JP7180617B2 - Polyimide resin composition and polyimide film - Google Patents
Polyimide resin composition and polyimide film Download PDFInfo
- Publication number
- JP7180617B2 JP7180617B2 JP2019569185A JP2019569185A JP7180617B2 JP 7180617 B2 JP7180617 B2 JP 7180617B2 JP 2019569185 A JP2019569185 A JP 2019569185A JP 2019569185 A JP2019569185 A JP 2019569185A JP 7180617 B2 JP7180617 B2 JP 7180617B2
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- Prior art keywords
- structural unit
- polyimide resin
- polyimide
- mol
- film
- Prior art date
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- 229920001721 polyimide Polymers 0.000 title claims description 234
- 239000009719 polyimide resin Substances 0.000 title claims description 143
- 239000000203 mixture Substances 0.000 title claims description 43
- 150000001875 compounds Chemical class 0.000 claims description 109
- 239000003431 cross linking reagent Substances 0.000 claims description 65
- 150000004985 diamines Chemical class 0.000 claims description 30
- 125000002971 oxazolyl group Chemical group 0.000 claims description 28
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims description 27
- 125000006158 tetracarboxylic acid group Chemical group 0.000 claims description 15
- 238000004132 cross linking Methods 0.000 claims description 10
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 229910052731 fluorine Inorganic materials 0.000 claims description 5
- 125000001153 fluoro group Chemical group F* 0.000 claims description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 5
- 125000002947 alkylene group Chemical group 0.000 claims description 4
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 4
- 125000001033 ether group Chemical group 0.000 claims description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 3
- 239000004642 Polyimide Substances 0.000 description 67
- 239000002966 varnish Substances 0.000 description 66
- 239000000243 solution Substances 0.000 description 47
- 230000000052 comparative effect Effects 0.000 description 36
- 239000003960 organic solvent Substances 0.000 description 27
- 239000007787 solid Substances 0.000 description 25
- 150000000000 tetracarboxylic acids Chemical class 0.000 description 25
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 24
- 238000006243 chemical reaction Methods 0.000 description 24
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 18
- 239000002904 solvent Substances 0.000 description 18
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 16
- 238000000034 method Methods 0.000 description 13
- 230000003287 optical effect Effects 0.000 description 13
- 239000003054 catalyst Substances 0.000 description 11
- 238000003756 stirring Methods 0.000 description 11
- OCKGFTQIICXDQW-ZEQRLZLVSA-N 5-[(1r)-1-hydroxy-2-[4-[(2r)-2-hydroxy-2-(4-methyl-1-oxo-3h-2-benzofuran-5-yl)ethyl]piperazin-1-yl]ethyl]-4-methyl-3h-2-benzofuran-1-one Chemical compound C1=C2C(=O)OCC2=C(C)C([C@@H](O)CN2CCN(CC2)C[C@H](O)C2=CC=C3C(=O)OCC3=C2C)=C1 OCKGFTQIICXDQW-ZEQRLZLVSA-N 0.000 description 9
- 239000007810 chemical reaction solvent Substances 0.000 description 9
- 239000011521 glass Substances 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 9
- 125000003118 aryl group Chemical group 0.000 description 8
- 239000012299 nitrogen atmosphere Substances 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- LJMPOXUWPWEILS-UHFFFAOYSA-N 3a,4,4a,7a,8,8a-hexahydrofuro[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1C2C(=O)OC(=O)C2CC2C(=O)OC(=O)C21 LJMPOXUWPWEILS-UHFFFAOYSA-N 0.000 description 7
- -1 9,9-bis(4-(4-aminophenoxy)phenyl)fluorene aromatic diamines Chemical class 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 102100031503 Barrier-to-autointegration factor-like protein Human genes 0.000 description 6
- 101000729827 Homo sapiens Barrier-to-autointegration factor-like protein Proteins 0.000 description 6
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 6
- 125000002723 alicyclic group Chemical group 0.000 description 6
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- WGQKYBSKWIADBV-UHFFFAOYSA-N benzylamine Chemical compound NCC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-N 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- OISVCGZHLKNMSJ-UHFFFAOYSA-N 2,6-dimethylpyridine Chemical compound CC1=CC=CC(C)=N1 OISVCGZHLKNMSJ-UHFFFAOYSA-N 0.000 description 3
- HMOZDINWBHMBSQ-UHFFFAOYSA-N 2-[3-(4,5-dihydro-1,3-oxazol-2-yl)phenyl]-4,5-dihydro-1,3-oxazole Chemical compound O1CCN=C1C1=CC=CC(C=2OCCN=2)=C1 HMOZDINWBHMBSQ-UHFFFAOYSA-N 0.000 description 3
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 3
- KIFDSGGWDIVQGN-UHFFFAOYSA-N 4-[9-(4-aminophenyl)fluoren-9-yl]aniline Chemical compound C1=CC(N)=CC=C1C1(C=2C=CC(N)=CC=2)C2=CC=CC=C2C2=CC=CC=C21 KIFDSGGWDIVQGN-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- OVASAEXSPYGGES-UHFFFAOYSA-N C1C2C(C(OC3=O)=O)C3C1CC2(C1=O)CCC21CC1CC2C2C(=O)OC(=O)C12 Chemical compound C1C2C(C(OC3=O)=O)C3C1CC2(C1=O)CCC21CC1CC2C2C(=O)OC(=O)C12 OVASAEXSPYGGES-UHFFFAOYSA-N 0.000 description 3
- 239000004971 Cross linker Substances 0.000 description 3
- 241001272720 Medialuna californiensis Species 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 125000005907 alkyl ester group Chemical group 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 125000005442 diisocyanate group Chemical group 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 150000002924 oxiranes Chemical class 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- QWBBPBRQALCEIZ-UHFFFAOYSA-N 2,3-dimethylphenol Chemical compound CC1=CC=CC(O)=C1C QWBBPBRQALCEIZ-UHFFFAOYSA-N 0.000 description 2
- JYYNAJVZFGKDEQ-UHFFFAOYSA-N 2,4-Dimethylpyridine Chemical compound CC1=CC=NC(C)=C1 JYYNAJVZFGKDEQ-UHFFFAOYSA-N 0.000 description 2
- NKTOLZVEWDHZMU-UHFFFAOYSA-N 2,5-xylenol Chemical compound CC1=CC=C(C)C(O)=C1 NKTOLZVEWDHZMU-UHFFFAOYSA-N 0.000 description 2
- NXXYKOUNUYWIHA-UHFFFAOYSA-N 2,6-Dimethylphenol Chemical compound CC1=CC=CC(C)=C1O NXXYKOUNUYWIHA-UHFFFAOYSA-N 0.000 description 2
- YCOXTKKNXUZSKD-UHFFFAOYSA-N 3,4-xylenol Chemical compound CC1=CC=C(O)C=C1C YCOXTKKNXUZSKD-UHFFFAOYSA-N 0.000 description 2
- UENRXLSRMCSUSN-UHFFFAOYSA-N 3,5-diaminobenzoic acid Chemical compound NC1=CC(N)=CC(C(O)=O)=C1 UENRXLSRMCSUSN-UHFFFAOYSA-N 0.000 description 2
- TUAMRELNJMMDMT-UHFFFAOYSA-N 3,5-xylenol Chemical compound CC1=CC(C)=CC(O)=C1 TUAMRELNJMMDMT-UHFFFAOYSA-N 0.000 description 2
- GWHLJVMSZRKEAQ-UHFFFAOYSA-N 3-(2,3-dicarboxyphenyl)phthalic acid Chemical compound OC(=O)C1=CC=CC(C=2C(=C(C(O)=O)C=CC=2)C(O)=O)=C1C(O)=O GWHLJVMSZRKEAQ-UHFFFAOYSA-N 0.000 description 2
- JJYPMNFTHPTTDI-UHFFFAOYSA-N 3-methylaniline Chemical compound CC1=CC=CC(N)=C1 JJYPMNFTHPTTDI-UHFFFAOYSA-N 0.000 description 2
- FYYYKXFEKMGYLZ-UHFFFAOYSA-N 4-(1,3-dioxo-2-benzofuran-5-yl)-2-benzofuran-1,3-dione Chemical compound C=1C=C2C(=O)OC(=O)C2=CC=1C1=CC=CC2=C1C(=O)OC2=O FYYYKXFEKMGYLZ-UHFFFAOYSA-N 0.000 description 2
- QYIMZXITLDTULQ-UHFFFAOYSA-N 4-(4-amino-2-methylphenyl)-3-methylaniline Chemical compound CC1=CC(N)=CC=C1C1=CC=C(N)C=C1C QYIMZXITLDTULQ-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 2
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000003377 acid catalyst Substances 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 239000000010 aprotic solvent Substances 0.000 description 2
- 150000004984 aromatic diamines Chemical class 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000002981 blocking agent Substances 0.000 description 2
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 description 2
- GGSUCNLOZRCGPQ-UHFFFAOYSA-N diethylaniline Chemical compound CCN(CC)C1=CC=CC=C1 GGSUCNLOZRCGPQ-UHFFFAOYSA-N 0.000 description 2
- 239000004210 ether based solvent Substances 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- GAEKPEKOJKCEMS-UHFFFAOYSA-N gamma-valerolactone Chemical compound CC1CCC(=O)O1 GAEKPEKOJKCEMS-UHFFFAOYSA-N 0.000 description 2
- 238000001879 gelation Methods 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- 150000002596 lactones Chemical class 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- ZWLPBLYKEWSWPD-UHFFFAOYSA-N o-toluic acid Chemical compound CC1=CC=CC=C1C(O)=O ZWLPBLYKEWSWPD-UHFFFAOYSA-N 0.000 description 2
- 150000007530 organic bases Chemical class 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- RZXMPPFPUUCRFN-UHFFFAOYSA-N p-toluidine Chemical compound CC1=CC=C(N)C=C1 RZXMPPFPUUCRFN-UHFFFAOYSA-N 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 2
- ZUHZGEOKBKGPSW-UHFFFAOYSA-N tetraglyme Chemical compound COCCOCCOCCOCCOC ZUHZGEOKBKGPSW-UHFFFAOYSA-N 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- BEBFJOSPYYGOKL-UHFFFAOYSA-N (3-ethylphenyl)methanamine Chemical compound CCC1=CC=CC(CN)=C1 BEBFJOSPYYGOKL-UHFFFAOYSA-N 0.000 description 1
- RGXUCUWVGKLACF-UHFFFAOYSA-N (3-methylphenyl)methanamine Chemical compound CC1=CC=CC(CN)=C1 RGXUCUWVGKLACF-UHFFFAOYSA-N 0.000 description 1
- RCNBXBQGBCGTPB-UHFFFAOYSA-N (4-dodecylphenyl)methanamine Chemical compound CCCCCCCCCCCCC1=CC=C(CN)C=C1 RCNBXBQGBCGTPB-UHFFFAOYSA-N 0.000 description 1
- DGAGEFUEKIORSQ-UHFFFAOYSA-N (4-ethylphenyl)methanamine Chemical compound CCC1=CC=C(CN)C=C1 DGAGEFUEKIORSQ-UHFFFAOYSA-N 0.000 description 1
- HMTSWYPNXFHGEP-UHFFFAOYSA-N (4-methylphenyl)methanamine Chemical compound CC1=CC=C(CN)C=C1 HMTSWYPNXFHGEP-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- AVQQQNCBBIEMEU-UHFFFAOYSA-N 1,1,3,3-tetramethylurea Chemical compound CN(C)C(=O)N(C)C AVQQQNCBBIEMEU-UHFFFAOYSA-N 0.000 description 1
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 description 1
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- CGSKOGYKWHUSLC-UHFFFAOYSA-N 1-(4-aminophenyl)-1,3,3-trimethyl-2h-inden-5-amine Chemical compound C12=CC=C(N)C=C2C(C)(C)CC1(C)C1=CC=C(N)C=C1 CGSKOGYKWHUSLC-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- RPOHXHHHVSGUMN-UHFFFAOYSA-N 1-n,4-n-bis(4-aminophenyl)benzene-1,4-dicarboxamide Chemical compound C1=CC(N)=CC=C1NC(=O)C1=CC=C(C(=O)NC=2C=CC(N)=CC=2)C=C1 RPOHXHHHVSGUMN-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- KUFFULVDNCHOFZ-UHFFFAOYSA-N 2,4-xylenol Chemical compound CC1=CC=C(O)C(C)=C1 KUFFULVDNCHOFZ-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- KKKKCPPTESQGQH-UHFFFAOYSA-N 2-(4,5-dihydro-1,3-oxazol-2-yl)-4,5-dihydro-1,3-oxazole Chemical compound O1CCN=C1C1=NCCO1 KKKKCPPTESQGQH-UHFFFAOYSA-N 0.000 description 1
- IMSODMZESSGVBE-UHFFFAOYSA-N 2-Oxazoline Chemical group C1CN=CO1 IMSODMZESSGVBE-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- MXPYJVUYLVNEBB-UHFFFAOYSA-N 2-[2-(2-carboxybenzoyl)oxycarbonylbenzoyl]oxycarbonylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C(=O)OC(=O)C1=CC=CC=C1C(=O)OC(=O)C1=CC=CC=C1C(O)=O MXPYJVUYLVNEBB-UHFFFAOYSA-N 0.000 description 1
- ZDNUPMSZKVCETJ-UHFFFAOYSA-N 2-[4-(4,5-dihydro-1,3-oxazol-2-yl)phenyl]-4,5-dihydro-1,3-oxazole Chemical compound O1CCN=C1C1=CC=C(C=2OCCN=2)C=C1 ZDNUPMSZKVCETJ-UHFFFAOYSA-N 0.000 description 1
- XWKFPIODWVPXLX-UHFFFAOYSA-N 2-methyl-5-methylpyridine Natural products CC1=CC=C(C)N=C1 XWKFPIODWVPXLX-UHFFFAOYSA-N 0.000 description 1
- YJLVXRPNNDKMMO-UHFFFAOYSA-N 3,4,5,6-tetrafluorophthalic acid Chemical compound OC(=O)C1=C(F)C(F)=C(F)C(F)=C1C(O)=O YJLVXRPNNDKMMO-UHFFFAOYSA-N 0.000 description 1
- PAHZZOIHRHCHTH-UHFFFAOYSA-N 3-[2-(2,3-dicarboxyphenyl)propan-2-yl]phthalic acid Chemical compound C=1C=CC(C(O)=O)=C(C(O)=O)C=1C(C)(C)C1=CC=CC(C(O)=O)=C1C(O)=O PAHZZOIHRHCHTH-UHFFFAOYSA-N 0.000 description 1
- ITQTTZVARXURQS-UHFFFAOYSA-N 3-methylpyridine Chemical compound CC1=CC=CN=C1 ITQTTZVARXURQS-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- BCJIMAHNJOIWKQ-UHFFFAOYSA-N 4-[(1,3-dioxo-2-benzofuran-4-yl)oxy]-2-benzofuran-1,3-dione Chemical compound O=C1OC(=O)C2=C1C=CC=C2OC1=CC=CC2=C1C(=O)OC2=O BCJIMAHNJOIWKQ-UHFFFAOYSA-N 0.000 description 1
- OPVHOFITDJSMOD-UHFFFAOYSA-N 4-[(1,3-dioxo-2-benzofuran-5-yl)oxy]-2-benzofuran-1,3-dione Chemical compound C=1C=C2C(=O)OC(=O)C2=CC=1OC1=CC=CC2=C1C(=O)OC2=O OPVHOFITDJSMOD-UHFFFAOYSA-N 0.000 description 1
- GEYAGBVEAJGCFB-UHFFFAOYSA-N 4-[2-(3,4-dicarboxyphenyl)propan-2-yl]phthalic acid Chemical compound C=1C=C(C(O)=O)C(C(O)=O)=CC=1C(C)(C)C1=CC=C(C(O)=O)C(C(O)=O)=C1 GEYAGBVEAJGCFB-UHFFFAOYSA-N 0.000 description 1
- BEKFRNOZJSYWKZ-UHFFFAOYSA-N 4-[2-(4-aminophenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]aniline Chemical compound C1=CC(N)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(N)C=C1 BEKFRNOZJSYWKZ-UHFFFAOYSA-N 0.000 description 1
- HESXPOICBNWMPI-UHFFFAOYSA-N 4-[2-[4-[2-(4-aminophenyl)propan-2-yl]phenyl]propan-2-yl]aniline Chemical compound C=1C=C(C(C)(C)C=2C=CC(N)=CC=2)C=CC=1C(C)(C)C1=CC=C(N)C=C1 HESXPOICBNWMPI-UHFFFAOYSA-N 0.000 description 1
- HHLMWQDRYZAENA-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropan-2-yl]phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=C(C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)(C(F)(F)F)C(F)(F)F)C=C1 HHLMWQDRYZAENA-UHFFFAOYSA-N 0.000 description 1
- KMKWGXGSGPYISJ-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=CC(N)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=C(N)C=C1 KMKWGXGSGPYISJ-UHFFFAOYSA-N 0.000 description 1
- HYDATEKARGDBKU-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenyl]phenoxy]aniline Chemical group C1=CC(N)=CC=C1OC1=CC=C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)C=C1 HYDATEKARGDBKU-UHFFFAOYSA-N 0.000 description 1
- NVKGJHAQGWCWDI-UHFFFAOYSA-N 4-[4-amino-2-(trifluoromethyl)phenyl]-3-(trifluoromethyl)aniline Chemical compound FC(F)(F)C1=CC(N)=CC=C1C1=CC=C(N)C=C1C(F)(F)F NVKGJHAQGWCWDI-UHFFFAOYSA-N 0.000 description 1
- RXNKCIBVUNMMAD-UHFFFAOYSA-N 4-[9-(4-amino-3-fluorophenyl)fluoren-9-yl]-2-fluoroaniline Chemical compound C1=C(F)C(N)=CC=C1C1(C=2C=C(F)C(N)=CC=2)C2=CC=CC=C2C2=CC=CC=C21 RXNKCIBVUNMMAD-UHFFFAOYSA-N 0.000 description 1
- YRKVLGUIGNRYJX-UHFFFAOYSA-N 4-[9-(4-amino-3-methylphenyl)fluoren-9-yl]-2-methylaniline Chemical compound C1=C(N)C(C)=CC(C2(C3=CC=CC=C3C3=CC=CC=C32)C=2C=C(C)C(N)=CC=2)=C1 YRKVLGUIGNRYJX-UHFFFAOYSA-N 0.000 description 1
- OSFGNTLIOUHOKN-UHFFFAOYSA-N 4-[benzyl(methyl)sulfamoyl]benzoic acid Chemical compound C=1C=C(C(O)=O)C=CC=1S(=O)(=O)N(C)CC1=CC=CC=C1 OSFGNTLIOUHOKN-UHFFFAOYSA-N 0.000 description 1
- XPAQFJJCWGSXGJ-UHFFFAOYSA-N 4-amino-n-(4-aminophenyl)benzamide Chemical compound C1=CC(N)=CC=C1NC(=O)C1=CC=C(N)C=C1 XPAQFJJCWGSXGJ-UHFFFAOYSA-N 0.000 description 1
- DVIPPHSQIBKWSA-UHFFFAOYSA-N 4-chlorophthalic acid Chemical compound OC(=O)C1=CC=C(Cl)C=C1C(O)=O DVIPPHSQIBKWSA-UHFFFAOYSA-N 0.000 description 1
- VGVHNLRUAMRIEW-UHFFFAOYSA-N 4-methylcyclohexan-1-one Chemical compound CC1CCC(=O)CC1 VGVHNLRUAMRIEW-UHFFFAOYSA-N 0.000 description 1
- JTNVCJCSECAMLD-UHFFFAOYSA-N 4-phenyl-2-[2-(4-phenyl-4,5-dihydro-1,3-oxazol-2-yl)propan-2-yl]-4,5-dihydro-1,3-oxazole Chemical compound N=1C(C=2C=CC=CC=2)COC=1C(C)(C)C(OC1)=NC1C1=CC=CC=C1 JTNVCJCSECAMLD-UHFFFAOYSA-N 0.000 description 1
- HLHBIMJNCKZZQO-UHFFFAOYSA-N 4-phenyl-2-[6-(4-phenyl-4,5-dihydro-1,3-oxazol-2-yl)pyridin-2-yl]-4,5-dihydro-1,3-oxazole Chemical compound C1OC(C=2N=C(C=CC=2)C=2OCC(N=2)C=2C=CC=CC=2)=NC1C1=CC=CC=C1 HLHBIMJNCKZZQO-UHFFFAOYSA-N 0.000 description 1
- OAQJLSASJWIYMU-UHFFFAOYSA-N 4-propan-2-yl-2-pyridin-2-yl-4,5-dihydro-1,3-oxazole Chemical compound CC(C)C1COC(C=2N=CC=CC=2)=N1 OAQJLSASJWIYMU-UHFFFAOYSA-N 0.000 description 1
- DPMGLJUMNRDNMX-UHFFFAOYSA-N 4-tert-butyl-2-[2-(4-tert-butyl-4,5-dihydro-1,3-oxazol-2-yl)propan-2-yl]-4,5-dihydro-1,3-oxazole Chemical compound CC(C)(C)C1COC(C(C)(C)C=2OCC(N=2)C(C)(C)C)=N1 DPMGLJUMNRDNMX-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- QQGYZOYWNCKGEK-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)oxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC=2C=C3C(=O)OC(C3=CC=2)=O)=C1 QQGYZOYWNCKGEK-UHFFFAOYSA-N 0.000 description 1
- ZHBXLZQQVCDGPA-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)sulfonyl]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(S(=O)(=O)C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 ZHBXLZQQVCDGPA-UHFFFAOYSA-N 0.000 description 1
- QHHKLPCQTTWFSS-UHFFFAOYSA-N 5-[2-(1,3-dioxo-2-benzofuran-5-yl)-1,1,1,3,3,3-hexafluoropropan-2-yl]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)(C(F)(F)F)C(F)(F)F)=C1 QHHKLPCQTTWFSS-UHFFFAOYSA-N 0.000 description 1
- JVERADGGGBYHNP-UHFFFAOYSA-N 5-phenylbenzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C=2C=CC=CC=2)=C1C(O)=O JVERADGGGBYHNP-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- ZPAKUZKMGJJMAA-UHFFFAOYSA-N Cyclohexane-1,2,4,5-tetracarboxylic acid Chemical compound OC(=O)C1CC(C(O)=O)C(C(O)=O)CC1C(O)=O ZPAKUZKMGJJMAA-UHFFFAOYSA-N 0.000 description 1
- 239000004805 Cyclohexane-1,2-dicarboxylic acid Substances 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- OIFBSDVPJOWBCH-UHFFFAOYSA-N Diethyl carbonate Chemical compound CCOC(=O)OCC OIFBSDVPJOWBCH-UHFFFAOYSA-N 0.000 description 1
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- ZWXPDGCFMMFNRW-UHFFFAOYSA-N N-methylcaprolactam Chemical compound CN1CCCCCC1=O ZWXPDGCFMMFNRW-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- XZAHJRZBUWYCBM-UHFFFAOYSA-N [1-(aminomethyl)cyclohexyl]methanamine Chemical compound NCC1(CN)CCCCC1 XZAHJRZBUWYCBM-UHFFFAOYSA-N 0.000 description 1
- QLBRROYTTDFLDX-UHFFFAOYSA-N [3-(aminomethyl)cyclohexyl]methanamine Chemical compound NCC1CCCC(CN)C1 QLBRROYTTDFLDX-UHFFFAOYSA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000003660 carbonate based solvent Substances 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- CURBACXRQKTCKZ-UHFFFAOYSA-N cyclobutane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1C(C(O)=O)C(C(O)=O)C1C(O)=O CURBACXRQKTCKZ-UHFFFAOYSA-N 0.000 description 1
- ILUAAIDVFMVTAU-UHFFFAOYSA-N cyclohex-4-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CC=CCC1C(O)=O ILUAAIDVFMVTAU-UHFFFAOYSA-N 0.000 description 1
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 1
- ASJCSAKCMTWGAH-UHFFFAOYSA-N cyclopentane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCC1C(O)=O ASJCSAKCMTWGAH-UHFFFAOYSA-N 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000006081 fluorescent whitening agent Substances 0.000 description 1
- 238000001641 gel filtration chromatography Methods 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000011181 potassium carbonates Nutrition 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 229940086066 potassium hydrogencarbonate Drugs 0.000 description 1
- 235000011118 potassium hydroxide Nutrition 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- 239000000326 ultraviolet stabilizing agent Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/35—Heterocyclic compounds having nitrogen in the ring having also oxygen in the ring
- C08K5/353—Five-membered rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1042—Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0025—Crosslinking or vulcanising agents; including accelerators
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2379/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
- C08J2379/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08J2379/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
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- Chemical & Material Sciences (AREA)
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Description
本発明はポリイミド樹脂組成物及びポリイミドフィルムに関する。 The present invention relates to a polyimide resin composition and a polyimide film.
ポリイミド樹脂は、優れた機械的特性及び耐熱性を有することから、電気・電子部品等の分野において様々な利用が検討されている。例えば、液晶ディスプレイやOLEDディスプレイ等の画像表示装置に用いられるガラス基板を、デバイスの軽量化やフレキシブル化を目的として、プラスチック基板へ代替することが望まれており、当該プラスチック基板として適するポリイミドフィルムの研究が進められている。このような用途のポリイミドフィルムには無色透明性が求められる。 Polyimide resins have excellent mechanical properties and heat resistance, and are therefore being investigated for various uses in fields such as electric and electronic parts. For example, it is desired to replace glass substrates used in image display devices such as liquid crystal displays and OLED displays with plastic substrates for the purpose of reducing the weight and increasing the flexibility of devices. Research is ongoing. Polyimide films for such applications are required to be colorless and transparent.
また、極性溶媒等の有機溶媒に対する耐性(耐有機溶媒性)に劣るフィルムは、極性溶媒等の有機溶媒に曝されたときに、その表面の溶出または膨潤によりフィルムの形態が変わることがあるため、ポリイミドフィルムには耐有機溶媒性が求められることも多い。そのような要求に応えるため、ポリイミド樹脂に架橋剤を添加して製造されたポリイミドフィルムが提案されている。
特許文献1には、カルボキシル基を有するポリイミド樹脂と少なくとも2つのオキサゾリル基を有する架橋剤とを含むポリイミド樹脂組成物が開示され、当該ポリイミド樹脂組成物によって、良好な透明性と高硬度を有する膜の形成が可能であると記載されている。
また、特許文献2には、カルボキシル基を有するポリイミド共重合体と多官能性エポキシドとを含有する透明フレキシブル膜が開示されている。In addition, films with poor resistance to organic solvents such as polar solvents (organic solvent resistance) may change their morphology due to elution or swelling of the surface when exposed to organic solvents such as polar solvents. In many cases, polyimide films are required to be resistant to organic solvents. In order to meet such demands, a polyimide film produced by adding a cross-linking agent to a polyimide resin has been proposed.
Patent Document 1 discloses a polyimide resin composition containing a polyimide resin having a carboxyl group and a cross-linking agent having at least two oxazolyl groups, and the polyimide resin composition provides a film having good transparency and high hardness. It is described that the formation of
Further, Patent Document 2 discloses a transparent flexible film containing a polyimide copolymer having a carboxyl group and a polyfunctional epoxide.
画像表示装置において、表示素子から発せられる光がプラスチック基板を通って出射されるような場合、プラスチック基板には無色透明性が要求され、さらに、位相差フィルムや偏光板を光が通過する場合(例えば、液晶ディスプレイ、タッチパネル等)は、無色透明性に加えて、光学的等方性が高いことも要求される。しかし、特許文献1には、光学的等方性について何ら記載されていない。
また、特許文献2において、架橋剤として添加されている多官能性エポキシドのエポキシ基は、比較的低温(約30℃以上)でもカルボキシ基との反応が進行する。そのため、カルボキシル基を有するポリイミド樹脂と多官能性エポキシドとを含む組成物は、室温にて保存すると架橋によるゲル化が進行し、保存安定性が悪い。また、一般的にエポキシ樹脂の熱分解温度は250~350℃であり、高温プロセスが必要とされる用途では耐熱性が不十分であると考えられる。
本発明は上記の状況に鑑みてなされたものであり、本発明の課題は、機械的特性、耐有機溶媒性、無色透明性、及び光学的等方性に優れるフィルムの形成が可能であって、保存安定性に優れるポリイミド樹脂組成物を提供すること、並びに前記ポリイミド樹脂組成物中のポリイミド樹脂が架橋剤により架橋されてなるポリイミドフィルムを提供することにある。In an image display device, when the light emitted from the display element is emitted through a plastic substrate, the plastic substrate is required to be colorless and transparent. For example, liquid crystal displays, touch panels, etc.) are required to have high optical isotropy in addition to being colorless and transparent. However, Patent Document 1 does not describe anything about optical isotropy.
Further, in Patent Document 2, the epoxy group of the polyfunctional epoxide added as a cross-linking agent undergoes reaction with the carboxyl group even at a relatively low temperature (approximately 30° C. or higher). Therefore, when stored at room temperature, a composition containing a polyimide resin having a carboxyl group and a polyfunctional epoxide undergoes gelation due to cross-linking, resulting in poor storage stability. Further, the thermal decomposition temperature of epoxy resin is generally 250 to 350° C., and it is considered that the heat resistance is insufficient for applications requiring high-temperature processes.
The present invention has been made in view of the above circumstances, and an object of the present invention is to enable formation of a film excellent in mechanical properties, resistance to organic solvents, colorless transparency, and optical isotropy. Another object of the present invention is to provide a polyimide resin composition having excellent storage stability, and to provide a polyimide film obtained by cross-linking the polyimide resin in the polyimide resin composition with a cross-linking agent.
本発明者らは、特定の構成単位の組み合わせを含むポリイミド樹脂と特定の架橋剤とを含むポリイミド樹脂組成物が上記課題を解決できることを見出し、発明を完成させるに至った。 The present inventors have found that a polyimide resin composition containing a polyimide resin containing a combination of specific structural units and a specific cross-linking agent can solve the above problems, and have completed the invention.
即ち、本発明は、下記の[1]~[9]に関する。
[1]
ポリイミド樹脂と、少なくとも2つのオキサゾリル基を有する架橋剤とを含むポリイミド樹脂組成物であって、
前記ポリイミド樹脂が、テトラカルボン酸二無水物に由来する構成単位A及びジアミンに由来する構成単位Bを有し、
構成単位Aが、下記式(a-1-1)で表される化合物に由来する構成単位(A-1-1)及び下記式(a-1-2)で表される化合物に由来する構成単位(A-1-2)からなる群より選ばれる少なくとも1つである構成単位(A-1)を含み、
構成単位Bが、下記式(b-1)で表される化合物に由来する構成単位(B-1)と、下記式(b-2)で表される化合物に由来する構成単位(B-2)とを含む、ポリイミド樹脂組成物。
(式(b-1)中、Rはそれぞれ独立して、水素原子、フッ素原子、又はメチル基であり;式(b-2)中、Xは単結合、置換若しくは無置換のアルキレン基、カルボニル基、エーテル基、下記式(b-2-i)で表される基、又は下記式(b-2-ii)で表される基であり、pは0~2の整数であり、m1は0~4の整数であり、m2は0~4の整数である。ただし、pが0の場合、m1は1~4の整数である。)
(式(b-2-i)中、m3は0~5の整数であり;式(b-2-ii)中、m4は0~5の整数である。なお、m1+m2+m3+m4は1以上であり、pが2の場合、2つのX及び2つのm2~m4のそれぞれは独立して選択される。)That is, the present invention relates to the following [1] to [9].
[1]
A polyimide resin composition comprising a polyimide resin and a cross-linking agent having at least two oxazolyl groups,
The polyimide resin has a structural unit A derived from a tetracarboxylic dianhydride and a structural unit B derived from a diamine,
A constitution in which the structural unit A is derived from a structural unit (A-1-1) derived from a compound represented by the following formula (a-1-1) and a compound represented by the following formula (a-1-2) including a structural unit (A-1) that is at least one selected from the group consisting of units (A-1-2),
The structural unit B is a structural unit (B-1) derived from a compound represented by the following formula (b-1), and a structural unit (B-2) derived from a compound represented by the following formula (b-2) ) and a polyimide resin composition.
(In formula (b-1), each R is independently a hydrogen atom, a fluorine atom, or a methyl group; In formula (b-2), X is a single bond, a substituted or unsubstituted alkylene group, carbonyl group, an ether group, a group represented by the following formula (b-2-i), or a group represented by the following formula (b-2-ii), p is an integer of 0 to 2, and m1 is is an integer of 0 to 4, and m2 is an integer of 0 to 4. However, when p is 0, m1 is an integer of 1 to 4.)
(In formula (b-2-i), m3 is an integer of 0 to 5; In formula (b-2-ii), m4 is an integer of 0 to 5. Note that m1 + m2 + m3 + m4 is 1 or more, When p is 2, each of the two Xs and the two m2-m4 are independently selected.)
[2]
構成単位(B-2)が、下記式(b-21)で表される化合物に由来する構成単位(B-21)である、上記[1]に記載のポリイミド樹脂組成物。
[3]
前記架橋剤が、前記少なくとも2つのオキサゾリル基が結合したベンゼン環を含む、上記[1]又は[2]に記載のポリイミド樹脂組成物。
[4]
前記架橋剤中のオキサゾリル基と前記ポリイミド樹脂中のカルボキシル基とのモル比(オキサゾリル基/カルボキシル基)が1/4~1/0.5の範囲となるような比率で、前記ポリイミド樹脂と前記架橋剤とを含む、上記[1]~[3]のいずれかに記載のポリイミド樹脂組成物。
[5]
構成単位B中における構成単位(B-1)の比率が40~99モル%であり、
構成単位B中における構成単位(B-2)の比率が1~60モル%である、上記[1]~[4]のいずれかに記載のポリイミド樹脂組成物。
[6]
構成単位A中における構成単位(A-1)の比率が50モル%以上である、上記[1]~[5]のいずれかに記載のポリイミド樹脂組成物。
[7]
構成単位(A-1)が構成単位(A-1-1)である、上記[1]~[6]のいずれかに記載のポリイミド樹脂組成物。
[8]
構成単位(A-1)が構成単位(A-1-2)である、上記[1]~[6]のいずれかに記載のポリイミド樹脂組成物。
[9]
上記[1]~[8]のいずれかに記載のポリイミド樹脂組成物中の前記ポリイミド樹脂が前記架橋剤により架橋されてなるポリイミドフィルム。[2]
The polyimide resin composition according to [1] above, wherein the structural unit (B-2) is a structural unit (B-21) derived from a compound represented by the following formula (b-21).
[3]
The polyimide resin composition according to the above [1] or [2], wherein the cross-linking agent contains a benzene ring to which the at least two oxazolyl groups are bonded.
[4]
The polyimide resin and the polyimide resin and the The polyimide resin composition according to any one of [1] to [3] above, comprising a cross-linking agent.
[5]
The ratio of the structural unit (B-1) in the structural unit B is 40 to 99 mol%,
The polyimide resin composition according to any one of [1] to [4] above, wherein the proportion of the structural unit (B-2) in the structural unit B is 1 to 60 mol%.
[6]
The polyimide resin composition according to any one of [1] to [5] above, wherein the proportion of the structural unit (A-1) in the structural unit A is 50 mol% or more.
[7]
The polyimide resin composition according to any one of [1] to [6] above, wherein the structural unit (A-1) is the structural unit (A-1-1).
[8]
The polyimide resin composition according to any one of [1] to [6] above, wherein the structural unit (A-1) is the structural unit (A-1-2).
[9]
A polyimide film obtained by cross-linking the polyimide resin in the polyimide resin composition according to any one of [1] to [8] above with the cross-linking agent.
本発明のポリイミド樹脂組成物は保存安定性に優れており、機械的特性、耐有機溶媒性、無色透明性、及び光学的等方性に優れるフィルムを形成することができる。 The polyimide resin composition of the present invention has excellent storage stability and can form a film having excellent mechanical properties, organic solvent resistance, colorless transparency, and optical isotropy.
[ポリイミド樹脂組成物]
本発明のポリイミド樹脂組成物はポリイミド樹脂と架橋剤とを含む。以下、本発明におけるポリイミド樹脂及び架橋剤について説明する。[Polyimide resin composition]
The polyimide resin composition of the present invention contains a polyimide resin and a cross-linking agent. The polyimide resin and the cross-linking agent in the present invention are described below.
<ポリイミド樹脂>
本発明において、ポリイミド樹脂はテトラカルボン酸二無水物に由来する構成単位A及びジアミンに由来する構成単位Bを有し、構成単位Aが下記式(a-1-1)で表される化合物に由来する構成単位(A-1-1)及び下記式(a-1-2)で表される化合物に由来する構成単位(A-1-2)からなる群より選ばれる少なくとも1つである構成単位(A-1)を含み、構成単位Bが下記式(b-1)で表される化合物に由来する構成単位(B-1)と、下記式(b-2)で表される化合物に由来する構成単位(B-2)とを含む。
(式(b-1)中、Rはそれぞれ独立して、水素原子、フッ素原子又はメチル基であり;式(b-2)中、Xは単結合、置換若しくは無置換のアルキレン基、カルボニル基、エーテル基、下記式(b-2-i)で表される基、又は下記式(b-2-ii)で表される基であり、pは0~2の整数であり、m1は0~4の整数であり、m2は0~4の整数である。ただし、pが0の場合、m1は1~4の整数である。)
(式(b-2-i)中、m3は0~5の整数であり;式(b-2-ii)中、m4は0~5の整数である。なお、m1+m2+m3+m4は1以上であり、pが2の場合、2つのX及び2つのm2~m4のそれぞれは独立して選択される。)<Polyimide resin>
In the present invention, the polyimide resin has a structural unit A derived from a tetracarboxylic dianhydride and a structural unit B derived from a diamine, and the structural unit A is a compound represented by the following formula (a-1-1). A structure which is at least one selected from the group consisting of a structural unit derived from (A-1-1) and a structural unit (A-1-2) derived from a compound represented by the following formula (a-1-2) A structural unit (B-1) containing a unit (A-1), wherein the structural unit B is derived from a compound represented by the following formula (b-1), and a compound represented by the following formula (b-2) and the derived structural unit (B-2).
(In formula (b-1), each R is independently a hydrogen atom, a fluorine atom or a methyl group; In formula (b-2), X is a single bond, a substituted or unsubstituted alkylene group, a carbonyl group , an ether group, a group represented by the following formula (b-2-i), or a group represented by the following formula (b-2-ii), p is an integer of 0 to 2, m1 is 0 is an integer from 1 to 4, and m2 is an integer from 0 to 4. However, when p is 0, m1 is an integer from 1 to 4.)
(In formula (b-2-i), m3 is an integer of 0 to 5; In formula (b-2-ii), m4 is an integer of 0 to 5. Note that m1 + m2 + m3 + m4 is 1 or more, When p is 2, each of the two Xs and the two m2-m4 are independently selected.)
(構成単位A)
構成単位Aは、ポリイミド樹脂に占めるテトラカルボン酸二無水物に由来する構成単位であって、下記式(a-1-1)で表される化合物に由来する構成単位(A-1-1)及び下記式(a-1-2)で表される化合物に由来する構成単位(A-1-2)からなる群より選ばれる少なくとも1つである構成単位(A-1)を含む。
Structural unit A is a structural unit derived from a tetracarboxylic dianhydride in the polyimide resin, a structural unit derived from a compound represented by the following formula (a-1-1) (A-1-1) and a structural unit (A-1) which is at least one selected from the group consisting of a structural unit (A-1-2) derived from a compound represented by the following formula (a-1-2).
式(a-1-1)で表される化合物は、1,2,4,5-シクロヘキサンテトラカルボン酸二無水物である。
式(a-1-2)で表される化合物は、ノルボルナン-2-スピロ-α-シクロペンタノン-α’-スピロ-2’’-ノルボルナン-5,5’’,6,6’’-テトラカルボン酸二無水物である。
構成単位Aが構成単位(A-1)を含むことによって、フィルムの無色透明性向上に寄与する。また、構成単位(A-1)として構成単位(A-1-1)が含まれる場合は、フィルムの光学的等方性向上にも寄与することができる。The compound represented by formula (a-1-1) is 1,2,4,5-cyclohexanetetracarboxylic dianhydride.
The compound represented by formula (a-1-2) is norbornane-2-spiro-α-cyclopentanone-α′-spiro-2″-norbornane-5,5″,6,6″- It is a tetracarboxylic dianhydride.
Including the structural unit (A-1) in the structural unit A contributes to improving the colorless transparency of the film. Further, when the structural unit (A-1-1) is included as the structural unit (A-1), it can contribute to improving the optical isotropy of the film.
構成単位(A-1)は、構成単位(A-1-1)のみであってもよく、又は構成単位(A-1-2)のみであってもよい。また、構成単位(A-1)は、構成単位(A-1-1)と構成単位(A-1-2)の組み合わせであってもよい。 The structural unit (A-1) may be only the structural unit (A-1-1) or only the structural unit (A-1-2). Further, the structural unit (A-1) may be a combination of the structural unit (A-1-1) and the structural unit (A-1-2).
構成単位A中における構成単位(A-1)の比率は、好ましくは50モル%以上であり、より好ましくは70モル%以上であり、更に好ましくは90モル%以上であり、特に好ましくは99モル%以上である。構成単位(A-1)の比率の上限値は特に限定されず、即ち、100モル%である。構成単位Aは構成単位(A-1)のみからなっていてもよい。 The ratio of the structural unit (A-1) in the structural unit A is preferably 50 mol% or more, more preferably 70 mol% or more, still more preferably 90 mol% or more, particularly preferably 99 mol. % or more. The upper limit of the proportion of the structural unit (A-1) is not particularly limited, ie, 100 mol %. Structural unit A may consist only of structural unit (A-1).
構成単位Aは、構成単位(A-1)以外の構成単位を含んでもよい。そのような構成単位を与えるテトラカルボン酸二無水物としては、特に限定されないが、ピロメリット酸二無水物、3,3’,4,4’-ビフェニルテトラカルボン酸二無水物、2,3,3’,4’-ビフェニルテトラカルボン酸二無水物、2,2’,3,3’-ビフェニルテトラカルボン酸二無水物、9,9’-ビス(3,4-ジカルボキシフェニル)フルオレン二無水物、4,4’-(ヘキサフルオロイソプロピリデン)ジフタル酸無水物、2,2-ビス(3,4-ジカルボキシフェニル)プロパン二無水物、2,2-ビス(2,3-ジカルボキシフェニル)プロパン二無水物、3,3’,4,4’-ジフェニルスルホンテトラカルボン酸二無水物、4,4’-オキシジフタル酸無水物、3,4’-オキシジフタル酸無水物、3,3’-オキシジフタル酸無水物、3,3’,4、4’-ベンゾフェノンテトラカルボン酸二無水物、2,2’,3,3’-ベンゾフェノンテトラカルボン酸二無水物、4,4-(p-フェニレンジオキシ)ジフタル酸二無水物、及び4,4-(m-フェニレンジオキシ)ジフタル酸無二水物等の芳香族テトラカルボン酸二無水物;1,2,3,4-シクロブタンテトラカルボン酸二無水物等の脂環式テトラカルボン酸二無水物(ただし、式(a-1-1)で表される化合物及び式(a-1-2)で表される化合物を除く);並びに1,2,3,4-ブタンテトラカルボン酸二無水物等の脂肪族テトラカルボン酸二無水物が挙げられる。
なお、本明細書において、芳香族テトラカルボン酸二無水物とは芳香環を1つ以上含むテトラカルボン酸二無水物を意味し、脂環式テトラカルボン酸二無水物とは脂環を1つ以上含み、かつ芳香環を含まないテトラカルボン酸二無水物を意味し、脂肪族テトラカルボン酸二無水物とは芳香環も脂環も含まないテトラカルボン酸二無水物を意味する。
構成単位Aに任意に含まれる構成単位(A-1)以外の構成単位は、1種でもよいし、2種以上であってもよい。The structural unit A may contain structural units other than the structural unit (A-1). The tetracarboxylic dianhydride that provides such a structural unit is not particularly limited, but pyromellitic dianhydride, 3,3′,4,4′-biphenyltetracarboxylic dianhydride, 2,3, 3',4'-biphenyltetracarboxylic dianhydride, 2,2',3,3'-biphenyltetracarboxylic dianhydride, 9,9'-bis(3,4-dicarboxyphenyl)fluorene dianhydride 4,4'-(hexafluoroisopropylidene)diphthalic anhydride, 2,2-bis(3,4-dicarboxyphenyl)propane dianhydride, 2,2-bis(2,3-dicarboxyphenyl ) propane dianhydride, 3,3′,4,4′-diphenylsulfonetetracarboxylic dianhydride, 4,4′-oxydiphthalic anhydride, 3,4′-oxydiphthalic anhydride, 3,3′- oxydiphthalic anhydride, 3,3′,4,4′-benzophenonetetracarboxylic dianhydride, 2,2′,3,3′-benzophenonetetracarboxylic dianhydride, 4,4-(p-phenylenedi Aromatic tetracarboxylic dianhydrides such as oxy)diphthalic dianhydride and 4,4-(m-phenylenedioxy)diphthalic anhydride; 1,2,3,4-cyclobutanetetracarboxylic acid dianhydride; alicyclic tetracarboxylic dianhydrides such as anhydrides (excluding compounds represented by formula (a-1-1) and compounds represented by formula (a-1-2)); and 1, Aliphatic tetracarboxylic dianhydrides such as 2,3,4-butanetetracarboxylic dianhydride can be mentioned.
In this specification, aromatic tetracarboxylic dianhydride means tetracarboxylic dianhydride containing one or more aromatic rings, and alicyclic tetracarboxylic dianhydride has one alicyclic ring. The term "aliphatic tetracarboxylic dianhydride" means a tetracarboxylic dianhydride containing neither an aromatic ring nor an alicyclic ring.
Structural units other than the structural unit (A-1) optionally contained in the structural unit A may be of one type or two or more types.
構成単位(A-1)以外の構成単位の好適な一態様としては、下記式(a-2)で表される化合物に由来する構成単位(A-2)が挙げられる。 A preferred embodiment of the structural unit other than the structural unit (A-1) is a structural unit (A-2) derived from a compound represented by the following formula (a-2).
式(a-2)で表される化合物は、ビフェニルテトラカルボン酸二無水物(BPDA)であり、その具体例としては、下記式(a-2s)で表される3,3’,4,4’-ビフェニルテトラカルボン酸二無水物(s-BPDA)、下記式(a-2a)で表される2,3,3’,4’-ビフェニルテトラカルボン酸二無水物(a-BPDA)、下記式(a-2i)で表される2,2’,3,3’-ビフェニルテトラカルボン酸二無水物(i-BPDA)が挙げられる。 The compound represented by formula (a-2) is biphenyltetracarboxylic dianhydride (BPDA), and specific examples thereof include 3,3',4, represented by formula (a-2s) below. 4'-biphenyltetracarboxylic dianhydride (s-BPDA), 2,3,3',4'-biphenyltetracarboxylic dianhydride (a-BPDA) represented by the following formula (a-2a), 2,2′,3,3′-biphenyltetracarboxylic dianhydride (i-BPDA) represented by the following formula (a-2i) can be mentioned.
構成単位Aが構成単位(A-1)及び構成単位(A-2)を含む場合、構成単位A中における構成単位(A-1)の比率は、好ましくは50~95モル%であり、より好ましくは70~95モル%であり、更に好ましくは85~95モル%であり、構成単位A中における構成単位(A-2)の比率は、好ましくは5~50モル%であり、より好ましくは5~30モル%であり、更に好ましくは5~15モル%である。
構成単位Aは構成単位(A-1)と構成単位(A-2)とのみからなっていてもよい。When the structural unit A contains the structural unit (A-1) and the structural unit (A-2), the ratio of the structural unit (A-1) in the structural unit A is preferably 50 to 95 mol%, and more It is preferably 70 to 95 mol%, more preferably 85 to 95 mol%, and the ratio of the structural unit (A-2) in the structural unit A is preferably 5 to 50 mol%, more preferably It is 5 to 30 mol %, more preferably 5 to 15 mol %.
Structural unit A may consist of only structural unit (A-1) and structural unit (A-2).
(構成単位B)
構成単位Bは、ポリイミド樹脂に占めるジアミンに由来する構成単位であって、下記式(b-1)で表される化合物に由来する構成単位(B-1)と、下記式(b-2)で表される化合物に由来する構成単位(B-2)とを含む。
(式(b-1)中、Rはそれぞれ独立して、水素原子、フッ素原子、又はメチル基であり;式(b-2)中、Xは単結合、置換若しくは無置換のアルキレン基、カルボニル基、エーテル基、下記式(b-2-i)で表される基、又は下記式(b-2-ii)で表される基であり、pは0~2の整数であり、m1は0~4の整数であり、m2は0~4の整数である。ただし、pが0の場合、m1は1~4の整数である。)
(式(b-2-i)中、m3は0~5の整数であり;式(b-2-ii)中、m4は0~5の整数である。なお、m1+m2+m3+m4は1以上であり、pが2の場合、2つのX及び2つのm2~m4のそれぞれは独立して選択される。)(Constituent unit B)
Structural unit B is a structural unit derived from a diamine occupying the polyimide resin, a structural unit (B-1) derived from a compound represented by the following formula (b-1), and the following formula (b-2) and a structural unit (B-2) derived from the compound represented by
(In formula (b-1), each R is independently a hydrogen atom, a fluorine atom, or a methyl group; In formula (b-2), X is a single bond, a substituted or unsubstituted alkylene group, carbonyl group, an ether group, a group represented by the following formula (b-2-i), or a group represented by the following formula (b-2-ii), p is an integer of 0 to 2, and m1 is is an integer of 0 to 4, and m2 is an integer of 0 to 4. However, when p is 0, m1 is an integer of 1 to 4.)
(In formula (b-2-i), m3 is an integer of 0 to 5; In formula (b-2-ii), m4 is an integer of 0 to 5. Note that m1 + m2 + m3 + m4 is 1 or more, When p is 2, each of the two Xs and the two m2-m4 are independently selected.)
式(b-1)中において、Rは、それぞれ独立して、水素原子、フッ素原子、又はメチル基であり、水素原子であることが好ましい。式(b-1)で表される化合物としては、9,9-ビス(4-アミノフェニル)フルオレン、9,9-ビス(3-フルオロ-4-アミノフェニル)フルオレン、及び9,9-ビス(3-メチル-4-アミノフェニル)フルオレン等が挙げられ、9,9-ビス(4-アミノフェニル)フルオレンが好ましい。
構成単位Bが構成単位(B-1)を含むことによって、フィルムの光学的等方性が向上する。In formula (b-1), each R is independently a hydrogen atom, a fluorine atom, or a methyl group, preferably a hydrogen atom. Compounds represented by formula (b-1) include 9,9-bis(4-aminophenyl)fluorene, 9,9-bis(3-fluoro-4-aminophenyl)fluorene, and 9,9-bis (3-methyl-4-aminophenyl)fluorene and the like are mentioned, and 9,9-bis(4-aminophenyl)fluorene is preferred.
Including the structural unit (B-1) in the structural unit B improves the optical isotropy of the film.
式(b-2)で表される化合物の具体例としては、下記式(b-21)~(b-27)で表される化合物が挙げられる。 Specific examples of the compound represented by formula (b-2) include compounds represented by the following formulas (b-21) to (b-27).
上記化合物の中でも式(b-21)で表される化合物が好ましく、下記式(b-211)で表される化合物、即ち、3,5-ジアミノ安息香酸がより好ましい。 Among the above compounds, the compound represented by the formula (b-21) is preferable, and the compound represented by the following formula (b-211), that is, 3,5-diaminobenzoic acid is more preferable.
構成単位(B-2)は、ポリイミド樹脂にカルボキシル基を与える構成単位である。ポリイミド樹脂がカルボキシル基を有することによって、後述する架橋剤を介したポリイミド樹脂同士の架橋が可能となる。したがって、構成単位Bが構成単位(B-2)を含むことによって、フィルムの耐有機溶媒性が向上する。 The structural unit (B-2) is a structural unit that provides a carboxyl group to the polyimide resin. By having a carboxyl group in the polyimide resin, cross-linking between the polyimide resins via a cross-linking agent, which will be described later, becomes possible. Therefore, by including the structural unit (B-2) in the structural unit B, the organic solvent resistance of the film is improved.
構成単位B中における構成単位(B-1)の比率は、好ましくは40~99モル%であり、より好ましくは45~95モル%であり、更に好ましくは75~95モル%であり、特に好ましくは80~90モル%である。
構成単位B中における構成単位(B-2)の比率は、好ましくは1~60モル%であり、より好ましくは5~55モル%であり、更に好ましくは5~25モル%であり、特に好ましくは10~20モル%である。
構成単位B中における構成単位(B-1)及び構成単位(B-2)の合計の比率は、好ましくは50モル%以上であり、より好ましくは70モル%以上であり、更に好ましくは90モル%以上であり、特に好ましくは99モル%以上である。構成単位(B-1)及び構成単位(B-2)の合計の比率の上限値は特に限定されず、即ち、100モル%である。構成単位Bは構成単位(B-1)と構成単位(B-2)とのみからなっていてもよい。The ratio of the structural unit (B-1) in the structural unit B is preferably 40 to 99 mol%, more preferably 45 to 95 mol%, still more preferably 75 to 95 mol%, particularly preferably is 80 to 90 mol %.
The ratio of the structural unit (B-2) in the structural unit B is preferably 1 to 60 mol%, more preferably 5 to 55 mol%, even more preferably 5 to 25 mol%, particularly preferably is 10 to 20 mol %.
The total ratio of the structural unit (B-1) and the structural unit (B-2) in the structural unit B is preferably 50 mol% or more, more preferably 70 mol% or more, and still more preferably 90 mol. % or more, particularly preferably 99 mol % or more. The upper limit of the total ratio of the structural unit (B-1) and the structural unit (B-2) is not particularly limited, ie, 100 mol %. The structural unit B may consist of only the structural unit (B-1) and the structural unit (B-2).
構成単位Bは構成単位(B-1)及び(B-2)以外の構成単位を含んでもよい。そのような構成単位を与えるジアミンとしては、特に限定されないが、1,4-フェニレンジアミン、p-キシリレンジアミン、2,2’-ジメチルビフェニル-4,4’-ジアミン、2,2’-ビス(トリフルオロメチル)ベンジジン、4,4’-ジアミノジフェニルエーテル、4,4’-ジアミノ-2,2’-ビストリフルオロメチルジフェニルエーテル、4,4’-ジアミノジフェニルメタン、2,2-ビス(4-アミノフェニル)ヘキサフルオロプロパン、ビス(4-アミノフェニル)スルホン、4,4’-ジアミノベンズアニリド、1-(4-アミノフェニル)-2,3-ジヒドロ-1,3,3-トリメチル-1H-インデン-5-アミン、α,α’-ビス(4-アミノフェニル)-1,4-ジイソプロピルベンゼン、N,N’-ビス(4-アミノフェニル)テレフタルアミド、4,4’-ビス(4-アミノフェノキシ)ビフェニル、2,2-ビス〔4-(4-アミノフェノキシ)フェニル〕プロパン、2,2-ビス(4-(4-アミノフェノキシ)フェニル)ヘキサフルオロプロパン、5,5’-(1,1,1,3,3,3-ヘキサフルオロ-2-ヒドロキシイソプロピル)-2,2’-ジメチルビフェニル-4,4’-ジアミン及び9,9-ビス(4-(4-アミノフェノキシ)フェニル)フルオレン等の芳香族ジアミン(ただし、式(b-1)で表される化合物及び式(b-2)で表される化合物を除く);1,3-ビス(アミノメチル)シクロヘキサン及び1,4-ビス(アミノメチル)シクロヘキサン等の脂環式ジアミン;並びにエチレンジアミン及びヘキサメチレンジアミン等の脂肪族ジアミンが挙げられる。
なお、本明細書において、芳香族ジアミンとは芳香環を1つ以上含むジアミンを意味し、脂環式ジアミンとは脂環を1つ以上含み、かつ芳香環を含まないジアミンを意味し、脂肪族ジアミンとは芳香環も脂環も含まないジアミンを意味する。
構成単位Bに任意に含まれる構成単位(B-1)及び(B-2)以外の構成単位は、1種でもよいし、2種以上であってもよい。The structural unit B may contain structural units other than the structural units (B-1) and (B-2). Diamines that give such structural units are not particularly limited, but 1,4-phenylenediamine, p-xylylenediamine, 2,2′-dimethylbiphenyl-4,4′-diamine, 2,2′-bis (Trifluoromethyl)benzidine, 4,4'-diaminodiphenyl ether, 4,4'-diamino-2,2'-bistrifluoromethyldiphenyl ether, 4,4'-diaminodiphenylmethane, 2,2-bis(4-aminophenyl ) hexafluoropropane, bis(4-aminophenyl)sulfone, 4,4′-diaminobenzanilide, 1-(4-aminophenyl)-2,3-dihydro-1,3,3-trimethyl-1H-indene- 5-amine, α,α'-bis(4-aminophenyl)-1,4-diisopropylbenzene, N,N'-bis(4-aminophenyl)terephthalamide, 4,4'-bis(4-aminophenoxy ) biphenyl, 2,2-bis[4-(4-aminophenoxy)phenyl]propane, 2,2-bis(4-(4-aminophenoxy)phenyl)hexafluoropropane, 5,5′-(1,1 ,1,3,3,3-hexafluoro-2-hydroxyisopropyl)-2,2′-dimethylbiphenyl-4,4′-diamine and 9,9-bis(4-(4-aminophenoxy)phenyl)fluorene aromatic diamines such as (excluding compounds represented by formula (b-1) and compounds represented by formula (b-2)); 1,3-bis(aminomethyl)cyclohexane and 1,4- Alicyclic diamines such as bis(aminomethyl)cyclohexane; and aliphatic diamines such as ethylenediamine and hexamethylenediamine.
In the present specification, the term "aromatic diamine" means a diamine containing one or more aromatic rings, and the term "alicyclic diamine" means a diamine containing one or more alicyclic rings and no aromatic ring. A group diamine means a diamine containing neither aromatic nor alicyclic rings.
Structural units other than the structural units (B-1) and (B-2) optionally contained in the structural unit B may be of one type or two or more types.
本発明において、ポリイミド樹脂の数平均分子量は、得られるポリイミドフィルムの機械的強度の観点から、好ましくは5,000~100,000である。なお、ポリイミド樹脂の数平均分子量は、例えば、ゲルろ過クロマトグラフィー測定による標準ポリメチルメタクリレート(PMMA)換算値より求めることができる。 In the present invention, the number average molecular weight of the polyimide resin is preferably 5,000 to 100,000 from the viewpoint of the mechanical strength of the resulting polyimide film. Incidentally, the number average molecular weight of the polyimide resin can be obtained from, for example, a standard polymethyl methacrylate (PMMA) conversion value by gel filtration chromatography measurement.
<ポリイミド樹脂の製造方法>
本発明において、ポリイミド樹脂は、上述の構成単位(A-1)を与える化合物を含有するテトラカルボン酸成分と、上述の構成単位(B-1)を与える化合物及び上述の構成単位(B-2)を与える化合物を含むジアミン成分とを反応させることにより製造することができる。<Method for producing polyimide resin>
In the present invention, the polyimide resin includes a tetracarboxylic acid component containing a compound that provides the above-described structural unit (A-1), a compound that provides the above-described structural unit (B-1), and the above-described structural unit (B-2 ) can be produced by reacting a diamine component containing a compound that provides
構成単位(A-1)を与える化合物としては、構成単位(A-1-1)を与える化合物及び構成単位(A-1-2)を与える化合物からなる群より選ばれる少なくとも1つを用いる。
構成単位(A-1-1)を与える化合物としては、式(a-1-1)で表される化合物が挙げられるが、それに限られず、同じ構成単位を与える範囲でその誘導体であってもよい。当該誘導体としては、式(a-1-1)で表されるテトラカルボン酸二無水物に対応するテトラカルボン酸(即ち、1,2,4,5-シクロヘキサンテトラカルボン酸)、及び当該テトラカルボン酸のアルキルエステルが挙げられる。構成単位(A-1-1)を与える化合物としては、式(a-1-1)で表される化合物(即ち、二無水物)が好ましい。
構成単位(A-1-2)を与える化合物としては、式(a-1-2)で表される化合物が挙げられるが、それに限られず、同じ構成単位を与える範囲でその誘導体であってもよい。当該誘導体としては、式(a-1-2)で表されるテトラカルボン酸二無水物に対応するテトラカルボン酸、及び当該テトラカルボン酸のアルキルエステルが挙げられる。構成単位(A-1-2)を与える化合物としては、式(a-1-2)で表される化合物(即ち、二無水物)が好ましい。As the compound that provides the structural unit (A-1), at least one compound selected from the group consisting of compounds that provide the structural unit (A-1-1) and compounds that provide the structural unit (A-1-2) is used.
Compounds that provide the structural unit (A-1-1) include, but are not limited to, compounds represented by formula (a-1-1), and derivatives thereof within the range that provide the same structural unit good. Examples of the derivative include a tetracarboxylic acid corresponding to the tetracarboxylic dianhydride represented by formula (a-1-1) (that is, 1,2,4,5-cyclohexanetetracarboxylic acid), and the tetracarboxylic acid Alkyl esters of acids are mentioned. As the compound that provides the structural unit (A-1-1), a compound represented by formula (a-1-1) (ie, a dianhydride) is preferred.
Compounds that provide the structural unit (A-1-2) include, but are not limited to, compounds represented by formula (a-1-2), and derivatives thereof within the range that provide the same structural unit good. Examples of the derivative include tetracarboxylic acids corresponding to the tetracarboxylic dianhydride represented by formula (a-1-2), and alkyl esters of the tetracarboxylic acids. As the compound that provides the structural unit (A-1-2), a compound represented by formula (a-1-2) (ie, a dianhydride) is preferred.
構成単位(A-1)を与える化合物として、構成単位(A-1-1)を与える化合物のみを用いてもよく、構成単位(A-1-2)を与える化合物のみを用いてもよい。
また、構成単位(A-1)を与える化合物として、構成単位(A-1-1)を与える化合物と構成単位(A-1-2)を与える化合物の組み合わせを用いてもよい。As the compound that provides the structural unit (A-1), only the compound that provides the structural unit (A-1-1) may be used, or only the compound that provides the structural unit (A-1-2) may be used.
Further, as the compound that provides the structural unit (A-1), a combination of a compound that provides the structural unit (A-1-1) and a compound that provides the structural unit (A-1-2) may be used.
テトラカルボン酸成分は、構成単位(A-1)を与える化合物を、好ましくは50モル%以上含み、より好ましくは70モル%以上含み、更に好ましくは90モル%以上含み、特に好ましくは99モル%以上含む。構成単位(A-1)を与える化合物の含有量の上限値は特に限定されず、即ち、100モル%である。テトラカルボン酸成分は構成単位(A-1)を与える化合物のみからなっていてもよい。 The tetracarboxylic acid component preferably contains 50 mol% or more, more preferably 70 mol% or more, still more preferably 90 mol% or more, particularly preferably 99 mol%, of the compound that provides the structural unit (A-1). Including above. The upper limit of the content of the compound that provides the structural unit (A-1) is not particularly limited, ie, 100 mol %. The tetracarboxylic acid component may consist only of the compound that provides the structural unit (A-1).
テトラカルボン酸成分は、構成単位(A-1)を与える化合物以外の化合物を含んでもよく、当該化合物としては、上述の芳香族テトラカルボン酸二無水物、脂環式テトラカルボン酸二無水物、及び脂肪族テトラカルボン酸二無水物、並びにそれらの誘導体(テトラカルボン酸、テトラカルボン酸のアルキルエステル等)が挙げられる。
テトラカルボン酸成分に任意に含まれる構成単位(A-1)を与える化合物以外の化合物は、1種でもよいし、2種以上であってもよい。The tetracarboxylic acid component may contain a compound other than the compound that provides the structural unit (A-1). Examples of the compound include the above-described aromatic tetracarboxylic dianhydride, alicyclic tetracarboxylic dianhydride, and aliphatic tetracarboxylic dianhydrides, and their derivatives (tetracarboxylic acids, alkyl esters of tetracarboxylic acids, etc.).
The number of compounds other than the compound that gives the structural unit (A-1) optionally contained in the tetracarboxylic acid component may be one, or two or more.
構成単位(A-1)を与える化合物以外の化合物の好適な一態様としては、構成単位(A-2)を与える化合物が挙げられる。
構成単位(A-2)を与える化合物としては、式(a-2)で表される化合物が挙げられるが、それに限られず、同じ構成単位を与える範囲でその誘導体であってもよい。当該誘導体としては、式(a-2)で表されるテトラカルボン酸二無水物に対応するテトラカルボン酸、及び当該テトラカルボン酸のアルキルエステルが挙げられる。構成単位(A-2)を与える化合物としては、式(a-2)で表される化合物(即ち、二無水物)が好ましい。
テトラカルボン酸成分が構成単位(A-1)を与える化合物及び構成単位(A-2)を与える化合物を含む場合、テトラカルボン酸成分は構成単位(A-1)を与える化合物を、好ましくは50~95モル%含み、より好ましくは70~95モル%含み、更に好ましくは85~95モル%含み、構成単位(A-2)を与える化合物を、好ましくは5~50モル%含み、より好ましくは5~30モル%含み、更に好ましくは5~15モル%含む。
テトラカルボン酸成分は構成単位(A-1)を与える化合物と構成単位(A-2)を与える化合物とのみからなっていてもよい。A preferred embodiment of the compound other than the compound that provides the structural unit (A-1) is a compound that provides the structural unit (A-2).
The compound that provides the structural unit (A-2) includes, but is not limited to, the compound represented by formula (a-2), and may be a derivative thereof as long as it provides the same structural unit. Examples of the derivative include tetracarboxylic acids corresponding to the tetracarboxylic dianhydrides represented by formula (a-2), and alkyl esters of the tetracarboxylic acids. As the compound that provides the structural unit (A-2), a compound represented by formula (a-2) (ie, a dianhydride) is preferred.
When the tetracarboxylic acid component contains a compound that provides the structural unit (A-1) and a compound that provides the structural unit (A-2), the tetracarboxylic acid component contains the compound that provides the structural unit (A-1), preferably 50 ~95 mol%, more preferably 70 to 95 mol%, more preferably 85 to 95 mol%, a compound that gives the structural unit (A-2), preferably 5 to 50 mol%, more preferably It contains 5 to 30 mol %, more preferably 5 to 15 mol %.
The tetracarboxylic acid component may consist of only a compound that provides the structural unit (A-1) and a compound that provides the structural unit (A-2).
構成単位(B-1)を与える化合物としては、式(b-1)で表される化合物が挙げられるが、それに限られず、同じ構成単位を与える範囲でその誘導体であってもよい。当該誘導体としては、式(b-1)で表されるジアミンに対応するジイソシアネートが挙げられる。構成単位(B-1)を与える化合物としては、式(b-1)で表される化合物(即ち、ジアミン)が好ましい。
構成単位(B-2)を与える化合物としては、式(b-2)で表される化合物が挙げられるが、それに限られず、同じ構成単位を与える範囲でその誘導体であってもよい。当該誘導体としては、式(b-2)で表されるジアミンに対応するジイソシアネートが挙げられる。構成単位(B-2)を与える化合物としては、式(b-2)で表される化合物(即ち、ジアミン)が好ましい。The compound that provides the structural unit (B-1) includes, but is not limited to, the compound represented by formula (b-1), and may be a derivative thereof as long as it provides the same structural unit. Such derivatives include diisocyanates corresponding to diamines represented by formula (b-1). As the compound that provides the structural unit (B-1), a compound represented by formula (b-1) (ie, diamine) is preferred.
The compound that provides the structural unit (B-2) includes, but is not limited to, the compound represented by formula (b-2), and may be a derivative thereof as long as it provides the same structural unit. Such derivatives include diisocyanates corresponding to diamines represented by formula (b-2). As the compound that provides the structural unit (B-2), a compound represented by formula (b-2) (ie, diamine) is preferred.
ジアミン成分は、構成単位(B-1)を与える化合物を、好ましくは40~99モル%含み、より好ましくは45~95モル%含み、更に好ましくは75~95モル%含み、特に好ましくは80~90モル%含む。
ジアミン成分は、構成単位(B-2)を与える化合物を、好ましくは1~60モル%含み、より好ましくは5~55モル%含み、更に好ましくは5~25モル%含み、特に好ましくは10~20モル%含む。
ジアミン成分は、構成単位(B-1)を与える化合物及び構成単位(B-2)を与える化合物を合計で、好ましくは50モル%以上含み、より好ましくは70モル%以上含み、更に好ましくは90モル%以上含み、特に好ましくは99モル%以上含む。構成単位(B-1)を与える化合物及び構成単位(B-2)を与える化合物の合計の含有量の上限値は特に限定されず、即ち、100モル%である。ジアミン成分は構成単位(B-1)を与える化合物と構成単位(B-2)を与える化合物とのみからなっていてもよい。The diamine component preferably contains 40 to 99 mol%, more preferably 45 to 95 mol%, still more preferably 75 to 95 mol%, particularly preferably 80 to 95 mol% of a compound that provides the structural unit (B-1). Contains 90 mol %.
The diamine component preferably contains 1 to 60 mol%, more preferably 5 to 55 mol%, still more preferably 5 to 25 mol%, and particularly preferably 10 to 10 mol% of a compound that provides the structural unit (B-2). Contains 20 mol %.
The diamine component preferably contains 50 mol% or more, more preferably 70 mol% or more, still more preferably 90% in total of the compound that gives the structural unit (B-1) and the compound that gives the structural unit (B-2). It contains 99 mol % or more, particularly preferably 99 mol % or more. The upper limit of the total content of the compound that provides the structural unit (B-1) and the compound that provides the structural unit (B-2) is not particularly limited, ie, it is 100 mol %. The diamine component may consist only of a compound that provides the structural unit (B-1) and a compound that provides the structural unit (B-2).
ジアミン成分は構成単位(B-1)を与える化合物及び構成単位(B-2)を与える化合物以外の化合物を含んでもよく、当該化合物としては、上述の芳香族ジアミン、脂環式ジアミン、及び脂肪族ジアミン、並びにそれらの誘導体(ジイソシアネート等)が挙げられる。
ジアミン成分に任意に含まれる構成単位(B-1)を与える化合物及び構成単位(B-2)を与える化合物以外の化合物は、1種でもよいし、2種以上であってもよい。The diamine component may contain a compound other than the compound that provides the structural unit (B-1) and the compound that provides the structural unit (B-2). Examples of such compounds include the aromatic diamines, alicyclic diamines, and aliphatic group diamines, as well as their derivatives such as diisocyanates.
The compounds other than the compound giving the structural unit (B-1) and the compound giving the structural unit (B-2) optionally contained in the diamine component may be one kind or two or more kinds.
本発明において、ポリイミド樹脂の製造に用いるテトラカルボン酸成分とジアミン成分の仕込み量比は、テトラカルボン酸成分1モルに対してジアミン成分が0.9~1.1モルであることが好ましい。 In the present invention, the charging ratio of the tetracarboxylic acid component and the diamine component used in the production of the polyimide resin is preferably 0.9 to 1.1 mol of the diamine component per 1 mol of the tetracarboxylic acid component.
また、本発明において、ポリイミド樹脂の製造には、前述のテトラカルボン酸成分及びジアミン成分の他に、末端封止剤を用いてもよい。末端封止剤としてはモノアミン類あるいはジカルボン酸類が好ましい。導入される末端封止剤の仕込み量としては、テトラカルボン酸成分1モルに対して0.0001~0.1モルが好ましく、特に0.001~0.06モルが好ましい。モノアミン類末端封止剤としては、例えば、メチルアミン、エチルアミン、プロピルアミン、ブチルアミン、ベンジルアミン、4-メチルベンジルアミン、4-エチルベンジルアミン、4-ドデシルベンジルアミン、3-メチルベンジルアミン、3-エチルベンジルアミン、アニリン、3-メチルアニリン、4-メチルアニリン等が推奨される。これらのうち、ベンジルアミン、アニリンが好適に使用できる。ジカルボン酸類末端封止剤としては、ジカルボン酸類が好ましく、その一部を閉環していてもよい。例えば、フタル酸、無水フタル酸、4-クロロフタル酸、テトラフルオロフタル酸、2,3-ベンゾフェノンジカルボン酸、3,4-ベンゾフェノンジカルボン酸、シクロヘキサン-1,2-ジカルボン酸、シクロペンタン-1,2-ジカルボン酸、4-シクロヘキセン-1,2-ジカルボン酸等が推奨される。これらのうち、フタル酸、無水フタル酸が好適に使用できる。 In addition, in the present invention, a terminal blocker may be used in addition to the tetracarboxylic acid component and the diamine component described above for the production of the polyimide resin. Monoamines or dicarboxylic acids are preferable as the terminal blocking agent. The amount of the terminal blocker to be introduced is preferably 0.0001 to 0.1 mol, particularly preferably 0.001 to 0.06 mol, per 1 mol of the tetracarboxylic acid component. Monoamine terminal blockers include, for example, methylamine, ethylamine, propylamine, butylamine, benzylamine, 4-methylbenzylamine, 4-ethylbenzylamine, 4-dodecylbenzylamine, 3-methylbenzylamine, 3- Ethylbenzylamine, aniline, 3-methylaniline, 4-methylaniline and the like are recommended. Among these, benzylamine and aniline are preferably used. Dicarboxylic acids are preferable as the dicarboxylic acid end blocking agent, and a part of them may be ring-closed. For example, phthalic acid, phthalic anhydride, 4-chlorophthalic acid, tetrafluorophthalic acid, 2,3-benzophenonedicarboxylic acid, 3,4-benzophenonedicarboxylic acid, cyclohexane-1,2-dicarboxylic acid, cyclopentane-1,2 -dicarboxylic acid, 4-cyclohexene-1,2-dicarboxylic acid and the like are recommended. Among these, phthalic acid and phthalic anhydride can be preferably used.
前述のテトラカルボン酸成分とジアミン成分とを反応させる方法には特に制限はなく、公知の方法を用いることができる。
具体的な反応方法としては、(1)テトラカルボン酸成分、ジアミン成分、及び反応溶剤を反応器に仕込み、室温~80℃で0.5~30時間撹拌し、その後に昇温してイミド化反応を行う方法、(2)ジアミン成分及び反応溶剤を反応器に仕込んで溶解させた後、テトラカルボン酸成分を仕込み、必要に応じて室温~80℃で0.5~30時間撹拌し、その後に昇温してイミド化反応を行う方法、(3)テトラカルボン酸成分、ジアミン成分、及び反応溶剤を反応器に仕込み、直ちに昇温してイミド化反応を行う方法等が挙げられる。The method for reacting the tetracarboxylic acid component and the diamine component described above is not particularly limited, and a known method can be used.
As a specific reaction method, (1) a tetracarboxylic acid component, a diamine component, and a reaction solvent are charged into a reactor, stirred at room temperature to 80° C. for 0.5 to 30 hours, and then heated to imidize. (2) After charging the diamine component and the reaction solvent into a reactor and dissolving them, charging the tetracarboxylic acid component, stirring at room temperature to 80° C. for 0.5 to 30 hours, and then and (3) a method in which a tetracarboxylic acid component, a diamine component and a reaction solvent are charged into a reactor and the temperature is immediately raised to carry out the imidization reaction.
ポリイミド樹脂の製造に用いられる反応溶剤は、イミド化反応を阻害せず、生成するポリイミド樹脂を溶解できるものであればよい。例えば、非プロトン性溶剤、フェノール系溶剤、エーテル系溶剤、カーボネート系溶剤等が挙げられる。 The reaction solvent used for the production of the polyimide resin may be any solvent as long as it can dissolve the resulting polyimide resin without inhibiting the imidization reaction. Examples include aprotic solvents, phenolic solvents, ether solvents, carbonate solvents and the like.
非プロトン性溶剤の具体例としては、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、N-メチル-2-ピロリドン、N-メチルカプロラクタム、1,3-ジメチルイミダゾリジノン、テトラメチル尿素等のアミド系溶剤、γ-ブチロラクトン、γ-バレロラクトン等のラクトン系溶剤、ヘキサメチルホスホリックアミド、ヘキサメチルホスフィントリアミド等の含リン系アミド系溶剤、ジメチルスルホン、ジメチルスルホキシド、スルホラン等の含硫黄系溶剤、アセトン、シクロヘキサノン、メチルシクロヘキサノン等のケトン系溶剤、ピコリン、ピリジン等のアミン系溶剤、酢酸(2-メトキシ-1-メチルエチル)等のエステル系溶剤等が挙げられる。 Specific examples of aprotic solvents include N,N-dimethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, N-methylcaprolactam, 1,3-dimethylimidazolidinone, tetramethylurea and the like. , lactone solvents such as γ-butyrolactone and γ-valerolactone, phosphorus-containing amide solvents such as hexamethylphosphoricamide and hexamethylphosphinetriamide, sulfur-containing solvents such as dimethylsulfone, dimethylsulfoxide, and sulfolane. ketone solvents such as acetone, cyclohexanone and methylcyclohexanone; amine solvents such as picoline and pyridine; and ester solvents such as acetic acid (2-methoxy-1-methylethyl).
フェノール系溶剤の具体例としては、フェノール、o-クレゾール、m-クレゾール、p-クレゾール、2,3-キシレノール、2,4-キシレノール、2,5-キシレノール、2,6-キシレノール、3,4-キシレノール、3,5-キシレノール等が挙げられる。
エーテル系溶剤の具体例としては、1,2-ジメトキシエタン、ビス(2-メトキシエチル)エーテル、1,2-ビス(2-メトキシエトキシ)エタン、ビス〔2-(2-メトキシエトキシ)エチル〕エーテル、テトラヒドロフラン、1,4-ジオキサン等が挙げられる。
また、カーボネート系溶剤の具体的な例としては、ジエチルカーボネート、メチルエチルカーボネート、エチレンカーボネート、プロピレンカーボネート等が挙げられる。
上記反応溶剤の中でも、アミド系溶剤又はラクトン系溶剤が好ましい。また、上記の反応溶剤は単独で又は2種以上混合して用いてもよい。Specific examples of phenolic solvents include phenol, o-cresol, m-cresol, p-cresol, 2,3-xylenol, 2,4-xylenol, 2,5-xylenol, 2,6-xylenol, 3,4 -xylenol, 3,5-xylenol, and the like.
Specific examples of ether solvents include 1,2-dimethoxyethane, bis(2-methoxyethyl)ether, 1,2-bis(2-methoxyethoxy)ethane, bis[2-(2-methoxyethoxy)ethyl] ether, tetrahydrofuran, 1,4-dioxane and the like.
Specific examples of carbonate-based solvents include diethyl carbonate, methylethyl carbonate, ethylene carbonate, propylene carbonate, and the like.
Among the above reaction solvents, amide solvents or lactone solvents are preferred. Moreover, the above reaction solvents may be used alone or in combination of two or more.
イミド化反応では、ディーンスターク装置等を用いて、製造時に生成する水を除去しながら反応を行うことが好ましい。このような操作を行うことで、重合度及びイミド化率をより上昇させることができる。 In the imidization reaction, it is preferable to carry out the reaction using a Dean-Stark apparatus or the like while removing water produced during production. By performing such an operation, the degree of polymerization and the imidization rate can be further increased.
上記のイミド化反応においては、公知のイミド化触媒を用いることができる。イミド化触媒としては、塩基触媒又は酸触媒が挙げられる。
塩基触媒としては、ピリジン、キノリン、イソキノリン、α-ピコリン、β-ピコリン、2,4-ルチジン、2,6-ルチジン、トリメチルアミン、トリエチルアミン、トリプロピルアミン、トリブチルアミン、トリエチレンジアミン、イミダゾール、N,N-ジメチルアニリン、N,N-ジエチルアニリン等の有機塩基触媒、水酸化カリウムや水酸化ナトリウム、炭酸カリウム、炭酸ナトリウム、炭酸水素カリウム、炭酸水素ナトリウム等の無機塩基触媒が挙げられる。
また、酸触媒としては、クロトン酸、アクリル酸、トランス-3-ヘキセノイック酸、桂皮酸、安息香酸、メチル安息香酸、オキシ安息香酸、テレフタル酸、ベンゼンスルホン酸、パラトルエンスルホン酸、ナフタレンスルホン酸等が挙げられる。上記のイミド化触媒は単独で又は2種以上を組み合わせて用いてもよい。
上記のうち、取り扱い性の観点から、塩基触媒を用いることが好ましく、有機塩基触媒を用いることがより好ましく、トリエチルアミンを用いることが更に好ましく、トリエチルアミンとトリエチレンジアミンを組み合わせて用いること特に好ましい。A known imidization catalyst can be used in the above imidization reaction. Examples of imidization catalysts include base catalysts and acid catalysts.
Base catalysts include pyridine, quinoline, isoquinoline, α-picoline, β-picoline, 2,4-lutidine, 2,6-lutidine, trimethylamine, triethylamine, tripropylamine, tributylamine, triethylenediamine, imidazole, N,N -dimethylaniline, N,N-diethylaniline and other organic base catalysts, and potassium hydroxide, sodium hydroxide, potassium carbonate, sodium carbonate, potassium hydrogencarbonate, sodium hydrogencarbonate and other inorganic base catalysts.
Acid catalysts include crotonic acid, acrylic acid, trans-3-hexenoic acid, cinnamic acid, benzoic acid, methylbenzoic acid, oxybenzoic acid, terephthalic acid, benzenesulfonic acid, p-toluenesulfonic acid, naphthalenesulfonic acid, and the like. is mentioned. You may use said imidization catalyst individually or in combination of 2 or more types.
Among the above, from the viewpoint of handleability, it is preferable to use a base catalyst, more preferably to use an organic base catalyst, more preferably to use triethylamine, and particularly preferably to use a combination of triethylamine and triethylenediamine.
イミド化反応の温度は、反応率及びゲル化等の抑制の観点から、好ましくは120~250℃、より好ましくは160~200℃である。また、反応時間は、生成水の留出開始後、好ましくは0.5~10時間である。 The temperature of the imidization reaction is preferably 120 to 250°C, more preferably 160 to 200°C, from the viewpoints of reaction rate and inhibition of gelation. Moreover, the reaction time is preferably 0.5 to 10 hours after the start of distillation of the produced water.
<架橋剤>
本発明において、架橋剤は少なくとも2つのオキサゾリル基を有する。即ち、本発明における架橋剤は、分子内に2以上のオキサゾリル基(オキサゾリン環)を有する多官能オキサゾリン化合物である。
オキサゾリル基はカルボキシル基との反応性を有しており、カルボキシル基とオキサゾリル基とが反応すると、以下に示すようにアミドエステル結合が形成される。この反応は、80℃以上に加熱すると特に進行しやすい。<Crosslinking agent>
In the present invention, the crosslinker has at least two oxazolyl groups. That is, the cross-linking agent in the present invention is a polyfunctional oxazoline compound having two or more oxazolyl groups (oxazoline rings) in the molecule.
An oxazolyl group is reactive with a carboxyl group, and when a carboxyl group and an oxazolyl group react, an amide ester bond is formed as shown below. This reaction proceeds particularly easily when heated to 80° C. or higher.
本発明のポリイミド樹脂組成物に含まれるポリイミド樹脂はカルボキシル基を有することから、本発明のポリイミド樹脂組成物を加熱すると、架橋剤を介してポリイミド樹脂同士が架橋して、架橋ポリイミド樹脂が形成される。このような理由から、フィルムの耐有機溶媒性が向上する。また、オキサゾリル基とカルボキシル基との反応は、室温ではほとんど進行しないため、本発明のポリイミド樹脂組成物は保存安定性に優れる。 Since the polyimide resin contained in the polyimide resin composition of the present invention has a carboxyl group, when the polyimide resin composition of the present invention is heated, the polyimide resins are crosslinked via a cross-linking agent to form a crosslinked polyimide resin. be. For these reasons, the organic solvent resistance of the film is improved. Moreover, since the reaction between an oxazolyl group and a carboxyl group hardly progresses at room temperature, the polyimide resin composition of the present invention has excellent storage stability.
架橋剤は、分子内に2以上のオキサゾリル基を有する化合物であれば特に限定されず、その具体例としては、1,3-ビス(4,5-ジヒドロ-2-オキサゾリル)ベンゼン、1,4-ビス(4,5-ジヒドロ-2-オキサゾリル)ベンゼン、2,2’-ビス(2-オキサゾリン)、株式会社日本触媒製のK-2010E、K-2020E、K-2030E、2,6-ビス(4-イソプロピル-2-オキサゾリン-2-イル)ピリジン、2,6-ビス(4-フェニル-2-オキサゾリン-2-イル)ピリジン、2,2’-イソプロピリデンビス(4-フェニル-2-オキサゾリン)、2,2’-イソプロピリデンビス(4-tert-ブチル-2-オキサゾリン)等が挙げられる。
架橋剤としては、好ましくは少なくとも2つのオキサゾリル基が結合した芳香環又は芳香族複素環を含む化合物であり、より好ましくは少なくとも2つのオキサゾリル基が結合したベンゼン環を含む化合物であり、更に好ましくは1,3-ビス(4,5-ジヒドロ-2-オキサゾリル)ベンゼンである。
架橋剤は、単独で用いてもよいし、2種類以上を組み合わせて用いてもよい。The crosslinking agent is not particularly limited as long as it is a compound having two or more oxazolyl groups in the molecule, and specific examples include 1,3-bis(4,5-dihydro-2-oxazolyl)benzene, 1,4 -Bis(4,5-dihydro-2-oxazolyl)benzene, 2,2'-bis(2-oxazoline), K-2010E, K-2020E, K-2030E, 2,6-bis manufactured by Nippon Shokubai Co., Ltd. (4-isopropyl-2-oxazolin-2-yl)pyridine, 2,6-bis(4-phenyl-2-oxazolin-2-yl)pyridine, 2,2′-isopropylidenebis(4-phenyl-2- oxazoline), 2,2′-isopropylidenebis(4-tert-butyl-2-oxazoline) and the like.
The cross-linking agent is preferably a compound containing an aromatic ring or aromatic heterocycle to which at least two oxazolyl groups are bonded, more preferably a compound containing a benzene ring to which at least two oxazolyl groups are bonded, and still more preferably 1,3-bis(4,5-dihydro-2-oxazolyl)benzene.
A crosslinking agent may be used independently and may be used in combination of 2 or more types.
本発明のポリイミド樹脂組成物は、架橋剤中のオキサゾリル基とポリイミド樹脂中のカルボキシル基とのモル比(オキサゾリル基/カルボキシル基)が1/4~1/0.5の範囲となるような比率で、ポリイミド樹脂と架橋剤とを含むことが好ましい。前記モル比は、より好ましくは1/4~1/1であり、更に好ましくは1/2~1/1である。
なお、上記のモル比は、架橋剤に含まれるオキサゾリル基と、ポリイミド樹脂の製造に用いる構成単位(B-2)を与える化合物に含まれるカルボキシル基とのモル比を意味し、架橋剤の添加量と構成単位(B-2)を与える化合物の添加量に基づいて計算される。In the polyimide resin composition of the present invention, the molar ratio of oxazolyl groups in the cross-linking agent to carboxyl groups in the polyimide resin (oxazolyl group/carboxyl group) is in the range of 1/4 to 1/0.5. and preferably contains a polyimide resin and a cross-linking agent. The molar ratio is more preferably 1/4 to 1/1, more preferably 1/2 to 1/1.
The above molar ratio means the molar ratio between the oxazolyl group contained in the cross-linking agent and the carboxyl group contained in the compound giving the structural unit (B-2) used in the production of the polyimide resin, and the addition of the cross-linking agent. It is calculated based on the added amount of the compound that gives the amount and the structural unit (B-2).
本発明のポリイミド樹脂組成物の好適な一態様として、上述のポリイミド樹脂及び上述の架橋剤に加えて、有機溶媒を更に含み、当該ポリイミド樹脂が当該有機溶媒に溶解しているポリイミド樹脂組成物(以後、“ポリイミドワニス”とも呼称する)が挙げられる。
有機溶媒はポリイミド樹脂が溶解するものであればよく、特に限定されないが、ポリイミド樹脂の製造に用いられる反応溶剤として上述した化合物を、単独又は2種以上を混合して用いることが好ましい。
ポリイミドワニスは、重合法により得られるポリイミド樹脂が反応溶剤に溶解した溶液そのものに対して架橋剤を添加したものであってもよいし、又は当該溶液に対して希釈溶剤及び架橋剤を添加したものであってもよい。As a preferred embodiment of the polyimide resin composition of the present invention, in addition to the above-described polyimide resin and the above-described crosslinking agent, the polyimide resin composition further contains an organic solvent, and the polyimide resin is dissolved in the organic solvent ( hereinafter also referred to as "polyimide varnish").
The organic solvent is not particularly limited as long as it dissolves the polyimide resin, but it is preferable to use the compounds described above as the reaction solvent used in the production of the polyimide resin singly or in combination of two or more.
The polyimide varnish may be obtained by adding a cross-linking agent to the solution itself in which the polyimide resin obtained by the polymerization method is dissolved in the reaction solvent, or adding a diluting solvent and a cross-linking agent to the solution. may be
上述のポリイミド樹脂は溶媒溶解性を有しており、しかも、室温では架橋剤との架橋反応がほとんど進行しない。そのため、室温で安定な高濃度のポリイミドワニスとすることができる。ポリイミドワニスは、ポリイミド樹脂を5~40質量%含むことが好ましく、10~30質量%含むことがより好ましい。ポリイミドワニスの粘度は1~200Pa・sが好ましく、5~150Pa・sがより好ましい。ポリイミドワニスの粘度は、E型粘度計を用いて25℃で測定された値である。 The polyimide resin described above is solvent soluble, and furthermore, the cross-linking reaction with the cross-linking agent hardly progresses at room temperature. Therefore, a high-concentration polyimide varnish that is stable at room temperature can be obtained. The polyimide varnish preferably contains 5 to 40% by mass of polyimide resin, more preferably 10 to 30% by mass. The viscosity of the polyimide varnish is preferably 1 to 200 Pa·s, more preferably 5 to 150 Pa·s. The viscosity of the polyimide varnish is a value measured at 25° C. using an E-type viscometer.
また、本発明のポリイミド樹脂組成物は、ポリイミドフィルムの要求特性を損なわない範囲で、無機フィラー、接着促進剤、剥離剤、難燃剤、紫外線安定剤、界面活性剤、レベリング剤、消泡剤、蛍光増白剤、架橋剤、重合開始剤、感光剤等各種添加剤を含んでもよい。
本発明のポリイミド樹脂組成物の製造方法は特に限定されず、公知の方法を適用することができる。Further, the polyimide resin composition of the present invention, in the range that does not impair the required properties of the polyimide film, an inorganic filler, an adhesion promoter, a release agent, a flame retardant, an ultraviolet stabilizer, a surfactant, a leveling agent, an antifoaming agent, Various additives such as fluorescent whitening agents, cross-linking agents, polymerization initiators, and photosensitizers may also be included.
The method for producing the polyimide resin composition of the present invention is not particularly limited, and known methods can be applied.
本発明のポリイミド樹脂組成物は、機械的特性、耐有機溶媒性、無色透明性、及び光学的等方性に優れるフィルムを形成することができる。本発明のポリイミド樹脂組成物を用いて形成することができるフィルムの好適な物性値は以下の通りである。 The polyimide resin composition of the present invention can form a film excellent in mechanical properties, organic solvent resistance, colorless transparency, and optical isotropy. Preferred physical properties of the film that can be formed using the polyimide resin composition of the present invention are as follows.
引張強度は、好ましくは50MPa以上であり、より好ましくは60MPa以上であり、更に好ましくは70MPa以上である。
引張弾性率は、好ましくは2.0GPa以上であり、より好ましくは2.2GPa以上であり、更に好ましくは2.5GPa以上である。
全光線透過率は、厚さ10μmのフィルムとした際に、好ましくは87%以上であり、より好ましくは88%以上であり、更に好ましくは89%以上である。
イエローインデックス(YI)は、厚さ10μmのフィルムとした際に、好ましくは6.8以下であり、より好ましくは3.5以下であり、更に好ましくは2.2以下である。
厚み位相差(Rth)の絶対値は、厚さ10μmのフィルムとした際に、好ましくは75nm以下であり、より好ましくは25nm以下であり、更に好ましく10nm以下である。
なお、本発明における引張強度、引張弾性率、全光線透過率、イエローインデックス(YI)、及び厚み位相差(Rth)は、具体的には実施例に記載の方法で測定することができる。The tensile strength is preferably 50 MPa or higher, more preferably 60 MPa or higher, and even more preferably 70 MPa or higher.
The tensile modulus is preferably 2.0 GPa or higher, more preferably 2.2 GPa or higher, and even more preferably 2.5 GPa or higher.
The total light transmittance of a film having a thickness of 10 μm is preferably 87% or more, more preferably 88% or more, and still more preferably 89% or more.
The yellow index (YI) is preferably 6.8 or less, more preferably 3.5 or less, and still more preferably 2.2 or less when a film having a thickness of 10 μm is formed.
The absolute value of the thickness retardation (Rth) is preferably 75 nm or less, more preferably 25 nm or less, still more preferably 10 nm or less when a film having a thickness of 10 μm is formed.
The tensile strength, tensile modulus, total light transmittance, yellow index (YI), and thickness retardation (Rth) in the present invention can be specifically measured by the methods described in Examples.
[ポリイミドフィルム]
本発明のポリイミドフィルムは、本発明のポリイミド樹脂組成物中に含まれる上述のポリイミド樹脂が上述の架橋剤により架橋されてなる。即ち、本発明のポリイミドフィルムは、架橋剤を介したポリイミド樹脂同士の架橋物である架橋ポリイミド樹脂を含む。したがって、本発明のポリイミドフィルムは、機械的特性、耐有機溶媒性、無色透明性、及び光学的等方性に優れる。本発明のポリイミドフィルムが有する好適な物性値は上述の通りである。
本発明のポリイミドフィルムの製造方法には、ポリイミド樹脂と架橋剤との架橋反応が進行する温度(好ましくは80℃以上、より好ましくは100℃以上、更に好ましくは150℃以上)で架橋する工程を含めば、特に制限はない。例えば、上述のポリイミドワニスを、ガラス板、金属板、プラスチック等の平滑な支持体上に塗布、又はフィルム状に成形した後、加熱する方法が挙げられる。この加熱処理により、ポリイミドワニス中のポリイミド樹脂と架橋剤との架橋反応を進行させながら、ポリイミドワニス中に含まれる反応溶剤や希釈溶剤等の有機溶媒を除去することができる。前記支持体の表面には、必要に応じて、予め離形剤を塗布しておいてもよい。
ポリイミドワニスを支持体上に塗布する方法としては、スピンコート、スリットコート、ブレードコート等の公知の塗布方法が挙げられる。
加熱処理としては、以下の方法が好ましい。すなわち、60~150℃の温度で有機溶媒を蒸発させて自己支持性フィルムとした後、該自己支持性フィルムを支持体より剥離し、該自己支持性フィルムの端部を固定し、用いた有機溶媒の沸点以上の温度で乾燥してポリイミドフィルムを製造することが好ましい。また、窒素雰囲気下で乾燥することが好ましい。乾燥雰囲気の圧力は、減圧、常圧、加圧のいずれでもよい。自己支持性フィルムを乾燥してポリイミドフィルムを製造する際の加熱温度は、特に限定されないが、250~400℃が好ましい。[Polyimide film]
The polyimide film of the present invention is obtained by cross-linking the above-described polyimide resin contained in the polyimide resin composition of the present invention with the above-described cross-linking agent. That is, the polyimide film of the present invention contains a crosslinked polyimide resin which is a crosslinked product between polyimide resins via a crosslinking agent. Therefore, the polyimide film of the present invention is excellent in mechanical properties, organic solvent resistance, colorless transparency, and optical isotropy. Preferred physical properties of the polyimide film of the present invention are as described above.
The method for producing a polyimide film of the present invention includes a step of crosslinking at a temperature at which the crosslinking reaction between the polyimide resin and the crosslinking agent proceeds (preferably 80° C. or higher, more preferably 100° C. or higher, and still more preferably 150° C. or higher). There are no particular restrictions on inclusion. For example, the polyimide varnish described above may be coated on a smooth support such as a glass plate, a metal plate or plastic, or formed into a film and then heated. By this heat treatment, an organic solvent such as a reaction solvent and a dilution solvent contained in the polyimide varnish can be removed while the crosslinking reaction between the polyimide resin in the polyimide varnish and the crosslinking agent proceeds. If necessary, the surface of the support may be coated with a release agent in advance.
Examples of the method for applying the polyimide varnish onto the support include known coating methods such as spin coating, slit coating and blade coating.
As the heat treatment, the following method is preferable. That is, after evaporating the organic solvent at a temperature of 60 to 150° C. to form a self-supporting film, the self-supporting film is peeled off from the support, the end of the self-supporting film is fixed, and the organic solvent used is It is preferable to produce a polyimide film by drying at a temperature higher than the boiling point of the solvent. Moreover, it is preferable to dry in a nitrogen atmosphere. The pressure of the drying atmosphere may be reduced pressure, normal pressure, or increased pressure. The heating temperature for drying the self-supporting film to produce the polyimide film is not particularly limited, but is preferably 250 to 400°C.
本発明のポリイミドフィルムの厚みは用途等に応じて適宜選択することができるが、好ましくは1~250μm、より好ましくは5~100μm、更に好ましくは10~80μmの範囲である。厚みが1~250μmであることで、自立膜としての実用的な使用が可能となる。
ポリイミドフィルムの厚みは、ポリイミドワニスの固形分濃度や粘度を調整することにより、容易に制御することができる。The thickness of the polyimide film of the present invention can be appropriately selected depending on the application, etc., but is preferably in the range of 1 to 250 μm, more preferably 5 to 100 μm, still more preferably 10 to 80 μm. A thickness of 1 to 250 μm enables practical use as a self-supporting film.
The thickness of the polyimide film can be easily controlled by adjusting the solid content concentration and viscosity of the polyimide varnish.
本発明のポリイミドフィルムは、カラーフィルター、フレキシブルディスプレイ、半導体部品、光学部材等の各種部材用のフィルムとして好適に用いられる。本発明のポリイミドフィルムは、液晶ディスプレイやOLEDディスプレイ等の画像表示装置の基板として、特に好適に用いられる。 The polyimide film of the present invention is suitably used as films for various members such as color filters, flexible displays, semiconductor parts, and optical members. The polyimide film of the present invention is particularly suitably used as a substrate for image display devices such as liquid crystal displays and OLED displays.
以下に、実施例により本発明を具体的に説明する。但し、本発明はこれらの実施例により何ら制限されるものではない。 EXAMPLES The present invention will be specifically described below with reference to examples. However, the present invention is in no way limited by these examples.
実施例及び比較例で得たポリイミド樹脂溶液及びポリイミドワニスの固形分濃度並びにポリイミドフィルムの各物性は以下に示す方法によって測定した。
(1)固形分濃度
ポリイミド樹脂溶液及びポリイミドワニスの固形分濃度の測定は、アズワン株式会社製の小型電気炉「MMF-1」で試料を320℃×120minで加熱し、加熱前後の試料の質量差から算出した。
(2)フィルム厚さ
フィルム厚さは、株式会社ミツトヨ製のマイクロメーターを用いて測定した。
(3)引張強度、引張弾性率
測定はJIS K7127に準拠し、東洋精機株式会社製の引張試験機「ストログラフVG-1E」を用いて行った。
(4)全光線透過率、イエローインデックス(YI)
測定はJIS K7361-1準拠し、日本電色工業株式会社製の色彩・濁度同時測定器「COH400」を用いて行った。
(5)厚み位相差(Rth)
厚み位相差(Rth)は、日本分光株式会社製のエリプソメーター「M-220」を用いて測定した。測定波長590nmにおける、厚み位相差の値を測定した。なおRthは、ポリイミドフィルムの面内の屈折率のうち最大のものをnx、最小のものをnyとし、厚み方向の屈折率をnzとし、フィルムの厚みをdとしたとき、下記式によって表されるものである。
Rth=[{(nx+ny)/2}-nz]×d
(6)耐有機溶媒性
得られたフィルムを有機溶媒に60℃で3時間浸漬し、耐有機溶媒性を評価した。なお、有機溶媒としては、N-メチル-2-ピロリドン(NMP)を使用した。
耐有機溶媒性の評価基準は、以下の通りとした。
B:有機溶媒に浸漬して3時間未満でフィルム表面が溶解した。
A:有機溶媒に浸漬して3時間経過後もフィルム表面が溶解せず変化がなかった。The solid content concentrations of the polyimide resin solutions and polyimide varnishes obtained in Examples and Comparative Examples, and the physical properties of the polyimide films were measured by the following methods.
(1) Solid content concentration The solid content concentration of the polyimide resin solution and the polyimide varnish was measured by heating the sample at 320 ° C. × 120 min in a small electric furnace “MMF-1” manufactured by AS ONE Co., Ltd., and the mass of the sample before and after heating. Calculated from the difference.
(2) Film thickness The film thickness was measured using a Mitutoyo micrometer.
(3) Tensile Strength, Tensile Modulus Measurements were carried out according to JIS K7127 using a tensile tester "Strograph VG-1E" manufactured by Toyo Seiki Co., Ltd.
(4) Total light transmittance, yellow index (YI)
The measurement was performed in accordance with JIS K7361-1 using a simultaneous color/turbidity measuring instrument "COH400" manufactured by Nippon Denshoku Industries Co., Ltd.
(5) Thickness retardation (Rth)
The thickness retardation (Rth) was measured using an ellipsometer "M-220" manufactured by JASCO Corporation. A thickness retardation value was measured at a measurement wavelength of 590 nm. Rth is represented by the following formula, where nx is the maximum refractive index in the plane of the polyimide film, ny is the minimum one, nz is the refractive index in the thickness direction, and d is the thickness of the film. It is a thing.
Rth=[{(nx+ny)/2}-nz]×d
(6) Organic Solvent Resistance The resulting film was immersed in an organic solvent at 60° C. for 3 hours to evaluate the organic solvent resistance. N-methyl-2-pyrrolidone (NMP) was used as the organic solvent.
The organic solvent resistance evaluation criteria were as follows.
B: The film surface dissolved in less than 3 hours after being immersed in an organic solvent.
A: Even after 3 hours of immersion in an organic solvent, the film surface did not dissolve and remained unchanged.
実施例及び比較例にて使用したテトラカルボン酸成分、ジアミン成分、架橋剤、並びにその略号は以下の通りである。
<テトラカルボン酸成分>
HPMDA:1,2,4,5-シクロヘキサンテトラカルボン酸二無水物(三菱ガス化学株式会社製;式(a-1-1)で表される化合物)
CpODA:ノルボルナン-2-スピロ-α-シクロペンタノン-α’-スピロ-2’’-ノルボルナン-5,5’’,6,6’’-テトラカルボン酸二無水物(JXエネルギー株式会社製;式(a-1-2)で表される化合物)
s-BPDA:3,3’,4,4’-ビフェニルテトラカルボン酸二無水物(三菱ケミカル株式会社製;式(a-2s)で表される化合物)
<ジアミン成分>
BAFL:9,9-ビス(4-アミノフェニル)フルオレン(田岡化学工業株式会社製;式(b-1)で表される化合物)
3,5-DABA:3,5-ジアミノ安息香酸(日本純良薬品株式会社製;式(b-211)で表される化合物)
mTB:2,2’-ジメチルビフェニル-4,4’-ジアミン(セイカ株式会社製)
<架橋剤>
1,3-PBO:1,3-ビス(4,5-ジヒドロ-2-オキサゾリル)ベンゼン(三國製薬工業株式会社製)
TG:イソシアヌル酸トリグリシジル(東京化成工業株式会社製)The tetracarboxylic acid component, diamine component, cross-linking agent and their abbreviations used in Examples and Comparative Examples are as follows.
<Tetracarboxylic acid component>
HPMDA: 1,2,4,5-cyclohexanetetracarboxylic dianhydride (manufactured by Mitsubishi Gas Chemical Company; compound represented by formula (a-1-1))
CpODA: norbornane-2-spiro-α-cyclopentanone-α'-spiro-2''-norbornane-5,5'',6,6''-tetracarboxylic dianhydride (manufactured by JX Energy Corporation; compound represented by formula (a-1-2))
s-BPDA: 3,3′,4,4′-biphenyltetracarboxylic dianhydride (manufactured by Mitsubishi Chemical Corporation; compound represented by formula (a-2s))
<Diamine component>
BAFL: 9,9-bis(4-aminophenyl)fluorene (manufactured by Taoka Chemical Co., Ltd.; compound represented by formula (b-1))
3,5-DABA: 3,5-diaminobenzoic acid (manufactured by Nihon Junryaku Co., Ltd.; compound represented by formula (b-211))
mTB: 2,2'-dimethylbiphenyl-4,4'-diamine (manufactured by Seika Co., Ltd.)
<Crosslinking agent>
1,3-PBO: 1,3-bis(4,5-dihydro-2-oxazolyl)benzene (manufactured by Mikuni Pharmaceutical Industry Co., Ltd.)
TG: triglycidyl isocyanurate (manufactured by Tokyo Chemical Industry Co., Ltd.)
<実施例1A>
ステンレス製半月型撹拌翼、窒素導入管、冷却管を取り付けたディーンスターク、温度計、ガラス製エンドキャップを備えた1Lの5つ口丸底フラスコに、BAFLを27.876g(0.080モル)と、3,5-DABAを3.043g(0.020モル)と、γ-ブチロラクトン(三菱ケミカル株式会社製)を79.242g投入し、系内温度70℃、窒素雰囲気下、回転数200rpmで撹拌して溶液を得た。
この溶液に、HPMDAを22.417g(0.100モル)と、γ-ブチロラクトン(三菱ケミカル株式会社製)を19.811gとを一括で添加した後、イミド化触媒としてトリエチルアミン(関東化学株式会社製)を0.506g投入し、マントルヒーターで加熱し、約20分かけて反応系内温度を190℃まで上げた。留去される成分を捕集し、回転数を粘度上昇に合わせて調整しつつ、反応系内温度を190℃に保持して3時間還流した。
その後、γ-ブチロラクトン(三菱ケミカル株式会社製)を351.779g添加して、反応系内温度を120℃まで冷却した後、更に約3時間撹拌して均一化して、固形分濃度10.0質量%のポリイミド樹脂溶液(1)を得た。
続いて、ポリイミド樹脂溶液(1)を100g中に、架橋剤として1,3-PBOを0.216g(0.001モル)添加し、室温で1時間攪拌後、架橋剤とポリイミド樹脂とを含む固形分濃度10.2質量%のポリイミドワニスを得た。なお、1,3-PBOの添加量と3,5-DABAの添加量に基づいて計算されるオキサゾリル基/カルボキシル基のモル比は、1/2である。
続いてガラス板上へ、得られたポリイミドワニスを塗布し、ホットプレートで80℃、20分間保持し、その後、窒素雰囲気下、熱風乾燥機中350℃で30分加熱し溶媒を蒸発させ、厚み18μmのフィルムを得た。結果を表1に示す。<Example 1A>
27.876 g (0.080 mol) of BAFL was placed in a 1 L 5-neck round-bottom flask equipped with a stainless steel half-moon stirrer, a nitrogen inlet tube, a Dean Stark condenser, a thermometer, and a glass end cap. Then, 3.043 g (0.020 mol) of 3,5-DABA and 79.242 g of γ-butyrolactone (manufactured by Mitsubishi Chemical Corporation) were added, and the temperature in the system was 70 ° C., under a nitrogen atmosphere, at a rotation speed of 200 rpm. Stir to obtain a solution.
To this solution, 22.417 g (0.100 mol) of HPMDA and 19.811 g of γ-butyrolactone (manufactured by Mitsubishi Chemical Corporation) were added all at once, and triethylamine (manufactured by Kanto Chemical Co., Ltd.) was used as an imidization catalyst. ) was added and heated with a mantle heater to raise the temperature in the reaction system to 190° C. over about 20 minutes. The components to be distilled off were collected, and the temperature in the reaction system was kept at 190° C. and refluxed for 3 hours while adjusting the number of revolutions according to the increase in viscosity.
After that, 351.779 g of γ-butyrolactone (manufactured by Mitsubishi Chemical Co., Ltd.) is added, the temperature inside the reaction system is cooled to 120° C., and the mixture is further stirred for about 3 hours for homogenization to obtain a solid concentration of 10.0 mass. % polyimide resin solution (1) was obtained.
Subsequently, 0.216 g (0.001 mol) of 1,3-PBO as a cross-linking agent is added to 100 g of the polyimide resin solution (1), and after stirring at room temperature for 1 hour, the cross-linking agent and the polyimide resin are added. A polyimide varnish having a solid concentration of 10.2% by mass was obtained. The molar ratio of oxazolyl group/carboxyl group calculated based on the added amount of 1,3-PBO and the added amount of 3,5-DABA is 1/2.
Subsequently, the resulting polyimide varnish is applied onto a glass plate, held on a hot plate at 80 ° C. for 20 minutes, and then heated in a hot air dryer at 350 ° C. for 30 minutes in a nitrogen atmosphere to evaporate the solvent. A film of 18 μm was obtained. Table 1 shows the results.
<実施例1B>
ポリイミド樹脂溶液(1)に対する架橋剤1,3-PBOの添加量を0.432g(0.002モル)に変更したこと以外は、実施例1Aと同様の方法により、ポリイミドワニスを作製し、架橋剤とポリイミド樹脂とを含む固形分濃度10.4質量%のポリイミドワニスを得た。なお、1,3-PBOの添加量と3,5-DABAの添加量に基づいて計算されるオキサゾリル基/カルボキシル基のモル比は、1/1である。
得られたポリイミドワニスを用いて、実施例1Aと同様の方法によりフィルムを作製し、厚み17μmのフィルムを得た。結果を表1に示す。<Example 1B>
A polyimide varnish was prepared and crosslinked in the same manner as in Example 1A, except that the amount of the crosslinking agent 1,3-PBO added to the polyimide resin solution (1) was changed to 0.432 g (0.002 mol). A polyimide varnish having a solid concentration of 10.4% by mass containing the agent and the polyimide resin was obtained. The molar ratio of oxazolyl group/carboxyl group calculated based on the added amount of 1,3-PBO and the added amount of 3,5-DABA is 1/1.
Using the obtained polyimide varnish, a film was produced in the same manner as in Example 1A to obtain a film with a thickness of 17 μm. Table 1 shows the results.
<比較例1>
ポリイミド樹脂溶液(1)に対して架橋剤1,3-PBOを添加しなかったこと以外は、実施例1Aと同様の方法により、ポリイミドワニスを作製した。即ち、ポリイミド樹脂溶液(1)を、そのままポリイミドワニスとして用いた。
得られたポリイミドワニスを用いて、実施例1Aと同様の方法によりフィルムを作製し、厚み16μmのフィルムを得た。結果を表1に示す。<Comparative Example 1>
A polyimide varnish was prepared in the same manner as in Example 1A, except that the cross-linking agent 1,3-PBO was not added to the polyimide resin solution (1). That is, the polyimide resin solution (1) was directly used as the polyimide varnish.
Using the obtained polyimide varnish, a film was produced in the same manner as in Example 1A to obtain a film with a thickness of 16 µm. Table 1 shows the results.
<実施例2A>
ステンレス製半月型撹拌翼、窒素導入管、冷却管を取り付けたディーンスターク、温度計、ガラス製エンドキャップを備えた1Lの5つ口丸底フラスコに、BAFLを31.361g(0.090モル)と、3,5-DABAを1.522g(0.010モル)と、γ-ブチロラクトン(三菱ケミカル株式会社製)を105.961g投入し、系内温度70℃、窒素雰囲気下、回転数200rpmで撹拌して溶液を得た。
この溶液に、CpODAを38.438g(0.100モル)と、γ-ブチロラクトン(三菱ケミカル株式会社製)を26.490gとを一括で添加した後、イミド化触媒としてトリエチルアミン(関東化学株式会社製)を0.506g及びトリエチレンジアミン(東京化成工業株式会社製)を0.056g投入し、マントルヒーターで加熱し、約20分かけて反応系内温度を190℃まで上げた。留去される成分を捕集し、回転数を粘度上昇に合わせて調整しつつ、反応系内温度を190℃に保持して3時間還流した。
その後、γ-ブチロラクトン(三菱ケミカル株式会社製)を478.614g添加して、反応系内温度を120℃まで冷却した後、更に約3時間撹拌して均一化して、固形分濃度10.0質量%のポリイミド樹脂溶液(2)を得た。
続いて、ポリイミド樹脂溶液(2)を100g中に、架橋剤として1,3-PBOを0.0796g(0.00037モル)添加し、室温で1時間攪拌後、架橋剤とポリイミド樹脂とを含む固形分濃度10.07質量%のポリイミドワニスを得た。なお、1,3-PBOの添加量と3,5-DABAの添加量に基づいて計算されるオキサゾリル基/カルボキシル基のモル比は、1/2である。
続いてガラス板上へ、得られたポリイミドワニスを塗布し、ホットプレートで80℃、20分間保持し、その後、窒素雰囲気下、熱風乾燥機中350℃で30分加熱し溶媒を蒸発させ、厚み27μmのフィルムを得た。結果を表1に示す。<Example 2A>
31.361 g (0.090 mol) of BAFL was placed in a 1 L 5-necked round-bottom flask equipped with a stainless steel half-moon stirrer, a nitrogen inlet tube, a Dean Stark condenser, a thermometer, and a glass end cap. Then, 1.522 g (0.010 mol) of 3,5-DABA and 105.961 g of γ-butyrolactone (manufactured by Mitsubishi Chemical Corporation) were added, and the temperature in the system was 70 ° C., under a nitrogen atmosphere, at a rotation speed of 200 rpm. Stir to obtain a solution.
To this solution, 38.438 g (0.100 mol) of CpODA and 26.490 g of γ-butyrolactone (manufactured by Mitsubishi Chemical Corporation) were added all at once, and triethylamine (manufactured by Kanto Chemical Co., Ltd.) was used as an imidization catalyst. ) and 0.056 g of triethylenediamine (manufactured by Tokyo Kasei Kogyo Co., Ltd.) were added, heated with a mantle heater, and the temperature in the reaction system was raised to 190° C. over about 20 minutes. The components to be distilled off were collected, and the temperature in the reaction system was kept at 190° C. and refluxed for 3 hours while adjusting the number of revolutions according to the increase in viscosity.
After that, 478.614 g of γ-butyrolactone (Mitsubishi Chemical Co., Ltd.) was added, the temperature inside the reaction system was cooled to 120° C., and the mixture was further stirred for about 3 hours to homogenize the solid content to a solid concentration of 10.0 mass. % polyimide resin solution (2) was obtained.
Subsequently, 0.0796 g (0.00037 mol) of 1,3-PBO as a cross-linking agent is added to 100 g of the polyimide resin solution (2), and after stirring at room temperature for 1 hour, the cross-linking agent and the polyimide resin are added. A polyimide varnish having a solid concentration of 10.07% by mass was obtained. The molar ratio of oxazolyl group/carboxyl group calculated based on the added amount of 1,3-PBO and the added amount of 3,5-DABA is 1/2.
Subsequently, the resulting polyimide varnish is applied onto a glass plate, held on a hot plate at 80 ° C. for 20 minutes, and then heated in a hot air dryer at 350 ° C. for 30 minutes in a nitrogen atmosphere to evaporate the solvent. A 27 μm film was obtained. Table 1 shows the results.
<実施例2B>
ポリイミド樹脂溶液(2)に対する架橋剤1,3-PBOの添加量を0.1592g(0.00074モル)に変更したこと以外は、実施例2Aと同様の方法により、ポリイミドワニスを作製し、架橋剤とポリイミド樹脂とを含む固形分濃度10.14質量%のポリイミドワニスを得た。なお、1,3-PBOの添加量と3,5-DABAの添加量に基づいて計算されるオキサゾリル基/カルボキシル基のモル比は、1/1である。
得られたポリイミドワニスを用いて、実施例2Aと同様の方法によりフィルムを作製し、厚み23μmのフィルムを得た。結果を表1に示す。<Example 2B>
A polyimide varnish was prepared and crosslinked in the same manner as in Example 2A, except that the amount of the crosslinking agent 1,3-PBO added to the polyimide resin solution (2) was changed to 0.1592 g (0.00074 mol). A polyimide varnish having a solid content concentration of 10.14% by mass containing the agent and the polyimide resin was obtained. The molar ratio of oxazolyl group/carboxyl group calculated based on the added amount of 1,3-PBO and the added amount of 3,5-DABA is 1/1.
Using the obtained polyimide varnish, a film was produced in the same manner as in Example 2A to obtain a film with a thickness of 23 μm. Table 1 shows the results.
<比較例2>
ポリイミド樹脂溶液(2)に対して架橋剤1,3-PBOを添加しなかったこと以外は、実施例2Aと同様の方法により、ポリイミドワニスを作製した。即ち、ポリイミド樹脂溶液(2)を、そのままポリイミドワニスとして用いた。
得られたポリイミドワニスを用いて、実施例2Aと同様の方法によりフィルムを作製し、厚み14μmのフィルムを得た。結果を表1に示す。<Comparative Example 2>
A polyimide varnish was prepared in the same manner as in Example 2A, except that the cross-linking agent 1,3-PBO was not added to the polyimide resin solution (2). That is, the polyimide resin solution (2) was used as it was as a polyimide varnish.
Using the obtained polyimide varnish, a film was produced in the same manner as in Example 2A to obtain a film with a thickness of 14 μm. Table 1 shows the results.
<実施例3A>
BAFLの量を31.361g(0.090モル)から27.876g(0.080モル)に変更し、3,5-DABAの量を1.522g(0.010モル)から3.043g(0.020モル)に変更した以外は、実施例2Aと同様の方法によりポリイミド樹脂溶液を作製し、固形分濃度10.0質量%のポリイミド樹脂溶液(3)を得た。
続いて、ポリイミド樹脂溶液(3)を100g中に、架橋剤として1,3-PBOを0.159g(0.0007モル)添加し、室温で1時間攪拌後、架橋剤とポリイミド樹脂とを含む固形分濃度10.14質量%のポリイミドワニスを得た。なお、1,3-PBOの添加量と3,5-DABAの添加量に基づいて計算されるオキサゾリル基/カルボキシル基のモル比は、1/2である。
得られたポリイミドワニスを用いて、実施例2Aと同様の方法によりフィルムを作製し、厚み24μmのフィルムを得た。結果を表1に示す。
<実施例3B>
ポリイミド樹脂溶液(3)に対する架橋剤1,3-PBOの添加量を0.319g(0.0015モル)に変更したこと以外は、実施例3Aと同様の方法により、ポリイミドワニスを作製し、架橋剤とポリイミド樹脂とを含む固形分濃度10.29質量%のポリイミドワニスを得た。なお、1,3-PBOの添加量と3,5-DABAの添加量に基づいて計算されるオキサゾリル基/カルボキシル基のモル比は、1/1である。
得られたポリイミドワニスを用いて、実施例3Aと同様の方法によりフィルムを作製し、厚み23μmのフィルムを得た。結果を表1に示す。<Example 3A>
The amount of BAFL was changed from 31.361 g (0.090 mol) to 27.876 g (0.080 mol) and the amount of 3,5-DABA was changed from 1.522 g (0.010 mol) to 3.043 g (0.080 mol). 020 mol), a polyimide resin solution was prepared in the same manner as in Example 2A to obtain a polyimide resin solution (3) having a solid concentration of 10.0% by mass.
Subsequently, 0.159 g (0.0007 mol) of 1,3-PBO as a cross-linking agent is added to 100 g of the polyimide resin solution (3), and after stirring at room temperature for 1 hour, the cross-linking agent and the polyimide resin are added. A polyimide varnish having a solid content concentration of 10.14% by mass was obtained. The molar ratio of oxazolyl group/carboxyl group calculated based on the added amount of 1,3-PBO and the added amount of 3,5-DABA is 1/2.
Using the obtained polyimide varnish, a film was produced in the same manner as in Example 2A to obtain a film with a thickness of 24 μm. Table 1 shows the results.
<Example 3B>
A polyimide varnish was prepared and crosslinked in the same manner as in Example 3A, except that the amount of the crosslinking agent 1,3-PBO added to the polyimide resin solution (3) was changed to 0.319 g (0.0015 mol). A polyimide varnish having a solid concentration of 10.29% by mass containing the agent and the polyimide resin was obtained. The molar ratio of oxazolyl group/carboxyl group calculated based on the added amount of 1,3-PBO and the added amount of 3,5-DABA is 1/1.
Using the obtained polyimide varnish, a film was produced in the same manner as in Example 3A to obtain a film with a thickness of 23 μm. Table 1 shows the results.
<比較例3>
ポリイミド樹脂溶液(3)に対して架橋剤1,3-PBOを添加しなかったこと以外は、実施例3Aと同様の方法により、ポリイミドワニスを作製した。即ち、ポリイミド樹脂溶液(3)を、そのままポリイミドワニスとして用いた。
得られたポリイミドワニスを用いて、実施例3Aと同様の方法によりフィルムを作製し、厚み20μmのフィルムを得た。結果を表1に示す。<Comparative Example 3>
A polyimide varnish was produced in the same manner as in Example 3A, except that the cross-linking agent 1,3-PBO was not added to the polyimide resin solution (3). That is, the polyimide resin solution (3) was directly used as the polyimide varnish.
Using the obtained polyimide varnish, a film was produced in the same manner as in Example 3A to obtain a film with a thickness of 20 μm. Table 1 shows the results.
<実施例4A>
BAFLの量を31.361g(0.090モル)から17.423g(0.050モル)に変更し、3,5-DABAの量を1.522g(0.010モル)から7.608g(0.050モル)に変更した以外は、実施例2Aと同様の方法によりポリイミド樹脂溶液を作製し、固形分濃度10.0質量%のポリイミド樹脂溶液(4)を得た。
続いて、ポリイミド樹脂溶液(4)を100g中に、架橋剤として1,3-PBOを0.445g(0.0021モル)添加し、室温で1時間攪拌後、架橋剤とポリイミド樹脂とを含む固形分濃度10.40質量%のポリイミドワニスを得た。なお、1,3-PBOの添加量と3,5-DABAの添加量に基づいて計算されるオキサゾリル基/カルボキシル基のモル比は、1/2である。
得られたポリイミドワニスを用いて、実施例2Aと同様の方法によりフィルムを作製し、厚み12μmのフィルムを得た。結果を表1に示す。
<実施例4B>
ポリイミド樹脂溶液(4)に対する架橋剤1,3-PBOの添加量を0.890g(0.0041モル)に変更したこと以外は、実施例4Aと同様の方法により、ポリイミドワニスを作製し、架橋剤とポリイミド樹脂とを含む固形分濃度10.79質量%のポリイミドワニスを得た。なお、1,3-PBOの添加量と3,5-DABAの添加量に基づいて計算されるオキサゾリル基/カルボキシル基のモル比は、1/1である。
得られたポリイミドワニスを用いて、実施例4Aと同様の方法によりフィルムを作製し、厚み15μmのフィルムを得た。結果を表1に示す。<Example 4A>
The amount of BAFL was changed from 31.361 g (0.090 mol) to 17.423 g (0.050 mol) and the amount of 3,5-DABA was changed from 1.522 g (0.010 mol) to 7.608 g (0 050 mol), a polyimide resin solution was prepared in the same manner as in Example 2A to obtain a polyimide resin solution (4) having a solid concentration of 10.0% by mass.
Subsequently, 0.445 g (0.0021 mol) of 1,3-PBO as a cross-linking agent is added to 100 g of the polyimide resin solution (4), and after stirring for 1 hour at room temperature, the cross-linking agent and the polyimide resin are added. A polyimide varnish having a solid content concentration of 10.40% by mass was obtained. The molar ratio of oxazolyl group/carboxyl group calculated based on the added amount of 1,3-PBO and the added amount of 3,5-DABA is 1/2.
Using the obtained polyimide varnish, a film was produced in the same manner as in Example 2A to obtain a film with a thickness of 12 μm. Table 1 shows the results.
<Example 4B>
A polyimide varnish was prepared and crosslinked in the same manner as in Example 4A, except that the amount of the crosslinking agent 1,3-PBO added to the polyimide resin solution (4) was changed to 0.890 g (0.0041 mol). A polyimide varnish having a solid concentration of 10.79% by mass containing the agent and the polyimide resin was obtained. The molar ratio of oxazolyl group/carboxyl group calculated based on the added amount of 1,3-PBO and the added amount of 3,5-DABA is 1/1.
Using the obtained polyimide varnish, a film was produced in the same manner as in Example 4A to obtain a film with a thickness of 15 μm. Table 1 shows the results.
<比較例4>
ポリイミド樹脂溶液(4)に対して架橋剤1,3-PBOを添加しなかったこと以外は、実施例4Aと同様の方法により、ポリイミドワニスを作製した。即ち、ポリイミド樹脂溶液(4)を、そのままポリイミドワニスとして用いた。
得られたポリイミドワニスを用いて、実施例4Aと同様の方法によりフィルムを作製し、厚み20μmのフィルムを得た。結果を表1に示す。<Comparative Example 4>
A polyimide varnish was produced in the same manner as in Example 4A, except that the cross-linking agent 1,3-PBO was not added to the polyimide resin solution (4). That is, the polyimide resin solution (4) was used as it was as a polyimide varnish.
Using the obtained polyimide varnish, a film was produced in the same manner as in Example 4A to obtain a film with a thickness of 20 μm. Table 1 shows the results.
<実施例5>
HPMDAの量を22.417g(0.100モル)から11.209g(0.050モル)に変更し、CpODAを19.219g(0.050モル)追加した以外は、実施例1Aと同様の方法によりポリイミド樹脂溶液を作製し、固形分濃度10.0質量%のポリイミド樹脂溶液(5)を得た。
続いて、ポリイミド樹脂溶液(5)を100g中に、架橋剤として1,3-PBOを0.372g(0.0017モル)添加し、室温で1時間攪拌後、架橋剤とポリイミド樹脂とを含む固形分濃度10.33質量%のポリイミドワニスを得た。なお、1,3-PBOの添加量と3,5-DABAの添加量に基づいて計算されるオキサゾリル基/カルボキシル基のモル比は、1/1である。
得られたポリイミドワニスを用いて、実施例1Aと同様の方法によりフィルムを作製し、厚み9μmのフィルムを得た。結果を表1に示す。<Example 5>
Same procedure as in Example 1A except that the amount of HPMDA was changed from 22.417 g (0.100 mol) to 11.209 g (0.050 mol) and 19.219 g (0.050 mol) of CpODA was added. to prepare a polyimide resin solution (5) having a solid concentration of 10.0% by mass.
Subsequently, 0.372 g (0.0017 mol) of 1,3-PBO as a cross-linking agent is added to 100 g of the polyimide resin solution (5), and after stirring at room temperature for 1 hour, the cross-linking agent and the polyimide resin are added. A polyimide varnish having a solid concentration of 10.33% by mass was obtained. The molar ratio of oxazolyl group/carboxyl group calculated based on the added amount of 1,3-PBO and the added amount of 3,5-DABA is 1/1.
Using the obtained polyimide varnish, a film was produced in the same manner as in Example 1A to obtain a film with a thickness of 9 μm. Table 1 shows the results.
<比較例5>
ポリイミド樹脂溶液(5)に対して架橋剤1,3-PBOを添加しなかったこと以外は、実施例5と同様の方法により、ポリイミドワニスを作製した。即ち、ポリイミド樹脂溶液(5)を、そのままポリイミドワニスとして用いた。
得られたポリイミドワニスを用いて、実施例5と同様の方法によりフィルムを作製し、厚み9μmのフィルムを得た。結果を表1に示す。<Comparative Example 5>
A polyimide varnish was produced in the same manner as in Example 5, except that the cross-linking agent 1,3-PBO was not added to the polyimide resin solution (5). That is, the polyimide resin solution (5) was used as it was as a polyimide varnish.
Using the obtained polyimide varnish, a film was produced in the same manner as in Example 5 to obtain a film with a thickness of 9 μm. Table 1 shows the results.
<実施例6>
HPMDAの量を22.417g(0.100モル)から20.175g(0.090モル)に変更し、s-BPDAを2.942g(0.010モル)追加した以外は、実施例1Aと同様の方法によりポリイミド樹脂溶液を作製し、固形分濃度10.0質量%のポリイミド樹脂溶液(6)を得た。
続いて、ポリイミド樹脂溶液(6)を100g中に、架橋剤として1,3-PBOを0.424g(0.0020モル)添加し、室温で1時間攪拌後、架橋剤とポリイミド樹脂とを含む固形分濃度10.38質量%のポリイミドワニスを得た。なお、1,3-PBOの添加量と3,5-DABAの添加量に基づいて計算されるオキサゾリル基/カルボキシル基のモル比は、1/1である。
得られたポリイミドワニスを用いて、実施例1Aと同様の方法によりフィルムを作製し、厚み20μmのフィルムを得た。結果を表1に示す。<Example 6>
Same as Example 1A except the amount of HPMDA was changed from 22.417 g (0.100 mol) to 20.175 g (0.090 mol) and 2.942 g (0.010 mol) of s-BPDA was added. A polyimide resin solution was prepared by the method of No. to obtain a polyimide resin solution (6) having a solid concentration of 10.0 mass %.
Subsequently, 0.424 g (0.0020 mol) of 1,3-PBO as a cross-linking agent is added to 100 g of the polyimide resin solution (6), and after stirring at room temperature for 1 hour, the cross-linking agent and the polyimide resin are added. A polyimide varnish having a solid content concentration of 10.38% by mass was obtained. The molar ratio of oxazolyl group/carboxyl group calculated based on the added amount of 1,3-PBO and the added amount of 3,5-DABA is 1/1.
Using the obtained polyimide varnish, a film was produced in the same manner as in Example 1A to obtain a film with a thickness of 20 μm. Table 1 shows the results.
<比較例6>
ポリイミド樹脂溶液(6)に対して架橋剤1,3-PBOを添加しなかったこと以外は、実施例6と同様の方法により、ポリイミドワニスを作製した。即ち、ポリイミド樹脂溶液(6)を、そのままポリイミドワニスとして用いた。
得られたポリイミドワニスを用いて、実施例6と同様の方法によりフィルムを作製し、厚み17μmのフィルムを得た。結果を表1に示す。<Comparative Example 6>
A polyimide varnish was produced in the same manner as in Example 6, except that the cross-linking agent 1,3-PBO was not added to the polyimide resin solution (6). That is, the polyimide resin solution (6) was directly used as the polyimide varnish.
Using the obtained polyimide varnish, a film was produced in the same manner as in Example 6 to obtain a film with a thickness of 17 μm. Table 1 shows the results.
<比較例7A>
ポリイミド樹脂溶液(1)に対して添加する架橋剤を、1,3-PBOを0.216g(0.001モル)からTGを0.500g(0.0017モル)に変更したこと以外は、実施例1Aと同様の方法により、ポリイミドワニスを作製し、架橋剤とポリイミド樹脂とを含む固形分濃度10.45質量%のポリイミドワニスを得た。
続いてガラス板上へ、得られたポリイミドワニスを塗布し、ホットプレートで80℃、20分間保持し、その後、窒素雰囲気下、熱風乾燥機中350℃で30分加熱し溶媒を蒸発させ、厚み20μmのフィルムを得た。得られたフィルムには全面に点状欠点が見られた。結果を表2に示す。<Comparative Example 7A>
The cross-linking agent added to the polyimide resin solution (1) was changed from 0.216 g (0.001 mol) of 1,3-PBO to 0.500 g (0.0017 mol) of TG. A polyimide varnish was prepared in the same manner as in Example 1A to obtain a polyimide varnish containing a cross-linking agent and a polyimide resin and having a solid concentration of 10.45% by mass.
Subsequently, the resulting polyimide varnish is applied onto a glass plate, held on a hot plate at 80 ° C. for 20 minutes, and then heated in a hot air dryer at 350 ° C. for 30 minutes in a nitrogen atmosphere to evaporate the solvent. A 20 μm film was obtained. The obtained film had dotted defects on the entire surface. Table 2 shows the results.
<比較例7B>
ポリイミド樹脂溶液(1)に対する架橋剤TGの添加量を1.000g(0.0034モル)に変更したこと以外は、比較例7Aと同様の方法により、ポリイミドワニスを作製し、架橋剤とポリイミド樹脂とを含む固形分濃度10.89質量%のポリイミドワニスを得た。
得られたポリイミドワニスを用いて、比較例7Aと同様の方法によりフィルムを作製し、厚み22μmのフィルムを得た。得られたフィルムには全面に点状欠点が見られた。結果を表2に示す。<Comparative Example 7B>
A polyimide varnish was prepared in the same manner as in Comparative Example 7A, except that the amount of the cross-linking agent TG added to the polyimide resin solution (1) was changed to 1.000 g (0.0034 mol). A polyimide varnish having a solid content concentration of 10.89% by mass was obtained.
Using the obtained polyimide varnish, a film was produced in the same manner as in Comparative Example 7A to obtain a film with a thickness of 22 μm. The obtained film had dotted defects on the entire surface. Table 2 shows the results.
<比較例8A>
ステンレス製半月型撹拌翼、窒素導入管、冷却管を取り付けたディーンスターク、温度計、ガラス製エンドキャップを備えた1Lの5つ口丸底フラスコに、mTBを10.615g(0.050モル)と、3,5-DABAを7.608g(0.050モル)と、γ-ブチロラクトン(三菱ケミカル株式会社製)を48.767g投入し、系内温度70℃、窒素雰囲気下、回転数200rpmで撹拌して溶液を得た。
この溶液に、HPMDAを22.417g(0.100モル)と、N,N’-ジメチルアセトアミド(三菱ガス化学株式会社製)を12.192gとを一括で添加した後、イミド化触媒としてトリエチルアミン(関東化学株式会社製)を0.506g投入し、マントルヒーターで加熱し、約20分かけて反応系内温度を180℃まで上げた。留去される成分を捕集し、回転数を粘度上昇に合わせて調整しつつ、反応系内温度を180℃に保持して5時間還流した。
その後、N,N’-ジメチルアセトアミド(三菱ガス化学株式会社製)を280.466g添加して、反応系内温度を120℃まで冷却した後、更に約3時間撹拌して均一化して、固形分濃度10.0質量%のポリイミド樹脂溶液(7)を得た。
続いて、ポリイミド樹脂溶液(7)を100g中に、架橋剤として1,3-PBOを1.425g(0.0066モル)添加し、室温で1時間攪拌後、架橋剤とポリイミド樹脂とを含む固形分濃度11.26質量%のポリイミドワニスを得た。なお、1,3-PBOの添加量と3,5-DABAの添加量に基づいて計算されるオキサゾリル基/カルボキシル基のモル比は、1/1である。
続いてガラス板上へ、得られたポリイミドワニスを塗布し、ホットプレートで80℃、20分間保持し、その後、窒素雰囲気下、熱風乾燥機中350℃で30分加熱し溶媒を蒸発させ、厚み16μmのフィルムを得た。結果を表3に示す。<Comparative Example 8A>
10.615 g (0.050 mol) of mTB was added to a 1 L 5-necked round-bottom flask equipped with a stainless steel half-moon stirrer, a nitrogen inlet tube, a Dean Stark condenser, a thermometer, and a glass end cap. Then, 7.608 g (0.050 mol) of 3,5-DABA and 48.767 g of γ-butyrolactone (manufactured by Mitsubishi Chemical Corporation) were added, and the temperature in the system was 70 ° C., under a nitrogen atmosphere, at a rotation speed of 200 rpm. Stir to obtain a solution.
To this solution, 22.417 g (0.100 mol) of HPMDA and 12.192 g of N,N'-dimethylacetamide (Mitsubishi Gas Chemical Co., Ltd.) were added all at once, followed by triethylamine ( 0.506 g of Kanto Kagaku Co., Ltd.) was added and heated with a mantle heater to raise the temperature in the reaction system to 180° C. over about 20 minutes. The components to be distilled off were collected, and the temperature in the reaction system was maintained at 180° C. and refluxed for 5 hours while adjusting the number of revolutions according to the increase in viscosity.
After that, 280.466 g of N,N'-dimethylacetamide (manufactured by Mitsubishi Gas Chemical Co., Ltd.) is added, and the temperature in the reaction system is cooled to 120 ° C., and then stirred for about 3 hours to homogenize the solid content. A polyimide resin solution (7) having a concentration of 10.0% by mass was obtained.
Subsequently, 1.425 g (0.0066 mol) of 1,3-PBO as a cross-linking agent is added to 100 g of the polyimide resin solution (7), and after stirring at room temperature for 1 hour, the cross-linking agent and the polyimide resin are added. A polyimide varnish having a solid content concentration of 11.26% by mass was obtained. The molar ratio of oxazolyl group/carboxyl group calculated based on the added amount of 1,3-PBO and the added amount of 3,5-DABA is 1/1.
Subsequently, the resulting polyimide varnish is applied onto a glass plate, held on a hot plate at 80 ° C. for 20 minutes, and then heated in a hot air dryer at 350 ° C. for 30 minutes in a nitrogen atmosphere to evaporate the solvent. A 16 μm film was obtained. Table 3 shows the results.
<比較例8B>
ポリイミド樹脂溶液(7)に対して架橋剤1,3-PBOを添加しなかったこと以外は、比較例8Aと同様の方法により、ポリイミドワニスを作製した。即ち、ポリイミド樹脂溶液(7)を、そのままポリイミドワニスとして用いた。
得られたポリイミドワニスを用いて、比較例8Aと同様の方法によりフィルムを作製し、厚み15μmのフィルムを得た。結果を表3に示す。<Comparative Example 8B>
A polyimide varnish was prepared in the same manner as in Comparative Example 8A, except that the cross-linking agent 1,3-PBO was not added to the polyimide resin solution (7). That is, the polyimide resin solution (7) was directly used as the polyimide varnish.
Using the obtained polyimide varnish, a film was produced in the same manner as in Comparative Example 8A to obtain a film with a thickness of 15 μm. Table 3 shows the results.
表1に示されるように、実施例のフィルムは、いずれも機械的特性、耐有機溶媒性、無色透明性、及び光学的等方性に優れていた。
特に、1,3-PBOを添加することにより、耐有機溶媒性が向上することが確認された(実施例1A及び1Bと比較例1との対比、実施例2A及び2Bと比較例2との対比、実施例3A及び3Bと比較例3との対比、実施例4A及び4Bと比較例4との対比、実施例5と比較例5との対比、並びに実施例6と比較例6との対比)。
また、驚くことに、1,3-PBOを添加しても光学的等方性を維持できる(実施例1A及び1Bと比較例1との対比)か、又は1,3-PBOを添加ことにより光学的等方性が向上する(実施例2A及び2Bと比較例2との対比、実施例3A及び3Bと比較例3との対比、実施例4A及び4Bと比較例4との対比、実施例5と比較例5との対比、並びに実施例6と比較例6との対比)ことが確認された。As shown in Table 1, the films of Examples were all excellent in mechanical properties, organic solvent resistance, colorless transparency, and optical isotropy.
In particular, it was confirmed that the addition of 1,3-PBO improves the organic solvent resistance (comparison between Examples 1A and 1B and Comparative Example 1, comparison between Examples 2A and 2B and Comparative Example 2). Comparison, comparison between Examples 3A and 3B and Comparative Example 3, comparison between Examples 4A and 4B and Comparative Example 4, comparison between Example 5 and Comparative Example 5, and comparison between Example 6 and Comparative Example 6 ).
Surprisingly, even if 1,3-PBO is added, optical isotropy can be maintained (comparison with Examples 1A and 1B and Comparative Example 1), or by adding 1,3-PBO Optical isotropy is improved (comparison between Examples 2A and 2B and Comparative Example 2, comparison between Examples 3A and 3B and Comparative Example 3, comparison between Examples 4A and 4B and Comparative Example 4, Example 5 and Comparative Example 5, and Example 6 and Comparative Example 6).
架橋剤としてTG(少なくとも2つのオキサゾリル基を有する架橋剤ではない)を使用した比較例7A及び7Bで得られたフィルムは、均一なフィルムではなかった。ポリイミド樹脂と添加剤TGとの相溶性が悪く、分離しているためと考えられる。
また、表2に示されるように、比較例7Bのフィルムは、無色透明性が大きく劣っていた。The films obtained in Comparative Examples 7A and 7B using TG as a crosslinker (not a crosslinker with at least two oxazolyl groups) were not uniform films. This is probably because the polyimide resin and the additive TG have poor compatibility and are separated.
Moreover, as shown in Table 2, the film of Comparative Example 7B was significantly inferior in colorless transparency.
比較例8A及び8Bでは、ジアミン成分として、BAFL(式(b-1)で表される化合物)を使用せず、代わりにmTBを用いた。その結果得られた比較例8A及び8Bのフィルムは、光学的等方性に劣っていた。また、比較例8Bのフィルムは耐有機溶媒性に劣っていた。比較例8Aを比較例8Bと対比すると分かるように、1,3-PBOを添加することにより、耐有機溶媒性は向上するものの、無色透明性(全光線透過率、YI)が大幅に悪化した。その結果として、比較例8Aのフィルムは、実施例のフィルムと比べて無色透明性が大きく劣っていた。 In Comparative Examples 8A and 8B, mTB was used instead of BAFL (compound represented by formula (b-1)) as the diamine component. The resulting films of Comparative Examples 8A and 8B had poor optical isotropy. Also, the film of Comparative Example 8B was inferior in organic solvent resistance. As can be seen by comparing Comparative Example 8A with Comparative Example 8B, the addition of 1,3-PBO improved the organic solvent resistance, but the colorless transparency (total light transmittance, YI) was greatly deteriorated. . As a result, the film of Comparative Example 8A was significantly inferior in colorless transparency to the films of Examples.
Claims (8)
前記ポリイミド樹脂が、テトラカルボン酸二無水物に由来する構成単位A及びジアミンに由来する構成単位Bを有し、
構成単位Aが、下記式(a-1-1)で表される化合物に由来する構成単位(A-1-1)及び下記式(a-1-2)で表される化合物に由来する構成単位(A-1-2)からなる群より選ばれる少なくとも1つである構成単位(A-1)を含み、
構成単位Bが、下記式(b-1)で表される化合物に由来する構成単位(B-1)と、下記式(b-2)で表される化合物に由来する構成単位(B-2)とを含み、
構成単位B中における構成単位(B-1)の比率が75~99モル%であり、
構成単位B中における構成単位(B-2)の比率が1~25モル%である、ポリイミド樹脂組成物。
(式(b-1)中、Rはそれぞれ独立して、水素原子、フッ素原子、又はメチル基であり;式(b-2)中、Xは単結合、置換若しくは無置換のアルキレン基、カルボニル基、エーテル基、下記式(b-2-i)で表される基、又は下記式(b-2-ii)で表される基であり、pは0~2の整数であり、m1は0~4の整数であり、m2は0~4の整数である。ただし、pが0の場合、m1は1~4の整数である。)
(式(b-2-i)中、m3は0~5の整数であり;式(b-2-ii)中、m4は0~5の整数である。なお、m1+m2+m3+m4は1以上であり、pが2の場合、2つのX及び2つのm2~m4のそれぞれは独立して選択される。) A polyimide resin composition comprising a polyimide resin and a cross-linking agent having at least two oxazolyl groups,
The polyimide resin has a structural unit A derived from a tetracarboxylic dianhydride and a structural unit B derived from a diamine,
A constitution in which the structural unit A is derived from a structural unit (A-1-1) derived from a compound represented by the following formula (a-1-1) and a compound represented by the following formula (a-1-2) including a structural unit (A-1) that is at least one selected from the group consisting of units (A-1-2),
The structural unit B is a structural unit (B-1) derived from a compound represented by the following formula (b-1), and a structural unit (B-2) derived from a compound represented by the following formula (b-2) ) and
The ratio of the structural unit (B-1) in the structural unit B is 75 to 99 mol%,
A polyimide resin composition in which the ratio of the structural unit (B-2) in the structural unit B is 1 to 25 mol% .
(In formula (b-1), each R is independently a hydrogen atom, a fluorine atom, or a methyl group; In formula (b-2), X is a single bond, a substituted or unsubstituted alkylene group, carbonyl group, an ether group, a group represented by the following formula (b-2-i), or a group represented by the following formula (b-2-ii), p is an integer of 0 to 2, and m1 is is an integer of 0 to 4, and m2 is an integer of 0 to 4. However, when p is 0, m1 is an integer of 1 to 4.)
(In formula (b-2-i), m3 is an integer of 0 to 5; In formula (b-2-ii), m4 is an integer of 0 to 5. Note that m1 + m2 + m3 + m4 is 1 or more, When p is 2, each of the two Xs and the two m2-m4 are independently selected.)
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