JP7463964B2 - Polyimide resin, polyimide varnish and polyimide film - Google Patents

Polyimide resin, polyimide varnish and polyimide film Download PDF

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JP7463964B2
JP7463964B2 JP2020538359A JP2020538359A JP7463964B2 JP 7463964 B2 JP7463964 B2 JP 7463964B2 JP 2020538359 A JP2020538359 A JP 2020538359A JP 2020538359 A JP2020538359 A JP 2020538359A JP 7463964 B2 JP7463964 B2 JP 7463964B2
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晃久 松丸
重之 廣瀬
智寿 村山
孝博 村谷
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Mitsubishi Gas Chemical Co Inc
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1042Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
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    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
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    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
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    • C08J2379/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
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    • C08J2379/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

Description

本発明はポリイミド樹脂、ポリイミドワニス及びポリイミドフィルムに関する。 The present invention relates to polyimide resins, polyimide varnishes and polyimide films.

ポリイミド樹脂は、電気・電子部品等の分野において様々な利用が検討されている。例えば、液晶ディスプレイやOLEDディスプレイ等の画像表示装置に用いられるガラス基板を、デバイスの軽量化やフレキシブル化を目的として、プラスチック基板へ代替することが望まれており、当該プラスチック基板として適するポリイミドフィルムの研究が進められている。このような用途のポリイミドフィルムには無色透明性が求められる。
さらに、ポリイミドフィルムの要求特性として複屈折による位相差が小さく、リタデーションが低いことが求められる。
Various applications of polyimide resins are being considered in the fields of electric and electronic parts, etc. For example, it is desirable to replace glass substrates used in image display devices such as liquid crystal displays and OLED displays with plastic substrates in order to make the devices lighter and more flexible, and research on polyimide films suitable for such plastic substrates is being conducted. Polyimide films for such applications are required to be colorless and transparent.
Furthermore, the polyimide film is required to have a small phase difference due to birefringence and a low retardation.

特許文献1には、複屈折が低減したフィルムを与えるポリイミド樹脂として、ジアミンのアミノ基の少なくとも一方が主鎖に対してメタ位に結合しているジアミン(例えば、メタフェニレンジアミン)を用いて得られるポリイミド樹脂が開示されている。
特許文献2には、耐熱性、透過率、低線膨張係数及び低リタデーションに優れたフィルムを与えるポリイミド樹脂として、特定構造のテトラカルボン酸残基及びジアミン残基と、屈曲部位を有するテトラカルボン残基及び/又はジアミン残基とを含むポリイミド樹脂が開示され、具体的に、3,3’,4,4’-ビフェニルテトラカルボン酸二無水物、3,3’,4,4’-ビシクロヘキサンテトラカルボン酸二無水物、ピロメリット酸無水物、2,2’-ビス(トリフルオロメチル)ベンジジン、及び4,4’-ジアミノジフェニルスルホンを用いて得られるポリイミド樹脂が開示されている。
Patent Document 1 discloses a polyimide resin obtained by using a diamine in which at least one of the amino groups of the diamine is bonded to the meta position relative to the main chain (e.g., metaphenylenediamine) as a polyimide resin that can provide a film with reduced birefringence.
Patent Document 2 discloses a polyimide resin containing tetracarboxylic acid residues and diamine residues of specific structures, and tetracarboxylic acid residues and/or diamine residues having bending sites, as a polyimide resin that provides a film excellent in heat resistance, transmittance, low linear expansion coefficient, and low retardation. Specifically, the document discloses a polyimide resin obtained using 3,3',4,4'-biphenyltetracarboxylic acid dianhydride, 3,3',4,4'-bicyclohexanetetracarboxylic acid dianhydride, pyromellitic anhydride, 2,2'-bis(trifluoromethyl)benzidine, and 4,4'-diaminodiphenyl sulfone.

特開平8-134211号公報Japanese Patent Application Laid-Open No. 8-134211 国際公開第2015/125895号International Publication No. 2015/125895

上述のように、ポリイミドフィルムには様々な特性が要求されるが、それら特性を同時に満足させることは容易ではない。
本発明はこのような状況に鑑みてなされたものであり、本発明の課題は、無色透明性に優れ、更に低リタデーションであるフィルムの形成が可能なポリイミド樹脂、並びに該ポリイミド樹脂を含むポリイミドワニス及びポリイミドフィルムを提供することにある。
As described above, various characteristics are required for a polyimide film, and it is not easy to satisfy all of these characteristics at the same time.
The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a polyimide resin which is excellent in colorless transparency and is capable of forming a film having low retardation, and a polyimide varnish and a polyimide film which contain the polyimide resin.

本発明者らは、特定の構成単位の組み合わせを含むポリイミド樹脂が上記課題を解決できることを見出し、発明を完成させるに至った。The inventors discovered that a polyimide resin containing a specific combination of structural units can solve the above problems, and thus completed the invention.

即ち、本発明は、下記の[1]~[9]に関する。
[1]
テトラカルボン酸二無水物に由来する構成単位A及びジアミンに由来する構成単位Bを有するポリイミド樹脂であって、
構成単位Aが、下記式(a-1)で表される化合物に由来する構成単位(A-1)、及び下記式(a-2)で表される化合物に由来する構成単位(A-2)からなる群から選ばれる少なくとも1つの構成単位を含み、
構成単位Bが、下記一般式(b1-1)で表される化合物に由来する構成単位、及び下記一般式(b2-1)で表される化合物に由来する構成単位からなる群から選ばれる少なくとも1つの構成単位(B-1)を含む、ポリイミド樹脂。
That is, the present invention relates to the following [1] to [9].
[1]
A polyimide resin having a structural unit A derived from a tetracarboxylic dianhydride and a structural unit B derived from a diamine,
The structural unit A includes at least one structural unit selected from the group consisting of a structural unit (A-1) derived from a compound represented by the following formula (a-1) and a structural unit (A-2) derived from a compound represented by the following formula (a-2):
A polyimide resin, wherein the structural unit B includes at least one structural unit (B-1) selected from the group consisting of structural units derived from a compound represented by the following general formula (b1-1) and structural units derived from a compound represented by the following general formula (b2-1):

Figure 0007463964000001

(式中、X~Xはそれぞれ独立に、単結合、炭素数1~5のアルキレン基、炭素数2~5のアルキリデン基、-S-、-SO-、-SO-、-O-又は-CO-を示す。)
Figure 0007463964000001

(In the formula, X 1 to X 4 each independently represent a single bond, an alkylene group having 1 to 5 carbon atoms, an alkylidene group having 2 to 5 carbon atoms, -S-, -SO-, -SO 2 -, -O- or -CO-.)

[2]
構成単位B中における構成単位(B-1)の比率が5~100モル%である、上記[1]に記載のポリイミド樹脂。
[3]
構成単位Aが構成単位(A-1)を含み、構成単位A中における構成単位(A-1)の比率が45~100モル%である、上記[1]又は[2]に記載のポリイミド樹脂。
[4]
構成単位(B-1)が、下記式(b1-1-1)で表される化合物に由来する構成単位、下記式(b1-1-2)で表される化合物に由来する構成単位、及び下記式(b1-1-3)で表される化合物に由来する構成単位からなる群から選ばれる少なくとも1つの構成単位を含む、上記[1]~[3]のいずれかに記載のポリイミド樹脂。
[2]
The polyimide resin according to the above-mentioned [1], wherein the ratio of the structural unit (B-1) in the structural unit B is 5 to 100 mol %.
[3]
The polyimide resin according to the above [1] or [2], wherein the structural unit A contains the structural unit (A-1), and the ratio of the structural unit (A-1) in the structural unit A is 45 to 100 mol %.
[4]
The polyimide resin according to any one of the above [1] to [3], wherein the structural unit (B-1) includes at least one structural unit selected from the group consisting of a structural unit derived from a compound represented by the following formula (b1-1-1), a structural unit derived from a compound represented by the following formula (b1-1-2), and a structural unit derived from a compound represented by the following formula (b1-1-3):

Figure 0007463964000002
Figure 0007463964000002

[5]
構成単位Bが、さらに下記式(b-2)で表される化合物に由来する構成単位(B-2)、下記式(b-3)で表される化合物に由来する構成単位(B-3)、及び下記式(b-4)で表される化合物に由来する構成単位(B-4)からなる群から選ばれる少なくとも1つの構成単位を含む、上記[1]~[4]のいずれかに記載のポリイミド樹脂。
[5]
The polyimide resin according to any one of the above [1] to [4], wherein the structural unit B further comprises at least one structural unit selected from the group consisting of a structural unit (B-2) derived from a compound represented by the following formula (b-2), a structural unit (B-3) derived from a compound represented by the following formula (b-3), and a structural unit (B-4) derived from a compound represented by the following formula (b-4):

Figure 0007463964000003
Figure 0007463964000003

[6]
構成単位B中における構成単位(B-2)、構成単位(B-3)、及び構成単位(B-4)の合計が占める比率が5~95モル%である、上記[5]に記載のポリイミド樹脂。
[7]
構成単位Aが、さらに下記式(a-3)で表される化合物に由来する構成単位(A-3)を含む、上記[1]~[6]のいずれかに記載のポリイミド樹脂。
[6]
The polyimide resin according to the above item [5], wherein the total proportion of the structural units (B-2), (B-3), and (B-4) in the structural unit B is 5 to 95 mol %.
[7]
The polyimide resin according to any one of the above [1] to [6], wherein the structural unit A further contains a structural unit (A-3) derived from a compound represented by the following formula (a-3):

Figure 0007463964000004
Figure 0007463964000004

[8]
上記[1]~[7]のいずれかに記載のポリイミド樹脂が有機溶媒に溶解してなるポリイミドワニス。
[9]
上記[1]~[7]のいずれかに記載のポリイミド樹脂を含む、ポリイミドフィルム。
[8]
A polyimide varnish obtained by dissolving the polyimide resin according to any one of the above [1] to [7] in an organic solvent.
[9]
A polyimide film comprising the polyimide resin according to any one of [1] to [7] above.

本発明によれば、無色透明性に優れ、更に低リタデーションであるフィルムの形成が可能なポリイミド樹脂、並びに該ポリイミド樹脂を含むポリイミドワニス及びポリイミドフィルムを提供することができる。According to the present invention, it is possible to provide a polyimide resin capable of forming a film having excellent colorless transparency and low retardation, as well as a polyimide varnish and a polyimide film containing the polyimide resin.

[ポリイミド樹脂]
本発明のポリイミド樹脂は、テトラカルボン酸二無水物に由来する構成単位A及びジアミンに由来する構成単位Bを有し、構成単位Aが、下記式(a-1)で表される化合物に由来する構成単位(A-1)、及び下記式(a-2)で表される化合物に由来する構成単位(A-2)からなる群から選ばれる少なくとも1つの構成単位を含み、
構成単位Bが、下記一般式(b1-1)で表される化合物に由来する構成単位、及び下記一般式(b2-1)で表される化合物に由来する構成単位からなる群から選ばれる少なくとも1つの構成単位(B-1)を含む。
[Polyimide resin]
The polyimide resin of the present invention has a structural unit A derived from a tetracarboxylic dianhydride and a structural unit B derived from a diamine, in which the structural unit A includes at least one structural unit selected from the group consisting of a structural unit (A-1) derived from a compound represented by the following formula (a-1) and a structural unit (A-2) derived from a compound represented by the following formula (a-2):
The structural unit B contains at least one structural unit (B-1) selected from the group consisting of structural units derived from compounds represented by general formula (b1-1) below and structural units derived from compounds represented by general formula (b2-1) below:

Figure 0007463964000005

(式中、X~Xはそれぞれ独立に、単結合、炭素数1~5のアルキレン基、炭素数2~5のアルキリデン基、-S-、-SO-、-SO-、-O-又は-CO-を示す。)
Figure 0007463964000005

(In the formula, X 1 to X 4 each independently represent a single bond, an alkylene group having 1 to 5 carbon atoms, an alkylidene group having 2 to 5 carbon atoms, -S-, -SO-, -SO 2 -, -O- or -CO-.)

<構成単位A>
構成単位Aは、ポリイミド樹脂に占めるテトラカルボン酸二無水物に由来する構成単位であって、構成単位Aは、下記式(a-1)で表される化合物に由来する構成単位(A-1)、及び下記式(a-2)で表される化合物に由来する構成単位(A-2)からなる群から選ばれる少なくとも1つの構成単位を含む。

Figure 0007463964000006
<Structural Unit A>
The structural unit A is a structural unit derived from a tetracarboxylic dianhydride contained in a polyimide resin, and includes at least one structural unit selected from the group consisting of a structural unit (A-1) derived from a compound represented by the following formula (a-1) and a structural unit (A-2) derived from a compound represented by the following formula (a-2):
Figure 0007463964000006

式(a-1)で表される化合物は、1,2,4,5-シクロヘキサンテトラカルボン酸二無水物である。
構成単位Aが構成単位(A-1)を含むことによって、フィルムの無色透明性、耐熱性、及び熱安定性が向上する。
式(a-2)で表される化合物は、4,4’-(ヘキサフルオロイソプロピリデン)ジフタル酸無水物である。
構成単位Aが構成単位(A-2)を含むことよって、フィルムの透明性が向上し、ポリイミドの有機溶剤に対する溶解性が向上する。
The compound represented by formula (a-1) is 1,2,4,5-cyclohexanetetracarboxylic dianhydride.
When the structural unit A contains the structural unit (A-1), the colorless transparency, heat resistance, and thermal stability of the film are improved.
The compound represented by formula (a-2) is 4,4'-(hexafluoroisopropylidene)diphthalic anhydride.
When the structural unit A contains the structural unit (A-2), the transparency of the film is improved, and the solubility of the polyimide in organic solvents is improved.

構成単位Aは、構成単位(A-1)、及び構成単位(A-2)の両方を含んでいてもよいが、好ましくは構成単位(A-1)、又は構成単位(A-2)のいずれか一方を含み、より好ましくは構成単位(A-1)を含む。The structural unit A may contain both the structural unit (A-1) and the structural unit (A-2), but preferably contains either the structural unit (A-1) or the structural unit (A-2), and more preferably contains the structural unit (A-1).

構成単位Aが構成単位(A-1)及び構成単位(A-2)を含む場合、構成単位A中における構成単位(A-1)及び(A-2)の合計の比率は、好ましくは50モル%以上、より好ましくは70モル%以上、更に好ましくは90モル%以上、特に好ましくは99モル%以上である。構成単位(A-1)及び(A-2)の合計の比率の上限値は特に限定されず、即ち、100モル%である。When structural unit A contains structural unit (A-1) and structural unit (A-2), the total ratio of structural units (A-1) and (A-2) in structural unit A is preferably 50 mol% or more, more preferably 70 mol% or more, even more preferably 90 mol% or more, and particularly preferably 99 mol% or more. There is no particular upper limit to the total ratio of structural units (A-1) and (A-2), that is, it is 100 mol%.

構成単位Aが構成単位(A-1)を含む場合、構成単位A中における構成単位(A-1)の比率は、好ましくは45モル%以上、より好ましくは70モル%以上、更に好ましくは90モル%以上、特に好ましくは99モル%以上である。その比率の上限値は特に限定されず、即ち、100モル%である。同様に、構成単位A中における構成単位(A-1)の比率は、好ましくは45~100モル%、より好ましくは70~100モル%、更に好ましくは90~100モル%、特に好ましくは99~100モル%である。
構成単位Aが構成単位(A-2)を含む場合、構成単位A中における構成単位(A-2)の比率は、好ましくは45モル%以上、より好ましくは70モル%以上、更に好ましくは90モル%以上、特に好ましくは99モル%以上である。その比率の上限値は特に限定されず、即ち、100モル%である。同様に、構成単位A中における構成単位(A-2)の比率は、好ましくは45~100モル%、より好ましくは70~100モル%、更に好ましくは90~100モル%、特に好ましくは99~100モル%である。
When the structural unit A contains the structural unit (A-1), the ratio of the structural unit (A-1) in the structural unit A is preferably 45 mol% or more, more preferably 70 mol% or more, even more preferably 90 mol% or more, and particularly preferably 99 mol% or more. The upper limit of the ratio is not particularly limited, that is, it is 100 mol%. Similarly, the ratio of the structural unit (A-1) in the structural unit A is preferably 45 to 100 mol%, more preferably 70 to 100 mol%, even more preferably 90 to 100 mol%, and particularly preferably 99 to 100 mol%.
When the structural unit A contains the structural unit (A-2), the ratio of the structural unit (A-2) in the structural unit A is preferably 45 mol% or more, more preferably 70 mol% or more, even more preferably 90 mol% or more, and particularly preferably 99 mol% or more. The upper limit of the ratio is not particularly limited, that is, it is 100 mol%. Similarly, the ratio of the structural unit (A-2) in the structural unit A is preferably 45 to 100 mol%, more preferably 70 to 100 mol%, even more preferably 90 to 100 mol%, and particularly preferably 99 to 100 mol%.

構成単位Aは、さらに下記式(a-3)で表される化合物に由来する構成単位(A-3)を含んでいてもよい。The structural unit A may further contain a structural unit (A-3) derived from a compound represented by the following formula (a-3):

Figure 0007463964000007
Figure 0007463964000007

式(a-3)で表される化合物は、ノルボルナン-2-スピロ-α-シクロペンタノン-α’-スピロ-2’’-ノルボルナン-5,5’’,6,6’’-テトラカルボン酸二無水物である。構成単位Aが構成単位(A-3)を含むことよって、フィルムの無色透明性が向上する。The compound represented by formula (a-3) is norbornane-2-spiro-α-cyclopentanone-α'-spiro-2"-norbornane-5,5",6,6"-tetracarboxylic dianhydride. The colorless transparency of the film is improved by including structural unit (A-3) in structural unit A.

構成単位Aが構成単位(A-3)を含む場合、構成単位A中における構成単位(A-13)の比率は、好ましくは55モル%以下、より好ましくは30モル%以下である。
構成単位Aが構成単位(A-3)を含む場合、構成単位Aは、好ましくは構成単位(A-1)及び構成単位(A-3)を含み、より好ましくは構成単位(A-1)及び構成単位(A-3)からなる。
When the structural unit A contains the structural unit (A-3), the amount of the structural unit (A-13) in the structural unit A is preferably no greater than 55 mol %, and more preferably no greater than 30 mol %.
When the structural unit A contains the structural unit (A-3), the structural unit A preferably contains the structural unit (A-1) and the structural unit (A-3), and more preferably consists of the structural unit (A-1) and the structural unit (A-3).

構成単位Aは、本発明の効果を損なわない範囲で、構成単位(A-1)~(A-3)以外の構成単位を含んでもよい。そのような構成単位を与えるテトラカルボン酸二無水物としては、特に限定されないが、ピロメリット酸二無水物、3,3’,4,4’-ジフェニルスルホンテトラカルボン酸二無水物、3,3’,4,4’-ベンゾフェノンテトラカルボン酸二無水物、2,2’,3,3’-ベンゾフェノンテトラカルボン酸二無水物、4,4’-オキシジフタル酸無水物、3,3’,4,4’-ビフェニルテトラカルボン酸二無水物、2,3,3’,4’-ビフェニルテトラカルボン酸二無水物、2,2’,3,3’-ビフェニルテトラカルボン酸二無水物等の芳香族テトラカルボン酸二無水物;1,2,3,4-シクロブタンテトラカルボン酸二無水物、1,2,4,5-シクロペンタンテトラカルボン酸二無水物、ビシクロ[2.2.2]オクタ-7-エン-2,3,5,6-テトラカルボン酸二無水物、及びジシクロヘキシルテトラカルボン酸二無水物等の脂環式テトラカルボン酸二無水物;並びに1,2,3,4-ブタンテトラカルボン酸二無水物等の脂肪族テトラカルボン酸二無水物が挙げられる。
なお、本明細書において、芳香族テトラカルボン酸二無水物とは芳香環を1つ以上含むテトラカルボン酸二無水物を意味し、脂環式テトラカルボン酸二無水物とは脂環を1つ以上含み、かつ芳香環を含まないテトラカルボン酸二無水物を意味し、脂肪族テトラカルボン酸二無水物とは芳香環も脂環も含まないテトラカルボン酸二無水物を意味する。
構成単位Aに任意に含まれる構成単位(A-1)~(A-3)以外の構成単位は、1種でもよいし、2種以上であってもよい。
構成単位Aは、前記構成単位(A-1)~(A-3)以外の構成単位を含まないことが好ましい。
The structural unit A may contain structural units other than the structural units (A-1) to (A-3) as long as the effects of the present invention are not impaired. The tetracarboxylic dianhydride that gives such a structural unit is not particularly limited, but may be pyromellitic dianhydride, 3,3',4,4'-diphenylsulfonetetracarboxylic dianhydride, 3,3',4,4'-benzophenonetetracarboxylic dianhydride, 2,2',3,3'-benzophenonetetracarboxylic dianhydride, 4,4'-oxydiphthalic anhydride, 3,3',4,4'-biphenyltetracarboxylic dianhydride, 2,3,3',4'-biphenyltetracarboxylic dianhydride, 2,2',3, Examples of the tetracarboxylic acid dianhydride include aromatic tetracarboxylic acid dianhydrides such as 3'-biphenyltetracarboxylic acid dianhydride; alicyclic tetracarboxylic acid dianhydrides such as 1,2,3,4-cyclobutanetetracarboxylic acid dianhydride, 1,2,4,5-cyclopentanetetracarboxylic acid dianhydride, bicyclo[2.2.2]oct-7-ene-2,3,5,6-tetracarboxylic acid dianhydride, and dicyclohexyltetracarboxylic acid dianhydride; and aliphatic tetracarboxylic acid dianhydrides such as 1,2,3,4-butanetetracarboxylic acid dianhydride.
In this specification, the term "aromatic tetracarboxylic acid dianhydride" refers to a tetracarboxylic acid dianhydride containing one or more aromatic rings, the term "alicyclic tetracarboxylic acid dianhydride" refers to a tetracarboxylic acid dianhydride containing one or more alicyclic rings but no aromatic rings, and the term "aliphatic tetracarboxylic acid dianhydride" refers to a tetracarboxylic acid dianhydride containing neither an aromatic ring nor an alicyclic ring.
The structural units other than the structural units (A-1) to (A-3) optionally contained in the structural unit A may be of one type, or of two or more types.
It is preferable that the structural unit A does not contain any structural units other than the structural units (A-1) to (A-3).

<構成単位B>
構成単位Bは、ポリイミド樹脂に占めるジアミンに由来する構成単位であって、下記一般式(b1-1)で表される化合物に由来する構成単位、及び下記一般式(b2-1)で表される化合物に由来する構成単位からなる群から選ばれる少なくとも1つの構成単位(B-1)を含む。
<Structural Unit B>
The structural unit B is a structural unit derived from a diamine in a polyimide resin, and includes at least one structural unit (B-1) selected from the group consisting of structural units derived from a compound represented by general formula (b1-1) below, and structural units derived from a compound represented by general formula (b2-1) below:

Figure 0007463964000008
Figure 0007463964000008

式(b1-1)及び(b2-1)中、X~Xはそれぞれ独立に、単結合、炭素数1~5のアルキレン基、炭素数2~5のアルキリデン基、-S-、-SO-、-SO-、-O-又は-CO-を示す。
構成単位Bが構成単位(B-1)を含むことによって、フィルムの無色透明性が向上し、リタデーション値が低下する。構成単位(B-1)は、1種でもよいし、2種以上であってもよい。
In formulae (b1-1) and (b2-1), X 1 to X 4 each independently represent a single bond, an alkylene group having 1 to 5 carbon atoms, an alkylidene group having 2 to 5 carbon atoms, -S-, -SO-, -SO 2 -, -O- or -CO-.
When the structural unit B contains the structural unit (B-1), the colorless transparency of the film is improved and the retardation value is reduced. The structural unit (B-1) may be one type or two or more types.

一般式(b1-1)で表される化合物は、X及びXを介して3つのベンゼン環が連結し、中央のベンゼン環の1,3位にX及びXが結合した骨格を有し、一般式(b2-1)で表される化合物は、X及びXを介して3つのベンゼン環が連結し、中央のベンゼン環の1,2位にX及びXが結合した骨格を有している。ポリイミド樹脂における構成単位B中にこのような骨格構造を有することにより、低リタデーションに優れたフィルムを形成することが可能となる。 The compound represented by the general formula (b1-1) has a skeleton in which three benzene rings are linked via X1 and X2 , and X1 and X2 are bonded to the 1- and 3-positions of the central benzene ring, and the compound represented by the general formula (b2-1) has a skeleton in which three benzene rings are linked via X3 and X4 , and X3 and X4 are bonded to the 1- and 2-positions of the central benzene ring. By having such a skeleton structure in the structural unit B in the polyimide resin, it is possible to form a film with excellent low retardation.

一般式(b1-1)及び(b2-1)におけるX~Xは、低リタデーションに優れたフィルムを形成する観点から、それぞれ独立に、好ましくは炭素数3~5のアルキリデン基、-SO-、又は-O-を示し、より好ましくは炭素数3~5のアルキリデン基、又は-O-を示し、更に好ましくはイソプロピリデン基、又は-O-を示し、より更に好ましくはイソプロピリデン基を示す。
一般式(b1-1)におけるX及びXは、それぞれ異なる基を有していてもよいが、同一の基であることが好ましい。同様に、式(b2-1)におけるX及びXは、それぞれ異なる基を有していてもよいが、同一の基であることが好ましい。
一般式(b1-1)及び(b2-1)におけるアミノ基は、各々のアミノ基が結合するベンゼン環と結合するX~Xのいずれかに対して、このベンゼン環のパラ位又はメタ位に結合することが好ましい。
In general formulae (b1-1) and (b2-1), X 1 to X 4 each independently represent, from the viewpoint of forming a film having excellent low retardation, preferably an alkylidene group having 3 to 5 carbon atoms, -SO 2 -, or -O-, more preferably an alkylidene group having 3 to 5 carbon atoms, or -O-, even more preferably an isopropylidene group, or -O-, and still more preferably an isopropylidene group.
X1 and X2 in formula (b1-1) may each have a different group, but are preferably the same group. Similarly, X3 and X4 in formula (b2-1) may each have a different group, but are preferably the same group.
The amino group in general formulae (b1-1) and (b2-1) is preferably bonded to the para- or meta-position of the benzene ring relative to any one of X 1 to X 4 bonded to the benzene ring to which the respective amino group is bonded.

構成単位(B-1)は、上記一般式(b1-1)で表される化合物に由来する構成単位を含むことが好ましく、下記式(b1-1-1)で表される化合物に由来する構成単位、下記式(b1-1-2)で表される化合物に由来する構成単位、及び下記式(b1-1-3)で表される化合物に由来する構成単位からなる群から選ばれる少なくとも1つの構成単位を含むことがより好ましい。The structural unit (B-1) preferably contains a structural unit derived from a compound represented by the above general formula (b1-1), and more preferably contains at least one structural unit selected from the group consisting of a structural unit derived from a compound represented by the following formula (b1-1-1), a structural unit derived from a compound represented by the following formula (b1-1-2), and a structural unit derived from a compound represented by the following formula (b1-1-3).

Figure 0007463964000009
Figure 0007463964000009

式(b1-1-1)で表される化合物は、1,3-ビス[2-(4-アミノフェニル)-2-プロピル]ベンゼンであり、
式(b1-1-2)で表される化合物は、1,3-ビス(4-アミノフェノキシ)ベンゼンであり、
式(b1-1-3)で表される化合物は、1,3-ビス(3-アミノフェノキシ)ベンゼンである。
The compound represented by formula (b1-1-1) is 1,3-bis[2-(4-aminophenyl)-2-propyl]benzene,
The compound represented by formula (b1-1-2) is 1,3-bis(4-aminophenoxy)benzene,
The compound represented by formula (b1-1-3) is 1,3-bis(3-aminophenoxy)benzene.

式(b1-1-1)~式(b1-1-3)で表される化合物の中では、好ましくは式(b1-1-1)で表される化合物、及び式(b1-1-2)で表される化合物からなる群から選ばれる少なくとも1つの化合物であり、より好ましくは式(b1-1-1)で表される化合物である。Among the compounds represented by formulas (b1-1-1) to (b1-1-3), at least one compound selected from the group consisting of compounds represented by formula (b1-1-1) and compounds represented by formula (b1-1-2) is preferred, and the compound represented by formula (b1-1-1) is more preferred.

構成単位B中における構成単位(B-1)の比率は、好ましくは5モル%以上、より好ましくは15モル%以上、更に好ましくは45モル%以上、特に好ましくは75モル%以上である。構成単位(B-1)の比率の上限値は特に限定されず、即ち、100モル%である。構成単位Bは構成単位(B-1)のみからなっていてもよい。
構成単位B中における構成単位(B-1)の比率は、好ましくは5~100モル%、より好ましくは15~100モル%、更に好ましくは45~100モル%、特に好ましくは75~100モル%である。
構成単位(B-1)が式(b1-1-1)で表される化合物に由来する構成単位を含む場合、構成単位(B-1)中における式(b1-1-1)で表される化合物に由来する構成単位の比率は、好ましくは50~100モル%、より好ましくは75~100モル%、更に好ましくは90~100モル%、特に好ましくは95~100モル%である。
The ratio of the structural unit (B-1) in the structural unit B is preferably 5 mol% or more, more preferably 15 mol% or more, even more preferably 45 mol% or more, and particularly preferably 75 mol% or more. There is no particular upper limit for the ratio of the structural unit (B-1), that is, it is 100 mol%. The structural unit B may be composed only of the structural unit (B-1).
The proportion of the structural unit (B-1) in the structural unit B is preferably from 5 to 100 mol %, more preferably from 15 to 100 mol %, even more preferably from 45 to 100 mol %, and particularly preferably from 75 to 100 mol %.
When the structural unit (B-1) contains a structural unit derived from the compound represented by formula (b1-1-1), the ratio of the structural unit derived from the compound represented by formula (b1-1-1) in the structural unit (B-1) is preferably 50 to 100 mol%, more preferably 75 to 100 mol%, even more preferably 90 to 100 mol%, and particularly preferably 95 to 100 mol%.

構成単位Bは構成単位(B-1)以外の構成単位を含んでもよい。そのような構成単位としては、特に限定されないが、下記式(b-2)で表される化合物に由来する構成単位(B-2)、下記式(b-3)で表される化合物に由来する構成単位(B-3)、及び下記式(b-4)で表される化合物に由来する構成単位(B-4)からなる群から選ばれる少なくとも1つの構成単位を含むことが好ましい。The structural unit B may contain a structural unit other than the structural unit (B-1). Such a structural unit is not particularly limited, but preferably contains at least one structural unit selected from the group consisting of the structural unit (B-2) derived from a compound represented by the following formula (b-2), the structural unit (B-3) derived from a compound represented by the following formula (b-3), and the structural unit (B-4) derived from a compound represented by the following formula (b-4).

Figure 0007463964000010
Figure 0007463964000010

式(b-2)で表される化合物は、2,2-ビス[4-(4-アミノフェノキシ)フェニル]プロパンであり、
式(b-3)で表される化合物は、4,4’-ジアミノジフェニルエーテルであり、
式(b-4)で表される化合物は、1,4-ビス[2-(4-アミノフェニル)-2-プロピル]ベンゼンである。
構成単位Bが構成単位(B-2)~(B-4)からなる群から選ばれる少なくとも1つの構成単位を含む場合、構成単位(B-2)~(B-4)のうち2種以上を含んでいてもよいが、構成単位(B-2)~(B-4)のうち1種の構成単位を含むことが好ましい。つまり、構成単位Bが構成単位(B-2)、構成単位(B-3)、又は構成単位(B-4)を含むことが好ましい。
The compound represented by formula (b-2) is 2,2-bis[4-(4-aminophenoxy)phenyl]propane,
The compound represented by formula (b-3) is 4,4'-diaminodiphenyl ether,
The compound represented by formula (b-4) is 1,4-bis[2-(4-aminophenyl)-2-propyl]benzene.
When the structural unit B contains at least one structural unit selected from the group consisting of the structural units (B-2) to (B-4), it may contain two or more of the structural units (B-2) to (B-4), but it is preferable that the structural unit B contains one of the structural units (B-2) to (B-4). In other words, it is preferable that the structural unit B contains the structural unit (B-2), the structural unit (B-3), or the structural unit (B-4).

構成単位Bが構成単位(B-2)~(B-4)からなる群から選ばれる少なくとも1つの構成単位を含む場合、構成単位B中における構成単位(B-2)~(B-4)の合計が占める比率は、好ましくは5~95モル%、より好ましくは7~85モル%、更に好ましくは10~55モル%、特に好ましくは12~25モル%である。When structural unit B contains at least one structural unit selected from the group consisting of structural units (B-2) to (B-4), the total proportion of structural units (B-2) to (B-4) in structural unit B is preferably 5 to 95 mol%, more preferably 7 to 85 mol%, even more preferably 10 to 55 mol%, and particularly preferably 12 to 25 mol%.

構成単位Bは構成単位(B-1)~(B-4)以外の構成単位を含んでもよい。そのような構成単位を与えるジアミンとしては、特に限定されないが、1,4-フェニレンジアミン、p-キシリレンジアミン、3,5-ジアミノ安息香酸、1,5-ジアミノナフタレン、2,2’-ジメチルビフェニル-4,4’-ジアミン、2,2’-ビス(トリフルオロメチル)ベンジジン、4,4’-ジアミノジフェニルメタン、2,2-ビス(4-アミノフェニル)ヘキサフルオロプロパン、4,4’-ジアミノジフェニルスルホン、4,4’-ジアミノベンズアニリド、3,4’-ジアミノジフェニルエーテル、1-(4-アミノフェニル)-2,3-ジヒドロ-1,3,3-トリメチル-1H-インデン-5-アミン、N,N’-ビス(4-アミノフェニル)テレフタルアミド、4,4’-ビス(4-アミノフェノキシ)ビフェニル、2,2-ビス(4-(4-アミノフェノキシ)フェニル)ヘキサフルオロプロパン、2,2-ビス(3-アミノ-4-ヒドロキシフェニル)ヘキサフルオロプロパン及び9,9-ビス(4-アミノフェニル)フルオレン、1,4-ビス(4-アミノフェノキシ)ベンゼン等の芳香族ジアミン;1,3-ビス(アミノメチル)シクロヘキサン及び1,4-ビス(アミノメチル)シクロヘキサン等の脂環式ジアミン;並びにエチレンジアミン及びヘキサメチレンジアミン等の脂肪族ジアミンが挙げられる。
なお、本明細書において、芳香族ジアミンとは芳香環を1つ以上含むジアミンを意味し、脂環式ジアミンとは脂環を1つ以上含み、かつ芳香環を含まないジアミンを意味し、脂肪族ジアミンとは芳香環も脂環も含まないジアミンを意味する。
構成単位Bに任意に含まれる構成単位(B-1)~(B-4)以外の構成単位は、1種でもよいし、2種以上であってもよい。
構成単位Bは、前記構成単位(B-1)~(B-4)以外の構成単位を含まないことが好ましい。
The structural unit B may contain structural units other than the structural units (B-1) to (B-4). Diamines that provide such structural units are not particularly limited, but include 1,4-phenylenediamine, p-xylylenediamine, 3,5-diaminobenzoic acid, 1,5-diaminonaphthalene, 2,2'-dimethylbiphenyl-4,4'-diamine, 2,2'-bis(trifluoromethyl)benzidine, 4,4'-diaminodiphenylmethane, 2,2-bis(4-aminophenyl)hexafluoropropane, 4,4'-diaminodiphenylsulfone, 4,4'-diaminobenzanilide, 3,4'-diaminodiphenylether, 1-(4-aminophenyl)-2,3-dihydro-1,3,3-trimethyl-1H-indene-5- amines, aromatic diamines such as N,N'-bis(4-aminophenyl)terephthalamide, 4,4'-bis(4-aminophenoxy)biphenyl, 2,2-bis(4-(4-aminophenoxy)phenyl)hexafluoropropane, 2,2-bis(3-amino-4-hydroxyphenyl)hexafluoropropane, and 9,9-bis(4-aminophenyl)fluorene, 1,4-bis(4-aminophenoxy)benzene; alicyclic diamines such as 1,3-bis(aminomethyl)cyclohexane and 1,4-bis(aminomethyl)cyclohexane; and aliphatic diamines such as ethylenediamine and hexamethylenediamine.
In this specification, an aromatic diamine means a diamine containing one or more aromatic rings, an alicyclic diamine means a diamine containing one or more alicyclic rings but no aromatic rings, and an aliphatic diamine means a diamine containing neither an aromatic ring nor an alicyclic ring.
The structural units other than the structural units (B-1) to (B-4) optionally contained in the structural unit B may be of one type, or of two or more types.
It is preferable that the structural unit B does not contain any structural units other than the structural units (B-1) to (B-4) described above.

本発明のポリイミド樹脂の数平均分子量は、得られるポリイミドフィルムの機械的強度の観点から、好ましくは5,000~100,000である。なお、ポリイミド樹脂の数平均分子量は、例えば、ゲルろ過クロマトグラフィー測定による標準ポリメチルメタクリレート(PMMA)換算値より求めることができる。The number average molecular weight of the polyimide resin of the present invention is preferably 5,000 to 100,000 from the viewpoint of the mechanical strength of the resulting polyimide film. The number average molecular weight of the polyimide resin can be determined, for example, from a standard polymethyl methacrylate (PMMA) equivalent value measured by gel filtration chromatography.

本発明のポリイミド樹脂は、ポリイミド鎖(構成単位Aと構成単位Bとがイミド結合してなる構造)以外の構造を含んでもよい。ポリイミド樹脂中に含まれうるポリイミド鎖以外の構造としては、例えばアミド結合を含む構造等が挙げられる。
本発明のポリイミド樹脂は、ポリイミド鎖(構成単位Aと構成単位Bとがイミド結合してなる構造)を主たる構造として含むことが好ましい。したがって、本発明のポリイミド樹脂中に占めるポリイミド鎖の比率は、好ましくは50質量%以上であり、より好ましくは70質量%以上であり、更に好ましくは90質量%以上であり、特に好ましくは99質量%以上である。
The polyimide resin of the present invention may contain a structure other than a polyimide chain (a structure formed by imide bonding between the structural unit A and the structural unit B). Examples of structures other than a polyimide chain that can be contained in the polyimide resin include a structure containing an amide bond.
The polyimide resin of the present invention preferably contains, as a main structure, a polyimide chain (a structure formed by imide bonding between the structural unit A and the structural unit B). Therefore, the ratio of the polyimide chain in the polyimide resin of the present invention is preferably 50% by mass or more, more preferably 70% by mass or more, even more preferably 90% by mass or more, and particularly preferably 99% by mass or more.

本発明のポリイミド樹脂を用いることで、無色透明性に優れ、更に低リタデーションであるフィルムを形成することができ、当該フィルムの有する好適な物性値は以下の通りである。
全光線透過率は、厚さ30μmのフィルムとした際に、好ましくは85%以上であり、より好ましくは87%以上であり、更に好ましくは88%以上、より更に好ましくは89%以上である。
ヘイズは、厚さ30μmのフィルムとした際に、好ましくは2.0%以下であり、より好ましくは1.5%以下であり、更に好ましくは1.0%以下である。
イエローインデックス(YI)は、厚さ30μmのフィルムとした際に、好ましくは4.0以下であり、より好ましくは3.5以下であり、更に好ましくは3.0以下、より更に好ましく2.0以下である。
本発明では、厚み位相差(Rth)が好ましくは90nm以下、より好ましくは70nm以下、更に好ましくは50nm以下、より更に好ましくは30nm以下のポリイミドフィルムとすることができる。なお、本明細書において、「低リタデーション」とは、厚み位相差(Rth)が低いことを意味し、好ましくは厚み位相差(Rth)が前記範囲内にあることをいう。
なお、本発明における上述の物性値は、具体的には実施例に記載の方法で測定することができる。
By using the polyimide resin of the present invention, a film which is excellent in colorless transparency and further has low retardation can be formed, and the preferable physical properties of the film are as follows.
The total light transmittance, when made into a film having a thickness of 30 μm, is preferably 85% or more, more preferably 87% or more, even more preferably 88% or more, and still more preferably 89% or more.
The haze, when formed into a film having a thickness of 30 μm, is preferably 2.0% or less, more preferably 1.5% or less, and further preferably 1.0% or less.
The yellow index (YI) when made into a film having a thickness of 30 μm is preferably 4.0 or less, more preferably 3.5 or less, even more preferably 3.0 or less, and still more preferably 2.0 or less.
In the present invention, the thickness retardation (Rth) of the polyimide film is preferably 90 nm or less, more preferably 70 nm or less, even more preferably 50 nm or less, and even more preferably 30 nm or less. In this specification, "low retardation" means that the thickness retardation (Rth) is low, and preferably means that the thickness retardation (Rth) is within the above range.
The above-mentioned physical properties in the present invention can be specifically measured by the methods described in the Examples.

本発明のポリイミド樹脂を用いることで形成することができるフィルムは耐熱性及び機械的特性も良好であり、以下のような好適な物性値を有する。
ガラス転移温度(Tg)は、好ましくは200℃以上であり、より好ましくは230℃以上であり、更に好ましくは250℃以上である。
引張弾性率は、好ましくは2.5GPa以上であり、より好ましくは3.0GPa以上であり、更に好ましくは3.5GPa以上である。
引張強度は、好ましくは70MPa以上であり、より好ましくは90MPa以上であり、更に好ましくは100MPa以上である。
引張弾性率及び引張強度は、JIS K7127:1999に準拠して測定される値である。
A film that can be formed by using the polyimide resin of the present invention has good heat resistance and mechanical properties, and has the following preferable physical properties.
The glass transition temperature (Tg) is preferably 200° C. or higher, more preferably 230° C. or higher, and even more preferably 250° C. or higher.
The tensile modulus is preferably 2.5 GPa or more, more preferably 3.0 GPa or more, and even more preferably 3.5 GPa or more.
The tensile strength is preferably 70 MPa or more, more preferably 90 MPa or more, and further preferably 100 MPa or more.
The tensile modulus and tensile strength are values measured in accordance with JIS K7127:1999.

[ポリイミド樹脂の製造方法]
本発明のポリイミド樹脂は、上述の構成単位(A-1)を与える化合物及び上述の構成単位(A-2)を与える化合物からなる群から選ばれる少なくとも1つを含むテトラカルボン酸成分と、上述の構成単位(B-1)を与える化合物を含むジアミン成分とを反応させることにより製造することができる。
[Method of producing polyimide resin]
The polyimide resin of the present invention can be produced by reacting a tetracarboxylic acid component containing at least one selected from the group consisting of compounds which provide the above-mentioned structural unit (A-1) and compounds which provide the above-mentioned structural unit (A-2), with a diamine component which contains a compound which provides the above-mentioned structural unit (B-1).

構成単位(A-1)を与える化合物としては、式(a-1)で表される化合物が挙げられるが、それに限られず、同じ構成単位を与える範囲でその誘導体であってもよい。当該誘導体としては、式(a-1)で表されるテトラカルボン酸二無水物に対応するテトラカルボン酸及び当該テトラカルボン酸のアルキルエステルが挙げられる。構成単位(A-1)を与える化合物としては、式(a-1)で表される化合物(即ち、二無水物)が好ましい。
同様に、構成単位(A-2)を与える化合物としては、式(a-2)で表される化合物が挙げられるが、それに限られず、同じ構成単位を与える範囲でその誘導体であってもよい。当該誘導体としては、式(a-2)で表されるテトラカルボン酸二無水物に対応するテトラカルボン酸及び当該テトラカルボン酸のアルキルエステルが挙げられる。構成単位(A-2)を与える化合物としては、式(a-2)で表される化合物(即ち、二無水物)が好ましい。
Compounds that provide the structural unit (A-1) include, but are not limited to, compounds represented by formula (a-1), and may be derivatives thereof as long as they provide the same structural unit. Examples of such derivatives include tetracarboxylic acids corresponding to the tetracarboxylic dianhydride represented by formula (a-1) and alkyl esters of the tetracarboxylic acid. Compounds that provide the structural unit (A-1) are preferably compounds represented by formula (a-1) (i.e., dianhydrides).
Similarly, examples of compounds that provide the structural unit (A-2) include, but are not limited to, compounds represented by formula (a-2), and may be derivatives thereof as long as they provide the same structural unit. Examples of such derivatives include tetracarboxylic acids corresponding to the tetracarboxylic dianhydride represented by formula (a-2) and alkyl esters of the tetracarboxylic acid. Compounds that provide the structural unit (A-2) are preferably compounds represented by formula (a-2) (i.e., dianhydrides).

テトラカルボン酸成分は、構成単位(A-1)を与える化合物及び構成単位(A-2)を与える化合物を合計で、好ましくは50モル%以上含み、より好ましくは70モル%以上含み、更に好ましくは90モル%以上含み、特に好ましくは99モル%以上含む。構成単位(A-1)を与える化合物及び構成単位(A-2)を与える化合物の合計の含有量の上限値は特に限定されず、即ち、100モル%である。テトラカルボン酸成分は構成単位(A-1)を与える化合物と構成単位(A-2)を与える化合物とのみからなっていてもよい。The tetracarboxylic acid component preferably contains 50 mol% or more of the compound that gives the structural unit (A-1) and the compound that gives the structural unit (A-2) in total, more preferably 70 mol% or more, even more preferably 90 mol% or more, and particularly preferably 99 mol% or more. There is no particular upper limit to the total content of the compound that gives the structural unit (A-1) and the compound that gives the structural unit (A-2), that is, 100 mol%. The tetracarboxylic acid component may consist only of the compound that gives the structural unit (A-1) and the compound that gives the structural unit (A-2).

テトラカルボン酸成分は、構成単位(A-1)を与える化合物、又は構成単位(A-2)を与える化合物を含む場合、構成単位(A-1)を与える化合物、又は構成単位(A-2)を与える化合物を、好ましくは45モル%以上含み、より好ましくは70モル%以上含み、更に好ましくは90モル%以上含む。構成単位(A-1)を与える化合物、又は構成単位(A-2)を与える化合物の含有量の上限値は限定されず、即ち、100モル%である。テトラカルボン酸成分は構成単位(A-1)を与える化合物又は構成単位(A-2)を与える化合物のみからなっていてもよく、構成単位(A-1)を与える化合物のみからなることが好ましい。When the tetracarboxylic acid component contains a compound that gives the structural unit (A-1) or a compound that gives the structural unit (A-2), the compound that gives the structural unit (A-1) or the compound that gives the structural unit (A-2) is preferably contained in an amount of 45 mol% or more, more preferably 70 mol% or more, and even more preferably 90 mol% or more. The upper limit of the content of the compound that gives the structural unit (A-1) or the compound that gives the structural unit (A-2) is not limited, that is, it is 100 mol%. The tetracarboxylic acid component may consist only of a compound that gives the structural unit (A-1) or a compound that gives the structural unit (A-2), and it is preferable that the tetracarboxylic acid component consists only of a compound that gives the structural unit (A-1).

テトラカルボン酸成分は、低リタデーションの物性を損なわない範囲で上述の構成単位(A-3)を与える化合物を含んでもよい。
構成単位(A-3)を与える化合物としては、式(a-3)で表される化合物が挙げられるが、それに限られず、同じ構成単位を与える範囲でその誘導体であってもよい。当該誘導体としては、式(a-3)で表されるテトラカルボン酸二無水物に対応するテトラカルボン酸及び当該テトラカルボン酸のアルキルエステルが挙げられる。構成単位(A-3)を与える化合物としては、式(a-3)で表される化合物(即ち、二無水物)が好ましい。
The tetracarboxylic acid component may contain a compound that gives the above-mentioned structural unit (A-3) within a range that does not impair the low retardation property.
Compounds that provide the structural unit (A-3) include, but are not limited to, compounds represented by formula (a-3), and may be derivatives thereof as long as they provide the same structural unit. Examples of such derivatives include tetracarboxylic acids corresponding to the tetracarboxylic dianhydride represented by formula (a-3) and alkyl esters of the tetracarboxylic acid. Compounds that provide the structural unit (A-3) are preferably compounds represented by formula (a-3) (i.e., dianhydrides).

テトラカルボン酸成分は、構成単位(A-3)を与える化合物を含む場合、構成単位(A-3)を与える化合物を、好ましくは55モル%以下、より好ましくは30モル%以下含む。テトラカルボン酸成分は、構成単位(A-3)を与える化合物を含む場合、構成単位(A-1)を与える化合物及び構成単位(A-3)を与える化合物のみからなることが好ましい。When the tetracarboxylic acid component contains a compound that gives the structural unit (A-3), it preferably contains 55 mol % or less, more preferably 30 mol % or less, of the compound that gives the structural unit (A-3). When the tetracarboxylic acid component contains a compound that gives the structural unit (A-3), it is preferable that the tetracarboxylic acid component consists only of the compound that gives the structural unit (A-1) and the compound that gives the structural unit (A-3).

テトラカルボン酸成分は、構成単位(A-1)を与える化合物、構成単位(A-2)を与える化合物、及び構成単位(A-3)を与える化合物以外の化合物を含んでもよく、当該化合物としては、上述の芳香族テトラカルボン酸二無水物、脂環式テトラカルボン酸二無水物、及び脂肪族テトラカルボン酸二無水物、並びにそれらの誘導体(テトラカルボン酸、テトラカルボン酸のアルキルエステル等)が挙げられる。
テトラカルボン酸成分に任意に含まれる構成単位(A-1)~(A-3)を与える化合物以外の化合物は、1種でもよいし、2種以上であってもよい。
The tetracarboxylic acid component may contain a compound other than the compound that provides the structural unit (A-1), the compound that provides the structural unit (A-2), and the compound that provides the structural unit (A-3). Examples of such compounds include the above-mentioned aromatic tetracarboxylic acid dianhydrides, alicyclic tetracarboxylic acid dianhydrides, and aliphatic tetracarboxylic acid dianhydrides, as well as derivatives thereof (tetracarboxylic acids, alkyl esters of tetracarboxylic acids, etc.).
The compound other than the compound that gives the structural units (A-1) to (A-3) that is optionally contained in the tetracarboxylic acid component may be one type or two or more types.

構成単位(B-1)を与える化合物としては、一般式(b1-1)で表される化合物、及び一般式(b2-1)で表される化合物が挙げられるが、それに限られず、同じ構成単位を与える範囲でその誘導体であってもよい。当該誘導体としては、一般式(b1-1)で表される化合物に対応するジイソシアネート、及び一般式(b2-1)で表されるジアミンに対応するジイソシアネートが挙げられる。構成単位(B-1)を与える化合物としては、一般式(b1-1)で表される化合物、及び一般式(b2-1)で表される化合物からなる群から選ばれる少なくとも1つの化合物(即ち、ジアミン)が好ましい。 Compounds that provide the structural unit (B-1) include compounds represented by general formula (b1-1) and compounds represented by general formula (b2-1), but are not limited thereto, and may be derivatives thereof as long as they provide the same structural unit. Examples of such derivatives include diisocyanates corresponding to the compounds represented by general formula (b1-1) and diisocyanates corresponding to the diamines represented by general formula (b2-1). As a compound that provides the structural unit (B-1), at least one compound (i.e., a diamine) selected from the group consisting of compounds represented by general formula (b1-1) and compounds represented by general formula (b2-1) is preferred.

構成単位(B-1)を与える化合物としては、一般式(b1-1)で表される化合物を含むことが好ましく、式(b1-1-1)で表される化合物、式(b1-1-2)で表される化合物、及び式(b1-1-3)で表される化合物からなる群から選ばれる少なくとも1つの化合物を含むことがより好ましく、式(b1-1-1)で表される化合物、及び式(b1-1-2)で表される化合物からなる群から選ばれる少なくとも1つの化合物を含むことが更に好ましく、式(b1-1-1)で表される化合物を含むことが特に好ましい。The compound that provides the structural unit (B-1) preferably includes a compound represented by general formula (b1-1), more preferably includes at least one compound selected from the group consisting of compounds represented by formula (b1-1-1), compounds represented by formula (b1-1-2), and compounds represented by formula (b1-1-3), even more preferably includes at least one compound selected from the group consisting of compounds represented by formula (b1-1-1) and compounds represented by formula (b1-1-2), and particularly preferably includes a compound represented by formula (b1-1-1).

ジアミン成分は、構成単位(B-1)を与える化合物を、好ましくは5モル%以上含み、より好ましくは15モル%以上含み、更に好ましくは45モル%以上含み、特に好ましくは75モル%以上含む。構成単位(B-1)を与える化合物の含有量の上限値は特に限定されず、即ち、100モル%である。ジアミン成分は構成単位(B-1)を与える化合物のみからなっていてもよい。
構成単位(B-1)を与える化合物が式(b1-1-1)で表される化合物を含む場合、構成単位(B-1)を与える化合物中における式(b1-1-1)で表される化合物の比率は、好ましくは50~100モル%、より好ましくは75~100モル%、更に好ましくは90~100モル%、特に好ましくは95~100モル%である。
The diamine component contains the compound that gives the structural unit (B-1) in an amount of preferably 5 mol % or more, more preferably 15 mol % or more, even more preferably 45 mol % or more, and particularly preferably 75 mol % or more. There is no particular upper limit to the content of the compound that gives the structural unit (B-1), that is, it is 100 mol %. The diamine component may consist of only the compound that gives the structural unit (B-1).
When the compound that provides the structural unit (B-1) contains a compound represented by formula (b1-1-1), the ratio of the compound represented by formula (b1-1-1) in the compound that provides the structural unit (B-1) is preferably 50 to 100 mol %, more preferably 75 to 100 mol %, even more preferably 90 to 100 mol %, and particularly preferably 95 to 100 mol %.

ジアミン成分は、無色透明性、低リタデーションの物性を損なわない範囲で上述の構成単位(B-2)を与える化合物、上述の構成単位(B-3)を与える化合物、及び上述の構成単位(B-4)を与える化合物からなる群から選ばれる少なくとも1つの化合物を含んでもよい。
構成単位(B-2)~(B-4)を与える化合物としては、それぞれ式(b-2)~(b-4)で表される化合物が挙げられるが、それらに限られず、同じ構成単位を与える範囲でその誘導体であってもよい。当該誘導体としては、式(b-2)~(b-4)で表されるジアミンに対応するジイソシアネートが挙げられる。構成単位(B-2)~(B-4)を与える化合物としては、それぞれ式(b-2)~(b-4)で表される化合物(即ち、ジアミン)が好ましい。
The diamine component may contain at least one compound selected from the group consisting of compounds that provide the above-mentioned structural unit (B-2), compounds that provide the above-mentioned structural unit (B-3), and compounds that provide the above-mentioned structural unit (B-4), within a range that does not impair the physical properties of colorless transparency and low retardation.
Compounds that give the structural units (B-2) to (B-4) include compounds represented by formulas (b-2) to (b-4), respectively, but are not limited thereto and may be derivatives thereof as long as they give the same structural units. Examples of such derivatives include diisocyanates corresponding to the diamines represented by formulas (b-2) to (b-4). Compounds that give the structural units (B-2) to (B-4) are preferably compounds represented by formulas (b-2) to (b-4), respectively (i.e., diamines).

ジアミン成分は、構成単位(B-2)~(B-4)からなる群から選ばれる少なくとも1つの構成単位を与える化合物を含む場合、構成単位(B-2)~(B-4)のうち2種以上の構成単位を与える化合物を含んでいてもよいが、構成単位(B-2)~(B-4)のうち1種の構成単位を与える化合物含むことが好ましい。つまり、構成単位Bが構成単位(B-2)を与える化合物、構成単位(B-3)を与える化合物、又は構成単位(B-4)を与える化合物を含むことが好ましい。When the diamine component contains a compound that provides at least one structural unit selected from the group consisting of structural units (B-2) to (B-4), it may contain compounds that provide two or more structural units among the structural units (B-2) to (B-4), but it is preferable that the diamine component contains a compound that provides one structural unit among the structural units (B-2) to (B-4). In other words, it is preferable that the structural unit B contains a compound that provides the structural unit (B-2), a compound that provides the structural unit (B-3), or a compound that provides the structural unit (B-4).

ジアミン成分は、構成単位(B-2)~(B-4)からなる群から選ばれる少なくとも1つの構成単位を与える化合物を含む場合、当該化合物を、好ましくは5~95モル%、より好ましくは7~85モル%、更に好ましくは10~55モル%、特に好ましくは12~25モル%含む。When the diamine component contains a compound that provides at least one structural unit selected from the group consisting of structural units (B-2) to (B-4), the diamine component contains the compound in an amount of preferably 5 to 95 mol %, more preferably 7 to 85 mol %, even more preferably 10 to 55 mol %, and particularly preferably 12 to 25 mol %.

ジアミン成分は構成単位(B-1)~(B-4)を与える化合物以外の化合物を含んでもよく、当該化合物としては、上述の芳香族ジアミン、脂環式ジアミン、及び脂肪族ジアミン、並びにそれらの誘導体(ジイソシアネート等)が挙げられる。
ジアミン成分に任意に含まれる構成単位(B-1)~(B-4)を与える化合物以外の化合物は、1種でもよいし、2種以上であってもよい。
The diamine component may contain compounds other than the compounds that provide the structural units (B-1) to (B-4). Examples of such compounds include the above-mentioned aromatic diamines, alicyclic diamines, and aliphatic diamines, as well as derivatives thereof (diisocyanates, etc.).
The compound other than the compound that gives the structural units (B-1) to (B-4) that is optionally contained in the diamine component may be one type, or two or more types.

本発明において、ポリイミド樹脂の製造に用いるテトラカルボン酸成分とジアミン成分の仕込み量比は、テトラカルボン酸成分1モルに対してジアミン成分が0.9~1.1モルであることが好ましい。In the present invention, the ratio of the amounts of the tetracarboxylic acid component and the diamine component used in the production of the polyimide resin is preferably 0.9 to 1.1 moles of the diamine component per mole of the tetracarboxylic acid component.

また、本発明において、ポリイミド樹脂の製造には、前述のテトラカルボン酸成分及びジアミン成分の他に、末端封止剤を用いてもよい。末端封止剤としてはモノアミン類あるいはジカルボン酸類が好ましい。導入される末端封止剤の仕込み量としては、テトラカルボン酸成分1モルに対して0.0001~0.1モルが好ましく、特に0.001~0.06モルが好ましい。モノアミン類末端封止剤としては、例えば、メチルアミン、エチルアミン、プロピルアミン、ブチルアミン、ベンジルアミン、4-メチルベンジルアミン、4-エチルベンジルアミン、4-ドデシルベンジルアミン、3-メチルベンジルアミン、3-エチルベンジルアミン、アニリン、3-メチルアニリン、4-メチルアニリン等が推奨される。これらのうち、ベンジルアミン、アニリンが好適に使用できる。ジカルボン酸類末端封止剤としては、ジカルボン酸類が好ましく、その一部を閉環していてもよい。例えば、フタル酸、無水フタル酸、4-クロロフタル酸、テトラフルオロフタル酸、2,3-ベンゾフェノンジカルボン酸、3,4-ベンゾフェノンジカルボン酸、シクロペンタン-1,2-ジカルボン酸、4-シクロヘキセン-1,2-ジカルボン酸等が推奨される。これらのうち、フタル酸、無水フタル酸が好適に使用できる。In addition, in the present invention, in addition to the above-mentioned tetracarboxylic acid component and diamine component, a terminal blocking agent may be used in the production of the polyimide resin. As the terminal blocking agent, monoamines or dicarboxylic acids are preferred. The amount of the terminal blocking agent to be introduced is preferably 0.0001 to 0.1 moles per mole of the tetracarboxylic acid component, and particularly preferably 0.001 to 0.06 moles. As the monoamine terminal blocking agent, for example, methylamine, ethylamine, propylamine, butylamine, benzylamine, 4-methylbenzylamine, 4-ethylbenzylamine, 4-dodecylbenzylamine, 3-methylbenzylamine, 3-ethylbenzylamine, aniline, 3-methylaniline, 4-methylaniline, etc. are recommended. Of these, benzylamine and aniline are preferably used. As the dicarboxylic acid terminal blocking agent, dicarboxylic acids are preferred, and a part of them may be ring-closed. For example, phthalic acid, phthalic anhydride, 4-chlorophthalic acid, tetrafluorophthalic acid, 2,3-benzophenonedicarboxylic acid, 3,4-benzophenonedicarboxylic acid, cyclopentane-1,2-dicarboxylic acid, 4-cyclohexene-1,2-dicarboxylic acid, etc. are recommended. Of these, phthalic acid and phthalic anhydride are preferably used.

前述のテトラカルボン酸成分とジアミン成分とを反応させる方法には特に制限はなく、公知の方法を用いることができる。
具体的な反応方法としては、(1)テトラカルボン酸成分、ジアミン成分、及び反応溶剤を反応器に仕込み、室温~80℃で0.5~30時間撹拌し、その後に昇温してイミド化反応を行う方法、(2)ジアミン成分及び反応溶剤を反応器に仕込んで溶解させた後、テトラカルボン酸成分を仕込み、必要に応じて室温~80℃で0.5~30時間撹拌し、その後に昇温してイミド化反応を行う方法、(3)テトラカルボン酸成分、ジアミン成分、及び反応溶剤を反応器に仕込み、直ちに昇温してイミド化反応を行う方法等が挙げられる。
The method for reacting the tetracarboxylic acid component and the diamine component is not particularly limited, and any known method can be used.
Specific reaction methods include: (1) a method in which a tetracarboxylic acid component, a diamine component, and a reaction solvent are charged into a reactor, and the mixture is stirred at room temperature to 80° C. for 0.5 to 30 hours, and then the temperature is raised to carry out the imidization reaction; (2) a method in which a diamine component and a reaction solvent are charged into a reactor and dissolved, and then a tetracarboxylic acid component is charged, and the mixture is stirred at room temperature to 80° C. for 0.5 to 30 hours as necessary, and then the temperature is raised to carry out the imidization reaction; and (3) a method in which a tetracarboxylic acid component, a diamine component, and a reaction solvent are charged into a reactor, and the temperature is immediately raised to carry out the imidization reaction.

ポリイミド樹脂の製造に用いられる反応溶剤は、イミド化反応を阻害せず、生成するポリイミドを溶解できるものであればよい。例えば、非プロトン性溶剤、フェノール系溶剤、エーテル系溶剤、カーボネート系溶剤等が挙げられる。The reaction solvent used in the production of polyimide resins may be any solvent that does not inhibit the imidization reaction and can dissolve the resulting polyimide. Examples include aprotic solvents, phenolic solvents, ether solvents, and carbonate solvents.

非プロトン性溶剤の具体例としては、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、N-メチル-2-ピロリドン、N-メチルカプロラクタム、1,3-ジメチルイミダゾリジノン、テトラメチル尿素等のアミド系溶剤、γ-ブチロラクトン、γ-バレロラクトン等のラクトン系溶剤、ヘキサメチルホスホリックアミド、ヘキサメチルホスフィントリアミド等の含リン系アミド系溶剤、ジメチルスルホン、ジメチルスルホキシド、スルホラン等の含硫黄系溶剤、アセトン、メチルエチルケトン、シクロヘキサノン、メチルシクロヘキサノン等のケトン系溶剤、ピコリン、ピリジン等のアミン系溶剤、酢酸(2-メトキシ-1-メチルエチル)等のエステル系溶剤等が挙げられる。 Specific examples of aprotic solvents include amide-based solvents such as N,N-dimethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, N-methylcaprolactam, 1,3-dimethylimidazolidinone, and tetramethylurea; lactone-based solvents such as γ-butyrolactone and γ-valerolactone; phosphorus-containing amide-based solvents such as hexamethylphosphoric amide and hexamethylphosphine triamide; sulfur-containing solvents such as dimethyl sulfone, dimethyl sulfoxide, and sulfolane; ketone-based solvents such as acetone, methyl ethyl ketone, cyclohexanone, and methylcyclohexanone; amine-based solvents such as picoline and pyridine; and ester-based solvents such as 2-methoxy-1-methylethyl acetate.

フェノール系溶剤の具体例としては、フェノール、o-クレゾール、m-クレゾール、p-クレゾール、2,3-キシレノール、2,4-キシレノール、2,5-キシレノール、2,6-キシレノール、3,4-キシレノール、3,5-キシレノール等が挙げられる。
エーテル系溶剤の具体例としては、1,2-ジメトキシエタン、ビス(2-メトキシエチル)エーテル、1,2-ビス(2-メトキシエトキシ)エタン、ビス〔2-(2-メトキシエトキシ)エチル〕エーテル、テトラヒドロフラン、1,4-ジオキサン等が挙げられる。
カーボネート系溶剤の具体的な例としては、ジエチルカーボネート、メチルエチルカーボネート、エチレンカーボネート、プロピレンカーボネート等が挙げられる。
上記反応溶剤の中でも、アミド系溶剤又はラクトン系溶剤が好ましい。上記の反応溶剤は単独で又は2種以上混合して用いてもよい。
Specific examples of phenol-based solvents include phenol, o-cresol, m-cresol, p-cresol, 2,3-xylenol, 2,4-xylenol, 2,5-xylenol, 2,6-xylenol, 3,4-xylenol, and 3,5-xylenol.
Specific examples of ether solvents include 1,2-dimethoxyethane, bis(2-methoxyethyl)ether, 1,2-bis(2-methoxyethoxy)ethane, bis[2-(2-methoxyethoxy)ethyl]ether, tetrahydrofuran, and 1,4-dioxane.
Specific examples of carbonate solvents include diethyl carbonate, methyl ethyl carbonate, ethylene carbonate, and propylene carbonate.
Among the above reaction solvents, amide-based solvents and lactone-based solvents are preferred. The above reaction solvents may be used alone or in combination of two or more.

イミド化反応では、ディーンスターク装置などを用いて、製造時に生成する水を除去しながら反応を行うことが好ましい。このような操作を行うことで、重合度及びイミド化率をより上昇させることができる。In the imidization reaction, it is preferable to carry out the reaction while removing the water generated during production using a Dean-Stark apparatus or the like. By carrying out such an operation, it is possible to further increase the degree of polymerization and the imidization rate.

上記のイミド化反応においては、公知のイミド化触媒を用いることができる。イミド化触媒としては、塩基触媒又は酸触媒が挙げられる。
塩基触媒としては、ピリジン、キノリン、イソキノリン、α-ピコリン、β-ピコリン、2,4-ルチジン、2,6-ルチジン、トリメチルアミン、トリエチルアミン、トリプロピルアミン、トリブチルアミン、トリエチレンジアミン、イミダゾール、N,N-ジメチルアニリン、N,N-ジエチルアニリン等の有機塩基触媒、水酸化カリウムや水酸化ナトリウム、炭酸カリウム、炭酸ナトリウム、炭酸水素カリウム、炭酸水素ナトリウム等の無機塩基触媒が挙げられる。
また、酸触媒としては、クロトン酸、アクリル酸、トランス-3-ヘキセノイック酸、桂皮酸、安息香酸、メチル安息香酸、オキシ安息香酸、テレフタル酸、ベンゼンスルホン酸、パラトルエンスルホン酸、ナフタレンスルホン酸等が挙げられる。上記のイミド化触媒は単独で又は2種以上を組み合わせて用いてもよい。
上記のうち、取り扱い性の観点から、塩基触媒を用いることが好ましく、有機塩基触媒を用いることがより好ましく、トリエチルアミン及びトリエチレンジアミンから選ばれる1種以上を用いることが更に好ましく、トリエチルアミンを用いること、又はトリエチルアミンとトリエチレンジアミンを組み合わせて用いることが特に好ましい。
In the above imidization reaction, a known imidization catalyst can be used, such as a base catalyst or an acid catalyst.
Examples of the base catalyst include organic base catalysts such as pyridine, quinoline, isoquinoline, α-picoline, β-picoline, 2,4-lutidine, 2,6-lutidine, trimethylamine, triethylamine, tripropylamine, tributylamine, triethylenediamine, imidazole, N,N-dimethylaniline, and N,N-diethylaniline; and inorganic base catalysts such as potassium hydroxide, sodium hydroxide, potassium carbonate, sodium carbonate, potassium hydrogencarbonate, and sodium hydrogencarbonate.
Examples of the acid catalyst include crotonic acid, acrylic acid, trans-3-hexenoic acid, cinnamic acid, benzoic acid, methylbenzoic acid, oxybenzoic acid, terephthalic acid, benzenesulfonic acid, paratoluenesulfonic acid, naphthalenesulfonic acid, etc. The above imidization catalysts may be used alone or in combination of two or more kinds.
Among the above, from the viewpoint of handleability, it is preferable to use a base catalyst, it is more preferable to use an organic base catalyst, it is even more preferable to use one or more selected from triethylamine and triethylenediamine, and it is particularly preferable to use triethylamine or a combination of triethylamine and triethylenediamine.

イミド化反応の温度は、反応率及びゲル化等の抑制の観点から、好ましくは120~250℃、より好ましくは160~200℃である。また、反応時間は、生成水の留出開始後、好ましくは0.5~10時間である。The temperature of the imidization reaction is preferably 120 to 250°C, more preferably 160 to 200°C, from the viewpoint of the reaction rate and suppression of gelation, etc. The reaction time is preferably 0.5 to 10 hours after the start of distillation of the produced water.

[ポリイミドワニス]
本発明のポリイミドワニスは、本発明のポリイミド樹脂が有機溶媒に溶解してなるものである。即ち、本発明のポリイミドワニスは、本発明のポリイミド樹脂及び有機溶媒を含み、当該ポリイミド樹脂は当該有機溶媒に溶解している。
有機溶媒はポリイミド樹脂が溶解するものであればよく、特に限定されないが、ポリイミド樹脂の製造に用いられる反応溶剤として上述した化合物を、単独又は2種以上を混合して用いることが好ましい。
本発明のポリイミドワニスは、重合法により得られるポリイミド樹脂が反応溶剤に溶解したポリイミド溶液そのものであってもよいし、又は当該ポリイミド溶液に対して更に希釈溶剤を追加したものであってもよい。
本発明のポリイミドワニスは、本発明のポリイミド樹脂が沸点130℃以下の低沸点溶媒に溶解してなるものであってもよい。有機溶媒として当該低沸点溶媒を用いることで、後述するポリイミドフィルムを製造する際の加熱温度を低くすることができる。当該低沸点溶媒としては、四塩化炭素、ジクロロメタン、クロロホルム、1,2-ジクロロエタン、テトラヒドロフラン、アセトン等が挙げられ、中でもジクロロメタンが好ましい。
[Polyimide varnish]
The polyimide varnish of the present invention is obtained by dissolving the polyimide resin of the present invention in an organic solvent. That is, the polyimide varnish of the present invention contains the polyimide resin of the present invention and an organic solvent, and the polyimide resin is dissolved in the organic solvent.
The organic solvent is not particularly limited as long as it dissolves the polyimide resin. However, it is preferable to use the above-mentioned compounds as reaction solvents used in the production of the polyimide resin, either alone or in combination of two or more kinds.
The polyimide varnish of the present invention may be a polyimide solution itself in which a polyimide resin obtained by polymerization is dissolved in a reaction solvent, or may be a polyimide solution to which a dilution solvent is further added.
The polyimide varnish of the present invention may be prepared by dissolving the polyimide resin of the present invention in a low-boiling point solvent having a boiling point of 130° C. or less. By using the low-boiling point solvent as the organic solvent, the heating temperature during the production of the polyimide film described below can be lowered. Examples of the low-boiling point solvent include carbon tetrachloride, dichloromethane, chloroform, 1,2-dichloroethane, tetrahydrofuran, and acetone, and among these, dichloromethane is preferred.

本発明のポリイミド樹脂は溶媒溶解性を有しているため、室温で安定な高濃度のワニスとすることができる。本発明のポリイミドワニスは、本発明のポリイミド樹脂を5~40質量%含むことが好ましく、10~30質量%含むことがより好ましい。ポリイミドワニスの粘度は1~200Pa・sが好ましく、5~150Pa・sがより好ましい。ポリイミドワニスの粘度は、E型粘度計を用いて25℃で測定された値である。
また、本発明のポリイミドワニスは、ポリイミドフィルムの要求特性を損なわない範囲で、無機フィラー、接着促進剤、剥離剤、難燃剤、紫外線安定剤、界面活性剤、レベリング剤、消泡剤、蛍光増白剤、架橋剤、重合開始剤、感光剤等各種添加剤を含んでもよい。
本発明のポリイミドワニスの製造方法は特に限定されず、公知の方法を適用することができる。
Since the polyimide resin of the present invention has solvent solubility, it can be made into a highly concentrated varnish that is stable at room temperature. The polyimide varnish of the present invention preferably contains 5 to 40 mass %, more preferably 10 to 30 mass %, of the polyimide resin of the present invention. The viscosity of the polyimide varnish is preferably 1 to 200 Pa·s, more preferably 5 to 150 Pa·s. The viscosity of the polyimide varnish is a value measured at 25°C using an E-type viscometer.
In addition, the polyimide varnish of the present invention may contain various additives such as inorganic fillers, adhesion promoters, release agents, flame retardants, UV stabilizers, surfactants, leveling agents, defoamers, fluorescent brightening agents, crosslinking agents, polymerization initiators, and photosensitizers, as long as the additives do not impair the required properties of the polyimide film.
The method for producing the polyimide varnish of the present invention is not particularly limited, and any known method can be applied.

[ポリイミドフィルム]
本発明のポリイミドフィルムは、本発明のポリイミド樹脂を含む。したがって、本発明のポリイミドフィルムは、無色透明性に優れ、更に低リタデーションである。本発明のポリイミドフィルムが有する好適な物性値は上述の通りである。
本発明のポリイミドフィルムの製造方法には特に制限はなく、公知の方法を用いることができる。例えば、本発明のポリイミドワニスを、ガラス板、金属板、プラスチックなどの平滑な支持体上に塗布、又はフィルム状に成形した後、該ワニス中に含まれる反応溶剤や希釈溶剤等の有機溶媒を加熱により除去する方法等が挙げられる。前記支持体の表面には、必要に応じて、予め離形剤を塗布しておいてもよい。
ワニス中に含まれる有機溶媒を加熱により除去する方法としては、以下の方法が好ましい。即ち、120℃以下の温度で有機溶媒を蒸発させて自己支持性フィルムとした後、該自己支持性フィルムを支持体より剥離し、該自己支持性フィルムの端部を固定し、用いた有機溶媒の沸点以上の温度で乾燥してポリイミドフィルムを製造することが好ましい。また、窒素雰囲気下で乾燥することが好ましい。乾燥雰囲気の圧力は、減圧、常圧、加圧のいずれでもよい。自己支持性フィルムを乾燥してポリイミドフィルムを製造する際の加熱温度は、特に限定されないが、200~400℃が好ましい。
本発明のポリイミドワニスに含まれる有機溶媒が沸点130℃以下の低沸点溶媒である場合には、自己支持性フィルムの加熱温度は、100~180℃が好ましい。さらに、低沸点溶媒を除去して得られたポリイミドフィルムをさらにガラス転移温度以上の温度で加熱するアニール処理を行うことが好ましい。
[Polyimide film]
The polyimide film of the present invention contains the polyimide resin of the present invention. Therefore, the polyimide film of the present invention is excellent in colorless transparency and low retardation. The preferable physical properties of the polyimide film of the present invention are as described above.
The method for producing the polyimide film of the present invention is not particularly limited, and known methods can be used. For example, the polyimide varnish of the present invention is applied to a smooth support such as a glass plate, a metal plate, or a plastic plate, or formed into a film, and then the organic solvents contained in the varnish, such as a reaction solvent or a dilution solvent, are removed by heating. If necessary, a release agent may be applied to the surface of the support in advance.
The following method is preferred as a method for removing the organic solvent contained in the varnish by heating. That is, it is preferred to evaporate the organic solvent at a temperature of 120° C. or less to form a self-supporting film, and then peel the self-supporting film from the support, fix the ends of the self-supporting film, and dry at a temperature equal to or higher than the boiling point of the organic solvent used to produce a polyimide film. It is also preferred to dry under a nitrogen atmosphere. The pressure of the drying atmosphere may be reduced pressure, normal pressure, or pressurized. The heating temperature when drying the self-supporting film to produce a polyimide film is not particularly limited, but is preferably 200 to 400° C.
When the organic solvent contained in the polyimide varnish of the present invention is a low-boiling point solvent having a boiling point of 130° C. or less, the heating temperature of the self-supporting film is preferably 100 to 180° C. Furthermore, it is preferable to subject the polyimide film obtained by removing the low-boiling point solvent to an annealing treatment in which the polyimide film is further heated at a temperature equal to or higher than the glass transition temperature.

また、本発明のポリイミドフィルムは、ポリアミド酸が有機溶媒に溶解してなるポリアミド酸ワニスを用いて製造することもできる。
前記ポリアミド酸ワニスに含まれるポリアミド酸は、本発明のポリイミド樹脂の前駆体であって、上述の構成単位(A-1)を与える化合物及び上述の構成単位(A-2)を与える化合物からなる群から選ばれる少なくとも1つを含むテトラカルボン酸成分と上述の構成単位(B-1)を与える化合物を含むジアミン成分との重付加反応の生成物である。このポリアミド酸をイミド化(脱水閉環)することで、最終生成物である本発明のポリイミド樹脂が得られる。
前記ポリアミド酸ワニスに含まれる有機溶媒としては、本発明のポリイミドワニスに含まれる有機溶媒を用いることができる。
本発明において、ポリアミド酸ワニスは、上述の構成単位(A-1)を与える化合物及び上述の構成単位(A-2)を与える化合物からなる群から選ばれる少なくとも1つを含むテトラカルボン酸成分と上述の構成単位(B-1)を与える化合物を含むジアミン成分とを反応溶剤中で重付加反応させて得られるポリアミド酸溶液そのものであってもよいし、又は当該ポリアミド酸溶液に対して更に希釈溶剤を追加したものであってもよい。
The polyimide film of the present invention can also be produced by using a polyamic acid varnish prepared by dissolving a polyamic acid in an organic solvent.
The polyamic acid contained in the polyamic acid varnish is a precursor of the polyimide resin of the present invention, and is a product of a polyaddition reaction between a tetracarboxylic acid component containing at least one selected from the group consisting of a compound that gives the above-mentioned structural unit (A-1) and a compound that gives the above-mentioned structural unit (A-2), and a diamine component containing a compound that gives the above-mentioned structural unit (B-1). The polyamic acid is imidized (dehydration ring closure) to obtain the final product, the polyimide resin of the present invention.
As the organic solvent contained in the polyamic acid varnish, the organic solvent contained in the polyimide varnish of the present invention can be used.
In the present invention, the polyamic acid varnish may be a polyamic acid solution itself obtained by subjecting a tetracarboxylic acid component containing at least one selected from the group consisting of compounds which provide the above-mentioned structural unit (A-1) and compounds which provide the above-mentioned structural unit (A-2) to a polyaddition reaction in a reaction solvent with a diamine component containing a compound which provides the above-mentioned structural unit (B-1), or may be a polyamic acid solution to which a dilution solvent has been further added.

ポリアミド酸ワニスを用いてポリイミドフィルムを製造する方法には特に制限はなく、公知の方法を用いることができる。例えば、ポリアミド酸ワニスを、ガラス板、金属板、プラスチックなどの平滑な支持体上に塗布、又はフィルム状に成形し、該ワニス中に含まれる反応溶剤や希釈溶剤等の有機溶媒を加熱により除去してポリアミド酸フィルムを得て、該ポリアミド酸フィルム中のポリアミド酸を加熱によりイミド化することで、ポリイミドフィルムを製造することができる。
ポリアミド酸ワニスを乾燥させてポリアミド酸フィルムを得る際の加熱温度としては、好ましくは50~120℃である。ポリアミド酸を加熱によりイミド化する際の加熱温度としては好ましくは200~400℃である。
なお、イミド化の方法は熱イミド化に限定されず、化学イミド化を適用することもできる。
The method for producing a polyimide film using the polyamic acid varnish is not particularly limited, and a known method can be used.For example, the polyamic acid varnish is applied to a smooth support such as a glass plate, a metal plate, or a plastic plate, or formed into a film, and the organic solvent contained in the varnish, such as a reaction solvent or a dilution solvent, is removed by heating to obtain a polyamic acid film, and the polyamic acid in the polyamic acid film is imidized by heating, thereby producing a polyimide film.
The heating temperature when the polyamic acid varnish is dried to obtain a polyamic acid film is preferably 50 to 120° C. The heating temperature when the polyamic acid is imidized by heating is preferably 200 to 400° C.
The imidization method is not limited to thermal imidization, and chemical imidization can also be applied.

本発明のポリイミドフィルムの厚みは用途等に応じて適宜選択することができるが、好ましくは1~250μm、より好ましくは5~100μm、更に好ましくは10~80μmの範囲である。厚みが1~250μmであることで、自立膜としての実用的な使用が可能となる。
ポリイミドフィルムの厚みは、ポリイミドワニスの固形分濃度や粘度を調整することにより、容易に制御することができる。
The thickness of the polyimide film of the present invention can be appropriately selected depending on the application, etc., but is preferably in the range of 1 to 250 μm, more preferably 5 to 100 μm, and even more preferably 10 to 80 μm. When the thickness is 1 to 250 μm, practical use as a free-standing film becomes possible.
The thickness of the polyimide film can be easily controlled by adjusting the solids concentration and viscosity of the polyimide varnish.

以下に、実施例により本発明を具体的に説明する。但し、本発明はこれらの実施例により何ら制限されるものではない。
実施例及び比較例で得たワニスの固形分濃度及びフィルムの各物性は以下に示す方法によって測定した。
The present invention will be described in detail below with reference to examples, although the present invention is not limited to these examples in any way.
The solids concentration of the varnishes and the physical properties of the films obtained in the examples and comparative examples were measured by the methods described below.

(1)固形分濃度
ワニスの固形分濃度の測定は、アズワン株式会社製の小型電気炉「MMF-1」で試料を280℃×120minで加熱し、加熱前後の試料の質量差から算出した。
(2)フィルム厚さ
フィルム厚さは、株式会社ミツトヨ製のマイクロメーターを用いて測定した。
(3)全光線透過率、イエローインデックス(YI)、ヘイズ
全光線透過率、YI及びヘイズは、日本電色工業株式会社製の色彩・濁度同時測定器「COH400」を用いて測定した。全光線透過率及びYIの測定はJIS K7361-1:1997に準拠し、ヘイズの測定はJIS K7136:2000に準拠した
(4)厚み位相差(Rth)
厚み位相差(Rth)は、日本分光株式会社製のエリプソメーター「M-220」を用いて測定した。測定波長550nmにおける、厚み位相差の値を測定した。なおRthは、ポリイミドフィルムの面内の屈折率のうち最大のものをnx、最小のものをnyとし、厚み方向の屈折率をnzとし、フィルムの厚みをdとしたとき、下記式によって表されるものである。
Rth=[{(nx+ny)/2}-nz]×d
(1) Solid Content Concentration The solid content concentration of the varnish was measured by heating a sample at 280° C. for 120 min in a small electric furnace “MMF-1” manufactured by AS ONE Corporation, and calculating from the mass difference of the sample before and after heating.
(2) Film Thickness The film thickness was measured using a micrometer manufactured by Mitutoyo Corporation.
(3) Total light transmittance, yellow index (YI), and haze The total light transmittance, YI, and haze were measured using a color and turbidity simultaneous measuring instrument "COH400" manufactured by Nippon Denshoku Industries Co., Ltd. The total light transmittance and YI were measured in accordance with JIS K7361-1:1997, and the haze was measured in accordance with JIS K7136:2000. (4) Thickness retardation (Rth)
The thickness retardation (Rth) was measured using an ellipsometer "M-220" manufactured by JASCO Corporation. The thickness retardation value was measured at a measurement wavelength of 550 nm. Rth is expressed by the following formula, where the maximum in-plane refractive index of the polyimide film is nx, the minimum is ny, the refractive index in the thickness direction is nz, and the thickness of the film is d.
Rth = [{(nx + ny) / 2} - nz] x d

実施例及び比較例にて使用したテトラカルボン酸成分及びジアミン成分、並びにその略号等は下記の通りである。
<テトラカルボン酸成分>
HPMDA:1,2,4,5-シクロヘキサンテトラカルボン酸二無水物(三菱ガス化学株式会社製;式(a-1)で表される化合物)
CpODA:ノルボルナン-2-スピロ-α-シクロペンタノン-α’-スピロ-2’’-ノルボルナン-5,5’’,6,6’’-テトラカルボン酸二無水物(JXTGエネルギー株式会社製;式(a-3)で表される化合物)
<ジアミン成分>
BisAM:1,3-ビス[2-(4-アミノフェニル)-2-プロピル]ベンゼン(三井化学ファイン株式会社製、式(b1-1-1)で表される化合物)
TPER:1,3-ビス(4-アミノフェノキシ)ベンゼン(和歌山精化工業株式会社製、式(b1-1-2)で表される化合物)
APBN:1,3-ビス(3-アミノフェノキシ)ベンゼン(三井化学株式会社製、式(b1-1-3)で表される化合物)
TPEQ:1,4-ビス(4-アミノフェノキシ)ベンゼン(和歌山精化工業株式会社製)
3,5-DABA:3,5-ジアミノ安息香酸(日本純良薬品株式会社製)
BAPA:2,2-ビス(3-アミノ-4-ヒドロキシフェニル)ヘキサフルオロプロパン(和歌山精化工業株式会社製)
ODA:4,4’-ジアミノジフェニルエーテル(和歌山精化工業株式会社製、式(b-3)で表される化合物)
BAPP:2,2-ビス[4-(4-アミノフェノキシ)フェニル]プロパン(和歌山精化工業株式会社製、式(b-2)で表される化合物)
3,4’-DPE:3,4’-ジアミノジフェニルエーテル(和歌山精化工業株式会社製)
BisAP:1,4-ビス[2-(4-アミノフェニル)-2-プロピル]ベンゼン(三井化学ファイン株式会社製、式(b-4)で表される化合物)
The tetracarboxylic acid components and diamine components used in the examples and comparative examples, as well as their abbreviations, are as follows:
<Tetracarboxylic acid component>
HPMDA: 1,2,4,5-cyclohexanetetracarboxylic dianhydride (manufactured by Mitsubishi Gas Chemical Company, Inc.; compound represented by formula (a-1))
CpODA: norbornane-2-spiro-α-cyclopentanone-α'-spiro-2″-norbornane-5,5″,6,6″-tetracarboxylic dianhydride (manufactured by JXTG Energy Corporation; compound represented by formula (a-3))
<Diamine component>
BisAM: 1,3-bis[2-(4-aminophenyl)-2-propyl]benzene (manufactured by Mitsui Fine Chemicals, Inc., a compound represented by formula (b1-1-1))
TPER: 1,3-bis(4-aminophenoxy)benzene (manufactured by Wakayama Seika Kogyo Co., Ltd., a compound represented by formula (b1-1-2))
APBN: 1,3-bis(3-aminophenoxy)benzene (manufactured by Mitsui Chemicals, Inc., a compound represented by formula (b1-1-3))
TPEQ: 1,4-bis(4-aminophenoxy)benzene (manufactured by Wakayama Seika Kogyo Co., Ltd.)
3,5-DABA: 3,5-diaminobenzoic acid (manufactured by Nippon Junryo Pharmaceutical Co., Ltd.)
BAPA: 2,2-bis(3-amino-4-hydroxyphenyl)hexafluoropropane (manufactured by Wakayama Seika Kogyo Co., Ltd.)
ODA: 4,4'-diaminodiphenyl ether (manufactured by Wakayama Seika Kogyo Co., Ltd., a compound represented by formula (b-3))
BAPP: 2,2-bis[4-(4-aminophenoxy)phenyl]propane (manufactured by Wakayama Seika Kogyo Co., Ltd., a compound represented by formula (b-2))
3,4'-DPE: 3,4'-diaminodiphenyl ether (manufactured by Wakayama Seika Kogyo Co., Ltd.)
BisAP: 1,4-bis[2-(4-aminophenyl)-2-propyl]benzene (manufactured by Mitsui Fine Chemicals, Inc., a compound represented by formula (b-4))

実施例及び比較例において使用した、溶媒及び触媒の詳細は下記の通りである。
γ-ブチロラクトン(三菱ケミカル株式会社製)
N,N-ジメチルアセトアミド(三菱ガス化学株式会社製)
トリエチレンジアミン(東京化成工業株式会社製)
トリエチルアミン(関東化学株式会社製)
Details of the solvents and catalysts used in the examples and comparative examples are as follows.
γ-Butyrolactone (Mitsubishi Chemical Corporation)
N,N-Dimethylacetamide (Mitsubishi Gas Chemical Company, Inc.)
Triethylenediamine (Tokyo Chemical Industry Co., Ltd.)
Triethylamine (Kanto Chemical Co., Ltd.)

<実施例1>
反応装置としてステンレス製半月型撹拌翼、窒素導入管、冷却管を取り付けたディーンスターク装置、温度計、及びガラス製エンドキャップを備えた0.3Lの5ツ口ガラス製丸底フラスコを使用し、該丸底フラスコ中で、BisAMを25.920g(0.075モル)、γ-ブチロラクトン(三菱ケミカル株式会社製)を35.0g、及び触媒として、トリエチレンジアミンを0.048g、トリエチルアミンを3.80g入れ、窒素雰囲気下、150rpmで撹拌しながら70℃まで昇温し溶液を得た。この溶液に、HPMDAを16.830g(0.075モル)とγ-ブチロラクトンを17.1g、それぞれ一括で加えた後、マントルヒーターで加熱し、約20分かけて反応系内温度を200℃まで上げた。留去される成分を捕集し、反応系内温度を200℃に5.5時間維持した。N,N-ジメチルアセトアミドを67.71g添加後、100℃付近で約1時間撹拌して、固形分濃度25質量%の均一なポリイミドワニスを得た。
Example 1
A 0.3 L 5-neck glass round-bottom flask equipped with a stainless steel half-moon stirring blade, a nitrogen inlet tube, a Dean-Stark apparatus equipped with a cooling tube, a thermometer, and a glass end cap was used as the reaction apparatus. In the round-bottom flask, 25.920 g (0.075 mol) of BisAM, 35.0 g of γ-butyrolactone (manufactured by Mitsubishi Chemical Corporation), and 0.048 g of triethylenediamine and 3.80 g of triethylamine were placed, and the mixture was heated to 70° C. under a nitrogen atmosphere while stirring at 150 rpm to obtain a solution. To this solution, 16.830 g (0.075 mol) of HPMDA and 17.1 g of γ-butyrolactone were added in one lump, and then the mixture was heated with a mantle heater, and the temperature in the reaction system was raised to 200° C. over about 20 minutes. The components distilled off were collected, and the temperature in the reaction system was maintained at 200° C. for 5.5 hours. After adding 67.71 g of N,N-dimethylacetamide, the mixture was stirred at about 100° C. for about 1 hour to obtain a homogeneous polyimide varnish having a solid content concentration of 25% by mass.

続いて、得られたポリイミドワニスをPET基板上に塗布し、100℃で20分保持し、溶媒を揮発させることで自己支持性を有する無色透明な一次乾燥フィルムを得た。更に該フィルムをステンレス枠に固定し、210℃で空気雰囲気下、20分間乾燥することにより溶媒を除去し、厚み30μmのフィルムを得た。このポリイミドフィルムの評価結果を表1に示す。The resulting polyimide varnish was then applied to a PET substrate and held at 100°C for 20 minutes to evaporate the solvent, yielding a colorless, transparent, self-supporting primary dried film. The film was then fixed to a stainless steel frame and dried at 210°C in an air atmosphere for 20 minutes to remove the solvent, yielding a film with a thickness of 30 μm. The evaluation results of this polyimide film are shown in Table 1.

<実施例2>
実施例1と同じ反応装置を使用し、丸底フラスコ中で、APBNを24.899g(0.085モル)、γ-ブチロラクトンを40.0g、及び触媒として、トリエチルアミンを4.30g入れ、窒素雰囲気下、150rpmで撹拌しながら70℃まで昇温し溶液を得た。この溶液に、HPMDAを19.074g(0.085モル)とγ-ブチロラクトンを13.7g、それぞれ一括で加えた後、マントルヒーターで加熱し、約20分かけて反応系内温度を190℃まで上げた。留去される成分を捕集し、反応系内温度を190℃に3.3時間維持した。N,N-ジメチルアセトアミドを41.6g添加後、100℃付近で約1時間撹拌して、固形分濃度30質量%の均一なポリイミドワニスを得た。
Example 2
Using the same reaction apparatus as in Example 1, 24.899 g (0.085 mol) of APBN, 40.0 g of γ-butyrolactone, and 4.30 g of triethylamine as a catalyst were placed in a round-bottom flask, and the temperature was raised to 70 ° C. while stirring at 150 rpm under a nitrogen atmosphere to obtain a solution. To this solution, 19.074 g (0.085 mol) of HPMDA and 13.7 g of γ-butyrolactone were added in one lump, and then the reaction system temperature was raised to 190 ° C. over about 20 minutes by heating with a mantle heater. The components distilled off were collected, and the reaction system temperature was maintained at 190 ° C. for 3.3 hours. After adding 41.6 g of N,N-dimethylacetamide, the mixture was stirred at about 100 ° C. for about 1 hour to obtain a uniform polyimide varnish with a solid content concentration of 30% by mass.

続いて、得られたポリイミドワニスをPET基板上に塗布し、100℃で20分保持し、溶媒を揮発させることで自己支持性を有する無色透明な一次乾燥フィルムを得た。更に該フィルムをステンレス枠に固定し、210℃で空気雰囲気下、20分間乾燥することにより溶媒を除去し、厚み47μmのフィルムを得た。このポリイミドフィルムの評価結果を表1に示す。The resulting polyimide varnish was then applied to a PET substrate and held at 100°C for 20 minutes to evaporate the solvent, yielding a colorless, transparent, self-supporting primary dried film. The film was then fixed to a stainless steel frame and dried at 210°C in an air atmosphere for 20 minutes to remove the solvent, yielding a film with a thickness of 47 μm. The evaluation results of this polyimide film are shown in Table 1.

<実施例3>
実施例1と同じ反応装置を使用し、丸底フラスコ中で、TPERを24.337g(0.083モル)、γ-ブチロラクトンを45.1g、及び触媒として、トリエチルアミンを2.11g入れ、窒素雰囲気下、150rpmで撹拌しながら70℃まで昇温し溶液を得た。この溶液に、HPMDAを18.701g(0.083モル)とN,N-ジメチルアセトアミドを19.4g、それぞれ一括で加えた後、マントルヒーターで加熱し、約20分かけて反応系内温度を190℃まで上げた。留去される成分を捕集し、反応系内温度を190℃に2.7時間維持した。N,N-ジメチルアセトアミドを64.5g添加後、100℃付近で約1時間撹拌して、固形分濃度24質量%の均一なポリイミドワニスを得た。
Example 3
Using the same reaction apparatus as in Example 1, 24.337 g (0.083 mol) of TPER, 45.1 g of γ-butyrolactone, and 2.11 g of triethylamine as a catalyst were placed in a round-bottom flask, and the mixture was heated to 70 ° C. under a nitrogen atmosphere while stirring at 150 rpm to obtain a solution. To this solution, 18.701 g (0.083 mol) of HPMDA and 19.4 g of N,N-dimethylacetamide were added in one lump, and then the mixture was heated with a mantle heater to raise the temperature in the reaction system to 190 ° C. over about 20 minutes. The components distilled off were collected, and the temperature in the reaction system was maintained at 190 ° C. for 2.7 hours. After adding 64.5 g of N,N-dimethylacetamide, the mixture was stirred at about 100 ° C. for about 1 hour to obtain a uniform polyimide varnish with a solid content concentration of 24 mass%.

続いて、得られたポリイミドワニスをPET基板上に塗布し、100℃で20分保持し、溶媒を揮発させることで自己支持性を有する無色透明な一次乾燥フィルムを得た。更に該フィルムをステンレス枠に固定し、210℃で空気雰囲気下、20分間乾燥することにより溶媒を除去し、厚み31μmのフィルムを得た。このポリイミドフィルムの評価結果を表1に示す。The resulting polyimide varnish was then applied to a PET substrate and held at 100°C for 20 minutes to evaporate the solvent, yielding a colorless, transparent, self-supporting primary dried film. The film was then fixed to a stainless steel frame and dried at 210°C in an air atmosphere for 20 minutes to remove the solvent, yielding a film with a thickness of 31 μm. The evaluation results of this polyimide film are shown in Table 1.

<比較例1>
実施例1と同じ反応装置を使用し、丸底フラスコ中で、TPEQを23.370g(0.080モル)、γ-ブチロラクトンを40.4g、及び触媒として、トリエチルアミンを0.41g入れ、窒素雰囲気下、150rpmで撹拌しながら80℃まで昇温し溶液を得た。この溶液に、HPMDAを17.934g(0.080モル)とγ-ブチロラクトンを10.1g、それぞれ一括で加えた後、マントルヒーターで加熱し、約20分かけて反応系内温度を200℃まで上げた。留去される成分を捕集し、反応系内温度を200℃に2.5時間維持した。N,N-ジメチルアセトアミドを103.3g添加後、100℃付近で約1時間撹拌して、固形分濃度20質量%の均一なポリイミドワニスを得た。
<Comparative Example 1>
Using the same reaction apparatus as in Example 1, 23.370 g (0.080 mol) of TPEQ, 40.4 g of γ-butyrolactone, and 0.41 g of triethylamine as a catalyst were placed in a round-bottom flask, and the temperature was raised to 80 ° C. while stirring at 150 rpm under a nitrogen atmosphere to obtain a solution. To this solution, 17.934 g (0.080 mol) of HPMDA and 10.1 g of γ-butyrolactone were added in one lump, and then the reaction system temperature was raised to 200 ° C. over about 20 minutes by heating with a mantle heater. The components distilled off were collected, and the reaction system temperature was maintained at 200 ° C. for 2.5 hours. After adding 103.3 g of N,N-dimethylacetamide, the mixture was stirred at about 100 ° C. for about 1 hour to obtain a uniform polyimide varnish with a solid content concentration of 20 mass%.

続いて、得られたポリイミドワニスをPET基板上に塗布し、100℃で20分保持し、溶媒を揮発させることで自己支持性を有する無色透明な一次乾燥フィルムを得た。更に該フィルムをステンレス枠に固定し、210℃で空気雰囲気下、20分間乾燥することにより溶媒を除去し、厚み18μmのフィルムを得た。このポリイミドフィルムの評価結果を表1に示す。The resulting polyimide varnish was then applied to a PET substrate and held at 100°C for 20 minutes to evaporate the solvent, yielding a colorless, transparent, self-supporting primary dried film. The film was then fixed to a stainless steel frame and dried at 210°C in an air atmosphere for 20 minutes to remove the solvent, yielding a film with a thickness of 18 μm. The evaluation results of this polyimide film are shown in Table 1.

<比較例2>
実施例1と同じ反応装置を使用し、丸底フラスコ中で、3,5-DABAを28.559g(0.188モル)、γ-ブチロラクトンを132.1g、及び触媒として、トリエチルアミンを0.95g入れ、窒素雰囲気下、150rpmで撹拌しながら70℃まで昇温し溶液を得た。この溶液に、HPMDAを42.132g(0.188モル)とγ-ブチロラクトンを33.03g、それぞれ一括で加えた後、マントルヒーターで加熱し、約20分かけて反応系内温度を190℃まで上げた。留去される成分を捕集し、反応系内温度を190℃に5.0時間維持した。γ-ブチロラクトンを90.86g添加後、100℃付近で約1時間撹拌して、固形分濃度20質量%の均一なポリイミドワニスを得た。
<Comparative Example 2>
Using the same reaction apparatus as in Example 1, 28.559 g (0.188 mol) of 3,5-DABA, 132.1 g of γ-butyrolactone, and 0.95 g of triethylamine as a catalyst were placed in a round-bottom flask, and the mixture was heated to 70° C. under a nitrogen atmosphere while stirring at 150 rpm to obtain a solution. 42.132 g (0.188 mol) of HPMDA and 33.03 g of γ-butyrolactone were added to the solution in a lump, and then the mixture was heated with a mantle heater to raise the temperature in the reaction system to 190° C. over about 20 minutes. The components distilled off were collected, and the temperature in the reaction system was maintained at 190° C. for 5.0 hours. After adding 90.86 g of γ-butyrolactone, the mixture was stirred at about 100° C. for about 1 hour to obtain a uniform polyimide varnish with a solid content concentration of 20% by mass.

続いて、得られたポリイミドワニスをPET基板上に塗布し、100℃で20分保持し、溶媒を揮発させることで自己支持性を有する無色透明な一次乾燥フィルムを得た。更に該フィルムをステンレス枠に固定し、210℃で空気雰囲気下、20分間乾燥することにより溶媒を除去し、厚み29μmのフィルムを得た。このポリイミドフィルムの評価結果を表1に示す。The resulting polyimide varnish was then applied to a PET substrate and held at 100°C for 20 minutes to evaporate the solvent, yielding a colorless, transparent, self-supporting primary dried film. The film was then fixed to a stainless steel frame and dried at 210°C for 20 minutes in an air atmosphere to remove the solvent, yielding a film with a thickness of 29 μm. The evaluation results of this polyimide film are shown in Table 1.

<比較例3>
実施例1と同じ反応装置を使用し、丸底フラスコ中で、BAPAを42.278g(0.115モル)、γ-ブチロラクトンを81.8g、及び触媒として、トリエチルアミンを0.58g入れ、窒素雰囲気下、150rpmで撹拌しながら70℃まで昇温し溶液を得た。この溶液に、HPMDAを25.877g(0.115モル)とγ-ブチロラクトンを20.4g、それぞれ一括で加えた後、マントルヒーターで加熱し、約20分かけて反応系内温度を190℃まで上げた。留去される成分を捕集し、反応系内温度を190℃に5.0時間維持した。γ-ブチロラクトンを153.8g添加後、100℃付近で約1時間撹拌して、固形分濃度20質量%の均一なポリイミドワニスを得た。
<Comparative Example 3>
Using the same reaction apparatus as in Example 1, 42.278 g (0.115 mol) of BAPA, 81.8 g of γ-butyrolactone, and 0.58 g of triethylamine as a catalyst were placed in a round-bottom flask, and the mixture was heated to 70 ° C. under a nitrogen atmosphere while stirring at 150 rpm to obtain a solution. 25.877 g (0.115 mol) of HPMDA and 20.4 g of γ-butyrolactone were added to the solution in one lump, and then the mixture was heated with a mantle heater to raise the temperature in the reaction system to 190 ° C. over about 20 minutes. The components distilled off were collected, and the temperature in the reaction system was maintained at 190 ° C. for 5.0 hours. After adding 153.8 g of γ-butyrolactone, the mixture was stirred at about 100 ° C. for about 1 hour to obtain a uniform polyimide varnish with a solid content concentration of 20% by mass.

続いて、得られたポリイミドワニスをPET基板上に塗布し、100℃で20分保持し、溶媒を揮発させることで自己支持性を有する無色透明な一次乾燥フィルムを得た。更に該フィルムをステンレス枠に固定し、210℃で空気雰囲気下、20分間乾燥することにより溶媒を除去し、厚み26μmのフィルムを得た。このポリイミドフィルムの評価結果を表1に示す。The resulting polyimide varnish was then applied to a PET substrate and held at 100°C for 20 minutes to evaporate the solvent, yielding a colorless, transparent, self-supporting primary dried film. The film was then fixed to a stainless steel frame and dried at 210°C in an air atmosphere for 20 minutes to remove the solvent, yielding a film with a thickness of 26 μm. The evaluation results of this polyimide film are shown in Table 1.

<比較例4>
実施例1と同じ反応装置を使用し、丸底フラスコ中で、ODAを20.024g(0.100モル)、γ-ブチロラクトンを45.0g、及び触媒として、トリエチルアミンを1.52g入れ、窒素雰囲気下、150rpmで撹拌しながら70℃まで昇温し溶液を得た。この溶液に、HPMDAを22.417g(0.100モル)とγ-ブチロラクトンを18.7g、それぞれ一括で加えた後、マントルヒーターで加熱し、約20分かけて反応系内温度を200℃まで上げた。留去される成分を捕集し、反応系内温度を200℃に4.0時間維持した。N,N-ジメチルアセトアミドを91.7g添加後、100℃付近で約1時間撹拌して、固形分濃度20質量%の均一なポリイミドワニスを得た。
<Comparative Example 4>
Using the same reaction apparatus as in Example 1, 20.024 g (0.100 mol) of ODA, 45.0 g of γ-butyrolactone, and 1.52 g of triethylamine as a catalyst were placed in a round-bottom flask, and the mixture was heated to 70° C. under a nitrogen atmosphere while stirring at 150 rpm to obtain a solution. 22.417 g (0.100 mol) of HPMDA and 18.7 g of γ-butyrolactone were added to the solution in a lump, and the mixture was heated with a mantle heater to raise the temperature in the reaction system to 200° C. over about 20 minutes. The components distilled off were collected, and the temperature in the reaction system was maintained at 200° C. for 4.0 hours. 91.7 g of N,N-dimethylacetamide was added, and the mixture was stirred at about 100° C. for about 1 hour to obtain a uniform polyimide varnish with a solid content concentration of 20% by mass.

続いて、得られたポリイミドワニスをPET基板上に塗布し、100℃で20分保持し、溶媒を揮発させることで自己支持性を有する無色透明な一次乾燥フィルムを得た。更に該フィルムをステンレス枠に固定し、210℃で空気雰囲気下、20分間乾燥することにより溶媒を除去し、厚み40μmのフィルムを得た。このポリイミドフィルムの評価結果を表1に示す。The resulting polyimide varnish was then applied to a PET substrate and held at 100°C for 20 minutes to evaporate the solvent, yielding a colorless, transparent, self-supporting primary dried film. The film was then fixed to a stainless steel frame and dried at 210°C in an air atmosphere for 20 minutes to remove the solvent, yielding a film with a thickness of 40 μm. The evaluation results of this polyimide film are shown in Table 1.

<比較例5>
実施例1と同じ反応装置を使用し、丸底フラスコ中で、BAPPを43.745g(0.107モル)、γ-ブチロラクトンを81.4g、及び触媒として、トリエチルアミンを0.54g入れ、窒素雰囲気下、150rpmで撹拌しながら70℃まで昇温し溶液を得た。この溶液に、HPMDAを23.887g(0.107モル)とγ-ブチロラクトン(三菱化学株式会社製)を20.3g、それぞれ一括で加えた後、マントルヒーターで加熱し、約20分かけて反応系内温度を190℃まで上げた。留去される成分を捕集し、反応系内温度を190℃に4.0時間維持した。γ-ブチロラクトン(三菱化学株式会社製)を154.2g添加後、100℃付近で約1時間撹拌して、固形分濃度20質量%の均一なポリイミドワニスを得た。
<Comparative Example 5>
Using the same reaction apparatus as in Example 1, 43.745 g (0.107 mol) of BAPP, 81.4 g of γ-butyrolactone, and 0.54 g of triethylamine as a catalyst were placed in a round-bottom flask, and the temperature was raised to 70 ° C. while stirring at 150 rpm under a nitrogen atmosphere to obtain a solution. 23.887 g (0.107 mol) of HPMDA and 20.3 g of γ-butyrolactone (manufactured by Mitsubishi Chemical Corporation) were added to this solution all at once, and then the solution was heated with a mantle heater to raise the temperature in the reaction system to 190 ° C. over about 20 minutes. The components distilled off were collected, and the temperature in the reaction system was maintained at 190 ° C. for 4.0 hours. After adding 154.2 g of γ-butyrolactone (manufactured by Mitsubishi Chemical Corporation), the mixture was stirred at about 100 ° C. for about 1 hour to obtain a uniform polyimide varnish with a solid content concentration of 20% by mass.

続いて、得られたポリイミドワニスをPET基板上に塗布し、100℃で20分保持し、溶媒を揮発させることで自己支持性を有する無色透明な一次乾燥フィルムを得た。更に該フィルムをステンレス枠に固定し、210℃で空気雰囲気下、20分間乾燥することにより溶媒を除去し、厚み33μmのフィルムを得た。このポリイミドフィルムの評価結果を表1に示す。The resulting polyimide varnish was then applied to a PET substrate and held at 100°C for 20 minutes to evaporate the solvent, yielding a colorless, transparent, self-supporting primary dried film. The film was then fixed to a stainless steel frame and dried at 210°C for 20 minutes in an air atmosphere to remove the solvent, yielding a film with a thickness of 33 μm. The evaluation results of this polyimide film are shown in Table 1.

<比較例6>
実施例1と同じ反応装置を使用し、丸底フラスコ中で、3,4’-DPEを20.024g(0.100モル)、γ-ブチロラクトンを45.0g、及び触媒として、トリエチレンジアミンを0.065g、トリエチルアミンを1.52g入れ、窒素雰囲気下、150rpmで撹拌しながら70℃まで昇温し溶液を得た。この溶液に、HPMDAを22.417g(0.100モル)とγ-ブチロラクトンを18.7g、それぞれ一括で加えた後、マントルヒーターで加熱し、約20分かけて反応系内温度を200℃まで上げた。留去される成分を捕集し、反応系内温度を200℃に4.0時間維持した。N,N-ジメチルアセトアミドを91.7g添加後、100℃付近で約1時間撹拌して、固形分濃度20質量%の均一なポリイミドワニスを得た。
<Comparative Example 6>
Using the same reaction apparatus as in Example 1, 20.024 g (0.100 mol) of 3,4'-DPE, 45.0 g of γ-butyrolactone, and 0.065 g of triethylenediamine and 1.52 g of triethylamine as catalysts were added in a round-bottom flask, and the temperature was raised to 70 ° C. while stirring at 150 rpm under a nitrogen atmosphere to obtain a solution. 22.417 g (0.100 mol) of HPMDA and 18.7 g of γ-butyrolactone were added to this solution in one lump, and then the solution was heated with a mantle heater to raise the temperature in the reaction system to 200 ° C. over about 20 minutes. The components distilled off were collected, and the temperature in the reaction system was maintained at 200 ° C. for 4.0 hours. After adding 91.7 g of N,N-dimethylacetamide, the mixture was stirred at about 100 ° C. for about 1 hour to obtain a uniform polyimide varnish with a solid content concentration of 20% by mass.

続いて、得られたポリイミドワニスをPET基板上に塗布し、100℃で20分保持し、溶媒を揮発させることで自己支持性を有する無色透明な一次乾燥フィルムを得た。更に該フィルムをステンレス枠に固定し、210℃で空気雰囲気下、20分間乾燥することにより溶媒を除去し、厚み25μmのフィルムを得た。このポリイミドフィルムの評価結果を表1に示す。The resulting polyimide varnish was then applied to a PET substrate and held at 100°C for 20 minutes to evaporate the solvent, yielding a colorless, transparent, self-supporting primary dried film. The film was then fixed to a stainless steel frame and dried at 210°C for 20 minutes in an air atmosphere to remove the solvent, yielding a film with a thickness of 25 μm. The evaluation results of this polyimide film are shown in Table 1.

Figure 0007463964000011
Figure 0007463964000011

<実施例4>
実施例1と同じ反応装置を使用し、丸底フラスコ中で、ODAを14.417g(0.072モル)、BisAMを6.201g(0.018モル)、γ-ブチロラクトンを40.0g、及び触媒として、トリエチレンジアミンを0.050g、トリエチルアミンを4.55g入れ、窒素雰囲気下、150rpmで撹拌しながら70℃まで昇温し溶液を得た。この溶液に、HPMDAを20.175g(0.090モル)とγ-ブチロラクトンを10.0g、それぞれ一括で加えた後、マントルヒーターで加熱し、約20分かけて反応系内温度を200℃まで上げた。留去される成分を捕集し、反応系内温度を200℃に0.7時間維持した。N,N-ジメチルアセトアミドを38.0g添加後、100℃付近で約1時間撹拌して、固形分濃度30質量%の均一なポリイミドワニスを得た。
Example 4
Using the same reaction apparatus as in Example 1, 14.417 g (0.072 mol) of ODA, 6.201 g (0.018 mol) of BisAM, 40.0 g of γ-butyrolactone, and 0.050 g of triethylenediamine and 4.55 g of triethylamine as catalysts were placed in a round-bottom flask, and the mixture was heated to 70° C. under a nitrogen atmosphere while stirring at 150 rpm to obtain a solution. 20.175 g (0.090 mol) of HPMDA and 10.0 g of γ-butyrolactone were added to the solution in a lump, and the mixture was heated with a mantle heater to raise the temperature in the reaction system to 200° C. over about 20 minutes. The components distilled off were collected, and the temperature in the reaction system was maintained at 200° C. for 0.7 hours. After adding 38.0 g of N,N-dimethylacetamide, the mixture was stirred at about 100° C. for about 1 hour to obtain a homogeneous polyimide varnish having a solid content concentration of 30% by mass.

続いて、得られたポリイミドワニスをPET基板上に塗布し、100℃で20分保持し、溶媒を揮発させることで自己支持性を有する無色透明な一次乾燥フィルムを得た。更に該フィルムをステンレス枠に固定し、210℃で空気雰囲気下、20分間乾燥することにより溶媒を除去し、厚み42μmのフィルムを得た。このポリイミドフィルムの評価結果を表1に示す。The resulting polyimide varnish was then applied to a PET substrate and held at 100°C for 20 minutes to evaporate the solvent, yielding a colorless, transparent, self-supporting primary dried film. The film was then fixed to a stainless steel frame and dried at 210°C in an air atmosphere for 20 minutes to remove the solvent, yielding a film with a thickness of 42 μm. The evaluation results of this polyimide film are shown in Table 1.

<実施例5>
実施例1と同じ反応装置を使用し、丸底フラスコ中で、ODAを10.012g(0.050モル)、BisAMを17.225g(0.050モル)、γ-ブチロラクトンを48.7g、及び触媒として、トリエチレンジアミンを0.056g、トリエチルアミンを5.06g入れ、窒素雰囲気下、150rpmで撹拌しながら70℃まで昇温し溶液を得た。この溶液に、HPMDAを22.417g(0.10モル)とγ-ブチロラクトンを12.2g、それぞれ一括で加えた後、マントルヒーターで加熱し、約20分かけて反応系内温度を200℃まで上げた。留去される成分を捕集し、反応系内温度を200℃に0.6時間維持した。N,N-ジメチルアセトアミドを77.8g添加後、100℃付近で約1時間撹拌して、固形分濃度25質量%の均一なポリイミドワニスを得た。
Example 5
Using the same reaction apparatus as in Example 1, 10.012 g (0.050 mol) of ODA, 17.225 g (0.050 mol) of BisAM, 48.7 g of γ-butyrolactone, and 0.056 g of triethylenediamine and 5.06 g of triethylamine as catalysts were placed in a round-bottom flask, and the mixture was heated to 70° C. under a nitrogen atmosphere while stirring at 150 rpm to obtain a solution. 22.417 g (0.10 mol) of HPMDA and 12.2 g of γ-butyrolactone were added to the solution in a lump, and the mixture was heated with a mantle heater to raise the temperature in the reaction system to 200° C. over about 20 minutes. The components distilled off were collected, and the temperature in the reaction system was maintained at 200° C. for 0.6 hours. After adding 77.8 g of N,N-dimethylacetamide, the mixture was stirred at about 100° C. for about 1 hour to obtain a homogeneous polyimide varnish having a solid content concentration of 25% by mass.

続いて、得られたポリイミドワニスをPET基板上に塗布し、100℃で20分保持し、溶媒を揮発させることで自己支持性を有する無色透明な一次乾燥フィルムを得た。更に該フィルムをステンレス枠に固定し、210℃で空気雰囲気下、20分間乾燥することにより溶媒を除去し、厚み34μmのフィルムを得た。このポリイミドフィルムの評価結果を表1に示す。The resulting polyimide varnish was then applied to a PET substrate and held at 100°C for 20 minutes to evaporate the solvent, yielding a colorless, transparent, self-supporting primary dried film. The film was then fixed to a stainless steel frame and dried at 210°C in an air atmosphere for 20 minutes to remove the solvent, yielding a film with a thickness of 34 μm. The evaluation results of this polyimide film are shown in Table 1.

<実施例6>
反応装置として、実施例1と同様の3.0Lの装置を使用し、丸底フラスコ中で、ODAを23.228g(0.116モル)、BisAMを159.848g(0.464モル)、γ-ブチロラクトンを307.0g、及び触媒として、トリエチレンジアミンを0.325g、トリエチルアミンを29.345g入れ、窒素雰囲気下、150rpmで撹拌しながら70℃まで昇温し溶液を得た。この溶液に、HPMDAを130.019g(0.580モル)とγ-ブチロラクトンを76.8g、それぞれ一括で加えた後、マントルヒーターで加熱し、約20分かけて反応系内温度を200℃まで上げた。留去される成分を捕集し、反応系内温度を200℃に2.0時間維持した。N,N-ジメチルアセトアミドを300.0g添加後、100℃付近で約1時間撹拌して、固形分濃度30質量%の均一なポリイミドワニスを得た。
Example 6
As a reaction apparatus, a 3.0 L apparatus similar to that in Example 1 was used, and 23.228 g (0.116 mol) of ODA, 159.848 g (0.464 mol) of BisAM, 307.0 g of γ-butyrolactone, and 0.325 g of triethylenediamine and 29.345 g of triethylamine as catalysts were placed in a round-bottom flask, and the mixture was heated to 70° C. while stirring at 150 rpm under a nitrogen atmosphere to obtain a solution. 130.019 g (0.580 mol) of HPMDA and 76.8 g of γ-butyrolactone were added to this solution in one lump, and then the mixture was heated with a mantle heater, and the temperature in the reaction system was raised to 200° C. over about 20 minutes. The components distilled off were collected, and the temperature in the reaction system was maintained at 200° C. for 2.0 hours. After adding 300.0 g of N,N-dimethylacetamide, the mixture was stirred at about 100° C. for about 1 hour to obtain a homogeneous polyimide varnish having a solid content concentration of 30% by mass.

続いて、得られたポリイミドワニスをPET基板上に塗布し、段階的に温度を上げていき、最高温度140℃で約2分保持し、溶媒を揮発させることで自己支持性を有する無色透明な一次乾燥フィルムを得た。更に該フィルムをステンレス枠に固定し、210℃で空気雰囲気下、20分間乾燥することにより溶媒を除去し、厚み32μmのフィルムを得た。このポリイミドフィルムの評価結果を表1に示す。The resulting polyimide varnish was then applied to a PET substrate and the temperature was gradually increased, with the maximum temperature being held at 140°C for approximately 2 minutes to volatilize the solvent, yielding a colorless, transparent, self-supporting primary dried film. The film was then fixed to a stainless steel frame and dried at 210°C in an air atmosphere for 20 minutes to remove the solvent, yielding a film with a thickness of 32 μm. The evaluation results of this polyimide film are shown in Table 1.

Figure 0007463964000012
Figure 0007463964000012

<実施例7>
実施例1と同じ反応装置を使用し、丸底フラスコ中で、BAPPを27.259g(0.066モル)、BisAMを5.719g(0.017モル)、γ-ブチロラクトンを50.6g、及び触媒として、トリエチレンジアミンを0.047g、トリエチルアミンを4.20g入れ、窒素雰囲気下、150rpmで撹拌しながら70℃まで昇温し溶液を得た。この溶液に、HPMDAを18.606g(0.083モル)とγ-ブチロラクトンを12.6g、それぞれ一括で加えた後、マントルヒーターで加熱し、約20分かけて反応系内温度を200℃まで上げた。留去される成分を捕集し、反応系内温度を200℃に0.5時間維持した。N,N-ジメチルアセトアミドを83.0g添加後、100℃付近で約1時間撹拌して、固形分濃度25質量%の均一なポリイミドワニスを得た。
Example 7
Using the same reaction apparatus as in Example 1, 27.259 g (0.066 mol) of BAPP, 5.719 g (0.017 mol) of BisAM, 50.6 g of γ-butyrolactone, and 0.047 g of triethylenediamine and 4.20 g of triethylamine as catalysts were placed in a round-bottom flask, and the mixture was heated to 70° C. under a nitrogen atmosphere while stirring at 150 rpm to obtain a solution. To this solution, 18.606 g (0.083 mol) of HPMDA and 12.6 g of γ-butyrolactone were added in one lump, and then the mixture was heated with a mantle heater, and the temperature in the reaction system was raised to 200° C. over about 20 minutes. The components distilled off were collected, and the temperature in the reaction system was maintained at 200° C. for 0.5 hours. After adding 83.0 g of N,N-dimethylacetamide, the mixture was stirred at about 100° C. for about 1 hour to obtain a homogeneous polyimide varnish having a solid content concentration of 25% by mass.

続いて、得られたポリイミドワニスをPET基板上に塗布し、100℃で20分保持し、溶媒を揮発させることで自己支持性を有する無色透明な一次乾燥フィルムを得た。更に該フィルムをステンレス枠に固定し、210℃で空気雰囲気下、20分間乾燥することにより溶媒を除去し、厚み47μmのフィルムを得た。このポリイミドフィルムの評価結果を表1に示す。The resulting polyimide varnish was then applied to a PET substrate and held at 100°C for 20 minutes to evaporate the solvent, yielding a colorless, transparent, self-supporting primary dried film. The film was then fixed to a stainless steel frame and dried at 210°C in an air atmosphere for 20 minutes to remove the solvent, yielding a film with a thickness of 47 μm. The evaluation results of this polyimide film are shown in Table 1.

<実施例8>
実施例1と同じ反応装置を使用し、丸底フラスコ中で、BAPPを16.421g(0.040モル)、BisAMを13.780g(0.040モル)γ-ブチロラクトンを40.0g、及び触媒として、トリエチレンジアミンを0.044g、トリエチルアミンを4.05g入れ、窒素雰囲気下、150rpmで撹拌しながら70℃まで昇温し溶液を得た。この溶液に、HPMDAを17.934g(0.080モル)とγ-ブチロラクトンを18.8g、それぞれ一括で加えた後、マントルヒーターで加熱し、約20分かけて反応系内温度を190℃まで上げた。留去される成分を捕集し、反応系内温度を190℃に2.2時間維持した。N,N-ジメチルアセトアミドを122.2g添加後、100℃付近で約1時間撹拌して、固形分濃度20質量%の均一なポリイミドワニスを得た。
Example 8
Using the same reaction apparatus as in Example 1, 16.421 g (0.040 mol) of BAPP, 13.780 g (0.040 mol) of BisAM, 40.0 g of γ-butyrolactone, and 0.044 g of triethylenediamine and 4.05 g of triethylamine as catalysts were placed in a round-bottom flask, and the mixture was heated to 70 ° C. while stirring at 150 rpm under a nitrogen atmosphere to obtain a solution. To this solution, 17.934 g (0.080 mol) of HPMDA and 18.8 g of γ-butyrolactone were added in one lump, and then the mixture was heated with a mantle heater, and the temperature in the reaction system was raised to 190 ° C. over about 20 minutes. The components distilled off were collected, and the temperature in the reaction system was maintained at 190 ° C. for 2.2 hours. After adding 122.2 g of N,N-dimethylacetamide, the mixture was stirred at about 100° C. for about 1 hour to obtain a homogeneous polyimide varnish having a solid content concentration of 20% by mass.

続いて、得られたポリイミドワニスをPET基板上に塗布し、100℃で20分保持し、溶媒を揮発させることで自己支持性を有する無色透明な一次乾燥フィルムを得た。更に該フィルムをステンレス枠に固定し、210℃で空気雰囲気下、20分間乾燥することにより溶媒を除去し、厚み30μmのフィルムを得た。このポリイミドフィルムの評価結果を表1に示す。The resulting polyimide varnish was then applied to a PET substrate and held at 100°C for 20 minutes to evaporate the solvent, yielding a colorless, transparent, self-supporting primary dried film. The film was then fixed to a stainless steel frame and dried at 210°C in an air atmosphere for 20 minutes to remove the solvent, yielding a film with a thickness of 30 μm. The evaluation results of this polyimide film are shown in Table 1.

<実施例9>
実施例1と同じ反応装置を使用し、丸底フラスコ中で、BAPPを6.568g(0.016モル)、BisAMを22.048g(0.064モル)、γ-ブチロラクトンを30.0g、及び触媒として、トリエチレンジアミンを0.044g、トリエチルアミンを4.05g入れ、窒素雰囲気下、150rpmで撹拌しながら70℃まで昇温し溶液を得た。この溶液に、HPMDAを17.934g(0.080モル)とγ-ブチロラクトンを16.6g、それぞれ一括で加えた後、マントルヒーターで加熱し、約20分かけて反応系内温度を190℃まで上げた。留去される成分を捕集し、反応系内温度を190℃に1.4時間維持した。N,N-ジメチルアセトアミドを84.4g添加後、100℃付近で約1時間撹拌して、固形分濃度25質量%の均一なポリイミドワニスを得た。
<Example 9>
Using the same reaction apparatus as in Example 1, 6.568 g (0.016 mol) of BAPP, 22.048 g (0.064 mol) of BisAM, 30.0 g of γ-butyrolactone, and 0.044 g of triethylenediamine and 4.05 g of triethylamine as catalysts were placed in a round-bottom flask, and the mixture was heated to 70° C. under a nitrogen atmosphere while stirring at 150 rpm to obtain a solution. To this solution, 17.934 g (0.080 mol) of HPMDA and 16.6 g of γ-butyrolactone were added in one lump, and then the mixture was heated with a mantle heater to raise the temperature in the reaction system to 190° C. over about 20 minutes. The components distilled off were collected, and the temperature in the reaction system was maintained at 190° C. for 1.4 hours. After adding 84.4 g of N,N-dimethylacetamide, the mixture was stirred at about 100° C. for about 1 hour to obtain a homogeneous polyimide varnish having a solid content concentration of 25% by mass.

続いて、得られたポリイミドワニスをPET基板上に塗布し、100℃で20分保持し、溶媒を揮発させることで自己支持性を有する無色透明な一次乾燥フィルムを得た。更に該フィルムをステンレス枠に固定し、210℃で空気雰囲気下、20分間乾燥することにより溶媒を除去し、厚み35μmのフィルムを得た。このポリイミドフィルムの評価結果を表1に示す。The resulting polyimide varnish was then applied to a PET substrate and held at 100°C for 20 minutes to evaporate the solvent, yielding a colorless, transparent, self-supporting primary dried film. The film was then fixed to a stainless steel frame and dried at 210°C in an air atmosphere for 20 minutes to remove the solvent, yielding a film with a thickness of 35 μm. The evaluation results of this polyimide film are shown in Table 1.

Figure 0007463964000013
Figure 0007463964000013

<実施例10>
実施例1と同じ反応装置を使用し、丸底フラスコ中で、BisAMを27.560g(0.080モル)γ-ブチロラクトンを30.8g、及び触媒として、トリエチレンジアミンを0.022g、トリエチルアミンを2.02g入れ、窒素雰囲気下、150rpmで撹拌しながら70℃まで昇温し溶液を得た。この溶液に、HPMDAを8.967g(0.040モル)、CpODAを15.375g(0.040モル)、γ-ブチロラクトンを32.9g、それぞれ一括で加えた後、マントルヒーターで加熱し、約20分かけて反応系内温度を190℃まで上げた。留去される成分を捕集し、反応系内温度を190℃に2.0時間維持した。N,N-ジメチルアセトアミドを88.0g添加後、100℃付近で約1時間撹拌して、固形分濃度25質量%の均一なポリイミドワニスを得た。
Example 10
Using the same reaction apparatus as in Example 1, 27.560 g (0.080 mol) of BisAM, 30.8 g of γ-butyrolactone, and 0.022 g of triethylenediamine and 2.02 g of triethylamine as catalysts were placed in a round-bottom flask, and the mixture was heated to 70° C. under a nitrogen atmosphere while stirring at 150 rpm to obtain a solution. 8.967 g (0.040 mol) of HPMDA, 15.375 g (0.040 mol) of CpODA, and 32.9 g of γ-butyrolactone were added to the solution in a lump, and the mixture was heated with a mantle heater to raise the temperature in the reaction system to 190° C. over about 20 minutes. The components distilled off were collected, and the temperature in the reaction system was maintained at 190° C. for 2.0 hours. After adding 88.0 g of N,N-dimethylacetamide, the mixture was stirred at about 100° C. for about 1 hour to obtain a homogeneous polyimide varnish having a solid content concentration of 25% by mass.

続いて、得られたポリイミドワニスをPET基板上に塗布し、100℃で20分保持し、溶媒を揮発させることで自己支持性を有する無色透明な一次乾燥フィルムを得た。更に該フィルムをステンレス枠に固定し、210℃で空気雰囲気下、20分間乾燥することにより溶媒を除去し、厚み38μmのフィルムを得た。このポリイミドフィルムの評価結果を表1に示す。The resulting polyimide varnish was then applied to a PET substrate and held at 100°C for 20 minutes to evaporate the solvent, yielding a colorless, transparent, self-supporting primary dried film. The film was then fixed to a stainless steel frame and dried at 210°C for 20 minutes in an air atmosphere to remove the solvent, yielding a film with a thickness of 38 μm. The evaluation results of this polyimide film are shown in Table 1.

<実施例11>
実施例1と同じ反応装置を使用し、丸底フラスコ中で、BisAPを13.780g(0.040モル)、BisAMを13.780g(0.040モル)、γ-ブチロラクトンを40.0g、及び触媒として、トリエチレンジアミンを0.044g、トリエチルアミンを4.05g入れ、窒素雰囲気下、150rpmで撹拌しながら70℃まで昇温し溶液を得た。この溶液に、HPMDAを17.934g(0.080モル)とγ-ブチロラクトンを15.6g、それぞれ一括で加えた後、マントルヒーターで加熱し、約20分かけて反応系内温度を190℃まで上げた。留去される成分を捕集し、反応系内温度を190℃に3.5時間維持した。N,N-ジメチルアセトアミドを114.8g添加後、100℃付近で約1時間撹拌して、固形分濃度20質量%の均一なポリイミドワニスを得た。
Example 11
Using the same reaction apparatus as in Example 1, 13.780 g (0.040 mol) of BisAP, 13.780 g (0.040 mol) of BisAM, 40.0 g of γ-butyrolactone, and 0.044 g of triethylenediamine and 4.05 g of triethylamine as catalysts were placed in a round-bottom flask, and the mixture was heated to 70° C. under a nitrogen atmosphere while stirring at 150 rpm to obtain a solution. 17.934 g (0.080 mol) of HPMDA and 15.6 g of γ-butyrolactone were added to this solution in one lump, and then the mixture was heated with a mantle heater to raise the temperature in the reaction system to 190° C. over about 20 minutes. The components distilled off were collected, and the temperature in the reaction system was maintained at 190° C. for 3.5 hours. After adding 114.8 g of N,N-dimethylacetamide, the mixture was stirred at about 100° C. for about 1 hour to obtain a homogeneous polyimide varnish having a solid content concentration of 20% by mass.

続いて、得られたポリイミドワニスをPET基板上に塗布し、100℃で20分保持し、溶媒を揮発させることで自己支持性を有する無色透明な一次乾燥フィルムを得た。更に該フィルムをステンレス枠に固定し、210℃で空気雰囲気下、20分間乾燥することにより溶媒を除去し、厚み35μmのフィルムを得た。このポリイミドフィルムの評価結果を表1に示す。The resulting polyimide varnish was then applied to a PET substrate and held at 100°C for 20 minutes to evaporate the solvent, yielding a colorless, transparent, self-supporting primary dried film. The film was then fixed to a stainless steel frame and dried at 210°C in an air atmosphere for 20 minutes to remove the solvent, yielding a film with a thickness of 35 μm. The evaluation results of this polyimide film are shown in Table 1.

Figure 0007463964000014
Figure 0007463964000014

表1に示すように、特定のテトラカルボン酸成分及び特定のジアミン成分を用いて製造した実施例1~11のポリイミドフィルムは、無色透明性に優れ、更に低リタデーションであった。
一方、ジアミン成分として構成単位(B-1)を与えるジアミンを使用しない比較例1~6のポリイミドフィルムは、実施例1~3のポリイミドフィルムと対比して、リタデーション値(Rth)が大きかった。
ジアミン酸成分としてBisAMとODAを併用した実施例4~6のポリイミドフィルムは、ODAのみを使用して製造した比較例4のポリイミドフィルムと対比して、リタデーション値(Rth)が大幅に低減した。
ジアミン酸成分としてBisAMとBAPPを併用した実施例7~9のポリイミドフィルムは、BAPPのみを使用して製造した比較例5のポリイミドフィルムと対比して、リタデーション値(Rth)が大幅に低減した。
As shown in Table 1, the polyimide films of Examples 1 to 11 produced using a specific tetracarboxylic acid component and a specific diamine component were excellent in colorless transparency and had low retardation.
On the other hand, the polyimide films of Comparative Examples 1 to 6, which did not use a diamine that provides the structural unit (B-1) as the diamine component, had a large retardation value (Rth) compared to the polyimide films of Examples 1 to 3.
The polyimide films of Examples 4 to 6, which used BisAM and ODA in combination as the diamine acid components, had significantly reduced retardation values (Rth) compared to the polyimide film of Comparative Example 4, which was produced using only ODA.
The polyimide films of Examples 7 to 9, which used BisAM and BAPP in combination as the diamine acid components, had significantly reduced retardation values (Rth) compared to the polyimide film of Comparative Example 5, which was produced using only BAPP.

本発明のポリイミドフィルムは、カラーフィルター、フレキシブルディスプレイ、半導体部品、光学部材等の各種部材用のフィルムとして好適に用いられる。本発明のポリイミドフィルムは、液晶ディスプレイやOLEDディスプレイ等の画像表示装置の基板として、特に好適に用いられる。The polyimide film of the present invention is suitable for use as a film for various components such as color filters, flexible displays, semiconductor parts, and optical components. The polyimide film of the present invention is particularly suitable for use as a substrate for image display devices such as liquid crystal displays and OLED displays.

Claims (6)

テトラカルボン酸二無水物に由来する構成単位A及びジアミンに由来する構成単位Bを有するポリイミド樹脂であって、
構成単位Aが、下記式(a-1)で表される化合物に由来する構成単位(A-1)を含み、
構成単位Bが、下記一般式(b1-1-1)で表される化合物に由来する構成単位(B-1)を含み、
構成単位A及び構成単位Bの少なくとも一方が2種以上の構成単位を含み、
構成単位Aが2種以上の構成単位を含む場合における、構成単位(A-1)以外の構成単位として、構成単位Aがさらに下記式(a-3)で表される化合物に由来する構成単位(A-3)を含み、
構成単位Bが2種以上の構成単位を含む場合における、構成単位(B-1)以外の構成単位として、構成単位Bが、さらに下記式(b-2)で表される化合物に由来する構成単位(B-2)、下記式(b-3)で表される化合物に由来する構成単位(B-3)、及び下記式(b-4)で表される化合物に由来する構成単位(B-4)からなる群から選ばれる少なくとも1つの構成単位を5~55モル%含む、ポリイミド樹脂。

A polyimide resin having a structural unit A derived from a tetracarboxylic dianhydride and a structural unit B derived from a diamine,
The structural unit A includes a structural unit (A-1) derived from a compound represented by the following formula (a-1):
The structural unit B includes a structural unit (B-1) derived from a compound represented by the following general formula (b1-1-1):
At least one of the structural unit A and the structural unit B contains two or more types of structural units,
When the structural unit A contains two or more types of structural units, the structural unit A further contains a structural unit (A-3) derived from a compound represented by the following formula (a-3) as a structural unit other than the structural unit (A-1):
A polyimide resin in which, when the structural unit B contains two or more types of structural units, the structural unit B further contains, as a structural unit other than the structural unit (B-1), 5 to 55 mol % of at least one structural unit selected from the group consisting of a structural unit (B-2) derived from a compound represented by the following formula (b-2), a structural unit (B-3) derived from a compound represented by the following formula (b-3), and a structural unit (B-4) derived from a compound represented by the following formula (b-4):

構成単位B中における構成単位(B-1)の比率が5~100モル%である、請求項1に記載のポリイミド樹脂。 The polyimide resin according to claim 1, in which the ratio of structural unit (B-1) in structural unit B is 5 to 100 mol %. 構成単位Aが構成単位(A-1)を含み、構成単位A中における構成単位(A-1)の比率が45~100モル%である、請求項1又は2に記載のポリイミド樹脂。 The polyimide resin according to claim 1 or 2, wherein the structural unit A contains the structural unit (A-1) and the ratio of the structural unit (A-1) in the structural unit A is 45 to 100 mol %. 構成単位B中における構成単位(B-2)、構成単位(B-3)、及び構成単位(B-4)の合計が占める比率が5~55モル%である、請求項1~のいずれかに記載のポリイミド樹脂。 The polyimide resin according to any one of claims 1 to 3 , wherein the total proportion of the structural units (B-2), (B-3), and (B-4) in the structural unit B is 5 to 55 mol %. 請求項1~4のいずれかに記載のポリイミド樹脂が有機溶媒に溶解してなるポリイミドワニス。 A polyimide varnish obtained by dissolving the polyimide resin according to any one of claims 1 to 4 in an organic solvent. 請求項1~4のいずれかに記載のポリイミド樹脂を含む、ポリイミドフィルム。 A polyimide film comprising the polyimide resin according to any one of claims 1 to 4.
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