WO2020166510A1 - 硬化性組成物、膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、画像表示装置、及び、高分子化合物 - Google Patents
硬化性組成物、膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、画像表示装置、及び、高分子化合物 Download PDFInfo
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- RRHXZLALVWBDKH-UHFFFAOYSA-M trimethyl-[2-(2-methylprop-2-enoyloxy)ethyl]azanium;chloride Chemical compound [Cl-].CC(=C)C(=O)OCC[N+](C)(C)C RRHXZLALVWBDKH-UHFFFAOYSA-M 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000000108 ultra-filtration Methods 0.000 description 1
- 238000001132 ultrasonic dispersion Methods 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- ZTWTYVWXUKTLCP-UHFFFAOYSA-N vinylphosphonic acid Chemical compound OP(O)(=O)C=C ZTWTYVWXUKTLCP-UHFFFAOYSA-N 0.000 description 1
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000001018 xanthene dye Substances 0.000 description 1
- 150000003732 xanthenes Chemical class 0.000 description 1
- 239000001043 yellow dye Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
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- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
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- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
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- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
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Definitions
- the present invention relates to a curable composition, a film, a color filter, a method for manufacturing a color filter, a solid-state imaging device, an image display device, and a polymer compound.
- CCD charge-coupled device
- the color filter is manufactured using a curable composition containing a colorant and a resin.
- a pigment when used as a colorant, it is also common to disperse the pigment in the curable composition using a dispersant or the like.
- Patent Document 1 discloses (A) a weight average of at least one of the polymer main chains containing a polymer component having a specific structure and a polymerizable double bond group having a specific structure bonded to only one end thereof.
- a copolymer comprising at least a monofunctional macromonomer having a molecular weight of 3 ⁇ 10 4 or less, a quaternary ammonium salt monomer having a specific structure, and a monomer having at least one acid amide group having a specific structure in the molecule
- B A radiation-sensitive compound, and an invention relating to a radiation-sensitive coloring composition containing the (C) pigment are disclosed.
- Patent Document 2 discloses an electrodeposition coating composition in which a carboxylic acid compound selected from the group consisting of acrylic acid, methacrylic acid, maleic acid and the like 0.5 to 30% by mass, glycidyl acrylate having a specific structure Alternatively, a reaction product of glycidyl methacrylate and a quaternary ammonium salt 0.5 to 30% by mass, a monomer having at least one hydroxyl group selected from the group consisting of hydroxyalkyl acrylate and hydroxyalkyl methacrylate having 2 to 5 carbon atoms 10 to 40% by mass, 10 to 70% by mass of an unsaturated monomer selected from the group consisting of alkyl acrylates and alkyl methacrylates having 2 to 5 carbon atoms at 60 to 120° C., and the weight average molecular weight obtained is 3,000 to An acrylate copolymer having a 3,000,00 and a dry coating thickness of 1 to 2.5 ⁇ m and a dielectric constant of 3.0 to 6.0, 10
- An object of the present invention is to provide a curable composition that forms a film having excellent adhesion to a support. Further, a film formed from the curable composition, a color filter, a method for producing a color filter using the curable composition, a solid-state imaging device and an image display device including the film or the color filter, a novel polymer To provide a compound.
- Condition 1 The resin contains a structural unit having an anion structure, a quaternary ammonium cation structure ionically bonded to the anion structure, and a radically polymerizable group in the same side chain;
- Condition 2 The resin contains a quaternary ammonium cation structure and a structural unit having a group to which a radically polymerizable group is linked in a side chain.
- L A1 represents a monovalent substituent when mA is 1, a mA valent linking group when mA is 2 or more, and L A2 represents an nA+1 valent linking group, and A3 represents a divalent linking group, R A4 represents a hydrogen atom or an alkyl group, nA represents an integer of 1 or more, mA represents an integer of 1 or more, and when mA is 2 or more, 2 or more.
- R A2 , 2 or more R A3 and 2 or more L A2 may be the same or different, and when mA is 2 or more, it is a structure containing a quaternary ammonium cation.
- At least one selected from the group consisting of R A2 and R A3 contained in one structure is at least one selected from the group consisting of R A2 and R A3 contained in another structure.
- a ring structure may be formed, and when at least one selected from the group consisting of nA and mA is 2 or more, 2 or more L A3 and 2 or more R A4 may be the same or different.
- R A2 , R A3 and L A2 may combine to form a ring;
- R B1 represents a hydrogen atom or an alkyl group
- L B1 represents a divalent linking group
- R B2 and R B3 each independently represent an alkyl group
- L B2 represents a nB+1 valent linking.
- L B3 represents a divalent linking group
- R B4 represents a hydrogen atom or an alkyl group
- nB represents an integer of 1 or more, and when nB is 2 or more, L B3 of 2 or more and Two or more R B4 may be the same or different, and at least two of R B2 , R B3 , L B1 and L B2 may be bonded to each other to form a ring.
- nA in the above formula (A1) is 1 and the bond of L A2 and L A3 represents any one of groups represented by the following formulas (C1) to (C4)
- nB is 1
- L B2 and L B3 represent any one of groups represented by the following formulas (C1) to (C4).
- the bond site with the atom, * represents the bond site with the carbon atom to which R A4 in formula (A1) is bonded or the carbon atom to which R B4 in formula (B1) is bonded.
- the content of the constitutional unit represented by the formula (A1) and the constitutional unit represented by the formula (B1) in the resin is 1% by mass to 60% by mass, ⁇ 1> to ⁇
- the resin further has a radically polymerizable group, and further includes a structural unit represented by the formula (A1) and a structural unit D different from the structural unit represented by the formula (B1), The curable composition according to any one of ⁇ 1> to ⁇ 4>.
- R D4 represents a divalent linking group
- L D1 represents a group represented by the following formula (D2), formula (D3) or formula (D3′)
- R D5 represents , (N+1)-valent linking group
- X D2 represents an oxygen atom or NR D7 ⁇
- R D7 represents a hydrogen atom, an alkyl group or an aryl group
- R D represents a hydrogen atom or a methyl group
- nD represents an integer of 1 or more, and when nD is 2 or more, X D2 of 2 or more and R D of 2 or more may be the same or different.
- X D3 represents an oxygen atom or —NH—
- X D4 represents an oxygen atom or COO—
- R e1 to R e3 are independent of each other.
- X D5 represents an oxygen atom or —COO—
- R e4 to R e6 each independently represents a hydrogen atom or an alkyl group, and at least two of R e4 to R e6 may be bonded to each other to form a ring structure, and * and a wavy line are bonded to another structure.
- Y D1 represents an alkyleneoxy group or an alkylenecarbonyloxy group
- Z D1 represents an aliphatic hydrocarbon group having 1 to 20 carbon atoms or an aromatic hydrocarbon group having 6 to 20 carbon atoms
- p represents an integer of 1 or more, and when p is 2 or more, p Y D1 s may be the same or different.
- ⁇ 10> The curable composition according to any one of ⁇ 1> to ⁇ 9> for forming a colored layer of a color filter or an infrared absorbing layer.
- ⁇ 11> A film formed from the curable composition according to any one of ⁇ 1> to ⁇ 10>.
- ⁇ 12> A color filter formed from the curable composition according to any one of ⁇ 1> to ⁇ 10>.
- ⁇ 13> A step of applying the curable composition according to any one of ⁇ 1> to ⁇ 10> to a support to form a composition layer, A step of exposing the composition layer to a pattern, And a step of developing and removing an unexposed portion to form a colored pattern.
- ⁇ 14> The curable composition according to any one of ⁇ 1> to ⁇ 10> is applied on a support to form a composition layer, and the composition layer is cured to form a cured layer.
- Process A step of forming a photoresist layer on the cured layer, Patterning the photoresist layer by exposure and development to obtain a resist pattern, A step of etching the cured layer using the resist pattern as an etching mask, Color filter manufacturing method.
- a solid-state image sensor including the film according to ⁇ 11> or the color filter according to ⁇ 12>.
- An image display device including the film according to ⁇ 11> or the color filter according to ⁇ 12>.
- R A1 represents a hydrogen atom or an alkyl group
- a A1 represents a structure containing a group in which a proton is dissociated from an acid group
- R A2 and R A3 each independently represent an alkyl group or an aralkyl group.
- L A1 represents a monovalent substituent when mA is 1, a mA valent linking group when mA is 2 or more, and L A2 represents an nA+1 valent linking group, and A3 represents a divalent linking group, R A4 represents a hydrogen atom or an alkyl group, nA represents an integer of 1 or more, mA represents an integer of 1 or more, and when mA is 2 or more, 2 or more.
- R A2 , 2 or more R A3 and 2 or more L A2 may be the same or different, and when mA is 2 or more, it is a structure containing a quaternary ammonium cation.
- At least one selected from the group consisting of R A2 and R A3 contained in one structure is at least one selected from the group consisting of R A2 and R A3 contained in another structure.
- a ring structure may be formed, and when at least one selected from the group consisting of nA and mA is 2 or more, 2 or more L A3 and 2 or more R A4 may be the same or different.
- R A2 , R A3 and L A2 may combine to form a ring;
- R B1 represents a hydrogen atom or an alkyl group
- L B1 represents a divalent linking group
- R B2 and R B3 each independently represent an alkyl group
- L B2 represents a nB+1 valent linking.
- L B3 represents a divalent linking group
- R B4 represents a hydrogen atom or an alkyl group
- nB represents an integer of 1 or more, and when nB is 2 or more, L B3 of 2 or more and Two or more R B4 may be the same or different, and at least two of R B2 , R B3 , L B1 and L B2 may be bonded to each other to form a ring.
- nA in the above formula (A1) is 1, and the bond of L A2 and L A3 represents any one of groups represented by the following formulas (C1) to (C4)
- nB is 1, and L B2 and L B3 represent any one of groups represented by the following formulas (C1) to (C4).
- the binding site, * represents a binding site with the carbon atom to which R A4 in formula (A1) is bound or the carbon atom to which R B4 in formula (B1) is bound.
- a curable composition which forms a film having excellent adhesion to a support. Further, a film formed from the curable composition, a color filter, a method for producing a color filter using the curable composition, a solid-state imaging device and an image display device including the film or the color filter, a novel polymer A compound is provided.
- substitution and non-substitution are not included in the description of the group (atomic group) in the present specification, the notation in which substitution and non-substitution are not included includes a group (atomic group) having no substituent and a group (atomic group) having a substituent.
- the “alkyl group” includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
- the term “exposure” includes not only exposure using light but also drawing using a particle beam such as an electron beam or an ion beam unless otherwise specified.
- Examples of the light used for exposure include a bright line spectrum of a mercury lamp, deep ultraviolet rays typified by excimer laser, extreme ultraviolet rays (EUV light), X-rays, active rays such as electron rays, or radiation.
- “(meth)acrylate” represents both acrylate and methacrylate, or either
- “(meth)acrylic” represents both acrylic and methacrylic
- “(meth )"Acryloyl” means both acryloyl and methacryloyl, or either.
- Me in the structural formula represents a methyl group
- Et represents an ethyl group
- Bu represents a butyl group
- Ph represents a phenyl group.
- the weight average molecular weight (Mw) and the number average molecular weight (Mn) are polystyrene conversion values measured by the GPC (gel permeation chromatography) method.
- near infrared rays mean light having a wavelength of 700 to 2,500 nm.
- the solid content means the mass of components excluding the solvent from all components of the composition.
- the pigment means a compound that is difficult to dissolve in a solvent.
- the solubility of the pigment in both 100 g of water at 23° C. and 100 g of propylene glycol monomethyl ether acetate at 23° C. is preferably 0.1 g or less, and more preferably 0.01 g or less.
- the term “step” is included in this term as long as the intended action of the step is achieved not only as an independent step but also when it cannot be clearly distinguished from other steps. ..
- the composition may include, as each component included in the composition, two or more kinds of compounds corresponding to the component. Further, unless otherwise specified, the content of each component in the composition means the total content of all compounds corresponding to the component.
- a wavy line portion or * (asterisk) in the structural formula represents a binding site with another structure. In the present specification, a combination of the preferred embodiments is a more preferred embodiment.
- the curable composition of the present invention is A pigment and a resin satisfying at least one of the following Condition 1 and Condition 2 (hereinafter, also referred to as “specific resin”) are included.
- Condition 1 The resin contains a structural unit having an anion structure, a quaternary ammonium cation structure ionically bonded to the anion structure, and a radically polymerizable group in the same side chain;
- Condition 2 The resin contains a quaternary ammonium cation structure and a structural unit having a group to which a radically polymerizable group is linked in a side chain.
- the specific resin in the curable composition of the invention contains at least one of the above Condition 1 and Condition 2 to contain a quaternary ammonium cation structure and a radically polymerizable group in the same side chain. Due to the electrostatic interaction between the quaternary ammonium structures, in the polymerization of the radical polymerizable group contained in the same side chain as the quaternary ammonium cation structure, the polymerization of the radical polymerizable group in the molecule of the specific resin ( Intramolecular cross-linking) is suppressed, and polymerization (intermolecular cross-linking) between a specific resin molecule and another specific resin molecule, such as between the molecules of a specific resin, is likely to occur. It is speculated that an excellent film can be obtained.
- neither of Patent Documents 1 and 2 describes or suggests a curable composition containing a resin satisfying at least one of Condition 1 and Condition 2 described above.
- the curable composition of the present invention is easily excellent in the pattern shape of the pattern obtained by using the curable composition. It is presumed that this is because the above-mentioned intermolecular cross-linking is likely to occur due to the electrostatic interaction between the quaternary ammonium structures described above, so that the curability of the curable composition is improved. Further, when the curable composition of the present invention further comprises a polymerizable compound described below, the electrostatic interaction between the quaternary ammonium structures described above causes the resin and the polymerizable compound to be polymerized rather than the resins.
- the curability of the curable composition is likely to be excellent, and the pattern shape of the pattern obtained by curing the curable composition is more likely to be excellent.
- the curable composition of the present invention contains the specific resin, the storage stability of the curable composition is likely to be improved. It is presumed that this is because the above-mentioned electrostatic interaction suppresses the aggregation of the pigment.
- the curable composition of the present invention contains the specific resin, generation of a development residue at the time of forming the pattern is easily suppressed. This is presumed to be because the hydrophilicity of the specific resin is improved and the development residue is easily removed by including the quaternary ammonium structure in the side chain.
- the leaving defect is easily suppressed.
- the "deposition defect” means that a certain period (for example, 12 hours to 3 days) elapses after patterning by exposure, development, etc., after forming a composition layer by applying a curable composition to a support or the like. In such a case, the resulting pattern has defects (for example, granular aggregates are generated in the composition layer over time. Such components are difficult to remove by development, and thus remain on the support and become defects). It is a phenomenon that is recognized. In the curable composition of the present invention, the electrostatic interaction described above suppresses the occurrence of pigment agglomeration in the composition layer as well, and thus it is presumed that the leaving defect is easily suppressed.
- the curable composition of the present invention can be preferably used as a curable composition for a color filter. Specifically, it can be preferably used as a composition for forming pixels of a color filter. Further, the curable composition of the present invention can be preferably used as a curable composition for a solid-state image sensor, and more preferably used as a curable composition for forming pixels of a color filter used in a solid-state image sensor. it can. The curable composition of the present invention can also be preferably used as a curable composition for a display device, and can be more preferably used as a colored composition for forming pixels of a color filter used for a display device. The curable composition of the present invention can also be used as a composition for forming color microlenses. Examples of the method for manufacturing the color microlens include the method described in JP-A-2018-010162.
- the curable composition of the present invention contains a pigment.
- pigments include white pigments, black pigments, chromatic pigments, transparent pigments, and near-infrared absorbing pigments.
- the white pigment includes not only pure white but also a light gray pigment close to white (for example, grayish white, light gray, etc.).
- the pigment may be either an inorganic pigment or an organic pigment, and is preferably an organic pigment because it is easy to improve dispersion stability.
- the pigment preferably has a maximum absorption wavelength in the wavelength range of 400 to 2,000 nm, and more preferably has a maximum absorption wavelength in the wavelength range of 400 to 700 nm.
- the curable composition of the present invention is used for forming a colored layer or an infrared absorption layer in a color filter. It can be preferably used as a curable composition.
- the colored layer include a red colored layer, a green colored layer, a blue colored layer, a magenta colored layer, a cyan colored layer, and a yellow colored layer.
- the average primary particle diameter of the pigment is preferably 1 to 200 nm.
- the lower limit is preferably 5 nm or more, more preferably 10 nm or more.
- the upper limit is preferably 180 nm or less, more preferably 150 nm or less, still more preferably 100 nm or less.
- the primary particle diameter of the pigment can be determined from an image photograph obtained by observing the primary particle of the pigment with a transmission electron microscope. Specifically, the projected area of the primary particles of the pigment is obtained, and the diameter of a perfect circle having the same area as the projected area (equivalent circle diameter) is calculated as the primary particle diameter of the pigment.
- the average primary particle diameter in the present invention is an arithmetic average value of the primary particle diameters of 400 primary particles of the pigment.
- the primary particles of the pigment are independent particles that do not aggregate.
- the chromatic color pigment is not particularly limited, and a known chromatic color pigment can be used.
- chromatic color pigments include pigments having a maximum absorption wavelength in the wavelength range of 400 to 700 nm.
- a yellow pigment, an orange pigment, a red pigment, a green pigment, a purple pigment, a blue pigment and the like can be mentioned. Specific examples of these include the following.
- CI Color Index (CI) Pigment Yellow
- PY Color Index (CI) Pigment Yellow
- PY Color Index (CI) Pigment Yellow
- Pigment Orange (hereinafter, also simply referred to as “PO”) 2, 5, 13, 16, 17: 1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60 , 61, 62, 64, 71, 73 etc. (above, orange pigment), C. I.
- Pigment Red (hereinafter, also simply referred to as “PR”) 1,2,3,4,5,6,7,9,10,14,17,22,23,31,38,41,48:1,48 :2,48:3,48:4,49,49:1,49:2,52:1,52:2,53:1,57:1,60:1,63:1,66,67,81 : 1, 81: 2, 81: 3, 83, 88, 90, 105, 112, 119, 122, 123, 144, 146, 149, 150, 155, 166, 168, 169, 170, 171, 172, 175.
- PR Pigment Red
- Pigment Violet (hereinafter, also simply referred to as "PV”) 1,19,23,27,32,37,42,60 (triarylmethane type), 61 (xanthene type), etc. (above, purple pigment), C. I. Pigment Blue (hereinafter, also simply referred to as "PB”) 1,2,15,15:1,15:2,15:3,15:4,15:6,16,22,29,60,64,66 , 79, 80, 87 (monoazo type), 88 (methine/polymethine type), etc. (above, blue pigment).
- PV Pigment Violet
- the curable composition of the present invention preferably contains a green pigment as a pigment, more preferably contains a halogenated phthalocyanine, and contains PG 36 and/or PG 58. It is more preferable to include. It is also preferable that the curable composition of the present invention contains the green pigment and the yellow pigment at the same time. Preferred examples of the yellow pigment in this case include PY 150 and/or PY 185.
- a green pigment a halogenated zinc phthalocyanine pigment having an average number of halogen atoms in one molecule of 10 to 14, an average number of bromine atoms of 8 to 12 and an average number of chlorine atoms of 2 to 5 Can also be used. Specific examples thereof include the compounds described in WO 2015/118720. Further, as the green pigment, a compound described in Chinese Patent Application Publication No. 106909027, a phthalocyanine compound having a phosphoric acid ester as a ligand, or the like can also be used.
- an aluminum phthalocyanine compound having a phosphorus atom can be used as the blue pigment.
- Specific examples thereof include the compounds described in paragraphs 0022 to 0030 of JP2012-247591A and paragraph 0047 of JP2011-157478A.
- the pigment described in JP-A-2017-201003 and the pigment described in JP-A-2017-197719 can be used.
- a yellow pigment at least one anion selected from the group consisting of an azo compound represented by the following formula (I) and an azo compound having a tautomeric structure thereof, two or more metal ions, and a melamine compound: Metal azo pigments containing can also be used.
- R 1 and R 2 are each independently —OH or NR 5 R 6
- R 3 and R 4 are independently ⁇ O or ⁇ NR 7
- R 5 to R 7 are Each is independently a hydrogen atom or an alkyl group.
- the alkyl group represented by R 5 to R 7 preferably has 1 to 10 carbon atoms, more preferably has 1 to 6 carbon atoms, and further preferably has 1 to 4 carbon atoms.
- the alkyl group may be linear, branched or cyclic, preferably linear or branched, and more preferably linear.
- the alkyl group may have a substituent.
- the substituent is preferably a halogen atom, a hydroxy group, an alkoxy group, a cyano group and an amino group.
- paragraph numbers 0011 to 0062 and 0137 to 0276 in JP-A-2017-171912 paragraph numbers 0010 to 0062, 0138 to 0295 and JP-A-2017-171914 in JP-A-2017-171913.
- the descriptions in paragraph numbers 0011 to 0062 and 0139 to 0190 of the publication and paragraph numbers 0010 to 0065 and 0142 to 0222 in JP-A-2017-171915 can be referred to, and the contents thereof are incorporated in the present specification.
- red pigment a diketopyrrolopyrrole pigment in which at least one bromine atom is substituted in the structure described in JP-A-2017-201384, a diketopyrrolopyrrole pigment described in paragraph Nos. 0016 to 0022 of Patent No. 6248838.
- a pigment or the like can also be used.
- the red pigment it is also possible to use a compound having a structure in which an aromatic ring group in which a group having an oxygen atom, a sulfur atom or a nitrogen atom bonded to the aromatic ring is introduced is bound to a diketopyrrolopyrrole skeleton. it can.
- a compound represented by the formula (DPP1) is preferable, and a compound represented by the formula (DPP2) is more preferable.
- R 11 and R 13 each independently represent a substituent
- R 12 and R 14 each independently represent a hydrogen atom, an alkyl group, an aryl group or a heteroaryl group
- n 11 and n 13 are each independently Represents an integer of 0 to 4
- X 12 and X 14 each independently represent an oxygen atom, a sulfur atom or a nitrogen atom
- m12 represents 1 and X
- X When 12 is a nitrogen atom, m12 represents 2, when X 14 is an oxygen atom or a sulfur atom, m14 represents 1, and when X 14 is a nitrogen atom, m14 represents 2.
- Examples of the substituent represented by R 11 and R 13 include the groups mentioned above as the substituent T, and include an alkyl group, an aryl group, a halogen atom, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, and a heteroaryloxycarbonyl. Specific preferred examples include groups, amide groups, cyano groups, nitro groups, trifluoromethyl groups, sulfoxide groups, sulfo groups and the like.
- the chromatic color pigments may be used in combination of two or more kinds.
- black may be formed by a combination of two or more kinds of chromatic color pigments.
- Examples of such a combination include the following aspects (1) to (7).
- the curable composition contains two or more kinds of chromatic color pigments and exhibits a black color by a combination of two or more kinds of chromatic color pigments
- the curable composition of the present invention is used as a near infrared transmitting filter. It can be preferably used.
- a mode containing a red pigment, a blue pigment, a yellow pigment, and a purple pigment (3) A mode containing a red pigment, a blue pigment, a yellow pigment, and a purple pigment. (4) A mode containing a red pigment, a blue pigment, a yellow pigment, a purple pigment, and a green pigment. (5) An embodiment containing a red pigment, a blue pigment, a yellow pigment and a green pigment. (6) A mode containing a red pigment, a blue pigment, and a green pigment. (7) A mode containing a yellow pigment and a purple pigment.
- white pigment titanium oxide, strontium titanate, barium titanate, zinc oxide, magnesium oxide, zirconium oxide, aluminum oxide, barium sulfate, silica, talc, mica, aluminum hydroxide, calcium silicate, aluminum silicate, hollow Examples thereof include resin particles and zinc sulfide.
- the white pigment is preferably particles having a titanium atom, and more preferably titanium oxide.
- the white pigment is preferably particles having a refractive index of 2.10 or more at 25° C. with respect to light having a wavelength of 589 nm. The above-mentioned refractive index is preferably 2.10 to 3.00, and more preferably 2.50 to 2.75.
- titanium oxide described in "Titanium oxide physical properties and applied technology, Manabu Seino, pages 13-45, issued June 25, 1991, published by Gihodo Publishing" can be used.
- the white pigment is not limited to a single inorganic substance, and particles mixed with other materials may be used. For example, particles having pores or other materials inside, particles in which a large number of inorganic particles are attached to core particles, core and shell composite particles composed of core particles made of polymer particles and a shell layer made of inorganic nanoparticles are used. It is preferable.
- core and shell composite particles composed of the core particles composed of the polymer particles and the shell layer composed of the inorganic nanoparticles for example, the description in paragraph Nos. 0012 to 0042 of JP-A-2015-047520 can be referred to, This content is incorporated herein.
- Hollow inorganic particles can be used as the white pigment.
- the hollow inorganic particle is an inorganic particle having a structure having a cavity inside, and refers to an inorganic particle having a cavity surrounded by an outer shell.
- Examples of the hollow inorganic particles include the hollow inorganic particles described in JP 2011-0775786 A, WO 2013/061621, JP 2015-164881 A, etc., the contents of which are incorporated herein. Be done.
- the black pigment is not particularly limited, and known pigments can be used. Examples thereof include carbon black, titanium black, graphite, etc., carbon black and titanium black are preferable, and titanium black is more preferable. Titanium black is black particles containing titanium atoms, and low-order titanium oxide and titanium oxynitride are preferable.
- the surface of titanium black can be modified as necessary for the purpose of improving dispersibility and suppressing cohesion. For example, it is possible to coat the surface of titanium black with silicon oxide, titanium oxide, germanium oxide, aluminum oxide, magnesium oxide, or zirconium oxide. Further, treatment with a water-repellent substance as disclosed in JP-A-2007-302836 is also possible.
- black pigments include Color Index (CI) Pigment Black 1, 7 and the like.
- Titanium black preferably has a small primary particle diameter and a small average primary particle diameter. Specifically, the average primary particle size is preferably 10 to 45 nm. Titanium black can also be used as a dispersion.
- a dispersion containing titanium black particles and silica particles, in which the content ratio of Si atoms and Ti atoms in the dispersion is adjusted to be in the range of 0.20 to 0.50 may be mentioned.
- the description in paragraphs 0020 to 0105 of JP 2012-169556 A can be referred to, and the contents thereof are incorporated in the present specification.
- titanium black examples include titanium black 10S, 12S, 13R, 13M, 13M-C, 13R-N, 13MT (trade name: manufactured by Mitsubishi Materials Corporation), Tilac D ( Trade name: manufactured by Ako Kasei Co., Ltd., etc.
- the near-infrared absorbing pigment is preferably an organic pigment.
- the near-infrared absorbing pigment preferably has a maximum absorption wavelength in the range of more than 700 nm and 1,400 nm or less.
- the maximum absorption wavelength of the near-infrared absorbing pigment is preferably 1,200 nm or less, more preferably 1,000 nm or less, still more preferably 950 nm or less.
- the near-infrared absorbing pigment preferably has A 550 /A max, which is a ratio of the absorbance A 550 at a wavelength of 550 nm and the absorbance A max at the maximum absorption wavelength, of 0.1 or less, preferably 0.05 or less.
- the lower limit is not particularly limited, but may be 0.0001 or more, and may be 0.0005 or more, for example.
- the maximum absorption wavelength of the near-infrared absorbing pigment and the value of the absorbance at each wavelength are values obtained from the absorption spectrum of the film formed using the curable composition containing the near-infrared absorbing pigment.
- the near-infrared absorbing pigment is not particularly limited, but is a pyrrolopyrrole compound, a rylene compound, an oxonol compound, a squarylium compound, a cyanine compound, a croconium compound, a phthalocyanine compound, a naphthalocyanine compound, a pyrylium compound, an azurenium compound, an indigo compound and a pyrromethene compound.
- pyrrolopyrrole compounds are preferably at least one selected from the group consisting of pyrrolopyrrole compounds, squarylium compounds, cyanine compounds, phthalocyanine compounds and naphthalocyanine compounds, more preferably a pyrrolopyrrole compound or a squarylium compound, pyrrolopyrrole Particularly preferred is a compound.
- Transparent pigment examples include titanium oxide, zirconium oxide, silica, zinc oxide, barium sulfate, barium carbonate, alumina white, calcium carbonate, calcium stearate and the like. Among these, those having a small coloring power are preferable, titanium oxide or zirconium oxide is more preferable, and zirconium oxide is further preferable.
- the content of the pigment in the total solid content of the curable composition is preferably 5% by mass or more, more preferably 10% by mass or more, further preferably 20% by mass or more, 30% by mass. It is even more preferable that the amount is 40% by mass or more, and particularly preferably 50% by mass or more.
- the upper limit is preferably 80% by mass or less, more preferably 70% by mass or less, and further preferably 60% by mass or less.
- the curable composition of the present invention may contain a pigment derivative.
- a pigment derivative in the present invention, it is also a preferred embodiment to use a pigment and a pigment derivative together.
- the pigment derivative include compounds having a structure in which a part of the chromophore is substituted with an acid group, a basic group or a phthalimidomethyl group.
- the chromophore constituting the pigment derivative includes a quinoline skeleton, a benzimidazolone skeleton, a diketopyrrolopyrrole skeleton, an azo skeleton, a phthalocyanine skeleton, an anthraquinone skeleton, a quinacridone skeleton, a dioxazine skeleton, a perinone skeleton.
- quinoline skeleton, benzimidazolone skeleton, diketo A pyrrolopyrrole skeleton, an azo skeleton, a quinophthalone skeleton, an isoindoline skeleton and a phthalocyanine skeleton are preferable, and an azo skeleton and a benzimidazolone skeleton are more preferable.
- the acid group contained in the pigment derivative is preferably a sulfo group or a carboxy group, more preferably a sulfo group.
- an amino group is preferable, and a tertiary amino group is more preferable.
- Specific examples of the pigment derivative include the compounds described in Examples below, and the compounds described in paragraphs 0162 to 0183 of JP2011-252065A.
- the content of the pigment derivative is preferably 1 to 30 parts by mass and more preferably 3 to 20 parts by mass with respect to 100 parts by mass of the pigment.
- the pigment derivative only one kind may be used, or two or more kinds may be used in combination.
- the curable composition of the present invention contains a resin (specific resin) satisfying at least one of the following Condition 1 and Condition 2.
- Condition 1 The resin contains a structural unit having an anion structure, a quaternary ammonium cation structure ionically bonded to the anion structure, and a radically polymerizable group in the same side chain.
- Condition 2 The resin contains a quaternary ammonium cation structure and a structural unit having a group to which a radically polymerizable group is linked in a side chain.
- the specific resin in the present invention may be any of a linear polymer compound, a star polymer compound, and a comb polymer compound, and the specific terminal described in JP 2007-277514 A or the like having a plurality of branch points. It may be a star-shaped polymer compound having a group, and the form of the resin does not matter.
- the molecular weight (weight average molecular weight in the case of having a molecular weight distribution) of the side chain under Condition 1 or Condition 2 is preferably 50 to 1500, and more preferably 100 to 1000.
- the specific resin is preferably an addition polymerization type resin, and more preferably an acrylic resin.
- the side chain in Condition 1 or Condition 2 is a molecular chain that is bonded to a molecular chain formed by addition polymerization and is a molecular chain formed by a method other than addition polymerization. An aspect is mentioned.
- the specific resin may be a dispersant.
- a resin mainly used for dispersing particles such as a pigment is also referred to as a dispersant.
- the specific resin can be used for purposes other than such an application.
- the anion structure and the quaternary ammonium cation structure are: It may be ionically bonded or may be dissociated.
- the side chain under Condition 1 may have at least one anion structure, quaternary ammonium cation structure, and radically polymerizable group, and may have an anion structure, a quaternary ammonium cation structure, and A side chain may have a plurality of at least one selected from the group consisting of radically polymerizable groups.
- the anion structure in the above Condition 1 is not particularly limited, and examples thereof include anions derived from acid groups such as carboxylate anion, sulfonate anion, phosphonate anion, phosphinate anion, and phenolate anion. preferable. Further, the anion structure under the above Condition 1 may be directly linked to the main chain of the resin. For example, when a carboxy group (side group) included in a structural unit derived from acrylic acid in an acrylic resin is anionized, it has an anion structure directly connected to the main chain of the resin.
- the distance (the number of atoms) between the main chain and the quaternary ammonium cation structure when the anion structure and the quaternary ammonium cation structure are bonded is preferably 4 to 70 elements, more preferably 4 to 50 elements. -30 elements are more preferable.
- the distance between two structures in a polymer compound means the number of atoms of a linking group connecting the two structures in the shortest distance.
- the distance between the quaternary ammonium cation structure and the radically polymerizable group is preferably 2 to 30 elements, more preferably 3 to 20 elements, and further preferably 4 to 15 elements.
- the distance between the radically polymerizable group and the main chain is preferably 6 to 100 elements, more preferably 6 to 70 elements, and even more preferably 6 to 50 elements.
- the quaternary ammonium cation structure in the above Condition 1 is preferably a structure in which at least three are hydrocarbon groups out of four groups containing four carbon atoms bonded to nitrogen atoms, and at least three are alkyl groups. Is more preferable. At least one of the four groups containing four carbon atoms bonded to the nitrogen atom is a linking group containing a bonding site with the radically polymerizable group.
- the linking group is preferably a divalent to hexavalent linking group, more preferably a divalent to tetravalent linking group, and more preferably a divalent or trivalent linking group.
- linking group examples include groups represented by L A2 in formula (A1) described below. Further, it is preferable that only one of the four groups containing four carbon atoms bonded to the nitrogen atom is the linking group. Of the four groups containing the above four carbon atoms, two or three are preferably alkyl groups having 1 to 4 carbon atoms, and two are alkyl groups having 1 to 4 carbon atoms, and the remaining 2 Of the two groups, one is preferably a hydrocarbon group having 4 to 20 carbon atoms. Further, the two or three alkyl groups may be the same group or different groups. The alkyl group having 1 to 4 carbon atoms is preferably a methyl group or an ethyl group, and more preferably a methyl group.
- the hydrocarbon group having 4 to 20 carbon atoms is preferably an alkyl group having 4 to 20 carbon atoms or a benzyl group.
- the side chain includes a plurality of quaternary ammonium cation structures, the quaternary ammonium cation structures are bound to each other via a linking group, and the quaternary ammonium cation structures form a ring structure.
- Examples of the ring structure formed include the ring structure represented by the following formula. In the following formula, * represents a binding site with a linking group including a binding site with a radically polymerizable group.
- the radically polymerizable group is preferably a group having an ethylenically unsaturated group.
- the group having an ethylenically unsaturated group include a vinyl group, a (meth)allyl group, a (meth)acrylamide group, a (meth)acryloxy group, and a vinylphenyl group. From the viewpoint of reactivity, (meth)acryloxy group A group or a vinylphenyl group is preferable, and a (meth)acryloxy group is more preferable.
- the quaternary ammonium cation structure and the radically polymerizable group are linked. That is, one side chain has both at least one quaternary ammonium cation structure and at least one radically polymerizable group.
- the side chain in the above Condition 2 may have at least one quaternary ammonium cation structure and at least one radically polymerizable group, and a group consisting of a quaternary ammonium cation structure and a radically polymerizable group. A plurality of at least one selected from the group may be contained in one side chain.
- the distance (atom number) between the main chain and the quaternary ammonium cation structure is preferably 4 to 20 elements, more preferably 4 to 15 elements, and most preferably 4 to 10 elements.
- the distance between the quaternary ammonium cation structure and the polymerizable group is preferably 2 to 30 elements, more preferably 3 to 20 elements, and further preferably 4 to 15 elements.
- the distance between the polymerizable group and the main chain is preferably 6 to 50 elements, more preferably 6 to 30 elements, and even more preferably 6 to 20 elements.
- the quaternary ammonium cation structure in the above Condition 2 is preferably a structure in which at least two are hydrocarbon groups out of four groups containing four carbon atoms bonded to nitrogen atoms, and at least two are alkyl groups. Is more preferable.
- the hydrocarbon group is preferably an alkyl group or an aryl group, more preferably an alkyl group or a phenyl group.
- the alkyl group is preferably an alkyl group having 1 to 4 carbon atoms, more preferably a methyl group or an ethyl group, and further preferably a methyl group.
- the two alkyl groups may be the same group or different groups.
- At least one is a linking group containing a binding site with a radically polymerizable group, and at least one is a binding site with a main chain in a specific resin.
- the linking group with the radically polymerizable group is preferably a divalent to hexavalent linking group, more preferably a divalent to tetravalent linking group, and a divalent or trivalent linking group. Is more preferable.
- Examples of the linking group include a group represented by L B2 in the formula (B1) described later.
- the linking group containing the binding site to the main chain in the specific resin is preferably a divalent linking group.
- linking group examples include groups represented by L B1 in the formula (B1) described below.
- the counter anion of the quaternary ammonium cation structure in the above Condition 2 may be present in the specific resin, or may be present in the other components contained in the curable composition, but is present in the specific resin. Preferably.
- the radically polymerizable group is preferably a group having an ethylenically unsaturated group.
- the group having an ethylenically unsaturated group include a vinyl group, a (meth)allyl group, a (meth)acrylamide group, a (meth)acryloxy group, and a vinylphenyl group. From the viewpoint of reactivity, (meth)acryloxy group A group or a vinylphenyl group is preferable, and a (meth)acryloxy group is more preferable.
- the resin preferably contains at least one of a structural unit represented by the following formula (A1) and a structural unit represented by the following formula (B1).
- the resin containing the structural unit represented by the following formula (A1) is a resin that satisfies Condition 1
- the resin including the structural unit represented by the following formula (B1) is a resin that satisfies Condition 2.
- R A1 represents a hydrogen atom or an alkyl group
- a A1 represents a structure containing a group in which a proton is dissociated from an acid group
- R A2 and R A3 each independently represent an alkyl group or an aralkyl group.
- L A1 represents a monovalent substituent when mA is 1, a mA valent linking group when mA is 2 or more
- L A2 represents an nA+1 valent linking group
- A3 represents a divalent linking group
- R A4 represents a hydrogen atom or an alkyl group
- nA represents an integer of 1 or more
- mA represents an integer of 1 or more
- R A2 , 2 or more R A3 and 2 or more L A2 may be the same or different, and when mA is 2 or more, it is a structure containing a quaternary ammonium cation.
- mA structures at least one selected from the group consisting of R A2 and R A3 contained in one structure is at least one selected from the group consisting of R A2 and R A3 contained in another structure.
- a ring structure may be formed, and when at least one selected from the group consisting of nA and mA is 2 or more, 2 or more L A3 and 2 or more R A4 may be the same or different.
- R A2 , R A3 and L A2 may combine to form a ring;
- R B1 represents a hydrogen atom or an alkyl group
- L B1 represents a divalent linking group
- R B2 and R B3 each independently represent an alkyl group
- L B2 represents a nB+1 valent linking.
- L B3 represents a divalent linking group
- R B4 represents a hydrogen atom or an alkyl group
- nB represents an integer of 1 or more, and when nB is 2 or more, L B3 of 2 or more and Two or more R B4 may be the same or different, and at least two of R B2 , R B3 , L B1 and L B2 may be bonded to each other to form a ring.
- R A1 is preferably a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and more preferably a hydrogen atom or a methyl group.
- a A1 represents a structure containing a group in which a proton is dissociated from an acid group, and examples of the acid group include a carboxy group, a sulfo group, a phosphoric acid group, a phosphonic acid group, and a phenolic hydroxy group. Groups are preferred.
- the number of acid groups contained in A A1 may be one or more, and is preferably one.
- the acid group in A A1 may be directly bonded to the carbon atom to which R A1 in the formula (A1) is bonded, or may be bonded via a linking group.
- the linking group is preferably a hydrocarbon group, an ether bond (—O—), an ester bond (—COO—), an amide bond (—CONH—), or a group formed by combining two or more of these.
- the hydrocarbon group include a divalent hydrocarbon group, preferably an alkylene group or an arylene group, and more preferably an alkylene group having 1 to 20 carbon atoms or a phenylene group.
- R A2 and R A3 are each independently preferably an alkyl group, more preferably an alkyl group having 1 to 10 carbon atoms, more preferably an alkyl group having 1 to 4 carbon atoms, and a methyl group. Or, an ethyl group is more preferable, and a methyl group is particularly preferable.
- R A2 or R A3 is an aralkyl group
- an aralkyl group having 7 to 22 carbon atoms is preferable
- an aralkyl group having 7 to 10 carbon atoms is more preferable
- a benzyl group is further preferable.
- L A1 is preferably a mA-valent hydrocarbon group when mA is 2 or more, and saturated aliphatic hydrocarbons, aromatic hydrocarbons, or mA hydrogens from a structure in which two or more of these are bonded. More preferred is a group excluding atoms.
- L A1 is preferably an alkyl group, an aryl group or an aralkyl group, more preferably an alkyl group having 4 to 20 carbon atoms or a benzyl group.
- L A2 is preferably any one of groups represented by formulas (C1-1) to (C4-1) described later.
- L A3 is preferably an ether bond (—O—), an ester bond (—COO—), an amide bond (—NHCO—), an alkylene group or an arylene group, more preferably an ester bond or a phenylene group. preferable.
- R A4 is preferably a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and more preferably a hydrogen atom or a methyl group.
- nA is preferably from 1 to 10, more preferably from 1 to 4, even more preferably 1 or 2, and particularly preferably 1.
- mA is preferably 1 to 10, more preferably 1 to 4, and further preferably 1 to 3.
- R B1 is preferably a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and more preferably a hydrogen atom or a methyl group.
- L B1 represents a divalent linking group, which is a hydrocarbon group, an ether bond (—O—), an ester bond (—COO—), an amide bond (—CONH—), or two or more of these. Linked groups are preferred. Examples of the hydrocarbon group include a divalent hydrocarbon group, preferably an alkylene group or an arylene group, and more preferably an alkylene group having 1 to 20 carbon atoms or a phenylene group.
- R B2 and R B3 are each independently preferably an alkyl group having 1 to 10 carbon atoms, more preferably an alkyl group having 1 to 4 carbon atoms, further preferably a methyl group or an ethyl group, and a methyl group. Is particularly preferable.
- L B2 is preferably any one of groups represented by formulas (C1-1) to (C4-1) described later.
- L B3 is preferably an ether bond (—O—), an ester bond (—COO—), an amide bond (—NHCO—), an alkylene group or an arylene group, more preferably an ester bond or a phenylene group.
- nB is preferably 1 to 10, more preferably 1 to 4, even more preferably 1 or 2, and particularly preferably 1.
- L A2 in the formula (A1) or L B2 in the formula (B1) is preferably any one of groups represented by the following formula (C1-1) to the following formula (C4-1). ..
- L C11 represents an nC1+1 valent linking group
- L C21 represents an nC2+1 valent linking group
- L C31 represents an nC3+1 valent hydrocarbon group
- nC1 To nC3 each independently represent an integer of 1 or more
- the wavy line portion represents a binding site with a nitrogen atom in the formula (A1) or the formula (B1)
- * represents a carbon to which R A4 in the formula (A1) is bonded.
- L C21 in the formula (C3-1) represents that it may be bonded to any carbon atom of the cyclohexane ring in the formula (C3-1).
- L C11 is preferably an nC1+1-valent hydrocarbon group, an ether bond, an ester bond, or a group in which two or more of these are bonded, and a saturated aliphatic hydrocarbon or aromatic A group hydrocarbon, an ether bond, an ester bond, or a group in which two or more of these are bonded and nC1+1 hydrogen atoms are removed is more preferable.
- nC1 is preferably 1-10, more preferably 1-4, and even more preferably 1 or 2.
- L C21 is preferably an nC2+1 valent hydrocarbon group, an ether bond, an ester bond, or a group in which two or more of these are bonded, and a saturated aliphatic hydrocarbon, an aromatic hydrocarbon, an ether bond, An ester bond or a group obtained by removing nC2+1 hydrogen atoms from a structure in which two or more of these are bonded is more preferable.
- nC2 is preferably 1-10, more preferably 1-4, and even more preferably 1 or 2.
- L C31 is preferably a saturated aliphatic hydrocarbon, an aromatic hydrocarbon, or a group in which nC3+1 hydrogen atoms are removed from the structure in which two or more of these are bonded.
- nC3 is preferably 1-10, more preferably 1-4, and even more preferably 1 or 2.
- L A3 is preferably an ester bond.
- L A3 is preferably a phenylene group.
- L B3 is preferably an ester bond.
- L B3 is preferably a phenylene group.
- nA in the formula (A1) is 1, L A2 and L A3 Represents a group represented by the following formulas (C1) to (C4), or nB in the formula (B1) is 1 and L B2 and L B3 are An embodiment in which any one of the groups represented by the formula (C1) to the following formula (C4) is represented is preferable.
- L C1 , L C2 and L C3 each independently represent a single bond or a divalent linking group, and the wavy line portion represents a nitrogen atom in formula (A1) or formula (B1).
- the bond site with the atom * represents the bond site with the carbon atom to which R A4 in formula (A1) is bonded or the carbon atom to which R B4 in formula (B1) is bonded.
- L C2 in the formula (C3) represents that it may be bonded to any carbon atom of the cyclohexane ring in the formula (C3).
- L C1 is preferably a divalent hydrocarbon group, an ether bond, an ester bond, or a group in which two or more of these are bonded, and an alkylene group, an arylene group, an ether bond, an ester bond. Or, a group in which two or more of these are bonded is more preferable, and an alkylene group having 1 to 20 carbon atoms, a phenylene group, an ether bond, or a group in which two or more of these are bonded is more preferable.
- L C2 is preferably a divalent hydrocarbon group, an ether bond, an ester bond, or a group in which two or more of these are bonded, and an alkylene group, an arylene group, an ether bond, an ester bond, or these A group in which two or more are bonded is more preferable, and an alkylene group having 1 to 20 carbon atoms, a phenylene group, an ether bond, or a group in which two or more of these are bonded is more preferable.
- L C3 is preferably a divalent hydrocarbon group, an ether bond, an ester bond, or a group in which two or more of these are bonded, and an alkylene group, an arylene group, an ether bond, an ester bond, or these A group in which two or more are bonded is more preferable, and an alkylene group having 1 to 20 carbon atoms is more preferable.
- the constitutional unit represented by the formula (A1) preferably includes the structures shown below, but is not limited thereto.
- n represents an integer of 1 or more.
- the structural unit represented by the formula (B1) preferably includes the structures shown below, but it goes without saying that the structure is not limited thereto. Further, in these structures, at least a part of the constitutional unit having a quaternary ammonium cation structure is represented by the formula (A1) corresponding to the following formula (A1-1-1) (the partial structure in the formula (A-1)). The structure may be represented by (1-1′). Specifically, the structure represented by the above formula (C1) contained in the structural unit having a quaternary ammonium cation structure may be the structure represented by the above formula (C2). The structure such as the formula (A1-1-1′) exists as a structural isomer in, for example, a reaction between an amine compound and a compound having an epoxy group and an acryloyl group.
- the specific resin may have one type of the structural unit represented by formula (A1) alone, or may have two or more types. Further, the specific resin may have one kind of the structural unit represented by the formula (B1) alone, or may have two or more kinds.
- the content of the structural unit represented by the formula (A1) and the structural unit represented by the formula (B1) (when two or more kinds are contained, the total content) is 1 mass with respect to the total mass of the specific resin. % To 60% by mass, more preferably 5 to 40% by mass, still more preferably 5 to 20% by mass.
- the specific resin preferably further contains a structural unit represented by the formula (A1) and a structural unit D different from the structural unit represented by the formula (B1) and having a radically polymerizable group.
- the radically polymerizable group in the structural unit D is preferably a group having an ethylenically unsaturated group.
- Examples of the group having an ethylenically unsaturated group include a vinyl group, a (meth)allyl group, a (meth)acrylamide group, a (meth)acryloxy group, and a vinylphenyl group. From the viewpoint of reactivity, (meth)acryloxy group A group or a vinylphenyl group is preferable, and a (meth)acryloxy group is more preferable.
- the specific resin preferably further contains, as the structural unit D, a structural unit represented by the following formula (D1).
- R D1 to R D3 each independently represent a hydrogen atom or an alkyl group
- X D1 represents a —COO—, —CONR D6 — or an arylene group
- R D6 represents a hydrogen atom or an alkyl group.
- R D4 represents a divalent linking group
- L D1 represents a group represented by the following formula (D2), formula (D3) or formula (D3′)
- R D5 represents , (N+1)-valent linking group
- X D2 represents an oxygen atom or NR D7 ⁇
- R D7 represents a hydrogen atom, an alkyl group or an aryl group
- R D represents a hydrogen atom or a methyl group
- nD represents an integer of 1 or more, and when nD is 2 or more, X D2 of 2 or more and R D of 2 or more may be the same or different.
- X D3 represents an oxygen atom or —NH—
- X D4 represents an oxygen atom or COO—
- R e1 to R e3 are independent of each other.
- X D5 represents an oxygen atom or —COO—
- R e4 to R e6 each independently represents a hydrogen atom or an alkyl group, and at least two of R e4 to R e6 may be bonded to each other to form a ring structure, and * and a wavy line are bonded to another structure. Indicates the position.
- the deep-part curability of the obtained film is likely to be excellent.
- the side chain has a group represented by the formula (D2), the formula (D3) or the formula (D3′), which is a polar group, and thus the composition It is considered that the range in which the (meth)acryloyl group moves becomes large and the reactivity is excellent.
- the group represented by the formula (D2), the formula (D3) or the formula (D3′) by having the group represented by the formula (D2), the formula (D3) or the formula (D3′), the aggregation of the resins is suppressed, the dispersibility is excellent, and the (meth)acryloyl group is more reactive. Therefore, it is considered that the curable composition having excellent deep-part curability can be easily obtained. Further, by containing the constitutional unit represented by the formula (D1), high reactivity can be achieved at a position distant from the main chain via the group represented by the formula (D2), the formula (D3) or the formula (D3′). (Meth)acryloyl group can be introduced.
- the constitutional unit represented by the formula (D1) has a relatively long side chain structure and has a polar group represented by the formula (D2), the formula (D3) or the formula (D3′) in the side chain. Therefore, it is considered that the three-dimensional repulsion property is enhanced by enhancing the adsorptivity to the pigment and suppressing the aggregation of the pigment particles.
- the dispersibility of the pigment is improved.
- the specific resin has a structural unit represented by the formula (D4) described later, it is possible to introduce a carboxylic acid serving as an adsorptive group at a position distant from the main chain, thereby enhancing pigment adsorbability and dispersion stability. It is thought that the property can be improved.
- the constitutional unit represented by the formula (D1) the substrate adhesion and the pattern shape are also improved due to the excellent deep-part curability, and further represented by the formula (D4) described later. It is considered that the dispersion stability of the curable composition is improved by having the structural unit.
- R D1 to R D3 in the formula (D1) are each independently preferably a hydrogen atom or a methyl group, and more preferably a hydrogen atom, from the viewpoint of deep curability. Further, from the viewpoint of deep-part curability, it is more preferable that R D1 is a hydrogen atom or a methyl group, and R D2 and R D3 are hydrogen atoms.
- L D1 is a group represented by formula (D2)
- R D1 is more preferably a methyl group
- L D1 is a group represented by formula (D3) or formula (D3′)
- X D1 in the formula (D1) is preferably —COO— or CONR D6 —, and more preferably —COO—, from the viewpoint of the deep-part curability.
- X D1 is an arylene group, it is preferably a divalent aromatic hydrocarbon group having 6 to 20 carbon atoms, more preferably a phenylene group or a naphthylene group, still more preferably a phenylene group.
- X D1 is —COO—, it is preferred that the carbon atom in —COO— be bonded to the carbon atom to which R D1 in formula (D1) is bonded.
- R D6 is preferably a hydrogen atom or an alkyl group, and more preferably a hydrogen atom.
- R D4 in the formula (D1) is a hydrocarbon group or a group in which two or more hydrocarbon groups are bonded to one or more structures selected from the group consisting of an ether bond and an ester bond, from the viewpoint of deep-hardenability. Is more preferable, and a hydrocarbon group or a group in which two or more hydrocarbon groups and one or more ester bonds are bonded is more preferable.
- R D4 in the formula (D1) is preferably a group in which two or more groups selected from the group consisting of an alkylene group, an ether group, a carbonyl group, a phenylene group, a cycloalkylene group, and an ester bond are bonded.
- a group in which two or more groups selected from the group consisting of an alkylene group, an ether group, and an ester bond are bonded is more preferable.
- R D4 in the formula (D1) is preferably a group having a total number of atoms of 2 to 60, more preferably a group having a total number of atoms of 2 to 50, and more preferably a total number of atoms from the viewpoint of deep-hardenability.
- R D4 is a group selected from the group consisting of a hydrocarbon group, an alkyleneoxy group, an alkylenecarbonyloxy group and any group represented by the following structure, and R is It is particularly preferable that D5 is an alkylene group or a group in which two or more alkylene groups and one or more structures selected from the group consisting of ether bonds and ester bonds are bonded.
- * and a wavy line represent a binding position with another structure
- * represents a binding site with X D1 in the formula (D1)
- a wavy line represents a binding position with L D1
- L F1 and L F2 each independently represent a hydrocarbon group
- n represents an integer of 0 or more.
- L F1 and L F2 are each independently an alkylene group having 2 to 20 carbon atoms.
- L F1 and L F2 are the same group.
- An embodiment in which n is 0 to 100 is also preferable.
- ND in the formula (D1) is preferably an integer of 1 to 6, more preferably an integer of 1 to 3, and even more preferably 1 from the viewpoint of deep-part curability.
- R D5 in the formula (D1) is preferably a divalent linking group from the viewpoint of deep-curing property, and is selected from the group consisting of an alkylene group, or a group consisting of two or more alkylene groups, an ether bond and an ester bond. A group in which one or more structures are bonded is more preferable, an alkyleneoxyalkylene group is still more preferable, and a methyleneoxy-n-butylene group is particularly preferable.
- R D5 in the formula (D1) is preferably a group having a total number of atoms of 2 to 40, more preferably a group having a total number of atoms of 2 to 30, and more preferably a total number of atoms from the viewpoint of deep-hardenability. A group of 2 to 20 is particularly preferable.
- X D2 in the formula (D1) is preferably an oxygen atom from the viewpoint of deep-part curability.
- R D7 is preferably a hydrogen atom or an alkyl group, and more preferably a hydrogen atom.
- R D is preferably a hydrogen atom.
- L D1 in the formula (D1) is preferably a group represented by the formula (D2) from the viewpoint of dispersibility, and the formula (D3) or the formula from the viewpoint of suppressing the pattern shape and the development residue. It is preferably a group represented by (D3′).
- * is preferably a binding site with R D4 and the wavy line is a binding site with R D5 .
- X D3 in the formula (D2) is preferably an oxygen atom from the viewpoint of deep-part curability and dispersibility.
- R D4 is an ethylene group, an n-propylene group, an isopropylene group, an n-butylene group or It is particularly preferable that it is a group selected from the group consisting of isobutylene groups and R D5 is an ethylene group.
- X D4 in formula (D3) or formula (D3′) is preferably —COO— from the viewpoint of deep-part curability, pattern shape and development residue suppression.
- X D4 is —COO—, it is preferable that the oxygen atom in —COO— and the carbon atom to which R e1 is bonded be bonded.
- R e1 to R e3 in the formula (D3) or the formula (D3′) is preferably a hydrogen atom from the viewpoint of the deep-curing property, the pattern shape, and the development residue suppression.
- L D1 is a group represented by the formula (D3) or the formula (D3′)
- R D4 is a hydrocarbon group or 2 or more from the viewpoint of deep-curing property, pattern shape and development residue suppression.
- the group represented by the formula (D2) is preferably a group represented by the following formula (D2-1) or formula (D2-2).
- As the group represented by the formula (D3) a group represented by the following formula (D3-1) or the formula (D3-2) is preferable.
- the * and wavy lines in the formula (D2-1), the formula (D2-2), the formula (D3-1), and the formula (D3-2) are the * and wavy lines in the formula (D2) or the formula (D3). It is synonymous with the part and the preferable aspect is also the same.
- at least a part of the formula (D3-1′) corresponding to the formula (D3-1) below and the formula (D3-2) below It may have a structure represented by the formula (D3-2′).
- the structure such as the formula (D3-1′) exists as a structural isomer in, for example, a reaction between a carboxylic acid compound and a compound having an epoxy group and an acryloyl group.
- the structure such as the formula (D3-2′) exists as a structural isomer in, for example, a reaction of a phenol compound with a compound having an epoxy group and an acryloyl group.
- the specific resin may have one type or two or more types of the structural unit represented by the formula (D1).
- the content of the structural unit represented by the formula (D1) is from 1 to 80% by mass based on the total mass of the specific resin, from the viewpoint of developability, pattern shape, dispersion stability, and deep-part curability. Is preferable, 1 to 70% by mass is more preferable, and 1 to 60% by mass is particularly preferable.
- the specific resin preferably further has a structural unit represented by the following formula (D4).
- R D8 represents a hydrogen atom or an alkyl group
- X D5 represents a —COO—, —CONR B — or an arylene group
- R B represents a hydrogen atom, an alkyl group or an aryl group.
- L D2 is an aliphatic hydrocarbon group having 1 to 10 carbon atoms, an aromatic hydrocarbon group having 6 to 20 carbon atoms, or an aliphatic hydrocarbon group having 1 to 10 carbon atoms and an aromatic group having 6 to 20 carbon atoms Represents a group in which two or more groups selected from the group consisting of a group hydrocarbon group and one or more groups selected from a group consisting of an ether bond and an ester bond are bonded together, and X D5 in L D2 is arylene. When it is a group, it may be a single bond.
- R D8 in formula (D4) is preferably a hydrogen atom.
- X D5 in formula (D4) is preferably —COO— or —CONR B —, and more preferably —COO—.
- X D5 is —COO—
- R B is preferably a hydrogen atom or an alkyl group, and more preferably a hydrogen atom.
- L D2 in the formula (D4) is an aliphatic hydrocarbon group having 1 to 10 carbon atoms, or an aliphatic hydrocarbon group having 2 or more carbon atoms and 1 to 10 carbon atoms and one or more ester bonds. Is preferably a group in which and are bonded, more preferably an aliphatic hydrocarbon group having 1 to 10 carbon atoms, and particularly preferably an alkylene group having 1 to 10 carbon atoms.
- n represents an integer of 1 or more.
- the specific resin may have one type of structural unit represented by formula (D4) alone, or may have two or more types.
- the content of the structural unit represented by the formula (D4) is preferably 20% by mass to 80% by mass based on the total mass of the specific resin, from the viewpoints of developability, pattern shape, and dispersion stability. More preferably 20% by mass to 70% by mass, and particularly preferably 20% by mass to 60% by mass.
- the specific resin preferably further has a structural unit represented by the following formula (D5) from the viewpoint of dispersion stability, and is represented by the above formula (D4) from the viewpoint of dispersion stability and developability. It is more preferable to further include a structural unit and a structural unit represented by the following formula (D5).
- R D9 represents a hydrogen atom or an alkyl group
- X D6 represents an oxygen atom or NR C ⁇
- R C represents a hydrogen atom, an alkyl group or an aryl group
- L D3 represents a divalent group.
- Y D1 represents an alkyleneoxy group or an alkylenecarbonyloxy group
- Z D1 represents an aliphatic hydrocarbon group having 1 to 20 carbon atoms or an aromatic hydrocarbon group having 6 to 20 carbon atoms
- p represents an integer of 1 or more, and when p is 2 or more, p Y D1 s may be the same or different.
- R D9 in formula (D5) is preferably a hydrogen atom or a methyl group, and more preferably a methyl group.
- X D6 in formula (D5) is preferably an oxygen atom.
- R C is preferably a hydrogen atom or an alkyl group, and more preferably a hydrogen atom.
- L D3 in formula (D5) is preferably a group having a total number of atoms of 2 to 30, more preferably a group having a total number of atoms of 3 to 20, and a total number of atoms of 4 to Particularly preferred are 10 groups.
- L D3 in the formula (D5) is preferably a group having a urethane bond or a urea bond, more preferably a group having a urethane bond, and an alkylene group and a urethane bond. Is particularly preferably a group to which is bonded.
- Y D1 in formula (D5) is preferably an alkylenecarbonyloxy group.
- p Y D1 includes a plurality of structures, these structures may be arranged randomly or may be arranged in a block.
- the alkylenecarbonyloxy group preferably has 2 to 30 carbon atoms, more preferably has 3 to 10 carbon atoms, and particularly preferably has 5 to 8 carbon atoms.
- p is an integer of 1 or more, and preferably an integer of 3 or more. Further, p is preferably 100 or less, more preferably 60 or less, and particularly preferably 40 or less.
- Z D1 in the formula (D5) is preferably an aliphatic hydrocarbon group having 1 to 20 carbon atoms, more preferably an alkyl group having 4 to 20 carbon atoms, and Particularly preferably, it is an alkyl group of 6 to 20. Further, the alkyl group in Z D1 is preferably a branched alkyl group from the viewpoint of dispersion stability.
- n represents an integer of 1 or more
- a and b each independently represent an integer of 1 or more.
- a oxyalkylenecarbonyl structure or alkyleneoxy structure and b oxyalkylenecarbonyl structure or alkyleneoxy structure are randomly arranged.
- the specific resin may have one kind of the structural unit represented by the formula (D5) alone, or may have two or more kinds.
- the content of the structural unit represented by the formula (D5) is preferably 5% by mass to 80% by mass with respect to the total mass of the specific resin, from the viewpoint of developability and dispersion stability. % To 70% by mass is more preferable, and 5% to 60% by mass is particularly preferable.
- the specific resin may have a structural unit other than the structural units represented by the formula (A1), the formula (B1), the formula (D1), the formula (D4), and the formula (D5) described above.
- the other structural unit is not particularly limited and may have a known structural unit.
- the weight average molecular weight (Mw) of the specific resin is preferably 1,000 or more, more preferably 1,000 to 200,000, and particularly preferably 1,000 to 100,000.
- the ethylenically unsaturated valency of the specific resin is preferably 0.01 mmol/g to 2.5 mmol/g, and more preferably 0.05 mmol/g to, from the viewpoint of deep-curing property, pattern shape, and substrate adhesion. It is more preferably 2.3 mmol/g, still more preferably 0.1 mmol/g to 2.2 mmol/g, and particularly preferably 0.1 mmol/g to 2.0 mmol/g.
- the ethylenically unsaturated valency of the specific resin represents the molar amount of the ethylenically unsaturated group per 1 g of the solid content of the specific resin, and is measured by the method described in Examples.
- the acid value of the specific resin is preferably 30 to 110 mgKOH/g, and more preferably 40 to 90 mgKOH/g.
- the acid value is measured by the method described in Examples.
- the amine value of the specific resin is preferably 0.03 to 0.8 mmol/g, and more preferably 0.1 to 0.5 mmol/g from the viewpoint of adhesion to the support.
- the amine value is measured by the method described in Examples.
- the curable composition may contain one specific resin or two or more specific resins.
- the content of the specific resin is preferably 10 to 45% by mass and 12 to 40% by mass based on the total solid content of the curable composition from the viewpoints of adhesion to a support and storage stability. % Is more preferable, and 14 to 35% by mass is particularly preferable.
- the content of the specific resin is preferably 20 to 60 parts by mass, and 22 to 55 parts by mass with respect to 100 parts by mass of the pigment content from the viewpoints of adhesion to a support and storage stability. It is more preferably part by mass, and particularly preferably 24 to 50 parts by mass.
- the method for synthesizing the specific resin is not particularly limited, and known methods and known methods can be applied to synthesize.
- the constitutional unit represented by the above formula (A1) is introduced by a reaction of a carboxy group contained in the precursor of the specific resin, an amine compound, a compound having an epoxy group and an acryloyl group, or the like.
- constitutional unit represented by the above formula (A1) is introduced by the reaction of the amine compound contained in the precursor of the above-mentioned specific resin with the compound having a halogeno group and an acryloyl group.
- the constitutional unit represented by the above formula (B1) is introduced by the reaction of the amino group contained in the precursor of the above-mentioned specific resin with the compound having an epoxy group and an acryloyl group.
- the constitutional unit represented by the above formula (B1) is introduced by the reaction of the amino group contained in the precursor of the above-mentioned specific resin with the compound having a halogeno group and an acryloyl group.
- the structural unit represented by the formula (D1) is a reaction between a carboxy group contained in the precursor of the specific resin and a compound having an epoxy group and an acryloyl group, and a hydroxy group contained in the precursor of the specific resin.
- These synthesizing methods are merely examples, and the synthesizing method of the specific resin is not particularly limited. Further, when the specific resin is a star-shaped polymer compound or a star-shaped polymer compound having a specific terminal group, these polymer compounds are referred to, for example, the synthesis method described in JP-A-2007-277514. Can be synthesized.
- the specific resin is composed of different structural units such as a structural unit responsible for developability, a structural unit responsible for dispersibility, a structural unit responsible for curability, and the like, in order to effectively exhibit different functions
- the composition of the specific resin is preferably uniform.
- a method for homogenizing the composition of the specific resin for example, a method of dropping a monomer into the reaction system so as to match consumption rates of different monomer species can be mentioned.
- it is possible to match the reaction rate by increasing the initial concentration of the monomer species with slow consumption rate in the reaction system and dropping the monomer species with high consumption rate to create a concentration difference in the reaction system. Is.
- Specific examples of the specific resin in the present invention include PA-1 to PA-22 and PB-1 to PB-18 in Examples described later.
- the content of the specific resin in the total solid content of the curable composition is preferably 5 to 50% by mass.
- the lower limit is preferably 8% by mass or more, and more preferably 10% by mass or more.
- the upper limit is preferably 40% by mass or less, more preferably 35% by mass or less, and further preferably 30% by mass or less.
- the content of the specific resin having an acid group in the total solid content of the curable composition is preferably 5 to 50% by mass.
- the lower limit is preferably 10% by mass or more, more preferably 15% by mass or more.
- the upper limit is preferably 40% by mass or less, more preferably 35% by mass or less, and further preferably 30% by mass or less.
- the total content of the polymerizable compound and the specific resin described later in the total solid content of the curable composition is preferably 10 to 65% by mass from the viewpoint of curability, developability and film forming property.
- the lower limit is preferably 15% by mass or more, more preferably 20% by mass or more, and further preferably 30% by mass or more.
- the upper limit is preferably 60% by mass or less, more preferably 50% by mass or less, and further preferably 40% by mass or less. Further, it is preferable to contain 30 to 300 parts by mass of the specific resin with respect to 100 parts by mass of the polymerizable compound.
- the lower limit is preferably 50 parts by mass or more, and more preferably 80 parts by mass or more.
- the upper limit is preferably 250 parts by mass or less, more preferably 200 parts by mass or less.
- the curable composition of the present invention preferably contains a polymerizable compound.
- the compound corresponding to the above-mentioned specific resin does not correspond to the polymerizable compound.
- the polymerizable compound a known compound that can be crosslinked by a radical, an acid or heat can be used.
- the polymerizable compound is preferably a compound having an ethylenically unsaturated group, for example. Examples of the ethylenically unsaturated group include a vinyl group, a (meth)allyl group and a (meth)acryloyl group.
- the polymerizable compound used in the present invention is preferably a radical polymerizable compound.
- the polymerizable compound may be in any chemical form such as a monomer, a prepolymer or an oligomer, but a monomer is preferable.
- the molecular weight of the polymerizable compound is preferably 100 to 3,000.
- the upper limit is more preferably 2,000 or less, still more preferably 1,500 or less.
- the lower limit is more preferably 150 or more, further preferably 250 or more.
- the polymerizable compound is preferably a compound containing 3 or more ethylenically unsaturated groups, more preferably a compound containing 3 to 15 ethylenically unsaturated groups, and 3 to 6 ethylenically unsaturated groups. It is more preferable that the compound contains a single compound. Further, the polymerizable compound is preferably a 3- to 15-functional (meth)acrylate compound, and more preferably a 3- to 6-functional (meth)acrylate compound.
- polymerizable compound examples include paragraph numbers 0095 to 0108 in JP 2009-288705 A, paragraph 0227 in JP 2013-029760 A, paragraphs 0254 to 0257 in JP 2008-292970 A, and JP Compounds described in paragraphs 0034 to 0038 of 2013-253224, paragraphs 0477 of JP2012-208494A, JP2017-048367A, JP60557891A, and JP6031807A are disclosed. And their contents are incorporated herein.
- Polymerizable compounds include dipentaerythritol triacrylate (commercially available KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetraacrylate (commercially available KAYARAD D-320; Nippon Kayaku Co., Ltd.) )), dipentaerythritol penta(meth)acrylate (commercially available KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa(meth)acrylate (commercially available KAYARAD DPHA; Nippon Kayaku) Co., Ltd., NK ester A-DPH-12E; Shin-Nakamura Chemical Co., Ltd., and a structure in which these (meth)acryloyl groups are bonded via ethylene glycol and/or propylene glycol residues.
- SR454, SR499 commercially available from Sartomer
- diglycerin EO (ethylene oxide) modified (meth)acrylate M-460 as a commercial product; manufactured by Toagosei Co., Ltd.
- pentaerythritol tetraacrylate manufactured by Shin-Nakamura Chemical Co., Ltd.
- NK ester A-TMMT 1,6-hexanediol diacrylate
- RP-1040 Nippon Kayaku Co., Ltd.
- Aronix TO-2349 Toagosei Co., Ltd.)
- NK oligo UA-7200 manufactured by Shin-Nakamura Chemical Co., Ltd.
- 8UH-1006, 8UH-1012 manufactured by Taisei Fine Chemical Co., Ltd.
- trimethylolpropane tri(meth)acrylate trimethylolpropane propyleneoxy modified tri(meth)acrylate, trimethylolpropane ethyleneoxy modified tri(meth)acrylate, isocyanuric acid ethyleneoxy modified tri(meth)acrylate.
- a trifunctional (meth)acrylate compound such as pentaerythritol tri(meth)acrylate.
- Commercially available trifunctional (meth)acrylate compounds include Aronix M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306, M-305.
- M-303, M-452, M-450 manufactured by Toagosei Co., Ltd.
- a compound having an acid group can also be used as the polymerizable compound.
- the polymerizable compound having an acid group By using the polymerizable compound having an acid group, it is possible to easily remove the polymerizable compound in the unexposed portion during development of the film formed from the curable composition, and to suppress the development residue.
- the acid group include a carboxy group, a sulfo group, a phosphoric acid group and the like, and a carboxy group is preferable.
- Examples of commercially available polymerizable compounds having an acid group include Aronix M-510, M-520, Aronix TO-2349 (manufactured by Toagosei Co., Ltd.) and the like.
- the acid value of the polymerizable compound having an acid group is preferably 0.1 to 40 mgKOH/g, more preferably 5 to 30 mgKOH/g.
- the acid value of the polymerizable compound is 0.1 mgKOH/g or more, the solubility of the film in the developing solution is good, and when it is 40 mgKOH/g or less, it is advantageous in production and handling.
- the polymerizable compound is a compound having a caprolactone structure.
- the polymerizable compound having a caprolactone structure is commercially available from Nippon Kayaku Co., Ltd. as KAYARAD DPCA series, and examples thereof include DPCA-20, DPCA-30, DPCA-60 and DPCA-120.
- a polymerizable compound having an alkyleneoxy group can also be used.
- the polymerizable compound having an alkyleneoxy group is preferably a polymerizable compound having an ethyleneoxy group and/or a propyleneoxy group, more preferably a polymerizable compound having an ethyleneoxy group, and 3 to 4 having 4 to 20 ethyleneoxy groups.
- Hexafunctional (meth)acrylate compounds are more preferred.
- Examples of commercially available polymerizable compounds having an alkyleneoxy group include SR-494, which is a tetrafunctional (meth)acrylate having four ethyleneoxy groups manufactured by Sartomer, and trifunctional (meth) having three isobutyleneoxy groups. Examples include acrylate KAYARAD TPA-330.
- the polymerizable compound may be a polymerizable compound having a fluorene skeleton.
- Examples of commercially available polymerizable compounds having a fluorene skeleton include Ogsol EA-0200 and EA-0300 (Osaka Gas Chemical Co., Ltd. (meth)acrylate monomer having a fluorene skeleton).
- the polymerizable compound it is also preferable to use a compound that does not substantially contain an environmentally regulated substance such as toluene.
- an environmentally regulated substance such as toluene.
- Commercially available products of such compounds include KAYARAD DPHA LT, KAYARAD DPEA-12LT (manufactured by Nippon Kayaku Co., Ltd.) and the like.
- Examples of the polymerizable compound include urethane acrylates such as those described in JP-B-48-041708, JP-A-51-037193, JP-B-02-032293, and JP-B-02-016765.
- Urethane compounds having an ethylene oxide skeleton described in JP-B-58-049860, JP-B-56-017654, JP-B-62-039417 and JP-B-62-039418 are also suitable. It is also preferable to use the polymerizable compounds described in JP-A-63-277653, JP-A-63-260909 and JP-A-01-105238, which have an amino structure or a sulfide structure in the molecule.
- UA-7200 manufactured by Shin-Nakamura Chemical Co., Ltd.
- DPHA-40H manufactured by Nippon Kayaku Co., Ltd.
- UA-306H, UA-306T, UA-306I, AH-600. , T-600, AI-600, LINC-202UA manufactured by Kyoeisha Chemical Co., Ltd. or the like may be used.
- the content of the polymerizable compound in the total solid content of the curable composition is preferably 0.1 to 50% by mass.
- the lower limit is more preferably 0.5% by mass or more, still more preferably 1% by mass or more.
- the upper limit is more preferably 45% by mass or less, further preferably 40% by mass or less.
- the polymerizable compounds may be used alone or in combination of two or more. When two or more kinds are used in combination, it is preferable that the total of them be in the above range.
- the curable composition of the present invention preferably contains a photopolymerization initiator.
- the photopolymerization initiator is not particularly limited and can be appropriately selected from known photopolymerization initiators. For example, compounds having photosensitivity to light rays in the ultraviolet region to the visible region are preferable.
- the photopolymerization initiator is preferably a photoradical polymerization initiator.
- a halogenated hydrocarbon derivative for example, a compound having a triazine skeleton, a compound having an oxadiazole skeleton
- an acylphosphine compound for example, a compound having a triazine skeleton, a compound having an oxadiazole skeleton
- an acylphosphine compound for example, a compound having a triazine skeleton, a compound having an oxadiazole skeleton
- an acylphosphine compound for example, a compound having a triazine skeleton, a compound having an oxadiazole skeleton
- an acylphosphine compound for example, a compound having a triazine skeleton, a compound having an oxadiazole skeleton
- an acylphosphine compound for example, a compound having a triazine skeleton, a compound having an oxadiazole skeleton
- the photopolymerization initiator is a trihalomethyltriazine compound, a benzyldimethylketal compound, an ⁇ -hydroxyketone compound, an ⁇ -aminoketone compound, an acylphosphine compound, a phosphine oxide compound, a metallocene compound, an oxime compound, a triarylimidazole.
- a dimer, an onium compound, a benzothiazole compound, a benzophenone compound, an acetophenone compound, a cyclopentadiene-benzene-iron complex, a halomethyloxadiazole compound and a 3-aryl-substituted coumarin compound are preferable, and an oxime compound and an ⁇ -hydroxyketone compound are preferable.
- a compound selected from the group consisting of an ⁇ -aminoketone compound and an acylphosphine compound is more preferable, and an oxime compound is more preferable from the viewpoint of easily obtaining the effects of the present invention.
- the descriptions in paragraphs 0065 to 0111 and JP 6301489 of JP-A-2014-130173 can be referred to, and the contents thereof are incorporated in the present specification.
- Examples of commercially available ⁇ -hydroxyketone compounds include IRGACURE-184, DAROCUR-1173, IRGACURE-500, IRGACURE-2959, and IRGACURE-127 (all manufactured by BASF).
- Commercially available ⁇ -aminoketone compounds include IRGACURE-907, IRGACURE-369, IRGACURE-379, and IRGACURE-379EG (all manufactured by BASF).
- Commercially available acylphosphine compounds include IRGACURE-819, DAROCUR-TPO (above, manufactured by BASF) and the like.
- Examples of the oxime compound include the compounds described in JP 2001-233842 A, the compounds described in JP 2000-080068 A, the compounds described in JP 2006-342166 A, the compounds described in J. C. S. Perkin II (1979, pp. 1653-1660), the compound described in J. C. S. The compound described in Perkin II (1979, pp.156-162), the compound described in Journal of Photopolymer Science and Technology (1995, pp.202-232), the compound described in Japanese Patent Laid-Open No.
- oxime compound examples include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, and 2-ethoxycarbonyloxy Examples thereof include imino-1-phenylpropan-1-one.
- IRGACURE OXE01, IRGACURE OXE02, IRGACURE OXE03, IRGACURE OXE04 (above, manufactured by BASF), TR-PBG-304 (manufactured by Changzhou Power Electronics New Material Co., Ltd.), ADEKA OPTOMER N-1919 ((stock))
- the photopolymerization initiator 2) described in JP 2012-014052 manufactured by ADEKA can be used.
- the oxime compound it is also preferable to use a compound having low colorability or a compound having high transparency and being resistant to discoloration. Examples of commercially available products include ADEKA ARKUL'S NCI-730, NCI-831, NCI-930 (above, manufactured by ADEKA Corporation).
- an oxime compound having a fluorene ring can be used as the photopolymerization initiator.
- Specific examples of the oxime compound having a fluorene ring include the compounds described in JP-A-2014-137466. This content is incorporated herein.
- an oxime compound having a fluorine atom can be used as the photopolymerization initiator.
- Specific examples of the oxime compound having a fluorine atom are described in JP 2010-262028 A, compounds 24, 36 to 40 described in JP-A-2014-500852, and JP 2013-164471 A. Compound (C-3) and the like. These contents are incorporated herein.
- an oxime compound having a nitro group can be used as the photopolymerization initiator.
- the oxime compound having a nitro group is also preferably a dimer.
- Specific examples of the oxime compound having a nitro group include compounds described in paragraphs 0031 to 0047 of JP2013-114249A, paragraphs 0008 to 0012 and 0070 to 0079 of JP2014-137466A.
- the compounds described in paragraph Nos. 0007 to 0025 of Japanese Patent No. 4223071, ADEKA ARKUL'S NCI-831 (manufactured by ADEKA Corporation) can be mentioned.
- an oxime compound having a benzofuran skeleton can be used as the photopolymerization initiator.
- Specific examples thereof include OE-01 to OE-75 described in WO 2015/036910.
- oxime compounds preferably used in the present invention are shown below, but the present invention is not limited thereto.
- the photopolymerization initiator used in the present invention is preferably a compound having a maximum absorption wavelength in the wavelength range of 350 to 500 nm, more preferably a compound having a maximum absorption wavelength in the wavelength range of 360 to 480 nm.
- the molar extinction coefficient at a wavelength of 365 nm of the photopolymerization initiator used in the present invention is preferably 1,000 L ⁇ mol ⁇ 1 ⁇ cm ⁇ 1 or more from the viewpoint that the effect of the present invention can be more easily obtained. It is more preferably 3,000 L ⁇ mol ⁇ 1 ⁇ cm ⁇ 1 or more, further preferably 5,000 L ⁇ mol ⁇ 1 ⁇ cm ⁇ 1 or more.
- the maximum value is not particularly limited, it is preferably 100,000 L ⁇ mol ⁇ 1 ⁇ cm ⁇ 1 or less.
- the molar extinction coefficient of the photopolymerization initiator can be measured using a known method. For example, it is preferable to perform measurement with a spectrophotometer (Cary-5 spectrophotometer manufactured by Varian) using an ethyl acetate solvent at a concentration of 0.01 g/L.
- a bifunctional or trifunctional or higher functional photoradical polymerization initiator may be used as the photopolymerization initiator.
- a photo-radical polymerization initiator two or more radicals are generated from one molecule of the photo-radical polymerization initiator, so that good sensitivity can be obtained.
- the crystallinity is reduced and the solubility in a solvent or the like is improved, and it becomes difficult to deposit over time, and the stability over time of the curable composition can be improved. it can.
- Specific examples of the bifunctional or trifunctional or higher functional photoradical polymerization initiators include those disclosed in Japanese Patent Publication No. 2010-527339, Japanese Patent Publication No.
- the content of the photopolymerization initiator in the total solid content of the curable composition of the present invention is preferably 0.1 to 30% by mass.
- the lower limit is preferably 0.5% by mass or more, and more preferably 1% by mass or more.
- the upper limit is preferably 20% by mass or less, and more preferably 15% by mass or less.
- the photopolymerization initiator may be used alone or in combination of two or more. When two or more kinds are used, the total amount thereof is preferably within the above range.
- the curable composition of the present invention may further contain other resins.
- the compound corresponding to the above-mentioned specific resin does not correspond to any other resin.
- Other resins are mixed, for example, for the purpose of dispersing particles such as pigments in the curable composition or for the purpose of binder.
- such applications of other resins are examples, and the resins may be used for purposes other than such applications.
- the weight average molecular weight (Mw) of other resins is preferably 3,000 to 2,000,000.
- the upper limit is preferably 1,000,000 or less, more preferably 500,000 or less.
- the lower limit is preferably 4,000 or more, more preferably 5,000 or more.
- resins include (meth)acrylic resins, ene/thiol resins, polycarbonate resins, polyether resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyphenylene resins, polyarylene ether phosphine oxide resins, polyimide resins, polyamides.
- Examples thereof include imide resin, polyolefin resin, cyclic olefin resin, polyester resin and styrene resin.
- One of these resins may be used alone, or two or more thereof may be mixed and used. Further, the resins described in paragraphs 0041 to 0060 of JP-A-2017-206689 and the resins described in paragraphs 0022 to 0071 of JP-A-2018-010856 can also be used.
- the curable composition of the present invention preferably contains a resin having an acid group as another resin. According to this aspect, the developability of the curable composition can be improved, and pixels having excellent rectangularity can be easily formed.
- the acid group include a carboxy group, a phosphoric acid group, a sulfo group and a phenolic hydroxy group, and a carboxy group is preferable.
- the resin having an acid group can be used as, for example, an alkali-soluble resin.
- the resin having an acid group preferably contains a structural unit having an acid group in its side chain, and more preferably contains 5 to 70 mol% of a structural unit having an acid group in its side chain in the total structural units of the resin.
- the upper limit of the content of the structural unit having an acid group in its side chain is preferably 50 mol% or less, more preferably 30 mol% or less.
- the lower limit of the content of the constituent unit having an acid group in its side chain is preferably 10 mol% or more, more preferably 20 mol% or more. In the present specification, when the content of the constituent unit is described in mol %, the constituent unit is synonymous with the monomer unit.
- the resin having an acid group is a monomer containing a compound represented by the following formula (ED1) and/or a compound represented by the following formula (ED2) (hereinafter, these compounds may be referred to as “ether dimer”). It is also preferable to include a structural unit derived from the component.
- R 1 and R 2 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms which may have a substituent.
- R represents a hydrogen atom or an organic group having 1 to 30 carbon atoms.
- the resin used in the present invention also preferably contains a structural unit derived from a compound represented by the following formula (X).
- R 1 represents a hydrogen atom or a methyl group
- R 2 represents an alkylene group having 2 to 10 carbon atoms
- R 3 represents a hydrogen atom or 1 to 20 carbon atoms which may contain a benzene ring.
- n represents an integer of 1 to 15.
- JP-A 2012-208494 paragraphs 0558 to 0571 (corresponding US Patent Application Publication No. 2012/0235099, paragraphs 0685 to 0700), JP-A-2012-198408.
- the description of paragraph numbers 0076 to 0099 of the publication can be referred to, and the contents thereof are incorporated in the present specification.
- a commercially available product may be used as the resin having an acid group.
- the acid value of the resin having an acid group is preferably 30 to 500 mgKOH/g.
- the lower limit is preferably 50 mgKOH/g or more, more preferably 70 mgKOH/g or more.
- the upper limit is preferably 400 mgKOH/g or less, more preferably 300 mgKOH/g or less, and further preferably 200 mgKOH/g or less.
- the weight average molecular weight (Mw) of the resin having an acid group is preferably 5,000 to 100,000.
- the number average molecular weight (Mn) of the resin having an acid group is preferably 1,000 to 20,000.
- Examples of the resin having an acid group include resins having the following structures. In the structure below, the subscripts in parentheses represent the content (mol %) of each structural unit.
- the curable composition of the present invention can also contain a resin as a dispersant.
- the dispersant include an acidic dispersant (acidic resin) and a basic dispersant (basic resin).
- the acidic dispersant (acidic resin) represents a resin in which the amount of acid groups is larger than the amount of basic groups.
- the acidic dispersant (acidic resin) is preferably a resin in which the amount of acid groups accounts for 70 mol% or more when the total amount of acid groups and basic groups is 100 mol %, and the acid dispersant is substantially acid.
- a resin consisting of only a group is more preferable.
- the acid group contained in the acidic dispersant (acidic resin) is preferably a carboxy group.
- the acid value of the acidic dispersant is preferably 20 to 180 mgKOH/g, more preferably 30 to 150 mgKOH/g, further preferably 50 to 100 mgKOH/g.
- the basic dispersant represents a resin in which the amount of basic groups is larger than the amount of acid groups.
- the basic dispersant is preferably a resin in which the amount of basic groups exceeds 50 mol% when the total amount of acid groups and basic groups is 100 mol %.
- the basic group contained in the basic dispersant is preferably an amino group.
- the resin used as the dispersant preferably contains a structural unit having an acid group.
- the resin used as the dispersant contains the structural unit having an acid group, generation of a development residue can be further suppressed when forming a pattern by the photolithography method.
- the resin used as the dispersant is also preferably a graft resin.
- graft resin the description in paragraphs 0025 to 0094 of JP 2012-255128 A can be referred to, and the contents thereof are incorporated in the present specification.
- the resin used as the dispersant is a polyimine dispersant containing a nitrogen atom in at least one of the main chain and the side chain.
- the polyimine-based dispersant has a main chain having a partial structure having a functional group of pKa14 or less and a side chain having 40 to 10,000 atoms, and at least one of the main chain and the side chain has a basic nitrogen atom. Resins having atoms are preferred.
- the basic nitrogen atom is not particularly limited as long as it is a nitrogen atom that exhibits basicity.
- the description in paragraph numbers 0102 to 0166 of JP 2012-255128 A can be referred to, and the contents thereof are incorporated in the present specification.
- the resin used as the dispersant has a structure in which a plurality of polymer chains are bonded to the core part.
- a resin include dendrimers (including star polymers).
- specific examples of the dendrimer include polymer compounds C-1 to C-31 described in paragraph Nos. 0196 to 0209 of JP-A-2013-043962.
- the above-mentioned resin having an acid group (alkali-soluble resin) can be used as a dispersant.
- the resin used as the dispersant is also preferably a resin containing a structural unit having an ethylenically unsaturated group in its side chain.
- the content of the constituent unit having an ethylenically unsaturated group in its side chain is preferably 10 mol% or more, more preferably 10 to 80 mol%, and more preferably 20 to 70 mol% in the total constituent units of the resin. Is more preferable.
- the dispersant is also available as a commercial product, and specific examples thereof include the DISPERBYK series manufactured by BYK Chemie (for example, DISPERBYK-111 and 161, etc.), the Sols Perth series manufactured by Nippon Lubrizol Co., Ltd. For example, Solsperse 76500 etc.) and the like. Further, the pigment dispersant described in paragraph Nos. 0041 to 0130 of JP-A-2014-130338 can also be used, and the contents thereof are incorporated in the present specification.
- the resin described as the dispersant can be used for purposes other than the dispersant. For example, it can be used as a binder.
- a resin having a curable group is also suitably exemplified.
- the curable group in the dispersant is preferably an ethylenically unsaturated group, selected from the group consisting of vinyl group, vinylphenyl group, allyl group, (meth)acryloyl group, (meth)acrylamide group, and maleimide group. At least one kind is more preferable, a (meth)acryloyl group is further preferable, and an acryloyl group is particularly preferable.
- the resin having a curable group preferably has a curable group in its side chain, and also preferably has a curable group at the molecular end of the side chain.
- the weight average molecular weight of the dispersant is preferably 10,000 to 100,000.
- the resin having a curable group include resins containing a constitutional unit represented by the above formula (D1), and a constitutional unit represented by the above formula (D1) and a formula (D4) described above. And a structural unit represented by the above formula (D5), and a resin containing at least one selected from the group consisting of the structural units represented by the above formula (D5).
- the resin containing the structural unit represented by the formula (D4) and the structural unit represented by the above formula (D5) is more preferable.
- the resin having a curable group is a resin that does not satisfy both the conditions 1 and 2 described above.
- the content of the other resin in the total solid content of the curable composition is preferably 0.5 to 50% by mass.
- the lower limit is preferably 1% by mass or more, and more preferably 2% by mass or more.
- the upper limit is preferably 40% by mass or less, more preferably 35% by mass or less, and further preferably 30% by mass or less.
- the content of the resin having an acid group in the total solid content of the curable composition is preferably 0.5 to 50% by mass.
- the lower limit is preferably 1% by mass or more, and more preferably 2% by mass or more.
- the upper limit is preferably 40% by mass or less, more preferably 35% by mass or less, and further preferably 30% by mass or less.
- the curable composition of the present invention can contain a compound having a cyclic ether group.
- the cyclic ether group include an epoxy group and an oxetanyl group.
- the compound having a cyclic ether group is preferably a compound having an epoxy group.
- the compound having an epoxy group include compounds having one or more epoxy groups in one molecule, and compounds having two or more epoxy groups are preferable. It is preferable to have 1 to 100 epoxy groups in one molecule.
- the upper limit of the number of epoxy groups may be, for example, 10 or less, or 5 or less.
- the lower limit of the number of epoxy groups is preferably 2 or more.
- the compound having an epoxy group may be a low molecular weight compound (for example, a molecular weight of less than 2000, and further, a molecular weight of less than 1,000), or a macromolecular compound (for example, a molecular weight of 1,000 or more, in the case of a polymer, The weight average molecular weight may be 1,000 or more).
- the weight average molecular weight of the compound having an epoxy group is preferably 200 to 100,000, more preferably 500 to 50,000.
- the upper limit of the weight average molecular weight is preferably 10,000 or less, more preferably 5,000 or less, still more preferably 3,000 or less.
- An epoxy resin can be preferably used as the compound having an epoxy group.
- the epoxy resin include an epoxy resin which is a glycidyl ether compound of a phenol compound, an epoxy resin which is a glycidyl ether compound of various novolak resins, an alicyclic epoxy resin, an aliphatic epoxy resin, a heterocyclic epoxy resin, a glycidyl ester system.
- the epoxy equivalent of the epoxy resin is preferably 310 to 3,300 g/eq, more preferably 310 to 1,700 g/eq, and further preferably 310 to 1,000 g/eq.
- Examples of commercially available compounds having a cyclic ether group include EHPE3150 (manufactured by Daicel Corporation), EPICLON N-695 (manufactured by DIC Corporation), Marproof G-0150M, G-0105SA, G-0130SP, G -0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, G-01758 (these are NOF Corporation's epoxy group-containing polymers).
- the content of the compound having a cyclic ether group in the total solid content of the curable composition is preferably 0.1 to 20% by mass.
- the lower limit is, for example, preferably 0.5% by mass or more, more preferably 1% by mass or more.
- the upper limit is, for example, preferably 15% by mass or less, more preferably 10% by mass or less.
- the compound having a cyclic ether group may be only one kind or two or more kinds. When two or more kinds are used, the total amount thereof is preferably within the above range.
- the curable composition of the present invention can contain a silane coupling agent.
- the adhesion of the obtained film to the support can be further improved.
- the silane coupling agent means a silane compound having a hydrolyzable group and a functional group other than that.
- the hydrolyzable group refers to a substituent which is directly bonded to a silicon atom and can form a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction. Examples of the hydrolyzable group include a halogen atom, an alkoxy group, an acyloxy group and the like, and an alkoxy group is preferable.
- the silane coupling agent is preferably a compound having an alkoxysilyl group.
- functional groups other than hydrolyzable groups include vinyl group, (meth)allyl group, (meth)acryloyl group, mercapto group, epoxy group, oxetanyl group, amino group, ureido group, sulfide group, and isocyanate group.
- a phenyl group and the like, and an amino group, a (meth)acryloyl group and an epoxy group are preferable.
- Specific examples of the silane coupling agent include compounds described in JP-A 2009-288703, paragraphs 0018 to 0036, and JP-A 2009-242604, paragraphs 0056 to 0066. Are incorporated herein by reference.
- the content of the silane coupling agent in the total solid content of the curable composition is preferably 0.1 to 5% by mass.
- the upper limit is preferably 3% by mass or less, and more preferably 2% by mass or less.
- the lower limit is preferably 0.5% by mass or more, and more preferably 1% by mass or more.
- the silane coupling agent may be only one kind or two or more kinds. When two or more kinds are used, the total amount is preferably within the above range.
- the curable composition of the present invention may contain a solvent.
- the solvent include organic solvents.
- the solvent is basically not particularly limited as long as the solubility of each component and the coatability of the curable composition are satisfied.
- the organic solvent include ester solvents, ketone solvents, alcohol solvents, amide solvents, ether solvents, hydrocarbon solvents and the like. For details of these, reference can be made to paragraph No. 0223 of WO 2015/166779, the content of which is incorporated herein. Further, an ester solvent substituted with a cyclic alkyl group and a ketone solvent substituted with a cyclic alkyl group can also be preferably used.
- organic solvent examples include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate and methyl 3-methoxypropionate.
- a solvent having a low metal content it is preferable to use a solvent having a low metal content, and the metal content of the solvent is preferably, for example, 10 mass ppb (parts per billion) or less. If necessary, a solvent having a mass ppt (parts per trillion) level may be used, and such a high-purity solvent is provided by, for example, Toyo Gosei Co., Ltd. (Chemical Industry Daily, November 13, 2015).
- the filter pore size of the filter used for filtration is preferably 10 ⁇ m or less, more preferably 5 ⁇ m or less, still more preferably 3 ⁇ m or less.
- the material of the filter is preferably polytetrafluoroethylene, polyethylene or nylon.
- the solvent may contain isomers (compounds having the same number of atoms but different structures). Moreover, as for the isomer, only 1 type may be contained and 2 or more types may be contained.
- the content of peroxide in the organic solvent is preferably 0.8 mmol/L or less, and more preferably substantially free of peroxide.
- the content of the solvent in the curable composition is preferably 10 to 95% by mass, more preferably 20 to 90% by mass, and further preferably 30 to 90% by mass.
- the curable composition of the present invention does not substantially contain an environmentally controlled substance from the viewpoint of environmental regulation.
- the phrase “substantially free of environmentally controlled substances” means that the content of environmentally controlled substances in the curable composition is 50 mass ppm or less, and may be 30 mass ppm or less. It is more preferably 10 mass ppm or less, still more preferably 1 mass ppm or less.
- the environmentally controlled substance include benzene; alkylbenzenes such as toluene and xylene; halogenated benzenes such as chlorobenzene.
- a method of reducing the environmentally controlled substance there is a method of heating or depressurizing the system to a temperature equal to or higher than the boiling point of the environmentally controlled substance and distilling the environmentally controlled substance from the system to reduce the amount. Further, in the case of distilling off a small amount of environmentally regulated substances, it is also useful to azeotropically distill with a solvent having a boiling point equivalent to that of the corresponding solvent in order to improve efficiency. Further, when containing a compound having a radical polymerizable property, a polymerization inhibitor or the like is added and distilled under reduced pressure in order to suppress radical polymerization reaction and intermolecular crosslinking during the distillation under reduced pressure. May be.
- These distillation methods include the steps of the raw material, the reaction product of the raw material (for example, a resin solution or a polyfunctional monomer solution after polymerization), or a curable composition prepared by mixing these compounds. It is possible at any stage.
- the curable composition of the present invention may contain a polymerization inhibitor.
- the polymerization inhibitor include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4′-thiobis(3-methyl-6-tert-butylphenol), 2,2′-methylenebis(4-methyl-6-t-butylphenol), N-nitrosophenylhydroxylamine salt (ammonium salt, ceric salt, etc.) can be mentioned. Of these, p-methoxyphenol is preferable.
- the content of the polymerization inhibitor in the total solid content of the curable composition is preferably 0.0001 to 5% by mass.
- the curable composition of the present invention can contain a surfactant.
- a surfactant various surfactants such as a fluorine-based surfactant, a nonionic-based surfactant, a cationic-based surfactant, an anionic-based surfactant, and a silicone-based surfactant can be used.
- the paragraph numbers 0238 to 0245 of WO 2015/166779 can be referred to, and the contents thereof are incorporated herein.
- the surfactant is preferably a fluorinated surfactant.
- a fluorinated surfactant By containing a fluorine-based surfactant in the curable composition, liquid characteristics (particularly, fluidity) can be further improved, and liquid saving can be further improved. It is also possible to form a film having a small thickness unevenness.
- the fluorine content in the fluorine-based surfactant is preferably 3 to 40% by mass, more preferably 5 to 30% by mass, and particularly preferably 7 to 25% by mass.
- a fluorine-based surfactant having a fluorine content within this range is effective in terms of uniformity of the thickness of the coating film and liquid saving, and also has good solubility in the curable composition.
- fluorinated surfactant examples include the surfactants described in JP-A-2014-041318, paragraphs 0060 to 0064 (corresponding to WO 2014/017669, paragraphs 0060 to 0064), and JP-A-2011-2011. Examples thereof include the surfactants described in paragraph numbers 0117 to 0132 of Japanese Patent No. 132503, the contents of which are incorporated herein. Examples of commercially available fluorine-based surfactants include Megafac F171, F172, F173, F176, F177, F141, F142, F143, F144, R30, F437, F475, F479, F482, F554, F780, EXP and MFS.
- the fluorine-based surfactant has an acrylic compound having a molecular structure having a functional group containing a fluorine atom, and when heat is applied, the portion of the functional group containing the fluorine atom is cleaved to volatilize the fluorine atom. It can be preferably used.
- a fluorinated surfactant include Megafac DS series manufactured by DIC Corporation (Chemical Industry Daily, February 22, 2016) (Nikkei Sangyo Shimbun, February 23, 2016), for example, Megafac DS. -21 is included.
- the fluorine-based surfactant it is also preferable to use a polymer of a fluorine atom-containing vinyl ether compound having a fluorinated alkyl group or a fluorinated alkylene ether group and a hydrophilic vinyl ether compound.
- a fluorine-based surfactant the description in JP-A-2016-216602 can be referred to, and the contents thereof are incorporated in the present specification.
- a block polymer can also be used as the fluorine-based surfactant.
- the fluorosurfactant has a structural unit derived from a (meth)acrylate compound having a fluorine atom and 2 or more (preferably 5 or more) alkyleneoxy groups (preferably ethyleneoxy groups and propyleneoxy groups) (meth).
- a fluorine-containing polymer compound containing a structural unit derived from an acrylate compound can also be preferably used.
- the following compounds are also exemplified as the fluorine-based surfactant used in the present invention.
- the weight average molecular weight of the above compound is preferably 3,000 to 50,000, for example, 14,000. In the above compounds,% indicating the ratio of the constituent units is mol %.
- a fluorine-based surfactant a fluorine-containing polymer having an ethylenically unsaturated group in its side chain can be used.
- the compounds described in JP-A-2010-164965, paragraph numbers 0050 to 0090 and paragraph numbers 0289 to 0295 such as Megafac RS-101, RS-102, and RS-718K manufactured by DIC Corporation. , RS-72-K and the like.
- the fluorine-based surfactant compounds described in paragraph numbers 0015 to 0158 of JP-A-2005-117327 can also be used.
- Nonionic surfactants include glycerol, trimethylolpropane, trimethylolethane and their ethoxylates and propoxylates (eg, glycerolpropoxylate, glycerolethoxylate, etc.), polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, Polyoxyethylene oleyl ether, polyoxyethylene octyl phenyl ether, polyoxyethylene nonyl phenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitan fatty acid ester, Pluronic L10, L31, L61, L62, 10R5, 17R2, 25R2 (BASF Company), Tetronic 304, 701, 704, 901, 904, 150R1 (manufactured by BASF), Sols Perth 20000 (manufactured by Lubrizol Japan Ltd.), NCW-101, NCW-1001, NCW-1002 (Wako Pure Chemical Industries, Ltd.) Industrial
- silicone-based surfactant examples include Toray Silicone DC3PA, Toray Silicone SH7PA, Toray Silicone DC11PA, Toray Silicone SH21PA, Toray Silicone SH28PA, Toray Silicone SH29PA, Toray Silicone SH30PA, Toray Silicone SH8400 (above, Toray Dow Corning Co., Ltd. )), TSF-4440, TSF-4300, TSF-4445, TSF-4460, TSF-4452 (above, manufactured by Momentive Performance Materials, Inc.), KP-341, KF-6001, KF-6002 (above, Shin-Etsu Silicone Co., Ltd., BYK307, BYK323, BYK330 (above, manufactured by Big Chemie), and the like.
- the content of the surfactant in the total solid content of the curable composition is preferably 0.001 to 5.0% by mass, more preferably 0.005 to 3.0% by mass. Only 1 type may be sufficient as a surfactant and 2 or more types may be sufficient as it. When two or more kinds are used, the total amount is preferably within the above range.
- the curable composition of the present invention may contain a colorant other than the above-mentioned pigment.
- Other colorants include, for example, dyes.
- the dye is not particularly limited, and known dyes can be used.
- the dye may be a chromatic dye or a near infrared absorbing dye.
- chromatic dyes include pyrazole azo compounds, anilino azo compounds, triarylmethane compounds, anthraquinone compounds, anthrapyridone compounds, benzylidene compounds, oxonol compounds, pyrazolotriazole azo compounds, pyridone azo compounds, cyanine compounds, phenothiazine compounds, pyrrolopyrazole azomethine compounds. , Xanthene compounds, phthalocyanine compounds, benzopyran compounds, indigo compounds, and pyrromethene compounds.
- the thiazole compound described in JP 2012-158649 A, the azo compound described in JP 2011-18449 A, and the azo compound described in JP 2011-145540 A can also be used.
- the yellow dye quinophthalone compounds described in paragraphs 0011 to 0034 of JP2013-054339A, quinophthalone compounds described in paragraphs 0013 to 0058 of JP2014-026228A, and the like can be used.
- Examples of the near infrared absorbing dye include a pyrrolopyrrole compound, a rylene compound, an oxonol compound, a squarylium compound, a cyanine compound, a croconium compound, a phthalocyanine compound, a naphthalocyanine compound, a pyrylium compound, an azurenium compound, an indigo compound and a pyrromethene compound.
- the squarylium compound described in JP-A-2017-197437 the squarylium compound described in paragraphs 0090 to 0107 of WO2017/213047, and the paragraphs 0019 to 0075 of JP-A-2018-054760.
- Pyrrole ring-containing compounds Pyrrole ring-containing compounds described in paragraphs 0078 to 0082 of JP-A-2018-040955, Pyrrole ring-containing compounds described in paragraphs 0043 to 0069 of JP-A-2018-002773, JP-A-2018 -041047, paragraphs 0024 to 0086, a squarylium compound having an aromatic ring at the amide ⁇ -position; an amide-linked squarylium compound described in JP-A-2017-179131; and JP-A-2017-141215.
- a compound, a pyrrole ring-containing compound (carbazole type) described in JP-A-2017-067963, a phthalocyanine compound described in Japanese Patent No. 6251530 and the like can also be used.
- the curable composition of the present invention may contain a dye multimer as another colorant.
- the dye multimer is preferably a dye to be used by being dissolved in a solvent, but the dye multimer may form particles, and when the dye multimer is particles, it is usually in a state of being dispersed in a solvent. Used.
- the dye multimer in the form of particles can be obtained, for example, by emulsion polymerization, and specific examples thereof include the compounds and production methods described in JP-A-2015-214682.
- the dye multimer has two or more dye structures in one molecule, and preferably has three or more dye structures. The upper limit is not particularly limited, but can be 100 or less.
- the plurality of dye structures contained in one molecule may be the same dye structure or different dye structures.
- the weight average molecular weight (Mw) of the dye multimer is preferably 2,000 to 50,000.
- the lower limit is more preferably 3,000 or more, further preferably 6,000 or more.
- the upper limit is more preferably 30,000 or less, further preferably 20,000 or less.
- the dye multimers are described in JP2011-213925A, JP2013-041097A, JP2015-028144A, JP2015-030742A, WO2016/031442 and the like. Compounds can also be used.
- the content of the other colorant in the total solid content of the curable composition is preferably 1% by mass or more, and more preferably 5% by mass or more. It is preferably 10% by mass or more and particularly preferably.
- the upper limit is not particularly limited, but is preferably 70% by mass or less, more preferably 65% by mass or less, and further preferably 60% by mass or less. Further, the content of the other colorant is preferably 5 to 50 parts by mass with respect to 100 parts by mass of the pigment.
- the upper limit is preferably 45 parts by mass or less, and more preferably 40 parts by mass or less.
- the lower limit is preferably 10 parts by mass or more, and more preferably 15 parts by mass or more.
- the curable composition of the present invention may contain substantially no other coloring agent.
- the content of the other colorant in the total solid content of the curable composition of the present invention is 0.1% by mass or less. Is preferred, more preferably 0.05% by mass or less, and particularly preferably not contained.
- the curable composition of the present invention can contain an ultraviolet absorber.
- an ultraviolet absorber a conjugated diene compound, an aminodiene compound, a salicylate compound, a benzophenone compound, a benzotriazole compound, an acrylonitrile compound, a hydroxyphenyltriazine compound, an indole compound, a triazine compound or the like can be used.
- the ultraviolet absorber a conjugated diene compound, an aminodiene compound, a salicylate compound, a benzophenone compound, a benzotriazole compound, an acrylonitrile compound, a hydroxyphenyltriazine compound, an indole compound, a triazine compound or the like can be used.
- paragraphs 0052 to 0072 of JP2012-208374A paragraphs 0317 to 0334 of JP2013-068814A
- paragraphs 0061 to 0080 of JP2016-162946A Reference may be made to these contents, which are
- UV absorber examples include compounds having the following structures.
- examples of commercially available UV absorbers include UV-503 (manufactured by Daito Chemical Co., Ltd.).
- UV-503 manufactured by Daito Chemical Co., Ltd.
- examples of the benzotriazole compound include MYUA series manufactured by Miyoshi Oil & Fats (Chemical Industry Daily, February 1, 2016).
- the content of the ultraviolet absorber in the total solid content of the curable composition is preferably 0.01 to 10% by mass, more preferably 0.01 to 5% by mass.
- the ultraviolet absorber may be used alone or in combination of two or more. When two or more kinds are used, the total amount is preferably within the above range.
- the curable composition of the present invention may contain an antioxidant.
- the antioxidant include phenol compounds, phosphite ester compounds, thioether compounds and the like.
- the phenol compound any phenol compound known as a phenolic antioxidant can be used.
- Preferred phenol compounds include hindered phenol compounds.
- a compound having a substituent at the site (ortho position) adjacent to the phenolic hydroxy group is preferred.
- a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms is preferable.
- the antioxidant is also preferably a compound having a phenol group and a phosphite group in the same molecule.
- a phosphorus-based antioxidant can also be preferably used.
- phosphorus-based antioxidants include tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2]dioxaphosphepin-6 -Yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tert-butyldibenzo[d,f][1,3,2]dioxaphosphapin-2-yl )Oxy]ethyl]amine, ethylbisphosphite (2,4-di-tert-butyl-6-methylphenyl), and the like.
- antioxidants examples include Adekastab AO-20, Adekastab AO-30, Adekastab AO-40, Adekastab AO-50, Adekastab AO-50F, Adekastab AO-60, Adekastab AO-60G, Adekastab AO-80G. , ADEKA STAB AO-330 (above, ADEKA Corporation) and the like.
- the content of the antioxidant in the total solid content of the curable composition is preferably 0.01 to 20% by mass, more preferably 0.3 to 15% by mass.
- the antioxidant only one kind may be used, or two or more kinds may be used. When two or more kinds are used, the total amount is preferably within the above range.
- the curable composition of the present invention can contain an oxidizing agent.
- the oxidizing agent may include the compound that also functions as the above-mentioned polymerization inhibitor.
- Examples of the oxidizing agent include quinone compounds and quinodimethane compounds.
- quinone compound benzoquinone, naphthoquinone, anthraquinone, chloranil, dichlorodicyanobenzoquinone (DDQ) and the like can be used.
- quinodimethane compound examples include 7,7,8,8-tetracyanoquinodimethane (TCNQ), 2-fluoro-7,7,8,8-tetracyanoquinodimethane (FTCNQ) and 2,5-difluoro-7, 7,8,8-Tetracyanoquinodimethane (F2TCNQ), tetrafluorotetracyanoquinodimethane (F4TCNQ) and the like can be used.
- the oxidizing agent is preferably lower than the lowest unoccupied molecular orbit (LUMO) of the pigment or dye contained therein.
- the LUMO of the oxidizing agent is preferably -3.5 eV or less, more preferably -3.8 eV or less, and most preferably -4.0 eV or less.
- the content of the oxidizing agent in the total solid content of the curable composition is preferably 0.0001 to 10% by mass, more preferably 0.0005 to 5% by mass, and 0.001 to 1% by mass. % Is most preferred.
- the oxidizing agent only one kind may be used, or two or more kinds may be used. When two or more kinds are used, the total amount is preferably within the above range.
- the curable composition of the present invention contains a sensitizer, a curing accelerator, a filler, a thermal curing accelerator, a plasticizer and other auxiliaries (for example, conductive particles, a filler, a defoaming agent), if necessary. , Flame retardants, leveling agents, peeling accelerators, fragrances, surface tension adjusting agents, chain transfer agents, etc.). Properties such as film physical properties can be adjusted by appropriately incorporating these components. These components are described, for example, in JP 2012-003225 A, paragraph No. 0183 et seq. (corresponding U.S. Patent Application Publication No. 2013/0034812, paragraph No. 0237), and JP 2008-250074 A.
- the curable composition of the present invention may contain a latent antioxidant, if necessary.
- the latent antioxidant is a compound in which the site functioning as an antioxidant is protected by a protecting group, and the compound is heated at 100 to 250°C or heated at 80 to 200°C in the presence of an acid/base catalyst.
- Examples of the latent antioxidant include compounds described in International Publication No. 2014/021023, International Publication No. 2017/030005, and JP-A-2017-008219.
- Examples of commercially available latent antioxidants include ADEKA ARCRUZ GPA-5001 (manufactured by ADEKA Corporation).
- the curable composition of the present invention may contain a metal oxide in order to adjust the refractive index of the obtained film.
- the metal oxide include TiO 2 , ZrO 2 , Al 2 O 3 , and SiO 2 .
- the primary particle diameter of the metal oxide is preferably from 1 to 100 nm, more preferably from 3 to 70 nm, even more preferably from 5 to 50 nm.
- the metal oxide may have a core-shell structure. Further, in this case, the core portion may be hollow.
- the curable composition of the present invention may contain a light resistance improver.
- a light resistance improver the compounds described in JP-A-2017-198787, paragraphs 0036 to 0037, the compounds described in JP-A-2017-146350, paragraphs 0029 to 0034, and JP-A-2017-129774.
- the viscosity (25° C.) of the curable composition of the present invention is preferably 1 to 100 mPa ⁇ s when forming a film by coating, for example.
- the lower limit is more preferably 0.1 mPa ⁇ s or more, further preferably 0.2 mPa ⁇ s or more.
- the upper limit is more preferably 10 mPa ⁇ s or less, further preferably 5 mPa ⁇ s or less, and particularly preferably 3 mPa ⁇ s or less.
- the content of free metal that is not bound or coordinated with a pigment or the like is preferably 100 ppm or less, more preferably 50 ppm or less, further preferably 10 ppm or less. It is preferable and it is especially preferable not to contain substantially. In the present specification, ppm is based on mass. According to this aspect, stabilization of pigment dispersibility (inhibition of aggregation), improvement of spectral characteristics due to improvement of dispersibility, stabilization of curable component, suppression of conductivity fluctuation due to elution of metal atom/metal ion, display Effects such as improved characteristics can be expected.
- JP 2012-153796A, JP 2000-345085A, JP 2005-200560A, JP 08-043620A, JP 2004-145078A, JP 2014-119487A Described in JP 2010-083997 A, JP 2017-090930 A, JP 2018-025612 A, JP 2018-025797 A, JP 2017-155228 A, JP 2018-036521 A, etc. The effect is also obtained.
- the types of the above-mentioned free metals include Na, K, Ca, Sc, Ti, Mn, Cu, Zn, Fe, Cr, Co, Mg, Al, Sn, Zr, Ga, Ge, Ag, Au, Pt, Cs, Ni, Cd, Pb, Bi and the like can be mentioned.
- the curable composition of the present invention preferably has a content of free halogen that is not bound or coordinated with a pigment or the like of 100 ppm or less, more preferably 50 ppm or less, and more preferably 10 ppm or less. Are more preferable, and it is particularly preferable that they are not substantially contained.
- Halogen includes F, Cl, Br, I and their anions. Examples of methods for reducing free metals and halogens in the curable composition include washing with ion-exchanged water, filtration, ultrafiltration, and purification with an ion-exchange resin.
- the curable composition of the present invention contains substantially no terephthalic acid ester.
- the container for the curable composition of the present invention is not particularly limited, and a known container can be used.
- the inner wall of the container has a multi-layer bottle composed of 6 kinds of 6 layers of resin and a 6 kinds of resin having 7 layers structure. It is also preferred to use bottles.
- the container described in JP-A-2015-123351 can be cited.
- the curable composition of the present invention, or as a container for the composition used for producing an image sensor prevents metal elution from the inner wall of the container, enhances storage stability of the composition, and suppresses component deterioration.
- the inner wall of the container is made of glass, stainless steel, or the like.
- the storage condition of the curable composition of the present invention is not particularly limited, and a conventionally known method can be used. Alternatively, the method described in JP-A-2016-180058 can be used.
- the curable composition of the present invention can be prepared by mixing the above components.
- all the components may be dissolved and/or dispersed in a solvent at the same time to prepare the curable composition, or if necessary, each component may be appropriately used as two or more solutions or dispersions.
- the curable composition may be prepared as a liquid by mixing these at the time of use (at the time of application).
- the mechanical force used for dispersing the pigment includes compression, squeezing, impact, shearing, cavitation and the like.
- Specific examples of these processes include a bead mill, a sand mill, a roll mill, a ball mill, a paint shaker, a microfluidizer, a high speed impeller, a sand grinder, a flow jet mixer, a high pressure wet atomization, and an ultrasonic dispersion.
- the pulverization of the pigment in the sand mill (bead mill) it is preferable to use the beads having a small diameter, and to increase the filling rate of the beads to carry out the treatment under the condition that the pulverization efficiency is increased. Further, it is preferable to remove coarse particles by filtration, centrifugation or the like after the crushing treatment.
- the process and disperser for dispersing pigments are described in "Dispersion Technology Taizen, Information Technology Co., Ltd., July 15, 2005” and "Dispersion technology centered on suspension (solid/liquid dispersion system) and industrial application. Actually, the process and the disperser described in Paragraph No.
- JP-A-2015-157893 "Comprehensive reference materials, published by Management Development Center Publishing Department, October 10, 1978" can be suitably used.
- the particles may be refined in a salt milling step.
- the materials, equipment, processing conditions, etc. used in the salt milling process can be referred to, for example, the descriptions in JP-A-2015-194521 and JP-A-2012-046629.
- the filter can be used without particular limitation as long as it is a filter that has been conventionally used for filtration and the like.
- fluororesins such as polytetrafluoroethylene (PTFE), polyamide resins such as nylon (eg nylon-6, nylon-6,6), polyolefin resins such as polyethylene and polypropylene (PP) (high density, ultra high molecular weight). (Including the polyolefin resin), etc., and the like.
- PTFE polytetrafluoroethylene
- nylon eg nylon-6, nylon-6,6)
- polyolefin resins such as polyethylene and polypropylene (PP) (high density, ultra high molecular weight).
- PP polypropylene
- nylon high-density polypropylene
- nylon are preferable.
- the pore size of the filter is preferably 0.01 to 7.0 ⁇ m, more preferably 0.01 to 3.0 ⁇ m, still more preferably 0.05 to 0.5 ⁇ m. If the pore size of the filter is within the above range, fine foreign matter can be removed more reliably.
- the nominal value of the filter manufacturer can be referred to.
- various filters provided by Nippon Pole Co., Ltd. (DFA4201NIEY, etc.), Advantech Toyo Co., Ltd., Japan Entegris Co., Ltd. (formerly Japan Microlith Co., Ltd.), KITZ Micro Filter Co., Ltd., etc. can be used.
- a fibrous filter medium as the filter.
- the fibrous filter medium include polypropylene fiber, nylon fiber, glass fiber and the like.
- examples of commercially available products include SBP type series (such as SBP008), TPR type series (such as TPR002 and TPR005), and SHPX type series (such as SHPX003) manufactured by Roki Techno.
- filters for example, the first filter and the second filter
- the filtration with each filter may be performed only once, or may be performed twice or more. Further, filters having different pore sizes within the above range may be combined.
- the filtration with the first filter may be performed only on the dispersion liquid, and after the other components are mixed, the filtration with the second filter may be performed.
- the film of the present invention is a film formed from the curable composition of the present invention described above.
- the film of the present invention is preferably a cured film obtained by curing the curable composition of the present invention.
- the film of the present invention is preferably a film made of a cured product of the curable composition of the present invention.
- the film of the present invention can be used as a color filter, a near infrared ray transmitting filter, a near infrared ray cutting filter, a black matrix, a light shielding film, a refractive index adjusting film, and the like.
- it can be preferably used as a colored layer of a color filter.
- the film thickness of the film of the present invention can be appropriately adjusted according to the purpose.
- the film thickness is preferably 20 ⁇ m or less, more preferably 10 ⁇ m or less, still more preferably 5 ⁇ m or less.
- the lower limit of the film thickness is preferably 0.1 ⁇ m or more, more preferably 0.2 ⁇ m or more, still more preferably 0.3 ⁇ m or more.
- the color filter of the present invention is a color filter formed from the curable composition of the present invention.
- the color filter of the present invention preferably has the above-mentioned film of the present invention.
- a chromatic color pigment as the pigment.
- the thickness of the color filter of the present invention is preferably 20 ⁇ m or less, more preferably 10 ⁇ m or less, still more preferably 5 ⁇ m or less.
- the lower limit of the film thickness is preferably 0.1 ⁇ m or more, more preferably 0.2 ⁇ m or more, still more preferably 0.3 ⁇ m or more.
- the color filter of the present invention can be used for a solid-state imaging device such as CCD (charge coupled device) or CMOS (complementary metal oxide semiconductor), an image display device, or the like.
- the color filter of the present invention may include the film of the present invention and a protective layer.
- the protective layer and the film of the present invention may be in contact with each other, another layer may be provided therebetween, or a void may be provided therebetween.
- various functions such as oxygen blocking, low reflection, hydrophilicity/hydrophobicity, and blocking of light having a specific wavelength (ultraviolet rays, near infrared rays, infrared rays, etc.) can be imparted.
- the thickness of the protective layer is preferably 0.01 to 10 ⁇ m, more preferably 0.1 to 5 ⁇ m.
- Examples of the method of forming the protective layer include a method of applying a resin composition dissolved in a solvent to form the protective layer, a chemical vapor deposition method, and a method of attaching a molded resin with an adhesive.
- Examples of components constituting the protective layer include (meth)acrylic resin, ene/thiol resin, polycarbonate resin, polyether resin, polyarylate resin, polysulfone resin, polyethersulfone resin, polyphenylene resin, polyarylene ether phosphine oxide resin, and polyimide.
- Resin polyamideimide resin, polyolefin resin, cyclic olefin resin, polyester resin, styrene resin, polyol resin, polyvinylidene chloride resin, melamine resin, urethane resin, aramid resin, polyamide resin, alkyd resin, epoxy resin, modified silicone resin, fluorine Examples include resin, polyacrylonitrile resin, cellulose resin, Si, C, W, Al 2 O 3 , Mo, SiO 2 , Si 2 N 4, and the like, which may contain two or more of these components, for example, oxygen.
- the protective layer intended for blocking it is preferable that the protective layer contains a polyol resin, SiO 2 , and Si 2 N 4 . Further, in the case of the protective layer aiming at low reflection, the protective layer preferably contains a (meth)acrylic resin or a fluororesin.
- the resin composition When the resin composition is applied to form the protective layer, known methods such as a spin coating method, a casting method, a screen printing method, and an inkjet method can be used as the method of applying the resin composition.
- a known solvent eg, propylene glycol 1-monomethyl ether 2-acetate, cyclopentanone, ethyl lactate, etc.
- the protective layer is formed by the chemical vapor deposition method, known chemical vapor deposition methods (thermochemical vapor deposition method, plasma chemical vapor deposition method, photochemical vapor deposition method) are known as the chemical vapor deposition method. Can be used.
- the protective layer is added with organic particles, inorganic particles, an absorber of a specific wavelength (for example, ultraviolet rays, near infrared rays, infrared rays, etc.), a refractive index adjusting agent, an antioxidant, an adhesive agent, a surfactant, etc., if necessary. You may contain an agent.
- organic/inorganic particles include, for example, polymer particles (eg, silicone resin particles, polystyrene particles, melamine resin particles), titanium oxide, zinc oxide, zirconium oxide, indium oxide, aluminum oxide, titanium nitride, titanium oxynitride.
- a known absorber can be used as the absorber having a specific wavelength.
- the ultraviolet absorber a conjugated diene compound, an aminodiene compound, a salicylate compound, a benzophenone compound, a benzotriazole compound, an acrylonitrile compound, a hydroxyphenyltriazine compound, an indole compound, a triazine compound or the like can be used.
- infrared absorbers include cyclic tetrapyrrole dyes, oxocarbon dyes, cyanine dyes, quaterrylene dyes, naphthalocyanine dyes, nickel complex dyes, copper ion dyes, iminium dyes, subphthalocyanine dyes, xanthene dyes, azo dyes, dipyrromethene.
- a dye, a pyrrolopyrrole dye, etc. can be used.
- the content of these additives can be adjusted as appropriate, but is preferably 0.1 to 70% by mass, more preferably 1 to 60% by mass, based on the total mass of the protective layer.
- the protective layer described in paragraph numbers 0073 to 0092 of JP-A-2017-151176 may be used.
- the method for producing a color filter of the present invention comprises a step of applying a curable composition onto a support to form a composition layer (composition layer forming step), and a step of exposing the composition layer in a pattern ( Exposure step) and a step of developing and removing the unexposed portion to form a colored pattern (developing step).
- composition layer forming step a step of applying a curable composition onto a support to form a composition layer
- Exposure step a step of exposing the composition layer in a pattern
- developing step developing and removing the unexposed portion to form a colored pattern
- composition layer forming step the curable composition of the present invention is used to form a curable composition layer on a support.
- the support is not particularly limited and can be appropriately selected depending on the application.
- a glass substrate, a silicon substrate, etc. are mentioned, and a silicon substrate is preferable.
- a charge coupled device (CCD), complementary metal oxide semiconductor (CMOS), transparent conductive film, etc. may be formed on the silicon substrate.
- CMOS complementary metal oxide semiconductor
- transparent conductive film etc.
- a black matrix that isolates each pixel may be formed on the silicon substrate.
- the silicon substrate may be provided with an undercoat layer for the purpose of improving the adhesion to the upper layer, preventing the diffusion of substances, or flattening the substrate surface.
- the curable composition is applied to the support.
- a method of applying the curable composition a known method can be used. For example, a dropping method (drop casting); a slit coating method; a spraying method; a roll coating method; a spin coating method (spin coating); a cast coating method; a slit and spin method; a pre-wet method (for example, JP 2009-145395A). Method described in the publication); inkjet (for example, on-demand method, piezo method, thermal method), ejection-type printing such as nozzle jet, flexographic printing, screen printing, gravure printing, reverse offset printing, metal mask printing method, etc.
- Examples include various printing methods; transfer methods using molds and the like; nanoimprint methods.
- the method of applying the inkjet method is not particularly limited.
- the descriptions in International Publication No. 2017/030174 and International Publication No. 2017/018419 can be referred to, and the contents thereof are incorporated in the present specification.
- the curable composition layer formed on the support may be dried (prebaked). If the film is produced by a low temperature process, prebaking may not be performed.
- the prebaking temperature is preferably 150° C. or lower, more preferably 120° C. or lower, and further preferably 110° C. or lower.
- the lower limit may be, for example, 50° C. or higher, and may be 80° C. or higher.
- the prebake time is preferably 10 to 300 seconds, more preferably 40 to 250 seconds, and further preferably 80 to 220 seconds. Prebaking can be performed with a hot plate, an oven, or the like.
- the curable composition layer is exposed in a pattern (exposure step).
- the curable composition layer can be exposed in a pattern by using a stepper exposure device, a scanner exposure device, or the like through a mask having a predetermined mask pattern. Thereby, the exposed portion can be cured.
- the radiation (light) that can be used at the time of exposure g rays, i rays, etc. are preferably used. Further, light having a wavelength of 300 nm or less (preferably light having a wavelength of 180 to 300 nm) can be used. Examples of light having a wavelength of 300 nm or less include KrF rays (wavelength 248 nm) and ArF rays (wavelength 193 nm), and KrF rays (wavelength 248 nm) are preferable. Also, a long-wave light source of 300 nm or more can be used.
- pulse exposure is an exposure method of a type in which light irradiation and rest are repeated in a short-time (for example, millisecond level or less) cycle.
- the pulse width is preferably 100 nanoseconds (ns) or less, more preferably 50 nanoseconds or less, and further preferably 30 nanoseconds or less.
- the lower limit of the pulse width is not particularly limited, but may be 1 femtosecond (fs) or more, and may be 10 femtoseconds or more.
- the frequency is preferably 1 kHz or higher, more preferably 2 kHz or higher, even more preferably 4 kHz or higher.
- the upper limit of the frequency is preferably 50 kHz or less, more preferably 20 kHz or less, and further preferably 10 kHz or less.
- Maximum instantaneous intensity is preferably at 50,000,000W / m 2 or more, more preferably 100,000,000W / m 2 or more, still be at 200,000,000W / m 2 or more preferable.
- the maximum limit of the instantaneous intensity is preferably at 1,000,000,000W / m 2 or less, more preferably 800,000,000W / m 2 or less, 500,000,000W / m 2 The following is more preferable.
- the pulse width is the time during which light is emitted in the pulse cycle.
- the frequency means the number of pulse cycles per second.
- the maximum instantaneous illuminance is the average illuminance within the time during which the light is emitted in the pulse cycle.
- the pulse cycle is a cycle in which light irradiation and pause in pulse exposure are one cycle.
- Irradiation dose for example, preferably 0.03 ⁇ 2.5J / cm 2, more preferably 0.05 ⁇ 1.0J / cm 2.
- the oxygen concentration at the time of exposure can be appropriately selected, and in addition to performing in the atmosphere, for example, in a low oxygen atmosphere having an oxygen concentration of 19% by volume or less (for example, 15% by volume, 5% by volume, or substantially It may be exposed to oxygen-free) or may be exposed to a high oxygen atmosphere in which the oxygen concentration exceeds 21% by volume (for example, 22% by volume, 30% by volume, or 50% by volume).
- the exposure illuminance can be set as appropriate, and is usually 1,000 W/m 2 to 100,000 W/m 2 (eg, 5,000 W/m 2 , 15,000 W/m 2 , or 35,000 W). /M 2 ).
- Oxygen concentration and exposure illuminance may appropriately combined conditions, for example, illuminance 10,000 W / m 2 at an oxygen concentration of 10 vol%, oxygen concentration of 35 vol% can be such illuminance 20,000W / m 2.
- the unexposed portion of the curable composition layer is developed and removed to form a pattern (pixel).
- the development removal of the unexposed portion of the curable composition layer can be performed using a developer.
- the curable composition layer in the unexposed portion in the exposure step is eluted into the developing solution, and only the photocured portion remains.
- As the developing solution an organic alkaline developing solution that does not damage the underlying device or circuit is desirable.
- the temperature of the developer is preferably 20 to 30° C., for example.
- the development time is preferably 20 to 180 seconds. Further, in order to improve the residue removability, the process of shaking off the developing solution every 60 seconds and further supplying a new developing solution may be repeated several times.
- the developer is preferably an alkaline aqueous solution (alkali developer) obtained by diluting an alkaline agent with pure water.
- alkaline agent include ammonia, ethylamine, diethylamine, dimethylethanolamine, diglycolamine, diethanolamine, hydroxyamine, ethylenediamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide.
- Ethyltrimethylammonium hydroxide Ethyltrimethylammonium hydroxide, benzyltrimethylammonium hydroxide, dimethylbis(2-hydroxyethyl)ammonium hydroxide, choline, pyrrole, piperidine, 1,8-diazabicyclo[5.4.0]-7-undecene, etc.
- alkaline compounds examples include alkaline compounds and inorganic alkaline compounds such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogen carbonate, sodium silicate, and sodium metasilicate.
- the alkaline agent a compound having a large molecular weight is preferable in terms of environment and safety.
- the concentration of the alkaline agent in the alkaline aqueous solution is preferably 0.001 to 10% by mass, more preferably 0.01 to 1% by mass.
- the developing solution may further contain a surfactant.
- the surfactant include the above-mentioned surfactants, and nonionic surfactants are preferable.
- the developer may be once produced as a concentrated solution and diluted to a required concentration at the time of use, from the viewpoint of convenience of transportation and storage. Although the dilution ratio is not particularly limited, it can be set, for example, in the range of 1.5 to 100 times. It is also preferable to wash (rinse) with pure water after development.
- the rinse is performed by supplying a rinse liquid to the curable composition layer after development while rotating the support on which the curable composition layer after development is formed. It is also preferable to move the nozzle for discharging the rinse liquid from the central portion of the support to the peripheral portion of the support. At this time, when moving from the central portion of the support body of the nozzle to the peripheral edge portion, the moving speed of the nozzle may be gradually reduced. By performing the rinse in this manner, it is possible to suppress the in-plane variation of the rinse. Further, the same effect can be obtained by gradually decreasing the rotation speed of the support while moving the nozzle from the center of the support to the peripheral portion.
- the additional exposure treatment and the post-baking are treatments after development to complete curing, and the heating temperature is, for example, preferably 100 to 240°C, more preferably 200 to 240°C.
- Post-baking can be performed in a continuous or batch manner by using a heating means such as a hot plate, a convection oven (hot air circulation dryer), or a high-frequency heater so that the film after development can meet the above conditions. ..
- the light used for the exposure is preferably light having a wavelength of 400 nm or less. Further, the additional exposure process may be performed by the method described in Korean Published Patent No. 10-2017-0122130.
- the pixel width is preferably 0.5 to 20.0 ⁇ m.
- the lower limit is preferably 1.0 ⁇ m or more, and more preferably 2.0 ⁇ m or more.
- the upper limit is preferably 15.0 ⁇ m or less, more preferably 10.0 ⁇ m or less.
- the Young's modulus of the pixel is preferably 0.5 to 20 GPa, more preferably 2.5 to 15 GPa.
- the pixel preferably has high flatness.
- the surface roughness Ra of the pixel is preferably 100 nm or less, more preferably 40 nm or less, and further preferably 15 nm or less. Although the lower limit is not specified, it is preferably 0.1 nm or more, for example.
- the surface roughness can be measured using, for example, an AFM (atomic force microscope) Dimension 3100 manufactured by Veeco.
- the contact angle of water on the pixel can be set to a suitable value as appropriate, but is typically in the range of 50 to 110°.
- the contact angle can be measured using, for example, a contact angle meter CV-DT•A type (manufactured by Kyowa Interface Science Co., Ltd.).
- the volume resistance value of the pixel is high.
- the volume resistance value of the pixel is preferably 10 9 ⁇ cm or more, more preferably 10 11 ⁇ cm or more.
- the upper limit is not specified, it is preferably, for example, 10 14 ⁇ cm or less.
- the volume resistance value of a pixel can be measured using, for example, an ultra-high resistance meter 5410 (manufactured by Advantest).
- a color filter having a desired color layer is formed.
- the above-mentioned manufacturing method is a method for manufacturing pixels of a color filter, but the curable composition of the present invention also manufactures, for example, a black matrix provided between pixels of the color filter.
- the black matrix for example, except that a curable composition of the present invention in which a black pigment is added as a pigment is used, pattern exposure and development are performed in the same manner as in the above-described pixel manufacturing method, and post-baking is performed if necessary. Can be manufactured by carrying out.
- the second aspect of the method for producing a color filter of the present invention is to apply the curable composition of the present invention onto a support to form a composition layer, and cure the composition layer to form a cured layer.
- the curable composition of the present invention is applied onto a support and cured to form a cured layer.
- the support the support used in the above-mentioned composition layer forming step is preferably used.
- the application method in the above-mentioned composition film forming step is preferably used.
- the method for curing the applied curable composition is not particularly limited, and curing with light or heat is preferable. In the case of curing by light, the light may be appropriately selected according to the initiator contained in the curable composition, but, for example, ultraviolet rays such as g-rays and i-rays are preferably used.
- Exposure is preferably 5 ⁇ 1,500mJ / cm 2, more preferably 10 ⁇ 1,000mJ / cm 2, more preferably 10 ⁇ 500mJ / cm 2.
- the heating temperature is preferably 120 to 250°C, more preferably 160 to 230°C.
- the heating time varies depending on the heating means, but when heating on a hot plate, it is preferably 3 to 30 minutes, and when heating in an oven, it is preferably 30 to 90 minutes.
- Photoresist layer forming step In the photoresist layer forming step, a photoresist layer is formed on the cured layer.
- a photoresist layer for example, a known negative or positive photosensitive composition is used, and a positive photosensitive composition is preferable.
- a photoresist layer is obtained by applying the above-mentioned photosensitive composition onto the above-mentioned cured layer, and drying it if necessary.
- the method for forming the photoresist layer is not particularly limited and may be a known method.
- the thickness of the photoresist layer is preferably 0.1 to 3 ⁇ m, more preferably 0.2 to 2.5 ⁇ m, and even more preferably 0.3 to 2 ⁇ m.
- the resist pattern is formed by exposing and developing the photoresist layer in a pattern.
- the exposure and development are not particularly limited and may be performed by a known method.
- the hardened layer is etched through the resist pattern.
- the etching method is not particularly limited, and any known method may be used. For example, a dry etching method may be used.
- the second aspect of the method for manufacturing a color filter according to the present invention may further include a step of peeling the resist pattern after the etching step.
- the method for removing the resist pattern is not particularly limited, and a known method can be used.
- the solid-state image sensor of the present invention includes the above-mentioned film of the present invention or the color filter of the present invention.
- the configuration of the solid-state imaging device of the present invention is not particularly limited as long as it includes the film of the present invention and functions as a solid-state imaging device, but examples thereof include the following configurations.
- a plurality of photodiodes forming a light receiving area of a solid-state image sensor (CCD (charge coupled device) image sensor, CMOS (complementary metal oxide semiconductor) image sensor, etc.) and transfer electrodes made of polysilicon or the like are provided.
- CCD charge coupled device
- CMOS complementary metal oxide semiconductor
- transfer electrodes made of polysilicon or the like are provided.
- a device protection film made of silicon nitride or the like is formed on the photodiode and the transfer electrode so that only the light receiving portion of the photodiode is opened, and is formed on the light shielding film so as to cover the entire light shielding film and the photodiode light receiving portion. And has a color filter on the device protective film.
- a structure having a light collecting means (for example, a microlens or the like; hereinafter the same) on the device protective film and below the color filter (a side close to the substrate), or a structure having a light collecting means on the color filter is used. It may be.
- the color filter may have a structure in which each colored pixel is embedded in a space partitioned by a partition wall, for example, in a lattice shape. In this case, the partition wall preferably has a low refractive index for each colored pixel. Examples of the image pickup device having such a structure include the devices described in JP2012-227478A, JP2014-179577A, and International Publication No. 2018/043654.
- the image pickup apparatus provided with the solid-state image pickup device of the present invention can be used not only for digital cameras and electronic devices having an image pickup function (such as mobile phones), but also for vehicle-mounted cameras and surveillance cameras.
- the image display device of the present invention includes the above-described film of the present invention or the color filter of the present invention.
- Examples of the image display device include a liquid crystal display device and an organic electroluminescence display device.
- the liquid crystal display device is described in, for example, “Next-generation liquid crystal display technology (edited by Tatsuo Uchida, Industrial Research Institute Co., Ltd., published in 1994)”.
- the liquid crystal display device to which the present invention is applicable is not particularly limited, and for example, the present invention can be applied to various types of liquid crystal display devices described in the above-mentioned "next-generation liquid crystal display technology".
- the polymer compound of the present invention contains at least one of the structural unit represented by the above formula (A1) and the structural unit represented by the above formula (B1).
- the polymer compound of the present invention is the same as the specific resin in the curable composition of the present invention described above, and the preferred embodiments are also the same.
- the amounts of the monomer B-1 (solid content in the solution), the monomer A-1, the monomers C-1, F-1 and Q-1 used are as shown in Table 1 below.
- the specific resin PA-1 obtained had a weight average molecular weight of 17,200 and an acid value of 70 mgKOH/mg.
- the specific resin PA-1 is a resin that satisfies the above-mentioned Condition 1 and also has a structural unit represented by the above formula (A1).
- Detector Differential refractometer (RI detector) Pre-column TSKGUARDCOLUMN MP(XL) 6mm ⁇ 40mm (manufactured by Tosoh Corporation) Sample side column: Directly connect the following 4 columns [all manufactured by Tosoh Corporation] TSK-GEL Multipore-HXL-M 7.8mm x 300mm Reference column: same as the sample column Constant temperature bath temperature: 40°C Mobile phase: tetrahydrofuran Sample-side mobile phase flow rate: 1.0 mL/min Reference-side mobile phase flow rate: 0.3 mL/min Sample concentration: 0.1% by mass Sample injection volume: 100 ⁇ L Data collection time: 16 to 46 minutes after sample injection Sampling pitch: 300 ms (millisecond)
- the acid value of each resin was determined by neutralization titration using an aqueous sodium hydroxide solution. Specifically, a solution obtained by dissolving the obtained resin in a solvent is titrated with an aqueous sodium hydroxide solution using a potentiometric method to calculate the number of millimoles of the acid contained in 1 g of the solid of the resin. The value was determined by multiplying the molecular weight of potassium hydroxide (KOH) by 56.1.
- KOH potassium hydroxide
- the acid value of the resin is shown in the column of "acid value" in Table 1 or 2. In Table 1 or Table 2, the unit of the acid value is (mgKOH/g).
- C C value (ethylenically unsaturated bond value)-
- the low molecular weight component (a) of the ethylenically unsaturated group moiety for example, acrylic acid in the case of having an acryloxy group in the structural unit represented by the formula D1 of the above-mentioned specific resin
- HPLC high performance liquid chromatography
- 0.1 g of the specific resin was dissolved in a tetrahydrofuran/methanol mixed solution (50 mL/15 mL), 10 mL of a 4 mol/L sodium hydroxide aqueous solution was added, and the mixture was reacted at 40° C. for 2 hours.
- the reaction mixture was neutralized with 10.2 mL of a 4 mol/L methanesulfonic acid aqueous solution, and then a mixed solution containing 5 mL of ion-exchanged water and 2 mL of methanol was transferred to a 100 mL volumetric flask, and the volume was measured up with methanol to perform HPLC measurement.
- a sample is prepared and measured under the following conditions.
- the content of the low molecular weight component (a) was calculated from a separately prepared calibration curve of the low molecular weight component (a), and the ethylenically unsaturated valency was calculated from the following formula.
- Amine value a ⁇ 5.611/c a: 0.1 mol/L Perchloric acid consumption (mL) c: amount of sample (g)
- the amine value of the resin is shown in the column of "amine value" in Table 1 or 2. In Table 1 or Table 2, the unit of amine value is (mmol/g).
- PA-2 to PA-25> PA-2 was prepared in the same manner as PA-1, except that the monomer 1, monomer 2, monomer 3, reactive compound, amine compound, and polymerization inhibitor used were changed to those listed in Table 1.
- ⁇ PA-22 was synthesized. When monomer 3 was added, monomer 3 was also added to the mixture of monomer 1 and monomer 2.
- the unit of the numerical value described in the "content” column is "g”.
- the components described as "-” were not used.
- PA-2 to PA-22 are resins that satisfy the above-mentioned Condition 1 and also have a structural unit represented by the above formula (A1).
- the column of “Structural unit A1” is a structural unit represented by any of the above formulas (A1-1) to (A1-17), and is a structural unit contained in each resin. Is shown.
- PZ-1 was prepared by the same method as PA-1 except that the monomer 1, monomer 2, monomer 3, reactive compound, amine compound, and polymerization inhibitor used were changed to those listed in Table 1. Was synthesized.
- the resin PZ-1 cannot form a structure in which the quaternary ammonium cation structure and the radically polymerizable group are linked because F-8 is used as the amine compound, and does not satisfy the conditions 1 and 2 described above. Is.
- B-1 Synthetic product according to the following synthesis example B1
- B-2 Synthetic product according to the following synthesis example B2
- B-3 Synthetic product according to the following synthesis example B3
- B-4 Bremmer PSE1300 (manufactured by NOF Corporation)
- stearoxy polyethylene glycol monomethacrylate B-5: Bremmer 75ANEP-600 (manufactured by NOF Corporation) nonylphenoxy (ethylene glycol-polypropylene glycol) monoacrylate
- B-6 Bremmer 50 POEP800B (manufactured by NOF Corporation) )
- Octoxy polyethylene glycol-polypropylene glycol monomethacrylate By using at least one compound of B-1 to B-6 as the monomer 2, the constitutional unit represented by the above formula (D5) is introduced into the specific resin. ..
- B-1 the macromonomer B-1 (also simply referred to as “B-1”), which is the monomer 2, containing a structural unit composed of an oxyalkylenecarbonyl group is shown below.
- ⁇ -caprolactone (1256.62 parts, which corresponds to a cyclic compound) and 2-ethyl-1-hexanol (143.38 parts, which corresponds to a ring-opening polymerization initiator) were introduced into a flask, and the mixture was obtained.
- the above mixture was stirred while blowing nitrogen.
- Monobutyltin oxide (0.63 parts) was then added to the mixture and the resulting mixture was heated to 90°C.
- B-2- B-2 was synthesized in the same manner as in the synthesis of B-1 except that 2-ethyl-1-hexanol (143.38 g) was changed to stearyl alcohol (297.88 g).
- the structure of B-2 (shown in formula (B-2)) was confirmed by 1 H-NMR.
- the weight average molecular weight of the obtained B-2 was 3,400.
- AIBN azobisisobutyronitrile
- an initiator 0.5 part by mass of azobisisobutyronitrile (AIBN, manufactured by Wako Pure Chemical Industries, Ltd., an initiator) was added to this, and after heating for 3 hours, 0.5 part of AIBN was added again, and under a nitrogen stream, The reaction was carried out at 90°C for 3 hours. Then, after cooling to room temperature (25° C., the same below) and replacing with air, 20 parts by mass of 4-hydroxybutyl acrylate glycidyl ether, 4.02 parts by mass of dimethyldodecylamine, TEMPO (2,2,6,6,- Tetramethylpiperidine 1-oxyl) (0.023 parts by mass) was added, and the mixture was heated with stirring at 90° C. for 36 hours.
- AIBN azobisisobutyronitrile
- PA-26 is a resin that satisfies the above condition 1 and has a structural unit represented by the above formula (A1).
- PA-27 is a resin that satisfies the above condition 1 and has a structural unit represented by the above formula (A1).
- the amounts of the monomer 2 (solid content in the solution), the monomer 1, the monomer 4, C-1 and Q-1 used were as shown in Table 2 below.
- the obtained resin PB-2 had a weight average molecular weight of 17,800, an acid value of 75 mgKOH/mg 19,200, and an acid value of 60 mgKOH/mg.
- the specific resin PB-2 is a resin that satisfies the above-mentioned Condition 2 and has a structural unit represented by the above formula (B1).
- PB-1 ⁇ Synthesis of Specific Resins PB-1, PB-3 to PB-18> PB-1 was prepared in the same manner as PA-1, except that the monomer 1, monomer 2, monomer 3, monomer 4, reactive compound, and polymerization inhibitor used were changed to those listed in Table 1. , And PB-3 to PB-18 were synthesized. When monomer 3 was added, monomer 3 was also added to the mixture of monomer 1, monomer 2 and monomer 4. In Table 2, the unit of the numerical value described in the "content” column is "mass %". In Table 2, the components described as "-" were not used.
- the column of “Structural Unit B1” is a structural unit represented by any of the above formulas (B1-1) to (B1-12), and is a structural unit contained in each resin. Is shown. PB-1 and PB-3 to PB-18 are resins that satisfy the above condition 2 and also have a structural unit represented by the above formula (B1).
- PZ-2 was prepared by the same method as PB-2 except that the monomer 1, monomer 2, monomer 3, monomer 4, reactive compound, and polymerization inhibitor used were changed to those listed in Table 2.
- the resin PZ-2 uses E-1 and E-7 as the monomer 4, it cannot form a structure in which the quaternary ammonium cation structure and the radically polymerizable group are linked, and therefore, the condition P and the condition 2 are not satisfied. It is a resin that does not satisfy.
- D-4 N,N-dimethyl-1-(4-vinylphenyl)methanamine (synthesized product, synthesized with reference to Angewandte Chemie-International Edition, 2007, vol. 46, #46, p. 8869-8871).
- PB-19 is a resin that satisfies the above condition 2 and has the structural unit represented by the above formula (B1).
- PB-20 is a resin that satisfies the above-mentioned Condition 2 and has a structural unit represented by the above formula (B1).
- PA-1 to PA-27 Synthetic product in the above synthesis example.
- PB-1 to PB-20 Synthetic product in the above synthesis example.
- PZ-1 to PZ-2 Synthetic product in the above synthesis example.
- M1 compound represented by the following formula (M)
- M2 compound represented by the following formula (M)
- a+b+c 4
- M3 a compound represented by the following formula (M)
- M4 dipentaerythritol hexaacrylate (DPHA).
- M5 compound represented by the following formula (M5)
- M6 compound represented by the following formula (M6)
- the coated substrate was passed through a mask having a 1.1 ⁇ m square island pattern at a wavelength of 365 nm, and the coated film was irradiated at 50 to 1,700 mJ/ Irradiation was carried out with an exposure dose of cm 2 .
- the film was developed using an alkaline developer CD-2000 (manufactured by FUJIFILM Electronic Materials Co., Ltd.) at 25° C. for 40 seconds. Then, after rinsed with running water for 30 seconds, it was spray-dried to obtain a colored pattern.
- the colored pattern corresponds to a film formed using the curable composition.
- the obtained colored pattern was observed from above the pattern using a scanning electron microscope (S-9220 manufactured by Hitachi, Ltd.) to measure the pattern size. Further, the adhesion was evaluated using an optical microscope.
- the pattern size when all the patterns were in close contact was evaluated on a scale of 5 according to the following evaluation criteria.
- the evaluation results are shown in the column of "Adhesion sensitivity" in Tables 6 to 8. It can be said that the closer the evaluation result is to 5, the better the adhesion to the support.
- the evaluation result is preferably 3, 4, or 5, more preferably 4 or 5, and most preferably 5.
- ⁇ Evaluation criteria ⁇ 5 The pattern size is 0.9 ⁇ m or more and less than 1.0 ⁇ m and they are in close contact.
- the pattern size is 1.0 ⁇ m or more and less than 1.05 ⁇ m and they are in close contact.
- 3 The pattern size is 1.05 ⁇ m or more and less than 1.1 ⁇ m, and they are in close contact.
- 2 The pattern size is 1.1 ⁇ m or more and less than 1.2 ⁇ m and they are in close contact.
- 1 Adhesion does not occur unless the pattern size is 1.2 ⁇ m or more.
- each of the curable compositions obtained in each Example or Comparative Example was used to form a patterned cured product, and the edge shape (pattern shape) of the cured product was evaluated.
- the patterned cured product corresponds to a film formed using the curable composition.
- a curable composition layer (composition film) was formed on a silicon wafer so that the film thickness after drying was 0.9 ⁇ m.
- the formation of the curable composition layer was performed by spin coating. The number of rotations of spin coating was adjusted so that the above film thickness was obtained.
- the curable composition layer after application was placed on a hot plate with the silicon wafer facing down and dried. The surface temperature of the hot plate was 100° C., and the drying time was 120 seconds.
- the curable composition layer thus obtained was exposed under the following conditions.
- the exposure was performed using an i-line stepper (trade name “FPA-3000iS+”, manufactured by Canon Inc.).
- the curable composition film was irradiated (exposed) with i-line through a mask having a linear shape of 20 ⁇ m (width 20 ⁇ m, length 4 mm) at an exposure dose of 400 mJ/cm 2 (irradiation time 0.5 seconds).
- the patterned cured product was photographed with a scanning electron microscope, and the edge shape of the 1.5 ⁇ m pattern cross section was evaluated according to the following criteria. As shown in FIG. 1, the length T of the notch at the bottom of the pattern edge portion 2 of the patterned cured product 1 formed on the wafer 4 was measured. In FIG. 1, L 1 corresponds to the exposed area and L 2 corresponds to the unexposed area. The evaluation was performed according to the following criteria. The evaluation results are shown in the column of "Pattern shape" in Tables 6 to 8. It can be said that the smaller the undercut width, the better the pattern shape.
- the evaluation result is preferably A or AA, and more preferably AA.
- AA The undercut width (above length T) was more than 0 ⁇ m and 0.05 ⁇ m or less.
- A The undercut width exceeded 0.05 ⁇ m and was 0.15 ⁇ m or less.
- B The undercut width exceeded 0.15 ⁇ m and was 0.25 ⁇ m or less.
- C The undercut width exceeded 0.25 ⁇ m.
- the coating film obtained above was irradiated with light having a wavelength of 365 nm through a pattern mask having a line-and-space of 1 ⁇ m for 10 to 1, Exposure was performed by irradiating with an exposure dose of 600 mJ/cm 2 .
- the curable composition film after exposure was developed using a 60% CD-2000 (manufactured by FUJIFILM Electronic Materials Co., Ltd.) developer at 25° C. for 60 seconds to form a patterned cured film. Got Then, the patterned cured film was rinsed with running water for 20 seconds and then air-dried.
- the patterned cured film corresponds to a film formed using a curable composition.
- the minimum exposure amount at which the pattern line width after development of the region irradiated with light was 1.0 ⁇ m or more was defined as the exposure sensitivity, and this exposure sensitivity was defined as the initial exposure sensitivity.
- the curable composition in each of Examples and Comparative Examples was applied onto a glass substrate by spin coating so that the film thickness after drying was 0.9 ⁇ m, and then the curable composition was applied on a hot plate.
- the glass substrate coated with was heated at 100° C. for 2 minutes to obtain a coating film.
- a patterned cured product was obtained through the steps of exposure, development and post-baking under the same conditions as in the above "evaluation of pattern shape”.
- the pattern-like cured product was observed using an optical microscope MT-3600LW (manufactured by FLOVEL) to evaluate the defects caused by the retention (presence/absence of foreign matter). It can be said that the smaller the amount of foreign matter is, the better the storage stability is, and the more the defects due to the retention are suppressed.
- the evaluation result is preferably 3, 4, or 5, more preferably 4 or 5, and most preferably 5.
- a film having excellent adhesion to the support was formed.
- the curable composition in Comparative Example 1 did not contain a resin satisfying at least one of Condition 1 or Condition 2, and a film having excellent adhesion to the support was not formed.
- the curable composition in Comparative Example 2 did not contain a resin satisfying at least one of Condition 1 or Condition 2, and a film having excellent adhesion to the support was not formed.
- Example 101 to 164 One of the Green composition, the Blue composition, and the Red composition is spin-coated by a spin coating method so that the film thickness after film formation is 1.0 ⁇ m so that the color does not overlap with the curable composition.
- the color of the curable compositions of Examples 1-50 is Red
- the color of the curable compositions of Examples 51-56 is Blue
- the color of the curable compositions of Examples 57-64 is Green.
- the Red composition described below and the Red composition described below should not be overlapped with any of the Red compositions of Examples 1 to 50, the Green composition of 57 to 64, or the Blue composition of 51 to 56.
- Green composition and two kinds of compositions selected from the group consisting of the below-mentioned Blue composition, and a total of three colors of composition (Red composition, Green composition, and Blue composition, any one color
- the compositions of Examples are the compositions of Examples 1 to 64). Then, using a hot plate, it heated at 100 degreeC for 2 minutes. Then, using an i-line stepper exposure apparatus FPA-3000i5+ (manufactured by Canon Inc.), exposure was performed at 1,000 mJ/cm 2 through a mask having a 2 ⁇ m square dot pattern. Then, paddle development was carried out at 23° C. for 60 seconds using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide (TMAH).
- TMAH tetramethylammonium hydroxide
- the Red composition, the Green composition, and the Blue composition are respectively patterned by heating at 200° C. for 5 minutes using a hot plate to form red, green, and blue coloring patterns (Bayer patterns).
- the Bayer pattern means one red (Red) element, two green (Green) elements, and one blue (Blue) as disclosed in US Pat. No. 3,971,065. ) Element and a 2 ⁇ 2 array of color filter elements are repeated. An image of the obtained solid-state imaging device was captured and the image performance was evaluated. Even when any of the compositions obtained in Examples 1 to 64 was used, an image could be clearly recognized even in an environment of low illuminance.
- the Red composition, the Green composition, the Blue composition, and the infrared transmitting filter forming composition used in Examples 101 to 164 are as follows.
- Red pigment dispersion 51.7 parts by mass Resin 4 (40% by mass PGMEA solution): 0.6 parts by mass Polymerizable compound 4: 0.6 parts by mass Photopolymerization initiator 1: 0.3 parts by mass Surfactant 1 : 4.2 parts by mass PGMEA: 42.6 parts by mass
- Green pigment dispersion 73.7 parts by mass Resin 4 (40% by mass PGMEA solution): 0.3 parts by mass Polymerizable compound 1:1.2 parts by mass Photopolymerization initiator 1:0.6 parts by mass Surfactant 1 : 4.2 parts by mass Ultraviolet absorber (UV-503, manufactured by Daito Chemical Co., Ltd.): 0.5 parts by mass PGMEA: 19.5 parts by mass
- Blue pigment dispersion 44.9 parts by mass Resin 4 (40% by mass PGMEA solution): 2.1 parts by mass Polymerizable compound 1: 1.5 parts by mass Polymerizable compound 4: 0.7 parts by mass Photopolymerization initiator 1 : 0.8 parts by mass Surfactant 1: 4.2 parts by mass PGMEA: 45.8 parts by mass
- composition for forming infrared transmission filter The components in the following composition were mixed, stirred, and then filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) having a pore size of 0.45 ⁇ m to prepare an infrared transmitting filter forming composition.
- Pigment dispersion liquid 1-1 46.5 parts by mass Pigment dispersion liquid 1-2: 37.1 parts by mass Polymerizable compound 5: 1.8 parts by mass Resin 4:1.1 parts by mass Photopolymerization initiator 2: 0. 9 parts by mass Surfactant 1:4.2 parts by mass Polymerization inhibitor (p-methoxyphenol): 0.001 parts by mass Silane coupling agent: 0.6 parts by mass PGMEA: 7.8 parts by mass
- Pigment dispersion 2-1 1,000 parts by weight
- Polymerizable compound dipentaerythritol hexaacrylate
- Resin 17 parts by weight
- Photopolymerization initiator (1-[4-(phenylthio)]-1,2- Octanedione-2-(O-benzoyloxime)
- PGMEA 179 parts by mass
- Alkali-soluble polymer FA-1 17 parts by mass (solid content concentration 35 parts by mass)
- This polymer had a polystyrene equivalent weight average molecular weight of 9,700, a number average molecular weight of 5,700, and an Mw/Mn of 1.70.
- Raw materials used for the Red composition, the Green composition, the Blue composition, and the composition for forming an infrared transmission filter are as follows.
- Red pigment dispersion C.I. I. Pigment Red 254, 9.6 parts by mass, C.I. I. Pigment Yellow 139 (4.3 parts by mass), a dispersant (Disperbyk-161, manufactured by BYK Chemie) 6.8 parts by mass, and PGMEA (79.3 parts by mass) in a bead mill (zirconia beads 0.3 mm diameter). ) was mixed and dispersed for 3 hours to prepare a pigment dispersion liquid.
- a dispersion treatment was further performed using a high pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) equipped with a decompression mechanism at a flow rate of 500 g/min under a pressure of 2,000 kg/cm 3 . This dispersion treatment was repeated 10 times to obtain a Red pigment dispersion liquid.
- NANO-3000-10 manufactured by Nippon BEE Co., Ltd.
- C.I. I. Pigment Green 36, 6.4 parts by mass, C.I. I. Pigment A mixture liquid containing 5.3 parts by mass of Yellow 150, 5.2 parts by mass of a dispersant (Disperbyk-161, manufactured by BYK Chemie), and 83.1 parts by mass of PGMEA was prepared by a bead mill (zirconia beads 0.3 mm diameter). The pigment dispersion was prepared by mixing and dispersing for 3 hours.
- a dispersion treatment was further performed using a high pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) equipped with a decompression mechanism at a flow rate of 500 g/min under a pressure of 2,000 kg/cm 3 . This dispersion treatment was repeated 10 times to obtain a Green pigment dispersion liquid.
- NANO-3000-10 manufactured by Nippon BEE Co., Ltd.
- ⁇ Pigment dispersion 1-1 A mixed solution having the following composition was mixed and dispersed in a bead mill (high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) with a pressure reducing mechanism) for 3 hours using 0.3 mm diameter zirconia beads. Thus, a pigment dispersion liquid 1-1 was prepared.
- Pigment Dispersion Liquid 1-2 was prepared.
- Polymerizable compound 1 KAYARAD DPHA (mixture of dipentaerythritol hexaacrylate and dipentaerythritol pentaacrylate, manufactured by Nippon Kayaku Co., Ltd.)
- Polymerizable compound 4 the following structure
- Polymerizable compound 5 the following structure (a mixture of the left side compound and the right side compound in a molar ratio of 7:3)
- Photoinitiator 1 IRGACURE-OXE01 (1-[4-(phenylthio)]-1,2-octanedione-2-(O-benzoyloxime), manufactured by BASF) -Photopolymerization initiator 2: the following structure
- -Silane coupling agent a compound having the following structure.
- Et represents an ethyl group.
- Cured product 2 Pattern edge part of the cured product 4: Support (wafer)
- L 1 exposed area
- L 2 unexposed area
- T length of cut at the bottom of the pattern edge of the cured product
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Abstract
Description
また、特許文献2には、電着塗料組成物であって、アクリル酸、メタクリル酸、マレイン酸などからなる群から選択されたカルボン酸化合物 0.5~30質量%、特定の構造のグリシジルアクリレート又はグリシジルメタクリレートと第四級アンモニウム塩の反応物 0.5~30質量%、炭素数2~5のヒドロキシアルキルアクリレートとヒドロキシアルキルメタクリレートからなる群から選択された少なくとも一つの水酸基を含有するモノマー 10~40質量%、炭素数2~5のアルキルアクリレートとアルキルメタクリレートからなる群から選択された不飽和モノマー10~70質量%を60~120℃で反応させて得られた重量平均分子量が3,000~30,00であり、1~2.5μmの乾燥塗膜の厚さとした際に3.0-6.0の誘電率を有するアクリレート共重合体 10~15質量%、及び、アントラキノン系顔料とフタロシアニン系顔料から選択される平均粒子径20~150nmの顔料 1~5質量%を含む電着塗料組成物が記載されている。
本発明の目的は、支持体との密着性に優れた膜が形成される硬化性組成物を提供することである。また、上記硬化性組成物から形成された膜、カラーフィルタ、上記硬化性組成物を用いたカラーフィルタの製造方法、上記膜又は上記カラーフィルタを含む固体撮像素子及び画像表示装置、新規な高分子化合物を提供することである。
<1> 顔料、並びに、下記条件1及び下記条件2の少なくとも一方を満たす樹脂を含む
硬化性組成物;
条件1:上記樹脂が、アニオン構造、上記アニオン構造とイオン結合する第四級アンモニウムカチオン構造、及び、ラジカル重合性基を同一の側鎖に有する構成単位を含む;
条件2:上記樹脂が、第四級アンモニウムカチオン構造、及び、ラジカル重合性基が連結された基を側鎖に有する構成単位を含む。
<2> 上記樹脂が下記式(A1)で表される構成単位、及び、下記式(B1)で表される構成単位の少なくとも一方を含む、<1>に記載の硬化性組成物。
式(B1)中、RB1は水素原子又はアルキル基を表し、LB1は2価の連結基を表し、RB2及びRB3はそれぞれ独立に、アルキル基を表し、LB2はnB+1価の連結基を表し、LB3は2価の連結基を表し、RB4は水素原子又はアルキル基を表し、nBは1以上の整数を表し、nBが2以上の場合には、2以上のLB3及び2以上のRB4はそれぞれ同一であってもよいし異なっていてもよく、RB2、RB3、LB1及びLB2のうち少なくとも2つが結合して環を形成してもよい。
<3> 上記式(A1)中のnAが1であり、LA2及びLA3の結合が下記式(C1)~下記式(C4)により表される基のうちいずれか1つを表すか、又は、上記式(B1)中のnBが1であり、LB2及びLB3が下記式(C1)~下記式(C4)により表される基のうちいずれか1つを表す、<2>に記載の硬化性組成物;
<4> 上記樹脂における、式(A1)で表される構成単位、及び、式(B1)で表される構成単位の含有量が、1質量%~60質量%である、<1>~<3>のいずれか1つに記載の硬化性組成物。
<5> 上記樹脂が、ラジカル重合性基を有し、かつ、式(A1)で表される構成単位、及び、式(B1)で表される構成単位とは異なる構成単位Dを更に含む、<1>~<4>のいずれか1つに記載の硬化性組成物。
<6> 上記樹脂が、上記構成単位Dとして、下記式(D1)で表される構成単位を更に含む、<5>に記載の硬化性組成物。
<7> 上記樹脂が下記式(D5)で表される構成単位を更に含む、<1>~<6>のいずれか1つに記載の硬化性組成物。
<8> 光重合開始剤として、オキシム化合物を含む、<1>~<7>のいずれか1つに記載の硬化性組成物。
<9> 重合性化合物を更に含む、<1>~<8>のいずれか1つに記載の硬化性組成物。
<10> カラーフィルタの着色層又は赤外線吸収層形成用である、<1>~<9>のいずれか1つに記載の硬化性組成物。
<11> <1>~<10>のいずれか1つに記載の硬化性組成物から形成された膜。
<12> <1>~<10>のいずれか1つに記載の硬化性組成物から形成されたカラーフィルタ。
<13> <1>~<10>のいずれか1つに記載の硬化性組成物を支持体上に適用して組成物層を形成する工程と、
上記組成物層をパターン状に露光する工程と、
未露光部を現像除去して着色パターンを形成する工程と、を含む
カラーフィルタの製造方法。
<14> <1>~<10>のいずれか1つに記載の硬化性組成物を支持体上に適用して組成物層を形成し、上記組成物層を硬化して硬化層を形成する工程と、
上記硬化層上にフォトレジスト層を形成する工程と、
露光及び現像することにより上記フォトレジスト層をパターニングしてレジストパターンを得る工程と、
上記レジストパターンをエッチングマスクとして上記硬化層をエッチングする工程と、を含む、
カラーフィルタの製造方法。
<15> <11>に記載の膜又は<12>に記載のカラーフィルタを含む固体撮像素子。
<16> <11>に記載の膜又は<12>に記載のカラーフィルタを含む画像表示装置。
<17> 下記式(A1)で表される構成単位、及び、下記式(B1)で表される構成単位の少なくとも一方を含む、高分子化合物;
式(B1)中、RB1は水素原子又はアルキル基を表し、LB1は2価の連結基を表し、RB2及びRB3はそれぞれ独立に、アルキル基を表し、LB2はnB+1価の連結基を表し、LB3は2価の連結基を表し、RB4は水素原子又はアルキル基を表し、nBは1以上の整数を表し、nBが2以上の場合には、2以上のLB3及び2以上のRB4はそれぞれ同一であってもよいし異なっていてもよく、RB2、RB3、LB1及びLB2のうち少なくとも2つが結合して環を形成してもよい。
<18> 上記式(A1)中のnAが1であり、LA2及びLA3の結合が下記式(C1)~下記式(C4)により表される基のうちいずれか1つを表すか、又は、上記式(B1)中のnBが1であり、LB2及びLB3が下記式(C1)~下記式(C4)により表される基のうちいずれか1つを表す、<17>に記載の高分子化合物;
本明細書において、「~」とはその前後に記載される数値を下限値及び上限値として含む意味で使用される。
本明細書における基(原子団)の表記において、置換及び無置換を記していない表記は、置換基を有さない基(原子団)と共に置換基を有する基(原子団)をも包含する。例えば、「アルキル基」とは、置換基を有さないアルキル基(無置換アルキル基)のみならず、置換基を有するアルキル基(置換アルキル基)をも包含する。
本明細書において「露光」とは、特に断らない限り、光を用いた露光のみならず、電子線、イオンビーム等の粒子線を用いた描画も露光に含める。また、露光に用いられる光としては、水銀灯の輝線スペクトル、エキシマレーザに代表される遠紫外線、極紫外線(EUV光)、X線、電子線等の活性光線又は放射線が挙げられる。
本明細書において、「(メタ)アクリレート」は、アクリレート及びメタクリレートの双方、又は、いずれかを表し、「(メタ)アクリル」は、アクリル及びメタクリルの双方、又は、いずれかを表し、「(メタ)アクリロイル」は、アクリロイル及びメタクリロイルの双方、又は、いずれかを表す。
本明細書において、構造式中のMeはメチル基を表し、Etはエチル基を表し、Buはブチル基を表し、Phはフェニル基を表す。
本明細書において、重量平均分子量(Mw)及び数平均分子量(Mn)は、GPC(ゲルパーミエーションクロマトグラフィ)法により測定したポリスチレン換算値である。
本明細書において、近赤外線とは、波長700~2,500nmの光をいう。
本明細書において、固形分とは、組成物の全成分から溶剤を除いた成分の質量をいう。
本明細書において、顔料とは、溶剤に対して溶解しにくい化合物を意味する。例えば、顔料は、23℃の水100g及び23℃のプロピレングリコールモノメチルエーテルアセテート100gに対する溶解度がいずれも0.1g以下であることが好ましく、0.01g以下であることがより好ましい。
本明細書において「工程」との語は、独立した工程だけではなく、他の工程と明確に区別できない場合であってもその工程の所期の作用が達成されれば、本用語に含まれる。
本明細書において、特段の記載がない限り、組成物は、組成物に含まれる各成分として、その成分に該当する2種以上の化合物を含んでもよい。また、特段の記載がない限り、組成物における各成分の含有量とは、その成分に該当する全ての化合物の合計含有量を意味する。
本明細書において、特段の記載がない限り、構造式中の波線部又は*(アスタリスク)は他の構造との結合部位を表す。
本明細書において、好ましい態様の組み合わせは、より好ましい態様である。
本発明の硬化性組成物は、
顔料、並びに、下記条件1及び下記条件2の少なくとも一方を満たす樹脂(以下、「特定樹脂」ともいう。)を含む。
条件1:上記樹脂が、アニオン構造、上記アニオン構造とイオン結合する第四級アンモニウムカチオン構造、及び、ラジカル重合性基を同一の側鎖に有する構成単位を含む;
条件2:上記樹脂が、第四級アンモニウムカチオン構造、及び、ラジカル重合性基が連結された基を側鎖に有する構成単位を含む。
この第四級アンモニウム構造同士の静電相互作用により、第四級アンモニウムカチオン構造と同一の側鎖に含まれるラジカル重合性基の重合において、特定樹脂の分子内でのラジカル重合性基の重合(分子内架橋)が抑制され、例えば、特定樹脂の分子間など、ある特定樹脂分子と、他の特定樹脂分子との間での重合(分子間架橋)が起こりやすいため、支持体との密着性に優れた膜が得られると推測される。
ここで、特許文献1及び2のいずれの文献にも、上述の条件1及び条件2の少なくとも一方を満たす樹脂を含む硬化性組成物については、記載も示唆もない。
また、本発明の硬化性組成物が、後述する重合性化合物を更に含む場合、上述の第四級アンモニウム構造同士の静電相互作用により、樹脂同士の重合よりも、樹脂と重合性化合物との間での重合が更に起こりやすいため、硬化性組成物の硬化性に優れやすく、硬化性組成物を硬化して得られるパターンのパターン形状に更に優れやすいと考えられる。
本発明の硬化性組成物が特定樹脂を含むことにより、硬化性組成物の保存安定性も向上しやすい。これは、上述の静電相互作用により、顔料の凝集が抑制される等の理由によるものであると推測される。
本発明の硬化性組成物が特定樹脂を含むことにより、上記パターンの形成時における現像残渣の発生が抑制されやすい。これは、側鎖に上記第四級アンモニウム構造を含むことにより特定樹脂の親水性が向上し、現像残渣が除去されやすいためであると推測される。
本発明の硬化性組成物が特定樹脂を含むことにより、引き置き欠陥が抑制されやすい。「引き置き欠陥」とは、硬化性組成物を支持体等に付与して組成物層を形成した後、露光、現像等によるパターニングまである程度の期間(例えば、12時間~3日間等)が経過した場合に、得られるパターンに欠陥(例えば、組成物層に粒状の凝集物が時間経過で発生する。このような成分は現像除去が難しい為、支持体上に残留し欠陥となる等)が認められるという現象である。本発明の硬化性組成物においては、上述の静電相互作用により、上記組成物層においても顔料の凝集の発生が抑制されるため、引き置き欠陥が抑制されやすいと推測される。
また、本発明の硬化性組成物は、固体撮像素子用の硬化性組成物として好ましく用いることができ、固体撮像素子に用いられるカラーフィルタの画素形成用の硬化性組成物としてより好ましく用いることができる。
また、本発明の硬化性組成物は、表示装置用の硬化性組成物として好ましく用いることもでき、表示装置に用いられるカラーフィルタの画素形成用の着色組成物としてより好ましく用いることができる。
また、本発明の硬化性組成物は、カラーマイクロレンズの形成用の組成物として用いることもできる。カラーマイクロレンズの製造方法としては、特開2018-010162号公報に記載された方法などが挙げられる。
本発明の硬化性組成物は、顔料を含有する。
顔料としては、白色顔料、黒色顔料、有彩色顔料、透明顔料、近赤外線吸収顔料が挙げられる。なお、本発明において、白色顔料は純白色のみならず、白に近い明るい灰色(例えば灰白色、薄灰色など)の顔料などを含む。
また、顔料は、無機顔料、有機顔料のいずれでもよく、分散安定性をより向上させやすいという理由から有機顔料であることが好ましい。
また、顔料は、波長400~2,000nmの範囲に極大吸収波長を有するものが好ましく、波長400~700nmの範囲に極大吸収波長を有するものがより好ましい。
また、波長400~700nmの範囲に極大吸収波長を有する顔料(好ましくは有彩色顔料)を用いた場合においては、本発明の硬化性組成物は、カラーフィルタにおける着色層又は赤外線吸収層形成用の硬化性組成物として好ましく用いることができる。
着色層としては、例えば、赤色着色層、緑色着色層、青色着色層、マゼンタ色着色層、シアン色着色層、イエロー色着色層などが挙げられる。
有彩色顔料としては、特に限定されず、公知の有彩色顔料を用いることができる。有彩色顔料としては、波長400~700nmの範囲に極大吸収波長を有する顔料が挙げられる。例えば、黄色顔料、オレンジ色顔料、赤色顔料、緑色顔料、紫色顔料、青色顔料などが挙げられる。これらの具体例としては、例えば、以下が挙げられる。
C.I.Pigment Orange(以下、単に「PO」ともいう。) 2,5,13,16,17:1,31,34,36,38,43,46,48,49,51,52,55,59,60,61,62,64,71,73等(以上、オレンジ色顔料)、
C.I.Pigment Red(以下、単に「PR」ともいう。) 1,2,3,4,5,6,7,9,10,14,17,22,23,31,38,41,48:1,48:2,48:3,48:4,49,49:1,49:2,52:1,52:2,53:1,57:1,60:1,63:1,66,67,81:1,81:2,81:3,83,88,90,105,112,119,122,123,144,146,149,150,155,166,168,169,170,171,172,175,176,177,178,179,184,185,187,188,190,200,202,206,207,208,209,210,216,220,224,226,242,246,254,255,264,270,272,279,294(キサンテン系、Organo Ultramarine、Bluish Red),295(アゾ系),296(アゾ系)等(以上、赤色顔料)、
C.I.Pigment Green(以下、単に「PG」ともいう。) 7,10,36,37,58,59,62,63等(以上、緑色顔料)、
C.I.Pigment Violet(以下、単に「PV」ともいう。) 1,19,23,27,32,37,42,60(トリアリールメタン系),61(キサンテン系)等(以上、紫色顔料)、
C.I.Pigment Blue(以下、単に「PB」ともいう。) 1,2,15,15:1,15:2,15:3,15:4,15:6,16,22,29,60,64,66,79,80,87(モノアゾ系),88(メチン/ポリメチン系)等(以上、青色顔料)。
また、本発明の硬化性組成物は、上記緑色顔料と黄色顔料とを同時に含むことも好ましい。この場合の黄色顔料としては、PY 150及び/又はPY 185が好ましく挙げられる。
また、緑色顔料として、1分子中のハロゲン原子数が平均10~14個であり、臭素原子数が平均8~12個であり、塩素原子数が平均2~5個であるハロゲン化亜鉛フタロシアニン顔料を用いることもできる。具体例としては、国際公開第2015/118720号に記載の化合物が挙げられる。また、緑色顔料として中国特許出願公開第106909027号明細書に記載の化合物、リン酸エステルを配位子として有するフタロシアニン化合物などを用いることもできる。
また、青色顔料として、リン原子を有するアルミニウムフタロシアニン化合物を用いることもできる。具体例としては、特開2012-247591号公報の段落0022~0030、特開2011-157478号公報の段落0047に記載の化合物が挙げられる。
また、黄色顔料として、特開2017-201003号公報に記載されている顔料、特開2017-197719号公報に記載されている顔料を用いることができる。
また、黄色顔料として、下記式(I)により表されるアゾ化合物及びその互変異性構造のアゾ化合物よりなる群から選ばれる少なくとも1種のアニオンと、2種以上の金属イオンと、メラミン化合物とを含む金属アゾ顔料を用いることもできる。
赤色顔料として、特開2017-201384号公報に記載の構造中に少なくとも1つ臭素原子が置換したジケトピロロピロール系顔料、特許第6248838号の段落番号0016~0022に記載のジケトピロロピロール系顔料などを用いることもできる。また、赤色顔料として、芳香族環に対して、酸素原子、硫黄原子又は窒素原子が結合した基が導入された芳香族環基がジケトピロロピロール骨格に結合した構造を有する化合物を用いることもできる。このような化合物としては、式(DPP1)により表される化合物であることが好ましく、式(DPP2)により表される化合物であることがより好ましい。
(1)赤色顔料と青色顔料とを含有する態様。
(2)赤色顔料と青色顔料と黄色顔料とを含有する態様。
(3)赤色顔料と青色顔料と黄色顔料と紫色顔料とを含有する態様。
(4)赤色顔料と青色顔料と黄色顔料と紫色顔料と緑色顔料とを含有する態様。
(5)赤色顔料と青色顔料と黄色顔料と緑色顔料とを含有する態様。
(6)赤色顔料と青色顔料と緑色顔料とを含有する態様。
(7)黄色顔料と紫色顔料とを含有する態様。
白色顔料としては、酸化チタン、チタン酸ストロンチウム、チタン酸バリウム、酸化亜鉛、酸化マグネシウム、酸化ジルコニウム、酸化アルミニウム、硫酸バリウム、シリカ、タルク、マイカ、水酸化アルミニウム、ケイ酸カルシウム、ケイ酸アルミニウム、中空樹脂粒子、硫化亜鉛などが挙げられる。白色顔料は、チタン原子を有する粒子が好ましく、酸化チタンがより好ましい。また、白色顔料は、波長589nmの光に対する25℃における屈折率が2.10以上の粒子であることが好ましい。前述の屈折率は、2.10~3.00であることが好ましく、2.50~2.75であることがより好ましい。
黒色顔料としては特に限定されず、公知のものを用いることができる。例えば、カーボンブラック、チタンブラック、グラファイト等が挙げられ、カーボンブラック、チタンブラックが好ましく、チタンブラックがより好ましい。チタンブラックとは、チタン原子を含有する黒色粒子であり、低次酸化チタンや酸窒化チタンが好ましい。チタンブラックは、分散性向上、凝集性抑制などの目的で必要に応じ、表面を修飾することが可能である。例えば、酸化珪素、酸化チタン、酸化ゲルマニウム、酸化アルミニウム、酸化マグネシウム、又は、酸化ジルコニウムでチタンブラックの表面を被覆することが可能である。また、特開2007-302836号公報に表されるような撥水性物質での処理も可能である。黒色顔料として、カラーインデックス(C.I.)Pigment Black 1,7等が挙げられる。チタンブラックは、個々の粒子の一次粒子径及び平均一次粒子径のいずれもが小さいことが好ましい。具体的には、平均一次粒子径が10~45nmであることが好ましい。チタンブラックは、分散物として用いることもできる。例えば、チタンブラック粒子とシリカ粒子とを含み、分散物中のSi原子とTi原子との含有比が0.20~0.50の範囲に調整された分散物などが挙げられる。上記分散物については、特開2012-169556号公報の段落0020~0105の記載を参酌でき、この内容は本明細書に組み込まれる。チタンブラックの市販品の例としては、チタンブラック10S、12S、13R、13M、13M-C、13R-N、13M-T(商品名:三菱マテリアル(株)製)、ティラック(Tilack)D(商品名:赤穂化成(株)製)などが挙げられる。
近赤外線吸収顔料は、有機顔料であることが好ましい。また、近赤外線吸収顔料は、波長700nmを超え1,400nm以下の範囲に極大吸収波長を有することが好ましい。また、近赤外線吸収顔料の極大吸収波長は、1,200nm以下であることが好ましく、1,000nm以下であることがより好ましく、950nm以下であることが更に好ましい。また、近赤外線吸収顔料は、波長550nmにおける吸光度A550と極大吸収波長における吸光度Amaxとの比であるA550/Amaxが0.1以下であるものが好ましく、0.05以下であることがより好ましく、0.03以下であることが更に好ましく、0.02以下であることが特に好ましい。下限は、特に限定はないが、例えば、0.0001以上とすることができ、0.0005以上とすることもできる。上述の吸光度の比が上記範囲であれば、可視光透明性及び近赤外線遮蔽性に優れた近赤外線吸収顔料とすることができる。なお、本発明において、近赤外線吸収顔料の極大吸収波長及び各波長における吸光度の値は、近赤外線吸収顔料を含む硬化性組成物を用いて形成した膜の吸収スペクトルから求めた値である。
透明顔料としては、例えば、酸化チタン、酸化ジルコニウム、シリカ、酸化亜鉛、硫酸バリウム、炭酸バリウム、アルミナホワイト、炭酸カルシウム、ステアリン酸カルシウムなどが挙げられる。
これらの中でも、着色力が小さいものが好ましく、酸化チタン又は酸化ジルコニウムがより好ましく、酸化ジルコニウムが更に好ましい。
本発明の硬化性組成物は、顔料誘導体を含んでもよい。本発明では、顔料と顔料誘導体を併用することも好ましい態様である。顔料誘導体としては、発色団の一部分を、酸基、塩基性基またはフタルイミドメチル基で置換した構造を有する化合物が挙げられる。顔料誘導体を構成する発色団としては、キノリン系骨格、ベンゾイミダゾロン系骨格、ジケトピロロピロール系骨格、アゾ系骨格、フタロシアニン系骨格、アンスラキノン系骨格、キナクリドン系骨格、ジオキサジン系骨格、ペリノン系骨格、ペリレン系骨格、チオインジゴ系骨格、イソインドリン系骨格、イソインドリノン系骨格、キノフタロン系骨格、スレン系骨格、金属錯体系骨格等が挙げられ、キノリン系骨格、ベンゾイミダゾロン系骨格、ジケトピロロピロール系骨格、アゾ系骨格、キノフタロン系骨格、イソインドリン系骨格およびフタロシアニン系骨格が好ましく、アゾ系骨格およびベンゾイミダゾロン系骨格がより好ましい。顔料誘導体が有する酸基としては、スルホ基、カルボキシ基が好ましく、スルホ基がより好ましい。顔料誘導体が有する塩基性基としては、アミノ基が好ましく、三級アミノ基がより好ましい。顔料誘導体の具体例としては、後述の実施例に記載の化合物や、特開2011-252065号公報の段落番号0162~0183に記載された化合物が挙げられる。顔料誘導体の含有量は、顔料100質量部に対して1~30質量部が好ましく、3~20質量部がさらに好ましい。顔料誘導体は、1種のみを用いてもよいし、2種以上を併用してもよい。
本発明の硬化性組成物は、下記条件1及び下記条件2の少なくとも一方を満たす樹脂(特定樹脂)を含む。
条件1:上記樹脂が、アニオン構造、上記アニオン構造とイオン結合する第四級アンモニウムカチオン構造、及び、ラジカル重合性基を同一の側鎖に有する構成単位を含む。
条件2:上記樹脂が、第四級アンモニウムカチオン構造、及び、ラジカル重合性基が連結された基を側鎖に有する構成単位を含む。
条件1又は条件2における側鎖の分子量(分子量分布を有する場合には、重量平均分子量)は50~1500であることが好ましく、100~1000であることがより好ましい。
また、特定樹脂は、付加重合型樹脂であることが好ましく、アクリル樹脂であることがより好ましい。特定樹脂が付加重合型樹脂である場合、条件1又は条件2における側鎖が、付加重合により形成される分子鎖に結合する分子鎖であって、付加重合以外の方法により形成された分子鎖である態様が挙げられる。
上記条件1におけるアニオン構造、上記アニオン構造とイオン結合する第四級アンモニウムカチオン構造、及び、ラジカル重合性基を同一の側鎖に有する構成単位において、アニオン構造と第四級アンモニウムカチオン構造とは、イオン結合していてもよいし、解離していてもよい。
また、条件1における側鎖は、アニオン構造と、第四級アンモニウムカチオン構造と、ラジカル重合性基と、をそれぞれ少なくとも1つ有していればよく、アニオン構造、第四級アンモニウムカチオン構造、及び、ラジカル重合性基よりなる群から選ばれた少なくとも1種を1つの側鎖に複数有していてもよい。
上記条件1におけるアニオン構造としては、特に限定されないが、カルボキシラートアニオン、スルホナートアニオン、ホスホナートアニオン、ホスフィナートアニオン、フェノラートアニオン等の酸基に由来するアニオンが挙げられ、カルボキシラートアニオンが好ましい。
また、上記条件1におけるアニオン構造は、樹脂の主鎖に直結していてもよい。例えば、アクリル樹脂におけるアクリル酸に由来する構成単位に含まれるカルボキシ基(側基、side group)がアニオン化した場合に、樹脂の主鎖に直結したアニオン構造となる。
また、アニオン構造と第四級アンモニウムカチオン構造が結合した場合の主鎖と第四級アンモニウムカチオン構造との距離(原子数)は、4~70元素が好ましく、4~50元素がより好ましく、4~30元素が更に好ましい。
本明細書において、高分子化合物中の2つの構造の距離とは、2つの構造を最短で結ぶ連結基の原子数をいう。
第四級アンモニウムカチオン構造とラジカル重合性基との距離は、2~30元素が好ましく、3~20元素がより好ましく、4~15元素が更に好ましい。
ラジカル重合性基と主鎖との距離は、6~100元素が好ましく、6~70元素がより好ましく、6~50元素が更に好ましい。
上記条件1における第四級アンモニウムカチオン構造としては、窒素原子に結合する4つの炭素原子が含まれる4つの基のうち、少なくとも3つが炭化水素基である構造が好ましく、少なくとも3つがアルキル基であることがより好ましい。
上記窒素原子に結合する4つの炭素原子を含む4つの基のうち、少なくとも1つはラジカル重合性基との結合部位を含む連結基である。上記連結基は、2価~6価の連結基であることが好ましく、2価~4価の連結基であることがより好ましく、2価又は3価の連結基であることがより好ましい。上記連結基としては、後述の式(A1)におけるLA2により表される基が挙げられる。
また、上記窒素原子に結合する4つの炭素原子を含む4つの基のうち、1つのみが上記連結基であることが好ましい。
上記4つの炭素原子を含む4つの基のうち、2つ又は3つが炭素数1~4のアルキル基であることが好ましく、2つが炭素数1~4のアルキル基であり、かつ、残りの2つの基のうち、1つが炭素数4~20の炭化水素基であることが好ましい。また、上記2つ又は3つのアルキル基は同一の基であってもよいし、異なる基であってもよい。
上記炭素数1~4のアルキル基としては、メチル基又はエチル基であることが好ましく、メチル基であることがより好ましい。
上記炭素数4~20の炭化水素基としては、炭素数4~20のアルキル基、又は、ベンジル基が好ましい。
上記条件1において、側鎖が複数の第四級アンモニウムカチオン構造を含む場合、第四級アンモニウムカチオン構造同士は連結基を介して結合しており、第四級アンモニウムカチオン構造同士が環構造を形成していてもよい。形成される環構造としては、下記式により表される環構造が挙げられる。下記式において、*はラジカル重合性基との結合部位を含む連結基との結合部位を表す。
ラジカル重合性基としては、エチレン性不飽和基を有する基が好ましい。エチレン性不飽和基を有する基としては、ビニル基、(メタ)アリル基、(メタ)アクリルアミド基、(メタ)アクリロキシ基、ビニルフェニル基などが挙げられ、反応性の観点からは(メタ)アクリロキシ基又はビニルフェニル基が好ましく、(メタ)アクリロキシ基がより好ましい。
上記条件2における側鎖において、第四級アンモニウムカチオン構造と、ラジカル重合性基とは連結されている。すなわち、1つの側鎖が少なくとも1つの第四級アンモニウムカチオン構造と、少なくとも1つのラジカル重合性基と、の両方を有する。
上記条件2における側鎖は、第四級アンモニウムカチオン構造と、ラジカル重合性基と、をそれぞれ少なくとも1つ有していればよく、第四級アンモニウムカチオン構造、及び、ラジカル重合性基よりなる群から選ばれた少なくとも1種を1つの側鎖に複数有していてもよい。
また、主鎖と第四級アンモニウムカチオン構造との距離(原子数)は、4~20元素が好ましく、4~15元素がより好ましく、4~10元素が最も好ましい。
第四級アンモニウムカチオン構造と重合性基との距離は、2~30元素が好ましく、3~20元素がより好ましく、4~15元素が更に好ましい。
重合性基と主鎖との距離は、6~50元素が好ましく、6~30元素がより好ましく、6~20元素が更に好ましい。
上記条件2における第四級アンモニウムカチオン構造としては、窒素原子に結合する4つの炭素原子を含む4つの基のうち、少なくとも2つが炭化水素基である構造が好ましく、少なくとも2つがアルキル基であることがより好ましい。
上記炭化水素基としては、アルキル基又はアリール基が好ましく、アルキル基又はフェニル基がより好ましい。
上記アルキル基としては、炭素数1~4のアルキル基が好ましく、メチル基又はエチル基であることがより好ましく、メチル基であることが更に好ましい。また、上記2つのアルキル基は同一の基であってもよいし、異なる基であってもよい。
上記窒素原子に結合する4つの炭素原子を含む4つの基のうち、少なくとも1つはラジカル重合性基との結合部位を含む連結基であり、少なくとも1つは特定樹脂における主鎖との結合部位を含む連結基である。
上記ラジカル重合性基との連結基は、2価~6価の連結基であることが好ましく、2価~4価の連結基であることがより好ましく、2価又は3価の連結基であることがより好ましい。上記連結基としては、後述の式(B1)におけるLB2により表される基が挙げられる。
上記特定樹脂における主鎖との結合部位を含む連結基は、2価の連結基であることが好ましい。上記連結基としては、後述の式(B1)におけるLB1により表される基が挙げられる。
上記条件2における第四級アンモニウムカチオン構造の対アニオンは、特定樹脂中に存在してもよいし、硬化性組成物に含まれる他の成分中に存在してもよいが、特定樹脂中に存在することが好ましい。
ラジカル重合性基としては、エチレン性不飽和基を有する基が好ましい。エチレン性不飽和基を有する基としては、ビニル基、(メタ)アリル基、(メタ)アクリルアミド基、(メタ)アクリロキシ基、ビニルフェニル基などが挙げられ、反応性の観点からは(メタ)アクリロキシ基又はビニルフェニル基が好ましく、(メタ)アクリロキシ基がより好ましい。
上記樹脂は、下記式(A1)で表される構成単位、及び、下記式(B1)で表される構成単位の少なくとも一方を含むことが好ましい。
下記式(A1)で表される構成単位を含む樹脂は、条件1を満たす樹脂であり、下記式(B1)で表される構成単位を含む樹脂は、条件2を満たす樹脂である。
式(B1)中、RB1は水素原子又はアルキル基を表し、LB1は2価の連結基を表し、RB2及びRB3はそれぞれ独立に、アルキル基を表し、LB2はnB+1価の連結基を表し、LB3は2価の連結基を表し、RB4は水素原子又はアルキル基を表し、nBは1以上の整数を表し、nBが2以上の場合には、2以上のLB3及び2以上のRB4はそれぞれ同一であってもよいし異なっていてもよく、RB2、RB3、LB1及びLB2のうち少なくとも2つが結合して環を形成してもよい。
式(A1)中、AA1は酸基からプロトンが乖離した基を含む構造を表し、酸基としてはカルボキシ基、スルホ基、リン酸基、ホスホン酸基、フェノール性ヒドロキシ基が挙げられ、カルボキシ基が好ましい。AA1に含まれる酸基は1つであっても複数であってもよく、1つであることが好ましい。また、AA1における酸基は、式(A1)中のRA1が結合した炭素原子と直接結合してもよいし、連結基を介して結合してもよい。上記連結基としては、炭化水素基、エーテル結合(-O-)、エステル結合(-COO-)、アミド結合(-CONH-)及び、これらが2以上結合した基が好ましい。上記炭化水素基としては、2価の炭化水素基が挙げられ、アルキレン基又はアリーレン基が好ましく、炭素数1~20のアルキレン基又はフェニレン基がより好ましい。また、本明細書において、特段の記載がない限り、アミド結合における水素原子はアルキル基、アリール基等の公知の置換基により置換されていてもよい。
式(A1)中、RA2及びRA3はそれぞれ独立に、アルキル基であることが好ましく、炭素数1~10のアルキル基がより好ましく、炭素数1~4のアルキル基がより好ましく、メチル基又はエチル基が更に好ましく、メチル基が特に好ましい。
式(A1)中、RA2又はRA3がアラルキル基である場合、炭素数7~22のアラルキル基が好ましく、炭素数7~10のアラルキル基がより好ましく、ベンジル基が更に好ましい。
式(A1)中、LA1はmAが2以上である場合、mA価の炭化水素基が好ましく、飽和脂肪族炭化水素、芳香族炭化水素、又はこれらが2以上結合した構造からmA個の水素原子を除いた基がより好ましい。mAが1である場合、LA1はアルキル基、アリール基、又は、アラルキル基が好ましく、炭素数4~20のアルキル基、又は、ベンジル基がより好ましい。
式(A1)中、LA2は後述する式(C1-1)~式(C4-1)により表される基のうちいずれか1つであることが好ましい。
式(A1)中、LA3はエーテル結合(-O-)、エステル結合(-COO-)、アミド結合(-NHCO-)、アルキレン基、又は、アリーレン基が好ましく、エステル結合又はフェニレン基がより好ましい。
式(A1)中、RA4は水素原子又は炭素数1~4のアルキル基が好ましく、水素原子又はメチル基がより好ましい。
式(A1)中、nAは1~10であることが好ましく、1~4であることがより好ましく、1又は2であることが更に好ましく、1であることが特に好ましい。
式(A1)中、mAは1~10であることが好ましく、1~4であることがより好ましく、1~3であることが更に好ましい。
式(B1)中、LB1は2価の連結基を表し、炭化水素基、エーテル結合(-O-)、エステル結合(-COO-)、アミド結合(-CONH-)及び、これらが2以上結合した基が好ましい。上記炭化水素基としては、2価の炭化水素基が挙げられ、アルキレン基又はアリーレン基が好ましく、炭素数1~20のアルキレン基又はフェニレン基がより好ましい。
式(B1)中、RB2及びRB3はそれぞれ独立に、炭素数1~10のアルキル基が好ましく、炭素数1~4のアルキル基がより好ましく、メチル基又はエチル基が更に好ましく、メチル基が特に好ましい。
式(B1)中、LB2は後述する式(C1-1)~式(C4-1)により表される基のうちいずれか1つであることが好ましい。
式(B1)中、LB3はエーテル結合(-O-)、エステル結合(-COO-)、アミド結合(-NHCO-)、アルキレン基、又は、アリーレン基が好ましく、エステル結合又はフェニレン基がより好ましい。
式(B1)中、nBは1~10であることが好ましく、1~4であることがより好ましく、1又は2であることが更に好ましく、1であることが特に好ましい。
また、式(C3-1)におけるLC21は、式(C3-1)中のシクロヘキサン環のいずれの炭素原子に結合してもよいことを表している。
式(C1-1)又は式(C2-1)中、nC1は1~10であることが好ましく、1~4であることが好ましく、1又は2であることがより好ましい。
式(C3-1)中、nC2は1~10であることが好ましく、1~4であることが好ましく、1又は2であることがより好ましい。
式(C4-1)中、nC3は1~10であることが好ましく、1~4であることが好ましく、1又は2であることがより好ましい。
式(A1)において、LA2が式(C4-1)により表される基である場合、LA3はフェニレン基であることが好ましい。
式(B1)において、LB2が式(C1-1)、式(C2-1)又は式(C3-1)により表される基である場合、LB3はエステル結合であることが好ましい。
式(B1)において、LB2が式(C4-1)により表される基である場合、LB3はフェニレン基であることが好ましい。
また、式(C3)におけるLC2は、式(C3)中のシクロヘキサン環のいずれの炭素原子に結合してもよいことを表している。
式(C3)中、LC2は2価の炭化水素基、エーテル結合、エステル結合、又は、これらが2以上結合した基が好ましく、アルキレン基、アリーレン基、エーテル結合、エステル結合、又は、これらが2以上結合した基がより好ましく、炭素数1~20のアルキレン基、フェニレン基、エーテル結合、又は、これらが2以上結合した基がより好ましい。
式(C4)中、LC3は2価の炭化水素基、エーテル結合、エステル結合、又は、これらが2以上結合した基が好ましく、アルキレン基、アリーレン基、エーテル結合、エステル結合、又は、これらが2以上結合した基がより好ましく、炭素数1~20のアルキレン基がより好ましい。
具体的には、第四級アンモニウムカチオン構造を有する構成単位に含まれる上述の式(C1)で表される構造が、上述の式(C2)で表される構造となっていてもよい。式(A1-1-1’)のような構造は、一例としては、アミン化合物と、エポキシ基及びアクリロイル基を有する化合物との反応において、構造異性体として存在する。
また特定樹脂は、式(B1)で表される構成単位を、1種単独で有していても、2種以上を有していてもよい。
式(A1)で表される構成単位、及び、式(B1)で表される構成単位の含有量(2種以上含む場合は、合計含有量)は、特定樹脂の全質量に対し、1質量%~60質量%であることが好ましく、5質量%~40質量%であることがより好ましく、5~20質量%であることが更に好ましい。
特定樹脂は、ラジカル重合性基を有し、かつ、式(A1)で表される構成単位、及び、式(B1)で表される構成単位とは異なる構成単位Dを更に含むことも好ましい。
構成単位Dにおけるラジカル重合性基としては、エチレン性不飽和基を有する基が好ましい。エチレン性不飽和基を有する基としては、ビニル基、(メタ)アリル基、(メタ)アクリルアミド基、(メタ)アクリロキシ基、ビニルフェニル基などが挙げられ、反応性の観点からは(メタ)アクリロキシ基又はビニルフェニル基が好ましく、(メタ)アクリロキシ基がより好ましい。
特定樹脂は、上記構成単位Dとして、下記式(D1)で表される構成単位を更に含むことが好ましい。
上記効果が得られる理由は不明であるが、以下のように推測される。
式(D1)により表される構成単位を有する樹脂においては、側鎖に極性基である式(D2)、式(D3)又は式(D3’)により表される基を有することにより、組成物中において、上記(メタ)アクリロイル基が動く幅が大きくなり、反応性に優れると考えられる。また、式(D2)、式(D3)又は式(D3’)により表される基を有することにより、樹脂同士の凝集を抑制し、分散性に優れ、より上記(メタ)アクリロイル基が反応しやすくなるため、上記深部硬化性に優れる硬化性組成物が得られやすいと考えられる。
また、式(D1)により表される構成単位を含むことにより、主鎖から離れた位置に式(D2)、式(D3)又は式(D3’)により表される基を介して高反応性の(メタ)アクリロイル基を導入することができる。これにより、樹脂分子内の(メタ)アクリロイル基同士で反応するのではなく、樹脂分子間又は組成物中の他の架橋成分(例えば、重合性化合物など)と反応する確率が高められ、顔料濃度の高い組成物中でも効率良く架橋反応が進行し、深部硬化性及びパターン形状を向上できると考えられる。
また、式(D1)により表される構成単位は、比較的長い側鎖構造を有し、式(D2)、式(D3)又は式(D3’)により表される極性基を側鎖に有するため、顔料への吸着性を高め、かつ、顔料粒子同士の凝集を抑制する立体的な反発性を発現すると考えられる。その結果、顔料の分散性が向上されると考えられる。
更に、特定樹脂が後述する式(D4)により表される構成単位を有することにより、主鎖から離れた位置に吸着性基となるカルボン酸を導入することができ、顔料吸着性を高め分散安定性を向上することができると考えられる。
また、式(D1)により表される構成単位を導入することにより、基板密着性及びパターン形状も、上記深部硬化性に優れることにより、改良され、更に、後述する式(D4)により表される構成単位を有することにより、硬化性組成物の分散安定性が向上されると考えられる。
式(D1)におけるXD1は、深部硬化性の観点から、-COO-又はCONRD6-であることが好ましく、-COO-であることがより好ましい。XD1がアリーレン基である場合、炭素数6~20の2価の芳香族炭化水素基であることが好ましく、フェニレン基又はナフチレン基がより好ましく、フェニレン基が更に好ましい。XD1が-COO-である場合、-COO-における炭素原子が式(D1)中のRD1が結合した炭素原子と結合することが好ましい。XD1が-CONRD6-である場合、-CONRD6-における炭素原子が式(D1)中のRD1が結合した炭素原子と結合することが好ましい。
RD6は、水素原子又はアルキル基であることが好ましく、水素原子であることがより好ましい。
式(D1)におけるRD4は、深部硬化性の観点から、炭化水素基、又は、2以上の炭化水素基とエーテル結合及びエステル結合よりなる群から選ばれた1以上の構造とが結合した基であることが好ましく、炭化水素基、又は、2以上の炭化水素基と1以上のエステル結合とが結合した基であることがより好ましい。
また式(D1)におけるRD4は、アルキレン基、エーテル基、カルボニル基、フェニレン基、シクロアルキレン基、及び、エステル結合よりなる群から選ばれた2以上の基を結合した基であることが好ましく、アルキレン基、エーテル基、及び、エステル結合よりなる群から選ばれた2以上の基を結合した基であることがより好ましい。
また、式(D1)におけるRD4は、深部硬化性の観点から、総原子数2~60の基であることが好ましく、総原子数2~50の基であることがより好ましく、総原子数2~40の基であることが特に好ましい。
更に、深部硬化性の観点から、RD4が、炭化水素基、アルキレンオキシ基、アルキレンカルボニルオキシ基及び下記構造により表されるいずれかの基よりなる群から選ばれた基であり、かつ上記RD5が、アルキレン基、又は、2以上のアルキレン基とエーテル結合及びエステル結合よりなる群から選ばれた1以上の構造とが結合した基であることが特に好ましい。
また、上記式中、LF1及びLF2はそれぞれ独立に、炭化水素基を表し、nは0以上の整数を表す。
LF1及びLF2はそれぞれ独立に、炭素数2~20のアルキレン基である態様も好ましい。
LF1及びLF2は同一の基である態様も好ましい。
nは0~100である態様も好ましい。
式(D1)におけるRD5は、深部硬化性の観点から、2価の連結基であることが好ましく、アルキレン基、又は、2以上のアルキレン基とエーテル結合及びエステル結合よりなる群から選ばれた1以上の構造とが結合した基であることがより好ましく、アルキレンオキシアルキレン基であることが更に好ましく、メチレンオキシ-n-ブチレン基であることが特に好ましい。
また、式(D1)におけるRD5は、深部硬化性の観点から、総原子数2~40の基であることが好ましく、総原子数2~30の基であることがより好ましく、総原子数2~20の基であることが特に好ましい。
式(D1)におけるXD2は、深部硬化性の観点から、酸素原子であることが好ましい。
RD7は、水素原子又はアルキル基であることが好ましく、水素原子であることがより好ましい。
RDは、水素原子であることが好ましい。
上記式(D2)、式(D3)及び式(D3’)において、*がRD4との結合部位であり、波線部がRD5との結合部位であることが好ましい。
式(D2)におけるXD3は、深部硬化性及び分散性の観点から、酸素原子であることが好ましい。
また、LD1が、式(D2)により表される基である場合、深部硬化性及び分散性の観点から、RD4が、エチレン基、n-プロピレン基、イソプロピレン基、n-ブチレン基及びイソブチレン基よりなる群から選ばれた基であり、かつRD5が、エチレン基であることが特に好ましい。
式(D3)又は式(D3’)におけるXD4は、深部硬化性、パターン形状及び現像残渣抑制の観点から、-COO-であることが好ましい。XD4が上記-COO-である場合、-COO-における酸素原子と、Re1が結合した炭素原子と、が結合することが好ましい。
式(D3)又は式(D3’)におけるRe1~Re3は、深部硬化性、パターン形状及び現像残渣抑制の観点から、水素原子であることが好ましい。
また、LD1が、式(D3)又は式(D3’)により表される基である場合、深部硬化性、パターン形状及び現像残渣抑制の観点から、RD4が、炭化水素基、2以上の炭化水素基とエーテル結合及びエステル結合よりなる群から選ばれた1以上の構造とが結合した基、又は、下記構造により表されるいずれかの基であり、かつRD5が、アルキレン基、又は、2以上のアルキレン基とエーテル結合及びエステル結合よりなる群から選ばれた1以上の構造とが結合した基であることが特に好ましい。
また、式(D3)により表される基としては、下記式(D3-1)又は式(D3-2)により表される基が好ましく挙げられる。
また、式(D3-1)、及び、式(D3-2)の構造において、少なくとも一部が、下記式(D3-1)に対する式(D3-1’)、下記式(D3-2)に対する式(D3-2’)で表される構造となっていてもよい。式(D3-1’)のような構造は、一例としては、カルボン酸化合物と、エポキシ基及びアクリロイル基を有する化合物との反応において、構造異性体として存在する。式(D3-2’)のような構造は、一例としては、フェノール化合物と、エポキシ基及びアクリロイル基を有する化合物との反応において、構造異性体として存在する。
式(D1)により表される構成単位の含有量は、現像性、パターン形状、分散安定性、及び、深部硬化性の観点から、特定樹脂の全質量に対し、1~80質量%であることが好ましく、1~70質量%であることがより好ましく、1~60質量%であることが特に好ましい。
特定樹脂は、分散安定性、及び、現像性の観点から、下記式(D4)により表される構成単位を更に有することが好ましい。
式(D4)におけるXD5は、分散安定性の観点から、-COO-又は-CONRB-であることが好ましく、-COO-であることがより好ましい。XD5が-COO-である場合、-COO-における炭素原子が式(D4)中のRD8が結合した炭素原子と結合することが好ましい。XD5が-CONRDB-である場合、-CONRDB-における炭素原子が式(D4)中のRD8が結合した炭素原子と結合することが好ましい。
RBは、水素原子又はアルキル基であることが好ましく、水素原子であることがより好ましい。
式(D4)におけるLD2は、分散安定性の観点から、炭素数1~10の脂肪族炭化水素基、又は、2以上の炭素数1~10の脂肪族炭化水素基と1以上のエステル結合とを結合した基であることが好ましく、炭素数1~10の脂肪族炭化水素基であることが更に好ましく、炭素数1~10のアルキレン基であることが特に好ましい。
式(D4)により表される構成単位の含有量は、現像性、パターン形状、及び、分散安定性の観点から、特定樹脂の全質量に対し、20質量%~80質量%であることが好ましく、20質量%~70質量%であることがより好ましく、20質量%~60質量%であることが特に好ましい。
特定樹脂は、分散安定性の観点から、下記式(D5)により表される構成単位を更に有することが好ましく、分散安定性、及び、現像性の観点から、上記式(D4)により表される構成単位、及び、下記式(D5)により表される構成単位を更に有することがより好ましい。
式(D5)におけるXD6は、分散安定性の観点から、酸素原子であることが好ましい。
RCは、水素原子又はアルキル基であることが好ましく、水素原子であることがより好ましい。
式(D5)におけるLD3は、分散安定性の観点から、総原子数2~30の基であることが好ましく、総原子数3~20の基であることがより好ましく、総原子数4~10の基であることが特に好ましい。
また、式(D5)におけるLD3は、分散安定性の観点から、ウレタン結合又はウレア結合を有する基であることが好ましく、ウレタン結合を有する基であることがより好ましく、アルキレン基とウレタン結合とが結合した基であることが特に好ましい。
上記アルキレンカルボニルオキシ基の炭素数は、分散安定性の観点から、2~30であることが好ましく、3~10であることがより好ましく、5~8であることが特に好ましい。
分散安定性の観点から、pは、1以上の整数であり、3以上の整数であることが好ましい。
また、pは100以下であることが好ましく、60以下であることがより好ましく、40以下であることが特に好ましい。
式(D5)におけるZD1は、分散安定性の観点から、炭素数1~20の脂肪族炭化水素基であることが好ましく、炭素数4~20のアルキル基であることがより好ましく、炭素数6~20のアルキル基であることが特に好ましい。
また、ZD1における上記アルキル基は、分散安定性の観点から、分岐アルキル基であることが好ましい。
また、a個のオキシアルキレンカルボニル構造又はアルキレンオキシ構造とb個のオキシアルキレンカルボニル構造又はアルキレンオキシ構造はランダムに配列していることが好ましい。
式(D5)により表される構成単位の含有量は、現像性、及び、分散安定性の観点から、特定樹脂の全質量に対し、5質量%~80質量%であることが好ましく、5質量%~70質量%であることがより好ましく、5質量%~60質量%であることが特に好ましい。
特定樹脂は、上述した式(A1)、式(B1)、式(D1)、式(D4)及び式(D5)により表される構成単位以外のその他の構成単位を有していてもよい。
その他の構成単位としては、特に制限はなく、公知の構成単位を有することができる。
-重量平均分子量-
特定樹脂の重量平均分子量(Mw)は、1,000以上であることが好ましく、1,000~200,000であることがより好ましく、1,000~100,000であることが特に好ましい。
特定樹脂のエチレン性不飽和結合価は、深部硬化性、パターン形状、及び、基板密着性の観点から、0.01mmol/g~2.5mmol/gであることが好ましく、0.05mmol/g~2.3mmol/gであることがより好ましく、0.1mmol/g~2.2mmol/gであることが更に好ましく、0.1mmol/g~2.0mmol/gであることが特に好ましい。
特定樹脂のエチレン性不飽和結合価は、特定樹脂の固形分1gあたりのエチレン性不飽和基のモル量を表したものであり、実施例に記載の方法により測定される。
特定樹脂の酸価は、現像性の観点からは、30~110mgKOH/gであることが好ましく、40~90mgKOH/gであることがより好ましい。
上記酸価は、実施例に記載の方法により測定される。
特定樹脂のアミン価は、支持体との密着性の観点からは、0.03~0.8mmol/gであることが好ましく、0.1~0.5mmol/gであることがより好ましい。
上記アミン価は、実施例に記載の方法により測定される。
特定樹脂の含有量は、支持体との密着性、及び、保存安定性の観点から、硬化性組成物の全固形分に対して、10~45質量%であることが好ましく、12~40質量%であることがより好ましく、14~35質量%であることが特に好ましい。
また、特定樹脂の含有量は、支持体との密着性、及び、保存安定性の観点から、顔料の含有量100質量部に対して、20~60質量部含有することが好ましく、22~55質量部であることがより好ましく、24~50質量部であることが特に好ましい。
例えば、上記特定樹脂の前駆体を公知の方法により合成した後、高分子反応により、上記式(A1)又は式(B1)により表される構成単位におけるラジカル重合性基を有する基を導入する方法が挙げられる。
上記式(A1)により表される構成単位は、上記特定樹脂の前駆体が有するカルボキシ基と、アミン化合物と、エポキシ基及びアクリロイル基を有する化合物との反応等により導入される。また、上記式(A1)により表される構成単位は、上記特定樹脂の前駆体が有するアミン化合物と、ハロゲノ基及びアクリロイル基を有する化合物との反応により導入される。
上記式(B1)により表される構成単位は、上記特定樹脂の前駆体が有するアミノ基と、エポキシ基及びアクリロイル基を有する化合物との反応により導入される。また、上記式(B1)により表される構成単位は、上記特定樹脂の前駆体が有するアミノ基と、ハロゲノ基及びアクリロイル基を有する化合物との反応により導入される。
上記式(D1)により表される構成単位は、上記特定樹脂の前駆体が有するカルボキシ基と、エポキシ基およびアクリロイル基を有する化合物との反応、ならびに、上記特定樹脂の前駆体が有するヒドロキシ基と、イソシアナト基およびアクリロイル基を有する化合物との反応等により導入される。
これらの合成方法はあくまで一例であり、特定樹脂の合成方法は特に限定されるものではない。
また、特定樹脂が星型高分子化合物、又は、特定末端基を有する星型高分子化合物である場合、これらの高分子化合物は、例えば、特開2007-277514号公報に記載の合成法を参考に合成することができる。
上記特定樹脂の組成を均一化する方法としては、例えば、異なるモノマー種の消費速度を合わせるように反応系内にモノマーを滴下する手法が挙げられる。一般的には、消費速度の遅いモノマー種の反応系内の初期濃度を上げ、消費速度の速いモノマー種を滴下することで反応系内での濃度差を作ることで反応速度を合わすことが可能である。
硬化性組成物の全固形分中における特定樹脂の含有量は、5~50質量%が好ましい。下限は、8質量%以上が好ましく、10質量%以上がより好ましい。上限は、40質量%以下が好ましく、35質量%以下がより好ましく、30質量%以下が更に好ましい。また、硬化性組成物の全固形分中における酸基を有する特定樹脂の含有量は、5~50質量%が好ましい。下限は、10質量%以上が好ましく、15質量%以上がより好ましい。上限は、40質量%以下が好ましく、35質量%以下がより好ましく、30質量%以下が更に好ましい。
本発明の硬化性組成物は、重合性化合物を含有することが好ましい。上述の特定樹脂に該当する化合物は、重合性化合物には該当しないものとする。重合性化合物としては、ラジカル、酸又は熱により架橋可能な公知の化合物を用いることができる。本発明において、重合性化合物は、例えば、エチレン性不飽和基を有する化合物であることが好ましい。エチレン性不飽和基としては、ビニル基、(メタ)アリル基、(メタ)アクリロイル基などが挙げられる。本発明で用いられる重合性化合物は、ラジカル重合性化合物であることが好ましい。
本発明の硬化性組成物は光重合開始剤を含むことが好ましい。光重合開始剤としては、特に制限はなく、公知の光重合開始剤の中から適宜選択することができる。例えば、紫外線領域から可視領域の光線に対して感光性を有する化合物が好ましい。光重合開始剤は、光ラジカル重合開始剤であることが好ましい。
また、本発明において用いられる光重合開始剤の波長365nmにおけるモル吸光係数は、本発明の効果がより得られやすい観点から、1,000L・mol-1・cm-1以上であることが好ましく、3,000L・mol-1・cm-1以上であることがより好ましく、5,000L・mol-1・cm-1以上であることが更に好ましい。また最大値は、特に限定されないが、100,000L・mol-1・cm-1以下であることが好ましい。 光重合開始剤のモル吸光係数は、公知の方法を用いて測定することができる。例えば、分光光度計(Varian社製Cary-5 spectrophotometer)にて、酢酸エチル溶媒を用い、0.01g/Lの濃度で測定することが好ましい。
本発明の硬化性組成物は、その他の樹脂を更に含んでもよい。本発明において、上述の特定樹脂に該当する化合物は、その他の樹脂には該当しないものとする。その他の樹脂は、例えば、顔料などの粒子を硬化性組成物中で分散させる用途やバインダーの用途で配合される。ただし、その他の樹脂のこのような用途は一例であって、このような用途以外の目的で使用することもできる。
本発明の硬化性組成物は、その他の樹脂として酸基を有する樹脂を含むことが好ましい。この態様によれば、硬化性組成物の現像性を向上させることができ、矩形性に優れた画素を形成しやすい。酸基としては、カルボキシ基、リン酸基、スルホ基、フェノール性ヒドロキシ基などが挙げられ、カルボキシ基が好ましい。酸基を有する樹脂は、例えば、アルカリ可溶性樹脂として用いることができる。
本明細書において、構成単位の含有量をモル%で記載する場合には、構成単位はモノマー単位と同義であるものとする。
本発明の硬化性組成物は、分散剤としての樹脂を含むこともできる。分散剤としては、酸性分散剤(酸性樹脂)、塩基性分散剤(塩基性樹脂)が挙げられる。ここで、酸性分散剤(酸性樹脂)とは、酸基の量が塩基性基の量よりも多い樹脂を表す。酸性分散剤(酸性樹脂)は、酸基の量と塩基性基の量の合計量を100モル%としたときに、酸基の量が70モル%以上を占める樹脂が好ましく、実質的に酸基のみからなる樹脂がより好ましい。酸性分散剤(酸性樹脂)が有する酸基は、カルボキシ基が好ましい。酸性分散剤(酸性樹脂)の酸価は、20~180mgKOH/gが好ましく、30~150mgKOH/gがより好ましく、50~100mgKOH/gがさらに好ましい。また、塩基性分散剤(塩基性樹脂)とは、塩基性基の量が酸基の量よりも多い樹脂を表す。塩基性分散剤(塩基性樹脂)は、酸基の量と塩基性基の量の合計量を100モル%としたときに、塩基性基の量が50モル%を超える樹脂が好ましい。塩基性分散剤が有する塩基性基は、アミノ基であることが好ましい。
本発明において用いられる分散剤としては、硬化性基を有する樹脂も好適にあげられる。
上記分散剤における硬化性基としては、エチレン性不飽和基が好ましく、ビニル基、ビニルフェニル基、アリル基、(メタ)アクリロイル基、(メタ)アクリルアミド基、及び、マレイミド基よりなる群から選ばれた少なくとも1種がより好ましく、(メタ)アクリロイル基が更に好ましく、アクリロイル基が特に好ましい。
また、硬化性基を有する樹脂は、硬化性基を側鎖に有することが好ましく、側鎖の分子末端に有することも好ましい。
また、分散剤の好ましい重量平均分子量は、10,000~100,000であることが好ましい。
硬化性基を有する樹脂としては、上述の式(D1)で表される構成単位を含む樹脂が挙げられ、上述の式(D1)で表される構成単位と、上述の式(D4)で表される構成単位及び上述の式(D5)で表される構成単位よりなる群から選ばれた少なくとも1種と、を含む樹脂が好ましく、上述の式(D1)で表される構成単位と、上述の式(D4)で表される構成単位及び上述の式(D5)で表される構成単位を含む樹脂がより好ましい。
また、上記硬化性基を有する樹脂は、上述の条件1及び条件2のいずれをも満たさない樹脂である。
本発明の硬化性組成物がその他の樹脂を含む場合、硬化性組成物の全固形分中におけるその他の樹脂の含有量は、0.5~50質量%が好ましい。下限は、1質量%以上が好ましく、2質量%以上がより好ましい。上限は、40質量%以下が好ましく、35質量%以下がより好ましく、30質量%以下が更に好ましい。また、硬化性組成物の全固形分中における酸基を有する樹脂の含有量は、0.5~50質量%が好ましい。下限は、1質量%以上が好ましく、2質量%以上がより好ましい。上限は、40質量%以下が好ましく、35質量%以下がより好ましく、30質量%以下が更に好ましい。
本発明の硬化性組成物は、環状エーテル基を有する化合物を含有することができる。環状エーテル基としては、エポキシ基、オキセタニル基などが挙げられる。環状エーテル基を有する化合物は、エポキシ基を有する化合物であることが好ましい。エポキシ基を有する化合物としては、1分子内にエポキシ基を1つ以上有する化合物が挙げられ、エポキシ基を2つ以上有する化合物が好ましい。エポキシ基は、1分子内に1~100個有することが好ましい。エポキシ基の数の上限は、例えば、10個以下とすることもでき、5個以下とすることもできる。エポキシ基の数の下限は、2個以上が好ましい。エポキシ基を有する化合物としては、特開2013-011869号公報の段落番号0034~0036、特開2014-043556号公報の段落番号0147~0156、特開2014-089408号公報の段落番号0085~0092に記載された化合物、特開2017-179172号公報に記載された化合物を用いることもできる。これらの内容は、本明細書に組み込まれる。
本発明の硬化性組成物は、シランカップリング剤を含有することができる。この態様によれば、得られる膜の支持体との密着性をより向上させることができる。本発明において、シランカップリング剤は、加水分解性基とそれ以外の官能基とを有するシラン化合物を意味する。また、加水分解性基とは、ケイ素原子に直結し、加水分解反応及び縮合反応の少なくともいずれかによってシロキサン結合を生じ得る置換基をいう。加水分解性基としては、例えば、ハロゲン原子、アルコキシ基、アシルオキシ基などが挙げられ、アルコキシ基が好ましい。すなわち、シランカップリング剤は、アルコキシシリル基を有する化合物が好ましい。また、加水分解性基以外の官能基としては、例えば、ビニル基、(メタ)アリル基、(メタ)アクリロイル基、メルカプト基、エポキシ基、オキセタニル基、アミノ基、ウレイド基、スルフィド基、イソシアネート基、フェニル基などが挙げられ、アミノ基、(メタ)アクリロイル基及びエポキシ基が好ましい。シランカップリング剤の具体例としては、特開2009-288703号公報の段落番号0018~0036に記載の化合物、特開2009-242604号公報の段落番号0056~0066に記載の化合物が挙げられ、これらの内容は本明細書に組み込まれる。
本発明の硬化性組成物は、溶剤を含有することができる。溶剤としては、有機溶剤が挙げられる。溶剤は、各成分の溶解性や硬化性組成物の塗布性を満足すれば基本的には特に制限はない。有機溶剤としては、エステル系溶剤、ケトン系溶剤、アルコール系溶剤、アミド系溶剤、エーテル系溶剤、炭化水素系溶剤などが挙げられる。これらの詳細については、国際公開第2015/166779号の段落番号0223を参酌でき、この内容は本明細書に組み込まれる。また、環状アルキル基が置換したエステル系溶剤、環状アルキル基が置換したケトン系溶剤を好ましく用いることもできる。有機溶剤の具体例としては、ポリエチレングリコールモノメチルエーテル、ジクロロメタン、3-エトキシプロピオン酸メチル、3-エトキシプロピオン酸エチル、エチルセロソルブアセテート、乳酸エチル、ジエチレングリコールジメチルエーテル、酢酸ブチル、3-メトキシプロピオン酸メチル、2-ヘプタノン、シクロヘキサノン、酢酸シクロヘキシル、シクロペンタノン、エチルカルビトールアセテート、ブチルカルビトールアセテート、プロピレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテルアセテート、3-メトキシ-N,N-ジメチルプロパンアミド、3-ブトキシ-N,N-ジメチルプロパンアミドなどが挙げられる。ただし溶剤としての芳香族炭化水素類(ベンゼン、トルエン、キシレン、エチルベンゼン等)は、環境面等の理由により低減したほうがよい場合がある(例えば、有機溶剤全量に対して、50質量ppm(parts per million)以下とすることもでき、10質量ppm以下とすることもでき、1質量ppm以下とすることもできる)。
本発明の硬化性組成物は、重合禁止剤を含有することができる。重合禁止剤としては、ハイドロキノン、p-メトキシフェノール、ジ-tert-ブチル-p-クレゾール、ピロガロール、tert-ブチルカテコール、ベンゾキノン、4,4’-チオビス(3-メチル-6-tert-ブチルフェノール)、2,2’-メチレンビス(4-メチル-6-t-ブチルフェノール)、N-ニトロソフェニルヒドロキシルアミン塩(アンモニウム塩、第一セリウム塩等)が挙げられる。中でも、p-メトキシフェノールが好ましい。硬化性組成物の全固形分中における重合禁止剤の含有量は、0.0001~5質量%が好ましい。
本発明の硬化性組成物は、界面活性剤を含有することができる。界面活性剤としては、フッ素系界面活性剤、ノニオン系界面活性剤、カチオン系界面活性剤、アニオン系界面活性剤、シリコーン系界面活性剤などの各種界面活性剤を使用することができる。界面活性剤については、国際公開第2015/166779号の段落番号0238~0245を参酌でき、この内容は本明細書に組み込まれる。
本発明の硬化性組成物は、上述した顔料以外の他の着色剤を含有してもよい。他の着色剤としては、例えば、染料が挙げられる。
〔染料〕
染料としては特に制限はなく、公知の染料が使用できる。染料は、有彩色染料であってもよく、近赤外線吸収染料であってもよい。有彩色染料としては、ピラゾールアゾ化合物、アニリノアゾ化合物、トリアリールメタン化合物、アントラキノン化合物、アントラピリドン化合物、ベンジリデン化合物、オキソノール化合物、ピラゾロトリアゾールアゾ化合物、ピリドンアゾ化合物、シアニン化合物、フェノチアジン化合物、ピロロピラゾールアゾメチン化合物、キサンテン化合物、フタロシアニン化合物、ベンゾピラン化合物、インジゴ化合物、ピロメテン化合物が挙げられる。また、特開2012-158649号公報に記載のチアゾール化合物、特開2011-184493号公報に記載のアゾ化合物、特開2011-145540号公報に記載のアゾ化合物を用いることもできる。また、黄色染料として、特開2013-054339号公報の段落番号0011~0034に記載のキノフタロン化合物、特開2014-026228号公報の段落番号0013~0058に記載のキノフタロン化合物などを用いることもできる。近赤外線吸収染料としては、ピロロピロール化合物、リレン化合物、オキソノール化合物、スクアリリウム化合物、シアニン化合物、クロコニウム化合物、フタロシアニン化合物、ナフタロシアニン化合物、ピリリウム化合物、アズレニウム化合物、インジゴ化合物及びピロメテン化合物が挙げられる。また、特開2017-197437号公報に記載のスクアリリウム化合物、国際公開第2017/213047号の段落番号0090~0107に記載のスクアリリウム化合物、特開2018-054760号公報の段落番号0019~0075に記載のピロール環含有化合物、特開2018-040955号公報の段落番号0078~0082に記載のピロール環含有化合物、特開2018-002773号公報の段落番号0043~0069に記載のピロール環含有化合物、特開2018-041047号公報の段落番号0024~0086に記載のアミドα位に芳香族環を有するスクアリリウム化合物、特開2017-179131号公報に記載のアミド連結型スクアリリウム化合物、特開2017-141215号公報に記載のピロールビス型スクアリリウム骨格又はクロコニウム骨格を有する化合物、特開2017-082029号公報に記載されたジヒドロカルバゾールビス型のスクアリリウム化合物、特開2017-068120号公報の段落番号0027~0114に記載の非対称型の化合物、特開2017-067963号公報に記載されたピロール環含有化合物(カルバゾール型)、特許第6251530号公報に記載されたフタロシアニン化合物などを用いることもできる。
また、他の着色剤の含有量は、顔料の100質量部に対して5~50質量部であることが好ましい。上限は、45質量部以下であることが好ましく、40質量部以下であることがより好ましい。下限は、10質量部以上であることが好ましく、15質量部以上であることが更に好ましい。
また、本発明の硬化性組成物は他の着色剤を実質的に含有しないこともできる。本発明の硬化性組成物が他の着色剤を実質的に含まない場合、本発明の硬化性組成物の全固形分中における他の着色剤の含有量が0.1質量%以下であることが好ましく、0.05質量%以下であることがより好ましく、含有しないことが特に好ましい。
本発明の硬化性組成物は、紫外線吸収剤を含有することができる。紫外線吸収剤は、共役ジエン化合物、アミノジエン化合物、サリシレート化合物、ベンゾフェノン化合物、ベンゾトリアゾール化合物、アクリロニトリル化合物、ヒドロキシフェニルトリアジン化合物、インドール化合物、トリアジン化合物などを用いることができる。これらの詳細については、特開2012-208374号公報の段落番号0052~0072、特開2013-068814号公報の段落番号0317~0334、特開2016-162946号公報の段落番号0061~0080の記載を参酌でき、これらの内容は本明細書に組み込まれる。紫外線吸収剤の具体例としては、下記構造の化合物などが挙げられる。紫外線吸収剤の市販品としては、例えば、UV-503(大東化学(株)製)などが挙げられる。また、ベンゾトリアゾール化合物としては、ミヨシ油脂製のMYUAシリーズ(化学工業日報、2016年2月1日)が挙げられる。
本発明の硬化性組成物は、酸化防止剤を含有することができる。酸化防止剤としては、フェノール化合物、亜リン酸エステル化合物、チオエーテル化合物などが挙げられる。フェノール化合物としては、フェノール系酸化防止剤として知られる任意のフェノール化合物を使用することができる。好ましいフェノール化合物としては、ヒンダードフェノール化合物が挙げられる。フェノール性ヒドロキシ基に隣接する部位(オルト位)に置換基を有する化合物が好ましい。前述の置換基としては炭素数1~22の置換又は無置換のアルキル基が好ましい。また、酸化防止剤は、同一分子内にフェノール基と亜リン酸エステル基を有する化合物も好ましい。また、酸化防止剤は、リン系酸化防止剤も好適に使用することができる。リン系酸化防止剤としてはトリス[2-[[2,4,8,10-テトラキス(1,1-ジメチルエチル)ジベンゾ[d,f][1,3,2]ジオキサホスフェピン-6-イル]オキシ]エチル]アミン、トリス[2-[(4,6,9,11-テトラ-tert-ブチルジベンゾ[d,f][1,3,2]ジオキサホスフェピン-2-イル)オキシ]エチル]アミン、亜リン酸エチルビス(2,4-ジ-tert-ブチル-6-メチルフェニル)などが挙げられる。酸化防止剤の市販品としては、例えば、アデカスタブ AO-20、アデカスタブ AO-30、アデカスタブ AO-40、アデカスタブ AO-50、アデカスタブ AO-50F、アデカスタブ AO-60、アデカスタブ AO-60G、アデカスタブ AO-80、アデカスタブ AO-330(以上、(株)ADEKA)などが挙げられる。
本発明の硬化性組成物は、酸化剤を含有することができる。
酸化剤には、上述の重合禁止剤としても働く化合物が含まれる場合がある。
酸化剤としては、たとえばキノン化合物、キノジメタン化合物などが挙げられる。キノン化合物としてはベンゾキノン、ナフトキノン、アントラキノン、クロラニル、ジクロロジシアノベンゾキノン(DDQ)などを用いることができる。キノジメタン化合物としては7,7,8,8-テトラシアノキノジメタン(TCNQ)、2-フルオロ-7,7,8,8-テトラシアノキノジメタン(FTCNQ)、2,5-ジフルオロ-7,7,8,8-テトラシアノキノジメタン(F2TCNQ)、テトラフルオロテトラシアノキノジメタン(F4TCNQ)などを用いることができる。
酸化剤は含有する顔料又は染料の最低空軌道(LUMO)よりも低いことが好ましい。酸化剤のLUMOは好ましくは-3.5eV以下であり、より好ましくは-3.8eV以下であり、最も好ましくは-4.0eV以下である。
硬化性組成物の全固形分中における酸化剤の含有量は、0.0001~10質量%であることが好ましく、0.0005~5質量%であることがより好ましく、0.001~1質量%であることが最も好ましい。酸化剤は1種のみを用いてもよく、2種以上を用いてもよい。2種以上を用いる場合は、合計量が上記範囲となることが好ましい。
本発明の硬化性組成物は、必要に応じて、増感剤、硬化促進剤、フィラー、熱硬化促進剤、可塑剤及びその他の助剤類(例えば、導電性粒子、充填剤、消泡剤、難燃剤、レベリング剤、剥離促進剤、香料、表面張力調整剤、連鎖移動剤など)を含有してもよい。これらの成分を適宜含有させることにより、膜物性などの性質を調整することができる。これらの成分は、例えば、特開2012-003225号公報の段落番号0183以降(対応する米国特許出願公開第2013/0034812号明細書の段落番号0237)の記載、特開2008-250074号公報の段落番号0101~0104、0107~0109等の記載を参酌でき、これらの内容は本明細書に組み込まれる。また、本発明の硬化性組成物は、必要に応じて、潜在酸化防止剤を含有してもよい。潜在酸化防止剤としては、酸化防止剤として機能する部位が保護基で保護された化合物であって、100~250℃で加熱するか、又は酸/塩基触媒存在下で80~200℃で加熱することにより保護基が脱離して酸化防止剤として機能する化合物が挙げられる。潜在酸化防止剤としては、国際公開第2014/021023号、国際公開第2017/030005号、特開2017-008219号公報に記載された化合物が挙げられる。潜在酸化防止剤の市販品としては、アデカアークルズGPA-5001((株)ADEKA製)等が挙げられる。
本発明の硬化性組成物の収容容器としては、特に限定はなく、公知の収容容器を用いることができる。また、収容容器として、原材料や硬化性組成物中への不純物混入を抑制することを目的に、容器内壁を6種6層の樹脂で構成する多層ボトルや6種の樹脂を7層構造にしたボトルを使用することも好ましい。このような容器としては例えば特開2015-123351号公報に記載の容器が挙げられる。
また、本発明の硬化性組成物や、イメージセンサを製造するために用いられる組成物の収容容器としては、容器内壁からの金属溶出を防ぎ、組成物の保存安定性を高め、成分変質を抑制する目的で、収容容器の内壁をガラス製やステンレス製などにすることも好ましい。
本発明の硬化性組成物の保存条件としては特に限定はなく、従来公知の方法を用いることができる。また、特開2016-180058号公報に記載された方法を用いることもできる。
本発明の硬化性組成物は、前述の成分を混合して調製できる。硬化性組成物の調製に際しては、全成分を同時に溶剤に溶解及び/又は分散して硬化性組成物を調製してもよいし、必要に応じて、各成分を適宜2つ以上の溶液又は分散液としておいて、使用時(塗布時)にこれらを混合して硬化性組成物を調製してもよい。
本発明の膜は、上述した本発明の硬化性組成物から形成された膜である。
本発明の膜は、本発明の硬化性組成物を硬化してなる硬化膜であることが好ましい。また、本発明の膜は、本発明の硬化性組成物の硬化物よりなる膜であることが好ましい。
本発明の膜は、カラーフィルタ、近赤外線透過フィルタ、近赤外線カットフィルタ、ブラックマトリクス、遮光膜、屈折率調整膜などに用いることができる。例えば、カラーフィルタの着色層として好ましく用いることができる。
本発明の膜の膜厚は、目的に応じて適宜調整できる。例えば、膜厚は、20μm以下が好ましく、10μm以下がより好ましく、5μm以下がさらに好ましい。膜厚の下限は、0.1μm以上が好ましく、0.2μm以上がより好ましく、0.3μm以上がさらに好ましい。
本発明のカラーフィルタは、本発明の硬化性組成物から形成されたカラーフィルタである。本発明のカラーフィルタは、上述した本発明の膜を有することが好ましい。本発明の膜をカラーフィルタに用いる場合においては、顔料として、有彩色顔料を用いることが好ましい。
本発明のカラーフィルタの膜厚は、20μm以下が好ましく、10μm以下がより好ましく、5μm以下がさらに好ましい。膜厚の下限は、0.1μm以上が好ましく、0.2μm以上がより好ましく、0.3μm以上が更に好ましい。本発明のカラーフィルタは、CCD(電荷結合素子)やCMOS(相補型金属酸化膜半導体)などの固体撮像素子や画像表示装置などに用いることができる。
本発明のカラーフィルタの製造方法は、硬化性組成物を支持体上に適用して組成物層を形成する工程(組成物層形成工程)と、上記組成物層をパターン状に露光する工程(露光工程)と、未露光部を現像除去して着色パターンを形成する工程(現像工程)と、を含む。
以下、各工程について説明する。
組成物層形成工程では、本発明の硬化性組成物を用いて、支持体上に硬化性組成物層を形成する。支持体としては、特に限定は無く、用途に応じて適宜選択できる。例えば、ガラス基板、シリコン基板などが挙げられ、シリコン基板であることが好ましい。また、シリコン基板には、電荷結合素子(CCD)、相補型金属酸化膜半導体(CMOS)、透明導電膜などが形成されていてもよい。また、シリコン基板には、各画素を隔離するブラックマトリクスが形成されている場合もある。また、シリコン基板には、上部の層との密着性改良、物質の拡散防止或いは基板表面の平坦化のために下塗り層が設けられていてもよい。
硬化性組成物の付与方法としては、公知の方法を用いることができる。例えば、滴下法(ドロップキャスト);スリットコート法;スプレー法;ロールコート法;回転塗布法(スピンコーティング);流延塗布法;スリットアンドスピン法;プリウェット法(たとえば、特開2009-145395号公報に記載されている方法);インクジェット(例えばオンデマンド方式、ピエゾ方式、サーマル方式)、ノズルジェット等の吐出系印刷、フレキソ印刷、スクリーン印刷、グラビア印刷、反転オフセット印刷、メタルマスク印刷法などの各種印刷法;金型等を用いた転写法;ナノインプリント法などが挙げられる。インクジェットでの適用方法としては、特に限定されず、例えば「広がる・使えるインクジェット-特許に見る無限の可能性-、2005年2月発行、住ベテクノリサーチ」に示された方法(特に115ページ~133ページ)や、特開2003-262716号公報、特開2003-185831号公報、特開2003-261827号公報、特開2012-126830号公報、特開2006-169325号公報などに記載の方法が挙げられる。また、硬化性組成物の塗布方法については、国際公開第2017/030174号、国際公開第2017/018419号の記載を参酌でき、これらの内容は本明細書に組み込まれる。
次に、硬化性組成物層をパターン状に露光する(露光工程)。例えば、硬化性組成物層に対し、ステッパー露光機やスキャナ露光機などを用いて、所定のマスクパターンを有するマスクを介して露光することで、パターン状に露光することができる。これにより、露光部分を硬化することができる。
次に、硬化性組成物層の未露光部を現像除去してパターン(画素)を形成する。硬化性組成物層の未露光部の現像除去は、現像液を用いて行うことができる。これにより、露光工程における未露光部の硬化性組成物層が現像液に溶出し、光硬化した部分だけが残る。現像液としては、下地の素子や回路などにダメージを起さない有機アルカリ現像液が望ましい。現像液の温度は、例えば、20~30℃が好ましい。現像時間は、20~180秒が好ましい。また、残渣除去性を向上するため、現像液を60秒ごとに振り切り、さらに新たに現像液を供給する工程を数回繰り返してもよい。
追加露光処理を行う場合、露光に用いられる光は、波長400nm以下の光であることが好ましい。また、追加露光処理は、韓国公開特許第10-2017-0122130号公報に記載の方法で行ってもよい。
また、画素上の水の接触角は適宜好ましい値に設定することができるが、典型的には、50~110°の範囲である。接触角は、例えば接触角計CV-DT・A型(協和界面科学(株)製)を用いて測定できる。
上記製造方法は、カラーフィルタの画素の製造方法であるが、本発明の硬化性組成物によれば、例えば、カラーフィルタの画素間に設けられるブラックマトリックスも製造される。ブラックマトリックスは、例えば、本発明の硬化性組成物に顔料として黒色顔料を添加したものを用いる以外は、上記画素の製造方法と同様に、パターン露光、現像を行い、更に必要に応じてポストベークを行うことにより製造することができる。
本発明のカラーフィルタの製造方法の第二の態様は、本発明の硬化性組成物を支持体上に適用して組成物層を形成し、上記組成物層を硬化して硬化層を形成する工程(硬化層形成工程)と、上記硬化層上にフォトレジスト層を形成する工程(フォトレジスト層形成工程)と、露光及び現像することにより上記フォトレジスト層をパターニングしてレジストパターンを得る工程(レジストパターン形成工程)と、上記レジストパターンをエッチングマスクとして上記硬化層をエッチングする工程(エッチング工程)と、を含む。
以下、各工程について説明する。
硬化層形成工程においては、本発明の硬化性組成物を、支持体上に付与し、硬化して硬化層を形成する。
支持体としては、上述の組成物層形成工程における支持体が好ましく用いられる。
また、硬化性組成物の付与方法としては、上述の組成物膜形成工程における付与方法が好ましく用いられる。
付与された硬化性組成物の硬化方法としては、特に限定されず、光又は熱により硬化することが好ましい。
光による硬化を行う場合、光としては、硬化性組成物に含まれる開始剤に応じて適宜選択すればよいが、例えば、g線、i線、等の紫外線が好ましく用いられる。露光量は5~1,500mJ/cm2が好ましく、10~1,000mJ/cm2がより好ましく、10~500mJ/cm2が更に好ましい。
熱による硬化を行う場合、加熱温度は、120~250℃であることが好ましく、160~230℃であることがより好ましい。加熱時間は、加熱手段により異なるが、ホットプレート上で加熱する場合、例えば3~30分間が好ましく、オーブン中で加熱する場合、例えば30~90分間が好ましい。
フォトレジスト層形成工程においては、上記硬化層上にフォトレジスト層が形成される。
フォトレジスト層の形成においては、例えば、公知のネガ型又はポジ型の感光性組成物が用いられ、ポジ型の感光性組成物が好ましい。
上記感光性組成物を上記硬化層上に塗布し、必要に応じて乾燥を行うことにより、フォトレジスト層が得られる。
フォトレジスト層の形成方法としては、特に限定されず、公知の方法により行えばよい。
フォトレジスト層の厚さとしては、0.1~3μmが好ましく、0.2~2.5μmがより好ましく、0.3~2μmがより好ましい。
レジストパターン形成工程においては、上記フォトレジスト層をパターン状に露光し、現像することによりレジストパターンが形成される。
上記露光及び現像は、特に限定されず、公知の方法により行われる。
エッチング工程においては、上記レジストパターンを介して上記硬化層がエッチングされる。
エッチング方法としては、特に限定されず、公知の方法により行えばよいが、例えば、ドライエッチングによる方法が挙げられる。
本発明におけるカラーフィルタの製造方法の第二の態様は、上記エッチング工程後、レジストパターンを剥離する工程を更に含んでもよい。
レジストパターンの剥離方法としては、特に限定されず、公知の方法が用いられる。
本発明の固体撮像素子は、上述した本発明の膜又は本発明のカラーフィルタを含む。本発明の固体撮像素子の構成としては、本発明の膜を含み、固体撮像素子として機能する構成であれば特に限定はないが、例えば、以下のような構成が挙げられる。
本発明の画像表示装置は、上述した本発明の膜又は本発明のカラーフィルタを含む。画像表示装置としては、液晶表示装置や有機エレクトロルミネッセンス表示装置などが挙げられる。画像表示装置の定義や各画像表示装置の詳細については、例えば「電子ディスプレイデバイス(佐々木昭夫著、(株)工業調査会、1990年発行)」、「ディスプレイデバイス(伊吹順章著、産業図書(株)平成元年発行)」などに記載されている。また、液晶表示装置については、例えば「次世代液晶ディスプレイ技術(内田龍男編集、(株)工業調査会、1994年発行)」に記載されている。本発明が適用できる液晶表示装置に特に制限はなく、例えば、上記の「次世代液晶ディスプレイ技術」に記載されている色々な方式の液晶表示装置に適用できる。
本発明の高分子化合物は、上述の式(A1)で表される構成単位、及び、上述の式(B1)で表される構成単位の少なくとも一方を含む。
本発明の高分子化合物は、上述の本発明の硬化性組成物における特定樹脂と同様であり、好ましい態様も同様である。
三口フラスコに、モノマー2として濃度(固形分含有量)が50質量%の後述するマクロモノマーB-1溶液、モノマー1としてモノマーA-1、PGMEA(プロピレングリコール1-モノメチルエーテル2-アセタート)を導入し、混合物を得た。
窒素を吹き込みながら、上記混合物を撹拌した。次に、窒素をフラスコ内に流しながら、混合物を75℃まで昇温した。次に、混合物に、ドデシルメルカプタン(0.82g)、次いで、2,2’-アゾビス(2-メチルプロピオン酸メチル)0.43g、以下「V-601」ともいう。)を添加し、重合反応を開始した。
混合物を75℃で2時間加熱した後、更にV-601(0.43g)を混合物に追加した。2時間後、更にV-601(0.43g)を混合物に追加した。
更に2時間反応後、混合物を90℃に昇温し、3時間撹拌した。上記操作により、重合反応は終了した。
反応終了後、空気下でアミン化合物としてジメチルドデシルアミン(F-1)と重合禁止剤として2,2,6,6,-テトラメチルピペリジン1-オキシル(Q-1、TEMPO)を加えた後、反応性化合物として4-ヒドロキシブチルアクリレートグリシジルエーテル(モノマーC-1)を滴下した。
滴下終了後、空気下、90℃、24時間反応を続けた後、酸価測定により反応終了を確認した。得られた混合物に30質量%溶液になるようPGMEAを追加することで樹脂PA-1を得た。
モノマーB-1(溶液中の固形分量)、モノマーA-1、モノマーC-1、F-1及びQ-1の使用量は、後述の表1に記載の通りとした。
得られた特定樹脂PA-1の重量平均分子量は17,200、酸価は70mgKOH/mgであった。
特定樹脂PA-1は、上述の条件1を満たす樹脂であり、また、上述の式(A1)で表される構成単位を有する樹脂である。
各マクロモノマー、及び、樹脂の重量平均分子量(Mw)は、下記測定条件の下、GPC(Gel permeation chromatography)測定により算出した。樹脂の重量平均分子量は表1又は表2に記載した。
装置:HLC-8220GPC(東ソー(株)製)
検出器:示差屈折計(RI検出器)
プレカラム TSKGUARDCOLUMN MP(XL)6mm×40mm(東ソー(株)製)
サンプル側カラム:以下4本を直結〔全て東ソー(株)製〕
TSK-GEL Multipore-HXL-M 7.8mm×300mm
リファレンス側カラム:サンプル側カラムに同じ
恒温槽温度:40℃
移動相:テトラヒドロフラン
サンプル側移動相流量:1.0mL/分
リファレンス側移動相流量:0.3mL/分
試料濃度:0.1質量%
試料注入量:100μL
データ採取時間:試料注入後16分~46分
サンプリングピッチ:300ms(ミリ秒)
また、各樹脂の酸価は水酸化ナトリウム水溶液を用いた中和滴定により求めた。具体的には、得られた樹脂を溶媒に溶解させた溶液に、電位差測定法を用いて水酸化ナトリウム水溶液で滴定し、樹脂の固形1gに含まれる酸のミリモル数を算出し、次に、その値を水酸化カリウム(KOH)の分子量56.1をかけることにより求めた。樹脂の酸価は表1又は表2の「酸価」の欄に記載した。表1又は表2中、酸価の単位は(mgKOH/g)である。
下記方法により、各樹脂のC=C価を測定した。
アルカリ処理により特定樹脂からエチレン性不飽和基部位(例えば、上記特定樹脂の式D1により表される構成単位において、アクリロキシ基を有する場合は、アクリル酸)の低分子成分(a)を取り出し、その含有量を高速液体クロマトグラフィー(HPLC)により測定し、その測定値に基づいて下記式からエチレン性不飽和結合価(C=C価)を算出した。
具体的には、特定樹脂0.1gをテトラヒドロフラン/メタノール混合液(50mL/15mL)に溶解させ、4mol/L水酸化ナトリウム水溶液10mLを加え、40℃で2時間反応させた。反応液を4mol/Lメタンスルホン酸水溶液10.2mLで中和し、その後、イオン交換水5mLとメタノール2mLを加えた混合液を100mLメスフラスコに移液し、メタノールでメスアップすることでHPLC測定サンプルを調製し、以下の条件で測定する。なお、低分子成分(a)の含有量は別途作成した低分子成分(a)の検量線から算出し、エチレン性不飽和結合価は下記式より算出した。特定樹脂のC=C価は表1又は表2の「C=C価」の欄に記載した。表1又は表2中、C=C価の単位は(mmol/g)である。
エチレン性不飽和結合価(mmol/g)=(低分子成分(a)含有量(ppm)/低分子成分(a)の分子量(g/mol))/(調液ポリマーの秤量値(g)×(ポリマー液の固形分濃度(%)/100)×10)
-HPLC測定条件-
測定機器: Agilent-1200(アジレント・テクノロジー(株)製)
カラム: Phenomenex社製 Synergi 4u Polar-RP 80A,250mm×4.60mm(内径)+ガードカラム
カラム温度:40℃
分析時間:15分
流速:1.0mL/min(最大送液圧力:182bar(18.2MPa))
注入量:5μl
検出波長:210nm
溶離液:テトラヒドロフラン(安定剤不含HPLC用)/バッファー溶液(リン酸0.2体積%及びトリエチルアミン0.2体積%を含有するイオン交換水溶液)=55/45(体積%)
なお、本明細書において、体積%は25℃における値である。
試料約 0.5gを精密に量り、酢酸50mL を加えて溶かし、0.1 mol/L 過塩素酸酢酸溶液で電気滴定法(電位差滴定)電位差自動滴定装置(AT-710M;京都電子工業(株)製)を用い、により滴定した。また、同様の方法で空試験を行って補正した。
アミン価=a×5.611/c
a:0.1mol/L 過塩素酸の消費量(mL)
c:試料の量(g)
樹脂のアミン価は表1又は表2の「アミン価」の欄に記載した。表1又は表2中、アミン価の単位は(mmol/g)である。
使用するモノマー1、モノマー2、モノマー3、反応性化合物、アミン化合物、及び、重合禁止剤を表1に記載のものに変更した以外は、PA-1の合成方法と同様の方法によりPA-2~PA-22を合成した。モノマー3を添加する場合、モノマー3はモノマー1及びモノマー2の混合物に更に添加した。
表1中、「含有量」の欄に記載の数値の単位は「g」である。表1中、「-」と記載した成分は使用しなかった。
PA-2~PA-22は、上述の条件1を満たす樹脂であり、また、上述の式(A1)で表される構成単位を有する樹脂である。
表1中、「構成単位A1」の欄の記載は、上述の式(A1-1)~式(A1-17)のいずれかにより表される構成単位であって、各樹脂に含まれる構成単位を示している。
使用するモノマー1、モノマー2、モノマー3、反応性化合物、アミン化合物、及び、重合禁止剤を表1に記載のものに変更した以外は、PA-1の合成方法と同様の方法によりPZ-1を合成した。
樹脂PZ-1は、アミン化合物としてF-8を用いた為四級アンモニウムカチオン構造とラジカル重合性基が連結された構造を形成できず、上述の条件1及び条件2のいずれをも満たさない樹脂である。
〔モノマー1〕
・A-1:アロニックスM-5300、ω-カルボキシ-ポリカプロラクトンモノアクリレート(東亞合成(株)製)
・A-2:ライトエステルHO-MS、2-メタクリロイロキシエチルコハク酸(共栄社化学製)
・A-3:ライトエステルHOA-HH、2-アクリロイロキシエチルヘキサヒドロフタル酸(共栄社化学製)
・A-4:βCEA、β-カルボキシエチルアクリレート(ダイセル・オルネクス製)
・A-5:ビニル安息香酸(東京化成工業(株)製)
・A-6:CB-12-メタクリロイロキシエチルフタル酸(新中村化学工業(株)製)
・A-7:12-methacrylamidododecanoic acid(合成品、公知の方法により合成した。)
・A-8:4-(4-(acryloyloxy)butoxy)benzoic acid(合成品、公知の方法により合成した。)
・A-9:メタクリル酸
・A-10:ビニルスルホン酸(東京化成工業(株)製)
・A-11:ビニルホスホン酸(東京化成工業(株)製)
・A-12:10-(Phosphonooxy)decyl Methacrylate(富士フイルム和光純薬(株)製)
・B-1:下記合成例B1による合成品
・B-2:下記合成例B2による合成品
・B-3:下記合成例B3による合成品
・B-4:ブレンマーPSE1300(日油(株)製)、ステアロキシポリエチレングリコールモノメタクリレート
・B-5:ブレンマー75ANEP-600(日油(株)製)ノニルフェノキシ(エチレングリコール-ポリプロピレングリコール)モノアクリレート
・B-6:ブレンマー50POEP800B(日油(株)製)オクトキシポリエチレングリコール-ポリプロピレングリコールモノメタクリレート
B-1~B-6の少なくとも1種の化合物をモノマー2として用いることにより、上述の式(D5)で表される構成単位が特定樹脂に導入される。
オキシアルキレンカルボニル基からなる構成単位を含有する、モノマー2であるマクロモノマーB-1(単に「B-1」ともいう。)の合成方法を以下に示す。
フラスコに、ε-カプロラクトン(1256.62部、環状化合物に該当する。)、及び、2-エチル-1-ヘキサノール(143.38部、開環重合開始剤に該当する。)を導入し、混合物を得た。次に、窒素を吹き込みながら、上記混合物を撹拌した。
次に、混合物にモノブチル錫オキシド(0.63部)を加え、得られた混合物を90℃に加熱した。6時間後、1H-NMR(nuclear magnetic resonance)を用いて、混合物中における2-エチル-1-ヘキサノールに由来するシグナルが消失したのを確認後、混合物を110℃に加熱した。窒素下にて110℃で2時間重合反応を続けた後、1H-NMRでε-カプロラクトンに由来するシグナルの消失を確認した後、80℃に降温し、上記化合物を含有する混合物に2,6-ジ-t-ブチル-4-メチルフェノール(0.78部)を添加した後、更に、得られた混合物に対して、2-メタクリロイロキシエチルイソシアネート(174.15部)を30分かけて滴下した。滴下終了から1時間後、1H-NMRにて2-メタクリロイロキシエチルイソシアネート(MOI)に由来するシグナルが消失したのを確認後、プロピレングリコールモノメチルエーテルアセテート(PGMEA)(1575.57部)を混合物に添加し、濃度が50質量%のマクロモノマーB-1溶液を得た。マクロモノマーB-1の構造は、1H-NMRにより確認した。得られたマクロモノマーB-1の重量平均分子量は3,000であった。
2-エチル-1-ヘキサノール(143.38g)を、ステアリルアルコール(297.88g)に変更した以外は、B-1の合成と同様にしてB-2を合成した。
B-2の構造(式(B-2)に示した)は、1H-NMRにより確認した。得られたB-2の重量平均分子量は3,400であった。
フラスコに、ε-カプロラクトン(243.45部、環状化合物に該当する。)、δ-バレロラクトン(60.86部、環状化合物に該当する。)、及び、2-エチル-1-ヘキサノール(35.69部、開環重合開始剤に該当する。)を導入し、混合物を得た。次に、窒素を吹き込みながら、上記混合物を撹拌した。
次に、混合物にモノブチル錫オキシド(0.156部)を加え、得られた混合物を90℃に加熱した。6時間後、1H-NMR(nuclear magnetic resonance)を用いて、混合物中における2-エチル-1-ヘキサノールに由来するシグナルが消失したのを確認後、混合物を110℃に加熱した。窒素下にて110℃で12時間重合反応を続けた後、1H-NMRでε-カプロラクトン及びδ-バレロラクトンに由来するシグナルの消失を確認した後、80℃に降温し、上記化合物を含有する混合物に2,6-ジ-t-ブチル-4-メチルフェノール(0.19部)を添加した後、更に、得られた混合物に対して、2-メタクリロイロキシエチルイソシアネート(42.52部)を30分かけて滴下した。滴下終了から1時間後、1H-NMRにて2-メタクリロイロキシエチルイソシアネート(MOI)に由来するシグナルが消失したのを確認後、プロピレングリコールモノメチルエーテルアセテート(PGMEA)(382.87部)を混合物に添加し、濃度が50質量%のマクロモノマーB-3溶液を得た。マクロモノマーB-3の構造は、1H-NMRにより確認した。得られたマクロモノマーB-3の重量平均分子量は3,000であった。
・E-1:ベンジルメタクリレート(東京化成工業(株)製)
・E-3:2-エチルヘキシルメタクリレート(東京化成工業(株)製)
・E-4:アロニックスM120(東亞合成(株)製)2-(2-((2-ethylhexyl)oxy)ethoxy)ethyl acrylate
・E-5:メタクリル酸ジシクロペンタニル(東京化成工業(株)製)
・E-6:2-メトキシエチルアクリレート(東京化成工業(株)製)
・E-7:2-(メタクリロイルオキシ)エチルトリメチルアンモニウムクロリド(東京化成工業(株)製)
・C-1:4HBAGE、4-ヒドロキシブチル アクリレート グリシジルエーテル(日本化成工業(株)製)
・C-2:3,4-エポキシシクロヘキシルメチルアクリレート((株)ダイセル製)
・C-3:グリシジルアクリレート(東京化成工業(株)製)
・C-4:9-(oxiran-2-yl)nonyl acrylate(下記合成品)
・C-5:3-(oxiran-2-ylmethoxy)-3-oxopropyl acrylate(下記合成品)
・C-6:2-methyl-2-(((oxiran-2-ylmethoxy)carbonyl)amino)propane-1,3-diyl diacrylate(下記合成品)
・C-7:GMA、グリシジルメタクリレート(東京化成工業(株)製)
・C-8:アリルグリシジルエーテル(東京化成工業(株)製)
・C-9:クロロメチルスチレン(東京化成工業(株)製)
10-ウンデセン-1-オール(東京化成工業(株)製) 200g、DMAc:ジメチルアセトアミド 1,378gを投入したフラスコを氷冷しながら3-クロロプロピオニルクロリド(東京化成工業(株)製) 153.65gを滴下し、1.5時間氷冷下で撹拌した。1H-NMRにて原料アルコールの消失及び目的物を確認し、撹拌を止めた。酢酸エチル 2,000mlを加え、3.5質量%塩酸水溶液 2,000mlで2回水洗し、5質量%重曹水 2,000mlにて2回水洗し、有機層を硫酸マグネシウムにて乾燥し、溶媒を減圧留去することで中間体 296gを得た。その中間体 192gとジクロロメタン 918gを投入したフラスコに水浴下でメタクロロ過安息香酸:mCPBA 200gを1時間おきに5回分割添加し、終夜撹拌した。
1H-NMRにて原料の末端ニ重結合のピークが消失したのを確認し、反応液に対し5質量%重曹水を 1,487g加え2時間撹拌した。その後、酢酸エチル 500mlを加え、抽出し、5質量%チオ硫酸ナトリウム水溶液 500mlを加え1時間撹拌し、水層を廃棄し、有機層を減圧濃縮することで中間体 211.5gを得た。
上記中間体 210g、塩化メチレン 822g、p-メトキシフェノール 182.3mgを加え氷冷下でジアザビシクロウンデセン 231gと塩化メチレン 441gの混合液を10℃以下を保持しながら滴下した。
1H-NMRにて生成物を確認し、酢酸 91.1g、塩化メチレン 147gの混合液を10℃以下を保持しながら滴下し、室温にて2時間撹拌した。
塩化メチレンを減圧濃縮し、ヘキサンを1,050gを加え水 420gで水洗し、5質量%重曹水 420gにて水洗し、目的物であるC-4 137.9gを得た。
β-カルボキシエチルアクリレート 23.3g、p-メトキシフェノール 87mg、クロロホルム 117g、グリシドール 16.8g、N、N-ジメチルアミノピリジン 1.98gをフラスコに加え、氷冷下で1-(3-ジメチルアミノプロピル)-3-エチルカルボジイミド塩酸塩 37.26gを分割添加し、1時間撹拌した。その後、0.1規定(0.1mol/L)塩酸水 150mlで水洗した後、水 150mlで水洗し、有機層を減圧濃縮し、目的物であるC-5 20gを得た。
フラスコに、グリシドール(アルドリッチ製) 5.0g、酢酸ブチル 53g、p-メトキシフェノール 0.04g、カレンズBEI(昭和電工(株)製) 14.5g、ネオスタンU600(日東化成(株)製) 0.04gを加え、ゆっくりと60℃に昇温させた。60℃で4時間重合反応を続けた後、1H-NMRでカレンズBEIに由来するシグナルの消失を確認し、水50gを加え撹拌させた。分液し水層を廃棄することにより得られた有機層を再度水50gで洗浄した。洗浄後の有機層に、硫酸マグネシウム3gを加え、ろ過した後、2,6-ジt-ブチル-4-メチルフェノール(0.4g)を加えて濃縮することでC-6を12g得た。
・F-1:ジメチルドデシルアミン(東京化成工業(株)製)
・F-2:ジメチルブチルアミン(東京化成工業(株)製)
・F-3:ジメチルベンジルアミン(東京化成工業(株)製)
・F-4:2,4,6-トリス(ジメチルアミノメチル)フェノール(東京化成工業(株)製)
・F-5:2-(ジメチルアミノメチル)フェノール
・F-6:N,N-ジメチルピペラジン(東京化成工業(株)製)
・F-7:トリエチルアミン(東京化成工業(株)製)
・F-8:TBAB(テトラブチルアンモニウムブロミド)(東京化成工業(株)製)
・Q-1:TEMPO free radical:2,2,6,6,-テトラメチルピペリジン1-オキシル
・Q-2:4-hydroxy-TEMPO free radical:4-ヒドロキシ-2,2,6,6,-テトラメチルピペリジン2-オキシル
・Q-3:p-メトキシフェノール
特開2007-277514号公報に記載の合成法にて得た連鎖移動剤CTA-1(下記構造)の20質量%溶液 36.25質量部、及びメタクリル酸 18質量部、メタクリル酸メチル 20質量部の混合溶液を、30質量%1-メトキシ-2-プロパノール溶液になるよう調製し、窒素気流下、75℃に加熱した。
これにアゾビスイソブチロニトリル(AIBN、和光純薬工業(株)製、開始剤) 0.5質量部を加えて3時間加熱後、再度AIBN 0.5部を加えて、窒素気流下、90℃で3時間反応させた。その後、室温(25℃、以下同様)まで冷却し空気に置換した後、4-ヒドロキシブチルアクリレートグリシジルエーテル 20質量部、ジメチルドデシルアミン 4.02質量部、TEMPO(2,2,6,6,-テトラメチルピペリジン1-オキシル) 0.023質量部を加え、90℃、36時間加熱撹拌した。
その後、室温まで冷却し、アセトンで希釈した。多量のメタノールを用いて再沈殿させた後、真空乾燥させることにより、高分子化合物PA-26:ポリスチレン換算の重量平均分子量18,600、酸価88.5mgKOH/g、C=C価1.44mmol/g、アミン価0.27mmol/gの固体(特定樹脂PA-26)65.1質量部を得た。
PA-26は、上述の条件1を満たす樹脂であり、上述の式(A1)で表される構成単位を有する樹脂である。
特開2007-277514号公報に記載の合成法にて得た連鎖移動剤CTA-15(下記構造)の30質量%溶液24.17質量部、及びメタクリル酸 10質量部、メタクリル酸メチル 29.59質量部の混合溶液を、30質量%1-メトキシ-2-プロパノール溶液になるよう調製し、窒素気流下、75℃に加熱した。
これにV-601 0.5質量部を加えて3時間加熱後、再度V-601 0.5質量部を加えて、窒素気流下、90℃で3時間反応させた。その後、室温まで冷却し空気に置換した後、グリシジルメタクリレート 14.21質量部、ジメチルドデシルアミン 4質量部、TEMPO 0.023質量部を加え、90℃、36時間加熱撹拌した。
その後、室温まで冷却し、アセトンで希釈した。多量のメタノールを用いて再沈殿させた後、真空乾燥させることにより、高分子化合物PA-27:ポリスチレン換算の重量平均分子量13,800、酸価21mgKOH/g、C=C価1.54mmol/g、アミン価0.29mmol/gの固体51.5質量部を得た。
PA-27は、上述の条件1を満たす樹脂であり、上述の式(A1)で表される構成単位を有する樹脂である。
三口フラスコに、モノマー2として濃度(固形分含有量)が50質量%のマクロモノマーB-1溶液、モノマー1としてω-カルボキシ-ポリカプロラクトンモノアクリレート、モノマー4としてアクリル酸2-(ジメチルアミノ)エチル、PGMEA 171gを導入し、混合物を得た。
窒素を吹き込みながら、上記混合物を撹拌した。次に、窒素をフラスコ内に流しながら、混合物を75℃まで昇温した。次に、混合物に、ドデシルメルカプタン 1.34g、次いで、V-601 0.7gを添加し、重合反応を開始した。混合物を75℃で2時間加熱した後、更にV-601 0.7gを混合物に追加した。2時間後、更にV-601 0.7gを混合物に追加した。
更に2時間反応後、混合物を90℃に昇温し、3時間撹拌した。上記操作により、重合反応は終了した。
反応終了後、空気下でTEMPO(Q-1)を加えた後、4-ヒドロキシブチル アクリレート グリシジルエーテル (C-1)を滴下した。
滴下終了後、空気下、90℃、24時間反応を続けた。得られた混合物に30質量%溶液になるようPGMEAを追加することで樹脂PB-2を得た。
モノマー2(溶液中の固形分量)、モノマー1、モノマー4、C-1、及びQ-1の使用量は、後述の表2に記載の通りとした。
得られた樹脂PB-2の重量平均分子量は17,800、酸価は75mgKOH/mg19,200、酸価は60mgKOH/mgであった。
特定樹脂PB-2は、上述の条件2を満たす樹脂であり、上述の式(B1)で表される構成単位を有する樹脂である。
使用するモノマー1、モノマー2、モノマー3、モノマー4、反応性化合物、及び、重合禁止剤を表1に記載のものに変更した以外は、PA-1の合成方法と同様の方法によりPB-1、及び、PB-3~PB-18を合成した。モノマー3を添加する場合、モノマー3はモノマー1、モノマー2及びモノマー4の混合物に更に添加した。
表2中、「含有量」の欄に記載の数値の単位は「質量%」である。表2中、「-」と記載した成分は使用しなかった。
表2中、「構成単位B1」の欄の記載は、上述の式(B1-1)~式(B1-12)のいずれかにより表される構成単位であって、各樹脂に含まれる構成単位を示している。
PB-1、及び、PB-3~PB-18は、上述の条件2を満たす樹脂であり、また、上述の式(B1)で表される構成単位を有する樹脂である。
使用するモノマー1、モノマー2、モノマー3、モノマー4、反応性化合物、及び、重合禁止剤を表2に記載のものに変更した以外は、PB-2の合成方法と同様の方法によりPZ-2を合成した。
樹脂PZ-2は、モノマー4としてE-1、E-7を用いた為四級アンモニウムカチオン構造とラジカル重合性基が連結された構造を形成できず、上述の条件1及び条件2のいずれをも満たさない樹脂である。
・D-1:アクリル酸2-(ジメチルアミノ)エチル(東京化成工業(株)製)
・D-2:メタクリル酸2-(ジエチルアミノ)エチル(東京化成工業(株)製)
・D-3:2-(((2-(dimethylamino)ethoxy)carbonyl)amino)ethyl acrylate(合成品、Bulletin of the Chemical Society of Japan, 2011, vol. 84, # 11, p. 1215 - 1226を参考に合成した。)
・D-4:N,N-dimethyl-1-(4-vinylphenyl)methanamine(合成品、Angewandte Chemie - International Edition, 2007, vol. 46, # 46, p. 8869 - 8871を参考に合成した。)
特開2007-277514号公報に記載の合成法にて得た連鎖移動剤CTA-1(上記構造)の20質量%溶液 36.25質量部、及びメタクリル酸 12質量部、メタクリル酸2-(ジメチルアミノ)エチル 5.46質量部、メタクリル酸メチル 14質量部の混合溶液を、30質量%1-メトキシ-2-プロパノール溶液になるよう調製し、窒素気流下、75℃に加熱した。
これにAIBN 0.5質量部を加えて3時間加熱後、再度AIBN 0.5質量部を加えて、窒素気流下、90℃で3時間反応させた。その後、室温(25℃、以下同様)まで冷却し空気に置換した後、4-ヒドロキシブチル アクリレート グリシジルエーテル 15質量部、TEMPO 0.023質量部を加え、90℃、36時間加熱撹拌した。
その後、室温まで冷却し、アセトンで希釈した。多量のメタノールを用いて再沈殿させた後、真空乾燥させることにより、高分子化合物PB-19:ポリスチレン換算の重量平均分子量14,600、酸価67.4mgKOH/g、C=C価1.39mmol/g、アミン価0.71mmol/gの固体(特定樹脂PB-19)62.9質量部を得た。
PB-19は、上述の条件2を満たす樹脂であり、上述の式(B1)で表される構成単位を有する樹脂である。
特開2007-277514号公報に記載の合成法にて得た連鎖移動剤CTA-24(下記構造)の30質量%溶液 24.17質量部、メタクリル酸2-(ジメチルアミノ)エチル 14.32質量部、及びメタクリル酸2-ヒドロキシエチル 6.51質量部の混合溶液に対し30質量%1-メトキシ-2-プロパノール溶液になるよう調製し、窒素気流下、75℃に加熱した。
これにV-601 0.5質量部を加えて3時間加熱後、再度V-601 0.5質量部を加えて、窒素気流下、90℃で3時間反応させた。その後、室温(25℃、以下同様)まで冷却し空気に置換した後、4-ヒドロキシブチル アクリレート グリシジルエーテル 20.02質量部、TEMPO 0.023質量部を加え、90℃、36時間加熱撹拌した。その後、室温まで冷却し空気に置換した後、昭和電工(株)製カレンズBEI 11.96質量部、日東化成社製ネオスタンU600 0.61質量部、TEMPO 0.023質量部を加え、90℃、36時間加熱撹拌した。
その後、室温まで冷却し、アセトンで希釈した。多量のメタノールを用いて再沈殿させた後、真空乾燥させることにより、高分子化合物PB-20:ポリスチレン換算の重量平均分子量19500、酸価12.5mgKOH/g、C=C価3.33mmol/g、アミン価1.67mmol/gの固体(特定樹脂PB-20)57.4質量部を得た。
PB-20は、上述の条件2を満たす樹脂であり、上述の式(B1)で表される構成単位を有する樹脂である。
下記表3~表5記載の顔料、分散助剤(顔料誘導体)、樹脂、重合禁止剤、及び、溶剤を混合したのち、直径0.3mmのジルコニアビーズ230質量部を加えて、ペイントシェーカーを用いて5時間分散処理を行い、ビーズをろ過で分離して分散液を製造した。下記の表3~表5に記載の含有量を示す数値は質量部である。
また、例えば顔料分散液R-12における「樹脂」の「種類」欄のPA-12/P1=1/1等の記載は、樹脂として、PA-12と、P1とを1/1(質量比)の割合で使用し、その合計使用量が4.2質量部であることを示している。
また、表3~表5中、「-」の記載は該当する化合物を含有しないことを示している。
・PR254:C.I.Pigment Red 254
・PR264:C.I.Pigment Red 264
・PR272:C.I.Pigment Red 272
・PY139:C.I.Pigment Yellow 139
・PY150:C.I.Pigment Yellow 150
・PB15:6:C.I.Pigment Blue 15:6
・PV23:C.I.Pigment Violet 23
・PG58:C.I.Pigment Green 58
・PG36:C.I.Pigment Green 36
・PY185:C.I.Pigment Yellow 185
・TiON:酸窒化チタン
・TiN:窒化チタン
・K1:下記構造の化合物
・K2:下記構造の化合物
・PA-1~PA-27:上記合成例における合成品
・PB-1~PB-20:上記合成例における合成品
・PZ-1~PZ-2:上記合成例における合成品
・Q1:TEMPO free radical:2,2,6,6,-テトラメチルピペリジン1-オキシル
・Q2:4-hydroxy-TEMPO free radical:4-ヒドロキシ-2,2,6,6,-テトラメチルピペリジン2-オキシル
・Q3:p-メトキシフェノール
・J1:PGMEA(プロピレングリコールモノメチルエーテルアセテート)
・J2:シクロヘキサノン
・J3:シクロペンタノン
・J4:PGME(プロピレングリコールモノメチルエーテル)
各実施例及び比較例において、下記表6~表8に記載の原料を混合して硬化性組成物を調製した。
表6~表8中、「顔料分散液1」又は「顔料分散液2」の欄の「R-1」、「Y-1」等の記載は、上述した「顔料分散液R-1」、「顔料分散液Y-1」等を使用したことを意味している。
また、例えば「顔料分散液1」等の欄の「R-13/R-19=9/1」等の記載は、顔料分散液として「R-13」及び「R-19」を合計で44.8質量部を含有し、かつ、「R-13」及び「R-19」の含有質量比が9:1であること等を示している。
また、表6~表8中、「-」の記載は該当する化合物を含有しないことを示している。
・I1:IRGACURE OXE02(BASF社製)
・I2:IRGACURE OXE03(BASF社製)
・I3:IRGACURE OXE04(BASF社製)
・I4:下記式(I4)で表される構造の化合物
・I5:アデカアークルズNCI-831((株)ADEKA製)
・I6:IRGACURE 369(BASF社製)
・M1:下記式(M)で表される化合物、a+b+c=3
・M2:下記式(M)で表される化合物、a+b+c=4
・M3:下記式(M)で表される化合物、a+b+c=5の化合物とa+b+c=6の化合物を1:3(質量比)で混合したもの
・M4:ジペンタエリスリトールヘキサアクリレート(DPHA)
・M5:下記式(M5)で表される化合物
・M6:下記式(M6)で表される化合物
・H1:メガファックF-781F(DIC(株)製)
各実施例又は比較例において得られた硬化性組成物を、それぞれ、予めヘキサメチルジシラザンを噴霧した8インチ(1インチは2.54cm)のシリコンウエハの上に、乾燥後膜厚が0.8μmになるようにスピンコーターを用いて塗布し、100℃で120秒間プリベークした。
塗布基板をi線ステッパー露光装置FPA-i5+(キヤノン(株)製)を使用して、塗布膜に365nmの波長で、1.1μm四方のアイランドパターンを有するマスクを通し、50~1,700mJ/cm2の露光量でi線を照射した。露光後、アルカリ現像液CD-2000(富士フイルムエレクトロニクスマテリアルズ(株)製)を使用して、25℃、40秒間の条件で現像した。その後、流水で30秒間リンスした後、スプレー乾燥し、着色パターンを得た。
上記着色パターンは、硬化性組成物を用いて形成された膜に該当する。
得られた着色パターンについて、走査型電子顕微鏡((株)日立製作所製S-9220)を用いてパターン上方から観察し、パターンサイズ計測を行った。また光学顕微鏡を用いて密着性の評価を行った。全てのパターンが密着している時のパターンサイズを下記評価基準に従って5段階で評価した。評価結果は、表6~表8の「密着感度」の欄に記載した。
評価結果が5に近いほど、支持体との密着性に優れているといえる。評価結果は、3、4又は5が好ましく、4又は5がより好ましく、5が最も好ましい。
〔評価基準〕
5:パターンサイズが0.9μm以上1.0μm未満で密着している。
4:パターンサイズが1.0μm以上1.05μm未満で密着している。
3:パターンサイズが1.05μm以上1.1μm未満で密着している。
2:パターンサイズが1.1μm以上1.2μm未満で密着している。
1:パターンサイズが1.2μm以上でないと密着しない。
以下の方法により、各実施例又は比較例において得られた硬化性組成物を用いてそれぞれパターン状の硬化物を形成し、上記硬化物のエッジ形状(パターン形状)を評価した。
上記パターン状の硬化物は、硬化性組成物を用いて形成された膜に該当する。
シリコンウエハ上に、乾燥後の膜厚が0.9μmになるように、硬化性組成物層(組成物膜)を形成した。硬化性組成物層の形成は、スピンコートを用いて行った。上記膜厚となるよう、スピンコートの回転数を調整した。塗布後の硬化性組成物層を、シリコンウエハを下にしてホットプレート上に載置して乾燥した。ホットプレートの表面温度は100℃で、乾燥時間は、120秒間とした。
得られた硬化性組成物層を、以下の条件で露光した。
露光は、i線ステッパー(商品名「FPA-3000iS+」、キャノン社製)を用いて行った。硬化性組成物膜に対して、線形20μm(幅20μm、長さ4mm)を有するマスクを介して400mJ/cm2の露光量(照射時間0.5秒)でi線を照射(露光)した。
硬化後の硬化性組成物層を、以下の条件により現像し、パターン状の硬化膜を得た。
硬化後の硬化性組成物層に対して、テトラメチルアンモニウムハイドロオキサイド(TMAH)0.3質量%水溶液を用いて、23℃で、60秒間のパドル現像を5回繰り返し、パターン状の硬化物を得た。その後、パターン状の硬化物をスピンシャワーを用いてリンスし、更に純水で洗浄した。
上記で得られたパターン状の硬化物を、クリーンオーブンCLH-21CDH(光洋サーモ社製)を用いて220℃で300秒間加熱した。
更に、加熱後のパターン状の硬化物を、表面温度220℃のホットプレートに載置し、300秒間加熱した。
上記のパターン状の硬化物を走査型電子顕微鏡で撮影し、1.5μmパターン断面のエッジ形状を下記基準にて評価した。
図1に示すように、ウエハ4上に形成されたパターン状の硬化物1のパターンエッジ部2における底部の切れ込みの長さTを測定した。なお、図1において、L1は露光領域、L2は未露光領域に相当する。評価は以下の基準により行った。評価結果は、表6~表8の「パターン形状」の欄に記載した。
アンダーカット幅が小さいほど、パターン形状に優れるといえる。評価結果は、A又はAAであることが好ましく、AAであることがより好ましい。
-評価基準-
「AA」:アンダーカット幅(上記長さT)が0μmを超え、0.05μm以下だった。
「A」:アンダーカット幅が0.05μmを超え、0.15μm以下だった。
「B」:アンダーカット幅が0.15μmを超え、0.25μm以下だった。
「C」:アンダーカット幅が0.25μmを超えた。
〔1.硬化性組成物の露光感度(初期)〕
各実施例及び比較例において、それぞれ、調製直後の各硬化性組成物を、ガラス基板上にスピンコートを用いて塗布し、乾燥して膜厚1.0μmの硬化性組成物層を形成した。スピンコートの条件は、まず、回転数:300rpm(rotation per minute)で、5秒間、次いで、800rpmで20秒間とした。また、乾燥条件は100℃で80秒とした。
上記により得られた塗膜に対して、i線ステッパー露光装置FPA-3000i5+(Canon(株)製)を用いて、波長365nmの光を、1μmのラインアンドスペースを有するパターンマスクを通して10~1,600mJ/cm2の露光量で照射し、露光した。次に、60%CD-2000(富士フイルムエレクトロニクスマテリアルズ社製)現像液を使用して、露光後の硬化性組成物膜を、25℃、60秒間の条件で現像し、パターン状の硬化膜を得た。その後、パターン状の硬化膜を流水で20秒間リンスした後、エアー乾燥した。
上記パターン状の硬化膜は、硬化性組成物を用いて形成された膜に該当する。
上記露光において、光が照射された領域の現像後のパターン線幅が、1.0μm以上となる最小の露光量を露光感度とし、この露光感度を初期の露光感度とした。
調製直後の硬化性組成物を密閉容器に封入し、器内温度が45℃に設定された恒温器(EYELA/LTI-700)内に保持し、30日間経過後に取り出した。取り出した硬化性組成物を用いて、調製直後の硬化性組成物を用いて行ったのと同様の試験を行い、露光感度を求めた。これを経時後の露光感度とした。
初期の露光感度と、経時後の露光感度から、以下の式で求められる露光感度の変動率(%)を算出した。上記変動率(%)の値が小さいほど、硬化性組成物の保存安定性が優れていることを示す。
(式)変動率=[(経時後の露光感度-初期の露光感度)/初期の露光感度]×100
評価結果は、表6~表8の「保存安定性」の欄に記載した。評価結果は、3、4又は5が好ましく、4又は5がより好ましく、5が最も好ましい。
「5」:変動率が0%~3%だった。
「4」:変動率が3%を超え、6%以下だった。
「3」:変動率が6%を超え、10%以下だった。
「2」:変動率が10%を超え、15%以下だった。
「1」:変動率が15%を超えていた。
上記の〔1.硬化性組成物の露光感度(初期)〕の試験において、上記現像後のパターン線幅が1.0μm以上となる最小の露光量で得られた硬化膜を、ガラス基板ごと220℃のオーブンで1時間加熱した。硬化膜を加熱した後、ガラス基板上の、露光工程において光が照射されなかった領域(未露光部)に存在する残渣の数をSEM(Scanning Electron Microscope、倍率:20,000倍)にて観察し、未露光部残渣を評価した。評価は以下の基準により行い、結果を表6~表8の「現像残渣」の欄に示した。
残渣の個数が少ないほど、現像残渣の発生が抑制されているといえる。評価結果は、3、4又は5が好ましく、4又は5がより好ましく、5が最も好ましい。
「5」:パターンが形成され、未露光部には、残渣が全く観察されなかった。
「4」:パターンが形成され、未露光部1.0μm四方に残渣が1~3個観察された。
「3」:パターンが形成され、未露光部1.0μm四方に残渣が4~10個観察された。
「2」:パターンが形成され、未露光部1.0μm四方に残渣が11個以上観察された。
「1」:現像不良でパターンが形成されなかった。
各実施例及び比較例における硬化性組成物を、それぞれ乾燥後の膜厚が0.9μmになるようにスピンコート法でガラス基板上に塗布し、その後、ホットプレート上にて、硬化性組成物を塗布したガラス基板を100℃で2分間加熱して塗膜を得た。24時間後に、上述の「パターン形状の評価」と同じ条件で露光、現像、ポストベーク工程を経てパターン状の硬化物を得た。
このパターン状の硬化物を光学顕微鏡MT-3600LW(FLOVEL製)を用いて観察することにより、引き置き欠陥(異物発生の有無)を評価した。異物が少ないほど貯蔵安定性が良好であり、引き置き欠陥が抑制されているといえる。評価結果は、3、4又は5が好ましく、4又は5がより好ましく、5が最も好ましい。
「5」:パターン状の硬化物上に異物が認められない。
「4」:パターン状の硬化物上に認められる異物が5個未満である。
「3」:パターン状の硬化物上に認められる異物が5~10個である。
「2」:パターン状の硬化物上に認められる異物が11~50個である。
「1」:パターン状の硬化物上に認められる異物が51~100個である。
各実施例及び比較例において、下記表9に記載の原料を混合して硬化性組成物を調製した。
表9中、「顔料分散液1」又は「顔料分散液2」の欄の「R-1」、「Y-1」等の記載は、上述した「顔料分散液R-1」、「顔料分散液Y-1」等を使用したことを意味している。
また、表9中、「-」の記載は該当する化合物を含有しないことを示している。
〔下塗り層付ガラス基板の作製〕
ガラス基板(コーニング1737)を0.5質量%水酸化ナトリウム水溶液で超音波洗浄した後、水洗、脱水ベーク(200℃/20分)を行った。次いで、洗浄したガラス基板上に乾燥後の膜厚が0.1μmになるようにスピンコーターを用いてCT-4000(富士フイルムエレクトロニクスマテリアルズ(株)製)を塗布し、ホットプレートを用いて220℃で1時間加熱乾燥させて、下塗り層付ガラス基板を調製した。
上記下塗り層付ガラス基板を用いた以外は、上述の「密着感度(密着性)評価」に記載の評価方法と同様の方法により評価した。評価結果は、表9の「ガラス基板密着感度」の欄に記載した。
比較例1における硬化性組成物は、条件1又は条件2の少なくとも一方を満たす樹脂を含まず、支持体との密着性に優れた膜が形成されなかった。
比較例2における硬化性組成物は、条件1又は条件2の少なくとも一方を満たす樹脂を含まず、支持体との密着性に優れた膜が形成されなかった。
上記硬化性組成物と色が重複しないように、Green組成物、Blue組成物、Red組成物のうちのいずれか1つを製膜後の膜厚が1.0μmになるようにスピンコート法で塗布した。例えば、実施例1~50の硬化性組成物の色は、Redであり、実施例51~56の硬化性組成物の色は、Blueであり、実施例57~64の硬化性組成物の色は、Greenである。
実施例1~50のRed組成物、57~64のGreen組成物、又は、51~56のBlue組成物のいずれかと、上記組成物と色が重ならないように、後述のRed組成物、後述のGreen組成物、及び、後述のBlue組成物よりなる群から選ばれる2種の組成物と、の計3色の組成物(Red組成物、Green組成物、及び、Blue組成物、いずれか1色の組成物が実施例1~64の組成物である。)をそれぞれ準備した。
次いで、ホットプレートを用いて、100℃で2分間加熱した。次いで、i線ステッパー露光装置FPA-3000i5+(キヤノン(株)製)を用い、1,000mJ/cm2で2μm四方のドットパターンのマスクを介して露光した。次いで、水酸化テトラメチルアンモニウム(TMAH)0.3質量%水溶液を用い、23℃で60秒間パドル現像を行った。その後、スピンシャワーにてリンスを行い、更に純水にて水洗した。次いで、ホットプレートを用いて、200℃で5分間加熱することで、Red組成物、Green組成物、及び、Blue組成物をそれぞれパターニングし、赤、緑及び青の着色パターン(Bayerパターン)を形成した。
なお、Bayerパターンとは、米国特許第3,971,065号明細書に開示されているような、一個の赤色(Red)素子と、二個の緑色(Green)素子と、一個の青色(Blue)素子とを有する色フィルタ素子の2×2アレイを繰り返したパターンである。
得られた固体撮像素子について、画像の取り込みを行い、画像性能を評価した。実施例1~実施例64で得られたいずれの組成物を使用した場合でも、低照度の環境下であっても画像をはっきりと認識できた。
下記成分を混合し、撹拌した後、孔径0.45μmのナイロン製フィルタ(日本ポール(株)製)でろ過して、Red組成物を調製した。
Red顔料分散液:51.7質量部
樹脂4(40質量%PGMEA溶液):0.6質量部
重合性化合物4:0.6質量部
光重合開始剤1:0.3質量部
界面活性剤1:4.2質量部
PGMEA:42.6質量部
下記成分を混合し、撹拌した後、孔径0.45μmのナイロン製フィルタ(日本ポール(株)製)でろ過して、Green組成物を調製した。
Green顔料分散液:73.7質量部
樹脂4(40質量%PGMEA溶液):0.3質量部
重合性化合物1:1.2質量部
光重合開始剤1:0.6質量部
界面活性剤1:4.2質量部
紫外線吸収剤(UV-503、大東化学(株)製):0.5質量部
PGMEA:19.5質量部
下記成分を混合し、撹拌した後、孔径0.45μmのナイロン製フィルタ(日本ポール(株)製)でろ過して、Blue組成物を調製した。
Blue顔料分散液:44.9質量部
樹脂4(40質量%PGMEA溶液):2.1質量部
重合性化合物1:1.5質量部
重合性化合物4:0.7質量部
光重合開始剤1:0.8質量部
界面活性剤1:4.2質量部
PGMEA:45.8質量部
下記組成における成分を混合し、撹拌した後、孔径0.45μmのナイロン製フィルタ(日本ポール(株)製)でろ過して、赤外線透過フィルタ形成用組成物を調製した。
顔料分散液1-1:46.5質量部
顔料分散液1-2:37.1質量部
重合性化合物5:1.8質量部
樹脂4:1.1質量部
光重合開始剤2:0.9質量部
界面活性剤1:4.2質量部
重合禁止剤(p-メトキシフェノール):0.001質量部
シランカップリング剤:0.6質量部
PGMEA:7.8質量部
顔料分散液2-1:1,000質量部
重合性化合物(ジペンタエリスリトールヘキサアクリレート):50質量部
樹脂:17質量部
光重合開始剤(1-[4-(フェニルチオ)]-1,2-オクタンジオン-2-(O-ベンゾイルオキシム)):10質量部
PGMEA:179質量部
アルカリ可溶性重合体FA-1:17質量部(固形分濃度35質量部)
反応容器に、ベンジルメタクリレート14部、N-フェニルマレイミド12部、2-ヒドロキシエチルメタクリレート15部、スチレン10部及びメタクリル酸20部をプロピレングリコールモノメチルエーテルアセテート200部に溶解し、更に2,2’-アゾイソブチロニトリル3部及びα-メチルスチレンダイマー5部を投入した。反応容器内を窒素パージ後、撹拌及び窒素バブリングしながら80℃で5時間加熱し、アルカリ可溶性重合体FA-1を含む溶液(固形分濃度35質量%)を得た。この重合体は、ポリスチレン換算の重量平均分子量が9,700、数平均分子量が5,700であり、Mw/Mnが1.70であった。
C.I.ピグメントブラック32を60部、C.I.ピグメントブルー15:6を20部、C.I.ピグメントイエロー139を20部、日本ルーブリゾール(株)製のソルスパース76500を80部(固形分濃度50質量%)、アルカリ可溶性重合体F-1を含む溶液を120部(固形分濃度35質量%)、プロピレングリコールモノメチルエーテルアセテートを700部混合し、ペイントシェーカーを用いて8時間分散し、着色剤分散液2-1を得た。
C.I.Pigment Red 254を9.6質量部、C.I.Pigment Yellow 139を4.3質量部、分散剤(Disperbyk-161、BYKChemie社製)を6.8質量部、PGMEAを79.3質量部とからなる混合液を、ビーズミル(ジルコニアビーズ0.3mm径)により3時間混合及び分散して、顔料分散液を調製した。その後更に、減圧機構付き高圧分散機NANO-3000-10(日本ビーイーイー(株)製)を用いて、2,000kg/cm3の圧力下で流量500g/minとして分散処理を行った。この分散処理を10回繰り返し、Red顔料分散液を得た。
C.I.Pigment Green 36を6.4質量部、C.I.Pigment
Yellow 150を5.3質量部、分散剤(Disperbyk-161、BYKChemie社製)を5.2質量部、PGMEAを83.1質量部からなる混合液を、ビーズミル(ジルコニアビーズ0.3mm径)により3時間混合及び分散して、顔料分散液を調製した。その後更に、減圧機構付き高圧分散機NANO-3000-10(日本ビーイーイー(株)製)を用いて、2,000kg/cm3の圧力下で流量500g/minとして分散処理を行った。この分散処理を10回繰り返し、Green顔料分散液を得た。
C.I.Pigment Blue 15:6を9.7質量部、C.I.Pigment Violet 23を2.4質量部、分散剤(Disperbyk-161、BYKChemie社製)を5.5部、PGMEAを82.4部からなる混合液を、ビーズミル(ジルコニアビーズ0.3mm径)により3時間混合及び分散して、顔料分散液を調製した。その後更に、減圧機構付き高圧分散機NANO-3000-10(日本ビーイーイー(株)製)を用いて、2,000kg/cm3の圧力下で流量500g/minとして分散処理を行った。この分散処理を10回繰り返し、Blue顔料分散液を得た。
下記組成の混合液を、0.3mm径のジルコニアビーズを使用して、ビーズミル(減圧機構付き高圧分散機NANO-3000-10(日本ビーイーイー(株)製))で、3時間、混合、分散して、顔料分散液1-1を調製した。
・赤色顔料(C.I.Pigment Red 254)及び黄色顔料(C.I.Pigment Yellow 139)からなる混合顔料:11.8質量部
・樹脂(Disperbyk-111、BYKChemie社製):9.1質量部
・PGMEA:79.1質量部
下記組成の混合液を、0.3mm径のジルコニアビーズを使用して、ビーズミル(減圧機構付き高圧分散機NANO-3000-10(日本ビーイーイー(株)製))で、3時間、混合、分散して、顔料分散液1-2を調製した。
・青色顔料(C.I.Pigment Blue 15:6)及び紫色顔料(C.I.Pigment Violet 23)からなる混合顔料:12.6質量部
・樹脂(Disperbyk-111、BYKChemie社製):2.0質量部
・樹脂A:3.3質量部
・シクロヘキサノン:31.2質量部
・PGMEA:50.9質量部
・重合性化合物4:下記構造
・光重合開始剤2:下記構造
2:硬化物のパターンエッジ部
4:支持体(ウエハ)
L1:露光領域
L2:未露光領域
T:硬化物のパターンエッジ部における底部の切れ込みの長さ
Claims (18)
- 顔料、並びに、下記条件1及び下記条件2の少なくとも一方を満たす樹脂を含む
硬化性組成物;
条件1:前記樹脂が、アニオン構造、前記アニオン構造とイオン結合する第四級アンモニウムカチオン構造、及び、ラジカル重合性基を同一の側鎖に有する構成単位を含む;
条件2:前記樹脂が、第四級アンモニウムカチオン構造、及び、ラジカル重合性基が連結された基を側鎖に有する構成単位を含む。 - 前記樹脂が下記式(A1)で表される構成単位、及び、下記式(B1)で表される構成単位の少なくとも一方を含む、請求項1に記載の硬化性組成物。
式(B1)中、RB1は水素原子又はアルキル基を表し、LB1は2価の連結基を表し、RB2及びRB3はそれぞれ独立に、アルキル基を表し、LB2はnB+1価の連結基を表し、LB3は2価の連結基を表し、RB4は水素原子又はアルキル基を表し、nBは1以上の整数を表し、nBが2以上の場合には、2以上のLB3及び2以上のRB4はそれぞれ同一であってもよいし異なっていてもよく、RB2、RB3、LB1及びLB2のうち少なくとも2つが結合して環を形成してもよい。 - 前記樹脂における、式(A1)で表される構成単位、及び、式(B1)で表される構成単位の含有量が、1質量%~60質量%である、請求項1~3のいずれか1項に記載の硬化性組成物。
- 前記樹脂が、ラジカル重合性基を有し、かつ、式(A1)で表される構成単位、及び、式(B1)で表される構成単位とは異なる構成単位Dを更に含む、請求項1~4のいずれか1項に記載の硬化性組成物。
- 前記樹脂が、前記構成単位Dとして、下記式(D1)で表される構成単位を更に含む、請求項5に記載の硬化性組成物。
- 光重合開始剤として、オキシム化合物を含む、請求項1~7のいずれか1項に記載の硬化性組成物。
- 重合性化合物を更に含む、請求項1~8のいずれか1項に記載の硬化性組成物。
- カラーフィルタの着色層又は赤外線吸収層形成用である、請求項1~9のいずれか1項に記載の硬化性組成物。
- 請求項1~10のいずれか1項に記載の硬化性組成物から形成された膜。
- 請求項1~10のいずれか1項に記載の硬化性組成物から形成されたカラーフィルタ。
- 請求項1~10のいずれか1項に記載の硬化性組成物を支持体上に適用して組成物層を形成する工程と、
前記組成物層をパターン状に露光する工程と、
未露光部を現像除去して着色パターンを形成する工程と、を含む
カラーフィルタの製造方法。 - 請求項1~10のいずれか1項に記載の硬化性組成物を支持体上に適用して組成物層を形成し、前記組成物層を硬化して硬化層を形成する工程と、
前記硬化層上にフォトレジスト層を形成する工程と、
露光及び現像することにより前記フォトレジスト層をパターニングしてレジストパターンを得る工程と、
前記レジストパターンをエッチングマスクとして前記硬化層をエッチングする工程と、を含む、
カラーフィルタの製造方法。 - 請求項11に記載の膜又は請求項12に記載のカラーフィルタを含む固体撮像素子。
- 請求項11に記載の膜又は請求項12に記載のカラーフィルタを含む画像表示装置。
- 下記式(A1)で表される構成単位、及び、下記式(B1)で表される構成単位の少なくとも一方を含む、高分子化合物;
式(B1)中、RB1は水素原子又はアルキル基を表し、LB1は2価の連結基を表し、RB2及びRB3はそれぞれ独立に、アルキル基を表し、LB2はnB+1価の連結基を表し、LB3は2価の連結基を表し、RB4は水素原子又はアルキル基を表し、nBは1以上の整数を表し、nBが2以上の場合には、2以上のLB3及び2以上のRB4はそれぞれ同一であってもよいし異なっていてもよく、RB2、RB3、LB1及びLB2のうち少なくとも2つが結合して環を形成してもよい。
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WO2024070963A1 (ja) * | 2022-09-30 | 2024-04-04 | 富士フイルム株式会社 | 膜の製造方法、感光性樹脂組成物、硬化物の製造方法、硬化物、及び積層体 |
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