WO2020155475A1 - 负性光阻材料及彩色滤光片 - Google Patents

负性光阻材料及彩色滤光片 Download PDF

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Publication number
WO2020155475A1
WO2020155475A1 PCT/CN2019/087863 CN2019087863W WO2020155475A1 WO 2020155475 A1 WO2020155475 A1 WO 2020155475A1 CN 2019087863 W CN2019087863 W CN 2019087863W WO 2020155475 A1 WO2020155475 A1 WO 2020155475A1
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Prior art keywords
pigment
photoresist material
negative photoresist
photoinitiator
material according
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PCT/CN2019/087863
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English (en)
French (fr)
Inventor
饶夙缔
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Definitions

  • the invention relates to the field of display technology, in particular to a negative photoresist material and a color filter.
  • the color filter includes a base substrate 11, a red color resist 13, a green color resist 12, and a blue color resist 14. The two sides of the blue color resist 14 are respectively on the red color resist 13 and the green color resist 12.
  • An overlap is formed, and a horn 141 is formed at the overlap. If the horn 141 is too high, the uneven terrain will affect the inverted direction of the liquid crystal after the cell is formed, causing light leakage in the dark state, thereby affecting the contrast and reducing the quality of the panel.
  • the horn 141 is formed because of the overlap between the color resistors to form a height difference, and the height of the horn 141 will also increase as the color resistor overlap width W increases. Therefore, if you want to reduce the height of the horns 141, you will want to make the overlap width between the color resistors smaller. However, if the width W of the overlap is directly made small in the design, when the alignment accuracy shifts in the process, a gap will appear between the color resistance and the color resistance, which will cause light leakage, as shown in Figure 2, blue There is a gap between the color resistance 14 and the green color resistance 12. Therefore, due to the limitation of the positioning accuracy of the machine, it is impossible to reduce the overlap in the design, which makes it impossible to optimize the horns in the design.
  • the present invention provides a negative photoresist material and a color filter to solve the problem of the existing color filter, due to the overlap between the color resists, the color resist and the black matrix, and the overlap position It cannot be completely flat to form a horn with a certain height. However, due to the limitation of the manufacturing process, the horn cannot be optimized. If the horn is too high, it will affect the inverted direction of the liquid crystal after the cell is formed, causing light leakage in the dark state, thereby affecting the display technical problem.
  • the present invention provides a negative photoresist material, in terms of weight percentage, comprising: 6% ⁇ 10% resin, 2% ⁇ 7% polyfunctional monomer, 5% ⁇ 12% pigment dispersion, 70% ⁇ 80% solvent, 0.1% to 0.2% additives, and 0.4% to 0.8% photoinitiator; wherein, the photoinitiator has a main absorption peak at a wavelength of 300 to 330 nanometers in the ultraviolet absorption spectrum;
  • the photoinitiator is one or more combinations of ⁇ -hydroxy ketone derivatives, ⁇ -amino ketone derivatives, and benzoyl esters;
  • the resin is alkali-soluble acrylic resin and polyvinyl cinnamate One or more combinations of.
  • the photoinitiator is 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-phenyl-1-propanone, 2-methyl- One or more combinations of 1-(4-methylthiophenyl)-2-morpholin-1-acetone, BASF photoinitiator, and methyl benzoyl formate.
  • the multifunctional monomer is trimethylolpropane triacrylate, tris (2-hydroxyethyl) isocyanuric acid triacrylate, pentaerythritol tetraacrylate, and bi One or more combinations of pentaerythritol hexaacrylate.
  • the pigment dispersion liquid includes a pigment, a dispersing resin wrapped on the surface of the pigment, and a dispersant.
  • the pigment is an azo pigment, a naphthol series pigment, a benzimidazolone pigment, a phthalocyanine pigment, a quinacridone pigment, an anthraquinone pigment, or a quinophthalone pigment pigment.
  • the solvent is propylene glycol methyl ether acetate, propylene glycol diacetate, methylene bisacrylamide, N-methylpyrrolidone, ethyl 3-ethoxypropionate, And one or more combinations of cyclohexanone.
  • the additive is one or more combinations of a leveling agent, a defoaming agent, a surfactant, and a silane coupling agent.
  • the present invention provides another negative photoresist material, which includes 6% ⁇ 10% resin, 2% ⁇ 7% multifunctional monomer, 5% ⁇ 12% pigment dispersion, 70% by weight ⁇ 80% solvent, 0.1% ⁇ 0.2% additive, and 0.4% ⁇ 0.8% photoinitiator; wherein, the photoinitiator has a main absorption peak at a wavelength of 300 ⁇ 330 nanometers in the ultraviolet absorption spectrum.
  • the photoinitiator is one or more combinations of ⁇ -hydroxyketone derivatives, ⁇ -aminoketone derivatives, and benzoyl formates.
  • the photoinitiator is 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-phenyl-1-propanone, 2-methyl- One or more combinations of 1-(4-methylthiophenyl)-2-morpholin-1-acetone, BASF photoinitiator, and methyl benzoyl formate.
  • the resin is one or more combinations of alkali-soluble acrylic resin and polyvinyl alcohol cinnamate.
  • the multifunctional monomer is trimethylolpropane triacrylate, tris (2-hydroxyethyl) isocyanuric acid triacrylate, pentaerythritol tetraacrylate, and bi One or more combinations of pentaerythritol hexaacrylate.
  • the pigment dispersion liquid includes a pigment, a dispersing resin wrapped on the surface of the pigment, and a dispersant.
  • the pigment is an azo pigment, a naphthol series pigment, a benzimidazolone pigment, a phthalocyanine pigment, a quinacridone pigment, an anthraquinone pigment, or a quinophthalone pigment pigment.
  • the solvent is propylene glycol methyl ether acetate, propylene glycol diacetate, methylene bisacrylamide, N-methylpyrrolidone, ethyl 3-ethoxypropionate, And one or more combinations of cyclohexanone.
  • the additive is one or more combinations of a leveling agent, a defoaming agent, a surfactant, and a silane coupling agent.
  • the present invention also provides a color filter, comprising a base substrate and a color resist layer disposed on the base substrate, the color resist layer is formed of a negative photoresist material, and the negative Photoresist materials include: 6% ⁇ 10% resin, 2% ⁇ 7% polyfunctional monomer, 5% ⁇ 12% pigment dispersion, 70% ⁇ 80% solvent, 0.1% ⁇ 0.2% additive , And 0.4% to 0.8% photoinitiator; wherein the photoinitiator has a main absorption peak at a wavelength of 300 to 330 nanometers in the ultraviolet absorption spectrum.
  • the photoinitiator is one or more combinations of ⁇ -hydroxyketone derivatives, ⁇ -aminoketone derivatives, and benzoyl formates.
  • the photoinitiator is 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-phenyl-1-propanone, 2-methyl- One or more combinations of 1-(4-methylthiophenyl)-2-morpholin-1-acetone, BASF photoinitiator, and methyl benzoyl formate.
  • the resin is one or more combinations of alkali-soluble acrylic resin and polyvinyl alcohol cinnamate.
  • the beneficial effects of the present invention are: the negative photoresist material provided by the present invention has different sensitivities on different substrates, the sensitivity is higher on glass and silicon nitride substrates, and the sensitivity is lower on other photoresist substrates, thereby making When the photoresist of the present invention is overlapped with other photoresists, the overlap width will be reduced due to the low sensitivity, and the effect of reducing the horns is achieved; at the same time, because the photoresist of the present invention has a higher sensitivity on the substrate, the alignment accuracy will be biased. When shifting, the photoresist can still cover the substrate to avoid light leakage.
  • Figures 1 to 2 are schematic diagrams of the structure of a prior art color filter
  • FIG. 3 is a curve comparison diagram of the reflectance of the photoresist material of the present invention and silicon nitride in the ultraviolet band;
  • FIG. 4 is a schematic diagram of the structure of the color filter of the present invention.
  • the present invention is aimed at the existing color filter, because there are overlaps between the color resists and between the color resists and the black matrix, and the position of the overlap cannot be completely flat, forming a horn with a certain height, but in design Due to the limitation of the manufacturing process, it is impossible to optimize the horns. Excessively high horns will affect the inverted direction of the liquid crystal after the cell is formed, causing light leakage in the dark state, thereby affecting the technical problem of display. This embodiment can solve this defect.
  • the invention provides a negative photoresist material, which includes a resin, a multifunctional monomer, a pigment dispersion, a solvent, an additive, and a photoinitiator.
  • the content of the resin is 6% ⁇ 10%
  • the content of the multifunctional monomer is 2% ⁇ 7%
  • the content of the pigment dispersion is 5% ⁇ 12%
  • the content of the solvent is 70% to 80%
  • the content of the additive is 0.1% to 0.2%
  • the content of the photoinitiator is 0.4% to 0.8%.
  • the photoresist of the present invention selects a photoinitiator that has a main absorption peak at a wavelength of 300-330 nanometers in the ultraviolet absorption spectrum, and has weak or no absorption in the longer wavelength band of 330-380 nanometers.
  • the base substrate is mostly glass or silicon nitride substrate
  • the refractive index of glass or silicon nitride in the 300-330 nanometer ultraviolet band is relatively high.
  • the part blocked on the substrate can be subjected to secondary exposure, so the cross-linking is stronger, while the part on the other color resistors is partially absorbed by the ultraviolet light that initiates the photoreaction and has low reflectivity, so the degree of cross-linking is weaker.
  • the photoresist of the present invention has different sensitivity on different substrates and can be used to effectively reduce horns.
  • the photoinitiator is one or more combinations of ⁇ -hydroxy ketone derivatives, ⁇ -amino ketone derivatives, and benzoyl formates.
  • the photoinitiator is 1-hydroxycyclohexyl phenyl ketone (Irgacure 184), 2-hydroxy-2-methyl-1-phenyl-1-acetone (Darocur 1173), 2-methyl-1-( One or more combinations of 4-methylthiophenyl)-2-morpholin-1-acetone (Irgacure 907), BASF photoinitiator (Irgacure 369), and methyl benzoyl formate.
  • the photoinitiator can also be another photoinitiator whose main absorption peak is in the ultraviolet range of 300-330 nanometers, is non-toxic, non-yellowing, and has good solubility in common color resist solvents.
  • the resin is one or more combinations of alkali-soluble acrylic resin and polyvinyl alcohol cinnamate.
  • the multifunctional monomer is one or more of trimethylolpropane triacrylate, tris(2-hydroxyethyl)isocyanurate triacrylate, pentaerythritol tetraacrylate, and dipentaerythritol hexaacrylate
  • the combination can also be other commonly used multifunctional monomers for color resistance.
  • the pigment dispersion liquid includes a pigment, a dispersing resin and a dispersant wrapped on the surface of the pigment.
  • Different photoresists can be selected with different pigments.
  • the pigments include red pigments, red dyes, green pigments, yellow pigments, blue pigments, and blue pigments. One or more of color dyes, purple pigments, and purple dyes.
  • the pigments can be azo pigments, naphthol series pigments, benzimidazolone pigments, phthalocyanine pigments, quinacridone pigments, anthraquinone pigments, Or quinophthalone pigments.
  • the solvent is one or more of propylene glycol methyl ether acetate, propylene glycol diacetate, methylene bisacrylamide, N-methylpyrrolidone, ethyl 3-ethoxypropionate, and cyclohexanone combination.
  • the additives are one or more combinations of leveling agents, defoamers, surfactants, and silane coupling agents.
  • FIG. 3 it is a curve comparison diagram of the reflectance of the photoresist material of the present invention and the silicon nitride (SiNx) material in the ultraviolet band.
  • the solid line curve on the upper side in FIG. 3 is the reflectance of silicon nitride.
  • the dashed curve at the bottom is the reflectivity of the photoresist of the present invention.
  • the reflectivity of the silicon nitride is about 15 times higher than the reflectivity of the photoresist of the present invention at around 300 nanometers in the ultraviolet short wavelength band.
  • the photoresist of the present invention selects a photoinitiator with a main absorption peak at 300 ⁇ 330nm.
  • the second exposure is performed on plain glass or SiNx substrate due to high reflectivity, so the cross-linking is strong.
  • the reacted ultraviolet light is partially absorbed and the reflectivity is very low, so the degree of crosslinking is weak.
  • the photoresist of the present invention overlaps with other color resists, since the sensitivity is relatively low, compared with the existing color resists, the actual overlap area of the overlap is smaller, so that the effect of reducing the horns can be achieved. And because it has sufficient sensitivity in the open area, that is, on the substrate such as glass or SiNx, even when the alignment accuracy is shifted, the photoresist can still cover the substrate without light leakage. Therefore, the color provided by the present invention
  • the barrier material can effectively improve the horn problem and avoid light leakage.
  • the present invention also provides a color filter, which includes a base substrate 21 and a color resist layer disposed on the base substrate.
  • the base substrate is a glass substrate or a SiNx substrate.
  • the color resist layer is formed of the above negative photoresist material.
  • the color resist layer includes a red color resist 23, a green color resist 22, and a blue color resist 24.
  • the red, blue, and green resists are arranged in order.
  • the color resists of each color can be Arrange in other order.
  • the color resist of the present invention is made of the above-mentioned negative photoresist material, the part of the blue color resist 24 on the base substrate 21 has a higher sensitivity, and the higher reflectivity of the base substrate 21 will cause the secondary Exposure, even if the alignment of the mask plate and the exposure area is shifted ( Figure 4 shows the structure of the blue color resist 24 when the mask is shifted to the left), there will still be blue color resist 24 covering the base substrate 21 and shift In the position of, there will be no light leakage in Figure 2; when the two ends of the blue color resist 24 overlap the other two color resists, because the blue color resist 24 has a lower sensitivity on the color resist substrate, it is different from the existing Compared with the color resistance, the actual overlap area will be smaller, which can achieve the effect of reducing the height of the horns.
  • the negative photoresist material provided by the present invention has different sensitivities on different substrates.
  • the sensitivity is higher on glass and silicon nitride substrates, and the sensitivity is lower on other photoresist substrates.
  • the photoresist is overlapped with other photoresist, the overlap width will be reduced due to the low sensitivity, and the effect of reducing the horns is achieved; at the same time, because the photoresist of the present invention has a higher sensitivity on the substrate, even when the alignment accuracy is shifted , The photoresist can still cover the substrate to avoid light leakage.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)

Abstract

一种负性光阻材料，以重量百分数计，包括6％～10％的树脂、2％～7％的多官能单体、5％～12％的颜料分散液、70％～80％的溶剂、0.1％～0.2％的添加剂、以及0.4％～0.8％的光引发剂，光引发剂在紫外吸收光谱中在波长300～330纳米处具有主吸收峰。负性光阻材料在应用于彩色滤光片的色阻时，可有效改善牛角偏高问题以及避免漏光现象发生。

Description

负性光阻材料及彩色滤光片 技术领域
本发明涉及显示技术领域，尤其涉及一种负性光阻材料及彩色滤光片。
 背景技术
在TFT-LCD（thin film transistor-liquid crystal display，薄膜晶体管阵列-液晶显示器）彩色滤光片的制作工艺中，为避免漏光，红、绿、蓝色阻之间以及红、绿、蓝色阻与黑色矩阵之间通常会存在一定的搭接（Overlap），而搭接的位置无法完全平坦，因此会出现一定高度的牛角。如图1所示，彩色滤光片包括衬底基板11、红色色阻13、绿色色阻12、蓝色色阻14，蓝色色阻14的两侧分别在红色色阻13和绿色色阻12上形成搭接，在搭接处形成牛角141，牛角141过高在成盒之后由于地形的不平坦会影响液晶的倒向，造成暗态漏光，进而影响对比度，降低面板品质。
牛角141的形成是因为色阻之间存在搭接而形成高度差，而牛角141的高度也会随着色阻搭接宽度W的增加而增加。因此，通常若想要降低牛角141的高度，会希望把色阻之间的搭接宽度做得更小。然而，若设计上直接把搭接的宽度W做小，那么当制程上出现对位精度偏移时，色阻与色阻之间就会出现空隙，从而导致漏光，如图2所示,蓝色色阻14与绿色色阻12之间出现缝隙。因此，由于机台对位精度的限制，设计上无法将搭接减小，导致无法在设计上对牛角进行优化。
 技术问题
本发明提供一种负性光阻材料及彩色滤光片，以解决现有的彩色滤光片，由于彩色色阻之间、彩色色阻与黑矩阵之间存在搭接，而搭接的位置无法完全平坦，形成具有一定高度的牛角，但是在设计上由于制程工艺的限制，无法对牛角进行优化，牛角过高在成盒之后会影响液晶的倒向，造成暗态漏光，进而影响显示的技术问题。
 技术解决方案
为解决上述问题，本发明提供的技术方案如下：
本发明提供一种负性光阻材料，以重量百分数计，包括：6%~10%的树脂、2%~7%的多官能单体、5%~12%的颜料分散液、70%~80%的溶剂、0.1%~0.2%的添加剂、以及0.4%~0.8%的光引发剂；其中，所述光引发剂在紫外吸收光谱中在波长300~330纳米处具有主吸收峰；所述光引发剂为α-羟基酮类衍生物、α-氨基酮类衍生物以及苯甲酰甲酸酯类中的一种或多种组合；所述树脂为碱溶性丙烯酸树脂和聚乙烯醇肉桂酸酯中的一种或多种组合。
在本发明的至少一种实施例中，所述光引发剂为1-羟基环已基苯基酮、2-羟基-2-甲基-1-苯基-1-丙酮、2-甲基-1-(4-甲硫基苯基 )-2-吗啉基-1-丙酮、巴斯夫光引发剂、以及苯甲酰甲酸甲酯中的一种或多种组合。
在本发明的至少一种实施例中，所述多官能单体为三羟甲基丙烷三丙烯酸酯、三(2-羟乙基)异氰脲酸三丙烯酸酯、季戊四醇四丙烯酸酯、以及双季戊四醇六丙烯酸酯中的一种或多种组合。
在本发明的至少一种实施例中，所述颜料分散液包括颜料、包裹在颜料表面的分散树脂和分散剂。
在本发明的至少一种实施例中，所述颜料为偶氮颜料、萘酚系列颜料、苯并咪唑酮颜料、酞菁颜料、喹吖啶酮类颜料、蒽醌颜料、或者喹酞酮类颜料。
在本发明的至少一种实施例中，所述溶剂为丙二醇甲醚醋酸酯、丙二醇二乙酸酯、亚甲基双丙烯酰胺、N-甲基吡咯烷酮、3-乙氧基丙酸乙酯、以及环己酮中的一种或多种组合。
在本发明的至少一种实施例中，所述添加剂为流平剂、消泡剂、表面活性剂、以及硅烷偶联剂中的一种或多种组合。
本发明提供另一种负性光阻材料，以重量百分数计，包括：6%~10%的树脂、2%~7%的多官能单体、5%~12%的颜料分散液、70%~80%的溶剂、0.1%~0.2%的添加剂、以及0.4%~0.8%的光引发剂；其中，所述光引发剂在紫外吸收光谱中在波长300~330纳米处具有主吸收峰。
在本发明的至少一种实施例中，所述光引发剂为α-羟基酮类衍生物、α-氨基酮类衍生物以及苯甲酰甲酸酯类中的一种或多种组合。
在本发明的至少一种实施例中，所述光引发剂为1-羟基环已基苯基酮、2-羟基-2-甲基-1-苯基-1-丙酮、2-甲基-1-(4-甲硫基苯基 )-2-吗啉基-1-丙酮、巴斯夫光引发剂、以及苯甲酰甲酸甲酯中的一种或多种组合。
在本发明的至少一种实施例中，所述树脂为碱溶性丙烯酸树脂和聚乙烯醇肉桂酸酯中的一种或多种组合。
在本发明的至少一种实施例中，所述多官能单体为三羟甲基丙烷三丙烯酸酯、三(2-羟乙基)异氰脲酸三丙烯酸酯、季戊四醇四丙烯酸酯、以及双季戊四醇六丙烯酸酯中的一种或多种组合。
在本发明的至少一种实施例中，所述颜料分散液包括颜料、包裹在颜料表面的分散树脂和分散剂。
在本发明的至少一种实施例中，所述颜料为偶氮颜料、萘酚系列颜料、苯并咪唑酮颜料、酞菁颜料、喹吖啶酮类颜料、蒽醌颜料、或者喹酞酮类颜料。
在本发明的至少一种实施例中，所述溶剂为丙二醇甲醚醋酸酯、丙二醇二乙酸酯、亚甲基双丙烯酰胺、N-甲基吡咯烷酮、3-乙氧基丙酸乙酯、以及环己酮中的一种或多种组合。
在本发明的至少一种实施例中，所述添加剂为流平剂、消泡剂、表面活性剂、以及硅烷偶联剂中的一种或多种组合。
本发明还提供一种彩色滤光片，包括衬底基板和设置于所述衬底基板上的色阻层，所述色阻层由负性光阻材料形成，以重量百分数计，所述负性光阻材料包括：6%~10%的树脂、2%~7%的多官能单体、5%~12%的颜料分散液、70%~80%的溶剂、0.1%~0.2%的添加剂、以及0.4%~0.8%的光引发剂；其中，所述光引发剂在紫外吸收光谱中在波长300~330纳米处具有主吸收峰。
在本发明的至少一种实施例中，所述光引发剂为α-羟基酮类衍生物、α-氨基酮类衍生物以及苯甲酰甲酸酯类中的一种或多种组合。
在本发明的至少一种实施例中，所述光引发剂为1-羟基环已基苯基酮、2-羟基-2-甲基-1-苯基-1-丙酮、2-甲基-1-(4-甲硫基苯基 )-2-吗啉基-1-丙酮、巴斯夫光引发剂、以及苯甲酰甲酸甲酯中的一种或多种组合。
在本发明的至少一种实施例中，所述树脂为碱溶性丙烯酸树脂和聚乙烯醇肉桂酸酯中的一种或多种组合。
 有益效果
本发明的有益效果为：本发明提供的负性光阻材料在不同的基底上存在不同的感度，在玻璃及氮化硅基板上感度较高，在其他光阻基底上感度较低，进而使得本发明的光阻在于其他光阻搭接时，由于感度较低，搭接宽度会减小，达到降低牛角的效果；同时由于本发明的光阻在基板上感度较高，对位精度发生偏移时，仍能使光阻覆盖基板，避免漏光现象发生。
 附图说明
为了更清楚地说明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单介绍，显而易见地，下面描述中的附图仅仅是发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1~图2为现有技术彩色滤光片的结构示意图；
图3为本发明的光阻材料与氮化硅在紫外波段反射率的曲线对比图；
图4为本发明的彩色滤光片的结构示意图。
 本发明的实施方式
以下各实施例的说明是参考附加的图示，用以例示本发明可用以实施的特定实施例。本发明所提到的方向用语，例如[上]、[下]、[前]、[后]、[左]、[右]、[内]、[外]、[侧面]等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本发明，而非用以限制本发明。在图中，结构相似的单元是用以相同标号表示。
本发明针对现有的彩色滤光片，由于彩色色阻之间、彩色色阻与黑矩阵之间存在搭接，而搭接的位置无法完全平坦，形成具有一定高度的牛角，但是在设计上由于制程工艺的限制，无法对牛角进行优化，牛角过高在成盒之后会影响液晶的倒向，造成暗态漏光，进而影响显示的技术问题，本实施例能够解决该缺陷。
本发明提供一种负性光阻材料，包括树脂、多官能单体、颜料分散液、溶剂、添加剂、以及光引发剂。
以所述负性光阻材料的重量百分数计，所述树脂的含量为6%~10%，所述多官能单体的含量为2%~7%，所述颜料分散液的含量为5%~12%，所述溶剂的含量为70%~80%，所述添加剂的含量为0.1%~0.2%，所述光引发剂的含量为0.4％~0.8％。
本发明所述的光阻选用在紫外线吸收光谱中在波长300~330纳米处具有主吸收峰，在330~380纳米较长波段吸收较弱或无吸收的光引发剂。
本发明所述的光阻在制备彩色滤光片时，由于衬底基板多为玻璃或氮化硅基板，玻璃或氮化硅在300~330纳米紫外波段的折射率较高，本发明的光阻在基板上的部分能够受到二次曝光，因而交联较强，而在其他色阻上的部分因引发光反应的紫外光被部分吸收且反射率较低，因而交联程度较弱，因此本发明的光阻在不同基底上感度存在差异，可用于有效降低牛角。
所述光引发剂为α-羟基酮类衍生物、α-氨基酮类衍生物以及苯甲酰甲酸酯类中的一种或多种组合。
所述光引发剂为1-羟基环已基苯基酮（Irgacure 184）、2-羟基-2-甲基-1-苯基-1-丙酮（Darocur 1173）、2-甲基-1-(4-甲硫基苯基)-2-吗啉基-1-丙酮（Irgacure 907）、巴斯夫光引发剂（Irgacure 369）、以及苯甲酰甲酸甲酯中的一种或多种组合。在其他实施例中，所述光引发剂也可为其他的主吸收峰在300~330纳米紫外波段、无毒害、无黄变、且在常用色阻溶剂中溶解性较好的光引发剂。
所述树脂为碱溶性丙烯酸树脂和聚乙烯醇肉桂酸酯中的一种或多种组合。
所述多官能单体为三羟甲基丙烷三丙烯酸酯、三(2-羟乙基)异氰脲酸三丙烯酸酯、季戊四醇四丙烯酸酯、以及双季戊四醇六丙烯酸酯中的一种或多种组合，也可为其他的色阻常用多官能单体。
所述颜料分散液包括颜料、包裹在颜料表面的分散树脂和分散剂，不同的光阻可选用不同的颜料，所述颜料包括红色颜料，红色染料，绿色颜料，黄色颜料，蓝色颜料，蓝色染料，紫色颜料，紫色染料的一种或多种，所述颜料可为偶氮颜料、萘酚系列颜料、苯并咪唑酮颜料、酞菁颜料、喹吖啶酮类颜料、蒽醌颜料、或者喹酞酮类颜料。
所述溶剂为丙二醇甲醚醋酸酯、丙二醇二乙酸酯、亚甲基双丙烯酰胺、N-甲基吡咯烷酮、3-乙氧基丙酸乙酯、以及环己酮中的一种或多种组合。
所述添加剂为流平剂、消泡剂、表面活性剂、以及硅烷偶联剂中的一种或多种组合。
如图3所示，为本发明的光阻材料与氮化硅（SiNx）材料在紫外波段的反射率的曲线对比图，图3中的位于上方的实线曲线为氮化硅的反射率，位于下方的虚线曲线为本发明的光阻的反射率，在紫外短波段300纳米附近，所述氮化硅的反射率比本发明的光阻的反射率高约15倍。本发明所述光阻选用主吸收峰在300~330nm的光引发剂，在素玻璃或SiNx基板上因反射率高进行二次曝光，因而交联较强，而在其他色阻上因引发光反应的紫外光被部分吸收且反射率很低从而交联程度较弱。
当本发明所述光阻在与其他色阻搭接时，由于感度比较低，与现有的色阻相比，实际的搭接处重叠区域会比较小，从而可以达到降低牛角的效果。而由于其在开口区，即玻璃或者SiNx等基底上因其感度足够，即使对位精度发生偏移时，仍能保持有光阻覆盖基底，而不会发生漏光问题，因此本发明提供的色阻材料可有效改善牛角问题以及避免漏光情况发生。
如图4所示，本发明还提供一种彩色滤光片，包括衬底基板21和设置于所述衬底基板上的色阻层，所述衬底基板为玻璃基板或SiNx基板，所述色阻层由上述负性光阻材料形成。
所述色阻层包括红色色阻23、绿色色阻22和蓝色色阻24，本实施例按照红、蓝、绿色阻依序排列，进行说明，在其他实施例中各个颜色的色阻可按照其他顺序排列。
由于本发明的色阻采用上述负性光阻材料制备，所以蓝色色阻24在衬底基板21上的部分的感度较高，且衬底基板21的反射率较高会对该部分进行二次曝光，即使掩模板与曝光区域对位发生偏移（图4示出掩模板向左侧偏移时蓝色色阻24的结构），仍然会有蓝色色阻24覆盖衬底基板21的发生偏移的位置上，不会有图2中的漏光情况发生；蓝色色阻24的两端在其他两个色阻搭接时，由于蓝色色阻24在色阻基底上的感度较低，与现有的色阻相比，实际搭接区域会较小，从而可以达到降低牛角高度的效果。
有益效果：本发明提供的负性光阻材料在不同的基底上存在不同的感度，在玻璃及氮化硅基板上感度较高，在其他光阻基底上感度较低，进而使得本发明的光阻在与其他光阻搭接时，由于感度较低，搭接宽度会减小，达到降低牛角的效果；同时由于本发明的光阻在基板上感度较高，即使对位精度发生偏移时，仍能使光阻覆盖基板，避免漏光现象发生。
综上所述，虽然本发明已以优选实施例揭露如上，但上述优选实施例并非用以限制本发明，本领域的普通技术人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。

Claims (20)

  1. 一种负性光阻材料，其中，以重量百分数计，包括：
    6%~10%的树脂；
    2%~7%的多官能单体；
    5%~12%的颜料分散液；
    70%~80%的溶剂；
    0.1%~0.2%的添加剂：以及
    0.4%~0.8%的光引发剂；其中，所述光引发剂在紫外吸收光谱中在波长300~330纳米处具有主吸收峰；
    所述光引发剂为α-羟基酮类衍生物、α-氨基酮类衍生物以及苯甲酰甲酸酯类中的一种或多种组合；
    所述树脂为碱溶性丙烯酸树脂和聚乙烯醇肉桂酸酯中的一种或多种组合。
  2. 根据权利要求1所述的负性光阻材料，其中，所述光引发剂为1-羟基环已基苯基酮、2-羟基-2-甲基-1-苯基-1-丙酮、2-甲基-1-(4-甲硫基苯基 )-2-吗啉基-1-丙酮、巴斯夫光引发剂、以及苯甲酰甲酸甲酯中的一种或多种组合。
  3. 根据权利要求1所述的负性光阻材料，其中，所述多官能单体为三羟甲基丙烷三丙烯酸酯、三(2-羟乙基)异氰脲酸三丙烯酸酯、季戊四醇四丙烯酸酯、以及双季戊四醇六丙烯酸酯中的一种或多种组合。
  4. 根据权利要求1所述的负性光阻材料，其中，所述颜料分散液包括颜料、包裹在颜料表面的分散树脂和分散剂。
  5. 根据权利要求4所述的负性光阻材料，其中，所述颜料为偶氮颜料、萘酚系列颜料、苯并咪唑酮颜料、酞菁颜料、喹吖啶酮类颜料、蒽醌颜料、或者喹酞酮类颜料。
  6. 根据权利要求1所述的负性光阻材料，其中，所述溶剂为丙二醇甲醚醋酸酯、丙二醇二乙酸酯、亚甲基双丙烯酰胺、N-甲基吡咯烷酮、3-乙氧基丙酸乙酯、以及环己酮中的一种或多种组合。
  7. 根据权利要求1所述的负性光阻材料，其中，所述添加剂为流平剂、消泡剂、表面活性剂、以及硅烷偶联剂中的一种或多种组合。
  8. 一种负性光阻材料，其中，以重量百分数计，包括：
    6%~10%的树脂；
    2%~7%的多官能单体；
    5%~12%的颜料分散液；
    70%~80%的溶剂；
    0.1%~0.2%的添加剂：以及
    0.4%~0.8%的光引发剂；其中，所述光引发剂在紫外吸收光谱中在波长300~330纳米处具有主吸收峰。
  9. 根据权利要求8所述的负性光阻材料，其中，所述光引发剂为α-羟基酮类衍生物、α-氨基酮类衍生物以及苯甲酰甲酸酯类中的一种或多种组合。
  10. 根据权利要求9所述的负性光阻材料，其中，所述光引发剂为1-羟基环已基苯基酮、2-羟基-2-甲基-1-苯基-1-丙酮、2-甲基-1-(4-甲硫基苯基 )-2-吗啉基-1-丙酮、巴斯夫光引发剂、以及苯甲酰甲酸甲酯中的一种或多种组合。
  11. 根据权利要求8所述的负性光阻材料，其中，所述树脂为碱溶性丙烯酸树脂和聚乙烯醇肉桂酸酯中的一种或多种组合。
  12. 根据权利要求8所述的负性光阻材料，其中，所述多官能单体为三羟甲基丙烷三丙烯酸酯、三(2-羟乙基)异氰脲酸三丙烯酸酯、季戊四醇四丙烯酸酯、以及双季戊四醇六丙烯酸酯中的一种或多种组合。
  13. 根据权利要求8所述的负性光阻材料，其中，所述颜料分散液包括颜料、包裹在颜料表面的分散树脂和分散剂。
  14. 根据权利要求13所述的负性光阻材料，其中，所述颜料为偶氮颜料、萘酚系列颜料、苯并咪唑酮颜料、酞菁颜料、喹吖啶酮类颜料、蒽醌颜料、或者喹酞酮类颜料。
  15. 根据权利要求8所述的负性光阻材料，其中，所述溶剂为丙二醇甲醚醋酸酯、丙二醇二乙酸酯、亚甲基双丙烯酰胺、N-甲基吡咯烷酮、3-乙氧基丙酸乙酯、以及环己酮中的一种或多种组合。
  16. 根据权利要求1所述的负性光阻材料，其中，所述添加剂为流平剂、消泡剂、表面活性剂、以及硅烷偶联剂中的一种或多种组合。
  17. 一种彩色滤光片，包括衬底基板和设置于所述衬底基板上的色阻层，所述色阻层由负性光阻材料形成，其中，以重量百分数计，所述负性光阻材料包括：
    6%~10%的树脂；
    2%~7%的多官能单体；
    5%~12%的颜料分散液；
    70%~80%的溶剂；
    0.1%~0.2%的添加剂：以及
    0.4%~0.8%的光引发剂；其中，
    所述光引发剂在紫外吸收光谱中在波长300~330纳米处具有主吸收峰。
  18. 根据权利要求17所述的负性光阻材料，其中，所述光引发剂为α-羟基酮类衍生物、α-氨基酮类衍生物以及苯甲酰甲酸酯类中的一种或多种组合。
  19. 根据权利要求18所述的负性光阻材料，其中，所述光引发剂为1-羟基环已基苯基酮、2-羟基-2-甲基-1-苯基-1-丙酮、2-甲基-1-(4-甲硫基苯基 )-2-吗啉基-1-丙酮、巴斯夫光引发剂、以及苯甲酰甲酸甲酯中的一种或多种组合。
  20. 根据权利要求17所述的负性光阻材料，其中，所述树脂为碱溶性丙烯酸树脂和聚乙烯醇肉桂酸酯中的一种或多种组合。
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