WO2020133788A1 - 显示面板及触控显示装置 - Google Patents

显示面板及触控显示装置 Download PDF

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Publication number
WO2020133788A1
WO2020133788A1 PCT/CN2019/081740 CN2019081740W WO2020133788A1 WO 2020133788 A1 WO2020133788 A1 WO 2020133788A1 CN 2019081740 W CN2019081740 W CN 2019081740W WO 2020133788 A1 WO2020133788 A1 WO 2020133788A1
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WIPO (PCT)
Prior art keywords
substrate
layer
conductive layer
display panel
conductive
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PCT/CN2019/081740
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English (en)
French (fr)
Inventor
宋秀萍
李永凯
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武汉华星光电技术有限公司
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Publication of WO2020133788A1 publication Critical patent/WO2020133788A1/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means

Definitions

  • the present application relates to the field of display technology, in particular to a display panel and a touch display device.
  • TFT-LCD Thin Film Transistor-Liquid Crystal Display
  • CRT cathode Ray Tube
  • the afterimage is a phenomenon in which an additional electric field is formed by concentrated and attracted ions, which causes the liquid crystal molecules to deflect abnormally to form a light leakage region.
  • the two coexisting factors that are integral to the formation of afterimages are: 1 There is a DC bias on the drive (Direct Current Offset) voltage; 2 There is ionic impurities in the display. Due to the limitations of the pixel structure, process technology, etc., a DC bias voltage may appear in some areas of the pixel area.
  • the DC bias voltage will attract the ionic impurities in the display, resulting in the formation of residual DC bias in the asymmetrical area of the AC drive.
  • the liquid crystal molecules are affected by the residual DC bias and cannot correctly maintain the arrangement state required by the design, it looks like there is a front
  • the display screen remains. Only after a long time, after the residual polarities are dispersed, can the real next screen be displayed. The afterimage will cause ghost images on the next screen, thereby reducing the contrast of the TFT-LCD and blurring the displayed image.
  • Residual DC bias mainly comes from TFT devices, such as source-drain capacitance, storage capacitance, liquid crystal capacitance, and gate scan line voltage difference.
  • the current main improvement methods include: 1 Optimize pixel design (width/film thickness of gate wiring, channel width of transistor, storage capacitor area, and gate-on voltage (Vgon)); 2 perform step correction or common electrode (COM) modulation technology to eliminate the residual DC bias actually applied in the liquid crystal cell; 3 optimize the uniformity of the TFT panel, that is, reduce the residual DC bias and reduce the occurrence of afterimages by improving and compensating the design method.
  • the main sources of ionic impurities are material pollution, equipment pollution and production line pollution.
  • Material pollution mainly includes liquid crystal pollution and color film (Color Filter, CF) pollution and the influence of alignment film, etc.
  • the color film layer array substrate side is provided with a color film layer and a black matrix (Black Matrix), etc., and the color film layer and the black matrix are more easily introduced into the TFT-LCD due to the resin doped with various pigments.
  • it is mainly through the optimization of the composition of the liquid crystal and CF to reduce the ion impurity Thing, but the improvement effect is not obvious.
  • the purpose of the present application is to provide a display panel and a touch display device to avoid the problem of afterimages in the display panel and the touch display device.
  • a display panel includes an array substrate and a color film substrate that are oppositely arranged.
  • the color film substrate includes:
  • a first substrate having a display area and a non-display area located at the periphery of the display area;
  • a color film layer the color film layer includes a plurality of color filter units, the color film layer is formed in the display area of the first substrate;
  • a conductive layer, the conductive layer is disposed between the first substrate and the black matrix layer and the black matrix layer covers the conductive layer;
  • the array substrate includes a second substrate, and pixel electrodes and a common electrode formed on the second substrate; wherein the common electrode is electrically connected to the conductive layer, or the conductive layer and the display panel are grounded ⁇ Wire electrical connection.
  • the vertical projections of the conductive layer and the black matrix layer on the first substrate completely overlap.
  • the conductive layer is formed in the non-display area of the first substrate.
  • the conductive layer is a metal layer.
  • the conductive layer is an indium tin oxide layer or an indium zinc oxide layer.
  • the common electrode and the conductive layer are electrically connected by conductive silver paste.
  • the display panel further includes a conductive frame sealant, and the conductive frame sealant bonds the array substrate and the color film substrate.
  • the common electrode and the conductive layer are electrically connected through the conductive sealant.
  • a passivation layer is provided between the common electrode and the pixel electrode.
  • the preparation method of the conductive layer is any one of sputtering deposition, chemical vapor deposition, plasma enhanced chemical vapor deposition, and vacuum evaporation.
  • a touch display device includes a touch device and a display panel.
  • the touch device is provided inside the display panel, or the touch device is provided on the surface of the display panel
  • the display panel includes an array substrate and a color filter substrate that are oppositely arranged.
  • the color filter substrate includes:
  • a first substrate having a display area and a non-display area located at the periphery of the display area;
  • a color film layer the color film layer includes a plurality of color filter units, the color film layer is formed in the display area of the first substrate;
  • a conductive layer, the conductive layer is disposed between the first substrate and the black matrix layer and the black matrix layer covers the conductive layer;
  • the array substrate includes a second substrate, and pixel electrodes and a common electrode formed on the second substrate; wherein, the common electrode is electrically connected to the conductive layer, or the conductive layer and the display panel
  • the ground wire is electrically connected.
  • the vertical projections of the conductive layer and the black matrix layer on the first substrate completely overlap.
  • the conductive layer is formed on the non-display area of the first substrate.
  • the conductive layer is a metal layer.
  • the conductive layer is an indium tin oxide layer or an indium zinc oxide layer.
  • the common electrode and the conductive layer are electrically connected by conductive silver paste.
  • the display panel further includes a conductive frame sealant, and the conductive frame sealant bonds the array substrate and the color filter substrate.
  • the common electrode and the conductive layer are electrically connected through the conductive sealant.
  • a passivation layer is provided between the common electrode and the pixel electrode.
  • the preparation method of the conductive layer is one of sputtering deposition, chemical vapor deposition, plasma enhanced chemical vapor deposition, and vacuum evaporation.
  • the present application provides a display panel and a touch display device.
  • a conductive layer covered by a black matrix layer is provided in the display panel and the conductive layer is electrically connected to a common electrode or a ground line to derive the charge carried by the ions accumulated in the color filter substrate.
  • the conductive layer located in the display panel can reduce the impact on the touch performance of the touch display device.
  • FIG. 1 is a schematic structural diagram of a display panel according to Embodiment 1 of the present application.
  • FIG. 2 is a schematic plan view of the conductive layer in the display panel shown in FIG. 1;
  • FIG. 3 is a schematic structural diagram of a display panel according to Embodiment 2 of the present application.
  • FIG. 4 is a schematic structural diagram of a display panel according to Embodiment 3 of the present application.
  • This application provides a display panel, the display panel is IPS (In-Plane Switching) type liquid crystal display panel, the display panel includes an array substrate and a color film substrate oppositely arranged, the color film substrate includes:
  • a first substrate the first substrate has a display area and a non-display area located at the periphery of the display area;
  • a color film layer includes a plurality of color filter units, and the color film layer is formed in the display area of the first substrate;
  • a black matrix layer which is formed between adjacent color filter units and the non-display area of the first substrate
  • a conductive layer, the conductive layer is disposed between the first substrate and the black matrix layer and the black matrix layer covers the conductive layer;
  • the array substrate includes a second substrate, pixel electrodes and a common electrode formed on the second substrate; wherein the common electrode is electrically connected to the conductive layer, or the conductive layer is electrically connected to the ground line of the display panel.
  • a conductive layer covered with a black matrix layer is provided in the display panel and the conductive layer is electrically connected to the common electrode or the ground line to derive the charge carried by the ions accumulated in the color filter substrate, so as to avoid the problem of afterimages when the display panel is displayed.
  • the conductive layer covered by the black matrix layer guides that the electric layer is located directly under the black matrix layer and the surface area of the conductive layer and the black matrix layer in contact is not greater than the surface area of the surface of the black matrix layer opposite to the conductive layer. Since the black matrix layer between adjacent color filter units in the display area defines the light emitting area of the display area, the conductive layer covered by the black matrix layer makes the conductive layer outside the light emitting area. After the conductive layer is energized, it will not affect the liquid crystal Deflection.
  • FIG. 1 is a display panel 10 according to Embodiment 1 of the present application.
  • the display panel 10 includes an array substrate 11 and a color filter substrate 12 disposed oppositely.
  • the color filter substrate 12 includes:
  • the first substrate 121, the first substrate 121 has a display area 17 and a non-display area 18 located on the periphery of the display area 17;
  • a color film layer 122 includes a plurality of color filter units.
  • the color film layer 122 is formed in the display area 17 of the first substrate 121;
  • a conductive layer 124 which is disposed between the first substrate 121 and the black matrix layer 123 and the black matrix layer 123 covers the conductive layer 124;
  • the array substrate 11 includes a second substrate 111 and pixel electrodes 112 and a common electrode 113 formed on the second substrate 111; wherein the common electrode 113 is electrically connected to the conductive layer 124.
  • the first substrate 121 is a transparent glass substrate.
  • the color film layer 122 includes a plurality of color filter units, such as a red filter unit, a green filter unit, and a blue filter unit.
  • the red filter unit is used to transmit red light and absorb other colors
  • the green filter unit is used to transmit green light and absorb light of other colors
  • the blue filter unit is used to transmit blue light and absorb light of other colors.
  • the preparation material of the color film layer 122 is resin and color pigments, which causes charged ions to be introduced into the color film layer. When a DC bias voltage exists in the pixel area, the charged ions form an electric field opposite to the driving voltage. The electric field will affect the deflection of the liquid crystal and cause image sticking on the display panel.
  • the black matrix layer 123 is disposed in the display area 17 and the non-display area 18, and the black matrix layer 123 defines the light exit area of the display panel 10.
  • the preparation material of the black matrix layer 123 is resin and black pigment, which causes charged ions to be introduced into the black matrix layer 123.
  • the charged ions in the black matrix layer 123, together with the DC bias voltage existing in the pixel area, can also cause display Afterimages appear on the panel.
  • the vertical projections of the conductive layer 124 and the black matrix layer 123 on the first substrate 121 are completely coincident, that is, the conductive layer 124 is simultaneously disposed directly under the black matrix layer 123 in the display area 17 and in the non-display area 18 Directly below the black matrix layer 123, the surface area of the conductive layer 124 in contact with the black matrix layer 123 is equal to the surface area of the black matrix layer 123 opposite to the conductive layer 124.
  • FIG. 2 it is a schematic plan view of the conductive layer 124 of this embodiment.
  • the conductive layer 124 is provided with an opening 1241 corresponding to the light exit area of the display panel.
  • the conductive layer 124 may be a metal layer.
  • the metal layer may be made of silver, copper, etc.
  • the conductive layer may also be an indium tin oxide layer or an indium zinc oxide layer.
  • the manufacturing method of the conductive layer 124 includes, but is not limited to, sputtering deposition, chemical vapor deposition, plasma enhanced chemical vapor deposition, and vacuum evaporation.
  • the conductive layer 124 is not provided on the entire surface of the first substrate 121 based on two considerations, the main reason is that the conductive layer 124 is provided on the entire surface of the first substrate 121 will cause the conductive layer 124 is in the light-emitting area of the display panel 10, and the conductive layer 124 in the light-emitting area affects the deflection of the liquid crystal after being energized. The secondary reason is that the conductive layer 124 disposed in the light-emitting area of the display panel 10 affects the light-emitting rate.
  • the color filter substrate 12 further includes a planarization layer 125, which is used to flatten the surface of the color filter substrate 12, and the preparation material of the planarization layer 125 is resin.
  • the planarization layer 125 is formed on the color filter substrate 12 by spin coating (Spin Coating) or evaporation (Evaporation).
  • the color filter substrate 12 further includes an alignment layer (Alignment Layer) 126, and the alignment layer 126 is used to align the liquid crystal in a specific direction.
  • the alignment layer 126 is a polyimide layer.
  • the second substrate 111 includes a substrate, thin film transistors arranged in an array on the substrate, a planarization layer covering the surface of the thin film transistor, and an interlayer insulating layer covering the surface of the planarization layer.
  • the display panel 10 further includes a liquid crystal layer 14 disposed between the array substrate 11 and the color filter substrate 12.
  • the common electrode 113 is provided on the second substrate 111.
  • the common electrode 113 is an ITO layer with a thickness of 0.1 ⁇ m to 0.16 ⁇ m.
  • the preparation material is indium tin oxide or indium zinc oxide.
  • the pixel electrode 112 is disposed above the common electrode 113, and the pixel electrode 112 is made of indium tin oxide or indium zinc oxide. When both the pixel electrode 112 and the common electrode 113 are energized, an electric field is formed to deflect the liquid crystal.
  • a passivation layer 114 is provided between the common electrode 113 and the pixel electrode 112.
  • the passivation layer 114 is used to insulate the common electrode 113 and the pixel electrode 112 from each other.
  • the passivation layer 114 It is an inorganic insulating layer, such as a silicon nitride layer, a silicon oxide layer, and an overlapping layer of the silicon nitride layer and the silicon oxide layer.
  • the common electrode 113 and the conductive layer 124 are electrically connected through the conductive silver paste 13.
  • the conductive silver paste 13 is located in the non-display area 18 of the display panel 10.
  • the conductive silver paste 13 is disposed on the side close to the non-display area 18 of the color filter substrate 12 and above the array substrate 11.
  • One end of the conductive silver paste 13 directly communicates with the conductive
  • the layer 121 is connected, and the other end of the conductive silver paste 13 is connected to the common electrode 113 through a via on the passivation layer 114.
  • the conductive silver paste 13 may also electrically connect the common electrode 113 and the conductive layer 124 in other ways.
  • the conductive silver glue 13 is composed of organic adhesive and nano silver.
  • the conductive layer 124 and the common electrode 113 are connected through the conductive silver paste 13 so that the charges carried by the ions in the color filter substrate 12 are exported to the common electrode 113 to avoid the accumulation of ionic charges to form an electric field that affects the deflection of the liquid crystal, thereby preventing the display panel 10 from appearing during display Afterimage.
  • FIG. 3 is a display panel 20 according to Embodiment 2 of the present application.
  • the display panel 20 includes an array substrate 21 and a color filter substrate 22 that are oppositely arranged.
  • the color filter substrate 22 includes:
  • the first substrate 221, the first substrate 221 has a display area 27 and a non-display area 28 located on the periphery of the display area 27;
  • a color film layer 222 the color film layer 222 includes a plurality of color filter units, the color film layer 222 is formed in the display area 27 of the first substrate 221;
  • the array substrate 21 includes a second substrate 211 and pixel electrodes 212 and a common electrode 213 formed on the second substrate 211; wherein, the conductive layer 224 is electrically connected to the ground line 23 of the display panel 20.
  • the display panel 20 of this embodiment is similar to the display panel 10 substrate of the first embodiment, the difference is that the conductive layer 224 leads the ions in the color filter substrate 22 out of the color film substrate 22 through an electrical connection to the ground line to avoid the display panel 20 from displaying Afterimages appear.
  • FIG. 4 is a display panel 30 according to the third embodiment of the present application.
  • the display panel 30 includes an array substrate 31 and a color filter substrate 32 that are oppositely arranged.
  • the color filter substrate 32 includes:
  • the first substrate 321, the first substrate 321 has a display area 37 and a non-display area 38 located on the periphery of the display area 37;
  • the array substrate 31 includes a second substrate 311 and a pixel electrode 312 and a common electrode 313 formed on the second substrate 311; wherein the common electrode 313 is electrically connected to the conductive layer 324.
  • the conductive layer 324 is formed on the non-display area 38 of the first substrate 321.
  • the display panel 30 further includes a conductive frame sealant 33.
  • the conductive frame sealant 33 bonds the array substrate 31 and the color filter substrate 32.
  • the common electrode 313 and the conductive layer 324 are electrically connected through the conductive frame sealant 33.
  • the conductive sealant 33 is connected to the common electrode 313 through the via on the passivation layer 314 between the common electrode 313 and the pixel electrode 312.
  • the conductive sealant 33 is directly Contact with conductive layer 324.
  • the conductive sealant 33 is electrically connected to the conductive layer 324 and the common electrode 313 to lead the charge carried by the ions on the color filter substrate side to the common electrode 313 to avoid the afterimage phenomenon when the display panel is displayed.
  • the other structures in this embodiment are the same as those in Embodiment 1, and will not be described in detail here.
  • the touch display device includes a touch device and a display panel.
  • the touch device is disposed inside the display panel, or the touch device is disposed on the surface of the display panel.
  • the display panel is any one of the above-mentioned Embodiments 1 to 3, so that the touch display device of this embodiment can avoid afterimages during display.
  • the touch device when the touch device is disposed inside the display panel, the touch device includes a polarizer with a metal layer disposed outside the color filter substrate of the display panel, the polarizer with a metal layer and the display panel
  • the conductive layer covered by the black matrix layer between the first substrate and the black matrix layer in this application can reduce the coupling effect between the conductive layer and the metal layer in the polarizer to reduce
  • the small effect on the touch performance, especially the conductive layer 324 in the display panel 30 of the third embodiment, has the smallest area and is located in the non-display area.
  • the touch device when the touch device is disposed on the surface of the display panel, the touch device is a touch electrode layer disposed outside the color filter substrate.
  • the present application is located between the first substrate and the black matrix layer and is protected by the black matrix layer.
  • the covered conductive layer can reduce the coupling effect between the conductive layer and the touch electrode layer to reduce the impact on the touch performance.
  • a conductive layer covered with a black matrix layer is provided in a display panel and the conductive layer is electrically connected to a common electrode or a ground line to derive the charge carried by the ions accumulated in the color filter substrate, so as to avoid afterimages appearing on the display of the touch display device
  • the conductive layer located in the display panel can reduce the impact on the touch performance of the touch display device.

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Abstract

本申请提供一种显示面板和触控显示装置，通过在显示面板中设置黑色矩阵层覆盖的导电层且导电层与公共电极或者接地线电连接以导出彩膜基板中聚集的离子所带的电荷，以避免显示面板和触控显示装置显示时出现残像问题，此外，位于显示面板中的导电层能减小对触控显示装置的触控性能的影响。

Description

显示面板及触控显示装置 技术领域
本申请涉及显示技术领域，尤其涉及一种显示面板及触控显示装置。
 背景技术
近年来，由于薄膜晶体管液晶显示器（Thin Film Transistor -Liquid Crystal Display, TFT-LCD）相较于阴极射线管(Cathode Ray Tube, CRT)显示器具有更低的工作电压、更低的功耗以及更低的空间占有率等优势，其已经成为市场主流的显示器。然而，人们要求显示器具有高亮度、高对比度以及高响应时间等更佳性能以更好地显示时，显示器亮度不均匀(Mura)以及显示器的残像（Image Sticking）等问题急需解决，其中，显示器出现残像问题会严重影响TFT-LCD的画面品质。
对于TFT-LCD需要长时间显示的画面切换至下一画面时，所示画面仍会出现在下一个画面中，这种显示器在显示时出现的现象为残像。残像是一种由聚集和吸引的离子形成附加电场导致液晶分子偏转异常形成漏光区域的现象。形成残像缺一不可的两个并存因素是：①驱动上存在直流偏置（Direct Current Offset）电压；②显示屏中存在离子型不纯物。因为受到像素结构、工艺技术等的限制，在像素区的部分区域会出现直流偏置电压。由于显示屏内存在离子型不纯物，直流偏置电压就会吸引显示屏内的离子型不纯物，导致交流驱动不对称的区域就会形成残留直流偏置，如此，显示画面部分区域中离子极性残留下来，取消显示画面后，由于残留直流偏置作用，在显示下一个画面时，液晶分子受到残留直流偏置的影响不能正确保持设计所要求的排列状态，看起来就像有前面显示画面的残留。只有经过很长时间，等到残留极性散开后，才能显示真实的下一个画面，残像会使下一画面上出现重影，从而使TFT-LCD的对比度降低且显示图像模糊。
残留直流偏置主要来源于TFT器件，如源漏间电容、存储电容、液晶电容以及栅极扫描线电压差等。目前的主要改善方法包括：①优化像素设计（栅极配线的宽/膜厚、晶体管的沟道宽度、存储电容面积以及栅极导通电压（Vgon））；②进行阶调补正或公共电极（COM）调制技术以消除液晶盒内实际施加的残留直流偏置；③优化TFT面板的均一性，即通过改良和补偿设计的方法来减少残留直流偏置，减少残像现象的发生。而离子型不纯物的主要来源有材料污染、设备污染和生产线污染，材料污染主要包括液晶污染、彩色膜层（Color Filter, CF）污染以及配向膜影响等。其中彩色膜层阵列基板侧由于设置有彩色膜层以及黑色矩阵（Black Matrix）等，而彩色膜层和黑色矩阵由于掺杂有各种颜料的树脂，导致TFT-LCD中更容易引入离子不纯物，目前主要通过是优化液晶以及CF等的组成以减少离子不纯物，但改善效果并不明显。
因此，有必要提出一种技术方案以解决TFT-LCD的残像问题。
 技术问题
本申请的目的在于提供一种显示面板及触控显示装置，以避免显示面板和触控显示装置出现残像的问题。
 技术解决方案
一种显示面板，所述显示面板包括相对设置的阵列基板及彩膜基板，所述彩膜基板包括：
第一基板，所述第一基板具有显示区以及位于所述显示区外围的非显示区；
一彩色膜层，所述彩色膜层包括多个彩色滤光单元，所述彩色膜层形成于所述第一基板的显示区；
一黑色矩阵层，所述黑色矩阵层形成于相邻所述彩色滤光单元之间及所述第一基板的非显示区；
一导电层，所述导电层设置于所述第一基板和所述黑色矩阵层之间且所述黑色矩阵层覆盖所述导电层；
所述阵列基板包括第二基板以及于所述第二基板上形成的像素电极和公共电极；其中，所述公共电极与所述导电层电连接，或所述导电层与所述显示面板的接地线电连接。
在上述显示面板中，所述导电层和所述黑色矩阵层在所述第一基板上的垂直投影完全重合。
在上述显示面板中，所述导电层形成于所述第一基板的非显示区。
在上述显示面板中，所述导电层为金属层。
在上述显示面板中，所述导电层为氧化铟锡层或氧化铟锌层。
在上述显示面板中，所述公共电极与所述导电层通过导电银胶电连接。
在上述显示面板中，所述显示面板还包括导电封框胶，所述导电封框胶粘接所述阵列基板和所述彩膜基板。
在上述显示面板中，所述公共电极与所述导电层通过所述导电封框胶电连接。
在上述显示面板中，所述公共电极和所述像素电极之间设置有钝化层。
在上述显示面板中，所述导电层的制备方法为溅射沉积、化学气相沉积、等离子体增强化学气相沉积以及真空蒸镀中的任意一种。
一种触控显示装置，所述触控显示装置包括触控器件以及显示面板，所述触控器件设置于所述显示面板的内部，或，所述触控器件设置于所述显示面板的表面，所述显示面板包括相对设置的阵列基板及彩膜基板，所述彩膜基板包括：
第一基板，所述第一基板具有显示区以及位于所述显示区外围的非显示区；
一彩色膜层，所述彩色膜层包括多个彩色滤光单元，所述彩色膜层形成于所述第一基板的显示区；
一黑色矩阵层，所述黑色矩阵层形成于相邻所述彩色滤光单元之间及所述第一基板的非显示区；
一导电层，所述导电层设置于所述第一基板和所述黑色矩阵层之间且所述黑色矩阵层覆盖所述导电层；
所述阵列基板包括第二基板以及于所述第二基板上形成的像素电极和公共电极；其中，所述公共电极与所述导电层电连接，或，所述导电层与所述显示面板的接地线电连接。
在上述触控显示装置中，所述导电层和所述黑色矩阵层在所述第一基板上的垂直投影完全重合。
在上述触控显示装置中，所述导电层形成于所述第一基板的非显示区。
在上述触控显示装置中，所述导电层为金属层。
在上述触控显示装置中，所述导电层为氧化铟锡层或氧化铟锌层。
在上述触控显示装置中，所述公共电极与所述导电层通过导电银胶电连接。
在上述触控显示装置中，所述显示面板还包括导电封框胶，所述导电封框胶粘接所述阵列基板和所述彩膜基板。
在上述触控显示装置中，所述公共电极与所述导电层通过所述导电封框胶电连接。
在上述触控显示装置中，所述公共电极和所述像素电极之间设置有钝化层。
在上述触控显示装置中，所述导电层的制备方法为溅射沉积、化学气相沉积、等离子体增强化学气相沉积以及真空蒸镀中的一种。
 有益效果
本申请提供一种显示面板和触控显示装置，通过在显示面板中设置黑色矩阵层覆盖的导电层且导电层与公共电极或者接地线电连接以导出彩膜基板中聚集的离子所带的电荷，以避免显示面板和触控显示装置显示时出现残像问题，此外，位于显示面板中的导电层能减小对触控显示装置的触控性能的影响。
 附图说明
图1为本申请实施例一显示面板的结构示意图；
图2为图1所示显示面板中的导电层的平面示意图；
图3为本申请实施例二显示面板的结构示意图；
图4为本申请实施例三显示面板的结构示意图。
 本发明的实施方式
下面将结合本申请实施例中的附图，对本申请实施例中的技术方案进行清楚、完整地描述。显然，所描述的实施例仅仅是本申请一部分实施例，而不是全部的实施例。基于本申请中的实施例，本领域技术人员在没有作出创造性劳动前提下所获得的所有其他实施例，都属于本申请保护的范围。
本申请提供一种显示面板，显示面板为IPS（In-Plane Switching）型液晶显示面板，显示面板包括相对设置的阵列基板及彩膜基板，彩膜基板包括：
第一基板，第一基板具有显示区以及位于显示区外围的非显示区；
一彩色膜层，彩色膜层包括多个彩色滤光单元，彩色膜层形成于第一基板的显示区；
一黑色矩阵层，黑色矩阵层形成于相邻彩色滤光单元之间及第一基板的非显示区；
一导电层，导电层设置于第一基板和黑色矩阵层之间且黑色矩阵层覆盖导电层；
阵列基板包括第二基板以及于第二基板上形成的像素电极和公共电极；其中，公共电极与导电层电连接，或，导电层与显示面板的接地线电连接。
本申请通过在显示面板中设置黑色矩阵层覆盖的导电层且导电层与公共电极或者接地线电连接以导出彩膜基板中聚集的离子所带的电荷，以避免显示面板显示时出现残像问题。
需要说明的是，黑色矩阵层覆盖的导电层是指导电层位于黑色矩阵层的正下方且导电层与黑色矩阵层接触的表面积不大于黑色矩阵层与导电层相对的表面的表面积。由于显示区中位于相邻彩色滤光单元之间的黑色矩阵层限定了显示区的出光区域，黑色矩阵层覆盖的导电层使得导电层在出光区域之外，导电层通电之后，不会影响液晶的偏转。
下面结合具体实施例对上述技术方案进行详细描述。
实施例一
请参阅图1，其为本申请实施例一的显示面板10，显示面板10包括相对设置的阵列基板11及彩膜基板12，彩膜基板12包括：
第一基板121，第一基板121具有显示区17以及位于显示区17外围的非显示区18；
一彩色膜层122，彩色膜层122包括多个彩色滤光单元，彩色膜层122形成于第一基板121的显示区17；
一黑色矩阵层123，黑色矩阵层123形成于相邻彩色滤光单元之间及第一基板121的非显示区18；
一导电层124，导电层124设置于第一基板121和黑色矩阵层123之间且黑色矩阵层123覆盖导电层124；
阵列基板11包括第二基板111以及于第二基板111上形成的像素电极112和公共电极113；其中，公共电极113与导电层124电连接。
在本实施例中，第一基板121为透明玻璃基板。
在本实施例中，彩色膜层122包括多个彩色滤光单元，例如红色滤光单元、绿色滤光单元以及蓝色滤光单元，红色滤光单元用于透过红色的光而吸收其他颜色的光，绿色滤光单元用于透过绿色的光而吸收其他颜色的光，蓝色滤光单元用于透过蓝色的光而吸收其他颜色的光。彩色膜层122的制备材料为树脂以及彩色颜料，导致彩色膜层中会引入带电荷的离子，在像素区存在直流偏置电压时会使得带电荷的离子形成与驱动电压相反的电场，该相反的电场会影响液晶的偏转导致显示面板出现残影。
在本实施例中，黑色矩阵层123设置于显示区17以及非显示区18，黑色矩阵层123限定显示面板10的出光区域。黑色矩阵层123的制备材料为树脂以及黑色颜料，导致黑色矩阵层123也会引入带电荷的离子，黑色矩阵层123中带电荷的离子与像素区存在的直流偏置电压一起作用也会导致显示面板出现残影现象。
在本实施例中，导电层124和黑色矩阵层123在第一基板121上的垂直投影完全重合，即导电层124同时设置于显示区17的黑色矩阵层123的正下方和非显示区18的黑色矩阵层123的正下方，导电层124与黑色矩阵层123接触的表面积等于黑色矩阵层123与导电层124相对的表面积。如图2所示，其为本实施例导电层124的平面示意图，导电层124上设置有开口1241，开口1241与显示面板的出光区域相对应。导电层124可以为金属层，金属层的制备材料为银、铜等，导电层也可以为氧化铟锡层或氧化铟锌层。导电层124的制备方法包括但不限于溅射沉积、化学气相沉积、等离子体增强化学气相沉积以及真空蒸镀。需要说明的是，在本申请中，导电层124未设置于第一基板121的整个表面是基于两方面的考虑，主要原因在于，导电层124设置于第一基板121的整个表面会使得导电层124处于显示面板10的出光区域，出光区域的导电层124通电后会影响液晶的偏转，次要原因在于，导电层124设置于显示面板10的出光区域会影响出光率。
在本实施例中，彩膜基板12还包括平坦化层125，平坦化层125用于使彩膜基板12的表面平整，平坦化层125的制备材料为树脂。平坦化层125是通过旋转涂布（Spin Coating）或蒸镀(Evaporation)的方式形成于彩膜基板12上。
在本实施例中，彩膜基板12还包括配向层（Alignment Layer）126，配向层126用于使液晶按特定的方向排列。配向层126为聚酰亚胺层。
在本实施例中，第二基板111包括衬底、设置在衬底上阵列排布的薄膜晶体管、覆盖在薄膜晶体管表面的平坦化层以及覆盖在平坦化层表面的层间绝缘层。
在本实施例中，显示面板10还包括设置于阵列基板11和彩膜基板12之间的液晶层14。
在本实施例中，公共电极113设置在第二基板111上，公共电极113为ITO层，其厚度为0.1微米-0.16微米，其制备材料为氧化铟锡或氧化铟锌。像素电极112设置在公共电极113的上方，像素电极112的制备材料为氧化铟锡或氧化铟锌。像素电极112和公共电极113均通电后会形成电场使得液晶发生偏转。
在本实施例中，在公共电极113和像素电极112之间设置有钝化层（Passivation Layer）114，钝化层114用于使公共电极113和像素电极112之间彼此绝缘，钝化层114为无机绝缘层，例如氮化硅层、氧化硅层以及氮化硅层与氧化硅层的交叠层。
在本实施例中，公共电极113与导电层124通过导电银胶13电连接。导电银胶13位于显示面板10的非显示区域18，导电银胶13设置于靠近彩膜基板12的非显示区18的一侧且位于阵列基板11的上方，导电银胶13的一端直接与导电层121连接，导电银胶13的另一端是通过钝化层114上的过孔与公共电极113连接。在其他实施例中，导电银胶13也可以通过其他方式电连接公共电极113与导电层124。导电银胶13是由有机胶黏剂和纳米银组成。通过导电银胶13连接导电层124和公共电极113使得彩膜基板12中的离子所带电荷导出至公共电极113，避免出现离子电荷聚集形成影响液晶偏转的电场，从而避免显示面板10显示时出现残像。
实施例二
请参阅图3，其为本申请实施例二的显示面板20，显示面板20包括相对设置的阵列基板21及彩膜基板22，彩膜基板22包括：
第一基板221，第一基板221具有显示区27以及位于显示区27外围的非显示区28；
一彩色膜层222，彩色膜层222包括多个彩色滤光单元，彩色膜层222形成于第一基板221的显示区27；
一黑色矩阵层223，黑色矩阵层223形成于相邻彩色滤光单元之间及第一基板221的非显示区28；
一导电层224，导电层224设置于第一基板221和黑色矩阵层223之间且黑色矩阵层223覆盖导电层224；
阵列基板21包括第二基板211以及于第二基板211上形成的像素电极212和公共电极213；其中，导电层224与显示面板20的接地线23电连接。
本实施例的显示面板20与实施例一的显示面板10基板相似，不同之处在于，导电层224通过电连接接地线将彩膜基板22中的离子所带电荷导出以避免显示面板20显示时出现残像现象。
实施例三
请参阅图4，其为本申请实施例三的显示面板30，显示面板30包括相对设置的阵列基板31及彩膜基板32，彩膜基板32包括：
第一基板321，第一基板321具有显示区37以及位于显示区37外围的非显示区38；
一彩色膜层322，彩色膜层322包括多个彩色滤光单元，彩色膜层322形成于第一基板321的显示区37；
一黑色矩阵层323，黑色矩阵层323形成于相邻彩色滤光单元之间及第一基板321的非显示区38；
一导电层324，导电层324设置于第一基板321和黑色矩阵层323之间且黑色矩阵层323覆盖导电层324；
阵列基板31包括第二基板311以及于第二基板311上形成的像素电极312和公共电极313；其中，公共电极313与导电层324电连接。
在本实施例中，导电层324形成于第一基板321的非显示区38。
在本实施例中，显示面板30还包括导电封框胶33，导电封框胶33粘接阵列基板31和彩膜基板32，公共电极313与导电层324通过导电封框胶33电连接，在阵列基板31侧，导电封框胶33是通过公共电极313与像素电极312之间的钝化层314上的过孔连接至公共电极313，在彩膜基板32侧，导电封框胶33是直接与导电层324接触。通过导电封框胶33电连接导电层324以及公共电极313将彩膜基板侧的离子所带电荷导出至公共电极313以避免显示面板显示时出现残像现象。本实施例中的其他结构均与实施例一相同，此处不作详述。
实施例四
本实施例提供一种触控显示装置，触控显示装置包括触控器件以及显示面板，触控器件设置于显示面板的内部，或，触控器件设置于显示面板的表面。
在本实施例中，显示面板为上述实施例一至实施例三中任一一种显示面板，使得本实施例触控显示装置在显示时能避免出现残像。
在本实施例中，触控器件设置于显示面板的内部时，触控器件包括于显示面板的彩膜基板的外侧设置的带金属层的偏光片，此带金属层的偏光片与显示面板中的用于触控的金属层连接，本申请位于第一基板和黑色矩阵层之间且被黑色矩阵层覆盖的导电层能减小导电层与偏光片中的金属层之间的耦合作用以减小对触控性能的影响，特别是实施例三的显示面板30中的导电层324，其面积最小且位于非显示区域。
在本实施例中，触控器件设置于显示面板的表面时，触控器件为设置于彩膜基板外侧的触控电极层，本申请位于第一基板和黑色矩阵层之间且被黑色矩阵层覆盖的导电层能减小导电层与触控电极层之间的耦合作用以减小对触控性能的影响。
本申请通过在显示面板中设置黑色矩阵层覆盖的导电层且导电层与公共电极或者接地线电连接以导出彩膜基板中聚集的离子所带的电荷，以避免触控显示装置显示时出现残像问题，同时，位于显示面板中的导电层能减小对触控显示装置的触控性能的影响。
以上实施例的说明只是用于帮助理解本申请的技术方案及其核心思想；本领域的普通技术人员应当理解：其依然可以对前述各实施例所记载的技术方案进行修改，或者对其中部分技术特征进行等同替换；而这些修改或者替换，并不使相应技术方案的本质脱离本申请各实施例的技术方案的范围。

Claims (20)

  1. 一种显示面板，其中，所述显示面板包括相对设置的阵列基板及彩膜基板，所述彩膜基板包括：
    第一基板，所述第一基板具有显示区以及位于所述显示区外围的非显示区；
    一彩色膜层，所述彩色膜层包括多个彩色滤光单元，所述彩色膜层形成于所述第一基板的显示区；
    一黑色矩阵层，所述黑色矩阵层形成于相邻所述彩色滤光单元之间及所述第一基板的非显示区；
    一导电层，所述导电层设置于所述第一基板和所述黑色矩阵层之间且所述黑色矩阵层覆盖所述导电层；
    所述阵列基板包括第二基板以及于所述第二基板上形成的像素电极和公共电极；其中，所述公共电极与所述导电层电连接，或，所述导电层与所述显示面板的接地线电连接。
  2. 根据权利要求1所述的显示面板，其中，所述导电层和所述黑色矩阵层在所述第一基板上的垂直投影完全重合。
  3. 根据权利要求1所述的显示面板，其中，所述导电层形成于所述第一基板的非显示区。
  4. 根据权利要求1所述的显示面板，其中，所述导电层为金属层。
  5. 根据权利要求1所述的显示面板，其中，所述导电层为氧化铟锡层或氧化铟锌层。
  6. 根据权利要求1所述的显示面板，其中，所述公共电极与所述导电层通过导电银胶电连接。
  7. 根据权利要求1所述的显示面板，其中，所述显示面板还包括导电封框胶，所述导电封框胶粘接所述阵列基板和所述彩膜基板。
  8. 根据权利要求7所述的显示面板，其中，所述公共电极与所述导电层通过所述导电封框胶电连接。
  9. 根据权利要求1所述的显示面板，其中，所述公共电极和所述像素电极之间设置有钝化层。
  10. 根据权利要求1所述的显示面板，其中，所述导电层的制备方法为溅射沉积、化学气相沉积、等离子体增强化学气相沉积以及真空蒸镀中的任意一种。
  11. 一种触控显示装置，其中，所述触控显示装置包括触控器件以及显示面板，所述触控器件设置于所述显示面板的内部，或，所述触控器件设置于所述显示面板的表面，所述显示面板包括相对设置的阵列基板及彩膜基板，所述彩膜基板包括：
    第一基板，所述第一基板具有显示区以及位于所述显示区外围的非显示区；
    一彩色膜层，所述彩色膜层包括多个彩色滤光单元，所述彩色膜层形成于所述第一基板的显示区；
    一黑色矩阵层，所述黑色矩阵层形成于相邻所述彩色滤光单元之间及所述第一基板的非显示区；
    一导电层，所述导电层设置于所述第一基板和所述黑色矩阵层之间且所述黑色矩阵层覆盖所述导电层；
    所述阵列基板包括第二基板以及于所述第二基板上形成的像素电极和公共电极；其中，所述公共电极与所述导电层电连接，或，所述导电层与所述显示面板的接地线电连接。
  12. 根据权利要求11所述的触控显示装置，其中，所述导电层和所述黑色矩阵层在所述第一基板上的垂直投影完全重合。
  13. 根据权利要求11所述的触控显示装置，其中，所述导电层形成于所述第一基板的非显示区。
  14. 根据权利要求11所述的触控显示装置，其中，所述导电层为金属层。
  15. 根据权利要求11所述的触控显示装置，其中，所述导电层为氧化铟锡层或氧化铟锌层。
  16. 根据权利要求11所述的触控显示装置，其中，所述公共电极与所述导电层通过导电银胶电连接。
  17. 根据权利要求11所述的触控显示装置，其中，所述显示面板还包括导电封框胶，所述导电封框胶粘接所述阵列基板和所述彩膜基板。
  18. 根据权利要求17所述的触控显示装置，其中，所述公共电极与所述导电层通过所述导电封框胶电连接。
  19. 根据权利要求11所述的触控显示装置，其中，所述公共电极和所述像素电极之间设置有钝化层。
  20. 根据权利要求11所述的触控显示装置，其中，所述导电层的制备方法为溅射沉积、化学气相沉积、等离子体增强化学气相沉积以及真空蒸镀中的一种。
PCT/CN2019/081740 2018-12-26 2019-04-08 显示面板及触控显示装置 WO2020133788A1 (zh)

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CN112289807A (zh) * 2020-10-27 2021-01-29 武汉华星光电半导体显示技术有限公司 一种oled显示面板
CN113009728B (zh) * 2021-03-23 2022-10-11 厦门天马微电子有限公司 显示面板及显示装置
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