more preferably 90 mol% or more. It is particularly preferably 99 mol% or more. The upper limit of the total ratio of the structural units (B-1) and (B-2) is not particularly limited, that is, 100 mol%. The structural unit B may consist only of the structural unit (B-1) and the structural unit (B-2).
 構成単位Bは構成単位(B-1)及び(B-2)以外の構成単位を含んでもよい。そのような構成単位を与えるジアミンとしては、特に限定されないが、1,4-フェニレンジアミン、p-キシリレンジアミン、3,5-ジアミノ安息香酸、1,5-ジアミノナフタレン、2,2’-ジメチルビフェニル-4,4’-ジアミン、2,2’-ビス(トリフルオロメチル)ベンジジン、4,4’-ジアミノジフェニルエーテル、4,4’-ジアミノジフェニルメタン、2,2-ビス(4-アミノフェニル)ヘキサフルオロプロパン、4,4’-ジアミノジフェニルスルホン、4,4’-ジアミノベンズアニリド、1-(4-アミノフェニル)-2,3-ジヒドロ-1,3,3-トリメチル-1H-インデン-5-アミン、α,α’-ビス(4-アミノフェニル)-1,4-ジイソプロピルベンゼン、N,N’-ビス(4-アミノフェニル)テレフタルアミド、4,4’-ビス(4-アミノフェノキシ)ビフェニル、2,2-ビス〔4-(4-アミノフェノキシ)フェニル〕プロパン、2,2-ビス(4-(4-アミノフェノキシ)フェニル)ヘキサフルオロプロパン、9,9-ビス(4-アミノフェニル)フルオレン、及び4,4’-ジアミノ-2,2’-ビストリフルオロメチルジフェニルエーテル等の芳香族ジアミン(ただし、式(b-1)で表される化合物を除く);1,3-ビス(アミノメチル)シクロヘキサン及び1,4-ビス(アミノメチル)シクロヘキサン等の脂環式ジアミン;並びにエチレンジアミン及びヘキサメチレンジアミン等の脂肪族ジアミンが挙げられる。
 なお、本明細書において、芳香族ジアミンとは芳香環を1つ以上含むジアミンを意味し、脂環式ジアミンとは脂環を1つ以上含み、かつ芳香環を含まないジアミンを意味し、脂肪族ジアミンとは芳香環も脂環も含まないジアミンを意味する。
 構成単位Bに任意に含まれる構成単位は、1種でもよいし、2種以上であってもよい。
The structural unit B may include a structural unit other than the structural units (B-1) and (B-2). The diamine that provides such a constituent unit is not particularly limited, but is limited to 1,4-phenylenediamine, p-xylylene diamine, 3,5-diaminobenzoic acid, 1,5-diaminonaphthalene, and 2,2'-dimethyl. Biphenyl-4,4'-diamine, 2,2'-bis (trifluoromethyl) benzidine, 4,4'-diaminodiphenyl ether, 4,4'-diaminodiphenylmethane, 2,2-bis (4-aminophenyl) hexa Fluoropropane, 4,4'-diaminodiphenylsulfone, 4,4'-diaminobenzanilide, 1- (4-aminophenyl) -2,3-dihydro-1,3,3-trimethyl-1H-inden-5- Amin, α, α'-bis (4-aminophenyl) -1,4-diisopropylbenzene, N, N'-bis (4-aminophenyl) terephthalamide, 4,4'-bis (4-aminophenoxy) biphenyl , 2,2-bis [4- (4-aminophenoxy) phenyl] propane, 2,2-bis (4- (4-aminophenoxy) phenyl) hexafluoropropane, 9,9-bis (4-aminophenyl) Aromatic diamines such as fluorene and 4,4'-diamino-2,2'-bistrifluoromethyldiphenyl ether (excluding compounds represented by formula (b-1)); 1,3-bis (aminomethyl). ) Alicyclic diamines such as cyclohexane and 1,4-bis (aminomethyl) cyclohexane; and aliphatic diamines such as ethylenediamine and hexamethylenediamine.
In the present specification, the aromatic diamine means a diamine containing one or more aromatic rings, and the alicyclic diamine means a diamine containing one or more alicyclic rings and not containing an aromatic ring, and is a fat. The group diamine means a diamine that does not contain an aromatic ring or an alicyclic ring.
The structural unit arbitrarily included in the structural unit B may be one type or two or more types.
 構成単位Bに任意に含まれる構成単位を与えるジアミンとしては、下記式(b-3-1)で表される化合物、下記式(b-3-2)で表される化合物、下記式(b-3-3)で表される化合物、及び下記式(b-3-4)で表される化合物が好ましい。即ち、本発明の一態様のポリイミド樹脂は、構成単位Bが、下記式(b-3-1)で表される化合物に由来する構成単位(B-3-1)、下記式(b-3-2)で表される化合物に由来する構成単位(B-3-2)、下記式(b-3-3)で表される化合物に由来する構成単位(B-3-3)、及び下記式(b-3-4)で表される化合物に由来する構成単位(B-3-4)からなる群より選ばれる少なくとも1つである構成単位(B-3)を更に含んでもよい。 Examples of the diamine that gives the structural unit arbitrarily included in the structural unit B include a compound represented by the following formula (b-3-1), a compound represented by the following formula (b-3-2), and the following formula (b). The compound represented by -3-3) and the compound represented by the following formula (b-3-4) are preferable. That is, in the polyimide resin of one aspect of the present invention, the structural unit B is a structural unit (B-3-1) derived from a compound represented by the following formula (b-3-1), and the following formula (b-3). The structural unit (B-3-2) derived from the compound represented by -2), the structural unit (B-3-3) derived from the compound represented by the following formula (b-3-3), and the following. It may further contain at least one structural unit (B-3) selected from the group consisting of structural units (B-3-4) derived from the compound represented by the formula (b-3-4).
Figure JPOXMLDOC01-appb-C000006

(式(b-3-2)中、Rはそれぞれ独立して、水素原子、フッ素原子又はメチル基である。)
Figure JPOXMLDOC01-appb-C000006

(In formula (b-3-2), R is independently a hydrogen atom, a fluorine atom or a methyl group.)
 式(b-3-1)で表される化合物は、4,4’-ジアミノ-2,2’-ビストリフルオロメチルジフェニルエーテルである。
 構成単位Bが構成単位(B-3-1)を含むことによって、フィルムの無色透明性を向上させることができる。
The compound represented by the formula (b-3-1) is 4,4'-diamino-2,2'-bistrifluoromethyldiphenyl ether.
By including the structural unit (B-3-1) in the structural unit B, the colorless transparency of the film can be improved.
 式(b-3-2)において、Rはそれぞれ独立して、水素原子、フッ素原子、又はメチル基であり、水素原子であることが好ましい。式(b-3-2)で表される化合物としては、9,9-ビス(4-アミノフェニル)フルオレン、9,9-ビス(3-フルオロ-4-アミノフェニル)フルオレン、及び9,9-ビス(3-メチル-4-アミノフェニル)フルオレン等が挙げられ、9,9-ビス(4-アミノフェニル)フルオレンが好ましい。
 構成単位Bが構成単位(B-3-2)を含むことによって、フィルムの光学的等方性及び耐熱性を向上させることができる。
In the formula (b-3-2), R is independently a hydrogen atom, a fluorine atom, or a methyl group, and is preferably a hydrogen atom. The compounds represented by the formula (b-3-2) include 9,9-bis (4-aminophenyl) fluorene, 9,9-bis (3-fluoro-4-aminophenyl) fluorene, and 9,9. Examples thereof include -bis (3-methyl-4-aminophenyl) fluorene, and 9,9-bis (4-aminophenyl) fluorene is preferable.
When the structural unit B includes the structural unit (B-3-2), the optical isotropic property and heat resistance of the film can be improved.
 式(b-3-3)で表される化合物は、2,2-ビス(4-(4-アミノフェノキシ)フェニル)ヘキサフルオロプロパンである。
 構成単位Bが構成単位(B-3-3)を含むことによって、フィルムの無色透明性を向上させることができる。
The compound represented by the formula (b-3-3) is 2,2-bis (4- (4-aminophenoxy) phenyl) hexafluoropropane.
When the structural unit B includes the structural unit (B-3-3), the colorless transparency of the film can be improved.
 式(b-3-4)で表される化合物は、2,2’-ビス(トリフルオロメチル)ベンジジンである。
 構成単位Bが構成単位(B-3-4)を含むことによって、フィルムの無色透明性、耐薬品性、及び機械的特性を向上させることができる。
The compound represented by the formula (b-3-4) is 2,2'-bis (trifluoromethyl) benzidine.
When the structural unit B includes the structural unit (B-3-4), the colorless transparency, chemical resistance, and mechanical properties of the film can be improved.
 構成単位Bが構成単位(B-1)、構成単位(B-2)、及び構成単位(B-3)を含む場合、構成単位B中における構成単位(B-1)及び構成単位(B-2)の合計比率は、好ましくは70~95モル%であり、より好ましくは75~95モル%であり、更に好ましくは75~90モル%であり、構成単位B中における構成単位(B-3)の比率は、好ましくは5~30モル%であり、より好ましくは5~25モル%であり、更に好ましくは10~25モル%である。
 構成単位B中における構成単位(B-1)、構成単位(B-2)、及び構成単位(B-3)の合計の比率は、好ましくは75モル%以上であり、より好ましくは80モル%以上であり、更に好ましくは90モル%以上であり、特に好ましくは99モル%以上である。構成単位(B-1)、構成単位(B-2)、及び構成単位(B-3)の合計の比率の上限値は特に限定されず、即ち、100モル%である。構成単位Bは、構成単位(B-1)、構成単位(B-2)、及び構成単位(B-3)のみからなっていてもよい。
When the constituent unit B includes the constituent unit (B-1), the constituent unit (B-2), and the constituent unit (B-3), the constituent unit (B-1) and the constituent unit (B-) in the constituent unit B. The total ratio of 2) is preferably 70 to 95 mol%, more preferably 75 to 95 mol%, still more preferably 75 to 90 mol%, and the constituent unit (B-3) in the constituent unit B. ) Is preferably 5 to 30 mol%, more preferably 5 to 25 mol%, and even more preferably 10 to 25 mol%.
The total ratio of the structural unit (B-1), the structural unit (B-2), and the structural unit (B-3) in the structural unit B is preferably 75 mol% or more, more preferably 80 mol%. The above is more preferably 90 mol% or more, and particularly preferably 99 mol% or more. The upper limit of the ratio of the total of the structural unit (B-1), the structural unit (B-2), and the structural unit (B-3) is not particularly limited, that is, 100 mol%. The structural unit B may be composed of only the structural unit (B-1), the structural unit (B-2), and the structural unit (B-3).
 構成単位(B-3)は、構成単位(B-3-1)のみであってもよく、構成単位(B-3-2)のみであってもよく、構成単位(B-3-3)のみであってもよく、又は構成単位(B-3-4)のみであってもよい。
 また、構成単位(B-3)は、構成単位(B-3-1)~(B-3-4)からなる群より選ばれる2つ以上の構成単位の組み合せであってもよい。
The structural unit (B-3) may be only the structural unit (B-3-1), may be only the structural unit (B-3-2), or may be only the structural unit (B-3-3). It may be only, or it may be only a structural unit (B-3-4).
Further, the structural unit (B-3) may be a combination of two or more structural units selected from the group consisting of the structural units (B-3-1) to (B-3-4).
 本発明のポリイミド樹脂の数平均分子量は、得られるポリイミドフィルムの機械的強度の観点から、好ましくは5,000~200,000である。なお、ポリイミド樹脂の数平均分子量は、例えば、ゲルろ過クロマトグラフィー測定による標準ポリメチルメタクリレート(PMMA)換算値より求めることができる。 The number average molecular weight of the polyimide resin of the present invention is preferably 5,000 to 200,000 from the viewpoint of the mechanical strength of the obtained polyimide film. The number average molecular weight of the polyimide resin can be obtained from, for example, a standard polymethylmethacrylate (PMMA) conversion value measured by gel filtration chromatography.
 本発明のポリイミド樹脂は、ポリイミド鎖(構成単位Aと構成単位Bとがイミド結合してなる構造)以外の構造を含んでもよい。ポリイミド樹脂中に含まれうるポリイミド鎖以外の構造としては、例えばアミド結合を含む構造等が挙げられる。
 本発明のポリイミド樹脂は、ポリイミド鎖(構成単位Aと構成単位Bとがイミド結合してなる構造)を主たる構造として含むことが好ましい。したがって、本発明のポリイミド樹脂中に占めるポリイミド鎖の比率は、好ましくは50質量%以上であり、より好ましくは70質量%以上であり、更に好ましくは90質量%以上であり、特に好ましくは99質量%以上である。
The polyimide resin of the present invention may contain a structure other than the polyimide chain (a structure in which the structural unit A and the structural unit B are imide-bonded). Examples of the structure other than the polyimide chain that can be contained in the polyimide resin include a structure containing an amide bond.
The polyimide resin of the present invention preferably contains a polyimide chain (a structure in which a structural unit A and a structural unit B are imide-bonded) as a main structure. Therefore, the ratio of the polyimide chain to the polyimide resin of the present invention is preferably 50% by mass or more, more preferably 70% by mass or more, still more preferably 90% by mass or more, and particularly preferably 99% by mass. % Or more.
 本発明のポリイミド樹脂を用いることで、無色透明性、光学的等方性、耐薬品性(例えば耐酸性及び耐アルカリ性)、及び靱性に優れるフィルムを形成することができ、当該フィルムの有する好適な物性値は以下の通りである。
 全光線透過率は、厚さ10μmのフィルムとした際に、好ましくは88%以上であり、より好ましくは88.5%以上であり、更に好ましくは89%以上である。
 イエローインデックス(YI)は、厚さ10μmのフィルムとした際に、好ましくは4.0以下であり、より好ましくは2.5以下であり、更に好ましくは2.0以下である。
 bは、厚さ10μmのフィルムとした際に、好ましくは2.0以下であり、より好ましくは1.2以下であり、更に好ましくは1.0以下である。
 厚み位相差(Rth)の絶対値は、厚さ10μmのフィルムとした際に、好ましくは70nm以下であり、より好ましくは60nm以下であり、更に好ましくは35nm以下である。この範囲であると光学的等方性に優れる。
 引張強度は、好ましくは105MPa以上であり、より好ましくは110MPa以上であり、更に好ましくは115MPa以上である。引張伸び率は、好ましくは5~20%であり、より好ましくは5~15%である。引張強度及び引張伸び率がともにこの範囲であるとフィルムの靱性に優れ、ポリイミドフィルムを支持体から剥離する工程において剥離が容易となり、剥離中の破断を防ぐことができる。
 混酸ΔYIは、厚さ10μmのフィルムとした際に、好ましくは1.5以下であり、より好ましくは1.3以下であり、更に好ましくは1.0以下である。
 混酸Δbは、厚さ10μmのフィルムとした際に、好ましくは0.8以下であり、より好ましくは0.6以下であり、更に好ましくは0.5以下である。
 なお、混酸ΔYI及び混酸Δbは、それぞれ、リン酸、硝酸及び酢酸の混合物にポリイミドフィルムを浸漬した際の、浸漬前後でのYIの差及びbの差を意味し、具体的には実施例に記載の方法で測定することができる。ΔYI及びΔbが小さいほど、耐酸性に優れることを意味する。本発明のポリイミド樹脂を用いることで、耐薬品性に優れるフィルムを形成することができ、酸に対しても優れた耐性を示す。特に上記の酸混合物に対して優れた耐性を示す。
By using the polyimide resin of the present invention, it is possible to form a film having excellent colorless transparency, optical isotropic property, chemical resistance (for example, acid resistance and alkali resistance), and toughness, which is suitable for the film. The physical property values are as follows.
The total light transmittance is preferably 88% or more, more preferably 88.5% or more, and further preferably 89% or more when the film has a thickness of 10 μm.
The yellow index (YI) is preferably 4.0 or less, more preferably 2.5 or less, and further preferably 2.0 or less when the film has a thickness of 10 μm.
b * is preferably 2.0 or less, more preferably 1.2 or less, and further preferably 1.0 or less when the film has a thickness of 10 μm.
The absolute value of the thickness retardation (Rth) is preferably 70 nm or less, more preferably 60 nm or less, and further preferably 35 nm or less when the film has a thickness of 10 μm. Within this range, the optical isotropic property is excellent.
The tensile strength is preferably 105 MPa or more, more preferably 110 MPa or more, and further preferably 115 MPa or more. The tensile elongation is preferably 5 to 20%, more preferably 5 to 15%. When both the tensile strength and the tensile elongation are in this range, the toughness of the film is excellent, the polyimide film can be easily peeled off from the support, and breakage during peeling can be prevented.
The mixed acid ΔYI is preferably 1.5 or less, more preferably 1.3 or less, and further preferably 1.0 or less when the film has a thickness of 10 μm.
The mixed acid Δb * is preferably 0.8 or less, more preferably 0.6 or less, and further preferably 0.5 or less when the film has a thickness of 10 μm.
The mixed acid ΔYI and the mixed acid Δb * mean the difference in YI and the difference in b * before and after the immersion of the polyimide film in the mixture of phosphoric acid, nitric acid and acetic acid, respectively. It can be measured by the method described in the example. The smaller ΔYI and Δb * , the better the acid resistance. By using the polyimide resin of the present invention, a film having excellent chemical resistance can be formed, and it also exhibits excellent resistance to acids. In particular, it exhibits excellent resistance to the above acid mixture.
 本発明のポリイミド樹脂を用いて形成することができるフィルムは機械的特性及び耐熱性も良好であり、以下のような好適な物性値を有する。
 引張弾性率は、好ましくは2.0GPa以上であり、より好ましくは2.5GPa以上であり、更に好ましくは3.0GPa以上である。
 ガラス転移温度(Tg)は、好ましくは250℃以上であり、より好ましくは270℃以上であり、更に好ましくは300℃以上である。この範囲であると、ポリイミド基板を利用して液晶ディスプレイやOLEDディスプレイ等の画像表示装置を製造するに際して適した耐熱性を有する。
 なお、本発明における上述の物性値は、具体的には実施例に記載の方法で測定することができる。
The film that can be formed using the polyimide resin of the present invention has good mechanical properties and heat resistance, and has the following suitable physical property values.
The tensile elastic modulus is preferably 2.0 GPa or more, more preferably 2.5 GPa or more, and further preferably 3.0 GPa or more.
The glass transition temperature (Tg) is preferably 250 ° C. or higher, more preferably 270 ° C. or higher, and even more preferably 300 ° C. or higher. Within this range, the polyimide substrate has heat resistance suitable for manufacturing an image display device such as a liquid crystal display or an OLED display.
The above-mentioned physical property values in the present invention can be specifically measured by the method described in Examples.
[ポリイミド樹脂の製造方法]
 本発明のポリイミド樹脂は、上述の構成単位(A-1)を与える化合物を含むテトラカルボン酸成分(ただし、上述の構成単位(A-2)を与える化合物を含まない)と、上述の構成単位(B-1)を与える化合物及び上述の構成単位(B-2)を与える化合物を含むジアミン成分とを反応させることにより製造することができる。
[Manufacturing method of polyimide resin]
The polyimide resin of the present invention contains a tetracarboxylic dian component containing a compound giving the above-mentioned structural unit (A-1) (however, does not contain the compound giving the above-mentioned structural unit (A-2)) and the above-mentioned structural unit. It can be produced by reacting a diamine component containing a compound giving (B-1) and a compound giving the above-mentioned structural unit (B-2).
 構成単位(A-1)を与える化合物としては、式(a-1)で表される化合物が挙げられるが、それに限られず、同じ構成単位を与える範囲でその誘導体であってもよい。当該誘導体としては、式(a-1)で表されるテトラカルボン酸二無水物に対応するテトラカルボン酸(即ち、1,2,4,5-シクロヘキサンテトラカルボン酸)及び当該テトラカルボン酸のアルキルエステルが挙げられる。構成単位(A-1)を与える化合物としては、式(a-1)で表される化合物(即ち、二無水物)が好ましい。 Examples of the compound giving the structural unit (A-1) include the compound represented by the formula (a-1), but the compound is not limited to this, and may be a derivative thereof as long as the same structural unit is given. Examples of the derivative include a tetracarboxylic acid (that is, 1,2,4,5-cyclohexanetetracarboxylic acid) corresponding to the tetracarboxylic dianhydride represented by the formula (a-1) and an alkyl of the tetracarboxylic acid. Esters can be mentioned. As the compound giving the structural unit (A-1), the compound represented by the formula (a-1) (that is, dianhydride) is preferable.
 テトラカルボン酸成分は、構成単位(A-1)を与える化合物を、好ましくは90モル%以上含み、より好ましくは95モル%を超えて含み、更に好ましくは97モル%以上含み、更に好ましくは100モル%含む。 The tetracarboxylic acid component contains the compound giving the structural unit (A-1) in an amount of preferably 90 mol% or more, more preferably more than 95 mol%, still more preferably 97 mol% or more, still more preferably 100. Contains mol%.
 テトラカルボン酸成分は、構成単位(A-1)を与える化合物以外の化合物を含んでもよく、当該化合物としては、上述の芳香族テトラカルボン酸二無水物、脂環式テトラカルボン酸二無水物、及び脂肪族テトラカルボン酸二無水物、並びにそれらの誘導体(テトラカルボン酸、テトラカルボン酸のアルキルエステル等)が挙げられる。
 テトラカルボン酸成分に任意に含まれる化合物は、1種でもよいし、2種以上であってもよい。
The tetracarboxylic acid component may contain a compound other than the compound giving the constituent unit (A-1), and examples of the compound include the above-mentioned aromatic tetracarboxylic dianhydride and alicyclic tetracarboxylic dianhydride. And aliphatic tetracarboxylic dianhydrides, and derivatives thereof (tetracarboxylic dians, alkyl esters of tetracarboxylic dians, etc.).
The compound arbitrarily contained in the tetracarboxylic acid component may be one kind or two or more kinds.
 構成単位(B-1)を与える化合物としては、式(b-1)で表される化合物が挙げられるが、それに限られず、同じ構成単位を与える範囲でその誘導体であってもよい。当該誘導体としては、式(b-1)で表されるジアミンに対応するジイソシアネートが挙げられる。構成単位(B-1)を与える化合物としては、式(b-1)で表される化合物(即ち、ジアミン)が好ましい。
 構成単位(B-2)を与える化合物としては、式(b-2)で表される化合物が挙げられるが、それに限られず、同じ構成単位を与える範囲でその誘導体であってもよい。当該誘導体としては、式(b-2)で表されるジアミンに対応するジイソシアネートが挙げられる。構成単位(B-2)を与える化合物としては、式(b-2)で表される化合物(即ち、ジアミン)が好ましい。
Examples of the compound giving the structural unit (B-1) include the compound represented by the formula (b-1), but the compound is not limited to this, and may be a derivative thereof as long as the same structural unit is given. Examples of the derivative include diisocyanates corresponding to the diamine represented by the formula (b-1). As the compound giving the structural unit (B-1), the compound represented by the formula (b-1) (that is, diamine) is preferable.
Examples of the compound giving the structural unit (B-2) include the compound represented by the formula (b-2), but the compound is not limited to this, and may be a derivative thereof as long as the same structural unit is given. Examples of the derivative include diisocyanates corresponding to the diamine represented by the formula (b-2). As the compound giving the structural unit (B-2), the compound represented by the formula (b-2) (that is, diamine) is preferable.
 ジアミン成分は、構成単位(B-1)を与える化合物を、好ましくは30~70モル%含み、より好ましくは40~65モル%含み、更に好ましくは50~60モル%含む。ジアミン成分中における構成単位(B-1)を与える化合物の比率が当該範囲内にあれば、ポリイミド樹脂の重合時間が比較的短く、好ましい。
 ジアミン成分は構成単位(B-2)を与える化合物を、好ましくは70~30モル%含み、より好ましくは60~35モル%含み、更に好ましく50~40モル%含む。ジアミン成分中における構成単位(B-2)を与える化合物の比率が当該範囲内にあれば、ポリイミド樹脂の重合時間が比較的短く、好ましい。
 ジアミン成分中における構成単位(B-1)を与える化合物と構成単位(B-2)を与える化合物とのモル比率[(B-1)/(B-2)]は、好ましくは30/70~70/30であり、より好ましくは40/60~65/35であり、更に好ましくは50/50~60/40である。
The diamine component preferably contains a compound that gives the structural unit (B-1) in an amount of 30 to 70 mol%, more preferably 40 to 65 mol%, and even more preferably 50 to 60 mol%. When the ratio of the compound giving the structural unit (B-1) in the diamine component is within the above range, the polymerization time of the polyimide resin is relatively short, which is preferable.
The diamine component preferably contains a compound that gives the structural unit (B-2) in an amount of 70 to 30 mol%, more preferably 60 to 35 mol%, still more preferably 50 to 40 mol%. When the ratio of the compound giving the structural unit (B-2) in the diamine component is within the above range, the polymerization time of the polyimide resin is relatively short, which is preferable.
The molar ratio [(B-1) / (B-2)] of the compound giving the structural unit (B-1) and the compound giving the structural unit (B-2) in the diamine component is preferably from 30/70 to. It is 70/30, more preferably 40/60 to 65/35, and even more preferably 50/50 to 60/40.
 特に重合時間の観点からは、ジアミン成分中における構成単位(B-1)を与える化合物と構成単位(B-2)を与える化合物とのモル比率[(B-1)/(B-2)]は、好ましくは50/50~70/30であり、より好ましくは55/45~70/30であり、更に好ましくは60/40~70/30である。
 また、特に靱性(強度及び伸び率)や透明性の観点からは、ジアミン成分中における構成単位(B-1)を与える化合物と構成単位(B-2)を与える化合物とのモル比率[(B-1)/(B-2)]は、好ましくは30/70~60/40であり、より好ましくは30/70~55/45であり、更に好ましくは30/70~50/50である。
In particular, from the viewpoint of polymerization time, the molar ratio of the compound giving the structural unit (B-1) to the compound giving the structural unit (B-2) in the diamine component [(B-1) / (B-2)]. Is preferably 50/50 to 70/30, more preferably 55/45 to 70/30, and even more preferably 60/40 to 70/30.
Further, particularly from the viewpoint of toughness (strength and elongation) and transparency, the molar ratio of the compound giving the structural unit (B-1) and the compound giving the structural unit (B-2) in the diamine component [(B). -1) / (B-2)] is preferably 30/70 to 60/40, more preferably 30/70 to 55/45, and even more preferably 30/70 to 50/50.
 ジアミン成分は構成単位(B-1)を与える化合物及び構成単位(B-2)を与える化合物を合計で、好ましくは50モル%以上含み、より好ましくは70モル%以上含み、更に好ましくは90モル%以上含み、特に好ましくは99モル%以上含む。構成単位(B-1)を与える化合物及び構成単位(B-2)を与える化合物の合計の含有比率の上限値は特に限定されず、即ち、100モル%である。ジアミン成分は構成単位(B-1)を与える化合物と構成単位(B-2)を与える化合物とのみからなっていてもよい。 The diamine component contains, in total, a compound giving the structural unit (B-1) and a compound giving the structural unit (B-2) in an amount of 50 mol% or more, more preferably 70 mol% or more, still more preferably 90 mol. % Or more, particularly preferably 99 mol% or more. The upper limit of the total content ratio of the compound giving the structural unit (B-1) and the compound giving the structural unit (B-2) is not particularly limited, that is, 100 mol%. The diamine component may consist only of a compound giving a structural unit (B-1) and a compound giving a structural unit (B-2).
 ジアミン成分は構成単位(B-1)又は(B-2)を与える化合物以外の化合物を含んでもよく、当該化合物としては、上述の芳香族ジアミン、脂環式ジアミン、及び脂肪族ジアミン、並びにそれらの誘導体(ジイソシアネート等)が挙げられる。
 ジアミン成分に任意に含まれる化合物(即ち、構成単位(B-1)又は(B-2)を与える化合物以外の化合物)は、1種でもよいし、2種以上であってもよい。
The diamine component may contain a compound other than the compound giving the structural unit (B-1) or (B-2), and the compound includes the above-mentioned aromatic diamine, alicyclic diamine, and aliphatic diamine, and them. Derivatives of (diamine, etc.) can be mentioned.
The compound arbitrarily contained in the diamine component (that is, a compound other than the compound giving the structural unit (B-1) or (B-2)) may be one kind or two or more kinds.
 ジアミン成分に任意に含まれる化合物としては、構成単位(B-3)を与える化合物(即ち、構成単位(B-3-1)を与える化合物、構成単位(B-3-2)を与える化合物、構成単位(B-3-3)を与える化合物、及び構成単位(B-3-4)を与える化合物からなる群より選ばれる少なくとも1つ)が好ましい。
 構成単位(B-3)を与える化合物としては、式(b-3-1)で表される化合物、式(b-3-2)で表される化合物、式(b-3-3)で表される化合物、及び式(b-3-4)で表される化合物が挙げられるが、それに限られず、同じ構成単位を形成できる範囲でその誘導体であってもよい。当該誘導体としては、式(b-3-1)~式(b-3-4)で表されるジアミンに対応するジイソシアネートが挙げられる。構成単位(B-3)を与える化合物としては、式(b-3-1)~式(b-3-4)で表される化合物からなる群より選ばれる少なくとも1つ(即ち、ジアミン)が好ましい。
Examples of the compound arbitrarily contained in the diamine component include a compound that gives a structural unit (B-3) (that is, a compound that gives a structural unit (B-3-1), and a compound that gives a structural unit (B-3-2). At least one selected from the group consisting of a compound giving a structural unit (B-3-3) and a compound giving a structural unit (B-3-4)) is preferable.
Examples of the compound giving the structural unit (B-3) include a compound represented by the formula (b-3-1), a compound represented by the formula (b-3-2), and a compound represented by the formula (b-3-3). Examples thereof include the compound represented by the compound and the compound represented by the formula (b-3-4), but the present invention is not limited to this, and a derivative thereof may be used as long as the same structural unit can be formed. Examples of the derivative include diisocyanates corresponding to diamines represented by the formulas (b-3-1) to (b-3-4). As the compound that gives the structural unit (B-3), at least one (that is, diamine) selected from the group consisting of the compounds represented by the formulas (b-3-1) to (b-3-4) is used. preferable.
 ジアミン成分が、構成単位(B-1)を与える化合物、構成単位(B-2)を与える化合物、及び構成単位(B-3)を与える化合物を含む場合、ジアミン成分は構成単位(B-1)を与える化合物及び構成単位(B-2)を与える化合物を合計で好ましくは70~95モル%含み、より好ましくは75~95モル%含み、更に好ましくは75~90モル%含み、構成単位(B-3)を与える化合物を好ましくは5~30モル%含み、より好ましくは5~25モル%含み、更に好ましくは10~25モル%含む。
 ジアミン成分は、構成単位(B-1)を与える化合物、構成単位(B-2)を与える化合物、及び構成単位(B-3)を与える化合物を合計で、好ましくは75モル%以上含み、より好ましくは80モル%以上含み、更に好ましくは90モル%以上含み、特に好ましくは99モル%以上含む。構成単位(B-1)を与える化合物、構成単位(B-2)を与える化合物、及び構成単位(B-3)を与える化合物の合計の含有比率の上限値は特に限定されず、即ち、100モル%である。ジアミン成分は構成単位(B-1)を与える化合物、構成単位(B-2)を与える化合物、及び構成単位(B-3)を与える化合物とのみからなっていてもよい。
When the diamine component contains a compound that gives a structural unit (B-1), a compound that gives a structural unit (B-2), and a compound that gives a structural unit (B-3), the diamine component is a structural unit (B-1). ) And the constituent unit (B-2) are preferably contained in an amount of 70 to 95 mol%, more preferably 75 to 95 mol%, still more preferably 75 to 90 mol%, and the constituent unit ( The compound giving B-3) is preferably contained in an amount of 5 to 30 mol%, more preferably 5 to 25 mol%, still more preferably 10 to 25 mol%.
The diamine component contains a compound that gives the structural unit (B-1), a compound that gives the structural unit (B-2), and a compound that gives the structural unit (B-3) in total, preferably 75 mol% or more, and more. It preferably contains 80 mol% or more, more preferably 90 mol% or more, and particularly preferably 99 mol% or more. The upper limit of the total content ratio of the compound giving the structural unit (B-1), the compound giving the structural unit (B-2), and the compound giving the structural unit (B-3) is not particularly limited, that is, 100. Mol%. The diamine component may consist only of a compound that gives a structural unit (B-1), a compound that gives a structural unit (B-2), and a compound that gives a structural unit (B-3).
 構成単位(B-3)を与える化合物は、構成単位(B-3-1)を与える化合物のみであってもよく、構成単位(B-3-2)を与える化合物のみであってもよく、構成単位(B-3-3)を与える化合物のみであってもよく、又は構成単位(B-3-4)を与える化合物のみであってもよい。
 また、構成単位(B-3)を与える化合物は、構成単位(B-3-1)~(B-3-4)を与える化合物からなる群より選ばれる2つ以上の化合物の組み合せであってもよい。
The compound that gives the structural unit (B-3) may be only the compound that gives the structural unit (B-3-1), or may be only the compound that gives the structural unit (B-3-2). It may be only a compound giving a structural unit (B-3-3), or it may be only a compound giving a structural unit (B-3-4).
The compound that gives the structural unit (B-3) is a combination of two or more compounds selected from the group consisting of the compounds that give the structural unit (B-3-1) to (B-3-4). May be good.
 本発明において、ポリイミド樹脂の製造に用いるテトラカルボン酸成分とジアミン成分の仕込み量比は、テトラカルボン酸成分1モルに対してジアミン成分が0.9~1.1モルであることが好ましい。 In the present invention, the ratio of the amount of the tetracarboxylic acid component to the diamine component charged in the production of the polyimide resin is preferably 0.9 to 1.1 mol of the diamine component with respect to 1 mol of the tetracarboxylic acid component.
 また、本発明において、ポリイミド樹脂の製造には、前述のテトラカルボン酸成分及びジアミン成分の他に、末端封止剤を用いてもよい。末端封止剤としてはモノアミン類あるいはジカルボン酸類が好ましい。導入される末端封止剤の仕込み量としては、テトラカルボン酸成分1モルに対して0.0001~0.1モルが好ましく、特に0.001~0.06モルが好ましい。モノアミン類末端封止剤としては、例えば、メチルアミン、エチルアミン、プロピルアミン、ブチルアミン、ベンジルアミン、4-メチルベンジルアミン、4-エチルベンジルアミン、4-ドデシルベンジルアミン、3-メチルベンジルアミン、3-エチルベンジルアミン、アニリン、3-メチルアニリン、4-メチルアニリン等が推奨される。これらのうち、ベンジルアミン、アニリンが好適に使用できる。ジカルボン酸類末端封止剤としては、ジカルボン酸類が好ましく、その一部を閉環していてもよい。例えば、フタル酸、無水フタル酸、4-クロロフタル酸、テトラフルオロフタル酸、2,3-ベンゾフェノンジカルボン酸、3,4-ベンゾフェノンジカルボン酸、シクロペンタン-1,2-ジカルボン酸、4-シクロヘキセン-1,2-ジカルボン酸等が推奨される。これらのうち、フタル酸、無水フタル酸が好適に使用できる。 Further, in the present invention, in addition to the above-mentioned tetracarboxylic acid component and diamine component, an end-capping agent may be used for producing the polyimide resin. As the terminal encapsulant, monoamines or dicarboxylic acids are preferable. The amount of the end-capping agent to be introduced is preferably 0.0001 to 0.1 mol, particularly preferably 0.001 to 0.06 mol, based on 1 mol of the tetracarboxylic acid component. Examples of the monoamine terminal sealant include methylamine, ethylamine, propylamine, butylamine, benzylamine, 4-methylbenzylamine, 4-ethylbenzylamine, 4-dodecylbenzylamine, 3-methylbenzylamine, 3-. Ethylbenzylamine, aniline, 3-methylaniline, 4-methylaniline and the like are recommended. Of these, benzylamine and aniline can be preferably used. As the dicarboxylic acid terminal encapsulant, dicarboxylic acids are preferable, and a part thereof may be ring-closed. For example, phthalic acid, phthalic anhydride, 4-chlorophthalic acid, tetrafluorophthalic acid, 2,3-benzophenonedicarboxylic acid, 3,4-benzophenonedicarboxylic acid, cyclopentane-1,2-dicarboxylic acid, 4-cyclohexene-1. , 2-Dicarboxylic acid, etc. are recommended. Of these, phthalic acid and phthalic anhydride can be preferably used.
 前述のテトラカルボン酸成分とジアミン成分とを反応させる方法には特に制限はなく、公知の方法を用いることができる。
 具体的な反応方法としては、(1)テトラカルボン酸成分、ジアミン成分、及び反応溶剤を反応器に仕込み、室温~80℃で0.5~30時間撹拌し、その後に昇温してイミド化反応を行う方法、(2)ジアミン成分及び反応溶剤を反応器に仕込んで溶解させた後、テトラカルボン酸成分を仕込み、必要に応じて室温~80℃で0.5~30時間撹拌し、その後に昇温してイミド化反応を行う方法、(3)テトラカルボン酸成分、ジアミン成分、及び反応溶剤を反応器に仕込み、直ちに昇温してイミド化反応を行う方法等が挙げられる。
The method for reacting the above-mentioned tetracarboxylic acid component with the diamine component is not particularly limited, and a known method can be used.
As a specific reaction method, (1) a tetracarboxylic acid component, a diamine component, and a reaction solvent are charged into a reactor, stirred at room temperature to 80 ° C. for 0.5 to 30 hours, and then heated to imidize. Method of carrying out the reaction, (2) After charging the diamine component and the reaction solvent into the reactor and dissolving them, the tetracarboxylic acid component is charged, and if necessary, the mixture is stirred at room temperature to 80 ° C. for 0.5 to 30 hours, and then Examples thereof include a method of carrying out an imidization reaction by raising the temperature to (3) a method of charging a tetracarboxylic acid component, a diamine component and a reaction solvent into a reactor and immediately raising the temperature to carry out the imidization reaction.
 ポリイミド樹脂の製造に用いられる反応溶剤は、イミド化反応を阻害せず、生成するポリイミド樹脂を溶解できるものであればよい。例えば、非プロトン性溶剤、フェノール系溶剤、エーテル系溶剤、カーボネート系溶剤等が挙げられる。 The reaction solvent used in the production of the polyimide resin may be one that does not inhibit the imidization reaction and can dissolve the produced polyimide resin. For example, an aprotic solvent, a phenol solvent, an ether solvent, a carbonate solvent and the like can be mentioned.
 非プロトン性溶剤の具体例としては、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、N-メチル-2-ピロリドン、N-メチルカプロラクタム、1,3-ジメチルイミダゾリジノン、テトラメチル尿素等のアミド系溶剤、γ-ブチロラクトン、γ-バレロラクトン等のラクトン系溶剤、ヘキサメチルホスホリックアミド、ヘキサメチルホスフィントリアミド等の含リン系アミド系溶剤、ジメチルスルホン、ジメチルスルホキシド、スルホラン等の含硫黄系溶剤、アセトン、シクロヘキサノン、メチルシクロヘキサノン等のケトン系溶剤、ピコリン、ピリジン等のアミン系溶剤、酢酸(2-メトキシ-1-メチルエチル)等のエステル系溶剤等が挙げられる。 Specific examples of the aprotonic solvent include N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidone, N-methylcaprolactam, 1,3-dimethylimidazolidinone, tetramethylurea and the like. Amide-based solvents, lactone-based solvents such as γ-butyrolactone and γ-valerolactone, phosphorus-containing amide-based solvents such as hexamethylphosphoric amide and hexamethylphosphintriamide, and sulfur-containing solvents such as dimethylsulfone, dimethylsulfoxide, and sulfolane. Examples thereof include based solvents, ketone solvents such as acetone, cyclohexanone and methylcyclohexanone, amine solvents such as picolin and pyridine, and ester solvents such as acetic acid (2-methoxy-1-methylethyl).
 フェノール系溶剤の具体例としては、フェノール、o-クレゾール、m-クレゾール、p-クレゾール、2,3-キシレノール、2,4-キシレノール、2,5-キシレノール、2,6-キシレノール、3,4-キシレノール、3,5-キシレノール等が挙げられる。
 エーテル系溶剤の具体例としては、1,2-ジメトキシエタン、ビス(2-メトキシエチル)エーテル、1,2-ビス(2-メトキシエトキシ)エタン、ビス〔2-(2-メトキシエトキシ)エチル〕エーテル、テトラヒドロフラン、1,4-ジオキサン等が挙げられる。
 また、カーボネート系溶剤の具体的な例としては、ジエチルカーボネート、メチルエチルカーボネート、エチレンカーボネート、プロピレンカーボネート等が挙げられる。
 上記反応溶剤の中でも、アミド系溶剤又はラクトン系溶剤が好ましい。また、上記の反応溶剤は単独で又は2種以上混合して用いてもよい。
Specific examples of the phenolic solvent include phenol, o-cresol, m-cresol, p-cresol, 2,3-xylenol, 2,4-xylenol, 2,5-xylenol, 2,6-xylenol, 3,4. -Xylenol, 3,5-xylenol and the like can be mentioned.
Specific examples of the ether solvent include 1,2-dimethoxyethane, bis (2-methoxyethyl) ether, 1,2-bis (2-methoxyethoxy) ethane, and bis [2- (2-methoxyethoxy) ethyl]. Examples include ether, tetrahydrofuran, 1,4-dioxane and the like.
Specific examples of the carbonate solvent include diethyl carbonate, methyl ethyl carbonate, ethylene carbonate, propylene carbonate and the like.
Among the above reaction solvents, an amide solvent or a lactone solvent is preferable. Moreover, the above-mentioned reaction solvent may be used alone or in mixture of 2 or more types.
 イミド化反応では、ディーンスターク装置などを用いて、製造時に生成する水を除去しながら反応を行うことが好ましい。このような操作を行うことで、重合度及びイミド化率をより上昇させることができる。 In the imidization reaction, it is preferable to carry out the reaction while removing water generated during production using a Dean-Stark apparatus or the like. By performing such an operation, the degree of polymerization and the imidization rate can be further increased.
 上記のイミド化反応においては、公知のイミド化触媒を用いることができる。イミド化触媒としては、塩基触媒又は酸触媒が挙げられる。
 塩基触媒としては、ピリジン、キノリン、イソキノリン、α-ピコリン、β-ピコリン、2,4-ルチジン、2,6-ルチジン、トリメチルアミン、トリエチルアミン、トリプロピルアミン、トリブチルアミン、トリエチレンジアミン、イミダゾール、N,N-ジメチルアニリン、N,N-ジエチルアニリン等の有機塩基触媒、水酸化カリウムや水酸化ナトリウム、炭酸カリウム、炭酸ナトリウム、炭酸水素カリウム、炭酸水素ナトリウム等の無機塩基触媒が挙げられる。
 また、酸触媒としては、クロトン酸、アクリル酸、トランス-3-ヘキセノイック酸、桂皮酸、安息香酸、メチル安息香酸、オキシ安息香酸、テレフタル酸、ベンゼンスルホン酸、パラトルエンスルホン酸、ナフタレンスルホン酸等が挙げられる。上記のイミド化触媒は単独で又は2種以上を組み合わせて用いてもよい。
 上記のうち、取り扱い性の観点から、塩基触媒を用いることが好ましく、有機塩基触媒を用いることがより好ましく、トリエチルアミンを用いることが更に好ましく、トリエチルアミンとトリエチレンジアミンを組み合わせて用いること特に好ましい。
In the above imidization reaction, a known imidization catalyst can be used. Examples of the imidization catalyst include a base catalyst and an acid catalyst.
Base catalysts include pyridine, quinoline, isoquinoline, α-picoline, β-picoline, 2,4-lutidine, 2,6-lutidine, trimethylamine, triethylamine, tripropylamine, tributylamine, triethylenediamine, imidazole, N, N. Examples thereof include organic base catalysts such as dimethylaniline and N, N-diethylaniline, and inorganic base catalysts such as potassium hydroxide, sodium hydroxide, potassium carbonate, sodium carbonate, potassium hydrogencarbonate and sodium hydrogencarbonate.
Examples of the acid catalyst include crotonic acid, acrylic acid, trans-3-hexenoic acid, cinnamic acid, benzoic acid, methylbenzoic acid, oxybenzoic acid, terephthalic acid, benzenesulfonic acid, paratoluenesulfonic acid, naphthalenesulfonic acid and the like. Can be mentioned. The above-mentioned imidization catalyst may be used alone or in combination of two or more.
Of the above, from the viewpoint of handleability, it is preferable to use a base catalyst, more preferably an organic base catalyst, further preferably triethylamine, and particularly preferably a combination of triethylamine and triethylenediamine.
 イミド化反応の温度は、反応率及びゲル化等の抑制の観点から、好ましくは120~250℃、より好ましくは160~200℃である。また、反応時間は、生成水の留出開始後、好ましくは0.5~6時間、より好ましくは0.5~5.5時間である。本発明のポリイミド樹脂の反応時間は比較的短い。 The temperature of the imidization reaction is preferably 120 to 250 ° C., more preferably 160 to 200 ° C. from the viewpoint of suppressing the reaction rate and gelation. The reaction time is preferably 0.5 to 6 hours, more preferably 0.5 to 5.5 hours after the start of distillation of the produced water. The reaction time of the polyimide resin of the present invention is relatively short.
 イミド化反応時の固形分濃度は30~60質量%が好ましく、35~58質量%がより好ましく、40~56質量%が特に好ましい。イミド化反応時の固形分濃度がこの範囲であると、イミド化反応が良好に進行し、反応時に生成する水を除去しやすくなるため、重合度及びイミド化率を上昇させることができる。
 ただし、イミド化反応時の固形分濃度は、反応系内に添加したテトラカルボン酸成分、反応系内のジアミン成分、及び反応溶剤の質量に基づいて下記式から算出される値である。
イミド化反応時の固形分濃度(質量%)=(テトラカルボン酸成分及びジアミン成分の合計質量)/(テトラカルボン酸成分、ジアミン成分、及び反応溶剤の合計質量)×100
The solid content concentration during the imidization reaction is preferably 30 to 60% by mass, more preferably 35 to 58% by mass, and particularly preferably 40 to 56% by mass. When the solid content concentration at the time of the imidization reaction is within this range, the imidization reaction proceeds satisfactorily and the water generated during the reaction can be easily removed, so that the degree of polymerization and the imidization rate can be increased.
However, the solid content concentration at the time of the imidization reaction is a value calculated from the following formula based on the mass of the tetracarboxylic acid component added into the reaction system, the diamine component in the reaction system, and the reaction solvent.
Solid content concentration (mass%) at the time of imidization reaction = (total mass of tetracarboxylic acid component and diamine component) / (total mass of tetracarboxylic acid component, diamine component, and reaction solvent) × 100
[ポリイミドワニス]
 本発明のポリイミドワニスは、本発明のポリイミド樹脂が有機溶媒に溶解してなるものである。即ち、本発明のポリイミドワニスは、本発明のポリイミド樹脂及び有機溶媒を含み、当該ポリイミド樹脂は当該有機溶媒に溶解している。
 有機溶媒はポリイミド樹脂が溶解するものであればよく、特に限定されないが、ポリイミド樹脂の製造に用いられる反応溶剤として上述した化合物を、単独又は2種以上を混合して用いることが好ましい。
 本発明のポリイミドワニスは、重合法により得られるポリイミド樹脂が反応溶剤に溶解したポリイミド溶液そのものであってもよいし、又は当該ポリイミド溶液に対して更に希釈溶剤を追加したものであってもよい。
[Polyimide varnish]
The polyimide varnish of the present invention is obtained by dissolving the polyimide resin of the present invention in an organic solvent. That is, the polyimide varnish of the present invention contains the polyimide resin of the present invention and an organic solvent, and the polyimide resin is dissolved in the organic solvent.
The organic solvent may be any one that dissolves the polyimide resin, and is not particularly limited, but it is preferable to use the above-mentioned compounds alone or in combination of two or more as the reaction solvent used for producing the polyimide resin.
The polyimide varnish of the present invention may be a polyimide solution itself in which a polyimide resin obtained by a polymerization method is dissolved in a reaction solvent, or a diluting solvent may be further added to the polyimide solution.
 本発明のポリイミド樹脂は溶媒溶解性を有しているため、室温で安定な高濃度のワニスとすることができる。本発明のポリイミドワニスは、本発明のポリイミド樹脂を5~40質量%含むことが好ましく、10~30質量%含むことがより好ましい。ポリイミドワニスの粘度は1~200Pa・sが好ましく、1.5~100Pa・sがより好ましい。ポリイミドワニスの粘度は、E型粘度計を用いて25℃で測定された値である。
 また、本発明のポリイミドワニスは、ポリイミドフィルムの要求特性を損なわない範囲で、無機フィラー、接着促進剤、剥離剤、難燃剤、紫外線安定剤、界面活性剤、レベリング剤、消泡剤、蛍光増白剤、架橋剤、重合開始剤、感光剤等各種添加剤を含んでもよい。
 本発明のポリイミドワニスの製造方法は特に限定されず、公知の方法を適用することができる。
Since the polyimide resin of the present invention has solvent solubility, it can be a varnish having a high concentration stable at room temperature. The polyimide varnish of the present invention preferably contains the polyimide resin of the present invention in an amount of 5 to 40% by mass, more preferably 10 to 30% by mass. The viscosity of the polyimide varnish is preferably 1 to 200 Pa · s, more preferably 1.5 to 100 Pa · s. The viscosity of the polyimide varnish is a value measured at 25 ° C. using an E-type viscometer.
Further, the polyimide varnish of the present invention has an inorganic filler, an adhesion accelerator, a release agent, a flame retardant, an ultraviolet stabilizer, a surfactant, a leveling agent, a defoaming agent, and a fluorescence increase as long as the required properties of the polyimide film are not impaired. Various additives such as a whitening agent, a cross-linking agent, a polymerization initiator, and a photosensitizer may be contained.
The method for producing the polyimide varnish of the present invention is not particularly limited, and a known method can be applied.
[ポリイミドフィルム]
 本発明のポリイミドフィルムは、本発明のポリイミド樹脂を含む。したがって、本発明のポリイミドフィルムは、無色透明性、光学的等方性、及び耐薬品性(例えば耐酸性及び耐アルカリ性)に優れる。本発明のポリイミドフィルムが有する好適な物性値は上述の通りである。
 本発明のポリイミドフィルムの製造方法には特に制限はなく、公知の方法を用いることができる。例えば、本発明のポリイミドワニスを、ガラス板、金属板、プラスチックなどの平滑な支持体上に塗布、又はフィルム状に成形した後、該ワニス中に含まれる反応溶剤や希釈溶剤等の有機溶媒を加熱により除去する方法等が挙げられる。
[Polyimide film]
The polyimide film of the present invention contains the polyimide resin of the present invention. Therefore, the polyimide film of the present invention is excellent in colorless transparency, optical isotropic property, and chemical resistance (for example, acid resistance and alkali resistance). Suitable physical property values of the polyimide film of the present invention are as described above.
The method for producing the polyimide film of the present invention is not particularly limited, and a known method can be used. For example, the polyimide varnish of the present invention is applied onto a smooth support such as a glass plate, a metal plate, or plastic, or formed into a film, and then an organic solvent such as a reaction solvent or a dilution solvent contained in the varnish is applied. Examples thereof include a method of removing by heating.
 塗布方法としては、スピンコート、スリットコート、ブレードコート等の公知の塗布方法が挙げられる。中でも、スリットコートが分子間配向を制御し耐薬品性が向上すること、作業性の観点から好ましい。
 ワニス中に含まれる有機溶媒を加熱により除去する方法としては、150℃以下の温度で有機溶媒を蒸発させタックフリーにした後、用いた有機溶媒の沸点以上の温度(特に限定されないが、好ましくは200~500℃)で乾燥することが好ましい。また、空気雰囲気下又は窒素雰囲気下で乾燥することが好ましい。乾燥雰囲気の圧力は、減圧、常圧、加圧のいずれでもよい。
 支持体上に製膜されたポリイミドフィルムを支持体から剥離する方法は特に限定されないが、レーザーリフトオフ法や、剥離用犠牲層を使用する方法(支持体の表面に予め離形剤を塗布しておく方法)が挙げられる。
Examples of the coating method include known coating methods such as spin coating, slit coating, and blade coating. Above all, the slit coat is preferable from the viewpoint of controlling the intermolecular orientation and improving the chemical resistance and workability.
As a method for removing the organic solvent contained in the varnish by heating, the organic solvent is evaporated at a temperature of 150 ° C. or lower to make it tack-free, and then the temperature is equal to or higher than the boiling point of the organic solvent used (not particularly limited, but preferably). It is preferable to dry at 200 to 500 ° C.). Further, it is preferable to dry in an air atmosphere or a nitrogen atmosphere. The pressure in the dry atmosphere may be reduced pressure, normal pressure, or pressurized pressure.
The method of peeling the polyimide film formed on the support from the support is not particularly limited, but a laser lift-off method or a method of using a sacrificial layer for peeling (a mold release agent is applied to the surface of the support in advance). How to put) can be mentioned.
 また、本発明のポリイミドフィルムは、ポリアミド酸が有機溶媒に溶解してなるポリアミド酸ワニスを用いて製造することもできる。
 前記ポリアミド酸ワニスに含まれるポリアミド酸は、本発明のポリイミド樹脂の前駆体であって、上述の構成単位(A-1)を与える化合物及び上述の構成単位(A-2)を与える化合物を含むテトラカルボン酸成分と、上述の構成単位(B-1)を与える化合物及び上述の構成単位(B-2)を与える化合物を含むジアミン成分との重付加反応の生成物である。このポリアミド酸をイミド化(脱水閉環)することで、最終生成物である本発明のポリイミド樹脂が得られる。
 前記ポリアミド酸ワニスに含まれる有機溶媒としては、本発明のポリイミドワニスに含まれる有機溶媒を用いることができる。
 本発明において、ポリアミド酸ワニスは、テトラカルボン酸成分とジアミン成分とを反応溶剤中で重付加反応させて得られるポリアミド酸溶液そのものであってもよいし、又は当該ポリアミド酸溶液に対して更に希釈溶剤を追加したものであってもよい。
Further, the polyimide film of the present invention can also be produced by using a polyamic acid varnish in which polyamic acid is dissolved in an organic solvent.
The polyamic acid contained in the polyamic acid varnish is a precursor of the polyimide resin of the present invention and includes a compound giving the above-mentioned structural unit (A-1) and a compound giving the above-mentioned structural unit (A-2). It is a product of a polyaddition reaction between a tetracarboxylic acid component and a diamine component containing the compound giving the above-mentioned structural unit (B-1) and the compound giving the above-mentioned structural unit (B-2). By imidizing (dehydrating and ring-closing) this polyamic acid, the polyimide resin of the present invention, which is the final product, can be obtained.
As the organic solvent contained in the polyamic acid varnish, the organic solvent contained in the polyimide varnish of the present invention can be used.
In the present invention, the polyamic acid varnish may be the polyamic acid solution itself obtained by subjecting the tetracarboxylic acid component and the diamine component to a heavy addition reaction in a reaction solvent, or may be further diluted with respect to the polyamic acid solution. It may be the one to which a solvent is added.
 ポリアミド酸ワニスを用いてポリイミドフィルムを製造する方法には特に制限はなく、公知の方法を用いることができる。例えば、ポリアミド酸ワニスを、ガラス板、金属板、プラスチックなどの平滑な支持体上に塗布、又はフィルム状に成形し、該ワニス中に含まれる反応溶剤や希釈溶剤等の有機溶媒を加熱により除去してポリアミド酸フィルムを得て、該ポリアミド酸フィルム中のポリアミド酸を加熱によりイミド化することで、ポリイミドフィルムを製造することができる。
 ポリアミド酸ワニスを乾燥させてポリアミド酸フィルムを得る際の加熱温度としては、好ましくは50~120℃である。ポリアミド酸を加熱によりイミド化する際の加熱温度としては好ましくは200~400℃である。
 なお、イミド化の方法は熱イミド化に限定されず、化学イミド化を適用することもできる。
The method for producing the polyimide film using the polyamic acid varnish is not particularly limited, and a known method can be used. For example, a polyamic acid varnish is applied onto a smooth support such as a glass plate, a metal plate, or plastic, or formed into a film, and organic solvents such as a reaction solvent and a diluting solvent contained in the varnish are removed by heating. Then, a polyamic acid film is obtained, and the polyamic acid in the polyamic acid film is imidized by heating to produce a polyimide film.
The heating temperature for drying the polyamic acid varnish to obtain a polyamic acid film is preferably 50 to 120 ° C. The heating temperature for imidizing the polyamic acid by heating is preferably 200 to 400 ° C.
The imidization method is not limited to thermal imidization, and chemical imidization can also be applied.
 本発明のポリイミドフィルムの厚みは用途等に応じて適宜選択することができるが、好ましくは1~250μm、より好ましくは5~100μm、更に好ましくは10~80μmの範囲である。厚みが1~250μmであることで、自立膜としての実用的な使用が可能となる。
 ポリイミドフィルムの厚みは、ポリイミドワニスの固形分濃度や粘度を調整することにより、容易に制御することができる。
The thickness of the polyimide film of the present invention can be appropriately selected depending on the intended use and the like, but is preferably in the range of 1 to 250 μm, more preferably 5 to 100 μm, and further preferably 10 to 80 μm. When the thickness is 1 to 250 μm, it can be practically used as a self-supporting film.
The thickness of the polyimide film can be easily controlled by adjusting the solid content concentration and viscosity of the polyimide varnish.
 本発明のポリイミドフィルムは、カラーフィルター、フレキシブルディスプレイ、半導体部品、光学部材等の各種部材用のフィルムとして好適に用いられる。本発明のポリイミドフィルムは、液晶ディスプレイやOLEDディスプレイ等の画像表示装置の基板として、特に好適に用いられる。 The polyimide film of the present invention is suitably used as a film for various members such as color filters, flexible displays, semiconductor parts, and optical members. The polyimide film of the present invention is particularly preferably used as a substrate for an image display device such as a liquid crystal display or an OLED display.
 以下に、実施例により本発明を具体的に説明する。但し、本発明はこれらの実施例により何ら制限されるものではない。 Hereinafter, the present invention will be specifically described with reference to Examples. However, the present invention is not limited to these examples.
 実施例及び比較例において、各物性は以下に示す方法によって測定した。
(1)フィルム厚さ
 フィルム厚さは、株式会社ミツトヨ製のマイクロメーターを用いて測定した。
(2)引張強度(引張強さ)、引張弾性率、引張伸び率(引張破壊ひずみ)
 引張強度(引張強さ)、引張弾性率及び引張伸び率(引張破壊ひずみ)は、JIS K7161:2014及びJIS K7127:1999に準拠し、東洋精機株式会社製の引張試験機「ストログラフVG-1E」を用いて測定した。チャック間距離は50mm、試験片サイズは10mm×70mm、試験速度は20mm/minとした。
(3)ガラス転移温度(Tg)
 株式会社日立ハイテクサイエンス製の熱機械的分析装置「TMA/SS6100」を用いて、引張モードで試料サイズ2mm×20mm、荷重0.1N、昇温速度10℃/minの条件で、残留応力を取り除くのに十分な温度まで昇温して残留応力を取り除き、その後室温まで冷却した。その後、前記残留応力を取り除くための処理と同じ条件で試験片伸びの測定を行い、伸びの変曲点が見られたところをガラス転移温度として求めた。
(4)全光線透過率、イエローインデックス(YI)、b
 全光線透過率、YI及びbは、JIS K7105:1981に準拠し、日本電色工業株式会社製の色彩・濁度同時測定器「COH400」を用いて測定した。
(5)厚み位相差(Rth)
 厚み位相差(Rth)は、日本分光株式会社製のエリプソメーター「M-220」を用いて測定した。測定波長590nmにおける、厚み位相差の値を測定した。なおRthは、ポリイミドフィルムの面内の屈折率のうち最大のものをnx、最小のものをnyとし、厚み方向の屈折率をnzとし、フィルムの厚みをdとしたとき、下記式によって表されるものである。
  Rth=[{(nx+ny)/2}-nz]×d
(6)重合時間
 固形分濃度20質量%としたときの粘度が12Pa・s以上となるのに必要な重合時間を重合時間とした。ただし重合時間とは、反応系内温度が190℃に到達してから190℃で維持される時間を意味する。
(7)耐酸性(混酸ΔYI及び混酸Δb
 ガラス板上に製膜したポリイミドフィルムを40℃に温めた混酸(HNO(10質量%)+HPO(70質量%)+CHCOOH(5質量%)+HO(15質量%)の混合溶液)に4分間浸漬した後、水洗した。水洗後、水分をふき取り、ホットプレートにて240℃で50分加熱して、乾燥した。試験前後でYI及びbを測定し、その変化(ΔYI及びΔb)を求めた。なお、ここでのYI測定及びb測定は、ガラス板にポリイミドフィルムを製膜した状態(ガラス板+ポリイミドフィルムの状態)で行った。
(8)耐アルカリ性
 ガラス板上に製膜したポリイミドフィルムを、室温で3質量%濃度の水酸化カリウム水溶液に5分間浸漬した後、水洗した。水洗後、フィルム表面に変化がないかを確認した。
 耐アルカリ性の評価基準は、以下の通りとした。
A:フィルム表面に変化がなかった。
B:フィルム表面にわずかにクラックが入った。
C:フィルム表面にクラックが入った、又はフィルム表面が溶解した。
In Examples and Comparative Examples, each physical property was measured by the method shown below.
(1) Film thickness The film thickness was measured using a micrometer manufactured by Mitutoyo Co., Ltd.
(2) Tensile strength (tensile strength), tensile elastic modulus, tensile elongation (tensile fracture strain)
Tensile strength (tensile strength), tensile elastic modulus and tensile elongation (tensile fracture strain) are based on JIS K7161: 2014 and JIS K7127: 1999, and the tensile tester "Strograph VG-1E" manufactured by Toyo Seiki Co., Ltd. Was measured using. The distance between the chucks was 50 mm, the test piece size was 10 mm × 70 mm, and the test speed was 20 mm / min.
(3) Glass transition temperature (Tg)
Using the thermomechanical analyzer "TMA / SS6100" manufactured by Hitachi High-Tech Science Co., Ltd., residual stress is removed under the conditions of sample size 2 mm x 20 mm, load 0.1 N, and heating rate 10 ° C / min in tensile mode. The temperature was raised to a sufficient temperature to remove residual stress, and then cooled to room temperature. Then, the elongation of the test piece was measured under the same conditions as the treatment for removing the residual stress, and the place where the inflection point of the elongation was observed was determined as the glass transition temperature.
(4) Total light transmittance, yellow index (YI), b *
The total light transmittance, YI and b * were measured in accordance with JIS K7105: 1981 using a color / turbidity simultaneous measuring device "COH400" manufactured by Nippon Denshoku Industries Co., Ltd.
(5) Thickness phase difference (Rth)
The thickness phase difference (Rth) was measured using an ellipsometer "M-220" manufactured by JASCO Corporation. The value of the thickness phase difference at the measurement wavelength of 590 nm was measured. Rth is expressed by the following formula when the maximum in-plane refractive index of the polyimide film is nx, the minimum is ny, the refractive index in the thickness direction is nz, and the thickness of the film is d. It is a thing.
Rth = [{(nx + ny) / 2} -nz] × d
(6) Polymerization time The polymerization time required for the viscosity to be 12 Pa · s or more when the solid content concentration was 20% by mass was defined as the polymerization time. However, the polymerization time means the time during which the temperature in the reaction system reaches 190 ° C. and is maintained at 190 ° C.
(7) Acid resistance (mixed acid ΔYI and mixed acid Δb * )
A mixed acid (HNO 3 (10% by mass) + H 3 PO 4 (70% by mass) + CH 3 COOH (5% by mass) + H 2 O (15% by mass)) obtained by warming a polyimide film formed on a glass plate to 40 ° C. The mixture was immersed in a mixed solution for 4 minutes and then washed with water. After washing with water, the water was wiped off, and the mixture was heated on a hot plate at 240 ° C. for 50 minutes to dry. YI and b * were measured before and after the test, and their changes (ΔYI and Δb * ) were determined. The YI measurement and b * measurement here were performed in a state where a polyimide film was formed on a glass plate (a state of a glass plate + a polyimide film).
(8) The polyimide film formed on the alkali-resistant glass plate was immersed in a potassium hydroxide aqueous solution having a concentration of 3% by mass at room temperature for 5 minutes, and then washed with water. After washing with water, it was confirmed that there was no change on the film surface.
The evaluation criteria for alkali resistance are as follows.
A: There was no change on the film surface.
B: The film surface was slightly cracked.
C: The film surface was cracked or the film surface was dissolved.
 実施例及び比較例にて使用したテトラカルボン酸成分及びジアミン成分、その他成分並びにそれらの略号は以下の通りである。
<テトラカルボン酸成分>
HPMDA:1,2,4,5-シクロヘキサンテトラカルボン酸二無水物(三菱ガス化学株式会社製;式(a-1)で表される化合物)
<ジアミン成分>
3,3’-DDS:3,3’-ジアミノジフェニルスルホン(セイカ株式会社製;式(b-1)で表される化合物)
BAPS:ビス[4-(4-アミノフェノキシ)フェニル]スルホン(セイカ株式会社製;式(b-2)で表される化合物)
<その他>
GBL:γ-ブチロラクトン(三菱ケミカル株式会社製)
TEA:トリエチルアミン(関東化学株式会社製)
The tetracarboxylic acid component and diamine component used in Examples and Comparative Examples, other components, and their abbreviations are as follows.
<Tetracarboxylic acid component>
HPMDA: 1,2,4,5-Cyclohexanetetracarboxylic dianhydride (manufactured by Mitsubishi Gas Chemical Company, Inc .; compound represented by formula (a-1))
<Diamine component>
3,3'-DDS: 3,3'-diaminodiphenyl sulfone (manufactured by Seika Co., Ltd .; compound represented by formula (b-1))
BAPS: Bis [4- (4-aminophenoxy) phenyl] sulfone (manufactured by Seika Co., Ltd .; compound represented by formula (b-2))
<Others>
GBL: γ-Butyrolactone (manufactured by Mitsubishi Chemical Corporation)
TEA: Triethylamine (manufactured by Kanto Chemical Co., Inc.)
<実施例1>
 ステンレス製半月型撹拌翼、窒素導入管、冷却管を取り付けたディーンスターク、温度計、ガラス製エンドキャップを備えた300mLの5つ口丸底フラスコに、3,3’-DDS 14.135g(0.057モル)、BAPS 24.527g(0.057モル)、及びGBL 41.945gを投入し、系内温度70℃、窒素雰囲気下、回転数200rpmで撹拌して溶液を得た。
 この溶液に、HPMDA 25.421g(0.113モル)及びGBL 10.486gを一括で添加した後、イミド化触媒としてTEA 0.573gを投入し、マントルヒーターで加熱し、約20分かけて反応系内温度を190℃まで上げた。留去される成分を捕集し、回転数を粘度上昇に合わせて調整しつつ、反応系内温度を190℃に保持して約5時間還流した。
 その後、固形分濃度20質量%となるようにGBL 187.569gを添加して、反応系内温度を100℃まで冷却した後、更に約1時間撹拌して均一化して、ポリイミドワニスを得た。ワニス溶液の粘度は25℃において12Pa・sであった。
 続いてガラス板上へ、得られたポリイミドワニスをスピンコートにより塗布し、ホットプレートで80℃、20分間保持し、その後、空気雰囲気下、熱風乾燥機中260℃で30分加熱し溶媒を蒸発させ、フィルムを得た。結果を表1に示す。
<Example 1>
3,3'-DDS 14.135g (0) in a 300mL five-necked round-bottom flask with a stainless half-moon agitator, a nitrogen inlet tube, a Dean Stark with a cooling tube, a thermometer, and a glass end cap. .057 mol), BAPS 24.527 g (0.057 mol), and GBL 41.945 g were added and stirred at a system temperature of 70 ° C. and a nitrogen atmosphere at a rotation speed of 200 rpm to obtain a solution.
After adding 25.421 g (0.113 mol) of HPMDA and 10.486 g of GBL in a batch to this solution, 0.573 g of TEA was added as an imidization catalyst, heated with a mantle heater, and reacted over about 20 minutes. The temperature inside the system was raised to 190 ° C. The components to be distilled off were collected, and the temperature inside the reaction system was maintained at 190 ° C. and reflux was carried out for about 5 hours while adjusting the rotation speed according to the increase in viscosity.
Then, 187.569 g of GBL was added so as to have a solid content concentration of 20% by mass, the temperature inside the reaction system was cooled to 100 ° C., and the mixture was further stirred for about 1 hour to homogenize to obtain a polyimide varnish. The viscosity of the varnish solution was 12 Pa · s at 25 ° C.
Subsequently, the obtained polyimide varnish was applied onto a glass plate by spin coating, held on a hot plate at 80 ° C. for 20 minutes, and then heated in a hot air dryer at 260 ° C. for 30 minutes in an air atmosphere to evaporate the solvent. And obtained a film. The results are shown in Table 1.
<実施例2>
 ステンレス製半月型撹拌翼、窒素導入管、冷却管を取り付けたディーンスターク、温度計、ガラス製エンドキャップを備えた300mLの5つ口丸底フラスコに、3,3’-DDS 17.571g(0.071モル)、BAPS 20.326g(0.047モル)、及びGBL 42.041gを投入し、系内温度70℃、窒素雰囲気下、回転数200rpmで撹拌して溶液を得た。
 この溶液に、HPMDA 26.333g(0.117モル)、及びGBL 10.510gを一括で添加した後、イミド化触媒としてTEA 0.594gを投入し、マントルヒーターで加熱し、約20分かけて反応系内温度を190℃まで上げた。留去される成分を捕集し、回転数を粘度上昇に合わせて調整しつつ、反応系内温度を190℃に保持して約4.7時間還流した。
 その後、固形分濃度20質量%となるようにGBL 187.449gを添加して、反応系内温度を100℃まで冷却した後、更に約1時間撹拌して均一化して、ポリイミドワニスを得た。ワニス溶液の粘度は25℃において12Pa・sであった。
 続いてガラス板上へ、得られたポリイミドワニスをスピンコートにより塗布し、ホットプレートで80℃、20分間保持し、その後、空気雰囲気下、熱風乾燥機中260℃で30分加熱し溶媒を蒸発させ、フィルムを得た。結果を表1に示す。
<Example 2>
3,3'-DDS 17.571g (0) in a 300mL five-necked round-bottom flask equipped with a stainless half-moon agitator, a nitrogen inlet tube, a Dean Stark with a cooling tube, a thermometer, and a glass end cap. .071 mol), BAPS 20.326 g (0.047 mol), and GBL 42.041 g were added and stirred at a system temperature of 70 ° C. and a nitrogen atmosphere at a rotation speed of 200 rpm to obtain a solution.
After adding 26.333 g (0.117 mol) of HPMDA and 10.510 g of GBL in a batch to this solution, 0.594 g of TEA was added as an imidization catalyst, and the mixture was heated with a mantle heater over about 20 minutes. The temperature inside the reaction system was raised to 190 ° C. The components to be distilled off were collected, and the temperature inside the reaction system was maintained at 190 ° C. and refluxed for about 4.7 hours while adjusting the rotation speed according to the increase in viscosity.
Then, 187.449 g of GBL was added so as to have a solid content concentration of 20% by mass, the temperature in the reaction system was cooled to 100 ° C., and the mixture was further stirred for about 1 hour to homogenize to obtain a polyimide varnish. The viscosity of the varnish solution was 12 Pa · s at 25 ° C.
Subsequently, the obtained polyimide varnish was applied onto a glass plate by spin coating, held on a hot plate at 80 ° C. for 20 minutes, and then heated in a hot air dryer at 260 ° C. for 30 minutes in an air atmosphere to evaporate the solvent. And obtained a film. The results are shown in Table 1.
<比較例1>
 ステンレス製半月型撹拌翼、窒素導入管、冷却管を取り付けたディーンスターク、温度計、ガラス製エンドキャップを備えた300mLの5つ口丸底フラスコに、3,3’-DDS 5.122g(0.021モル)、BAPS 35.549g(0.082モル)、及びGBL 41.694gを投入し、系内温度70℃、窒素雰囲気下、回転数200rpmで撹拌して溶液を得た。
 この溶液に、HPMDA 23.028g(0.103モル)及びGBL 10.388gを一括で添加した後、イミド化触媒としてTEA 0.519gを投入し、マントルヒーターで加熱し、約20分かけて反応系内温度を190℃に保持して約7時間還流した。ワニス溶液の粘度は25℃において12Pa・sであった。
 その後、固形分濃度20質量%となるようにGBL 187.883gを添加して、反応系内温度を100℃まで冷却した後、更に約1時間撹拌して均一化して、ポリイミドワニスを得た。
 続いてガラス板上へ、得られたポリイミドワニスをスピンコートにより塗布し、ホットプレートで80℃、20分間保持し、その後、空気雰囲気下、熱風乾燥機中260℃で30分加熱し溶媒を蒸発させ、フィルムを得た。結果を表1に示す。
<Comparative example 1>
3,3'-DDS 5.122 g (0) in a 300 mL five-necked round-bottom flask equipped with a stainless half-moon agitator, a nitrogen inlet tube, a Dean Stark with a cooling tube, a thermometer, and a glass end cap. .021 mol), BAPS 35.549 g (0.082 mol), and GBL 41.694 g were added and stirred at a system temperature of 70 ° C. and a nitrogen atmosphere at a rotation speed of 200 rpm to obtain a solution.
After adding 23.028 g (0.103 mol) of HPE and 10.388 g of GBL in a batch to this solution, 0.519 g of TEA was added as an imidization catalyst, heated with a mantle heater, and reacted over about 20 minutes. The temperature in the system was maintained at 190 ° C., and the mixture was refluxed for about 7 hours. The viscosity of the varnish solution was 12 Pa · s at 25 ° C.
Then, 187.883 g of GBL was added so as to have a solid content concentration of 20% by mass, the temperature inside the reaction system was cooled to 100 ° C., and the mixture was further stirred for about 1 hour to homogenize to obtain a polyimide varnish.
Subsequently, the obtained polyimide varnish was applied onto a glass plate by spin coating, held on a hot plate at 80 ° C. for 20 minutes, and then heated in a hot air dryer at 260 ° C. for 30 minutes in an air atmosphere to evaporate the solvent. And obtained a film. The results are shown in Table 1.
<比較例2>
 ステンレス製半月型撹拌翼、窒素導入管、冷却管を取り付けたディーンスターク、温度計、ガラス製エンドキャップを備えた300mLの5つ口丸底フラスコに、3,3’-DDS 25.239g(0.101モル)、BAPS 10.949g(0.025モル)、及びGBL 42.255gを投入し、系内温度70℃、窒素雰囲気下、回転数200rpmで撹拌して溶液を得た。
 この溶液に、HPMDA 28.369g(0.126モル)及びGBL 10.564gを一括で添加した後、イミド化触媒としてTEA 0.640gを投入し、マントルヒーターで加熱し、約20分かけて反応系内温度を190℃まで上げた。留去される成分を捕集し、回転数を粘度上昇に合わせて調整しつつ、反応系内温度を190℃に保持して約7.5時間還流した。
 その後、固形分濃度20質量%となるようにGBL 187.181gを添加して、反応系内温度を100℃まで冷却した後、更に約1時間撹拌して均一化して、ポリイミドワニスを得た。ワニス溶液の粘度は25℃において12Pa・sであった。
 続いてガラス板上へ、得られたポリイミドワニスをスピンコートにより塗布し、ホットプレートで80℃、20分間保持し、その後、空気雰囲気下、熱風乾燥機中260℃で30分加熱し溶媒を蒸発させ、フィルムを得た。結果を表1に示す。
<Comparative example 2>
3,3'-DDS 25.239 g (0) in a 300 mL five-necked round-bottom flask equipped with a stainless half-moon agitator, a nitrogen inlet tube, a Dean Stark with a cooling tube, a thermometer, and a glass end cap. .101 mol), BAPS 10.949 g (0.025 mol), and GBL 42.255 g were added and stirred at a system temperature of 70 ° C. and a nitrogen atmosphere at a rotation speed of 200 rpm to obtain a solution.
After adding 28.369 g (0.126 mol) of HPMDA and 10.564 g of GBL in a batch to this solution, 0.640 g of TEA was added as an imidization catalyst, heated with a mantle heater, and reacted over about 20 minutes. The temperature inside the system was raised to 190 ° C. The components to be distilled off were collected, and the temperature inside the reaction system was maintained at 190 ° C. and reflux was carried out for about 7.5 hours while adjusting the rotation speed according to the increase in viscosity.
Then, 187.181 g of GBL was added so as to have a solid content concentration of 20% by mass, the temperature inside the reaction system was cooled to 100 ° C., and the mixture was further stirred for about 1 hour to homogenize to obtain a polyimide varnish. The viscosity of the varnish solution was 12 Pa · s at 25 ° C.
Subsequently, the obtained polyimide varnish was applied onto a glass plate by spin coating, held on a hot plate at 80 ° C. for 20 minutes, and then heated in a hot air dryer at 260 ° C. for 30 minutes in an air atmosphere to evaporate the solvent. And obtained a film. The results are shown in Table 1.
Figure JPOXMLDOC01-appb-T000007
Figure JPOXMLDOC01-appb-T000007
 表1に示すように、実施例1~2のポリイミドフィルムは、テトラカルボン酸成分としてHPMDAを用い、ジアミン成分として50~60モル%の3,3’-DDSと50~40モル%のBAPSを併用して製造した。その結果、無色透明性、光学的等方性、耐酸性、及び耐アルカリ性を示し、靱性に優れていた。さらに重合時間が比較例よりも短いものであった。
 一方、比較例1のポリイミドフィルムは、テトラカルボン酸成分としてHPMDAを用い、ジアミン成分として20モル%の3,3’-DDSと80モル%のBAPSを併用して製造した。その結果、厚み位相差(リタデーション、Rth)が高く光学的等方性が劣っていた。また重合時間も長いものであった。
 比較例2のポリイミドフィルムは、テトラカルボン酸成分としてHPMDAを用い、ジアミン成分として80モル%の3,3’-DDSと20モル%のBAPSを併用して製造した。その結果、厚み位相差(リタデーション、Rth)は低く光学物性に優れるものの、引張伸び率、引張強度が低く劣っていた。また重合時間も長いものであった。
 したがって、テトラカルボン酸成分としてHPMDAを用い、ジアミン成分として3,3’-DDS及びBAPSを特定の比率で併用して製造したポリイミドフィルムは、無色透明性、光学的等方性、耐薬品性(例えば耐酸性及び耐アルカリ性)、及び靱性に優れるフィルムとして液晶ディスプレイ、タッチパネルなどのプラスチック基板として好適に使用できる。さらに、重合時間も短く製造時のエネルギーを低減でき製造コストに優れるものである。
As shown in Table 1, the polyimide films of Examples 1 and 2 used HPMDA as the tetracarboxylic acid component, and 50 to 60 mol% of 3,3'-DDS and 50 to 40 mol% of BAPS as the diamine component. Manufactured in combination. As a result, it exhibited colorless transparency, optical isotropic property, acid resistance, and alkali resistance, and was excellent in toughness. Furthermore, the polymerization time was shorter than that of the comparative example.
On the other hand, the polyimide film of Comparative Example 1 was produced by using HPMDA as a tetracarboxylic acid component and using 20 mol% of 3,3'-DDS and 80 mol% of BAPS in combination as a diamine component. As a result, the thickness retardation (Rth) was high and the optical isotropic property was inferior. In addition, the polymerization time was long.
The polyimide film of Comparative Example 2 was produced by using HPMDA as a tetracarboxylic acid component and using 80 mol% of 3,3'-DDS and 20 mol% of BAPS in combination as a diamine component. As a result, although the thickness retardation (Rth) was low and the optical characteristics were excellent, the tensile elongation and tensile strength were low and inferior. In addition, the polymerization time was long.
Therefore, a polyimide film produced by using HPMDA as a tetracarboxylic acid component and 3,3'-DDS and BAPS as a diamine component in a specific ratio has colorless transparency, optical isotropic property, and chemical resistance ( For example, it can be suitably used as a plastic substrate for a liquid crystal display, a touch panel, etc. as a film having excellent acid resistance and alkali resistance) and toughness. Further, the polymerization time is short, the energy during production can be reduced, and the production cost is excellent.

Claims (3)

  1.  テトラカルボン酸二無水物に由来する構成単位A及びジアミンに由来する構成単位Bを有するポリイミド樹脂であって、
     構成単位Aが下記式(a-1)で表される化合物に由来する構成単位(A-1)を含み、かつ、下記式(a-2)で表される化合物に由来する構成単位(A-2)を含まず、
     構成単位Bが下記式(b-1)で表される化合物に由来する構成単位(B-1)と、下記式(b-2)で表される化合物に由来する構成単位(B-2)とを含み、
     構成単位B中における構成単位(B-1)の比率が30~70モル%であり、構成単位B中における構成単位(B-2)の比率が70~30モル%である、ポリイミド樹脂。
    Figure JPOXMLDOC01-appb-C000001
    A polyimide resin having a structural unit A derived from tetracarboxylic dianhydride and a structural unit B derived from diamine.
    The structural unit A includes a structural unit (A-1) derived from a compound represented by the following formula (a-1), and a structural unit (A) derived from a compound represented by the following formula (a-2). -2) is not included,
    A structural unit (B-1) in which the structural unit B is derived from a compound represented by the following formula (b-1) and a structural unit (B-2) derived from a compound represented by the following formula (b-2). Including and
    A polyimide resin in which the ratio of the structural unit (B-1) in the structural unit B is 30 to 70 mol%, and the ratio of the structural unit (B-2) in the structural unit B is 70 to 30 mol%.
    Figure JPOXMLDOC01-appb-C000001
  2.  請求項1に記載のポリイミド樹脂が有機溶媒に溶解してなるポリイミドワニス。 A polyimide varnish in which the polyimide resin according to claim 1 is dissolved in an organic solvent.
  3.  請求項1に記載のポリイミド樹脂を含む、ポリイミドフィルム。 A polyimide film containing the polyimide resin according to claim 1.
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