WO2020054974A1 - Appareil de purification par sublimation et procédé de purification par sublimation - Google Patents
Appareil de purification par sublimation et procédé de purification par sublimation Download PDFInfo
- Publication number
- WO2020054974A1 WO2020054974A1 PCT/KR2019/009812 KR2019009812W WO2020054974A1 WO 2020054974 A1 WO2020054974 A1 WO 2020054974A1 KR 2019009812 W KR2019009812 W KR 2019009812W WO 2020054974 A1 WO2020054974 A1 WO 2020054974A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- boat
- sublimation purification
- chamber
- tube housing
- heating zone
- Prior art date
Links
- 238000000746 purification Methods 0.000 title claims abstract description 166
- 238000000859 sublimation Methods 0.000 title claims abstract description 161
- 230000008022 sublimation Effects 0.000 title claims abstract description 161
- 238000000034 method Methods 0.000 title claims description 33
- 238000010438 heat treatment Methods 0.000 claims abstract description 102
- 239000000463 material Substances 0.000 claims abstract description 60
- 229910052751 metal Inorganic materials 0.000 claims abstract description 20
- 239000002184 metal Substances 0.000 claims abstract description 20
- 239000013077 target material Substances 0.000 claims description 35
- 238000012546 transfer Methods 0.000 claims description 32
- 239000012535 impurity Substances 0.000 claims description 24
- 238000001816 cooling Methods 0.000 claims description 23
- 239000000126 substance Substances 0.000 claims description 18
- 238000007789 sealing Methods 0.000 claims description 16
- 239000010936 titanium Substances 0.000 claims description 15
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 12
- 229910052719 titanium Inorganic materials 0.000 claims description 12
- 229910052715 tantalum Inorganic materials 0.000 claims description 10
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 10
- 239000010949 copper Substances 0.000 claims description 7
- 238000005259 measurement Methods 0.000 claims description 7
- 239000000919 ceramic Substances 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 229910052709 silver Inorganic materials 0.000 claims description 4
- 239000004332 silver Substances 0.000 claims description 4
- 238000005406 washing Methods 0.000 claims description 3
- 238000002844 melting Methods 0.000 claims description 2
- 230000008018 melting Effects 0.000 claims description 2
- 239000013076 target substance Substances 0.000 claims 4
- 239000007789 gas Substances 0.000 description 21
- 230000008569 process Effects 0.000 description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 15
- 235000012239 silicon dioxide Nutrition 0.000 description 14
- 239000010453 quartz Substances 0.000 description 13
- 239000013014 purified material Substances 0.000 description 12
- 239000011368 organic material Substances 0.000 description 8
- 238000010943 off-gassing Methods 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000007769 metal material Substances 0.000 description 4
- 238000001953 recrystallisation Methods 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000010924 continuous production Methods 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 229910001026 inconel Inorganic materials 0.000 description 2
- 238000004020 luminiscence type Methods 0.000 description 2
- 238000001465 metallisation Methods 0.000 description 2
- 238000005092 sublimation method Methods 0.000 description 2
- 229910001374 Invar Inorganic materials 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000012938 design process Methods 0.000 description 1
- 230000003670 easy-to-clean Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000011403 purification operation Methods 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/311—Purifying organic semiconductor materials
Landscapes
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
Abstract
Un appareil de purification par sublimation, selon un mode de réalisation de la présente invention, comprend : une chambre sous vide ; un boîtier de tube disposé à l'intérieur de la chambre sous vide ; un bateau en contact étroit avec le boîtier de tube ; et une unité de chauffage positionnée adjacente à une surface extérieure du bateau et une surface extérieure du boîtier de tube, le bateau contenant un matériau soumis à une purification par sublimation, et le bateau et/ou le boîtier de tube étant formé d'un métal.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US16/968,365 US11426678B2 (en) | 2018-09-12 | 2019-08-06 | Sublimation purification apparatus and sublimation purification method |
| JP2020539202A JP7052172B2 (ja) | 2018-09-12 | 2019-08-06 | 昇華精製装置および昇華精製方法 |
| CN201980012120.4A CN111699565B (zh) | 2018-09-12 | 2019-08-06 | 升华纯化装置和升华纯化方法 |
| EP19858777.6A EP3734683B1 (fr) | 2018-09-12 | 2019-08-06 | Appareil de purification par sublimation et procédé de purification par sublimation |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2018-0109089 | 2018-09-12 | ||
| KR20180109089 | 2018-09-12 | ||
| KR1020190066109A KR102297249B1 (ko) | 2018-09-12 | 2019-06-04 | 승화 정제 장치 및 승화 정제 방법 |
| KR10-2019-0066109 | 2019-06-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2020054974A1 true WO2020054974A1 (fr) | 2020-03-19 |
Family
ID=69777190
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/KR2019/009812 WO2020054974A1 (fr) | 2018-09-12 | 2019-08-06 | Appareil de purification par sublimation et procédé de purification par sublimation |
Country Status (1)
| Country | Link |
|---|---|
| WO (1) | WO2020054974A1 (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU219766U1 (ru) * | 2023-06-12 | 2023-08-04 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Российский химико-технологический университет имени Д.И. Менделеева" (РХТУ им. Д.И.Менделеева) | Оснастка для получения очищенного трис(8-оксихинолята) алюминия методом вакуумной сублимации |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20040049365A (ko) * | 2002-12-03 | 2004-06-12 | (주)그라쎌 | 경사가열식 진공 승화 정제 장치 및 그 방법 |
| JP2006265575A (ja) * | 2005-03-22 | 2006-10-05 | Toppan Printing Co Ltd | 深底蒸着ボート |
| KR20100045548A (ko) * | 2008-10-24 | 2010-05-04 | 하이디스 테크놀로지 주식회사 | 유기박막 형성장치 |
| KR20120061137A (ko) * | 2010-10-25 | 2012-06-13 | 삼성모바일디스플레이주식회사 | 승화정제장치 및 승화정제장치용 내부관유닛 |
| KR20140146385A (ko) * | 2013-06-17 | 2014-12-26 | 롬엔드하스전자재료코리아유한회사 | 승화 정제 장치 |
-
2019
- 2019-08-06 WO PCT/KR2019/009812 patent/WO2020054974A1/fr unknown
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20040049365A (ko) * | 2002-12-03 | 2004-06-12 | (주)그라쎌 | 경사가열식 진공 승화 정제 장치 및 그 방법 |
| JP2006265575A (ja) * | 2005-03-22 | 2006-10-05 | Toppan Printing Co Ltd | 深底蒸着ボート |
| KR20100045548A (ko) * | 2008-10-24 | 2010-05-04 | 하이디스 테크놀로지 주식회사 | 유기박막 형성장치 |
| KR20120061137A (ko) * | 2010-10-25 | 2012-06-13 | 삼성모바일디스플레이주식회사 | 승화정제장치 및 승화정제장치용 내부관유닛 |
| KR20140146385A (ko) * | 2013-06-17 | 2014-12-26 | 롬엔드하스전자재료코리아유한회사 | 승화 정제 장치 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU219766U1 (ru) * | 2023-06-12 | 2023-08-04 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Российский химико-технологический университет имени Д.И. Менделеева" (РХТУ им. Д.И.Менделеева) | Оснастка для получения очищенного трис(8-оксихинолята) алюминия методом вакуумной сублимации |
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