WO2021112294A1 - Appareil de préparation continue de nanopoudre dans lequel la quantité d'évaporation et la vitesse de matière première sont ajustées - Google Patents

Appareil de préparation continue de nanopoudre dans lequel la quantité d'évaporation et la vitesse de matière première sont ajustées Download PDF

Info

Publication number
WO2021112294A1
WO2021112294A1 PCT/KR2019/017116 KR2019017116W WO2021112294A1 WO 2021112294 A1 WO2021112294 A1 WO 2021112294A1 KR 2019017116 W KR2019017116 W KR 2019017116W WO 2021112294 A1 WO2021112294 A1 WO 2021112294A1
Authority
WO
WIPO (PCT)
Prior art keywords
raw material
crucible
nanopowder
reaction chamber
track
Prior art date
Application number
PCT/KR2019/017116
Other languages
English (en)
Korean (ko)
Inventor
김태윤
Original Assignee
김태윤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김태윤 filed Critical 김태윤
Priority to PCT/KR2019/017116 priority Critical patent/WO2021112294A1/fr
Publication of WO2021112294A1 publication Critical patent/WO2021112294A1/fr
Priority to US17/805,322 priority patent/US20220297185A1/en

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/05—Metallic powder characterised by the size or surface area of the particles
    • B22F1/054—Nanosized particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00—Making metallic powder or suspensions thereof
    • B22F9/02—Making metallic powder or suspensions thereof using physical processes
    • B22F9/14—Making metallic powder or suspensions thereof using physical processes using electric discharge
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00—Making metallic powder or suspensions thereof
    • B22F9/16—Making metallic powder or suspensions thereof using chemical processes
    • B22F9/18—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds
    • B22F9/28—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds starting from gaseous metal compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2202/00—Treatment under specific physical conditions
    • B22F2202/13—Use of plasma

Definitions

  • the present invention relates to a nanopowder manufacturing apparatus, and more particularly, to continuously produce nanopowders having a uniform particle size, thereby increasing the productivity of nanopowders and improving the quality of nanopowders by smooth evaporation of raw materials. It relates to a continuous manufacturing apparatus for nanopowder in which the evaporation amount and evaporation rate of raw materials to be increased are controlled.
  • nanopowder refers to a material with a size of 1 dimension less than 100 nm.
  • Nanopowder technology enables control and manipulation at the atomic and molecular level of materials, bringing about innovative changes not only in materials, but also in electrical, electronic, bio, chemical, environmental, and energy industries.
  • the manufacturing method of nanopowder using thermal plasma can be divided into a transfer type and a non-transferred type according to the structure of the torch.
  • all electrodes are mounted inside the torch to generate an arc from the electrodes inside the torch, and the arc is ejected by the carrier gas from the rear.
  • the cathode and the anode are spaced apart and spaced apart. to adjust the arc length.
  • Korean Patent Registration No. 10-0788412 discloses an apparatus for manufacturing nanopowder using thermal plasma.
  • the registered patent includes a power supply unit, a plasma torch unit, a reaction chamber, a vacuum pump, a cooling tube, a collecting unit, and a scrubber, and the sample evaporated by plasma in the reaction chamber is crystallized into nanopowder while passing through the cooling tube and collected collected from the department.
  • the evaporation amount and evaporation rate cannot be controlled in the vaporization process of the raw material, and the vaporization becomes unstable depending on the type, amount or location of the raw material, so there is a problem in that the quality of the nanopowder is deteriorated.
  • Patent Document 0001 Republic of Korea Patent Publication No. 10-0788412 (2007. 12. 24. Announcement)
  • the present invention has been proposed to solve the problems of the prior art as described above, and by continuously producing nanopowders having a uniform particle size, not only can the productivity of the nanopowder be increased, but also the nanopowder can be evaporated smoothly by
  • An object of the present invention is to provide a continuous manufacturing apparatus for nanopowder that can improve the quality of powder.
  • a reaction chamber for vaporizing raw materials using a plasma electrode and a crucible; a raw material supply unit connected to one side of the reaction chamber and supplying the raw material to the reaction chamber; a transport film that collects and transports the raw material or crystallized nanopowder vaporized in the upper inner portion of the reaction chamber and moves along a closed loop; and a collecting unit connected to the other side of the reaction chamber and configured to recover the nanopowder transferred through the transfer film
  • the reaction chamber includes: a rotating unit for rotating the crucible; and a rotating and elevating device having a; and an elevating unit for elevating and lowering the crucible and the plasma electrode independently from the inside through the rotation of the crucible by the rotating and elevating device and the elevating and lowering of the crucible and the plasma electrode.
  • the raw material is vaporized by the thermal plasma generated between the crucible electrode and the plasma electrode, and the nanopowder having a uniform particle size is continuously produced. Nanopowder can be mass-produced easily.
  • the evaporation amount and evaporation rate of a raw material according to the present invention is controlled, the amount of evaporation according to the type, amount or location of the raw material accommodated in the crucible as the crucible rotates and the crucible and the plasma electrode are raised and lowered And since the evaporation rate is controlled, the vaporization of the raw material can be facilitated, so that the quality of the nanopowder can be improved.
  • FIG. 1 is a schematic diagram for explaining the structure of a nanopowder continuous manufacturing apparatus in which the evaporation amount and evaporation rate of a raw material according to the present invention are controlled.
  • Figure 2 is a perspective view in one direction showing the outer appearance of the nano-powder continuous manufacturing apparatus in which the evaporation amount and evaporation rate of the raw material according to the present invention is controlled.
  • Figure 3 is a perspective view in another direction showing the outer appearance of the nano-powder continuous manufacturing apparatus in which the evaporation amount and evaporation rate of the raw material according to the present invention is controlled.
  • Figure 4 is a cross-sectional view for explaining the structure of the nano-powder continuous manufacturing apparatus in which the evaporation amount and evaporation rate of the raw material according to the present invention is controlled.
  • FIG. 5 is a side view of an automatic feeding device in a continuous nanopowder production apparatus in which the evaporation amount and evaporation rate of a raw material according to the present invention are controlled.
  • FIG. 6 is a detailed view of a crucible in a continuous nanopowder manufacturing apparatus in which the evaporation amount and evaporation rate of a raw material according to the present invention are controlled.
  • FIG. 7 is a detailed view of a crucible and a crucible electrode in the nanopowder continuous manufacturing apparatus in which the evaporation amount and evaporation rate of the raw material are controlled according to the present invention.
  • FIG. 8 is a detailed view of a plasma electrode in a continuous nanopowder manufacturing apparatus in which the evaporation amount and evaporation rate of a raw material according to the present invention are controlled.
  • FIG. 9 is an exemplary view showing the modularization of the nanopowder continuous manufacturing apparatus in which the evaporation amount and evaporation rate of the raw material are controlled according to the present invention.
  • FIG. 10 is a partial perspective view of a rotating and elevating device of a reaction chamber in a continuous nanopowder manufacturing apparatus in which the evaporation amount and evaporation rate of a raw material are controlled according to the present invention.
  • FIG. 11 is a side view of a rotating and elevating device of a reaction chamber in a continuous nanopowder manufacturing apparatus in which an evaporation amount and an evaporation rate of a raw material are controlled according to the present invention.
  • FIG. 12 is an exemplary view showing the rotation of the reaction chamber and the rotation of the crucible by the lifting device in the nano-powder continuous manufacturing apparatus in which the evaporation amount and the evaporation rate of the raw material are controlled according to the present invention.
  • FIG. 13 is an exemplary view showing the rotation of the reaction chamber and the lifting and lowering of the crucible by the lifting device in the nanopowder continuous manufacturing apparatus in which the evaporation amount and the evaporation rate of the raw material are controlled according to the present invention.
  • FIG 14 is an exemplary view showing the rotation of the reaction chamber and the elevation of the plasma electrode by the elevation device in the continuous nanopowder production apparatus in which the evaporation amount and the evaporation rate of the raw material are controlled according to the present invention.
  • the continuous nanopowder production apparatus (A) in which the evaporation amount and evaporation rate of the raw material according to the present invention is controlled, the reaction chamber 100; Raw material supply unit 200; transfer film 180; and a collection unit 300 .
  • the reaction chamber 100 of the present invention vaporizes the raw material using the plasma electrode 160 and the crucible 110 .
  • the reaction chamber 100 is provided with a plasma electrode 160, a crucible 110 and a transfer film 180 therein, a raw material supply unit 200 to which a raw material is supplied is connected to one side, and a nano material is provided to the other side.
  • a collection unit 300 to be collected is connected.
  • reaction chamber 100 is provided with a support frame 400 in the lower portion is located at a set height as the lower portion is supported by the support frame (400).
  • the support frame 400 supports not only the reaction chamber 100 but also the collecting unit 300 and the raw material supply unit 200 at a set height, respectively.
  • reaction chamber 100 is provided with a material supply port 101 connected to the raw material supply unit 200 on at least one surface, and a vacuum port 102 connected to the vacuum pump P and the like.
  • reaction chamber 100 and the collecting unit 300 and the raw material supply unit 200 connected thereto preferably maintain a vacuum state.
  • the crucible 110 and the plasma electrode 160 are disposed to be spaced apart from each other by a predetermined distance, and the plasma generated from the plasma electrode 160 generates an arc in the direction of the crucible 110 .
  • the crucible 110 of the reaction chamber 100 is connected to the crucible electrode 120 as shown in Figs. 6a to 6c and 7, can withstand a high-temperature atmosphere, and the current passes through graphite (Graphite) can be made with
  • the crucible electrode 120 is connected to the lower center of the crucible 110 , and cooling water may be separately introduced and discharged to the crucible electrode 120 .
  • the crucible central axis 130 is connected to the lower part of the crucible electrode 120 .
  • the crucible 110 may have a double structure.
  • the crucible 110 a first track 111 of a shape that is settling in the downward direction; a second track 112 having an inner circumference larger than the outer circumference of the first track 111 and having a shape that is recessed in the downward direction; and a barrier 113 provided between the first track 111 and the second track 112 to block the first track 111 and the second track 112 .
  • the raw material supplied from the automatic feeding device 210 described below may be accommodated in the first track 111 and the second track 112 , respectively, and the first track 111 and the second track 112 , respectively.
  • a plurality of plasma electrodes 160 may be disposed, for example, two plasma electrodes 160 on the first track 111 and four on the second track 112 .
  • the number and position of the plasma electrodes 160 may be determined in consideration of the circumference of the first track 111 or the second track 112 .
  • first track 111 and the second track 112 may each be supplied with a raw material of the same material or a raw material of a different material.
  • a plurality of automatic feeding devices 210 described below are applied to supply raw materials to the first track 111 and the second track 112 , respectively.
  • the automatic feeding device 210 supplies raw materials of the same material or different materials to the first track 111 and the second track 112 through each of the feeding nozzles 214 .
  • the crucible 110 having the double structure as described above can effectively control the evaporation amount and the evaporation rate due to the difference in the position and temperature of the first track 111 and the second track 112 when the raw material of the same material is supplied. Also, when raw materials of different materials are supplied, different raw materials can be synthesized in the gas phase, so that the composite nanopowder can be manufactured.
  • the plasma electrodes 160 of the reaction chamber 100 are provided to be spaced apart from the crucible 110 by a predetermined distance to form a hot cathode.
  • a tip 161 made of tungsten or graphite may be fastened to an end of the plasma electrode 160 as shown in FIG. 8 , and cooling water may be separately introduced and discharged at a lower portion thereof.
  • the plasma electrode 160 may include an electrode central axis 162 extending in a vertical direction and a connection terminal 163 connected to a power source at one side of the electrode central axis 162 .
  • the cooling water may be introduced into the electrode central shaft 162 .
  • the reaction chamber 100 as shown in FIGS. 10 and 11, a rotating part 150 for rotating the crucible 110; and a rotating and lifting device (D) having a; and a lifting unit (140) for independently lifting and lowering the crucible (110) and the plasma electrode (160).
  • the rotating unit 150 of the rotating and lifting device (D) includes a first gear 151 fixedly coupled to the lower end of the crucible central shaft 130 connected to the crucible 110 through the reaction chamber 100; and a second gear 152 that is engaged with the first gear 151 and rotates by driving the motor 153 .
  • the first gear 151 engaged therewith rotates
  • the crucible central shaft 130 to which the first gear 151 is coupled and the crucible 110 connected to the crucible central shaft 130 rotate clockwise or counterclockwise.
  • the motor 153 may have any conventional structure and method as long as it is capable of forward and reverse rotation, and the first gear 151 and the second gear 152 may be a spur gear, a worm gear, or a bevel gear.
  • the crucible 110 connected to the crucible central shaft 130 is rotated by the rotating part 150 of the rotating and lifting device D, so that the raw material accommodated in the crucible 110 when the raw material is vaporized in the reaction chamber 100
  • the evaporation amount and evaporation rate of the material are controlled.
  • the raw material accommodated in the crucible 110 has different evaporation and evaporation rates depending on the type, amount, or location, but as the crucible 110 rotates, the raw material accommodated in the crucible 110 and the plasma electrode ( 160), the distance between them may be farther or closer, thereby controlling the evaporation amount and evaporation rate of the raw material, thereby facilitating the vaporization of the raw material.
  • the lifting unit 140 of the rotating and lifting device (D) is connected to the lower end of the crucible central shaft 130 leading to the lower portion of the crucible electrode 120 connected to the crucible 110, the lower portion from the fixed plate 141 A first lifting plate 143 coupled through a plurality of support rods 142 leading to the lower end; And the fixed plate 141 and the first lifting plate 143 is coupled to the lower end of the electrode center shaft 162 leading to the lower plasma electrode 160 penetrating the screw shaft 144 rotated by the motor 146 driving. and a second lifting plate 145 that ascends and descends according to the clockwise or counterclockwise rotation of the screw shaft by spiral engagement.
  • the crucible central shaft 130 is elevated and the crucible 110 connected to the crucible central shaft 130 is raised and lowered, and as shown in FIG. As shown, the plasma electrode 160 is raised and lowered by the lift of the second lifting plate 145 .
  • the first elevating plate 143 may be elevated by a separate elevating means.
  • a rod (not shown in the drawing) of a hydraulic or pneumatic cylinder (not shown in the drawing) is connected to the first elevating plate 143 so that the first elevating plate 143 can be elevated as the cylinder rod protrudes and retracts. .
  • the lifting and lowering of the second lifting plate 145 by the rotation of the screw shaft 144 may be performed simultaneously with the lifting of the first lifting plate 143 or with a time difference from the lifting and lowering of the first lifting plate 143.
  • the first elevating plate 143 is elevated together with the lowering of the second elevating plate 145, the crucible 110 and the plasma electrode Adjustment of the interval between 160 is more smooth.
  • the crucible 110 and the plasma electrode 160 are raised and lowered by the lifting unit 140 of the rotating and lifting device D, so that the raw material is accommodated in the crucible 110 when the raw material is vaporized in the reaction chamber 100 .
  • the amount of evaporation and the rate of evaporation are controlled.
  • the raw material accommodated in the crucible 110 has different evaporation and evaporation rates depending on the type, amount, or location, but as the crucible 110 and the plasma electrode 160 move up and down, the raw material is accommodated in the crucible 110. Since the distance between the raw material and the plasma electrode 160 may be increased or decreased, the evaporation amount and the evaporation rate of the raw material are controlled by this, so that the vaporization of the raw material is facilitated.
  • the motor 146 and the screw shaft 144 involved in the elevating of the second elevating plate 145 in the elevating unit 140 of the rotating and elevating device D are first elevated by a coupling member (not shown).
  • the second lifting plate 145 is raised and lowered by the rotation of the screw shaft 144 by the motor 146 driving.
  • the raw material supply unit 200 of the present invention is connected to one side of the reaction chamber 100 to supply the raw material to the reaction chamber 100 .
  • the raw material is vaporized and condensed inside the reaction chamber 100 to be changed into nanopowder, and the changed nanopowder is collected by the collecting unit 300 .
  • the raw material supply unit 200 may include an automatic feeding device 210 for supplying the raw material into the reaction chamber 100 .
  • the automatic feeding device 210 includes a feeding housing 211 as shown in FIG. 5; a feeding screw 212 provided in a spiral shape inside the feeding housing 211; a feeding motor 215 for driving the feeding screw 212; and a feeding nozzle 214 connected to the feeding housing 211 and supplying a raw material into the reaction chamber 100, so that the inside of the feeding housing 211 is in a vacuum state by rotation of the feeding screw 212 The raw material can be moved by the extrusion method.
  • the feeding housing 211 has a sealed structure in a cylindrical shape and maintains a vacuum state inside, and a feeding nozzle 214 is connected to one side of the feeding housing 211 and a feeding motor 215 is connected to the other side. .
  • the feeding housing 211 may be connected to one side of the reaction chamber 100 so that the feeding nozzle 214 smoothly supplies the raw material to the crucible 110 provided in the reaction chamber 100 .
  • the feeding housing 211 is provided with an opening 213 through which the raw material is supplied.
  • the opening/closing opening 213 preferably uses a load-lock type valve to minimize the influence on the internal vacuum environment of the feeding housing 211 .
  • the raw material introduced through the opening 213 is moved in the direction of the feeding nozzle 214 by the rotation of the feeding screw 212 , the crucible provided inside the reaction chamber 100 through the feeding nozzle 214 .
  • the raw material may be continuously supplied to (110).
  • a feeding heater 216 that heats the raw material accommodated in the feeding housing 211 to reach a set temperature may be connected to the outside of the feeding housing 211, and there may be a plurality of feeding heaters 216 .
  • one side of the feeding housing 211 is coupled to the material supply port 101 , and in this case, the feeding nozzle 214 connected to the feeding housing 211 is located inside the reaction chamber 100 .
  • the shape and structure of the feeding nozzle 214 may vary, and the feeding nozzle 214 may be plural.
  • the transport film 180 of the present invention collects and transports the vaporized raw material or crystallized nanopowder in the upper inner portion of the reaction chamber 100 and transports it along a closed loop.
  • the transfer film 180 is spaced apart from the crucible 110 by a certain distance, and some or all of it is located above the reaction chamber 100 .
  • the transfer film 180 may be formed of a metal to collect the raw material vaporized by electrical or magnetic properties on the surface.
  • the transfer film 180 is supported by the transfer shaft 181, each of both sides extending in the horizontal direction.
  • cooling water may be introduced into each of the transfer shafts 181 .
  • the transfer shaft 181 may be provided to pass through the reaction chamber 100 or the collecting unit 300 in a horizontal direction to facilitate the inflow or discharge of the coolant.
  • the transfer film 180 extends from the reaction chamber 100 in the direction of the collecting unit 300 to transfer the raw material collected in the reaction chamber 100 to the collecting unit 300 .
  • the transfer film 180 moves from the inside of the reaction chamber 100 to the inside of the collection unit 300 while moving on the caterpillar along the closed loop.
  • the rotation of the transfer film 180 or the transfer shaft 181 may be performed by driving a motor provided outside the reaction chamber 100 or the collection unit 300 .
  • the transfer film 180 may further include a cooling plate 182 .
  • the cooling plate 182 cools the transfer film 180 to a set temperature, and may be in contact with the inner surface of the transfer film 180 .
  • the vaporized raw material collected on the outer surface of the transfer film 180 is cooled to a set temperature through the cooling plate 182 and is condensed while moving in the reaction chamber 100 in the direction of the collecting unit 300 and condensed. It may crystallize into a powder.
  • the cooling of the transfer film 180 through the cooling plate 182 may be performed using cooling water or an inert gas having a set temperature.
  • a scraper 183 is provided on one side of the transfer film 180 .
  • the scraper 183 scrapes the nanopowder transferred by the transfer film 180 in contact with the transfer film 180 .
  • the scraper 183 is formed to extend in the width direction of the transfer film 180 , and is located in the collection unit 300 .
  • the scraper 183 is particularly in contact with the lower surface of the transfer film 180 , and the nanopowder is separated from the transfer film 180 by the scraper 183 and collected through the collecting unit 300 .
  • the collecting unit 300 of the present invention is connected to the other side of the reaction chamber 100 to recover the nanopowder transferred through the transfer film 180 .
  • the collecting unit 300 includes a first collecting unit 310 for collecting the nanopowder separated from the transfer film 180 ; a second collecting unit 320 connected to the first collecting unit 310 and collecting and transferring the nanopowder collected through the first collecting unit 310; and a powder recovery unit 330 in which the nanopowder moved through the second collection unit 320 is recovered.
  • the first collection unit 310 is provided with a vacuum port 102 connected to a vacuum pump (P), etc., and moves the nanopowder downward in an environment in which the inside is vacuum.
  • P vacuum pump
  • the first collecting unit 310 may be provided with a load lock valve or a gate valve, and various configurations for collecting and moving the nanopowder while maintaining a vacuum state may be additionally provided.
  • the second collecting unit 320 is provided with a vacuum port 102 connected to the vacuum pump P, etc., which may have the same configuration as the first collecting unit 310 .
  • the nanopowder that has passed through the first collecting unit 310 and the second collecting unit 320 is finally recovered by the powder collecting unit 330 .
  • first collecting unit 310 and the second collecting unit 320 are each independently created in a vacuum environment, and internal pressures may be different from each other.
  • a viewport 301 formed of a transparent material is provided on the upper portion of the collection unit 300 to visually check the internal condition of the collection unit 300 through the viewport 301 .
  • the powder recovery unit 330 may be connected to a packaging container, and a load lock valve is provided to move the nanopowder into the packaging container by a predetermined amount in a vacuum state.
  • the powder recovery unit 330 may be provided with a screw conveyor, which moves the nanopowder to a predetermined position while maintaining a vacuum state according to the rotation of the spirally wound screw.
  • the continuous nanopowder production apparatus (A) in which the evaporation amount and evaporation rate of the raw material according to the present invention are controlled can be operated as one module by connecting a plurality of them in parallel as shown in FIG. 9 .
  • the continuous nano-powder production apparatus (A) in which the evaporation amount and evaporation rate of raw materials are controlled according to the present invention, is operated as a module, vacuum is formed through the vacuum pump (P), raw material is supplied through the automatic feeding device 210 and cooling water It is possible to increase the efficiency of cooling, etc. through
  • the continuous nanopowder production apparatus (A) in which the evaporation amount and evaporation rate of the raw material according to the present invention is controlled includes an automatic feeding device 210 and a transfer film 180, and the supply of the raw material And since the collection of the nanopowder is made continuously, it is possible to continuously produce the nanopowder.
  • the continuous nanopowder production apparatus (A) in which the evaporation amount and evaporation rate of the raw material according to the present invention is controlled has a vacuum port 102 in all of the raw material supply unit 200 , the reaction chamber 100 and the collection unit 300 . Since it is provided and connected to the vacuum pump (P), the supply of raw materials and the generation and collection of nanopowders are carried out in a vacuum environment, it is possible to prevent surface oxidation of the nanopowder due to exposure to air.
  • a rotating and elevating device (D) is provided in the reaction chamber (100), and a crucible by the rotating and elevating device (D) As 110 rotates and the crucible 110 and the plasma electrode 160 move up and down, the evaporation amount and evaporation rate of the raw material can be adjusted in the process of vaporizing the raw material, so that the raw material can be vaporized smoothly.
  • reaction chamber 101 material supply port
  • first track 112 second track
  • blocking jaw 120 crucible electrode
  • first lifting plate 144 screw shaft
  • raw material supply unit 210 automatic feeding device
  • feeding housing 212 feeding screw
  • opening 214 feeding nozzle
  • feeding motor 216 feeding heater
  • first collection unit 320 second collection unit
  • support frame A nano-powder continuous manufacturing device
  • the present invention not only increases the productivity of the nanopowder by continuously producing the nanopowder having a uniform particle size, but also improves the quality of the nanopowder by facilitating the vaporization of the raw material, so that the nanopowder production-related industrial use There is a possibility.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

La présente invention concerne un appareil de préparation continue de nanopoudre dans lequel la quantité d'évaporation et la vitesse de matière première sont ajustées, l'appareil comprenant : une chambre de réaction pour évaporer une matière première au moyen d'une électrode à plasma et d'un creuset ; une unité de distribution de matière première, raccordée à un côté de la chambre de réaction, pour distribuer la matière première à la chambre de réaction ; un film de transfert capturant la matière première évaporée ou la nanopoudre cristallisée au niveau d'une partie supérieure de l'intérieur de la chambre de réaction et transférant celle-ci, et se déplaçant le long d'une boucle fermée ; et une unité de collecte, raccordée à l'autre côté de la chambre de réaction, pour collecter la nanopoudre transférée à travers le film de transfert, la chambre de réaction comprenant un appareil de rotation et d'élévation comprenant : une partie de rotation pour faire tourner le creuset ; et une partie d'élévation pour élever indépendamment le creuset et l'électrode à plasma et, par conséquent, par la rotation du creuset et de l'élévation du creuset et de l'électrode à plasma au moyen de l'appareil de rotation et d'élévation, la quantité d'évaporation et la vitesse de la matière première évaporée de façon interne sont ajustées.
PCT/KR2019/017116 2019-12-05 2019-12-05 Appareil de préparation continue de nanopoudre dans lequel la quantité d'évaporation et la vitesse de matière première sont ajustées WO2021112294A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
PCT/KR2019/017116 WO2021112294A1 (fr) 2019-12-05 2019-12-05 Appareil de préparation continue de nanopoudre dans lequel la quantité d'évaporation et la vitesse de matière première sont ajustées
US17/805,322 US20220297185A1 (en) 2019-12-05 2022-06-03 Apparatus for continuously preparing nanopowder in which evaporation amount and speed of raw material are adjusted

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/KR2019/017116 WO2021112294A1 (fr) 2019-12-05 2019-12-05 Appareil de préparation continue de nanopoudre dans lequel la quantité d'évaporation et la vitesse de matière première sont ajustées

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US17/805,322 Continuation US20220297185A1 (en) 2019-12-05 2022-06-03 Apparatus for continuously preparing nanopowder in which evaporation amount and speed of raw material are adjusted

Publications (1)

Publication Number Publication Date
WO2021112294A1 true WO2021112294A1 (fr) 2021-06-10

Family

ID=76222011

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2019/017116 WO2021112294A1 (fr) 2019-12-05 2019-12-05 Appareil de préparation continue de nanopoudre dans lequel la quantité d'évaporation et la vitesse de matière première sont ajustées

Country Status (2)

Country Link
US (1) US20220297185A1 (fr)
WO (1) WO2021112294A1 (fr)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3721511A (en) * 1971-02-18 1973-03-20 M Schlienger Rotating arc furnace crucible
JP2008179509A (ja) * 2007-01-24 2008-08-07 Ulvac Japan Ltd シリコン精錬装置、シリコン精錬方法
KR20140106044A (ko) * 2013-02-25 2014-09-03 주식회사 선익시스템 증발원 및 증착장치
KR20160034740A (ko) * 2014-09-22 2016-03-30 주식회사 선익시스템 증발원용 도가니 및 이를 포함하는 증발원
KR20180135760A (ko) * 2017-06-13 2018-12-21 한국기계연구원 나노 분말의 제조 장치 및 이 제조 장치를 이용한 제조 방법

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3721511A (en) * 1971-02-18 1973-03-20 M Schlienger Rotating arc furnace crucible
JP2008179509A (ja) * 2007-01-24 2008-08-07 Ulvac Japan Ltd シリコン精錬装置、シリコン精錬方法
KR20140106044A (ko) * 2013-02-25 2014-09-03 주식회사 선익시스템 증발원 및 증착장치
KR20160034740A (ko) * 2014-09-22 2016-03-30 주식회사 선익시스템 증발원용 도가니 및 이를 포함하는 증발원
KR20180135760A (ko) * 2017-06-13 2018-12-21 한국기계연구원 나노 분말의 제조 장치 및 이 제조 장치를 이용한 제조 방법

Also Published As

Publication number Publication date
US20220297185A1 (en) 2022-09-22

Similar Documents

Publication Publication Date Title
WO2014098458A1 (fr) Procédé et appareil de purification de matière organique à l'aide d'un liquide ionique
WO2017057913A1 (fr) Procédé de fabrication d'une structure de cristal de pérovskite et dispositif associé de fabrication de structure de cristal de pérovskite
JP2002266065A5 (ja) 成膜方法、発光装置の作製方法及び成膜装置
WO2021112294A1 (fr) Appareil de préparation continue de nanopoudre dans lequel la quantité d'évaporation et la vitesse de matière première sont ajustées
WO2016043396A1 (fr) Procédé de préparation de graphène dopé à l'azote et graphène dopé à l'azote ainsi préparé
WO2021112295A1 (fr) Dispositif de production continue de nanopoudre pour améliorer l'efficacité de collecte de nanopoudre
GB2127709A (en) Manufacture of aluminium nitride
WO2016114546A1 (fr) Procédé de préparation de motif métallique hybride par le biais d'une explosion de fil électrique et d'un frittage par lumière et motif métallique hybride ainsi préparé
WO2021141261A1 (fr) Dispositif de fabrication d'une diode électroluminescente organique pour éclairage
CN112442660B (zh) 挡板装置、成膜装置、成膜方法及电子设备的制造方法
WO2016032227A1 (fr) Procédé de préparation de nanomatériau in situ pourvu d'un revêtement de matériau fonctionnel, et nanomatériau préparé au moyen de ce procédé
WO2020059956A1 (fr) Appareil de préparation en continu de nanopoudre à l'aide de plasma thermique transféré et procédé de préparation en continu de nanopoudre composite à l'aide de plasma thermique transféré
WO2019132116A1 (fr) Équipement pour la production de masse d'éléments amoled à haute résolution en grappe au moyen d'une source d'évaporation à plan vertical
WO2018186634A1 (fr) Équipement de production en série de dispositifs amoled haute résolution faisant appel à une source d'évaporation du type plan
WO2016186386A1 (fr) Appareil et procédé de dépôt de film organique, et appareil de film organique
KR102162973B1 (ko) 이송식 열플라즈마를 이용한 나노분말 연속 제조방법
WO2018048090A1 (fr) Nanofil hybride organique-inorganique utilisable dans un dispositif photoélectrique, et son procédé de production
WO2021235590A1 (fr) Procédé et appareil de préparation de nanotubes de nitrure de bore par traitement thermique d'un précurseur de bore
WO2022231020A1 (fr) Nanopoudre de céramique piézoélectrique de haute pureté pour la calcination à basse température et procédé de préparation s'y rapportant
WO2014148687A1 (fr) Dispositif de raffinage et procédé de raffinage pour des déchets de titane et des éponges de titane utilisant des gaz de désoxydation
WO2015163734A1 (fr) Matière organique ayant une couche de protection
WO2013019041A2 (fr) Procédé de fabrication de film mince d'électrolyte solide et dispositif de fabrication associé
WO2023153672A1 (fr) Module source d'évaporation sous vide comprenant un obturateur et procédé de fabrication d'un dispositif d'affichage électroluminescent organique l'utilisant
KR20200032499A (ko) 이송식 열플라즈마를 이용한 나노분말 연속제조장치
WO2010098604A2 (fr) Appareil de recuit comprenant l'utilisation d'un plasma

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 19955389

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 19955389

Country of ref document: EP

Kind code of ref document: A1