WO2020113804A1 - 发光面板、发光面板的制作方法及显示设备 - Google Patents
发光面板、发光面板的制作方法及显示设备 Download PDFInfo
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- WO2020113804A1 WO2020113804A1 PCT/CN2019/073202 CN2019073202W WO2020113804A1 WO 2020113804 A1 WO2020113804 A1 WO 2020113804A1 CN 2019073202 W CN2019073202 W CN 2019073202W WO 2020113804 A1 WO2020113804 A1 WO 2020113804A1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/87—Passivation; Containers; Encapsulations
- H10K59/873—Encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/301—Details of OLEDs
- H10K2102/351—Thickness
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/87—Passivation; Containers; Encapsulations
- H10K59/871—Self-supporting sealing arrangements
- H10K59/8722—Peripheral sealing arrangements, e.g. adhesives, sealants
Definitions
- the present application relates to the field of display technology, and in particular to a light-emitting panel, a method for manufacturing the light-emitting panel, and a display device.
- OLED Organic Light Emitting Diode
- the embodiments of the present application provide a light-emitting panel, a method for manufacturing the light-emitting panel, and a display device, which can obtain an organic encapsulation layer with a uniform thickness, thereby reducing the encapsulation failure rate and reducing the quality problems of the OLED panel.
- an embodiment of the present application provides a light-emitting panel, including:
- the organic layer encapsulation layer is formed of organic ink
- a wetting layer is provided on the peripheral area of the first inorganic layer, and the wetting layer is used to wet the peripheral area of the first inorganic layer, so that the organic ink forms the organic encapsulation layer before Evenly distributed on the first inorganic layer.
- the vertical thickness of the wetting layer is 0.1 to 2 microns
- the horizontal width of the wetting layer is 0.5 to 2 mm
- the vertical thickness of the organic encapsulation layer is 2 ⁇ 12 microns.
- the wetting layer is a closed structure to cover the peripheral area of the first inorganic layer.
- the vertical thickness of the wettable layer is less than or equal to the vertical thickness of the organic encapsulation layer.
- the vertical thickness of the moisturizing layer is 0.1 to 2 microns.
- the moisturizing layer is composed of an amphiphilic surface active material, and the amphiphilic surface active material includes a quaternary ammonium salt, sodium dodecyl sulfonate, dodecyl benzene At least one of sodium sulfonate, polyvinyl alcohol, and polyvinyl chloride.
- the vertical thickness of the organic encapsulation layer is 2-12 microns.
- the orthographic projection area of the second inorganic layer on the light-emitting substrate is greater than or equal to the orthographic projection area of the organic encapsulation layer on the light-emitting substrate.
- the first inorganic layer and the second inorganic layer are composed of silicon nitride.
- the vertical thickness of the first inorganic layer and the second inorganic layer is 0.1 to 2 microns.
- an embodiment of the present application further provides a method for manufacturing a light-emitting panel.
- the manufacturing method includes:
- the wetting layer is used to wet the peripheral area of the first inorganic layer
- a second inorganic layer is deposited on the organic encapsulation layer to obtain the light-emitting panel.
- the spraying of organic ink on the first inorganic layer provided with the wetting layer to form an organic encapsulation layer includes:
- the hydrophilic layer is composed of an amphiphilic surface active material, and the amphiphilic surface active material includes a quaternary ammonium salt, sodium dodecyl sulfonate, twelve At least one of sodium alkylbenzene sulfonate, polyvinyl alcohol, and polyvinyl chloride.
- the organic ink is a polymethacrylate organic ink.
- an embodiment of the present application further provides a display device, including a housing and a light-emitting panel, the light-emitting panel is mounted on the housing, the light-emitting panel includes:
- the organic layer encapsulation layer is formed of organic ink
- a wetting layer is provided on the peripheral area of the first inorganic layer, and the wetting layer is used to wet the peripheral area of the first inorganic layer, so that the organic ink forms the organic encapsulation layer before The first inorganic layer is evenly distributed, wherein the wetting layer is a closed structure to cover the peripheral area of the first inorganic layer, and the vertical thickness of the wetting layer is less than or equal to that of the organic package The vertical thickness of the layer.
- the vertical thickness of the wetting layer is 0.1 to 2 microns
- the horizontal width of the wetting layer is 0.5 to 2 mm
- the vertical thickness of the organic encapsulation layer is 2 ⁇ 12 microns.
- the hydrophilic layer is composed of an amphiphilic surface active material, and the amphiphilic surface active material includes a quaternary ammonium salt, sodium dodecylsulfonate, dodecylbenzene At least one of sodium sulfonate, polyvinyl alcohol, and polyvinyl chloride.
- the orthographic projection area of the second inorganic layer on the light-emitting substrate is greater than or equal to the ortho-projection area of the organic encapsulation layer on the light-emitting substrate.
- the light-emitting panel provided by the embodiment of the present application includes a light-emitting substrate, a first inorganic layer, an organic encapsulation layer, and a second inorganic layer stacked in this order from bottom to top; wherein, the organic layer encapsulation layer is formed of organic ink; A wetting layer is provided on the peripheral area of the first inorganic layer, and the wetting layer is used to wet the peripheral area of the first inorganic layer, so that the organic ink forms Evenly distributed on the first inorganic layer.
- the thickness of the organic packaging layer can be made uniform, thereby reducing the packaging failure rate and reducing the quality problems of the OLED panel.
- FIG. 1 is a schematic structural diagram of a display device provided by an embodiment of the present application.
- FIG. 2 is a schematic cross-sectional structure diagram of a light-emitting panel provided by an embodiment of the present application.
- FIG 3 is a schematic structural diagram of a first inorganic layer in a light-emitting panel provided by an embodiment of the present application.
- FIG. 4 is a schematic structural diagram of a first inorganic layer after a wetting layer is provided in a light-emitting panel provided by an embodiment of the present application.
- FIG. 5 is another schematic cross-sectional structure diagram of a light-emitting panel provided by an embodiment of the present application.
- first and second are used for description purposes only, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated.
- features defined as “first” and “second” may explicitly or implicitly include one or more of the features.
- the meaning of “plurality” is two or more, unless otherwise specifically limited.
- connection should be understood in a broad sense, for example, it can be fixed connection or detachable Connected, or integrally connected; may be mechanical, electrical, or may communicate with each other; may be directly connected, or may be indirectly connected through an intermediary, may be the connection between two elements or the interaction of two elements relationship.
- the first feature “above” or “below” the second feature may include the direct contact of the first and second features, or may include the first and second features Contact not directly but through another feature between them.
- the first feature is “above”, “above” and “above” the second feature includes that the first feature is directly above and obliquely above the second feature, or simply means that the first feature is higher in level than the second feature.
- the first feature is “below”, “below” and “below” the second feature includes that the first feature is directly below and obliquely below the second feature, or simply means that the first feature is less horizontal than the second feature.
- inkjet printing Ink Jet Printing, IJP
- IJP Ink Jet Printing
- the sprayed printing ink is difficult to distribute evenly on the inorganic encapsulation layer, resulting in uneven thickness of the cured organic encapsulation layer, which may easily cause packaging failure and problems affecting the quality of the OLED panel.
- the embodiments of the present application provide a light-emitting panel, a method for manufacturing the light-emitting panel, and a display device, which can obtain an organic encapsulation layer with a uniform thickness, thereby reducing the encapsulation failure rate and reducing the quality problems of the OLED panel.
- Embodiments of the present application provide a method for manufacturing a light-emitting panel.
- the light-emitting panel may be integrated into a display device.
- the light-emitting panel may be manufactured using a method for manufacturing a light-emitting panel.
- the display device includes but is not limited to a smart wearable device, a smart phone, Tablet PC, smart TV and other devices.
- An embodiment of the present application provides a display device, which includes a housing and a light-emitting panel, the light-emitting panel is mounted on the housing, and the light-emitting panel includes:
- the organic layer encapsulation layer is formed of organic ink
- a wetting layer is provided on the peripheral area of the first inorganic layer, and the wetting layer is used to wet the peripheral area of the first inorganic layer, so that the organic ink forms the organic encapsulation layer before The first inorganic layer is evenly distributed, wherein the wetting layer is a closed structure to cover the peripheral area of the first inorganic layer, and the vertical thickness of the wetting layer is less than or equal to that of the organic package The vertical thickness of the layer.
- the vertical thickness of the wetting layer is 0.1 to 2 microns
- the horizontal width of the wetting layer is 0.5 to 2 millimeters
- the vertical thickness of the organic encapsulation layer is 2 to 12 microns.
- the moisturizing layer is composed of amphiphilic surface active materials
- the amphiphilic surface active materials include quaternary ammonium salts, sodium dodecyl sulfonate, sodium dodecyl benzene sulfonate, polyvinyl alcohol And at least one of polyvinyl chloride.
- the orthographic area of the second inorganic layer on the light-emitting substrate is greater than or equal to the orthographic area of the organic encapsulation layer on the light-emitting substrate.
- FIG. 1 is a schematic structural diagram of a display device 1000 provided by an embodiment of the present application.
- the display device 1000 may include a light emitting panel 100, a control circuit 200, and a housing 300. It should be noted that the display device 1000 shown in FIG. 1 is not limited to the above content, and it may also include other devices, such as a camera, an antenna structure, and a fingerprint unlocking module.
- the light emitting panel 100 is disposed on the housing 200.
- the light-emitting panel 100 may be fixed to the housing 200, and the light-emitting panel 100 and the housing 300 form a closed space to accommodate devices such as the control circuit 200.
- the housing 300 may be made of a flexible material, such as a plastic housing or a silicone housing.
- the control circuit 200 is installed in the housing 300.
- the control circuit 200 may be the main board of the display device 1000.
- the control circuit 200 may be integrated with a battery, an antenna structure, a microphone, a speaker, a headphone jack, a universal serial bus interface, One, two or more of the functional components such as camera, distance sensor, ambient light sensor, receiver and processor.
- the light-emitting panel 100 is installed in the housing 300, and at the same time, the light-emitting panel 100 is electrically connected to the control circuit 200 to form the display surface of the display device 1000.
- the light emitting panel 100 may include a display area and a non-display area.
- the display area can be used to display the screen of the display device 1000 or for user touch manipulation.
- the non-display area can be used to set various functional components.
- FIG. 2 is a schematic cross-sectional structural view of a light-emitting panel provided by an embodiment of the present application
- FIG. 3 is a structural schematic view of a first inorganic layer in the light-emitting panel provided by an embodiment of the present application
- FIG. 4 is A schematic structural diagram of a first inorganic layer after a wetting layer is provided in a light-emitting panel provided by an embodiment of the present application.
- the light-emitting panel 100 includes: a light-emitting substrate 10, a first inorganic layer 20, an organic encapsulation layer 30, and a second inorganic layer 40 stacked in this order from bottom to top; wherein,
- the organic layer encapsulation layer 30 is formed of organic ink
- the organic encapsulation layer 30 was uniformly distributed on the first inorganic layer 20 before.
- the light-emitting panel 100 is composed of the light-emitting substrate 10, the first inorganic layer 20, the organic encapsulation layer 30 and the second inorganic layer 40.
- the organic encapsulation layer 30 is composed of organic ink, the organic ink is hydrophobic. Therefore, when spraying organic ink, it is difficult for the hydrophobic organic ink to be completely and evenly distributed on the hydrophilic first inorganic layer 20, so a peripheral layer 201 of the first inorganic layer 20 is provided with an oil-water amphiphilic layer 50. The wetting layer 50 can wet the peripheral region 201 of the first inorganic layer 20. According to the similar compatibility principle, when spraying the organic ink, the organic ink can be diffused and leveled around the first inorganic layer 20, so that the thickness of the formed organic encapsulation layer 30 is uniform.
- the organic ink is a polymethacrylate organic ink.
- the organic encapsulation layer 30 can be printed by inkjet (Ink Jet Printing, IJP) method, UV spray curing of the sprayed organic ink to form the organic encapsulation layer 30.
- IJP Ink Jet Printing
- the light-emitting panel 100 provided by an embodiment of the present application includes a light-emitting substrate 10, a first inorganic layer 20, an organic encapsulation layer 30, and a second inorganic layer 40 stacked in this order from bottom to top; wherein, the organic layer encapsulation layer 30 is composed of organic Ink formation; on the peripheral area 201 of the first inorganic layer 20, a wetting layer 50 is provided, the wetting layer 50 is used to wet the peripheral area 201 of the first inorganic layer 20, so that the The organic ink is evenly distributed on the first inorganic layer 20 before forming the organic encapsulation layer 30.
- the thickness of the organic packaging layer 30 can be made uniform, thereby reducing the packaging failure rate and reducing the quality problems of the OLED panel.
- the wetting layer is a closed structure to cover the peripheral area of the first inorganic layer.
- the wetting layer 50 provided on the closed surface corresponds to a closed structure to cover the peripheral region 201 of the first inorganic layer 20.
- the moisturizing layer is composed of amphiphilic surface-active materials, the amphiphilic surface-active materials including quaternary ammonium salts, sodium dodecyl sulfonate, sodium dodecyl benzene sulfonate, polyethylene At least one of alcohol and polyvinyl chloride.
- the first inorganic layer and the second inorganic layer are composed of silicon nitride.
- the first inorganic layer 20 and the second inorganic layer 40 can be prepared by chemical vapor deposition (Chemical Vapor Deposition, CVD).
- CVD chemical Vapor Deposition
- the adhesion of the surface treatment film is increased by about 30% to prevent the scratches generated during the bending and stretching of high-strength steel.
- the first inorganic layer 20 and the second inorganic layer 40 may be composed of silicon nitride.
- the vertical thickness of the first inorganic layer and the second inorganic layer is 0.1-2 microns.
- FIG. 5 is another schematic cross-sectional structural diagram of a light-emitting panel provided by an embodiment of the present application.
- the vertical thickness of the wetting layer is less than or equal to the vertical thickness of the organic encapsulation layer.
- the vertical thickness of the moisturizing layer is 0.1-2 microns.
- the vertical thickness of the organic encapsulation layer is 2-12 microns.
- the orthographic area of the second inorganic layer on the light-emitting substrate is greater than or equal to the orthographic area of the organic encapsulation layer on the light-emitting substrate.
- X represents a horizontal direction
- Y represents a vertical direction
- the thickness of the wetting layer 50 in the Y direction is smaller than the thickness of the organic encapsulation layer 30 in the Y direction.
- the orthographic area of the second inorganic layer 40 on the light-emitting substrate 10 is equal to the orthographic area of the organic encapsulation layer 30 on the light-emitting substrate 10.
- the thickness of the wetting layer 50 in the Y direction is 0.1 to 2 ⁇ m
- the thickness of the organic encapsulation layer 30 in the Y direction is 2 to 12 ⁇ m.
- the organic encapsulation layer 30 has a T-shaped structure.
- X represents the horizontal direction and Y represents the vertical direction.
- FIG. 5 shows that the thickness of the wetting layer 50 in the Y direction is 2 ⁇ m, and the thickness of the organic encapsulation layer 30 in the Y direction is also 2 ⁇ m .
- the thickness of the wetting layer 50 in the Y direction is equal to the thickness of the organic encapsulation layer 30 in the Y direction.
- the orthographic area of the second inorganic layer 40 on the light-emitting substrate 10 is larger than the orthographic area of the organic encapsulation layer 30 on the light-emitting substrate 10.
- the organic encapsulation layer 30 has a square structure.
- the width of the hydrophilic layer 50 in the X direction is 0.5-2 mm.
- the light-emitting panel 100 provided by an embodiment of the present application includes a light-emitting substrate 10, a first inorganic layer 20, an organic encapsulation layer 30, and a second inorganic layer 40 stacked in this order from bottom to top; wherein, the organic layer encapsulation layer 30 is composed of organic Ink formation; on the peripheral area 201 of the first inorganic layer 20, a wetting layer 50 is provided, the wetting layer 50 is used to wet the peripheral area 201 of the first inorganic layer 20, so that the The organic ink is evenly distributed on the first inorganic layer 20 before forming the organic encapsulation layer 30.
- the thickness of the organic packaging layer 30 can be made uniform, thereby reducing the packaging failure rate and reducing the quality problems of the OLED panel.
- the wetting layer is used to wet the peripheral area of the first inorganic layer
- a second inorganic layer is deposited on the organic encapsulation layer to obtain the light-emitting panel.
- the light-emitting panel is composed of a light-emitting substrate, a first inorganic layer, an organic encapsulation layer, and a second inorganic layer.
- the organic encapsulation layer is composed of organic ink
- the organic ink is hydrophobic. Therefore, when spraying organic inks, it is difficult for hydrophobic organic inks to be evenly distributed in the hydrophilic first inorganic layer, so an oil-water amphiphilic moisturizing layer is provided in the peripheral area of the first inorganic layer.
- the wetting layer can wet the peripheral area of the first inorganic layer. According to the similar compatibility principle, when spraying organic ink, the organic ink can diffuse and level around the first inorganic layer, so that the thickness of the formed organic encapsulation layer is uniform.
- the spraying of organic ink on the first inorganic layer provided with the wetting layer to form an organic encapsulation layer includes:
- the organic ink is a polymethacrylate organic ink.
- the organic ink is a polymethacrylate organic ink.
- the organic encapsulation layer can be formed by inkjet printing (Ink Jet Printing, IJP) method, and the sprayed organic ink is subjected to ultraviolet curing treatment to form an organic encapsulation layer.
- the moisturizing layer is composed of amphiphilic surface active materials
- the amphiphilic surface active materials include quaternary ammonium salts, sodium dodecyl sulfonate, sodium dodecyl benzene sulfonate, At least one of polyvinyl alcohol and polyvinyl chloride.
- the manufacturing method of the light-emitting panel provided by the embodiment of the present application is applied to a display device, and a wetting layer is provided on the edge area of the first inorganic layer of the display panel, and the wetting layer is used to wet the first inorganic layer
- the peripheral area of the layer so that the organic ink is evenly distributed on the first inorganic layer before forming the organic encapsulation layer.
- the thickness of the organic packaging layer can be made uniform, thereby reducing the packaging failure rate and reducing the quality problems of the OLED panel.
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Abstract
一种发光面板(100)、发光面板的制作方法及显示设备(1000),发光面板(100)包括:从下至上依次层叠设置的发光基板(10)、第一无机层(20)、有机封装层(30)以及第二无机层(40);其中,有机封装层(30)由有机墨水形成;在第一无机层(20)的周缘区域(201)上,设置有一亲润层(50),亲润层(50)用于润湿第一无机层(20)的周缘区域(201),以使得有机墨水形成有机封装层(30)之前在第一无机层(20)上均匀分布。
Description
本申请涉及显示技术领域,具体涉及一种发光面板、发光面板的制作方法及显示设备。
近年来,有机发光二极管(Organic Light Emitting Diode,OLED)显示技术发展突飞猛进,OLED产品由于具有轻薄、响应快、广视角、高对比度、可弯折等优点,受到了越来越多的关注和应用,主要应用在手机、平板、电视等显示技术领域。
现有技术中,在对OLED进行封装时,通常需要在无机封装层上制备有机层封装层。然而,利用现有形成有机封装层的方法经常使得有机封装层厚度不均匀,从而易造成封装失败以及影响OLED面板品质的问题。
因此,现有技术存在缺陷,急需改进。
本申请实施例提供一种发光面板、发光面板的制作方法及显示设备,可以得到厚度均匀的有机封装层,从而降低封装失败率以及减少OLED面板品质问题。
第一方面,本申请实施例提供一种发光面板,包括:
从下至上依次层叠设置的发光基板、第一无机层、有机封装层以及第二无机层;其中,
所述有机层封装层由有机墨水形成;
在所述第一无机层的周缘区域上设置有一亲润层,所述亲润层用于润湿所述第一无机层的周缘区域,以使得所述有机墨水形成所述有机封装层之前在所述第一无机层上均匀分布。
在本申请所述的发光面板中,所述亲润层的竖直厚度为0.1~2微米,所述亲润层的水平宽度为0.5~2毫米,所述有机封装层的竖直厚度为2~12微米。
在本申请所述的发光面板中,所述亲润层为闭合结构,以包覆所述第一无机层的周缘区域。
在本申请所述的发光面板中,所述亲润层的竖直厚度小于或等于所述有机封装层的竖直厚度。
在本申请所述的发光面板中,所述亲润层的竖直厚度为0.1~2微米。
在本申请所述的发光面板中,所述亲润层由两亲性表面活性材料组成,所述两亲性表面活性材料包括季铵盐、十二烷基磺酸钠、十二烷基苯磺酸钠、聚乙烯醇以及聚氯乙烯中的至少一种。
在本申请所述的发光面板中,所述有机封装层的竖直厚度为2~12微米。
在本申请所述的发光面板中,所述第二无机层在所述发光基板上的正投影面积大于或等于所述有机封装层在所述发光基板上的正投影面积。
在本申请所述的发光面板中,所述第一无机层以及所述第二无机层由氮化硅组成。
在本申请所述的发光面板中,所述第一无机层以及所述第二无机层的竖直厚度为0.1~2微米。
第二方面,本申请实施例还提供一种发光面板的制作方法,所述制作方法包括:
提供一发光基板;
在所述发光基板上沉积一第一无机层;
在所述第一无机层的周缘区域设置一亲润层,所述亲润层用于润湿所述第一无机层的周缘区域;
在设置有所述亲润层的第一无机层上喷涂有机墨水,形成有机封装层;
在所述有机封装层上沉积一第二无机层,得到所述发光面板。
在本申请所述的发光面板的制作方法中,所述在设置有所述亲润层的第一无机层上喷涂有机墨水,形成有机封装层,包括:
在设置有所述亲润层的第一无机层上喷涂有机墨水;
对所述有机墨水进行紫外固化处理,得到所述有机封装层。
在本申请所述的发光面板的制作方法中,所述亲润层由两亲性表面活性材料组成,所述两亲性表面活性材料包括季铵盐、十二烷基磺酸钠、十二烷基苯磺酸钠、聚乙烯醇以及聚氯乙烯中的至少一种。
在本申请所述的发光面板的制作方法中,所述有机墨水为聚甲基丙烯酸酯有机墨水。
第三方面,本申请实施例还提供一种显示设备,包括壳体和发光面板,所述发光面板安装在所述壳体上,所述发光面板包括:
从下至上依次层叠设置的发光基板、第一无机层、有机封装层以及第二无机层;其中,
所述有机层封装层由有机墨水形成;
在所述第一无机层的周缘区域上设置有一亲润层,所述亲润层用于润湿所述第一无机层的周缘区域,以使得所述有机墨水形成所述有机封装层之前在所述第一无机层上均匀分布,其中,所述亲润层为闭合结构,以包覆所述第一无机层的周缘区域,所述亲润层的竖直厚度小于或等于所述有机封装层的竖直厚度。
在本申请所述的显示设备中,所述亲润层的竖直厚度为0.1~2微米,所述亲润层的水平宽度为0.5~2毫米,所述有机封装层的竖直厚度为2~12微米。
在本申请所述的显示设备中,所述亲润层由两亲性表面活性材料组成,所述两亲性表面活性材料包括季铵盐、十二烷基磺酸钠、十二烷基苯磺酸钠、聚乙烯醇以及聚氯乙烯中的至少一种。
在本申请所述的显示设备中,所述第二无机层在所述发光基板上的正投影面积大于或等于所述有机封装层在所述发光基板上的正投影面积。
本申请实施例提供的发光面板,包括从下至上依次层叠设置的发光基板、第一无机层、有机封装层以及第二无机层;其中,所述有机层封装层由有机墨水形成;在所述第一无机层的周缘区域上,设置有一亲润层,所述亲润层用于润湿所述第一无机层的周缘区域,以使得所述有机墨水形成所述有机封装层之前在所述第一无机层上均匀分布。可以使有机封装层厚度均匀,从而降低封装失败率以及减少OLED面板品质问题。
为了更清楚地说明本申请实施例中的技术方案,下面将对实施例描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本申请的一些实施例,对于本领域技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。
图1为本申请实施例提供的显示设备的结构示意图。
图2为本申请实施例提供的发光面板的剖面结构示意图。
图3为本申请实施例提供的发光面板中第一无机层的结构示意图。
图4为本申请实施例提供的发光面板中设置亲润层后的第一无机层的结构示意图。
图5为本申请实施例提供的发光面板的另一剖面结构示意图。
下面将结合本申请实施例中的附图,对本申请实施例中的技术方案进行清楚、完整地描述。显然,所描述的实施例仅仅是本申请一部分实施例,而不是全部的实施例。基于本申请中的实施例,本领域技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本申请保护的范围。
在本申请的描述中,需要理解的是,术语“中心”、“纵向”、“横向”、“长度”、“宽度”、“厚度”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”、“顺时针”、“逆时针”等指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本申请和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本申请的限制。此外,术语“第一”、“第二”仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个所述特征。在本申请的描述中,“多个”的含义是两个或两个以上,除非另有明确具体的限定。
在本申请的描述中,需要说明的是,除非另有明确的规定和限定,术语“安装”、“相连”、“连接”应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或一体地连接;可以是机械连接,也可以是电连接或可以相互通讯;可以是直接相连,也可以通过中间媒介间接相连,可以是两个元件内部的连通或两个元件的相互作用关系。对于本领域的普通技术人员而言,可以根据具体情况理解上述术语在本申请中的具体含义。
在本申请中,除非另有明确的规定和限定,第一特征在第二特征之“上”或之“下”可以包括第一和第二特征直接接触,也可以包括第一和第二特征不是直接接触而是通过它们之间的另外的特征接触。而且,第一特征在第二特征“之上”、“上方”和“上面”包括第一特征在第二特征正上方和斜上方,或仅仅表示第一特征水平高度高于第二特征。第一特征在第二特征“之下”、“下方”和“下面”包括第一特征在第二特征正下方和斜下方,或仅仅表示第一特征水平高度小于第二特征。
下文的公开提供了许多不同的实施方式或例子用来实现本申请的不同结构。为了简化本申请的公开,下文中对特定例子的部件和设置进行描述。当然,它们仅仅为示例,并且目的不在于限制本申请。此外,本申请可以在不同例子中重复参考数字和/或参考字母,这种重复是为了简化和清楚的目的,其本身不指示所讨论各种实施方式和/或设置之间的关系。此外,本申请提供了的各种特定的工艺和材料的例子,但是本领域普通技术人员可以意识到其他工艺的应用和/或其他材料的使用。
现有技术中,在对OLED进行封装时,通常采用喷墨打印(Ink Jet Printing,IJP)的方式在无机封装层上喷涂打印墨水并使其固化形成有机层封装层。然而,喷涂的打印墨水很难在无机封装层上均匀分布,造成固化后的有机封装层厚度不均匀,从而易造成封装失败以及影响OLED面板品质的问题。因此,本申请实施例提供一种发光面板、发光面板的制作方法及显示设备,可以得到厚度均匀的有机封装层,从而降低封装失败率以及减少OLED面板品质问题。
本申请实施例提供一种发光面板的制作方法,该发光面板可以集成在显示设备中,该发光面板可以采用发光面板的制作方法制成,该显示设备包括但不限于智能穿戴设备、智能手机、平板电脑、智能电视等设备。
本申请实施例提供一种显示设备,其包括壳体和发光面板,所述发光面板安装在所述壳体上,所述发光面板包括:
从下至上依次层叠设置的发光基板、第一无机层、有机封装层以及第二无机层;其中,
所述有机层封装层由有机墨水形成;
在所述第一无机层的周缘区域上设置有一亲润层,所述亲润层用于润湿所述第一无机层的周缘区域,以使得所述有机墨水形成所述有机封装层之前在所述第一无机层上均匀分布,其中,所述亲润层为闭合结构,以包覆所述第一无机层的周缘区域,所述亲润层的竖直厚度小于或等于所述有机封装层的竖直厚度。
其中,所述亲润层的竖直厚度为0.1~2微米,所述亲润层的水平宽度为0.5~2毫米,所述有机封装层的竖直厚度为2~12微米。
其中,其中所述亲润层由两亲性表面活性材料组成,所述两亲性表面活性材料包括季铵盐、十二烷基磺酸钠、十二烷基苯磺酸钠、聚乙烯醇以及聚氯乙烯中的至少一种。
其中,其中所述第二无机层在所述发光基板上的正投影面积大于或等于所述有机封装层在所述发光基板上的正投影面积。
请参阅图1,图1为本申请实施例提供的显示设备1000的结构示意图。该显示设备1000可以包括发光面板100、控制电路200、以及壳体300。需要说明的是,图1所示的显示设备1000并不限于以上内容,其还可以包括其他器件,比如还可以包括摄像头、天线结构、指纹解锁模块等。
其中,发光面板100设置于壳体200上。
在一些实施例中,发光面板100可以固定到壳体200上,发光面板100和壳体300形成密闭空间,以容纳控制电路200等器件。
在一些实施例中,壳体300可以为由柔性材料制成,比如为塑胶壳体或者硅胶壳体等。
其中,该控制电路200安装在壳体300中,该控制电路200可以为显示设备1000的主板,控制电路200上可以集成有电池、天线结构、麦克风、扬声器、耳机接口、通用串行总线接口、摄像头、距离传感器、环境光传感器、受话器以及处理器等功能组件中的一个、两个或多个。
其中,该发光面板100安装在壳体300中,同时,该发光面板100电连接至控制电路200上,以形成显示设备1000的显示面。该发光面板100可以包括显示区域和非显示区域。该显示区域可以用来显示显示设备1000的画面或者供用户进行触摸操控等。该非显示区域可用于设置各种功能组件。
进一步的,请参阅图2至图4,图2为本申请实施例提供的发光面板的剖面结构示意图,图3为本申请实施例提供的发光面板中第一无机层的结构示意图,图4为本申请实施例提供的发光面板中设置亲润层后的第一无机层的结构示意图。
其中,该发光面板100包括:从下至上依次层叠设置的发光基板10、第一无机层20、有机封装层30以及第二无机层40;其中,
所述有机层封装层30由有机墨水形成;
在所述第一无机层20的周缘区域201上,设置有一亲润层50,所述亲润层50用于润湿所述第一无机层20的周缘区域201,以使得所述有机墨水形成所述有机封装层30之前在所述第一无机层20上均匀分布。
可以理解,发光面板100由发光基板10、第一无机层20、有机封装层30以及第二无机层40组成。由于有机封装层30是由有机墨水组成,该有机墨水为疏水性。因此在喷涂有机墨水时,疏水性的有机墨水很难在亲水性的第一无机层20完全均匀分布,所以在第一无机层20的周缘区域201设置一具有油水两亲性的亲润层50,该亲润层50可润湿该第一无机层20的周缘区域201。根据相似相容原理,在喷涂有机墨水时,有机墨水可以向第一无机层20四周扩散流平,使得形成的有机封装层30厚度均匀。
其中,有机墨水为聚甲基丙烯酸酯有机墨水。该有机封装层30可由采用喷墨打印(Ink
Jet Printing,IJP)的方法形成,对喷涂的有机墨水进行紫外固化处理,形成有机封装层30。
本申请实施例提供的发光面板100,包括从下至上依次层叠设置的发光基板10、第一无机层20、有机封装层30以及第二无机层40;其中,所述有机层封装层30由有机墨水形成;在所述第一无机层20的周缘区域201上,设置有一亲润层50,所述亲润层50用于润湿所述第一无机层20的周缘区域201,以使得所述有机墨水形成所述有机封装层30之前在所述第一无机层20上均匀分布。可以使有机封装层30厚度均匀,从而降低封装失败率以及减少OLED面板品质问题。
在一些实施例中,所述亲润层为闭合结构,以包覆所述第一无机层的周缘区域。
具体的,由于第一无机层20的周缘区域201为一闭合面,所以设置在该闭合面上的亲润层50对应为闭合结构,以包覆该第一无机层20的周缘区域201。
在一些实施例中,亲润层由两亲性表面活性材料组成,所述两亲性表面活性材料包括季铵盐、十二烷基磺酸钠、十二烷基苯磺酸钠、聚乙烯醇以及聚氯乙烯中的至少一种。
在一些实施例中,所述第一无机层以及所述第二无机层由氮化硅组成。
其中,第一无机层20与第二无机层40可以由化学气相沉积(Chemical Vapor Deposition,CVD)制备而成。把含有构成薄膜元素的气态反应剂或液态反应剂的蒸气及反应所需其它气体引入反应室,在衬底表面发生化学反应生成薄膜的过程。经过CVD处理后,表面处理膜密着性约提高30%,防止高强力钢的弯曲,拉伸等成形时产生的刮痕。第一无机层20以及第二无机层40可由氮化硅组成。
在一些实施例中,所述第一无机层以及所述第二无机层的竖直厚度为0.1~2微米。
具体的,请参阅图2与图5,图5为本申请实施例提供的发光面板的另一剖面结构示意图。
在一些实施例中,所述亲润层的竖直厚度小于或等于所述有机封装层的竖直厚度。
在一些实施例中,所述亲润层的竖直厚度为0.1~2微米。
在一些实施例中,所述有机封装层的竖直厚度为2~12微米。
在一些实施例中,所述第二无机层在所述发光基板上的正投影面积大于或等于所述有机封装层在所述发光基板上的正投影面积。
如图2所示,图中X代表水平方向,Y代表竖直方向,亲润层50的Y方向的厚度小于有机封装层30的Y方向的厚度。第二无机层40在发光基板10上的正投影面积等于该有机封装层30在该发光基板10上的正投影面积。其中,亲润层50在Y方向上的厚度为0.1~2微米,有机封装层30在Y方向上的厚度为2~12微米。此时,有机封装层30为T型结构。
如图5所示,图中X代表水平方向,Y代表竖直方向,图5为亲润层50在Y方向上的厚度为2微米,有机封装层30在Y方向上的厚度也为2微米。这时,该亲润层50在Y方向上的厚度等于该有机封装层30在Y方向上的厚度。并且第二无机层40在发光基板10上的正投影面积大于该有机封装层30在该发光基板10上的正投影面积。此时,有机封装层30为方形结构。其中,亲润层50在X方向上的宽度为0.5~2毫米。
本申请实施例提供的发光面板100,包括从下至上依次层叠设置的发光基板10、第一无机层20、有机封装层30以及第二无机层40;其中,所述有机层封装层30由有机墨水形成;在所述第一无机层20的周缘区域201上,设置有一亲润层50,所述亲润层50用于润湿所述第一无机层20的周缘区域201,以使得所述有机墨水形成所述有机封装层30之前在所述第一无机层20上均匀分布。可以使有机封装层30厚度均匀,从而降低封装失败率以及减少OLED面板品质问题。
为了进一步描述本申请,下面从发光面板的制作方法的方向进行描述。
提供一发光基板;
在所述发光基板上沉积一第一无机层;
在所述第一无机层的周缘区域设置一亲润层,所述亲润层用于润湿所述第一无机层的周缘区域;
在设置有所述亲润层的第一无机层上喷涂有机墨水,形成有机封装层;
在所述有机封装层上沉积一第二无机层,得到所述发光面板。
可以理解,发光面板由发光基板、第一无机层、有机封装层以及第二无机层组成。由于有机封装层是由有机墨水组成,该有机墨水为疏水性。因此在喷涂有机墨水时,疏水性的有机墨水很难在亲水性的第一无机层完全均匀分布,所以在第一无机层的周缘区域设置一具有油水两亲性的亲润层,该亲润层可润湿该第一无机层的周缘区域。根据相似相容原理,在喷涂有机墨水时,有机墨水可以向第一无机层四周扩散流平,使得形成的有机封装层厚度均匀。
在一些实施例中,所述在设置有所述亲润层的第一无机层上喷涂有机墨水,形成有机封装层,包括:
在设置有所述亲润层的第一无机层上喷涂有机墨水;
对所述有机墨水进行紫外固化处理,得到所述有机封装层。
在一些实施例中,所述有机墨水为聚甲基丙烯酸酯有机墨水。
其中,有机墨水为聚甲基丙烯酸酯有机墨水。该有机封装层可由采用喷墨打印(Ink Jet Printing,IJP)的方法形成,对喷涂的有机墨水进行紫外固化处理,形成有机封装层。
在一些实施例中,所述亲润层由两亲性表面活性材料组成,所述两亲性表面活性材料包括季铵盐、十二烷基磺酸钠、十二烷基苯磺酸钠、聚乙烯醇以及聚氯乙烯中的至少一种。
本申请实施例提供的发光面板的制作方法,应用于显示设备中,在该显示面板的第一无机层的边缘区域设置一亲润层,所述亲润层用于润湿所述第一无机层的周缘区域,以使得所述有机墨水形成所述有机封装层之前在所述第一无机层上均匀分布。可以使有机封装层厚度均匀,从而降低封装失败率以及减少OLED面板品质问题。
在上述实施例中,对各个实施例的描述都各有侧重,某个实施例中没有详述的部分,可以参见其他实施例的相关描述。
以上对本申请实施例所提供的一种发光面板、发光面板的制作方法及显示设备进行了详细介绍,本文中应用了具体个例对本申请的原理及实施方式进行了阐述,以上实施例的说明只是用于帮助理解本申请的技术方案及其核心思想;本领域的普通技术人员应当理解:其依然可以对前述各实施例所记载的技术方案进行修改,或者对其中部分技术特征进行等同替换;而这些修改或者替换,并不使相应技术方案的本质脱离本申请各实施例的技术方案的范围。
Claims (14)
- 一种发光面板,其包括:从下至上依次层叠设置的发光基板、第一无机层、有机封装层以及第二无机层;其中,所述有机层封装层由有机墨水形成;在所述第一无机层的周缘区域上设置有一亲润层,所述亲润层用于润湿所述第一无机层的周缘区域,以使得所述有机墨水形成所述有机封装层之前在所述第一无机层上均匀分布。
- 如权利要求1所述的发光面板,其中所述亲润层的竖直厚度为0.1~2微米,所述亲润层的水平宽度为0.5~2毫米,所述有机封装层的竖直厚度为2~12微米。
- 如权利要求1所述的发光面板,其中所述亲润层为闭合结构,以包覆所述第一无机层的周缘区域。
- 如权利要求1所述的发光面板,其中所述亲润层的竖直厚度小于或等于所述有机封装层的竖直厚度。
- 如权利要求4所述的发光面板,其中所述亲润层由两亲性表面活性材料组成,所述两亲性表面活性材料包括季铵盐、十二烷基磺酸钠、十二烷基苯磺酸钠、聚乙烯醇以及聚氯乙烯中的至少一种。
- 如权利要求1所述的发光面板,其中所述第二无机层在所述发光基板上的正投影面积大于或等于所述有机封装层在所述发光基板上的正投影面积。
- 一种发光面板的制作方法,其包括:提供一发光基板;在所述发光基板上沉积一第一无机层;在所述第一无机层的周缘区域设置一亲润层,所述亲润层用于润湿所述第一无机层的周缘区域;在设置有所述亲润层的第一无机层上喷涂有机墨水,形成有机封装层;在所述有机封装层上沉积一第二无机层,得到所述发光面板。
- 如权利要求7所述的发光面板的制作方法,其中所述在设置有所述亲润层的第一无机层上喷涂有机墨水,形成有机封装层,包括:在设置有所述亲润层的第一无机层上喷涂有机墨水;对所述有机墨水进行紫外固化处理,得到所述有机封装层。
- 如权利要求8所述的发光面板的制作方法,其中所述亲润层由两亲性表面活性材料组成,所述两亲性表面活性材料包括季铵盐、十二烷基磺酸钠、十二烷基苯磺酸钠、聚乙烯醇以及聚氯乙烯中的至少一种。
- 如权利要求8所述的发光面板的制作方法,其中所述有机墨水为聚甲基丙烯酸酯有机墨水。
- 一种显示设备,其包括壳体和发光面板,所述发光面板安装在所述壳体上,所述发光面板包括:从下至上依次层叠设置的发光基板、第一无机层、有机封装层以及第二无机层;其中,所述有机层封装层由有机墨水形成;在所述第一无机层的周缘区域上设置有一亲润层,所述亲润层用于润湿所述第一无机层的周缘区域,以使得所述有机墨水形成所述有机封装层之前在所述第一无机层上均匀分布,其中,所述亲润层为闭合结构,以包覆所述第一无机层的周缘区域,所述亲润层的竖直厚度小于或等于所述有机封装层的竖直厚度。
- 如权利要求11所述的显示设备,其中所述亲润层的竖直厚度为0.1~2微米,所述亲润层的水平宽度为0.5~2毫米,所述有机封装层的竖直厚度为2~12微米。
- 如权利要求11所述的显示设备,其中所述亲润层由两亲性表面活性材料组成,所述两亲性表面活性材料包括季铵盐、十二烷基磺酸钠、十二烷基苯磺酸钠、聚乙烯醇以及聚氯乙烯中的至少一种。
- 如权利要求11所述的显示设备,其中所述第二无机层在所述发光基板上的正投影面积大于或等于所述有机封装层在所述发光基板上的正投影面积。
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| CN114300517B (zh) * | 2021-12-24 | 2025-08-19 | 深圳市华星光电半导体显示技术有限公司 | 显示面板及其制作方法、显示装置 |
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| KR20170039809A (ko) * | 2015-10-01 | 2017-04-12 | 삼성디스플레이 주식회사 | 윈도우 부재 및 이를 포함하는 표시 장치 |
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| US20110198598A1 (en) * | 2010-02-16 | 2011-08-18 | Young-Il Kim | Organic light emitting display apparatus and method of manufacturing the same |
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| CN109546004B (zh) | 2020-06-30 |
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