WO2020155942A1 - 掩模板、柔性显示面板及其制作方法 - Google Patents

掩模板、柔性显示面板及其制作方法 Download PDF

Info

Publication number
WO2020155942A1
WO2020155942A1 PCT/CN2019/127852 CN2019127852W WO2020155942A1 WO 2020155942 A1 WO2020155942 A1 WO 2020155942A1 CN 2019127852 W CN2019127852 W CN 2019127852W WO 2020155942 A1 WO2020155942 A1 WO 2020155942A1
Authority
WO
WIPO (PCT)
Prior art keywords
area
mask
trench
display panel
flexible display
Prior art date
Application number
PCT/CN2019/127852
Other languages
English (en)
French (fr)
Inventor
胡谦
杨玉清
杨凡
Original Assignee
京东方科技集团股份有限公司
成都京东方光电科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 京东方科技集团股份有限公司, 成都京东方光电科技有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US17/042,140 priority Critical patent/US11963431B2/en
Publication of WO2020155942A1 publication Critical patent/WO2020155942A1/zh

Links

Images

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F1/00—Details not covered by groups G06F3/00 - G06F13/00 and G06F21/00
    • G06F1/16—Constructional details or arrangements
    • G06F1/1613—Constructional details or arrangements for portable computers
    • G06F1/1633—Constructional details or arrangements of portable computers not specific to the type of enclosures covered by groups G06F1/1615 - G06F1/1626
    • G06F1/1637—Details related to the display arrangement, including those related to the mounting of the display in the housing
    • G06F1/1652—Details related to the display arrangement, including those related to the mounting of the display in the housing the display being flexible, e.g. mimicking a sheet of paper, or rollable
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/1201—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/131—Interconnections, e.g. wiring lines or terminals
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/311—Flexible OLED

Definitions

  • OLED display technology is a technology that uses reversible colors generated by organic functional materials driven by current to achieve display.
  • OLED displays have ultra-light, ultra-thin, high brightness, large viewing angle, low voltage, low power consumption, fast response, high definition, shock resistance, flexibility, low cost, simple process, less raw materials, high luminous efficiency and temperature range Wide and other advantages are considered to be one of the most promising display technologies.
  • active matrix OLED (AMOLED) display technology has the advantages of self-luminescence, wide viewing angle, high contrast, and fast response speed. Therefore, compared with passive OLED, it has a higher refresh rate and consumes energy. Significantly reduced. This makes AMOLED very suitable for working in portable electronic devices that are sensitive to power consumption.
  • the flexible AMOLED display panel is based on the AMOLED display panel, through the use of a flexible substrate to achieve a certain degree of flexibility, and can even be folded and curled like paper, thus completely subverting people's understanding of traditional display panels, and is currently a hot spot in the field of display technology one.
  • the formed first groove and the second groove are connected
  • the slope angle of the step will be much less than 60°, so even if the source and drain metal material remains on the step, the remaining source and drain metal material will be broken at the corner of the step because the slope angle of the step is far less than 60° This can at least avoid the short-circuiting of adjacent data lines due to residual source and drain metal, and improve the display effect of the display panel.
  • the shape of the protrusion is selected from a triangle, a trapezoid, and a quadrilateral.
  • the size of the protrusion in the first direction is not more than 10 microns.
  • the flexible display panel has a plurality of data lines extending along the first direction, and the maximum size of each protrusion in the second direction is not greater than the distance between adjacent data lines. Distance, where the second direction is perpendicular to the first direction.
  • the edges of the first area and the second area facing the third area have a plurality of protrusions, and the protrusions of the first area and the corresponding protrusions of the second area are aligned in the first direction. Correct.
  • the flexible display panel includes a display area and a flexible bending area located outside the display area.
  • the method includes: forming a buffer layer on a substrate; forming an insulating layer on the side of the buffer layer away from the substrate; using a first mask to etch away the insulating layer in the flexible bending area to form a first trench; The two mask plates etch away the buffer layer in the first trench to form a second trench; and form a source and drain metal layer on the side of the insulating layer away from the buffer layer.
  • the source drain metal layer covers the first trench and the second trench. At least one of the first mask and the second mask is any one of the above-mentioned masks.
  • the slope angle of the formed steps will be much less than 60°. Therefore, even if the source and drain metal materials remain on the steps of the trench after patterning, The remaining source and drain metal materials will also be disconnected at the corners of the step because the slope angle of the step is far less than 60°, so as to at least avoid the short-circuiting of adjacent data lines due to the residual source and drain metal, and improve the display panel The display effect.
  • both the first mask and the second mask are any of the above-mentioned masks, and the size of the third area of the first mask in the first direction is larger than that of the second mask. The size of the third zone in its first direction.
  • the minimum dimension of the first groove is greater than the maximum dimension of the second groove.
  • the flexible display panel includes a display area and a flexible bending area located outside the display area, and the flexible display panel includes: a substrate; a buffer layer provided on the substrate; and a buffer layer provided on the side of the buffer layer away from the substrate An insulating layer; a first trench provided in the insulating layer in the flexible bending area; a second trench provided in the buffer layer in the first trench.
  • the slope angle of the steps formed will be much less than 60°, so even if the source and drain metal materials remain on the steps of the trenches after patterning , The remaining source and drain metal materials will also be disconnected at the corner of the step because the slope angle of the step is far less than 60°, so as to at least avoid the short-circuiting of adjacent data lines due to the residual source and drain metal, and improve the display The display effect of the panel.
  • the minimum dimension of the first groove is greater than the maximum dimension of the second groove.
  • Fig. 1(a) schematically illustrates a top view of a flexible display panel
  • Fig. 1(b) schematically illustrates a side view of the flexible display panel as shown in Fig. 1(a) in a bent state.
  • Fig. 2 schematically illustrates a top view of a conventional mask.
  • Figure 3 (a) schematically illustrates a cross-sectional view of the groove made using the mask as shown in Figure 2, and Figure 3 (b) to Figure 3 (d) are respectively illustrating the use of Electron micrograph of the source and drain metal residues caused by the mask.
  • Fig. 4 schematically illustrates a top view of a mask according to an embodiment of the present disclosure.
  • FIG. 5 schematically illustrates a flowchart of a manufacturing method of a flexible display panel according to an embodiment of the present disclosure.
  • FIG. 6(a) to 6(e) schematically illustrate cross-sectional views of each step corresponding to the method shown in FIG. 5.
  • Figures 7(a) and 7(b) schematically illustrate a combined top view and a side view of a first mask sheet and a second mask sheet according to an embodiment of the present disclosure, respectively.
  • FIG. 8 schematically illustrates a cross-sectional view of a flexible display panel according to an embodiment of the present disclosure.
  • Fig. 1(a) schematically illustrates a top view of a flexible display panel.
  • the flexible display panel 100 includes a display area AA', a non-display area BB' surrounding the display area AA', and a bending area arranged between the display area AA' and the non-display area BB' CC'.
  • a trench Tx extending in the x direction and a trench Ty extending in the y direction are formed in the bending area CC'.
  • the gate line and the data line respectively extend in the x direction and the y direction in the display area AA′, and extend to the non-display area BB′ through the trenches Ty and Tx, respectively.
  • the non-display area BB' can be bent to the back of the display panel 100 through the bending area CC', as shown in FIG. 1(b), so as to achieve the effect of no border on the display surface of the display panel, thereby improving the display quality.
  • the trenches Ty and Tx respectively provide necessary buffers for the gate line and the data line, so that they will not break when the flexible display panel is bent.
  • the trenches Tx and Ty can be implemented by a photolithography process.
  • FIG. 2 schematically illustrates a top view of a conventional mask for making the groove
  • FIG. 3(a) schematically illustrates a cross-sectional view of a groove formed using the conventional mask as shown in FIG. 2.
  • the mask used to form the trench Tx includes a first conventional mask M1 and a second conventional mask M2 with similar patterns, and the pattern includes The first area 201 and the second area 202 arranged opposite to each other in the y direction, and the third area 203 sandwiched between the first area 201 and the second area 202, the pattern of the third area 203 and the groove to be formed the same.
  • the sizes of the first zone, the second zone, and the third zone in FIG. 2 are only schematic, and do not imply the actual relative size relationship of the first zone, the second zone, and the third zone.
  • the mask as shown in FIG. 2 may be a part of a larger-sized mask used to make a flexible display panel, and in this case, the first and second regions may include The patterns corresponding to other parts of the flexible display panel are not described here.
  • the light transmittance of the first region 201 and the second region 202 is the same, and is opposite to that of the third region 203, so as to cooperate with the corresponding photoresist to form a trench.
  • a trench Tx is formed in the buffer layer 303 and the insulating layer 304 on the base substrate 302 through two photolithography processes, and the first conventional mask is used for the first photolithography.
  • the template M1 is used to form a wider first trench T1 in the insulating layer 304, and a second conventional mask M2 is used for the second photolithography to form a narrower position in the first trench T1 where the buffer layer 303 is exposed.
  • the first trench T1 has a larger size in the y direction relative to the second trench T2. Accordingly, the size of the third region 203 of the first conventional mask M1 in the y direction is larger than that of the first conventional mask M1.
  • the size of the third zone 203 in the y direction is larger.
  • the trench Ty has a structure similar to that of the trench Tx, so that the mask used to form the trench Ty also includes a first regular mask and a second regular mask with similar patterns.
  • the first regular mask It is used to form the first trench in the trench Ty, and the second conventional mask is used to form the second trench in the trench Ty.
  • the inventor realized that when using the mask as shown in FIG. 2 to form the grooves in the bending area of the AMOLED flexible display panel, the thickness of the organic layer of the AMOLED flexible display panel is large, so the required groove depth is also Correspondingly larger, for example, the depth of the trench can reach 1.65 microns. Therefore, when the data line is formed by the subsequent patterning process after the trench is formed, due to the etching accuracy, the source and drain metal residues are likely to occur at the step formed at the junction of the first trench and the second trench, as shown in FIG. As shown in 3(a), the black spots at the junction of T1 and T2 schematically indicate the source and drain metal residues.
  • the source and drain metals remaining between the data lines will short-circuit adjacent data lines, which in turn will cause the dark line defects in the data line direction.
  • Figures 3(b) to 3(d) respectively specifically illustrate the actual situation of the source and drain metal residues at the steps in the electron micrographs, in which Figure 3(b) is a top view, and Figure 3(c) is along the data line 3(d) is a cross-sectional view along a direction perpendicular to the data line, and the circled part is the remaining source and drain metal.
  • the inventor further found that the gradient angle formed by etching using the conventional first and second conventional masks as shown in FIG. 2 is about 60°, which makes the source and drain metals easy to remain on the steps.
  • simply increasing the source and drain metal etching time cannot eliminate the residue, and may increase the risk of loss of the interlayer dielectric layer due to the long etching time, thereby affecting the yield of the display panel.
  • the embodiment of the present disclosure provides a mask plate for forming the trench Tx or Ty of the flexible display panel as shown in FIG. 1.
  • the mask includes a first area 401, a second area 402, and a third area 403 sandwiched between the first area 401 and the second area 402 in the first direction.
  • the light transmittance of the first area 401 and the second area 402 is the same, and opposite to the light transmittance of the third area 403.
  • the sizes of the first zone, the second zone, and the third zone in FIG. 4 are only schematic, and do not imply the actual relative size relationship of the first zone, the second zone, and the third zone. In practical applications, the mask as shown in FIG.
  • the first and second regions may include The patterns corresponding to other parts of the flexible display panel are not described here.
  • the first area 401 and the second area 402 may be opaque, and the third area 403 may be light-transmissive, so that the mask is used in conjunction with a positive photoresist.
  • the first area 401 and the second area 402 may be light-transmissive, and the third area 403 is opaque, so that the mask is used in conjunction with a negative photoresist.
  • the pattern of the third region 403 corresponds to the pattern of the trench to be formed. In particular, as shown in FIG.
  • the edges of the first area 401 and the second area 402 facing the third area 403 have a plurality of protrusions 404, and each protrusion 404 has a vertex angle on the side close to the third area 403. , And the apex angle is not greater than 90°.
  • the mask can be used to fabricate the first trenches of the trenches Tx or Ty through a patterning process. Either the groove and the second groove. Alternatively, two mask plates as shown in FIG. 4 may be used to make the first groove and the second groove respectively through a patterning process.
  • the “first direction” refers to a direction perpendicular to the extending direction of the groove to be formed. Taking FIG. 1 as an example, the first direction of the mask used to form the trench Tx is the y direction, and the first direction of the mask used to form the trench Ty is the x direction.
  • the formed The slope angle of the step at the junction of the first trench and the second trench will be much less than 60°. Therefore, even if the source and drain metal material remains on the step, the remaining source and drain metal material will be greatly affected by the slope angle of the step. It is less than 60° and is disconnected at the corner of the step, so as to avoid the short-circuiting of adjacent data lines due to residual source and drain metal, and improve the display effect of the display panel.
  • both the first region 401 and the second region 402 have protrusions 404
  • the present disclosure is not limited thereto.
  • the protrusion 404 may be arranged only at the edge of one of the first area 401 and the second area 402 facing the third area 403, and it is also possible to reduce the residue in the area to a certain extent. Probability of the source and drain metal materials on the steps to short-circuit adjacent data lines.
  • the protrusion 404 may have a triangular shape.
  • the protrusion 404 may have other shapes, such as trapezoid, quadrilateral, regular or irregular polygon, etc., as long as the protrusion 404 has a vertex on the side close to the third area 403, And the apex angle is not more than 90°.
  • the above-mentioned mask plate is used to make grooves on the flexible display panel, and a plurality of data lines along the XX direction will be formed on the display panel in the subsequent manufacturing process.
  • the maximum size of each bump 404 of the mask plate in the second direction can be made not larger than the adjacent data line
  • the distance between the second direction is perpendicular to the first direction.
  • both the first area 401 and the second area 402 have protrusions 404, as shown in FIG. 4, the protrusions 404 of the first area 401 and the corresponding protrusions 404 of the second area 402 are directly opposite in the first direction.
  • FIG. 5 illustrates a flowchart of a method for manufacturing a flexible display panel using the mask as shown in FIG. 4, and FIGS. 6(a) to 6(e) schematically illustrate the manufacturing method corresponding to that shown in FIG. Cross-sectional view of the steps of the method.
  • the flexible display panel includes a display area and a flexible bending area located outside the display area, and the mask plate is used to form a groove at the flexible bending area.
  • a buffer layer 603 is formed on the base substrate 602.
  • the buffer layer 603 can be made of any common organic material or inorganic material.
  • an insulating layer 604 is formed on the buffer layer 603.
  • the insulating layer 604 can be made of any commonly used insulating material, such as SiO 2 , Si 3 N 4 and the like.
  • a first mask is used to etch away the insulating layer 604 in the bending area to form a first trench PB1.
  • the first mask may be the first conventional mask as shown in FIG. 2, or it may be a mask with protrusions in any embodiment of the present application, for example, the mask in FIG. 4.
  • the first trench PB1 is formed in the insulating layer 604 through a photolithography process. First, apply photoresist on the insulating layer.
  • the first area and the second area of the mask are opaque, and the third area of the mask is transparent, so that after the light is irradiated, the photolithography on the third area
  • the glue is denatured and removed during development.
  • the exposed insulating layer is etched to form a first trench.
  • the remaining photoresist is removed.
  • the first area and the second area of the mask are light-transmissive, and the third area of the mask is opaque, so that after the light is irradiated, the photolithography on the third area Glue is removed during development.
  • the exposed insulating layer is then etched to form a first trench, and the remaining photoresist is finally removed.
  • a second mask is used to etch away the buffer layer 603 in the formed first trench PB1 to form a second trench PB2.
  • the first mask sheet and the second mask sheet is a mask sheet as shown in FIG. 4.
  • the first mask is the first conventional mask M1 as shown in FIG. 2
  • the second mask is the mask provided by the present disclosure as shown in FIG. 4.
  • the first mask is the mask provided by the present disclosure as shown in FIG. 4
  • the second mask is the second conventional mask M2 as shown in FIG.
  • the first mask and the second mask are both masks provided by the present disclosure as shown in FIG. 4.
  • a source-drain metal layer 605 is formed on the insulating layer 604, wherein the source-drain metal layer 605 covers the first trench PB1 and the second trench PB2. Thereafter, the source and drain metal layer 605 is patterned to form data lines of the flexible display panel.
  • the slope angle of the formed steps will be much less than 60° due to the presence of protrusions, so even the source and drain
  • the metal material remains on the steps of the trench after patterning, and the remaining source and drain metal materials will also be disconnected at the corners of the step because the slope angle of the step is far less than 60°, so as to avoid adjacent data lines due to The source and drain metal remains and short-circuited, improving the display effect of the display panel.
  • the finally formed trench is formed through two photolithography processes, where the first photolithography uses the first mask to form the larger first trench, and the second photolithography uses the second
  • the mask plate forms a narrower second groove at the corresponding position of the first groove.
  • the size of the surface of the first groove close to the second groove in the first direction is larger than the size of the surface of the second groove close to the first groove in the first direction, so the first groove and the second groove are in phase.
  • the junction forms a step. Due to the presence of the protrusions of the first mask and/or the second mask, the slope angle of the formed steps will be much less than 60°.
  • the remaining source and drain metal materials will also be disconnected at the corners of the step because the slope angle of the step is far less than 60°, so as to avoid the short-circuiting of adjacent data lines due to the residual source and drain metal, and improve the display panel. display effect.
  • FIG. 7(a) and FIG. 7(b) respectively illustrate that The top view and the side view of the first mask M'1 and the second mask M'2 used in the method shown in the stacked state, wherein the first mask M'1 and the second mask M'2 Both are the mask plates according to the embodiment of the present disclosure as shown in FIG. 4.
  • FIG. 7(a) and FIG. 7(b) respectively illustrate that The top view and the side view of the first mask M'1 and the second mask M'2 used in the method shown in the stacked state, wherein the first mask M'1 and the second mask M'2 Both are the mask plates according to the embodiment of the present disclosure as shown in FIG. 4.
  • FIG. 7(a) and FIG. 7(b) respectively illustrate that The top view and the side view of the first mask M'1 and the second mask M'2 used in the method shown in the stacked state, wherein the first mask M'1 and the second mask M'2 Both are the mask plates according to the embodiment of the present disclosure as shown in FIG. 4.
  • the minimum size of the first trench is greater than the maximum size of the second trench, and to ensure that the first trench and the second trench meet
  • the slope angle of the formed step is far less than 60°, and the orthographic projection of the protrusion of the second mask on the first mask should fall within the range of the protrusion of the first mask.
  • the first area and the second area of the first mask plate and the second mask plate transmit light, and the third area of the first mask plate and the second mask plate do not transmit light.
  • the flexible display panel also provides a flexible display panel manufactured using the above method, including a plurality of data lines extending in a specific direction.
  • the flexible display panel includes a base substrate 802.
  • the base substrate 802 may be made of a flexible material, such as polyimide, and to ensure sufficient support strength, the base substrate 802 may be made of multilayer polyimide.
  • a buffer layer 803 and an insulating layer 804 are sequentially disposed on the base substrate 802.
  • the first trench PB1 is formed in the insulating layer 804, the second trench PB2 is formed in the buffer layer 803, and the positions of the first trench PB1 and the second trench PB2 correspond to the bending area of the flexible display panel.
  • the minimum size of the first trench PB1 is larger than the maximum size of the second trench PB2, thereby forming a step between the two.
  • a source-drain metal layer 805 is provided on the insulating layer 804, and the source-drain metal layer 805 covers the first trench PB1.
  • the above-mentioned flexible display panel may further include a protective layer 801 located on the side of the base substrate 802 away from the buffer layer 803, a planarization layer 806 located on the side of the source and drain metal layer 805 away from the insulating layer 804, and The encapsulation layer 806 on the side away from the source and drain metal layer 802 is the encapsulation layer 807.
  • the slope angle of the steps formed will be much less than 60°, so even if the source and drain metal materials remain on the steps of the trenches after patterning , The remaining source and drain metal materials will also be disconnected at the corner of the step because the slope angle of the step is far less than 60°, so as to avoid the short circuit of adjacent data lines due to the residual source and drain metal, and improve the display panel The display effect.
  • the concept of the present disclosure can be widely applied to various flexible electronic systems with display functions, such as mobile phones, notebook computers, LCD TVs, and so on.

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Theoretical Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Human Computer Interaction (AREA)
  • General Engineering & Computer Science (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

一种柔性显示面板（100）、其制作方法、及用于在柔性显示面板（100）的柔性弯折区（CC'）中形成沟槽（Tx、Ty）的掩模板（M'1、M'2）。该掩模板（M'1、M'2）包括第一区（401、701）、第二区（402、702），以及在第一方向上夹在第一区（401、701）和第二区（402、702）之间的第三区（403、703），该第三区（403、703）具有与待形成的沟槽（Tx、Ty）相同的图案。第一区（401、701）和第二区（402、702）的透光性相同，并且与第三区（403、703）的透光性相反。第一区（401、701）和/或第二区（402、702）的面向第三区（403、703）的边缘具有多个凸起（404），每一个凸起（404）在靠近第三区（403、703）的一侧具有顶角，并且该顶角不大于90°。

Description

掩模板、柔性显示面板及其制作方法
相关申请的交叉引用
本申请要求于2019年1月30日提交的中国专利申请No.201910092372.4的优先权，该专利申请的全部内容通过引用方式合并于此。
技术领域
本公开一般地涉及显示技术领域。更具体地，本公开涉及一种掩模板、柔性显示面板，以及用于制作该柔性显示面板的方法。
背景技术
有机发光二极管(OLED)显示技术是一种利用有机功能材料在电流的驱动下产生的可逆变色来实现显示的技术。OLED显示器具有超轻、超薄、高亮度、大视角、低电压、低功耗、快响应、高清晰度、抗震、可弯曲、低成本、工艺简单、使用原材料少、发光效率高和温度范围宽等优点，被认为是最有发展前景的显示技术之一。
在OLED显示技术中，有源矩阵OLED(AMOLED)显示技术具有自发光性、广视角、高对比、反应速度快等优点，因此相比被动式OLED而言，具有更高的刷新率，耗能也显著降低。这使得AMOLED非常适合工作于对功耗敏感的便携式电子设备中。
柔性AMOLED显示面板在AMOLED显示面板的基础上，通过采用柔性基板来实现一定的柔性，甚至可以像纸一样折叠、卷曲，因而彻底颠覆了人们对传统显示面板的认识，是目前显示技术领域的热点之一。
发明内容
本公开的一方面提供了一种用于在柔性显示面板的柔性弯折区中形成沟槽的掩模板。该掩模板包括第一区、第二区，以及在第一方向上夹在第一区和第二区之间的第三区，该第三区具有与待形成的沟槽相同的图案。第一区和第二区的透光性相同，并且与第三区的透光性相反。第一区和/或第二区的面向第三区的边缘具有多个凸起，每一个凸起在靠近第三区的一侧具有顶角，并且该顶角不大于90°。
当采用具有上述布置的掩模板制作柔性显示面板的弯折区中的第一沟槽和第二沟槽之一时，由于凸起的存在，所形成的第一沟槽与第二沟槽连接处的台阶的坡度角将远远小于60°，因此即使源漏金属材料残留在该台阶上，残留的源漏金属材料也将由于台阶的坡度角 远远小于60°而在该台阶的拐角处断开，从而至少避免相邻的数据线由于源漏金属残留而短接的情况，改进显示面板的显示效果。
根据本公开的示例性实施例，凸起的形状选自三角形、梯形、四边形。
根据本公开的示例性实施例，凸起在第一方向上的尺寸不大于10微米。
根据本公开的示例性实施例，该柔性显示面板具有沿所述第一方向延伸的多条数据线，并且每一个凸起在第二方向上的最大尺寸不大于相邻的数据线之间的距离，其中第二方向垂直于第一方向。
根据本公开的示例性实施例，第一区和第二区的面向第三区的边缘具有多个凸起，并且第一区的凸起与第二区的相应凸起在第一方向上正对。
本公开的另一方面提供了一种制作柔性显示面板的方法。该柔性显示面板包括显示区和位于显示区外侧的柔性弯折区。该方法包括：在衬底上形成缓冲层；在缓冲层背离衬底的一侧上形成绝缘层；使用第一掩模板在柔性弯折区中蚀刻掉绝缘层而形成第一沟槽；使用第二掩模板在第一沟槽中蚀刻掉缓冲层而形成第二沟槽；以及在绝缘层背离缓冲层的一侧上形成源漏金属层。源漏金属层覆盖第一沟槽和所述第二沟槽。第一掩模板和第二掩模板中的至少一个是上述任一种掩模板。
当上述方法制作柔性显示面板时，由于掩模板中凸起的存在，所形成的台阶的坡度角将远远小于60°，因此即使源漏金属材料在图案化后残留在沟槽的台阶上，残留的源漏金属材料也将由于台阶的坡度角远远小于60°而在该台阶的拐角处断开，从而至少避免相邻的数据线由于源漏金属残留而短接的情况，改进显示面板的显示效果。
根据本公开的示例性实施例，第一掩模板和第二掩模板均为上述任一种掩模板，并且第一掩模板的第三区在其第一方向上的尺寸大于第二掩模板的第三区在其第一方向上的尺寸。
根据本公开的示例性实施例，在第一方向上，第一沟槽的最小尺寸大于第二沟槽的最大尺寸。
本公开另外的方面提供了一种柔性显示面板，使用上述任一种制作柔性显示面板的方法来制作。该柔性显示面板包括显示区和位于显示区外侧的柔性弯折区，并且，该柔性显示面板包括：衬底；设置在衬底上的缓冲层；设置在缓冲层背离衬底的一侧上的绝缘层；在柔性弯折区中设置在绝缘层中的第一沟槽；在第一沟槽中设置在缓冲层中的第二沟槽。
在上述柔性显示面板中，由于所使用的掩模板的凸起的存在，所形成的台阶的坡度角将远远小于60°，因此即使源漏金属材料在图案化后残留在沟槽的台阶上，残留的源漏 金属材料也将由于台阶的坡度角远远小于60°而在该台阶的拐角处断开，从而至少避免相邻的数据线由于源漏金属残留而短接的情况，改进显示面板的显示效果。
根据本公开的示例性实施例，在第一方向上，第一沟槽的最小尺寸大于第二沟槽的最大尺寸。
应理解，根据本公开的各方面具有相同或类似的特征和实施例。以上的一般描述和下文的细节描述仅是示例性和解释性的，并非旨在以任何方式限制本公开。
附图说明
为了更清楚地说明本公开实施例中的技术方案，下面将对实施例描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本公开的一些实施例。
图1(a)示意性地图示了柔性显示面板的顶视图，并且图1(b)示意性地图示了如图1(a)所示的柔性显示面板在弯折状态下的侧视图。
图2示意性地图示了常规的掩模板的顶视图。
图3(a)示意性地图示了使用如图2所示的掩模板制作的沟槽的截面视图，并且图3(b)至图3(d)是分别图示了使用如图2所示的掩模板所导致的源漏金属残留现象的电镜图。
图4示意性地图示了根据本公开的实施例的掩模板的顶视图。
图5示意性地图示了根据本公开的实施例的柔性显示面板的制作方法的流程图。
图6(a)至图6(e)示意性地图示了与如图5所示的方法对应的各步骤的截面视图。
图7(a)和图7(b)分别示意性地图示了根据本公开的实施例的第一掩模板和第二掩模板的组合顶视图和侧视图。
图8示意性地图示了根据本公开的实施例的柔性显示面板的截面视图。
通过上述附图，已示出本公开明确的实施例，后文中将有更详细的描述。这些附图和文字描述并不是为了通过任何方式限制本公开构思的范围，而是通过参考特定实施例为本领域普通技术人员说明本公开的概念。
具体实施方式
为使本公开实施例的目的、技术方案和优点更加清楚，下面将结合附图对本公开实施例的技术方案作进一步地详细描述。
图1(a)示意性地图示了柔性显示面板的顶视图。如图1(a)所示，柔性显示面板 100包括显示区AA'、围绕显示区AA'的非显示区BB'，以及设置在显示区AA'与非显示区BB'之间的弯折区CC'。弯折区CC'中形成有沿x方向延伸的沟槽Tx和沿y方向延伸的沟槽Ty。栅线和数据线(在图中未示出)在显示区AA'中分别沿x方向和y方向延伸，并且分别通过沟槽Ty和Tx延伸到非显示区BB'。特别地，非显示区BB'可以通过弯折区CC'弯折到该显示面板100的背面，如图1(b)所示，以便实现该显示面板的显示面无边框的效果，从而提高显示品质。沟槽Ty和Tx分别为栅线和数据线提供了必要的缓冲，使得其在柔性显示面板弯折时不会发生断裂。
在具体实现时，沟槽Tx和Ty可以通过光刻工艺来实现。图2示意性地图示了用于制作该沟槽的常规掩模板的顶视图，并且图3(a)示意性地图示了使用如图2所示的常规掩模板形成的沟槽的截面视图。以沟槽Tx为例，如图2所示，用于形成沟槽Tx的该掩模板包括具有类似图案的第一常规掩模板M1和第二常规掩模板M2，该图案包括沿图1(a)中的y方向相对布置的第一区201和第二区202，以及夹在第一区201与第二区202之间的第三区203，第三区203的图案与要形成的沟槽相同。应当指出的是，图2中的第一区、第二区和第三区的尺寸仅仅是示意性的，而不暗示第一区、第二区和第三区的实际相对尺寸关系。在实际应用中，如图2所示的掩模板可以是用于制作柔性显示面板的具有更大尺寸的掩模板的一部分，并且在这样的情况下，第一区和第二区将可能包括与柔性显示面板的其他部分对应的图案，在此不进行赘述。特别地，第一区201和第二区202的透光性相同，并且与第三区203的透光性相反，以便与相应的光刻胶配合来形成沟槽。具体地，如图3(a)所示，经过两次光刻工艺来在衬底基板302上的缓冲层303和绝缘层304中形成沟槽Tx，其中第一次光刻使用第一常规掩模板M1，以在绝缘层304中形成较宽的第一沟槽T1，第二次光刻使用第二常规掩模板M2，以便在第一沟槽T1内暴露出缓冲层303的位置形成较窄的第二沟槽T2。第一沟槽T1相对于第二沟槽T2在y方向上具有更大的尺寸，相应地，第一常规掩模板M1的第三区203在y方向上的尺寸大于第一常规掩模板M1的第三区203在y方向上的尺寸。由于第一沟槽T1与第二沟槽T2之间的尺寸差异，在第一沟槽T1和第二沟槽T2相接的位置处形成有台阶。应当指出的是，沟槽Ty具有与沟槽Tx类似的结构，使得用于形成沟槽Ty的掩模板同样包括具有类似图案的第一常规掩模板和第二常规掩模板，第一常规掩模板用于形成沟槽Ty中的第一沟槽，并且第二常规掩模板用于形成沟槽Ty中的第二沟槽。
发明人认识到，在使用如图2所示的掩模板形成AMOLED柔性显示面板的弯折区中的沟槽时，由于AMOLED柔性显示面板的有机层厚度较大，因此所需要的沟槽深度也相应 地较大，例如沟槽的深度可以达到1.65微米。因此，当在形成沟槽之后通过后续构图工艺形成数据线时，受限于蚀刻精度，在上述第一沟槽和第二沟槽相接处形成的台阶处容易出现源漏金属残留，如图3(a)所示，T1和T2相接处的黑斑示意性的表示源漏金属残留。残留在数据线之间的源漏金属将使得相邻的数据线短接，进而导致数据线方向上的暗线不良。发明人发现，当对所制作的显示面板进行电气测试时，数据线方向上的暗线不良率为4％～8％左右，而根据失效分析结果，其中50％的暗线不良是由于台阶处的源漏金属残留所导致的。
图3(b)至图3(d)分别在电镜图中具体地图示了台阶处的源漏金属残留的实际情况，其中图3(b)是顶视图，图3(c)是沿数据线方向的截面图，并且图3(d)是沿与数据线垂直的方向的截面图，并且圆圈部分即为残留的源漏金属。
发明人进一步发现，使用如图2所示的常规的第一常规掩模板和第二常规掩模板进行蚀刻后所形成的坡度角为60°左右，该坡度角使得源漏金属容易残留在台阶处，而受限于工艺条件，单纯地增加源漏金属蚀刻时间并不能消除该残留，并且有可能由于蚀刻时间过长而增加层间电介质层损失的风险，进而影响显示面板的良率。
有鉴于此，本公开的实施例提供了一种用于形成如图1中所示的柔性显示面板的沟槽Tx或Ty的掩模板。如图4所示，该掩模板包括第一区401、第二区402，以及在第一方向上夹在第一区401和第二区402之间的第三区403。第一区401和第二区402的透光性相同，并且与第三区403的透光性相反。同样应当指出的是，图4中的第一区、第二区和第三区的尺寸仅仅是示意性的，而不暗示第一区、第二区和第三区的实际相对尺寸关系。在实际应用中，如图4所示的掩模板可以是用于制作柔性显示面板的具有更大尺寸的掩模板的一部分，并且在这样的情况下，第一区和第二区将可能包括与柔性显示面板的其他部分对应的图案，在此不进行赘述。在示例中，第一区401和第二区402可以是不透光的，并且第三区403是透光的，使得该掩模板与正性光刻胶配合使用。可替换地，第一区401和第二区402可以是透光的，并且第三区403是不透光的，使得该掩模板与负性光刻胶配合使用。第三区403的图案与待形成的沟槽的图案对应。特别地，如图4所示，第一区401和第二区402的面向第三区403的边缘具有多个凸起404，每一个凸起404在靠近第三区403的一侧具有顶角，并且该顶角不大于90°。
当如图4所示的掩模板用于制作如图1所示的柔性显示面板的沟槽Tx或Ty时，该掩模板可以用于通过图案化工艺来制作沟槽Tx或Ty的第一沟槽和第二沟槽中的任一个。可替换地，可以使用两个如图4所示的掩模板来分别通过图案化工艺制作第一沟槽和第二沟 槽。如本公开中所使用的，“第一方向”是指与沿待形成的沟槽的延伸方向垂直的方向。以图1为例，用于形成沟槽Tx的掩模板的第一方向为y方向，而用于形成沟槽Ty的掩模板的第一方向为x方向。
当采用具有上述布置的掩模板制作如图3(a)中所示的柔性显示面板的弯折区中的第一沟槽和第二沟槽之一时，由于凸起404的存在，所形成的第一沟槽与第二沟槽连接处的台阶的坡度角将远远小于60°，因此即使源漏金属材料残留在该台阶上，残留的源漏金属材料也将由于台阶的坡度角远远小于60°而在该台阶的拐角处断开，从而避免相邻的数据线由于源漏金属残留而短接的情况，改进显示面板的显示效果。
应当指出的是，尽管在图4所示的掩模板中，第一区401和第二区402均具有凸起404，但是本公开不限于此。可替换地，在其它示例性实施例中，凸起404可以仅布置在第一区401和第二区402中的一个面向第三区403的边缘处，而同样能够在一定程度上降低残留在台阶上的源漏金属材料使得相邻的数据线短接的概率。
如图4所示，凸起404可以具有三角形的形状。可替换地，在其它示例性实施例中，凸起404可以具有其它形状，例如梯形、四边形、规则或不规则的多边形等，只要凸起404在靠近第三区403的一侧具有顶角，并且该顶角不大于90°即可。
在一些示例性实施例中，凸起404在上述第一方向上的尺寸不大于10微米，从而一方面保证第三区403能够形成具有足够大小的沟槽，以便于将显示面板四周的非显示区弯折到显示面板的主显示面的背侧，另一方面避免残留在沟槽台阶处的源漏金属使得相邻的数据线短接。
上述掩模板用于制作柔性显示面板上的凹槽，后续制作工艺中会在该显示面板上形成多条沿XX方向的数据线。为了进一步有效地避免相邻的数据线由于残留在沟槽台阶处的源漏金属而短接，可以使得掩模板的每一个凸起404在第二方向上的最大尺寸不大于相邻的数据线之间的距离，该第二方向垂直于上述第一方向。
当第一区401和第二区402均具有凸起404时，如图4所示，第一区401的凸起404和第二区402的相应凸起404在第一方向上正对。
图5图示了使用如图4所示的掩模板制作柔性显示面板的方法的流程图，并且图6(a)至图6(e)示意性地图示了对应于如图5所示的制作方法的各步骤的截面图。具体地，该柔性显示面板包括显示区和位于显示区外侧的柔性弯折区，并且掩模板用于在柔性弯折区处形成凹槽。在步骤S501处，如图6(a)所示，在衬底基板602上形成缓冲层603。缓冲层603可以采用任何常见的有机材料或无机材料来制作。接着，在步骤S502处，如图 6(b)所示，在缓冲层603上形成绝缘层604。绝缘层604可以采用常用的任何绝缘材料来制作，诸如SiO 2、Si 3N 4等。在步骤S503处，如图6(c)所示，使用第一掩模板在弯折区中蚀刻掉绝缘层604而形成第一沟槽PB1。第一掩模板可以是如图2所示的第一常规掩模板，也可以是本申请中任一实施例中的具有凸起的掩模板，例如，图4中的掩模板。具体地，通过光刻工艺在绝缘层604中形成第一沟槽PB1。首先，在绝缘层上涂敷光刻胶。当采用正性光刻胶时，掩模板的第一区和第二区是不透光的，并且掩模板的第三区是透光的，使得在光线照射后，第三区上的光刻胶发生变性而在显影中被去除。然后对暴露的绝缘层进行蚀刻而形成第一沟槽。最后去除剩余的光刻胶。当采用负性光刻胶时，掩模板的第一区和第二区是透光的，并且掩模板的第三区是不透光的，使得在光线照射后，第三区上的光刻胶在显影中被去除。同样地，然后对暴露的绝缘层进行蚀刻而形成第一沟槽，并且最后去除剩余的光刻胶。
然后，在步骤S504处，如图6(d)所示，使用第二掩模板在所形成的第一沟槽PB1中蚀刻掉缓冲层603而形成第二沟槽PB2。特别地，在本公开的实施例中，第一掩模板和第二掩模板中的至少一个是如图4所示的掩模板。例如，在一些实施例中，第一掩模板是如图2所示的第一常规掩模板M1，第二掩模板是如图4所示的本公开所提供的掩模板。在另外的一些实施例中，第一掩模板是如图4所示的本公开所提供的掩模板，第二掩模板是如图2所示的第二常规掩模板M2。在再另外的实施例中，第一掩模板和第二掩模板均为如图4所示的本公开所提供的掩模板。
然后，在步骤S505处，如图6(e)所示，在绝缘层604上形成源漏金属层605，其中该源漏金属层605覆盖第一沟槽PB1和第二沟槽PB2。此后，对源漏金属层605进行图案化，以形成柔性显示面板的数据线。
当采用本公开的实施例所提供的掩模板制作柔性显示面板的弯折区中的沟槽时，由于凸起的存在，所形成的台阶的坡度角将远远小于60°，因此即使源漏金属材料在图案化后残留在沟槽的台阶上，残留的源漏金属材料也将由于台阶的坡度角远远小于60°而在该台阶的拐角处断开，从而避免相邻的数据线由于源漏金属残留而短接的情况，改进显示面板的显示效果。
在上述实施例中，最终形成的沟槽经过两次光刻工艺来形成，其中第一次光刻使用第一掩模板，形成较大的第一沟槽，并且第二次光刻使用第二掩模板，在第一沟槽的相应位置处形成较窄的第二沟槽。第一沟槽靠近第二沟槽的表面在第一方向上的尺寸大于第二沟槽靠近第一沟槽的表面在第一方向上的尺寸，因此第一沟槽和第二沟槽在相接处形成台阶。由 于第一掩模板和/或第二掩模板的凸起的存在，所形成的台阶的坡度角将远远小于60°，因此即使源漏金属材料在图案化后残留在沟槽的台阶上，残留的源漏金属材料也将由于台阶的坡度角远远小于60°而在该台阶的拐角处断开，从而避免相邻的数据线由于源漏金属残留而短接的情况，改进显示面板的显示效果。
示例性的，在制作第一沟槽和第二沟槽时，可以分别使用本申请实施例中的掩模板，例如图7(a)和图7(b)分别图示了可以在如图5所示的方法中使用的第一掩模板M'1和第二掩模板M'2在叠放状态下的顶视图和侧视图，其中第一掩模板M'1和第二掩模板M'2均为如图4所示的根据本公开的实施例的掩模板。如图7(a)所示，在分别使用第一掩模板M'1和第二掩模板M'2进行的光刻工艺中，当使用正性光刻胶时，为了保证在第一方向上，第一沟槽的最小尺寸大于第二沟槽的最大尺寸，并且保证在第一沟槽和第二沟槽相接处形成的台阶的坡度角远远小于60°，第一掩模板M'1的凸起在第二掩模板M'2上的正投影应当落入第二掩模板M'2的凸起范围内。在此情况下，第一掩模板M'1和第二掩模板M'2的第一区701和第二区702不透光，并且第一掩模板M'1和第二掩模板M'2的第三区703透光。
相反，当使用负性光刻胶时，为了保证在第一方向上，第一沟槽的最小尺寸大于第二沟槽的最大尺寸，并且保证在第一沟槽和第二沟槽相接处形成的台阶的坡度角远远小于60°，第二掩模板的凸起在第一掩模板上的正投影应当落入第一掩模板的凸起范围内。相应地，第一掩模板和第二掩模板的第一区和第二区透光，并且第一掩模板和第二掩模板的第三区不透光。
本公开的实施例还提供了一种使用上述方法制作的柔性显示面板，包括沿特定方向延伸的多条数据线。如图8所示，柔性显示面板包括衬底基板802。为了实现显示面板的柔性，可以使用柔性材料来制作衬底基板802，例如聚酰亚胺，并且为了保证足够的支撑强度，可以使用多层聚酰亚胺来制作衬底基板802。在衬底基板802上依次设置缓冲层803和绝缘层804。第一沟槽PB1形成在绝缘层804中，第二沟槽PB2形成在缓冲层803中，并且第一沟槽PB1和第二沟槽PB2的位置与柔性显示面板的弯折区对应。如图8所示，在该柔性显示面板的数据线的延伸方向上，第一沟槽PB1的最小尺寸大于第二沟槽PB2的最大尺寸，从而在二者之间形成台阶。在绝缘层804上设置源漏金属层805，该源漏金属层805覆盖第一沟槽PB1。
进一步地，上述柔性显示面板还可以包括位于衬底基板802远离缓冲层803的一侧的保护层801、位于源漏金属层805远离绝缘层804的一侧上的平坦化层806，以及位于平 坦化层806远离源漏金属层802的一侧上的封装层807。
在上述柔性显示面板中，由于所使用的掩模板的凸起的存在，所形成的台阶的坡度角将远远小于60°，因此即使源漏金属材料在图案化后残留在沟槽的台阶上，残留的源漏金属材料也将由于台阶的坡度角远远小于60°而在该台阶的拐角处断开，从而避免相邻的数据线由于源漏金属残留而短接的情况，改进显示面板的显示效果。
本公开的概念可以广泛地应用于具有显示功能的各种柔性电子系统，例如移动电话、笔记本计算机、液晶电视等等。
除非另外定义，否则本公开使用的技术术语或者科学术语应当为本公开所属领域普通技术人员所理解的通常意义。本公开中使用的“第一”、“第二”以及类似的词语并不表示任何顺序、数量或者重要性，而只是用来区分不同的组成部分。同样，“一个”、“一”或者“该”等类似词语也不表示数量限制，而是表示存在至少一个。“包括”或者“包含”等类似的词语意指出现该词前面的元件或者物件涵盖出现在该词后面列举的元件或者物件及其等同，而不排除其他元件或者物件。“连接”或者“相连”等类似的词语并非限定于物理的或者机械的连接，而是可以包括电性的连接，不管是直接的还是间接的。“上”、“下”、“左”、“右”等仅用于表示相对位置关系，当被描述对象的绝对位置改变后，则该相对位置关系也可能相应地改变。需要注意的是，在不冲突的前提下，上述实施例中的特征可以任意组合使用。
以上所述，仅为本公开的示例性实施方式，但本公开的保护范围并不局限于此，任何本领域普通技术人员在本公开揭露的技术范围内，可轻易想到的变化或替换，都应涵盖在本公开的保护范围之内。因此，本公开的保护范围应该以权利要求的保护范围为准。

Claims (10)

  1. 一种掩模板，用于在柔性显示面板的柔性弯折区中形成沟槽，所述掩模板包括第一区、第二区，以及在第一方向上夹在所述第一区和第二区之间的第三区，所述第三区具有与待形成的沟槽相同的图案，其中
    所述第一区和第二区的透光性相同，并且与所述第三区的透光性相反，并且
    所述第一区和/或所述第二区的面向所述第三区的边缘具有多个凸起，每一个所述凸起在靠近所述第三区的一侧具有顶角，并且所述顶角不大于90°。
  2. 根据权利要求1所述的掩模板，其中，所述凸起的形状选自三角形、梯形、四边形。
  3. 根据权利要求1所述的掩模板，其中，所述凸起在所述第一方向上的尺寸不大于10微米。
  4. 根据权利要求1所述的掩模板，其中，所述柔性显示面板具有沿所述第一方向延伸的多条数据线，并且每一个凸起在第二方向上的最大尺寸不大于相邻的数据线之间的距离，所述第二方向垂直于所述第一方向。
  5. 根据权利要求1所述的掩模板，其中，所述第一区和所述第二区的面向所述第三区的边缘具有多个所述凸起，并且所述第一区的凸起与所述第二区的相应凸起在所述第一方向上正对。
  6. 一种制作柔性显示面板的方法，其中，所述柔性显示面板包括显示区和位于显示区外侧的柔性弯折区，所述方法包括：
    在衬底上形成缓冲层；
    在所述缓冲层背离所述衬底的一侧上形成绝缘层；
    使用第一掩模板在所述柔性弯折区中蚀刻掉所述绝缘层而形成第一沟槽；
    使用第二掩模板在所述第一沟槽中蚀刻掉所述缓冲层而形成第二沟槽；以及
    在所述绝缘层背离所述缓冲层的一侧上形成源漏金属层，其中所述源漏金属层覆盖所述第一沟槽和所述第二沟槽，
    其中，所述第一掩模板和所述第二掩模板中的至少一个是根据权利要求1-5中任一项所述的掩模板。
  7. 根据权利要求6所述的方法，其中，所述第一掩模板和所述第二掩模板均为根据权利要求1-5中任一项所述的掩模板，并且所述第一掩模板的第三区在其第一方向上的尺寸大于所述第二掩模板的第三区在其第一方向上的尺寸。
  8. 根据权利要求7所述的方法，其中，在所述第一方向上，所述第一沟槽的最小尺寸大于所述第二沟槽的最大尺寸。
  9. 一种柔性显示面板，使用权利要求6-8中任一项所述的方法制作，其中，所述柔性显示面板包括显示区和位于显示区外侧的柔性弯折区，并且，所述柔性显示面板包括：
    衬底；
    设置在所述衬底上的缓冲层；
    设置在所述缓冲层背离所述衬底的一侧上的绝缘层；
    在所述柔性弯折区中设置在所述绝缘层中的第一沟槽；
    在所述第一沟槽中设置在所述缓冲层中的第二沟槽。
  10. 根据权利要求9所述的柔性显示面板，其中，在所述第一方向上，所述第一沟槽的最小尺寸大于所述第二沟槽的最大尺寸。
PCT/CN2019/127852 2019-01-30 2019-12-24 掩模板、柔性显示面板及其制作方法 WO2020155942A1 (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US17/042,140 US11963431B2 (en) 2019-01-30 2019-12-24 Mask, flexible display panel and manufacturing method thereof

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201910092372.4A CN111505897B (zh) 2019-01-30 2019-01-30 掩模板、柔性显示面板及其制作方法
CN201910092372.4 2019-01-30

Publications (1)

Publication Number Publication Date
WO2020155942A1 true WO2020155942A1 (zh) 2020-08-06

Family

ID=71840798

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2019/127852 WO2020155942A1 (zh) 2019-01-30 2019-12-24 掩模板、柔性显示面板及其制作方法

Country Status (3)

Country Link
US (1) US11963431B2 (zh)
CN (1) CN111505897B (zh)
WO (1) WO2020155942A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200129230A (ko) * 2019-05-07 2020-11-18 삼성디스플레이 주식회사 표시 부품, 표시 장치 및 그것의 제조 방법

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104035274A (zh) * 2014-06-11 2014-09-10 京东方科技集团股份有限公司 掩膜板及利用掩膜板构图的方法
CN204374608U (zh) * 2015-01-23 2015-06-03 山西大同大学 一种掩模板
US20160141587A1 (en) * 2014-11-19 2016-05-19 Samsung Sdi Co., Ltd. Rechargeable battery
CN106449695A (zh) * 2015-08-06 2017-02-22 三星显示有限公司 柔性显示装置
CN107978612A (zh) * 2017-11-30 2018-05-01 京东方科技集团股份有限公司 柔性显示基板及其制备方法、柔性显示面板及显示装置
CN108054188A (zh) * 2017-12-20 2018-05-18 上海天马微电子有限公司 柔性显示装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105511221B (zh) * 2016-01-05 2019-11-19 京东方科技集团股份有限公司 膜层及其制备方法、基板、显示装置
CN206133181U (zh) * 2016-11-01 2017-04-26 合肥鑫晟光电科技有限公司 一种掩膜板
CN107247386A (zh) * 2017-06-14 2017-10-13 京东方科技集团股份有限公司 掩膜版、过孔及显示基板的形成方法、显示基板及装置
JP6843710B2 (ja) * 2017-07-12 2021-03-17 株式会社ジャパンディスプレイ 表示装置、および表示装置の製造方法
CN108288637B (zh) * 2018-01-24 2021-03-02 武汉华星光电半导体显示技术有限公司 柔性显示面板的制作方法及柔性显示面板
US11342398B2 (en) * 2018-02-21 2022-05-24 Sharp Kabushiki Kaisha Display device and method of manufacturing same
KR102584517B1 (ko) * 2018-02-28 2023-10-05 삼성디스플레이 주식회사 디스플레이 장치

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104035274A (zh) * 2014-06-11 2014-09-10 京东方科技集团股份有限公司 掩膜板及利用掩膜板构图的方法
US20160141587A1 (en) * 2014-11-19 2016-05-19 Samsung Sdi Co., Ltd. Rechargeable battery
CN204374608U (zh) * 2015-01-23 2015-06-03 山西大同大学 一种掩模板
CN106449695A (zh) * 2015-08-06 2017-02-22 三星显示有限公司 柔性显示装置
CN107978612A (zh) * 2017-11-30 2018-05-01 京东方科技集团股份有限公司 柔性显示基板及其制备方法、柔性显示面板及显示装置
CN108054188A (zh) * 2017-12-20 2018-05-18 上海天马微电子有限公司 柔性显示装置

Also Published As

Publication number Publication date
CN111505897A (zh) 2020-08-07
US11963431B2 (en) 2024-04-16
CN111505897B (zh) 2021-12-31
US20210020873A1 (en) 2021-01-21

Similar Documents

Publication Publication Date Title
TWI518890B (zh) 有機發光顯示器及其製造方法
WO2018176740A1 (zh) 柔性显示面板、显示装置及柔性显示面板的制作方法
US11349104B2 (en) Display panel and method of manufacturing the same
WO2016179940A1 (zh) Oled像素单元、透明显示装置及制作方法、显示设备
WO2019105086A1 (zh) 显示基板及其制作方法、显示面板、显示装置
WO2021047163A1 (zh) 一种显示面板、显示模组以及显示装置
US20200388782A1 (en) Display substrate and manufacturing method therefor
CN110797379B (zh) 一种显示基板、显示装置及显示基板的制作方法
US11793037B2 (en) Display panel and display device
WO2021196362A1 (zh) 低温多晶硅显示面板及其制作方法、液晶显示装置
US20180175065A1 (en) Electrical Connection Structure, Array Substrate and Display Device
KR20150125207A (ko) 유기 발광 표시 장치 및 이의 제조 방법
WO2020155942A1 (zh) 掩模板、柔性显示面板及其制作方法
TWI650855B (zh) 頂部發光型微發光二極體顯示器與底部發光型微發光二極體顯示器及其形成方法
TW201743118A (zh) 顯示面板
WO2018214628A1 (zh) 阵列基板、其制作方法、液晶显示面板及显示装置
JP2020533626A (ja) Ｔｆｔ基板の製造方法及びその構造
TWI690838B (zh) 畫素陣列基板
TW200422703A (en) Liquid crystal display device
WO2021248453A1 (zh) 显示面板及其制作方法和显示装置
KR20210054650A (ko) 윈도우 글라스, 이를 포함하는 표시 장치 및 이의 제조 방법
US20240040866A1 (en) Display substrate and display device
US11625132B2 (en) Touch pad and method for manufacturing the same, touch display device
KR20200047832A (ko) 표시 장치 및 이의 제조 방법
US11906860B2 (en) Electronic device

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 19913740

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 19913740

Country of ref document: EP

Kind code of ref document: A1

122 Ep: pct application non-entry in european phase

Ref document number: 19913740

Country of ref document: EP

Kind code of ref document: A1

32PN Ep: public notification in the ep bulletin as address of the adressee cannot be established

Free format text: NOTING OF LOSS OF RIGHTS PURSUANT TO RULE 112(1) EPC (EPO FORM 1205A DATED 24.01.2022)

122 Ep: pct application non-entry in european phase

Ref document number: 19913740

Country of ref document: EP

Kind code of ref document: A1