WO2020241726A1 - 基板洗浄用ブラシ - Google Patents

基板洗浄用ブラシ Download PDF

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Publication number
WO2020241726A1
WO2020241726A1 PCT/JP2020/021024 JP2020021024W WO2020241726A1 WO 2020241726 A1 WO2020241726 A1 WO 2020241726A1 JP 2020021024 W JP2020021024 W JP 2020021024W WO 2020241726 A1 WO2020241726 A1 WO 2020241726A1
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WO
WIPO (PCT)
Prior art keywords
holder
brush
cleaning
substrate
held
Prior art date
Application number
PCT/JP2020/021024
Other languages
English (en)
French (fr)
Inventor
覚嗣 川口
知幸 中垣
Original Assignee
アイオン株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by アイオン株式会社 filed Critical アイオン株式会社
Priority to CN202080038113.4A priority Critical patent/CN113874131B/zh
Priority to KR1020217038118A priority patent/KR20220014324A/ko
Priority to US17/614,270 priority patent/US20220212234A1/en
Publication of WO2020241726A1 publication Critical patent/WO2020241726A1/ja

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
    • B08B1/12—Brushes
    • A—HUMAN NECESSITIES
    • A46—BRUSHWARE
    • A46B—BRUSHES
    • A46B13/00—Brushes with driven brush bodies or carriers
    • A46B13/008—Disc-shaped brush bodies
    • A—HUMAN NECESSITIES
    • A46—BRUSHWARE
    • A46B—BRUSHES
    • A46B13/00—Brushes with driven brush bodies or carriers
    • A46B13/02—Brushes with driven brush bodies or carriers power-driven carriers
    • A—HUMAN NECESSITIES
    • A46—BRUSHWARE
    • A46B—BRUSHES
    • A46B5/00—Brush bodies; Handles integral with brushware
    • A46B5/0095—Removable or interchangeable brush heads
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/04—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by a combination of operations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
    • A—HUMAN NECESSITIES
    • A46—BRUSHWARE
    • A46B—BRUSHES
    • A46B2200/00—Brushes characterized by their functions, uses or applications
    • A46B2200/30—Brushes for cleaning or polishing
    • A46B2200/3073—Brush for cleaning specific unusual places not otherwise covered, e.g. gutters, golf clubs, tops of tin cans, corners

Definitions

  • the present invention relates to a substrate cleaning brush used by being attached to a substrate cleaning apparatus for brush cleaning a substrate.
  • Patent Document 1 describes a substrate cleaning brush configured by holding a brush body in a brush holder composed of an upper attachment portion and a lower holding portion.
  • the upper half of the brush body is a large diameter part, and the lower half is a small diameter part having a smaller diameter than the large diameter part.
  • the brush body is made of a porous material that has continuous pores, is hydrophilic, and exhibits good flexibility and elasticity when wet.
  • a locking portion for attaching the substrate cleaning brush to the brush rotation shaft of the substrate cleaning apparatus is integrally projected from the center of the upper surface of the upper attachment portion of the brush holder.
  • the inner diameter of the lower holding portion of the brush holder is slightly larger than the outer diameter of the large diameter portion of the brush body, and the supporting annular portion is integrally formed on the inner peripheral surface near the lower end of the lower holding portion.
  • the inner diameter of the supporting annular portion is slightly larger than the outer diameter of the small diameter portion of the brush body and smaller than the outer diameter of the large diameter portion.
  • the brush body To incorporate the brush body into the brush holder, insert the small diameter part of the brush body into the circular hole of the support annular part of the lower holding part, house the brush body in the lower holding part, and then take the upper part at the upper end of the lower holding part. Fit the fitting part of the fitting part. As a result, the brush body is held by the brush holder, and the lower end surface of the brush body protrudes downward from the lower end of the lower holding portion.
  • a brush for cleaning the substrate is attached to the brush rotation axis of the brush holding arm of the substrate cleaning device, and a cleaning liquid such as pure water is supplied onto the substrate while rotating the substrate held by the spin chuck around the vertical axis. Then, while rotating the substrate cleaning brush, lower it from the upper position, and with the lower surface of the brush body in contact with the substrate surface, move the substrate cleaning brush along the surface of the substrate from the center to the periphery. It is done by moving towards.
  • the lower surface of the small diameter portion of the brush body moves on the surface of the substrate, and the flexible small diameter portion is elastic in the radial direction so as to be inclined with respect to the rotation axis (vertical axis). Since it is deformed, the contact pressure of the small diameter portion with respect to the surface of the substrate also fluctuates according to the elastic deformation of the small diameter portion in the radial direction. Therefore, if the length of the small diameter portion that can be elastically deformed in the radial direction is excessive in the vertical direction, the contact pressure of the small diameter portion also fluctuates greatly, and it becomes difficult to uniformly clean the surface to be cleaned of the substrate.
  • the length in the vertical direction of the small diameter portion that can be elastically deformed in the radial direction is set to a range that does not impair the cleaning effect of the small diameter portion (elasticity so as to exert a desired cleaning effect). It is preferable to keep it as short as possible in the range of deformation).
  • the small diameter portion inserts the circular hole of the thin plate-shaped support annular portion, and the vertical length of the circular hole is the protrusion length of the small diameter portion from the large diameter portion.
  • the length of the small diameter portion that can be elastically deformed in the radial direction becomes excessive in the vertical direction, and the surface to be cleaned may not be uniformly cleaned.
  • an object of the present invention is to provide a substrate cleaning brush suitable for evenly cleaning the entire area of the substrate to be cleaned.
  • the first aspect of the present invention is a substrate cleaning brush that cleans a substrate by rotating integrally with a brush rotation axis of a substrate cleaning device whose axis extends in the vertical direction. It is equipped with a brush holder and a brush body.
  • the brush holder has an upper part of the holder, a lower part of the holder, and a bottom plate part of the holder.
  • the upper part of the holder is attached to the lower end of the brush rotation shaft.
  • the lower part of the holder has a cylindrical shape extending downward from the upper part of the holder with the upper part of the holder attached to the rotating shaft of the brush.
  • the holder bottom plate portion has a hollow disk shape that protrudes inward in the radial direction from the inner edge of the lower end of the lower portion of the holder when the holder is attached.
  • the lower surface of the upper part of the holder, the inner peripheral surface of the lower part of the holder, and the upper surface of the bottom plate of the holder divide the brush accommodating space, and the inner peripheral edge of the bottom plate of the holder has a circular shape smaller than the inner diameter of the lower part of the holder.
  • the holder opening is partitioned, and the central axis of the brush accommodating space and the central axis of the holder opening substantially coincide with the axis of the brush rotation axis.
  • the brush body integrally has a held portion and a cleaning portion.
  • the held portion is a columnar shape through which the holder opening cannot be inserted, and is accommodated and held in the brush accommodating space.
  • the cleaning part is a columnar shape that has a smaller diameter than the held part and allows the holder opening to be inserted, and the holder opening is inserted downward while the held part is held in the brush storage space in the holder-mounted state. Protrude.
  • the brush body is cleaned by bringing the lower surface of the cleaning portion into contact with the substrate from above while the brush is attached.
  • the vertical length of the holder opening of the brush holder is 1/4 or more of the protruding length of the cleaning portion from the held portion of the brush body, and is shorter than the protruding length of the cleaning portion.
  • the vertical length of the holder opening is preferably 2/3 or less of the protruding length of the cleaning portion.
  • the lower surface of the cleaning portion of the brush body that rotates around the brush rotation axis is pressed against the surface to be cleaned from above to move it on the surface to be cleaned. Due to such movement, the cleaning portion is elastically deformed in the radial direction so as to be inclined with respect to the brush rotation axis.
  • the vertical length of the holder opening of the brush holder is 1/4 or more of the protruding length of the cleaning portion from the held portion of the brush body, which is shorter than the protruding length of the cleaning portion.
  • radial elastic deformation in a range of a vertical length of 1/4 or more of the protruding length of the cleaning portion is regulated by the holder opening. Therefore, the vertical length of the cleaning portion that can be elastically deformed in the radial direction can be suppressed as short as possible within a range that does not impair the cleaning effect of the cleaning portion (a range that elastically deforms so as to obtain a desired cleaning effect). , The entire area to be cleaned can be cleaned evenly.
  • the second aspect of the present invention is the substrate cleaning brush of the first aspect, and the brush holder has a cylindrical brush deformation restricting portion that protrudes downward from the inner peripheral edge of the holder bottom plate portion in the holder-mounted state. ..
  • the inner peripheral surface of the brush deformation restricting portion defines the holder opening together with the inner peripheral edge of the holder bottom plate portion.
  • a brush deformation restricting portion that protrudes downward from the inner peripheral edge of the holder bottom plate portion is provided, and the holder opening is partitioned by the inner peripheral edge of the holder bottom plate portion and the inner peripheral surface of the brush deformation restricting portion. It is not necessary to thicken the bottom plate of the holder according to the length.
  • a third aspect of the present invention is the substrate cleaning brush of the first or second aspect, and the inner peripheral surface of the lower part of the holder is the outer peripheral surface of the held portion of the brush body housed in the brush accommodating space.
  • a plurality of protrusions are formed to partially elastically deform the brush inward in the radial direction.
  • the rotation of the held portion of the brush body with respect to the brush holder can be suppressed by a plurality of protrusions at the bottom of the holder.
  • the entire area of the substrate to be cleaned can be evenly cleaned.
  • FIG. 2 is a plan sectional view, (a) shows a IIIa-IIIa cross section, (b) shows a IIIb-IIIb cross section, (c) shows a IIIc-IIIc cross section, and (d) shows a IIId-IIId cross section. ..
  • FIG. 2 is a plan sectional view, (a) shows a IIIa-IIIa cross section, (b) shows a IIIb-IIIb cross section, (c) shows a IIIc-IIIc cross section, and (d) shows a IIId-IIId cross section. ..
  • a substrate cleaning brush (hereinafter, simply referred to as a cleaning brush) 1 will be described with reference to FIGS. 1 to 3.
  • the cleaning brush 1 is composed of a brush holder 10 and a brush body 30, and is used by being attached to the lower end of a brush rotation shaft 2 of a substrate cleaning device.
  • the axis 3 of the brush rotation shaft 2 extends in the vertical direction (substantially vertical direction), and the cleaning brush 1 rotates integrally with the brush rotation shaft 2 to allow the surface to be cleaned of the substrate 4 (the upper surface of the substrate 4).
  • the substrate 4 to be cleaned is various substrates such as a semiconductor wafer, a glass substrate for a liquid crystal display device or a photomask, and a substrate for an optical disk.
  • the substrate cleaning device holds the substrate 4 in a horizontal position and has a vertical axis (a vertical axis (). Axial center 3) While rotating around the axis, a cleaning liquid is supplied onto the surface to be cleaned 5 to perform brush cleaning.
  • the brush holder 10 is composed of an upper holder (holder upper part) 11 and a lower holder 12.
  • the upper holder 11 and the lower holder 12 are formed of a hard resin material such as polypropylene, and are integrated by assembling the lower holder 12 to the upper holder 11.
  • the upper holder 11 is a disk-shaped upper holder large diameter portion 13, a disc-shaped upper holder small diameter portion 14 having a diameter slightly smaller than the upper holder large diameter portion 13, and a holder having male screws formed on the outer peripheral surface.
  • the male screw portion 15 is integrally provided, and the upper holder large diameter portion 13, the upper holder small diameter portion 14, and the holder male screw portion 15 are provided coaxially.
  • the upper holder small diameter portion 14 projects downward from the lower surface of the upper holder large diameter portion 13, and the holder male screw portion 15 projects upward from the upper surface of the upper holder large diameter portion 13.
  • a plurality of (two locations in this embodiment) locking protrusions 16 are projected on the outer peripheral surface of the upper holder small diameter portion 14, and a bottomed square hole 17 extending downward is provided on the upper surface of the holder male screw portion 15. Is formed.
  • the upper holder 11 rotates the brush by inserting a square shaft (not shown) on the brush rotation shaft 2 side of the substrate cleaning device into the square hole 17 and screwing and tightening a nut (not shown) into the male screw portion 15 of the holder. It is attached to the lower end of the shaft 2 and rotates integrally with the brush rotating shaft 2.
  • the lower holder 12 integrally includes a cylindrical holder lower portion 18, a hollow disk-shaped holder bottom plate portion 19, a cylindrical brush cover portion 20, and a cylindrical brush deformation regulating portion 21.
  • the lower portion 18, the holder bottom plate portion 19, the brush cover portion 20, and the brush deformation regulating portion 21 are provided coaxially.
  • the outer diameter of the lower holder 18 is formed to be substantially the same as the outer diameter of the upper holder large diameter portion 13, and the inner diameter of the holder lower 18 is substantially the same as or slightly smaller than the outer diameter of the upper holder small diameter portion 14. It is formed with a large diameter.
  • a plurality of locking holes 22 (two locations in the present embodiment) to which the locking protrusions 16 of the upper holder small diameter portion 14 are inserted and engaged are formed.
  • the lower holder 12 is fixedly attached to the upper holder 11 by inserting the lower end of the upper holder small diameter portion 14 into the holder lower portion 18 from above and engaging the locking protrusion 16 with the locking hole 22.
  • the lower holder 18 extends downward from the upper holder 11 in a holder-mounted state in which the lower holder 12 is attached to the upper holder 11 and the upper holder 11 is attached to the brush rotation shaft 2.
  • the holder bottom plate portion 19 projects radially inward from the inner edge of the lower end of the holder lower portion 18 in the holder mounted state.
  • the brush cover portion 20 has a cylindrical shape having the same diameter as the holder lower portion 18, and extends continuously downward from the lower end of the holder lower portion 18 when the holder is attached.
  • the brush deformation restricting portion 21 has a cylindrical shape having a smaller diameter than the brush cover portion 20, and projects downward from the inner peripheral edge of the holder bottom plate portion 19 in the holder-mounted state.
  • the protruding height of the brush cover portion 20 from the holder bottom plate portion 19 and the protruding height of the brush deformation regulating portion 21 can be arbitrarily set, and in the present embodiment, both are set to substantially the same protruding height.
  • the lower surface of the upper holder 11, the inner peripheral surface of the lower part 18 of the holder, and the upper surface of the holder bottom plate 19 partition the brush accommodating space 23.
  • the inner peripheral edge of the holder bottom plate portion 19 partitions the inner peripheral surface of the brush deformation regulating portion 21 and the circular holder opening 24 having a diameter smaller than the inner diameter of the holder lower portion 18 (the diameter of the inner peripheral surface of the holder lower portion 18).
  • the central axis of the brush accommodating space 23 and the central axis of the holder opening 24 substantially coincide with the axis 3 of the brush rotation axis 2.
  • the brush body 30 is formed of a hydrophilic sponge-like porous material, and integrally has a columnar held portion 31 and a cylindrical cleaning portion 32 having a diameter smaller than that of the held portion 31.
  • the porous material is, for example, a porous material made from PVA (PVAt-based porous material).
  • PVAt-based porous material for example, polyvinyl formal is produced by a formalization reaction in which formaldehyde is bound to PVA using an acid as a catalyst, and at that time, a pore-forming agent is added to form pores, and an insoluble porous substrate is completed. After that, it is produced by extracting the bubble generating agent.
  • the brush body 30 formed of the PVAt-based porous material has continuous pores formed in the entire area thereof, has hydrophilicity, exhibits good flexibility and elasticity when wet, and loses elasticity when dry. And cure.
  • the held portion 31 has an outer diameter that does not allow the holder opening 24 to be inserted (an outer diameter larger than the holder opening 24), and is accommodated and held in the brush accommodating space 23.
  • the cleaning portion 32 has an outer diameter smaller than that of the held portion 31 and is capable of inserting the holder opening 24, and the holder opening is in the brush mounting state in which the held portion 31 is held in the brush accommodating space 23 in the holder mounting state. 24 is inserted and protrudes downward.
  • the held portion 31 is sandwiched and held from above and below by the lower surface of the upper holder 11 and the upper surface of the holder bottom plate portion 19.
  • the lower surface of the cleaning portion 32 comes into contact with the surface to be cleaned 5 of the substrate 4 from above.
  • a plurality of protrusions 25 that partially elastically deform the outer peripheral surface of the held portion 31 housed in the brush storage space 23 inward in the radial direction are integrally projected on the inner peripheral surface of the holder lower portion 18.
  • 12 protrusions 25 having a semicircular shape and extending in the vertical direction are formed at substantially equal intervals in the circumferential direction.
  • the vertical length L2 of the holder opening 24 of the brush holder 10 is 1/4 or more of the protrusion length L1 of the cleaning portion 32 from the held portion 31 of the brush body 30, and the protrusion length L1 of the cleaning portion 32. Is set shorter than (L1> L2 ⁇ L1 / 4). In the present embodiment, in consideration of the cleaning ability of the cleaning unit 32, the vertical length L2 of the holder opening 24 is within the range of 1/4 or more and 2/3 or less of the protruding length L1 of the cleaning unit 32 (L1 ⁇ 2 /). It is set to 3 ⁇ L2 ⁇ L1 / 4).
  • the cleaning brush 1 When the cleaning brush 1 is attached to the brush rotating shaft 2 of the substrate cleaning device to clean the surface 5 to be cleaned of the substrate 4 with a brush, for example, the substrate 4 held by a spin chuck (not shown) is rotated around a vertical axis. While supplying a cleaning liquid such as pure water onto the surface 5 to be cleaned of the substrate 4, the cleaning brush 1 is rotated and lowered from an upper position, and the lower surface of the cleaning portion 32 of the brush body 30 comes into contact with the surface 5 to be cleaned. In this state, the cleaning brush 1 is moved from the central portion of the substrate 4 toward the peripheral portion along the surface to be cleaned 5.
  • a cleaning liquid such as pure water
  • the vertical length L2 of the holder opening 24 of the brush holder 10 is 1/4 or more of the protrusion length L1 of the cleaning portion 32 from the held portion 31 of the brush body 30, and the cleaning portion 32 protrudes. Since the length is shorter than the length L1, on the upper end side of the cleaning portion 32 of the brush body 30, radial elastic deformation in the range of the vertical length of 1/4 or more of the protruding length L1 of the cleaning portion 32 is caused by the holder opening 24. Be regulated. Therefore, the length of the cleaning portion 32 elastically deformable in the radial direction should be kept as short as possible within a range that does not impair the cleaning effect of the cleaning portion 32 (a range that elastically deforms so as to obtain a desired cleaning effect). The entire area of the surface to be cleaned 5 can be cleaned evenly.
  • the brush deformation restricting portion 21 protruding downward from the inner peripheral edge of the holder bottom plate portion 19 is provided and the holder opening 24 is partitioned by the inner peripheral edge of the holder bottom plate portion 19 and the inner peripheral surface of the brush deformation restricting portion 21, the holder It is not necessary to thicken the holder bottom plate portion 19 according to the vertical length L2 of the opening 24.
  • the rotation of the held portion 31 of the brush body 30 with respect to the brush holder 10 can be suppressed by the plurality of protrusions 25 of the holder lower portion 18, and the cleaning performance is further improved.
  • the present invention is not limited to the above-described embodiment described as an example and the above-described embodiment, and even if it is other than the above-described embodiment, it does not deviate from the technical idea of the present invention. If so, various changes can be made according to the design and the like.
  • the brush holder 10 may have the brush cover portion 20 (see FIG. 2) omitted.
  • the brush cover portion 20 and the brush deformation regulating portion 21 are omitted, and the holder bottom plate portion 19 is thickened to increase the vertical length of the holder opening 24. It may be extended to a desired length.
  • the present invention is useful as a substrate cleaning brush used by being attached to a substrate cleaning apparatus for brush cleaning a substrate.
  • Brush for cleaning the substrate 2 Brush rotation shaft 3: Axis center of the brush rotation shaft 4: Substrate 5: Surface to be cleaned 10: Brush holder 11: Upper holder (upper part of holder) 12: Lower holder 13: Upper holder large diameter part 14: Upper holder small diameter part 15: Holder male screw part 16: Locking protrusion 17: Square hole 18: Holder lower part 19: Holder bottom plate part 20: Brush cover part 21: Brush Deformation control part 22: Locking hole 23: Brush accommodating space 24: Holder opening 25: Protrusion 30: Brush body 31: Hold part 32: Cleaning part L1: Cleaning part protrusion height L2: Vertical length of holder opening

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

ホルダ上部１１をブラシ回転軸２に取付けたホルダ取付状態で、ホルダ上部１１の下面とホルダ下部１８の内周面とはブラシ収容空間２３を区画し、ホルダ底板部１９の内周縁は、ホルダ下部１８の内径よりも小径な円形状のホルダ開口２４を区画する。ブラシ本体３０の被保持部３１は、ホルダ開口２４を挿通不能な円柱状であり、ブラシ収容空間２３に収容されて保持される。ブラシ本体３０の洗浄部３２は、被保持部３１よりも小径でホルダ開口２４を挿通可能な円柱状であり、ホルダ開口２４を挿通して下方へ突出する。ブラシホルダ１０のホルダ開口２４の上下長さＬ２は、ブラシ本体３０の被保持部３１からの洗浄部３２の突出長さＬ１の１／４以上であって、洗浄部３２の突出長さＬ１よりも短い。

Description

基板洗浄用ブラシ
　本発明は、基板をブラシ洗浄する基板洗浄装置に取付けられて使用される基板洗浄用ブラシに関する。
　特許文献１には、上部取着部と下部保持部とからなるブラシホルダにブラシ本体を保持して構成された基板洗浄用ブラシが記載されている。ブラシ本体の上半部は大径部であり、下半部は大径部よりも小径の小径部である。ブラシ本体は、連続的な気孔が形成され、親水性を有し、湿潤時には良好な柔軟性、弾力性を呈する多孔質素材により形成されている。ブラシホルダの上部取着部の上面中央部には、基板洗浄用ブラシを基板洗浄装置のブラシ回転軸に取着するための係止部が一体に突設されている。ブラシホルダの下部保持部の内径寸法は、ブラシ本体の大径部の外径より僅かに大きく、下部保持部の下端近くの内周面には、支持環状部が一体に形設されている。支持環状部の内径寸法は、ブラシ本体の小径部の外径より僅かに大きくかつ大径部の外径より小さい。
　ブラシホルダにブラシ本体を組み込むには、下部保持部の支持環状部の円形孔にブラシ本体の小径部を挿入し、下部保持部内にブラシ本体を収容した後、下部保持部の上端部に上部取着部の嵌合部を嵌着させる。これにより、ブラシ本体がブラシホルダに保持され、ブラシ本体の下端面が下部保持部の下端より下方へ突き出た状態になる。
　基板の洗浄は、基板洗浄用ブラシを基板洗浄装置のブラシ保持アームのブラシ回転軸に取り付け、スピンチャックに保持された基板を鉛直軸回りに回転させながら、基板上に純水等の洗浄液を供給し、基板洗浄用ブラシを自転させながら上方位置から下降させ、ブラシ本体の下面を基板表面に接触させた状態で、基板洗浄用ブラシを基板の表面に沿って基板上を中心部から周縁部に向かって移動させることにより行われる。
特開平９－１８１０２５号公報
　特許文献１の基板洗浄用ブラシによる洗浄では、ブラシ本体の小径部の下面が基板の表面上を移動し、柔軟な小径部が回転軸（鉛直軸）に対して傾斜するように径方向へ弾性変形するため、径方向への小径部の弾性変形に応じて、基板の表面に対する小径部の接触圧も変動する。このため、径方向へ弾性変形可能な小径部の上下方向の長さが過大であると、小径部の接触圧の変動も大きくなり、基板の被洗浄面を均等に洗浄することが難しくなる。従って、被洗浄面を均一に洗浄するためには、径方向へ弾性変形可能な小径部の上下方向の長さを、小径部による洗浄効果を損ねない範囲（所望の洗浄効果を奏するように弾性変形する範囲）において、できるだけ短く抑えることが好ましい。
　しかし、特許文献１の基板洗浄用ブラシでは、薄板状の支持環状部の円形孔を小径部が挿通し、円形孔の上下方向の長さは、大径部からの小径部の突出長さに対して極めて短い。このため、径方向へ弾性変形可能な小径部の上下方向の長さが過大となり、被洗浄面を均等に洗浄することができないおそれがある。
　そこで本発明は、基板の被洗浄面の全域を均等に洗浄するために好適な基板洗浄用ブラシの提供を目的とする。
　上記目的を達成すべく、本発明の第１の態様は、軸心が上下方向に延びる基板洗浄装置のブラシ回転軸と一体的に回転することによって基板を洗浄する基板洗浄用ブラシであって、ブラシホルダとブラシ本体とを備える。
　ブラシホルダは、ホルダ上部とホルダ下部とホルダ底板部とを有する。ホルダ上部は、ブラシ回転軸の下端に取付けられる。ホルダ下部は、ホルダ上部をブラシ回転軸に取付けたホルダ取付状態でホルダ上部から下方へ延びる円筒状である。ホルダ底板部は、ホルダ取付状態でホルダ下部の下端内縁から径方向内側へ突出する中空円板状である。ホルダ取付状態で、ホルダ上部の下面とホルダ下部の内周面とホルダ底板部の上面とはブラシ収容空間を区画し、ホルダ底板部の内周縁は、ホルダ下部の内径よりも小径な円形状のホルダ開口を区画し、ブラシ収容空間の中心軸とホルダ開口の中心軸とがブラシ回転軸の軸心と略一致する。
　ブラシ本体は、被保持部と洗浄部とを一体的に有する。被保持部は、ホルダ開口を挿通不能な円柱状であり、ブラシ収容空間に収容されて保持される。洗浄部は、被保持部よりも小径でホルダ開口を挿通可能な円柱状であり、ホルダ取付状態のブラシ収容空間に被保持部が保持されたブラシ取付状態で、ホルダ開口を挿通して下方へ突出する。ブラシ本体は、ブラシ取付状態で洗浄部の下面を基板に上方から接触させて洗浄する。
　ブラシホルダのホルダ開口の上下長さは、ブラシ本体の被保持部からの洗浄部の突出長さの１／４以上であって、洗浄部の突出長さよりも短い。なお、洗浄部の洗浄能力を考慮すると、ホルダ開口の上下長さは、洗浄部の突出長さの２／３以下が好適である。
　基板の被洗浄面を洗浄する場合、ブラシ回転軸を中心として回転するブラシ本体の洗浄部の下面を被洗浄面に上方から押し当てて被洗浄面上を移動させる。係る移動により、洗浄部は、ブラシ回転軸に対して傾斜するように径方向へ弾性変形する。
　上記構成では、ブラシホルダのホルダ開口の上下長さは、ブラシ本体の被保持部からの洗浄部の突出長さの１／４以上であって、洗浄部の突出長さよりも短いので、ブラシ本体の洗浄部の被保持部側（上端側）において、洗浄部の突出長さの１／４以上の上下長さの範囲の径方向の弾性変形がホルダ開口によって規制される。従って、径方向へ弾性変形可能な洗浄部の上下方向の長さを、洗浄部による洗浄効果を損ねない範囲（所望の洗浄効果を奏するように弾性変形する範囲）において、できるだけ短く抑えることができ、被洗浄面の全域を均等に洗浄することができる。
　本発明の第２の態様は、第１の態様の基板洗浄用ブラシであって、ブラシホルダは、ホルダ取付状態でホルダ底板部の内周縁から下方へ突出する円筒状のブラシ変形規制部を有する。ブラシ変形規制部の内周面は、ホルダ底板部の内周縁とともにホルダ開口を区画する。
　上記構成では、ホルダ底板部の内周縁から下方へ突出するブラシ変形規制部を設け、ホルダ開口をホルダ底板部の内周縁とブラシ変形規制部の内周面とによって区画するので、ホルダ開口の上下長さに合わせてホルダ底板部を厚肉化する必要がない。
　本発明の第３の態様は、第１又は第２の態様の基板洗浄用ブラシであって、ホルダ下部の内周面には、ブラシ収容空間に収容されたブラシ本体の被保持部の外周面を径方向内側へ部分的に弾性変形させる複数の突起が形成されている。
　上記構成では、ブラシホルダに対するブラシ本体の被保持部の回転をホルダ下部の複数の突起によって抑制することができる。
　本発明によれば、基板の被洗浄面の全域を均等に洗浄することができる。
本発明の一実施形態に係る基板洗浄用ブラシの分解斜視図である。 図１のブラシ本体をブラシホルダに装着した基板洗浄用ブラシの断面図である。 図２の平断面図であり、（ａ）はIIIａ－IIIａ断面を、（ｂ）はIIIｂ－IIIｂ断面を、（ｃ）はIIIｃ－IIIｃ断面を、（ｄ）はIIIｄ－IIIｄ断面をそれぞれ示す。 図１のブラシ本体を他の形態のブラシホルダに装着した例の基板洗浄用ブラシの断面図であり、（ａ）は第１の変形例を、（ｂ）は第２の変形例をそれぞれ示す。
　本発明の一実施形態に係る基板洗浄用ブラシ（以下、単に洗浄用ブラシと称する）１について、図１～図３を参照して説明する。
　図２に示すように、洗浄用ブラシ１は、ブラシホルダ１０とブラシ本体３０とから構成され、基板洗浄装置のブラシ回転軸２の下端に取付けられて使用される。ブラシ回転軸２の軸心３は、上下方向（略鉛直方向）に延び、洗浄用ブラシ１は、ブラシ回転軸２と一体的に回転することによって基板４の被洗浄面（基板４の上面の略全域）５をブラシ洗浄する。洗浄対象の基板４は、例えば半導体ウエハ、液晶表示装置用やフォトマスク用のガラス基板、光ディスク用の基板等の各種基板であり、基板洗浄装置は、基板４を水平姿勢に保持し鉛直軸（軸心３）回りに回転させながら被洗浄面５上へ洗浄液を供給してブラシ洗浄を行う。
　図１～図３に示すように、ブラシホルダ１０は、上ホルダ（ホルダ上部）１１と下ホルダ１２とから構成される。上ホルダ１１及び下ホルダ１２は、例えばポリプロピレン等の硬質樹脂材によって形成され、上ホルダ１１に下ホルダ１２を組付けることによって一体化される。
　上ホルダ１１は、円板状の上ホルダ大径部１３と、上ホルダ大径部１３よりも僅かに小径な円板状の上ホルダ小径部１４と、外周面に雄ネジが形成されたホルダ雄ネジ部１５とを一体的に有し、上ホルダ大径部１３と上ホルダ小径部１４とホルダ雄ネジ部１５とは、同軸状に設けられている。上ホルダ小径部１４は上ホルダ大径部１３の下面から下方へ突出し、ホルダ雄ネジ部１５は上ホルダ大径部１３の上面から上方へ突出する。上ホルダ小径部１４の外周面には、複数（本実施形態で２箇所）の係止突部１６が突設され、ホルダ雄ネジ部１５の上面には、下方へ延びる有底の角穴１７が形成されている。
　上ホルダ１１は、基板洗浄装置のブラシ回転軸２側の角形軸（図示省略）を角穴１７に挿入し、ホルダ雄ネジ部１５にナット（図示省略）を螺合して締付けることによってブラシ回転軸２の下端に取付けられ、ブラシ回転軸２と一体的に回転する。
　下ホルダ１２は、円筒状のホルダ下部１８と、中空円板状のホルダ底板部１９と、円筒状のブラシカバー部２０と、円筒状のブラシ変形規制部２１とを一体的に有し、ホルダ下部１８とホルダ底板部１９とブラシカバー部２０とブラシ変形規制部２１とは、同軸状に設けられている。
　ホルダ下部１８の外径は、上ホルダ大径部１３の外径と略同径に形成され、ホルダ下部１８の内径は、上ホルダ小径部１４の外径と略同径に又はそれよりも僅かに大径に形成されている。ホルダ下部１８の一端部（上端部）には、上ホルダ小径部１４の係止突部１６が挿入されて係合可能な複数（本実施形態では２箇所）の係止孔２２が形成され、上ホルダ小径部１４の下端をホルダ下部１８に上方から挿入し、係止突部１６を係止孔２２に係合することにより、下ホルダ１２が上ホルダ１１に固定的に取付けられる。
　ホルダ下部１８は、下ホルダ１２を上ホルダ１１に取付け、上ホルダ１１をブラシ回転軸２に取付けたホルダ取付状態で、上ホルダ１１から下方へ延びる。ホルダ底板部１９は、ホルダ取付状態でホルダ下部１８の下端内縁から径方向内側へ突出する。ブラシカバー部２０は、ホルダ下部１８と同径の円筒状であり、ホルダ取付状態でホルダ下部１８の下端から連続して下方へ延びる。ブラシ変形規制部２１は、ブラシカバー部２０よりも小径の円筒状であり、ホルダ取付状態でホルダ底板部１９の内周縁から下方へ突出する。ホルダ底板部１９からのブラシカバー部２０の突出高さとブラシ変形規制部２１の突出高さとは、それぞれ任意に設定可能であり、本実施形態では両者を略等しい突出高さに設定している。
　ホルダ取付状態において、上ホルダ１１の下面とホルダ下部１８の内周面とホルダ底板部１９の上面とはブラシ収容空間２３を区画する。ホルダ底板部１９の内周縁は、ブラシ変形規制部２１の内周面とともに、ホルダ下部１８の内径（ホルダ下部１８の内周面の直径）よりも小径な円形状のホルダ開口２４を区画する。また、ブラシ収容空間２３の中心軸とホルダ開口２４の中心軸とは、ブラシ回転軸２の軸心３と略一致する。
　ブラシ本体３０は、親水性を有するスポンジ状の多孔質素材によって形成され、円柱状の被保持部３１と、被保持部３１よりも小径な円柱状の洗浄部３２とを一体的に有する。多孔質素材は、例えばＰＶＡを原料とした多孔質素材（ＰＶＡｔ系多孔質素材）である。ＰＶＡｔ系多孔質素材は、例えばＰＶＡに酸を触媒としてホルムアルデヒドを結合させるホルマール化反応によりポリビニルホルマールを生成し、その際、気孔生成剤を加えて気孔形成を行ない、不溶性の多孔質基質が完成した後、気泡生成剤を抽出することにより製造される。ＰＶＡｔ系多孔質素材により形成されたブラシ本体３０は、その全域に連続的な気孔が形成され、親水性を有し、湿潤時には良好な柔軟性及び弾力性を呈し、乾燥時には弾力性が喪失して硬化する。
　被保持部３１は、ホルダ開口２４を挿通不能な外径（ホルダ開口２４よりも大きい外径）を有し、ブラシ収容空間２３に収容されて保持される。洗浄部３２は、被保持部３１よりも小径でホルダ開口２４を挿通可能な外径を有し、ホルダ取付状態のブラシ収容空間２３に被保持部３１が保持されたブラシ取付状態で、ホルダ開口２４を挿通して下方へ突出する。ブラシホルダ１０にブラシ本体３０を装着する場合、上ホルダ１１と下ホルダ１２とを分離し、下ホルダ１２のホルダ開口２４に洗浄部３２を挿入しながらブラシ収容空間２３に被保持部３１を収容し、下ホルダ１２を上ホルダ１１に取付ける。これにより、被保持部３１が上ホルダ１１の下面とホルダ底板部１９の上面とによって上下から挟まれて保持される。ブラシ本体３０によるブラシ洗浄時には、洗浄部３２の下面が基板４の被洗浄面５に上方から接触する。
　ホルダ下部１８の内周面には、ブラシ収容空間２３に収容された被保持部３１の外周面を径方向内側へ部分的に弾性変形させる複数の突起２５が一体的に突設されている。本実施形態では、半円弧状で上下方向に延びる１２箇所の突起２５が、周方向に略等間隔に形成されている。
　ブラシホルダ１０のホルダ開口２４の上下長さＬ２は、ブラシ本体３０の被保持部３１からの洗浄部３２の突出長さＬ１の１／４以上であって、且つ洗浄部３２の突出長さＬ１よりも短く設定されている（Ｌ１＞Ｌ２≧Ｌ１／４）。本実施形態では、洗浄部３２の洗浄能力を考慮して、ホルダ開口２４の上下長さＬ２を洗浄部３２の突出長さＬ１の１／４以上２／３以下の範囲内（Ｌ１×２／３≧Ｌ２≧Ｌ１／４）に設定している。
　洗浄用ブラシ１を基板洗浄装置のブラシ回転軸２に取り付けて基板４の被洗浄面５をブラシ洗浄する場合、例えば、スピンチャック（図示省略）に保持された基板４を鉛直軸回りに回転させながら、基板４の被洗浄面５上に純水等の洗浄液を供給し、洗浄用ブラシ１を自転させながら上方位置から下降させ、ブラシ本体３０の洗浄部３２の下面を被洗浄面５に接触させた状態で、洗浄用ブラシ１を基板４の中心部から周縁部に向かって被洗浄面５に沿って移動させる。このように、ブラシ回転軸２の軸心３を中心として回転するブラシ本体３０の洗浄部３２の下面を被洗浄面５に上方から押し当てて被洗浄面５上を移動させるため、洗浄部３２は、ブラシ回転軸２（軸心３）に対して傾斜するように径方向へ弾性変形する。
　本実施形態では、ブラシホルダ１０のホルダ開口２４の上下長さＬ２は、ブラシ本体３０の被保持部３１からの洗浄部３２の突出長さＬ１の１／４以上で、且つ洗浄部３２の突出長さＬ１よりも短いので、ブラシ本体３０の洗浄部３２の上端側において、洗浄部３２の突出長さＬ１の１／４以上の上下長さの範囲の径方向の弾性変形がホルダ開口２４によって規制される。従って、径方向へ弾性変形可能な洗浄部３２の上下方向の長さを、洗浄部３２による洗浄効果を損ねない範囲（所望の洗浄効果を奏するように弾性変形する範囲）において、できるだけ短く抑えることができ、被洗浄面５の全域を均等に洗浄することができる。
　また、ホルダ底板部１９の内周縁から下方へ突出するブラシ変形規制部２１を設け、ホルダ開口２４をホルダ底板部１９の内周縁とブラシ変形規制部２１の内周面とによって区画するので、ホルダ開口２４の上下長さＬ２に合わせてホルダ底板部１９を厚肉化する必要がない。
　また、ブラシホルダ１０に対するブラシ本体３０の被保持部３１の回転をホルダ下部１８の複数の突起２５によって抑制することができ、洗浄性能がさらに向上する。
　なお、本発明は、一例として説明した上述の実施形態、及びその実施例に限定されることはなく、上述の実施形態等以外であっても、本発明に係る技術的思想を逸脱しない範囲であれば、設計等に応じて種々の変更が可能である。
　例えば、図４（ａ）に示すように、ブラシカバー部２０（図２参照）を省略したブラシホルダ１０としてもよい。また、図４（ｂ）に示すように、ブラシカバー部２０及びブラシ変形規制部２１（図２参照）を省略し、ホルダ底板部１９を厚肉化することによってホルダ開口２４の上下長さを所望の長さに伸長させてもよい。
　本発明は、基板をブラシ洗浄する基板洗浄装置に取付けられて使用される基板洗浄用ブラシとして有用である。
１：基板洗浄用ブラシ
２：ブラシ回転軸
３：ブラシ回転軸の軸心
４：基板
５：被洗浄面
１０：ブラシホルダ
１１：上ホルダ（ホルダ上部）
１２：下ホルダ
１３：上ホルダ大径部
１４：上ホルダ小径部
１５：ホルダ雄ネジ部
１６：係止突部
１７：角穴
１８：ホルダ下部
１９：ホルダ底板部
２０：ブラシカバー部
２１：ブラシ変形規制部
２２：係止孔
２３：ブラシ収容空間
２４：ホルダ開口
２５：突起
３０：ブラシ本体
３１：被保持部
３２：洗浄部
Ｌ１：洗浄部の突出高さ
Ｌ２：ホルダ開口の上下長さ

Claims (3)

  1. 　軸心が上下方向に延びる基板洗浄装置のブラシ回転軸と一体的に回転することによって基板を洗浄する基板洗浄用ブラシであって、
    　前記ブラシ回転軸の下端に取付けられるホルダ上部と、前記ホルダ上部を前記ブラシ回転軸に取付けたホルダ取付状態で前記ホルダ上部から下方へ延びる円筒状のホルダ下部と、前記ホルダ取付状態で前記ホルダ下部の下端内縁から径方向内側へ突出する中空円板状のホルダ底板部とを有し、前記ホルダ取付状態で、前記ホルダ上部の下面と前記ホルダ下部の内周面と前記ホルダ底板部の上面とはブラシ収容空間を区画し、前記ホルダ底板部の内周縁は、前記ホルダ下部の内径よりも小径な円形状のホルダ開口を区画し、前記ブラシ収容空間の中心軸と前記ホルダ開口の中心軸とが前記ブラシ回転軸の前記軸心と略一致するブラシホルダと、
    　前記ホルダ開口を挿通不能な円柱状であり、前記ブラシ収容空間に収容されて保持される被保持部と、前記被保持部よりも小径で前記ホルダ開口を挿通可能な円柱状であり、前記ホルダ取付状態の前記ブラシ収容空間に前記被保持部が保持されたブラシ取付状態で、前記ホルダ開口を挿通して下方へ突出する洗浄部とを一体的に有し、前記ブラシ取付状態で前記洗浄部の下面を前記基板に上方から接触させて洗浄するブラシ本体と、を備え、
    　前記ブラシホルダの前記ホルダ開口の上下長さは、前記ブラシ本体の前記被保持部からの前記洗浄部の突出長さの１／４以上であって、前記洗浄部の突出長さよりも短い
    　ことを特徴とする基板洗浄用ブラシ。
  2. 　請求項１に記載の基板洗浄用ブラシであって、
    　前記ブラシホルダは、前記ホルダ取付状態で前記ホルダ底板部の前記内周縁から下方へ突出する円筒状のブラシ変形規制部を有し、
    　前記ブラシ変形規制部の内周面は、前記ホルダ底板部の前記内周縁とともに前記ホルダ開口を区画する
    　ことを特徴とする基板洗浄用ブラシ。
  3. 　請求項１又は請求項２に記載の基板洗浄用ブラシであって、
    　前記ホルダ下部の前記内周面には、前記ブラシ収容空間に収容された前記ブラシ本体の前記被保持部の外周面を径方向内側へ部分的に弾性変形させる複数の突起が形成されている
    　ことを特徴とする基板洗浄用ブラシ。
PCT/JP2020/021024 2019-05-28 2020-05-27 基板洗浄用ブラシ WO2020241726A1 (ja)

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