WO2021112294A1

WO2021112294A1 - Apparatus for continuously preparing nanopowder in which evaporation amount and speed of raw material are adjusted

Info

Publication number: WO2021112294A1
Application number: PCT/KR2019/017116
Authority: WO
Inventors: 김태윤
Original assignee: 김태윤
Priority date: 2019-12-05
Filing date: 2019-12-05
Publication date: 2021-06-10
Also published as: US20220297185A1

Abstract

The present invention relates to an apparatus for continuously preparing nanopowder in which the evaporation amount and speed of a raw material are adjusted, the apparatus comprising: a reaction chamber for evaporating a raw material using a plasma electrode and a crucible; a raw material supply unit, connected to one side of the reaction chamber, for supplying the raw material to the reaction chamber; a transfer film capturing the evaporated raw material or crystallized nanopowder at an upper portion of the inside of the reaction chamber and transferring same, and moving along a closed loop; and a collection unit, connected to the other side of the reaction chamber, for collecting the nanopowder transferred through the transfer film, wherein the reaction chamber comprises a rotation and elevation apparatus including: a rotation portion for rotating the crucible; and an elevating portion for independently elevating the crucible and the plasma electrode, and thus, through rotation of the crucible and elevation of the crucible and the plasma electrode by means of the rotation and elevation apparatus, the evaporation amount and speed of the raw material internally evaporated are adjusted.

Description

Nanopowder continuous manufacturing device in which the evaporation amount and evaporation rate of raw materials are controlled

The present invention relates to a nanopowder manufacturing apparatus, and more particularly, to continuously produce nanopowders having a uniform particle size, thereby increasing the productivity of nanopowders and improving the quality of nanopowders by smooth evaporation of raw materials. It relates to a continuous manufacturing apparatus for nanopowder in which the evaporation amount and evaporation rate of raw materials to be increased are controlled.

In general, nanopowder refers to a material with a size of 1 dimension less than 100 nm.

Nanopowder technology enables control and manipulation at the atomic and molecular level of materials, bringing about innovative changes not only in materials, but also in electrical, electronic, bio, chemical, environmental, and energy industries.

There are wet methods and mechanical pulverization methods for manufacturing such nanopowders, but the wet method has problems in that the process is complicated, the productivity is low, and harmful substances are discharged to the environment, and the mechanical pulverization method produces nanopowders of a certain size or less. have difficulty doing

Due to the above problem, a method for producing nanopowders using plasma has recently been used.

In the production of nanopowders using thermal plasma, when raw material particles are put into an ultra-high temperature thermal plasma with a heat source of about 10000°C, they are completely vaporized into an atomic state by a high temperature and then cooled again, and the vaporized atoms are nucleated into nanoparticles. use the principle that

The manufacturing method of nanopowder using thermal plasma can be divided into a transfer type and a non-transferred type according to the structure of the torch.

In the case of the non-transfer type, all electrodes are mounted inside the torch to generate an arc from the electrodes inside the torch, and the arc is ejected by the carrier gas from the rear. In the case of the transfer type, the cathode and the anode are spaced apart and spaced apart. to adjust the arc length.

Korean Patent Registration No. 10-0788412 discloses an apparatus for manufacturing nanopowder using thermal plasma.

The registered patent includes a power supply unit, a plasma torch unit, a reaction chamber, a vacuum pump, a cooling tube, a collecting unit, and a scrubber, and the sample evaporated by plasma in the reaction chamber is crystallized into nanopowder while passing through the cooling tube and collected collected from the department.

However, when the above structure is used, it is difficult to continuously supply raw materials, and since the collection of the nanopowder is complicated, there is a problem that the productivity of the nanopowder is lowered.

In addition, in the case of using the above structure, the evaporation amount and evaporation rate cannot be controlled in the vaporization process of the raw material, and the vaporization becomes unstable depending on the type, amount or location of the raw material, so there is a problem in that the quality of the nanopowder is deteriorated.

[Prior art literature]

[Patent Literature]

(Patent Document 0001) Republic of Korea Patent Publication No. 10-0788412 (2007. 12. 24. Announcement)

The present invention has been proposed to solve the problems of the prior art as described above, and by continuously producing nanopowders having a uniform particle size, not only can the productivity of the nanopowder be increased, but also the nanopowder can be evaporated smoothly by An object of the present invention is to provide a continuous manufacturing apparatus for nanopowder that can improve the quality of powder.

In order to achieve the above object, the present invention

a reaction chamber for vaporizing raw materials using a plasma electrode and a crucible; a raw material supply unit connected to one side of the reaction chamber and supplying the raw material to the reaction chamber; a transport film that collects and transports the raw material or crystallized nanopowder vaporized in the upper inner portion of the reaction chamber and moves along a closed loop; and a collecting unit connected to the other side of the reaction chamber and configured to recover the nanopowder transferred through the transfer film, wherein the reaction chamber includes: a rotating unit for rotating the crucible; and a rotating and elevating device having a; and an elevating unit for elevating and lowering the crucible and the plasma electrode independently from the inside through the rotation of the crucible by the rotating and elevating device and the elevating and lowering of the crucible and the plasma electrode. We propose a continuous manufacturing apparatus for nanopowder in which the evaporation amount and evaporation rate of the raw material are controlled, characterized in that the evaporation amount and the evaporation rate of the raw material to be vaporized are controlled.

In the continuous nanopowder production apparatus in which the evaporation amount and evaporation rate of a raw material are controlled according to the present invention, the raw material is vaporized by the thermal plasma generated between the crucible electrode and the plasma electrode, and the nanopowder having a uniform particle size is continuously produced. Nanopowder can be mass-produced easily.

In addition, in the continuous nanopowder manufacturing apparatus in which the evaporation amount and evaporation rate of a raw material according to the present invention is controlled, the amount of evaporation according to the type, amount or location of the raw material accommodated in the crucible as the crucible rotates and the crucible and the plasma electrode are raised and lowered And since the evaporation rate is controlled, the vaporization of the raw material can be facilitated, so that the quality of the nanopowder can be improved.

1 is a schematic diagram for explaining the structure of a nanopowder continuous manufacturing apparatus in which the evaporation amount and evaporation rate of a raw material according to the present invention are controlled.

Figure 2 is a perspective view in one direction showing the outer appearance of the nano-powder continuous manufacturing apparatus in which the evaporation amount and evaporation rate of the raw material according to the present invention is controlled.

Figure 3 is a perspective view in another direction showing the outer appearance of the nano-powder continuous manufacturing apparatus in which the evaporation amount and evaporation rate of the raw material according to the present invention is controlled.

Figure 4 is a cross-sectional view for explaining the structure of the nano-powder continuous manufacturing apparatus in which the evaporation amount and evaporation rate of the raw material according to the present invention is controlled.

5 is a side view of an automatic feeding device in a continuous nanopowder production apparatus in which the evaporation amount and evaporation rate of a raw material according to the present invention are controlled.

6 is a detailed view of a crucible in a continuous nanopowder manufacturing apparatus in which the evaporation amount and evaporation rate of a raw material according to the present invention are controlled.

7 is a detailed view of a crucible and a crucible electrode in the nanopowder continuous manufacturing apparatus in which the evaporation amount and evaporation rate of the raw material are controlled according to the present invention.

8 is a detailed view of a plasma electrode in a continuous nanopowder manufacturing apparatus in which the evaporation amount and evaporation rate of a raw material according to the present invention are controlled.

9 is an exemplary view showing the modularization of the nanopowder continuous manufacturing apparatus in which the evaporation amount and evaporation rate of the raw material are controlled according to the present invention.

10 is a partial perspective view of a rotating and elevating device of a reaction chamber in a continuous nanopowder manufacturing apparatus in which the evaporation amount and evaporation rate of a raw material are controlled according to the present invention.

11 is a side view of a rotating and elevating device of a reaction chamber in a continuous nanopowder manufacturing apparatus in which an evaporation amount and an evaporation rate of a raw material are controlled according to the present invention.

12 is an exemplary view showing the rotation of the reaction chamber and the rotation of the crucible by the lifting device in the nano-powder continuous manufacturing apparatus in which the evaporation amount and the evaporation rate of the raw material are controlled according to the present invention.

13 is an exemplary view showing the rotation of the reaction chamber and the lifting and lowering of the crucible by the lifting device in the nanopowder continuous manufacturing apparatus in which the evaporation amount and the evaporation rate of the raw material are controlled according to the present invention.

14 is an exemplary view showing the rotation of the reaction chamber and the elevation of the plasma electrode by the elevation device in the continuous nanopowder production apparatus in which the evaporation amount and the evaporation rate of the raw material are controlled according to the present invention.

Hereinafter, the present invention will be described in detail based on the accompanying drawings.

1 to 4, the continuous nanopowder production apparatus (A) in which the evaporation amount and evaporation rate of the raw material according to the present invention is controlled, the reaction chamber 100; Raw material supply unit 200; transfer film 180; and a collection unit 300 .

The reaction chamber 100 of the present invention vaporizes the raw material using the plasma electrode 160 and the crucible 110 .

The reaction chamber 100 is provided with a plasma electrode 160, a crucible 110 and a transfer film 180 therein, a raw material supply unit 200 to which a raw material is supplied is connected to one side, and a nano material is provided to the other side. A collection unit 300 to be collected is connected.

And the reaction chamber 100 is provided with a support frame 400 in the lower portion is located at a set height as the lower portion is supported by the support frame (400).

Here, the support frame 400 supports not only the reaction chamber 100 but also the collecting unit 300 and the raw material supply unit 200 at a set height, respectively.

In addition, the reaction chamber 100 is provided with a material supply port 101 connected to the raw material supply unit 200 on at least one surface, and a vacuum port 102 connected to the vacuum pump P and the like.

Here, the reaction chamber 100 and the collecting unit 300 and the raw material supply unit 200 connected thereto preferably maintain a vacuum state.

In addition, in the reaction chamber 100 , the crucible 110 and the plasma electrode 160 are disposed to be spaced apart from each other by a predetermined distance, and the plasma generated from the plasma electrode 160 generates an arc in the direction of the crucible 110 .

And the crucible 110 of the reaction chamber 100 is connected to the crucible electrode 120 as shown in Figs. 6a to 6c and 7, can withstand a high-temperature atmosphere, and the current passes through graphite (Graphite) can be made with

The crucible electrode 120 is connected to the lower center of the crucible 110 , and cooling water may be separately introduced and discharged to the crucible electrode 120 .

At this time, the crucible central axis 130 is connected to the lower part of the crucible electrode 120 .

In addition, the crucible 110 may have a double structure.

More specifically, the crucible 110, a first track 111 of a shape that is settling in the downward direction; a second track 112 having an inner circumference larger than the outer circumference of the first track 111 and having a shape that is recessed in the downward direction; and a barrier 113 provided between the first track 111 and the second track 112 to block the first track 111 and the second track 112 .

Here, the raw material supplied from the automatic feeding device 210 described below may be accommodated in the first track 111 and the second track 112 , respectively, and the first track 111 and the second track 112 , respectively. A plurality of plasma electrodes 160 may be disposed, for example, two plasma electrodes 160 on the first track 111 and four on the second track 112 .

In this case, the number and position of the plasma electrodes 160 may be determined in consideration of the circumference of the first track 111 or the second track 112 .

In addition, the first track 111 and the second track 112 may each be supplied with a raw material of the same material or a raw material of a different material.

In this case, a plurality of automatic feeding devices 210 described below are applied to supply raw materials to the first track 111 and the second track 112 , respectively.

That is, the automatic feeding device 210 to be described below supplies raw materials of the same material or different materials to the first track 111 and the second track 112 through each of the feeding nozzles 214 .

The crucible 110 having the double structure as described above can effectively control the evaporation amount and the evaporation rate due to the difference in the position and temperature of the first track 111 and the second track 112 when the raw material of the same material is supplied. Also, when raw materials of different materials are supplied, different raw materials can be synthesized in the gas phase, so that the composite nanopowder can be manufactured.

In addition, the plasma electrodes 160 of the reaction chamber 100 are provided to be spaced apart from the crucible 110 by a predetermined distance to form a hot cathode.

At this time, a tip 161 made of tungsten or graphite may be fastened to an end of the plasma electrode 160 as shown in FIG. 8 , and cooling water may be separately introduced and discharged at a lower portion thereof.

In addition, the plasma electrode 160 may include an electrode central axis 162 extending in a vertical direction and a connection terminal 163 connected to a power source at one side of the electrode central axis 162 .

In this case, the cooling water may be introduced into the electrode central shaft 162 .

On the other hand, the reaction chamber 100, as shown in FIGS. 10 and 11, a rotating part 150 for rotating the crucible 110; and a rotating and lifting device (D) having a; and a lifting unit (140) for independently lifting and lowering the crucible (110) and the plasma electrode (160).

At this time, the rotating unit 150 of the rotating and lifting device (D) includes a first gear 151 fixedly coupled to the lower end of the crucible central shaft 130 connected to the crucible 110 through the reaction chamber 100; and a second gear 152 that is engaged with the first gear 151 and rotates by driving the motor 153 .

Accordingly, as the second gear 152 rotates clockwise or counterclockwise around the vertical line by the driving of the motor 153 as shown in FIG. 12 , the first gear 151 engaged therewith rotates The crucible central shaft 130 to which the first gear 151 is coupled and the crucible 110 connected to the crucible central shaft 130 rotate clockwise or counterclockwise.

Here, the motor 153 may have any conventional structure and method as long as it is capable of forward and reverse rotation, and the first gear 151 and the second gear 152 may be a spur gear, a worm gear, or a bevel gear.

As such, the crucible 110 connected to the crucible central shaft 130 is rotated by the rotating part 150 of the rotating and lifting device D, so that the raw material accommodated in the crucible 110 when the raw material is vaporized in the reaction chamber 100 The evaporation amount and evaporation rate of the material are controlled.

For example, the raw material accommodated in the crucible 110 has different evaporation and evaporation rates depending on the type, amount, or location, but as the crucible 110 rotates, the raw material accommodated in the crucible 110 and the plasma electrode ( 160), the distance between them may be farther or closer, thereby controlling the evaporation amount and evaporation rate of the raw material, thereby facilitating the vaporization of the raw material.

And the lifting unit 140 of the rotating and lifting device (D) is connected to the lower end of the crucible central shaft 130 leading to the lower portion of the crucible electrode 120 connected to the crucible 110, the lower portion from the fixed plate 141 A first lifting plate 143 coupled through a plurality of support rods 142 leading to the lower end; And the fixed plate 141 and the first lifting plate 143 is coupled to the lower end of the electrode center shaft 162 leading to the lower plasma electrode 160 penetrating the screw shaft 144 rotated by the motor 146 driving. and a second lifting plate 145 that ascends and descends according to the clockwise or counterclockwise rotation of the screw shaft by spiral engagement.

Therefore, as shown in FIG. 13 by the lifting of the first lifting plate 143, the crucible central shaft 130 is elevated and the crucible 110 connected to the crucible central shaft 130 is raised and lowered, and as shown in FIG. As shown, the plasma electrode 160 is raised and lowered by the lift of the second lifting plate 145 .

Here, the first elevating plate 143 may be elevated by a separate elevating means.

For example, a rod (not shown in the drawing) of a hydraulic or pneumatic cylinder (not shown in the drawing) is connected to the first elevating plate 143 so that the first elevating plate 143 can be elevated as the cylinder rod protrudes and retracts. .

In addition, the lifting and lowering of the second lifting plate 145 by the rotation of the screw shaft 144 may be performed simultaneously with the lifting of the first lifting plate 143 or with a time difference from the lifting and lowering of the first lifting plate 143. .

When the second elevating plate 145 and the first elevating plate 143 are simultaneously elevated, for example, the first elevating plate 143 is elevated together with the lowering of the second elevating plate 145, the crucible 110 and the plasma electrode Adjustment of the interval between 160 is more smooth.

As such, the crucible 110 and the plasma electrode 160 are raised and lowered by the lifting unit 140 of the rotating and lifting device D, so that the raw material is accommodated in the crucible 110 when the raw material is vaporized in the reaction chamber 100 . The amount of evaporation and the rate of evaporation are controlled.

For example, the raw material accommodated in the crucible 110 has different evaporation and evaporation rates depending on the type, amount, or location, but as the crucible 110 and the plasma electrode 160 move up and down, the raw material is accommodated in the crucible 110. Since the distance between the raw material and the plasma electrode 160 may be increased or decreased, the evaporation amount and the evaporation rate of the raw material are controlled by this, so that the vaporization of the raw material is facilitated.

And the outer surface of the plasma electrode 160 passing through the first lifting plate 143 in the lifting unit 140 of the rotating and lifting device D is wrapped with the bellows 147 to prevent the extension and contraction of the bellows 147. Elevation of the first lifting plate 143 by the smooth.

And the motor 146 and the screw shaft 144 involved in the elevating of the second elevating plate 145 in the elevating unit 140 of the rotating and elevating device D are first elevated by a coupling member (not shown). By being fixed to the plate 143, the second lifting plate 145 is raised and lowered by the rotation of the screw shaft 144 by the motor 146 driving.

The raw material supply unit 200 of the present invention is connected to one side of the reaction chamber 100 to supply the raw material to the reaction chamber 100 .

At this time, the raw material is vaporized and condensed inside the reaction chamber 100 to be changed into nanopowder, and the changed nanopowder is collected by the collecting unit 300 .

The raw material supply unit 200 may include an automatic feeding device 210 for supplying the raw material into the reaction chamber 100 .

The automatic feeding device 210 includes a feeding housing 211 as shown in FIG. 5; a feeding screw 212 provided in a spiral shape inside the feeding housing 211; a feeding motor 215 for driving the feeding screw 212; and a feeding nozzle 214 connected to the feeding housing 211 and supplying a raw material into the reaction chamber 100, so that the inside of the feeding housing 211 is in a vacuum state by rotation of the feeding screw 212 The raw material can be moved by the extrusion method.

Here, the feeding housing 211 has a sealed structure in a cylindrical shape and maintains a vacuum state inside, and a feeding nozzle 214 is connected to one side of the feeding housing 211 and a feeding motor 215 is connected to the other side. .

In addition, the feeding housing 211 may be connected to one side of the reaction chamber 100 so that the feeding nozzle 214 smoothly supplies the raw material to the crucible 110 provided in the reaction chamber 100 .

And the feeding housing 211 is provided with an opening 213 through which the raw material is supplied.

Here, the opening/closing opening 213 preferably uses a load-lock type valve to minimize the influence on the internal vacuum environment of the feeding housing 211 .

At this time, since the raw material introduced through the opening 213 is moved in the direction of the feeding nozzle 214 by the rotation of the feeding screw 212 , the crucible provided inside the reaction chamber 100 through the feeding nozzle 214 . The raw material may be continuously supplied to (110).

In addition, a feeding heater 216 that heats the raw material accommodated in the feeding housing 211 to reach a set temperature may be connected to the outside of the feeding housing 211, and there may be a plurality of feeding heaters 216 .

And one side of the feeding housing 211 is coupled to the material supply port 101 , and in this case, the feeding nozzle 214 connected to the feeding housing 211 is located inside the reaction chamber 100 .

The shape and structure of the feeding nozzle 214 may vary, and the feeding nozzle 214 may be plural.

The transport film 180 of the present invention collects and transports the vaporized raw material or crystallized nanopowder in the upper inner portion of the reaction chamber 100 and transports it along a closed loop.

The transfer film 180 is spaced apart from the crucible 110 by a certain distance, and some or all of it is located above the reaction chamber 100 .

At this time, the transfer film 180 may be formed of a metal to collect the raw material vaporized by electrical or magnetic properties on the surface.

And the transfer film 180 is supported by the transfer shaft 181, each of both sides extending in the horizontal direction.

At this time, cooling water may be introduced into each of the transfer shafts 181 .

The transfer shaft 181 may be provided to pass through the reaction chamber 100 or the collecting unit 300 in a horizontal direction to facilitate the inflow or discharge of the coolant.

Meanwhile, the transfer film 180 extends from the reaction chamber 100 in the direction of the collecting unit 300 to transfer the raw material collected in the reaction chamber 100 to the collecting unit 300 .

That is, the transfer film 180 moves from the inside of the reaction chamber 100 to the inside of the collection unit 300 while moving on the caterpillar along the closed loop.

Here, the rotation of the transfer film 180 or the transfer shaft 181 may be performed by driving a motor provided outside the reaction chamber 100 or the collection unit 300 .

In addition, the transfer film 180 may further include a cooling plate 182 .

The cooling plate 182 cools the transfer film 180 to a set temperature, and may be in contact with the inner surface of the transfer film 180 .

In this case, the vaporized raw material collected on the outer surface of the transfer film 180 is cooled to a set temperature through the cooling plate 182 and is condensed while moving in the reaction chamber 100 in the direction of the collecting unit 300 and condensed. It may crystallize into a powder.

The cooling of the transfer film 180 through the cooling plate 182 may be performed using cooling water or an inert gas having a set temperature.

And a scraper 183 is provided on one side of the transfer film 180 .

The scraper 183 scrapes the nanopowder transferred by the transfer film 180 in contact with the transfer film 180 .

At this time, the scraper 183 is formed to extend in the width direction of the transfer film 180 , and is located in the collection unit 300 .

Here, the scraper 183 is particularly in contact with the lower surface of the transfer film 180 , and the nanopowder is separated from the transfer film 180 by the scraper 183 and collected through the collecting unit 300 .

The collecting unit 300 of the present invention is connected to the other side of the reaction chamber 100 to recover the nanopowder transferred through the transfer film 180 .

At this time, the collecting unit 300 includes a first collecting unit 310 for collecting the nanopowder separated from the transfer film 180 ; a second collecting unit 320 connected to the first collecting unit 310 and collecting and transferring the nanopowder collected through the first collecting unit 310; and a powder recovery unit 330 in which the nanopowder moved through the second collection unit 320 is recovered.

The first collection unit 310 is provided with a vacuum port 102 connected to a vacuum pump (P), etc., and moves the nanopowder downward in an environment in which the inside is vacuum.

In addition, the first collecting unit 310 may be provided with a load lock valve or a gate valve, and various configurations for collecting and moving the nanopowder while maintaining a vacuum state may be additionally provided.

The second collecting unit 320 is provided with a vacuum port 102 connected to the vacuum pump P, etc., which may have the same configuration as the first collecting unit 310 .

The nanopowder that has passed through the first collecting unit 310 and the second collecting unit 320 is finally recovered by the powder collecting unit 330 .

It is preferable that the first collecting unit 310 and the second collecting unit 320 are each independently created in a vacuum environment, and internal pressures may be different from each other.

In addition, a viewport 301 formed of a transparent material is provided on the upper portion of the collection unit 300 to visually check the internal condition of the collection unit 300 through the viewport 301 .

And the powder recovery unit 330 may be connected to a packaging container, and a load lock valve is provided to move the nanopowder into the packaging container by a predetermined amount in a vacuum state.

In addition, the powder recovery unit 330 may be provided with a screw conveyor, which moves the nanopowder to a predetermined position while maintaining a vacuum state according to the rotation of the spirally wound screw.

On the other hand, the continuous nanopowder production apparatus (A) in which the evaporation amount and evaporation rate of the raw material according to the present invention are controlled can be operated as one module by connecting a plurality of them in parallel as shown in FIG. 9 .

When the continuous nano-powder production apparatus (A), in which the evaporation amount and evaporation rate of raw materials are controlled according to the present invention, is operated as a module, vacuum is formed through the vacuum pump (P), raw material is supplied through the automatic feeding device 210 and cooling water It is possible to increase the efficiency of cooling, etc. through

As described above, the continuous nanopowder production apparatus (A) in which the evaporation amount and evaporation rate of the raw material according to the present invention is controlled includes an automatic feeding device 210 and a transfer film 180, and the supply of the raw material And since the collection of the nanopowder is made continuously, it is possible to continuously produce the nanopowder.

In addition, the continuous nanopowder production apparatus (A) in which the evaporation amount and evaporation rate of the raw material according to the present invention is controlled has a vacuum port 102 in all of the raw material supply unit 200 , the reaction chamber 100 and the collection unit 300 . Since it is provided and connected to the vacuum pump (P), the supply of raw materials and the generation and collection of nanopowders are carried out in a vacuum environment, it is possible to prevent surface oxidation of the nanopowder due to exposure to air.

In addition, in the continuous nanopowder production apparatus (A) in which the evaporation amount and evaporation rate of the raw material according to the present invention are controlled, a rotating and elevating device (D) is provided in the reaction chamber (100), and a crucible by the rotating and elevating device (D) As 110 rotates and the crucible 110 and the plasma electrode 160 move up and down, the evaporation amount and evaporation rate of the raw material can be adjusted in the process of vaporizing the raw material, so that the raw material can be vaporized smoothly.

Since the present invention as described above is not limited to the above-described embodiments, it can be changed within the scope without departing from the gist of the present invention claimed in the claims, and such changes are the present invention defined by the following claims fall within the protection scope of the invention.

[Explanation of code]

100: reaction chamber 101: material supply port

102: vacuum port 110: crucible

111: first track 112: second track

113: blocking jaw 120: crucible electrode

130: crucible central axis 140: elevating part

141: fixed plate 142: support bar

143: first lifting plate 144: screw shaft

145: second lifting plate 146: motor

150: rotating part 151: first gear

152: second gear 153: motor

160: plasma electrode 161: tip

162: electrode central axis 163: connection terminal

180: transfer film 181: transfer shaft

182: cooling plate 183: scraper

200: raw material supply unit 210: automatic feeding device

211: feeding housing 212: feeding screw

213: opening 214: feeding nozzle

215: feeding motor 216: feeding heater

300: collection unit 301: viewport

310: first collection unit 320: second collection unit

330: powder recovery unit 340: packaging container

400: support frame A: nano-powder continuous manufacturing device

D : Rotating and lifting device P : Vacuum pump

The present invention not only increases the productivity of the nanopowder by continuously producing the nanopowder having a uniform particle size, but also improves the quality of the nanopowder by facilitating the vaporization of the raw material, so that the nanopowder production-related industrial use There is a possibility.

Claims

a reaction chamber 100 for vaporizing raw materials using the plasma electrode 160 and the crucible 110;

a raw material supply unit 200 connected to one side of the reaction chamber 100 and supplying the raw material to the reaction chamber 100;

a transport film 180 that collects and transports the raw material or crystallized nanopowder vaporized in the upper inner portion of the reaction chamber 100 and moves along a closed loop; and

A collection unit 300 connected to the other side of the reaction chamber 100 and configured to recover the nanopowder transferred through the transfer film 180;

The reaction chamber 100 includes a rotating part 150 for rotating the crucible 110; and a lifting unit 140 for independently lifting and lowering the crucible 110 and the plasma electrode 160, respectively. The evaporation amount and evaporation rate of the raw material, characterized in that by adjusting the evaporation amount and the evaporation rate of the raw material vaporized inside through the rotation of the crucible 110 and the raising and lowering of the crucible 110 and the plasma electrode 160 Controlled Nanopowder Continuous Manufacturing Equipment.
According to claim 1,

The rotating unit 150 includes a first gear 151 fixedly coupled to the lower end of the crucible central shaft 130 connected to the crucible 110 through the reaction chamber 100; and a second gear (152) that is engaged with the first gear (151) and rotates by driving a motor;
According to claim 1,

The lifting unit 140 is connected to the lower end of the crucible central shaft 130 that leads to the lower part of the crucible electrode 120 connected to the crucible 110 , and a plurality of support rods 142 extending downward from the fixed plate 141 . ) a first elevating plate 143 coupled through the lower end; and a screw shaft coupled to the lower end of the electrode central shaft 162 leading to the lower portion of the plasma electrode 160 penetrating the fixing plate 141 and the first lifting plate 143 , and rotating by driving the motor 146 . A second lifting plate 145 that is spirally engaged with the screw shaft 144 and ascends and descends according to the clockwise or counterclockwise rotation of the screw shaft 144; Nanopowder continuous manufacturing equipment.
4. The method of claim 3,

The second elevating plate 145 is a continuous manufacturing apparatus for nanopowder in which the evaporation amount and evaporation rate of the raw material is controlled, characterized in that the elevating and elevating of the first elevating plate 143 at the same time or with a time difference.
According to claim 1,

The plasma electrode 160, the tip 161 is fastened to the longitudinal end adjacent to the crucible 110, made of tungsten or graphite; an electrode central axis 162 extending in the vertical direction from the longitudinal end; and a connection terminal 163 disposed on one side of the electrode central shaft 162 and connected to a power source.
According to claim 1,

The crucible 110, a first track 111 of a shape that is settling in the downward direction; a second track (112) having an inner circumference larger than the outer circumference of the first track (111) and having a downwardly depressed shape; and a blocking protrusion 113 provided between the first track 111 and the second track 112 and blocking the first track 111 and the second track 112. A continuous production device for nanopowder in which the evaporation amount and evaporation rate of raw materials are controlled.
According to claim 1,

The raw material supply unit 200, a feeding housing 211; a feeding screw 212 provided in a spiral shape inside the feeding housing 211; a feeding motor 215 for driving the feeding screw 212; and a feeding nozzle 214 connected to the feeding housing 211 and supplying the raw material into the reaction chamber 100; an automatic feeding device 210 having; and an apparatus for continuously producing nanopowders in which the evaporation rate is controlled.
8. The method of claim 7,

The automatic feeding device 210 is provided in plurality to supply the raw material of the same material or the raw material of different materials to each of the first track 111 and the second track 112 of the crucible 110 . A continuous production device for nanopowder in which the evaporation amount and evaporation rate of the raw material are controlled.
According to claim 1,

The transfer film 180 is supported by a transfer shaft 181 on both sides extending in the horizontal direction, and the transfer shaft 181 has an evaporation amount and an evaporation rate of the raw material, characterized in that cooling water is introduced therein. Controlled Nanopowder Continuous Manufacturing Equipment.
According to claim 1,

The collecting unit 300 includes: a first collecting unit 310 for collecting the nanopowder separated from the transfer film 180; a second collecting unit 320 connected to the first collecting unit 310 and collecting and transferring the nanopowder collected through the first collecting unit 310; and a powder recovery unit 330 in which the nanopowder moved through the second collection unit 320 is recovered.