US20220297185A1 - Apparatus for continuously preparing nanopowder in which evaporation amount and speed of raw material are adjusted - Google Patents
Apparatus for continuously preparing nanopowder in which evaporation amount and speed of raw material are adjusted Download PDFInfo
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- US20220297185A1 US20220297185A1 US17/805,322 US202217805322A US2022297185A1 US 20220297185 A1 US20220297185 A1 US 20220297185A1 US 202217805322 A US202217805322 A US 202217805322A US 2022297185 A1 US2022297185 A1 US 2022297185A1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/05—Metallic powder characterised by the size or surface area of the particles
- B22F1/054—Nanosized particles
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/02—Making metallic powder or suspensions thereof using physical processes
- B22F9/14—Making metallic powder or suspensions thereof using physical processes using electric discharge
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/16—Making metallic powder or suspensions thereof using chemical processes
- B22F9/18—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds
- B22F9/28—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds starting from gaseous metal compounds
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2202/00—Treatment under specific physical conditions
- B22F2202/13—Use of plasma
Definitions
- the present disclosure relates to an apparatus for preparing nanopowder and, more particularly, to an apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted, the apparatus being able to not only increase productivity of nanopowder by continuously producing nanopowder having a uniform grain size, but increase the quality of nanopowder by smoothly evaporating a raw material.
- nanopowder is a material of which the size of 1 dimension is less than 100 nm.
- Nanopowder enable control and manufacturing at the atomic and molecular levels, thereby bringing innovative changes throughout industrial fields including not only a material field, but electric, electronic, bioscientific, chemical, environmental, and energy fields.
- the present disclosure provides an apparatus for continuously preparing nanopowder, the apparatus being able to not only increase productivity of nanopowder by continuously producing nanopowder having a uniform grain size, but increase the quality of nanopowder by smoothly evaporating a raw material.
- the present disclosure proposes an apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted, the apparatus including: a reaction chamber evaporating a raw material using a plasma electrode and a crucible; a raw material supplier connected to a first side of the reaction chamber and supplying the raw material to the reaction chamber; a conveying film moving along a closed loop while capturing and conveying the raw material that has been evaporated or nanopowder that has been crystallized at an upper portion in the reaction chamber; and a collector connected to a second side of the reaction chamber and collecting the nanopowder conveyed by the conveying film, in which the reaction chamber includes a rotation-elevation device including a rotator rotating the crucible and an elevator independently moving up and down the crucible and the plasma electrode, and the crucible is rotated and the crucible and the plasma electrode are moved up and down by the rotation-elevation device, whereby an evaporation amount and an evaporation speed of the raw material
- nanopowder having a uniform grain size can be continuously produced, so productivity of nanopowder can be increased.
- the apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted of the present disclosure, since the evaporation amount and the evaporation speed of a raw material are adjusted in accordance with the kind, the amount, the position, or the like of the raw material received in the crucible by rotation of the crucible and up-down movement of the plasma electrode, a raw material can be smoothly evaporated, so the quality of nanopowder can be increased.
- FIG. 1 is a schematic view for describing the structure of an apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure.
- FIG. 2 is a one-directional perspective view showing the external shape of the apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure.
- FIG. 3 is an another-directional perspective view showing the external shape of the apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure.
- FIG. 4 is a cross-sectional view for describing the structure of the apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure.
- FIG. 5 is a side view for describing an automatic feeder of the apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure.
- FIG. 6A , FIG. 6B , and FIG. 6C are detailed views of a crucible in the apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure.
- FIG. 7 is a detailed view of a crucible and a crucible electrode in the apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure.
- FIG. 8 is a detailed view of a plasma electrode in an apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure.
- FIG. 9 is an exemplary view showing modularization of the apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure.
- FIG. 10 is a partial perspective view showing rotation of a reaction chamber and an elevation device in the apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure.
- FIG. 11 is a side view showing rotation of the reaction chamber and the elevation device in the apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure.
- FIG. 12 is an exemplary view showing rotation of the reaction chamber and rotation of the crucible by the elevation device in the apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure.
- FIG. 13 is an exemplary view showing rotation of the reaction chamber and up-down movement of the crucible by the elevation device in the apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure.
- FIG. 14 is an exemplary view showing rotation of the reaction chamber and up-down movement of the plasma electrode by the elevation device in the apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure.
- Production of nanopowder using thermal plasma uses a principle that when raw particles are put into super-high-temperature thermal plasma at about 10000° C., the raw particles are evaporated completely into an atomic state due to high temperature and the evaporated atoms are nucleated into nanoparticles through cooling.
- Such a method of producing nanopowder using thermal plasma can be classified into a transferred type and a non-transferred type on the basis of the structure of a torch.
- all electrodes are mounted in a torch and generate arcs therein and the arcs are ejected to the outside by a carrier gas coming out from the rear. Further, according to the transferred type, a cathode and an anode are spaced with a predetermined gap and the length of an arc is adjusted by adjusting the gap.
- the registered patent includes a power supplier, a plasma torch, a reaction chamber, a vacuum pump, a cooling tube, a capturer, and a scrubber, in which a specimen evaporated by plasma in the reaction chamber is crystallized into nanopowder through the cooling tube and then captured by the capturer.
- an apparatus A for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted includes: a reaction chamber 100 ; a raw material supplier 200 , a conveying film 180 , and a collector 300 .
- the reaction chamber 100 of the present disclosure evaporates a raw material using a plasma electrode 160 and a crucible 110 .
- the reaction chamber 100 has the plasma electrode 160 , the crucible 110 , and the conveying film 180 , is connected on a first side with the raw material supplier 200 that is supplied with a raw material and on a second side with the collector 300 that collects a nanomaterial.
- a support frame 400 is disposed under the reaction chamber 100 and the bottom of the reaction chamber 100 is supported by the support frame 400 , whereby the reaction chamber 100 is positioned at a set height.
- the support frame 400 supports not only the reaction chamber 100 , but the collector 300 and the raw material supplier 200 at set heights, respectively.
- reaction chamber 100 has a substance supply port 101 connected with the raw material supplier 200 and a vacuum port 102 connected with a vacuum pump P, etc., on at least any one side.
- reaction chamber 100 and the collector 300 and the raw material supplier 200 that are connected to the reaction chamber 100 may be maintained in a vacuum state.
- the crucible 110 and the plasma electrode 160 are disposed with a predetermined distance therebetween in the reaction chamber 100 and plasma produced by the plasma electrode 160 generates an arc toward the crucible 110 .
- the crucible 110 in the reaction chamber 100 is connected with a crucible electrode 120 and may be made of graphite so that the crucible 100 can resist a high-temperature atmosphere and electricity can be conducted.
- the crucible electrode 120 is connected to the center of the bottom of the crucible 110 and cooling water may be separately supplied into and discharged from the crucible electrode 120 .
- a crucible center shaft 130 is connected to the bottom of the crucible electrode 120 .
- the crucible 110 may have a dual structure.
- the crucible 110 may include: a first track 111 recessed downward; a second track 112 having an inner circumference larger than the outer circumference of the first track 111 and recessed downward; and an isolation projection 113 disposed between the first track 111 and the second track 112 and isolating the first track 111 and the second track 112 from each other.
- a raw material supplied from the automatic feeder 210 which will be described below, may be received in the first track 111 and the second track 112 , and a plurality of plasma electrodes 160 may be provided to be fitted to the first track 111 and the second track 112 , for example, four plasma electrodes 160 may be provided for the first track 111 and the second track 112 .
- the number and positions of plasma electrodes 160 may be determined in consideration of the circumferences of the first track 111 and the second track 112 .
- a raw material of the same substance or raw materials of different substances may be supplied to the first track 111 and the second track 112 , respectively.
- a plurality of automatic feeders 210 to be described below is provided and supplies raw materials to the first track 111 and the second track 112 , respectively.
- automatic feeders 210 to be described below supply a raw material of the same substance or raw materials of different substances to the first track 111 and the second track 112 though feeding nozzles 214 , respectively.
- the crucible 110 having a dual structure, as described above, can effectively adjust an evaporation amount and an evaporation speed due to the differences in position and temperature of the first track 111 and the second track 112 when a raw material of the same substance is supplied, and can compounding raw materials of different substances in a gas state when raw materials of different substances are supplied, whereby complex nanopowder can be produced.
- the plasma electrode 160 is disposed at a predetermined distance from the crucible 110 and forms a hot cathode in the reaction chamber 100 .
- a tip 161 made of tungsten or graphite may be fastened to an end of the plasma electrode 160 and cooling water may be separately supplied into and discharged from the lower portion of the plasma electrode 160 .
- the plasma electrode 160 may have an electrode center shaft 162 vertically extending and a connection terminal 163 , which is connected with a power source, on a side of the electrode center shaft 162 .
- cooling water can flow into the electrode center shaft 162 .
- the reaction chamber 100 includes a rotation-elevation device D including: a rotator 150 that rotates the crucible 110 ; and an elevator 140 that independently moves up and down the crucible 110 and the plasma electrode 160 .
- the rotator 150 of the rotation-elevation device D includes: a first gear 151 that is coupled and fixed to the lower end portion of a crucible center shaft 130 connected to the crucible 110 through the reaction chamber 100 ; and a second gear 152 that is in mesh with the first gear 151 and is rotated by operation of a motor 153 .
- the motor 153 may be any common motor as long as it can rotate forward and backward, and the first gear 151 and the second gear 152 may be spur gears, worm gears, bevel gears, or the like.
- the evaporation amount and the evaporation speed of a raw material received in the crucible 110 are adjusted when the raw material is evaporated in the reaction chamber 100 .
- the evaporation amount and the evaporation speed of a raw material received in the crucible 110 depend on the kind, the amount, or the position, but the gap between the plasma electrode 160 and a raw material received in the crucible 110 may be increased or decreased by rotation of the crucible 110 , and accordingly, the evaporation amount and the evaporation speed of a raw material are adjusted. Therefore, a raw material is smoothly evaporated.
- the elevator 140 of the rotation-elevation device D includes: a first elevation plate 143 that is connected to the lower end of the crucible center shaft 130 extending downward from the crucible electrode 120 connected to the crucible 110 and is fitted on the lower ends of a plurality of support rods 142 extending downward from a fixed plate 141 ; and a second elevation plate 145 that is coupled to the lower end of the electrode center shaft 162 of the plasma electrode 160 passing through the fixed plate 141 and the first elevation plate 143 and is thread-fastened to a screw shaft 144 , which is rotated by operation of a motor 146 , to be moved up or down by clockwise or counterclockwise rotation of the screw shaft.
- the crucible center shaft 130 is moved up and down by up-down movement of the first elevation plate 143 , whereby the crucible 110 connected to the crucible center shaft 130 is moved up and down, as shown in FIG. 13 ; and, as shown in FIG. 14 , the plasma electrode 160 is moved up and down by up-down movement of the second elevation plate 145 .
- the first elevation plate 143 may be moved up and down by a separate elevation unit.
- a rod (not shown) of a hydraulic or pneumatic cylinder may be connected to the first elevation plate 143 and the first elevation plate 143 may be moved up and down by extending and retracting of the rod of the cylinder.
- the second elevation plate 145 may be moved up and down by rotation of the screw shaft 144 simultaneously with up-down movement of the first elevation plate 143 or with an interval from up-down movement of the first elevation plate 143 .
- the second elevation plate 145 and the first elevation plate 143 are simultaneously moved up or down, for example, when the second elevation plate 145 is moved down and simultaneously the first elevation plate 143 is moved up, it is easier to adjust the gap between the crucible 110 and the plasma electrode 160 .
- the crucible center shaft 160 connected with the crucible 110 is moved up and down by the elevator 140 of the rotation-elevation device D, the evaporation amount and the evaporation speed of a raw material received in the crucible 110 are adjusted when the raw material is evaporated in the reaction chamber 100 .
- the evaporation amount and the evaporation speed of a raw material received in the crucible 110 depend on the kind, the amount, the position, or the like, but the gap between the plasma electrode 160 and a raw material received in the crucible 110 can be increased or decreased by up-down movement of the crucible 110 and the plasma electrode 160 , and accordingly, the evaporation amount and the evaporation speed of a raw material are adjusted. Therefore, a raw material is smoothly evaporated.
- the outer surface of the plasma electrode 160 passing through the first elevation plate 143 is surrounded by a bellows 147 in the elevator 140 of the rotation-elevation device D, so the first elevation plate 143 is smoothly moved up and down by extending and retracting of the bellows 147 .
- the motor 146 and the screw shaft 144 that are in relation to up-down movement of the second elevation plate 145 are fixed to the first elevation plate 143 by coupling members (not shown) in the elevator 140 of the rotation-elevation device D, so the second elevation plate 145 is moved up and down by rotation of the screw shaft 144 that is operated by the motor 146 .
- the raw material supplier 200 of the present disclosure is connected to a side of the reach chamber 100 and supplies a raw material into the reaction chamber 100 .
- a raw material is changed into nanopowder through evaporation and condensation in the reaction chamber 100 , and the changed nanopowder is collected into the collector 300 .
- the raw material supplier 200 may include an automatic feeder 210 that supplies a raw material into the reaction chamber 100 .
- the automatic feeder 210 includes: a feeding housing 211 ; a feeding screw 212 spirally disposed in the feeding housing 211 ; a feeding motor 215 operating the feeding screw 212 ; and a feeding nozzle 214 connected to the feeding housing 211 and supplying a raw material into the reaction chamber 100 , whereby a raw material can be transferred in a extrusion type by rotation of the feeding screw 212 with the inside of the feeding housing 211 in a vacuum state.
- the feeding housing 211 has a cylindrical sealed structure and maintains the inside in a vacuum state
- the feeding nozzle 214 may be connected to a side of the feeding housing 211
- the feeding motor 215 may be connected to another side thereof.
- the feeding housing 211 may be connected to the first side of the reaction chamber 100 so that the feeding nozzle 214 smoothly supplies a raw material to the crucible 110 disposed in the reaction chamber 100 .
- the feeding housing 211 has an opening-closing unit 213 through which a raw material is supplied.
- a load lock type valve may be used as the opening-closing unit 213 to minimize influence on the internal vacuum environment of the feeding housing 211 .
- a raw material supplied inside through the opening-closing unit 213 is transferred toward the feeding nozzle 214 by rotation of the feeding screw 212 , so a raw material can be continuously supplied to the crucible 110 disposed in the reaction chamber 100 through the feeding nozzle 214 .
- a feeding heater 216 that heats a raw material in the feeding housing 211 up to a set temperature may be connected to the outer side of the feeding housing 211 , and a plurality of feeding heaters 216 may be provided.
- a side of the feeding housing 211 is coupled to the substance supply port 101 , and in this case, the feeding nozzle 214 connected to the feeding hosing 211 is positioned in the reaction chamber 100 .
- the shape and structure of the feeding nozzle 214 may be various and a plurality of feeding nozzles 214 may be provided.
- the conveying film 180 of the present disclosure captures and conveys an evaporated raw material or crystallized nanopowder at the upper portion in the reaction chamber 100 along a closed loop.
- the conveying film 180 is disposed at a predetermined distance from the crucible 110 and is partially or entirely positioned at the upper portion in the reaction chamber 100 .
- the conveying film 180 is made of metal and can capture an evaporated raw material on the surface thereof using an electrical or magnetic property.
- each of both sides of the conveying film 180 is supported by a conveying shaft 181 that is horizontally elongated.
- cooling water may be supplied into the conveying shaft 181 .
- the conveying shaft 181 may be disposed horizontally through the reaction chamber 100 or the collector 300 so that cooling water is easily supplied and discharged.
- the conveying film 180 extends from the reaction chamber 100 to the collector 300 , thereby conveying a raw material captured in the reaction chamber 100 to the collector 300 .
- the conveying film 180 moves into the collector 300 from the inside of the reaction chamber 100 while moving on a continuous track along a closed loop.
- the conveying film 180 or the conveying shaft 181 may be rotated by operation of a motor disposed outside the reaction chamber 100 or the collector 300 .
- the conveying film 180 may further include a cooling plate 182 .
- the cooling plate 182 may be in contact with the inner side of the conveying film and cools the conveying film 180 to a set temperature.
- an evaporated raw material captured on the outer side of the conveying film 180 is cooled to a set temperature by the cooling plate 182 and is condensed while being moved toward the collector 300 from the reaction chamber 100 , whereby the evaporated raw material can be crystallized into nanopowder.
- Cooling of the conveying film 180 through the cooling plate 182 may be performed using cooling water or inertia gas at a set temperature.
- a scrapper 183 is disposed at a side of the conveying film 180 .
- the scrapper 183 scrapes nanopowder, which is conveyed by the conveying film 180 , in contact with the conveying film 180 .
- the scrapper 183 extends in the width direction of the conveying film 180 and is positioned at the collector 300 .
- the scrapper 183 is particularly in contact with the surface of the lower portion of the conveying film 180 and nanopowder is separated from the conveying film 180 by the scrapper 183 and collected into the collector 300 .
- the collector 300 of the present disclosure is connected to the second side of the reaction chamber 100 and collects nanopowder conveyed by the conveying film 180 .
- the collector 300 includes: a first capturer 310 that captures nanopowder separated from the conveying film 180 ; a second capturer 320 that is connected with the first capturer 310 and captures and transfers nanopowder captured through the first capturer 310 ; and a powder receiver 330 receiving nanopowder moved through the second capturer 320 .
- the first capturer 310 has a vacuum port 102 to which a vacuum pump P, etc. are connected, and nanopowder is moved downward in the first capturer 310 of which the inside is in a vacuum state.
- the first capturer 310 may have a load lock valve or a gate valve and may further have various components for capturing and moving nanopowder while maintaining the vacuum state.
- the second capturer 320 has a vacuum port 102 to which a vacuum pump P, or the like is connected, and has the same configuration as the first capturer 310 .
- Nanopowder that has passed through the first capturer 310 and the second capturer 320 is finally received in the powder receiver 330 .
- the first capturer 310 and the second capturer 320 may have independently vacuum environments and the internal pressures may be different.
- the collector 300 has a view port 301 made of a transparent material at the upper portion, so it is possible to visually check the situation in the collector 300 .
- the powder receiver 330 may be connected with a packaging container and a load lock valve is provided, so nanopowder is moved into the packaging container by a predetermined amount in a vacuum state.
- the powder receiver 330 may have a screw conveyer and the screw conveyer moves nanopowder to a predetermined position while maintaining a vacuum state by rotation of spiral threads.
- a plurality of apparatuses A for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure may be connected in parallel and operated as one module.
- the apparatus A for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure described above includes the automatic feeder 210 and the conveying film 180 , a raw material is continuously supplied, nanopowder is continuously captured, so nanopowder can be continuously produced.
- the raw material supplier 200 , the reaction chamber 100 , and the collector 300 each have a vacuum port 102 and are all connected with vacuum pumps P, and a raw material is supplied and nanopowder is produced and collected in a vacuum environment, whereby it is possible to prevent surface oxidation of nanopowder due to exposure to the atmosphere.
- the apparatus A for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted includes the rotation-elevation device D in the reaction chamber 100 , and the crucible 110 is rotated and the crucible 110 and the plasma electrode 160 are moved up and down by the rotation-elevation device D, the evaporation amount and the evaporation speed of a raw material can be adjusted in the process of evaporation of the raw material. Therefore, a raw material can be smoothly evaporated.
- the present disclosure not only productivity of nanopowder can be increased because nanopowder having a uniform grain size is continuously produced, but the quality of nanopowder can be increased because a raw material is smoothly evaporated. Therefore, the present disclosure has industrial applicability in the field of nanopowder production.
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Abstract
An apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted is proposed. In one aspect, the apparatus includes a reaction chamber evaporating a raw material using a plasma electrode and a crucible, and a raw material supplier connected to a first side of the reaction chamber and supplying the raw material to the reaction chamber. The apparatus may also include a conveying film moving along a closed loop while capturing and conveying the raw material that has been evaporated or nanopowder that has been crystallized at an upper portion in the reaction chamber. The apparatus may further include a collector connected to a second side of the reaction chamber and collecting the nanopowder conveyed by the conveying film.
Description
- This application is a continuation application, and claims the benefit under 35 U.S.C. § 120 and § 365 of PCT Application No. PCT/KR2019/017116 filed on Dec. 5, 2019, the contents of which are hereby incorporated by reference in its entirety.
- The present disclosure relates to an apparatus for preparing nanopowder and, more particularly, to an apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted, the apparatus being able to not only increase productivity of nanopowder by continuously producing nanopowder having a uniform grain size, but increase the quality of nanopowder by smoothly evaporating a raw material.
- In general, nanopowder is a material of which the size of 1 dimension is less than 100 nm.
- Techniques about nanopowder enable control and manufacturing at the atomic and molecular levels, thereby bringing innovative changes throughout industrial fields including not only a material field, but electric, electronic, bioscientific, chemical, environmental, and energy fields.
- The present disclosure provides an apparatus for continuously preparing nanopowder, the apparatus being able to not only increase productivity of nanopowder by continuously producing nanopowder having a uniform grain size, but increase the quality of nanopowder by smoothly evaporating a raw material.
- The present disclosure proposes an apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted, the apparatus including: a reaction chamber evaporating a raw material using a plasma electrode and a crucible; a raw material supplier connected to a first side of the reaction chamber and supplying the raw material to the reaction chamber; a conveying film moving along a closed loop while capturing and conveying the raw material that has been evaporated or nanopowder that has been crystallized at an upper portion in the reaction chamber; and a collector connected to a second side of the reaction chamber and collecting the nanopowder conveyed by the conveying film, in which the reaction chamber includes a rotation-elevation device including a rotator rotating the crucible and an elevator independently moving up and down the crucible and the plasma electrode, and the crucible is rotated and the crucible and the plasma electrode are moved up and down by the rotation-elevation device, whereby an evaporation amount and an evaporation speed of the raw material that is evaporated in the reaction chamber are adjusted.
- According to the apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted of the present disclosure, since a raw material is evaporated by thermal plasma that is produced between a crucible electrode and a plasma electrode, nanopowder having a uniform grain size can be continuously produced, so productivity of nanopowder can be increased.
- Further, according to the apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted of the present disclosure, since the evaporation amount and the evaporation speed of a raw material are adjusted in accordance with the kind, the amount, the position, or the like of the raw material received in the crucible by rotation of the crucible and up-down movement of the plasma electrode, a raw material can be smoothly evaporated, so the quality of nanopowder can be increased.
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FIG. 1 is a schematic view for describing the structure of an apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure. -
FIG. 2 is a one-directional perspective view showing the external shape of the apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure. -
FIG. 3 is an another-directional perspective view showing the external shape of the apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure. -
FIG. 4 is a cross-sectional view for describing the structure of the apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure. -
FIG. 5 is a side view for describing an automatic feeder of the apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure. -
FIG. 6A ,FIG. 6B , andFIG. 6C are detailed views of a crucible in the apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure. -
FIG. 7 is a detailed view of a crucible and a crucible electrode in the apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure. -
FIG. 8 is a detailed view of a plasma electrode in an apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure. -
FIG. 9 is an exemplary view showing modularization of the apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure. -
FIG. 10 is a partial perspective view showing rotation of a reaction chamber and an elevation device in the apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure. -
FIG. 11 is a side view showing rotation of the reaction chamber and the elevation device in the apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure. -
FIG. 12 is an exemplary view showing rotation of the reaction chamber and rotation of the crucible by the elevation device in the apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure. -
FIG. 13 is an exemplary view showing rotation of the reaction chamber and up-down movement of the crucible by the elevation device in the apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure. -
FIG. 14 is an exemplary view showing rotation of the reaction chamber and up-down movement of the plasma electrode by the elevation device in the apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure. - There are a wet-type method, a mechanical crushing method, etc. as a method of producing nanopowder, but the wet-type method has a problem that the process is complicated, productivity is low, and noxious substances are discharged to the environment and the mechanical crushing method has difficulty in producing nanopowder under a predetermined size. Due to these problems, a method of producing nanopowder using plasma is recently used.
- Production of nanopowder using thermal plasma uses a principle that when raw particles are put into super-high-temperature thermal plasma at about 10000° C., the raw particles are evaporated completely into an atomic state due to high temperature and the evaporated atoms are nucleated into nanoparticles through cooling. Such a method of producing nanopowder using thermal plasma can be classified into a transferred type and a non-transferred type on the basis of the structure of a torch.
- According to the non-transferred type, all electrodes are mounted in a torch and generate arcs therein and the arcs are ejected to the outside by a carrier gas coming out from the rear. Further, according to the transferred type, a cathode and an anode are spaced with a predetermined gap and the length of an arc is adjusted by adjusting the gap.
- An apparatus for producing nanopowder using thermal plasma has been disclosed in Korean Patent No. 10-0788412. The registered patent includes a power supplier, a plasma torch, a reaction chamber, a vacuum pump, a cooling tube, a capturer, and a scrubber, in which a specimen evaporated by plasma in the reaction chamber is crystallized into nanopowder through the cooling tube and then captured by the capturer.
- However, when this structure is used, there is a problem that not only it is difficult to continuously supply a raw material, but it is complicated to collect nanopowder, so productivity of nanopowder decreases.
- Further, when this structure is used, there is a problem that the evaporation amount and the evaporation speed cannot be adjusted in the process of evaporation of a raw material, evaporation becomes unstable, depending on the kind, amount, position, or the like of a raw material, which deteriorates the quality of nanopowder.
- Hereinafter, the present disclosure is described in detail on the basis of the accompanying drawings.
- As shown in
FIGS. 1 to 4 , an apparatus A for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure includes: areaction chamber 100; araw material supplier 200, aconveying film 180, and acollector 300. - The
reaction chamber 100 of the present disclosure evaporates a raw material using aplasma electrode 160 and acrucible 110. - The
reaction chamber 100 has theplasma electrode 160, thecrucible 110, and theconveying film 180, is connected on a first side with theraw material supplier 200 that is supplied with a raw material and on a second side with thecollector 300 that collects a nanomaterial. - Further, a
support frame 400 is disposed under thereaction chamber 100 and the bottom of thereaction chamber 100 is supported by thesupport frame 400, whereby thereaction chamber 100 is positioned at a set height. - In this case, the
support frame 400 supports not only thereaction chamber 100, but thecollector 300 and theraw material supplier 200 at set heights, respectively. - Further, the
reaction chamber 100 has asubstance supply port 101 connected with theraw material supplier 200 and avacuum port 102 connected with a vacuum pump P, etc., on at least any one side. - In this case, the
reaction chamber 100, and thecollector 300 and theraw material supplier 200 that are connected to thereaction chamber 100 may be maintained in a vacuum state. - Further, the
crucible 110 and theplasma electrode 160 are disposed with a predetermined distance therebetween in thereaction chamber 100 and plasma produced by theplasma electrode 160 generates an arc toward thecrucible 110. - Further, the
crucible 110 in thereaction chamber 100, as shown inFIGS. 6A to 6C andFIG. 7 , is connected with acrucible electrode 120 and may be made of graphite so that thecrucible 100 can resist a high-temperature atmosphere and electricity can be conducted. - The
crucible electrode 120 is connected to the center of the bottom of thecrucible 110 and cooling water may be separately supplied into and discharged from thecrucible electrode 120. - In this case, a
crucible center shaft 130 is connected to the bottom of thecrucible electrode 120. - Further, the
crucible 110 may have a dual structure. - In more detail, the
crucible 110 may include: afirst track 111 recessed downward; asecond track 112 having an inner circumference larger than the outer circumference of thefirst track 111 and recessed downward; and anisolation projection 113 disposed between thefirst track 111 and thesecond track 112 and isolating thefirst track 111 and thesecond track 112 from each other. - In this case, a raw material supplied from the
automatic feeder 210, which will be described below, may be received in thefirst track 111 and thesecond track 112, and a plurality ofplasma electrodes 160 may be provided to be fitted to thefirst track 111 and thesecond track 112, for example, fourplasma electrodes 160 may be provided for thefirst track 111 and thesecond track 112. - In this case, the number and positions of
plasma electrodes 160 may be determined in consideration of the circumferences of thefirst track 111 and thesecond track 112. - Further, a raw material of the same substance or raw materials of different substances may be supplied to the
first track 111 and thesecond track 112, respectively. - In this case, a plurality of
automatic feeders 210 to be described below is provided and supplies raw materials to thefirst track 111 and thesecond track 112, respectively. - That is,
automatic feeders 210 to be described below supply a raw material of the same substance or raw materials of different substances to thefirst track 111 and thesecond track 112 though feedingnozzles 214, respectively. - The
crucible 110 having a dual structure, as described above, can effectively adjust an evaporation amount and an evaporation speed due to the differences in position and temperature of thefirst track 111 and thesecond track 112 when a raw material of the same substance is supplied, and can compounding raw materials of different substances in a gas state when raw materials of different substances are supplied, whereby complex nanopowder can be produced. - Further, the
plasma electrode 160 is disposed at a predetermined distance from thecrucible 110 and forms a hot cathode in thereaction chamber 100. - In this case, as shown in
FIG. 8 , atip 161 made of tungsten or graphite may be fastened to an end of theplasma electrode 160 and cooling water may be separately supplied into and discharged from the lower portion of theplasma electrode 160. - Further, the
plasma electrode 160 may have anelectrode center shaft 162 vertically extending and aconnection terminal 163, which is connected with a power source, on a side of theelectrode center shaft 162. - In this case, cooling water can flow into the
electrode center shaft 162. - Meanwhile, the
reaction chamber 100, as shown in FIGS. 10 and 11, includes a rotation-elevation device D including: arotator 150 that rotates thecrucible 110; and anelevator 140 that independently moves up and down thecrucible 110 and theplasma electrode 160. - In this case, the
rotator 150 of the rotation-elevation device D includes: afirst gear 151 that is coupled and fixed to the lower end portion of acrucible center shaft 130 connected to thecrucible 110 through thereaction chamber 100; and asecond gear 152 that is in mesh with thefirst gear 151 and is rotated by operation of amotor 153. - Accordingly, as shown in
FIG. 12 , when thesecond gear 152 is rotated clockwise or counterclockwise about a vertical line by operation of themotor 153, thefirst gear 151 engaged with thesecond gear 152 is rotated, whereby thecrucible center shaft 130 to which thefirst gear 151 is coupled and thecrucible 110 connected to thecrucible center shaft 130 are rotated clockwise or counterclockwise. - In this case, the
motor 153 may be any common motor as long as it can rotate forward and backward, and thefirst gear 151 and thesecond gear 152 may be spur gears, worm gears, bevel gears, or the like. - Since the
crucible 110 connected with thecrucible center shaft 130 is rotated by therotator 150 of the rotation-elevation device D, the evaporation amount and the evaporation speed of a raw material received in thecrucible 110 are adjusted when the raw material is evaporated in thereaction chamber 100. - For example, the evaporation amount and the evaporation speed of a raw material received in the
crucible 110 depend on the kind, the amount, or the position, but the gap between theplasma electrode 160 and a raw material received in thecrucible 110 may be increased or decreased by rotation of thecrucible 110, and accordingly, the evaporation amount and the evaporation speed of a raw material are adjusted. Therefore, a raw material is smoothly evaporated. - Further, the
elevator 140 of the rotation-elevation device D includes: afirst elevation plate 143 that is connected to the lower end of thecrucible center shaft 130 extending downward from thecrucible electrode 120 connected to thecrucible 110 and is fitted on the lower ends of a plurality ofsupport rods 142 extending downward from a fixedplate 141; and asecond elevation plate 145 that is coupled to the lower end of theelectrode center shaft 162 of theplasma electrode 160 passing through the fixedplate 141 and thefirst elevation plate 143 and is thread-fastened to ascrew shaft 144, which is rotated by operation of amotor 146, to be moved up or down by clockwise or counterclockwise rotation of the screw shaft. - Accordingly, the
crucible center shaft 130 is moved up and down by up-down movement of thefirst elevation plate 143, whereby thecrucible 110 connected to thecrucible center shaft 130 is moved up and down, as shown inFIG. 13 ; and, as shown inFIG. 14 , theplasma electrode 160 is moved up and down by up-down movement of thesecond elevation plate 145. - The
first elevation plate 143 may be moved up and down by a separate elevation unit. - For example, a rod (not shown) of a hydraulic or pneumatic cylinder (not shown) may be connected to the
first elevation plate 143 and thefirst elevation plate 143 may be moved up and down by extending and retracting of the rod of the cylinder. - Further, the
second elevation plate 145 may be moved up and down by rotation of thescrew shaft 144 simultaneously with up-down movement of thefirst elevation plate 143 or with an interval from up-down movement of thefirst elevation plate 143. - When the
second elevation plate 145 and thefirst elevation plate 143 are simultaneously moved up or down, for example, when thesecond elevation plate 145 is moved down and simultaneously thefirst elevation plate 143 is moved up, it is easier to adjust the gap between thecrucible 110 and theplasma electrode 160. - Since the
crucible center shaft 160 connected with thecrucible 110 is moved up and down by theelevator 140 of the rotation-elevation device D, the evaporation amount and the evaporation speed of a raw material received in thecrucible 110 are adjusted when the raw material is evaporated in thereaction chamber 100. - For example, the evaporation amount and the evaporation speed of a raw material received in the
crucible 110 depend on the kind, the amount, the position, or the like, but the gap between theplasma electrode 160 and a raw material received in thecrucible 110 can be increased or decreased by up-down movement of thecrucible 110 and theplasma electrode 160, and accordingly, the evaporation amount and the evaporation speed of a raw material are adjusted. Therefore, a raw material is smoothly evaporated. - Further, the outer surface of the
plasma electrode 160 passing through thefirst elevation plate 143 is surrounded by abellows 147 in theelevator 140 of the rotation-elevation device D, so thefirst elevation plate 143 is smoothly moved up and down by extending and retracting of thebellows 147. - Further, the
motor 146 and thescrew shaft 144 that are in relation to up-down movement of thesecond elevation plate 145 are fixed to thefirst elevation plate 143 by coupling members (not shown) in theelevator 140 of the rotation-elevation device D, so thesecond elevation plate 145 is moved up and down by rotation of thescrew shaft 144 that is operated by themotor 146. - The
raw material supplier 200 of the present disclosure is connected to a side of thereach chamber 100 and supplies a raw material into thereaction chamber 100. - In this case, a raw material is changed into nanopowder through evaporation and condensation in the
reaction chamber 100, and the changed nanopowder is collected into thecollector 300. - The
raw material supplier 200 may include anautomatic feeder 210 that supplies a raw material into thereaction chamber 100. - The
automatic feeder 210, as shown inFIG. 5 , includes: a feedinghousing 211; afeeding screw 212 spirally disposed in the feedinghousing 211; a feedingmotor 215 operating the feedingscrew 212; and afeeding nozzle 214 connected to the feedinghousing 211 and supplying a raw material into thereaction chamber 100, whereby a raw material can be transferred in a extrusion type by rotation of the feedingscrew 212 with the inside of the feedinghousing 211 in a vacuum state. - In this case, the feeding
housing 211 has a cylindrical sealed structure and maintains the inside in a vacuum state, the feedingnozzle 214 may be connected to a side of the feedinghousing 211, and the feedingmotor 215 may be connected to another side thereof. - Further, the feeding
housing 211 may be connected to the first side of thereaction chamber 100 so that the feedingnozzle 214 smoothly supplies a raw material to thecrucible 110 disposed in thereaction chamber 100. - Further, the feeding
housing 211 has an opening-closing unit 213 through which a raw material is supplied. - In this case, a load lock type valve may be used as the opening-
closing unit 213 to minimize influence on the internal vacuum environment of the feedinghousing 211. - In this case, a raw material supplied inside through the opening-
closing unit 213 is transferred toward the feedingnozzle 214 by rotation of the feedingscrew 212, so a raw material can be continuously supplied to thecrucible 110 disposed in thereaction chamber 100 through the feedingnozzle 214. - Further, a
feeding heater 216 that heats a raw material in the feedinghousing 211 up to a set temperature may be connected to the outer side of the feedinghousing 211, and a plurality of feedingheaters 216 may be provided. - A side of the feeding
housing 211 is coupled to thesubstance supply port 101, and in this case, the feedingnozzle 214 connected to the feeding hosing 211 is positioned in thereaction chamber 100. - The shape and structure of the feeding
nozzle 214 may be various and a plurality of feedingnozzles 214 may be provided. - The conveying
film 180 of the present disclosure captures and conveys an evaporated raw material or crystallized nanopowder at the upper portion in thereaction chamber 100 along a closed loop. - The conveying
film 180 is disposed at a predetermined distance from thecrucible 110 and is partially or entirely positioned at the upper portion in thereaction chamber 100. - In this case, the conveying
film 180 is made of metal and can capture an evaporated raw material on the surface thereof using an electrical or magnetic property. - Further, each of both sides of the conveying
film 180 is supported by a conveyingshaft 181 that is horizontally elongated. - In this case, cooling water may be supplied into the conveying
shaft 181. - The conveying
shaft 181 may be disposed horizontally through thereaction chamber 100 or thecollector 300 so that cooling water is easily supplied and discharged. - Meanwhile, the conveying
film 180 extends from thereaction chamber 100 to thecollector 300, thereby conveying a raw material captured in thereaction chamber 100 to thecollector 300. - That is, the conveying
film 180 moves into thecollector 300 from the inside of thereaction chamber 100 while moving on a continuous track along a closed loop. - In this case, the conveying
film 180 or the conveyingshaft 181 may be rotated by operation of a motor disposed outside thereaction chamber 100 or thecollector 300. - Further, the conveying
film 180 may further include acooling plate 182. - The
cooling plate 182 may be in contact with the inner side of the conveying film and cools the conveyingfilm 180 to a set temperature. - In this case, an evaporated raw material captured on the outer side of the conveying
film 180 is cooled to a set temperature by thecooling plate 182 and is condensed while being moved toward thecollector 300 from thereaction chamber 100, whereby the evaporated raw material can be crystallized into nanopowder. - Cooling of the conveying
film 180 through thecooling plate 182 may be performed using cooling water or inertia gas at a set temperature. - Further, a
scrapper 183 is disposed at a side of the conveyingfilm 180. - The
scrapper 183 scrapes nanopowder, which is conveyed by the conveyingfilm 180, in contact with the conveyingfilm 180. - In this case, the
scrapper 183 extends in the width direction of the conveyingfilm 180 and is positioned at thecollector 300. - In this case, the
scrapper 183 is particularly in contact with the surface of the lower portion of the conveyingfilm 180 and nanopowder is separated from the conveyingfilm 180 by thescrapper 183 and collected into thecollector 300. - The
collector 300 of the present disclosure is connected to the second side of thereaction chamber 100 and collects nanopowder conveyed by the conveyingfilm 180. - In this case, the
collector 300 includes: afirst capturer 310 that captures nanopowder separated from the conveyingfilm 180; asecond capturer 320 that is connected with thefirst capturer 310 and captures and transfers nanopowder captured through thefirst capturer 310; and apowder receiver 330 receiving nanopowder moved through thesecond capturer 320. - The
first capturer 310 has avacuum port 102 to which a vacuum pump P, etc. are connected, and nanopowder is moved downward in thefirst capturer 310 of which the inside is in a vacuum state. - Further, the
first capturer 310 may have a load lock valve or a gate valve and may further have various components for capturing and moving nanopowder while maintaining the vacuum state. - The
second capturer 320 has avacuum port 102 to which a vacuum pump P, or the like is connected, and has the same configuration as thefirst capturer 310. - Nanopowder that has passed through the
first capturer 310 and thesecond capturer 320 is finally received in thepowder receiver 330. - The
first capturer 310 and thesecond capturer 320 may have independently vacuum environments and the internal pressures may be different. - Further, the
collector 300 has aview port 301 made of a transparent material at the upper portion, so it is possible to visually check the situation in thecollector 300. - Further, the
powder receiver 330 may be connected with a packaging container and a load lock valve is provided, so nanopowder is moved into the packaging container by a predetermined amount in a vacuum state. - Further, the
powder receiver 330 may have a screw conveyer and the screw conveyer moves nanopowder to a predetermined position while maintaining a vacuum state by rotation of spiral threads. - Meanwhile, a plurality of apparatuses A for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure, as shown in
FIG. 9 , may be connected in parallel and operated as one module. - When the apparatuses A for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure are operated in a module, efficiency of making vacuum through a vacuum pump, supplying a raw material through the
automatic feeder 210, cooling through cooling water, etc. can be increased, so productivity of nanopowder can be increased. - The apparatus A for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure described above includes the
automatic feeder 210 and the conveyingfilm 180, a raw material is continuously supplied, nanopowder is continuously captured, so nanopowder can be continuously produced. - Further, in the apparatus A for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure, the
raw material supplier 200, thereaction chamber 100, and thecollector 300 each have avacuum port 102 and are all connected with vacuum pumps P, and a raw material is supplied and nanopowder is produced and collected in a vacuum environment, whereby it is possible to prevent surface oxidation of nanopowder due to exposure to the atmosphere. - Further, since the apparatus A for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted according to the present disclosure includes the rotation-elevation device D in the
reaction chamber 100, and thecrucible 110 is rotated and thecrucible 110 and theplasma electrode 160 are moved up and down by the rotation-elevation device D, the evaporation amount and the evaporation speed of a raw material can be adjusted in the process of evaporation of the raw material. Therefore, a raw material can be smoothly evaporated. - According to the present disclosure, not only productivity of nanopowder can be increased because nanopowder having a uniform grain size is continuously produced, but the quality of nanopowder can be increased because a raw material is smoothly evaporated. Therefore, the present disclosure has industrial applicability in the field of nanopowder production.
- Since the present disclosure described above is not limited to the embodiment described above, the present disclosure may be changed without departing from the spirit described in following claims and such change is included in the protection range of the present disclosure defined in the claims.
Claims (10)
1. An apparatus for continuously preparing nanopowder in which an evaporation amount and speed of a raw material are adjusted, the apparatus comprising:
a reaction chamber configured to evaporate a raw material using a plasma electrode and a crucible;
a raw material supplier connected to a first side of the reaction chamber and configured to supply the raw material to the reaction chamber;
a conveying film configured to move along a closed loop while capturing and conveying the raw material that has been evaporated or nanopowder that has been crystallized at an upper portion in the reaction chamber; and
a collector connected to a second side of the reaction chamber and configured to collect the nanopowder conveyed by the conveying film,
wherein the reaction chamber includes a rotation-elevation device including:
a rotator configured to rotate the crucible; and
an elevator configured to independently move up and down the crucible and the plasma electrode,
wherein the crucible is configured to be rotated and the crucible and the plasma electrode are configured to be moved up and down by the rotation-elevation device such that an evaporation amount and an evaporation speed of the raw material that is evaporated in the reaction chamber are adjusted.
2. The apparatus of claim 1 , wherein the rotator includes:
a first gear coupled and fixed to a lower end portion of a crucible center shaft connected to the crucible through the reaction chamber; and
a second gear being in mesh with the first gear and being rotated by operation of a motor.
3. The apparatus of claim 1 , wherein the elevator includes:
a first elevation plate connected to a lower end of the crucible center shaft extending downward from the crucible electrode connected to the crucible, fitted on lower ends of a plurality of support rods extending downward from a fixed plate; and
a second elevation plate coupled to a lower end of the electrode center shaft of the plasma electrode passing through the fixed plate and the first elevation plate, and thread-fastened to a screw shaft, which is rotated by operation of a motor, to be moved up or down by clockwise or counterclockwise rotation of the screw shaft.
4. The apparatus of claim 3 , wherein the second elevation plate and first elevation plate are configured to be moved up and down simultaneously or with an interval.
5. The apparatus of claim 1 , wherein the plasma electrode includes:
a tip fastened to a longitudinal front end adjacent to the crucible and made of tungsten or graphite;
an electrode center shaft vertically extending from another longitudinal end; and
a connection port disposed on a side of the electrode center shaft and connected with a power source.
6. The apparatus of claim 1 , wherein the crucible includes:
a first track recessed downward;
a second track having an inner circumference larger than an outer circumference of the first track and recessed downward; and
an isolation projection disposed between the first track and the second track and configured to isolate the first track and the second track from each other.
7. The apparatus of claim 1 , wherein the raw material supplier includes an automatic feeder including:
a feeding housing;
a feeding screw spirally disposed in the feeding housing;
a feeding motor configured to operate the feeding screw; and
a feeding nozzle connected to the feeding housing and configured to supply the raw material into the reaction chamber.
8. The apparatus of claim 7 , wherein the automatic feeder comprises a plurality of automatic feeders and is configured to supply the raw material of the same substance or the raw material of different substances to a first track and a second track of the crucible.
9. The apparatus of claim 1 , wherein each of both sides of the conveying film is supported by a conveying shaft that is horizontally elongated, and wherein cooling water is configured to be supplied into the conveying shaft.
10. The apparatus of claim 1 , wherein the collector includes:
a first capturer configured to capture nanopowder separated from the conveying film;
a second capturer connected with the first capturer and configured to capture and transfer nanopowder captured through the first capturer; and
a powder receiver configured to receive nanopowder moved through the second capturer.
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US3721511A (en) * | 1971-02-18 | 1973-03-20 | M Schlienger | Rotating arc furnace crucible |
JP4818137B2 (en) * | 2007-01-24 | 2011-11-16 | 株式会社アルバック | Silicon refining equipment, silicon refining method |
KR102073733B1 (en) * | 2013-02-25 | 2020-02-05 | 주식회사 선익시스템 | Evaporation source and apparatus for deposition |
KR20160034740A (en) * | 2014-09-22 | 2016-03-30 | 주식회사 선익시스템 | Crucible for evaporation source and evaporation source including the same |
KR102010992B1 (en) * | 2017-06-13 | 2019-08-14 | 한국기계연구원 | An appratus for producing nano powders and a method of producing using the same |
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2019
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